Vacuum degree adjusting device and method of reacting furnace for gallium nitride production

Abstract

The invention relates to the technical field of gallium nitride production, in particular to a vacuum degree adjusting device and method of a reacting furnace for gallium nitride production, and the vacuum degree adjusting device comprises a control assembly, a reacting furnace body assembly and a vacuum pumping assembly, the adjusting assembly further comprises a communicating assembly which is mounted on the control assembly and is used for communicating the reaction furnace body assembly with the detection assembly; according to the invention, the adjusting valve body is arranged, so that the three air pressure sensors with different detection ranges use the same air flow chamber, and the three air pressure sensors are singly communicated with the interior of the reaction furnace through the adjusting valve core, so that the air pressure change in the reaction furnace in three different stages of gallium nitride growth can be independently detected; the air pressure in the reaction furnace is adjusted in time through the valve body assembly and the vacuum pumping assembly, and the stable vacuum degree in the reaction furnace is kept, so that a good growth environment is provided for gallium nitride.

Description

Technical Field

[0001] The present invention relates to the technical field of gallium nitride production, and in particular to a device and method for adjusting the vacuum degree of a reactor for gallium nitride production. Background Art

[0002] Gallium nitride (GaN) is an important wide-bandgap semiconductor material. Due to its excellent electronic and optical properties, it is widely used in high-frequency, high-power electronic devices, optoelectronic devices, and LED lighting. During GaN production, stable vacuum levels within the reactor are particularly important. During the growth of GaN using the MOCVD method, the pressure within the reactor experiences significant fluctuations in three stages: the startup phase, the growth phase, and the final phase. Each of these stages requires a different vacuum level. The consumption of reactant gases and metals during these three stages also causes the vacuum level to fluctuate, which in turn affects GaN growth. Therefore, the vacuum level within the reactor must be adjusted promptly to meet the optimal vacuum requirements for GaN growth. Furthermore, GaN dust particles are generated during the GaN growth process. These particles can enter the reactor's vacuum pipes during vacuum adjustment, affecting the vacuum control.

[0003] A Chinese invention with prior art publication number CN106483433A discloses a control system for the dynamic balance of vacuum in a superconducting magnet Paschen test. The system adjusts the helium intake of a vacuum container by adjusting the size of the opening of an electric butterfly valve, ensuring that the vacuum container remains stable for a long time under different levels of low pressure. Although the device can maintain a stable air pressure in the vacuum container, it cannot make timely adjustments according to the real-time changes in the air pressure in the vacuum container during the adjustment process, and is not suitable for the production of items that generate dust particles. Therefore, a vacuum adjustment device is needed that can timely monitor the changes in the vacuum level in the reactor body, automatically balance it, and prevent the accumulation of dust particles from affecting the adjustment of the vacuum level. Summary of the Invention

[0004] The present invention aims to provide a vacuum degree regulating device for a reactor for gallium nitride production, which is used to solve the problem that the vacuum degree cannot be quickly and accurately adjusted according to the different growth stages during the gallium nitride growth process in the prior art.

[0005] In view of the above technical problems, the present invention provides the following technical solutions: A vacuum degree regulating device for a reactor for gallium nitride production comprises a control assembly, a reactor body assembly, and a vacuum pressure pumping assembly. The control assembly is mounted with a filter assembly and a regulating assembly. The filter assembly comprises a cleaning assembly mounted on the reactor body assembly for cleaning gallium nitride particles. The filter assembly also comprises a filter assembly mounted on the cleaning assembly for filtering gallium nitride particles and a collection assembly for collecting gallium nitride particles. The regulating assembly comprises a valve body assembly mounted on the vacuum pressure pumping assembly for vacuum degree regulation. The regulating assembly also comprises a detection assembly mounted on the control assembly for detecting air pressure changes. The regulating assembly also comprises a connecting assembly mounted on the control assembly for connecting the reactor body assembly and the detection assembly. The connecting assembly comprises a furnace body support frame I and a furnace body support frame II fixedly mounted on the reactor body assembly. An electric cylinder is fixedly mounted on the furnace body support frame I, and a regulating valve core is fixedly mounted on the extended end of the electric cylinder. A regulating valve body is fixedly mounted on the furnace body support frame II, and the regulating valve body is slidably mounted on the regulating valve core. A connecting pipe is fixedly mounted on the regulating valve body, and the connecting pipe is fixedly mounted on the reactor body assembly.

[0006] In the prior art, the gas pressure in the gallium nitride growth process changes significantly and is divided into three stages: the first stage is the startup stage, the second stage is the growth stage, and the third stage is the ending stage. Different vacuum degrees need to be set for each of the three stages, and the vacuum degree will also change due to the consumption of reaction gas and metal in these three stages. The change in vacuum degree in the three stages will affect the growth of gallium nitride. Therefore, when the vacuum degree changes in the three stages, the vacuum degree in the reactor needs to be adjusted in time to meet the optimal vacuum degree requirement for gallium nitride growth. In the prior art, multiple pressure sensors with different detection ranges are usually set to perform pressure detection in different growth stages. When installing the pressure sensor, in order to ensure that pressure sensors with different detection ranges do not affect each other, it is often necessary to set up corresponding isolation chambers and distinguish them through isolation valves. In addition, since the temperature in the reactor is too high, special pressure sensors are required to meet the requirements.

[0007] The present invention improves the connection between the air pressure sensor and the reactor, and provides a regulating valve body so that three air pressure sensors with different detection ranges use the same isolation chamber. The regulating valve core is used to achieve single connection of the three air pressure sensors, thereby enabling independent detection of changes in the air pressure in the reactor during the three different stages of gallium nitride growth. The air pressure in the reactor is timely adjusted through the valve body assembly and the vacuum pressure extraction assembly to ensure that the vacuum degree in the reactor is appropriate and maintain a stable vacuum degree in the reactor, thereby providing a good growth environment for gallium nitride.

