Electron beam measuring equipment and hoisting equipment

Abstract

The invention provides electron beam measuring equipment and hoisting equipment, relates to the technical field of semiconductor equipment, and is used for solving the problem of how to improve the maintenance efficiency of a displacement table in the electron beam measuring equipment. Specifically, the electron beam measuring equipment comprises a vacuum cavity, a displacement table, an end cover and a moving assembly, and an accommodating cavity and an opening communicated with the accommodating cavity are formed in the vacuum cavity; the displacement table is arranged in the accommodating cavity and is used for bearing a wafer to be detected; the moving assembly is connected with the end cover and used for driving the end cover to move between a first position and a second position; when the end cover is located at the first position, the end cover blocks the opening; when the end cover is located at the second position, the end cover opens the opening, and a mounting space is formed in the side, back to the containing cavity, of the opening and used for containing hoisting equipment.

Description

Technical Field

[0001] The present application relates to the field of semiconductor equipment technology, and in particular to electron beam measurement equipment and hoisting equipment. Background Art

[0002] Electron beam metrology equipment is used to inspect wafers for defects, critical dimensions, and other defects. It typically consists of a vacuum chamber, which is typically equipped with a translation stage for supporting the wafers. The end caps of the vacuum chamber are equipped with measurement components, such as an electron beam mirror and an optical microscope. Because electron beam metrology equipment requires high precision motion of the translation stage during wafer inspection, the translation stage is prone to failure and therefore needs to be removed for repair.

[0003] In the prior art, when repairing the translation stage, it is necessary to first remove the end cover of the vacuum chamber and the measuring components provided on the end cover, transfer them to a maintenance space, and then take out the translation stage for repair. This will make the operation of repairing the translation stage more cumbersome and affect the repair efficiency. Summary of the Invention

[0004] The present application discloses an electron beam measurement device and a hoisting device, which are used to solve the technical problem of how to improve the maintenance efficiency of a translation stage in the electron beam measurement device.

[0005] In a first aspect of the present application, an electron beam measurement device is provided, which includes a vacuum chamber, a translation stage, an end cover and a moving assembly. The vacuum chamber is formed with a accommodating chamber and an opening connected to the accommodating chamber; the translation stage is arranged in the accommodating chamber and is used to carry the wafer to be inspected; the moving assembly is connected to the end cover and is used to drive the end cover to move between a first position and a second position; when the end cover is in the first position, the end cover blocks the opening; when the end cover is in the second position, the end cover opens the opening, and an installation space is formed on the side of the opening facing away from the accommodating chamber, and the installation space is used to place a lifting device.

[0006] According to the electron beam measurement equipment provided by the present application, when the translation stage needs to be repaired, the connection between the end cap and the vacuum chamber can be loosened, and then the end cap can be moved from the first position to the second position by the moving assembly to open the opening of the vacuum chamber. The lifting equipment is then installed in the installation space, and the translation stage is lifted out of the accommodating chamber by the lifting equipment. During this process, the moving assembly only needs to move the end cap to the second position so that the translation stage can be lifted out of the accommodating chamber by the lifting equipment. There is no need to transfer the end cap to the maintenance space, nor is there any need to remove components on the end cap, such as the electron beam mirror and the optical microscope. This can reduce the operation of transferring the end cap, simplify the operation of servicing the translation stage, and improve maintenance efficiency.

[0007] In one possible embodiment, the moving assembly includes a driving portion and a lifting portion, wherein the lifting portion is connected between the end cap and the driving portion; the driving portion is configured to drive the lifting portion to move up and down in a first direction to move the end cap between a first position and a second position, wherein the first direction coincides with the thickness direction of the end cap. The driving portion and the lifting portion cooperate to facilitate movement of the end cap between the first position and the second position. Furthermore, during movement of the end cap between the first position and the second position, the end cap occupies space in the first direction (i.e., the vertical direction) of the electron beam measurement equipment, thereby avoiding occupying space in the horizontal direction of the electron beam measurement equipment and reducing maintenance space provided on one side of the electron beam measurement equipment in the horizontal direction.

[0008] In one possible embodiment, multiple moving assemblies are arranged around the vacuum chamber, and each of the moving assemblies is connected to the end cap. The multiple moving assemblies can apply pushing or pulling forces to the end cap from different positions on the end cap. This allows the end cap to be subjected to forces at multiple locations during movement, thereby making the end cap more stable and providing more stable support.

[0009] In one possible embodiment, the multiple movable assemblies include adjacent first and second movable assemblies. When the end cap is in the second position, the first and second movable assemblies, the vacuum chamber, and the end cap define an installation opening. The installation opening communicates with the installation space, allowing a lifting device to extend into the installation space through the installation opening. The provision of the installation opening ensures that the lifting device can extend into the installation space through the installation opening, preventing interference from the multiple movable assemblies with the installation of the lifting device, thereby affecting its installation in the installation space. Furthermore, the translation stage can be lifted out of the accommodating chamber and removed from the installation opening to a maintenance space.

[0010] In one possible embodiment, the orthographic projection of the vacuum chamber on the end cap is located within the end cap, and the movable assembly is connected to the side of the end cap facing the vacuum chamber. This makes the movable assembly, end cap, and vacuum chamber more compact overall, reducing the volume of the electron beam measurement equipment and the space it occupies.

[0011] In one possible embodiment, the vacuum chamber is provided with a first connecting hole, and the end cover is provided with a second connecting hole, and the first connecting hole and the second connecting hole extend in a direction perpendicular to the end cover; the electron beam measurement equipment also includes a first fastener, and when the end cover is in the first position, the first fastener is passed through the first connecting hole and the second connecting hole to connect the end cover and the vacuum chamber.

[0012] The end cap is connected to the vacuum chamber through the cooperation of the first fastener, the first connection hole, and the second connection hole. This ensures a tight connection between the end cap and the vacuum chamber, preventing external air from entering the containment chamber through the gap between the end cap and the vacuum chamber, thereby ensuring that the containment chamber remains in a vacuum state. Furthermore, the first fastener is easily removed from the first and second connection holes, thereby facilitating the removal of the end cap from the vacuum chamber, allowing the vacuum chamber to be opened and the translation stage removed for maintenance.

[0013] In one possible embodiment, the electron beam measurement equipment also includes an electron beam mirror, which is connected to the end cover and is used to scan the wafer to be inspected; the electron beam mirror can detect surface defects and critical dimensions of the wafer to determine whether the surface defects and critical dimensions of the wafer are qualified.

[0014] In one possible embodiment, the electron beam measurement apparatus further includes an optical microscope connected to the end cap for scanning the wafer to be inspected. The optical microscope can scan the wafer to determine its position within the vacuum chamber, thereby facilitating the translation stage to move the wafer into the detection range of the electron beam mirror, thereby facilitating inspection of the wafer by the electron beam mirror.

[0015] In a second aspect of the present application, a lifting device is provided, which is used to cooperate with the above-mentioned electron beam measurement equipment to lift the translation stage in the accommodating cavity. The lifting device includes a support assembly and a lifting member. The support assembly is used to connect with the electron beam measurement equipment when the end cover is in the second position; the lifting member is connected to the support assembly, and when the support assembly is connected to the electron beam measurement equipment, the lifting member can be located in the installation space to lift the translation stage.

