Alkaline etching solution and preparation method of anti-dazzle glass

Abstract

The invention discloses an alkaline etching solution and a preparation method of anti-dazzle glass, and the alkaline etching solution comprises the following components in parts by mass: 45-60 parts of sodium hydroxide; 10 to 25 parts of barium sulfate; 20 to 40 parts of glycerol and 40 to 55 parts of deionized water. The alkaline etching liquid is adopted, so that the phenomenon that hydrogen fluoride in the existing scheme hurts the environment and operators is avoided.

Description

Technical Field

[0001] The present invention relates to the technical field of glass products, and particularly to an alkaline etching solution and a method for preparing anti-glare glass. Background Art

[0002] In the existing process for surface treatment of glass to prepare anti-glare glass, the etching solution is mostly a fluorine-containing acidic solution. The main component in this etching solution that corrodes the glass is hydrogen fluoride. However, hydrogen fluoride is highly toxic and corrosive, and is extremely volatile, which can easily cause harm to operators and is not environmentally friendly.

[0003] How to improve the safety of the etching solution for operators has become an urgent technical problem in the industry. Summary of the Invention

[0004] In order to at least solve the above technical problems, the purpose of the present invention is to provide an alkaline etching solution, which avoids the harm to operators caused by the existing hydrogen fluoride.

[0005] To achieve the above purpose, the alkaline etching solution provided by the present invention, which is applied to the etching of anti-glare glass, includes:

[0006] The components of the alkaline etching solution include, by mass: 45 parts - 60 parts of sodium hydroxide; 10 parts - 25 parts of barium sulfate; 20 parts - 40 parts of glycerol, and 40 parts - 55 parts of deionized water.

[0007] Further, the components of the alkaline etching solution include, by mass: 50 parts - 55 parts of sodium hydroxide; 15 parts - 20 parts of barium sulfate; 30 parts - 35 parts of glycerol, and 45 parts - 50 parts of deionized water.

[0008] To achieve the above purpose, the preparation method of the alkaline etching solution provided by the present application includes:

[0009] Take 40 parts - 55 parts of deionized water, heat it to 85 °C and keep the temperature constant.

[0010] Take 45 parts - 60 parts of sodium hydroxide, add it to the deionized water, and stir until the sodium hydroxide is completely dissolved in the deionized water to form a sodium hydroxide solution;

[0011] Take 10 parts - 25 parts of barium sulfate and 20 - 40 parts of glycerol and add them to the sodium hydroxide solution, and stir until the sodium hydroxide solution is in a suspension state.

[0012] To achieve the above purpose, the preparation method of the anti-glare glass provided by the present application uses the above alkaline etching solution and includes:

[0013] Chemical etching, using the alkaline etching solution to etch the etched surface of the glass substrate;

[0014] Chemical polishing is carried out on the etched surface with an alkaline polishing solution;

[0015] Stop chemical polishing when the transmission haze of the etched surface reaches 3% - 85%.

[0016] Furthermore, each component of the alkaline polishing solution includes, by mass: 45 - 60 parts of sodium hydroxide; 40 - 55 parts of deionized water.

[0017] Furthermore, during chemical etching, the etching temperature of the alkaline etching solution is 115°C - 125°C;

[0018] The time for chemical etching is 3 min - 10 min.

[0019] Furthermore, the particle size range of barium sulfate in the alkaline etching solution is 3 μm - 20 μm.

[0020] Furthermore, the difference between the maximum and minimum particle sizes of barium sulfate is not greater than 5 μm.

[0021] Furthermore, the time for chemical polishing is 5 min - 135 min;

[0022] During chemical polishing, the working temperature of the alkaline polishing solution is 115°C - 125°C.

[0023] To achieve the above object, the anti - glare glass provided in this application is prepared by using the above - mentioned preparation method of anti - glare glass.

[0024] The alkaline etching solution, the preparation method of the alkaline etching solution, the preparation method of the anti - glare glass, and the anti - glare glass prepared by using the preparation method of the anti - glare glass in the embodiments of this application, by using the alkaline etching solution, avoid the occurrence of the harm phenomenon of the existing hydrogen fluoride to the operators. Because hydrogen fluoride is volatile and easily causes personal injury to the operators, and fluoride ions are highly toxic, and the usual treatment methods are more complex; compared with the existing acidic etching solution using hydrogen fluoride, sodium hydroxide has low volatility, and the waste liquid treatment is also simpler. Its waste liquid can be neutralized with acid, and the products are water and precipitates, which is very beneficial to environmental protection. When both the etching solution and the polishing solution are alkaline, the environmental protection ability is further improved.

[0025] Other features and advantages of this application will be described in the subsequent specification, and, in part, will become obvious from the specification, or will be understood by implementing this application. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] The drawings are used to provide a further understanding of this application, and constitute a part of the specification, and together with the embodiments of this application, are used to explain this application, and do not constitute a limitation to this application. In the drawings:

[0027] Figure 1 It is a schematic flow chart of the preparation method of the anti-glare glass according to an embodiment of the present application. Specific embodiments

[0028] The following will describe the preferred embodiments of the present application with reference to the accompanying drawings. It should be understood that the preferred embodiments described herein are only for the purpose of illustration and explanation of the present application, and are not intended to limit the present application.

[0029] The embodiments of the present application will be described in more detail below with reference to the accompanying drawings. Although some embodiments of the present application are shown in the drawings, it should be understood that the present application can be implemented in various forms and should not be construed as limited to the embodiments set forth herein. On the contrary, these embodiments are provided to more thoroughly and completely understand the present application. It should be understood that the drawings and embodiments of the present application are only for exemplary purposes and are not intended to limit the protection scope of the present application.

[0030] The term "including" and its variations used herein are open-ended, that is, "including but not limited to". The term "based on" is "at least partially based on". The term "one embodiment" means "at least one embodiment"; the term "another embodiment" means "at least one additional embodiment"; the term "some embodiments" means "at least some embodiments". The relevant definitions of other terms will be given in the following description.

