CVD wafer coating equipment
By designing the synergistic effect of the installation unit, transmission unit, and locking unit, the problems of coating defects and scratches in CVD wafer coating equipment are solved, enabling convenient removal of wafers after coating and high-quality coating.
Patent Information
- Application Number
- CN202510418163.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-03
- Publication Date
- 2025-11-25
- Estimated Expiration
- 2045-04-03
AI Technical Summary
Existing CVD wafer coating equipment is prone to coating defects due to impurities on the wafer itself during the coating process, and scratches are easily caused when the wafer is removed after coating.
A CVD wafer coating equipment including a mounting unit, a transmission unit, and a locking unit was designed. A servo motor drives a threaded rod to move the mounting plate, causing the upper and lower coating cylinders to move relative to each other. A push rod pushes the top plate to raise the mounting rod and the moving rod, releasing the clamping plate's positioning of the wafer and ensuring that the wafer can be smoothly removed after coating.
It effectively avoids scratches on the wafer after coating, improving coating quality and ease of operation.
Smart Images

Figure CN120158724B_ABST
Abstract
Description
Technical Field
[0001] This invention belongs to the field of CVD wafer coating technology, specifically, it relates to a CVD wafer coating equipment. Background Technology
[0002] The CVD method for preparing thin films involves the following steps: the reactant gas diffuses into and adsorbs onto the substrate surface, undergoes a chemical reaction on the substrate surface, and the gaseous byproducts generated on the substrate surface detach, diffuse into space, or are removed by the pumping system. The non-volatile solid-phase reaction products left on the substrate surface become the oxide film of the substrate.
[0003] However, existing CVD wafer coating processes often encounter defects due to impurities on the wafer itself, leading to coating failures. Furthermore, scratches are common when removing the coated wafer, causing considerable inconvenience.
[0004] In view of this, the present invention is proposed. Summary of the Invention
[0005] To solve the above-mentioned technical problems, the basic concept of the technical solution adopted by the present invention is as follows:
[0006] A CVD wafer coating equipment includes an installation unit, a transmission unit, and a locking unit. The installation unit includes a work box, with four support legs fixedly installed around the bottom of the work box. The four support legs are symmetrically arranged in pairs. Sliding doors are provided on the opposite side walls of the work box. A first sliding mechanism is provided in the inner cavity of the work box. A protective shell is provided on the top of the work box. Two symmetrical wafer bodies are arranged in the inner cavity of the work box.
[0007] The transmission unit includes a servo motor, which is disposed within the inner cavity of the protective housing. A first threaded rod is fixedly mounted on the output end of the servo motor, and the first threaded rod movably passes through the working box. A second threaded rod is fixedly mounted on the end of the first threaded rod away from the servo motor. A first bearing is disposed on the end of the second threaded rod away from the first threaded rod, and the first bearing is mounted on the bottom of the working box. The first and second threaded rods have opposite threaded directions. A first threaded sleeve and a second threaded sleeve are respectively engaged on the first and second threaded rods. Two mutually symmetrical guide rods movably pass through the first and second threaded sleeves. The two ends of the two guide rods are respectively fixedly connected to opposite side walls of the inner cavity of the working box. Fixed rods are fixedly installed on the threaded sleeve and the second threaded sleeve respectively. The four fixed rods are symmetrical to each other in pairs. An upper mounting plate and a lower mounting plate are fixedly connected to the ends of the four fixed rods away from the first threaded sleeve and the second threaded sleeve respectively. The two upper mounting plates and the lower mounting plates are symmetrical to each other. An upper coating cylinder and a lower coating cylinder are respectively installed through the two upper mounting plates and the lower coating cylinder are symmetrical to each other. Two placement plates are provided on the opposite side wall of the two upper coating cylinders and the lower coating cylinder. The four placement plates are symmetrical to each other in pairs. A connecting plate is provided on the opposite side wall of the four placement plates in pairs. The four connecting plates are symmetrical to each other in pairs. A movable mechanism is provided on each of the four connecting plates.
