Crystal oscillation system of vacuum evaporator

Through the dual-stage rotary nesting structure and a precision-designed crystal oscillator system, the problems of easy damage to the crystal oscillator and coating uniformity are solved, and high-precision film thickness monitoring and uniformity control are achieved, which significantly extends the monitoring time and improves the reliability of the detection data.

CN120272864APending Publication Date: 2025-07-08SUZHOU YOULUN VACUUM EQUIP TECH CO LTD

Patent Information

Application Number
CN202510715085.X
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-05-30
Publication Date
2025-07-08

AI Technical Summary

Technical Problem

The crystal oscillator of the existing vacuum evaporation equipment is easily damaged, resulting in excessive thickness of the coating, affecting production continuity, and the rotary monitoring device has problems such as insufficient rotational positioning accuracy and difficult to control the uniformity of the coating.

Method used

The crystal oscillator system adopts a dual-stage rotary nested structure, and the first rotating mechanism drives the vehicle rotation, and the second rotating member independently controls the rotation of the crystal oscillator to form a composite motion trajectory. Combined with the precisely designed probe cap and servo motor drive, the positioning accuracy of ±0.02° and the programmatic rotation of multiple crystal oscillators are achieved, and the steam flow field distribution is optimized.

Benefits of technology

The coating monitoring time is significantly extended, the coating uniformity control accuracy is improved to 98.5%, and the correlation coefficient between the film thickness detection data and the substrate deposition rate is improved to 0.96, ensuring high-precision film thickness control.

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Patent Text Reader

Abstract

The crystal oscillation system of the vacuum evaporator comprises a first rotating mechanism, a two-stage rotating nested structure is adopted, a second rotating piece independently controls a crystal oscillation piece mechanism to rotate while the first rotating mechanism drives a supporting assembly to achieve revolution of a carrier, and a composite motion trail is formed; a plurality of crystal oscillation sheets can be periodically cut into steam flow for time-sharing measurement, so that the monitoring time of single coating operation is obviously prolonged by 5-8 times; the precisely designed probe cap is matched with the middle rotating shaft driven by the servo motor, so that the positioning precision of + / -0.02 degrees can be realized; a plurality of crystal oscillation sheets arranged in a distributed mode can be started in turn in a programmable mode, so that the coating uniformity control precision is improved to 98.5% or above; a crystal oscillator monitoring point is arranged in a central through hole area of the carrier, and the correlation coefficient of detection data and the actual deposition rate of the substrate is improved to 0.96 from 0.82 of a traditional side arrangement mode by optimizing distribution of a steam flow field, so that the film thickness control reliability is greatly improved.
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Description

Technical Field

[0001] The present invention relates to the technical field of vacuum evaporation machines, and more specifically, to a crystal oscillator system of a vacuum evaporation machine. Background Art

[0002] With the rapid development of microelectronics and optical coating technologies, the vacuum evaporation process has put forward higher requirements for the monitoring accuracy of film thickness. Most traditional vacuum evaporation equipment adopts a fixed crystal oscillator chip monitoring system. The crystal oscillator chip is easily exposed to the vapor flow of the evaporation source for a long time, which may lead to the failure of the coating due to excessive thickness and requires frequent breaking of the vacuum for replacement, seriously affecting the production continuity. Although the existing rotary monitoring devices can extend the service life of the crystal oscillator chip, there are generally problems such as insufficient rotary positioning accuracy and the installation position being too deviated from the plating pot due to the position of the carrier, resulting in a deviation between the measured film thickness value and the actual deposition value. Especially when coating large-area substrates, the existing single-point monitoring method is difficult to accurately reflect the coating uniformity, severely restricting the preparation quality of high-precision functional thin films.

[0003] In the prior art, for example, CN218465922U discloses an evaporation machine for extending the service life of a crystal oscillator chip. A plurality of the shielding parts of the evaporation machine for extending the service life of a crystal oscillator chip are uniformly arranged around the rotation axis of the shielding plate, and the hollow part is arranged between adjacent shielding parts; a hollow channel is provided in the hollow part; both the hollow channel and the plane swept by the rotation of the shielding part are blocked between the evaporation source and the crystal oscillator chip, solving the problem of deviation in the position relative to the plating pot. CN213812124U provides a probe structure on the top of the chamber of a vacuum evaporation machine, which includes: a cylinder, a coupling, a second hollow sleeve, an electrode fixing part, a probe crystal oscillator chip fixing part, and a cap from top to bottom. The coupling is fixed to the cylinder and the first rod body. A first hollow sleeve is sleeved outside the coupling. The upper end of the first hollow sleeve is fixed to the shell of the cylinder, and the lower end is fixed to the second hollow sleeve. The electrode fixing part is fixed to the lower end of the second hollow sleeve. The probe crystal oscillator chip fixing part is fixed to the lower part of the first rod body. 6 probes and crystal oscillator chips are evenly distributed and fixed in the probe crystal oscillator chip fixing part. The cap is sleeved outside the probe crystal oscillator chip fixing part and is connected and fixed to the electrode fixing part. A first through hole is provided at the bottom of the cap. Each time the cylinder rotates 60°, it drives the coupling, the first rod body, and the probe crystal oscillator chip fixing part to rotate synchronously by 60°, so that the replacement of a probe and the crystal oscillator chip corresponds to the position of the first through hole of the cap, solving the rotation problem. However, how to effectively combine the two is a problem that needs to be solved at present.

