Compound, polymer compound, photosensitive surface treatment agent, laminate, pattern forming substrate, transistor, pattern forming method,

Abstract

A compound represented by general formula (M1). In formula (M1), Y represents a linear or branched alkyl group having 1-10 carbon atoms, a group containing a polymerizable group, or a group represented by [SiX3-Y11-*]. Y11 is a linear or branched alkylene group having 1-4 carbon atoms, X is a halogen atom or an alkoxy group, and * is a bonding site with an N atom. R1 is a hydrogen atom or methyl. And R2 represents a hydrogen atom or an alkyl group having 1-6 carbon atoms. And each of R3 and R4 independently represents an alkyl group having 1-3 carbon atoms or a fluoroalkyl group. N = 2. # imgabs0 #

Description

Technical Field

[0001] The present invention relates to a compound, a polymer compound, a photosensitive surface treatment agent, a laminate, a substrate for pattern formation, a transistor, a pattern formation method, and a method for manufacturing a transistor.

[0002] This application claims priority based on Japanese Patent Application No. 2022-209535 filed in Japan on December 27, 2022, and incorporates its content herein. Background Art

[0003] In recent years, in the manufacture of fine devices such as semiconductor elements, integrated circuits, and devices for organic electroluminescence (EL) displays, a method has been proposed in which patterns having different surface characteristics are formed on a substrate, and fine devices are manufactured using the differences in the surface characteristics.

[0004] As a pattern formation method using the differences in surface characteristics on a substrate, for example, there is a method of forming a region that generates a substituent having chemical activity on a part of the substrate. By this method, a metal material, an organic material, or an inorganic material can be closely adhered to a part of the substrate.

[0005] As a technique for forming a metal film by closely adhering a metal material to a substrate, there is electroless plating treatment. For example, Patent Document 1 discloses a technique for forming fine wirings by electroless plating treatment. Specifically, Patent Document 1 discloses using a catalyst activation layer and a photoresist to perform photolithography from a state of plating on one surface by etching or peeling.

[0006] Prior Art Documents

[0007] Patent Documents

[0008] Patent Document 1: Japanese Patent Laid-Open No. 2006-2201 Summary of the Invention

[0009] One embodiment of the present invention is a compound represented by the following formula (M1).

[0010] [Chemical Formula 1]

[0011]

[0012] (In formula (M1), Y is a linear or branched alkyl group having 1 to 10 carbon atoms, a group containing a polymerizable group, or a group represented by [SiX3-Y 11 -*]; Y 11 is a linear or branched alkylene group having 1 to 4 carbon atoms, X is a halogen atom or an alkoxy group, * is a bonding site to the N atom; R 1is a hydrogen atom or a methyl group; R 2 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; R 3 , R 4 are each independently an alkyl group or a fluoroalkyl group having 1 to 3 carbon atoms; n = 2) BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 Figure 1 is a schematic diagram for explaining the pattern forming method of the present embodiment.

[0014] Figure 2 Figure 2 is a schematic diagram for explaining the manufacturing method of the transistor of the present embodiment. DETAILED DESCRIPTION OF THE INVENTION

[0015] <Compound>

[0016] An embodiment of the present invention is a compound represented by the following formula (M1).

[0017] [Chemical Formula 2]

[0018]

[0019] In formula (M1), Y is a linear or branched alkyl group having 1 to 10 carbon atoms. As the alkyl group of Y, a linear or branched alkyl group having 1 to 5 carbon atoms is preferred. Specifically, Y may include methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, tert-butyl, pentyl, isopentyl, neopentyl, etc.

[0020] In formula (M1), as the group of Y containing a polymerizable group, the group represented by [CH2=(C-R 11 )-C(=O)-O-(Y 11 )-*] can be mentioned. R 11 is a hydrogen atom or a methyl group, Y 11 is a linear or branched alkylene group having 1 to 4 carbon atoms, and * is the bonding site with the N atom.

[0021] In formula (M1), when Y is a group represented by "SiX3-Y 11 -*", X is a halogen atom or an alkoxy group. The halogen atom represented by X may include: fluorine atom, chlorine atom, bromine atom, iodine atom, etc.

[0022] Y 11 may include: methylene [-CH2-], ethylene [-(CH2)2-], trimethylene [-(CH2)3-], tetramethylene [-(CH2)4-], etc. In addition, Y 1 ​​​​Examples include: -CH(CH3)-, -CH(CH2CH3)-, -C(CH3)2-, -C(CH3)(CH2CH3)-, etc.

[0023] X is preferably an alkoxy group. Examples of the alkoxy group as X include -O-(CH3) and -O-(CH2)n12(CH3). n12 is a natural number from 1 to 3.

[0024] In formula (M1), R 1 is a hydrogen atom or a methyl group.

[0025] In formula (M1), R 2 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. As the alkyl group of R 2 , an alkyl group having 1 to 3 carbon atoms is preferred, and methyl, ethyl, and isopropyl are preferred, and isopropyl is more preferred.

[0026] In formula (M1), R 3 , R 4 are each independently an alkyl group or a fluoroalkyl group having 1 to 3 carbon atoms.

[0027] As the alkyl groups of R 3 , R 4 , a linear or branched alkyl group having 1 to 3 carbon atoms is preferred. Specifically, examples include methyl, ethyl, and propyl.

[0028] When R 3 , R 4 is a fluoroalkyl group, the linear or branched alkyl group having 1 to 3 carbon atoms may be partially fluorinated or may be a perfluoroalkoxy group. In this embodiment, a partially fluorinated fluoroalkoxy group is preferred.

[0029] In formula (M1), n = 2.

[0030] The compound represented by formula (M1) has a dinitrobenzyl group with n = 2. When the compound represented by formula (M1) is irradiated with light, the dinitrobenzyl group dissociates to generate an amine. A metal material, an organic material, or an inorganic material can be closely contacted at the portion where the amine is generated. The amine generated from the compound represented by formula (M1) is a primary amine (-NH2) or a secondary amine (-NH-).

[0031] The photoreaction efficiency (φ365) of the compound represented by formula (M1) is greater than that of the compound having a mononitrobenzyl group. In this specification, the photoreaction efficiency (φ365) is the ratio of the photodecomposition rate constant (k) to the absorbance (A365), and is an index representing the efficiency of the reaction with the absorbed light. The photoreaction efficiency (φ) is specifically calculated by the following formula.

[0032] Photoreaction efficiency (φ365) = Photodecomposition rate constant (k) / Absorbance (A365)

[0033] The larger the value of the photoreaction efficiency (φ365) obtained by the above formula, the higher the efficiency of the reaction to the received light, which means that the cleavage reaction of the protecting group is likely to proceed even with a small exposure amount.

