Stamping bipolar plate and electrolytic bath

Abstract

The invention discloses a stamping bipolar plate and an electrolytic bath, and relates to the technical field of electrolytic baths, the stamping bipolar plate comprises two stamping forming single plates of the same structure, the middle of the front face of each single plate is concaved inwards to form a flow channel area, the front face of each single plate is further provided with a front face sealing structure, and the back face of each single plate is provided with a local welding sealing area; an integrated bipolar plate structure is formed after the local welding sealing areas on the back faces of the two single plates are connected, one side of the bipolar plate structure is an anode reaction area, the other side of the bipolar plate structure is a cathode reaction area, one end of the bipolar plate structure is provided with an anode runner inlet and a cathode runner inlet, and the other end of the bipolar plate structure is provided with a cathode runner inlet. And the other end of the bipolar plate structure is provided with an anode runner outlet and a cathode runner outlet. The bipolar plate structure disclosed by the invention not only ensures the sealing effect, but also has the advantages of thinner thickness, lower material cost, fewer formed parts and short processing period, and is more suitable for batch production.

Description

Technical Field

[0001] This invention application relates to the technical field of electrolytic cells, and specifically, to a stamping bipolar plate and an electrolytic cell. Background Art

[0002] The PEM electrolytic cell is an important device for electrolyzing water to produce green hydrogen using renewable energy sources (such as wind power and photovoltaic). The main core components of the PEM electrolytic cell include a membrane electrode, a bipolar plate, a gas diffusion layer, a sealing structure, etc.

[0003] The functions of the bipolar plate include distributing reaction gases, collecting current, providing mechanical support, and heat dissipation, etc. Currently, the bipolar plates on the market are usually processed by etching process or stamping forming process. For the bipolar plate processed by the etching process, a thicker thickness is required for the bipolar plate, resulting in higher material costs and longer processing cycles, which is not conducive to the mass production of later products. For the existing bipolar plate processed by the stamping forming process, only the middle flow channel area is stamped, while the surrounding structures such as the manifold orifice, the bridging area, and the seal need to be matched with plastic frame parts to form. This results in a complex structure of the bipolar plate, a relatively thick overall thickness, cumbersome assembly processes, and high matching precision requirements for the dimensions of each component to complete the assembly of the corresponding components. At the same time, due to the poor impact resistance of the plastic frame parts, they are not suitable for high-pressure working conditions, thus resulting in higher processing technology difficulties. Summary of the Invention

[0004] The problem solved by this invention application is: to provide a stamping bipolar plate with a simpler overall structure, no need for other additional accessories, low processing costs, short processing cycles, and more suitable for mass production.

[0005] In the first aspect, this invention application provides a stamping bipolar plate, including: two stamping formed single plates with the same structure. The middle part of the front surface of the single plate is concave to form a flow channel area. The front surface of the single plate is also provided with a front sealing structure. The back surface of the single plate is provided with a local welding and sealing area. After connecting through the local welding and sealing areas on the back surfaces of the two single plates, an integral bipolar plate structure is formed. One side of the bipolar plate structure is an anodic reaction area, and the other side is a cathodic reaction area. One end of the bipolar plate structure is provided with an anodic flow channel inlet and a cathodic flow channel inlet, and the other end is provided with an anodic flow channel outlet and a cathodic flow channel outlet. The bipolar plate structure is divided into an anodic side reaction chamber and a cathodic side reaction chamber through the cooperation of the front sealing structure and the local welding and sealing area.

[0006] The flow channel arrangement form of the flow channel area is centrosymmetric, and the flow channel at the outlet is shorter than the flow channel at the inlet.

[0007] The flow channel area includes an end channel area, a distribution area, and a diffusion area. The flow channels in the channel area correspond to the flow channels in the distribution area one by one, and the number of flow channels in the diffusion area is more than that in the distribution area.

[0008] The front sealing structure includes a sealing groove, which is arranged at the peripheral position of the front side of the single board, and a corresponding sealing glue line is arranged inside the sealing groove.

[0009] The single board is made of a metal material.

[0010] In a second aspect, the present invention application provides an electrolytic cell, including a stamping bipolar plate as described in any one of the first aspects above.

