Kaufman type plasma source integrated discharge chamber
Through integrated 3D printing technology, the anode cylinder, screen grid cylinder and insulating structure are combined, which solves the problems of complex assembly and sputtering pollution in the existing Kaufman-type plasma source, and achieves the effect of lightweight and efficient assembly.
Patent Information
- Application Number
- CN202510825727.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-06-19
- Publication Date
- 2025-07-29
AI Technical Summary
The discharge chamber structure of the existing Kaufman-type plasma source is difficult to process and assemble separately, the thin-wall structure is unevenly deformed in high-temperature environments, and the connection of fasteners leads to weight increase and sputter contamination, and the assembly is complex and inefficient.
3D printing technology is used to integrate the anode cylinder, screen grid cylinder, insulating structure and beam drainage structure, and titanium alloy or metal molybdenum and alumina ceramic materials to achieve coaxial coordination and no fastener connection inside.
The discharge chamber is simple, lightweight, good insulation and high assembly efficiency, reducing sputtering pollution and shortening production cycle.
Smart Images
Figure CN120390346A_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of aerospace technology, and more particularly, to an integrated discharge chamber of a Kaufman-type plasma source. Background Art
[0002] When a spacecraft operates in orbit, it interacts with factors such as plasma, solar radiation, and magnetic field environment in the surrounding space environment, which can trigger the charging and discharging effects on the spacecraft surface. Since the space charged environment varies greatly due to different satellite orbits, solar activities, geomagnetic activities, and shaded and illuminated areas, especially with the adoption of new satellite platforms, new technologies, and the extension of the satellite lifespan, the charging situation of the satellite has become more complex. Satellites developed in the future urgently need new technical means to meet the protection requirements for charging and discharging effects.
[0003] The spacecraft surface charging and discharging technology is usually divided into two categories: passive control and active control. Typical active potential controllers include three types: electron source type, ion source type, and plasma source type. The electron source type mainly emits electrons, such as hot filaments, electron emitters of hollow cathodes, and plasma contactors; the ion source type includes Geotail, Equators, ClusterII, etc.; the plasma source type includes the Flight Discharge System (FMDS) developed by AFGL and SHIELD developed by the U.S. Electric Propulsion Laboratory. Comparing the above three active potential controllers, the DSCD-Ⅲ satellite has proved that when a low-energy plasma beam is emitted on the satellite, it can discharge the charge accumulated on the satellite surface more effectively than emitting an ion beam or an electron beam alone.
[0004] The Kaufman-type plasma source belongs to an active potential control device of the plasma source type, which adaptively controls the satellite potential by emitting plasma into the environment to ensure the normal operation of the spacecraft. At present, the Kaufman-type discharge chambers applied on satellites have the following problems: the beam extraction structure, the screen grid cylinder structure, and the anode cylinder structure are generally processed and assembled separately, the internal space of the discharge chamber is small, the assembly is difficult and the efficiency is low; the screen grid cylinder structure and the screen grid extraction structure are assembled by screw fastening, and the high-temperature environment of the discharge chamber causes uneven deformation of the thin-wall screen grid or even structural failure; the screen grid cylinder structure and the anode cylinder structure are connected by insulating ceramic components, the structure is complex and the assembly accuracy is low; a large number of fasteners are used to connect the discharge chamber, the weight is greatly increased, and the fasteners will cause sputtering and pollute other important components (such as the cathode). Summary of the Invention
[0005] This application provides an integrated discharge chamber of a Kaufman-type plasma source, which realizes the integration of the anode cylinder, the screen grid cylinder, the insulating structure, and the beam extraction structure based on 3D printing technology.
