High-frequency pulse temperature control gas-liquid mixed flow cleaning system and cleaning method for frame filter

Abstract

The invention discloses a high-frequency pulse temperature control gas-liquid mixed flow cleaning system and method for a frame filter, and relates to the technical field of solid-liquid separation equipment, and the cleaning system comprises a filter frame mounting device, a high-frequency pulse water supply assembly, a washing type filter frame assembly and a filter assembly. The washing type filter frame assemblies and the filter assemblies are arranged on the filter frame installation equipment in a staggered mode, and the high-frequency pulse water supply assembly conveys high-frequency pulse cleaning liquid to the washing type filter frame assemblies. According to the system, high-pressure air and gas-liquid mixed liquid are generated through the ultra-aeration generator and converted into high-frequency pulse cleaning liquid through the high-frequency pulse generator, and the sieve plate and the filter cloth are washed through the washing nozzle to promote falling of a filter cake. The vacuum system is connected with the washing type filter frame assembly through the valve assembly, and cleaning liquid discharging and filter cake melting are achieved through vacuum suction. The washing liquid heat exchanger can adjust the temperature of washing liquid, and variable-temperature washing is achieved. The device is high in cleaning efficiency, low in energy consumption, optimized in equipment structure and suitable for various solid-liquid separation scenes.

Description

Technical Field

[0001] The present invention relates to the technical field of solid-liquid separation equipment, and in particular to a high-frequency pulse temperature-controlled gas-liquid mixed flow cleaning system and a cleaning method for a frame filter. Background Art

[0002] In the field of solid-liquid separation, plate-and-frame filters are widely used in industries such as chemical, pharmaceutical, and food processing due to their high separation efficiency. Traditional plate-and-frame filters typically use filter cloth to filter suspensions containing solid particles. The filter cloth is directly supported by a support plate at the rear, with little to no gap between the cloth and the support plate. Filtration relies primarily on a pressure differential to propel the filtrate through the cloth, achieving solid-liquid separation. However, this structure has several drawbacks. First, due to the small or almost non-existent gap between the filter cloth and the support plate, the filtrate flow path is narrow, resulting in high filtration resistance, which affects filtration efficiency and makes it difficult to meet the requirements of filtering high-concentration, high-viscosity solid-liquid mixtures. Second, after the filter cake is formed, traditional backwashing methods are difficult to effectively remove from the filter cloth. During backwashing, the water flow cannot evenly impact the filter cloth and filter cake, resulting in poor cleaning results, long cleaning time, and high energy consumption. Backwashing is even more difficult for highly viscous filter cakes to be completely removed from the filter cloth, causing clogging of the filter cloth, affecting filtration efficiency, reducing filter cake wash efficiency, and making it difficult to obtain high-purity filter cakes. This seriously hinders the continuous and stable operation of the filter and improves production efficiency. Therefore, developing a frame filter cleaning system that can achieve high-frequency pulse cleaning and combine variable temperature control has become a technical problem that needs to be solved urgently. Summary of the Invention

[0003] This invention addresses the challenges of high filtration resistance, low cleaning efficiency, and high energy consumption associated with existing plate-and-frame filters during high-concentration, high-viscosity solid-liquid separation processes. By providing a high-frequency pulse temperature-controlled gas-liquid mixed flow cleaning system and method for frame filters, this invention significantly improves cleaning efficiency and reduces operating costs through optimized structural design, the introduction of high-frequency pulse cleaning technology, and the integration of variable temperature control.

[0004] To achieve the above object, the present invention is implemented according to the following technical solutions: A high-frequency pulse temperature-controlled gas-liquid mixed flow cleaning system for a frame filter includes a filter frame mounting device, a high-frequency pulse water supply assembly, a washing filter frame assembly, and a filter assembly. The washing filter frame assemblies and filter assemblies are arranged in multiple groups, staggered on the filter frame mounting device. The drainage end of the high-frequency pulse water supply assembly is connected to the water supply end of the washing filter frame assembly; the drainage end of the high-frequency pulse water supply assembly is connected to the water supply end of the washing filter frame assembly to enable the delivery of high-frequency pulse cleaning liquid. The washing filter frame assembly is used to create a gap between two adjacent groups of filter assemblies, with the width of the gap equal to the thickness of the filter assembly, thereby reducing flow resistance and optimizing the cleaning effect.

[0005] Furthermore, the high-frequency pulse water supply component includes an overexposure generator, a washing liquid container, and a high-frequency pulse generator. The inlet of the overexposure generator is connected to the container containing the washing liquid container, and is used to inject high-pressure air into the washing liquid to generate a gas-liquid mixture of high-pressure air and washing liquid. The outlet of the washing liquid container and the outlet of the high-frequency pulse generator are simultaneously connected to the inlet of the washing filter frame assembly to ensure a stable supply of washing liquid. The high-frequency pulse generator converts the gas-liquid mixture into a high-frequency pulse cleaning liquid by applying periodic pressure changes to the gas-liquid mixture. The frequency range of the high-frequency pulse generator is a specific value to meet the cleaning requirements of different materials.

