Magnesium-lithium alloy, magnesium-lithium alloy preparation method and electronic equipment

Abstract

The embodiment of the invention provides a magnesium-lithium alloy and a magnesium-lithium alloy preparation method. The magnesium-lithium alloy comprises an alloy matrix and a composite coating, the composite coating comprises an aluminum transition layer, an aluminum layer and an anodic oxidation layer, and the aluminum transition layer, the aluminum layer and the anodic oxidation layer are sequentially arranged on the surface of the alloy matrix; wherein the thickness range of the aluminum transition layer is 1-10 [mu] m; and the texture of the metallic luster on the surface of the magnesium-lithium alloy is improved.

Description

Technical Field

[0001] The present invention relates to the technical field of surface treatment of magnesium-lithium alloys, and more specifically, to a magnesium-lithium alloy, a preparation method thereof, and an electronic device. Background Art

[0002] With the rapid development of AR / VR technology in recent years, people can experience a different sense of technology in an unprecedented immersive way. As the casings of AR / VR electronic devices need to be of relatively light weight to avoid causing fatigue to consumers during long-term use by consumers. Magnesium-lithium alloy is a kind of magnesium alloy and is currently the metal structural material with the lowest density, so it has great application potential in the field of AR / VR consumer electronics.

[0003] However, common surface treatment processes in the prior art, such as micro-arc oxidation spraying or electrophoretic treatment, will result in the lack of metallic texture on the appearance of magnesium-lithium alloys, which greatly limits the wide application of magnesium-lithium alloys in the field of AR / VR consumer electronics.

[0004] Therefore, a new technical solution is needed to solve the above technical problems. Summary of the Invention

[0005] An object of the present invention is to provide a new technical solution for a magnesium-lithium alloy, a preparation method thereof, and an electronic device.

[0006] According to a first aspect of the present invention, there is provided a magnesium-lithium alloy, wherein the magnesium-lithium alloy comprises:

[0007] An alloy matrix;

[0008] A composite coating, the composite coating comprising an aluminum transition layer, an aluminum layer, and an anodic oxidation layer, and the aluminum transition layer, the aluminum layer, and the anodic oxidation layer are sequentially disposed on the surface of the alloy matrix;

[0009] Wherein, the thickness range of the aluminum transition layer is 1-10 μm.

[0010] Optionally, the density of the aluminum transition layer is 100%.

[0011] Optionally, the material of the aluminum layer is aluminum or aluminum alloy.

[0012] Optionally, the thickness range of the aluminum layer is 5-30 μm.

[0013] Optionally, the density range of the aluminum layer is 99%-100%.

[0014] Optionally, the thickness range of the anodic oxidation layer is 5-15 μm.

[0015] According to a second aspect of the present invention, there is provided a method for preparing a magnesium-lithium alloy, wherein the method for preparing the magnesium-lithium alloy includes:

[0016] Providing an aluminum transition layer on the surface of the alloy matrix;

[0017] Providing an aluminum layer on a side of the aluminum transition layer away from the alloy matrix;

[0018] Providing an anodic oxidation layer on a side of the aluminum layer away from the aluminum transition layer.

[0019] Optionally, providing the aluminum transition layer on the surface of the alloy matrix includes:

[0020] Depositing the aluminum transition layer on the surface of the alloy matrix by a magnetron sputtering coating device under an inert gas atmosphere; wherein, the deposition air pressure range of the magnetron sputtering coating device is 0.1 - 2 Pa, the deposition power range is 60 - 400 W, and the bias voltage range is 50 - 200 V.

[0021] Optionally, providing the aluminum layer on the side of the aluminum transition layer away from the alloy matrix includes:

[0022] Depositing the aluminum layer on the side of the aluminum transition layer away from the alloy matrix by a magnetron sputtering coating device under an inert gas atmosphere; wherein, the deposition air pressure range of the magnetron sputtering coating device is 0.1 - 2 Pa, and the deposition power range is 60 - 400 W.

[0023] Optionally, the inert gas is argon, and the gas flow rate range of the argon introduced into the magnetron sputtering coating device is 30 - 50 sccm.

[0024] According to a third aspect of the present invention, there is provided an electronic device, including the magnesium-lithium alloy as described in the first aspect, or including the magnesium-lithium alloy prepared by the method for preparing the magnesium-lithium alloy as described in the second aspect.

