Glass coating method and coated glass

Abstract

The invention provides a glass coating method and coated glass, and the glass coating method comprises the following steps: spraying and coating a glass substrate; the sprayed and coated glass substrate is fixed to a roller of a magnetron sputtering coating machine, multiple times of magnetron sputtering coating are conducted on the glass substrate, and in the adjacent times of magnetron sputtering coating process, the rotating speeds of the roller are different; and carrying out vacuum evaporation coating on the glass substrate. According to the technical scheme provided by the invention, the problem of poor product quality caused by non-uniform coating thickness in the processing process of the cover plate glass in the prior art is effectively solved.

Description

Technical Field

[0001] The present application relates to the technical field of glass coating, and in particular to a glass coating method and coated glass. Background Art

[0002] Anti-reflection (AR) coatings on cover glass are commonly used in the assembly of displays for tablets, computers, and automotive displays. They reduce reflected light, improving screen contrast and viewing angles. This allows users to see on-screen content more clearly in varying lighting conditions. AR coatings reduce interference from external light reflections, enhance color saturation and display clarity, and enhance the user's visual experience. For example, in strong outdoor sunlight, screens with AR coatings can reduce glare, making images and text more legible.

[0003] Generally, the glass coating process involves applying an anti-glare film, an anti-reflection and anti-reflection film, and an anti-fingerprint film. During the anti-glare coating process, a coating solution is evenly sprayed onto the glass surface through a spraying device. After a baking or curing process, the coating forms a thin film with a certain degree of roughness. This film diffusely reflects incident light, reducing its reflectivity and achieving the desired effect of both anti-glare and reduced reflected light.

[0004] In the prior art, due to the uneven surface of the anti-glare film, particles accumulate on the uneven surface during magnetron sputtering coating, further leading to increased film thickness differences, poor product appearance, and poor anti-reflection and anti-reflection capabilities, such as CN118084349A. Summary of the Invention

[0005] A technical problem to be solved by the present application is that during the processing of cover glass, there is a problem of poor product quality due to uneven coating thickness.

[0006] In order to solve the above technical problems, the present application provides a glass coating method and coated glass.

[0007] According to the present application, a glass coating method includes: spray coating a glass substrate; fixing the spray-coated glass substrate on a roller of a magnetron sputtering coating machine, and performing multiple magnetron sputtering coatings on the glass substrate, wherein the rotation speed of the roller is different during adjacent magnetron sputtering coating processes; and vacuum evaporation coating the glass substrate.

[0008] In some embodiments, the glass coating method satisfies the following conditions: the magnetron sputtering coating includes five times, wherein the first magnetron sputtering coating, the third magnetron sputtering coating and the fifth magnetron sputtering coating are coated with SiO2 target material, and the second magnetron sputtering coating and the fourth magnetron sputtering coating are coated with Nb2O5 target material.

[0009] In some embodiments, the rotation speed of the drum in the first magnetron sputtering coating is X, the rotation speed of the drum in the third and fifth magnetron sputtering coatings is X, and the rotation speed of the drum in the second and fourth magnetron sputtering coatings is -X.

[0010] In some embodiments, the rotation speed of the drum in the first magnetron sputtering coating is X, the rotation speed of the drum in the third magnetron sputtering coating and the fifth magnetron sputtering coating is X, and the rotation speed of the drum in the second magnetron sputtering coating and the fourth magnetron sputtering coating is 0.7X to 0.9X.

[0011] In some embodiments, the glass coating method meets the following conditions: the magnetron sputtering coating includes ten times, wherein the first magnetron sputtering coating, the second magnetron sputtering coating, the fifth magnetron sputtering coating, the sixth magnetron sputtering coating, the ninth magnetron sputtering coating and the tenth magnetron sputtering coating are coated with SiO2 target materials, and the third magnetron sputtering coating, the fourth magnetron sputtering coating, the seventh magnetron sputtering coating and the eighth magnetron sputtering coating are coated with Nb2O5 target materials.

[0012] In some embodiments, the rotation speed of the drum in the first magnetron sputtering coating is X, the rotation speed of the drum in the third magnetron sputtering coating, the fifth magnetron sputtering coating, the seventh magnetron sputtering coating and the ninth magnetron sputtering coating is X, and the rotation speed of the drum in the second magnetron sputtering coating, the fourth magnetron sputtering coating, the sixth magnetron sputtering coating, the eighth magnetron sputtering coating and the tenth magnetron sputtering coating is -X.

