Dust-proof photovoltaic anti-reflection coated glass and preparation method thereof

Abstract

The present invention discloses a dustproof photovoltaic anti-reflective coated glass and a preparation method thereof, relating to the field of photovoltaic glass technology. The preparation method comprises the following steps: S1, immersing a glass substrate in acetone, ethanol, and deionized water in sequence for ultrasonic cleaning, drying with nitrogen, placing it in an oven to dry, and then placing it in a plasma cleaning machine for argon treatment to obtain a pretreated glass substrate; S2, spin-coating a silica sol on the pretreated glass substrate and sintering it under nitrogen protection to form an anti-reflective layer; S3, after activating the anti-reflective layer, spin-coating a copolymer coating liquid, heating and curing it to obtain a dustproof photovoltaic anti-reflective coated glass. The present invention prepares a dense and uniform anti-reflective layer by spin-coating on an ultra-cleaned glass substrate through a sol-gel method, thereby significantly improving the overall light transmittance of the glass substrate, allowing more sunlight to reach the surface of the solar cell, and directly improving the photoelectric conversion efficiency of the photovoltaic module.

Description

Technical Field

[0001] The present invention relates to the technical field of photovoltaic glass, and in particular to dust-proof photovoltaic anti-reflection coated glass and a preparation method thereof. Background Art

[0002] Photovoltaic glass, the front-end encapsulation material for crystalline silicon solar cell modules, faces a critical constraint on improving the photovoltaic conversion efficiency of solar cells due to surface optical reflection loss. Coating technology achieves physical control of surface reflection by precisely depositing functional thin films and constructing specific optical interference structures. The core mechanism lies in the destructive interference effect induced by the thin film system. By controlling the optical thickness of the film, light reflected at the air-film interface and the film-glass interface at specific wavelengths, particularly those covering the visible light band and near-infrared spectrum, undergoes destructive interference with a phase difference of 180 degrees. This significantly reduces Fresnel reflection energy and ultimately increases the effective light transmittance of the glass substrate.

[0003] In the prior art, the invention patent with the patent publication number CN111704370A discloses an anti-reflective coated glass and its manufacturing method. By placing the glass substrate in an environment of 120-150°C for preheating before coating the glass substrate, and drying the glass substrate, the problem of moisture absorption and fogging on the surface of the glass substrate is avoided, thereby effectively improving the transmittance of the AR film layer. However, the surface energy of the film layer of coated glass is generally high, which is easy to absorb dust. Sand and dust particles are firmly attached to the surface through physical adsorption and chemical adsorption, reducing the transmittance. In addition, in arid and windy areas, frequent sand and dust abrasion destroys the microstructure of the film layer, and the high humidity environment causes dust compaction and microbial corrosion, further accelerating performance degradation. At the same time, traditional mechanical or hydraulic cleaning is expensive, and frequent cleaning damages the film layer. Rainwater self-cleaning is not feasible in arid areas. Summary of the Invention

[0004] In order to solve the problems mentioned in the above background technology, the present invention provides a dust-proof photovoltaic anti-reflection coated glass and a preparation method thereof.

[0005] In order to achieve the above object, the present invention adopts the following technical solutions:

[0006] A method for preparing dust-proof photovoltaic anti-reflection coated glass comprises the following steps:

[0007] S1. Immerse the glass substrate in acetone, ethanol, and deionized water in sequence for ultrasonic cleaning, blow dry with nitrogen, place in an oven to dry for 10-20 minutes, and then place in a plasma cleaning machine for argon treatment for 10-20 minutes to obtain a pretreated glass substrate;

[0008] S2. Prepare a sol with ethyl orthosilicate, ethanol, and water in a certain mass ratio, adjust the pH with 0.1 M hydrochloric acid, add tetrabutyl titanate, stir under magnetic stirring at 60-65°C for 4-6 hours, and then age for 24 hours to obtain a silica sol, spin-coat the silica sol on a pretreated glass substrate to a film thickness of 150±10 nm, pre-cure for 10-20 minutes, and sinter under nitrogen protection for 1-2 hours to form an anti-reflection layer;

[0009] S3. Immerse the anti-reflection layer in KH-792 aqueous solution for 1-3 minutes, bake for 5-6 minutes, and then spin-coat the copolymer coating liquid to control the film thickness to 100±10nm. Preheat for 10-20 minutes and heat and cure for 2-3 hours to obtain dust-proof photovoltaic anti-reflection coated glass.