[0006] To achieve the above object, the present application provides an integrated discharge chamber of a Kaufman-type plasma source, including a grid pole shoe, a 3D printing component, a support plate, and a cathode pole shoe, wherein: the 3D printing component is fixed on the support plate; the grid pole shoe is arranged at the top outside the 3D printing component; the cathode pole shoe is fixed on the support plate and located at the bottom inside the 3D printing component; the grid pole shoe, the 3D printing component, the cathode pole shoe, and the support plate are assembled in a coaxial matching manner; the 3D printing component includes a beam extraction structure, an anode cylinder structure, an insulating ceramic structure, and a screen grid cylinder structure, the beam extraction structure is arranged above the screen grid cylinder structure, the anode cylinder structure is arranged inside the screen grid cylinder structure, and the insulating ceramic structure is arranged between the anode cylinder structure and the screen grid cylinder structure.
[0007] Further, the 3D printing component is a printing structure integrated with a metal material and a ceramic material, the metal material is titanium alloy or molybdenum metal, and the ceramic material is alumina ceramic.
[0008] Further, the beam extraction structure is a thin-wall structure with a thickness of 0.5-1 mm, and a plurality of beam extraction through holes with a pore diameter of 1.5-2 mm are uniformly distributed thereon.
[0009] Further, the anode cylinder structure is an annular structure with a thickness of 1-2 mm, and a convex first hollow annular structure is printed on the outer wall of the anode cylinder structure.
[0010] Further, the screen grid cylinder structure is an annular structure with a thickness of 1-2 mm, and is integrally wound around the outside of the anode cylinder structure, and a convex second hollow annular structure is printed on the inner wall of the screen grid cylinder structure.
[0011] Further, the first hollow annular structure and the second hollow annular structure are arranged correspondingly; the insulating ceramic structure is a columnar ceramic and is arranged between the first hollow annular structure and the second hollow annular structure.
[0012] Further, the insulating ceramic structures are uniformly arranged along the axial direction, and the number is 4 groups or 6 groups.
[0013] Further, mechanical annular reinforcing ribs are printed on the outer walls of both the anode cylinder structure and the screen grid cylinder structure.
[0014] Further, the grid pole shoe, the cathode pole shoe, and the support plate are all made of high magnetic permeability materials.
[0015] Further, a plurality of through holes are provided on both the grid pole shoe and the support plate.
[0016] The integrated discharge chamber of the Kaufman-type plasma source provided by the present application has the following beneficial effects:
[0017] The present application realizes the integration of the anode cylinder, the screen grid cylinder, the insulation structure, and the beam extraction structure, achieves effective insulation between the anode cylinder and the screen grid cylinder of the discharge chamber, and realizes uniform deformation of the thin-walled structure of the beam extraction under high and low temperature environments. It has outstanding advantages of good insulation, simple structure, light weight, high reliability, and low production cost; the integrated discharge chamber is convenient and simple to install as a whole, has high assembly efficiency, and high relative position accuracy after assembly, which can effectively shorten the production cycle of the plasma source. Moreover, there are no fasteners inside the discharge chamber, and the sputtering pollution is low. BRIEF DESCRIPTION OF THE DRAWINGS
[0018] The drawings constituting a part of this application are used to provide a further understanding of this application, making other features, objectives, and advantages of this application more obvious. The schematic embodiments and descriptions of the drawings of this application are used to explain this application and do not constitute an improper limitation to this application. In the drawings:
[0019] Figure 1 is a schematic diagram of an integrated discharge chamber of a Kaufman-type plasma source provided according to an embodiment of this application;
[0020] Figure 2 is a cross-sectional view of an integrated discharge chamber of a Kaufman-type plasma source provided according to an embodiment of this application;
[0021] Figure 3 is a schematic diagram of the anode cylinder structure provided according to an embodiment of this application;
[0022] Figure 4 is a schematic diagram of the screen grid cylinder structure provided according to an embodiment of this application;
[0023] In the figure: 1 - grid pole shoe, 2 - 3D printing component, 3 - support plate, 4 - cathode pole shoe, 5 - beam extraction structure, 6 - anode cylinder structure, 61 - first hollow ring structure, 7 - insulating ceramic structure, 8 - screen grid cylinder structure, 81 - second hollow ring structure, 9 - mechanical ring stiffener. DETAILED DESCRIPTION OF THE EMBODIMENTS
[0024] In order to enable those skilled in the art to better understand the solution of this application, the technical solutions in the embodiments of this application will be clearly and completely described below with reference to the drawings in the embodiments of this application. Obviously, the described embodiments are only a part of the embodiments of this application, rather than all the embodiments. Based on the embodiments in this application, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of this application.