[0031] It should be noted that the concepts such as "first" and "second" that may be mentioned in the present application are only used to distinguish different devices, components or parts, and are not intended to limit the order or interdependence relationship of the functions performed by these devices, components or parts.

[0032] It should be noted that the modification of "one" and "multiple" that may be mentioned in the present application is illustrative rather than restrictive. Those skilled in the art should understand that unless otherwise clearly specified in the context, it should be understood as "one or more". "Multiple" should be understood as two or more.

[0033] of the present application Figure 1 It is a schematic flow chart of the preparation method of the anti-glare glass according to an embodiment of the present application.

[0034] To make the purpose, technical solutions and advantages of the present application clearer, the embodiments of the present application will be further described in detail below with reference to the accompanying drawings.

[0035] Embodiment 1 The alkaline etching solution according to an embodiment of the present invention is applied to the etching of anti-glare glass, and can be understood as being used for the anti-glare treatment of the anti-glare surface of the anti-glare glass.

[0036] In an exemplary embodiment, the alkaline etching solution of the embodiments of the present application is used for etching glass products, and any glass product that can be corroded by sodium hydroxide can use the alkaline etching solution in the present application to produce anti-glare glass.

[0037] In an exemplary embodiment, the alkaline etching solution of the embodiments of the present application, each component is calculated by mass fraction and includes: 45 parts - 60 parts of sodium hydroxide; 10 parts - 25 parts of barium sulfate; 20 parts - 40 parts of glycerol, and 40 parts - 55 parts of deionized water.

[0038] In an exemplary embodiment, the alkaline etching solution of the embodiments of the present application, each component is calculated by mass fraction and includes: 48 - 58 parts of sodium hydroxide; 12 parts - 23 parts of barium sulfate; 25 parts - 35 parts of glycerol, and 48 parts - 55 parts of deionized water.

[0039] In an exemplary embodiment, the alkaline etching solution of the embodiments of the present application, each component is calculated by mass fraction and includes: 53 parts - 55 parts of sodium hydroxide; 15 parts - 20 parts of barium sulfate; 30 parts - 33 parts of glycerol, and 50 parts - 52 parts of deionized water.

[0040] In an exemplary embodiment, the alkaline etching solution of the embodiments of the present application, each component is calculated by mass fraction and includes: 50 parts - 55 parts of sodium hydroxide; 15 parts - 20 parts of barium sulfate; 30 parts - 35 parts of glycerol, and 45 parts - 50 parts of deionized water.

[0041] In an exemplary embodiment, the alkaline etching solution of the embodiments of the present application, each component is calculated by mass fraction and includes: 45 parts of sodium hydroxide; 10 parts of barium sulfate; 20 parts of glycerol, and 55 parts of deionized water.

[0042] In an exemplary embodiment, the alkaline etching solution of the embodiments of the present application, each component is calculated by mass fraction and includes: 60 parts of sodium hydroxide; 25 parts of barium sulfate; 40 parts of glycerol, and 40 parts of deionized water.

[0043] In an exemplary embodiment, the alkaline etching solution of the embodiments of the present application, each component is calculated by mass fraction and includes: 55 parts of sodium hydroxide; 25 parts of barium sulfate; 40 parts of glycerol, and 45 parts of deionized water.

[0044] In an exemplary embodiment, barium sulfate, that is, frosting; barium sulfate has weak alkalinity, is insoluble in deionized water and acid, has stable chemical properties, and has the characteristics of no magnetism and toxicity.

[0045] In an exemplary embodiment, barium sulfate also has the advantages of narrow particle size distribution range, good dispersibility, strong chemical inertness, good stability, acid and alkali resistance, moderate hardness, high relative density, high whiteness, and the ability to absorb harmful rays. It is an environmentally friendly material that is harmless to deionized water.

[0046] Example 2 In an exemplary embodiment, the embodiment of the present application is a method for preparing an alkaline etching solution.

[0047] In an exemplary embodiment, the method for preparing the alkaline etching solution of the embodiment of the present application is used to prepare the alkaline etching solution in Example 1, or it can be understood that the embodiment of the present application is for preparing the alkaline etching solution in Example 1.

[0048] In an exemplary embodiment, by mass, 40 parts - 55 parts of deionized water are taken, heated to 85°C and the temperature is kept constant, or it can be understood as being kept at 85°C.

[0049] In an exemplary embodiment, by mass, 45 parts - 60 parts of sodium hydroxide are taken, slowly added to the deionized water, and stirred until the sodium hydroxide is completely dissolved in the deionized water to form a sodium hydroxide solution.

[0050] In an exemplary embodiment, when adding sodium hydroxide to the deionized water, it can be added at a uniform speed.

[0051] In an exemplary embodiment, by mass, 10 parts - 25 parts of barium sulfate and 20 parts - 40 parts of glycerol are added to the sodium hydroxide solution, and stirred until the sodium hydroxide solution is in a suspension state.

[0052] In an exemplary embodiment, barium sulfate and glycerol can be added simultaneously.

[0053] Example 3 In an exemplary embodiment, the embodiment of the present application is a method for preparing an alkaline etching solution.

[0054] In an exemplary embodiment, the method for preparing the alkaline etching solution of the embodiment of the present application is used to prepare the alkaline etching solution in Example 1, or it can be understood that the embodiment of the present application is for preparing the alkaline etching solution in Example 1.

[0055] In an exemplary embodiment, by mass, 48 parts - 55 parts of deionized water are taken, heated to 85°C and the temperature is kept unchanged.

[0056] In an exemplary embodiment, by mass, 48 parts - 58 parts of sodium hydroxide are taken, slowly added to the deionized water, and stirred until the sodium hydroxide is completely dissolved in the deionized water to form a sodium hydroxide solution.

[0057] In an exemplary embodiment, 12 to 23 parts by mass of barium sulfate are taken and added into a sodium hydroxide solution. At the same time, 25 to 35 parts by mass of glycerol are taken and added into the sodium hydroxide solution, and the mixture is stirred until the sodium hydroxide solution becomes a suspension.

