Asiatic pennywort herb moistening mask

Abstract

The invention belongs to the technical field of cosmetics, and particularly relates to a herba centellae moisturizing mask which comprises an essence matrix and a carrier system. The essence matrix comprises a polyhydric alcohol moisturizing system: 3-5% of propylene glycol, 5-8% of glycerol, 2-4% of butanediol and 1-3% of trehalose; the active repairing compound comprises the following components in percentage by weight: 0.5 to 1.2 percent of centella asiatica extract, 0.3 to 0.8 percent of swertia japonica extract and 0.2 to 0.5 percent of dendrobium officinale stem extract; the antioxidant synergistic components comprise 0.1 to 0.3 percent of abelmoschus esculentus extract and 0.05 to 0.15 percent of peony root extract. The centella asiatica extract is added into a mask essence matrix, asiaticoside and trehalose can be utilized to form a molecular compound, the 48-hour moisturizing rate can reach 78.6%, meanwhile, the dendrobium officinale stem extract is added, natural antibacterial peptide in the dendrobium officinale stem extract cooperates with ethylhexylglycerin, traditional chemical preservatives are replaced, and the moisturizing effect is good. The protection efficiency is improved while the irritation is reduced, so that the synergistic effect of deep repairing and long-acting moisturizing is realized through an active ingredient distribution system and an efficient anti-corrosion system.

Description

Technical Field

[0001] The present invention belongs to the technical field of cosmetics, and particularly relates to a centella asiatica soothing mask. Background Art

[0002] Mask is an important part of skin care. Applying masks regularly according to the characteristics of various skin types can degrease oily skin, shrink thick pores, restore luster to dry and wrinkled skin, and inhibit the inflammation of acne skin. After using the mask, the skin appears fresh, smooth, white and delicate. This is because when the mask is applied to the skin, the mask has an affinity with the skin. As the mask gradually dries, the skin temperature rises, blood circulation accelerates, the skin tightens and the tension increases. The sebum and moisture secreted by the skin seep back into the stratum corneum, making the epidermis soft and stretched, and the pores instinctively open. The active ingredients in the mask penetrate into the skin and are absorbed by it. At the same time, the mask is tightly attached to the skin. When the mask is removed, the aged cutin on the skin and the deep dirt in the pores are also removed at the same time, making the skin fresh and clean.

[0003] The principle of the mask is to use the short time of covering the face to temporarily isolate the outside air and pollution, raise the skin temperature, expand the pores of the skin, promote sweat gland secretion and metabolism, increase the oxygen content of the skin, which is beneficial to the skin to excrete the products of epidermal cell metabolism and the accumulated oil substances. The moisture in the mask penetrates into the stratum corneum of the skin epidermis, and the skin becomes soft, and the skin is naturally bright and elastic.

[0004] The main components of centella asiatica extract are asiaticoside, madecassoside, the main components are (-)-spathulenol, (-)-menthone, pulegone, α-pinene, β-pinene, limonene, 1,8-cineole, p-cymene, isomenthone, isospathulenol, linalool, menthol and α-terpineol, etc. The components vary with the origin, extraction method and other factors. It also contains glechomafuran, glechomanolide. In addition, it also contains ursolic acid, β-sitosterol, palmitic acid, succinic acid, caffeic acid, ferulic acid, choline, vitamin C and stachyose. At present, there is no report on the utilization of centella asiatica extract, especially its application in masks. Summary of the Invention

[0005] The purpose of the present invention is to provide a centella asiatica soothing mask, which can achieve the synergistic effect of deep repair and long-term moisturization.

[0006] The technical solution adopted by the present invention is specifically as follows: The centella asiatica soothing mask includes an essence matrix and a carrier system; The essence matrix includes: Polyol moisturizing system: propylene glycol 3-5%, glycerin 5-8%, butylene glycol 2-4%, trehalose 1-3%; Active repair complex: 0.5 - 1.2% Centella asiatica extract, 0.3 - 0.8% Swertia japonica extract, 0.2 - 0.5% Dendrobium officinale stem extract; Antioxidant synergistic components: 0.1 - 0.3% Abelmoschus moschatus extract, 0.05 - 0.15% Paeonia suffruticosa root extract; Thickening and stabilizing system: 0.05 - 0.1% sodium hyaluronate, 0.1 - 0.2% xanthan gum, 0.3 - 0.5% hydroxyethyl cellulose; Antiseptic and buffer system: 0.3 - 0.6% ethylhexylglycerin, 0.1 - 0.2% octanoyl hydroxamic acid, pH adjusted to 5.5 - 6.0; The carrier system uses a silk membrane cloth modified with carboxymethyl chitosan, with a pore size of 10 - 50 μm, a thickness of 0.1 - 0.15 mm, and a loading capacity of ≥ 25 g / m².

[0007] Furthermore, the Centella asiatica extract (0.8 - 1.2%) contains ≥ 40% asiaticoside and ≥ 5% asiatic acid.

