Method for purifying hydrogen peroxide

Abstract

The invention relates to a method for purifying hydrogen peroxide. More specifically, the method comprises the steps of: regenerating the adsorbent resin of the primary purification system using an acidic solution, an alkaline solution, or a combination thereof; purifying the hydrogen peroxide crude product by using the adsorption resin of the primary purification system; and purifying the primarily purified hydrogen peroxide solution using a secondary purification system. The secondary purification system comprises an electrodeionization system, and the adsorption resin is used for removing organic carbon and positive ions in the hydrogen peroxide crude product.

Description

Technical Field

[0001] The present invention relates to a method for purifying hydrogen peroxide, and more particularly to a method for purifying hydrogen peroxide comprising an electrodeionization process. Background Art

[0002] Hydrogen peroxide has a strong oxidizing power, and its decomposition products are harmless. Therefore, hydrogen peroxide is used as an oxidizing agent, a bleaching agent for silk and wool, and a catalyst for vinyl polymerization in the plastics industry. In addition to the aforementioned uses, hydrogen peroxide is also used to clean display wafers and semiconductor wafers.

[0003] With the advent of the information age, the field of displays that visually express electronic information signals has developed rapidly. In response, various display devices with excellent performance (such as reduced thickness, light weight, and low power consumption) are being developed.

[0004] A representative example is an organic light-emitting diode (OLED) display device, which involves the deposition and patterning of various materials on a substrate. During this deposition and patterning process, conductive members, such as metal masks, may be used. Due to these deposition and patterning processes, the display substrate may become contaminated with various materials, necessitating a cleaning process for the display substrate. A representative wet cleaning method for display substrates is a chemical wet cleaning method using hydrogen peroxide.

[0005] Semiconductor wafer cleaning techniques can be categorized as wet cleaning or dry cleaning. The cleaning process is similar to etching in that both remove substances from the semiconductor wafer surface, but differs in that the cleaning process selectively removes impurities present on the semiconductor wafer surface. A representative wet cleaning method is a chemical wet cleaning method using hydrogen peroxide. Summary of the Invention

[0006] Technical issues

[0007] The present invention provides a method for purifying hydrogen peroxide, which can produce high-purity hydrogen peroxide.

[0008] The present invention provides a method for improving the performance and stability of an electrodeionization system for hydrogen peroxide purification.

[0009] Technical Solution

[0010] A method for purifying hydrogen peroxide according to one inventive concept of the present invention may include: regenerating an adsorption resin of a primary purification system using an acidic solution, an alkaline solution, or a combination thereof; purifying a crude hydrogen peroxide product using the adsorption resin of the primary purification system; and purifying the primary purified hydrogen peroxide solution using a secondary purification system. The secondary purification system may include an electrodeionization system, and the adsorption resin may remove organic carbon and cations from the crude hydrogen peroxide product.

[0011] A method for manufacturing an electronic device according to another aspect of the present invention may include performing a cleaning process on a substrate using hydrogen peroxide purified according to the method for purifying hydrogen peroxide.

[0012] Beneficial effects

[0013] The method for purifying hydrogen peroxide according to the present invention can obtain high-purity hydrogen peroxide in high yield and large quantities using an electrodeionization system. The method for purifying hydrogen peroxide according to the present invention can remove organic carbon and cations from hydrogen peroxide by using an adsorption resin system prior to the electrodeionization system. In particular, by increasing the stability of hydrogen peroxide above a reference value using only a single adsorption resin system, the stability and impurity removal efficiency of the electrodeionization system can be improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 is a schematic diagram for describing a hydrogen peroxide purification system according to an embodiment of the present invention.

[0015] Figure 2 is used to describe Figure 1 Schematic diagram of the electrodeionization system in the hydrogen peroxide purification system.

[0016] Figure 3 is a flow chart for describing a hydrogen peroxide purification process and an adsorption resin regeneration process according to an embodiment of the present invention.

[0017] Figure 4 is a flow chart for describing a hydrogen peroxide purification process and an adsorption resin regeneration process according to another embodiment of the present invention.

[0018] Figure 5 is a schematic diagram for describing a hydrogen peroxide purification system according to an embodiment of the present invention.