[0013] In some embodiments, the rotation speed of the drum in the first magnetron sputtering coating is X, the rotation speed of the drum in the third magnetron sputtering coating, the fifth magnetron sputtering coating, the seventh magnetron sputtering coating and the ninth magnetron sputtering coating is X, and the rotation speed of the drum in the second magnetron sputtering coating, the fourth magnetron sputtering coating, the sixth magnetron sputtering coating, the eighth magnetron sputtering coating and the tenth magnetron sputtering coating is 0.7X to 0.9X.

[0014] According to another aspect of the present application, a coated glass is provided. The coated glass adopts the above-mentioned glass coating method. The coated glass includes a glass substrate, an anti-glare film, an anti-reflection anti-reflection film and an anti-fingerprint film. The anti-glare film, the anti-reflection anti-reflection film and the anti-fingerprint film are arranged on the glass substrate in sequence. The anti-glare film is made by spray coating, the anti-reflection anti-reflection film is made by magnetron sputtering coating, and the anti-fingerprint film is made by vacuum evaporation coating.

[0015] In some embodiments, the anti-reflection and anti-reflection film includes a first film layer, a second film layer, a third film layer, a fourth film layer and a fifth film layer, and the first film layer, the second film layer, the third film layer, the fourth film layer and the fifth film layer are stacked in sequence on the anti-glare film, the first film layer, the third film layer and the fifth film layer are SiO2 film layers, and the second film layer and the fourth film layer are Nb2O5 film layers.

[0016] In some embodiments, the anti-reflection and anti-reflection film includes a first layer, a second layer, a third layer, a fourth layer, a fifth layer, a sixth layer, a seventh layer, an eighth layer, a ninth layer and a tenth layer, and the first layer, the second layer, the third layer, the fourth layer, the fifth layer, the sixth layer, the seventh layer, the eighth layer, the ninth layer and the tenth layer are stacked in sequence on the anti-glare film, the first layer, the second layer, the fifth layer, the sixth layer, the ninth layer and the tenth layer are SiO2 film layers, and the third layer, the fourth layer, the seventh layer and the eighth layer are Nb2O5 film layers.

[0017] Through the above technical solution, the glass coating method provided by the present application first spray-coates the glass substrate. After the spray coating, a thin film with a certain roughness is formed on the surface of the glass substrate. This thin film can cause incident light to form diffuse reflection on its surface, thereby reducing the reflectivity of light and achieving the effect of anti-glare and reducing reflected light. During the magnetron sputtering coating process, due to the rotation of the drum, the angle between the particles and the glass surface when they hit the glass surface is stable within a certain range. The size of the angle mainly depends on the rotation speed of the drum. Since the surface after the spray coating is uneven, during the sputtering coating, the side of the protrusion away from the particle emission direction is less likely to contact the particles, and there is less particle accumulation at this location. Therefore, changing the rotation speed of the drum can change the angle between the particle movement direction and the glass surface, thereby avoiding dead corners during the particle accumulation process, reducing the poor appearance of the glass surface coating due to large angular thickness differences, and making the coating thickness more uniform. The technical solution of the present application effectively solves the problem of poor product quality caused by uneven coating thickness in the cover glass processing process in the prior art. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.

[0019] Figure 1 A schematic flow chart of the glass coating method disclosed in Example 1 of the present application is shown;

[0020] Figure 2 Shown Figure 1 Schematic diagram of the internal structure of the magnetron sputtering coating machine used in the glass coating method;

[0021] Figure 3 Shown Figure 1 A schematic cross-sectional structure diagram of coated glass produced by the glass coating method;

[0022] Figure 4 Shown Figure 1 A schematic cross-sectional structure diagram of an anti-reflection and anti-reflection film on coated glass produced by a glass coating method;

[0023] Figure 5 A schematic cross-sectional view of the anti-reflection and anti-reflection coating on coated glass produced by the glass coating method disclosed in Example 2 of the present application is shown;

[0024] Figure 6 A product diagram showing the drum's unchanged rotation speed during magnetron sputtering coating;

[0025] Figure 7 A product diagram of the coated glass according to an embodiment of the present application is shown.