[0008] The locking unit includes two first clamping plates and two second clamping plates, which are symmetrical to each other. Two insertion rods and two insertion cylinders are respectively provided on opposite sides of the two first clamping plates and two insertion cylinders. Each insertion rod is fitted with an insertion cylinder, and each insertion rod has an insertion slot. Each insertion cylinder has a second sliding mechanism inside its cavity. A placement cylinder is fixedly installed above the cavity of each insertion cylinder. Each placement cylinder has a third sliding mechanism inside its cavity, on which a moving plate is mounted. A second return spring is fixedly installed above each moving plate, with its other end fixedly connected to the cavity of the placement cylinder. A limit rod is fixedly installed at the bottom of each moving plate, and each limit rod is fitted into the cavity of the insertion slot. A moving mechanism is provided on the outer wall of each placement cylinder. Mounting brackets are fixedly installed on one side wall of each of the two second clamping plates, and the two mounting brackets are symmetrical to each other. The other ends of the two mounting brackets are fixedly connected to the inner wall of the work box.
[0009] In a preferred embodiment of the present invention, the first sliding mechanism includes a plurality of first sliding grooves, each of which is respectively opened on opposite side walls of the inner cavity of the working box. Two mutually symmetrical sliding rods are slidably installed in the inner cavity of each first sliding groove, and a connecting plate is fixedly connected to the end of each pair of sliding rods away from the first sliding groove.
[0010] In a preferred embodiment of the present invention, each of the placement plates has a rectangular slot on one of its opposite side walls. Each rectangular slot has a rotating rod inside its cavity. Each rotating rod has a second bearing at both ends, and the second bearings are respectively installed on the opposite side walls of the rectangular slot cavity. Each rotating rod is fitted with a cleaning roller.
[0011] In a preferred embodiment of the present invention, the movable mechanism includes a plurality of movable rods, one end of each movable rod being movably mounted on opposite ends of the connecting plates, and the other end of each movable rod being movably connected to the upper mounting plate and the lower mounting plate.
[0012] In a preferred embodiment of the present invention, the second sliding mechanism includes a plurality of second sliding grooves, each second sliding groove being formed on one side wall of the inner cavity of the insertion cylinder in pairs, each second sliding groove being symmetrical to each other, each second sliding groove having a second slider slidably mounted thereon, each second slider being symmetrical to each other, each second slider having an inclined block fixedly connected to one end away from the second sliding groove, each inclined block being symmetrical to each other, and each second slider having a first return spring fixedly connected to one opposite end in pairs, each first return spring being symmetrical to each other, and the other end of the first return spring being fixedly connected to the inner wall of the second sliding groove.
[0013] In a preferred embodiment of the present invention, a connecting plate is fixedly installed on one side wall between each pair of inclined blocks, each connecting plate is symmetrical to each other, and a sealing plate is fixedly installed on the opposite side wall of each connecting plate, each sealing plate is symmetrical to each other, and each sealing plate is located at the bottom of the placement cylinder.
[0014] In a preferred embodiment of the present invention, the third sliding mechanism includes a plurality of third sliding grooves, each of the third sliding grooves being symmetrical to each other, a third slider being slidably installed in the inner cavity of each of the third sliding grooves, each of the third sliders being symmetrical to each other, and a movable plate being fixedly installed between each of the third sliders.
[0015] In a preferred embodiment of the present invention, a rectangular groove is provided in the inner cavity of one of the third sliding grooves, and a moving rod is provided in the inner cavity of each rectangular groove. One end of each moving rod is fixedly connected to the third slider.
[0016] In a preferred embodiment of the present invention, each of the movable rods is fixedly mounted above the end away from the placement cylinder, each of the mounting rods movably passes through the insertion cylinder, and a top plate is fixedly connected above each of the mounting rods.
[0017] In a preferred embodiment of the present invention, two mutually symmetrical push rods are fixedly installed above each of the two lower mounting plates, and each push rod is higher than the lower coating cylinder.
