Cleaning device for crystal growing furnace

Abstract

The embodiment of the invention provides a cleaning device for a crystal growing furnace. The cleaning device comprises an isolation hood, a connecting frame, a gas suction head, a gas outlet pipeline and a waste gas treatment assembly, the isolation hood is provided with a connecting port, the connecting port of the isolation hood is connected with the frame body of the connecting frame, the suction head is telescopically arranged relative to the isolation hood, and the suction head is connected with the waste gas treatment assembly through a gas outlet pipeline; the connecting frame is detachably mounted on the crystal growing furnace, and a frame body of the connecting frame surrounds an observation opening of the crystal growing furnace and forms a closed structure; and the air suction head can enter the furnace body of the crystal growing furnace through the observation opening.

Description

Technical Field

[0001] This specification relates to the technical field of crystal preparation, and particularly relates to a cleaning device for a crystal growth furnace. Background Art

[0002] During the process of crystal growth, solid particulate matter and waste gas are generated. The waste gas will pollute the environment and endanger the personal safety of the operator. Taking the growth of silicon carbide crystals as an example, the waste gas generated during the crystal growth process includes carbon monoxide (CO), and carbon monoxide can cause carbon monoxide poisoning of the operator and even cause an explosion, with relatively great harm.

[0003] Therefore, it is necessary to provide a cleaning device for a crystal growth furnace to effectively clean the solid particulate matter attached inside the crystal growth furnace while avoiding the leakage of waste gas. Summary of the Invention

[0004] One embodiment of this specification provides a cleaning device for a crystal growth furnace. The cleaning device includes: an isolation cover, a connection frame, a suction head, an air outlet pipe, and a waste gas treatment component; the isolation cover has a connection port, the connection port of the isolation cover is connected to the frame body of the connection frame, the suction head is arranged relative to the isolation cover in a telescopic manner, and the suction head is connected to the waste gas treatment component through the air outlet pipe; the connection frame is detachably installed on the crystal growth furnace, and the frame body of the connection frame surrounds the observation port of the crystal growth furnace and forms a closed structure; the suction head can enter the furnace body of the crystal growth furnace through the observation port.

[0005] In some embodiments, the connection frame includes a magnetic member.

[0006] In some embodiments, the connection frame includes a sunk groove extending along the frame body, the number of magnetic members is multiple, and the multiple magnetic members are arranged in the sunk groove at intervals along the extending direction of the sunk groove; and / or activated carbon is further provided in the sunk groove.

[0007] In some embodiments, the suction head is provided with bristles.

[0008] In some embodiments, the cleaning device further includes a blowing head, an air inlet pipe, and an air source, the blowing head is arranged relative to the isolation cover in a telescopic manner, the blowing head is connected to the air source through the air inlet pipe, and the suction head can extend into the furnace body of the crystal growth furnace through the observation port.

[0009] In some embodiments, the cleaning device includes a first moving member and a first driving member. The suction head is detachably connected to the first moving member, and the first moving member is movably arranged on the inner wall of the furnace body; the first driving member is drivingly connected to the first moving member, and the first driving member drives the first moving member to move within the furnace wall; and / or, the cleaning device includes a second moving member and a second driving member. The blowing head is detachably connected to the second moving member, and the second moving member is movably arranged on the inner wall of the furnace body; the second driving member is drivingly connected to the second moving member, and the second driving member drives the second moving member to move on the furnace wall.

[0010] In some embodiments, the cleaning device further includes a first robotic arm, and the suction head is arranged on the first robotic arm; and / or, the cleaning device further includes a second robotic arm, and the blowing head is arranged on the second robotic arm.

[0011] In some embodiments, the exhaust gas treatment assembly includes an explosion-proof pump and a combustion chamber. The explosion-proof pump is connected to the combustion chamber through a pump body exhaust pipeline, and an air outlet pipeline connects the suction head and the explosion-proof pump.

[0012] In some embodiments, the gas source includes a compressor, and an intake pipeline connects the blowing head and the compressor; the cleaning device further includes a cooling mechanism, and the cooling mechanism is arranged between the combustion chamber and the compressor.

[0013] One embodiment of this specification provides a crystal growth system. The crystal growth system includes a crystal growth furnace and a cleaning device; an observation port is provided on the furnace body of the crystal growth furnace, and an observation window for closing the observation port is arranged at the observation port; the observation window is detachably connected to the furnace body. Description of the Drawings

[0014] This specification will be further described in the manner of exemplary embodiments, and these exemplary embodiments will be described in detail through the drawings. These embodiments are not restrictive. In these embodiments, the same numbers represent the same structures, where:

[0015] Figure 1 is a schematic structural diagram of a crystal growth system shown in some embodiments of this specification;

[0016] Figure 2 is a schematic structural diagram of a cleaning device shown in some embodiments of this specification;

[0017] Figure 3 is a schematic structural diagram of a connection frame shown in some embodiments of this specification;

[0018] Figure 4 is a schematic structural diagram of a cleaning device shown in some other embodiments of this specification;

[0019] Figure 5 is a schematic structural diagram of a crystal growth system shown in some other embodiments of this specification;

[0020] Figure 6 is a schematic structural diagram of a crystal growth system according to some embodiments of this specification;

[0021] Figure 7 is a schematic structural diagram of a cleaning device according to some embodiments of this specification;

[0022] Figure 8 is a schematic structural diagram of a cleaning device according to some embodiments of this specification;

[0023] Figure 9 is a schematic structural diagram of a cooling mechanism according to some embodiments of this specification.

[0024] In the figure, 100 is a crystal growth system, 110 is a crystal growth furnace, 111 is an observation port, 112 is an observation window, 113 is a furnace body, 120 is a cleaning device, 121 is an isolation cover, 121-1 is a connection port, 122 is a connection frame, 122-1 is a frame body, 122-2 is a sunk groove, 122-3 is a magnetic part, 122-4 is activated carbon, 123 is a suction head, 123-1 is a brush, 123-2 is a first moving part, 123-3 is a first robotic arm, 124 is an exhaust pipe, 125 is an exhaust gas treatment component, 125-1 is an explosion-proof pump, 125-2 is a combustion chamber, 125-3 is a pump body exhaust pipe, 125-4 is a combustion chamber exhaust pipe, 126 is a blowing head, 126-1 is a second moving part, 126-2 is a second robotic arm, 127 is an intake pipe, 128 is a gas source, 129 is a cooling mechanism, 129-1 is a cooling mechanism exhaust pipe, 129-2 is a water cooling device. Detailed implementation manners

[0025] In order to more clearly illustrate the technical solutions of the embodiments of this specification, the accompanying drawings required for the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings in the following description are only some examples or embodiments of this specification. For those of ordinary skill in the art, without creative efforts, this specification can also be applied to other similar scenarios based on these drawings. Unless obvious from the language context or otherwise stated, the same reference numerals in the figures represent the same structures or operations.