[0034] Through the research of the present inventors et al., it has been found that among the compounds represented by formula (M1), the photoreaction efficiency of the compound having dinitrobenzyl is higher than that of the compound having mononitrobenzyl.

[0035] It is considered that the reason is that the effect of the nitro group contributing to the photoreaction is promoted by the increase of the nitro group or the change of the structure. In the above chemical structure, when irradiated with light, a 6-membered ring transition state containing the oxygen of the nitro group is formed from the hydrogen at the benzyl position, and the transfer of the hydrogen at the benzyl position to the oxygen of the nitro group becomes the initial process of photolysis. In order to obtain the effect of the nitro group, the positional relationship and steric conformation with the hydrogen at the benzyl position are important. It is speculated that the reason for the increase in the photoreaction efficiency compared with mononitrobenzyl is that the compound containing dinitrobenzyl has an effective conformation for hydrogen transfer.

[0036] Furthermore, through the research of the present inventors et al., it has been found that among the compounds represented by formula (M1), the photodecomposition rate of the compound having dinitrobenzyl is higher than that of the compound having mononitrobenzyl.

[0037] Formula (M1) is preferably any one of the following formulas (M1)-1, (M1)-2, and (M1)-3.

[0038] In the following formulas (M1)-1, (M1)-2, and (M1)-3, the description of each symbol is the same as that of the symbols in the above formula (M1).

[0039] [Chemical formula 3]

[0040]

[0041] Specific examples of the compound represented by formula (M1) are shown below.

[0042] [Chemical formula 4]

[0043]

[0044] [Chemical formula 5]

[0045]

[0046] [Chemical formula 6]

[0047]

[0048] [Chemical formula 7]

[0049]

[0050] [Chemical Formula 8]

[0051]

[0052] [Chemical Formula 9]

[0053]

[0054] <Method for producing compound (M1)>

[0055] The compound represented by formula (M1) can be produced by the following method.

[0056] In the following description of the production method, n = 2, and the descriptions related to each symbol are the same as those of each symbol in the formula (M1).

[0057] The compound represented by formula (M1) can be produced by a step of producing dinitro intermediate 1 or dinitro intermediate 2, and an operation of introducing Y into the obtained dinitro intermediate 1 or dinitro intermediate 2.

[0058] [Chemical Formula 10]

[0059]

[0060] Dinitro intermediate 1 can be obtained by the reaction shown in (R)-1 below.

[0061] [Chemical Formula 11]

[0062]

[0063] Dinitro intermediate 2 can be obtained by the reaction shown in (R)-2 below.

[0064] [Chemical Formula 12]

[0065]

[0066] The following shows a reaction example of introducing Y into the obtained dinitro intermediate 1 or dinitro intermediate 2 to produce compound (M1).

[0067] [Chemical Formula 13]

[0068]

[0069] In the formula, "Y-NCO" is an alkyl isocyanate. The alkyl group of the alkyl isocyanate is preferably a linear or branched alkyl group having 1 to 5 carbon atoms. Specifically, examples include: methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, tert-butyl, pentyl, isopentyl, neopentyl, etc.

[0070] [Chemical Formula 14]

[0071]

[0072] [Chemical Formula 15]

[0073]

[0074] [Chemical Formula 16]

[0075]

[0076] [Chemical Formula 17]

[0077]

[0078] [Chemical Formula 18]

[0079]

[0080] <Method for Manufacturing Compound (M1)-1>

[0081] The compound represented by formula (M1)-1 can be manufactured by a process of manufacturing dinitro intermediate 1-1 or dinitro intermediate 2-1, and an operation of introducing Y into the obtained dinitro intermediate 1-1 or dinitro intermediate 2-1.

[0082] [Chemical Formula 19]

[0083]

[0084] Dinitro intermediate 1-1 can be obtained by the reaction shown in (R)-1-1 below.

[0085] [Chemical Formula 20]

[0086]

[0087] Dinitro intermediate 2-1 can be obtained by the reaction shown in (R)-2-1 below.

[0088] [Chemical Formula 21]

[0089]

[0090] The following shows reaction examples of introducing Y into the obtained dinitro intermediate 1-1 or dinitro intermediate 2-1 to manufacture compound (M1)-1.

[0091] [Chemical Formula 22]

[0092]

[0093] [Chemical Formula 23]

[0094]

[0095] [Chemical Formula 24]

[0096]

[0097] [Chemical Formula 25]

[0098]

[0099] [Chemical Formula 26]

[0100]

[0101] [Chemical Formula 27]

[0102]

[0103] <Method for Producing Compound (M1)-2>

[0104] The compound represented by formula (M1)-2 can be produced by a process of producing dinitro intermediate 1-2 or dinitro intermediate 2-2, and introducing Y into the obtained dinitro intermediate 1-2 or dinitro intermediate 2-2.

[0105] [Chemical Formula 28]

[0106]

[0107] Dinitro intermediate 1-2 can be obtained by the reaction shown in the following (R)-1-2.

[0108] [Chemical Formula 29]

[0109]

[0110] In the reaction shown in the above (R)-1-1 and the reaction shown in the above (R)-1-2, both dinitro intermediate 1-1 and dinitro intermediate 1-2 are simultaneously formed. The product containing dinitro intermediate 1-1 and dinitro intermediate 1-2 is purified by silica gel column chromatography to obtain dinitro intermediate 1-1 and dinitro intermediate 1-2 separately.

[0111] Dinitro intermediate 2-2 can be obtained by the reaction shown in the following (R)-2-2.

[0112] [Chemical Formula 30]

[0113]

[0114] The following shows reaction examples of introducing Y into the obtained dinitro intermediate 1-2 or dinitro intermediate 2-2 to produce compound (M1)-2.

[0115] [Chemical Formula 31]

[0116]

[0117] [Chemical Formula 32]

[0118]

[0119] [Chemical Formula 33]

[0120]

[0121] [Chemical Formula 34]

[0122]

[0123] [Chemical Formula 35]

[0124]

[0125] [Chemical Formula 36]

[0126]

[0127] <Polymer Compound>

[0128] One embodiment of the present invention is a polymer compound, which includes a repeating unit represented by the following formula (P1).

[0129] [Chemical Formula 37]

[0130]

[0131] (In formula (P1), R 11 is a hydrogen atom or a methyl group, Y 11 is a linear or branched alkylene group having 1 to 4 carbon atoms; R 1 is a hydrogen atom or a methyl group; R 2 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; R 3 , R 4 are each independently an alkyl group or a fluoroalkyl group having 1 to 3 carbon atoms; n = 2)

[0132] In formula (P1), the descriptions related to R 11 , Y 11 , R 1 , R 3 , R 4 are the same as the descriptions of the respective symbols in formula (M1).