[0010] Furthermore, the ultrasonic cleaning parameters in step S1 are: power of 100-200 W, frequency of 40-50 kHz, and 10-15 minutes each time; the plasma treatment conditions are: power of 100-150 W, and gas pressure of 50-55 Pa.

[0011] Furthermore, the raw materials of the silica sol in step S2 include ethyl orthosilicate, ethanol, water and tetrabutyl titanate, with a mass ratio of (20-22): (46-50): (72-75): (0.3-0.4), and a pH value of 1.8-2.2.

[0012] Furthermore, in step S2, the pre-curing temperature is 80-90°C, the sintering temperature is 480-500°C, the heating rate is 5-6°C / min, the spin coating speed is 3000-4000 rpm, and the spin coating time is 30-35s.

[0013] Furthermore, in step S3, the concentration of the KH-792 aqueous solution is 0.5-0.8 wt %, the pH value is 4.5-5.0, and the baking temperature is 100-105° C.

[0014] Furthermore, in step S3, the preheating temperature is 120-125° C., the curing temperature is 160-170° C., the heating rate is 2-3° C. / min, the spin coating speed is 3000-4000 rpm, and the spin coating time is 45-55 s.

[0015] Furthermore, the copolymer coating liquid in step S3 is prepared by the following steps:

[0016] Hexafluoroisopropyl acrylate, trimethylsilyl methacrylate and maleic anhydride are added to a reactor pre-charged with tetrahydrofuran. Under nitrogen protection, azobisisobutyronitrile is added, and the reaction is stirred in an oil bath for 12-18 hours. After the reaction is completed, it is quenched in an ice-water bath at 0°C. If necessary, 0.1% hydroquinone is added to terminate the reaction. The product is poured into n-hexane for precipitation, filtered, and washed with tetrahydrofuran / n-hexane for 3 times in a cycle, and vacuum dried at 40°C to constant weight to obtain a copolymer precipitate. The copolymer precipitate is dissolved in a mixed solvent of perfluorobutyl methyl ether and tetrahydrofuran to prepare a copolymer coating liquid with a concentration of 8-10wt%.

[0017] Furthermore, the temperature of the oil bath is 70-75° C., and the stirring speed is 200-300 rpm.

[0018] Furthermore, the mass ratio of hexafluoroisopropyl acrylate, trimethylsilyl methacrylate and maleic anhydride, tetrahydrofuran and azobisisobutyronitrile is (33-35):(11-13):(4-6):(190-210):(0.3-0.4), and the volume ratio of perfluorobutyl methyl ether and tetrahydrofuran is (4-4.5):(1-1.2).

[0019] According to another aspect of the present invention, there is provided dust-proof photovoltaic anti-reflection coated glass produced by the above-mentioned preparation steps.

[0020] Beneficial effects of the present invention:

[0021] 1. The present invention uses the sol-gel method to spin-coat a dense and uniform anti-reflection layer on an ultra-cleaned glass substrate, thereby significantly improving the overall light transmittance of the glass substrate, allowing more sunlight to reach the surface of the cell, and directly improving the photoelectric conversion efficiency of the photovoltaic module.

[0022] 2. A functionalized copolymer dustproof coating is superimposed on top of the antireflection layer. This ternary random copolymer is obtained through free radical copolymerization of hexafluoroisopropyl acrylate, trimethylsilyl methacrylate, and maleic anhydride. Pretreated with KH-792 silane coupling agent, the copolymer forms a fluorocarbon chain layer on the surface through spin coating and gradient curing. Simultaneously, the anhydride groups within the copolymer hydrolyze and form numerous high-strength covalent amide bonds in situ with the amino groups of KH-792, anchoring the dustproof layer to the antireflection layer. The siloxane segments impart overall flexibility and cohesion to the coating.