[0018] Compared with the prior art, the present invention has the following advantages:
[0019] In this invention, when the upper and lower mounting plates move relative to each other, they can drive the upper and lower coating cylinders to move relative to each other until the wafer body is in the inner cavity of the upper and lower coating cylinders respectively. At this time, the push rod fixedly mounted on the lower mounting plate can push the top plate to move upward, thereby driving the mounting rod to move upward through the top plate, which in turn drives the moving rod to move upward, thereby driving the moving plate to move upward, so that the limiting rod can leave the insertion slot. Therefore, under the elastic force of the first reset spring set in the inner cavity of the second sliding mechanism, the insertion rod can be squeezed to reset, thereby causing the first clamping plate to lose its positioning of the wafer body. Therefore, when the wafer body coating is completed, when the upper and lower mounting plates reset, they can drive the upper and lower coating cylinders to reset as well. At this time, the wafer body will be located in the inner cavity of the lower coating cylinder, so that when the lower coating cylinder moves to the bottom, it is convenient for the staff to remove the coated wafer body. Therefore, to a certain extent, it can avoid scratches on the coated wafer body.
[0020] The specific embodiments of the present invention will now be described in further detail with reference to the accompanying drawings. Attached Figure Description
[0021] In the attached diagram:
[0022] Figure 1 A three-dimensional structural diagram of a CVD wafer coating equipment;
[0023] Figure 2 This is a schematic cross-sectional view of the work box of a CVD wafer coating equipment.
[0024] Figure 3 A schematic diagram of the internal structure of the working chamber of a CVD wafer coating equipment;
[0025] Figure 4 A CVD wafer coating equipment Figure 3 Enlarged structural diagram at point A in the middle;
[0026] Figure 5This is a schematic diagram of the structure of the first and second clamping plates in a CVD wafer coating equipment.
[0027] Figure 6 This is a schematic cross-sectional view of the connector structure of a CVD wafer coating equipment.
[0028] Figure 7 A bottom view of the connector structure of a CVD wafer coating equipment;
[0029] Figure 8 This is a schematic cross-sectional view of the placement cylinder of a CVD wafer coating equipment.
[0030] In the picture:
[0031] 100. Mounting unit; 101. Work box; 1011. Sliding door; 1012. Support leg; 102. Protective shell; 103. First slide rail; 1031. Slide rod; 104. Mounting bracket; 105. Wafer body;
[0032] 200. Transmission unit; 201. Servo motor; 2011. First threaded rod; 2012. First threaded sleeve; 2013. Second threaded rod; 2014. Second threaded sleeve; 2015. First bearing; 2016. Guide rod; 202. Fixing rod; 2021. Upper mounting plate; 2022. Upper coating cylinder; 2023. Lower mounting plate; 2024. Lower coating cylinder; 203. Placement plate; 2031. Connecting plate; 2032. Movable rod; 2033. Rectangular slot; 2034. Second bearing; 2035. Rotating rod; 2036. Cleaning roller; 204. Push rod;
[0033] 300. Locking unit; 301. First clamping plate; 3011. Second clamping plate; 302. Insertion rod; 3021. Insertion cylinder; 3022. Insertion slot; 303. Second slide groove; 3031. First return spring; 3032. Second slider; 3033. Inclined block; 3034. Connecting plate; 3035. Sealing plate; 304. Placement cylinder; 3041. Third slide groove; 3042. Third slider; 3043. Moving plate; 3044. Second return spring; 3045. Limiting rod; 305. Rectangular groove; 3051. Moving rod; 3052. Mounting rod; 3053. Top plate. Detailed Implementation
[0034] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments will be clearly and completely described below with reference to the accompanying drawings. The following embodiments are used to illustrate the present invention.