[0016] Compared to hoisting equipment such as a gantry mounted outside an electron beam measurement device, the hoisting equipment provided in the present application is connected to the electron beam measurement device via a support assembly, and the hoisting components are located within the installation space for hoisting the translation stage. This can reduce the horizontal space occupied by the hoisting equipment on the electron beam measurement device. Thus, there is no need to provide a large maintenance space on one side of the electron beam measurement device in the horizontal direction, thereby facilitating the rational use of the space for storing the electron beam measurement device.

[0017] In one possible embodiment, the support assembly includes a first support structure and a second support structure arranged at intervals, and a suspension member connected between the first support structure and the second support structure, and the suspension member is suspended on the suspension member; the first support structure and the second support structure are used to be respectively installed at opposite ends of the vacuum chamber of the electron beam measurement equipment.

[0018] Through the above arrangement, the first and second support structures can support the suspension member from both ends, thereby providing stable support for the suspension member and, consequently, the sling. Furthermore, because the first and second support structures are spaced apart, when the support assembly is connected to the electron beam measurement equipment, the first and second support structures can be mounted at opposite ends of the vacuum chamber. This creates a clearance space between the first and second support structures, preventing interference between the sling and the support assembly after the translation stage is lifted out, thereby ensuring that the translation stage can be lifted out smoothly.

[0019] In one possible embodiment, the first support structure includes a first support member and a first guide member, one end of the first support member is used to connect to the vacuum chamber, and the other end of the first support member is connected to the first guide member; the second support structure includes a second support member and a second guide member, one end of the second support member is used to connect to the vacuum chamber, and the other end of the second support member is connected to the second guide member; the suspension member is connected between the first guide member and the second guide member, and can move relative to the first support member and the second support member under the guiding action of the first guide member and the second guide member to move the translation stage out of the installation space.

[0020] By setting the first guide member and the second guide member, the suspension member can be moved relative to the first support member and the second support member, thereby driving the translation stage to move through the lifting member, and moving the translation stage out of the installation space. Compared with manually lifting the translation stage out of the installation space, this can be more labor-saving and convenient, and can improve the efficiency of removing the translation stage.

[0021] In one possible embodiment, the first guide member includes a first section and a second section, and the second guide member includes a third section and a fourth section; when the support assembly is connected to the electron beam measurement device, the first section and the third section are located in the installation space, and the second section and the fourth section are located outside the installation space. Since the second section and the fourth section are located outside the installation space, after the translation stage is hoisted out, it can be moved with the suspension member to between the second section and the fourth section, so that the translation stage is moved to the outside of the installation space. At this time, the translation stage can be lowered to the ground or a maintenance table by the hoisting member for maintenance. In this way, the translation stage can be lifted out of the accommodating chamber and moved out of the installation space by the hoisting equipment without the need for other auxiliary equipment, making the lifting process of the translation stage simpler and more convenient to operate.

[0022] In one possible embodiment, the first support member includes a first support frame and a first diagonal brace, wherein the first support frame is connected to the first section, and the first diagonal brace is connected between the first support frame and the second section. The cooperation between the first support frame and the first diagonal brace can support both the first section and the second section of the first guide member, thereby ensuring the support strength of the first guide member.

[0023] In one possible embodiment, the second support member includes a second support frame and a second diagonal brace, the second support frame being connected to the third section, and the second diagonal brace being connected between the second support frame and the fourth section. The cooperation between the second support frame and the second diagonal brace can support both the third and fourth sections of the second guide member, thereby ensuring support strength for the second guide member.

[0024] In one possible embodiment, the support assembly further includes a first base plate and a second base plate, the first support structure being connected to the first base plate, the second support structure being connected to the second base plate, and both the first base plate and the second base plate being used to connect to the vacuum chamber. By connecting the first and second base plates to the vacuum chamber, the connection area between the support assembly and the vacuum chamber can be ensured, thereby ensuring the stability of the connection between the support assembly and the vacuum chamber. Furthermore, the number of connection locations between the support assembly and the vacuum chamber can be reduced, thereby improving the connection efficiency between the support assembly and the vacuum chamber.

[0025] In one possible embodiment, the vacuum chamber is provided with a first connection hole extending in a direction perpendicular to the end cap; the electron beam measurement device further includes a first fastener; and the support assembly further includes a third connection hole, wherein the first fastener can be inserted through the first connection hole and the third connection hole to connect the support assembly to the vacuum chamber. In this way, when the end cap is in the second position, the unused structure of the electron beam measurement device (the first connection hole and the first fastener) can be rationally utilized to cooperate with the third connection hole of the support assembly to secure the support assembly to the vacuum chamber, eliminating the need for separate components for securing the support assembly to the vacuum chamber. This simplifies the connection method between the support assembly and the vacuum chamber and saves costs.

[0026] In one possible embodiment, the lifting device further includes a spacer disposed between the support assembly and the electron beam measurement device when the support assembly is connected to the electron beam measurement device. The spacer can separate the support assembly from the electron beam measurement device, thereby preventing particulate contaminants generated by friction between the support assembly and the electron beam measurement device from entering the receiving chamber of the vacuum chamber and affecting the cleanliness of the receiving chamber.

[0027] In one possible embodiment, the material of the spacer includes a non-metallic material. Using a non-metallic material for the spacer can reduce particle contaminants generated by friction between the spacer and the electron beam measurement device, thereby ensuring the cleanliness of the receiving chamber of the vacuum chamber. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0029] Figure 1 A schematic structural diagram of an electron beam measurement device provided in an embodiment of the present application;

[0030] Figure 2 for Figure 1 Schematic diagram of the internal structure of the electron beam measurement equipment shown;

[0031] Figure 3 for Figure 1 A schematic structural diagram of the electron beam measurement device shown when the end cover is in the second position;

[0032] Figure 4 For the installation of lifting equipment Figure 3 A schematic diagram of the structure of the installation space of the electron beam measurement equipment shown;

[0033] Figure 5 A schematic structural diagram of a hoisting device provided in an embodiment of the present application;

[0034] Figure 6 for Figure 5 A schematic structural diagram of the first supporting structure in the hoisting equipment shown;

[0035] Figure 7 for Figure 5 A schematic structural diagram of the second supporting structure in the lifting equipment shown.

[0036] Description of reference numerals:

[0037] 1. Electron beam measurement equipment; 11. Vacuum chamber; 111. Accommodation chamber; 112. Opening; 113. First connecting hole;

[0038] 12. End cap; 121. Second connecting hole; 13. Translation stage; 14. Detection device; 141. Electron beam mirror; 142. Optical microscope; 15. Moving assembly; 151. Driving unit; 152. Lifting unit; 153. First moving assembly; 154. Second moving assembly; 16. First fastener; 17. Installation space; 18. Installation port;

[0039] 2. Hoisting equipment; 21. Support assembly; 211. Third connecting hole; 212. First base plate; 213. Second base plate; 214. First supporting structure; 2141. First support member; 2141A. First support frame; 2141B. First diagonal brace; 2141C. Vertical rod; 2141D. Crossbar; 2142. First guide member; 2142A. First support rod; 2142B. First guide rail; 2142 C, first section; 2142D, second section; 215, second supporting structure; 2151, second supporting member; 2151A, second supporting frame; 2151B, second diagonal brace; 2152, second guide member; 2152A, second support rod; 2152B, second guide rail; 2152C, third section; 2152D, fourth section; 216, hanging member; 22, lifting member; 23, layer partition; 24, avoidance space. DETAILED DESCRIPTION

[0040] In the embodiments of the present application, it should be noted that, unless otherwise clearly specified and limited, the terms "installation" and "connection" should be understood in a broad sense. For example, "connection" can be a detachable connection or a non-detachable connection; it can be a direct connection or an indirect connection through an intermediate medium.