[0026] Description of reference numerals:

[0027] 10. Glass substrate; 20. Anti-glare film; 30. Anti-reflection and anti-reflection film; 40. Anti-fingerprint film; 31. First film layer; 32. Second film layer; 33. Third film layer; 34. Fourth film layer; 35. Fifth film layer; 311. First layer; 312. Second layer; 321. Third layer; 322. Fourth layer; 331. Fifth layer; 332. Sixth layer; 341. Seventh layer; 342. Eighth layer; 351. Ninth layer; 352. Tenth layer. DETAILED DESCRIPTION

[0028] The following detailed description of the embodiments of the present application is provided in conjunction with the accompanying drawings and examples. The detailed description of the following examples and the accompanying drawings are intended to illustrate the principles of the present application, but are not intended to limit the scope of the present application. The present application may be implemented in many different forms and is not limited to the specific embodiments disclosed herein, but rather encompasses all technical solutions within the scope of the claims.

[0029] The present application provides these embodiments to make this application thorough and complete, and to fully express the scope of this application to those skilled in the art. It should be noted that: unless otherwise specifically stated, the relative arrangement of parts and steps, the composition of materials, numerical expressions and numerical values set forth in these embodiments should be interpreted as merely exemplary, and not as limiting.

[0030] It should be noted that, in the description of this application, unless otherwise specified, "plurality" means greater than or equal to two; the terms "upper," "lower," "left," "right," "inner," "outer," and the like, indicating directions or positional relationships, are intended solely to facilitate the description of this application and simplify the description, and do not indicate or imply that the devices or components referred to must have a specific orientation, be constructed, or operate in a specific orientation. Therefore, they should not be construed as limitations on this application. When the absolute position of the object being described changes, the relative positional relationship may also change accordingly.

[0031] In addition, the terms "first," "second," and similar terms used in this application do not denote any order, quantity, or importance, but are simply used to distinguish different parts. "Perpendicular" does not mean perpendicular in the strict sense, but rather means within the tolerance range. "Parallel" does not mean parallel in the strict sense, but rather means within the tolerance range. "Include" or "comprising" and similar terms mean that the elements preceding the word include the elements listed after the word, and do not exclude the possibility of other elements being included.

[0032] It should also be noted that, in the description of this application, unless otherwise expressly specified or limited, the terms "installed," "connected," and "connected" should be understood in a broad sense. For example, they can refer to fixed connections, detachable connections, or integral connections; they can refer to direct connections or indirect connections through an intermediary. A person of ordinary skill in the art will understand the specific meanings of the above terms in this application depending on the specific circumstances. When a specific device is described as being located between a first device and a second device, there may or may not be an intervening device between the specific device and the first or second device.

[0033] All terms used in this application have the same meaning as understood by one of ordinary skill in the art to which this application belongs, unless otherwise specifically defined. It should also be understood that terms defined in, for example, common dictionaries should be interpreted as having a meaning consistent with their meaning in the context of the relevant technology and should not be interpreted in an idealized or highly formal sense, unless explicitly defined as such herein.

[0034] Technologies, methods, and equipment known to ordinary technicians in the relevant art may not be discussed in detail, but where appropriate, the technologies, methods, and equipment should be considered part of the specification.

[0035] like Figures 1 to 4 As shown, the glass coating method disclosed in the first embodiment of the present application includes: spray coating the glass substrate 10; fixing the spray-coated glass substrate 10 on the roller of the magnetron sputtering coating machine, and performing multiple magnetron sputtering coatings on the glass substrate 10, wherein the rotation speed of the roller is different during adjacent magnetron sputtering coating processes; and vacuum evaporation coating the glass substrate 10.

[0036] Using the technical solution of Example 1, a glass substrate 10 is first spray-coated. After the spray coating, a thin film with a certain degree of roughness is formed on the surface of the glass substrate 10. This thin film can diffusely reflect incident light on its surface, thereby reducing the reflectivity of light and achieving the effect of anti-glare and reducing reflected light. During the magnetron sputtering coating process, due to the rotation of the drum, the angle between the particles and the glass surface when they hit the glass surface is stable within a certain range. The size of this angle mainly depends on the rotation speed of the drum. Since the surface after the spray coating is uneven, during sputtering, the side of the protrusion away from the particle emission direction is less likely to contact the particles, and there is less particle accumulation. Therefore, changing the rotation speed of the drum can change the angle between the particle movement direction and the glass surface, avoiding dead corners during the particle accumulation process, reducing the poor appearance of the glass surface coating due to large angular thickness differences, and making the coating thickness more uniform. The technical solution of Example 1 effectively solves the problem of poor product quality caused by uneven coating thickness in the existing cover glass processing process.