[0035] Example 1:
[0036] like Figures 1 to 8As shown, a CVD wafer coating equipment includes a mounting unit 100, a transmission unit 200, and a locking unit 300. The mounting unit 100 includes a work box 101, with support legs 1012 fixedly mounted around the bottom of the work box 101. The four support legs 1012 are symmetrically arranged in pairs. Sliding doors 1011 are provided on opposite side walls of the work box 101. A first sliding mechanism is provided inside the work box 101. A protective shell 102 is provided on top of the work box 101. Two symmetrical wafer bodies 105 are arranged inside the work box 101. The transmission unit 200 includes a servo motor 201. The servo motor 201 is equipped with... A first threaded rod 2011 is fixedly installed at the output end of the servo motor 201, located inside the protective shell 102. The first threaded rod 2011 movably passes through the work box 101. A second threaded rod 2013 is fixedly installed at the end of the first threaded rod 2011 away from the servo motor 201. A first bearing 2015 is provided at the end of the second threaded rod 2013 away from the first threaded rod 2011. The first bearing 2015 is installed at the bottom of the work box 101. The threads of the first threaded rod 2011 and the second threaded rod 2013 are opposite. First threaded sleeves 20 are respectively engaged on the first threaded rod 2011 and the second threaded rod 2013. 12 and the second threaded sleeve 2014, with two mutually symmetrical guide rods 2016 movably passing through the first threaded sleeve 2012 and the second threaded sleeve 2014. The two guide rods 2016 are respectively fixedly connected at both ends to the opposite side walls of the inner cavity of the working box 101. The first threaded sleeve 2012 and the second threaded sleeve 2014 are respectively fixedly installed with four fixing rods 202, which are symmetrical in pairs. The ends of the four fixing rods 202 away from the first threaded sleeve 2012 and the second threaded sleeve 2014 are fixedly connected to the upper mounting plate 2021 and the lower mounting plate 2023. The two upper mounting plates 2021 and 2023 are respectively fixedly connected to the upper mounting plate 2021 and the lower mounting plate 2023. Plate 2021 and lower mounting plate 2023 are symmetrical to each other. Upper coating cylinder 2022 and lower coating cylinder 2024 are respectively installed through the two upper mounting plates 2021 and lower mounting plates 2023. The two upper coating cylinders 2022 and lower coating cylinders 2024 are symmetrical to each other. Two placement plates 203 are provided on the opposite side wall of the two upper coating cylinders 2022 and lower coating cylinders 2024. The four placement plates 203 are symmetrical to each other in pairs. A connecting plate 2031 is provided on the opposite side wall of the four placement plates 203 in pairs. The four connecting plates 2031 are symmetrical to each other in pairs. A movable mechanism is provided on each of the four connecting plates 2031.The locking unit 300 includes two first clamping plates 301 and a second clamping plate 3011, which are symmetrical to each other. Two insertion rods 302 and two insertion cylinders 3021 are respectively provided on opposite sides of the two clamping plates 301 and 3011. Each insertion rod 302 is engaged with an insertion cylinder 3021. Each insertion rod 302 has an insertion slot 3022. A second sliding mechanism is provided inside the cavity of each insertion cylinder 3021. A placement cylinder 304 is fixedly installed above the cavity of each insertion cylinder 3021. A third sliding mechanism is provided inside the cavity of each placement cylinder 304. The moving mechanism and the third sliding mechanism are equipped with moving plates 3043. Each moving plate 3043 is fixedly equipped with a second return spring 3044, and the other end of the second return spring 3044 is fixedly connected to the upper part of the inner cavity of the placement cylinder 304. Each moving plate 3043 is fixedly equipped with a limit rod 3045 at the bottom. Each limit rod 3045 is respectively fitted into the inner cavity of the insertion slot 3022. Each placement cylinder 304 is provided with a moving mechanism on the outer wall. Two second clamping plates 3011 are fixedly equipped with mounting brackets 104 on one side wall. The two mounting brackets 104 are symmetrical to each other. The other end of the two mounting brackets 104 is fixedly connected to the inner wall of the work box 101. When the upper mounting plate 2021 and the lower mounting plate 2023 move relative to each other, they can drive the upper coating cylinder 2022 and the lower coating cylinder 2024 to move relative to each other until the inner cavities of the upper coating cylinder 2022 and the lower coating cylinder 2024 are respectively located at both ends of the wafer body 105. At this time, the push rod 204 fixedly mounted on the lower mounting plate 2023 can push the top plate 3053 to move upward, thereby driving the mounting rod 3052 to move upward through the top plate 3053. The mounting rod 3052 can then drive the moving rod 3051 to move upward, thereby driving the moving plate 3043 to move upward, so that the limiting rod 3045 can leave the insertion slot 3022. Therefore, in the inner cavity of the second sliding mechanism... The first reset spring 3031, under its elastic force, can press the plug rod 302 to reset, thereby causing the first clamping plate 301 to lose its positioning of the wafer body 105. Therefore, when the wafer body 105 finishes coating, the upper mounting plate 2021 and lower mounting plate 2023 reset, which in turn drives the upper coating cylinder 2022 and lower coating cylinder 2024 to reset. At this time, the wafer body 105 will be located in the inner cavity of the lower coating cylinder 2024. Thus, when the lower coating cylinder 2024 moves to the bottom, it is convenient for the operator to remove the coated wafer body 105. Therefore, to a certain extent, it can prevent scratches on the coated wafer body 105.
