EUV light source generation device and method

Abstract

The invention relates to the technical field of plasma, and provides an EUV light source generation device and method, and the device comprises a vacuum cavity which is used for maintaining a vacuum environment; normal-temperature liquid metal alloy is arranged in the liquid metal spray generating device, and the liquid metal spray generating device is used for spraying liquid metal liquid drops into the vacuum cavity; the microwave emitter is used for applying a microwave field to the vacuum cavity to enable the liquid metal liquid drops to generate plasmas; and the spectrum filtering module is used for extracting extreme ultraviolet band light of the plasma radiation. According to the EUV light source generation device and method provided by the invention, a liquid metal spraying technology is combined with microwave plasma laser, so that the path dependence of the traditional EUV light source on laser or discharge is broken through, a solid tin target or xenon is replaced by normal-temperature liquid metal alloy, and the problem of high energy consumption of target material transportation and melting in the traditional technology is solved; by means of microwave non-contact energy transfer, the problem of high cost of a laser system or ablation of a discharge electrode is solved.

Description

Technical Field

[0001] The present invention relates to the field of plasma technology, and in particular to an EUV light source generating device and method. Background Art

[0002] Extreme ultraviolet (EUV) light sources, also known as laser plasma light sources, are mainly used in semiconductor lithography for manufacturing chips and are currently the shortest exposure light sources for commercial semiconductor lithography.

[0003] In the prior art, EUV light sources mainly rely on laser plasma technology: a high-power laser is used to bombard tin (Sn) metal droplets with a specific flow rate ejected from a nozzle. Each droplet is bombarded twice (i.e., 100,000 laser pulses per second), and they are evaporated into plasma. EUV light with a wavelength of 13.5 nm is obtained through the transition between the energy levels of high-valence tin ions.

[0004] However, the generation of EUV light sources relies on high-power lasers, resulting in significant energy consumption, high system complexity (a carbon dioxide laser has more than 450,000 components, the cable length in the system is up to more than 7,000 meters, and the weight reaches more than 17,000 kilograms), and a cost in the tens of millions of dollars range. These pain points have greatly promoted the exploration and development of alternative technologies. In addition, the existing laser plasma technology also has problems such as electrode ablation and lifespan limitations, and a relatively low EUV conversion efficiency (~5%).

[0005] Therefore, how to provide a low-cost and high-performance EUV light source generating device and method is a technical problem that needs to be urgently solved by those skilled in the art. Summary of the Invention

[0006] The present invention provides an EUV light source generating device and method to solve the defects of complex structure, high cost, and low performance of the existing EUV light source generating device, and to achieve the low-cost and high-performance generation of EUV light sources while ensuring the radiation intensity.

[0007] The present invention provides an EUV light source generating device, comprising: A vacuum chamber for maintaining a vacuum environment; A liquid metal spray generating device containing a room-temperature liquid metal alloy, which is used to spray liquid metal droplets into the vacuum chamber; A microwave emitter for applying a microwave field to the vacuum chamber to generate plasma from the liquid metal droplets; A spectral filtering module for extracting the extreme ultraviolet band light radiated by the plasma.

[0008] An EUV light source generating device provided by the present invention further includes: a detection component and a control module. The detection component is used to monitor the parameters of the liquid metal droplets generated by the liquid metal spray generating device, the microwave field signal of the microwave transmitter / the vacuum chamber, the operating parameters of the vacuum chamber, and the extreme ultraviolet band light intensity of the spectral filtering module, obtain a detection result, and feed back the detection result to the control module; The control module is used to control the corresponding module to make adjustments according to the detection result so that the detection result is within a preset range.

[0009] An EUV light source generating device provided by the present invention, the detection component includes: A microwave power meter and a three-dimensional electric field probe array for tracking the microwave field distribution in real time; A camera and a laser scattering particle size analyzer for online analyzing the particle size distribution and atomization concentration of the liquid metal droplets; A vacuum gauge for monitoring the vacuum environment; A flow meter for detecting the flow rate of the liquid metal droplets; A spectrometer for completing the feedback of EUV light intensity and spectral purity.

[0010] An EUV light source generating device provided by the present invention further includes a plasma confinement device, the working end of which is communicated with the vacuum chamber, and the plasma confinement device is used to confine the plasma.

