Frame filter high-frequency pulse temperature control gas-liquid mixed flow cleaning system and cleaning method

The high-frequency pulse temperature-controlled gas-liquid mixing flow cleaning system solves the problems of high filtration resistance and low cleaning efficiency in the separation of high-concentration and high-viscosity solids and liquids by traditional plate and frame filters, achieving efficient and energy-saving solid-liquid separation and cleaning effects, and is suitable for chemical, pharmaceutical, food processing and other fields.

CN120437692BActive Publication Date: 2025-12-12SICHUAN GUOTAIMINAN SCI & TECH CO LTD
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Patent Information

Application Number
CN202510962425.9
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2025-07-14
Publication Date
2025-12-12
Estimated Expiration
2045-07-14

AI Technical Summary

Technical Problem

Traditional plate and frame filters suffer from high filtration resistance, low cleaning efficiency, and high energy consumption during high-concentration, high-viscosity solid-liquid separation processes, making it difficult to effectively remove filter cake and affecting filtration performance and production efficiency.

Method used

The high-frequency pulse temperature-controlled gas-liquid mixed flow cleaning system adopts a high-efficiency cleaning method by increasing the gap between the sieve plates, combining high-frequency pulse cleaning technology and variable temperature control, and utilizing high-frequency pulse cleaning fluid and vacuum system to reduce filtration resistance and improve cleaning efficiency.

Benefits of technology

It significantly reduces filtration resistance, improves cleaning efficiency, reduces cleaning time and energy consumption, increases filter cake washing rate and equipment utilization, and is suitable for the separation of high-concentration, high-viscosity solid-liquid mixtures, meeting green and environmental protection requirements.

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Abstract

The application discloses a kind of frame filter high-frequency pulse temperature control gas-liquid mixed flow cleaning system and cleaning method, it is related to solid-liquid separation equipment technical field, wherein cleaning system includes filter frame installation equipment, high-frequency pulse water supply component, washing type filter frame component and filter component.Washing type filter frame component and filter component are set up on filter frame installation equipment, high-frequency pulse water supply component transports high-frequency pulse cleaning fluid to washing type filter frame component.System generates high-pressure air and gas-liquid mixture through super-exposure generator, is converted into high-frequency pulse cleaning fluid by high-frequency pulse generator, is washed to screen plate and filter cloth by washing spray head, promotes filter cake to fall off.Vacuum system is connected with washing type filter frame component by valve component, and cleaning fluid is discharged and filter cake is dried using vacuum suction.Washing liquid heat exchanger can adjust washing liquid temperature, and realize temperature cleaning.The application has high cleaning efficiency, low energy consumption, equipment structure optimization, and is suitable for a variety of solid-liquid separation scenes.
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Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of solid-liquid separation equipment, and in particular to a frame filter high-frequency pulse temperature control gas-liquid mixed flow cleaning system and a cleaning method. BACKGROUND

[0002] In the field of solid-liquid separation, plate and frame filters are widely used in chemical, pharmaceutical, food processing and other industries due to their high separation efficiency. Traditional plate and frame filters usually use filter cloth to filter suspensions containing solid particles. The back side of the filter cloth is directly supported by a support plate, and there is almost no gap between the filter cloth and the support plate. The filtration mainly relies on the pressure difference to push the filtrate through the filter cloth to achieve solid-liquid separation. However, this structure has many drawbacks. First, due to the small or almost no gap between the filter cloth and the support plate, the flow path of the filtrate is narrow, resulting in high filtration resistance, which affects the filtration efficiency and makes it difficult to meet the filtration needs of high-concentration and high-viscosity solid-liquid mixtures. Second, after the filter cake is formed, the traditional backwashing method is difficult to effectively remove the filter cake on the filter cloth. During backwashing, the water flow is difficult to uniformly impact the filter cloth and the filter cake, resulting in poor cleaning effect, long time consumption and high energy consumption. For filter cakes with strong viscosity, backwashing is difficult to completely strip them from the filter cloth, resulting in filter cloth blockage, affecting filtration effect, reducing filter cake washing rate, making it difficult to obtain high-purity filter cake, and seriously restricting the continuous and stable operation of the filter and the improvement of production efficiency. Therefore, developing a frame filter cleaning system that can realize high-frequency pulse cleaning and combine temperature control has become a technical problem to be solved. SUMMARY

[0003] The present application provides a frame filter high-frequency pulse temperature control gas-liquid mixed flow cleaning system and a cleaning method to solve the problems of high filtration resistance, low cleaning efficiency and high energy consumption of existing plate and frame filters during high-concentration and high-viscosity solid-liquid separation. By optimizing the structure design and introducing high-frequency pulse cleaning technology, combined with temperature control function, the cleaning efficiency is significantly improved and the operating cost is reduced.

[0004] To achieve the above purpose, the present application is implemented according to the following technical scheme:

[0005] The application discloses a kind of frame filter high-frequency pulse temperature control gas-liquid mixed flow cleaning system, including filter frame installation equipment, high-frequency pulse water supply component, washing filter frame component and filtering component, the washing filter frame component and the filtering component are all multiple groups, multiple the washing filter frame component and the filtering component are set up on the filter frame installation equipment, the water outlet of the high-frequency pulse water supply component is connected with the water supply end of the washing filter frame component;The water outlet of the high-frequency pulse water supply component is connected with the water supply end of the washing filter frame component, to realize the delivery of high-frequency pulse cleaning fluid.The washing filter frame component is used to make the gap between adjacent two filtering components, the width of the gap is equal to the thickness of the filtering component, to reduce flow resistance and optimize cleaning effect.