[0019] Figure 6 is a schematic diagram for describing a substrate cleaning process using purified hydrogen peroxide according to an embodiment of the present invention. DETAILED DESCRIPTION

[0020] To facilitate a full understanding of the configuration and effects of the present invention, preferred embodiments of the present invention will be described with reference to the accompanying drawings. However, the present invention is not limited to the embodiments described below and can be implemented in various forms and can be changed in various alternative forms. On the contrary, these embodiments are provided so that the present disclosure will be sufficient and complete and will fully convey the scope of the present invention to those skilled in the art to which the present invention pertains.

[0021] In this specification, when it is mentioned that one element is on another element, this means that the element can be directly formed on the other element, or a third element can be interposed between them. Additionally, in the drawings, for the effective description of the technical content, the thickness of the elements is enlarged. Throughout the specification, the same reference numerals refer to the same elements.

[0022] Although terms such as first, second, and third are used in various embodiments of this specification to describe a plurality of elements, these elements should not be limited by these terms. These terms are only used to distinguish one element from another. The embodiments described and illustrated herein also include their complementary embodiments.

[0023] The terms used herein are for the purpose of describing embodiments and are not intended to limit the present invention. In this specification, unless the context clearly indicates otherwise, the singular form includes the plural form. As used herein, the terms 'comprises' and / or 'comprising' are intended to include the stated elements and do not exclude the possibility of the presence or addition of one or more other elements.

[0024] Figure 1 is a schematic diagram for describing a hydrogen peroxide purification system according to an embodiment of the present invention. Figure 2 is for describing Figure 1 the electrodeionization system of the hydrogen peroxide purification system in

[0025] Referring to Figure 1 and Figure 2 , the hydrogen peroxide purification system may include a primary purification system PFS1 and a secondary purification system PFS2. The hydrogen peroxide crude product R is purified successively through the primary purification system PFS1 and the secondary purification system PFS2, and finally the purified hydrogen peroxide P can be obtained from the hydrogen peroxide crude product R.

[0026] The hydrogen peroxide crude product R can be prepared by the alkyl anthraquinone process. The hydrogen peroxide crude product R can be a product synthesized by the alkyl anthraquinone hydrogenation-oxygenation reaction. The hydrogen peroxide crude product R can be a product of the alkyl anthraquinone process that has not undergone a purification process (such as distillation).

[0027] Specifically, when hydrogen is added to alkyl anthraquinone to produce hydroquinone, and then the hydroquinone reacts with oxygen in the air, the hydroquinone is reduced back to anthraquinone, which can produce hydrogen peroxide. The crude hydrogen peroxide product R can be obtained by adding water to the anthraquinone and hydrogen peroxide that are the products of the oxidation reaction for extraction.

[0028] The crude hydrogen peroxide product R produced by the alkyl anthraquinone process can contain metal impurities with a concentration of 100 ppb or more, such as Al, Ni, and Cr, anion impurities with a concentration of 100 ppb or more, such as PO4 3- 、SO4 2- 、NO3 - and Cl - , and total organic carbon (TOC) with a concentration of 100 ppm or more.

[0029] The crude hydrogen peroxide product R can be introduced into the primary purification system PFS1. The primary purification system PFS1 according to an embodiment of the present invention can be a resin system.

[0030] The resin system according to the present invention can include an adsorption resin composed of a porous polymer. The resin system can remove organic carbon from the crude hydrogen peroxide product R through an adsorption filter filled with the adsorption resin. The adsorption resin according to an embodiment of the present invention can not only remove organic carbon from the crude hydrogen peroxide product R, but also remove cations.

[0031] The adsorption resin according to an embodiment of the present invention can include porous polymer particles. The specific surface area of the adsorption resin can be in the range of 300 m 2 / g to 1,000 m 2 / g. More specifically, the specific surface area of the adsorption resin can be in the range of 300 m 2 / g to 800 m 2 / g.

[0032] The average pore diameter (or diameter) of the adsorption resin can be in the range of 10 Å to 200 Å. More specifically, the average pore diameter of the adsorption resin can be in the range of 40 Å to 100 Å. The pore volume of the adsorption resin can be in the range of 0.5 mL / g to 2 mL / g. The average particle size of the adsorption resin can be in the range of 0.3 mm to 2 mm.