[0023] 3. In the technical solution of the present invention, the fluorocarbon chains highly enriched on the surface form a protective layer with low surface energy and super hydrophobicity, which effectively prevents the physical and chemical adsorption of dust particles. Rainwater or dewdrops can easily roll off and carry away the loose dust on the surface, achieving natural self-cleaning. The anchoring network composed of covalent amide bonds improves the interfacial bonding strength, so that the extremely thin dustproof coating can resist outdoor factors such as wind and sand abrasion, high humidity, temperature cycling, and ultraviolet aging. It is not easy to delaminate, peel or crack, and ensures the long-term stability of the dustproof function. Even in high dust or arid and windy areas, it can work effectively for a long time. The flexibility brought by the siloxane chain segment effectively absorbs impact stress and relieves thermomechanical stress, prevents the coating from brittle cracking under slight collisions or hot and cold shocks, and maintains the integrity and optical uniformity of the protective interface. DETAILED DESCRIPTION

[0024] The following will clearly and completely describe the technical solutions of the present invention in conjunction with the embodiments of the present invention. Obviously, the embodiments described are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making any creative efforts shall fall within the scope of protection of the present invention.

[0025] Preparation Example 1

[0026] The copolymer coating liquid comprises the following steps to prepare:

[0027] 330 g of hexafluoroisopropyl acrylate, 110 g of trimethylsilyl methacrylate and 40 g of maleic anhydride were added to a reactor pre-charged with 1900 g of tetrahydrofuran. Under nitrogen protection, 3 g of azobisisobutyronitrile was added. The mixture was stirred at 200 rpm in a 70°C oil bath for 12 hours. After the reaction, the mixture was quenched in an ice-water bath at 0°C. The product was poured into n-hexane for precipitation, filtered, and washed three times with tetrahydrofuran / n-hexane cycles. The mixture was vacuum-dried at 40°C to constant weight to obtain a copolymer precipitate. The copolymer precipitate was dissolved in a mixed solvent of perfluorobutyl methyl ether and tetrahydrofuran (4:1 v / v) to prepare a copolymer coating liquid with a concentration of 8 wt%.

[0028] Preparation Example 2

[0029] The copolymer coating liquid comprises the following steps to prepare:

[0030] 338 g of hexafluoroisopropyl acrylate, 123 g of trimethylsilyl methacrylate and 49 g of maleic anhydride were added to a reactor pre-charged with 2000 g of tetrahydrofuran. Under nitrogen protection, 3.4 g of azobisisobutyronitrile was added. The mixture was stirred at 250 rpm in a 72°C oil bath for 16 hours. After the reaction, the mixture was quenched in an ice-water bath at 0°C, and the product was poured into n-hexane for precipitation. After filtration, the product was washed three times with tetrahydrofuran / n-hexane in a cycle and dried in vacuo at 40°C to constant weight to obtain a copolymer precipitate. The copolymer precipitate was dissolved in a mixed solvent of perfluorobutyl methyl ether and tetrahydrofuran (4.2:1.1 v / v) to prepare a copolymer coating liquid with a concentration of 9 wt%.

[0031] Preparation Example 3

[0032] The copolymer coating liquid comprises the following steps to prepare:

[0033] 350 g of hexafluoroisopropyl acrylate, 130 g of trimethylsilyl methacrylate and 60 g of maleic anhydride were added to a reactor pre-charged with 2100 g of tetrahydrofuran. Under nitrogen protection, 4 g of azobisisobutyronitrile was added. The mixture was stirred at 300 rpm in a 75 ° C oil bath for 18 hours. After the reaction, it was quenched in an ice-water bath at 0 ° C. The product was poured into n-hexane for precipitation. After filtration, it was washed with tetrahydrofuran / n-hexane for 3 times in a cycle and dried in vacuo at 40 ° C to constant weight to obtain a copolymer precipitate. The copolymer precipitate was dissolved in a mixed solvent of perfluorobutyl methyl ether and tetrahydrofuran (4.5:1.2 v / v) to prepare a copolymer coating liquid with a concentration of 10 wt%.