[0004] Therefore, there is an urgent need for a crystal oscillator system that can detect the coating thickness with high precision. Summary of the Invention

[0005] In view of this, in order to solve the above problems, the present invention proposes a crystal oscillator system of a vacuum evaporation machine, comprising a first rotating mechanism 100, the lower part of the first rotating mechanism 100 is connected to a support assembly, the upper support ring 107 is connected to the lower support ring 108 through a support connection assembly, the lower support ring 108 is used to receive a carrier 109 to be coated, the internal cavity of the first rotating mechanism 100 is sleeved with a second rotating member 200, the rotating shaft of the second rotating member 200 is connected to an intermediate rotating shaft 220, the bottom end of the intermediate rotating shaft 220 is connected to a crystal oscillator mechanism 230, the coating thickness of the vacuum evaporation machine in the current state is detected by the coating amount at the crystal oscillator 235 of the crystal oscillator mechanism 230, a double-stage rotating nested structure is adopted, and the first rotating mechanism 100 drives the support assembly to realize the revolution of the carrier 109 At the same time, the second rotating member 200 independently controls the rotation of the crystal oscillator mechanism 230 to form a composite motion trajectory, so that multiple crystal oscillators 235 can periodically cut into the steam flow for time-sharing measurement, significantly extending the monitoring time of a single coating operation by 5-8 times; the precisely designed probe cap 236 cooperates with the intermediate rotating shaft 220 driven by the servo motor to achieve a positioning accuracy of ±0.02°, ensuring that the alignment error between the crystal oscillator 235 and the second through hole 237 is less than 50μm; the distributed arrangement of multiple crystal oscillators 235 can be programmably activated in turn, so that the coating uniformity control accuracy is improved to more than 98.5%; the crystal oscillator monitoring point is placed in the central through hole area of ​​the carrier 109, and by optimizing the steam flow field distribution, the correlation coefficient between the detection data and the actual deposition rate of the substrate is increased from 0.82 of the traditional side-mounted type to 0.96, greatly improving the reliability of film thickness control.

[0006] A crystal oscillator system of a vacuum evaporation coater, comprising a first rotating mechanism 100. The upper part of the first rotating mechanism 100 passes through the housing of the vacuum evaporation coater and is connected to an external driver. The lower part of the first rotating mechanism 100 is connected to a support assembly. The support assembly includes an upper support ring 107 and a lower support ring 108. The upper support ring 107 is connected to the lower support ring 108 through a support connection assembly. The lower support ring 108 is used to support a carrier 109 to be coated. It is characterized in that a second rotating member 200 is sleeved in the inner cavity of the first rotating mechanism 100, and there is no interference between the inner cavity of the first rotating mechanism 100 and the second rotating member 200. A middle rotating shaft 220 is connected to the rotating shaft of the second rotating member 200. A fourth through hole 110 is provided in the middle of the carrier 109 to be coated. The bottom end of the middle rotating shaft 220 is connected to a crystal oscillator plate mechanism 230. The crystal oscillator plate mechanism 230 is placed in the cavity formed by the fourth through hole 110 and does not interfere with the fourth through hole 110. A plurality of crystal oscillator plates 235 are provided on the crystal oscillator plate mechanism 230. A probe cap 236 is provided at the lower part of the crystal oscillator plate mechanism 230. A second through hole 237 is provided at the probe cap 236. By rotating the crystal oscillator plate mechanism 230 through the first rotating member to drive the crystal oscillator plates 235 to rotate, so that the position of one of the crystal oscillator plates 235 completely matches the position of the second through hole 237, and the coating thickness of the vacuum evaporation coater in the current state is detected by the coating amount at this crystal oscillator plate 235.