[0033] The adsorption resin according to the present invention can be non-polar (or neutral) and does not carry a charge. In an embodiment of the present invention, the adsorption resin can include a hydrophobic polymer. The polymer of the adsorption resin can have a hydrophobic group. For example, the hydrophobic group can include an alkyl group having 1 to 20 carbon atoms. The adsorption resin according to the present invention can be a hydrophobic adsorption resin without an ion exchange group.

[0034] The polymer of the adsorption resin may comprise a polyaromatic compound. More specifically, the polymer of the adsorption resin may comprise an aromatic polymer bound to a hydrophobic group. For example, the polymer of the adsorption resin may comprise at least one selected from the group consisting of a styrene / divinylbenzene copolymer, a styrene / trivinylbenzene copolymer, and a vinyltoluene / divinylbenzene copolymer. Preferably, the hydrophobic group may be bound to the copolymer.

[0035] The adsorption resin according to the present invention can be a non-polar resin that does not carry an electric charge. In one embodiment of the present invention, ion exchange resins having cationic / anionic functional groups can be excluded from the adsorption resin of the present invention. The adsorption resin according to the present invention described above can not only adsorb and remove organic carbon from the crude hydrogen peroxide product R, but also adsorb and remove cations.

[0036] Impurities in the crude hydrogen peroxide product R can be partially removed by the primary purification system PFS1, and a primary purified hydrogen peroxide solution PS can be obtained. The TOC concentration in the primary purified hydrogen peroxide solution PS can be reduced to less than 100 ppm by the adsorption resin used in the primary purification system PFS1. The ion concentration in the primary purified hydrogen peroxide solution PS can be reduced by the adsorption resin used in the primary purification system PFS1.

[0037] In another embodiment of the present invention, the adsorption resin in the primary purification system PFS1 may include an ionic resin in addition to the neutral resin. In other words, the adsorption resin of the present invention may be a mixture of a neutral resin and an ionic resin. The ionic resin can more effectively remove ions in the primary purification system PFS1.

[0038] The cations in the crude hydrogen peroxide product R may be adsorbed onto the adsorption resin of the primary purification system PFS1 , so that the concentration of the cations in the primary purified hydrogen peroxide solution PS may be lower than the concentration of the cations in the crude hydrogen peroxide product R.

[0039] The primary purified hydrogen peroxide solution PS can be introduced into a secondary purification system PFS2. The secondary purification system PFS2 can include an electrodeionization system EDI. The electrodeionization system EDI can be used to perform an electrodeionization process on the hydrogen peroxide solution PS.

[0040] Refer again Figure 2The electrodeionization system EDI may include a first electrode ELa, a second electrode ELc, a first concentrate chamber CC1, a second concentrate chamber CC2, and a diluent chamber DC between the first concentrate chamber CC1 and the second concentrate chamber CC2. The first concentrate chamber CC1 and the second concentrate chamber CC2, as well as the diluent chamber DC, may be located between the first electrode ELa and the second electrode ELc. For example, the first electrode ELa may be an anode, and the second electrode ELc may be a cathode.

[0041] Anion exchange membranes EMa and cation exchange membranes EMc may be alternately disposed between the first electrode ELa and the second electrode ELc. For example, the anion exchange membrane EMa may be interposed between the first concentrate chamber CC1 and the dilute chamber DC, and between the second concentrate chamber CC2 and the second electrode ELc. The cation exchange membrane EMc may be interposed between the second concentrate chamber CC2 and the dilute chamber DC, and between the first concentrate chamber CC1 and the first electrode ELa. The anion exchange membrane EMa is permeable to anions but not to cations. The cation exchange membrane EMc is permeable to cations but not to anions.