[0133] The polymer compound including the repeating unit represented by formula (P1) preferably has a substituent represented by the following formula (1x) bonded to at least one end of the main chain. In the following formula (1x), * indicates the bonding site to the end of the main chain of the polymer compound including the repeating unit represented by formula (P1).

[0134] [Chemical formula 38]

[0135]

[0136] The following exemplifies the polymer compound (P1)-A which is a polymer compound including the repeating unit represented by formula (P1) and has the substituent represented by the formula (1x) bonded to the end of the main chain.

[0137] [Chemical formula 39]

[0138]

[0139] The repeating unit represented by formula (P1) is preferably any one of the following formulas (P1)-1 to (P1)-3.

[0140] [Chemical formula 40]

[0141]

[0142] <Manufacturing method of polymer compound (P1)>[

[0143] By reacting a compound represented by formula (M1) containing a polymerizable group with various polymerization initiators such as a radical polymerization initiator and an anionic polymerization initiator, a polymer compound including the repeating unit represented by the general formula (P1) can be obtained. Examples of the reaction are described below.

[0144] [Chemical formula 41]

[0145]

[0146] [Chemical formula 42]

[0147]

[0148] [Chemical formula 43]

[0149]

[0150] [Chemical formula 44]

[0151]

[0152] The polymerization of the compound represented by the formula (M1) containing a polymerizable group is not particularly limited, and polymerization can be carried out by radical polymerization, anionic polymerization, etc. Among them, from the viewpoints of ease of control, etc., radical polymerization is preferably used. From the viewpoint of obtaining arbitrary solubility by controlling the molecular weight, in radical polymerization, controlled radical polymerization is more preferably used.

[0153] As the controlled radical polymerization method, a chain transfer agent method, a living radical polymerization method which is a kind of living polymerization, etc. can be mentioned, and living radical polymerization with easy control of the molecular weight distribution is more preferably used. In addition, as the living radical polymerization method, there are a nitroxide radical polymerization (NMP), an atom transfer radical polymerization (ATRP), a reversible addition-fragmentation chain transfer (RAFT), etc. From the viewpoints of temperature or versatility, atom transfer radical polymerization (ATRP) is particularly preferably used.

[0154] From the viewpoints of expanding the molecular weight distribution from low molecules to high molecules to obtain arbitrary film-forming properties, and productivity and economy, radical polymerization accompanied by a chain transfer reaction is preferably used.

[0155] In addition, in the case of using radical polymerization, known polymerization initiators can be appropriately used. In addition, the radical polymerization initiator can be used alone or in combination of two or more, and commercially available products can also be directly used.

[0156] For example, a compound having an azo group (-N=N-) and generating radicals with N2, that is, an azo polymerization initiator can be used. Specifically, azo nitriles, azo esters, azo amides, azo amidines, azo imidazolines, etc. can be mentioned. More specifically, for example, 2,2'-azobis(2-amidinopropane) dihydrochloride, 4,4'-azobis(4-cyanovaleric acid), 2,2'-bis(2-imidazolin-2-yl)-2,2'-azopropane dihydrochloride, 2,2'-bis(2-imidazolin-2-yl)-2,2'-azopropane, 2,2'-azobis[N-(2-hydroxyethyl)-2-methylpropionamide], 2,2'-azobisisobutyronitrile (AIBN), 2,2'-azobis(2,4-dimethylvaleronitrile) (ADBN) can be mentioned.

[0157] Among them, 2,2'-azobisisobutyronitrile (AIBN) and 2,2'-azobis(2,4-dimethylvaleronitrile) (ADBN) are preferred, and 2,2'-azobisisobutyronitrile (AIBN) is particularly preferred.

[0158] The high molecular compound of the present embodiment may be composed of repeating units represented by the formula (P1), or may be a copolymer that, in addition to having repeating units represented by the formula (P1), may also have other repeating units as needed. When the high molecular compound of the present embodiment is a copolymer containing repeating units other than those represented by the formula (P1), the proportion of the other repeating units is, for example, 50 mol% or less, 40 mol% or less, or 30 mol% or less relative to the total amount (100 mol%) of all repeating units constituting the high molecular compound.

[0159] Examples of other repeating units include methyl acrylate, phenyl acrylate, benzyl acrylate, dimethoxynitrobenzylcarbonylaminoethyl acrylate, fluorenylmethoxycarbonylaminoethyl acrylate, methyl methacrylate, phenyl methacrylate, benzyl methacrylate, dimethoxynitrobenzylcarbonylaminoethyl methacrylate, and fluorenylmethoxycarbonylaminoethyl methacrylate.

[0160] From the viewpoint of reducing the risk of dissolution and peeling in a plating bath or the like and ensuring solubility during film formation, the number average molecular weight of the high molecular compound including the repeating units represented by the formula (P1) is preferably 300 or more and 100,000 or less, more preferably 1,000 or more and 90,000 or less, and still more preferably 2,000 or more and 40,000 or less, which is a degree that can be wet-filmed. For the same reason, the peak of the molecular weight distribution is in the range of 1,000 or more and 90,000 or less, and still more preferably 2,000 or more and 40,000 or less. These can be measured by gel permeation chromatography (GPC).

[0161] <Photosensitive surface treatment agent>

[0162] In one embodiment of the present invention, the photosensitive surface treatment agent contains the compound represented by the formula (M1). In addition, in one embodiment of the present invention, the photosensitive surface treatment agent may also be composed of the compound represented by the formula (M1).

[0163] In one embodiment of the present invention, the photosensitive surface treatment agent contains a high molecular compound including the repeating units represented by the formula (P1). In addition, in one embodiment of the present invention, the photosensitive surface treatment agent may also be composed of a high molecular compound including the repeating units represented by the formula (P1).

[0164] In one embodiment of the present invention, the photosensitive surface treatment agent includes the compound represented by the formula (M1) and a polymer compound containing a repeating unit represented by the formula (P1).

[0165] In one embodiment of the present invention, the photosensitive surface treatment agent may also contain a solvent.

[0166] By dissolving in general organic solvents such as alcohol solvents, ester solvents, hydrocarbon aromatic solvents, amine solvents, ketone solvents, glycol ether solvents, ether solvents, etc. used as solvents, it can be used as a suitable surface treatment agent.

[0167] Examples of the alcohol solvent include isopropyl alcohol (IPA), n-butyl alcohol (n-butanol), etc.

