Layout generation method and device, storage medium and electronic equipment

Abstract

The invention discloses a layout generation method and device, a storage medium and electronic equipment, and relates to the technical field of circuits, and the layout generation method comprises the following steps: firstly, determining a target graph from a layout, and obtaining a boundary range of virtual amplification of the target graph; then, in the boundary range, retrieving avoiding graphs of different hierarchies and different graph layers; determining an avoiding distance between the target graph and the avoiding graph according to graph information and avoiding constraint rules corresponding to the target graph and the avoiding graph respectively; and finally, according to the avoidance spacing selected by different avoidance graphs, performing avoidance processing, and generating an avoidance processed layout. In this way, according to the graph information of the target graph and the avoiding graphs, the avoiding distances between the avoiding graphs and the target graph are determined, avoiding processing is carried out according to the avoiding distances, the layout after avoiding processing is generated, automatic avoiding processing between the target graph and the avoiding graphs in various scenes is achieved, and the layout is more accurate. Therefore, the layout generation efficiency is improved.

Description

Technical Field

[0001] The present application relates to the field of circuit technologies, and in particular, to a layout generation method, apparatus, storage medium, and electronic device. Background Art

[0002] Layout generation is a key step in the integrated circuit design and manufacturing process, which involves converting the logical design of a circuit into a physical layout, that is, determining the specific positions of various patterns on the layout.

[0003] Currently, in the process of generating a layout in related technologies, it is usually necessary to manually perform multiple avoidance processes on the patterns in the layout, which increases the avoidance processing time between the patterns in the layout, thereby reducing the layout generation efficiency. Summary of the Invention

[0004] In view of this, the present application provides a layout generation method, apparatus, storage medium, and electronic device, mainly aiming to improve the technical problem that in the current related technologies, it is usually necessary to manually perform multiple avoidance processes on the patterns in the layout, which increases the avoidance processing time between the patterns in the layout, thereby reducing the layout generation efficiency.

[0005] In a first aspect, the present application provides a layout generation method, including:

[0006] Determine a target pattern from the layout, and obtain the boundary range of virtual magnification of the target pattern;

[0007] Retrieve avoidance patterns of different levels and different layers within the boundary range;

[0008] Determine the avoidance distance between the target pattern and the avoidance pattern according to the pattern information and avoidance constraint rules respectively corresponding to the target pattern and the avoidance pattern;

[0009] Perform an avoidance process according to the avoidance distances selected for different avoidance patterns, and generate a layout after the avoidance process.

[0010] In some embodiments, determining the avoidance distance between the target pattern and the avoidance pattern according to the pattern information and avoidance constraint rules respectively corresponding to the target pattern and the avoidance pattern includes:

[0011] Obtain the target layer corresponding to the target pattern and the avoidance layer corresponding to the avoidance pattern according to the pattern information respectively corresponding to the target pattern and the avoidance pattern;

[0012] Determine the avoidance distance between the target pattern and the avoidance pattern based on the target layer and the avoidance layer.

[0013] In some embodiments, determining the avoidance distance between the target pattern and the avoidance pattern according to the target layer and the avoidance layer includes:

[0014] Determine whether the target layer is the same as the avoidance layer;

[0015] If the target layer is the same as the avoidance layer, determine the avoidance distance between the target pattern and the avoidance pattern according to the net attributes corresponding to the target pattern and the avoidance pattern respectively;

[0016] If the target layer is not the same as the avoidance layer, determine the avoidance distance between the target pattern and the avoidance pattern according to the avoidance constraint rules corresponding to the layer.

[0017] In some embodiments, determining the avoidance distance between the target pattern and the avoidance pattern according to the net attributes corresponding to the target pattern and the avoidance pattern respectively includes:

[0018] Determine whether the net attribute corresponding to the target pattern is the same as the net attribute corresponding to the avoidance pattern;

[0019] If the net attribute corresponding to the target pattern is the same as the net attribute corresponding to the avoidance pattern, no avoidance processing is performed;

[0020] If the net attribute corresponding to the target pattern is not the same as the net attribute corresponding to the avoidance pattern, determine the avoidance distance between the target pattern and the avoidance pattern according to the avoidance constraint rules corresponding to the net attribute.