[0007] In some embodiments, the crystal oscillator plate mechanism 230 includes a crystal oscillator plate fixing seat 231 and a crystal oscillator three-jaw fixing plate 234. The main body of the crystal oscillator plate fixing seat 231 is provided with first through holes 232 corresponding to the plurality of crystal oscillator plates 235 one by one. The first through holes 232 serve as channels for detecting film materials. A fixing seat connecting rod 233 is provided in the middle of the upper surface of the crystal oscillator plate fixing seat 231 for locking with the middle rotating shaft 220, so that the rotation of the middle rotating shaft 220 drives the crystal oscillator plate fixing seat 231 to rotate; a crystal oscillator three-jaw fixing plate 234 is also sleeved at the fixing seat connecting rod 233 and is located above the crystal oscillator plate fixing seat 231. The crystal oscillator three-jaw fixing plate 234 is used to fix the plurality of crystal oscillator plates 235.

[0008] Furthermore, the second through hole 237 is a flared mouth with a narrow upper part and a wide lower part, which can better collect film materials and improve the detection efficiency.

[0009] In some embodiments, a water-cooled shaft 240 is connected to the upper part of the probe cap 236. A water-cooled jacket 242 is provided in the inner ring of the water-cooled shaft 240. The water-cooled jacket 242 is an annular hollow chamber. The water inlet of the water-cooled jacket 242 is connected to a water inlet pipe, and the water outlet of the water-cooled jacket 242 is connected to a water outlet pipe. The water inlet and the water outlet are symmetrically arranged. The input end of the water inlet pipe is connected to cooling water. The cooling water enters the water-cooled jacket 242 from the water inlet pipe and is discharged from the water outlet pipe, forming a circulating cooling water path to cool the crystal oscillator plate mechanism 230, thereby forming a directional thermal radiation shield for the crystal oscillator plate mechanism 230.

[0010] Furthermore, a probe outer cylinder 250 is sleeved outside the water-cooled shaft 240. The bottom of the probe outer cylinder 250 is flush with the probe cap 236. The probe outer cylinder 250 extends upward to be connected to a third rotating mechanism 260. The lower part of the probe outer cylinder 250 is connected to a light control structure 261, which is used to detect the refractive index or light transmittance of the coating on the light control structure 261. The third rotating mechanism 260 is used to rotate the light control structure 261.

[0011] Furthermore, both the water inlet pipe and the water outlet pipe pass through the interlayer and are connected to an external transfer device 245. The external transfer device 245 is sleeved with the probe outer cylinder 250.

[0012] Furthermore, a third through hole 241 is provided at the axis center of the water-cooled shaft 240 for sleeving with an intermediate rotating shaft 220. A first accommodation chamber is provided at the position of the water-cooled shaft 240 close to the crystal oscillator plate mechanism 230 for accommodating the crystal oscillator plate mechanism 230 and the probe cap 236.

[0013] Furthermore, the water-cooled jacket 242 is located above the crystal oscillator plate mechanism 230, and the cooling effect is better.

[0014] Furthermore, a protective sleeve 246 for the intermediate rotating shaft is locked at the top of the water-cooled shaft 240. The protective sleeve 246 for the intermediate rotating shaft is sleeved with the intermediate rotating shaft 220 without interference, and the protective sleeve 246 for the intermediate rotating shaft is locked to the bottom of the external transfer device 245.

[0015] Furthermore, there is an interlayer between the protective sleeve 246 for the intermediate rotating shaft and the probe outer cylinder 250. A plurality of first partitions 247 are longitudinally spaced at intervals at the interlayer. The first partitions 247 are sleeved with the intermediate rotating shaft 220 without interference, and are used to prevent the radial displacement of the intermediate rotating shaft 220.

[0016] Further, an oscillator detection device mounting block 248 is provided at the upper part of the oscillator three-jaw fixing plate 234. A sixth through hole 249 is provided at the oscillator detection device mounting block 248. The position of the sixth through hole 249 matches the position of the first through hole 232. A detection end of the oscillator detection device is connected to the sixth through hole 249. An external connection end of the oscillator detection device passes through the sandwich between the intermediate rotating shaft protective sleeve 246 and the intermediate rotating shaft 220 and is connected to an external oscillator detection mechanism.

[0017] In some embodiments, the second rotating member 200 is a rotating cylinder. A rotating shaft of the second rotating member 200 is connected to an input end of a clamping type coupling 210. An output end of the clamping type coupling 210 is connected to an intermediate probe transmission shaft. The intermediate transmission shaft is connected to a first bearing fixing block 211 through a first bearing 212. An outer ring of the first bearing 212 is clamped to the bearing fixing block. An inner ring of the first bearing 212 is clamped to a connection nut of the intermediate transmission shaft. The transmission shaft drives the first bearing 212 to rotate within the outer ring of the bearing fixing block, so that the intermediate transmission shaft will not move up and down through the first bearing 212.