[0008] Furthermore, an air flow chamber is provided on the regulating valve body, and the regulating valve core is slidably installed in the air flow chamber of the regulating valve body. The air flow chamber of the regulating valve body is provided with an air inlet, an air outlet I, an air outlet II, and an air outlet III. The air inlet is fixedly installed with a connecting pipe, and the reaction furnace body assembly is connected with the air flow chamber of the regulating valve body through the connecting pipe. A valve core ventilation groove for gas circulation is provided on the regulating valve core, and a valve core ventilation groove is provided with a valve core ventilation port for connecting to the detection assembly, and the valve core ventilation port is intermittently connected with the air outlet I, the air outlet II, and the air outlet III respectively.

[0009] Furthermore, the valve body assembly includes a butterfly valve body fixedly mounted on the vacuum extraction and pressure assembly, a butterfly valve plate is rotatably mounted on the butterfly valve body, an electromagnetic controller I and an electromagnetic controller II for controlling the rotation of the butterfly valve plate are fixedly mounted on the rotating shaft of the butterfly valve plate, and a signal transmission line pipe for signal transmission is fixedly mounted on the electromagnetic controller II.

[0010] Furthermore, the detection component includes a furnace body support frame III fixedly mounted on the control component, and an air pressure sensor I, an air pressure sensor II, and an air pressure sensor III for detecting air pressure changes are fixedly mounted on the furnace body support frame III. The detection tube of the air pressure sensor I is fixedly connected to the air outlet I, the detection tube of the air pressure sensor II is fixedly connected to the air outlet II, and the detection tube of the air pressure sensor III is fixedly connected to the air outlet III. An information processing module I for processing information collected by the air pressure sensors I, II, and III is also fixedly mounted on the furnace body support frame III, and the information processing module I is fixedly connected to the valve body assembly.

[0011] Furthermore, the cleaning component includes a filter cartridge fixedly mounted on the reactor body component, the first end of the filter cartridge is communicated with the reactor body component, the second end of the filter cartridge is communicated with the vacuum pressure assembly, the filter cartridge is fixedly mounted with a support frame I, a power fan blade for providing power is rotatably mounted on the support frame I, and a scraping strip for cleaning gallium nitride dust is fixedly mounted on the rotating shaft of the power fan blade; the filter assembly includes a motor fixedly mounted, an arc-shaped mounting plate fixedly mounted on the motor output shaft, a double-layer filter cartridge movably mounted on the arc-shaped mounting plate, a stabilizing block movably mounted on the double-layer filter cartridge, a spring-connected spring clamping column on the stabilizing block, a connecting ring movably connected to the spring clamping column, and the connecting ring A filter membrane for adsorbing tiny particles is fixedly installed; the double-layer filter cylinder is provided with a hollow layer, the filter membrane is installed on the hollow layer of the double-layer filter cylinder, and the double-layer filter cylinder is provided with an opening for the filter membrane to enter; the collecting assembly includes an arc-shaped material receiving frame movably installed on the filter cylinder, and bolts are movably installed on the arc-shaped material receiving frame, and the bolts and nuts cooperate to fix the filter cylinder and the arc-shaped material receiving frame, and the arc-shaped material receiving frame is provided with a groove for catching gallium nitride particles; a sealing gasket I for ensuring sealing is fixedly installed on the arc-shaped mounting plate, and the sealing gasket I is made of fluororubber. A sealing gasket II for ensuring sealing is also fixedly installed on the arc-shaped material receiving frame, and the sealing gasket II is made of fluororubber.

[0012] In the prior art, when the vacuum degree inside the reactor is adjusted, a small amount of dust particles will be generated during the growth of gallium nitride. The present invention intercepts the dust particles by setting a filter assembly, accumulates the dust particles by a cleaning assembly, and collects the dust particles by a collecting assembly, thereby avoiding the dust particles from affecting the vacuum extraction assembly and reducing the waste of resources.

[0013] Furthermore, a vacuum degree adjustment method based on a vacuum degree adjustment device of a reactor for gallium nitride production includes the following steps: Step 1: During the preparation phase, the filter components are manually installed to prevent GaN particles from affecting the vacuum adjustment. Step 2: During the startup phase, the vacuum pumping and pressure reducing assembly is activated, and the regulating assembly is used to initially adjust the vacuum level in the reactor assembly to meet the pressure requirements during the startup phase. After the initial adjustment is completed, the vacuum pumping and pressure reducing assembly is used in conjunction with the regulating assembly to adjust the vacuum level in the reactor assembly during the startup phase, ensuring that the pressure in the reactor assembly is appropriate and achieving the initial environment required for the gallium nitride reaction. Step 3: During the growth phase, the vacuum pumping assembly is activated and cooperates with the regulating assembly to perform secondary adjustments to the vacuum level in the reactor assembly to meet the pressure requirements of the growth phase. After the secondary adjustments are completed, the vacuum pumping assembly and the regulating assembly are used to adjust the vacuum level of the reactor assembly during the growth phase, maintaining a stable vacuum level in the reactor assembly and increasing the growth rate of the gallium nitride. Step 4: At the end stage, start the vacuum pumping assembly and cooperate with the regulating assembly to adjust the vacuum degree in the reactor body assembly three times to meet the air pressure requirements of the end stage. After the three adjustments are completed, the vacuum pumping assembly and the regulating assembly are used to adjust the vacuum degree in the reactor body assembly at the end stage, maintain a stable vacuum degree of the reactor body assembly, end the gallium nitride reaction, and prepare for subsequent processing.

