Mask plate with semi-etching holes

Abstract

The invention relates to the field of OLED (Organic Light Emitting Diode) device manufacturing equipment, in particular to a mask plate with semi-etched holes. The mask plate with the half-etching holes comprises a plurality of horizontally arranged mask sheets and at least one shielding piece, the mask sheet comprises an open area and a non-open area; a plurality of through holes are vertically formed in the opening area, and each through hole corresponds to a pixel pit in the substrate; a plurality of half corrosion pits are formed in the top surface of the shielding piece; the half corrosion pit is used for adsorbing dust; and each half etching pit corresponds to one or more pixel pits on the substrate. The mask plate can effectively adsorb dust in and near pixel pits in the vacuum evaporation process, so that the quality of pixels is effectively ensured.

Description

Technical Field

[0001] The present invention relates to the field of OLED device manufacturing equipment, and particularly to a mask plate with semi-etching holes. Background Art

[0002] Currently, OLED (organic light-emitting diode) displays are replacing LCD (liquid crystal display) which has occupied a huge market due to their excellent performance. In the evaporation machine for manufacturing OLED devices, a precision metal mask plate (FMM) is required, and the display screen manufactured using the FMM has excellent performance. When manufacturing large-size OLED devices, large-size substrates are needed, and the larger the size, the higher the production efficiency. And large-size substrates require corresponding large-size mask plates. The larger the size of the mask sheet, the greater the influence of gravity and temperature and other environments, and the greater the degree of deformation. The existing patent document (CN115786846B) proposes a method for manufacturing large-size OLED devices, which divides a whole large mask sheet required for preparing the large-screen light-emitting layer coating into multiple narrow and overall complementary mask sheets, and a shielding part is arranged between multiple mask sheets on the mask plate. When in use, they are respectively aligned and evaporated on the same substrate to form a complete large-screen light-emitting layer pattern. However, there are still some defects in this design. For example, if there is dust on the shielding part and the non-opening area of the mask sheet, it may be contaminated on the substrate display area (AA area), resulting in pixel light-emitting defects.

[0003] It can be seen that the existing technology still needs to be improved. Summary of the Invention

[0004] In view of the above deficiencies of the existing technology, the purpose of the present invention is to provide a mask plate with semi-etching holes, aiming to solve the technical problem that dust on the shielding part in the existing technology will be contaminated on the substrate display area, resulting in pixel light-emitting defects.

[0005] To achieve the above purpose, the present invention adopts the following technical solutions: The present invention provides a mask plate with semi-etching holes, including multiple horizontally arranged mask sheets and at least one shielding member; the mask sheet includes an opening area and a non-opening area; a plurality of through holes are vertically arranged in the opening area, and each through hole corresponds to a pixel pit on the substrate; a plurality of semi-etching pits are arranged on the top surface of the shielding member; the semi-etching pits are used for adsorbing dust; each semi-etching pit corresponds to one or more pixel pits on the substrate.

[0006] In the mask plate with semi-etching holes, a plurality of semi-etching pits are arranged on the top surface of the non-opening area of the mask sheet.

[0007] The mask plate with semi-etched holes, further comprising a first support frame, wherein a plurality of support beams are arranged inside the first support frame, and both ends of the mask sheet and the shielding member are respectively fixed on the support beams.

[0008] The mask plate with semi-etched holes, wherein a first connecting portion is arranged on one side or both the left and right sides of the mask sheet and the shielding member; a first groove is arranged on the top surface of the support beam; the first connecting portion is fixed in the first groove; and the first grooves are respectively arranged on both sides of the first support frame.

[0009] The mask plate with semi-etched holes, wherein the first connecting portion extends obliquely downward toward the outside; and the left and right side walls of the first groove extend obliquely downward in opposite directions and are adapted to the first connecting portion.