[0018] Further, a top dust cover 270 is provided at the connection between the second rotating member 200 and the intermediate rotating shaft 220. The top dust cover 270 wraps the connection. The lower part of the top dust cover 270 extends downward to a support base 271. The top of the top dust cover 270 is locked to the housing of the second rotating member 200 through a first connecting plate 272.

[0019] Further, the bottom of the support base 271 is connected to the top large flange 273. The top large flange 273 is connected to the top of the evaporation machine for connecting the entire rotating device to the top of the evaporation machine.

[0020] In some embodiments, the first rotating mechanism 100 includes a magnetic fluid 101 and a first rotating shaft 103, the first rotating shaft 103 is a hollow chamber and is sleeved with the second rotating member 200 without interfering, the first rotating shaft 103 is connected with a rotating gear 104, the middle part of the magnetic fluid 101 is sleeved with the shaft of the magnetic fluid 101, the upper end of the shaft of the magnetic fluid 101 is placed outside the shell of the vacuum evaporation machine, and the lower end of the shaft of the magnetic fluid 101 is placed in the internal chamber, the rotating gear 104 is meshed with the second gear 102 connected to the lower end of the shaft of the magnetic fluid 101, and the upper end of the shaft of the magnetic fluid 101 is provided with a second gear 102. The second synchronous wheel 111 is connected to the synchronous wheel on the external driver through a synchronous belt. The motor drives the synchronous wheel to rotate, which in turn drives the second synchronous wheel 111 to rotate. The second synchronous wheel 111 drives the second gear 102 to rotate, so that the rotating gear 104 rotates and drives the first rotating shaft 103 to rotate, forming a multi-stage transmission system to ensure the smooth rotation of the first rotating shaft 103. The shaft of the magnetic fluid 101 is combined with the synchronous wheel multi-stage transmission to ensure vacuum sealing while transmitting stable power, solving the problem that the connection between the traditional first rotating shaft 103 and the drive system is prone to leakage or power loss due to insufficient vacuum sealing.

[0021] Beneficial effects of the present invention: The present invention proposes a crystal oscillator system for a vacuum evaporation machine, comprising a first rotating mechanism 100, the lower part of the first rotating mechanism 100 is connected to a support assembly, the upper support ring 107 is connected to the lower support ring 108 through a support connection assembly, the lower support ring 108 is used to receive a carrier 109 to be coated, the inner cavity of the first rotating mechanism 100 is sleeved with a second rotating member 200, the rotating shaft of the second rotating member 200 is connected to an intermediate rotating shaft 220, the bottom end of the intermediate rotating shaft 220 is connected to a crystal oscillator mechanism 230, the coating thickness of the vacuum evaporation machine in the current state is detected by the coating amount at the crystal oscillator 235 of the crystal oscillator mechanism 230, a double-stage rotating nested structure is adopted, the first rotating mechanism 100 drives the support assembly to realize the revolution of the carrier 109 at the same time, The second rotating member 200 independently controls the rotation of the crystal oscillator mechanism 230 to form a composite motion trajectory, so that multiple crystal oscillators 235 can periodically cut into the steam flow for time-sharing measurement, significantly extending the monitoring time of a single coating operation by 5-8 times; the precisely designed probe cap 236 cooperates with the intermediate rotating shaft 220 driven by the servo motor to achieve a positioning accuracy of ±0.02°, ensuring that the alignment error between the crystal oscillator 235 and the second through hole 237 is less than 50μm; the multiple crystal oscillators 235 arranged in a distributed manner can be programmably activated in turn, so that the coating uniformity control accuracy is improved to more than 98.5%; the crystal oscillator monitoring point is placed in the central through hole area of ​​the carrier 109, and by optimizing the steam flow field distribution, the correlation coefficient between the detection data and the actual deposition rate of the substrate is increased from 0.82 of the traditional side-mounted type to 0.96, greatly improving the reliability of film thickness control. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 It is an assembly diagram of the crystal oscillator system of the vacuum evaporation machine of the present invention.

[0023] Figure 2 The cross-sectional state of the crystal oscillator system of the vacuum evaporation machine of the present invention Figure 1 .

[0024] Figure 3 The cross-sectional state of the crystal oscillator system of the vacuum evaporation machine of the present invention Figure 2 .

[0025] Figure 4 The cross-sectional state of the crystal oscillator system of the vacuum evaporation machine of the present invention Figure 3 .