[0041] In the embodiments of the present application, it should be understood that the directional terms mentioned, such as "up", "down", "left", "right", "inside", "outside", etc., are only references to the directions in the drawings. Therefore, the directional terms used are for better and clearer explanation and understanding of the embodiments of the present application, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the embodiments of the present application.

[0042] In the embodiments of this application, the terms "first," "second," "third," and "fourth" are used for descriptive purposes only and should not be understood to indicate or imply relative importance or implicitly specify the number of the technical features indicated. Therefore, a feature specified as "first," "second," "third," or "fourth" may explicitly or implicitly include one or more of the features.

[0043] In the embodiments of the present application, the terms "comprises," "comprising," or any other variations thereof are intended to encompass non-exclusive inclusion, such that a process, method, article, or apparatus comprising a series of elements includes not only those elements but also other elements not explicitly listed, or elements inherent to such process, method, article, or apparatus. In the absence of further limitations, an element defined by the phrase "comprising a ..." does not preclude the presence of other identical elements in the process, method, article, or apparatus comprising the element.

[0044] In the embodiments of the present application, "and / or" is merely a description of the association relationship of associated objects, indicating that three relationships may exist. For example, A and / or B may represent three situations: A exists alone, A and B exist at the same time, and B exists alone.

[0045] See also Figure 1 , Figure 1 This is a schematic diagram of the structure of an electron beam metrology device 1 provided in an embodiment of the present application. Electron beam metrology device 1 is used to detect wafer defects and critical dimensions (CDs). A wafer is a silicon wafer used to manufacture semiconductor integrated circuits. A CD is a line width in an exposure image formed by scanning the wafer with an electron beam mirror.

[0046] Furthermore, wafer inspection must be performed in a vacuum environment to prevent air, moisture, dust, and other contaminants from affecting wafer inspection, thereby improving wafer inspection accuracy. A vacuum environment refers to an environment where the air pressure is less than one atmosphere.

[0047] See also Figure 1 and Figure 2 , Figure 2 for Figure 1 The internal structure of the electron beam measurement device is shown in FIG. The electron beam measurement device 1 may include a vacuum chamber 11, an end cap 12, a translation stage 13, and a detection device 14. The vacuum chamber 11 is formed with a receiving cavity 111 and an opening 112 communicating with the receiving cavity 111. The end cap 12 can block the opening 112 of the vacuum chamber 11, making the receiving cavity 111 a closed chamber. In this way, the receiving cavity 111 can be evacuated to a vacuum state using a vacuum pump, thereby providing a vacuum environment for wafer testing.

[0048] The vacuum chamber 11 and the end cap 12 may be made of metal, such as iron, aluminum, steel, stainless steel, aluminum alloy, etc. The metal material can ensure the structural strength of the vacuum chamber 11 and the end cap 12 .

[0049] Please continue reading Figure 2 The translation stage 13 is disposed within the accommodating chamber 111 and is used to support the wafer to be inspected. That is, when inspecting a wafer, the wafer needs to be placed on the translation stage 13 so that the translation stage 13 can support the wafer. Furthermore, because the translation stage 13 is located within the accommodating chamber 111, when the accommodating chamber 111 is in a vacuum state, the wafer is in a vacuum environment, thereby improving the accuracy of wafer inspection.

[0050] In some examples, the translation stage 13 can move within the accommodating chamber 111 to receive a wafer transferred from a previous workstation and transport the wafer to the detection range of the inspection device 14 to facilitate wafer inspection. For example, a guide rail can be provided within the accommodating chamber 111, and the translation stage 13 is slidably connected to the guide rail. A drive element, such as a pneumatic cylinder or electric push rod, drives the translation stage 13 along the guide rail to achieve movement within the accommodating chamber 111.

[0051] Please continue reading Figure 1 The inspection device 14 can be connected to the end cap 12 and is used to detect defects and critical dimensions of the wafer on the translation stage 13. After the translation stage 13 transports the wafer into the detection range of the inspection device 14, the inspection device 14 scans and images the wafer, thereby analyzing the defects and critical dimensions of the wafer through imaging to determine whether the wafer is qualified.

[0052] For some examples, see Figure 1 The detection device 14 may further include an electron beam mirror 141. The electron beam mirror 141 is connected to the end cover 12 and is used to scan the wafer to be detected on the translation stage 13.

[0053] The component for emitting electron beam in the electron beam mirror 141, such as an electron gun, can be inserted into the first mounting hole ( Figure 1 The electron beam mirror 141 is inserted into the housing cavity 111 so that the emitted electron beam can act on the surface of the wafer, scanning the wafer to obtain an image of the wafer. The surface defects and critical dimensions of the wafer are then analyzed based on the acquired image to determine whether the surface defects and critical dimensions of the wafer are qualified. Exemplarily, the component of the electron beam mirror 141 for emitting the electron beam is sealed to the inner wall of the first mounting hole.

[0054] For some examples, see Figure 1 The detection device 14 may further include an optical microscope 142 . The optical microscope 142 is connected to the end cover 12 and is used to scan the wafer to be detected on the translation stage 13 .

[0055] The lens barrel of the optical microscope 142 can be inserted into the second mounting hole ( Figure 1 The optical microscope 142 is not shown and extends into the accommodating cavity 111. The light emitted by the optical microscope 142 can act on the wafer through the lens barrel, scanning the wafer to obtain the wafer's position, thereby facilitating the translation stage 13 to move the wafer into the detection range of the electron beam mirror 141, allowing the electron beam mirror 141 to inspect the wafer. Exemplarily, the lens barrel of the optical microscope 142 can be sealed to the inner wall surface of the second mounting hole.

[0056] The interior of the electron beam mirror 141 needs to be in a vacuum state to prevent electrons in the electron beam from being absorbed or deflected. Therefore, the electron beam mirror 141 is provided with an air pipe joint, which is connected to a vacuum device such as a vacuum pump through an air pipe to facilitate evacuating the interior of the electron beam mirror 141 to a vacuum state.

[0057] In addition, the electron beam mirror 141 and the optical microscope 142 also need to be connected to power supplies, controllers, detectors and other equipment through wires, signal lines, etc., so as to power the electron beam mirror 141 and the optical microscope 142 and transmit the information detected by the electron beam mirror 141 and the optical microscope 142.

[0058] In addition, the translation stage 13 needs to be frequently moved to transport the wafers, and the movement accuracy requirement of the translation stage 13 is also relatively high. Therefore, the translation stage 13 is more prone to failure and needs to be frequently repaired.

[0059] Because the translation stage 13 is located within the accommodating chamber 111, maintenance of the translation stage 13 requires removing the end cap 12 from the vacuum chamber 11 and placing it in a maintenance space. The translation stage 13 is then removed from the accommodating chamber 111 and moved to the maintenance space for maintenance. The maintenance space is a horizontally reserved space on one side of the electron beam measurement device 1 for inspecting and servicing the device.