[0025] A magnesium-lithium alloy according to an embodiment of the present invention, the magnesium-lithium alloy includes an alloy matrix and a composite coating, the composite coating includes an aluminum transition layer, an aluminum layer, and an anodic oxidation layer, and the aluminum transition layer, the aluminum layer, and the anodic oxidation layer are sequentially provided on the surface of the alloy matrix; wherein, the density of the aluminum transition layer is 100%. By providing the aluminum transition layer, the aluminum layer, and the anodic oxidation layer, the texture of the metallic luster on the surface of the magnesium-lithium alloy is improved.

[0026] Through the following detailed description of the exemplary embodiments of the present invention with reference to the accompanying drawings, other features and advantages of the present invention will become clear. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and, together with the description, serve to explain the principles of the invention.

[0028] Figure 1 It is a schematic structural diagram of the magnesium-lithium alloy of the present invention.

[0029] Figure 2 It is a schematic structural diagram of the composite coating of the magnesium-lithium alloy of the present invention.

[0030] Figure 3 It is a flowchart of the preparation method of the magnesium-lithium alloy of the present invention.

[0031] Figure 4 It is a schematic cross-sectional view of the aluminum layer deposited on the aluminum transition layer of the present invention.

[0032] Figure 5 It is a schematic cross-sectional view of the aluminum layer deposited on the alloy substrate of the present invention.

[0033] Figure 6 It is a schematic surface view of the aluminum layer deposited on the aluminum transition layer of the present invention.

[0034] Figure 7 It is a schematic structural diagram of the spectacle frame in an embodiment of the present invention.

[0035] Figure 8 It is a schematic structural diagram of the temple in an embodiment of the present invention.

[0036] Explanation of reference numerals:

[0037] 111, alloy substrate; 12, composite coating; 121, aluminum transition layer; 122, aluminum layer; 123, anodic oxidation layer; 2, spectacle frame; 3, temple. Detailed embodiments

[0038] Now, various exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. It should be noted that: unless otherwise specifically stated, the relative arrangements of components and steps, numerical expressions and values set forth in these embodiments do not limit the scope of the present invention.

[0039] The embodiments of the present application will be described in detail below. Examples of the embodiments are shown in the accompanying drawings. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present application and should not be construed as limiting the present application. All other embodiments obtained by those of ordinary skill in the art based on the embodiments in the present application without creative efforts belong to the scope of protection of the present application.

[0040] It should be noted that like reference numerals and letters refer to like items in the following figures, and thus, once an item is defined in one figure, further discussion thereof is not required in subsequent figures.

[0041] According to an embodiment of the present application, a magnesium-lithium alloy is provided. Refer to Figure 1 and Figure 2 , the magnesium-lithium alloy includes an alloy matrix 111 and a composite coating 12. The composite coating includes an aluminum transition layer 121, an aluminum layer 122, and an anodic oxidation layer 123. The aluminum transition layer 121, the aluminum layer 122, and the anodic oxidation layer 123 are sequentially disposed on the surface of the alloy matrix; wherein, the thickness range of the aluminum transition layer 121 is 1-10 μm.

[0042] Specifically, as Figure 2 shown, the material of the aluminum layer 122 in the embodiment of the present application is aluminum or aluminum alloy. Since a dense anodic oxidation layer 123 can be formed on the surface of aluminum or aluminum alloy after anodic oxidation treatment, and the anodic oxidation layer 123 has a high-quality metallic luster, the texture of the metallic luster on the surface of the magnesium-lithium alloy can be significantly improved. Moreover, the anodic oxidation layer 123 can be dyed by electrolytic coloring, thereby further improving the texture of the metallic luster on the surface of the magnesium-lithium alloy.

[0043] Among them, since aluminum has low density, light weight, high strength, good workability, and good corrosion resistance and electrical conductivity, aluminum is preferably used to form the aluminum layer 122.

[0044] In addition, the alloy matrix 111 in the embodiment of the present application is a magnesium-lithium alloy matrix, and the magnesium-lithium alloy matrix includes metallic magnesium and metallic lithium.