[0168] Examples of the ester solvent include ethyl acetate (EAC), butyl acetate (NBAC), n-propyl acetate (NPAC), 3-methoxy-3-methylbutyl acetate, etc.

[0169] Examples of the hydrocarbon aromatic solvent include toluene, xylene, benzene, ethylbenzene, trimethylbenzene, etc.

[0170] Examples of the amine solvent include N-methyl-2-pyrrolidone (NMP), dimethylformamide (DMF), N,N-dimethylacetamide (DMAC).

[0171] Examples of the ketone solvent include methyl ethyl ketone (MEK), methyl isobutyl ketone (MIBK), diisobutyl ketone (DIBK), methyl isopropyl ketone (MIPK), cyclohexanone, cyclopentanone (CPN), cycloheptanone, acetone, etc.

[0172] As glycol ether solvents, examples include methyl cellosolve, butyl cellosolve, ethylene glycol mono tert-butyl ether (ETB), propylene glycol monomethyl ether (PGME), propylene glycol monomethyl ether acetate (PGMEA), 3-methoxy-3-methyl-1-butanol (MMB), etc.

[0173] As other solvents, halogen-based solvents containing chlorine or fluorine can be cited. Examples include chloroform, chlorobenzene, and fluoroalkyl ethers. These can be used alone or in combination of two or more. The organic solvent can be appropriately selected according to conditions such as environmental pollution, solubility, volatility, erosion to the substrate or base, film-forming apparatus, or film-forming method.

[0174] In the present invention, by making the photosensitive surface treatment layer hardly soluble, it is insoluble in cleaning liquids, plating liquids, solvents used in multi-layer film formation, etc., and the cleaning resistance or process resistance can be improved in the wiring and lamination processes.

[0175] In the case of the photosensitive surface treatment agent containing the compound represented by the formula (M1), from the viewpoint of improving the reactivity between the base agent and the photosensitive surface treatment agent and between the molecules of the photosensitive surface treatment agent, as the solvent contained, an alcohol-based, ether-based, or hydrocarbon-based solvent is preferred, and a hydrocarbon-based solvent is particularly preferred, and toluene is preferred among them.

[0176] Furthermore, from the viewpoint of improving the reactivity, an arbitrary acidic or basic compound can also be included during film formation. It can be appropriately selected according to film-forming conditions, and acidic compounds such as hydrochloric acid, acetic acid, and nitric acid are particularly preferred, and acetic acid is preferred among them.

[0177] In the case of the photosensitive surface treatment agent containing a high molecular compound including the repeating unit represented by the formula (P1), from the viewpoints of solubility and film-forming property, as the solvent contained, an ester-based or ketone-based solvent is preferred, a ketone-based solvent is particularly preferred, and cyclopentanone is preferred among them.

[0178] As the concentration of the compound represented by the formula (M1) or the high molecular compound including the repeating unit represented by the formula (P1) contained in the photosensitive surface treatment agent, it can be appropriately selected according to film-forming conditions. From the viewpoints of storage stability and economy, it is preferably 0.001% by mass to 10% by mass, more preferably 0.01% by mass to 2% by mass, and preferably 0.1% by mass to 0.3% by mass among them.

[0179] <Pattern formation method>

[0180] The pattern formation method of the present embodiment includes: a step of coating the photosensitive surface treatment agent of the present embodiment on a substrate to form a photosensitive resin film; a step of irradiating the photosensitive resin film with light of a specified pattern to form an amine generation region in the exposed region; and a step of disposing a catalyst for electroless plating in the amine generation region and performing electroless plating.

[0181] Hereinafter, each step will be described with reference to the accompanying drawings.

[0182] As shown in Figure 1 (a), the photosensitive surface treatment agent 10a of the present embodiment is coated on the substrate 11.

[0183] As the coating method, for example, spin coating method, dip coating method, die coating method, spray coating method, roll coating method, microgravure method, die lip coating method, inkjet method, applicator coating, brush coating and other coating methods can be used. In addition, coating can also be performed by printing methods such as flexographic printing and screen printing. In addition, a self-assembled monolayer (SAM) film or a Langmuir-Blodgett (LB) film can also be formed.

[0184] In addition, in this step, as shown in Figure 1 (a), a treatment for drying the solvent by heat or reduced pressure, etc. can also be applied.

[0185] As a result, as shown in Figure 1 (b), a photosensitive surface treatment agent layer 10 is formed on the substrate 11.

[0186] Next, as shown in Figure 1 (c), a photomask 13 having an exposure region of a specified pattern is prepared. As the exposure method, it is not limited to the method using a photomask, and projection exposure using an optical system such as a lens or a mirror, maskless exposure using a spatial light modulation element, a laser beam, etc. can be used. In addition, the photomask 13 can be arranged in contact with the photosensitive surface treatment agent layer 10 or can be arranged not to be in contact with the photosensitive surface treatment agent layer 10.

[0187] Thereafter, as shown in Figure 1 (c), ultraviolet (UV) light is irradiated on the photosensitive surface treatment agent layer 10 through the photomask 13. As a result, the photosensitive surface treatment agent layer 10 is exposed in the exposure region of the photomask 13.

[0188] As a result, as shown in Figure 1 (d), an amine generation part 14 is formed in the exposed part, and an amine non-generation part 12 is formed in the unexposed part.

[0189] UV light can be, for example, i-ray with a wavelength of 365 nm. In addition, the exposure amount or exposure time does not necessarily need to completely remove the protection, and it can be at a level where a part of the amine is generated.

[0190] Next, as shown in Figure 1 (e), a catalyst for electroless plating is applied to the surface to form a catalyst layer 15. The catalyst for electroless plating is a catalyst that reduces metal ions contained in the plating solution for electroless plating, and examples include silver or palladium.

[0191] An amino group is exposed on the surface of the amine generation part 14. The amino group can capture and reduce the catalyst for electroless plating. Therefore, the catalyst for electroless plating is only captured on the amine generation part 14 to form the catalyst layer 15. In addition, a catalyst capable of supporting an amino group can be used as the catalyst for electroless plating.

[0192] As shown in Figure 1 (f), an electroless plating treatment is performed to form a plating layer 16. In addition, as the material of the plating layer 16, nickel-phosphorus (NiP), gold (Au), or copper (Cu) can be cited.

[0193] In this step, the substrate 11 is immersed in an electroless plating bath, and metal ions are reduced on the surface of the catalyst to precipitate the plating layer 16. At this time, since a catalyst layer 15 carrying a sufficient amount of catalyst is formed on the surface of the amine generation part 14, the plating layer 16 can be selectively precipitated only on the amine generation part 14.