[0011] The electrolytic cell further includes: a membrane electrode, the anode side of the membrane electrode is hermetically connected to the anode side of one of the bipolar plate structures, and the cathode side of the membrane electrode is hermetically connected to the cathode side of the other bipolar plate structure.

[0012] The beneficial effects of the stamping bipolar plate and the electrolytic cell of the present invention application are as follows: After connecting the backs of two stamping-molded single boards with the same structure, an integrated bipolar plate structure is formed. Through the front sealing structure of the single board and the local welding and sealing area, the bipolar plate structure is divided into an anode reaction chamber and a cathode reaction chamber. Compared with the bipolar plate structure of the prior art, since it needs to additionally add plastic frame parts to form components such as the manifold orifice and the overbridge area of the bipolar plate, while the integrated bipolar plate structure of the present invention application does not require additional parts and can already fully meet the functional characteristics of the bipolar plate. At the same time, the bipolar plate structure of the present invention application not only ensures the sealing effect, but also has a thinner thickness, lower material cost, fewer components, shorter processing cycle, and is more suitable for mass production. Description of the Drawings

[0013] Figure 1 It is a schematic diagram of the overall structure of the bipolar plate structure of the present invention application; Figure 2 It is a front view (anode side) of the bipolar plate structure of the present invention application; Figure 3 It is a schematic diagram of the structure of the flow channel area of the present invention application; Figure 4 It is an exploded view of the bipolar plate structure of the present invention application; Figure 5 It is a partial front view (anode side) of the bipolar plate structure of the present invention application; Figure 6 It is a partial view of the anode side inlet of the bipolar plate structure of the present invention application; Figure 7 It is a partial view of the anode side inlet of the bipolar plate structure of the present invention application (in another direction); Figure 8This is a partial view of the anode side outlet of the bipolar plate structure of the present invention application; Figure 9 This is an exploded view of the bipolar plate structure and the membrane electrode of the present invention application.

[0014] Description of reference numerals: 1. Single plate; 2. Front sealing structure; 21. Sealing groove; 22. Sealing glue line; 23. First flange; 24. Second flange; 3. Flow channel area; 31. Diffusion area; 311. Third rib; 32. Inlet channel area; 321. First rib; 33. Outlet channel area; 34. Inlet distribution area; 341. Second rib; 35. Outlet distribution area; 4. Bipolar plate structure; 41. Anode flow channel inlet; 42. Cathode flow channel inlet; 43. Anode flow channel outlet; 44. Cathode flow channel outlet; 5. Local welding and sealing area; 51. Flow port sealing area; 52. Opening sealing area; 53. Cross-flow channel sealing area; 6. First cross-flow channel; 7. First port; 8. Second port; 9. Second cross-flow channel; 10. Third cross-flow channel; 11. Third port; 12. Fourth port; 13. Membrane electrode; 14. Blank area. Detailed implementation manners

[0015] Next, the technical solutions in the embodiments of the present application will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present application.

[0016] Among them, the same components are denoted by the same reference numerals. It should be noted that the terms "front", "rear", "left", "right", "upper" and "lower" used in the following description refer to the directions in the accompanying drawings of the present application specification, and the terms "bottom surface" and "top surface", "inner" and "outer" respectively refer to facing or away from a specific component. In addition, the terms "first" and "second" are only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, the features defined with "first" and "second" may explicitly or implicitly include one or more of such features. In the description of the present application specification, "a plurality of" means two or more.

[0017] Next, the present application will be further described in conjunction with the accompanying drawings and embodiments.

[0018] Embodiment 1. This embodiment provides a stamping bipolar plate, as Figure 1Schematic diagram of the overall structure of the bipolar plate structure shown, including two stamping single plates 1 with the same structure. A flow channel area 3 is recessed in the middle of the front surface of the single plate 1. A front sealing structure 2 is also provided on the front surface of the single plate 1. A local welding and sealing area 5 is provided on the back surface of the single plate 1. After the back surfaces of the two single plates 1 face each other, the two single plates are welded and connected through the local welding and sealing area 5 to form an integrated bipolar plate structure 4. If any side of the bipolar plate structure 4 is the anodic reaction area, then the flow channel area 3 on this side is the anodic reaction area; if the other side of the bipolar plate structure 4 is the cathodic reaction area, then the flow channel area 3 on this side is the cathodic reaction area.