[0014] Compared with the prior art, the present invention has the following advantages and beneficial effects: 1. The present invention provides a regulating valve body, allowing three air pressure sensors with different detection ranges to use the same isolation chamber. The regulating valve core enables single communication between the three air pressure sensors and the inner cavity of the reactor. This allows independent detection of changes in the air pressure in the reactor during the three different stages of gallium nitride growth. The valve body assembly and vacuum pumping assembly are used to timely adjust the air pressure in the reactor, maintaining a stable vacuum level in the reactor, thereby providing a favorable growth environment for gallium nitride. 2. The present invention can automatically filter gallium nitride particles by providing a filter assembly in conjunction with a vacuum pumping assembly, thereby preventing the gallium nitride particles from affecting the vacuum pumping assembly and the regulating assembly. In addition, the power fan blades can be provided to power the filter assembly through the vacuum pumping assembly, so that the double-layer filter cylinder will not be blocked by gallium nitride particles. At the same time, the gallium nitride particles can be collected, thereby avoiding waste of resources. 3. The present invention is designed to be easily disassembled, so the filter assembly can be quickly replaced and cleaned, reducing maintenance costs. The design of the sealing gasket ensures a closed environment for the device, greatly improving work efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] The drawings described herein are used to provide a further understanding of the embodiments of the present invention, constitute a part of this application, and do not constitute a limitation of the embodiments of the present invention. In the drawings: Figure 1 This is a schematic diagram of the overall module of the present invention; Figure 2 It is a partial cross-sectional schematic diagram of the overall structure of the present invention; Figure 3 It is a schematic diagram of the overall structure of the present invention; Figure 4 It is a schematic diagram of the local structure of the present invention; Figure 5 Schematic diagram of the overall structure of the filter assembly of the present invention Figure 6 It is a partial cross-sectional schematic diagram of the filter assembly of the present invention; Figure 7 For the present invention Figure 6 Schematic diagram of the structure at A in the middle; Figure 8 This is a schematic diagram of the filter assembly replacement process of the present invention; Figure 9 For the present invention Figure 8 Schematic diagram of the structure at B in the middle; Figure 10 This is a structural diagram of the stabilizing block of the present invention; Figure 11 It is a partial cross-sectional schematic diagram of the adjustment assembly of the present invention; Figure 12 For the present invention Figure 11 Schematic diagram of the structure at C in the middle; Figure 13 This is a schematic diagram of the half-section structure of the regulating valve body of the present invention.

[0016] Markings and corresponding parts names in the accompanying drawings: 1-Control assembly; 2-Reaction furnace assembly; 3-Filter assembly; 4-Adjustment assembly; 5-Vacuum extraction assembly; 101-Base plate; 102-Mounting bracket; 103-Mounting cover; 104-Processing operation panel; 105-Feeding door I; 106-Feeding door II; 201-Reaction furnace; 202-Detector I; 301-Filter cartridge; 302-Motor; 303-Curved mounting plate; 304-Sealing gasket Ⅰ; 305-arc-shaped material receiving frame; 306-sealing gasket Ⅱ; 307-bolt; 308-double-layer filter cylinder; 309-support frame Ⅰ; 310-power fan blade; 311-scraping strip; 312-stabilizing block; 313-filter membrane; 314-spring clamping column; 315-connecting ring; 401-butterfly valve body; 402-electromagnetic controller Ⅰ; 403-electric cylinder; 404-regulating valve body; 405-information processing Module I; 406-Furnace support frame I; 407-Furnace support frame II; 408-Butterfly valve plate; 409-Electromagnetic controller II; 410-Connecting pipe; 411-Regulating valve core; 412-Air pressure sensor I; 413-Air pressure sensor II; 414-Air pressure sensor III; 415-Furnace support frame III; 416-Signal transmission line pipe; 417-Air inlet; 418-Air outlet I; 419-Air outlet II ;420-air outlet III;421-valve core ventilation groove;422-valve core ventilation port;501-air supply pipe I;502-pressure controlling valve;503-air supply pipe II;504-small pumping valve;505-large pumping valve;506-stop valve;507-normal pressure valve;508-suction and pressure pump group I;509-suction and pressure pump group II;510-safety valve;511-pressure relief pipe;512-air supply pipe III;513-air supply pipe IV. DETAILED DESCRIPTION

[0017] In order to make the objectives, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with examples and drawings. The exemplary embodiments of the present invention and their descriptions are only used to explain the present invention and are not intended to limit the present invention.

[0018] Example 1: like Figures 1 to 13As shown, a vacuum degree regulating device for a reactor for gallium nitride production includes a control component 1, a reactor body component 2, and a vacuum pumping component 5. The control component 1 is equipped with a filter component 3 and a regulating component 4. The filter component 3 includes a cleaning component installed on the reactor body component 2 for cleaning gallium nitride particles. The filter component 3 also includes a filter component installed on the cleaning component for filtering gallium nitride particles and a collection component for collecting gallium nitride particles. The regulating component 4 includes a valve body component installed on the vacuum pumping component 5 for vacuum degree regulation. The regulating component 4 also includes a detection component installed on the control component 1 for detecting air pressure changes. The detection component, the adjustment component 4 also includes a connecting component installed on the control component 1 for connecting the reaction furnace body component 2 and the detection component, the connecting component includes a furnace body support frame I 406 and a furnace body support frame II 407 fixedly installed on the reaction furnace body component 2, the furnace body support frame I 406 is fixedly installed with an electric cylinder 403, and the protruding end of the electric cylinder 403 is fixedly installed with a regulating valve core 411, the furnace body support frame II 407 is fixedly installed with a regulating valve body 404, the regulating valve body 404 and the regulating valve core 411 are slidably installed, the regulating valve body 404 is fixedly installed with a connecting pipe 410, and the connecting pipe 410 is fixedly installed with the reaction furnace body component 2.