[0026] It should be understood that, for the convenience of describing this specification, the positional relationships indicated by terms such as "center", "upper surface", "lower surface", "upper", "lower", "top", "bottom", "inner", "outer", "axial", "radial", "outer periphery", "external", etc. are based on the positional relationships shown in the drawings, rather than indicating that the indicated devices, components or units must have specific positional relationships, and should not be construed as a limitation to this specification. However, if other words can achieve the same purpose, the said words can be replaced by other expressions.

[0027] An embodiment of this specification provides a cleaning device for a crystal growth furnace. After crystal growth is completed, there will be waste gas in the crystal growth furnace, and the waste gas can include solid particulate matter and gaseous pollutants. To clean the crystal growth furnace, the connection frame on the cleaning device can be used to surround the observation port of the crystal growth furnace with the frame body of the connection frame and install it on the crystal growth furnace, so that the isolation cover seals the observation port on the crystal growth furnace. While preventing waste gas leakage, the suction head can extend into the crystal growth furnace through the observation port and suck the waste gas to the waste gas treatment assembly, thereby achieving the purpose of cleaning the crystal growth furnace.

[0028] Figure 1 is a schematic structural diagram of a crystal growth system shown in some embodiments of this specification; Figure 2 is a schematic structural diagram of a cleaning device shown in some embodiments of this specification; Figure 3 is a schematic structural diagram of a connection frame shown in some embodiments of this specification; Figure 4 is a schematic structural diagram of a cleaning device shown in some other embodiments of this specification; Figure 5 is a schematic structural diagram of a crystal growth system shown in some other embodiments of this specification; Figure 6 is a schematic structural diagram of a crystal growth system shown in some other embodiments of this specification; Figure 7 is a schematic structural diagram of a cleaning device shown in some other embodiments of this specification; Figure 8 is a schematic structural diagram of a cleaning device shown in some other embodiments of this specification; Figure 9 is a schematic structural diagram of a cooling mechanism shown in some embodiments of this specification. The following will be combined with Figures 1-9 to explain in detail the setting method of the cleaning device involved in the embodiments of this specification. It should be noted that the following embodiments are only used to explain this specification and do not constitute a limitation to this specification.

[0029] In some embodiments, the cleaning device 120 may include an isolation cover 121, a connection frame 122, a suction head 123, an air outlet pipe 124, and a waste gas treatment assembly 125.

[0030] The isolation cover 121 refers to a device that can be used to isolate waste gas. The isolation cover 121 allows the waste gas in the crystal growth furnace 110 to directly enter the cleaning device 120 without directly diffusing into the external environment. In some embodiments, the material of the isolation cover 121 may include rigid materials such as metal, plastic, and ceramic. In some embodiments, the material of the isolation cover 121 may be flexible materials such as rubber, silicone, polyurethane, and polyurethane elastomer. When the isolation cover 121 is made of a soft material, the suction head 123 and the blowing head 126 can be manually operated, which is more flexible. In some embodiments, the shape of the isolation cover 121 may be trumpet-shaped, rectangular, cylindrical, etc.

[0031] The isolation cover 121 may have a connection port 121-1, and the connection port 121-1 of the isolation cover 121 is connected to the frame body 122-1 of the connection frame 122. Among them, the connection port 121-1 may include a threaded port, a pin port, a flange port, a welding port, an adhesive port, a snap port, a sliding pin port, a magnetic port, or a plug port. The frame body 122-1 of the connection frame 122 may have a mating port corresponding to the connection port 121-1, and the mating port can be connected to the connection port 121-1 by means of insertion, gripping, rotation, fixation, etc., so as to form a sealed structure between the isolation cover 121 and the connection frame 122.

[0032] The connection frame 122 refers to a component that can be connected to the crystal growth furnace 110. In some embodiments, the connection frame 122 is detachably mounted on the crystal growth furnace 110, and the frame body 122-1 of the connection frame 122 surrounds the observation port 111 of the crystal growth furnace 110 and forms a closed structure, so that the isolation cover 121 seals the observation port 111. Among them, the frame body 122-1 may be formed by surrounding or assembling strip-shaped structures. It can be understood that the area of the connection frame 122 needs to be larger than the area of the observation port 111, so as to ensure that the connection frame 122 can cover the observation port 111, so as to achieve the purpose of sealing the observation port 111 with the isolation cover 121. The isolation cover 121 seals the observation port 111, which can prevent waste gas or other substances discharged from the observation port 111 from diffusing into the external environment during the cleaning process, and the suction head 123 that can be telescopically arranged relative to the isolation cover 121 can extend into the furnace body 113 of the crystal growth furnace 110 through the observation port 111 for cleaning.

[0033] In some embodiments, the connection between the connection frame 122 and the crystal growth furnace 110 may include threaded connection, snap connection, magnetic connection, etc. The furnace body 113 of the crystal growth furnace 110 may have a mating frame corresponding to the connection frame 122, and the mating frame may be connected to the connection frame 122 by means of insertion, gripping, rotation, fixing, magnetic attraction, etc., so as to form a sealed structure between the connection frame 122 and the crystal growth furnace 110. In some embodiments, the cross-sectional shape of the connection frame 122 may be square, circular, rectangular, triangular, etc. In some embodiments, the shape of the connection frame 122 may be the same as or different from the shape of the observation port 111. In some embodiments, the material of the connection frame 122 may be a rigid material such as metal, plastic, ceramic, etc. When the connection frame 122 is a rigid material, if the corresponding position on the crystal growth furnace 110 is a plane, the connection frame 122 is also a plane; if the corresponding position on the crystal growth furnace 110 is a curved surface, the connection frame 122 is also a curved surface with the same curvature. In some embodiments, the material of the connection frame 122 may be a flexible material such as rubber, silica gel, polyurethane, polyurethane elastomer, etc. When the connection frame 122 is a flexible material, the connection frame 122 can adapt to the surface of the crystal growth furnace 110, so that the sealing between the connection frame 122 and the crystal growth furnace 110 is stronger.