[0021] In some embodiments, determining the avoidance distance between the target pattern and the avoidance pattern according to the avoidance constraint rules corresponding to the layer includes:

[0022] Determine whether the target pattern and the avoidance pattern conform to the avoidance constraint rules corresponding to the layer;

[0023] If the target pattern and the avoidance pattern conform to the avoidance constraint rules corresponding to the layer, determine the avoidance distance between the target pattern and the avoidance pattern as the avoidance distance corresponding to the avoidance constraint rules of the layer;

[0024] If the target pattern and the avoidance pattern do not conform to the avoidance constraint rules corresponding to the layer, no avoidance processing is performed.

[0025] In some embodiments, determining a target pattern from a layout and obtaining a boundary range of virtual magnification of the target pattern includes:

[0026] Perform virtual magnification processing according to the boundary range of the target pattern;

[0027] Determine the boundary range corresponding to the target graphic by taking the magnified graphic range as the boundary range.

[0028] In a second aspect, the present application provides a layout generation device, including:

[0029] A target graphic unit determination unit, configured to determine a target graphic from a layout and obtain a boundary range of virtual magnification of the target graphic;

[0030] An avoidance graphic unit determination unit, configured to retrieve avoidance graphics of different levels and different layers within the boundary range;

[0031] An avoidance distance unit determination unit, configured to determine an avoidance distance between the target graphic and the avoidance graphic according to graphic information corresponding to the target graphic and the avoidance graphic respectively and an avoidance constraint rule;

[0032] A layout unit generation unit after avoidance, configured to perform an avoidance process according to the avoidance distances selected for different avoidance graphics and generate a layout after the avoidance process.

[0033] In a third aspect, the present application provides a computer-readable storage medium, on which a computer program is stored, and when the computer program is executed by a processor, the layout generation method described in the first aspect is implemented.

[0034] In a fourth aspect, the present application provides an electronic device, including a storage medium, a processor, and a computer program stored on the storage medium and executable on the processor, and when the processor executes the computer program, the layout generation method described in the first aspect is implemented.

[0035] In a fifth aspect, the present application provides a computer program product, the computer program product includes a computer program, and is characterized in that when the computer program is executed by a processor, the layout generation method described in the first aspect is implemented.

[0036] With the above technical solution, a layout generation method, device, storage medium, and electronic device provided by this application, compared with the current existing technologies, first determine a target pattern from the layout and obtain the boundary range of the virtual magnification of the target pattern; then, within the boundary range, retrieve avoidance patterns of different levels and different layers; next, determine the avoidance distance between the target pattern and the avoidance pattern according to the pattern information and avoidance constraint rules corresponding to the target pattern and the avoidance pattern respectively; finally, perform avoidance processing according to the selected avoidance distances of different avoidance patterns to generate a layout after avoidance processing. In this way, the avoidance process is integrated and the steps are more streamlined, enabling rapid avoidance in two dimensions of different layers and different levels according to the designed avoidance rules, reducing the number of manual operations. The user only needs to select the target pattern that needs to perform avoidance, and then rapid avoidance processing can be carried out, effectively reducing the avoidance processing time between the target pattern and the avoidance pattern, thereby improving the layout generation efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0037] The accompanying drawings herein are incorporated into the specification and form a part of the specification, showing embodiments consistent with this application and used together with the specification to explain the principles of this application.

[0038] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the following will briefly introduce the accompanying drawings required for use in the description of the embodiments or the prior art. Obviously, for those of ordinary skill in the art, other accompanying drawings can be obtained based on these drawings without creative efforts.

[0039] Figure 1 The flowchart shows a layout generation method provided by an embodiment of this application;

[0040] Figure 2 The flowchart shows another layout generation method provided by an embodiment of this application;

[0041] Figure 3 The diagram shows an example provided by an embodiment of this application;

[0042] Figure 4 The diagram shows an example provided by an embodiment of this application;

[0043] Figure 5 The diagram shows an example provided by an embodiment of this application;

[0044] Figure 6 The diagram shows an example provided by an embodiment of this application;

[0045] Figure 7The figure shows a schematic structural diagram of a layout generation device provided by an embodiment of the present application. Detailed implementation manners

[0046] Embodiments of the present application will be described in more detail below with reference to the accompanying drawings. It should be noted that, without conflict, the embodiments in the present application and the features in the embodiments may be combined with each other.