[0019] like Figure 1 、 Figure 2 and Figure 3 As shown, the control assembly 1 includes a base plate 101, on which a mounting bracket 102 for mounting the adjustment assembly 4 is fixedly mounted, a mounting cover 103 for dust prevention is also fixedly mounted on the base plate 101, a processing operation panel 104 for operating the device to control the vacuum degree is fixedly mounted on the mounting cover 103, a material removal door I 105 for facilitating replacement of the filter membrane 313 and removal of the arc-shaped material receiving frame 305 is also fixedly mounted on the mounting cover 103, and a material removal door I 105 for facilitating removal of gallium nitride is also fixedly mounted on the mounting cover 103. The reactor body assembly 2 includes a reactor 201 fixedly mounted on a base plate 101 for growing gallium nitride. A vacuum pumping assembly 5 for providing a vacuum environment is also fixedly mounted on the base plate 101. A detector I 202 for monitoring and recording the internal air pressure of the reactor 201 is mounted on the reactor 201. A filter assembly 3 for filtering gallium nitride particles is mounted on the vacuum pumping assembly 5. An adjustment assembly 4 for cooperating with the vacuum pumping assembly 5 to adjust the vacuum degree inside the reactor 201 is also mounted on the vacuum pumping assembly 5.

[0020] like Figure 4 、 Figure 5 、 Figure 6 、 Figure 7 、 Figure 8 、 Figure 9 and Figure 10As shown, the filter assembly 3 includes a filter cartridge 301 fixedly mounted on the reactor 201, one end of the filter cartridge 301 is connected to the reactor 201, and the other end of the filter cartridge 301 is connected to the gas pipe I 501, and a support frame I 309 is fixedly mounted on the filter cartridge 301, and a power fan blade 310 that rotates through the airflow to provide power is rotatably mounted on the support frame I 309, and a scraping strip 311 for cleaning gallium nitride dust attached to the double-layer filter cartridge 308 is fixedly mounted on the rotating shaft of the power fan blade 310, and the gallium nitride dust is accumulated in the groove of the arc-shaped material receiving frame 305 by cleaning the scraping strip 311. The filter cartridge 301 is also fixedly mounted with a motor 302, and the output shaft of the motor 302 is fixedly mounted with an arc-shaped mounting plate 3 03. A double-layer filter cylinder 308 is fixedly installed on the arc-shaped mounting plate 303 by a buckle, and a stabilizing block 312 is slidably installed on the double-layer filter cylinder 308. The stabilizing block 312 is provided with a handle for easy taking and placing. Four spring clamping columns 314 are spring-connected to the stabilizing block 312, and connecting rings 315 are slidably clamped on the four spring clamping columns 314. A filter membrane 313 for adsorbing tiny particles is fixedly installed on the four connecting rings 315. A sealing gasket I 304 for ensuring sealing is fixedly installed on the arc-shaped mounting plate 303. The double-layer filter cylinder 308 is provided with a hollow layer, and the filter membrane 313 is installed on the hollow layer of the double-layer filter cylinder 308. The double-layer filter cylinder 308 is provided with an opening for the filter membrane 313 to enter.

[0021] An arc-shaped material connection frame 305 is also movably mounted on the filter cartridge 301, and a bolt 307 is movably mounted on the arc-shaped material connection frame 305. The bolt 307 cooperates with the nut to fix the filter cartridge 301 and the arc-shaped material connection frame 305. The arc-shaped material connection frame 305 is provided with a groove for receiving gallium nitride particles. A sealing gasket II 306 is also fixedly mounted on the arc-shaped material connection frame 305 to ensure sealing. During installation, the filter cartridge 301 and the arc-shaped material connection frame 305 are fixed by the bolt 307 and the nut. When the installation of the filter assembly is completed, the handle of the stabilizing block 312 contacts the groove of the arc-shaped material connection frame 305, and the filter membrane 313 is further fixed by the arc-shaped material connection frame 305.

[0022] During operation, when it is necessary to evacuate or replenish air inside the reactor 201, air will pass through the filter cartridge 301. When the air flows, it drives the power fan blade 310 to rotate, and then drives the scraping bar 311 to rotate, and then the rotating scraping bar 311 scrapes the double-layer filter cartridge 308 clean. When scraping, the centrifugal force causes the gallium nitride particles to gradually accumulate in the groove of the arc-shaped material receiving frame 305. The accumulated gallium nitride particles are taken out together when the arc-shaped material receiving frame 305 is cleaned. When cleaning the frame 305, the nut is loosened so that the bolt 307 and the arc-shaped material receiving frame 305 are no longer tightly connected. The nut is further unscrewed, and the cleaning personnel removes the arc-shaped material receiving frame 305 from the filter cartridge 301. After removal, the gallium nitride particles in the arc-shaped material receiving frame 305 are recycled. After cleaning the arc-shaped material receiving frame 305, the arc-shaped material receiving frame 305 is reinstalled on the filter cartridge 301 through the bolt 307 and the nut, thereby completing the filtration and collection of the gallium nitride particles.

[0023] When filtering gallium nitride particles, some smaller and smaller particles will pass through the double-layer filter cylinder 308. At this time, these small particles are adsorbed and blocked by the filter membrane 313. Since they have been filtered once by the double-layer filter cylinder 308, the number of these small particles is very small, and the filter membrane 313 is replaced every time gallium nitride is produced. Therefore, it will not affect the air extraction process. When replacing the filter membrane 313, the motor 302 is started, which in turn drives the arc-shaped mounting plate 303 to rotate, so that the double-layer filter cylinder 308 drives the filter membrane 313 to move to the outside of the filter cylinder 301 (such as Figure 8 After the filter membrane 313 is removed, the new filter membrane 313 is fixed on the fixing block 312 through the connecting ring 315 and the spring clamping column 314. The replaced filter membrane 313 is inserted into the double-layer filter cylinder 308 and initially fixed in the double-layer filter cylinder 308 through the fixing block 312. The motor 302 is then started to reset the arc-shaped mounting plate 303. After the reset is completed, the motor 302 stops working, and at this time, the inner groove edge of the groove of the arc-shaped material receiving frame 305 presses against the fixing block 312 to fix the filter membrane 313 for a second time to prevent the filter membrane 313 from deflecting under excessive pressure, thereby affecting the filtering effect.