[0034] The observation port 111 refers to a window that can facilitate the operator to monitor the crystal growth situation in the furnace in real time and perform corresponding operations. For example, during the crystal growth process, the operator can monitor the situation in the furnace through the observation port 111 in real time, and adjust the crystal growth temperature according to the shape and height of the crystal growth to improve the quality of crystal growth. In some embodiments, the shape of the observation port 111 may be circular, triangular, square, rectangular, trapezoidal, etc. In some embodiments, the observation port 111 may be disposed in the upper middle part of the furnace body 113. In some embodiments, an observation window 112 for closing the observation port 111 is provided at the observation port 111. For more information about the observation window 112, see Figure 1 And its related descriptions.

[0035] The suction head 123 refers to a component that can be used to suck waste gas. The suction head 123 is disposed relative to the isolation cover 121 in a telescopic manner, and the suction head 123 is connected to the waste gas treatment assembly 125 through an air outlet pipe 124. During the cleaning process of the crystal growth furnace 110, the suction head 123 can enter the furnace body 113 of the crystal growth furnace 110 through the observation port 111. Wherein, the suction head 123 is disposed relative to the isolation cover 121 in a telescopic manner, which means that the suction head 123 can change its position relative to the isolation cover 121 through telescoping. For example, in the retracted state, the suction head 123 is located inside the isolation cover 121 (at this time outside the furnace body 113); in the extended state, the suction head 123 is located inside the furnace body 113 (at this time outside the isolation cover 121).

[0036] In some embodiments, the suction head 123 can be disposed within the isolation cover 121 through a first telescopic structure and can extend outside the isolation cover 121, so as to realize that the suction head 123 is telescopically disposed relative to the isolation cover 121. Among them, the first telescopic structure can be a telescopic arm, a telescopic rod, a bellows, etc. When the first telescopic structure extends, the suction head 123 can extend from within the isolation cover 121 into the furnace body 113; when the first telescopic structure contracts, the suction head 123 can retract from the furnace body 113 into the isolation cover 121.

[0037] In some embodiments, such as Figure 2 shown, the suction head 123 can be provided with bristles 123-1. The bristles 123-1 can remove the solid particulate matter attached to the inside of the crystal growth furnace 110 and will not damage the inside of the crystal growth furnace 110.

[0038] The exhaust gas pipeline 124 refers to the pipeline for transporting the exhaust gas suctioned by the suction head 123 to the exhaust gas treatment assembly 125. The diameter and length of the exhaust gas pipeline 124 can be designed according to actual conditions. In some embodiments, the material of the exhaust gas pipeline 124 can include metals, plastics, rubbers, composite materials, etc. In some embodiments, a part of the exhaust gas pipeline 124 can be disposed within the isolation cover 121, and another part can be disposed outside the isolation cover 121. In some embodiments, the exhaust gas pipeline 124 can be entirely disposed within the isolation cover 121 to avoid air leakage at the position where the exhaust gas pipeline 124 penetrates into or out of the isolation cover 121, so that the isolation cover 121 can achieve a better isolation effect. In some embodiments, the exhaust gas pipeline 124 can be flexible and is telescopically disposed relative to the isolation cover 121. The exhaust gas pipeline 124 being flexible and telescopically disposed relative to the isolation cover 121 can enable the exhaust gas pipeline 124 to better cooperate with the suction head 123 when the suction head 123 extends and contracts relative to the isolation cover 121.

[0039] The exhaust gas treatment assembly 125 refers to the equipment for treating the exhaust gas generated during the crystal growth process. The exhaust gas treatment assembly 125 can remove or reduce the pollutants in the exhaust gas to a level meeting the environmental emission standards. In some embodiments, the exhaust gas treatment assembly 125 can include pretreatment equipment, adsorption equipment, catalytic converters, oxidizers, dust collectors, absorption towers, etc.

[0040] In some embodiments, such as Figure 3 shown, the connection frame 122 can include a frame body 122-1, and the frame body 122-1 refers to the frame constituting the connection frame 122. The connection frame 122 can further include a magnetic member 122-3.

[0041] The magnetic member 122-3 refers to a component with magnetism. The magnetic member 122-3 can be adsorbed on the crystal growth furnace 110 with a furnace wall made of materials such as iron, nickel, and cobalt through magnetic attraction. In some embodiments, the fixing methods of the magnetic member 122-3 can include bonding, welding, fastener connection, etc. It should be noted that to ensure the sealing between the connection frame 122 and the crystal growth furnace 110, the height of the magnetic member 122-3 can be not higher than the connection surface of the connection frame 122. In some embodiments, the magnetic member 122-3 can include a permanent magnet or an electromagnet. In some embodiments, the number of the magnetic members 122-3 can be multiple. The multiple magnetic members 122-3 are fixed on the frame body 122-1 of the connection frame 122 and are arranged at intervals along the extending direction of the frame body 122-1. The distances between the magnetic members 122-3 can be the same or different. Herein, the extending direction of the frame body 122-1 refers to the extending direction of the strip-shaped structure forming the frame body 122-1.

[0042] In some embodiments, as Figure 3 shown, the connection frame 122 can include a sunk groove 122-2 extending along the frame body 122-1. The number of the magnetic members 122-3 is multiple. The multiple magnetic members 122-3 are arranged in the sunk groove 122-2 and are arranged at intervals along the extending direction of the sunk groove 122-2. Herein, extending along the frame body 122-1 means extending along the strip-shaped structure forming the frame body 122-1. The sunk groove 122-2 refers to a groove body that can accommodate the magnetic member 122-3. The magnetic member 122-3 can be fixed in the sunk groove 122-2 by means of embedding, bonding, magnetic attraction, etc. It can be understood that when the sunk groove 122-2 is made of materials such as iron, nickel, and cobalt, the magnetic member 122-3 can be fixed by magnetic attraction. By installing the connection frame 122 on the crystal growth furnace 110 through the magnetic member 122-3, more connection sites can be provided, so that the sealing between the connection frame 122 and the crystal growth furnace 110 can be stronger. It can be understood that each magnetic member 122-3 can be regarded as a connection site.