[0019] It should be noted that, as Figure 2 shown in the front view (anodic side) of the bipolar plate structure, for the convenience of subsequent description, this front view is regarded as the front view of the anodic side of the bipolar plate structure 4. All descriptions related to this figure below are carried out according to this definition. An anodic flow channel inlet 41 and a cathodic flow channel inlet 42 are provided at one end of the bipolar plate structure 4. An anodic flow channel outlet 43 and a cathodic flow channel outlet 44 are provided at the other end of the bipolar plate structure 4. The bipolar plate structure 4 is divided into an anodic side reaction cavity and a cathodic side reaction cavity through the cooperation of the front sealing structure 2 and the local welding and sealing area 5. The anodic side reaction cavity includes the connected anodic flow channel inlet 41, anodic flow channel area, and anodic flow channel outlet 43. The cathodic side reaction cavity includes the connected cathodic flow channel inlet 42, cathodic flow channel area, and cathodic flow channel outlet 44.

[0020] In this embodiment, the back surfaces of two stamping single plates 1 with the same structure face each other, and are welded and connected through the local welding and sealing area 5 to form an integrated bipolar plate structure 4. The bipolar plate structure 4 is divided into an anodic reaction cavity and a cathodic reaction cavity through the cooperation of the front sealing structure 2 and the local welding and sealing area 5. Without other additional accessories, the functions of a complete bipolar plate can be realized. Compared with the bipolar plates processed by the stamping process in the prior art, which also need to additionally attach plastic frame parts to form the manifold ports, overbridge areas, etc. of the bipolar plate, it results in not only a relatively thick bipolar plate processed, but also the connection sealing between each component needs to be considered, making the processing technology more complex. In the application of the present invention, the two single plates 1 constituting the bipolar plate structure 4 have exactly the same structure, so only one stamping die is needed, effectively saving the processing cost. At the same time, without auxiliary parts such as plastic frame parts, it can fully meet the functional characteristics of the bipolar plate. Then, not only the bipolar plate formed is thinner, with low material usage cost, but also the overall structure is simple, the assembly process is easy, effectively reducing the processing cycle, and is more suitable for mass production.

[0021] In this embodiment, the two single plates 1 that make up the bipolar plate structure 4 are exactly the same. When stacking and encapsulating, after placing one single plate 1 with its back facing up, the other single plate 1 is placed in the same direction as this single plate 1, and then rotated 180 degrees relative to this single plate to face its back, and then welded and connected to form an integrated bipolar plate structure 4. Since the structures on both sides of the bipolar plate structure 4 are the same, in actual use, either side of the bipolar plate structure 4 can be defined as the anode side as needed, and the other side is the cathode side.

[0022] Specifically, the single plate 1 is made of a metal material, and materials such as pure titanium plates or stainless steel plates can be selected. The single plate 1 can be processed by stamping. In this invention application, the single plate 1 selects a pure titanium substrate and does not require surface coating, which saves the material usage cost. At the same time, the thickness of the pure titanium substrate is selected to be 0.3 mm - 0.5 mm, and the thickness of the integrated plate structure 4 formed by welding the two single plates 1 after stamping is 2 mm - 3.5 mm. This plate structure is thinner, has a low processing cost, and a simple processing process.

[0023] Optionally, the backs of the two single plates 1 that make up the bipolar plate structure 4 are welded and connected through a local welding seal area 5 to form an integrated plate structure 4. In this invention application, the connection method of the backs of the two single plates 1 is welded and connected by a laser welding process, which can not only ensure the sealing of the connection between the two single plates 1, but also has a simple processing process and a short processing cycle. Then, the outer surface of the integrated plate structure 4 is subjected to an overall plating treatment. The plating method can be PVD plating, electroplating or brush plating. Platinum can be selected for PVD plating, and the plating thickness is 20 nm - 50 nm.

[0024] Specifically, the single plate 1 has two opposite sides. The backs of the two single plates 1 are directly attached and welded, which not only ensures the sealing and connection strength of the two single plates 1, but also makes the plate structure thinner and lighter. Compared with the traditional plate structure, there are more auxiliary components, and the corresponding sealing requirements are higher, so the risk of failure is also greater. However, the coordinated setting of the two single plates 1, the front sealing structure 2, and the local welding seal area 5 in this invention application already has a complete bipolar plate function, with a simple structure, a smaller contact resistance, a reduced number of components, and thus greatly simplifies the stacking and assembly process.