[0006] Furthermore, a wash liquid heat exchanger is provided between the outlet of the wash liquid container and the inlet of the wash filter frame assembly. The wash liquid heat exchanger precisely controls the temperature of the wash liquid by adjusting the flow and temperature of the heat exchange medium to suit the cleaning characteristics of different materials. The temperature range of the heat exchange medium is set according to the physical and chemical properties of the specific material, thereby achieving high-frequency pulse temperature-variable cleaning.

[0007] Specifically, the washing filter frame assembly includes a filter frame, a sieve plate, a washing pipe, a sieve plate support column, and a washing nozzle. There are two sieve plates, and a plurality of sieve plate support columns are arranged between the two sieve plates to maintain the spacing between the sieve plates and provide support. The height range of the sieve plate support columns and the spacing between adjacent sieve plate support columns need to be uniform to ensure that the gap between the sieve plates is uniform and stable. The washing pipe is located in the gap between the two sieve plates, and a plurality of washing nozzles are evenly distributed on the washing pipe. The inlet of the washing pipe is connected to the washing water outlet of the washing liquid heat exchanger. The sieve plate, washing pipe, sieve plate support column, and washing nozzle are fixedly arranged in the filter frame, and the filter assembly is arranged on the outside of the sieve plate. The number and distribution density of the washing nozzles should be appropriately designed to ensure that the cleaning liquid can fully cover the back area of the sieve plate.

[0008] The filter assembly consists of two filter cloths and a frame. The two filter cloths are placed on both ends of the frame, forming a filter cake between the two filter cloths. The material and pore size of the filter cloths are selected based on the particle size and viscosity of the material to be processed to ensure effective filtration and cake formation.

[0009] The cleaning method of the frame filter high-frequency pulse temperature-controlled gas-liquid mixed flow cleaning system of the present invention comprises the following steps: S1: injecting high-pressure air into the washing liquid in the washing liquid container through the super exposure generator to generate a gas-liquid mixture of high-pressure air and washing liquid; S2: The high-frequency pulse generator receives the mixture of high-pressure air and cleaning liquid from the super-exposure generator and converts it into a high-frequency pulse cleaning liquid; S3: The high-frequency pulse cleaning liquid is transported to the washing pipe through the pipeline, and multiple washing nozzles on the washing pipe wash the back of the sieve plate; S4: The high-frequency pulse cleaning liquid passes through the sieve plate to flush the filter cloth, flushing and separating the filter cake from the filter cloth, making it easier to fall off the filter cake; As an improvement, the present invention adjusts the temperature of the washing liquid through a washing liquid heat exchanger as needed to achieve high-frequency pulse temperature-variable washing to further improve the washing efficiency.

[0010] As an improvement, the present invention also includes a vacuum system, the water inlet of which is connected to the drain outlet of the washing filter frame assembly. A valve assembly is provided between the high-frequency pulse water supply assembly, the washing filter frame assembly, and the vacuum system. The valve assembly includes a first valve, a second valve, a third valve, a fourth valve, and a fifth valve, which are used to precisely control the flow direction and flow rate of the high-frequency pulse cleaning fluid. The inlet of the first valve is connected to the outlets of the washing fluid container, the washing fluid heat exchanger, and the high-frequency pulse generator, and its outlet is connected to the inlets of the second valve, the third valve, and the fourth valve. The outlets of the second valve, the third valve, and the fourth valve are respectively connected to the washing pipe inlets of the three groups of washing filter frame assemblies. The fifth valve is provided between the outlet of the middle group of washing filter frame assemblies and the vacuum system to control the discharge path of the cleaning fluid. The provision of the valve assembly ensures that the high-frequency pulse cleaning fluid can flow in a predetermined order and path, thereby achieving an efficient cleaning process.

[0011] The vacuum system is connected to the middle set of washable filter frame assemblies via a fifth valve. It uses vacuum suction to remove the high-frequency pulse cleaning fluid after cleaning, further drying the filter cake. A vacuum pump is installed within the vacuum system, which uses negative pressure to extract the cleaning fluid from the washable filter frame assemblies. This process not only ensures the rapid discharge of the cleaning fluid but also further enhances the cleaning effect through the negative pressure environment. Specifically, the vacuum system's suction completely removes any residual cleaning fluid on the sieve plate and filter cloth surfaces, preventing secondary contamination. Furthermore, the negative pressure environment accelerates the drying process of the filter cake, facilitating subsequent collection.

[0012] The present invention also provides a cleaning method for a frame filter high-frequency pulse temperature-controlled gas-liquid mixed flow cleaning system, the specific steps of which are as follows: S1: High-pressure air is injected into the washing liquid in the washing liquid container through the super exposure generator to generate a high-pressure gas-liquid mixture.

[0013] S2: The high-frequency pulse generator receives the high-pressure gas-liquid mixture from the super-exposure generator and converts it into a high-frequency pulse cleaning fluid.