[0010] The mask plate with semi-etched holes, wherein second grooves are arranged on both sides of the top surface of the support beam; second connecting portions are arranged on the left and right sides of the mask sheet and the shielding member; the shielding member is fixed in the middle of the top surface of the support beam, and the second connecting portions at both ends thereof are respectively inserted into the two second grooves; and the second connecting portions at both ends of the mask sheet are respectively inserted into the second grooves of the two support beams.

[0011] The mask plate with semi-etched holes, further comprising a second support frame; a plurality of the shielding members are fixed inside the second support frame and arranged horizontally; and the shielding members are used for shielding and supporting the mask sheet.

[0012] The mask plate with semi-etched holes, wherein the cross-sectional shape of the semi-etch pit is an inverted trapezoid.

[0013] The mask plate with semi-etched holes, wherein an adsorption structure is arranged inside the semi-etch pit; a plurality of pits or slits are arranged on the adsorption structure; and the pits or slits are used for adsorbing and fixing dust particles.

[0014] The mask plate with semi-etched holes, wherein the bottom of the semi-etch pit is filled with a dust adsorbent.

[0015] The mask plate with semi-etched holes, wherein the bottom of the semi-etch pit is filled with a dust adsorbent.

[0016] The mask plate with semi-etched holes, wherein the dust adsorbent comprises at least one of porous metal, porous ceramic and adhesive.

[0017] Beneficial effects: The present invention provides a mask plate with semi-etching holes. On the top surface of the mask sheet and the shielding member of the mask plate, that is, the surface facing the substrate during use, a plurality of semi-etching pits for adsorbing dust are provided. During film coating, it can adsorb the dust in and near the pixel pits, thereby reducing the influence of dust on the display area of the substrate and ensuring the pixel light-emitting quality. Brief description of the drawings

[0018] Figure 1 Schematic cross-sectional structure of the mask plate Figure 1 。

[0019] Figure 2 Top view of the mask plate.

[0020] Figure 3 Schematic cross-sectional structure of the mask plate Figure 2 。

[0021] Figure 4 Schematic cross-sectional structure of the mask plate Figure 3 。

[0022] Figure 5 Schematic cross-sectional structure of the mask plate Figure 4 。

[0023] Figure 6 Schematic cross-sectional structure of the mask plate Figure 5 。

[0024] Figure 7 Schematic structure of the semi-etching pit Figure 1 。

[0025] Figure 8 Schematic structure of the semi-etching pit Figure 2 。

[0026] Figure 9 Schematic structure of the semi-etching pit Figure 3 。

[0027] Figure 10 Schematic structure of the semi-etching pit Figure 4 。

[0028] Figure 11 Schematic structure of the semi-etching pit Figure 5 。

[0029] Main element symbol description: X1 - substrate, X11 - pixel pit, 1 - mask sheet, 11 - through hole, 2 - shielding member, 3 - semi-etching pit, 12 - first connecting portion, 4 - first support frame, 41 - support beam, 42 - first groove, 21 - second connecting portion, 43 - second groove, 44 - sub-slot body, 31 - adsorption structure, 311 - slit, 32 - dust adsorbent. Detailed implementation manners

[0030] The present invention provides a mask plate with semi-etching holes. To make the objectives, technical solutions, and effects of the present invention clearer and more definite, the following further elaborates on the present invention with reference to the accompanying drawings and by way of examples. It should be understood that the specific examples described herein are only used to explain the present invention and are not used to limit the present invention.

[0031] In the description of the present invention, it should be understood that the terms "upper", "lower", "left", "right", etc. indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, specific orientation structure, and operation. Therefore, it should not be construed as a limitation to the present invention. In addition, "first" and "second" are only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly indicating the quantity of the indicated technical features. Therefore, the features defined with "first" and "second" may explicitly or implicitly include one or more of such features. In the description of the present invention, unless otherwise specified, the meaning of "a plurality" is more than two.