[0047] To address the technical problem that in the current related technologies, it is usually necessary to manually perform multiple avoidance processes on the graphics in the layout, which increases the avoidance processing time between the graphics in the layout, thereby reducing the layout generation efficiency. This embodiment provides a layout generation method, as Figure 1 shown, the method includes:

[0048] Step 101: Determine a target graphic from the layout, and obtain the boundary range of the virtual magnification of the target graphic.

[0049] Among them, the target graphic can be used to provide the graphic range for the avoidance process; the boundary range of the target graphic is the graphic range after the virtual magnification process of the target graphic, that is, the graphics within this range are subjected to the avoidance process; by way of example, both the target graphic and the avoidance graphic can be custom-drawn graphics in the layout, and the graphic shapes can include but are not limited to rectangles, circles, irregular graphics, etc.

[0050] Specifically, in the integrated circuit layout design, Electronic Design Automation (EDA) tools can be used to create and edit the layout, and corresponding tools can be used to provide an intuitive graphical user interface for users. Users can directly select the target graphics to be processed on the layout by clicking, box selection, etc., and determine their corresponding boundary ranges, and detect whether there are graphics that need to be avoided within this boundary range. In this way, users only need to determine the target graphic to perform avoidance detection on multiple graphics within the boundary range, saving the detection time of the avoidance graphics, and thus improving the layout generation efficiency.

[0051] Step 102: Retrieve avoidance graphics of different layers and different hierarchies within the boundary range.

[0052] Among them, the avoidance graphic can be one or more graphics that need to be avoided corresponding to different layers and different hierarchies within the boundary range of the target graphic.

[0053] In some embodiments, the layout usually has multiple layers and hierarchies, which respectively correspond to different functions and uses. After determining the boundary range, the boundary range can be applied to detect each layer and each hierarchy, and obtain the avoidance graphics existing in each layer and each hierarchy within the boundary range, so as to perform the avoidance process on the avoidance graphics.

[0054] Step 103: Determine the avoidance distance between the target graphic and the avoidance graphics according to the graphic information and avoidance constraint rules corresponding to the target graphic and the avoidance graphics respectively.

[0055] Exemplarily, the avoidance distance can be the avoidance distances corresponding to each avoidance graphic and the target graphic respectively. It can be judged according to the preset avoidance constraint rules and combined with the graphic information of each avoidance graphic, and the avoidance distances corresponding to each avoidance graphic are selected to realize the automatic avoidance of the avoidance graphics and improve the avoidance efficiency.

[0056] In some embodiments, the graphic information corresponding to each avoidance graphic may include but is not limited to layer, position (coordinates), size (length, width), net attribute, hierarchy, etc. Specifically, through comparative analysis of the graphic information of the target graphic and the avoidance graphics, it is judged whether they are in the same layer, whether they have the same net attribute and other avoidance conditions, so as to determine the avoidance distance between each avoidance graphic and the target graphic. By uniformly performing avoidance processing on the avoidance graphics within the boundary range, the avoidance method is made more accurate and efficient, the avoidance processing efficiency is improved, and thus the layout generation efficiency is improved.

[0057] Step 104: Perform avoidance processing on the target graphic and the avoidance graphics according to the avoidance distance to generate the layout after avoidance processing.

[0058] In some embodiments, after determining the avoidance distances corresponding to each avoidance graphic and the target graphic, the layout can be automatically updated according to the avoidance distances corresponding to each graphic. In this way, avoidance processing can be performed on multiple avoidance graphics at the same time, realizing automatic detection of multiple avoidance graphics, without manual multiple operations, and effectively improving the layout generation efficiency.