[0024] Example 2: like Figure 11 、 Figure 12 and Figure 13As shown, the regulating assembly 4 includes a furnace support frame I 406 and a furnace support frame II 407 fixedly mounted on the reaction furnace 201, an electric cylinder 403 is fixedly mounted on the furnace support frame I 406, a regulating valve core 411 is fixedly mounted on the protruding end of the electric cylinder 403, a regulating valve body 404 is fixedly mounted on the furnace support frame II 407, the regulating valve body 404 and the regulating valve core 411 are slidably mounted, a connecting pipe 410 is fixedly mounted on the regulating valve body 404, the connecting pipe 410 is fixedly mounted on the reaction furnace 201, an air flow chamber is provided on the regulating valve body 404, the regulating valve core 411 is slidably mounted in the air flow chamber of the regulating valve body 404, and through the regulating The throttle valve core 411 closes the air flow chamber of the butterfly valve body 401, and the air flow chamber of the regulating valve body 404 is provided with an air inlet 417, an air outlet I 418, an air outlet II 419 and an air outlet III 420. The air inlet 417 is fixedly installed with the connecting pipe 410, and the reactor 201 is connected with the air flow chamber of the regulating valve body 404 through the connecting pipe 410. The regulating valve core 411 is provided with a valve core ventilation groove 421 for gas circulation, and the valve core ventilation groove 421 is provided with a valve core ventilation port 422 for connecting with the detection component, and the valve core ventilation port 422 is intermittently connected with the air outlet I 418, the air outlet II 419 and the air outlet III 420 respectively.

[0025] A butterfly valve body 401 is fixedly installed on the gas transmission pipe I 501, and a butterfly valve plate 408 is rotatably installed on the butterfly valve body 401. An electromagnetic controller I 402 and an electromagnetic controller II 409 for controlling the rotation of the butterfly valve plate 408 are fixedly installed on the rotating shaft of the butterfly valve plate 408. A signal transmission line pipe 416 for signal transmission is fixedly installed on the electromagnetic controller II 409. A furnace body support frame III 415 is fixedly installed on the bottom plate 101. An air pressure sensor I 412 and an air pressure sensor II 415 for detecting air pressure changes are fixedly installed on the furnace body support frame III 415. 413 and air pressure sensor III414, the detection tube of air pressure sensor I412 is fixedly connected to the air outlet I418, the detection tube of air pressure sensor II413 is fixedly connected to the air outlet II419, the detection tube of air pressure sensor III414 is fixedly connected to the air outlet III420, and an information processing module I405 for processing the information collected by air pressure sensor I412, air pressure sensor II413 and air pressure sensor III414 is also fixedly installed on the furnace body support frame III415, and the information processing module I405 is fixedly connected to the signal transmission line tube 416.

[0026] The gas pressure in the gallium nitride growth process changes significantly and is divided into three stages. The first stage is the startup stage, the second stage is the growth stage, and the third stage is the end stage. Different vacuum degrees need to be set for each of the three stages. In addition, the vacuum degree will also change due to the consumption of reaction gas and metal in these three stages. The change in vacuum degree in the three stages will affect the growth of gallium nitride. Therefore, when the vacuum degree changes in the three stages, the vacuum degree in the reactor 201 needs to be adjusted in time to meet the optimal vacuum degree requirement for gallium nitride growth. In the prior art, multiple pressure sensors with different detection ranges are usually set to detect the pressure in different growth stages. When installing the pressure sensor, in order to ensure that the pressure sensors with different detection ranges do not affect each other, it is often necessary to set up corresponding isolation chambers, distinguish them through isolation valves, and Since the temperature inside the reactor 201 is too high, a special air pressure sensor is required to meet the demand. The present invention improves the connection part between the air pressure sensor and the reactor 201, and provides an adjusting valve body 404, so that the air pressure sensor III 414, the air pressure sensor II 413, and the air pressure sensor I 412 can use the same air flow chamber, and the air pressure sensor III 414, the air pressure sensor II 413, and the air pressure sensor I 412 are connected to the reactor 201 in a single manner by adjusting the valve core 411, thereby being able to independently detect the changes in the air pressure in the reactor 201 at the three different stages of gallium nitride growth, and timely adjust the air pressure in the reactor 201 through the valve body assembly and the vacuum pressure extraction assembly 5 to ensure that the vacuum degree in the reactor 201 is appropriate and maintain a stable vacuum degree in the reactor 201, thereby providing a good growth environment for gallium nitride.