[0014] S3: Open the first valve, the second valve and the third valve, close the fourth valve, and the high-frequency pulse cleaning liquid is transported to the washing pipes of the two sets of washing filter frame assemblies through the pipeline, and the washing nozzle flushes the back of the sieve plate.

[0015] S4: High-frequency pulse cleaning liquid passes through the sieve plate to flush the filter cloth and filter cake, flushing the filter cake from the surface of the filter cloth to facilitate the shedding of the filter cake.

[0016] S5: Open the fifth valve and start the vacuum system. The high-frequency pulse cleaning liquid passes through two sets of washing filter frame assemblies and then enters the middle set of washing filter frame assemblies. The suction force generated by the vacuum system sucks away the cleaned liquid, achieving thorough cleaning while cooperating with high-pressure suction.

[0017] S6: Open the fourth valve, close the second valve and the third valve, and further clean the washing pipe of the middle group of washing filter frame assemblies.

[0018] Compared with the prior art, the present invention has the following beneficial effects: 1. This invention significantly reduces filtration resistance by increasing the flow space between the sieve plates. The provision of sieve plate support columns creates a larger flow area between the two sieve plates, avoiding the problem of excessive filtration pressure caused by narrow flow paths, thereby improving filtration efficiency. It is particularly suitable for filtering high-concentration, high-viscosity solid-liquid mixtures, effectively solving the problem of high filtration resistance and difficulty in filtration caused by the small gap between the filter cloth and the support plate in traditional filters.

[0019] 2. High-frequency pulse cleaning technology is used, combined with a gas-liquid mixed flow, to generate a high-frequency pulse cleaning fluid with a powerful impact and cleaning effect. Multiple washing nozzles on the washing pipe can evenly flush the back of the sieve plate, allowing the cleaning fluid to fully cover the sieve plate and filter cloth, quickly and thoroughly washing the filter cake away from the filter cloth. This greatly improves cleaning efficiency, shortens cleaning time, reduces washing fluid and energy consumption, and lowers operating costs. It also effectively solves the problem of difficult to achieve uniform cleaning and poor cleaning effect in backwashing in existing technologies, avoids filter cloth clogging, improves filter cake washing efficiency, and facilitates the production of high-purity filter cake.

[0020] 3. The system is equipped with a wash liquid heat exchanger, which can flexibly adjust the wash liquid temperature according to the characteristics of different materials, realizing high-frequency pulse temperature-variable washing. This design enables the cleaning process to select the most suitable cleaning temperature for each type of material, further improving the cleaning effect, enhancing the adaptability to different materials, and improving the overall performance and application range of the filter.

[0021] 4. The staggered layout design of the washing filter frame assembly and the filter assembly fully utilizes the space of the filter frame installation equipment, improves the overall utilization rate of the equipment, enables the filter to achieve more efficient solid-liquid separation and cleaning functions in a limited space, and improves the economy and practicality of the equipment.

[0022] 5. The use of a vacuum system not only accelerates the discharge of the cleaning fluid but also further dries the filter cake, facilitating subsequent processing and collection. Compared with traditional cleaning methods, the present invention significantly reduces the consumption of cleaning fluid and energy, offering significant advantages such as reduced time consumption, excellent cleaning effect, and low energy consumption, thus meeting environmental protection requirements. The present invention is particularly suitable for processing high-viscosity, high-concentration solid-liquid mixtures and has broad application prospects in the fields of chemical industry, pharmaceuticals, and food processing, providing an efficient, energy-saving, and environmentally friendly solution for industrial solid-liquid separation and cleaning. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 It is a schematic diagram of the overall structure of the present invention; Figure 2 This is a schematic diagram of the connection between the washing filter frame assembly and the high-frequency pulse water supply assembly of the present invention; Figure 3 Schematic diagram of the cross-sectional structure of the washing filter frame assembly of the present invention; Figure 4 This is a schematic diagram of the end face structure of the washing filter frame assembly of the present invention; Figure 5 It is a structural schematic diagram of the vacuum system of the present invention.

[0024] The accompanying drawings are numbered as follows: 1. Superexposure generator; 2. Washing liquid container; 3. Washing liquid heat exchanger; 4. Filter frame installation equipment; 5. Filter cloth; 6. Filter frame; 7. Sieve plate; 8. Filter cake; 9. Washing pipe; 10. Sieve plate support column; 11. High-frequency pulse generator; 12. Washing nozzle; 13. Vacuum system; 14. First valve; 15. Second valve; 16. Third valve; 17. Fourth valve; 18. Fifth valve. DETAILED DESCRIPTION

[0025] The present invention will be further described below with reference to the accompanying drawings and specific embodiments. The exemplary embodiments and descriptions of the present invention are used to explain the present invention but are not intended to limit the present invention.