[0045] Furthermore, in order to ensure that the aluminum layer 122 disposed on the surface of the magnesium-lithium alloy can form a dense anodic oxidation layer 123 in subsequent anodic oxidation treatment, a relatively thick aluminum layer 122 needs to be provided on the alloy matrix 111. And the physical vapor deposition (PVD) process, as a green and environmentally friendly coating process, can deposit the required aluminum layer 122 on the surface of the magnesium-lithium alloy.

[0046] However, directly depositing the aluminum layer 122 on the surface of the magnesium-lithium alloy will become increasingly rough as the thickness of the aluminum layer 122 increases. At the same time, it will also cause the compactness of the aluminum layer 122 to deteriorate, making it impossible to form a dense anodic oxidation layer 123 in subsequent anodic oxidation treatment, and thus impossible to prepare a magnesium-lithium alloy with a high-quality metallic luster surface. Moreover, when using the physical vapor deposition process, due to the inherent random fluctuations and shadow effects during the forming process of the physical vapor deposition process, the surface roughness of the aluminum layer 122 will be further increased, resulting in more pores in the aluminum layer 122, and thus seriously affecting the anodic oxidation treatment effect of the aluminum layer 122 subsequently.

[0047] Therefore, in the embodiments of the present application, an aluminum transition layer 121 is further provided between the alloy substrate 111 and the aluminum layer 122, so that the aluminum transition layer 121 can effectively weaken the influence of the random fluctuations and shadow effects of the physical vapor deposition process on the deposition of the aluminum layer 122. Furthermore, by using the physical vapor deposition process, a dense, smooth and defect-free aluminum layer 122 can be deposited on the side of the aluminum transition layer 121 away from the alloy substrate 111. Then, anodic oxidation treatment is performed on the dense, smooth and defect-free aluminum layer 122 to prepare a magnesium-lithium alloy with a high-quality metallic luster effect, so as to meet the usage requirements of electronic devices.

[0048] In addition, when the thickness of the aluminum transition layer 121 is less than 1 μm, the bonding force of the aluminum transition layer 121 will be poor, and when using the physical vapor deposition process, the ability of the aluminum transition layer 121 to weaken the random fluctuations and shadow effects of the physical vapor deposition process will also be poor, resulting in the magnesium-lithium alloy being unable to form a high-quality metallic luster surface; while when the thickness of the aluminum transition layer 121 is greater than 10 μm, the lightweight effect of forming the magnesium-lithium alloy will be sacrificed.

[0049] Therefore, when the thickness range of the aluminum transition layer 121 is 1 - 10 μm, for example, when the thickness of the aluminum transition layer 121 is 1 μm, 5 μm or 10 μm, the magnesium-lithium alloy can have a dense, smooth and defect-free aluminum layer 122 to form a high-quality metallic luster surface, and retain the lightweight effect of the magnesium-lithium alloy, and thus can better meet the usage requirements of electronic devices.

[0050] Of course, the aluminum transition layer 121 described in the embodiments of the present application can also be provided by other processes, such as chemical conversion process, electro-chemical deposition (ECD) process, chemical vapor deposition (CVD) process, etc., so that the aluminum transition layer 121 has a high bonding strength, which can significantly improve the bonding strength between the alloy substrate 111 and the aluminum layer 122.

[0051] For example, in the embodiments of the present application, the aluminum transition layer 121 is provided between the alloy substrate 111 and the aluminum layer 122 through the above process, so that after the magnesium and lithium in the alloy substrate 111 and the aluminum in the aluminum layer 122 diffuse, they can combine with the aluminum element in the aluminum transition layer 121 to form magnesium-aluminum metal bonds and lithium-aluminum metal bonds, effectively ensuring the bonding strength between the alloy substrate 111 and the aluminum layer 122, and further enabling a thicker aluminum layer 122 to be provided on the alloy substrate 111.

[0052] Optionally, the density of the aluminum transition layer 121 is 100%.

[0053] Specifically, in the embodiments of the present application, by providing the aluminum transition layer 121 with a density of 100% between the alloy substrate 111 and the aluminum layer 122, it can better meet the subsequent requirements of providing the aluminum layer 122 on the aluminum transition layer 121 and performing anodic oxidation treatment on the aluminum layer 122, thereby significantly enhancing the high-quality metallic luster effect on the surface of the magnesium-lithium alloy.