[0058] Example 4 In an exemplary embodiment, the embodiment of the present application is a method for preparing an alkaline etching solution.

[0059] In an exemplary embodiment, the method for preparing an alkaline etching solution according to the embodiment of the present application is used to prepare the alkaline etching solution in Example 1, or it can be understood that the embodiment of the present application is for preparing the alkaline etching solution in Example 1.

[0060] In an exemplary embodiment, 50 to 52 parts by mass of deionized water are taken, heated to 85 °C and the temperature is kept constant.

[0061] In an exemplary embodiment, 53 to 55 parts by mass of sodium hydroxide are taken, slowly added to the deionized water, and stirred until the sodium hydroxide is completely dissolved in the deionized water to form a sodium hydroxide solution.

[0062] In an exemplary embodiment, 15 to 20 parts by mass of barium sulfate are taken and added into the sodium hydroxide solution. At the same time, 30 to 33 parts by mass of glycerol are taken and added into the sodium hydroxide solution, and the mixture is stirred until the sodium hydroxide solution becomes a suspension.

[0063] Example 5 In an exemplary embodiment, the embodiment of the present application is a method for preparing an alkaline etching solution.

[0064] In an exemplary embodiment, the method for preparing an alkaline etching solution according to the embodiment of the present application is used to prepare the alkaline etching solution in Example 1, or it can be understood that the embodiment of the present application is for preparing the alkaline etching solution in Example 1.

[0065] In an exemplary embodiment, 40 parts by mass of deionized water are taken, heated to 85 °C and the temperature is kept constant.

[0066] In an exemplary embodiment, 60 parts by mass of sodium hydroxide are taken, slowly added to the deionized water, and stirred until the sodium hydroxide is completely dissolved in the deionized water to form a sodium hydroxide solution.

[0067] In an exemplary embodiment, 25 parts by mass of barium sulfate are taken and added into the sodium hydroxide solution. At the same time, 40 parts by mass of glycerol are taken and added into the sodium hydroxide solution, and the mixture is stirred until the sodium hydroxide solution becomes a suspension.

[0068] Example 6 In an exemplary embodiment, the embodiment of the present application is a method for preparing an alkaline etching solution.

[0069] In an exemplary embodiment, the method for preparing an alkaline etching solution in the embodiment of the present application is used to prepare the alkaline etching solution in Example 1, or it can be understood that the embodiment of the present application is for preparing the alkaline etching solution in Example 1.

[0070] In an exemplary embodiment, by mass, take 45 parts of deionized water, heat it to 85 °C and keep the temperature constant.

[0071] In an exemplary embodiment, by mass, take 55 parts of sodium hydroxide, slowly add it to the deionized water, and stir until the sodium hydroxide is completely dissolved in the deionized water to form a sodium hydroxide solution.

[0072] In an exemplary embodiment, by mass, take 25 parts of barium sulfate and add it to the sodium hydroxide solution. At the same time, take 40 parts of glycerol and add it to the sodium hydroxide solution, and stir until the sodium hydroxide solution is in a suspension state.

[0073] Example 7 In an exemplary embodiment, the embodiment of the present application is a method for preparing an alkaline etching solution.

[0074] In an exemplary embodiment, the method for preparing an alkaline etching solution in the embodiment of the present application is used to prepare the alkaline etching solution in Example 1, or it can be understood that the embodiment of the present application is for preparing the alkaline etching solution in Example 1.

[0075] In an exemplary embodiment, by mass, take 55 parts of deionized water, heat it to 85 °C and keep the temperature constant.

[0076] In an exemplary embodiment, by mass, take 45 parts of sodium hydroxide, slowly add it to the deionized water, and stir until the sodium hydroxide is completely dissolved in the deionized water to form a sodium hydroxide solution.

[0077] In an exemplary embodiment, by mass, take 10 parts of barium sulfate and add it to the sodium hydroxide solution. At the same time, take 20 parts of glycerol and add it to the sodium hydroxide solution, and stir until the sodium hydroxide solution is in a suspension state.

[0078] Example 8 In an exemplary embodiment, the embodiment of the present application is a method for preparing an anti-glare glass, using the alkaline etching solution of the above embodiment.

[0079] The preparation method of the anti-glare glass according to the embodiments of the present invention is used for surface treatment of the glass to perform the anti-glare function, such as the anti-glare glass for vehicles, the anti-glare glass on the surface of mobile terminals, and the like.

[0080] First, in step 101, chemical etching is performed. An alkaline etching solution is used to etch the etched surface of the glass substrate.

[0081] In an exemplary embodiment, the etched surface of the glass substrate, or the anti-glare surface, is chemically etched using the alkaline etching solution of the above embodiment.

[0082] In an exemplary embodiment, the etching temperature of the chemical etching solution is 115°C - 125°C.

[0083] In an exemplary embodiment, the time for chemical etching is 3 min - 10 min.

[0084] In an exemplary embodiment, the particle size range of barium sulfate in the alkaline etching solution is 3 μm - 20 μm.

[0085] In an exemplary embodiment, the difference between the maximum size and the minimum size of the particle size of barium sulfate is not greater than 5 μm.

[0086] In an exemplary embodiment, as needed, before chemical etching, it further includes a cleaning treatment of the etched surface of the glass substrate. The cleaning is to remove the surface impurities of the etched surface of the glass substrate to avoid affecting the etching accuracy of the etched surface during chemical etching.

[0087] In an exemplary embodiment, as needed, after the cleaning step, it further includes a drying treatment of the cleaned glass substrate.

[0088] In an exemplary embodiment, when the glass substrate has only one etched surface, a protective layer is attached to the opposite surface of the etched surface.

[0089] Step 102, chemical polishing. An alkaline polishing solution is used to perform chemical polishing on the etched surface.

[0090] In an exemplary embodiment, chemical polishing is performed. An alkaline polishing solution is used to perform chemical polishing on the etched surface.

[0091] In an exemplary embodiment, chemical polishing is stopped when the transmission haze of the etched surface reaches 3% - 85%.