[0042] An ion exchange resin ER may be installed in the diluent chamber DC. In one embodiment of the present invention, ion exchange resins ER may also be installed in the first concentrate chamber CC1 and the second concentrate chamber CC2. In particular, installing ion exchange resins ER in both the first concentrate chamber CC1 and the second concentrate chamber CC2 further improves the efficiency of hydrogen peroxide purification. The ion exchange resin ER may include an anion exchange resin ERa and a cation exchange resin ERc. The anion exchange resin ERa adsorbs anions and transfers them to the anion exchange membrane EMa. The cation exchange resin ERc adsorbs cations and transfers them to the cation exchange membrane EMc. For example, even when the concentration of ions in the hydrogen peroxide solution PS decreases, the ion exchange resin ER can prevent the resistance of the hydrogen peroxide solution PS from increasing.

[0043] A hydrogen peroxide solution PS and water can be introduced into an inlet IN of an electrodeionization system EDI. The water can be purified water with low electrical conductivity. The concentration of hydrogen peroxide in the introduced hydrogen peroxide solution PS can be 1% to 70% by weight. The hydrogen peroxide solution PS can be introduced into a diluent chamber DC, and the water can be introduced into a first concentrate chamber CC1 and a second concentrate chamber CC2. The concentration of hydrogen peroxide in the first concentrate WF1 introduced into the first concentrate chamber CC1 and the concentration of the second concentrate WF2 introduced into the second concentrate chamber CC2 can be 1% by weight or less.

[0044] A direct current can be applied between the first electrode ELa and the second electrode ELc so that current can flow from the first electrode ELa to the second electrode ELc. Cations (e.g., metal impurities) in the hydrogen peroxide solution PS in the diluent chamber DC can pass through the cation exchange membrane EMc by electrostatic attraction generated by the direct current and move to the second concentrate WF2 in the second concentrate chamber CC2. Anions (e.g., anion impurities) in the hydrogen peroxide solution PS in the diluent chamber DC can pass through the anion exchange membrane EMa by electrostatic attraction generated by the direct current and move to the first concentrate WF1 in the first concentrate chamber CC1.

[0045] From the inlet IN to the outlet OUT of the diluent chamber DC, the concentration of ions in the hydrogen peroxide solution PS can be reduced. In other words, from the inlet IN to the outlet OUT of the diluent chamber DC, the concentration of impurities in the hydrogen peroxide solution PS can be reduced. The purified hydrogen peroxide P can be discharged through the outlet OUT of the diluent chamber DC.

[0046] The first concentrate WF1 and the second concentrate WF2 can be discharged through the respective outlets OUT of the first concentrate chamber CC1 and the second concentrate chamber CC2. The discharged first concentrate WF1 and second concentrate WF2 can have impurities concentrated therein, which are transferred from the hydrogen peroxide solution PS. For example, the discharged first concentrate WF1 and second concentrate WF2 can be discarded. As another example, the first concentrate WF1 and the second concentrate WF2 can be filtered and reintroduced into the inlet IN of the electro-deionization system EDI. That is, the first concentrate WF1 and the second concentrate WF2 can be circulated in the electro-deionization system EDI.

[0047] Since the concentration of ions in the hydrogen peroxide solution PS decreases from the inlet IN to the outlet OUT of the diluent chamber DC, in a region of the diluent chamber DC near the outlet OUT, the resistance of the hydrogen peroxide solution PS can increase. As a result, in this region of the diluent chamber DC, a voltage drop can occur, so that the decomposition of water and / or hydrogen peroxide can occur. Hydrogen ions and hydroxide ions can be generated by the decomposition of water and / or hydrogen peroxide, and the generated hydrogen ions and hydroxide ions can regenerate the ion exchange resin ER. Therefore, the electro-deionization system EDI according to the present invention can not require a separate process for regenerating the ion exchange resin ER.

[0048] The hydrogen peroxide purification system according to an embodiment of the present invention uses an electrodeionization system EDI as a secondary purification system PFS2 for hydrogen peroxide, so that high-purity hydrogen peroxide can be obtained in a high yield. In addition, the electrodeionization system EDI can operate at a relatively high flow rate, and for example, it can operate at about 0.1 to 10 m³ / hr for each electrodeionization stack. The production volume can be adjusted according to the system design (e.g., stack area, number of cells, and number of stacks), thus ultimately realizing the batch production of high-purity hydrogen peroxide.