[0037] It should be noted that spray coating applies AG (anti-glare) coating to glass, magnetron sputtering coating applies AR (anti-reflection) coating to glass, and vacuum evaporation coating applies AF (anti-fingerprint) coating to glass. If the product is not AG coated, the surface unevenness problem will not occur, and the product quality problems mentioned above will not occur. Therefore, there is no need to use the above-mentioned method of changing the rotation speed of the roller in magnetron sputtering coating. The above-mentioned change in the roller rotation speed includes changing the speed and changing the rotation direction.

[0038] like Figures 1 to 4 As shown, in the technical solution of Example 1, the glass coating method meets the following conditions: the magnetron sputtering coating process includes five steps, wherein the first, third, and fifth magnetron sputtering coating processes are performed using SiO2 targets, and the second and fourth magnetron sputtering coating processes are performed using Nb2O5 targets. By superimposing high-refractive index material layers and low-refractive index material layers on the glass surface, the reflectivity of the glass is reduced, thereby achieving the purpose of anti-reflection, ensuring good visibility of the product even in strong light environments.

[0039] like Figures 1 to 4As shown, in the technical solution of Example 1, the rotation speed of the drum in the first magnetron sputtering coating is X, the rotation speed of the drum in the third and fifth magnetron sputtering coatings is X, and the rotation speed of the drum in the second and fourth magnetron sputtering coatings is -X. That is, when processing adjacent film layers, the rotation directions of the drum are opposite, avoiding the problem of uneven film thickness caused by the angle between the particle movement direction and the glass being consistent due to the consistent rotation speed.

[0040] According to another aspect of the present application, a coated glass is provided. The coated glass adopts the above-mentioned glass coating method. The coated glass includes a glass substrate 10, an anti-glare film 20, an anti-reflection anti-reflection film 30, and an anti-fingerprint film 40. The anti-glare film 20, the anti-reflection anti-reflection film 30, and the anti-fingerprint film 40 are arranged on the glass substrate 10 in sequence. The anti-glare film 20 is made by spray coating, the anti-reflection anti-reflection film 30 is made by magnetron sputtering coating, and the anti-fingerprint film 40 is made by vacuum evaporation coating. After the glass substrate 10 has been quality inspected and cleaned, the anti-glare film 20 is processed by spray coating, the anti-reflection anti-reflection film 30 is processed by magnetron sputtering coating, and the anti-fingerprint film 40 is processed by vacuum evaporation coating, and finally the coated glass is obtained. Because the surface of the anti-glare film 20 is uneven, the magnetron sputtering coating method of Example 1 can effectively avoid further increase in film thickness differences, which would result in a product with a noticeable poor appearance.

[0041] like Figure 3 and Figure 4 As shown, in the coated glass manufactured by the glass coating method of Example 1, the anti-reflection and anti-reflection film 30 includes a first film layer 31, a second film layer 32, a third film layer 33, a fourth film layer 34 and a fifth film layer 35. The first film layer 31, the second film layer 32, the third film layer 33, the fourth film layer 34 and the fifth film layer 35 are stacked on the anti-glare film 20 in sequence. The first film layer 31, the third film layer 33 and the fifth film layer 35 are SiO2 film layers, and the second film layer 32 and the fourth film layer 34 are Nb2O5 film layers. The first film layer 31 is coated with a SiO2 target at a rotation speed of X; the second film layer 32 is coated with Nb2O5 at a rotation speed of -X; the third film layer 33 is coated with a SiO2 target at a rotation speed of X; the fourth film layer 34 is coated with Nb2O5 at a rotation speed of -X; the fifth film layer 35 is coated with a SiO2 target at a rotation speed of X; by stacking materials with different reflectivities and opposite particle emission angles, the reflectivity of the glass after coating is reduced while ensuring uniform film thickness and better appearance quality.

[0042] like Figure 5As shown, the difference between the technical solution of Example 2 and the technical solution of Example 1 is that the glass coating method meets the following conditions: the magnetron sputtering coating includes ten times, wherein the first magnetron sputtering coating, the second magnetron sputtering coating, the fifth magnetron sputtering coating, the sixth magnetron sputtering coating, the ninth magnetron sputtering coating, and the tenth magnetron sputtering coating use SiO2 targets for coating, and the third magnetron sputtering coating, the fourth magnetron sputtering coating, the seventh magnetron sputtering coating, and the eighth magnetron sputtering coating use Nb2O5 targets for coating. In the technical solution of Example 2, the number of magnetron sputtering coatings is increased, and the materials of every two layers are consistent, further refining the coating film layer to improve the light transmittance of the glass surface.