[0026] like Figures 1 to 4 As shown, the present invention provides a high-frequency pulse cleaning system and method for a frame filter, designed to achieve efficient filter cleaning. The system's main components include a filter frame mounting device 4, a high-frequency pulse water supply assembly, a washing filter frame assembly, and a filter assembly. The filter frame mounting device 4 serves as the core support, securing and staggering multiple groups of washing filter frame assemblies and filter assemblies. Both the washing filter frame assemblies and the filter assemblies are arranged in a staggered manner on the filter frame mounting device 4 to ensure efficient cleaning. The high-frequency pulse water supply assembly's drainage port is connected to the washing filter frame assembly's water supply port, enabling the entire system to achieve efficient cleaning. The washing filter frame assembly is configured to create a gap between two adjacent groups of filter assemblies, with the width of the gap being equal to the thickness of the filter assembly. The function of the washing filter frame assembly is to create a gap between two adjacent groups of filter assemblies, with the width of the gap being at least equal to the thickness of the filter assembly, thereby significantly reducing flow resistance during filtration. This design optimizes the flow space between the sieve plates 7, avoids the problem of excessive filtration pressure caused by narrow flow paths, and is particularly suitable for filtering high-concentration, high-viscosity solid-liquid mixtures.

[0027] The high-frequency pulse water supply assembly is the core of the entire cleaning system. It comprises an overexposure generator 1, a cleaning liquid container 2, and a high-frequency pulse generator 11. The inlet of the overexposure generator 1 is connected to the cleaning liquid container 2. High-pressure air is injected into the cleaning liquid to generate a gas-liquid mixture of high-pressure air and cleaning liquid. This mixture is then piped to the high-frequency pulse generator 11, which applies periodic pressure variations to the mixture, converting it into a cleaning liquid with a high-frequency pulse frequency. This process precisely controls the pressure and flow rate of the high-pressure air to ensure that the output high-frequency pulse cleaning liquid has stable physical properties, meeting the cleaning requirements of different materials. The outlets of the cleaning liquid container 2 and the high-frequency pulse generator 11 are simultaneously connected to the inlet of the cleaning filter frame assembly. Furthermore, a cleaning liquid heat exchanger 3 is located between the outlet of the cleaning liquid container 2 and the inlet of the cleaning filter frame assembly to regulate the temperature of the cleaning liquid. By controlling the flow rate and temperature of the heat exchange medium, the cleaning liquid heat exchanger 3 selects an appropriate cleaning temperature based on the material characteristics, thereby achieving high-frequency pulse variable temperature cleaning. For example, when processing high-viscosity materials, the washing liquid can be heated to 50-60°C to enhance the cleaning effect; when processing temperature-sensitive materials, the washing liquid can be cooled to 10-20°C to avoid physical or chemical changes in the material due to high temperature.

[0028] The washing filter frame assembly consists of multiple components, including the filter frame 6, two sieve plates 7, a washing pipe 9, sieve plate support columns 10, and washing nozzles 12. Multiple sieve plate support columns 10 are installed between the two sieve plates 7 to maintain spacing and provide support. The height range of the sieve plate support columns 10 and the spacing between adjacent sieve plate support columns 10 must be uniform to ensure a uniform and stable gap between the sieve plates. The washing pipe 9 is located in the gap between the two sieve plates 7, and multiple washing nozzles 12 are evenly distributed on it. The inlets of these nozzles are connected to the washing water outlet of the washing liquid heat exchanger 3, ensuring that high-frequency pulsed cleaning liquid is delivered to the washing nozzles 12 through the washing pipe 9. The number and distribution density of the washing nozzles 12 must be uniform to ensure that the cleaning liquid fully covers the back area of the sieve plates 7. The sieve plates 7, washing pipe 9, sieve plate support columns 10, and washing nozzles 12 are all securely mounted inside the filter frame 6, while the filter assembly is located outside the sieve plates 7.

[0029] The primary function of the filter assembly is to filter solid-liquid mixtures. The filter assembly comprises multiple filter cloths 5, positioned between two sieve plates 7. A filter cake 8 forms on the outer side of the space between the two filter cloths 5. The material and pore size of the filter cloths 5 are selected based on the particle size and viscosity of the material being processed to ensure effective filtration and cake formation. For example, when processing a suspension containing micron-sized particles, a filter cloth with a pore size of 10-20 microns is suitable; when processing materials containing larger particles, a filter cloth with a pore size of 50-100 microns is suitable.

[0030] The specific washing process of the high-frequency pulse cleaning system of the frame filter is as follows: S1: High-pressure air is injected into the cleaning liquid in cleaning liquid container 2 via superexposure generator 1, generating a gas-liquid mixture of high-pressure air and cleaning liquid. The pressure range and flow rate of the high-pressure air are precisely controlled to ensure that the physical properties of the gas-liquid mixture meet subsequent cleaning requirements. For example, the pressure of the high-pressure air can be set to 0.5-0.8 MPa, and the flow rate can be adjusted to 10-20 liters per minute based on the volume of cleaning liquid container 2.

[0031] S2: High-frequency pulse generator 11 receives a mixture of high-pressure air and cleaning fluid from superexposure generator 1 and converts it into a high-frequency pulse cleaning fluid by applying periodic pressure changes. The operating frequency range of high-frequency pulse generator 11 is set according to the specific cleaning requirements, typically between 20-50 Hz for optimal cleaning results.