[0025] Specifically, as Figure 2Front view (anode side) of the bipolar plate structure shown. At the upper end of the bipolar plate structure 4 are the anode flow channel inlet 41 and the cathode flow channel inlet 42, and at the lower end of the bipolar plate structure 4 are the anode flow channel outlet 43 and the cathode flow channel outlet 44. The anode flow channel inlet 41 and the anode flow channel outlet 43 are arranged at a diagonal position of the single plate 1 on this side, and the cathode flow channel inlet 42 and the cathode flow channel outlet 44 are arranged at another diagonal position of the single plate 1 on this side. In the present invention application, the anode flow channel inlet 41, the cathode flow channel inlet 42, the anode flow channel outlet 43, and the cathode flow channel outlet 44 are all long strip-shaped openings, and the corners are rounded. On the anode side, the anode flow channel inlet 41 is connected to the inlet of the flow channel area 3, and the anode flow channel outlet 43 is connected to the outlet of the flow channel area 3. On the cathode side of the other side of the bipolar plate structure 4, the cathode flow channel inlet 42 is connected to the inlet of the flow channel area on this side, and the cathode flow channel outlet 44 is connected to the outlet of the flow channel area on this side.

[0026] Optionally, as Figure 3 shown is the schematic structural diagram of the flow channel area. The flow channel layout form of the flow channel area 3 is centrosymmetric, and the flow channel at the outlet is shorter than the flow channel at the inlet. In this way, it not only ensures the uniform consistency of the distribution of reactants and products in the flow channel area 3, but also can adjust the temperature to ensure the heat dissipation function.

[0027] Optionally, the flow channel area 3 includes a channel area, a distribution area, and a diffusion area 31. The flow channels in the channel area correspond one-to-one with the flow channels in the distribution area. The flow channels in the diffusion area 31 are more than those in the distribution area. The diffusion area 31 serves as the core reaction area of the anode-side single plate and the cathode-side single plate. By expanding the design of the flow channels in the diffusion area 31 so that they are more than those in the distribution area, it further ensures effective fluid distribution and heat exchange in the reaction area and increases the surface area of heat exchange of the fluid.

[0028] Specifically, the channel area includes an inlet channel area 32 and an outlet channel area 33. For the anode side of the bipolar plate structure 4, the inlet channel area 32 is connected to the anode flow channel inlet 41, and the outlet channel area 33 is connected to the anode flow channel outlet 43; for the cathode side of the bipolar plate structure 4, the inlet channel area 32 is connected to the cathode flow channel inlet 42, and the outlet channel area 33 is connected to the cathode flow channel outlet 44. The distribution area includes an inlet distribution area 34 and an outlet distribution area 35. The inlet distribution area 34 is arranged between the inlet channel area 32 and one end of the diffusion area 31, and the outlet distribution area 35 is arranged between the outlet channel area 33 and the other end of the diffusion area 31. The inlet channel area 32, the inlet distribution area 34, the diffusion area 31, the outlet distribution area 35, and the outlet channel area 33 are approximately centrosymmetrically distributed with the center of the diffusion area 31. By setting the flow channel area 3 as three different flow channel regions, local blockage and uneven distribution can be avoided.

[0029] Specifically, the inlet channel area 32 and the outlet channel area 33 respectively include a plurality of first ribs 321, and the first ribs 321 are vertically distributed along the length direction of the bipolar plate structure 4. The inlet distribution area 34 and the outlet distribution area 35 respectively include a plurality of second ribs 341, and the second ribs 341 are horizontally distributed along the width direction of the bipolar plate structure 4. The diffusion area 31 includes a plurality of third ribs 311, and the third ribs 311 are vertically distributed along the length direction of the integral bipolar plate structure 4. The ratio of the number of the third ribs 311 to the number of the second ribs 341 is 1:1 to 3:1. The first ribs 321 and the second ribs 341 correspond to each other one by one and are connected by arc-shaped ribs. The second ribs 341 and the corresponding third ribs 311 correspond to each other one by one and are connected by arc-shaped ribs. In the present invention application, the number of the third ribs 311 is three times that of the second ribs 341. During operation, the fluid entering the flow channel area is introduced vertically through the inlet channel area 32, then distributed horizontally through the inlet distribution area 34, and then shunted in a three-fold flow channel manner through the diffusion area 31, so as to ensure better distribution consistency of reactants and products, and at the same time ensure the uniformity of pressure distribution and heat dissipation. At the same time, the flow channels in the channel area, distribution area, and diffusion area of the present invention application are all parallel flow channels. However, the flow channels in each area of the present invention application are not limited to the above flow channel structure, and it can also adopt a wavy flow channel or a dot-shaped flow channel, etc.