[0059] Compared with the current existing technologies, this embodiment can select the target graphic from the layout, determine the boundary range of virtual magnification of the target graphic, detect the avoidance graphics in different layers and different hierarchies within the boundary range, determine the avoidance distances between each avoidance graphic and the target graphic according to the graphic information and avoidance constraint rules of the avoidance graphics and the target graphic, and perform avoidance processing on the target graphic and the avoidance graphics according to the avoidance distances to obtain the layout after avoidance processing, making the avoidance process integrated and the steps more concise. It can quickly perform avoidance in two dimensions of different layers and different hierarchies, reduce the number of manual operations, and the user only needs to select the target graphic that needs to perform avoidance to perform fast avoidance processing, effectively reducing the avoidance processing time between the target graphic and the avoidance graphics, thereby improving the layout generation efficiency.

[0060] To further illustrate the specific implementation process of the method in this embodiment, this embodiment provides the following Figure 2 specific method, which includes:

[0061] Step 201: Perform virtual magnification processing based on the boundary range of the target graphic.

[0062] In some embodiments, after the user selects the target graphic, the initial graphic range corresponding to the target graphic can be obtained, and then the initial graphic range is virtually magnified to obtain the magnified graphic boundary range. Specifically, the magnification size for determining the initial graphic range can be customized to obtain the boundary range corresponding to the target graphic.

[0063] Step 202: Determine the graphic range after virtual magnification processing as the boundary range corresponding to the target graphic.

[0064] In some embodiments, the graphic after virtual magnification processing of the target graphic is obtained, and the boundary range occupied by the virtually magnified graphic is used as the boundary range of the target graphic for avoidance detection, that is, the avoidance graphic is detected within this boundary range, and the graphic located within this range is determined as the avoidance graphic. In this way, the graphic at the edge of the target graphic, the graphic with part of the area within the target graphic, and the graphic with the whole within the target graphic can be determined as the avoidance graphic, reducing the omission of avoidance graphics and improving the accuracy of avoidance graphic detection.

[0065] Step 203: Retrieve avoidance graphics of different levels and different layers within the boundary range.

[0066] In some embodiments, based on the boundary range, the avoidance graphics within the boundary range are detected in each level and each layer, and the detected graphics are determined as the avoidance graphics corresponding to this range, so as to obtain avoidance graphics of different layers and different layers. By detecting multiple levels and multiple layers, the detection and processing efficiency of avoidance graphics can be improved, the processing efficiency of avoidance graphics can be enhanced, and thus the layout generation efficiency can be improved. Exemplarily, the avoidance graphic and the target graphic can be in different layers and different levels; or, the avoidance graphic and the target graphic are in the same layer and different levels; or, the avoidance graphic and the target graphic are in the same layer and the same level; or, the avoidance graphic and the target graphic are in different layers and the same level.

[0067] Step 204: According to the graphic information and avoidance constraint rules corresponding to the target graphic and the avoidance graphic respectively, obtain the target layer corresponding to the target graphic and the avoidance layer corresponding to the avoidance graphic.

[0068] Among them, the target layer can be the layer where the target graphic is located, and the avoidance layer can be the layer where the avoidance graphic is located. Different layers can be marked with different colors. Specifically, after determining the target graphic and the avoidance graphic, the graphic information corresponding to each target graphic can be obtained, and based on its graphic information, the target layer where the target graphic is located can be obtained. Correspondingly, the graphic information corresponding to each avoidance graphic can be obtained, and based on its graphic information, the avoidance layer where the avoidance graphic is located can be obtained.

[0069] Step 205: Perform avoidance processing according to the selected avoidance distances of different avoidance graphics to generate a layout after avoidance processing.

[0070] In some embodiments, step 205 may specifically include: determining whether the target layer is the same as the avoidance layer; if the target layer is the same as the avoidance layer, then determine the avoidance distance between the target graphic and the avoidance graphic according to the net attributes corresponding to the target graphic and the avoidance graphic respectively; if the target layer is different from the avoidance layer, then determine the avoidance distance between the target graphic and the avoidance graphic according to the avoidance constraint rules corresponding to the layer.