[0006] Further, the high-frequency pulse water supply component includes super exposure generator, washing liquid container, high-frequency pulse generator, the inlet of the super exposure generator is connected with the container containing the washing liquid container, for injecting high-pressure air into washing liquid, generating high-pressure air and washing liquid gas-liquid mixture.The outlet of the washing liquid container and the outlet of the high-frequency pulse generator are simultaneously connected with the inlet of the washing filter frame component, to ensure the stable supply of cleaning fluid.The high-frequency pulse generator is converted into high-frequency pulse cleaning fluid by applying periodic pressure change to gas-liquid mixture, and the frequency range is a specific value, to meet the cleaning needs of different materials.

[0007] Further, a washing liquid heat exchanger is arranged between the outlet of the washing liquid container and the inlet of the washing filter frame component.The washing liquid heat exchanger accurately controls the temperature of washing liquid by adjusting the flow and temperature of heat exchange medium, to adapt to the cleaning characteristics of different materials.The temperature range of the heat exchange medium is set according to the physical and chemical properties of specific materials, to realize high-frequency pulse temperature changing cleaning.

[0008] Specifically, the washing filter frame component includes filter frame, sieve plate, washing pipe, sieve plate support column, washing nozzle, multiple sieve plate support columns are arranged between two sieve plates to maintain the spacing between sieve plates and provide support.The height range of the sieve plate support column and the spacing between adjacent sieve plate support columns are uniform, to ensure that the gap between sieve plates is uniform and stable.The washing pipe is located in the gap between two sieve plates, multiple washing nozzles are uniformly arranged on the washing pipe, the inlet of the washing pipe is connected with the washing water outlet of the washing liquid heat exchanger, the sieve plate, washing pipe, sieve plate support column and washing nozzle are fixedly arranged in the filter frame, and the filtering component is arranged on the outside of the sieve plate.The number and distribution density of the washing nozzle should be appropriate, to ensure that cleaning fluid can fully cover the back area of the sieve plate.

[0009] The filter assembly is composed of two filter cloths and a frame, the two filter cloths are arranged on the two end faces of the frame respectively, and the inner side between the two filter cloths forms a filter cake. The material and aperture size of the filter cloth are selected according to the particle size and viscosity characteristics of the material to be treated to ensure the filtering effect and the effective formation of the filter cake.

[0010] The cleaning method of the frame filter machine high-frequency pulse temperature control gas-liquid mixed flow cleaning system comprises the following steps:

[0011] S1: injecting high-pressure air into the washing liquid in the washing liquid container through the super-exposure generator to generate a gas-liquid mixture of high-pressure air and washing liquid;

[0012] S2: the high-frequency pulse generator receives the mixture of high-pressure air and washing liquid from the super-exposure generator and converts it into a high-frequency pulse cleaning liquid;

[0013] S3: the high-frequency pulse cleaning liquid is delivered to the washing pipe through the pipeline, and the plurality of washing nozzles on the washing pipe wash the back surface of the sieve plate;

[0014] S4: the high-frequency pulse cleaning liquid passes through the sieve plate to wash the filter cloth and washes the filter cake off the filter cloth, facilitating the falling off of the filter cake;

[0015] As an improvement, the temperature of the washing liquid is adjusted by the washing liquid heat exchanger as needed to realize high-frequency pulse temperature change washing and further improve the cleaning efficiency.

[0016] As an improvement, the present application further comprises a vacuum system, the water inlet end of the vacuum system is connected with the water outlet end of the washing filter frame assembly, and a valve assembly is arranged between the high-frequency pulse water supply assembly, the washing filter frame assembly and the vacuum system. The valve assembly comprises a first valve, a second valve, a third valve, a fourth valve and a fifth valve, which are used to accurately control the flow direction and flow rate of the high-frequency pulse cleaning liquid. The inlet of the first valve is connected with the outlet of the washing liquid container, the washing liquid heat exchanger and the high-frequency pulse generator, and the outlet thereof is connected with the inlets of the second valve, the third valve and the fourth valve. The outlets of the second valve, the third valve and the fourth valve are respectively connected with the inlet of the washing pipe of the three groups of washing filter frame assemblies. The fifth valve is arranged between the outlet of the middle group of washing filter frame assemblies and the vacuum system, which is used to control the discharge path of the cleaning liquid. The arrangement of the valve assembly ensures that the high-frequency pulse cleaning liquid can flow in a predetermined order and path, thereby realizing an efficient cleaning process.