[0030] In this embodiment, the bipolar plate structure 4 adopts a double-sided water inlet method, that is, pure water is simultaneously introduced into the anode side and the cathode side of the bipolar plate structure 4. After the pure water on the anode side enters, most of the pure water does not participate in the electrolysis reaction. The pure water that does not participate in the reaction converges and exports the oxygen on this side. The pure water on the cathode side is only used to converge and export the hydrogen on the cathode side. The simultaneous water inlet on the anode side and the cathode side effectively ensures the heat dissipation effect, and at the same time makes the distribution of reactants and products in the reaction areas on both sides more uniform, and is more conducive to exporting the corresponding gases generated on each side. With the development trend of the electrolytic cell towards large plate type and large flow rate, the bipolar plate needs to withstand a larger water inflow. However, if the water volume is too large, the corresponding pressure resistance will also increase. Generally speaking, if the water volume doubles, the pressure resistance will increase by about four times correspondingly, and at the same time, a pump with a larger flow rate needs to be equipped, and the required cost is relatively high. It is difficult to apply the traditional bipolar plate to the application of this large plate type electrolytic cell. The bipolar plate structure 4 of the present invention application can be applied to this application. It adopts a double-sided water inlet method, not only has a larger water inflow, but also can ensure the temperature uniformity of the flow channels on the anode side and the cathode side, and has a better heat dissipation effect.

[0031] Optionally, as Figure 4Exploded view of the bipolar plate structure 4 shown (the upper single plate 1 is the anode side). The front seal structure 2 includes seal grooves 21 provided at the circumferential position of the single plate 1 and at the outer periphery of each flow port. A corresponding sealant line 22 is provided inside the seal groove 21. Through the arrangement of the sealant line 22, the flow channel area 3 of the integrated plate structure 4 and each flow port are hermetically connected.

[0032] Specifically, the seal grooves 21 are arranged along the circumferential position of the single plate 1 and at the outer periphery of each flow port. First flanges 23 arranged at intervals are provided inside the seal grooves 21. The first flanges 23 are arranged at the circumferential position of the single plate 1. Blank areas 14 are also provided at both ends of the single plate 1. One blank area 14 is located between the anode flow channel inlet 41 and the cathode flow channel inlet 42, and the other blank area 14 is located between the anode flow channel outlet 43 and the cathode flow channel outlet 44. Second flanges 24 arranged at intervals are provided along the edges of the anode flow channel inlet 41, the cathode flow channel inlet 42, the anode flow channel outlet 43, the cathode flow channel outlet 44, and the blank area 14 on the single plate 1. The sealant line 22 includes a circumferential sealant line surrounding the first flanges 23 and an internal sealant line surrounding the second flanges 24. The circumferential sealant line and the internal sealant line are double-layer sealant lines surrounding the first flanges 23 and the second flanges 24. The double-layer sealant lines are connected by short sealant lines at the intervals corresponding to the first flanges 23 and the second flanges 24. Through the arrangement of the double-layer sealant lines, a more effective sealing effect can be provided, effectively reducing the risk of seal failure of the bipolar plate structure. Since the cathode side structure of the bipolar plate structure 4 is the same as the anode side structure, the front seal structure on the other side will not be elaborated.

[0033] As described above, since the sealant line 22 used on the front of the bipolar plate structure 4 in this embodiment is a double-layer sealant line, a double-sealing effect is achieved for the flow channel area 3 or each flow port on each side. That is, if any one of the double-layer sealant lines is damaged, the other sealant line can still achieve a sealing effect, effectively preventing hydrogen leakage, reducing potential safety hazards, ensuring the performance of the bipolar plate structure, and at the same time avoiding the risk of corrosion or damage to other components due to abnormal conditions such as air leakage and liquid leakage.