[0032] Please refer to Figure 1 , the present invention provides a mask plate with semi-etching holes, including a plurality of mask sheets 1 arranged horizontally and at least one shielding member 2; the mask sheet 1 includes an opening area and a non-opening area; a plurality of through holes 11 are vertically arranged in the opening area, and each through hole 11 corresponds to a pixel pit X11 on the substrate X1; a plurality of semi-etching pits 3 are arranged on the top surface of the shielding member 2; the semi-etching pits 3 are used to adsorb dust; each semi-etching pit 3 corresponds to one or more pixel pits X11 on the substrate X1.

[0033] According to design requirements, in one embodiment, the mask plate is composed of a plurality of mask sheets 1 and a plurality of shielding members 2. The positions of the opening areas and non-opening areas of the plurality of mask sheets 1 may be the same or different.

[0034] During use, the semi-etching pits 3 face the substrate X1, and dust falls into the semi-etching pits 3 under the influence of forces such as gravity, van der Waals force, and electrostatic Coulomb force, and is fixed in the semi-etching pits 3, thereby greatly reducing the entry of dust into the pixel pits X11 and ensuring the quality of the pixels.

[0035] Specifically, the positions of the plurality of semi-etching pits 3 can be set as needed. For example, they can be correspondingly distributed with the pixel pits X11 of the substrate X1 (such as Figure 3 ), or they can be spaced apart (such as Figure 4 ). For example, in the matrix on the top surface of the shielding member 2, the semi-etching pits 3 are only arranged in the first column, the fourth column, the seventh column, etc., i.e., 1 + 3x columns.

[0036] Please refer to Figure 1, a plurality of semi-etch pits 3 are also provided on the top surface of the non-opening area of the mask sheet 1.

[0037] Please refer to Figure 3 , in one embodiment, one semi-etch pit 3 corresponds to one pixel pit X11, and the size of the opening of the semi-etch pit 3 corresponds to the size of the opening of the pixel pit X11. Preferably, the area of the opening of the semi-etch pit 3 is less than or equal to the area of the opening of the corresponding pixel pit X11. The shape of the opening of the semi-etch pit 3 also does not exceed the range of the opening of the pixel pit X11. This can make the dust falling into the semi-etch pit 3 not easy to escape. This can make the support of the mask plate for the substrate X1 not change, and also make the dust falling into the semi-etch pit 3 not easy to escape.

[0038] Please refer to Figure 7 , in another embodiment, one semi-etch pit 3 corresponds to a plurality of pixel pits X11, and the size of the opening of the semi-etch pit 3 corresponds to the area size of the area where the plurality of pixel pits X11 are located.

[0039] Please refer to Figures 7 - 9 , the cross-section of the semi-etch pit 3 in the vertical direction can be a regular trapezoid, a rectangle or an inverted trapezoid. The regular trapezoid design can make large-particle dust easily fall into the semi-etch pit 3.

[0040] Preferably, the cross-sectional shape of the semi-etch pit 3 is an inverted trapezoid. The inverted trapezoid design can make it not easy for small-particle dust to escape after falling in.

[0041] Please refer to Figure 1 and Figure 2 , in one embodiment, the mask plate with semi-etching holes further includes a first support frame 4, and a plurality of support beams 41 are arranged in the first support frame 4. Both ends of the mask sheet 1 and the shielding member 2 are respectively fixed on the support beams 41. In this embodiment, the shielding member 2 is sheet-shaped and has the same thickness as the mask sheet 1. The plurality of support beams 41 are arranged in sequence. During use, the mask sheet 1 and the shielding member 2 are placed in the first support frame 4 and fixed.

[0042] Please refer to Figure 3 , in one embodiment, a first connecting portion 12 is provided on one side or both the left and right sides of the mask sheet 1 and the shielding member 2; a first groove 42 is provided on the top surface of the support beam 41; the first connecting portion 12 is fixed in the first groove 42; the first grooves 42 are respectively provided on both sides of the first support frame 4. Specifically, the shielding member 2 can be fixed by welding, or can be detachably fixed through a clamping structure.