[0092] In an exemplary embodiment, chemical polishing is stopped when the transmission haze of the etched surface is, for example, 3% - 30%, 30% - 60%, or 60% - 85%.

[0093] In an exemplary embodiment, the components of the chemical polishing solution include, by weight: 45-60 parts of sodium hydroxide; and 40-55 parts of deionized water.

[0094] In an exemplary embodiment, the components of the chemical polishing solution include, by weight, 48-58 parts of sodium hydroxide and 42-53 parts of deionized water.

[0095] In an exemplary embodiment, the components of the chemical polishing solution include, by weight: 50-55 parts of sodium hydroxide; and 45-50 parts of deionized water.

[0096] In an exemplary embodiment, the components of the chemical polishing solution include, by weight: 45 parts of sodium hydroxide; and 55 parts of deionized water.

[0097] In an exemplary embodiment, the components of the chemical polishing solution include, by weight: 55 parts of sodium hydroxide; 45 parts of deionized water.

[0098] In an exemplary embodiment, the chemical polishing time is 5 min-135 min.

[0099] In an exemplary embodiment, the working temperature of the alkaline polishing solution is 115°C-125°C.

[0100] In an exemplary embodiment, after chemical polishing is completed, the etched surface is further cleaned as needed.

[0101] In an exemplary embodiment, when the etching surface has only one side, the method further includes removing the protective layer attached to the opposite side of the etching surface after the chemical polishing is completed.

[0102] In an exemplary embodiment, the protective layer is an alkali corrosion resistant layer.

[0103] In an exemplary embodiment, the etched surface of the anti-glare glass of the present application has a 60-degree mirror glossiness of 15GU-130GU, a roughness of 0.04 μm-0.3 μm, and a haze of 3%-85%.

[0104] Example 9 Example 9 is a specific example of a method for preparing anti-glare glass.

[0105] In an exemplary embodiment, in order to facilitate comparison and reference of multiple embodiments in this application, glass substrates of the same model and material are deliberately selected, that is, Corning 2320 is uniformly selected.

[0106] In an exemplary embodiment, the method for preparing the anti-glare glass according to the embodiment of the present application uses the alkaline etching solution of the above embodiment, and the alkaline etching solution is prepared by the preparation method of the above alkaline etching solution.

[0107] In an exemplary embodiment, the mass fractions of the components in the alkaline etching solution in the present application are as follows: 45 parts of sodium hydroxide, 10 parts of barium sulfate, 20 parts of glycerol, and 55 parts of deionized water.

[0108] In an exemplary embodiment, the particle size of barium sulfate is 3 - 6 μm.

[0109] In an exemplary embodiment, the temperature of the alkaline etching solution is 115 °C, and the etching time is 7 minutes.

[0110] In an exemplary embodiment, the mass fractions of the components in the alkaline polishing solution are as follows: 45 parts of sodium hydroxide and 55 parts of deionized water.

[0111] In an exemplary embodiment, the temperature during chemical polishing is 115 °C, and the polishing time is 6 minutes.

[0112] In an exemplary embodiment, the transmission haze of the anti-glare surface of the embodiment of the present application is 83.3%.

[0113] The specular gloss of the etched surface of the anti-glare glass of the present application at a 60-degree angle is 15.1 GU, and the roughness is 0.087 μm.

[0114] Example 10 In an exemplary embodiment, the mass fractions of the components in the alkaline etching solution in the present application are as follows: 45 parts of sodium hydroxide, 10 parts of barium sulfate, 20 parts of glycerol, and 55 parts of deionized water.

[0115] In an exemplary embodiment, the particle size of barium sulfate is 8 - 12 μm.

[0116] In an exemplary embodiment, the temperature of the alkaline etching solution is 115 °C, and the etching time is 8 minutes.

[0117] In an exemplary embodiment, the mass fractions of the components in the alkaline polishing solution are as follows: 45 parts of sodium hydroxide and 55 parts of deionized water.

[0118] In an exemplary embodiment, the temperature during chemical polishing is 115 °C, and the polishing time is 15 minutes.

[0119] In an exemplary embodiment, the transmission haze of the anti-glare surface of the embodiment of the present application is 82.7%.

[0120] The 60-degree angular specular gloss of the etched surface of the anti-glare glass of the present application is 15.4 GU, and the roughness is 0.189 μm.

[0121] Example 11 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of the present application are as follows: 45 parts of sodium hydroxide, 10 parts of barium sulfate, 20 parts of glycerol, and 55 parts of deionized water.

[0122] In an exemplary embodiment, the particle size of barium sulfate is 15 - 20 μm.

[0123] In an exemplary embodiment, the temperature of the alkaline etching solution is 115 °C, and the etching time is 10 minutes.

[0124] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 45 parts of sodium hydroxide and 55 parts of deionized water.

[0125] In an exemplary embodiment, the temperature during chemical polishing is 115 °C, and the polishing time is 40 minutes.

[0126] In an exemplary embodiment, the transmission haze of the anti-glare surface of the example of the present application is 82.4%.

[0127] The 60-degree angular specular gloss of the etched surface of the anti-glare glass of the present application is 15.9 GU, and the roughness is 0.298 μm.

[0128] Example 12 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of the present application are as follows: 48 parts of sodium hydroxide, 12 parts of barium sulfate, 25 parts of glycerol, and 50 parts of deionized water.

[0129] In an exemplary embodiment, the particle size of barium sulfate is 3 - 6 μm.

[0130] In an exemplary embodiment, the temperature of the alkaline etching solution is 115 °C, and the etching time is 6 minutes.

[0131] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 48 parts of sodium hydroxide and 50 parts of deionized water.

[0132] In an exemplary embodiment, the temperature during chemical polishing is 115 °C, and the polishing time is 120 minutes.

[0133] In an exemplary embodiment, the transmission haze of the anti-glare surface of the example of the present application is 5.37%.

[0134] The specular gloss at a 60-degree angle of the etched surface of the anti-glare glass of this application is 106.8 GU, and the roughness is 0.05 μm.