[0071] In a specific application scenario, the layers of each graphic can be judged first, and different avoidance strategies can be adopted according to the judgment results. Exemplarily, if the target layer is the same as the avoidance layer, that is, the target graphic and the avoidance graphic are in the same layer, then the net attributes can be further compared, and according to the comparison result of the net attributes corresponding to the target graphic and the avoidance graphic respectively, determine the avoidance distance between the target graphic and the avoidance graphic; correspondingly, if the target layer is different from the avoidance layer, that is, the target graphic and the avoidance graphic are in different layers, then detect whether the two layers conform to the avoidance constraint rules corresponding to the layer.

[0072] In this way, the avoidance steps can be integrated and standardized into a process. When there are graphics with different net attributes in different layers in the layout, first select the range of the target graphic, and after retrieving the avoidance graphic within this range, according to the avoidance constraint rules that the target graphic and the avoidance graphic conform to, select different avoidance distances to achieve fast and automatic avoidance between the target graphic and the avoidance graphic.

[0073] In some embodiments, determining the avoidance distance between the target graphic and the avoidance graphic according to the net attributes corresponding to the target graphic and the avoidance graphic respectively may specifically include: determining whether the net attribute corresponding to the target graphic is the same as the net attribute corresponding to the avoidance graphic; if the net attribute corresponding to the target graphic is the same as the net attribute corresponding to the avoidance graphic, then no avoidance processing is performed; if the net attribute corresponding to the target graphic is different from the net attribute corresponding to the avoidance graphic, then determine the avoidance distance between the target graphic and the avoidance graphic according to the avoidance constraint rules corresponding to the net attribute.

[0074] In a specific application scenario, if the target layer is the same as the avoidance layer, the net attributes of the graphics can be automatically checked for consistency. Exemplarily, if it is detected that the layers of the avoidance graphic and the target graphic are the same and the net attributes are the same, there is no avoidance; if the layers of the avoidance graphic and the target graphic are the same and the net attributes are different, then it is judged whether the relationship between their net attributes conforms to the avoidance constraint rule. If it conforms, the avoidance is carried out according to the avoidance distance specified by the avoidance constraint rule; if it does not conform to the avoidance constraint rule, the default avoidance distance is selected for avoidance, such as Figure 3 as shown.

[0075] Correspondingly, the avoidance graphic can include multiple graphics at different levels. Exemplarily, when there are different levels (hierarchy) in the avoidance graphic, that is, when there are nested graphics in a certain avoidance graphic, the information such as the layer (layer) and net attributes of the avoidance graphic corresponding to different levels can be detected, and combined with the avoidance constraint rule, the avoidance distance of the avoidance graphic in different levels can be determined. Exemplarily, if there are target graphics and avoidance graphics with different net attributes under the same layer, and their net attributes conform to the avoidance constraint rule, the distance corresponding to the avoidance constraint rule can be selected as the avoidance distance to achieve fast and automatic avoidance between the target graphic and the avoidance graphic at different levels, such as Figure 4 as shown.

[0076] In some embodiments, to determine the avoidance distance between the target graphic and the avoidance graphic according to the avoidance constraint rule corresponding to the layer, it may specifically include: judging whether the target graphic and the avoidance graphic conform to the avoidance constraint rule corresponding to the layer; if the target graphic and the avoidance graphic conform to the avoidance constraint rule corresponding to the layer, the avoidance distance corresponding to the avoidance constraint rule of the layer is determined as the avoidance distance between the target graphic and the avoidance graphic; if the target graphic and the avoidance graphic do not conform to the avoidance constraint rule corresponding to the layer, no avoidance processing is performed.

[0077] Exemplarily, if the layers of the avoidance graphic and the target graphic are different, then check whether their layers conform to the avoidance constraint rule. If there are target graphics and avoidance graphics under different layers, and whether their layers conform to the avoidance constraint rule, the avoidance processing can be carried out according to the avoidance distance corresponding to the avoidance constraint rule, so as to achieve fast and automatic avoidance between the target graphic and the avoidance graphic, such as Figure 5 as shown; when there are avoidance graphics at different levels, the information such as the layer and net attributes of the avoidance graphic and the target graphic can be compared separately, and the avoidance distances corresponding to different avoidance graphics can be determined respectively according to the preset avoidance constraint rule to achieve fast and automatic avoidance between the target graphic and the avoidance graphic under different layers, such as Figure 6 as shown, and there is no avoidance if it does not conform to the avoidance constraint rule.