[0043] like Figure 5 As shown, in the technical solution of Example 2, the rotation speed of the roller in the first magnetron sputtering coating is X, the rotation speed of the roller in the third magnetron sputtering coating, the fifth magnetron sputtering coating, the seventh magnetron sputtering coating, and the ninth magnetron sputtering coating is X, and the rotation speed of the roller in the second magnetron sputtering coating, the fourth magnetron sputtering coating, the sixth magnetron sputtering coating, the eighth magnetron sputtering coating, and the tenth magnetron sputtering coating is -X. In the technical solution of Example 2, the method of changing the rotation direction of the roller is also adopted to perform multiple coatings. The difference from the technical solution of Example 1 is that the coating materials of each two layers are the same. Therefore, when magnetron sputtering is performed on these two layers, the directions of roller rotation are opposite. Moreover, since the sputtered particles are of the same type, the angles between the particle movement directions and the glass are symmetrical in the two coatings, further ensuring the uniformity of the coating.

[0044] like Figure 5As shown, in the coated glass manufactured by the glass coating method of Example 2, the anti-reflection and anti-reflection film 30 includes a first layer 311, a second layer 312, a third layer 321, a fourth layer 322, a fifth layer 331, a sixth layer 332, a seventh layer 341, an eighth layer 342, a ninth layer 351, and a tenth layer 352. The first layer 311, the second layer 312, the third layer 321, the fourth layer 322, the fifth layer 331, the sixth layer 332, the seventh layer 341, the eighth layer 342, the ninth layer 351, and the tenth layer 352 are stacked in sequence on the anti-glare film 20. The first layer 311, the second layer 312, the fifth layer 331, the sixth layer 332, the ninth layer 351, and the tenth layer 352 are SiO2 film layers, and the third layer 321, the fourth layer 322, the seventh layer 341, and the eighth layer 342 are Nb2O5 film layers. The first layer 311 is coated with a SiO2 target at a drum speed of X; the second layer 312 is coated with a SiO2 target at a drum speed of -X; the third layer 321 is coated with a Nb2O5 target at a drum speed of X; the fourth layer 322 is coated with a Nb2O5 target at a drum speed of -X; the fifth layer 331 is coated with a SiO2 target at a drum speed of X; the sixth layer 332 is coated with a SiO2 target at a drum speed of -X; the seventh layer 341 is coated with a Nb2O5 target at a drum speed of X; the eighth layer 342 is coated with a Nb2O5 target at a drum speed of -X; the ninth layer 351 is coated with a SiO2 target at a drum speed of X; and the tenth layer 352 is coated with a SiO2 target at a drum speed of -X. The film layers are further refined, and the drums rotate in opposite directions during the coating process for each layer, ensuring a good appearance of the coated glass. The technical solution of Example 3 differs from the technical solution of Example 1 in that the rotation speed of the drum during the first magnetron sputtering coating is X, the rotation speed of the drum during the third and fifth magnetron sputtering coatings is X, and the rotation speed of the drum during the second and fourth magnetron sputtering coatings is 0.7X to 0.9X. The technical solution of Example 3 reduces the drum speed to increase the angle between the particle movement direction and the glass surface, thereby reducing the occurrence of dead angles during the sputtering process and ensuring uniform coating.

[0045] The technical solution of Example 4 differs from that of Example 2 in that the rotation speed of the drum during the first magnetron sputtering coating is X, the rotation speed of the drum during the third, fifth, seventh, and ninth magnetron sputtering coatings is X, and the rotation speed of the drum during the second, fourth, sixth, eighth, and tenth magnetron sputtering coatings is 0.7X to 0.9X. Similar to Example 3, Example 4 also reduces the drum rotation speed to reduce dead spots and thereby ensure uniform film thickness. The greater number of coating layers in Example 4 further ensures uniform film thickness.

[0046] In the actual production process, the coating thickness and number of layers need to be calculated based on the refractive index and thickness of the glass itself, and the rotation speed and direction of the drum are specifically determined according to the model of the magnetron sputtering coating machine. The rotation speed and direction can be adjusted at the same time. For example, the drum speed is X during the first magnetron sputtering coating, and the drum speed is -0.7X to -0.9X during the second magnetron sputtering coating, etc., to compensate for the large difference in film thickness caused by a single rotation method and ensure a good product appearance.