[0135] Example 13 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of this application are as follows: 50 parts of sodium hydroxide, 15 parts of barium sulfate, 25 parts of glycerol, and 50 parts of deionized water.

[0136] In an exemplary embodiment, the particle size of barium sulfate is 8 - 12 μm.

[0137] In an exemplary embodiment, the temperature of the alkaline etching solution is 115 °C, and the etching time is 6 minutes.

[0138] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 50 parts of sodium hydroxide and 50 parts of deionized water.

[0139] In an exemplary embodiment, the temperature during chemical polishing is 115 °C, and the polishing time is 120 minutes.

[0140] In an exemplary embodiment, the transmission haze of the anti-glare surface of the example of this application is 5.45%.

[0141] The specular gloss at a 60-degree angle of the etched surface of the anti-glare glass of this application is 70.9 GU, and the roughness is 0.113 μm.

[0142] Example 14 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of this application are as follows: 55 parts of sodium hydroxide, 20 parts of barium sulfate, 30 parts of glycerol, and 45 parts of deionized water.

[0143] In an exemplary embodiment, the particle size of barium sulfate is 15 - 20 μm.

[0144] In an exemplary embodiment, the temperature of the alkaline etching solution is 115 °C, and the etching time is 6.5 minutes.

[0145] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 55 parts of sodium hydroxide and 45 parts of deionized water.

[0146] In an exemplary embodiment, the temperature during chemical polishing is 115 °C, and the polishing time is 122 minutes.

[0147] In an exemplary embodiment, the transmission haze of the anti-glare surface of the example of this application is 5.33%.

[0148] The specular gloss of the etched surface of the anti-glare glass of the present application at a 60-degree angle is 65.1 GU, and the roughness is 0.143 μm.

[0149] Example 15 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of the present application are as follows: 55 parts of sodium hydroxide, 18 parts of barium sulfate, 35 parts of glycerol, and 45 parts of deionized water.

[0150] In an exemplary embodiment, the particle size of barium sulfate is 3 - 6 μm.

[0151] In an exemplary embodiment, the temperature of the alkaline etching solution is 118 °C, and the etching time is 4.5 minutes.

[0152] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 55 parts of sodium hydroxide and 45 parts of deionized water.

[0153] In an exemplary embodiment, the temperature during chemical polishing is 118 °C, and the polishing time is 7 minutes.

[0154] In an exemplary embodiment, the transmission haze of the anti-glare surface of the embodiment of the present application is 83.1%.

[0155] The specular gloss of the etched surface of the anti-glare glass of the present application at a 60-degree angle is 15.2 GU, and the roughness is 0.089 μm.

[0156] Example 16 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of the present application are as follows: 55 parts of sodium hydroxide, 22 parts of barium sulfate, 40 parts of glycerol, and 50 parts of deionized water.

[0157] In an exemplary embodiment, the particle size of barium sulfate is 8 - 12 μm.

[0158] In an exemplary embodiment, the temperature of the alkaline etching solution is 118 °C, and the etching time is 3 minutes.

[0159] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 55 parts of sodium hydroxide and 50 parts of deionized water.

[0160] In an exemplary embodiment, the temperature during chemical polishing is 118 °C, and the polishing time is 17 minutes.

[0161] In an exemplary embodiment, the transmission haze of the anti-glare surface of the embodiment of the present application is 83.2%.

[0162] The 60-degree angular specular gloss of the etched surface of the anti-glare glass of this application is 15.4 GU, and the roughness is 0.192 μm.

[0163] Example 17 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of this application are as follows: 58 parts of sodium hydroxide, 25 parts of barium sulfate, 35 parts of glycerol, and 50 parts of deionized water.

[0164] In an exemplary embodiment, the particle size of barium sulfate is 15 - 20 μm.

[0165] In an exemplary embodiment, the temperature of the alkaline etching solution is 120 °C, and the etching time is 5 minutes.

[0166] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 58 parts of sodium hydroxide and 50 parts of deionized water.

[0167] In an exemplary embodiment, the temperature during chemical polishing is 120 °C, and the polishing time is 34 minutes.

[0168] In an exemplary embodiment, the transmission haze of the anti-glare surface of the example of this application is 82.4%.

[0169] The 60-degree angular specular gloss of the etched surface of the anti-glare glass of this application is 15.3 GU, and the roughness is 0.287 μm.

[0170] Example 18 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of this application are as follows: 55 parts of sodium hydroxide, 13 parts of barium sulfate, 28 parts of glycerol, and 45 parts of deionized water.

[0171] In an exemplary embodiment, the particle size of barium sulfate is 3 - 6 μm.

[0172] In an exemplary embodiment, the temperature of the alkaline etching solution is 120 °C, and the etching time is 4.5 minutes.

[0173] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 55 parts of sodium hydroxide and 45 parts of deionized water.

[0174] In an exemplary embodiment, the temperature during chemical polishing is 120 °C, and the polishing time is 123 minutes.

[0175] In an exemplary embodiment, the transmission haze of the anti-glare surface of the example of this application is 5.47%.

[0176] The 60-degree angular specular gloss of the etched surface of the anti-glare glass of this application is 105.7 GU, and the roughness is 0.061 μm.

[0177] Example 19 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of this application are as follows: 58 parts of sodium hydroxide, 15 parts of barium sulfate, 30 parts of glycerol, and 55 parts of deionized water.

[0178] In an exemplary embodiment, the particle size of barium sulfate is 8 - 12 μm.

[0179] In an exemplary embodiment, the temperature of the alkaline etching solution is 120 °C, and the etching time is 4 minutes.

[0180] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 58 parts of sodium hydroxide and 55 parts of deionized water.

[0181] In an exemplary embodiment, the temperature during chemical polishing is 120 °C, and the polishing time is 116 minutes.

[0182] In an exemplary embodiment, the transmission haze of the anti-glare surface of the example of this application is 5.37%.