[0027] During operation, the air pressure sensor III 414 corresponds to the start-up phase, the air pressure sensor II 413 corresponds to the growth phase, and the air pressure sensor I 412 corresponds to the end phase. During the start-up phase, the gas in the reactor 201 is quickly extracted through the vacuum pumping assembly 5. At this time, the butterfly valve 408 is fully opened under the action of the electromagnetic controller I 402 and detected by the detector I 202. When it is detected that the vacuum degree in the reactor 201 meets the initial requirements of the start-up phase, the vacuum pumping assembly 5 stops working, and the butterfly valve 408 is fully opened under the action of the electromagnetic controller I 402. The bottom is completely closed. This is the startup phase. The air pressure sensor III 414 should be used as a detector to adjust the vacuum degree. Therefore, the electric cylinder 403 is started, which drives the regulating valve core 411 to move upward, thereby connecting the valve core vent 422 with the air outlet III 420, and then connecting the air flow groove of the regulating valve body 404 with the air pressure sensor III 414. At this time, the inner cavity of the reactor 201 is connected to the connecting pipe 410 and then to the air pressure sensor III 414. When the inner cavity pressure of the reactor 201 changes (gas injection or material consumption during growth), the valve core vent groove The air pressure at 421 will also change. The air pressure sensor III 414 records the change in air pressure and processes it into an electrical signal, which is then transmitted to the electromagnetic controller II 409 and the processing operation panel 104 through the information processing module I 405. The electromagnetic controller II 409 that receives the signal starts to drive the butterfly valve 408 to rotate. The greater the air pressure change, the greater the deflection angle of the butterfly valve 408. The deflection angle is recorded and sent to the processing operation panel 104 for display. The clockwise rotation of the butterfly valve 408 indicates that the pressure in the reactor 201 increases and needs to be pumped out. The butterfly valve 408 rotates clockwise. 08 rotates counterclockwise to reduce the pressure in the reactor 201 and needs to be released, which is then displayed on the processing operation panel 104. The personnel controls the vacuum extraction and pressure reduction component 5 through the processing operation panel 104 to operate the reactor 201 to extract or release the pressure. After the vacuum degree in the reactor 201 meets the requirement, the air pressure sensor III 414 detects it and sends a signal through the information processing module I 405. The electromagnetic controller II 409 that receives the signal starts and drives the butterfly valve plate 408 to reset, thereby completing the adjustment of the vacuum degree in the reactor 201 during the startup phase.

[0028] After the start-up phase ends and the growth phase begins, the vacuum level in the reactor 201 needs to be adjusted over a wide range to achieve optimal growth requirements. At this time, the electric cylinder 403 is reset, so that the inner cavity of the reactor 201 is no longer connected to the airflow chamber of the regulating valve body 404. The butterfly valve 408 is fully opened by the electromagnetic controller I 402, and the air pressure in the inner cavity of the reactor 201 is adjusted by the vacuum pumping assembly 5. The air pressure is detected by the detector I 202. When it is detected that the vacuum level in the reactor 201 meets the initial requirements of the growth phase, the vacuum pumping assembly 5 stops working, and the butterfly valve 408 is fully closed under the action of the electromagnetic controller I 402. At this time, it is the growth phase, and the air pressure sensor II 413 should be used as a detector for adjusting the vacuum level. Therefore, the electric cylinder 403 is started, which drives the regulating valve core 411 to move upward, thereby connecting the valve core vent 422 with the air outlet II 419. The adjustment work of the start-up phase is repeated, and the vacuum level in the reactor 201 during the growth phase is completed.

[0029] When the growth stage enters the end stage, the vacuum degree in the reactor 201 needs to be adjusted over a large range to meet the optimal requirements of the end stage. At this time, the electric cylinder 403 is reset, so that the inner cavity of the reactor 201 is no longer connected to the air flow cavity of the regulating valve body 404. The butterfly valve piece 408 is fully opened by the electromagnetic controller I 402, and the air pressure of the inner cavity of the reactor 201 is adjusted by the vacuum pumping component 5. The detector I 202 is used for detection. When it is detected that the vacuum degree in the reactor 201 meets the initial requirements of the end stage, the vacuum pumping component 5 stops working, and the butterfly valve piece 408 is completely closed under the action of the electromagnetic controller I 402. This is the end stage, and the gas should be used. The pressure sensor I 412 is used as a detector for adjusting the vacuum degree, so the electric cylinder 403 is started, which in turn drives the regulating valve core 411 to move upward, thereby connecting the valve core vent 422 with the pressure sensor I 412, and repeating the adjustment work in the startup phase to ensure that the vacuum degree in the reactor 201 is stable so that the gallium nitride is completely stabilized. After the gallium nitride is completely stabilized, the electric cylinder 403 is reset, so that the inner cavity of the reactor 201 is no longer connected to the airflow chamber of the regulating valve body 404, and the air pressure in the inner cavity of the reactor 201 is adjusted to the normal pressure range through the vacuum pumping component 5, so that the gallium nitride can be taken out, thereby completing the adjustment work of the vacuum degree in the reactor 201 during the gallium nitride production process.

[0030] like Figure 1 、 Figure 2 、 Figure 3 and Figure 4As shown, the vacuum pumping assembly 5 includes an air pipe I 501 connected to the filter cartridge 301 and the butterfly valve body 401, and the air pipe I 501 is provided with a pressure control valve 502 for overall control of air flow, a large pumping valve 505 for rapid pumping, a stop valve 506 for blocking backflow, and a pumping pump group I 508 for pumping. An air pipe II 503 for small-amplitude pumping is connected between the pressure control valve 502 and the large pumping valve 505, and a small pumping valve 504 for controlling the flow of the air pipe II 503 is provided on the air pipe II 503. The other end of the air pipe II 503 is cross-connected with the air pipe I 501. The connected air pipes A normal pressure valve 507 for releasing pressure is provided on Ⅱ503, and a gas pipe IV513 is also provided on the gas pipe I501 between the stop valve 506 and the pressure pump group I508. The gas pipe IV513 is connected to the gas pipe II503 after the normal pressure valve 507. The gas pipe IV513 is also provided with a pressure pump group II509 for auxiliary pressure regulation. The gas pipe IV513 is also connected to a pressure relief pipe 511. The pressure relief pipe 511 is connected to the inner cavity of the reactor 201. The pressure relief pipe 511 is provided with a safety valve 510 for ensuring the safety of the pressure in the inner cavity of the reactor 201 (the vacuum pressure extraction component 5 adopts an existing solution in the existing technology).