[0026] Figure 5 The cross-sectional state of the crystal oscillator system of the vacuum evaporation machine of the present invention Figure 4 .

[0027] Main component symbols

[0028] The first rotating mechanism 100, the magnetic fluid 101, the second gear 102, the first rotating shaft 103, the rotating gear 104, the upper support ring 107, the lower support ring 108, the carrier 109, the fourth through hole 110, the second synchronous wheel 111, the second rotating member 200, the clamping coupling 210, the first bearing fixing block 211, the first bearing 212, the intermediate rotating shaft 220, the crystal oscillator mechanism 230, the crystal oscillator fixing seat 231, the first through hole 232, the fixing seat connecting rod 233, the crystal oscillator Three-claw fixing plate 234, crystal oscillator plate 235, probe cover cap 236, second through hole 237, water-cooled shaft 240, third through hole 241, water-cooled jacket 242, external adapter 245, probe outer tube 250, third rotating mechanism 260, light control structure 261, intermediate rotating shaft protection cover 246, first partition 247, crystal oscillator detection device mounting block 248, sixth through hole 249, top dust cover 270, support base 271, first connecting plate 272, top large flange 273.

[0029] The following specific implementation manner will further illustrate the present invention in conjunction with the above-mentioned drawings. DETAILED DESCRIPTION Example

[0030] like Figure 1-2As shown in the figure, a crystal oscillator system of a vacuum evaporation coater includes a first rotating mechanism 100. The upper part of the first rotating mechanism 100 passes through the housing of the vacuum evaporation coater and is connected to an external driver. The lower part of the first rotating mechanism 100 is connected to a support assembly. The support assembly includes an upper support ring 107 and a lower support ring 108. The upper support ring 107 is connected to the lower support ring 108 through a support connection assembly. The lower support ring 108 is used to support the carrier 109 to be coated. A second rotating member 200 is sleeved in the inner cavity of the first rotating mechanism 100, and there is no interference between the inner cavity of the first rotating mechanism 100 and the second rotating member 200. A middle rotating shaft 220 is connected to the rotating shaft of the second rotating member 200. A fourth through hole 110 is provided in the middle of the carrier 109 to be coated. The bottom end of the middle rotating shaft 220 is connected to a crystal oscillator mechanism 230. The crystal oscillator mechanism 230 is placed in the cavity formed by the fourth through hole 110 and does not interfere with the fourth through hole 110. A plurality of crystal oscillator chips 235 are provided on the crystal oscillator mechanism 230. A probe cap 236 is provided at the lower part of the crystal oscillator mechanism 230. A second through hole 237 is provided at the probe cap 236. By rotating the crystal oscillator mechanism 230 through the first rotating member to drive the crystal oscillator chips 235 to rotate, the position of one of the crystal oscillator chips 235 is completely matched with the position of the second through hole 237. The coating thickness of the vacuum evaporation coater in the current state is detected by the coating amount at this crystal oscillator chip 235.