[0011] An EUV light source generating device provided by the present invention, the detection component further includes a confinement field detection device for detecting the external field generated by the plasma confinement device.

[0012] An EUV light source generating device provided by the present invention, the plasma confinement device uses an externally applied magnetic field or electric field or electromagnetic field or confines the plasma under the synergistic action of multiple fields.

[0013] An EUV light source generating device provided by the present invention, the inner wall of the vacuum chamber includes a metamaterial layer, and the metamaterial layer is used to place the liquid metal droplets for corrosion and enhance the coupling efficiency between the microwave field and the liquid metal droplets.

[0014] The present invention also provides an EUV light source generating method, using the EUV light source generating device described in any one of the above, including: S1. Evacuate the vacuum chamber so that the vacuum degree of the vacuum chamber reaches a preset value; S2. Generate liquid metal micro-nano droplets with a certain flow rate and a certain concentration through the liquid metal spray generating device and introduce them into the vacuum chamber; S3. Turn on the microwave emitter, feed microwaves with a certain pulse frequency and power into the vacuum cavity, and adjust the spatial distribution position, operating voltage, operating current, microwave pulse frequency, and electromagnetic field strength of the magnetron to achieve synchronization with the droplet ejection; S4. Under the action of the microwave field, the liquid metal spray generates plasma, and the extreme ultraviolet light radiated is filtered by the spectral filtering module to obtain an EUV light source.

[0015] According to an EUV light source generation method provided by the present invention, it further includes: S5. Detect whether the EUV light intensity reaches a preset value; S6. If the EUV intensity does not reach the preset value, adjust the operating parameters of the liquid metal spray generation device, microwave emitter, and plasma confinement device through the control module, and repeat the above steps S2 - S4 until the EUV intensity reaches the preset value; S7. Maintain the set operating parameters and continuously output stable EUV light.

[0016] According to an EUV light source generation method provided by the present invention, in the step S2, the liquid metal is a metal alloy containing tin and being liquid at room temperature, and the particle size, atomization concentration, and flow rate of the liquid metal droplets are controlled and generated by the liquid metal spray generation device.

[0017] The EUV light source generation device and method provided by the present invention combine the liquid metal spray technology with microwave plasma excitation, breaking through the path dependence of traditional EUV light sources on lasers or discharges, and having the following beneficial effects: (1) Target innovation: Select a room-temperature liquid metal alloy (such as GaInSn) to replace the solid tin target or xenon, and solve the problems of high target material transportation and melting energy consumption in traditional technologies.

[0018] (2) Excitation method innovation: Utilize microwave non-contact energy transfer to avoid the high cost of the laser system or the ablation problem of the discharge electrode.

[0019] (3) Low energy consumption: Room-temperature liquid metals have fluid properties, which are convenient for using low-cost atomizing nozzles to generate micro-nano droplet sprays. Compared with the process of using a high-power laser light source to heat the target material tin to vaporize in the LDP technology, the equipment cost is lower and the energy consumption is also lower; compared with solid metals, the surface atoms of liquid metals are arranged loosely and are more easily excited by an external field to generate plasma; the microwave field is spatially distributed and has a larger action area, which is convenient for generating more extreme ultraviolet light; the liquid metal interface has abundant free electrons, which are convenient for discharging under the excitation of the microwave field to generate high-energy plasma, with low energy consumption; by setting the microwave power and working time, as well as the liquid metal spray concentration and particle size, the extreme ultraviolet light is adjusted, the process is simple, the controllability is good, the cost is low, and it is convenient for commercial production. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the technical solutions in the present invention or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the drawings in the following description are some embodiments of the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings.

[0021] Figure 1 It is a schematic structural diagram of the EUV light source generating device provided by the present invention.

[0022] Reference numerals: 1, vacuum chamber; 2, liquid metal spray generating device; 3, microwave emitter; 4, spectral filtering module; 6, control module; 7, plasma confinement device; 51, microwave power meter and three-dimensional electric field probe array; 52, camera; 53, laser scattering particle size analyzer; 54, vacuum gauge; 55, flow meter; 56, spectrometer; 57, confinement field detection device. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0023] In order to make the objectives, technical solutions and advantages of the present invention clearer, the following will clearly and completely describe the technical solutions in the present invention with reference to the drawings in the present invention. Obviously, the described embodiments are some, but not all, of the embodiments of the present invention. All other embodiments obtained by those of ordinary skill in the art without creative efforts based on the embodiments in the present invention belong to the scope of protection of the present invention.