[0043] In some embodiments, activated carbon 122-4 can also be provided in the sunk groove 122-2. The activated carbon 122-4 can be arranged around the magnetic member 122-3. Since there may not be a complete seal between the connection frame 122 and the crystal growth furnace 110 and there may be a small amount of gaps, the activated carbon 122-4 in the sunk groove 122-2 can adsorb the waste gas leaking from the gaps between the connection frame 122 and the crystal growth furnace 110, thereby avoiding environmental pollution and personal injury.

[0044] Through the setting of the sunk groove 122-2, an installation space can be provided for the magnetic member 122-3 to avoid the setting of the magnetic member 122-3 affecting the sealing performance, and the activated carbon 122-4 can further ensure the sealing performance, so as to better avoid environmental pollution and personal injury.

[0045] In some embodiments, as Figure 4 shown, the cleaning device 120 may further include a blowing head 126, an intake pipeline 127, and a gas source 128.

[0046] The suction head 123 refers to a component that can be used to blow off the solid particulate matter attached inside the crystal growth furnace 110. The blowing head 126 is disposed on the isolation cover 121 in a telescopic manner, and the blowing head 126 is connected to the gas source 128 through the intake pipeline 127. During the cleaning process of the crystal growth furnace 110, the blowing head 126 can extend into the furnace body 113 of the crystal growth furnace 110 through the observation port 111. Among them, the blowing head 126 is disposed on the isolation cover 121 in a telescopic manner, which means that the blowing head 126 can change its position relative to the isolation cover 121 through telescoping. For example, in the retracted state, the blowing head 126 is located inside the isolation cover 121 (at this time, outside the furnace body 113); in the extended state, the blowing head 126 is located inside the furnace body 113 (at this time, outside the isolation cover 121).

[0047] In some embodiments, the blowing head 126 can be disposed inside the isolation cover 121 through a second telescopic structure and can extend outside the isolation cover 121, so as to realize the telescopic setting of the blowing head 126 relative to the isolation cover 121. Among them, the second telescopic structure can be a telescopic arm, a telescopic rod, a bellows, etc. When the second telescopic structure extends, the blowing head 126 can extend from inside the isolation cover 121 into the furnace body 113; when the second telescopic structure contracts, the blowing head 126 can retract from inside the furnace body 113 into the isolation cover 121.

[0048] The intake pipeline 127 refers to a pipeline used to transport the gas provided by the gas source 128 to the crystal growth furnace 110. The diameter and length of the intake pipeline 127 can be designed according to actual situations. In some embodiments, the material of the intake pipeline 127 may include metals, plastics, rubbers, composite materials, etc. In some embodiments, a part of the intake pipeline 127 can be disposed inside the isolation cover 121, and another part can be disposed outside the isolation cover 121. In some embodiments, the intake pipeline 127 can be entirely disposed inside the isolation cover 121 to avoid air leakage at the position where the intake pipeline 127 penetrates into or out of the isolation cover 121, so that the isolation cover 121 can achieve a better isolation effect. In some embodiments, the intake pipeline 127 can be flexible and is disposed on the isolation cover 121 in a telescopic manner. The intake pipeline 127 being flexible and disposed on the isolation cover 121 in a telescopic manner can enable the intake pipeline 127 to better cooperate with the blowing head 126 when the blowing head 126 telescopes relative to the isolation cover 121.

[0049] In some embodiments, when the cleaning device 120 cleans the crystal growth furnace 110, the suction head 123 and / or the blowing head 126 can move in the furnace body 113 of the crystal growth furnace 110 in various ways to clean all parts inside the crystal growth furnace 110. In some embodiments, the moving manners of the suction head 123 and the blowing head 126 can be the same or different.

[0050] In some embodiments, when the isolation cover 121 is made of a flexible material, an operator can hold the suction head 123 and / or the blowing head 126 and move them in the furnace body 113 of the crystal growth furnace 110. Since the isolation cover 121 is made of a flexible material, the operator can manually control the positions of the suction head 123 and / or the blowing head 126 in the furnace body 113 to clean all parts inside the crystal growth furnace 110.

[0051] The operator can hold the suction head 123 and / or the blowing head 126 and move them in the furnace body 113 of the crystal growth furnace 110. The equipment is simple and highly operable.

[0052] Some solid particulate matters will adhere to the inside of the crystal growth furnace 110. The crystal growth furnace 110 is usually large in volume while the observation port 111 is small. Therefore, when the operator holds the suction head 123 and / or the blowing head 126 that extends into the furnace body 113 of the crystal growth furnace 110 through the observation port 111 for cleaning, it will be difficult to clean the inside of the crystal growth furnace 110 thoroughly. In the following Figure 5 and Figure 6 corresponding embodiments, by controlling the movement of the suction head 123 and / or the blowing head 126 that extends into the furnace body 113 of the crystal growth furnace 110 through the observation port 111 by a mechanical device, the inside of the furnace body 113 can be cleaned comprehensively, making the inside of the crystal growth furnace 110 cleaner.

[0053] In some embodiments, as Figure 5 shown, the cleaning device 120 can include a first moving member 123-2 and a first driving member (not shown in the figure). The suction head 123 is detachably connected to the first moving member 123-2, and the first moving member 123-2 is movably arranged on the inner wall of the furnace body 113. The first driving member is drivingly connected to the first moving member 123-2, and the first driving member drives the first moving member 123-2 to move inside the furnace wall. In some embodiments, the cleaning device 120 can include a second moving member 126-1 and a second driving member (not shown in the figure). The blowing head 126 is detachably connected to the second moving member 126-1, and the second moving member 126-1 is movably arranged on the inner wall of the furnace body 113. The second driving member is drivingly connected to the second moving member 126-1, and the second driving member drives the second moving member 126-1 to move on the furnace wall.