[0032] S3: The high-frequency pulse cleaning liquid is delivered to the washing pipe 9 through a pipeline. Multiple washing nozzles 12 on the washing pipe 9 rinse the back of the sieve plate 7. The spray angle and spray pressure of the washing nozzles 12 are optimized to ensure that the cleaning liquid can evenly cover the entire back area of the sieve plate 7. For example, the spray angle of the washing nozzles 12 can be set to 30-45 degrees, and the spray pressure can be set to 0.2-0.4 MPa.

[0033] S4: High-frequency pulse cleaning fluid passes through the sieve plate 7 to flush the filter cloth 5 and filter cake 8. After the filter cake is pushed out, the filter cake 8 is flushed and separated from the filter cloth 5, facilitating its removal. The flushing time and flow rate are adjusted according to the thickness and viscosity of the filter cake to ensure effective cleaning. For example, when processing a filter cake with a thickness of 5-10 mm, the flushing time can be set to 5-10 minutes and the flow rate can be set to 15-20 liters per minute.

[0034] As an improvement, the present invention adjusts the temperature of the washing liquid as needed through the washing liquid heat exchanger 3, achieving high-frequency pulse variable temperature washing and further improving cleaning efficiency. The temperature range of variable temperature washing is set according to the physical and chemical properties of the material to further improve cleaning efficiency. For example, when processing high-viscosity materials, the washing liquid can be heated to 50-60°C to enhance the cleaning effect; when processing temperature-sensitive materials, the washing liquid can be cooled to 10-20°C to prevent physical or chemical changes in the material caused by high temperature.

[0035] The present invention significantly reduces filtration resistance by increasing the flow space between the sieve plates 7. The design of the sieve plate support column 10 creates a larger flow area between the two sieve plates 7, avoiding the problem of excessive filtration pressure caused by a narrow flow path, thereby improving filtration efficiency. It is particularly suitable for filtering high-concentration, high-viscosity solid-liquid mixtures. In addition, the material and surface treatment process of the sieve plate support column 10 have been optimized to enhance its corrosion resistance and mechanical strength. For example, the sieve plate support column 10 can be made of stainless steel and polished on its surface to reduce frictional resistance and prevent corrosion.

[0036] The high-frequency pulse cleaning technology, combined with a mixed gas-liquid flow, produces a high-frequency pulse cleaning fluid with a powerful impact and cleaning effect. The multiple washing nozzles 12 on the washing pipe 9 have been optimized to evenly flush the back of the sieve plate 7, ensuring that the cleaning fluid fully covers the sieve plate 7 and filter cloth 5, quickly and thoroughly flushing the filter cake 8 from the filter cloth 5. This design significantly shortens cleaning time, reduces washing fluid and energy consumption, and lowers operating costs. Furthermore, by optimizing the distribution density and spray angle of the washing nozzles 12, the difficulty of achieving uniform cleaning with traditional backwashing methods is resolved, preventing clogging of the filter cloth 5 and improving the washing efficiency of the filter cake 8.

[0037] The system features a wash liquid heat exchanger 3, which flexibly adjusts the wash liquid temperature based on the characteristics of different materials, achieving high-frequency pulse temperature-variable cleaning. This design allows the optimal cleaning temperature to be selected for each material, further improving cleaning effectiveness and enhancing adaptability to different materials. By adjusting the flow rate and temperature of the heat exchange medium, the wash liquid temperature range is ensured to meet the cleaning requirements of the material, thereby enhancing the overall performance and application range of the filter.

[0038] The staggered layout of the wash filter frame assemblies and filter components fully utilizes the space within the filter frame mounting device (4), improving overall equipment utilization. This staggered layout is precisely calculated to ensure uniform and stable spacing between each set of wash filter frame assemblies and filter components, enabling more efficient solid-liquid separation and cleaning within a limited space. This design not only improves the equipment's cost-effectiveness and practicality, but also enables the filter to adapt to the solid-liquid separation and cleaning needs of various industrial scenarios.

[0039] The vacuum system 13 is connected to the middle set of washing filter frame assemblies via a fifth valve 18. It uses vacuum suction to remove the high-frequency pulse cleaning fluid after cleaning, while also further drying the filter cake. A vacuum pump is housed within the vacuum system 13, which uses negative pressure to extract the cleaned liquid from the washing filter frame assemblies. This process not only allows for the rapid discharge of the cleaning fluid but also further enhances the cleaning effect through the negative pressure environment. Specifically, the vacuum system's suction completely removes any cleaning fluid remaining on the surfaces of the sieve plate 7 and filter cloth 5, preventing secondary contamination. Furthermore, the negative pressure environment accelerates the drying process of the filter cake 8, facilitating subsequent collection of the filter cake.