[0194] Through the above steps, a wiring pattern can be formed on a specified substrate using the photosensitive surface treatment agent of the present embodiment.

[0195] <Manufacturing method of transistor>

[0196] Furthermore, a manufacturing method of a transistor using the plating layer 16 obtained by the <pattern forming method> as a gate electrode will be described. Figure 2

[0197] Figure 2 As shown in Figure 2As shown in Fig. (a), an insulator layer 17 is formed by a known method so as to cover the plating layer 16 of the electroless plating pattern formed by the above-described pattern forming method and the amine non-generation portion 12. The insulator layer 17 can also be formed, for example, by using a coating solution prepared by dissolving one or more resins such as a UV-curable acrylic resin, an epoxy resin, an ene-thiol resin, and a silicone resin in an organic solvent, and coating the coating solution. By irradiating the coating film with ultraviolet rays through a mask having openings corresponding to the region where the insulator layer 17 is to be formed, the insulator layer 17 can be formed into a desired pattern. Further, before forming the insulator layer 17, the amine non-generation portion 12 can be removed as needed.

[0198] As Figure 2 As shown in Fig. (b), a photosensitive surface treatment agent layer 10 is formed on the insulator layer 17 in the same manner as the electroless plating pattern forming method, and an amine generation portion 14 is formed in the portions where the source electrode and the drain electrode are to be formed.

[0199] As Figure 2 As shown in Fig. (c), an electroless plating catalyst is supported on the amine generation portion 14 in the same manner as the pattern forming method, and after forming a catalyst layer 15, electroless plating is performed to thereby form a plating layer 18 (source electrode) and a plating layer 19 (drain electrode). Further, as the materials of the plating layer 18 and the plating layer 19, nickel-phosphorus (NiP) or copper (Cu) can be cited, but they can also be formed of materials different from those of the plating layer 16 (gate electrode), and gold (Au) can be deposited by electroless gold plating of a different metal, for example, on the surface of nickel-phosphorus (NiP) or copper (Cu).

[0200] As Figure 2 As shown in Fig. (d), a semiconductor layer 21 is formed between the plating layer 18 (source electrode) and the plating layer 19 (drain electrode).

[0201] The semiconductor layer 21 can be formed, for example, by preparing a solution in which an organic semiconductor material soluble in an organic solvent such as TIPS pentacene (6,13-bis(triisopropylsilylethynyl)pentacene) is dissolved in the organic solvent, coating the solution between the plating layer 18 (source electrode) and the plating layer 19 (drain electrode), and drying it.

[0202] Alternatively, the semiconductor layer 21 can be formed by adding one or more insulating polymers such as polystyrene (PS) or polymethyl methacrylate (PMMA) to the above solution, coating the solution containing the insulating polymer, and drying it.

[0203] When the semiconductor layer 21 is formed in this manner, an insulating polymer is concentratedly formed below the semiconductor layer 21 (on the insulator layer 17 side). When polar groups such as amino groups are present at the interface between the organic semiconductor and the insulator layer, there is a tendency for the transistor characteristics to deteriorate. However, by adopting a structure in which the organic semiconductor is provided with the insulating polymer interposed therebetween, a decrease in the transistor characteristics can be suppressed. A transistor can be manufactured in the above manner.

[0204] According to the method described above, in the UV exposure process, it is not necessary to separately provide a chemical resist or the like, and it can be a simple process that uses only a photomask. Therefore, of course, there is no need for a process of removing the resist layer. In addition, due to the catalytic reduction ability of the amino group, the activation treatment process of the catalyst that is usually required can also be omitted, thereby enabling a significant reduction in cost and time, and high-precision patterning. In addition, since the dip coating method can be used, it can also be very suitably used in the roll-to-roll process.

[0205] In addition, as the structure of the transistor, there is no particular limitation, and it can be appropriately selected according to the purpose. For example, top-contact-bottom-gate type, top-contact-top-gate type, and bottom-contact-top-gate type transistors can also be manufactured in the same manner.

[0206] <Stacked body>

[0207] The present embodiment is a stacked body including the photosensitive surface treatment agent of the present embodiment.

[0208] The stacked body of the present embodiment is a stacked body in which a substrate and a metal pattern are laminated, and includes a photosensitive surface treatment agent in an unexposed portion where no pattern is formed.

[0209] <Transistor>

[0210] The present embodiment is a transistor including the photosensitive surface treatment agent of the present embodiment.

[0211] The stacked body of the present embodiment is a transistor having a stacked body in which a substrate and a metal pattern are laminated, and includes a photosensitive surface treatment agent in an unexposed portion where no pattern is formed.

[0212] Examples

[0213] Hereinafter, the present invention will be described more specifically by way of examples, but the present invention is not limited to the following examples.

[0214] Through the reaction shown below, nitration of 1-(4,5-dimethoxy-2-nitrophenyl)-2-methylpropanone is carried out to obtain intermediate A and intermediate B.

[0215] [Chemical 45]

[0216]

[0217] In a 100 mL wide-mouth eggplant-shaped flask, 500 mg (1.97 mmol, 1.0 eq, MI457) of 1-(4,5-dimethoxy-2-nitrophenyl)-2-methylpropanone was placed, and 3 mL (70.2 mol, 36 eq) of fuming HNO3 was slowly added dropwise over 5 minutes at 0 °C (ice water), and then stirred at room temperature for 30 minutes.

[0218] Cold water (45 mL) was added to the reaction solution, and after stirring at 0 °C for 1 hour, suction filtration was carried out using a membrane filter, rinsed with H2O (45 mL), and vacuum dried to obtain 421 mg of a pale brown solid.

[0219] Purification was carried out using silica gel column chromatography (developing solvent hexane:ethyl acetate = 2:1), concentrated and vacuum dried to obtain 30 mg (0.10 mmol, 5%) of yellow oil A (intermediate A) as fraction 1 of the developing solvent, and 144 mg (purity 63%, converted yield 91 mg, 0.30 mmol, 15%) of pale yellow solid B (intermediate B) as fraction 2.

[0220] The measurement results of intermediate A and intermediate B are shown below.

[0221] Intermediate A

[0222] 1 H NMR (Nuclear Magnetic Resonance) (CDCl3) 1.23 (6H, d), 2.82 (1H, m), 4.05 (3H, s), 4.07 (3H, s), 7.81 (1H, s).

[0223] 13 C NMR (CDCl3) 18.33, 41.80, 57.14, 62 / 69, 109.67, 124.30, 140.79, 146.30, 153.48, 201.89.