[0017] The vacuum system is connected with the intermediate set of washing filter frame assemblies through a fifth valve, and the cleaned high-frequency pulse cleaning liquid is sucked away by the vacuum suction force, and the filter cake is further dried. A vacuum pump is arranged in the vacuum system, and the vacuum pump can suck the cleaned liquid out of the washing filter frame assembly through negative pressure. This process not only realizes the rapid discharge of the cleaning liquid, but also further enhances the cleaning effect through the negative pressure environment. Specifically, the suction force of the vacuum system can completely suck away the cleaning liquid remaining on the surface of the sieve plate and the filter cloth, avoiding secondary pollution. In addition, the negative pressure environment can also accelerate the drying process of the filter cake, providing convenience for the subsequent collection of the filter cake.

[0018] The application also provides a cleaning method of the high-frequency pulse temperature-controlled gas-liquid mixed flow cleaning system of the frame filter machine.

[0019] S1: high-pressure air is injected into the washing liquid in the washing liquid container through the super-exposure generator to generate high-pressure gas-liquid mixture.

[0020] S2: the high-frequency pulse generator receives the high-pressure gas-liquid mixture from the super-exposure generator and converts it into high-frequency pulse cleaning liquid.

[0021] S3: the first valve, the second valve and the third valve are opened, and the fourth valve is closed, the high-frequency pulse cleaning liquid is transported to the washing pipes of the two sets of washing filter frame assemblies through the pipeline, and the sieve plate back is washed by the washing nozzle.

[0022] S4: the high-frequency pulse cleaning liquid passes through the sieve plate to wash the filter cloth and the filter cake, and the filter cake is washed off from the surface of the filter cloth, facilitating the falling of the filter cake.

[0023] S5: the fifth valve is opened, the vacuum system is started, the high-frequency pulse cleaning liquid enters the intermediate set of washing filter frame assemblies after passing through the two sets of washing filter frame assemblies, and the suction force generated by the vacuum system sucks away the cleaned liquid, realizing cleaning while thoroughly cleaning with high-pressure suction.

[0024] S6: the fourth valve is opened, and the second valve and the third valve are closed, to further clean the washing pipes of the intermediate set of washing filter frame assemblies.

[0025] Compared with the prior art, the application has the following beneficial effects:

[0026] 1. The application increases the flow-through space between the sieve plates, significantly reducing the filtration resistance. The sieve plate support column is arranged to form a large flow-through area between the two sieve plates, avoiding the problem of excessive filtration pressure caused by narrow flow path, thereby improving the filtration efficiency, especially suitable for filtering high-concentration and high-viscosity solid-liquid mixtures, effectively solving the problem of large filtration resistance and difficult filtration caused by small gap between the filter cloth and the support plate in the traditional filter.

[0027] 2. Employing high-frequency pulse cleaning technology combined with gas-liquid mixing, the generated high-frequency pulse cleaning fluid possesses powerful impact and cleaning effect. Multiple washing nozzles on the washing pipe can evenly rinse the back of the sieve plate, ensuring the cleaning fluid fully covers the sieve plate and filter cloth. This rapidly and thoroughly washes the filter cake off the filter cloth, significantly improving cleaning efficiency, shortening cleaning time, reducing washing fluid and energy consumption, and lowering operating costs. Furthermore, it effectively solves the problems of uneven cleaning and poor cleaning effect in existing technologies, preventing filter cloth clogging, increasing filter cake washing rate, and facilitating the acquisition of high-purity filter cake.

[0028] 3. The system is equipped with a washing liquid heat exchanger, which allows for flexible adjustment of the washing liquid temperature according to the characteristics of different materials, enabling high-frequency pulse temperature-changing washing. This design allows the cleaning process to select the most suitable cleaning temperature for various materials, further improving the cleaning effect, enhancing adaptability to different materials, and improving the overall performance and application range of the filter.

[0029] 4. The staggered layout design of the washable filter frame assembly and the filter assembly makes full use of the space for the filter frame installation equipment, improves the overall utilization rate of the equipment, and enables the filter to achieve more efficient solid-liquid separation and cleaning functions in a limited space, thereby improving the economy and practicality of the equipment.

[0030] 5. The application of the vacuum system not only accelerates the discharge of the cleaning solution but also further dries the filter cake, facilitating its subsequent processing and collection. Compared with traditional cleaning methods, this invention significantly reduces the consumption of washing liquid and energy, offering significant advantages such as shorter processing time, better cleaning effect, and lower energy consumption, meeting the requirements of green environmental protection. This invention is particularly suitable for processing high-viscosity, high-concentration solid-liquid mixtures and has broad application prospects in chemical, pharmaceutical, and food processing fields, providing an efficient, energy-saving, and environmentally friendly solution for industrial solid-liquid separation and cleaning. Attached Figure Description

[0031] Figure 1 This is a schematic diagram of the overall structure of the present invention;

[0032] Figure 2 This is a schematic diagram showing the connection between the washing-type filter frame assembly and the high-frequency pulse water supply assembly of the present invention;

[0033] Figure 3 This is a schematic cross-sectional view of the washing-type filter frame assembly of the present invention;

[0034] Figure 4 This is a schematic diagram of the end face structure of the washing-type filter frame assembly of the present invention;

[0035] Figure 5 This is a schematic diagram of the vacuum system of the present invention.