[0054] The first moving member 123-2 refers to a component that can carry the suction head 123 for movement. During the cleaning process, the suction head 123 can be connected to the first moving member 123-2; after the cleaning is completed, the suction head 123 can be separated from the first moving member 123-2. In some embodiments, the inner wall of the furnace body 113 can be provided with a track, and the first moving member 123-2 can be a moving device (such as a trolley, etc.) that moves along the track. Among them, the tracks can be arranged in a staggered and connected manner on the inner wall, and the tracks can cover the inner wall, so that the moving device can move to various positions within the furnace wall. The first driving member can drive the above-mentioned moving device to move within the furnace wall. Since the internal temperature of the furnace body 113 is very high during the crystal growth process, the moving device can be detachably connected to the track. During the crystal growth process, the moving device can be outside the furnace body 113. When the crystal growth is completed and cleaning is required, the moving device is then arranged on the track; alternatively, a protective sleeve can be provided outside the moving device, and this protective sleeve can prevent high temperature. Thus, during the crystal growth process, the moving device can still be arranged on the track, and the connection between the moving device and the track can be maintained to avoid repeated disassembly.

[0055] In some embodiments, the first moving member 123-2 can include a base portion and a connecting portion. The base portion can be used to connect to the inner wall of the furnace body 113; the connecting portion can be fixed to the base portion and can be used to detachably connect the suction head 123. Exemplarily, as Figure 5 shown, the first moving member 123-2 can be a "2"-shaped magnetic adsorption mechanism. Among them, the "2"-shaped magnetic adsorption mechanism refers to a magnetic adsorption mechanism whose shape is similar to the number "2". The bottom edge of the "2"-shaped magnetic adsorption mechanism can be adsorbed on the inner wall of the furnace body 113, and the upper end point of the "2"-shaped magnetic adsorption mechanism can be detachably connected to the suction head 123. The magnetic adsorption mechanism refers to a component that can utilize the attraction and repulsion of magnetic materials to achieve the suspension and movement of objects. By controlling the intensity and direction of the magnetic field, the suspension and control of objects can be achieved. In some embodiments, the magnetic adsorption mechanism can be composed of a magnet and a magnetic field control system. Among them, the magnet can include a permanent magnet or an electromagnet, and the magnet can achieve the functions of attraction and repulsion by generating a magnetic field; the magnetic field control system can be used to adjust the intensity and direction of the magnetic field to control parameters such as the height, speed, and direction of the magnetic adsorption mechanism, so as to control parameters such as the height, speed, and direction of the suction head 123.

[0056] In some embodiments, based on the detachable connection between the suction head 123 and the first moving member 123-2, the suction head 123 can be a rotatable suction head, so that suction can be performed in different directions according to requirements.

[0057] The first driving member refers to a device that can drive the first moving member 123-2 to move within the furnace wall. In some embodiments, the first driving member may include a driving member and a transmission mechanism connected to the driving member. In some embodiments, the driving member may include a motor, a hydraulic cylinder, a pneumatic cylinder, etc. In some embodiments, the first driving member may be a linear motor, a rotary motor, etc.

[0058] The second moving member 126-1 refers to a component that can carry the blowing head 126 to move. During the cleaning process, the blowing head 126 can be connected to the second moving member 126-1; after the cleaning is completed, the blowing head 126 can be separated from the second moving member 126-12. The structure of the second moving member 126-1 is similar to that of the first moving member 123-2, and will not be described in detail here.

[0059] The second driving member refers to a device that can drive the second moving member 126-1 to move within the furnace wall. The structure of the second driving member is similar to that of the first driving member, and will not be described in detail here.

[0060] In some embodiments, during the cleaning process of the crystal growth furnace 110, the first driving member can drive the first moving member 123-2 to move within the furnace wall, thereby driving the suction head 123 connected to the first moving member 123-2 to move. In some embodiments, the second driving member can drive the second moving member 126-1 to move within the furnace wall, thereby driving the blowing head 126 connected to the second moving member 126-1 to move.

[0061] By driving the suction head 123 to move through the first moving member 123-2; and / or, driving the blowing head 126 to move through the second moving member 126-1, stable movement of the suction head 123 and / or the blowing head 126 can be achieved. When the first moving member 123-2 and / or the second moving member 126-1 is a "2"-type magnetic adsorption mechanism, non-contact, frictionless, low-noise, and high-precision cleaning of the crystal growth furnace 110 can be achieved.

[0062] In some embodiments, as Figure 6 shown, the cleaning device 120 may further include a first robotic arm 123-3. The suction head 123 can be disposed on the first robotic arm 123-3. In some embodiments, the cleaning device 120 further includes a second robotic arm 126-2. The blowing head 126 can be disposed on the second robotic arm 126-2.

[0063] The first robotic arm 123-3 refers to the component used to drive the suction head 123 to move. The first robotic arm 123-3 can be composed of links, a driver, and a control system. Among them, the links are the main part of the first robotic arm 123-3, which are connected by multiple joints and connecting rods, enabling the first robotic arm 123-3 to move in multiple directions. The driver (e.g., a motor, a hydraulic cylinder, or a pneumatic component) can provide power to drive the first robotic arm 123-3 to move. The control system can control the position and posture of the first robotic arm 123-3.

[0064] The second robotic arm 126-2 refers to the component used to drive the blowing head 126 to move. The second robotic arm 126-2 is similar to the first robotic arm 123-3 and will not be elaborated here.

[0065] In some embodiments, during the cleaning process of the crystal growth furnace 110, the first robotic arm 123-3 can drive the suction head 123 to move. In some embodiments, the second robotic arm 126-2 can drive the blowing head 126 to move.

[0066] In some embodiments, when the operator holds the suction head 123 and moves it, the first moving member 123-2 drives the suction head 123 to move, or the first robotic arm 123-3 drives the suction head 123 to move, a photographing device (e.g., a camera) can be provided on the suction head 123. The photographing device can capture an image inside the furnace, then transmit the image inside the furnace to an external display device, and then the operator can move the position of the suction head 123 based on the image in the display device. Among them, when the first moving member 123-2 drives the suction head 123 to move, or the first robotic arm 123-3 drives the suction head 123 to move, the operator can move the suction head 123 through the control device of the first moving member 123-2 or the first robotic arm 123-3. In some embodiments, when the operator holds the blowing head 126 and moves it, the second moving member 126-1 drives the blowing head 126 to move, or the second robotic arm 126-2 drives the blowing head 126 to move, a photographing device (e.g., a camera) can be provided on the blowing head 126. The photographing device can capture an image inside the furnace, then transmit the image inside the furnace to an external display device, and then the operator can move the position of the blowing head 126 based on the image in the display device. Among them, when the second moving member 126-1 drives the blowing head 126 to move, or the second robotic arm 126-2 drives the blowing head 126 to move, the operator can move the blowing head 126 through the control device of the second moving member 126-1 or the second robotic arm 126-2.