[0031] During operation, personnel control the vacuum pumping assembly 5 through the operation panel 104. When it is necessary to adjust the vacuum degree of the inner cavity of the reactor 201 significantly (during the startup phase or initial phase change), the pressure control valve 502, the large pumping valve 505, and the stop valve 506 are opened, the small pumping valve 504, the atmospheric pressure valve 507, and the safety valve 510 are closed, and the pumping pump group I 508 and the pumping pump group II 509 are started to adjust the pressure of the reactor 201 significantly. When it is necessary to adjust the pressure of the reactor slightly, the pressure control valve 502, the large pumping valve 505, and the stop valve 506 are opened, and the small pumping valve 504, the atmospheric pressure valve 507, and the safety valve 510 are closed. When the vacuum level of the inner cavity of the furnace 201 is adjusted (vacuum level changes due to gas consumption or gallium nitride growth inside the reactor 201), the pressure control valve 502, small pumping valve 504, and atmospheric pressure valve 507 are opened, the large pumping valve 505, stop valve 506, and safety valve 510 are closed, and the pumping pump group I 508 and the pumping pump group II 509 are started to perform a small pressure adjustment on the reactor 201. The setting of the safety valve 510 prevents the gas pressure in the reactor 201 from being too high or too low, which may cause damage to the equipment.

[0032] A vacuum degree adjustment method based on a vacuum degree adjustment device of a reactor for gallium nitride production includes the following steps.

[0033] Step 1: In the preparation stage, the filter assembly 3 is installed manually to prevent the GaN particles from affecting the vacuum adjustment; Step 2: Vacuum adjustment during the startup phase. The vacuum pumping assembly 5 is activated to quickly extract the gas from the reactor 201. At this time, the butterfly valve 408 is fully opened by the electromagnetic controller I 402 and detected by the detector I 202. When it is detected that the vacuum level in the reactor 201 meets the initial requirements of the startup phase, the vacuum pumping assembly 5 stops working, and the butterfly valve 408 is fully closed by the electromagnetic controller I 402. The electric cylinder 403 is activated to connect the inner cavity of the reactor 201 with the air pressure sensor III 414. When the air pressure in the inner cavity of the reactor 201 changes, the air pressure sensor III 414 detects it and sends a signal, causing the electromagnetic controller II 409 to drive the butterfly valve 408 to open. The vacuum level of the reactor 201 is adjusted by the vacuum pumping assembly 5 to ensure that the pressure in the reactor 201 is appropriate to achieve the initial environment required for the gallium nitride reaction. Step 3: Vacuum adjustment during the growth phase. The vacuum pumping assembly 5 is activated to quickly extract the gas from the reactor 201. At this time, the butterfly valve 408 is fully opened by the electromagnetic controller I 402 and detected by the detector I 202. When it is detected that the vacuum level in the reactor 201 meets the initial requirements of the growth phase, the vacuum pumping assembly 5 stops working, and the butterfly valve 408 is fully closed by the electromagnetic controller I 402. The electric cylinder 403 is activated to connect the inner cavity of the reactor 201 with the air pressure sensor II 413. When the air pressure in the inner cavity of the reactor 201 changes, the air pressure sensor II 413 detects it and sends a signal, causing the electromagnetic controller II 409 to drive the butterfly valve 408 to open. The vacuum level of the reactor 201 is adjusted by the vacuum pumping assembly 5 to ensure that the pressure in the reactor 201 is appropriate, so as to achieve the initial environment required for the gallium nitride reaction and maintain a stable vacuum level in the reactor 201, thereby providing a good growth environment for gallium nitride. Step 4: End stage vacuum adjustment. The gas in the reactor 201 is quickly extracted by starting the vacuum pumping assembly 5. At this time, the butterfly valve 408 is fully opened by the electromagnetic controller I 402 and detected by the detector I 202. When it is detected that the vacuum degree in the reactor 201 meets the initial requirements of the growth stage, the vacuum pumping assembly 5 stops working, and the butterfly valve 408 is fully closed by the electromagnetic controller I 402. The electric cylinder 403 is started to connect the inner cavity of the reactor 201 with the air pressure sensor I 412. When the air pressure in the inner cavity of the reactor 201 changes, the air pressure sensor I 412 detects it and sends a signal, causing the electromagnetic controller II 409 to drive the butterfly valve 408 to open, and the vacuum degree of the reactor 201 is adjusted by the vacuum pumping assembly 5 to maintain a stable vacuum degree in the reactor 201, so as to successfully end the gallium nitride reaction and prepare for subsequent processing.

[0034] The specific implementation methods described above further illustrate the objectives, technical solutions and beneficial effects of the present invention in detail. It should be understood that the above description is only a specific implementation method of the present invention and is not intended to limit the scope of protection of the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.

Claims

1. A vacuum degree regulating device for a reactor for gallium nitride production, comprising a control component (1), a reactor body component (2), and a vacuum pressure extraction component (5), characterized in that: The control component (1) is provided with a filter component (3) and a regulating component (4). The filter component (3) includes a cleaning component installed on the reactor body component (2) for cleaning gallium nitride particles. The filter component (3) also includes a filter component installed on the cleaning component for filtering gallium nitride particles and a collection component for collecting gallium nitride particles. The regulating component (4) includes a valve body component installed on the vacuum pumping component (5) for regulating the vacuum degree. The regulating component (4) also includes a detection component installed on the control component (1) for detecting air pressure changes. The regulating component (4) also includes a valve body component installed on the control component (1) for connecting the reactor. A connecting component between a body component (2) and a detection component, wherein the connecting component comprises a furnace body support frame I (406) and a furnace body support frame II (407) fixedly mounted on the reaction furnace body component (2), an electric cylinder (403) fixedly mounted on the furnace body support frame I (406), a regulating valve core (411) fixedly mounted on the extended end of the electric cylinder (403), a regulating valve body (404) fixedly mounted on the furnace body support frame II (407), the regulating valve body (404) and the regulating valve core (411) being slidably mounted, a connecting pipe (410) fixedly mounted on the regulating valve body (404), and the connecting pipe (410) fixedly mounted on the reaction furnace body component (2).