[0043] Please refer to Figure 3, Preferably, the first connecting portion 12 extends obliquely downward toward the outside; the left and right groove walls of the first groove 42 extend obliquely downward toward each other and are adapted to the first connecting portion 12. In this embodiment, after the two ends of the mask sheet 1 and the shielding member 2 are respectively inserted into the two first grooves 42, the fixing is completed.

[0044] Preferably, the first groove 42 is a V-shaped groove, and the design of the V-shaped groove can also play a good role in adsorbing dust, thereby improving the overall dust adsorption effect. After the first connecting portion 12 is fixed in the first groove 42, a sub-groove body 44 with a gap left at the top can be further formed. The sub-groove body 44 can also play a role in adsorbing and fixing dust. During use, dust can slide down along the inclined first connecting portion 12 into the sub-groove body 44, and the setting of the gap makes it difficult for dust to escape from the sub-groove body 44.

[0045] Please refer to Figure 5 , In one embodiment, second grooves 43 are provided on both sides of the top surface of the support beam 41; second connecting portions 21 are provided on the left and right sides of the mask sheet 1 and the shielding member 2; the shielding member 2 is fixed in the middle of the top surface of the support beam 41, and the second connecting portions 21 at both ends thereof are respectively inserted into the two second grooves 43; the second connecting portions 21 at both ends of the mask sheet 1 are respectively inserted into the second grooves 43 of the two support beams 41. When the shielding member 2 is made into a sheet shape, the thickness is small, and the density of the semi-etching pits 3 needs to be considered. If the density of the semi-etching pits 3 is too large, the strength of the sheet-shaped shielding member 2 will be insufficient. In this embodiment, by fixing the shielding member 2 on the support beam 41 and supporting the shielding member 2 through the support beam 41, the shielding member 2 does not need to worry about insufficient strength, can be covered with semi-etching pits 3, and the dust adsorption effect is improved.

[0046] Please refer to Figure 6 , In one embodiment, the mask plate with semi-etching holes further includes a second support frame; a plurality of the shielding members 2 are fixed in the second support frame and arranged horizontally; the shielding members 2 are used for shielding and supporting the mask sheet 1. In this embodiment, the shielding member 2 also functions as the support beam 41 and is a part of the second support frame. Compared with the support beam 41 of the first support frame 4, the shielding member 2 in this embodiment can not only play a role in shielding and adsorbing dust, but also play a role in supporting and fixing the mask sheet 1, and has sufficient strength, and the top surface can be covered with semi-etching pits 3.

[0047] Please refer to Figure 10, in one embodiment, an adsorption structure 31 is provided in the semi-etching pit 3; a plurality of pits or slits 311 are provided on the adsorption structure 31; the pits or slits 311 are used for adsorbing and fixing dust particles. The adsorption structure 31 can further improve the dust adsorption effect of the semi-etching pit 3. Preferably, the widths of the slits 311 are not uniform, and the slits 311 with different widths can respectively better adsorb and fix dust particles of different sizes.

[0048] Please refer to Figure 8 , in one embodiment, the middle aperture of the through hole 11 is smaller than the apertures at the bottom and the top. The aperture of the through hole 11 gradually becomes larger from the middle to the upper and lower ends respectively.

[0049] Please refer to Figure 11 , in one embodiment, the bottom of the semi-etching pit 3 is filled with a dust adsorbent 32. The dust adsorbent 32 can improve the adsorption and fixing effect on dust. Preferably, the dust adsorbent 32 includes at least one of porous metal, porous ceramic and adhesive.