[0024] In the description of the embodiments of the present invention, it should be noted that the orientation or positional relationship indicated by the terms "center", "longitudinal", "transverse", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the embodiments of the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation to the embodiments of the present invention. In addition, the terms "first", "second", "third" are only used for descriptive purposes and cannot be construed as indicating or implying relative importance.

[0025] The following will be combined with Figure 1 Describe the structural block diagram of the EUV light source generating device of the present invention.

[0026] As Figure 1 shown, the embodiment of the present invention aims to provide an EUV light source generating device, including a vacuum chamber 1, a liquid metal spray generating device 2, a microwave emitter 3 and a spectral filtering module 4.

[0027] The vacuum chamber 1 is used to maintain a vacuum environment. The liquid metal spray generating device 2 contains a room-temperature liquid metal alloy therein, and the liquid metal spray generating device is used to inject liquid metal droplets into the vacuum chamber 1. The microwave emitter 3 is used to apply a microwave field to the vacuum chamber 1 to generate plasma from the liquid metal droplets. The spectral filtering module 4 is used to extract the extreme ultraviolet band light radiated by the plasma.

[0028] It should be noted that under the action of the microwave field, the surface electrons of the liquid metal are accelerated to obtain kinetic energy. After these accelerated electrons collide with other liquid metal atoms, the outer electrons of the atoms are detached, and the newly generated electrons are further accelerated by the microwave field, triggering avalanche ionization to form plasma, and accompanied by specific plasma radiation phenomena. Liquid metals represented by gallium-based alloys not only have fluidity, high electrical / thermal conductivity, and dynamic self-healing properties, but also have the property of intrinsically generating plasma, and can generate plasmas with different properties under the excitation of various external fields (such as electric fields, electromagnetic fields, microwave fields).

[0029] Therefore, in this embodiment, a room-temperature liquid metal alloy (such as GaInSn) is selected to replace the solid tin target or xenon to solve the problems of high target material transportation and melting energy consumption in the traditional technology, and the microwave non-contact energy transfer is used to avoid the high cost of the laser system or the ablation problem of the discharge electrode; at the same time, the room-temperature liquid metal has fluid properties, which is convenient for using low-cost atomizing nozzles to generate micro-nano droplet sprays. Compared with the process of using a high-power laser light source to heat the target material tin to vaporize in the LDP technology, the equipment cost is lower and the energy consumption is also lower; compared with solid metals, the surface atoms of liquid metals are arranged loosely and are more easily excited by external fields to generate plasma; the microwave field is spatially distributed and the action area is larger, which is convenient for generating more extreme ultraviolet light; the liquid metal interface has abundant free electrons, which is convenient for discharging under the excitation of the microwave field to generate high-energy plasma with low energy consumption; by setting the microwave power and working time, as well as the liquid metal spray concentration and particle size, the extreme ultraviolet light can be adjusted. The process is simple, has good controllability, low cost, and is convenient for commercial production.

[0030] In some feasible embodiments of the present invention, it further includes: a detection component and a control module 6. The detection component is respectively signal-connected to the liquid metal spray generating device 2, the microwave emitter 3, the vacuum chamber 1, the spectral filtering module 4, and the control module 6. The detection component is used to monitor the parameters of the liquid metal droplets generated by the liquid metal spray generating device 2, the microwave field signal of the microwave emitter 3 / vacuum chamber 1, the working parameters of the vacuum chamber 1, and the extreme ultraviolet band light intensity of the spectral filtering module 4, obtain the detection result, and feed the detection result back to the control module 6. The control module 6 is used to control the corresponding module to make adjustments according to the detection result so that the detection result is within the preset range.

[0031] Among them, the parameters of the liquid metal droplets include particle size, atomization concentration, and flow rate. The control module 6 controls the corresponding module to make adjustments according to the detection results of the detection component when the microwave field signal, the parameters of the liquid metal droplets, the operating parameters of the vacuum chamber, and the EUV light intensity are not within the corresponding preset ranges.