[0034] Optionally, as Figure 2The front view of the bipolar plate structure 4 shown, a first bridging flow channel 6 is provided between the cathode flow channel inlet 42 and the flow channel region 3, a first port 7 is also provided between the first bridging flow channel 6 and the flow channel region 3, a second port 8 is provided between the anode flow channel inlet 41 and the flow channel region 3, the first port 7 and the second port 8 are of the same size and are symmetrically arranged. A second bridging flow channel 9 is provided between the anode flow channel outlet 44 and the flow channel region 3, the second bridging flow channel 9 is arranged close to the flow channel region 3, a third bridging flow channel 10 is also provided between the anode flow channel outlet 43 and the flow channel region 3, the third bridging flow channel 10 is close to and communicates with the anode flow channel outlet 43, a third port 11 and a fourth port 12 arranged at intervals are also provided between the anode flow channel outlet 43 and the reaction region 3, the third port 11 corresponds to the upper end flow port of the second bridging flow channel 9, the fourth port 12 corresponds to the lower end flow port of the second bridging flow channel 9, and each of the above bridging flow channels and each port are the designs on each single plate 1.

[0035] Specifically, as Figure 5 Shown is a partial front view (anode side) of the bipolar plate structure 4. In order to more clearly illustrate the local welding and sealing region 5 on the back surface, the back surface sealing mechanism 5 is shown in its front view. The local welding and sealing region 5 includes an end flow port sealing region 51, an opening sealing region 52, and a bridging flow channel sealing region 53. The end flow port sealing region 51 is circumferential to each flow port of the bipolar plate structure 4. Through the end flow port sealing region 51, the ports of the anode flow channel inlet 41, the cathode flow channel inlet 42, the anode flow channel outlet 43, and the cathode flow channel outlet 44 of the bipolar plate structure 4 are welded and sealed. The opening sealing region 52 is arranged circumferentially to the first port 7 and the second port 8. Through the opening sealing region 52, the ports of the first port 7 and the second port 8 are welded and sealed. The bridging flow channel sealing region 53 includes two identical sealing regions. One sealing region is arranged circumferentially to the second bridging flow channel 9 for welding and sealing the circumference of the second bridging flow channel 9, and the other sealing region is arranged circumferentially outside the third port 11 and the fourth port 12 for welding and sealing the outer circumference of the third port 11 and the fourth port 12.

[0036] In this embodiment, after the backs of the two single plates 1 face each other, they are welded correspondingly through each sealing region of the local welding and sealing region. Through the end flow port sealing region 51, the ports of the four flow ports of the bipolar plate structure 4 are welded and sealed. The opening sealing region 52 welds and seals the circumferences of the first port 7 and the second port 8 respectively. The bridging flow channel sealing region 53 welds and seals the circumference of the second bridging flow channel 9 and the outer circumferences of the third port 11 and the fourth port 12. And the front sealing structure 2 seals each flow port and the reaction region on the front of the single plate 1. Thus, the reaction chambers on the anode side and the cathode side are separated.

[0037] Specifically, since the single board 1 and another single board 1 are arranged back-to-back relative to each other, one single board 1 is rotated 180 degrees relative to the other single board 1. Therefore, when the respective sealing areas are welded and connected, the first port 7 of the anode-side single board 1 is welded to the second port 8 of the cathode-side single board 1, and the bridge flow channel sealing area 53 on the outer periphery of the third port 11 and the fourth port 12 of the anode-side single board 1 corresponds to the circumferential bridge flow channel sealing area of the second bridge flow channel 9 of the cathode-side single board 1.