[0067] In some embodiments, when the first moving member 123-2 drives the suction head 123 to move, or the first robotic arm 123-3 drives the suction head 123 to move, a photographing device (e.g., a camera) may be provided on the suction head 123. The photographing device may photograph the image inside the furnace, and then based on image recognition, obtain a recognition result, and automatically move the position of the suction head 123 based on the image recognition result. In some embodiments, when the second moving member 126-1 drives the blowing head 126 to move, or the second robotic arm 126-2 drives the blowing head 126 to move, a photographing device (e.g., a camera) may be provided on the blowing head 126. The photographing device may photograph the image inside the furnace, and then based on image recognition, obtain a recognition result, and automatically move the position of the blowing head 126 based on the image recognition result.

[0068] Driving the suction head 123 to move by the first robotic arm 123-3; and / or, driving the blowing head 126 to move by the second robotic arm 126-2 has high flexibility, can adapt to the changing structure inside the furnace body 113, and increases production efficiency, improves work safety, and can achieve automation and intelligence.

[0069] In some embodiments, as Figure 7 shown, the exhaust gas treatment component 125 includes an explosion-proof pump 125-1 and a combustion chamber 125-2. The explosion-proof pump 125-1 is connected to the combustion chamber 125-2 through a pump body exhaust pipe 125-3. The air outlet pipe 124 connects the suction head 123 and the explosion-proof pump 125-1, that is, one end of the air outlet pipe 124 communicates with the explosion-proof pump 125-1, and the other end communicates with the suction head 123. Among them, the size and material of the pump body exhaust pipe 125-3 may be similar to those of the air outlet pipe 124, which will not be elaborated here. It can be understood that the exhaust gas can enter the explosion-proof pump 125-1 via the suction head 123 and the air outlet pipe 124. Then, it enters the combustion chamber 125-2 through the pump body exhaust pipe 125-3 for burning to remove the exhaust gas.

[0070] The explosion-proof pump 125-1 refers to a pump used to transport flammable and explosive exhaust gas. The structure and material of the explosion-proof pump 125-1 are required to withstand factors such as high temperature, high pressure, and corrosion that may exist in an explosive environment. Components such as the pump body, impeller, and seal are usually made of special alloys, stainless steel, or chemically inert materials.

[0071] In some embodiments, a filtering device may be added to the explosion-proof pump 125-1 to adsorb solid particulate matter in the exhaust gas, and only transport gaseous pollutants (e.g., carbon monoxide, etc.) and a small amount of unfiltered solid particulate matter to the combustion chamber 125-2. Among them, the filtering device may include a separation net, a dust removal cloth bag, etc. By setting the filtering device, most of the solid particulate matter can be filtered, thereby reducing the processing volume of the combustion chamber 125-2.

[0072] It should be noted that during the operation of the explosion-proof pump 125-1, in order to avoid the generation of negative pressure inside the crystal growth furnace 110, gases such as air, nitrogen, and helium can be input. In some embodiments, the input gas can be the gas after the exhaust gas sucked by the suction head 123 is processed, thereby forming a cycle.

[0073] The combustion chamber 125-2 refers to a device that degrades and converts exhaust gas through a combustion reaction. The combustion chamber 125-2 can mix the exhaust gas and oxygen and make it burn under high-temperature conditions, so that harmful substances (such as carbon monoxide, etc.) in the exhaust gas are converted into carbon dioxide, water vapor, and other relatively stable gases. Auxiliary fuel can be added to the combustion chamber 125-2, or no auxiliary fuel can be added. If the concentration of combustible pollutants in the exhaust gas is high and the calorific value is high, and the combustion temperature can be maintained only by burning the exhaust gas, the method of not adding auxiliary fuel is selected; if the concentration of combustible pollutants in the exhaust gas is low and the calorific value is low, and auxiliary fuel needs to be added to maintain the combustion temperature, the method of adding auxiliary fuel is selected.

[0074] The gas source 128 refers to a device for providing gas. In some embodiments, the gas source 128 can include a compressor.

[0075] A compressor is a device used to compress a gas or a gas mixture to a higher pressure. It compresses the gas to the required pressure level by reducing the gas volume or increasing the arrangement density of gas molecules. In some embodiments, the compressor can include a reciprocating compressor, a screw compressor, a centrifugal compressor, a scroll compressor, etc. In some embodiments, the intake pipe 127 can be connected to the blowing head 126 and the compressor, that is, one end of the intake pipe 127 can be connected to the compressor, and the other end can be connected to the blowing head 126, so that the high-pressure gas generated by the compressor reaches the blowing head 126 through the intake pipe 127 to blow off the solid particles attached inside the crystal growth furnace 110.

[0076] In some embodiments, the gas compressed by the compressor can include air, nitrogen, helium, etc. In some embodiments, the gas compressed by the compressor can be the gas generated after the combustion in the combustion chamber 125-2.

[0077] In some embodiments, the exhaust gas sucked by the suction head 123 can be transmitted to the exhaust gas treatment assembly 125, then the gas generated by the exhaust gas treatment assembly 125 can be transmitted to the gas source 128, and then the gas generated by the gas source 128 can be blown out through the blowing head 126, realizing recycling and solving the problems of low resource utilization rate and environmental pollution defects. And when the suction head 123 and the blowing head 126 are included at the same time, the two can cooperate with each other to better clean the crystal growth furnace 110.