[0037] like Figures 2 to 3As shown, in a specific embodiment, the first sliding mechanism includes multiple first sliding grooves 103. Each first sliding groove 103 is respectively formed on opposite side walls of the inner cavity of the work box 101. Two mutually symmetrical sliding rods 1031 are slidably installed inside each first sliding groove 103. A connecting plate 2031 is fixedly connected to the end of each pair of sliding rods away from the first sliding groove 103. In this configuration, the installation position and components of the first sliding mechanism are determined.
[0038] like Figures 2 to 4 As shown, furthermore, each placement plate 203 has a rectangular slot 2033 on each opposite side wall between each pair of plates. Each rectangular slot 2033 has a rotating rod 2035 inside its cavity. Each rotating rod 2035 has a second bearing 2034 at both ends, and the second bearings 2034 are respectively installed on the opposite side walls of the rectangular slot 2033's inner cavity. A cleaning roller 2036 is sleeved onto each rotating rod 2035. In this configuration, the components of the inner cavity of the placement plate 203 are defined.
[0039] like Figures 2 to 3 As shown, the movable mechanism further includes multiple movable rods 2032, one end of each movable rod 2032 being movably mounted on opposite ends of the connecting plate 2031, and the other end of each movable rod 2032 being movably connected to the upper mounting plate 2021 and the lower mounting plate 2023, respectively. In this configuration, the installation position and components of the movable mechanism are defined.
[0040] Example 2:
[0041] The difference between the above embodiments and this embodiment is that: Figures 5 to 6 As shown, a CVD wafer coating apparatus includes a second sliding mechanism comprising multiple second sliding grooves 303. Each second sliding groove 303 is formed in pairs on one side wall of the inner cavity of the insertion cylinder 3021, and the pairs of second sliding grooves 303 are symmetrical to each other. A second slider 3032 is slidably mounted in the inner cavity of each second sliding groove 303, and the pairs of second sliders 3032 are symmetrical to each other. An inclined block 3033 is fixedly connected to one end of each second slider 3032 away from the second sliding groove 303, and the pairs of inclined blocks 3033 are symmetrical to each other. A first return spring 3031 is fixedly connected to one opposite end of each pair of second sliders 3032, and the pairs of first return springs 3031 are symmetrical to each other. The other end of the first return spring 3031 is fixedly connected to the inner wall of the second sliding groove 303. This configuration defines the installation position and components of the second sliding mechanism.
[0042] like Figures 5 to 6As shown, in a specific embodiment, a connecting plate 3034 is fixedly installed on one side wall between each pair of inclined blocks 3033. Each pair of connecting plates 3034 is symmetrical to each other. A sealing plate 3035 is fixedly installed on the opposite side wall of each connecting plate 3034. Each pair of sealing plates 3035 is symmetrical to each other, and each sealing plate 3035 is located at the bottom of the placement cylinder 304. In this configuration, the installation position and connection relationship of the sealing plates 3035 are determined.
[0043] like Figure 8 As shown, the third sliding mechanism further includes multiple third sliding grooves 3041, each third sliding groove 3041 being symmetrical to the others. A third slider 3042 is slidably mounted within the cavity of each third sliding groove 3041, each third slider 3042 being symmetrical to the others. A movable plate 3043 is fixedly mounted between each pair of third sliders 3042. In this configuration, the installation position and components of the third sliding mechanism are determined.
[0044] like Figures 6 to 8 As shown, further, each of the third slide grooves 3041 has a rectangular groove 305 inside its cavity, and each rectangular groove 305 has a movable rod 3051 inside its cavity. One end of each movable rod 3051 is fixedly connected to the third slider 3042. In this configuration, the installation position of the movable rod 3051 is determined.