[0036] The attached diagram is labeled as follows: 1. Overexposure generator; 2. Washing liquid container; 3. Washing liquid heat exchanger; 4. Filter frame installation equipment; 5. Filter cloth; 6. Filter frame; 7. Sieve plate; 8. Filter cake; 9. Washing pipe; 10. Sieve plate support column; 11. High-frequency pulse generator; 12. Washing nozzle; 13. Vacuum system; 14. First valve; 15. Second valve; 16. Third valve; 17. Fourth valve; 18. Fifth valve. Detailed Implementation

[0037] The present invention will be further described below with reference to the accompanying drawings and specific embodiments. The illustrative embodiments and descriptions herein are used to explain the present invention, but are not intended to limit the present invention.

[0038] like Figures 1 to 4 As shown, this invention provides a high-frequency pulse cleaning system and method for frame filters, aiming to achieve efficient cleaning of the filter. The main components of the system include a filter frame mounting device 4, a high-frequency pulse water supply assembly, a washable filter frame assembly, and a filter assembly. The filter frame mounting device 4 serves as the core support, used to fix and stagger multiple sets of washable filter frame assemblies and filter assemblies. Both the washable filter frame assemblies and the filter assemblies are multiple sets, and these assemblies are staggered on the filter frame mounting device 4 to ensure the efficiency of the cleaning process. The drain end of the high-frequency pulse water supply assembly is connected to the water supply end of the washable filter frame assembly, thereby enabling the entire system to achieve efficient cleaning. The washable filter frame assembly is used to create a gap between adjacent sets of filter assemblies, the width of which is equal to the thickness of the filter assembly. The function of the washable filter frame assembly is to create a gap between adjacent sets of filter assemblies, the width of which is at least equal to the thickness of the filter assembly, thereby significantly reducing the flow resistance during filtration. This design optimizes the flow space between the sieve plates 7, avoiding excessive filtration pressure caused by narrow flow paths, and is especially suitable for filtering high-concentration, high-viscosity solid-liquid mixtures.

[0039] The high frequency pulse water supply assembly is the core of the whole cleaning system, which includes the super exposure generator 1, the washing liquid container 2 and the high frequency pulse generator 11. The inlet of the super exposure generator 1 is connected with the washing liquid container 2, and high pressure air is injected into the washing liquid to generate gas-liquid mixture of high pressure air and washing liquid. The mixture is then transported to the high frequency pulse generator 11 through the pipeline, and the high frequency pulse generator 11 converts the mixture into high frequency pulse cleaning liquid by applying periodic pressure change to the mixture. This process ensures that the output high frequency pulse cleaning liquid has stable physical properties by precisely controlling the pressure and flow of high pressure air, meeting the cleaning needs of different materials. The outlet of the washing liquid container 2 and the outlet of the high frequency pulse generator 11 are connected with the inlet of the washing filter frame assembly at the same time. In addition, a washing liquid heat exchanger 3 is arranged between the outlet of the washing liquid container 2 and the inlet of the washing filter frame assembly, which is used to adjust the temperature of the washing liquid. By controlling the flow and temperature of the heat exchange medium, the washing temperature is selected according to the characteristics of the material, so as to realize the high frequency pulse temperature changing cleaning. For example, when processing high viscosity materials, the washing liquid can be heated to 50-60℃ to enhance the cleaning effect; while when processing temperature sensitive materials, the washing liquid can be cooled to 10-20℃ to avoid physical or chemical changes of the materials due to high temperature.

[0040] The washing filter frame assembly is composed of multiple parts, including the filter frame 6, the sieve plate 7 (two), the washing pipe 9, the sieve plate support column 10 and the washing nozzle 12. A plurality of sieve plate support columns 10 are arranged between the two sieve plates 7 to maintain the spacing between the sieve plates and provide support. The height range of the sieve plate support column 10 and the spacing between adjacent sieve plate support columns 10 are uniform, ensuring that the gap between the sieve plates is uniform and stable. The washing pipe 9 is located in the gap between the two sieve plates 7, and a plurality of washing nozzles 12 are uniformly distributed on it, the inlets of which are connected with the washing water outlet of the washing liquid heat exchanger 3, ensuring that the high frequency pulse cleaning liquid can be delivered to the washing nozzle 12 through the washing pipe 9. The number and distribution density of the washing nozzle 12 need to be uniform to ensure that the cleaning liquid can fully cover the back area of the sieve plate 7. The sieve plate 7, the washing pipe 9, the sieve plate support column 10 and the washing nozzle 12 are stably installed inside the filter frame 6, and the outside of the sieve plate 7 is configured with a filter assembly.

[0041] The main function of the filter assembly is to filter the solid-liquid mixture; the filter assembly includes multiple filter cloths 5, which are arranged outside between the two sieve plates 7. The outside between the two filter cloths 5 forms a filter cake 8, and the material and aperture size of the filter cloth 5 are selected according to the particle size and viscosity characteristics of the material to be processed to ensure the filtering effect and the effective formation of the filter cake. For example, when processing a suspension containing micron-sized particles, a filter cloth with a pore size of 10-20 microns can be selected; while when processing materials containing larger particles, a filter cloth with a pore size of 50-100 microns can be selected.