[0078] In some embodiments, such as Figure 8As described above, the cleaning device 120 may further include a cooling mechanism 129. The cooling mechanism 129 may be disposed between the combustion chamber 125-2 and the compressor. The cooling mechanism 129 is connected to the combustion chamber 125-2 through the combustion chamber 125-2 exhaust pipe 125-4, and the cooling mechanism 129 is connected to the gas source 128 through the cooling mechanism exhaust pipe 129-1. Since the higher the temperature of the gas generated after combustion in the combustion chamber 125-2, the smaller the exhaust volume of the compressor, the lower the efficiency of the compressor 8-1, and the shorter the life of the compressor, the cooling mechanism 129 can be provided to reduce the temperature of the gas generated after combustion in the combustion chamber 125-2 and then enter the compressor.

[0079] The cooling mechanism 129 refers to a device that can be used to cool gases. In some embodiments, as Figure 9 shown, the cooling mechanism 129 may include a water-cooling device 129-2. The water-cooling device 129-2 may be composed of multiple pipes of the same length arranged side by side. The two ends of the multiple pipes may be connected. Liquid may flow inside the pipes, and cooling gas may flow through the pipe gaps. When the liquid flows in the multiple pipes, the gas in the pipe gaps can be cooled. The liquid in the water-cooling device 129-2 may include water, coolant, refrigerant, etc. In some embodiments, the temperature of the coolant may be in the range of 20°C to 30°C. In some embodiments, the temperature of the coolant may be in the range of 22°C to 27°C. In some embodiments, the temperature of the coolant may be in the range of 23°C to 26°C. In some embodiments, the temperature of the coolant may be in the range of 24°C to 25°C.

[0080] In some embodiments, as Figure 1 shown, the crystal growth system 100 may include a crystal growth furnace 110 and a cleaning device 120. Among them, an observation port 111 is provided on the furnace body 113 of the crystal growth furnace 110, and an observation window 112 for closing the observation port 111 is provided at the observation port 111.

[0081] In some embodiments, as Figure 2 shown, the cleaning device 120 may include an isolation cover 121, a connection frame 122, a suction head 123, an air outlet pipe 124, and an exhaust gas treatment component 125. For more information about the cleaning device 120, see Figures 2-9 and its related description.

[0082] The crystal growth furnace 110 refers to a device used for growing crystals. For example, the crystal growth furnace 110 may include those that can be used to grow silicon carbide crystals, lutetium yttrium silicate scintillation crystals, cerium-doped lutetium silicate crystals, cerium-doped gadolinium gallium garnet crystals, alumina crystals, etc. In some embodiments, the crystal growth furnace 110 may include an observation port 111, an observation window 112, and a furnace body 113.

[0083] The furnace body 113 refers to the place where crystal growth occurs. In some embodiments, an observation port 111 may be provided on the side wall of the furnace body 113.

[0084] The observation window 112 refers to a component that can be used to close the observation port 111. The area of the observation window 112 needs to be larger than the area of the observation port 111, so as to ensure that the observation window 112 can cover the observation port 111, so as to achieve the purpose that the observation window 112 can close the observation port 111. The observation window 112 needs to be transparent, so as to ensure that during the crystal growth process, through the observation window 112, the crystal growth situation in the furnace can be monitored in real time through the observation port 111. In some embodiments, the material of the observation window 112 may include quartz, sapphire, magnesium zirconium fluoride, etc.

[0085] In some embodiments, the observation window 112 and the furnace body 113 may be detachably connected. For example, the connection methods between the observation window 112 and the furnace body 113 may include threaded connection, locking connection, pin connection, hinge connection, snap connection, ball joint connection or magnetic connection. During the crystal growth process, the observation window 112 and the furnace body 113 are hermetically connected; during the cleaning process of the crystal growth furnace 110, the observation window 112 can be detached, so that the suction head 123 and / or the blowing head 126 can extend into the furnace body 113 of the crystal growth furnace 110 through the observation port 111 for cleaning. In some embodiments, after the observation window 112 is detached, it can be fixed on the furnace body 113 through the hinge at its lower part, making the observation window 112 horizontal. During the cleaning process of the crystal growth furnace 110, the horizontal observation window 112 can be fixed to the isolation cover 121, so as to prevent the isolation cover 121 from falling off.

[0086] In some embodiments, the cleaning device 120 can be detachably installed on the crystal growth furnace 110 through the connection frame 122. For more content about the connection method between the cleaning device 120 and the crystal growth furnace 110, see Figures 2-3 and its related description. By adopting the cleaning device 120 in any of the above embodiments, cleaning the crystal growth furnace 110 in the crystal growth system 100 can effectively clean the solid particles attached inside the crystal growth furnace 110 while avoiding the leakage of waste gas.

[0087] The beneficial effects that may be brought about by the embodiments of this specification include, but are not limited to: (1) When the connection frame is made of a flexible material, the connection frame can adapt to the surface of the crystal growth furnace, thereby making the sealing between the connection frame and the crystal growth furnace stronger. (2) By using magnetic parts to install the connection frame on the crystal growth furnace, more connection points can be achieved, thus making the sealing between the connection frame and the crystal growth furnace stronger. And the activated carbon in the sink can adsorb the waste gas leaking from the gap between the connection frame and the crystal growth furnace, thereby avoiding environmental pollution and personnel injury. (3) The waste gas is sucked by the suction head to the waste gas treatment component; and / or, the blowing head sprays gas into the crystal growth furnace to blow off the solid particles attached inside the crystal growth furnace, so as to achieve the purpose of cleaning the crystal growth furnace. When both the suction head and the blowing head are included, they can cooperate with each other to better clean the crystal growth furnace. (4) By transmitting the waste gas sucked by the suction head to the waste gas treatment component, then the gas generated by the waste gas treatment component is transmitted to the gas source, and then the gas generated by the gas source is blown out through the blowing head, recycling is realized, and the problems of low resource utilization rate and environmental pollution defects are solved. (5) The operator can hold the suction head and / or the blowing head and move them inside the furnace body of the crystal growth furnace. The equipment is simple and highly operable. (6) The blowing head is driven to move by the first moving part; and / or, the blowing head is driven to move by the second moving part, so that the blowing head and / or the blowing head can move smoothly. When the first moving part and / or the second moving part is a "2"-type magnetic adsorption mechanism, non-contact, frictionless, low-noise and high-precision cleaning of the crystal growth furnace can be achieved. (7) The blowing head is driven to move by the first robotic arm; and / or, the blowing head is driven to move by the second robotic arm, which has high flexibility, can adapt to the variable structure inside the furnace body, increases production efficiency, improves work safety, and can achieve automation and intelligence.