[0045] like Figures 6 to 8 As shown, furthermore, each movable rod 3051 has an mounting rod 3052 fixedly installed above the end away from the placement cylinder 304. Each mounting rod 3052 movably passes through the insertion cylinder 3021, and a top plate 3053 is fixedly connected above each mounting rod 3052. In this configuration, the installation position and connection relationship of the top plate 3053 are determined, ensuring that when the top plate 3053 moves, it can drive the mounting rod 3052 to move, thereby driving the movable rod 3051 to move.
[0046] like Figures 2 to 3 As shown, furthermore, two mutually symmetrical push rods 204 are fixedly installed above each of the two lower mounting plates 2023, with each push rod 204 being higher than the lower coating cylinder 2024. In this configuration, the installation positions of the push rods 204 are determined.
[0047] The implementation principle of a CVD wafer coating equipment in this embodiment is as follows:
[0048] First, the operator opens the sliding doors 1011 on both sides and places the wafer body 105 between the first clamping plate 301 and the second clamping plate 3011. After placement, the operator moves the first clamping plate 301, which causes the insertion rod 302 to move into the insertion cylinder 3021. When the insertion rod 302 moves, it can squeeze the two tilting blocks 3033 to move to both sides with the assistance of the second sliding groove 303 and the second slider 3032 in the second sliding mechanism. When the tilting blocks 3033 move, they can drive the connecting plate 3034 and the sealing plate 3035 to leave the bottom of the placement cylinder 304.
[0049] When the sealing plate 3035 leaves the bottom of the placement cylinder 304, the second reset spring 3044 in the inner cavity of the placement cylinder 304 will be able to squeeze the moving plate 3043 under the elastic force. With the assistance of the third sliding groove 3041 and the third slider 3042 in the third sliding mechanism, the moving plate 3043 can move horizontally downward. When the moving plate 3043 moves downward, it can drive the limiting rod 3045 to move downward. Therefore, the limiting rod 3045 can be inserted into the inner cavity of the insertion slot 3022 opened in the insertion rod 302, thereby limiting the insertion rod 302. This allows the first clamping plate 301 and the second clamping plate 3011 to clamp the placed wafer body 105.
[0050] At this time, the staff controls the servo motor 201 to run through the controller. The servo motor 201 will drive the first threaded rod 2011 to rotate, and the first threaded rod 2011 will drive the second threaded rod 2013 to rotate. When the first threaded rod 2011 and the second threaded rod 2013 rotate, they can respectively drive the first threaded sleeve 2012 and the second threaded sleeve 2014 to make relative movements with the assistance of the guide rod 2016 (because the screw directions of the first threaded rod 2011 and the second threaded rod 2013 are opposite).
[0051] When the first threaded sleeve 2012 and the second threaded sleeve 2014 move relative to each other, the upper mounting plate 2021 and the lower mounting plate 2023 can be driven to move relative to each other through the fixed rod 202. When the upper mounting plate 2021 and the lower mounting plate 2023 move, the connecting plate 2031 can be driven to move horizontally with the assistance of the first sliding groove 103 and the sliding rod 1031 in the first sliding mechanism through the movable rod 2032. When the connecting plate 2031 moves, it can drive the placement plate 203 to move, so that the cleaning roller 2036 set in the inner cavity of the placement plate 203 can clean the surface of the wafer body 105 when it is attached to the wafer body 105, thereby ensuring that there will be no defects to a certain extent during the coating process.
[0052] Simultaneously, when the upper mounting plate 2021 and the lower mounting plate 2023 move relative to each other, they can drive the upper coating cylinder 2022 and the lower coating cylinder 2024 to move relative to each other until the inner cavities of the upper coating cylinder 2022 and the lower coating cylinder 2024 are respectively at both ends of the wafer body 105. At this time, the push rod 204 fixedly mounted on the lower mounting plate 2023 can push the top plate 3053 to move upward, thereby driving the mounting rod 3052 to move upward through the top plate 3053. The mounting rod 3052 can then drive the moving rod 3051 to move upward, thereby driving the moving plate 3043 to move upward, so that the limiting rod 3045 can leave the insertion slot 3022. Therefore, under the elastic force of the first reset spring 3031 set in the inner cavity of the second sliding mechanism, the insertion rod 302 can be squeezed to reset, thereby causing the first clamping plate 301 to lose its positioning on the wafer body 105.