[0025] It should be noted that the terms "first", "second", etc. in the description, claims and the above-mentioned drawings of the present application are used to distinguish similar objects, and do not necessarily describe a specific order or sequence. It should be understood that the data used in this way can be interchanged under appropriate circumstances, so as to implement the embodiments of the present application described herein. In addition, the terms "including" and "having" and any variations thereof are intended to cover non-exclusive inclusion. For example, a process, method, system, product or device including a series of steps or units does not necessarily limit to those steps or units clearly listed, but may include other steps or units not clearly listed or inherent to these processes, methods, products or devices.
[0026] In the present application, the orientation or positional relationship indicated by the terms "upper", "lower", "left", "right", "front", "rear", "top", "bottom", "inner", "outer", "middle", "vertical", "horizontal", "lateral", "longitudinal", etc. is based on the orientation or positional relationship shown in the drawings. These terms are mainly used to better describe the present application and its embodiments, and are not used to limit that the indicated devices, elements or components must have a specific orientation or be constructed and operated in a specific orientation.
[0027] Moreover, in addition to being used to represent the orientation or positional relationship, some of the above terms may also be used to represent other meanings. For example, the term "upper" may also be used to represent a certain attachment relationship or connection relationship in some cases. For those of ordinary skill in the art, the specific meanings of these terms in the present application can be understood according to specific circumstances.
[0028] In addition, the meaning of the term "plural" should be two or more.
[0029] It should be noted that, without conflict, the embodiments in the present application and the features in the embodiments can be combined with each other. The present application will be described in detail below with reference to the drawings and in combination with the embodiments.
[0030] As Figure 1-2 shown, the present application provides an integrated discharge chamber of a Kaufman-type plasma source, including a grid pole shoe 1, a 3D printing component 2, a support plate 3, and a cathode pole shoe 4, wherein: the 3D printing component 2 is fixed on the support plate 3; the grid pole shoe 1 is arranged at the top outside the 3D printing component 2; the cathode pole shoe 4 is fixed on the support plate 3 and is located at the bottom inside the 3D printing component 2; the grid pole shoe 1, the 3D printing component 2, the cathode pole shoe 4, and the support plate 3 are assembled in a coaxial matching manner; the 3D printing component 2 includes a beam extraction structure 5, an anode cylinder structure 6, an insulating ceramic structure 7, and a screen grid cylinder structure 8. The beam extraction structure 5 is arranged above the screen grid cylinder structure 8, the anode cylinder structure 6 is arranged inside the screen grid cylinder structure 8, and the insulating ceramic structure 7 is arranged between the anode cylinder structure 6 and the screen grid cylinder structure 8.
[0031] Specifically, the Kaufman-type plasma source integrated discharge chamber provided by the embodiments of the present application is based on 3D printing technology. The anode cylinder, screen grid cylinder, insulation structure, and beam extraction structure 5 of the discharge chamber are directly printed and integrally formed, realizing the integration of the overall structure. The structure is simple and easy to install, effectively shortening the production cycle of the plasma source. The support plate 3 is used to fixedly support the 3D printing component 2 of the discharge chamber and assemble and connect with other components of the plasma source; the grid pole shoe 1 and the cathode pole shoe 4 serve as the magnetic field structure of the discharge chamber, which is used to optimize the magnetic field distribution and enhance the magnetic field efficiency; the grid pole shoe 1 is a stepped ring structure, which is sleeved on the top of the outside of the 3D printing component 2; the cathode pole shoe 4 is a ring-shaped cylinder structure, which is located at the bottom inside the 3D printing component 2 and fixed on the support plate 3; the grid pole shoe 1, the 3D printing component 2, the cathode pole shoe 4, and the support plate 3 are integrally assembled in a coaxial matching manner to jointly form the discharge chamber structure. The 3D printing component 2, as the main structure of the discharge chamber, is directly printed and formed by 3D printing technology to form the beam extraction structure 5, the anode cylinder structure 6, the insulating ceramic structure 7, and the screen grid cylinder structure 8.