[0034] Example 1

[0035] A method for preparing dust-proof photovoltaic anti-reflection coated glass comprises the following steps:

[0036] S1. Immerse the glass substrate in acetone, ethanol, and deionized water in sequence for ultrasonic cleaning at a power of 100 W, a frequency of 40 kHz, and 10 min each time. Blow dry with nitrogen and place in an oven to dry for 10 min. Place in a plasma cleaning machine and treat with argon for 10 min at a power of 100 W and a pressure of 50 Pa to obtain a pretreated glass substrate.

[0037] S2. Prepare a sol with 200 g of ethyl orthosilicate, 460 g of ethanol, and 720 g of water in a mass ratio, adjust the pH to 1.8 with 0.1 M hydrochloric acid, add 3 g of tetrabutyl titanate, and age at 60° C. for 24 hours after magnetic stirring at 60° C. to obtain a silica sol. Spin-coat the silica sol on a pretreated glass substrate at a speed of 3000 rpm for 30 seconds, pre-cure at 80° C. for 10 minutes, and heat to 480° C. at a rate of 5° C. / min under nitrogen protection. Sinter for 1 hour to form an antireflection layer.

[0038] S3. Immerse the anti-reflection layer in a 0.5wt% KH-792 aqueous solution with a pH value of 4.5 for 1 minute, bake at 100°C for 5 minutes, and then spin-coat the copolymer coating liquid prepared in Preparation Example 1 at a spin coating speed of 3000 rpm for 45 seconds. Preheat at 120°C for 10 minutes, heat to 160°C at a rate of 2°C / min, and cure for 2 hours to obtain dust-proof photovoltaic anti-reflection coated glass.

[0039] Example 2

[0040] A method for preparing dust-proof photovoltaic anti-reflection coated glass comprises the following steps:

[0041] S1. Immerse the glass substrate in acetone, ethanol, and deionized water in sequence for ultrasonic cleaning at a power of 150 W, a frequency of 45 kHz, and 12 minutes each time. Blow dry with nitrogen and place in an oven to dry for 15 minutes. Then place in a plasma cleaning machine for argon treatment for 15 minutes at a power of 120 W and a pressure of 52 Pa to obtain a pretreated glass substrate.

[0042] S2. Prepare a sol with 212 g of ethyl orthosilicate, 483 g of ethanol, and 739 g of water in a mass ratio, adjust the pH to 2.0 with 0.1 M hydrochloric acid, add 3.5 g of tetrabutyl titanate, and age at 62° C. with magnetic stirring for 5 h and then age for 24 h to obtain a silica sol. Spin-coat the silica sol on a pretreated glass substrate at a speed of 3500 rpm for 32 s, pre-cure at 84° C. for 15 min, and heat to 492° C. at a rate of 6° C. / min under nitrogen protection. Sinter for 1.5 h to form an antireflection layer.

[0043] S3. Immerse the anti-reflection layer in a KH-792 aqueous solution with a concentration of 0.6wt% and a pH value of 4.7 for 2 minutes, bake at 102°C for 5.5 minutes, and then spin-coat the copolymer coating liquid prepared in Preparation Example 2 at a spin coating speed of 3500rpm for 50 seconds. Preheat at 122°C for 15 minutes, heat to 165°C at a rate of 3°C / min, and cure for 2.5 hours to obtain dust-proof photovoltaic anti-reflection coated glass.

[0044] Example 3

[0045] A method for preparing dust-proof photovoltaic anti-reflection coated glass comprises the following steps:

[0046] S1. Immerse the glass substrate in acetone, ethanol, and deionized water in sequence for ultrasonic cleaning at a power of 200 W, a frequency of 50 kHz, and 15 minutes each time. Blow dry with nitrogen and place in an oven to dry for 20 minutes. Then place in a plasma cleaning machine for argon treatment for 20 minutes at a power of 150 W and a pressure of 55 Pa to obtain a pretreated glass substrate.