[0054] Optionally, the thickness range of the aluminum layer 122 is 5 - 30 μm.

[0055] Specifically, when the thickness of the aluminum layer 122 is less than 5 μm, it will cause the subsequent inability to perform anodic oxidation treatment on the aluminum layer 122, resulting in the magnesium-lithium alloy being unable to form a high-quality metallic luster surface; while when the thickness of the aluminum layer 122 is greater than 30 μm, it will sacrifice the lightweight effect of forming the magnesium-lithium alloy.

[0056] Therefore, when the thickness range of the aluminum layer 122 is 5 - 30 μm, for example, when the thickness of the aluminum layer 122 is 5 μm, 10 μm, 20 μm or 30 μm, it can further ensure that the magnesium-lithium alloy has a high-quality metallic luster surface and retain the lightweight effect of the magnesium-lithium alloy.

[0057] Optionally, the density range of the aluminum layer 122 is 99% - 100%.

[0058] Specifically, the higher the density of the aluminum layer 122 in the embodiments of the present application, the better the quality of the anodic oxidation layer 123 formed by subsequent anodic oxidation treatment of the aluminum layer 122. For example, the aluminum layer 122 with a density of 100% can produce a metallic luster effect with a higher texture. However, since the aluminum layer 122 in the embodiments of the present application is relatively thick, the manufacturing efficiency of preparing the aluminum layer 122 with high density is low, and the manufacturing cost is high. Therefore, when the density range of the aluminum layer 122 is 99% - 100%, such as 99.9%, the manufacturing efficiency of the magnesium-lithium alloy can be significantly improved, and the manufacturing cost of the magnesium-lithium alloy can be reduced.

[0059] Optionally, the thickness range of the anodic oxidation layer 123 is 5 - 15 μm.

[0060] Specifically, when the thickness of the anodic oxidation layer 123 is less than 5 μm, the metallic texture on the surface of the formed magnesium-lithium alloy will be poor, and the corrosion resistance and wear resistance of the magnesium-lithium alloy will be reduced. When the thickness of the anodic oxidation layer 123 is greater than 15 μm, since the anodic oxidation layer 123 is formed by anodic oxidation treatment of the aluminum layer 122, the thicker the anodic oxidation layer 123, the thicker the aluminum layer 122, and the thicker the aluminum layer 122, the thicker the aluminum transition layer 121 is required to ensure the bonding force between the aluminum layer 122 and the alloy matrix 111. As a result, the weight of the finally prepared magnesium-lithium alloy is relatively large, and thus it cannot meet the requirement of lightweight of electronic devices.

[0061] Therefore, when the thickness range of the anodic oxidation layer 123 is 5 - 15 μm, for example, when the thickness of the anodic oxidation layer 123 is 5 μm, 10 μm or 15 μm, the magnesium-lithium alloy can effectively have a metallic luster surface with high texture and can achieve the effect of weight reduction.

[0062] According to another embodiment of the present application, a method for preparing a magnesium-lithium alloy is provided, as Figure 3 shown, including the following steps S1 - S3:

[0063] S1, providing an aluminum transition layer 121 on the surface of the alloy matrix 111;

[0064] S2, providing an aluminum layer 122 on the side of the aluminum transition layer 121 away from the alloy matrix 111;

[0065] S3, providing an anodic oxidation layer 123 on the side of the aluminum layer 122 away from the aluminum transition layer 121.

[0066] Specifically, the embodiments of the present application are described by taking the physical vapor deposition process as an example, and the specific operation process can be:

[0067] First, select the alloy substrate 111. Among them, the alloy substrate 111 can be plate-shaped, strip-shaped or block-shaped. For example, when the magnesium-lithium alloy substrate 111 is plate-shaped, the magnesium-lithium alloy substrate 111 can be a flat plate, an arc plate or other plate bodies. Of course, those skilled in the art can also make selections according to actual needs, and the present application does not make specific limitations here.

[0068] Further, the surface of the alloy substrate 111 can be subjected to surface pretreatment so that there are no bad defects such as oxide scales and cavities on the surface of the alloy substrate 111 and the surface is clean without dirt.