[0049] It has been confirmed that when the stability of the hydrogen peroxide solution PS introduced into the electrodeionization system EDI is lower than the reference value, the purification performance and stability of the electrodeionization system EDI rapidly decrease with the running time. It has also been confirmed that when the stability of the hydrogen peroxide solution PS is lower than the above reference value, the removal rates of ions and organic carbon passing through the electrodeionization system EDI also rapidly decrease with the running time.

[0050] According to an embodiment of the present invention, the adsorption resin used as the primary purification system PFS1 can not only remove organic carbon in the crude hydrogen peroxide product R, but also remove ions (e.g., anions and cations). As a result, the stability of the hydrogen peroxide solution PS introduced into the electrodeionization system EDI can be improved. When the stability of the hydrogen peroxide solution PS is equal to or higher than the above reference value, the purification performance and stability of the electrodeionization system EDI with the running time can be maintained in a favorable state, and the removal rates of impurities (e.g., ions and organic carbon) can also be advantageously maintained.

[0051] According to an embodiment of the present invention, only the process of using the adsorption resin as the primary purification system PFS1 can simultaneously remove organic carbon and cations in the crude hydrogen peroxide product R. As a comparative example of the present invention, if another purification system (e.g., an ion exchange resin system or a reverse osmosis system) is used before introducing it into the electrodeionization system EDI, the economic efficiency of the hydrogen peroxide purification process may be significantly reduced.

[0052] As another comparative example of the present invention, when the process of using the adsorption resin as the primary purification system PFS1 is omitted and the crude hydrogen peroxide product R is directly introduced into the electrodeionization system EDI, the following problems may occur: the performance and stability of the electrodeionization system EDI are significantly reduced.

[0053] The present invention can improve the performance and stability of the electrodeionization system EDI only through a simple pretreatment process (i.e., the process of using the adsorption resin as the primary purification system PFS1).

[0054] Figure 3is a flowchart for describing a hydrogen peroxide purification process and a regeneration process of an adsorption resin according to an embodiment of the present invention. Referring to Figure 3 , the stability (S100) of the primary purified hydrogen peroxide solution PS of the primary purification system PFS1 (adsorption resin) that has previously passed through Figure 1 can be measured. The stability can be measured using the method (standard number: KSM1112) for measuring the stability of hydrogen peroxide defined in the National Standard Certification Integrated Information System (KS standard).

[0055] According to an embodiment of the present invention, the reference value of the stability can be 90%. More specifically, the reference value of the stability can be 95%. If the stability of the hydrogen peroxide solution PS is lower than 90%, the purification performance and durability of the electrodeionization system EDI over the operation time may rapidly decrease. On the other hand, when the stability of the hydrogen peroxide solution PS is higher than 90%, the impurity removal rate of the electrodeionization system EDI over the operation time can be stably maintained, and the durability can also be improved.

[0056] If the measured stability of the hydrogen peroxide solution PS is equal to or higher than the above reference value, the hydrogen peroxide solution PS can be introduced into the secondary purification system described with reference to Figure 1 and 2 , that is, PFS2 and EDI (S200).

[0057] If the measured stability of the hydrogen peroxide solution PS is lower than the above reference value, the adsorption resin of the primary purification system PFS1 can be regenerated. The method for regenerating the adsorption resin according to an embodiment of the present invention may include treating the adsorption resin with an acidic solution, a basic solution, or a combination thereof (S300).

[0058] For example, the adsorption resin can be washed with an acidic solution (e.g., hydrochloric acid and / or sulfuric acid). The adsorption resin can be washed with a basic solution (e.g., sodium hydroxide and / or ammonium bicarbonate). The adsorption resin can be washed with an acidic solution and then with a basic solution.

[0059] When the adsorption resin is regenerated with an acidic solution and / or a basic solution, the ions (e.g., cations) adsorbed in the adsorption resin can be removed. As a result, the ion adsorption performance of the adsorption resin can be restored again. Therefore, through the above adsorption resin regeneration method, the stability of the primary purified hydrogen peroxide solution PS can be improved to be equal to or higher than the reference value (90%).

[0060] Figure 41 is a flow chart for describing a hydrogen peroxide purification process and an adsorption resin regeneration process according to another embodiment of the present invention. Figure 4 The regeneration process of the adsorption resin may further include a step of regenerating the adsorption resin with alcohol (S400).