[0224] FTIR (Fourier transform infrared spectroscopy) (NaCl) 1706, 1549, 1341, 1293 cm -1 .

[0225] ESIMS (electrospray ionization mass spectrometry) 321.0730, C 12 H 14 Calculated value of N2O7Na[M+Na + is 321.0699.

[0226] Mp. 70.1 - 72.6 °C

[0227] Intermediate B

[0228] 1 H NMR (CDCl3) 1.23 (6H, d), 2.92 (1H, m), 4.00 (3H, s), 4.04 (3H, s), 6.87 (1H, s).

[0229] 13 C NMR (CDCl3) 18.54, 40.77, 57.24, 62.75, 111.03, 131.26, 134.63, 140.25, 142.46, 157.63, 203.96.

[0230] ESIMS 321.0723, C 12 H 14 Calculated value of N2O7Na[M+Na + is 321.0699.

[0231] Mp. 115.2 - 117.2 °C

[0232] <Example 1>

[0233] By the reaction shown below, the obtained Intermediate A was reduced to obtain 1-(3,4-dimethoxy-2,6-dinitrophenyl)-2-methylpropan-1-ol.

[0234] [Chemical formula 46]

[0235]

[0236] In a 20 mL eggplant-shaped flask, 57 mg (0.19 mmol, 1.0 eq) of 1-(3,4-dimethoxy-2,6-dinitrophenyl)-2-methylpropanone was placed and dissolved in 1 mL of tetrahydrofuran (THF) and 0.5 mL of methanol. 11 mg (0.29 mmol, 1.5 eq) of sodium tetrahydroborate was added in small portions at 0 °C, and the mixture was stirred at 0 °C for 30 minutes and then at room temperature for 3 hours.

[0237] After concentration under reduced pressure, ethyl acetate (2 mL × 5) and water (2 mL) were added for extraction, dried over anhydrous magnesium sulfate, filtered, concentrated, and vacuum dried to obtain 46 mg of a brown viscous substance. Purification was carried out by silica gel column chromatography (developing solvent: hexane:ethyl acetate = 3:1), concentrated, and vacuum dried to obtain 18 mg of a yellow oil (purity 60%, 0.0036 mmol, yield 19%).

[0238] The measurement results of 1-(3,4-dimethoxy-2,6-dinitrophenyl)-2-methylpropan-1-ol are shown below.

[0239] 1 H NMR (CDCl3) 0.74 (3H, d), 1.08 (3H, d), 2.07 (1H, m), 3.98 (3H, s), 4.00 (3H, s), 4.57 (1H, br), 7.46 (1H, s).

[0240] 13 C NMR (CDCl3) 19.26, 19.67, 33.79, 56.81, 62.46, 74.75, 110.26, 123.02, 144.35, 144.54, 145.88, 151.90.

[0241] FTIR (NaCl) 3565, 2967, 1547, 1350, 1293 cm -1 .

[0242] ESIMS 323.0883, C 12 H 16 N2O7Na[M+Na + calculated value 323.0855.

[0243] Furthermore, the model compound A (1-(3,4-dimethoxy-2,6-dinitrophenyl)-2-methylpropyl N-butylcarbamate) was synthesized through the reaction shown below.

[0244] [Chemical Formula 47]

[0245]

[0246] In a 10 mL ground glass test tube, 17 mg (purity 60%, 0.034 mmol) of 1-(3,4-dimethoxy-2,6-dinitrophenyl)-2-methylpropanol was placed and dissolved in 1 mL of dry tetrahydrofuran (THF). Then, 5 μL (0.008 mmol, 0.2 eq) of dibutyltindilaurate (DBTL) and 20 μL (0.75 mmol, 22 eq) of butyl isocyanate (BuNCO) were added. Under a nitrogen atmosphere, the mixture was refluxed for 19 hours. It was concentrated under reduced pressure and dried in vacuo to obtain 56 mg of a dark brown solid. Purification was carried out using silica gel column chromatography (developing solvent: chloroform), followed by concentration and drying in vacuo to obtain 13 mg (0.030 mmol, yield 88%) of the target product (model compound A) as a yellow oil.

[0247] The measurement results of model compound A are shown below.

[0248] 1 H NMR (CDCl3) 0.88 (3H, t), 0.89 (3H, d), 0.93 (3H, d), 1.32 (2H, m), 1.47 (2H, m), 2.25 (1H, m), 3.12 (2H, m), 3.97 (6H, s), 4.68 (1H, br), 5.92 (1H, d), 7.52 (1H, s).

[0249] 13 C NMR (CDCl3). 13.70, 18.21, 19.80, 19.98, 31.80, 33.18, 40.83, 56.73, 62.42, 74.89, 109.90, 121.37, 144.56, 144.76, 144.83, 151.86, 155.29

[0250] ESIMS 422.1571,C 17 H 25 N3O8Na[M+Na + Calculated value: 422.1539.

[0251] <Example 2>

[0252] The obtained intermediate B was reduced through the reaction shown below to obtain 1-(4,5-dimethoxy-2,3-dinitrophenyl)-2-methylpropan-1-ol.

[0253] [Chemical formula 48]

[0254]

[0255] In a 50 mL eggplant-shaped flask, 144 mg (purity 63%, calculated as 91 mg, 0.30 mmol, 1.0 eq) of 1-(4,5-dimethoxy-2,3-dinitrophenyl)-2-methylpropanone was dissolved in 2 mL of tetrahydrofuran (THF) and 1 mL of methanol. At 0 °C, 17 mg (0.45 mmol, 1.5 eq) of sodium borohydride was added in small portions each time, and the mixture was stirred at 0 °C for 30 minutes and then at room temperature for 3 hours.

[0256] After concentration under reduced pressure, ethyl acetate (2 mL × 5) and water (5 mL) were added for extraction, dried over anhydrous magnesium sulfate, filtered, concentrated, and vacuum dried to obtain 139 mg of a brown viscous substance. It was purified by silica gel column chromatography (developing solvent hexane:ethyl acetate = 2:1), concentrated, and vacuum dried to obtain 75 mg (0.25 mmol, 82%) of a yellow oil as the target product containing the raw material.

[0257] The measurement results of 1-(4,5-dimethoxy-2,3-dinitrophenyl)-2-methylpropan-1-ol are shown below.

[0258] 1 H NMR(CDCl3) 0.92(3H,d), 0.97(3H,d), 1.95(1H,m), 2.21(1H,d), 3.99(3H,s), 4.01(3H,s), 4.87(1H,br), 7.31(1H,s).

[0259] 1313C NMR (CDCl3): 16.83, 19.48, 34.70, 56.83, 62.62, 73.28, 111.71, 134.10, 135.89, 140.07, 140.94, 156.12.