[0042] The specific washing process of the above-mentioned frame filter high-frequency pulse cleaning system is as follows:

[0043] S1: high-pressure air is injected into the washing liquid in the washing liquid container 2 through the super-exposure generator 1 to generate a gas-liquid mixture of high-pressure air and washing liquid; the pressure range and flow rate of the high-pressure air are accurately controlled to ensure that the physical properties of the gas-liquid mixture meet the subsequent cleaning requirements. For example, the pressure of the high-pressure air can be set to 0.5-0.8 MPa, and the flow rate can be adjusted to 10-20 liters per minute according to the volume of the washing liquid container 2.

[0044] S2: the high-frequency pulse generator 11 receives the mixture of high-pressure air and washing liquid from the super-exposure generator 1 and converts it into high-frequency pulse cleaning liquid by applying periodic pressure changes to the mixture. The operating frequency range of the high-frequency pulse generator 11 is set according to the specific cleaning requirements, usually 20-50 Hz, to achieve the best cleaning effect.

[0045] S3: the high-frequency pulse cleaning liquid is delivered to the washing pipe 9 through the pipeline, and the multiple washing nozzles 12 on the washing pipe 9 wash the back of the sieve plate 7; the spray angle and spray pressure of the washing nozzles 12 are optimized to ensure that the cleaning liquid can uniformly cover the entire back area of the sieve plate 7. For example, the spray angle of the washing nozzles 12 can be set to 30-45 degrees, and the spray pressure can be set to 0.2-0.4 MPa.

[0046] S4: the high-frequency pulse cleaning liquid passes through the sieve plate 7 to wash the filter cloth 5 and the filter cake 8, and after the filter cake is pushed out, the filter cake 8 is washed off from the filter cloth 5, facilitating the falling of the filter cake 8; the time and flow rate of the washing process are adjusted according to the thickness and viscosity characteristics of the filter cake to ensure the cleaning effect. For example, when processing filter cakes with a thickness of 5-10 mm, the washing time can be set to 5-10 minutes, and the flow rate can be set to 15-20 liters per minute.

[0047] As an improvement, the present application adjusts the temperature of the washing liquid through the washing liquid heat exchanger 3 as needed to achieve high-frequency pulse temperature-changing washing, further improving the cleaning efficiency. The temperature range of the temperature-changing washing is set according to the physical and chemical properties of the material to further improve the cleaning efficiency. For example, when processing high-viscosity materials, the washing liquid can be heated to 50-60℃ to enhance the cleaning effect; while when processing temperature-sensitive materials, the washing liquid can be cooled to 10-20℃ to avoid physical or chemical changes of the materials due to high temperature.

[0048] The present application significantly reduces the filtration resistance by increasing the flow space between the screen plates 7. The design of the screen plate support column 10 forms a larger flow area between the two screen plates 7, avoiding the problem of excessive filtration pressure caused by narrow flow path, thereby improving the filtration efficiency, especially suitable for filtering high concentration and high viscosity solid-liquid mixture. In addition, the material and surface treatment process of the screen plate support column 10 are optimized to enhance its corrosion resistance and mechanical strength. For example, the screen plate support column 10 can be made of stainless steel and polished on its surface to reduce friction resistance and prevent corrosion.

[0049] Using high-frequency pulse cleaning technology combined with gas-liquid mixed flow, the high-frequency pulse cleaning fluid produced has strong impact force and cleaning effect. The multiple washing nozzles 12 on the washing pipe 9 are optimally designed to uniformly wash the back of the screen plate 7, so that the cleaning fluid fully covers the screen plate 7 and the filter cloth 5, and quickly and completely washes the filter cake 8 off the filter cloth 5. This design greatly shortens the cleaning time, reduces the consumption of washing liquid and energy, and reduces the operating cost. At the same time, by optimizing the distribution density and jet angle of the washing nozzles 12, the problem of uneven cleaning that is difficult to achieve with traditional backwashing is solved, avoiding filter cloth 5 blockage and improving filter cake 8 washing rate.

[0050] The system sets the washing liquid heat exchanger 3, which can flexibly adjust the temperature of the washing liquid according to the characteristics of different materials, achieving high-frequency pulse temperature-changing cleaning. This design allows the cleaning process to select the most suitable cleaning temperature for various materials, further improving the cleaning effect and enhancing the adaptability to different materials. By adjusting the flow and temperature of the heat exchange medium, the temperature range of the washing liquid is ensured to meet the cleaning needs of the materials, thereby improving the overall performance and application range of the filter.

[0051] The staggered layout design of the washing type filter frame assembly and the filtration assembly makes full use of the space of the filter frame installation device 4, improving the overall utilization rate of the equipment. The staggered layout design is precisely calculated to ensure that the gap between each set of washing type filter frame assembly and filtration assembly is uniform and stable, thereby achieving more efficient solid-liquid separation and cleaning function in limited space. This design not only improves the economy and practicality of the equipment, but also enables the filter to adapt to the solid-liquid separation and cleaning needs of various industrial scenarios.