[0183] The 60-degree angular specular gloss of the etched surface of the anti-glare glass of this application is 71.2 GU, and the roughness is 0.124 μm.

[0184] Example 20 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of this application are as follows: 52 parts of sodium hydroxide, 18 parts of barium sulfate, 25 parts of glycerol, and 45 parts of deionized water.

[0185] In an exemplary embodiment, the particle size of barium sulfate is 15 - 20 μm.

[0186] In an exemplary embodiment, the temperature of the alkaline etching solution is 120 °C, and the etching time is 7 minutes.

[0187] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 52 parts of sodium hydroxide and 45 parts of deionized water.

[0188] In an exemplary embodiment, the temperature during chemical polishing is 120 °C, and the polishing time is 118 minutes.

[0189] In an exemplary embodiment, the transmission haze of the anti-glare surface of the example of this application is 5.41%.

[0190] The 60-degree angular specular gloss of the etched surface of the anti-glare glass of the present application is 64.9 GU, and the roughness is 0.159 μm.

[0191] Example 21 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of the present application are as follows: 54 parts of sodium hydroxide, 10 parts of barium sulfate, 40 parts of glycerol, and 40 parts of deionized water.

[0192] In an exemplary embodiment, the particle size of barium sulfate is 3-6 μm.

[0193] In an exemplary embodiment, the temperature of the alkaline etching solution is 122 °C, and the etching time is 3 minutes.

[0194] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 54 parts of sodium hydroxide and 40 parts of deionized water.

[0195] In an exemplary embodiment, the temperature during chemical polishing is 122 °C, and the polishing time is 5 minutes.

[0196] In an exemplary embodiment, the transmission haze of the anti-glare surface of the embodiment of the present application is 85%.

[0197] The 60-degree angular specular gloss of the etched surface of the anti-glare glass of the present application is 15 GU, and the roughness is 0.092 μm.

[0198] Example 22 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of the present application are as follows: 52 parts of sodium hydroxide, 15 parts of barium sulfate, 33 parts of glycerol, and 50 parts of deionized water.

[0199] In an exemplary embodiment, the particle size of barium sulfate is 8-12 μm.

[0200] In an exemplary embodiment, the temperature of the alkaline etching solution is 125 °C, and the etching time is 5 minutes.

[0201] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 52 parts of sodium hydroxide and 50 parts of deionized water.

[0202] In an exemplary embodiment, the temperature during chemical polishing is 125 °C, and the polishing time is 16 minutes.

[0203] In an exemplary embodiment, the transmission haze of the anti-glare surface of the embodiment of the present application is 83.8%.

[0204] The 60-degree angular specular gloss of the etched surface of the anti-glare glass of the present application is 15.1 GU, and the roughness is 0.201 μm.

[0205] Example 23 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution in the present application are as follows: 54 parts of sodium hydroxide, 22 parts of barium sulfate, 30 parts of glycerol, and 52 parts of deionized water.

[0206] In an exemplary embodiment, the particle size of barium sulfate is 15 - 20 μm.

[0207] In an exemplary embodiment, the temperature of the alkaline etching solution is 118 °C, and the etching time is 9 minutes.

[0208] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 54 parts of sodium hydroxide and 52 parts of deionized water.

[0209] In an exemplary embodiment, the temperature during chemical polishing is 118 °C, and the polishing time is 36 minutes.

[0210] In an exemplary embodiment, the transmission haze of the anti-glare surface in the embodiment of the present application is 84.1%.

[0211] The 60-degree angle specular gloss of the etched surface of the anti-glare glass of the present application is 15.3 GU, and the roughness is 0.3 μm.

[0212] Example 24 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution in the present application are as follows: 55 parts of sodium hydroxide, 10 parts of barium sulfate, 35 parts of glycerol, and 45 parts of deionized water.

[0213] In an exemplary embodiment, the particle size of barium sulfate is 3 - 6 μm.

[0214] In an exemplary embodiment, the temperature of the alkaline etching solution is 120 °C, and the etching time is 4 minutes.

[0215] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 55 parts of sodium hydroxide and 45 parts of deionized water.

[0216] In an exemplary embodiment, the temperature during chemical polishing is 120 °C, and the polishing time is 27 minutes.

[0217] In an exemplary embodiment, the transmission haze of the anti-glare surface in the embodiment of the present application is 60.1%.

[0218] The 60-degree angle specular gloss of the etched surface of the anti-glare glass of the present application is 30.9 GU, and the roughness is 0.084 μm.

[0219] Example 25 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution in the present application are as follows: 45 parts of sodium hydroxide, 20 parts of barium sulfate, 30 parts of glycerol, and 55 parts of deionized water.

[0220] In an exemplary embodiment, the particle size of barium sulfate is 8 - 12 μm.

[0221] In an exemplary embodiment, the temperature of the alkaline etching solution is 123 °C, and the etching time is 8 minutes.

[0222] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 45 parts of sodium hydroxide and 55 parts of deionized water.

[0223] In an exemplary embodiment, the temperature during chemical polishing is 123 °C, and the polishing time is 39 minutes.

[0224] In an exemplary embodiment, the transmission haze of the anti-glare surface in the embodiment of the present application is 61.3%.

[0225] The 60-degree angle specular gloss of the etched surface of the anti-glare glass of the present application is 20.4 GU, and the roughness is 0.184 μm.

[0226] Example 26 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution in the present application are as follows: 48 parts of sodium hydroxide, 25 parts of barium sulfate, 20 parts of glycerol, and 55 parts of deionized water.

[0227] In an exemplary embodiment, the particle size of barium sulfate is 15 - 20 μm.

[0228] In an exemplary embodiment, the temperature of the alkaline etching solution is 125 °C, and the etching time is 10 minutes.

[0229] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 48 parts of sodium hydroxide and 55 parts of deionized water.

[0230] In an exemplary embodiment, the temperature during chemical polishing is 125 °C, and the polishing time is 57 minutes.

[0231] In an exemplary embodiment, the transmission haze of the anti-glare surface in the embodiment of the present application is 60.7%.