[0032] Furthermore, the 3D printing component 2 is a printing structure integrating metal materials and ceramic materials. The metal material is titanium alloy or molybdenum metal, and the ceramic material is alumina ceramic. According to the different composition structures, different materials are used for printing each structure. In the embodiments of the present application, two materials, metal materials and ceramic materials, are used for integrated printing. The beam extraction structure 5, the anode cylinder structure 6, and the screen grid cylinder structure 8 are preferably printed with high-temperature-resistant titanium alloy or molybdenum metal materials; while the insulating ceramic structure 7 is preferably printed with alumina ceramic with good insulation performance and high strength.
[0033] Furthermore, the beam extraction structure 5 is a thin-wall structure with a thickness of 0.5 - 1 mm, and a plurality of beam extraction through holes with a pore diameter of 1.5 - 2 mm are evenly distributed thereon. The beam extraction structure 5 is arranged above the overall 3D printing component 2, and the beam is extracted through the plurality of beam extraction through holes.
[0034] Furthermore, as Figure 3 shown, the anode cylinder structure 6 is a ring structure with a thickness of 1 - 2 mm, and a convex first hollow ring structure 61 is printed on the outer wall of the anode cylinder structure 6.
[0035] Furthermore, as Figure 4 shown, the screen grid cylinder structure 8 is a ring structure with a thickness of 1 - 2 mm, and is integrally surrounded outside the anode cylinder structure 6. A convex second hollow ring structure 81 is printed on the inner wall of the screen grid cylinder structure 8.
[0036] Furthermore, the first hollow annular structure 61 and the second hollow annular structure 81 are correspondingly arranged; the insulating ceramic structure 7 is a columnar ceramic and is arranged between the first hollow annular structure 61 and the second hollow annular structure 81.
[0037] Specifically, both the anode cylinder structure 6 and the screen grid cylinder structure 8 are annular structures. The screen grid cylinder structure 8 is integrally sleeved on the periphery of the anode cylinder structure 6, and the two are fixedly connected in insulation through the insulating ceramic structure 7. A raised first hollow annular structure 61 is printed on the outer wall of the anode cylinder structure 6, and a raised second hollow annular structure 81 is printed on the inner wall of the screen grid cylinder. The first hollow annular structure 61 and the second hollow annular structure 81 are correspondingly arranged, and a card slot is formed in the middle; the insulating ceramic structure 7 is printed on the card slot. The insulating ceramic structure 7 is preferably a columnar ceramic and is used for the insulation between the screen grid cylinder structure 8 and the anode cylinder structure 6.
[0038] Furthermore, the insulating ceramic structures 7 are arranged evenly along the axis, and the number is 4 groups or 6 groups. In order to achieve effective insulation between the anode cylinder structure 6 and the screen grid cylinder structure 8, both the insulating ceramic structures 7 and the raised hollow annular structures are evenly distributed along the axis. According to the overall size, it is preferably set to 4 groups or 6 groups.
[0039] Furthermore, mechanical annular reinforcing ribs 9 are printed on the outer walls of both the anode cylinder structure 6 and the screen grid cylinder structure 8. In order to ensure the strength of the anode cylinder structure 6 and the screen grid cylinder structure 8, multiple groups of mechanical annular reinforcing ribs 9 are arranged on their outer walls.
[0040] Furthermore, the grid pole shoe 1, the cathode pole shoe 4, and the support plate 3 are all made of high magnetic permeability materials. The grid pole shoe 1, the cathode pole shoe 4, and the support plate 3, as part of the magnetic field structure of the discharge chamber, are all made of high magnetic permeability materials, preferably 4J29 material or 4J33 material.