[0078] In this way, the problems of excessive graphic avoidance jamming and low efficiency in the layout are solved. This method is not restricted by the hierarchy in the layout. It can quickly retrieve the net attributes of the avoidance graphics under different layers, compare them with the net attributes of the target graphics, and select different avoidance distances according to the avoidance constraint rules to which the net attributes belong, so as to achieve fast and accurate avoidance between the target graphics and the avoidance graphics under different layers. Through this avoidance processing logic, the avoidance time between the target graphics and the avoidance graphics under different layers can be effectively shortened, and the layout generation efficiency can be improved.

[0079] Step 206: Perform avoidance processing according to the avoidance distances selected for different avoidance graphics to generate a layout after avoidance processing.

[0080] In some embodiments, the layout can be adjusted based on the avoidance distances between each avoidance graphic and each target graphic to achieve fast and automatic avoidance between the target graphics and the avoidance graphics, and obtain the layout after avoidance processing.

[0081] Further, as Figure 1 and Figure 2 a specific implementation of the method shown, this embodiment provides a layout generation device, as Figure 7 shown. The device includes: a target graphic determination unit 31, an avoidance graphic determination unit 32, an avoidance distance determination unit 33, and a layout generation unit 34 after avoidance.

[0082] The target graphic determination unit 31 is configured to determine target graphics from the layout and obtain the boundary range of the virtual magnification of the target graphics;

[0083] The avoidance graphic determination unit 32 is configured to retrieve avoidance graphics of different hierarchies and different layers within the boundary range;

[0084] The avoidance distance determination unit 33 is configured to determine the avoidance distance between the target graphics and the avoidance graphics according to the graphic information and avoidance constraint rules respectively corresponding to the target graphics and the avoidance graphics;

[0085] The layout generation unit 34 after avoidance is configured to perform avoidance processing according to the avoidance distances selected for different avoidance graphics to generate a layout after avoidance processing.

[0086] In some examples of this embodiment, the avoidance distance determination unit 33 is specifically configured to obtain the target layer corresponding to the target graphics and the avoidance layer corresponding to the avoidance graphics according to the graphic information respectively corresponding to the target graphics and the avoidance graphics; and determine the avoidance distance between the target graphics and the avoidance graphics based on the target layer and the avoidance layer.

[0087] In some examples of this embodiment, the avoidance distance determination unit 33 is specifically configured to determine whether the target layer is the same as the avoidance layer; if the target layer is the same as the avoidance layer, determine the avoidance distance between the target graphic and the avoidance graphic according to the net attributes corresponding to the target graphic and the avoidance graphic respectively; if the target layer is not the same as the avoidance layer, determine the avoidance distance between the target graphic and the avoidance graphic according to the avoidance constraint rules corresponding to the layer.

[0088] In some examples of this embodiment, the avoidance distance determination unit 33 is specifically configured to determine whether the net attribute corresponding to the target graphic is the same as the net attribute corresponding to the avoidance graphic; if the net attribute corresponding to the target graphic is the same as the net attribute corresponding to the avoidance graphic, no avoidance processing is performed; if the net attribute corresponding to the target graphic is not the same as the net attribute corresponding to the avoidance graphic, determine the avoidance distance between the target graphic and the avoidance graphic according to the avoidance constraint rules corresponding to the net attribute.

[0089] In some examples of this embodiment, the avoidance distance determination unit 33 is specifically configured to determine whether the target graphic and the avoidance graphic conform to the avoidance constraint rules corresponding to the layer; if the target graphic and the avoidance graphic conform to the avoidance constraint rules corresponding to the layer, determine the avoidance distance corresponding to the avoidance constraint rules of the layer as the avoidance distance between the target graphic and the avoidance graphic; if the target graphic and the avoidance graphic do not conform to the avoidance constraint rules corresponding to the layer, no avoidance processing is performed.

[0090] In some examples of this embodiment, the target graphic determination unit 31 is specifically configured to perform virtual magnification processing according to the boundary range of the target graphic; determine the graphic range after the virtual magnification processing as the boundary range corresponding to the target graphic.