[0050] Specifically, the usage method of the mask plate in this embodiment is as follows: First, select the mask sheet 1 and the shielding member 2 according to the design requirements, and then stretch the mesh with the support frame to form a mask plate. After assembly, cleaning is carried out. After washing, the dust adsorbent 32 is set in the semi-etching pit 3. The method of injecting the dust adsorbent 32 can adopt inkjet printing method or coating method. After injection, the adsorbent is baked and cured to complete the fixation of the dust adsorbent 32. Then the mask plate is introduced into a vacuum device, and multiple vacuum coatings are carried out using the mask plate. After completion, it is exported from the vacuum device, and then cleaning is carried out to remove the dust adsorbed on the mask plate and the dust adsorbent 32, and enter the next cycle.

[0051] In summary, the present invention provides a plurality of semi-etching pits 3 on the top surfaces of the mask sheet 1 and the shielding member 2, which play a role in capturing and fixing dust, thereby reducing the influence of dust on pixel formation during vacuum coating, and can be applied to FMM and CMM. In addition, the present invention can further inject a dust adsorbent 32 into the semi-etching pit 3 to improve the dust capturing effect.

[0052] It can be understood that for those of ordinary skill in the art, equivalent substitutions or changes can be made according to the technical solution of the present invention and its inventive concept, and all such changes or substitutions should fall within the protection scope of the appended claims of the present invention.

Claims

1. A mask plate with semi-etched holes, characterized in that It includes multiple horizontally arranged mask sheets and at least one shielding member; the mask sheet includes an opening area and a non-opening area; multiple through holes are vertically arranged in the opening area, and each through hole corresponds to a pixel pit on the substrate; multiple half-etch pits are arranged on the top surface of the shielding member; the half-etch pits are used to adsorb dust; each half-etch pit corresponds to one or more pixel pits on the substrate.

2. The mask plate with semi-etching holes according to claim 1, characterized in that Multiple half-etch pits are arranged on the top surface of the non-opening area of the mask sheet.

3. The mask plate with semi-etching holes according to claim 1, characterized in that, It further includes a first support frame, and multiple support beams are arranged in the first support frame, and both ends of the mask sheet and the shielding member are respectively fixed on the support beams.

4. The mask plate with semi-etching holes according to claim 3, characterized in that, A first connecting portion is arranged on one side or both the left and right sides of the mask sheet and the shielding member; a first groove is arranged on the top surface of the support beam; the first connecting portion is fixed in the first groove; the first grooves are respectively arranged on both sides of the first support frame.

5. The mask plate with semi-etching holes according to claim 4, characterized in that, The first connecting portion extends obliquely downward toward the outside; the left and right side walls of the first groove extend obliquely downward toward each other and are adapted to the first connecting portion.

6. The mask plate with semi-etching holes according to claim 3, characterized in that Second grooves are arranged on both sides of the top surface of the support beam; second connecting portions are arranged on the left and right sides of the mask sheet and the shielding member; the shielding member is fixed in the middle of the top surface of the support beam, and the second connecting portions at both ends of it are respectively inserted into two second grooves; the second connecting portions at both ends of the mask sheet are respectively inserted into the second grooves of two support beams.

7. The mask plate with semi-etching holes according to claim 1, characterized in that, It further includes a second support frame; multiple shielding members are fixed in the second support frame and are horizontally arranged; the shielding members are used for shielding and supporting the mask sheet.

8. The mask plate with semi-etching holes according to claim 1, characterized in that, The cross-sectional shape of the half-etch pit is an inverted trapezoid.

9. The mask plate with semi-etched holes according to any one of claims 1-8, characterized in that, An adsorption structure is arranged in the half-etch pit; multiple pits or slits are arranged on the adsorption structure; the pits or slits are used to adsorb and fix dust particles.

10. The mask plate with semi-etching holes according to claim 9, characterized in that, The bottom of the half-etch pit is filled with a dust adsorbent.

11. The mask plate with semi-etching holes according to any one of claims 1-8, characterized in that, The bottom of the half-etch pit is filled with a dust adsorbent.

12. The mask plate with semi-etched holes according to claim 11, characterized in that, The dust adsorbent includes at least one of porous metal, porous ceramic and adhesive.

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