[0052] The vacuum system 13 is connected to the middle set of washing filter frame assemblies through the fifth valve 18, and uses vacuum suction to suck away the cleaned high-frequency pulse cleaning liquid, and further dries the filter cake. The vacuum system 13 is internally provided with a vacuum pump, which uses negative pressure to suck out the cleaned liquid from the washing filter frame assemblies. This process not only realizes the rapid discharge of the cleaning liquid, but also further enhances the cleaning effect through the negative pressure environment. Specifically, the suction of the vacuum system completely sucks away the cleaning liquid remaining on the surface of the sieve plate 7 and the filter cloth 5, avoiding secondary pollution. In addition, the negative pressure environment also speeds up the drying process of the filter cake 8, providing convenience for subsequent filter cake collection.

[0053] The valve assembly includes a first valve 14, a second valve 15, a third valve 16, a fourth valve 17 and a fifth valve 18, which are used to accurately control the flow direction and flow rate of the high-frequency pulse cleaning liquid. The inlet of the first valve 14 is connected to the washing liquid container 2, the washing liquid heat exchanger 3 and the outlet of the high-frequency pulse generator 11, and the outlet thereof is connected to the inlets of the second valve 15, the third valve 16 and the fourth valve 17. The outlets of the second valve 15, the third valve 16 and the fourth valve 17 are respectively connected to the inlets of the washing pipes 9 of the three sets of washing filter frame assemblies. The fifth valve 18 is arranged between the outlet of the middle set of washing filter frame assemblies and the vacuum system 13, and is used to control the discharge path of the cleaning liquid. The arrangement of the valve assembly ensures that the high-frequency pulse cleaning liquid can flow in a predetermined order and path, thereby realizing an efficient cleaning process.

[0054] Based on the above structure, the application provides a cleaning method.

[0055] S1 injects high-pressure air into the washing liquid in the washing liquid container 2 through the super-exposure generator 1 to generate a high-pressure gas-liquid mixture. Specifically, the super-exposure generator 1 injects high-pressure air into the washing liquid container 2 through the built-in high-pressure air pump, so that the washing liquid and air are fully mixed to form a stable gas-liquid mixture. The gas-liquid mixture has high kinetic energy, which can effectively improve the impact force and coverage range of the subsequent cleaning process.

[0056] S2 The high-frequency pulse generator 11 receives the high-pressure gas-liquid mixture from the super-exposure generator 1 and converts it into a high-frequency pulse cleaning liquid. The high-frequency pulse generator 11 is internally provided with an oscillation device, which decomposes the gas-liquid mixture into a high-frequency pulse form of fluid through rapid opening and closing. Such high-frequency pulse cleaning liquid not only has strong impact force, but also can cover a larger cleaning area in a short time, thereby significantly improving the cleaning efficiency.

[0057] S3 opens the first valve 14, the second valve 15 and the third valve 16, closes the fourth valve 17, and the high-frequency pulse cleaning liquid is delivered to the two groups of washing type filter frame assemblies through the pipeline to the washing pipe 9, and the washing nozzle 12 washes the back of the sieve plate 7. At this time, the high-frequency pulse cleaning liquid flows out from the high-frequency pulse generator 11, is divided into two groups of washing type filter frame assemblies corresponding to the second valve 15 and the third valve 16 through the first valve 14. The multiple washing nozzles 12 on the washing pipe 9 are uniformly distributed, which ensures that the cleaning liquid can fully cover the back surface area of the sieve plate 7. Because the high-frequency pulse cleaning liquid has high kinetic energy, it can quickly penetrate the microporous structure of the sieve plate 7 and remove the impurities and residues attached to the surface of the sieve plate 7. In addition, the design of the sieve plate support column 10 forms a large flow space between the sieve plates 7, which further reduces the resistance of the cleaning liquid when flowing, ensuring that the cleaning process is efficient.

[0058] S4 The high-frequency pulse cleaning liquid washes the filter cloth 5 through the sieve plate 7, washes and separates the filter cake 8 from the surface of the filter cloth 5, and facilitates the falling of the filter cake 8. When the high-frequency pulse cleaning liquid passes through the sieve plate 7, it directly acts on the surface of the filter cloth 5 and the filter cake 8. The filter cloth 5, as a key component of solid-liquid separation, is easily clogged by the filter cake 8 during long-term use. The high-frequency pulse cleaning liquid can effectively destroy the adhesion between the filter cake 8 and the filter cloth 5 through its high-frequency vibration characteristics, so that the filter cake 8 is stripped from the surface of the filter cloth 5. At the same time, the high-frequency pulse cleaning liquid can also penetrate the fiber structure of the filter cloth 5 and remove the fine particles embedded therein, thereby restoring the permeability of the filter cloth 5. In this process, the sieve plate support column 10 plays a crucial role, as it not only provides sufficient flow space, but also ensures that the cleaning liquid can be uniformly distributed on the surface of the filter cloth 5, avoiding the problem of insufficient local cleaning.