[0031] As Figure 3As shown, the crystal oscillator mechanism 230 includes a crystal oscillator fixing seat 231 and a crystal oscillator three-claw fixing plate 234. The body of the crystal oscillator fixing seat 231 is provided with a first through hole 232 corresponding to a plurality of crystal oscillators 235. A fixing seat connecting rod 233 is provided in the middle of the upper surface of the crystal oscillator fixing seat 231 for locking with the intermediate rotating shaft 220 so that the rotation of the intermediate rotating shaft 220 drives the crystal oscillator fixing seat 231 to rotate; the fixing seat connecting rod 233 is also sleeved with a crystal oscillator three-claw fixing plate 234 and is located at the crystal oscillator fixing seat 231. The upper part, the crystal three-claw fixing plate 234 is used to fix multiple crystal oscillators 235, the second through hole 237 is a trumpet mouth that is narrow at the top and wide at the bottom, the upper part of the probe cover 236 is connected to a water-cooled shaft 240, the inner ring of the water-cooled shaft 240 is provided with a water-cooled jacket 242, the water-cooled jacket 242 is an annular hollow chamber, the water inlet of the water-cooled jacket 242 is connected to the water inlet pipe, the water outlet of the water-cooled jacket 242 is connected to the water outlet pipe, the water inlet and the water outlet are symmetrically arranged, the input end of the water inlet pipe is connected to cooling water, and the cooling water enters the water from the water inlet pipe. The cooling jacket 242 is discharged from the water outlet pipe to form a circulating cooling water circuit to cool the crystal oscillator mechanism 230, thereby forming a directional thermal radiation shielding for the crystal oscillator mechanism 230. The outer shell of the water-cooled shaft 240 is connected with a probe outer tube 250. The bottom of the probe outer tube 250 is flush with the probe cap 236. The probe outer tube 250 extends upward to be connected to the third rotating mechanism 260. The lower part of the probe outer tube 250 is connected to the light control structure 261 for detecting the refractive index or transmittance of the coating on the light control structure 261. The third The rotating mechanism 260 is used to rotate the light control structure 261. The water inlet pipe and the water outlet pipe are both connected to the external adapter device 245 through the interlayer. The external adapter device 245 is sleeved with the probe outer tube 250. The center of the water-cooled shaft 240 is provided with a third through hole 241 for sleeved with the intermediate rotating shaft 220. The water-cooled shaft 240 is provided with a first accommodating chamber near the crystal oscillator mechanism 230 for accommodating the crystal oscillator mechanism 230 and the probe cover cap 236. The water-cooling jacket 242 is located on the upper part of the crystal oscillator mechanism 230 for better cooling effect., a middle rotating shaft protective sleeve 246 is locked at the top of the water-cooled shaft 240. The middle rotating shaft protective sleeve 246 is sleeved on the middle rotating shaft 220 without interference. The bottom of the middle rotating shaft protective sleeve 246 is locked to the bottom of an external adapter device 245. There is a sandwich layer between the middle rotating shaft protective sleeve 246 and the probe outer cylinder 250. A plurality of first partitions 247 are longitudinally and spaced apart at the sandwich layer. The first partitions 247 are sleeved on the middle rotating shaft 220 without interference, and are used to prevent the radial displacement of the middle rotating shaft 220. An oscillator detection device mounting block 248 is provided on the upper part of the oscillator three-jaw fixing disk 234. A sixth through hole 249 is provided at the oscillator detection device mounting block 248. The position of the sixth through hole 249 matches the position of the first through hole 232. The detection end of the oscillator detection device is connected at the sixth through hole 249. The external connection end of the oscillator detection device passes through the sandwich layer between the middle rotating shaft protective sleeve 246 and the middle rotating shaft 220 and is connected to an external oscillator detection mechanism.

[0032] As Figure 2 and Figure 4 shown, the second rotating member 200 is a rotating cylinder. The rotating shaft of the second rotating member 200 is connected to the input end of a clamping type coupling 210. The output end of the clamping type coupling 210 is connected to a probe intermediate transmission shaft. The intermediate transmission shaft is connected to a first bearing fixing block 211 through a first bearing 212. The outer ring of the first bearing 212 is clamped to the bearing fixing block. The inner ring of the first bearing 212 is clamped to the connection nut of the intermediate transmission shaft. The transmission shaft drives the first bearing 212 to rotate within the outer ring of the bearing fixing block. Through the first bearing 212, the intermediate transmission shaft will not move up and down. A top dust cover 270 is provided at the connection between the second rotating member 200 and the middle rotating shaft 220. The top dust cover 270 wraps the connection. The lower part of the top dust cover 270 extends downward to a support base 271. The top of the top dust cover 270 is locked to the housing of the second rotating member 200 through a first connecting plate 272. The bottom of the support base 271 is connected to the top large flange 273. The top large flange 273 is connected to the top of the evaporation machine, and is used to connect the entire rotating device to the top of the evaporation machine.

[0033] As Figure 5As shown, the first rotating mechanism 100 includes a magnetic fluid 101 and a first rotating shaft 103, the first rotating shaft 103 is a hollow chamber and is sleeved with the second rotating member 200 without interfering, the first rotating shaft 103 is connected with a rotating gear 104, the middle part of the magnetic fluid 101 is sleeved with the shaft of the magnetic fluid 101, the upper end of the shaft of the magnetic fluid 101 is placed outside the shell of the vacuum evaporation machine, and the lower end of the shaft of the magnetic fluid 101 is placed in the internal chamber, the rotating gear 104 is meshed with a second gear 102 connected to the lower end of the shaft of the magnetic fluid 101, and the upper end of the shaft of the magnetic fluid 101 is provided with a second synchronous Wheel 111, the second synchronous wheel 111 is connected to the synchronous wheel on the external driver through a synchronous belt, and the motor drives the synchronous wheel to rotate, which in turn drives the second synchronous wheel 111 to rotate, and the second synchronous wheel 111 drives the second gear 102 to rotate, so that the rotating gear 104 rotates and drives the first rotating shaft 103 to rotate, forming a multi-stage transmission system to ensure the smooth rotation of the first rotating shaft 103. The axis of the magnetic fluid 101 is combined with the synchronous wheel multi-stage transmission to ensure vacuum sealing while transmitting stable power, which solves the problem that the connection between the traditional first rotating shaft 103 and the drive system is prone to leakage or power loss due to insufficient vacuum sealing.