[0232] The 60-degree angle specular gloss of the etched surface of the anti-glare glass of the present application is 16.8 GU, and the roughness is 0.268 μm.

[0233] Example 27 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of the present application are as follows: 50 parts of sodium hydroxide, 15 parts of barium sulfate, 30 parts of glycerol, and 55 parts of deionized water.

[0234] In an exemplary embodiment, the particle size of barium sulfate is 3 - 6 μm.

[0235] In an exemplary embodiment, the temperature of the alkaline etching solution is 122 °C, and the etching time is 5 minutes.

[0236] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 50 parts of sodium hydroxide and 55 parts of deionized water.

[0237] In an exemplary embodiment, the temperature during chemical polishing is 122 °C, and the polishing time is 51 minutes.

[0238] In an exemplary embodiment, the transmission haze of the anti-glare surface of the embodiment of the present application is 42.1%.

[0239] The 60-degree angle specular gloss of the etched surface of the anti-glare glass of the present application is 35.3 GU, and the roughness is 0.081 μm.

[0240] Example 28 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of the present application are as follows: 50 parts of sodium hydroxide, 20 parts of barium sulfate, 33 parts of glycerol, and 52 parts of deionized water.

[0241] In an exemplary embodiment, the particle size of barium sulfate is 8 - 12 μm.

[0242] In an exemplary embodiment, the temperature of the alkaline etching solution is 120 °C, and the etching time is 7 minutes.

[0243] [[ID=3`2]]In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 50 parts of sodium hydroxide and 52 parts of deionized water.

[0244] In an exemplary embodiment, the temperature during chemical polishing is 120 °C, and the polishing time is 61 minutes.

[0245] In an exemplary embodiment, the transmission haze of the anti-glare surface of the embodiment of the present application is 41.2%.

[0246] The 60-degree angle specular gloss of the etched surface of the anti-glare glass of the present application is 26.4 GU, and the roughness is 0.169 μm.

[0247] Example 29 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of the present application are as follows: 58 parts of sodium hydroxide, 25 parts of barium sulfate, 20 parts of glycerol, and 40 parts of deionized water.

[0248] In an exemplary embodiment, the particle size of barium sulfate is 15 - 20 μm.

[0249] In an exemplary embodiment, the temperature of the alkaline etching solution is 125 °C, and the etching time is 4.5 minutes.

[0250] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 58 parts of sodium hydroxide, and 40 parts of deionized water.

[0251] In an exemplary embodiment, the temperature during chemical polishing is 125 °C, and the polishing time is 76 minutes.

[0252] In an exemplary embodiment, the transmission haze of the anti-glare surface of the embodiment of the present application is 41.5%.

[0253] The 60-degree angle specular gloss of the etched surface of the anti-glare glass of the present application is 18.4 GU, and the roughness is 0.231 μm.

[0254] Example 30 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of the present application are as follows: 50 parts of sodium hydroxide, 18 parts of barium sulfate, 30 parts of glycerol, and 45 parts of deionized water.

[0255] In an exemplary embodiment, the particle size of barium sulfate is 3 - 6 μm.

[0256] In an exemplary embodiment, the temperature of the alkaline etching solution is 118 °C, and the etching time is 5.5 minutes.

[0257] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 50 parts of sodium hydroxide, and 45 parts of deionized water.

[0258] In an exemplary embodiment, the temperature during chemical polishing is 118 °C, and the polishing time is 73 minutes.

[0259] In an exemplary embodiment, the transmission haze of the anti-glare surface of the embodiment of the present application is 20.2%.

[0260] The 60-degree angle specular gloss of the etched surface of the anti-glare glass of the present application is 68.3 GU, and the roughness is 0.072 μm.

[0261] Example 31 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of the present application are as follows: 55 parts of sodium hydroxide, 20 parts of barium sulfate, 35 parts of glycerol, and 50 parts of deionized water.

[0262] In an exemplary embodiment, the particle size of barium sulfate is 8 - 12 μm.

[0263] In an exemplary embodiment, the temperature of the alkaline etching solution is 125 °C, and the etching time is 3 minutes.

[0264] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 55 parts of sodium hydroxide and 50 parts of deionized water.

[0265] In an exemplary embodiment, the temperature during chemical polishing is 125 °C, and the polishing time is 84 minutes.

[0266] In an exemplary embodiment, the transmitted haze of the anti-glare surface of the embodiment of the present application is 19.8%.

[0267] The 60-degree angle specular gloss of the etched surface of the anti-glare glass of the present application is 45.5 GU, and the roughness is 0.148 μm.

[0268] Example 32 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of the present application are as follows: 53 parts of sodium hydroxide, 18 parts of barium sulfate, 32 parts of glycerol, and 48 parts of deionized water.

[0269] In an exemplary embodiment, the particle size of barium sulfate is 15 - 20 μm.

[0270] In an exemplary embodiment, the temperature of the alkaline etching solution is 118 °C, and the etching time is 8 minutes.

[0271] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 53 parts of sodium hydroxide and 48 parts of deionized water.

[0272] In an exemplary embodiment, the temperature during chemical polishing is 118 °C, and the polishing time is 95 minutes.

[0273] In an exemplary embodiment, the transmitted haze of the anti-glare surface of the embodiment of the present application is 20.4%.

[0274] The 60-degree angle specular gloss of the etched surface of the anti-glare glass of the present application is 30.4 GU, and the roughness is 0.194 μm.

[0275] Example 33 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of the present application are as follows: 55 parts of sodium hydroxide, 20 parts of barium sulfate, 30 parts of glycerol, and 45 parts of deionized water.

[0276] In an exemplary embodiment, the particle size of barium sulfate is 3 - 6 μm.

[0277] In an exemplary embodiment, the temperature of the alkaline etching solution is 115 °C, and the etching time is 4 minutes.

[0278] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 55 parts of sodium hydroxide and 45 parts of deionized water.

[0279] In an exemplary embodiment, the temperature during chemical polishing is 115 °C, and the polishing time is 124 minutes.