[0038] The following will describe in detail the fluid flow direction on the anode side of the bipolar plate structure 4. As Figure 6 , 7 shown in the schematic diagram of the local structure of the anode-side inlet of the bipolar plate structure 4, which shows the fluid flow direction at the inlet. Specifically, the fluid enters from the anode flow channel inlet 41 and then descends. After being guided by the first bridge flow channel 6 on the cathode side, it ascends and enters the second port 8 (the anode flow channel inlet 41, the first bridge flow channel 6 of the cathode-side single board 1, the second port 8 of the anode-side single board 1, and the corresponding first port 7 of the cathode-side single board 1 form a fluid channel). It enters the reaction zone 3 through the second port 8. The fluid flowing out after the reaction in the reaction zone 3 is as shown in the schematic diagram of the local structure of the anode-side outlet of the bipolar plate structure 4 in Figure 8. The fluid flow direction at this outlet is that the fluid at the outlet of the reaction zone 3 flows in from the third port 11 and then descends, enters the internal guidance of the second bridge flow channel 9 of the cathode-side single board 1 (here, a flow channel is formed through the bridge flow channel sealing area 53 to connect the inside of the second bridge flow channel 9 of the cathode-side single board 1 with the third port 11 and the fourth port 12 of the anode-side single board 1). The fluid in the second bridge flow channel 9 ascends and flows out from the fourth port 12, and then successively flows out through the third bridge flow channel 10 and the anode flow channel outlet 43. The fluid flow direction on the cathode side of the bipolar plate structure 4 is similar to that on the anode side, which will not be elaborated here.

[0039] Embodiment 2. An electrolytic cell provided by the present invention application includes the above bipolar plate structure. The electrolytic cell of the present invention application has all the technical features and all the technical effects of the above bipolar plate structure, which will not be elaborated here.

[0040] Specifically, it further includes a membrane electrode 13. The anode side of the membrane electrode 13 is hermetically connected to the anode side of a bipolar plate structure 4, and the cathode side of the membrane electrode 13 is hermetically connected to the cathode side of another bipolar plate structure 4. In actual use, the electrolytic cell mainly includes a plurality of membrane electrodes 13 and a plurality of bipolar plate structures 4, and the membrane electrodes 13 and the bipolar plate structures 4 are alternately stacked and assembled.

[0041] The above are only the preferred embodiments of the present invention application, and the present invention application is not limited to the above embodiments. It can be understood that other improvements and changes directly derived or associated by those skilled in the art without departing from the spirit and concept of the present invention application shall be considered to be included within the protection scope of the present invention application.

[0042] As described above, although the present invention application has been shown and described with reference to specific preferred embodiments, it should not be construed as a limitation on the present invention application itself. Various changes can be made in its form and details without departing from the spirit and scope of the present invention application defined by the appended claims.

Claims

1. A stamping bipolar plate, characterized in that, Comprising: Two stamping single plates with the same structure. A flow channel area is formed by concave in the middle of the front surface of the single plate. A front sealing structure is also provided on the front surface of the single plate. A local welding and sealing area is provided on the back surface of the single plate. After connecting through the local welding and sealing areas on the back surfaces of the two single plates, an integrated bipolar plate structure is formed. One side of the bipolar plate structure is an anodic reaction area, and the other side of the bipolar plate structure is a cathodic reaction area. An anodic flow channel inlet and a cathodic flow channel inlet are provided at one end of the bipolar plate structure, and an anodic flow channel outlet and a cathodic flow channel outlet are provided at the other end of the bipolar plate structure. The bipolar plate structure is separated into an anodic side reaction chamber and a cathodic side reaction chamber through the cooperation of the front sealing structure and the local welding and sealing area.

2. The stamping bipolar plate according to claim 1, characterized in that, The flow channel arrangement form of the flow channel area is centrosymmetric, and the flow channel at the outlet is shorter than the flow channel at the inlet.

3. A stamping bipolar plate according to claim 2, characterized in that, The flow channel area includes an end channel area, a distribution area, and a diffusion area. The flow channels in the channel area correspond to the flow channels in the distribution area one by one, and the flow channels in the diffusion area are more than the flow channels in the distribution area.

4. A stamping bipolar plate according to claim 3, wherein, The front sealing structure includes a sealing groove, which is provided at the peripheral position of the front surface of the single plate, and a corresponding sealing glue line is provided inside the sealing groove.

5. A stamping bipolar plate according to claim 1, characterized in that, The single plate is made of a metal material.

6. An electrolytic cell, characterized in that, Comprising a stamping bipolar plate according to any one of claims 1-5 above.

7. An electrolytic cell according to claim 6, characterized in that, The electrolytic cell further includes: a membrane electrode, the anodic side of the membrane electrode is hermetically connected to the anodic side of one of the bipolar plate structures, and the cathodic side of the membrane electrode is hermetically connected to the cathodic side of the other bipolar plate structure.

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