[0069] Then, put the pretreated alloy substrate 111 into a magnetron sputtering coating device, and pump the background vacuum of the vacuum chamber of the magnetron sputtering coating device to 8×10 -3 -1×10 -4 Pa. Argon is introduced into the vacuum chamber of the magnetron sputtering coating device, and the deposition pressure is adjusted. Among them, the chamber temperature of the vacuum chamber of the magnetron sputtering coating device is room temperature.

[0070] Turn on the deposition power supply of the magnetron sputtering coating device, adjust the bias voltage, and sputter-deposit an aluminum transition layer 121 on the surface of the alloy substrate 111 under the atmosphere of inert gas.

[0071] Turn off the bias voltage, and deposit an aluminum layer 122 on the side of the aluminum transition layer 121 away from the alloy substrate 111 under the atmosphere of inert gas.

[0072] Finally, an anodic oxidation layer 123 is provided on the side of the aluminum layer 122 away from the aluminum transition layer 121.

[0073] Optionally, the surface pretreatment is at least one of mechanical treatment or chemical treatment.

[0074] Specifically, the mechanical treatment described in the embodiments of the present application includes grinding, wiping, impregnation, spraying, steam, ultrasonic wave, etc., and the chemical treatment includes chemical degreasing, chemical alkali washing, chemical pickling, neutralization rust removal, sludge stripping, etc.

[0075] Optionally, the deposition of the aluminum transition layer 121 on the surface of the alloy substrate 111 includes:

[0076] Deposit an aluminum transition layer 121 on the surface of the alloy substrate 111 through a magnetron sputtering coating device under the atmosphere of inert gas; among them, the deposition pressure range of the magnetron sputtering coating device is 0.1-2 Pa, the deposition power range is 60-400 W, and the bias voltage range is 50-200 V.

[0077] Specifically, according to the different materials of the alloy substrate 111 to be processed, different deposition pressures and deposition powers can be selected to deposit the aluminum transition layer 121 on the surface of the alloy substrate 111.

[0078] For example, when the heat resistance of the alloy substrate 111 is relatively high, higher deposition pressure and deposition power can be selected. For example, the deposition pressure range is 1 - 2 Pa, and the deposition power range is 200 - 400 W, so as to significantly improve the processing efficiency of the alloy substrate 111 on the basis of ensuring the deposition quality of the aluminum transition layer 121. When the heat resistance of the alloy substrate 111 is relatively low, lower deposition pressure and deposition power can be selected. For example, the deposition pressure range is 0.1 - 1 Pa, and the deposition power range is 60 - 200 W, so as to effectively ensure the deposition quality of the aluminum transition layer 121.

[0079] Of course, the deposition pressure and deposition power of the magnetron sputtering coating equipment cannot be too low, as too low deposition pressure and deposition power will seriously affect the deposition quality of the aluminum transition layer 121. Similarly, the deposition pressure and deposition power of the magnetron sputtering coating equipment cannot be too high, as too high deposition pressure and deposition power will cause the cavity temperature of the vacuum chamber of the magnetron sputtering coating equipment to be too high, resulting in a decline in the performance of the alloy substrate 111, and in severe cases, even causing the alloy substrate 111 to melt.

[0080] Therefore, when the deposition pressure range of the magnetron sputtering coating equipment is 0.1 - 2 Pa and the deposition power range is 60 - 400 W, the deposition quality and deposition efficiency of the aluminum transition layer 121 can be effectively ensured.

[0081] In addition, when depositing the aluminum transition layer 121 on the surface of the alloy substrate 111, the present application embodiment also sets the deposition power supply bias voltage range of the magnetron sputtering coating equipment to be 50 - 200 V, so as to enable the deposition of the aluminum transition layer 121 under the condition of high bias voltage. Furthermore, an aluminum transition layer 121 with a density of 100% can be deposited on the surface of the alloy substrate 111. Further, a dense, smooth and defect - free aluminum layer 122 can be deposited on the side of the aluminum transition layer 121 away from the alloy substrate 111 by using a physical vapor deposition process. Then, an anodic oxidation treatment is performed on the dense, smooth and defect - free aluminum layer 122 to prepare a magnesium - lithium alloy with a high - texture metallic luster effect.