[0260] FTIR (NaCl): 3585, 2964, 1551, 1350, 1291 cm -1 .

[0261] ESIMS: 323.0873, C 12 H 16 N2O7Na [M + Na + calcd 323.0855.

[0262] Furthermore, the model compound B (1-(4,5-dimethoxy-2,3-dinitrophenyl)-2-methylpropyl N-butylcarbamate) was synthesized through the reaction shown below.

[0263] [Chemical Formula 49]

[0264]

[0265] In a 10 mL ground glass test tube, 150 mg (0.50 mmol) of 1-(4,5-dimethoxy-2,3-dinitrophenyl)-2-methylpropan-1-ol was placed and dissolved in 1.5 mL of dry tetrahydrofuran (THF). 15 μL (0.025 mmol, 0.05 eq) of dibutyltin dilaurate (DBTL) and 85 μL (0.75 mmol, 1.5 eq) of butyl isocyanate (BuNCO) were added. Under a nitrogen atmosphere, the mixture was refluxed for 19 hours. It was concentrated under reduced pressure and dried in vacuo to obtain 251 mg of a dark brown solid. It was purified by silica gel column chromatography (developing solvent: hexane:ethyl acetate = 2:1), concentrated, and dried in vacuo. After elution with hexane and vacuum drying, 156 mg (0.39 mmol, 78%) of the target product (model compound B) as an orange solid was obtained.

[0266] The measurement results of model compound B are shown below.

[0267] 11H NMR (CDCl3) 0.90 (3H, t), 0.91 (3H, d), 1.03 (3H, d), 1.32 (2H, m), 1.45 (2H, m), 2.18 (1H, m), 3.13 (2H, m), 3.93 (3H × 2, 2s), 4.76 (1H, br), 5.61 (1H, d), 6.97 (1H, s).

[0268] 13 13C NMR (CDCl3) 13.69, 17.88, 19.21, 19.86, 31.88, 33.39, 40.85, 56.71, 62.58, 76.04, 111.29, 131.17, 134.82, 140.45, 141.14, 155.28, 155.84.

[0269] Anal. Calcd for C17H25N3O8: C 51.12, H 6.31, N 10.52%. Found: C 51.07, H 6.20, N 10.42%.

[0270] FTIR (KBr disk): 1693, 1557, 1359 cm-1.

[0271] Mp 106.9 - 108.1 °C

[0272] <Comparative Example 1>

[0273] The mononitro compound (Synthesis of 1-(4,5-dimethoxy-2-nitrophenyl)-2-methylpropyl N-butylcarbamate) was prepared by the reaction shown below.

[0274] [Chemical Formula 50]

[0275]

[0276] In a 200 mL eggplant-shaped flask, 4.0 g (10 mmol) of 1-(4,5-dimethoxy-2-nitrophenyl)-2-methylpropyl(2-methylene-5-oxopyrrolidin-1-yl)carbonate was placed and dissolved in 40 mL of dry tetrahydrofuran (THF). 2 mL (20 mmol, 2 eq) of butylamine was added, and the mixture was stirred for 3 hours under a nitrogen atmosphere at room temperature. It was concentrated under reduced pressure, dissolved in 80 mL of ethyl acetate, washed 3 times with 40 mL of water, dried over anhydrous magnesium sulfate, and dried in vacuo to obtain 4.51 g of a pale yellow solid. It was purified by silica gel column chromatography (developing solvent: chloroform), concentrated and dried in vacuo to obtain 3.41 g of the target mononitro compound (9.62 mmol, yield 96%).

[0277] 1-(4,5-Dimethoxy-2-nitrophenyl)-2-methylpropyl(2-methylene-5-oxopyrrolidin-1-yl)carbonate was synthesized using the reported methods (the methods described in Non-Patent Document 1 and Non-Patent Document 2 below).

[0278] Non-Patent Document 1: Noriko Chikaraishi Kasuga, Yusuke Saito, Naomichi Okamura, Tatsuya Miyazaki, Hikaru Satou, Kazuhiro Watanabe, Takaki Ohta, Shu-hei Morimoto, Kazuo Yamaguchi, Influences of alpha-substituent in 2-nitrobenzyl-protected esters on both photocleavage rate and subsequent photoreaction of the generated 2-nitrosoketones: A novel photorearrangement of 2-nitrosoketones, J. Photochem. Photobiol. A: Chem., 2016, 321, 41-47 (Noriko Chikaraishi Kasuga,Yusuke Saito,Naomichi Okamura,Tatsuya Miyazaki,Hikaru Satou,Kazuhiro Watanabe,Takaki Ohta,Shu-hei Morimoto,Kazuo Yamaguchi,Influences of alpha-substituent in 2-nitrobenzyl-protected esters on both photocleavage rate and subsequent photoreaction of the generated 2-nitrosoketones:A novel photorearrangement of 2-nitrosoketones,J.Photochem.Photobiol.A:Chem.,2016,321,41-47.)

[0279] Non-Patent Document 2: Takuma Igari and Kazuo Yamaguchi, 2-Nitrobenzylcarbamate-bearing Alkylphosphonic Acid Derivative Forms Photodegradable Self-assembled Monolayer That Enables Fabrication of a Patterned Amine Surface, Chem. Lett. 2017, 46(8)1220-1222 (Takuma Igari and Kazuo Yamaguchi,2-Nitrobenzylcarbamate-bearingAlkylphosphonic Acid Derivative Forms Photodegradable Self-assembledMonolayer That Enables Fabrication of a Patterned Amine Surface,Chem.Lett.2017,46(8)1220-1222.)

[0280] The measurement results of the mononitro compounds are shown below.

[0281] 11H-NMR (CDCl3) 0.90 (3H, t), 0.99 (6H, m), 1.31 (2H, sext), 1.46 (2H, quint), 2.14 (1H, sept), 3.14 (2H, m), 3.94 (6H, s), 4.76 (1H, t), 6.23 (1H, d), 6.90 (1H, s), 7.61 (1H, s)

[0282] 13 13C-NMR (CDCl3) 13.71, 17.20, 19.43, 19.88, 32.04, 33.34, 40.78, 56.33, 75.74, 107.97, 108.94, 132.17, 140.65, 147.76, 153.02, 155.73

[0283] FTIR (KBr) 3303, 1685, 1518, 1274 cm -1

[0284] <Measurement of the photodecomposition rate constant k (s -1 )

[0285] The obtained model compound A, model compound B, and mononitro compound were respectively dissolved in acetonitrile to prepare 0.1 mM solutions.