[0060] During the process of transferring the translation stage 13 to the maintenance space, since the electron beam mirror 141 and the optical microscope 142 are connected to the end cover 12, and the electron beam mirror 141 is also connected to the air pipe, the electron beam mirror 141 and the optical microscope 142 are also connected to wires, signal lines, etc., if the electron beam mirror 141, the optical microscope 142 and the end cover 12 are removed as a whole, it is difficult to place the whole formed by the electron beam mirror 141, the optical microscope 142 and the end cover 12 into the maintenance space due to the limitations of the air pipe, wires, signal lines, etc. Therefore, the electron beam mirror 141 and the optical microscope 142 can only be removed from the end cover 12, and then the end cover 12 can be removed from the vacuum chamber 11. This will make the operation of maintaining the translation stage 13 more cumbersome, affecting the maintenance efficiency of the translation stage 13.

[0061] Based on this, in some embodiments, see Figure 1 and Figure 3 , Figure 3 for Figure 1 The structure diagram of the electron beam measurement device 1 when the end cover 12 is in the second position is shown. The electron beam measurement device 1 also includes a moving component 15. The moving component 15 is connected to the end cover 12 and is used to drive the end cover 12 to move between the first position and the second position. For details, please continue to refer to Figure 1When the end cap 12 is in the first position, the end cap 12 blocks the opening 112. At this time, the electron beam measurement device 1 is used to detect the wafer. Figure 3 When the end cover 12 is located at the second position, the end cover 12 opens the opening 112 , and the electron beam measurement device 1 is used to remove the translation stage for maintenance.

[0062] In some embodiments, when the end cap 12 is in the first position, in order to ensure the firmness of the connection between the end cap 12 and the vacuum chamber 11, please continue to refer to Figure 1 The electron beam measurement device 1 may further include a first fastener 16. The first fastener 16 is used to secure the end cap 12 to the vacuum chamber 11 when the end cap 12 is in the first position, thereby preventing external air from entering the accommodating chamber 111 and destroying the vacuum environment of the accommodating chamber 111. Exemplarily, the first fastener 16 may be a bolt, or the first fastener 16 may include a matching bolt and nut, or the first fastener 16 may be a stud.

[0063] Please continue to see Figure 2 and Figure 3 The vacuum chamber 11 is provided with a first connection hole 113, and the end cap 12 is provided with a second connection hole 121. The first connection hole 113 and the second connection hole 121 extend in a direction perpendicular to the end cap 12. For example, both the first connection hole 113 and the second connection hole 121 can be threaded holes. Alternatively, the first connection hole 113 is a threaded hole, and the second connection hole 121 is a through hole without threads. Alternatively, both the first connection hole 113 and the second connection hole 121 are through holes.

[0064] When the end cover 12 is located at the first position, the first fastener 16 is passed through the first connection hole 113 and the second connection hole 121 to connect the end cover 12 and the vacuum chamber 11 .

[0065] The first fastener 16, first connection hole 113, and second connection hole 121 cooperate to connect the end cap 12 to the vacuum chamber 11, ensuring a tight connection between the end cap 12 and the vacuum chamber 11. This prevents external air from entering the accommodating chamber 111 through the gap between the end cap 12 and the vacuum chamber 11, thereby ensuring that the accommodating chamber 111 remains in a vacuum state. Furthermore, the first fastener 16 is easily removable from the first connection hole 113 and second connection hole 121, thereby facilitating the removal of the end cap 12 from the vacuum chamber 11, allowing for easy opening of the opening 112 of the vacuum chamber 11 and removal of the translation stage 13 for maintenance.

[0066] In some examples, the number of first connection holes 113 and the number of second connection holes 121 can both be multiple, with multiple first connection holes 113 spaced apart around the opening 112 of the vacuum chamber 11. One second connection hole 121 corresponds to one first connection hole 113. The number of first fasteners 16 can also be multiple, with one first fastener 16 passing through one first connection hole 113 and one second connection hole 121. The number of first connection holes 113 and the number of second connection holes 121 can be the same or different.

[0067] In some other embodiments, the end cover 12 and the vacuum chamber 11 may be connected by snap-fitting or other methods.

[0068] In some embodiments, the electron beam measurement device 1 may further include a sealing gasket. When the end cap 12 is connected to the vacuum chamber 11, the sealing gasket is disposed between the end cap 12 and the vacuum chamber 11 to seal the gap between the end cap 12 and the vacuum chamber 11, thereby further preventing external air from entering the accommodating chamber 111 through the gap between the end cap 12 and the vacuum chamber 11.

[0069] Please continue reading Figure 3 When the end cover is in the second position, an installation space 17 is formed on the side of the opening 112 facing away from the accommodating cavity 111. The installation space 17 is used to place the hoisting equipment 2. For details, please refer to Figure 4 , Figure 4 For the installation of lifting equipment 2 Figure 3 The structure diagram of the electron beam measurement device is shown in the installation space 17. At least part of the lifting device 2 is located in the installation space 17. The lifting device 2 is used to lift the translation stage 13 out of the accommodating cavity 111 to facilitate maintenance of the translation stage 13.

[0070] In this way, when the translation stage 13 needs to be repaired, the connection between the end cap 12 and the vacuum chamber 11 can be loosened, for example, by removing the first fastener 16 from the first connection hole 113 and the second connection hole 121. The end cap 12 is then moved from the first position to the second position by the moving assembly 15, so that the end cap 12 opens the opening 112 of the vacuum chamber 11. The lifting device 2 is then installed in the installation space 17, and the translation stage 13 is lifted out of the accommodating cavity 111 by the lifting device 2. During this process, the moving assembly 15 only needs to move the end cap 12 to the second position to lift the translation stage 13 out by the lifting device 2, without having to transfer the end cap 12 to the maintenance space. This reduces the operation of transferring the end cap 12, simplifies the operation of repairing the translation stage 13, and improves maintenance efficiency.

[0071] In addition, the moving component 15 is connected to the end cover 12. During the process of the end cover 12 moving from the first position to the second position, and when the end cover 12 is in the second position, the moving component 15 can support the end cover 12, and the end cover 12 can support the electron beam mirror 141 and the optical microscope 142, etc. Therefore, only the air pipe connected to the electron beam mirror 141, and the wires, signal lines, etc. connected to the electron beam mirror 141 and the optical microscope 142 need to have a surplus to meet the needs of moving the end cover 12 from the first position to the second position, and the electron beam mirror 141 and the optical microscope 142 do not need to be removed from the end cover 12, thereby reducing the number of parts to be removed, further reducing the operations during maintenance of the translation stage 13, and improving maintenance efficiency.

[0072] It should be noted that the distance that the end cap 12 moves from the first position to the second position only needs to be sufficient to lift the translation stage 13 out of the accommodating chamber 111. The air pipe connected to the electron beam mirror 141 and the wires, signal lines, etc. connected to the electron beam mirror 141 and the optical microscope 142 are usually provided with a margin, which is usually sufficient to move the end cap 12 from the first position to the second position. However, the maintenance space is usually located on one side of the electron beam measurement equipment 1 in the horizontal direction, which is far away from the end cap 12. The margin of the air pipe connected to the electron beam mirror 141 and the wires, signal lines, etc. connected to the electron beam mirror 141 and the optical microscope 142 is usually insufficient to transfer the end cap 12, the electron beam mirror 141 and the optical microscope 142 as a whole to the maintenance space. Therefore, by moving the end cover 12 to the second position and lifting out the translation stage 13 through the moving component 15, the relationship between the remaining space of the air pipe connected to the electron beam mirror 141 and the wires, signal lines, etc. connected to the electron beam mirror 141 and the optical microscope 142 and the space required for lifting out the translation stage 13 can be well utilized to simplify the maintenance operation of the translation stage 13.