[0047] like Figure 6 As shown in the figure, the product with the drum rotating at the same speed during the magnetron sputtering coating process is placed under the inspection lamp. The bright part in the picture is the illumination area of the inspection lamp. The darker irregular lines can be observed, which are the locations where the particles accumulate less during the coating process. Figure 7The product shown in the figure is made using the glass coating method of the present application. The bright area in the image is the area illuminated by the inspection light, and no obvious surface defects were observed. As can be seen from the above, among the AG, AR, and AF processes, the AG process will leave the glass surface with a certain degree of roughness. A rough substrate surface significantly disrupts the growth of sputtered atoms or molecules as they deposit onto the substrate to form a thin film. On an ideally smooth substrate, sputtered particles deposit relatively evenly, forming a continuous, smooth film. However, a rough substrate surface exhibits an uneven microstructure. After the sputtered particles reach the substrate, the atoms accumulate at different heights in these uneven areas. This height difference is amplified during the film growth process, resulting in variations in film thickness and, ultimately, an undesirable "orange peel" appearance. Internal stress is generated during the film deposition process. On a smooth substrate, stress is relatively evenly distributed within the film. However, when the substrate is rough, the stress distribution becomes uneven due to differences in film thickness at different locations. This uneven stress can cause localized deformation of the film during growth. In areas of high stress, the film may shrink or stretch, further exacerbating surface unevenness and leading to the appearance of an "orange peel" effect. Because the barrel (drum) rotates at a constant speed during coating production, AG glass, unlike normal glass, has a certain degree of surface roughness. Consequently, angular thickness variations can occur on the AG glass surface. Specifically, when sputtered particles strike the substrate at a certain angle, the raised areas of the substrate obscure some of the recessed areas. This is similar to how the raised areas of an object cast a shadow behind them in sunlight. For magnetron sputtering, this means that the obscured recessed areas do not receive sufficient sputtered particles, resulting in slow film growth. Unobstructed areas, on the other hand, continue to grow normally. This discrepancy becomes increasingly pronounced as film thickness increases, ultimately resulting in an uneven, "orange peel" appearance on the film surface. Based on the above principle analysis, a coating method is proposed in which the rotation direction or speed of the barrel holding the glass is changed with each or every two layers of coating. The specific number of layers for which the rotation direction is changed requires production verification based on the specific equipment and film system. By changing the coating direction, the angle at which atoms sputter onto the glass surface is altered, which, to a certain extent, prevents the amplification of film thickness variations after coating in the same direction. This not only averages the film thickness but also reduces the stress caused by uneven film thickness. Each film layer can be further layered, and the layers can be altered during coating. Changing the rotation direction can reduce the occurrence of orange peel defects and enhance the surface hardness and friction resistance of the film structure. The specific coating method should be verified and validated based on the machine conditions through repeated testing to determine the most effective implementation.

[0048] Thus far, various embodiments of the present application have been described in detail. To avoid obscuring the concept of the present application, some details well known in the art have not been described. Based on the above description, those skilled in the art can fully understand how to implement the technical solutions of this application.

[0049] Although some specific embodiments of the present application have been described in detail through examples, those skilled in the art will understand that the above examples are for illustrative purposes only and are not intended to limit the scope of the present application. Those skilled in the art will understand that the above embodiments may be modified or some technical features may be replaced by equivalents without departing from the scope and spirit of the present application. In particular, as long as there are no structural conflicts, the various technical features mentioned in the various embodiments may be combined in any manner.

Claims

1. A glass coating method, characterized in that: The following steps are involved: performing spray coating on the glass substrate (10); The glass substrate (10) after spray coating is fixed on a roller of a magnetron sputtering coating machine, and the glass substrate (10) is subjected to multiple magnetron sputtering coatings, wherein the rotation speed of the roller is different during adjacent magnetron sputtering coating processes; The glass substrate (10) is subjected to vacuum evaporation coating.

2. The glass coating method according to claim 1, characterized in that: The glass coating method meets the following conditions: the magnetron sputtering coating includes five times, wherein the first magnetron sputtering coating, the third magnetron sputtering coating and the fifth magnetron sputtering coating are coated with SiO2 target material, and the second magnetron sputtering coating and the fourth magnetron sputtering coating are coated with Nb2O5 target material.