[0061] Adsorbent resins are typically regenerated by washing with alcohol (e.g., methanol) and water. This is because organic solvents such as alcohols effectively remove organic matter adsorbed on the adsorbent resin. However, while this alcohol-based regeneration method effectively removes organic matter from the adsorbent resin, it may not be suitable for removing the aforementioned cations. Therefore, in the present invention, after the step of regenerating the adsorbent resin with alcohol (S400), a step of regenerating the adsorbent resin with an acidic solution and / or an alkaline solution (S300) may be performed.

[0062] On the other hand, according to another embodiment of the present invention, the step of regenerating the adsorption resin with an acidic solution and / or an alkaline solution ( S300 ) may be performed before the step of regenerating the adsorption resin with an alcohol ( S400 ).

[0063] Experimental example

[0064] Use Reference Figure 1 Hydrogen peroxide is purified using the hydrogen peroxide purification process described herein. Specifically, the crude hydrogen peroxide product produced by the alkylanthraquinone process is initially purified using an adsorption resin process. The stability of the purified hydrogen peroxide is measured according to standard KSM1112 of the National Standard Certification Integrated Information System. The primary purified hydrogen peroxide solution is then subjected to secondary purification using an electrodeionization system (EDI) according to the present invention.

[0065] In the first example, primary purification was performed using an adsorption resin regenerated with an acidic solution and / or an alkaline solution. In the first comparative example, primary purification was performed using an adsorption resin regenerated with an alcohol. The concentration of ionic impurities in the purified hydrogen peroxide was measured over the operating time of the EDI system according to the first example and the first comparative example, and the results are shown in Table 1 below.

[0066] [Table 1]

[0067]

[0068] Referring to Table 1, in the first comparative example, which used an adsorbent resin regenerated solely with alcohol, the measured stability was significantly lower, at 75.7%. It was confirmed that the concentrations of cationic impurities such as Na, Al, and Ni significantly increased to over 1,000 ppt on the 30th day of EDI operation. Referring to the first comparative example, it was confirmed that the cations in the adsorbent resin were not sufficiently removed to below the reference level, resulting in a decrease in the stability of the primary purified hydrogen peroxide, and thus significantly reduced the purification performance of the EDI. On the other hand, in the first example, which used an adsorbent resin regenerated with an acidic and / or alkaline solution, the measured stability was significantly higher, at 95.5%. It was confirmed that even on the 30th day of EDI operation, the concentrations of cationic impurities such as Na, Al, and Ni were very low, at approximately 100 ppt. Furthermore, it was confirmed that, compared to the first comparative example, the concentrations of ionic impurities in the first example remained very low even on day 180. With reference to the first embodiment, it can be confirmed that the adsorption resin regenerated using an acidic solution and / or an alkaline solution can significantly improve the stability of the primarily purified hydrogen peroxide, thereby enabling the EDI system to maintain stable performance and improved durability.

[0069] Figure 5 Schematic diagram for describing a hydrogen peroxide purification system according to an embodiment of the present invention. Figure 5 The hydrogen peroxide purification system may further include a heat exchanger HE located between the primary purification system PFS1 and the secondary purification system PFS2. The temperature of the primarily purified hydrogen peroxide solution PS can be adjusted as it passes through the heat exchanger HE. The heat exchanger HE can adjust the temperature of the hydrogen peroxide solution PS to a range of -20°C to 20°C. In other words, the hydrogen peroxide solution PS, having a temperature of -20°C to 20°C, can be introduced into the electrodeionization system EDI, serving as the secondary purification system PFS2.

[0070] Because hydrogen peroxide is a strong oxidant, it can oxidize and degrade the ion exchange medium in the diluent chamber DC of the electrodeionization system (EDI). Consequently, the pressure inside the EDI can increase due to the oxygen generated by the decomposition of hydrogen peroxide in the diluent chamber through side reactions. As the temperature of the hydrogen peroxide rises, the amount of oxygen generated can rapidly increase. Excessive oxygen generation can lead to excessive pressure buildup within the EDI, potentially damaging the EDI and reducing the efficiency of the purification process.