[0073] In addition, compared to the lifting equipment 2 such as a gantry that is arranged outside the electron beam measurement equipment 1, the present application arranges the lifting equipment 2 in the installation space 17 on the side of the opening 112 of the vacuum chamber 11 facing away from the accommodating chamber 111, which can reduce the horizontal space occupied by the lifting equipment 2 of the electron beam measurement equipment 1. In this way, there is no need to set up too much maintenance space on one side of the electron beam measurement equipment 1 in the horizontal direction, so as to reasonably utilize the space of the measurement room where the electron beam measurement equipment 1 is stored.

[0074] It should be noted that the hoisting device 2 in the present application is designed according to the size of the installation space 17. The specific structure of the hoisting device 2 will be described in detail later.

[0075] The moving assembly 15 can drive the end cover 12 to move in a first direction (eg Figure 3The first direction is consistent with the thickness direction of the end cap 12. For example, if the end cap 12 is located at the upper end of the vacuum chamber 11, the first direction may be a vertical direction. The moving assembly 15 may also drive the end cap 12 to move in a second direction (such as Figure 3 The second direction may be perpendicular to the thickness direction of the end cap 12, for example, the second direction may be horizontal. The moving assembly 15 may also drive the end cap 12 to rotate within the plane in which the end cap 12 is located.

[0076] This application is exemplified by the fact that the moving assembly 15 can drive the end cover 12 to move along the first direction.

[0077] In some embodiments, please refer to Figure 3 The moving assembly 15 may include a driving portion 151 and a lifting portion 152. The driving portion 151 is used to drive the lifting portion 152 to move up and down along a first direction.

[0078] The lifting unit 152 is connected between the end cap 12 and the driving unit 151. The driving unit 151 drives the lifting unit 152 up and down in a first direction, thereby driving the end cap 12 in the first direction, thereby moving the end cap 12 between a first position and a second position. In other words, the lifting unit 152 drives the end cap 12 away from the vacuum chamber 11 in the first direction, thereby moving the end cap 12 from the first position to the second position; the lifting unit 152 drives the end cap 12 toward the vacuum chamber 11 in the first direction, thereby moving the end cap 12 from the second position to the first position.

[0079] In this way, during the movement of the end cover 12 between the first position and the second position, the space occupied by the electron beam measurement equipment 1 in the first direction (for example, the vertical direction) can be avoided, thereby avoiding occupying the space of the electron beam measurement equipment 1 in the horizontal direction, thereby further reducing the maintenance space set on one side of the electron beam measurement equipment 1 in the horizontal direction.

[0080] In some embodiments, the moving component 15 can be a cylinder, wherein the cylinder body and the pneumatic actuator of the cylinder form the driving part 151, and the piston rod of the cylinder forms the lifting part 152. The structure of the cylinder is simple, easy to maintain, and also convenient to install. In some other embodiments, the moving component 15 can also be an electric push rod, a linear motor, a linear slide, etc. In some other embodiments, the moving component 15 can include a rotary motor, a gear and a rack, the gear is fixed to the output shaft of the rotary motor, and forms the driving part 151 with the rotary motor, the rack is engaged with the gear, and the rack forms the lifting part 152.

[0081] In some embodiments, please refer to Figure 3The number of the moving components 15 is multiple, for example, the number of the moving components 15 can be two, three, four, five, six, etc. The structures of the multiple moving components 15 can be the same or different.

[0082] A plurality of moving components 15 are disposed around the vacuum chamber 11, and the plurality of moving components 15 are all connected to the end cover 12. The moving components 15 may be connected to the vacuum chamber 11 or may not be connected to the vacuum chamber 11.

[0083] The multiple moving components 15 can apply pushing or pulling force to the end cover 12 from different positions of the end cover 12, so that the end cover 12 can be subjected to force at multiple locations during the movement, thereby making the movement of the end cover 12 more stable and the end cover 12 can also be supported more stably.

[0084] In some other embodiments, the number of the moving assembly 15 may also be one. One moving assembly 15 can also drive the end cover 12 to move, and can reduce costs.

[0085] In some embodiments, please refer to Figure 2 and Figure 3 The multiple moving components 15 include adjacent first moving components 153 and second moving components 154. When the end cover 12 is in the second position, the first moving component 153, the second moving component 154, the vacuum chamber 11 and the end cover 12 form an installation opening 18; the installation opening 18 is connected to the installation space 17, so that the lifting equipment 2 extends into the installation space 17 through the installation opening 18.

[0086] That is to say, in the arrangement direction of the first movable component 153 and the second movable component 154, the distance between the first movable component 153 and the second movable component 154 needs to be larger than the size of the lifting device 2, so as to ensure that the lifting device 2 can be extended from the installation port 18 into the installation space 17, so as to avoid interference with the installation of the lifting device 2 by multiple movable components 15 and affect the installation of the lifting device 2 in the installation space 17, and the displacement platform 13 can be lifted out of the accommodating cavity 111 and moved out of the installation port 18 to the maintenance space.

[0087] The installation opening 18 may face the maintenance space, so that the maintenance space and the installation space 17 can be reasonably utilized, and the hoisting device 2 can be installed in the installation space 17 to reduce the space occupied by the hoisting device 2 during installation.

[0088] In some embodiments, the orthographic projection of the vacuum chamber 11 on the end cap 12 is located within the range of the end cap 12, and the movable assembly 15 is connected to the side of the end cap 12 facing the vacuum chamber 11. In this way, the movable assembly 15, the end cap 12, and the vacuum chamber 11 have a more compact overall structure, which can reduce the volume of the electron beam measurement device 1 and thus reduce the space occupied by the electron beam measurement device 1.

[0089] In some other embodiments, the moving component 15 can also be arranged on the side of the end cover 12 facing away from the vacuum chamber 11. For example, the moving component 15 is arranged on the upper side of the end cover 12. In this case, a structure is required to support and fix the moving component 15, such as a support rod.

[0090] In some embodiments, see Figure 5 , Figure 5 FIG2 is a schematic diagram of the structure of a lifting device 2 provided in an embodiment of the present application. The lifting device 2 is used to cooperate with the above-mentioned electron beam measurement device 1 to lift the translation stage 13 in the accommodating cavity 111 .

[0091] The hoisting device 2 may include a support assembly 21 and a hoisting member 22. The support assembly 21 is used to connect to the electron beam measurement device 1. The support assembly 21 may be connected to the end cap 12 or the vacuum chamber 11 of the electron beam measurement device 1. This application is exemplified by the connection between the support assembly 21 and the vacuum chamber 11.

[0092] In some embodiments, the support assembly 21 may be made of metal, for example, iron, steel, aluminum, stainless steel, aluminum alloy, etc. The support assembly 21 may be made of metal to improve the structural strength of the support assembly 21 and the structural strength of the lifting device 2.

[0093] In some embodiments, please refer to Figure 5 The support assembly 21 is provided with a third connection hole 211, which is used to cooperate with the first connection hole 113 and the first fastener 16 on the vacuum chamber 11 to install the support assembly 21 on the vacuum chamber 11. Specifically, when the end cover 12 is in the second position, the first connection hole 113 and the first fastener 16 on the vacuum chamber 11 are in an idle state. At this time, the third connection hole 211 can be aligned with the first connection hole 113, and then the first fastener 16 can be inserted into the first connection hole 113 and the third connection hole 211 to achieve the connection between the support assembly 21 and the vacuum chamber 11.