[0041] Furthermore, a plurality of through holes are provided on both the grid pole shoe 1 and the support plate 3. Uniform through holes are machined on the grid pole shoe 1 for connection and assembly with the discharge chamber magnetic field generating device (electromagnetic coil or permanent magnet); uniform through holes are machined on the support plate 3 for connection and assembly with other components of the plasma source.
[0042] Specifically, the Kaufman-type plasma source integrated discharge chamber provided by the embodiment of the present application uses 3D printing technology to integrally print the beam extraction structure 5, the anode cylinder structure 6, the insulating ceramic structure 7, and the screen grid cylinder structure 8. There are no fasteners connected inside, the sputtering pollution is low, the structure is simple, and it is convenient for assembly. At the same time, effective insulation between the anode cylinder structure 6 and the screen grid cylinder structure 8 of the discharge chamber is achieved, greatly shortening the production cycle of the plasma source.
[0043] The above are only the preferred embodiments of the present application and are not intended to limit the present application. For those skilled in the art, various changes and modifications can be made to the present application. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included within the protection scope of the present application.
Claims
1. An integrated discharge chamber of a Kaufman-type plasma source, characterized in that It includes a grid pole shoe, a 3D printing component, a support plate, and a cathode pole shoe, where: The 3D printing component is fixed on the support plate; The grid pole shoe is arranged at the top outside the 3D printing component; The cathode pole shoe is fixed on the support plate and is located at the bottom inside the 3D printing component; The grid pole shoe, the 3D printing component, the cathode pole shoe, and the support plate are assembled in a coaxial fitting manner; The 3D printing component includes a beam extraction structure, an anode cylinder structure, an insulating ceramic structure, and a screen grid cylinder structure. The beam extraction structure is arranged above the screen grid cylinder structure, the anode cylinder structure is arranged inside the screen grid cylinder structure, and the insulating ceramic structure is arranged between the anode cylinder structure and the screen grid cylinder structure.
2. The Kaufman-type plasma source integrated discharge chamber according to claim 1, wherein The 3D printing component is a printing structure integrated with metal material and ceramic material. The metal material is titanium alloy or molybdenum metal, and the ceramic material is alumina ceramic.
3. The Kaufman-type plasma source integrated discharge chamber according to claim 2, characterized in that, The beam extraction structure is a thin-walled structure with a thickness of 0.5 - 1 mm, and is evenly distributed with a plurality of beam extraction through holes with a pore diameter of 1.5 - 2 mm.
4. The Kaufman-type plasma source integrated discharge chamber according to claim 3, wherein The anode cylinder structure is a ring structure with a thickness of 1 - 2 mm, and a convex first hollow ring structure is printed on the outer wall of the anode cylinder structure.
5. The Kaufman type plasma source integrated discharge chamber according to claim 4, characterized in that, The screen grid cylinder structure is a ring structure with a thickness of 1 - 2 mm, and is integrally surrounded outside the anode cylinder structure. A convex second hollow ring structure is printed on the inner wall of the screen grid cylinder structure.
6. The Kaufman type plasma source integrated discharge chamber according to claim 5, characterized in that, The first hollow ring structure and the second hollow ring structure are arranged correspondingly; the insulating ceramic structure is a columnar ceramic and is arranged between the first hollow ring structure and the second hollow ring structure.
7. The Kaufman-type plasma source integrated discharge chamber according to claim 6, characterized in that, The insulating ceramic structures are evenly distributed along the axis, and the number is 4 groups or 6 groups.
8. The Kaufman-type plasma source integrated discharge chamber according to claim 7, characterized in that, Mechanical ring stiffeners are printed on the outer walls of both the anode cylinder structure and the screen grid cylinder structure.
9. The Kaufman-type plasma source integrated discharge chamber according to claim 8, characterized in that, The grid pole shoe, the cathode pole shoe, and the support plate are all made of high magnetic permeability materials.
10. The Kaufman-type plasma source integrated discharge chamber according to claim 9, characterized in that, A plurality of through holes are arranged on both the grid pole shoe and the support plate.