[0088] The basic concepts have been described above. Obviously, for those skilled in the art, the above detailed disclosure is only an example and does not constitute a limitation to this specification. Although not explicitly stated here, those skilled in the art may make various modifications, improvements and corrections to this specification. Such modifications, improvements and corrections are suggested in this specification, so such modifications, improvements and corrections still fall within the spirit and scope of the exemplary embodiments of this specification.

[0089] In the meantime, this specification uses specific terms to describe the embodiments of this specification. For example, "an embodiment", "one embodiment", and / or "some embodiments" mean a certain feature, structure, or characteristic related to at least one embodiment of this specification. Therefore, it should be emphasized and noted that the "one embodiment" or "an embodiment" or "an alternative embodiment" mentioned twice or more at different positions in this specification does not necessarily refer to the same embodiment. In addition, certain features, structures, or characteristics in one or more embodiments of this specification can be appropriately combined.

[0090] Similarly, it should be noted that, in order to simplify the presentation disclosed in this specification and thus help the understanding of one or more embodiments of the invention, in the foregoing description of the embodiments of this specification, sometimes multiple features are grouped into one embodiment, drawing, or description thereof. However, this method of disclosure does not mean that the features required by the subject matter of this specification are more than those mentioned in the claims. In fact, the features of the embodiments are fewer than all the features of the single embodiment disclosed above.

[0091] In some embodiments, numbers are used to describe components and the quantities of attributes. It should be understood that such numbers used for the description of embodiments are, in some examples, modified by the modifiers "about", "approximately", or "substantially". Unless otherwise specified, "about", "approximately", or "substantially" indicate that the said numbers allow a variation of ±20%. Accordingly, in some embodiments, the numerical parameters used in the specification and claims are approximate values, and such approximate values can be changed according to the characteristics required by individual embodiments. In some embodiments, the numerical parameters should consider the specified significant digits and adopt the method of retaining the general number of digits. Although the numerical ranges and parameters used in some embodiments of this specification to confirm the breadth of their scope are approximate values, in specific embodiments, such numerical settings are made as precise as possible within the feasible range.

[0092] For each patent, patent application, patent application publication, and other materials cited in this specification, such as articles, books, specifications, publications, documents, etc., their entire contents are hereby incorporated into this specification by reference. This excludes the application history documents that are inconsistent with or conflict with the content of this specification, and also excludes the documents that limit the broadest scope of the claims of this specification (currently or subsequently appended to this specification). It should be noted that if there are any inconsistencies or conflicts between the descriptions, definitions, and / or uses of terms in the attached materials of this specification and the content described in this specification, the descriptions, definitions, and / or uses of terms in this specification shall prevail.

[0093] Finally, it should be understood that the embodiments described in this specification are only used to illustrate the principles of the embodiments of this specification. Other variations may also fall within the scope of this specification. Therefore, by way of example and not limitation, alternative configurations of the embodiments of this specification may be regarded as consistent with the teachings of this specification. Accordingly, the embodiments of this specification are not limited to the embodiments explicitly presented and described in this specification.

Claims

1. A cleaning device for a crystal growth furnace, characterized in that It includes an isolation cover, a connection frame, a suction head, an exhaust pipe, and an exhaust gas treatment component; The isolation cover has a connection port, the connection port of the isolation cover is connected to the frame of the connection frame, the suction head is arranged to be telescopic relative to the isolation cover, and the suction head is connected to the exhaust gas treatment component through the exhaust pipe; The connection frame is detachably installed on the crystal growth furnace, and the frame of the connection frame surrounds the observation port of the crystal growth furnace and forms a closed structure; the suction head can enter the furnace body of the crystal growth furnace through the observation port.

2. The cleaning device according to claim 1, wherein, The connection frame includes a magnetic member.

3. The cleaning device according to claim 2, wherein, The connection frame includes a sunk groove extending along the frame, the number of the magnetic members is multiple, and the multiple magnetic members are arranged in the sunk groove at intervals along the extending direction of the sunk groove; and / or, Activated carbon is further arranged in the sunk groove.

4. The cleaning device according to claim 1, characterized in that, The suction head is provided with bristles.

5. The cleaning device according to claim 1, wherein The cleaning device further includes a blowing head, an air inlet pipe, and an air source. The blowing head is arranged to be telescopic relative to the isolation cover. The blowing head is connected to the air source through the air inlet pipe, and the suction head can extend into the furnace body of the crystal growth furnace through the observation port.

6. The cleaning device according to claim 5, characterized in that The cleaning device includes a first moving member and a first driving member. The suction head is detachably connected to the first moving member, and the first moving member is movably arranged on the inner wall of the furnace body; the first driving member is drivingly connected to the first moving member, and the first driving member drives the first moving member to move within the furnace wall; and / or, The cleaning device includes a second moving member and a second driving member. The blowing head is detachably connected to the second moving member, and the second moving member is movably arranged on the inner wall of the furnace body; the second driving member is drivingly connected to the second moving member, and the second driving member drives the second moving member to move on the furnace wall.

7. The cleaning device according to claim 5, wherein The cleaning device further includes a first robotic arm, and the suction head is arranged on the first robotic arm; and / or, The cleaning device further includes a second robotic arm, and the blowing head is arranged on the second robotic arm.

8. The cleaning device according to claim 5, characterized in that, The exhaust gas treatment component includes an explosion-proof pump and a combustion chamber. The explosion-proof pump is connected to the combustion chamber through a pump body exhaust pipe, and the exhaust pipe is connected to the suction head and the explosion-proof pump.

9. The cleaning device according to claim 8, wherein The air source includes a compressor, and the air inlet pipe is connected to the blowing head and the compressor; the cleaning device further includes a cooling mechanism, and the cooling mechanism is arranged between the combustion chamber and the compressor.

10. A crystal growth system, characterized in that, It includes a crystal growth furnace and the cleaning device according to any one of claims 1-9; an observation port is provided on the furnace body of the crystal growth furnace, and an observation window for closing the observation port is arranged at the observation port; The observation window is detachably connected to the furnace body.

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