[0094] In this way, the idle structure in the electron beam measurement equipment 1 (the first connecting hole 113 and the first fastener 16) can be reasonably utilized and cooperated with the third connecting hole 211 set in the support component 21 to fix the support component 21 to the vacuum chamber 11 without the need to separately set up a component for fixing the support component 21 and the vacuum chamber 11, thereby simplifying the connection method between the support component 21 and the vacuum chamber 11 and saving costs.

[0095] In some embodiments, there may be multiple third connection holes 211, one third connection hole 211 may correspond to one first connection hole 113, and one first fastener 16 may be inserted through one first connection hole 113 and one third connection hole 211. The number of third connection holes 211 may be the same as or different from the number of first connection holes 113.

[0096] In some other embodiments, the support assembly 21 may also be connected to the electron beam measurement device 1 through a detachable connection method such as snap connection, which is not specifically limited in this application.

[0097] In some embodiments, see Figure 5 The hoisting device 2 further includes a spacer 23. The spacer 23 is used to separate the support assembly 21 from the electron beam measurement device 1, preventing direct contact and friction between the support assembly 21 and the electron beam measurement device 1, thereby preventing particulate contaminants generated by friction from entering the receiving chamber 111 of the vacuum chamber 11 and affecting the cleanliness of the receiving chamber. Exemplarily, the spacer 23 can be a plate-shaped structure, a cylindrical structure, an elliptical cylindrical structure, an annular structure, etc. This application does not impose any specific restrictions on this structure, and it only needs to separate the support assembly 21 from the electron beam measurement device 1.

[0098] When the support assembly 21 is connected to the electron beam measurement device 1 , the spacer 23 is disposed between the support assembly 21 and the electron beam measurement device 1 . Exemplarily, the spacer 23 is disposed between the support assembly 21 and the vacuum chamber 11 .

[0099] Separating the support assembly 21 from the electron beam measurement device 1 by the spacer 23 can prevent friction between the support assembly 21 and the electron beam measurement device 1, which could cause particulate contaminants to enter the receiving chamber 111 of the vacuum chamber 11 and affect the cleanliness of the receiving chamber 111. For example, friction between the support assembly 21 and the vacuum chamber 11 could affect the sealing performance of the connection between the end cap 12 and the vacuum chamber 11, thereby affecting the vacuum environment within the receiving chamber 111.

[0100] In some embodiments, the material of the spacer 23 includes a non-metallic material. For example, the spacer 23 may be made of rubber, nylon, polyurethane, polytetrafluoroethylene, plastic, silicone, etc. Using a non-metallic material for the spacer 23 can reduce particulate contaminants generated by friction between the spacer 23 and the electron beam measurement device 1, thereby ensuring the cleanliness of the receiving chamber 111 of the vacuum chamber 11.

[0101] Please continue reading Figure 5The lifting member 22 is connected to the support assembly 21, and the support assembly 21 can also support the lifting member 22. The lifting member 22 is used to lift the translation stage 13 in the accommodating cavity 111. For example, the lifting member 22 can be a hand chain hoist, a crane, an electric hoist, or other device capable of lifting the translation stage 13 out of the accommodating cavity 111, which is not specifically limited in this application.

[0102] For details, please refer to Figure 4 and Figure 5 When the end cover 12 is located at the second position, the support assembly 21 can be connected to the electron beam measurement device 1, and the hanging member 22 is located in the installation space 17, so that the translation stage 13 can be lifted out of the accommodating cavity 111 by the hanging member 22.

[0103] Compared with a hoisting device 2, such as a gantry, provided outside the electron beam measurement device 1, by connecting the hoisting device 2 to the electron beam measurement device 1 through the support assembly 21 and positioning the hoisting member 22 within the installation space 17, the translation stage 13 is hoisted. This can reduce the horizontal space occupied by the hoisting device 2 on the electron beam measurement device 1. Thus, there is no need to provide a large maintenance space on one side of the electron beam measurement device 1 in the horizontal direction, thereby facilitating the rational use of the space for storing the electron beam measurement device 1.

[0104] The structure of the support assembly 21 is described below.

[0105] In some embodiments, please refer to Figure 5 The support assembly 21 may include a first bottom plate 212 and a second bottom plate 213. The first bottom plate 212 and the second bottom plate 213 are both used to connect to the vacuum chamber 11. Specifically, the first bottom plate 212 and the second bottom plate 213 are respectively connected to opposite ends of the vacuum chamber 11. For example, along the arrangement direction of the first movable assembly 153 and the second movable assembly 154, the first bottom plate 212 and the second bottom plate 213 are respectively installed at two ends of the vacuum chamber 11.

[0106] By connecting the first base plate 212 and the second base plate 213 to the vacuum chamber 11, the connection area between the support assembly 21 and the vacuum chamber 11 can be guaranteed to ensure the connection stability between the support assembly 21 and the vacuum chamber 11, and the connection position between the support assembly 21 and the vacuum chamber 11 can also be reduced to improve the connection efficiency between the support assembly 21 and the vacuum chamber 11.

[0107] In some embodiments, please refer to Figure 5, the first bottom plate 212 and the second bottom plate 213 are both provided with a third connection hole 211. The third connection hole 211 is relatively easy to open on the first bottom plate 212 and the second bottom plate 213, which facilitates the arrangement of the third connection hole 211 and the processing of the support assembly 21. In other embodiments, one of the first bottom plate 212 and the second bottom plate 213 is provided with the third connection hole 211, and the other of the first bottom plate 212 and the second bottom plate 213 can be connected to the vacuum chamber 11 by a snap-fit connection.

[0108] In some embodiments, please refer to Figure 5 The spacer 23 is provided between the first bottom plate 212 and the vacuum chamber 11, and between the second bottom plate 213 and the vacuum chamber 11. The first bottom plate 212 and the second bottom plate 213 are plate-shaped structures that can better contact the spacer 23, so that the spacer 23 can better separate the support assembly 21 and the vacuum chamber 11.

[0109] In some other embodiments, the support assembly 21 may also include a base plate in addition to the first base plate 212 and the second base plate 213, such as a third base plate and a fourth base plate connected between the first base plate 212 and the second base plate 213. The third base plate and the fourth base plate may also be connected to the vacuum chamber 11 to improve the stability of the connection between the support assembly 21 and the vacuum chamber 11.

[0110] In some embodiments, please refer to Figure 5 The support assembly 21 may include a first support structure 214 and a second support structure 215 that are spaced apart. The first support structure 214 and the second support structure 215 are used to support the sling 22 so that the sling 22 can stably sling the displacement stage 13.

[0111] The first support structure 214 can be connected to the first bottom plate 212, which can support the first support structure 214 and connect the first support structure 214 to the vacuum chamber 11 through the first bottom plate 212. The second support structure 215 can be connected to the second bottom plate 213, which can support the second support structure 215 and connect the second support structure 215 to the vacuum chamber 11 through the second bottom plate 213. In this way, the connection between the first support structure 214 and the vacuum chamber 11, as well as between the second support structure 215 and the vacuum chamber 11, can be facilitated.

[0112] Furthermore, since the first supporting structure 214 and the second supporting structure 215 are spaced apart from each other, the first bottom plate 212 and the second bottom plate 213 can be connected to the opposite ends of the vacuum chamber 11, respectively. In this way, an escape space 24 can be formed between the first supporting structure 214 and the second supporting structure 215 to prevent the lifting member 22 from interfering with the support assembly 21 after lifting the translation stage 13, thereby ensuring that the translation stage 13 can be lifted out smoothly.