[0047] S2. Prepare a sol with 220 g of ethyl orthosilicate, 500 g of ethanol, and 750 g of water in a mass ratio, adjust the pH to 2.2 with 0.1 M hydrochloric acid, add 4 g of tetrabutyl titanate, and magnetically stir at 65° C. for 6 h and then age for 24 h to obtain a silica sol. Spin-coat the silica sol on a pretreated glass substrate at a speed of 4000 rpm for 35 s, pre-curing at 90° C. for 20 min, and heating to 500° C. at a rate of 6° C. / min under nitrogen protection. Sinter for 2 h to form an antireflection layer.

[0048] S3. Immerse the anti-reflection layer in a KH-792 aqueous solution with a concentration of 0.8wt% and a pH value of 5.0 for 3 minutes, bake at 105°C for 6 minutes, and then spin-coat the copolymer coating liquid prepared in Preparation Example 3 at a spin coating speed of 4000 rpm for 55 seconds. Preheat at 125°C for 20 minutes, heat to 170°C at a rate of 3°C / min, and cure for 3 hours to obtain dust-proof photovoltaic anti-reflection coated glass.

[0049] Comparative Example 1

[0050] The difference between this comparative example and Preparation Example 1 is that hexafluoroisopropyl acrylate is not added, and the remaining steps are the same as those in Preparation Example 1.

[0051] Comparative Example 2

[0052] The difference between this comparative example and Preparation Example 2 is that trimethylsilyl methacrylate is not added, and the remaining steps are the same as those in Preparation Example 2.

[0053] Comparative Example 3

[0054] The difference between this comparative example and Preparation Example 3 is that maleic anhydride is not added, and the remaining steps are the same as those in Preparation Example 3.

[0055] Comparative Example 4

[0056] The difference between this comparative example and Example 1 is that the coating liquid prepared in Comparative Example 1 is used, and the remaining steps are the same as those in Example 1.

[0057] Comparative Example 5

[0058] The difference between this comparative example and Example 2 is that the coating liquid prepared in Comparative Example 2 is used, and the remaining steps are the same as those in Example 2.

[0059] Comparative Example 6

[0060] The difference between this comparative example and Example 3 is that the coating liquid prepared in Comparative Example 3 is used, and the remaining steps are the same as those in Example 3.

[0061] Comparative Example 7

[0062] The difference between this comparative example and Example 1 is that the copolymer coating liquid is not spin-coated, and the remaining steps are the same as those in Example 1.

[0063] Refer to GB / T 2680-2021 "Determination of visible light transmittance, direct solar transmittance, total solar transmittance, ultraviolet transmittance and related window glass parameters of architectural glass". Prepare the coated glass of Examples 1-3 and Comparative Examples 4-7 into samples with a size of 50mm × 50mm × 3mm, clean them for later use, and prepare bare glass substrates (blank controls) for later use by the same cleaning method. Prepare five parallel samples for each group of samples. Place the sample close to the transmission port of the spectrophotometer, set the light source to a D65 standard light source, set the incident angle to 8°, and the measurement aperture to φ8mm. Scan at 380, 450, 555, 650, and 780nm, and record the visible light transmittance Tv. Measure the center point of each sample three times and take the average value. The formula is as follows:

[0064]

[0065] Among them, T(λ i ) is the wavelength λ i Spectral transmittance at V(λ i ) is the standard viewing function value; λ i 380, 450, 555, 650, 780nm.