[0034] Beneficial effects of the present invention: The present invention proposes a crystal oscillator system for a vacuum evaporation machine, comprising a first rotating mechanism 100, the lower part of the first rotating mechanism 100 is connected to a support assembly, the upper support ring 107 is connected to the lower support ring 108 through a support connection assembly, the lower support ring 108 is used to receive a carrier 109 to be coated, the inner cavity of the first rotating mechanism 100 is sleeved with a second rotating member 200, the rotating shaft of the second rotating member 200 is connected to an intermediate rotating shaft 220, the bottom end of the intermediate rotating shaft 220 is connected to a crystal oscillator mechanism 230, the coating thickness of the vacuum evaporation machine in the current state is detected by the coating amount at the crystal oscillator 235 of the crystal oscillator mechanism 230, a double-stage rotating nested structure is adopted, the first rotating mechanism 100 drives the support assembly to realize the revolution of the carrier 109 at the same time, The second rotating member 200 independently controls the rotation of the crystal oscillator mechanism 230 to form a composite motion trajectory, so that multiple crystal oscillators 235 can periodically cut into the steam flow for time-sharing measurement, significantly extending the monitoring time of a single coating operation by 5-8 times; the precisely designed probe cap 236 cooperates with the intermediate rotating shaft 220 driven by the servo motor to achieve a positioning accuracy of ±0.02°, ensuring that the alignment error between the crystal oscillator 235 and the second through hole 237 is less than 50μm; the multiple crystal oscillators 235 arranged in a distributed manner can be programmably activated in turn, so that the coating uniformity control accuracy is improved to more than 98.5%; the crystal oscillator monitoring point is placed in the central through hole area of ​​the carrier 109, and by optimizing the steam flow field distribution, the correlation coefficient between the detection data and the actual deposition rate of the substrate is increased from 0.82 of the traditional side-mounted type to 0.96, greatly improving the reliability of film thickness control.

[0035] The above-described embodiments merely represent several implementation manners of the present invention. The description thereof is relatively specific and detailed, but it should not be construed as a limitation to the scope of the patent of the present invention. It should be noted that for those of ordinary skill in the art, without departing from the concept of the present invention, several variations and improvements can still be made, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the patent of the present invention shall be subject to the appended claims.

Claims

1. A crystal oscillator system of a vacuum evaporation machine, comprising a first rotating mechanism (100), an upper part of the first rotating mechanism (100) passes through a housing of the vacuum evaporation machine and is connected to an external driver, a lower part of the first rotating mechanism (100) is connected to a support assembly, the support assembly includes an upper support ring (107) and a lower support ring (108), the upper support ring (107) is connected to the lower support ring (108) through a support connection assembly, and the lower support ring (108) is used for supporting a carrier (109) to be coated, characterized in that, The inner cavity of the first rotating mechanism (100) is sleeved with a second rotating member (200). There is no interference between the inner cavity of the first rotating mechanism (100) and the second rotating member (200). The rotating shaft of the second rotating member (200) is connected to an intermediate rotating shaft (220). A fourth through hole (110) is provided in the exact middle of the carrier (109) to be coated. The bottom end of the intermediate rotating shaft (220) is connected to a crystal oscillator mechanism (230). The crystal oscillator mechanism (230) is placed in the cavity formed by the fourth through hole (110) and does not interfere with the fourth through hole (110). A plurality of crystal oscillators (235) are provided on the crystal oscillator mechanism (230). A probe cap (236) is provided at the lower part of the crystal oscillator mechanism (230). A second through hole (237) is provided at the probe cap (236). By rotating the crystal oscillator mechanism (230) with the first rotating member to drive the crystal oscillators (235) to rotate, the position of one of the crystal oscillators (235) is made to exactly match that of the second through hole (237). The coating thickness of the vacuum evaporation machine in the current state is detected by the coating amount at this crystal oscillator (235).

2. The crystal oscillator system of the vacuum evaporation coater according to claim 1, wherein: The crystal oscillator mechanism (230) includes a crystal oscillator fixing base (231) and a crystal oscillator three-jaw fixing disc (234). The main body of the crystal oscillator fixing base (231) is provided with first through holes (232) corresponding one by one to a plurality of crystal oscillators (235). A fixing base connecting rod (233) is provided in the middle of the upper surface of the crystal oscillator fixing base (231) for locking with the intermediate rotating shaft (220), so that the rotation of the intermediate rotating shaft (220) drives the crystal oscillator fixing base (231) to rotate; a crystal oscillator three-jaw fixing disc (234) is also sleeved at the fixing base connecting rod (233) and is located above the crystal oscillator fixing base (231). The crystal oscillator three-jaw fixing disc (234) is used to fix a plurality of crystal oscillators (235).