[0071] According to this embodiment, the temperature of the hydrogen peroxide solution PS introduced into the electrodeionization system (EDI) can be appropriately adjusted by the heat exchanger (HE) to prevent excessive oxygen generation. The heat exchanger (HE) can also improve the stability of the hydrogen peroxide solution PS according to the present invention. As a result, damage to the electrodeionization system (EDI) can be prevented, and the efficiency of hydrogen peroxide purification can be improved.

[0072] By the method for purifying hydrogen peroxide according to the above-described embodiment of the present invention, high-purity hydrogen peroxide can be obtained. Figure 6 is a schematic diagram for describing a process for cleaning a substrate using purified hydrogen peroxide according to an embodiment of the present invention.

[0073] Reference Figure 6 , a method for manufacturing an electronic device may include a process of cleaning a substrate SUB. The substrate SUB according to an embodiment of the present invention may include a display substrate or a semiconductor substrate. Specifically, the process of cleaning the substrate SUB may include: applying hydrogen peroxide P purified by the purification method of the present invention to the substrate SUB. As an example, the display substrate may include a substrate for an organic light-emitting display device, a substrate for a micro-LED display device, or an LCD substrate. The semiconductor substrate SUB may include silicon, germanium, or silicon-germanium.

[0074] If hydrogen peroxide containing impurities is used in the cleaning process, the impurities may react with substances on the substrate SUB and cause defects in the process. On the other hand, the hydrogen peroxide P purified according to the present invention has a very low impurity content, making it possible to prevent defects in the process.

[0075] Although the present invention has been described with reference to the accompanying drawings, it will be understood by those skilled in the art that various changes in form and detail may be made thereto without departing from the spirit and scope of the present invention. Therefore, it should be understood that the above embodiments are illustrative and non-restrictive in every respect.

Claims

1. A method for purifying hydrogen peroxide, the method comprising: Regenerating the adsorption resin of the primary purification system using an acidic solution, a basic solution, or a combination thereof; Purifying the crude hydrogen peroxide product using the adsorption resin of the primary purification system; And Purifying the primarily purified hydrogen peroxide solution using a secondary purification system, wherein the secondary purification system includes an electro-deionization system, and wherein the adsorption resin removes organic carbon and cations from the crude hydrogen peroxide product.

2. The method according to claim 1, wherein the regenerated adsorption resin increases the stability of the primarily purified hydrogen peroxide solution to above a reference value, and wherein the reference value is 90%.

3. The method according to claim 1, wherein the adsorption resin is a non-polar polymer resin.

4. The method according to claim 3, wherein the adsorption resin comprises a hydrophobic aromatic polymer.

5. The method according to claim 1, wherein the adsorption resin comprises a neutral resin and an ionic resin.

6. The method according to claim 1, the method further comprising: Regenerating the adsorption resin using an alcohol.

7. The method according to claim 1, wherein regenerating the adsorption resin includes removing cations from the adsorption resin.

8. The method according to claim 1, wherein the electro-deionization system includes: A first electrode and a second electrode; A first concentrate chamber, a second concentrate chamber, and a diluate chamber between the first concentrate chamber and the second concentrate chamber; Ion exchange resins disposed inside the diluate chamber, the first concentrate chamber, and the second concentrate chamber; An anion exchange membrane between the first concentrate chamber and the diluate chamber; and A cation exchange membrane between the second concentrate chamber and the diluate chamber.

9. The method according to claim 8, wherein a direct current is applied to the first electrode and the second electrode, wherein anion impurities in the hydrogen peroxide solution inside the diluate chamber pass through the anion exchange membrane and move to the first concentrate chamber, and wherein cation impurities in the hydrogen peroxide solution inside the diluate chamber pass through the cation exchange membrane and move to the second concentrate chamber.

10. The method according to claim 8, wherein a first concentrate and a second concentrate are respectively introduced into the first concentrate chamber and the second concentrate chamber, and wherein the first concentrate and the second concentrate are water.

11. The method according to claim 1, the method further comprising: Passing the primarily purified hydrogen peroxide solution through a heat exchanger.

12. A method for manufacturing an electronic device, the method comprising: Performing a cleaning process on a substrate using the hydrogen peroxide purified according to claim 1.

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