[0091] It should be noted that for other corresponding descriptions of each functional unit involved in a layout generation device provided in this embodiment, reference can be made to Figure 1 and Figure 2 the corresponding descriptions therein, which will not be elaborated here.

[0092] Based on the above methods as Figure 1 and Figure 2 shown, correspondingly, this embodiment further provides a computer-readable storage medium, on which a computer program is stored, and when the computer program is executed by a processor, the methods as Figure 1 and Figure 2 shown are implemented.

[0093] Based on such understanding, the technical solution of this application can be embodied in the form of a software product, which can be stored in a non-volatile storage medium (such as a CD-ROM, USB flash drive, mobile hard disk, etc.), including several instructions to enable a computer device (such as a personal computer, server, or network device, etc.) to execute the methods of various implementation scenarios of this application.

[0094] Based on the above-mentioned methods as Figure 1 and Figure 2 shown, and Figure 7 the virtual device embodiments shown, in order to achieve the above object, the embodiments of this application also provide an electronic device, such as a personal computer, server, and the device includes a storage medium and a processor; the storage medium is used to store a computer program; the processor is used to execute the computer program to implement the methods as Figure 1 and Figure 2 shown.

[0095] Optionally, the above-mentioned physical device may further include a user interface, a network interface, a camera, a radio frequency (RF) circuit, sensors, an audio circuit, a WI-FI module, and so on. The user interface may include a display screen (Display), an input unit such as a keyboard (Keyboard), etc., and the optional user interface may further include a USB interface, a card reader interface, etc. The network interface may optionally include a standard wired interface, a wireless interface (such as a WI-FI interface), etc.

[0096] Those skilled in the art can understand that the above-mentioned physical device structure provided in this embodiment does not constitute a limitation on the physical device, and it may include more or fewer components, or combine some components, or have different component arrangements.

[0097] The storage medium may also include an operating system and a network communication module. The operating system is a program that manages the hardware and software resources of the above-mentioned physical device and supports the operation of information processing programs and other software and / or programs. The network communication module is used to implement communication between components inside the storage medium and communication between other hardware and software in the information processing physical device.

[0098] Through the description of the above embodiments, those skilled in the art can clearly understand that the present application can be implemented by means of software plus a necessary general hardware platform, or can also be implemented by hardware. By applying the solution of this embodiment, in this way, this embodiment can select at least one target graphic from the layout, virtually magnify the corresponding boundary range of the target graphic, detect the avoidance graphics of different layers and different levels, determine the avoidance distance between each avoidance graphic and the target graphic according to the graphic information of the avoidance graphic and the target graphic, and perform avoidance processing on the target graphic and the avoidance graphic according to the avoidance distance to obtain the layout after avoidance processing, realizing the automatic avoidance processing of the avoidance graphics under different layers, effectively shortening the avoidance time between the target graphic and the avoidance graphic in the layout, and further improving the layout generation efficiency. Specifically, it is possible to determine the avoidance distance corresponding to each avoidance graphic according to the information such as the layers and net attributes respectively corresponding to the target graphic and the avoidance graphic and the preset avoidance constraint rules, so that the layout can be more convenient for design rule checking and layout Figure 1 consistency checking, and improving the accuracy of the generated layout.

[0099] It should be noted that in this article, relational terms such as "first" and "second" are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the term "comprising", "including" or any other variant thereof is intended to cover a non-exclusive inclusion, so that a process, method, article or device including a series of elements not only includes those elements, but also includes other elements not expressly listed, or further includes elements inherent to such process, method, article or device. Without further limitation, an element defined by the statement "including a..." does not exclude the existence of another identical element in the process, method, article or device including the element.

[0100] The above are only the specific embodiments of the present application, enabling those skilled in the art to understand or implement the present application. Various modifications to these embodiments will be obvious to those skilled in the art, and the general principles defined herein can be implemented in other embodiments without departing from the spirit or scope of the present application. Therefore, the present application will not be limited to these embodiments herein, but will conform to the widest scope consistent with the principles and novel features claimed herein.