[0032] Specifically, the detection component includes a microwave power meter, a three-dimensional electric field probe array 51, a camera 52, a laser scattering particle size analyzer 53, a vacuum gauge 54, a flow meter 55, and a spectrometer 56. The microwave power meter and the three-dimensional electric field probe array 51 are used to track the microwave field distribution in real time; the camera 52 and the laser scattering particle size analyzer 53 are used together to online analyze the particle size distribution and atomization concentration of the liquid metal droplets; the vacuum gauge 54 is used to monitor the vacuum environment; the flow meter 55 is used to detect the flow rate of the liquid metal droplets; the spectrometer 56 is used to complete the feedback of EUV light intensity and spectral purity.

[0033] In the above embodiments, all components adopt vacuum-compatible packaging and electromagnetic interference-resistant design, and support the synchronous data acquisition instrument to realize the closed-loop control of the plasma generation process. The working ends of the microwave power meter, the three-dimensional electric field probe array 51, the camera 52, the laser scattering particle size analyzer 53, the vacuum gauge 54, the flow meter 55, and the spectrometer 56 are all connected to the vacuum chamber 1. The atomized liquid droplets of the liquid metal are introduced into the vacuum chamber 1 through the flow meter 55, the camera 52 and the laser scattering particle size analyzer 53. The microwave emitted by the microwave emitter 3 is introduced into the vacuum chamber 1 after passing through the microwave power meter and the three-dimensional electric field probe array 51. The EUV light generated by the vacuum chamber 1 is introduced into the spectrometer 56 after passing through the spectral filtering module 4. The vacuum gauge 54 is signal-connected to the control module 6, and the control module 6 controls the vacuum degree of the vacuum chamber 1 according to the information fed back by the vacuum gauge 54.

[0034] Furthermore, the camera 52 is a high-speed microscopic camera.

[0035] In some feasible embodiments of the present invention, a plasma confinement device 7 is further included. The working end of the plasma confinement device 7 is connected to the vacuum chamber 1, and the plasma confinement device 7 is used to confine the plasma. The detection component further includes a confinement field detection device 57 for detecting the external field generated by the plasma confinement device 57. The external field generated by the plasma confinement device 7 is introduced into the vacuum chamber 1 after passing through the confinement field detection device 7.

[0036] Among them, the plasma confinement device 7 confines the plasma by applying an external magnetic field or electric field or electromagnetic field or under the synergistic action of multiple fields, which can extend the plasma lifetime and improve the EUV output stability.

[0037] In some feasible embodiments of the present invention, the inner wall of the vacuum chamber 1 includes a metamaterial layer, which is used to place liquid metal droplets for corrosion and enhance the coupling efficiency between the microwave field and the liquid metal droplets, and is used to prevent the liquid metal droplets from corrosion and enhance the coupling efficiency between the microwave field and the liquid metal droplets.

[0038] An embodiment of the second aspect of the present invention lies in providing an EUV light source generation method, which uses the EUV light source generation device of any one of the above, including: S1. Evacuate the vacuum chamber 1 to make the vacuum degree of the vacuum chamber 1 reach a preset value; S2. Generate liquid metal micro-nano droplets with a certain flow rate and a certain concentration through the liquid metal spray generation device 2, and introduce them into the vacuum chamber; S3. Turn on the microwave emitter 3, feed microwaves with a certain pulse frequency and power into the vacuum chamber 1, and adjust the spatial distribution position, working voltage, working current, microwave pulse frequency, and electromagnetic field strength of the magnetron to achieve synchronization with the droplet injection; S4. Under the action of the microwave field, the liquid metal spray generates plasma, and the radiated extreme ultraviolet light passes through the spectral filtering module to obtain an EUV light source.

[0039] In some feasible embodiments of the present invention, after step S4, it further includes: S5. Detect whether the EUV light intensity reaches a preset value; S6. If the EUV intensity does not reach the preset value, the control module 6 adjusts the working parameters of the liquid metal spray generation device 2, the microwave emitter 3, and the plasma confinement device 7, and repeats the above steps S2 - S4 until the EUV intensity reaches the preset value; S7. Keep the set working parameters and continuously output stable EUV light.