[0040] The valve assembly includes a first valve 14, a second valve 15, a third valve 16, a fourth valve 17, and a fifth valve 18, which are used to precisely control the flow direction and flow rate of the high-frequency pulse cleaning fluid. The inlet of the first valve 14 is connected to the outlets of the cleaning fluid container 2, the cleaning fluid heat exchanger 3, and the high-frequency pulse generator 11, and its outlet is connected to the inlets of the second valve 15, the third valve 16, and the fourth valve 17. The outlets of the second valve 15, the third valve 16, and the fourth valve 17 are respectively connected to the inlets of the washing pipes 9 of the three groups of washing filter frame assemblies. The fifth valve 18 is arranged between the outlet of the middle group of washing filter frame assemblies and the vacuum system 13 to control the discharge path of the cleaning fluid. The arrangement of the valve assembly ensures that the high-frequency pulse cleaning fluid can flow in a predetermined order and path, thereby achieving an efficient cleaning process.

[0041] Based on the above structure, the present invention provides a cleaning method.

[0042] S1 uses the superexposure generator 1 to inject high-pressure air into the cleaning liquid in the cleaning liquid container 2, generating a high-pressure gas-liquid mixture. Specifically, the superexposure generator 1 uses its built-in high-pressure air pump to inject high-pressure air into the cleaning liquid container 2, thoroughly mixing the cleaning liquid and air to form a stable gas-liquid mixture. This gas-liquid mixture has high kinetic energy, effectively enhancing the impact and coverage of the subsequent cleaning process.

[0043] The S2 high-frequency pulse generator 11 receives the high-pressure gas-liquid mixture from the superexposure generator 1 and converts it into a high-frequency pulse cleaning fluid. An internal oscillator in the high-frequency pulse generator 1 breaks down the gas-liquid mixture into high-frequency pulses through rapid opening and closing. This high-frequency pulse cleaning fluid not only has a strong impact but also covers a larger cleaning area in a shorter time, significantly improving cleaning efficiency.

[0044] S3 opens the first valve 14, the second valve 15 and the third valve 16, and closes the fourth valve 17. The high-frequency pulse cleaning liquid is transported to the washing pipes 9 of the two groups of washing filter frame assemblies through the pipeline, and the washing nozzles 12 rinse the back of the sieve plate 7. At this time, the high-frequency pulse cleaning liquid flows out from the high-frequency pulse generator 11, and is diverted through the first valve 14 to the two groups of washing filter frame assemblies corresponding to the second valve 15 and the third valve 16. The multiple washing nozzles 12 on the washing pipe 9 are evenly distributed to ensure that the cleaning liquid can fully cover the back area of the sieve plate 7. Since the high-frequency pulse cleaning liquid has high kinetic energy, it can quickly penetrate the microporous structure of the sieve plate 7 and remove impurities and residues attached to the surface of the sieve plate 7. In addition, the design of the sieve plate support column 10 creates a larger circulation space between the sieve plates 7, further reducing the resistance of the cleaning liquid flow and ensuring the efficient cleaning process.

[0045] S4 high-frequency pulse cleaning liquid passes through the sieve plate 7 to rinse the filter cloth 5, and the filter cake 8 is washed and separated from the surface of the filter cloth 5, making it easier for the filter cake 8 to fall off. After the high-frequency pulse cleaning liquid passes through the sieve plate 7, it directly acts on the surface of the filter cloth 5 and the filter cake 8. As a key component for solid-liquid separation, the filter cloth 5 is easily clogged by the filter cake 8 during long-term use. The high-frequency pulse cleaning liquid can effectively destroy the adhesion between the filter cake 8 and the filter cloth 5 through its high-frequency vibration characteristics, so that the filter cake 8 is peeled off from the surface of the filter cloth 5. At the same time, the high-frequency pulse cleaning liquid can also penetrate into the fiber structure of the filter cloth 5, remove the fine particles embedded therein, and thus restore the permeability of the filter cloth 5. In this process, the role of the sieve plate support column 10 is particularly critical. It not only provides sufficient circulation space, but also ensures that the cleaning liquid can be evenly distributed on the surface of the filter cloth 5, avoiding the problem of insufficient local cleaning.

[0046] S5 opens the fifth valve 18 and activates the vacuum system 13. The high-frequency pulse cleaning fluid passes through the two groups of washing filter frame assemblies and enters the middle group of washing filter frame assemblies. The suction generated by the vacuum system 13 draws away the cleaned liquid, achieving a thorough cleaning while cooperating with the high-pressure suction. After the first two groups of washing filter frame assemblies are cleaned, the fifth valve 18 is opened to connect the middle group of washing filter frame assemblies with the vacuum system 13. The vacuum system 13 uses its powerful suction to extract the cleaned high-frequency pulse cleaning fluid from the middle group of washing filter frame assemblies. This process not only ensures the rapid discharge of the cleaning fluid, but also further enhances the cleaning effect through the negative pressure. Specifically, the suction of the vacuum system can completely draw away the cleaning fluid remaining on the surface of the sieve plate 7 and filter cloth 5, avoiding secondary contamination. At the same time, the negative pressure environment can also accelerate the drying process of the filter cake 8, facilitating subsequent filter cake collection.