[0280] In an exemplary embodiment, the transmission haze of the anti-glare surface of the embodiment of the present application is 4.97%.

[0281] The 60-degree angle specular gloss of the etched surface of the anti-glare glass of the present application is 110.5 GU, and the roughness is 0.067 μm.

[0282] Example 34 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of the present application are as follows: 50 parts of sodium hydroxide, 18 parts of barium sulfate, 32 parts of glycerol, and 50 parts of deionized water.

[0283] In an exemplary embodiment, the particle size of barium sulfate is 8 - 12 μm.

[0284] In an exemplary embodiment, the temperature of the alkaline etching solution is 115 °C, and the etching time is 6 minutes.

[0285] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 50 parts of sodium hydroxide and 50 parts of deionized water.

[0286] In an exemplary embodiment, the temperature during chemical polishing is 115 °C, and the polishing time is 124 minutes.

[0287] In an exemplary embodiment, the transmission haze of the anti-glare surface of the embodiment of the present application is 5.24%.

[0288] The 60-degree angle specular gloss of the etched surface of the anti-glare glass of the present application is 70.7 GU, and the roughness is 0.138 μm.

[0289] Example 35 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of the present application are as follows: 60 parts of sodium hydroxide, 22 parts of barium sulfate, 30 parts of glycerol, and 40 parts of deionized water.

[0290] In an exemplary embodiment, the particle size of barium sulfate is 15 - 20 μm.

[0291] In an exemplary embodiment, the temperature of the alkaline etching solution is 125 °C, and the etching time is 3 minutes.

[0292] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 60 parts of sodium hydroxide and 40 parts of deionized water.

[0293] In an exemplary embodiment, the temperature during chemical polishing is 125 °C, and the polishing time is 126 minutes.

[0294] In an exemplary embodiment, the transmitted haze of the anti-glare surface of the embodiment of the present application is 5.19%.

[0295] The 60-degree angle specular gloss of the etched surface of the anti-glare glass of the present application is 63.9 GU, and the roughness is 0.166 μm.

[0296] Example 36 In an exemplary embodiment, the mass parts of each component in the alkaline etching solution of the present application are as follows: 52 parts of sodium hydroxide, 12 parts of barium sulfate, 35 parts of glycerol, and 55 parts of deionized water.

[0297] In an exemplary embodiment, the particle size of barium sulfate is 3 - 6 μm.

[0298] In an exemplary embodiment, the temperature of the alkaline etching solution is 120 °C, and the etching time is 4.5 minutes.

[0299] In an exemplary embodiment, the mass parts of each component in the alkaline polishing solution are as follows: 52 parts of sodium hydroxide and 55 parts of deionized water.

[0300] In an exemplary embodiment, the temperature during chemical polishing is 120 °C, and the polishing time is 135 minutes.

[0301] In an exemplary embodiment, the transmitted haze of the anti-glare surface of the embodiment of the present application is 3%.

[0302] The 60-degree angle specular gloss of the etched surface of the anti-glare glass of the present application is 130 GU, and the roughness is 0.04 μm.

[0303] Example 37 An anti-glare glass is prepared by using the preparation method of the anti-glare glass in the above embodiment.

[0304] Those of ordinary skill in the art can understand that the above are only preferred embodiments of the present application and are not intended to limit the present application. Although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or perform equivalent replacements for some of the technical features. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present application shall be included within the protection scope of the present application.

Claims

1. An alkaline etching solution is applied to the etching of antiglare glass, characterized in that The components of the alkaline etching solution include, by mass parts: 45 parts - 60 parts of sodium hydroxide; 10 parts - 25 parts of barium sulfate; 20 parts - 40 parts of glycerol, and 40 parts - 55 parts of deionized water.

2. The alkaline etchant according to claim 1, characterized in that, The components of the alkaline etching solution include, by mass parts: 50 parts - 55 parts of sodium hydroxide; 15 parts - 20 parts of barium sulfate; 30 parts - 35 parts of glycerol, and 45 parts - 50 parts of deionized water.

3. A method for preparing the alkaline etching solution according to any one of claims 1-2, characterized in that, Include: Take 40 parts - 55 parts of deionized water, heat it to 85 °C and keep the temperature constant; Take 45 parts - 60 parts of sodium hydroxide and add it into the deionized water, and stir until the sodium hydroxide is completely dissolved in the deionized water to form a sodium hydroxide solution; Take 10 parts - 25 parts of barium sulfate and 20 - 40 parts of glycerol and add them into the sodium hydroxide solution, and stir until the sodium hydroxide solution is in a suspension state.

4. A method for preparing an anti-glare glass, using the alkaline etching solution described in claim 1, characterized in that, Include: Chemical etching, using the alkaline etching solution to etch the etched surface of the glass substrate; Chemical polishing, using the alkaline polishing solution to chemically polish the etched surface; Stop the chemical polishing when the transmission haze of the etched surface reaches 3% - 85%.

5. The preparation method of the anti-glare glass according to claim 4, characterized in that, The components of the alkaline polishing solution include, by mass parts: 45 parts - 60 parts of sodium hydroxide; 40 parts - 55 parts of deionized water.

6. The preparation method of the anti-glare glass according to claim 4, wherein, During the chemical etching, the etching temperature of the alkaline etching solution is 115 °C - 125 °C; The time of the chemical etching is 3 min - 10 min.

7. The preparation method of the anti-glare glass according to claim 4, characterized in that, The particle size range of barium sulfate in the alkaline etching solution is 3 μm - 20 μm.

8. The preparation method of the anti-glare glass according to claim 7, wherein, The difference between the maximum size and the minimum size of the barium sulfate particle size is not more than 5 μm.

9. The preparation method of the anti-glare glass according to claim 4, characterized in that, The time of the chemical polishing is 5 min - 135 min; During the chemical polishing, the working temperature of the alkaline polishing solution is 115 °C - 125 °C.

10. An anti-glare glass, characterized in that, Prepared by using the preparation method of the anti-glare glass according to any one of claims 4 - 9.

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