[0053] Therefore, when the coating of the wafer body 105 is completed, the upper mounting plate 2021 and the lower mounting plate 2023 are reset, which can drive the upper coating cylinder 2022 and the lower coating cylinder 2024 to reset. At this time, the wafer body 105 will be located in the inner cavity of the lower coating cylinder 2024. When the lower coating cylinder 2024 moves to the bottom, it is convenient for the staff to remove the coated wafer body 105. Therefore, to a certain extent, it can avoid scratches on the coated wafer body 105.
Claims
1. A CVD wafer coating apparatus, comprising a mounting unit (100), a transmission unit (200), and a locking unit (300), characterized in that: The installation unit (100) includes a work box (101), and support legs (1012) are fixedly installed around the bottom of the work box (101). The four support legs (1012) are symmetrical to each other in pairs. Sliding doors (1011) are provided on the opposite side walls of the work box (101). A first sliding mechanism is provided in the inner cavity of the work box (101). A protective shell (102) is provided on the top of the work box (101). Two symmetrical wafer bodies (105) are provided in the inner cavity of the work box (101). The transmission unit (200) includes a servo motor (201), which is disposed inside the protective shell (102). A first threaded rod (2011) is fixedly installed at the output end of the servo motor (201), which movably passes through the work box (101). A second threaded rod (2013) is fixedly installed at the end of the first threaded rod (2011) away from the servo motor (201), and a first bearing (2015) is provided at the end of the second threaded rod (2013) away from the first threaded rod (2011). The support (2015) is installed at the bottom of the work box (101). The first threaded rod (2011) and the second threaded rod (2013) have opposite thread directions. The first threaded rod (2011) and the second threaded rod (2013) are respectively fitted with a first threaded sleeve (2012) and a second threaded sleeve (2014). The first threaded sleeve (2012) and the second threaded sleeve (2014) have two mutually symmetrical guide rods (2016) that move through them. The two guide rods (2016) are respectively fixedly connected at both ends to the opposite side walls of the inner cavity of the work box (101). Fixing rods (202) are fixedly installed on the first threaded sleeve (2012) and the second threaded sleeve (2014), respectively. The four fixing rods (202) are symmetrical to each other in pairs. An upper mounting plate (2021) and a lower mounting plate (2023) are fixedly connected to one end of each fixing rod (202) away from the first threaded sleeve (2012) and the second threaded sleeve (2014), respectively. The two upper mounting plates (2021) and the two lower mounting plates (2023) are symmetrical to each other. A through-mounted rod is installed on each of the two upper mounting plates (2021) and the two lower mounting plates (2023). There are an upper coating cylinder (2022) and a lower coating cylinder (2024). The two upper coating cylinders (2022) and the lower coating cylinder (2024) are symmetrical to each other. Two placement plates (203) are provided on the opposite side wall of the two upper coating cylinders (2022) and the lower coating cylinder (2024). The four placement plates (203) are symmetrical to each other in pairs. A connecting plate (2031) is provided on the opposite side wall of the four placement plates (203). The four connecting plates (2031) are symmetrical to each other in pairs. A movable mechanism is provided on each of the four connecting plates (2031). The first sliding mechanism includes a plurality of first slide grooves (103). Each first slide groove (103) is respectively opened on the opposite side walls of the inner cavity of the work box (101). Two mutually symmetrical slide rods (1031) are slidably installed in the inner cavity of each first slide groove (103). A connecting plate (2031) is fixedly connected to the end of each slide rod (1031) away from the first slide groove (103). A rectangular slot (2033) is opened on the opposite side wall of each placement plate (203). A rotating rod (2035) is provided in the inner cavity of each rectangular slot (2033). A second bearing (2034) is provided at both ends of each rotating rod (2035). The second bearings (2034) are respectively installed on the opposite side walls of the inner cavity of the rectangular slot (2033). A cleaning roller (2036) is sleeved on each rotating rod (2035). The locking unit (300) includes two first clamping plates (301) and a second clamping plate (3011). The two first clamping plates (301) and the second clamping plate (3011) are symmetrical to each other. Two insertion rods (302) and two insertion cylinders (3021) are respectively provided on opposite sides of the two first clamping plates (301) and the second clamping plate (3011). Each insertion rod (302) is fitted with an insertion slot (3022). A second sliding mechanism is provided in the inner cavity of each insertion cylinder (3021). A placement cylinder (304) is fixedly installed above the inner cavity of each insertion cylinder (3021). A first sliding mechanism is provided in the inner cavity of each placement cylinder (304). The three sliding mechanisms are provided with a moving plate (3043) installed on the third sliding mechanism. A second return spring (3044) is fixedly installed on the top of each moving plate (3043), and the other end of the second return spring (3044) is fixedly connected to the top of the inner cavity of the placement cylinder (304). A limit rod (3045) is fixedly installed at the bottom of each moving plate (3043). Each limit rod (3045) is respectively fitted into the inner cavity of the insertion slot (3022). A moving mechanism is provided on the outer wall of each placement cylinder (304). An installation bracket (104) is fixedly installed on one side wall of the two second clamping plates (3011). The two installation brackets (104) are symmetrical to each other. The other end of the two installation brackets (104) is fixedly connected to the inner wall of the work box (101).