[0082] Among them, when the deposition power bias voltage of the magnetron sputtering coating equipment is less than 50V, the quality of the deposited aluminum transition layer 121 will be poor. Further, it will also cause the surface roughness of the aluminum layer 122 deposited on the side of the aluminum transition layer 121 away from the alloy matrix 111 to be relatively high, and there are relatively large pores. When the deposition power bias voltage of the magnetron sputtering coating equipment is greater than 200V, the deposition rate of the aluminum transition layer 121 will be too small, thereby affecting the production efficiency of the magnesium-lithium alloy.

[0083] Therefore, when the deposition power bias voltage range of the magnetron sputtering coating equipment is 50 - 200V, for example, when the deposition power bias voltage of the magnetron sputtering coating equipment is 50V, 100V, 150V or 200V, the deposition quality and deposition efficiency of the aluminum transition layer 121 can be effectively guaranteed.

[0084] Optionally, the thickness range of the aluminum transition layer 121 deposited on the surface of the alloy matrix 111 is 1 - 10μm.

[0085] Optionally, the setting of the aluminum layer 122 on the side of the aluminum transition layer 121 away from the alloy matrix 111 includes:

[0086] Under the atmosphere of inert gas, the aluminum layer 122 is deposited on the side of the aluminum transition layer 121 away from the alloy matrix 111 through the magnetron sputtering coating equipment; wherein, the deposition gas pressure range of the magnetron sputtering coating equipment is 0.1 - 2Pa, and the deposition power range is 60 - 400W.

[0087] Specifically, when the deposition gas pressure and deposition power of the magnetron sputtering coating equipment are too low, the density of the deposited aluminum layer 122 cannot meet the requirements for subsequent anodizing treatment; when the deposition gas pressure and deposition power of the magnetron sputtering coating equipment are too high, the chamber temperature of the vacuum chamber of the magnetron sputtering coating equipment will be too high, resulting in a decline in the performance of the alloy matrix 111, and in severe cases, the alloy matrix 111 will even melt.

[0088] Therefore, when the deposition gas pressure range of the magnetron sputtering coating equipment is 0.1 - 2Pa and the deposition power range is 60 - 400W, the deposition quality and deposition efficiency of the aluminum transition layer 121 can be effectively guaranteed.

[0089] Optionally, the thickness range of the aluminum layer 122 deposited on the side of the aluminum transition layer 121 away from the alloy matrix 111 is 10 - 50μm, so as to subsequently set an anodic oxidation layer 123 with a thickness range of 5 - 15μm on the side of the aluminum layer 122 away from the aluminum transition layer 121.

[0090] Optionally, the inert gas is argon, and the gas flow rate of argon introduced into the magnetron sputtering coating equipment ranges from 30 to 50 sccm.

[0091] Specifically, in the embodiment of the present application, argon with a gas flow rate ranging from 30 to 50 sccm can be introduced into the magnetron sputtering coating equipment to effectively ensure the deposition rate and deposition quality of the aluminum transition layer 121.

[0092] Optionally, processes such as chemical conversion, electrochemical deposition, chemical vapor deposition, and physical vapor deposition are used to deposit the aluminum transition layer 121 on the surface of the alloy substrate 111.

[0093] Optionally, processes such as chemical vapor deposition or physical vapor deposition are used to deposit an aluminum layer 122 on the side of the aluminum transition layer 121 away from the alloy substrate 111.

[0094] Optionally, oxalic acid anodizing treatment, chromic acid anodizing treatment, or sulfuric acid anodizing treatment is used to form a dense oxalic acid anodized layer, chromic acid anodized layer, or sulfuric acid anodized layer on the side of the aluminum layer 122 away from the aluminum transition layer 121.

[0095] In the embodiment of the present application, the above magnetron sputtering coating equipment is used to first deposit the aluminum transition layer 121 on the surface of the alloy substrate 111, and then deposit the aluminum layer 122 on the side of the aluminum transition layer 121 away from the alloy substrate 111, so as to prepare a dense aluminum layer 122 with a thickness of 10 - 50 μm, which can effectively meet the requirements for subsequent anodizing treatment of the aluminum layer 122.