Claims

1. A layout generation method, characterized in that, Including: Determine a target pattern from a layout, and obtain a boundary range of virtual magnification of the target pattern; Retrieve avoidance patterns of different levels and different layers within the boundary range; Determine an avoidance distance between the target pattern and the avoidance pattern according to the pattern information and avoidance constraint rules respectively corresponding to the target pattern and the avoidance pattern; Perform avoidance processing according to the avoidance distances selected for different avoidance patterns, and generate a layout after avoidance processing.

2. The method according to claim 1, wherein Determine an avoidance distance between the target pattern and the avoidance pattern according to the pattern information and avoidance constraint rules respectively corresponding to the target pattern and the avoidance pattern, including: Obtain a target layer corresponding to the target pattern and an avoidance layer corresponding to the avoidance pattern according to the pattern information respectively corresponding to the target pattern and the avoidance pattern; Determine an avoidance distance between the target pattern and the avoidance pattern based on the target layer and the avoidance layer.

3. The method according to claim 2, wherein Determine an avoidance distance between the target pattern and the avoidance pattern based on the target layer and the avoidance layer, including: Judge whether the target layer is the same as the avoidance layer; If the target layer is the same as the avoidance layer, determine an avoidance distance between the target pattern and the avoidance pattern according to the net attributes respectively corresponding to the target pattern and the avoidance pattern; If the target layer is different from the avoidance layer, determine an avoidance distance between the target pattern and the avoidance pattern according to the avoidance constraint rules corresponding to the layer.

4. The method according to claim 3, wherein Determine an avoidance distance between the target pattern and the avoidance pattern according to the net attributes respectively corresponding to the target pattern and the avoidance pattern, including: Judge whether the net attribute corresponding to the target pattern is the same as the net attribute corresponding to the avoidance pattern; If the net attribute corresponding to the target pattern is the same as the net attribute corresponding to the avoidance pattern, no avoidance processing is performed; If the net attribute corresponding to the target pattern is different from the net attribute corresponding to the avoidance pattern, determine an avoidance distance between the target pattern and the avoidance pattern according to the avoidance constraint rules corresponding to the net attribute.

5. The method according to claim 3, wherein Determine an avoidance distance between the target pattern and the avoidance pattern according to the avoidance constraint rules corresponding to the layer, including: Judge whether the target pattern and the avoidance pattern comply with the avoidance constraint rules corresponding to the layer; If the target pattern and the avoidance pattern comply with the avoidance constraint rules corresponding to the layer, determine an avoidance distance between the target pattern and the avoidance pattern as the avoidance distance corresponding to the avoidance constraint rules of the layer; If the target pattern and the avoidance pattern do not comply with the avoidance constraint rules corresponding to the layer, no avoidance processing is performed.

6. The method according to claim 1, wherein Determine a target pattern from a layout, and obtain a boundary range of virtual magnification of the target pattern, including: Perform virtual magnification processing according to the boundary range of the target pattern; Determine the graphic range after virtual magnification processing as the boundary range corresponding to the target pattern.

7. A layout generation device, characterized in that Including: Determine the target graphic unit, which is configured to determine the target graphic from the layout and obtain the boundary range of the virtual magnification of the target graphic; Determine the avoidance graphic unit, which is configured to retrieve avoidance graphics of different levels and different layers within the boundary range; Determine the avoidance spacing unit, which is configured to determine the avoidance spacing between the target graphic and the avoidance graphic according to the graphic information and avoidance constraint rules respectively corresponding to the target graphic and the avoidance graphic; Generate the layout unit after avoidance, which is configured to perform avoidance processing according to the avoidance spacing selected for different avoidance graphics and generate the layout after avoidance processing.

8. A computer-readable storage medium having a computer program stored thereon, characterized in that, When the computer program is executed by a processor, it implements the method according to any one of claims 1 to 6.

9. An electronic device, comprising a storage medium, a processor, and a computer program stored on the storage medium and executable on the processor, characterized in that, When the processor executes the computer program, it implements the method according to any one of claims 1 to 6.

10. A computer program product, the computer program product comprising a computer program, characterized in that, When the computer program is executed by a processor, it implements the method according to any one of claims 1 to 6.

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