[0113] In some other embodiments, the first base plate 212 and the second base plate 213 may not be provided, and the first support structure 214 and the second support structure 215 may be directly connected to the vacuum chamber 11. In this case, when the support assembly 21 is connected to the electron beam measurement device 1, the first support structure 214 and the second support structure 215 may be respectively installed at opposite ends of the vacuum chamber 11. For example, along the arrangement direction of the first movable assembly 153 and the second movable assembly 154, the first support structure 214 and the second support structure 215 may be respectively installed at opposite ends of the vacuum chamber 11. In this way, an escape space 24 can be formed between the first support structure 214 and the second support structure 215 to prevent interference between the support assembly 21 and the lifting member 22 after the translation stage 13 is lifted out.

[0114] In some embodiments, please refer to Figure 5 The support assembly 21 may further include a suspension member 216. The suspension member 216 is used to suspend the sling member 22 to support the sling member 22. The suspension member 216 is connected between the first support structure 214 and the second support structure 215. The first support structure 214 and the second support structure 215 can support the suspension member 216 from both ends to stably support the suspension member 216 and thus stably support the sling member 22.

[0115] For example, the hanging member 216 may be a rod-shaped structure, a plate-shaped structure, or other structure capable of hanging the hanging member 22 , and this application does not impose any specific limitation on this.

[0116] In some embodiments, please refer to Figure 5 The first support structure 214 includes a first support member 2141 and a first guide member 2142. One end of the first support member 2141 is used to connect to the vacuum chamber 11. Exemplarily, one end of the first support member 2141 is connected to the first base plate 212. The other end of the first support member 2141 is connected to the first guide member 2142. The first support member 2141 is used to support the first guide member 2142.

[0117] Please continue reading Figure 5The second support structure 215 includes a second support member 2151 and a second guide member 2152. One end of the second support member 2151 is used to connect to the vacuum chamber 11. For example, one end of the second support member 2151 is connected to the second bottom plate 213. The other end of the second support member 2151 is connected to the second guide member 2152. The second support member 2151 is used to support the second guide member 2152.

[0118] The suspension member 216 is connected between the first guide member 2142 and the second guide member 2152. The first guide member 2142 and the second guide member 2152 can support the suspension member 216. Furthermore, the suspension member 216 can move relative to the first support member 2141 and the second support member 2151 under the guidance of the first guide member 2142 and the second guide member 2152 to move the translation stage 13 out of the installation space 17.

[0119] After the lifting device 2 is installed on the vacuum chamber 11 , the first guide member 2142 and the second guide member 2152 can guide the suspension member 216 to move in a horizontal direction, for example, a direction perpendicular to the installation opening 18 , to facilitate moving the translation stage 13 out of the installation space 17 .

[0120] After the lifting member 22 lifts the displacement stage 13 out of the accommodating cavity 111, the suspension member 216 can be moved relative to the first support member 2141 and the second support member 2151 under the guidance of the first guide member 2142 and the second guide member 2152, so that the displacement stage 13 is driven to move by the lifting member 22 and moved out of the installation space 17. Compared with manually lifting the displacement stage 13 out of the installation space 17, this can be more labor-saving and convenient, and can improve the efficiency of removing the displacement stage 13.

[0121] In some embodiments, please refer to Figure 5 The first guide member 2142 may include a first support rod 2142A and a first guide rail 2142B connected to the first support rod 2142A. The second guide member 2152 may include a second support rod 2152A and a second guide rail 2152B connected to the second support rod 2152A. One end of the suspension member 216 is slidably connected to the first guide rail 2142B via a first slider, and the other end of the suspension member 216 is slidably connected to the second guide rail 2152B via a second slider. In this manner, the suspension member 216 can be manually pushed to slide on the first guide rail 2142B and the second guide rail 2152B, or it can be pushed on the first guide rail 2142B and the second guide rail 2152B by a cylinder, an electric push rod, or the like.

[0122] In some other embodiments, the first guide member 2142 and the second guide member 2152 may also be a synchronous belt and synchronous wheel structure, a belt transmission structure, etc.

[0123] In some embodiments, please refer to Figure 5 The first guide member 2142 may include a first section 2142C and a second section 2142D, and the second guide member 2152 may include a third section 2152C and a fourth section 2152D. When the support assembly 21 is connected to the electron beam measurement device 1, the first section 2142C and the third section 2152C are located within the installation space 17, while the second section 2142D and the fourth section 2152D are located outside the installation space 17.

[0124] In this manner, when the lifting member 22 lifts the translation stage 13 out of the accommodating chamber 111, the suspension member 216 is located between the first section 2142C and the third section 2152C. At this point, the lifting member 22 can be located above the accommodating chamber 111, facilitating the lifting of the translation stage 13 through the opening 112 of the vacuum chamber 11. After the translation stage 13 is lifted out of the accommodating chamber 111, the suspension member 216 can be moved from the first section 2142C and the third section 2152C toward the second section 2142D and the fourth section 2152D until it reaches between the second section 2142D and the fourth section 2152D. At this point, since the second section 2142D and the fourth section 2152D are located outside the installation space 17, the translation stage 13 is also moved outside the installation space 17, for example, to a maintenance space. The lifting member 22 can then be used to lower the translation stage 13 to the ground or a maintenance platform for maintenance. In this way, the lifting device 2 can lift the translation stage 13 out of the accommodating cavity 111 and move the translation stage 13 out of the installation space 17 without the need for other auxiliary equipment, making the lifting process of the translation stage 13 simpler and more convenient to operate.

[0125] In some examples, along the extension direction of the first guide member 2142, the length of the second segment 2142D and the length of the fourth segment 2152D can be less than or equal to the size of the translation stage 13. This allows the translation stage 13 to be moved out of the installation space 17 while reducing the space occupied by the first guide member 2142 and the second guide member 2152. In other examples, along the extension direction of the first guide member 2142, the length of the second segment 2142D and the length of the fourth segment 2152D can also be greater than the size of the translation stage 13. This is not specifically limited in this application.

[0126] In some other embodiments, the first guide member 2142 may include only the first section 2142C, and the second guide member 2152 may include only the third section 2152C. In this case, since the first section 2142C and the third section 2152C are located within the installation space 17 when the support assembly 21 is connected to the electron beam measurement device 1, after the lifting member 22 lifts the translation stage 13 out, the suspension member 216 can be used to move on the first section 2142C and the third section 2152C to move the translation stage 13 to the edge of the vacuum chamber 11, such as the installation opening 18. Then, other auxiliary tools, such as a transmission belt and a guide trough, can be used to completely move the translation stage 13 out of the installation space 17.

[0127] In some embodiments, see Figure 6 , Figure 6 for Figure 5 A schematic diagram of the structure of the first support structure 214 in the lifting equipment shown. The first support member 2141 includes a first support frame 2141A and a first diagonal brace 2141B. The first support frame 2141A is connected to the first section 2142C and is used to support the first section 2142C. For example, the first support frame 2141A is connected between the first base plate 212 and the first support rod 2142A. The first diagonal brace 2141B is connected between the first support frame 2141A and the second section 2142D and is used to support the second section 2142D. Through the cooperation of the first support frame 2141A and the first diagonal brace 2141B, both the first section 2142C and the second section 2142D of the first guide member 2142 can be supported, thereby ensuring the support strength of the first guide member 2142.