[0008] Furthermore, the molar ratio of swertiamarin to asiaticoside in the Swertia japonica extract is 1:3.

[0009] Furthermore, the Dendrobium officinale stem extract (0.3 - 0.5%) contains ≥ 50% polysaccharides.

[0010] The preparation method of the Centella asiatica soothing facial mask includes: 1. Preparation of essence: a. Heat the aqueous phase components (water, propylene glycol, glycerol, trehalose) to 45°C and stir to dissolve; b. Add niacinamide, Centella asiatica extract, Swertia japonica extract, and Dendrobium officinale extract in sequence, and maintain a constant temperature of 40°C for emulsification for 15 min; c. After cooling to 30°C, add the composite thickener of sodium hyaluronate, xanthan gum, and hydroxyethyl cellulose, and perform homogenization treatment (2000 rpm, 5 min); d. Adjust the pH value and then add the preservative, and filter and sterilize; 2. Treatment of the membrane cloth: a. Treat the silk membrane cloth with plasma (power 50 W, time 30 s) to increase surface activity; b. Immerse it in the essence containing 1% carboxymethyl chitosan, and perform ultrasonic-assisted drug loading (40 kHz, 20 min); c. Perform vacuum freeze-drying (40°C, 12 h) to form a porous drug-loading structure.

[0011] The technical effects achieved by the present invention are: By adding centella asiatica extract to the essence matrix of the facial mask, the asiaticoside can form a molecular complex with trehalose, and the 48-hour moisturizing rate can reach 78.6%. At the same time, by adding the extract of dendrobium officinale stems and using the natural antibacterial peptide in the extract of dendrobium officinale stems to synergistically cooperate with ethylhexylglycerin to replace the traditional chemical preservative, while reducing irritation, the protection efficiency is improved. Through the active ingredient distribution system and the high-efficiency anti-corrosion system, the present invention realizes the synergistic effect of deep repair and long-term moisturization. Detailed implementation mode

[0012] In order to make the purpose and advantages of the present invention clearer, the present invention will be specifically described below in conjunction with embodiments. It should be understood that the following text only describes one or several specific implementation modes of the present invention, and does not strictly limit the specific protection scope claimed by the present invention.

[0013] Centella asiatica soothing facial mask, including an essence matrix and a carrier system; The essence matrix includes: Polyol moisturizing system: propylene glycol 3-5%, glycerin 5-8%, butylene glycol 2-4%, trehalose 1-3%; Active repair complex: centella asiatica extract 0.5-1.2%, swertia japonica extract 0.3-0.8%, dendrobium officinale stem extract 0.2-0.5%; Antioxidant synergistic component: abelmoschus moschatus extract 0.1-0.3%, paeonia suffruticosa root extract 0.05-0.15%; Thickening and stabilizing system: sodium hyaluronate 0.05-0.1%, xanthan gum 0.1-0.2%, hydroxyethyl cellulose 0.3-0.5%; Antiseptic buffer system: ethylhexylglycerin 0.3-0.6%, octanoyl hydroxamic acid 0.1-0.2%, pH adjusted to 5.5-6.0; The carrier system uses a silk membrane cloth modified by carboxymethyl chitosan, with a pore size of 10-50 μm, a thickness of 0.1-0.15 mm, and a loading capacity of ≥25 g / m².

[0014] Further, the centella asiatica extract (0.8-1.2%) contains asiaticoside ≥40% and asiatic acid ≥5%.

[0015] Further, the molar ratio of swertiamarin to asiaticoside in the swertia japonica extract is 1:3.

[0016] Further, the dendrobium officinale stem extract (0.3-0.5%) contains polysaccharides from dendrobium officinale ≥50%.

[0017] The preparation method of the centella asiatica soothing facial mask includes: 1. Preparation of essence: a. Heat the aqueous components (water, propylene glycol, glycerin, trehalose) to 45°C and stir until dissolved; b. Add niacinamide, centella asiatica extract, swertia japonica extract, and dendrobium officinale extract in sequence, and maintain a constant temperature of 40°C for emulsification for 15 minutes; c. After cooling to 30°C, add the composite thickeners of sodium hyaluronate, xanthan gum, and hydroxyethyl cellulose, and perform homogenization treatment (2000 rpm, 5 minutes); d. Adjust the pH value and then add the preservative, and filter and sterilize; 2. Membrane treatment: a. The silk membrane is treated by plasma (power 50W, time 30s) to increase surface activity; b. Immerse it in the essence solution containing 1% carboxymethyl chitosan, and perform ultrasonic-assisted drug loading (40 kHz, 20 minutes); c. Vacuum freeze-dry (-40°C, 12h) to form a porous drug-loaded structure. Example

[0018] 1. Raw material composition: Essence solution formula (weight percentage): Polyol moisturizing system: propylene glycol 4.2%, glycerin 6.5%, butylene glycol 3.1%, trehalose 2.3%; Active repair complex: centella asiatica extract (madecassoside content 42%) 1.0%, swertia japonica extract (sweroside purity 92%) 0.6%, dendrobium officinale stem extract (polysaccharide content 55%) 0.4%; Antioxidant component: abelmoschus moschatus extract 0.25%, paeonia suffruticosa root extract 0.12%; Thickening and stabilizing system: sodium hyaluronate 0.08%, xanthan gum 0.15%, hydroxyethyl cellulose 0.4%; Antiseptic and buffer system: ethylhexylglycerin 0.5%, octanoyl hydroxamic acid 0.15%; Deionized water: the balance to 100%.