[0059] S5 opens the fifth valve 18, starts the vacuum system 13, and the high-frequency pulse cleaning liquid enters the middle group of washing type filter frame assemblies after passing through the two groups of washing type filter frame assemblies, and the suction force generated by the vacuum system 13 removes the cleaned liquid, realizing cleaning while cooperating with high-pressure suction to thoroughly clean. After completing the cleaning of the first two groups of washing type filter frame assemblies, the fifth valve 18 is opened to connect the middle group of washing type filter frame assemblies with the vacuum system 13. The vacuum system 13 can extract the cleaned high-frequency pulse cleaning liquid from the middle group of washing type filter frame assemblies through its strong suction force. This process not only realizes the rapid discharge of the cleaning liquid, but also further enhances the cleaning effect through the negative pressure effect. Specifically, the suction force of the vacuum system can completely suck away the cleaning liquid remaining on the surface of the sieve plate 7 and the filter cloth 5, avoiding secondary pollution. At the same time, the negative pressure environment can also accelerate the drying process of the filter cake 8, providing convenience for the subsequent collection of the filter cake.

[0060] S6 opens the fourth valve 17, closes the second valve 15 and the third valve 16, and further washes the washing pipe 9 of the middle group of washing filter frame assemblies. After completing the first five steps of washing operation, the fourth valve 17 is opened to make the high-frequency pulse cleaning liquid flow into the washing pipe 9 of the middle group of washing filter frame assemblies. At this time, the second valve 15 and the third valve 16 are closed to ensure that the cleaning liquid only acts on the middle group of washing filter frame assemblies. Through this operation, the middle group of washing filter frame assemblies can be washed separately to ensure that the internal structure is completely clean. The washing nozzle 12 continues to play its uniform spraying function to accurately deliver the high-frequency pulse cleaning liquid to the surface of the sieve plate 7 and the filter cloth 5 to complete the final washing step.

[0061] In practical application, the present application can be widely applied in the fields of chemical industry, pharmaceutical industry, food processing and the like, and is good at processing high-viscosity and high-concentration solid-liquid mixtures. Taking the chemical industry as an example, the system can effectively clean the filter cloth containing high-concentration suspended particles. Compared with the traditional cleaning method, the present application has shorter time consumption and better effect. In addition, through the high-frequency pulse cleaning technology, the present application significantly reduces the consumption of cleaning liquid and energy, fully meeting the requirements of green environmental protection. Moreover, the temperature changing function of the cleaning liquid heat exchanger 3 can select a suitable cleaning temperature according to the characteristics of the material, thereby further improving the cleaning effect. The design of the washing filter frame assembly and the filter assembly being staggered with each other fully utilizes the space of the filter frame installation device, and improves the overall utilization rate of the device.

[0062] Gas pressure dialysis and vacuum suction filtration greatly strengthen the driving of cleaning liquid and filtrate in filter cake, and under the premise of greatly reducing the amount of washing water, the filter cake can also be washed clean through the high-frequency, pulse, temperature control and atomization combined process. According to the process requirements, the filter cake can also be dialyzed by a single controllable temperature gas. Thirdly, the filter cake is sucked under the condition of pressure dialysis by using the vacuum system, and the filter cake is further dried, thereby providing solid foundation guarantee and perfect process and equipment support for obtaining high-purity and low-humidity filter cake.

[0063] To sum up, the technical scheme of the present application significantly reduces the cleaning time and energy consumption through the application of high-frequency pulse cleaning liquid. The setting of the cleaning liquid heat exchanger makes the temperature of the cleaning liquid flexible to adjust according to the characteristics of different materials, thereby optimizing the cleaning effect. In particular, the design of the sieve plate support column increases the flow-through space between the sieve plates, reduces the filtration resistance, and improves the filtration efficiency. In addition, the high-frequency pulse cleaning technology combined with the vacuum suction technology reduces the consumption of cleaning liquid and energy, meeting the requirements of green environmental protection. The present application is suitable for solid-liquid separation and cleaning scenes in the fields of chemical industry, pharmaceutical industry, food processing and the like, and is especially good at processing high-viscosity and high-concentration solid-liquid mixtures. Compared with the traditional cleaning method, the present application has the advantages of short time consumption, good cleaning effect and low energy consumption.

[0064] The technical solutions of the present application are not limited to the above specific embodiments, and any technical variations made according to the technical solutions of the present application fall within the protection scope of the present application.