[0040] More specifically, in step S2, the liquid metal is a metal alloy containing tin and being liquid at room temperature, preferably gallium-tin alloy, gallium-indium-tin alloy, gallium-indium-zinc-tin alloy, where the mass ratio of tin is ≥10%; the particle size, atomization concentration, and flow rate of the liquid metal droplets are controlled and generated by the liquid metal spray generation device 2; the particle size range of the liquid metal droplets is 0.001 - 1000 μm, and the droplet size error is less than 1%; the concentration is in ppm level; the flow rate range is 100 m / s - 0.1 m / s.

[0041] Furthermore, in step S3, the spatial distribution position, operating voltage, operating current, microwave frequency, electromagnetic field strength, microwave power, and operating time of the microwave emitter 3 are adjustable; the operating frequency of the microwave emitter 3 is 0.3 - 30 THz, the power density ≥ 1 GW / cm², and the pulse width ≤ 100 ns; the types of microwave feeding ports include rectangular, coaxial, and circular ports; the port modes include transverse electric mode, transverse magnetic mode, transverse electromagnetic mode, numerical mode, and periodic mode; the microwave power setting range is 10% - 100% of the total microwave power.

[0042] In summary, the method for generating an EUV light source provided by the present invention is as follows: evacuate the vacuum chamber 1, and use the vacuum gauge 54 to detect whether the vacuum degree of the vacuum chamber 1 reaches a preset value; after the vacuum degree of the vacuum chamber 1 reaches the preset value, the liquid metal spray generating device 2 generates liquid metal micro-nano droplets with a certain flow rate and a certain concentration and feeds them into the vacuum chamber 1; use the flowmeter 55, camera 52, and laser scattering particle size analyzer 53 to online analyze the flow rate, particle size distribution, and atomization concentration of the liquid metal droplets generated by the liquid metal spray generating device 2, and transmit the data to the control module 6 in real time; turn on the microwave emitter 3, feed microwaves with a certain pulse frequency and power into the vacuum chamber 1, and achieve synchronization with the droplet injection by adjusting the spatial distribution position, operating voltage, operating current, microwave pulse frequency, and electromagnetic field strength of the magnetron; use the microwave power meter three-dimensional electric field probe array 51 to track the microwave field distribution in real time and transmit the data to the control module 6 in real time; use the plasma confinement device 7 to confine the plasma generated by the liquid metal spray in the vacuum chamber 1, and use the confinement field detection device 57 to detect the confinement strength and transmit the data to the control module 6 in real time; after the radiated extreme ultraviolet light passes through the spectral filtering module 4, use the spectrometer 56 to detect whether the EUV intensity reaches the preset value and transmit the data to the control module 6 in real time; if it does not reach the preset value, adjust the operating parameters of the liquid metal spray generating device 2, microwave emitter 3, and plasma confinement device 7 through the control module 6, and repeat the above steps; after the spectrometer 56 detects that the EUV intensity reaches the preset value, maintain the set operating parameters and continuously output stable EUV light.

[0043] Therefore, the EUV light source generating device and method provided by the present invention replace the traditional laser plasma with microwave plasma technology, and while ensuring the radiation intensity, realize the low-cost and high-efficiency generation of EUV light sources.

[0044] In the description of the embodiments of the present invention, it should be noted that unless otherwise clearly specified and limited, the terms "connected" and "coupled" should be understood in a broad sense. For example, it may be a fixed connection, a detachable connection, or an integral connection; it may be a mechanical connection or an electrical connection; it may be directly connected or indirectly connected through an intermediate medium. For those of ordinary skill in the art, the specific meanings of the above terms in the embodiments of the present invention can be understood according to specific circumstances.

[0045] In the description of this specification, the descriptions with reference to the terms "one embodiment", "some embodiments", "mode", "specific mode", or "some modes", etc. mean that the specific features, structures, materials, or characteristics described in connection with the embodiment or mode are included in at least one embodiment or mode of the embodiments of the present invention. In this specification, the schematic descriptions of the above terms do not necessarily refer to the same embodiment or mode. Moreover, the specific features, structures, materials, or characteristics described can be combined in a suitable manner in any one or more embodiments or modes. In addition, without contradiction, those skilled in the art can combine and combine the different embodiments or modes described in this specification and the features of different embodiments or modes.