3. The glass coating method according to claim 2, characterized in that: The rotation speed of the roller in the first magnetron sputtering coating is X, the rotation speed of the roller in the third and fifth magnetron sputtering coatings is X, and the rotation speed of the roller in the second and fourth magnetron sputtering coatings is -X.

4. The glass coating method according to claim 2, characterized in that: The rotation speed of the roller in the first magnetron sputtering coating is X, the rotation speed of the roller in the third and fifth magnetron sputtering coatings is X, and the rotation speed of the roller in the second and fourth magnetron sputtering coatings is 0.7X to 0.9X.

5. The glass coating method according to claim 1, characterized in that: The glass coating method meets the following conditions: the magnetron sputtering coating includes ten times, wherein the first magnetron sputtering coating, the second magnetron sputtering coating, the fifth magnetron sputtering coating, the sixth magnetron sputtering coating, the ninth magnetron sputtering coating and the tenth magnetron sputtering coating are coated with SiO2 targets, and the third magnetron sputtering coating, the fourth magnetron sputtering coating, the seventh magnetron sputtering coating and the eighth magnetron sputtering coating are coated with Nb2O5 targets.

6. The glass coating method according to claim 5, characterized in that: The rotation speed of the roller in the first magnetron sputtering coating is X, the rotation speed of the roller in the third magnetron sputtering coating, the fifth magnetron sputtering coating, the seventh magnetron sputtering coating and the ninth magnetron sputtering coating is X, and the rotation speed of the roller in the second magnetron sputtering coating, the fourth magnetron sputtering coating, the sixth magnetron sputtering coating, the eighth magnetron sputtering coating and the tenth magnetron sputtering coating is -X.

7. The glass coating method according to claim 5, characterized in that: The rotation speed of the roller in the first magnetron sputtering coating is X, the rotation speed of the roller in the third magnetron sputtering coating, the fifth magnetron sputtering coating, the seventh magnetron sputtering coating and the ninth magnetron sputtering coating is X, and the rotation speed of the roller in the second magnetron sputtering coating, the fourth magnetron sputtering coating, the sixth magnetron sputtering coating, the eighth magnetron sputtering coating and the tenth magnetron sputtering coating is 0.7X to 0.9X.

8. A coated glass, characterized in that: The coated glass adopts the glass coating method described in any one of claims 1 to 7, and the coated glass comprises a glass substrate (10), an anti-glare film (20), an anti-reflection anti-reflection film (30) and an anti-fingerprint film (40), wherein the anti-glare film (20), the anti-reflection anti-reflection film (30) and the anti-fingerprint film (40) are sequentially arranged on the glass substrate (10), the anti-glare film (20) is made by the spray coating, the anti-reflection anti-reflection film (30) is made by the magnetron sputtering coating, and the anti-fingerprint film (40) is made by vacuum evaporation coating.

9. The coated glass according to claim 8, characterized in that: The anti-reflection and anti-reflection film (30) comprises a first film layer (31), a second film layer (32), a third film layer (33), a fourth film layer (34) and a fifth film layer (35); the first film layer (31), the second film layer (32), the third film layer (33), the fourth film layer (34) and the fifth film layer (35) are stacked in sequence on the anti-glare film (20); the first film layer (31), the third film layer (33) and the fifth film layer (35) are SiO2 film layers, and the second film layer (32) and the fourth film layer (34) are Nb2O5 film layers.

10. The coated glass according to claim 8, characterized in that: The anti-reflection and anti-reflection film (30) comprises a first layer (311), a second layer (312), a third layer (321), a fourth layer (322), a fifth layer (331), a sixth layer (332), a seventh layer (341), an eighth layer (342), a ninth layer (351) and a tenth layer (352), wherein the first layer (311), the second layer (312), the third layer (321), the fourth layer (322), the fifth layer (331), the sixth layer (332), the seventh layer (341), the eighth layer (342), the ninth layer (351) and the tenth layer (352) are (341), the eighth layer (342), the ninth layer (351) and the tenth layer (352) are stacked in sequence on the anti-glare film (20), the first layer (311), the second layer (312), the fifth layer (331), the sixth layer (332), the ninth layer (351) and the tenth layer (352) are SiO2 film layers, and the third layer (321), the fourth layer (322), the seventh layer (341) and the eighth layer (342) are Nb2O5 film layers.

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