[0047] S6 opens the fourth valve 17, closes the second valve 15 and the third valve 16, and further cleans the washing pipe 9 of the middle group of washing filter frame assemblies. After completing the first five cleaning operations, open the fourth valve 17 to allow the high-frequency pulse cleaning liquid to flow into the washing pipe 9 of the middle group of washing filter frame assemblies. At this time, close the second valve 15 and the third valve 16 to ensure that the cleaning liquid only acts on the middle group of washing filter frame assemblies. Through this operation, the middle group of washing filter frame assemblies can be cleaned separately to ensure that their internal structure is completely clean. The washing nozzle 12 continues to play its uniform spraying function, accurately delivering the high-frequency pulse cleaning liquid to the surface of the sieve plate 7 and the filter cloth 5, completing the final cleaning step.

[0048] In practical applications, the present invention can be widely used in the fields of chemical industry, pharmaceutical industry, food processing, etc., and is good at processing high-viscosity and high-concentration solid-liquid mixtures. Taking the chemical industry as an example, the system can effectively clean filter cloths containing high-concentration suspended particles. Compared with traditional cleaning methods, it takes less time and has better effects. In addition, through high-frequency pulse cleaning technology, the present invention significantly reduces the consumption of washing liquid and energy, which fully meets the requirements of green environmental protection. Moreover, the temperature variable function of the washing liquid heat exchanger 3 can select the appropriate cleaning temperature according to the material characteristics, thereby further improving the cleaning effect. The design of the staggered arrangement of the washing filter frame assembly and the filter assembly fully utilizes the space of the filter frame installation equipment and improves the overall utilization rate of the equipment.

[0049] Gas pressure dialysis and vacuum suction diafiltration significantly enhance the removal of washing liquid and filtrate from the filter cake, significantly reducing wash water usage while also enabling the filter cake to be cleaned through a combined process of high frequency, pulse, temperature control, and atomization. Depending on process requirements, the filter cake can also be dialyzed using a single, temperature-controlled gas. Furthermore, the filter cake can be further dried by suctioning it under pressure dialysis conditions using a vacuum system, providing a solid foundation and comprehensive process and equipment support for obtaining high-purity, low-moisture filter cakes.

[0050] In summary, the technical solution of the present invention significantly reduces cleaning time and energy consumption through the application of high-frequency pulse cleaning fluid. The provision of a washing liquid heat exchanger allows the temperature of the cleaning liquid to be flexibly adjusted according to the characteristics of different materials, thereby optimizing the cleaning effect. In particular, the design of the sieve plate support columns increases the flow space between the sieve plates, reduces the filtration resistance, and improves the filtration efficiency. In addition, the use of high-frequency pulse cleaning technology combined with vacuum suction technology reduces the consumption of washing fluid and energy, meeting green environmental protection requirements. The present invention is suitable for solid-liquid separation and cleaning scenarios in the fields of chemical, pharmaceutical, and food processing, and is particularly good at processing high-viscosity, high-concentration solid-liquid mixtures. Compared with traditional cleaning methods, the present invention has significant advantages such as short time consumption, good cleaning effect, and low energy consumption.

[0051] The technical solution of the present invention is not limited to the above-mentioned specific embodiments. Any technical variations made according to the technical solution of the present invention fall within the protection scope of the present invention.

Claims

1. A high-frequency pulse temperature-controlled gas-liquid mixed flow cleaning system for a frame filter, characterized by: The invention comprises a filter frame installation device (4), a high-frequency pulse water supply component, a washing filter frame component and a filter component, wherein the washing filter frame component and the filter component are both in multiple groups, and the multiple groups of the washing filter frame components and the filter components are arranged on the filter frame installation device in an interlaced manner, and the drainage end of the high-frequency pulse water supply component is connected to the water supply end of the washing filter frame component; the washing filter frame component is used to provide a gap between two adjacent groups of filter components, and the width of the gap is equal to the thickness of the filter component.

2. The high-frequency pulse temperature-controlled gas-liquid mixed flow cleaning system for a frame filter according to claim 1, characterized in that: The high-frequency pulse water supply assembly comprises an overexposure generator (1), a washing liquid container (2), and a high-frequency pulse generator (11); the inlet of the overexposure generator (1) is connected to a container containing the washing liquid container (2); the outlet of the washing liquid container (2) and the outlet of the high-frequency pulse generator (11) are simultaneously connected to the inlet of the washing filter frame assembly.

3. The high-frequency pulse temperature-controlled gas-liquid mixed flow cleaning system for a frame filter according to claim 2, characterized in that: A washing liquid heat exchanger (3) is provided between the outlet of the washing liquid container (2) and the inlet of the washing filter frame assembly.