[0046] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and are not intended to limit them. Although the present invention has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that they can still modify the technical solutions described in the foregoing embodiments or equivalently replace some of the technical features. However, such modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. An EUV light source generating device, characterized in that: include: A vacuum chamber (1) for maintaining a vacuum environment; A liquid metal spray generating device (2) having a room temperature liquid metal alloy therein, the liquid metal spray generating device being used to spray liquid metal droplets into the vacuum cavity (1); A microwave transmitter (3) for applying a microwave field to the vacuum cavity (1) to cause the liquid metal droplets to generate plasma; The spectrum filtering module (4) is used to extract the extreme ultraviolet light radiated by the plasma.

2. The EUV light source generating device according to claim 1, characterized in that: Also includes: A detection component and a control module (6), wherein the detection component is used to monitor the parameters of liquid metal droplets generated by the liquid metal spray generating device (2), the microwave field signal of the microwave emitter (3) / the vacuum cavity (1), the operating parameters of the vacuum cavity (1), and the extreme ultraviolet band light intensity of the spectrum filtering module (4), obtain detection results, and feed the detection results back to the control module (6); The control module (6) is used to control the corresponding module to make adjustments according to the detection result so that the detection result is within a preset range.

3. The EUV light source generating device according to claim 2, characterized in that: The detection component comprises: A microwave power meter and a three-dimensional electric field probe array (51) for real-time tracking of microwave field distribution; A camera (52) and a laser scattering particle size analyzer (53) are used to analyze the particle size distribution and atomization concentration of liquid metal droplets online; A vacuum gauge (54) for monitoring the vacuum environment; A flow meter (55) for detecting the flow rate of the liquid metal droplets; The spectrometer (56) is used to provide feedback on EUV light intensity and spectral purity.

4. The EUV light source generating device according to claim 2 or 3, characterized in that: It also comprises a plasma confinement device (7), a working end of which is connected to the vacuum chamber (1), and the plasma confinement device (7) is used to confine plasma.

5. The EUV light source generating device according to claim 4, characterized in that: The detection assembly further comprises a confinement field detection device (57) for detecting the external field generated by the plasma confinement device (57).

6. The EUV light source generating device according to claim 4, characterized in that: The plasma confinement device (57) uses an external magnetic field, electric field, electromagnetic field or the coordinated action of multiple fields to confine the plasma.

7. The EUV light source generating device according to claim 1, characterized in that: The inner wall of the vacuum cavity (1) comprises a metamaterial layer, and the metamaterial layer is used to prevent corrosion by liquid metal droplets and enhance the coupling efficiency between the microwave field and the liquid metal droplets.

8. A method for generating an EUV light source, using the EUV light source generating device according to any one of claims 1 to 7, characterized in that: include: S1. evacuating the vacuum chamber (1) so that the vacuum degree of the vacuum chamber (1) reaches a preset value; S2, generating liquid metal micro-nano droplets with a certain flow rate and a certain concentration through a liquid metal spray generating device (2), and passing the droplets into the vacuum cavity; S3, turning on the microwave transmitter (3), feeding microwaves of a certain pulse frequency and power into the vacuum cavity (1), and adjusting the spatial distribution position, working voltage, working current, microwave pulse frequency, and electromagnetic field strength of the magnetron to achieve synchronization with the droplet ejection; S4. Under the action of the microwave field, the liquid metal spray generates plasma, and the radiated extreme ultraviolet light passes through the spectrum filtering module (4) to obtain an EUV light source.

9. The EUV light source generation method according to claim 8, characterized in that: After step S4, the method further includes: S5, detecting whether the EUV light intensity reaches a preset value; S6, if the EUV intensity does not reach the preset value, adjusting the operating parameters of the liquid metal spray generating device (2), the microwave emitter (3), and the plasma confinement device (7) through the control module (6), and repeating the steps S2 to S4 until the EUV intensity reaches the preset value; S7. Maintain the set working parameters and continuously output stable EUV light.

10. The EUV light source generation method according to claim 8, characterized in that: In the step S2, the liquid metal is a metal alloy containing tin and being liquid at room temperature, and the particle size, atomization concentration and flow rate of the liquid metal droplets are controlled by the liquid metal spray generating device (2).

Images