[0066] The results are shown in Table 1:

[0067]

[0068] Coated glass samples from Examples 1-3 and Comparative Examples 4-7 were prepared into samples measuring 100 mm × 100 mm × 3 mm. The surfaces of the samples were wiped with ethanol and oven-dried at 50°C for 1 hour. The initial mass was measured, recorded as m0. The samples were placed in a homemade dust test chamber equipped with a 30° inclined support and an adjustable-speed blower. The samples were fixed to the 30° inclined support, with the center of the surface 20 cm from the blower. 10.0000 g of dust (a mixture of quartz sand and talc powder with a mass ratio of 1:1) was weighed and poured through a 200-mesh sieve. The sieve was moved at a constant speed to sprinkle the dust. The dust settled for 60 seconds. The blower was then turned on to sweep the surface vertically for 30 seconds at a speed of 5.0 ± 0.2 m / s. The scattered dust was then collected with a vacuum cleaner. The final mass of the sample and residual dust was measured, recorded as m1. The residual dust mass, dust adhesion rate, and dust removal efficiency were calculated. The formula is as follows:

[0069]

[0070] The results are shown in Table 2:

[0071]

[0072] As shown in Table 1, the visible light transmittance (Tv) of Examples 1-3 is higher than that of Comparative Examples 4-7 and the blank control. The Tv of Examples 1-3 ranges from 93.1% to 93.7%, while the Tv of Comparative Examples 4-7 ranges from 91.0% to 91.8%, and the Tv of the blank control is 90.8%. This demonstrates that the coated glasses of Examples 1-3 exhibit superior visible light transmittance.

[0073] As shown in Table 2, the dust removal efficiency of Examples 1-3 is significantly higher than that of Comparative Examples 4-7. The dust removal efficiency of Examples 1-3 ranges from 99.867% to 99.903%, while that of Comparative Examples 4-7 ranges from 99.302% to 99.667%. Furthermore, the dust adhesion rate of Examples 1-3 is much lower than that of Comparative Examples 4-7, and the residual dust mass is also lower. This demonstrates that the coated glass of Examples 1-3 has superior dust-proofing properties.

[0074] In the copolymer coating liquid, hexafluoroisopropyl acrylate contains fluorine elements. Fluorine atoms have lower surface energy and can reduce the surface tension of the coating, making it difficult for pollutants such as dust to adhere to the coating surface. In Comparative Example 4, hexafluoroisopropyl acrylate is not added, resulting in a relatively high surface energy of the coating, an increase in dust adhesion rate, a decrease in dust removal efficiency, and an impact on the visible light transmittance. The silicon element in trimethylsilyl methacrylate can improve the flexibility and weather resistance of the coating, while also contributing to reduced surface energy. Comparative Example 5 does not add trimethylsilyl methacrylate, and the performance of the coating decreases, the dust adhesion rate increases, and the visible light transmittance decreases. Maleic anhydride can copolymerize with other monomers, introduce polar groups, enhance the adhesion between the coating and the substrate, and also contribute to improving the chemical stability of the coating. Comparative Example 6 does not add maleic anhydride, and the performance of the coating is affected, the dust adhesion rate increases, and the visible light transmittance decreases.

[0075] In Examples 1-3, a low-surface-energy coating was formed on the anti-reflective layer by spin-coating a copolymer coating liquid. This effectively prevents the adhesion of contaminants such as dust. Furthermore, due to the good adhesion between the coating and the substrate, dust is easily removed by wind, thereby improving dust removal efficiency. Furthermore, the copolymer coating has a minimal effect on visible light transmission, improving visible light transmittance while maintaining dust-proof performance.

[0076] Comparative Example 7 does not spin-coat the copolymer coating liquid. Although the anti-reflection layer itself has certain properties, it lacks the low surface energy coating protection, and dust easily adheres to the surface, resulting in a high dust adhesion rate, low dust removal efficiency, and relatively low visible light transmittance.

[0077] In summary, the synergistic effect of hexafluoroisopropyl acrylate, trimethylsilyl methacrylate and maleic anhydride in the copolymer, as well as the formation of the copolymer coating layer, are the key factors for improving the visible light transmittance and dust-proof performance of dust-proof photovoltaic anti-reflection coated glass.

[0078] Throughout the specification, reference to terms such as "Preparation," "Example," or "Examples" indicates that the specific features, structures, materials, or characteristics described in conjunction with that embodiment or preparation are included in at least one embodiment or preparation of the present invention. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiment or preparation. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or preparations.