[0019] 2. Preparation method: (1) Preparation of essence solution a. Aqueous phase dissolution: Add deionized water, propylene glycol, glycerin, and trehalose to the jacketed reactor, heat to 50 ± 2°C, and stir at 300 rpm for 15 minutes until completely dissolved.

[0020] b. Active substance addition: After cooling to 40°C, add centella asiatica extract, swertia japonica extract, and dendrobium officinale stem extract in sequence, maintain the system pH at 5.8, and disperse with a high-shear emulsifier (10000 rpm) for 10 minutes.

[0021] c. Emulsification and homogenization: Add the remaining components such as okra extract and peony root extract, switch to paddle stirring (800 rpm) and continue for 20 min, then circulate through a high-pressure homogenizer (pressure 50 MPa) 3 times.

[0022] d. Sterilization and filling: After cooling to 25 °C, sterilize through a 0.22 μm polyethersulfone filter membrane and fill into an aluminum-plastic composite bag.

[0023] (2)Membrane cloth modification a. Plasma activation: Place the silk membrane cloth (substrate thickness 0.12 mm) in a radio frequency plasma device, introduce an Ar / O2 mixed gas (flow ratio 4:1), set the power to 60 W, and process for 45 s. The surface oxygen element content increases from 12.3% to 29.5% (measured by XPS).

[0024] b. Carboxymethyl chitosan drug loading: Immerse the treated membrane cloth in a modification solution containing 1.2% carboxymethyl chitosan and 0.5% citric acid, and process in a 40 kHz ultrasonic bath for 25 min. The drug loading reaches 27.8 g / m².

[0025] c. Freeze-drying: Pre-freeze at 40 °C for 4 h, then transfer to a freeze-dryer and perform sublimation drying under a vacuum of 10 Pa for 12 h. The final porosity of the membrane cloth is 81.5% (measured by mercury intrusion method).

[0026] 3. Moisturizing efficacy test Corneometer test: 30 subjects (aged 25 - 45 years, skin dryness index ≥ 3) use it 3 times a week. After 4 weeks: Immediate moisturizing rate: 62.3% (15 min after use) Long-term moisturizing rate: 34.7% (after 24 h) Control group (commercially available ordinary mask): The immediate moisturizing rate and long-term moisturizing rate are 48.1% and 11.2% respectively.

[0027] The above are only the preferred embodiments of the present invention. It should be noted that for those of ordinary skill in the art, without departing from the principle of the present invention, several improvements and refinements can be made, and these improvements and refinements should also be regarded as the protection scope of the present invention. The structures, devices, and operation methods not specifically described and explained in the present invention are implemented according to the conventional means in the art without special instructions and limitations.

Claims

1. Centella Asiatica Soothing Mask, characterized in that: It includes a serum matrix and a carrier system; The serum matrix includes: Polyol moisturizing system: propylene glycol 3 - 5%, glycerin 5 - 8%, butylene glycol 2 - 4%, trehalose 1 - 3%; Active repair complex: centella asiatica extract 0.5 - 1.2%, swertia japonica extract 0.3 - 0.8%, dendrobium officinale stem extract 0.2 - 0.5%; Antioxidant synergistic components: abelmoschus moschatus extract 0.1 - 0.3%, paeonia suffruticosa root extract 0.05 - 0.15%; Thickening and stabilizing system: sodium hyaluronate 0.05 - 0.1%, xanthan gum 0.1 - 0.2%, hydroxyethyl cellulose 0.3 - 0.5%; Antiseptic and buffer system: ethylhexylglycerin 0.3 - 0.6%, octanoyl hydroxamic acid 0.1 - 0.2%, pH adjusted to 5.5 - 6.0; The carrier system uses a silk membrane cloth modified with carboxymethyl chitosan, with a pore size of 10 - 50 μm, a thickness of 0.1 - 0.15 mm, and a loading capacity of ≥ 25 g / m².

2. The centella asiatica soothing facial mask according to claim 1, characterized in that: The centella asiatica extract (0.8 - 1.2%) contains ≥ 40% asiaticoside and ≥ 5% asiatic acid.

3. The centella asiatica moisturizing facial mask according to claim 1, wherein: The molar ratio of swertiamarin to asiaticoside in the swertia japonica extract is 1:

3.

4. The centella asiatica moisturizing facial mask according to claim 1, characterized in that: The dendrobium officinale stem extract (0.3 - 0.5%) contains ≥ 50% polysaccharides.