[0286] Using an ultra-high pressure mercury lamp, through a 365 nm band-pass filter and a water filter, irradiate light with a wavelength of 365 nm and an illuminance of 25 mW / cm 2 for 5 seconds, 10 seconds, 15 seconds, 20 seconds, 25 seconds, and 30 seconds, and perform high performance liquid chromatography (HPLC) measurements respectively.

[0287] Substitute the peak areas of the raw materials obtained by HPLC measurement (S0: area before light irradiation, S t : area after light irradiation for t seconds) into the following formula, and calculate the photodecomposition rate constant k (s -1 ) based on the reduction rate of the raw materials. The results are shown in Table 1.

[0288] [Equation 1]

[0289]

[0290] <Measurement of the molar absorption coefficient (ε 365 / M -1 cm -1 )

[0291] The obtained model compound A, model compound B, and mononitro compound were each dissolved in acetonitrile to prepare 0.1 mM solutions. The solutions were placed in a quartz cell with an optical path length of 1 cm, and the molar extinction coefficient (ε 365 / M -1 cm -1 ) was calculated based on the absorbance measured using an ultraviolet-visible spectrophotometer (V-570 manufactured by JASCO Corporation).

[0292] <Calculation of half-life (t 1 / 2 / s)>

[0293] The half-life (t 1 / 2 / s) was calculated based on the photodegradation rate constant.

[0294] <Calculation of photoreaction efficiency (φ365)>

[0295] Based on the photodegradation rate constant and absorbance (A365) measured using a 0.1 mM solution, the photoreaction efficiency (φ365) was calculated using the following method.

[0296] Photoreaction efficiency (φ365) = photodegradation rate constant (k) / absorbance (A365)

[0297] [Table 1]

[0298]

[0299] It was confirmed that model compound A and model compound B having dinitrobenzyl had a photoreaction efficiency about 4 times or more higher than that of the mononitro compound having mononitrobenzyl.

[0300] In addition, model compound A and model compound B having dinitrobenzyl had a faster photodegradation rate than the mononitro compound having mononitrobenzyl.

[0301] Furthermore, when model compound A and model compound B were compared, it was confirmed that model compound B had a faster photodegradation rate.

[0302] Based on the results of model compound A and model compound B, it can be fully speculated that the compound represented by formula (M1) and the polymer compound represented by formula (P1) having dinitrobenzyl also exhibit the same effect of high photoreaction efficiency or increased photodegradation rate.

[0303] Explanation of reference numerals

[0304] 11: Substrate

[0305] 10a: Photosensitive surface treatment agent

[0306] 10: Photosensitive surface treatment agent layer

[0307] 13: Photomask

[0308] 14: Amine generation part

[0309] 12: Amine non-generation part

[0310] 15: Catalyst layer

[0311] 16: Plating layer

[0312] 17: Insulator layer

[0313] 18: Plating layer (source electrode)

[0314] 19: Plating layer (drain electrode)

[0315] 21: Semiconductor layer

Claims

1. A compound represented by the following general formula (M1). [Chemical formula 1] (In formula (M1), Y is a linear or branched alkyl group having 1 to 10 carbon atoms, a group containing a polymerizable group, or a group represented by [SiX3-Y 11 -*]. Y 11 is a linear or branched alkylene group having 1 to 4 carbon atoms, X is a halogen atom or an alkoxy group, and * is a bonding site to the N atom. R 1 is a hydrogen atom or a methyl group. R 2 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. R 3 , R 4 are each independently an alkyl group or a fluoroalkyl group having 1 to 3 carbon atoms. n = 2).

2. A polymer compound comprising a repeating unit represented by the following general formula (P1). [Chemical formula 2] (In formula (P1), R 11 is a hydrogen atom or a methyl group, and Y 11 is a linear or branched alkylene group having 1 to 4 carbon atoms. R 1 is a hydrogen atom or a methyl group. R 2 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. R 3 , R 4 are each independently an alkyl group or a fluoroalkyl group having 1 to 3 carbon atoms. n = 2).

3. A photosensitive surface treatment agent containing the compound according to claim 1 or the polymer compound according to claim 2.

4. A laminate containing the photosensitive surface treatment agent according to claim 3.

5. A substrate for pattern formation having a surface chemically modified with the photosensitive surface treatment agent according to claim 3.

6. A transistor containing the photosensitive surface treatment agent according to claim 3.

7. A pattern forming method, comprising: A step of coating the substrate with the photosensitive surface treatment agent according to claim 3 to form a photosensitive resin film. A step of irradiating the photosensitive resin film with light of a specified pattern. And A step of electroless plating at least a part of the irradiation area of the light of the specified pattern.

8. A pattern forming method, comprising: A step of coating the substrate with the photosensitive surface treatment agent according to claim 3 to form a photosensitive resin film. A step of irradiating the photosensitive resin film with light of a specified pattern. And A step of disposing an electroless plating catalyst in at least a part of the irradiation area of the light of the specified pattern and performing electroless plating.

9. A pattern forming method, comprising: A step of coating the substrate with the photosensitive surface treatment agent according to claim 3 to form a photosensitive resin film. A step of irradiating the photosensitive resin film with light of a specified pattern to form an amine generation area in the exposed area. And a step of disposing an electroless plating catalyst in the amine generation area and performing electroless plating.

10. A method for manufacturing a transistor, comprising a step of forming any one or more of a source electrode, a drain electrode, or a gate electrode by the pattern formation method according to any one of claims 7 to 9.

11. A transistor containing the compound represented by the following formula (M1) or a polymer compound having a repeating unit represented by the following formula (P1). [Chemical formula 3] (In formula (M1), Y is a linear or branched alkyl group having 1 to 10 carbon atoms, a group containing a polymerizable group, or a group represented by [SiX3-Y 11 -*]. Y 11 is a linear or branched alkylene group having 1 to 4 carbon atoms, X is a halogen atom or an alkoxy group, * is a bonding site to the N atom. R 1 is a hydrogen atom or a methyl group. R 2 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. R 3 , R 4 are each independently an alkyl group or a fluoroalkyl group having 1 to 3 carbon atoms. n = 2). [Chemical formula 4] (In formula (P1), R 11 is a hydrogen atom or a methyl group, and Y 11 is a linear or branched alkylene group having 1 to 4 carbon atoms. R 1 is a hydrogen atom or a methyl group. R 2 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. R 3 , R 4 are each independently an alkyl group or a fluoroalkyl group having 1 to 3 carbon atoms. n = 2).

12. The transistor according to claim 11, wherein the compound or the polymer compound has a part where at least a part of nitrobenzyl is detached to generate an amino group.

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