Claims

1. A cleaning method for a high-frequency pulse temperature-controlled gas-liquid mixed flow cleaning system for a frame filter, characterized in that: The application relates to a high-frequency pulse temperature-controlled gas-liquid mixed flow cleaning system for a frame filter, which comprises filter frame mounting equipment (4), a high-frequency pulse water supply assembly, a washing filter frame assembly and a filter assembly, the washing filter frame assembly and the filter assembly are multiple groups, the multiple groups of the washing filter frame assembly and the filter assembly are arranged on the filter frame mounting equipment in an interlaced mode, and the water outlet of the high-frequency pulse water supply assembly is connected with the water inlet of the washing filter frame assembly; the washing filter frame assembly is used for forming a gap between two adjacent filter assemblies, and the width of the gap is equal to the thickness of the filter assembly; The washing filter frame assembly comprises filter frames (6), sieve plates (7), washing pipes (9), sieve plate support columns (10) and washing nozzles (12), two sieve plates (7) are arranged, a plurality of sieve plate support columns (10) are arranged between the two sieve plates (7), the washing pipe (9) is arranged in the gap between the two sieve plates (7), the washing pipe (9) is arranged in a ring shape, a plurality of washing nozzles (12) are uniformly arranged on the washing pipe (9), and the sieve plate (7), the washing pipe (9), the sieve plate support column (10) and the washing nozzle (12) are fixedly arranged in the filter frame (6); the filter assembly is arranged on the outer side of the sieve plate (7); The high-frequency pulse water supply assembly comprises an ultralight generator (1), a washing liquid container (2) and a high-frequency pulse generator (11), the inlet of the ultralight generator (1) is connected with a container containing the washing liquid container (2), the outlet of the washing liquid container (2) and the outlet of the high-frequency pulse generator (11) are simultaneously connected with the inlet of the washing filter frame assembly; The filter assembly is composed of two filter cloths (5) and a frame, the two filter cloths (5) are arranged on two end faces of the frame, and a filter cake (8) is formed on the inner side between the two filter cloths (5); The cleaning method comprises the following steps: S1: high-pressure air and washing liquid gas-liquid mixed liquid is generated by injecting high-pressure air into washing liquid in the washing liquid container (2) through the ultralight generator (1); S2: the high-frequency pulse generator (11) receives the high-pressure air and washing liquid gas-liquid mixed liquid from the ultralight generator (1) and converts the high-pressure air and washing liquid gas-liquid mixed liquid into high-frequency pulse cleaning liquid; S3: the high-frequency pulse cleaning liquid is delivered to the washing pipe (9) through a pipeline, and the plurality of washing nozzles (12) on the washing pipe (9) flush the back surface of the sieve plate (7); S4: the high-frequency pulse cleaning liquid passes through the sieve plate (7) to flush the filter cloth (5), the filter cake (8) is flushed off from the filter cloth (5), the filter cake (8) is conveniently separated, and the cleaning is completed.

2. The method of claim 1, wherein the method comprises: A washing liquid heat exchanger (3) is arranged between the outlet of the washing liquid container (2) and the inlet of the washing filter frame assembly.

3. The method of claim 2, wherein the method further comprises: The inlet of the washing pipe (9) is connected with the washing water outlet of the washing liquid heat exchanger (3).

4. The method of claim 3, wherein the method further comprises: The temperature of the washing liquid is adjusted through the washing liquid heat exchanger as required, high-frequency pulse temperature-variable washing is realized, and the cleaning efficiency is further improved.

5. The method according to any one of claims 1 to 4, wherein the method is characterized by: The frame filter high-frequency pulse temperature control gas-liquid mixed flow cleaning system further comprises a vacuum system (13), the water inlet end of the vacuum system (13) is connected with the water outlet end of the washing filter frame assembly, and a valve assembly is arranged between the high-frequency pulse water supply assembly, the washing filter frame assembly and the vacuum system (13).

6. The method of claim 5, wherein the method further comprises: The valve assembly comprises a first valve (14), a second valve (15), a third valve (16), a fourth valve (17) and a fifth valve (18), the inlets of the second valve (15), the third valve (16) and the fourth valve (17) are connected with the outlet of the first valve (14) at the same time, the inlet of the first valve (14) is connected with the washing liquid container (2), the washing liquid heat exchanger (3) and the outlet of the high-frequency pulse generator (11), the outlets of the second valve (15), the third valve (16) and the fourth valve (17) are respectively connected with the inlets of the washing pipes (9) of three groups of the washing filter frame assemblies, and the outlet of the washing pipe (9) of a group of the washing filter frame assemblies between two groups of the washing filter frame assemblies is connected with the vacuum system (13) through the fifth valve (18).

7. The method of claim 6, wherein the high frequency pulse temperature control gas-liquid mixed flow cleaning system of the frame filter is characterized in that, The method comprises the following steps: S1: high-pressure air is injected into the washing liquid in the washing liquid container (2) through the super-exposure generator (1) to generate a mixed liquid of high-pressure air and washing liquid; S2: the high-frequency pulse generator (11) receives the gas-liquid mixed liquid of high-pressure air and washing liquid from the super-exposure generator (1) and converts it into a high-frequency pulse cleaning liquid; S3: the first valve (14), the second valve (15) and the third valve (16) are opened, and the fourth valve (17) is closed, the high-frequency pulse cleaning liquid is transported to the washing pipes (9) of two groups of the washing filter frame assemblies through pipelines, and a plurality of washing nozzles (12) on the washing pipes (9) wash the back surface of the sieve plate (7); S4: the high-frequency pulse cleaning liquid passes through the sieve plate (7) to wash the filter cake (8) and washes the filter cake (8) away from the filter cloth (5), so that the filter cake (8) is easily separated; S5: the fifth valve (18) is opened, the vacuum system (13) is started, the high-frequency pulse cleaning liquid enters the middle group of the washing filter frame assemblies after passing through two groups of the washing filter frame assemblies, and the high-frequency pulse cleaning liquid after cleaning is sucked away through the suction force generated by the vacuum system (13), and the cleaning is performed at the same time.

Citation Information

Patent Citations

  • Low-resistance and easy-to-clean frame filter and filtering method

    CN120437693A

  • Filter pressing assembly of plate-and-frame filter press and plate-and-frame filter press

    CN214714620U

  • Plate and frame filtering device for battery-grade iron phosphate and production device

    CN221808378U

  • Pulse cleaning method and pulse cleaning apparatus

    JP2008114182A