2. The CVD wafer coating equipment according to claim 1, characterized in that, The movable mechanism includes multiple movable rods (2032), one end of each movable rod (2032) is movably mounted on opposite ends of the connecting plate (2031), and the other end of each movable rod (2032) is movably connected to the upper mounting plate (2021) and the lower mounting plate (2023).
3. The CVD wafer coating equipment according to claim 1, characterized in that, The second sliding mechanism includes a plurality of second slide grooves (303). Each second slide groove (303) is formed on one side wall of the inner cavity of the plug tube (3021) in pairs. Each second slide groove (303) is symmetrical to each other in pairs. A second slider (3032) is slidably installed in the inner cavity of each second slide groove (303). Each second slider (3032) is symmetrical to each other in pairs. An inclined block (3033) is fixedly connected to one end of each second slider (3032) away from the second slide groove (303). Each inclined block (3033) is symmetrical to each other in pairs. A first return spring (3031) is fixedly connected to one opposite end of each second slider (3032). Each first return spring (3031) is symmetrical to each other in pairs, and the other end of the first return spring (3031) is fixedly connected to the inner wall of the second slide groove (303).
4. The CVD wafer coating equipment according to claim 3, characterized in that, Each of the inclined blocks (3033) has a connecting plate (3034) fixedly installed on one side wall between each pair of them. Each of the connecting plates (3034) is symmetrical to each other. Each of the connecting plates (3034) has a sealing plate (3035) fixedly installed on the opposite side wall of each connecting plate (3034). Each of the sealing plates (3035) is symmetrical to each other. Each of the sealing plates (3035) is located at the bottom of the placement cylinder (304).
5. The CVD wafer coating equipment according to claim 1, characterized in that, The third sliding mechanism includes a plurality of third slide grooves (3041), each of the third slide grooves (3041) being symmetrical to each other in pairs, and a third slider (3042) being slidably installed in the inner cavity of each of the third slide grooves (3041), each of the third sliders (3042) being symmetrical to each other in pairs, and a movable plate (3043) being fixedly installed between each of the third sliders (3042).
6. The CVD wafer coating equipment according to claim 5, characterized in that, Each of the third slide grooves (3041) has a rectangular groove (305) in its inner cavity. Each rectangular groove (305) is provided with a moving rod (3051) in its inner cavity. One end of each moving rod (3051) is fixedly connected to the third slider (3042).
7. A CVD wafer coating equipment according to claim 6, characterized in that, Each of the movable rods (3051) has an mounting rod (3052) fixedly installed above one end away from the placement cylinder (304), each mounting rod (3052) movably passes through the insertion cylinder (3021), and a top plate (3053) is fixedly connected above each mounting rod (3052).
8. The CVD wafer coating equipment according to claim 1, characterized in that, Two mutually symmetrical push rods (204) are fixedly installed above each of the two lower mounting plates (2023), and each push rod (204) is higher than the lower coating cylinder (2024).
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