4. The high-frequency pulse temperature-controlled gas-liquid mixed flow cleaning system for a frame filter according to claim 3, characterized in that: The washing filter frame assembly comprises a filter frame (6), a sieve plate (7), a washing pipe (9), a sieve plate support column (10), and a washing nozzle (12). The sieve plates (7) are two, and a plurality of sieve plate support columns (10) are arranged between the two sieve plates (7). The washing pipe (9) is located in the gap between the two sieve plates (7). A plurality of washing nozzles (12) are evenly distributed on the washing pipe (9). The inlet of the washing pipe (9) is connected to the washing water outlet of the washing liquid heat exchanger (3). The sieve plate (7), the washing pipe (9), the sieve plate support column (10), and the washing nozzle (12) are fixedly arranged in the filter frame (6), and the filter assembly is arranged on the outside of the sieve plate (7).

5. The high-frequency pulse temperature-controlled gas-liquid mixed flow cleaning system for a frame filter according to claim 4, characterized in that: The filter assembly consists of two filter cloths (5) and a frame. The two filter cloths (5) are respectively arranged on the two end surfaces of the frame, and a filter cake (8) is formed inside between the two filter cloths (5).

6. The cleaning method of the frame filter high-frequency pulse temperature-controlled gas-liquid mixed flow cleaning system according to any one of claims 1 to 5, characterized in that: The following steps are involved: S1: injecting high-pressure air into the washing liquid in the washing liquid container (2) through the super exposure generator (1) to generate a gas-liquid mixture of high-pressure air and washing liquid; S2: The high-frequency pulse generator (11) receives the gas-liquid mixture of high-pressure air and cleaning liquid from the super-exposure generator (1) and converts it into a high-frequency pulse cleaning liquid; S3: The high-frequency pulse cleaning liquid is transported to the washing pipe (9) through a pipeline, and a plurality of washing nozzles (12) on the washing pipe (9) wash the back of the sieve plate (7); S4: The high-frequency pulse cleaning liquid passes through the sieve plate (7) to flush the filter cloth (5), flushing and separating the filter cake (8) from the filter cloth (5), facilitating the shedding of the filter cake (8), and completing the cleaning.

7. The cleaning method of the frame filter high-frequency pulse temperature-controlled gas-liquid mixed flow cleaning system according to claim 6, characterized in that: The temperature of the washing liquid is adjusted through the washing liquid heat exchanger as needed to achieve high-frequency pulse temperature-variable washing to further improve the cleaning efficiency.

8. The high-frequency pulse temperature-controlled gas-liquid mixed flow cleaning system for a frame filter according to any one of claims 1 to 5, characterized in that: It also includes a vacuum system (13), the water inlet end of the vacuum system (13) is connected to the drainage end of the washing filter frame assembly, and a valve assembly is provided between the high-frequency pulse water supply assembly, the washing filter frame assembly and the vacuum system (13).

9. The high-frequency pulse temperature-controlled gas-liquid mixed flow cleaning system for a frame filter according to claim 8, characterized in that: The valve assembly comprises a first valve (14), a second valve (15), a third valve (16), a fourth valve (17), and a fifth valve (18); the inlets of the second valve (15), the third valve (16), and the fourth valve (17) are simultaneously connected to the outlet of the first valve (14); the inlet of the first valve (14) is connected to the outlet of the washing liquid container (2), the washing liquid heat exchanger (3), and the high-frequency pulse generator (11); the outlets of the second valve (15), the third valve (16), and the fourth valve (17) are respectively connected to the inlets of the washing pipes (9) of three groups of the washing filter frame assemblies; and the outlet of the washing pipe (9) of one group of the washing filter frame assemblies between two groups of the washing filter frame assemblies is connected to the vacuum system (13) through the fifth valve (18).

10. The cleaning method of the frame filter high-frequency pulse temperature-controlled gas-liquid mixed flow cleaning system according to claim 9, characterized in that: The following steps are involved: S1: injecting high-pressure air into the washing liquid in the washing liquid container (2) through the super exposure generator (1) to generate a mixture of high-pressure air and washing liquid; S2: The high-frequency pulse generator (11) receives the gas-liquid mixture of high-pressure air and cleaning liquid from the super-exposure generator (1) and converts it into a high-frequency pulse cleaning liquid; S3: Open the first valve (14), the second valve (15), and the third valve (16), and close the fourth valve (17). The high-frequency pulse cleaning liquid is transported to the washing pipes (9) of the two sets of washing filter frame assemblies through the pipeline. The multiple washing nozzles (12) on the washing pipes (9) wash the back of the sieve plate (7); S4: The high-frequency pulse cleaning liquid passes through the sieve plate (7) to flush the filter cake (8), thereby flushing and separating the filter cake (8) from the filter cloth (5) to facilitate the shedding of the filter cake (8); S5: Open the fifth valve (18) and start the vacuum system (13). The high-frequency pulse cleaning liquid passes through the two sets of washing filter frame assemblies and enters the middle set of washing filter frame assemblies. The vacuum system (13) generates suction to suck away the high-frequency pulse cleaning liquid after cleaning. The cleaning is carried out in conjunction with the high-pressure suction to ensure thorough cleaning. S6: Open the fourth valve (17), close the second valve (15) and the third valve (16), and then further clean the washing pipe (9) of the middle group of washing filter frame assemblies.

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