3. The crystal oscillator system of the vacuum evaporation coater according to claim 1, wherein: The upper part of the probe cap (236) is connected to a water-cooling shaft (240). A water-cooling jacket (242) is provided in the inner ring of the water-cooling shaft (240). The water-cooling jacket (242) is an annular hollow chamber. The water inlet of the water-cooling jacket (242) is connected to a water inlet pipe, and the water outlet of the water-cooling jacket (242) is connected to a water outlet pipe. The water inlet and the water outlet are symmetrically arranged. Cooling water is connected to the input end of the water inlet pipe. The cooling water enters the water-cooling jacket (242) from the water inlet pipe and is discharged from the water outlet pipe, forming a circulating cooling water path to cool the crystal oscillator mechanism (230), forming a directional thermal radiation shield for the crystal oscillator mechanism (230).

4. The crystal oscillator system of the vacuum evaporation coater according to claim 3, wherein: The outside of the water-cooling shaft (240) is sleeved with a probe outer cylinder (250). The bottom of the probe outer cylinder (250) is flush with the probe cap (236). The probe outer cylinder (250) extends upward to be connected to a third rotating mechanism (260). The lower part of the probe outer cylinder (250) is connected to a light control structure (261) for detecting the refractive index or light transmittance of the coating on the light control structure (261). The third rotating mechanism (260) is used to rotate the light control structure (261).

5. The crystal oscillator system of the vacuum evaporation coater according to claim 3, characterized in that: The water inlet pipe and the water outlet pipe are both connected to the external adapter device (245) through the interlayer, and the external adapter device (245) is sleeved with the probe outer tube (250).

6. The crystal oscillator system of the vacuum evaporation coater according to claim 3, characterized in that: The water-cooled shaft (240) is provided with a third through hole (241) at the center thereof for sleeve connection with the intermediate rotating shaft (220); the water-cooled shaft (240) is provided with a first accommodating chamber near the crystal oscillator mechanism (230) for accommodating the crystal oscillator mechanism (230) and the probe cover cap (236).

7. The crystal oscillator system of the vacuum evaporation coater according to claim 6, characterized in that: The top of the water-cooled shaft (240) is locked with an intermediate rotating shaft protective sleeve (246), the intermediate rotating shaft protective sleeve (246) is sleeved with the intermediate rotating shaft (220) without interfering with each other, and the intermediate rotating shaft protective sleeve (246) is locked with the bottom of the external adapter device (245).

8. The crystal oscillator system of the vacuum evaporation coater according to claim 7, characterized in that: An interlayer is provided between the intermediate rotating shaft protection sleeve (246) and the probe outer tube (250), and a plurality of first partitions (247) are provided at longitudinal intervals at the interlayer. The first partitions (247) are sleeved with the intermediate rotating shaft (220) but do not interfere with each other, so as to prevent radial displacement of the intermediate rotating shaft (220).

9. The crystal oscillator system of the vacuum evaporation coater according to claim 2, characterized in that: A crystal oscillator detection device mounting block (248) is provided on the upper part of the crystal oscillator three-claw fixing plate (234), and a sixth through hole (249) is provided at the crystal oscillator detection device mounting block (248). The position of the sixth through hole (249) matches the position of the first through hole (232), and the sixth through hole (249) is connected to the detection end of the crystal oscillator detection device. The external connection end of the crystal oscillator detection device passes through the interlayer between the intermediate rotating shaft protection sleeve (246) and the intermediate rotating shaft (220) and is connected to the external crystal oscillator detection mechanism.

10. The crystal oscillator system of the vacuum evaporation coater according to claim 1, wherein: The second rotating member (200) is a rotating cylinder. The rotating shaft of the second rotating member (200) is connected to the input end of the clamping coupling (210). The output end of the clamping coupling (210) is connected to the intermediate transmission shaft of the probe. The intermediate transmission shaft is connected to the first bearing fixing block (211) through the first bearing (212). The outer ring of the first bearing (212) is clamped with the bearing fixing block. The inner ring of the first bearing (212) is clamped with the connecting nut of the intermediate transmission shaft. The transmission shaft drives the first bearing (212) to rotate in the outer ring of the bearing fixing block. The first bearing (212) prevents the intermediate transmission shaft from moving up and down.

Citation Information

Patent Citations

  • Evaporator capable of prolonging service life of crystal oscillator

    CN218465922U

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