[0096] Furthermore, as Figure 4 and Figure 6 shown, the aluminum layer 122 prepared by the preparation method of the magnesium-lithium alloy described in the embodiment of the present application is smooth and dense, and has a low porosity. And as Figure 5 shown, directly depositing the aluminum layer 122 on the surface of the alloy substrate 111 will make the surface of the aluminum layer 122 rough and have large voids, thus unable to meet the requirements for subsequent anodizing treatment of the aluminum layer 122.

[0097] According to another embodiment of the present application, an electronic device is provided, which includes the magnesium-lithium alloy as described in the above embodiment, or a magnesium-lithium alloy prepared by the preparation method of the magnesium-lithium alloy as described in the above embodiment.

[0098] Specifically, the electronic device described in the embodiment of the present application can be a smart glasses (such as AR / VR glasses), a head-mounted device, a display screen, or a headset, etc.

[0099] For example Figure 7 and Figure 8As shown, the electronic device is a smart glasses, and the smart glasses include a frame 2 and temple arms 3 extending outward from both ends of the frame 2. Among them, at least part of the frame 2 or at least part of the temple arms 3 is made of the magnesium-lithium alloy.

[0100] In the above embodiments, the differences between the various embodiments are mainly described. As long as the different optimized features between the various embodiments are not contradictory, they can be combined to form a better embodiment. Considering the simplicity of the writing, it will not be elaborated here.

[0101] Although some specific embodiments of the present invention have been described in detail by way of examples, those skilled in the art should understand that the above examples are only for illustration and not for limiting the scope of the present invention. Those skilled in the art should understand that the above embodiments can be modified without departing from the scope and spirit of the present invention. The scope of the present invention is defined by the appended claims.

Claims

1. A magnesium-lithium alloy, characterized in that, Comprising: An alloy matrix; A composite coating, the composite coating including an aluminum transition layer, an aluminum layer, and an anodized layer, the aluminum transition layer, the aluminum layer, and the anodized layer being sequentially disposed on the surface of the alloy matrix; Wherein, the thickness range of the aluminum transition layer is 1-10 μm.

2. The magnesium-lithium alloy according to claim 1, characterized in that, The density of the aluminum transition layer is 100%.

3. The magnesium-lithium alloy according to claim 1, characterized in that, The material of the aluminum layer is aluminum or an aluminum alloy.

4. The magnesium-lithium alloy according to claim 1, characterized in that, The thickness range of the aluminum layer is 5-30 μm.

5. The magnesium-lithium alloy according to claim 1, characterized in that, The density range of the aluminum layer is 99%-100%.

6. The magnesium-lithium alloy according to claim 1, wherein, The thickness range of the anodized layer is 5-15 μm.

7. A method for preparing a magnesium-lithium alloy, characterized in that, The preparation method includes: Providing an aluminum transition layer on the surface of the alloy matrix; Providing an aluminum layer on the side of the aluminum transition layer away from the alloy matrix; Providing an anodized layer on the side of the aluminum layer away from the aluminum transition layer.

8. The preparation method of the magnesium-lithium alloy according to claim 7, characterized in that Providing an aluminum transition layer on the surface of the alloy matrix includes: Under the atmosphere of an inert gas, depositing an aluminum transition layer on the surface of the alloy matrix by a magnetron sputtering coating device; wherein, the deposition gas pressure range of the magnetron sputtering coating device is 0.1-2 Pa, the deposition power range is 60-400 W, and the bias voltage range is 50-200 V.

9. The preparation method of the magnesium-lithium alloy according to claim 7, characterized in that, Providing an aluminum layer on the side of the aluminum transition layer away from the alloy matrix includes: Under the atmosphere of an inert gas, depositing an aluminum layer on the side of the aluminum transition layer away from the alloy matrix by a magnetron sputtering coating device; wherein, the deposition gas pressure range of the magnetron sputtering coating device is 0.1-2 Pa, and the deposition power range is 60-400 W.

10. The preparation method of the magnesium-lithium alloy according to claim 8 or 9, characterized in that, The inert gas is argon, and the gas flow rate range of the argon introduced into the magnetron sputtering coating device is 30-50 sccm.

11. An electronic device, characterized in that, Comprising the magnesium-lithium alloy according to any one of claims 1-6, or the magnesium-lithium alloy prepared by the preparation method of the magnesium-lithium alloy according to any one of claims 7-10.

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