[0079] The above description is only a preferred specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any technician familiar with the technical field, within the technical scope disclosed by the present invention, who makes equivalent replacements or changes based on the technical solution and inventive concept of the present invention, should be covered by the scope of protection of the present invention.

Claims

1. A method for preparing dust-proof photovoltaic anti-reflection coated glass, characterized in that: The following steps are involved: S1. Immerse the glass substrate in acetone, ethanol, and deionized water in sequence for ultrasonic cleaning, blow dry with nitrogen, place in an oven to dry for 10-20 minutes, and then place in a plasma cleaning machine for argon treatment for 10-20 minutes to obtain a pretreated glass substrate; S2. Spin-coating the silica sol on the pretreated glass substrate, pre-curing for 10-20 minutes, and sintering under nitrogen protection for 1-2 hours to form an anti-reflection layer; S3, immersing the anti-reflection layer in a KH-792 aqueous solution for 1-3 minutes, baking for 5-6 minutes, then spin-coating the copolymer coating solution, preheating for 10-20 minutes, and heating and curing for 2-3 hours to obtain a dust-proof photovoltaic anti-reflection coated glass; The copolymer coating liquid in step S3 is prepared by the following steps: Hexafluoroisopropyl acrylate, trimethylsilyl methacrylate, and maleic anhydride are added to a reactor pre-charged with tetrahydrofuran, and azobisisobutyronitrile is added under nitrogen protection. The reaction is stirred in an oil bath for 12-18 hours. After the reaction is completed, the reaction is quenched in an ice-water bath, and the product is poured into n-hexane for precipitation. The product is filtered, washed, and dried to constant weight to obtain a copolymer precipitate. The copolymer precipitate is dissolved in a mixed solvent of perfluorobutyl methyl ether and tetrahydrofuran to prepare a copolymer coating liquid with a concentration of 8-10 wt%; The mass ratio of hexafluoroisopropyl acrylate, trimethylsilyl methacrylate and maleic anhydride, tetrahydrofuran and azobisisobutyronitrile is (33-35):(11-13):(4-6):(190-210):(0.3-0.4), and the volume ratio of perfluorobutyl methyl ether and tetrahydrofuran is (4-4.5):(1-1.2).

2. The method for preparing dust-proof photovoltaic anti-reflection coated glass according to claim 1, characterized in that: The ultrasonic cleaning parameters in step S1 are: power of 100-200 W, frequency of 40-50 kHz, and 10-15 minutes each time; the plasma treatment conditions are: power of 100-150 W, and gas pressure of 50-55 Pa.

3. The method for preparing dust-proof photovoltaic anti-reflection coated glass according to claim 1, characterized in that: The raw materials of the silica sol in step S2 include ethyl orthosilicate, ethanol, water and tetrabutyl titanate, with a mass ratio of (20-22): (46-50): (72-75): (0.3-0.4), and a pH value of 1.8-2.

2.

4. The method for preparing dust-proof photovoltaic anti-reflection coated glass according to claim 1, characterized in that: In step S2, the pre-curing temperature is 80-90°C, the sintering temperature is 480-500°C, the heating rate is 5-6°C / min, the spin coating speed is 3000-4000 rpm, and the spin coating time is 30-35s.

5. The method for preparing dust-proof photovoltaic anti-reflection coated glass according to claim 1, characterized in that: In step S3, the concentration of the KH-792 aqueous solution is 0.5-0.8 wt %, the pH value is 4.5-5.0, and the baking temperature is 100-105° C.

6. The method for preparing dust-proof photovoltaic anti-reflection coated glass according to claim 1, characterized in that: In step S3, the preheating temperature is 120-125° C., the curing temperature is 160-170° C., the heating rate is 2-3° C. / min, the spin coating speed is 3000-4000 rpm, and the spin coating time is 45-55 s.

7. The method for preparing dust-proof photovoltaic anti-reflection coated glass according to claim 1, characterized in that: The temperature of the oil bath is 70-75°C, and the stirring speed is 200-300 rpm.

8. A dust-proof photovoltaic anti-reflection coated glass produced by the preparation method according to any one of claims 1 to 7.

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