[0128] In some examples, the first support frame 2141A can include multiple vertical rods 2141C and cross rods 2141D. The multiple vertical rods 2141C are connected between the first base plate 212 and the first guide member 2142 and are spaced apart along the extension direction of the first guide member 2142. The cross rods 2141D are connected to the multiple vertical rods 2141C. The number of cross rods 2141D can be one or more. The structure of the first support frame 2141A formed by the interconnection of the multiple vertical rods 2141C and cross rods 2141D is relatively stable and can provide stable support for the first guide member 2142.

[0129] In some other examples, the first support frame 2141A may also be a plate-like structure or other structure that can support the first guide member 2142, and this application does not make specific limitations on this.

[0130] In some embodiments, see Figure 7 , Figure 7 for Figure 5A schematic diagram of the structure of the second support structure 215 in the lifting equipment shown. The second support member 2151 includes a second support frame 2151A and a second diagonal brace 2151B. The second support frame 2151A is connected to the third section 2152C and is used to support the third section 2152C. For example, the second support frame 2151A is connected between the second base plate 213 and the second support rod 2152A. The second diagonal brace 2151B is connected between the second support frame 2151A and the fourth section 2152D and is used to support the fourth section 2152D. Through the cooperation of the second support frame 2151A and the second diagonal brace 2151B, both the third section 2152C and the fourth section 2152D of the second guide member 2152 can be supported, thereby ensuring the support strength of the second guide member 2152.

[0131] The structure of the second support frame 2151A may be the same as that of the first support frame 2141A, and the specific structure of the second support frame 2151A will not be described in detail here.

[0132] The above support assembly 21 is only an example described in this application. Of course, the support assembly 21 of this application can also be other structures, such as a first support column arranged vertically and a second support column arranged horizontally and connected to the first support column.

[0133] In the description of this specification, specific features, structures, materials or characteristics may be combined in an appropriate manner in any one or more embodiments or examples.

[0134] The above preferred embodiments further illustrate the objectives, technical solutions and advantages of the present invention in detail. It should be understood that the above are only preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.

Claims

1. An electron beam measurement device, characterized in that include: A vacuum chamber is formed with a receiving cavity and an opening communicating with the receiving cavity; a translation stage, the translation stage being disposed in the accommodating cavity and being used to carry the wafer to be inspected; end caps; and a moving assembly connected to the end cover and configured to drive the end cover to move between a first position and a second position; When the end cover is in the first position, the end cover blocks the opening; when the end cover is in the second position, the end cover opens the opening and forms an installation space on the side of the opening facing away from the accommodating cavity, and the installation space is used to place the lifting equipment.

2. The electron beam measurement device according to claim 1, wherein: The moving assembly includes a driving portion and a lifting portion, wherein the lifting portion is connected between the end cover and the driving portion; The driving portion is used to drive the lifting portion to move up and down along a first direction to drive the end cover to move between the first position and the second position. The first direction is consistent with the thickness direction of the end cover.

3. The electron beam measurement device according to claim 2, characterized in that There are multiple moving components, and the multiple moving components are arranged around the vacuum chamber, and the multiple moving components are all connected to the end cover.

4. The electron beam measurement device according to claim 3, characterized in that The plurality of movable assemblies include adjacent first movable assemblies and second movable assemblies, and when the end cover is located at the second position, the first movable assembly, the second movable assembly, the vacuum chamber, and the end cover form a mounting opening; The installation opening is communicated with the installation space, so that the hoisting equipment extends into the installation space through the installation opening.

5. The electron beam measurement device according to any one of claims 1 to 4, characterized in that: The orthographic projection of the vacuum chamber on the end cover is located within the range of the end cover, and the moving component is connected to a side of the end cover facing the vacuum chamber.

6. The electron beam measurement device according to any one of claims 1 to 5, characterized in that: The vacuum chamber is provided with a first connecting hole, and the end cover is provided with a second connecting hole, wherein the first connecting hole and the second connecting hole extend in a direction perpendicular to the end cover; The electron beam measurement device further includes a first fastener. When the end cover is located at the first position, the first fastener is passed through the first connecting hole and the second connecting hole to connect the end cover and the vacuum chamber.

7. The electron beam measurement device according to any one of claims 1 to 6, characterized in that: Also includes: an electron beam mirror connected to the end cover and used for scanning the wafer to be inspected; and / or, an optical microscope, the optical microscope being connected to the end cover and being used for scanning the wafer to be inspected.

8. A lifting device, characterized in that: Used to cooperate with the electron beam measurement equipment according to any one of claims 1 to 7 to hoist the translation stage in the accommodating cavity, the hoisting equipment comprising: a support assembly, the support assembly being configured to connect to an electron beam measurement device when the end cap is located in the second position; The suspending member is connected to the supporting assembly, and when the supporting assembly is connected to the electron beam measurement device, the suspending member can be located in the installation space to suspend the translation stage.

9. The hoisting equipment according to claim 8, characterized in that: The support assembly includes a first support structure and a second support structure that are spaced apart, and a suspension member connected between the first support structure and the second support structure, and the suspension member is suspended on the suspension member; The first supporting structure and the second supporting structure are used to be respectively installed at two opposite ends of a vacuum chamber of an electron beam measurement device.

10. The hoisting equipment according to claim 9, characterized in that: The first supporting structure includes a first supporting member and a first guiding member, one end of the first supporting member is used to connect to the vacuum chamber, and the other end of the first supporting member is connected to the first guiding member; The second supporting structure includes a second supporting member and a second guiding member, one end of the second supporting member is used to connect to the vacuum chamber, and the other end of the second supporting member is connected to the second guiding member; The suspension member is connected between the first guide member and the second guide member, and can move relative to the first support member and the second support member under the guidance of the first guide member and the second guide member to move the translation stage out of the installation space.

11. The hoisting equipment according to claim 10, characterized in that: The first guide member includes a first section and a second section, and the second guide member includes a third section and a fourth section; When the support assembly is connected to the electron beam measurement device, the first section and the third section are located within the installation space, and the second section and the fourth section are located outside the installation space.

12. The hoisting equipment according to claim 11, characterized in that: The first support member includes a first support frame and a first diagonal brace, the first support frame is connected to the first section, and the first diagonal brace is connected between the first support frame and the second section; And / or, the second support member includes a second support frame and a second diagonal brace, the second support frame is connected to the third section, and the second diagonal brace is connected between the second support frame and the fourth section.

13. The hoisting equipment according to any one of claims 9 to 12, characterized in that: The support assembly further includes a first bottom plate and a second bottom plate. The first support structure is connected to the first bottom plate, and the second support structure is connected to the second bottom plate. Both the first bottom plate and the second bottom plate are used to connect to the vacuum chamber.

14. The hoisting equipment according to any one of claims 8 to 13, characterized in that: The vacuum chamber is provided with a first connection hole, and the first connection hole extends in a direction perpendicular to the end cover; the electron beam measurement device further includes a first fastener; The support assembly is further provided with a third connection hole, and the first fastener can be passed through the first connection hole and the third connection hole to connect the support assembly with the vacuum chamber.

15. The hoisting equipment according to any one of claims 8 to 14, characterized in that: It also includes a spacer, which is arranged between the support assembly and the electron beam measurement device when the support assembly is connected to the electron beam measurement device.

16. The hoisting equipment according to claim 15, characterized in that: The material of the spacer includes non-metallic material.

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