2. The vacuum degree regulating device for a gallium nitride production reactor according to claim 1, characterized in that: The regulating valve body (404) is provided with an air flow chamber, and the regulating valve core (411) is slidably installed in the air flow chamber of the regulating valve body (404). The air flow chamber of the regulating valve body (404) is provided with an air inlet (417), an air outlet I (418), an air outlet II (419), and an air outlet III (420). The air inlet (417) is fixedly installed with the connecting pipe (410). The reaction furnace body assembly (2) is connected to the air flow chamber of the regulating valve body (404) through the connecting pipe (410). The regulating valve core (411) is provided with a valve core ventilation groove (421) for gas circulation. The valve core ventilation groove (421) is provided with a valve core ventilation port (422) for connecting to the detection assembly. The valve core ventilation port (422) is intermittently connected with the air outlet I (418), the air outlet II (419), and the air outlet III (420), respectively.

3. The vacuum degree regulating device for a gallium nitride production reactor according to claim 1, characterized in that: The valve body assembly comprises a butterfly valve body (401) fixedly mounted on a vacuum pumping assembly (5); a butterfly valve disc (408) is rotatably mounted on the butterfly valve body (401); an electromagnetic controller I (402) and an electromagnetic controller II (409) for controlling the rotation of the butterfly valve disc (408) are fixedly mounted on the rotating shaft of the butterfly valve disc (408); and a signal transmission line pipe (416) for signal transmission is fixedly mounted on the electromagnetic controller II (409).

4. The vacuum degree regulating device for a gallium nitride production reactor according to claim 1, characterized in that: The detection component includes a furnace body support frame III (415) fixedly mounted on the control component (1), and an air pressure sensor I (412), an air pressure sensor II (413), and an air pressure sensor III (414) for detecting air pressure changes are fixedly mounted on the furnace body support frame III (415), a detection tube of the air pressure sensor I (412) is fixedly connected to the air outlet I (418), a detection tube of the air pressure sensor II (413) is fixedly connected to the air outlet II (419), and a detection tube of the air pressure sensor III (414) is fixedly connected to the air outlet III (420), and an information processing module I (405) for processing information collected by the air pressure sensor I (412), the air pressure sensor II (413), and the air pressure sensor III (414) is also fixedly mounted on the furnace body support frame III (415), and the information processing module I (405) is fixedly connected to the valve body component.

5. The vacuum degree regulating device for a gallium nitride production reactor according to claim 1, characterized in that: The cleaning component includes a filter cartridge (301) fixedly mounted on a reaction furnace body component (2), a first end of the filter cartridge (301) being in communication with the reaction furnace body component (2), a second end of the filter cartridge (301) being in communication with a vacuum pressure extraction component (5), a support frame I (309) being fixedly mounted on the filter cartridge (301), a power fan blade (310) for providing power being rotatably mounted on the support frame I (309), and a scraping strip (311) for cleaning gallium nitride dust being fixedly mounted on the rotating shaft of the power fan blade (310).

6. The vacuum degree regulating device for a gallium nitride production reactor according to claim 1, characterized in that: The filter assembly comprises a motor (302) fixedly mounted on the cleaning assembly, an arc-shaped mounting plate (303) fixedly mounted on the output shaft of the motor (302), a double-layer filter cylinder (308) movably mounted on the arc-shaped mounting plate (303), a stabilizing block (312) movably mounted on the double-layer filter cylinder (308), a spring-connected spring clamping column (314) on the stabilizing block (312), a connecting ring (315) movably connected to the spring clamping column (314), and a filter membrane (313) for adsorbing tiny particles fixedly mounted on the connecting ring (315).

7. The vacuum degree regulating device for a gallium nitride production reactor according to claim 6, characterized in that: A sealing gasket I (304) for ensuring sealing is fixedly mounted on the arc-shaped mounting plate (303), and the sealing gasket I (304) is made of fluororubber.

8. The vacuum degree regulating device for a gallium nitride production reactor according to claim 6, characterized in that: The double-layer filter cylinder (308) is provided with a hollow layer, the filter membrane (313) is installed on the hollow layer of the double-layer filter cylinder (308), and the double-layer filter cylinder (308) is provided with an opening for the filter membrane (313) to enter.

9. The vacuum degree regulating device for a gallium nitride production reactor according to claim 5, characterized in that: The collecting assembly comprises an arc-shaped material receiving frame (305) movably mounted on the filter cartridge (301), a bolt (307) being movably mounted on the arc-shaped material receiving frame (305), the bolt (307) cooperating with a nut to fixedly connect the filter cartridge (301) and the arc-shaped material receiving frame (305), a groove for receiving gallium nitride particles being provided on the arc-shaped material receiving frame (305), and a sealing gasket II (306) for ensuring sealing performance being fixedly mounted on the arc-shaped material receiving frame (305), the sealing gasket II (306) being made of fluororubber.

10. A method for regulating the vacuum degree of a reactor for gallium nitride production, using the device according to any one of claims 1 to 9, characterized in that: Step 1: In the preparation stage, the filter assembly (3) is installed manually to prevent the gallium nitride particles from affecting the vacuum adjustment; Step 2: During the startup phase, the vacuum pumping assembly (5) is started, and the adjustment assembly (4) is used to initially adjust the vacuum degree in the reactor body assembly (2) to meet the air pressure requirement during the startup phase. After the initial adjustment is completed, the vacuum pumping assembly (5) is used to cooperate with the adjustment assembly (4) to adjust the vacuum degree in the reactor body assembly (2) during the startup phase, ensuring that the pressure in the reactor is appropriate and achieving the initial environment required for the gallium nitride reaction. Step 3: During the growth phase, the vacuum pumping assembly (5) is started, and the regulating assembly (4) is used to perform secondary regulation on the vacuum degree in the reactor body assembly (2) to meet the pressure requirement during the growth phase. After the secondary regulation is completed, the vacuum pumping assembly (5) is used to cooperate with the regulating assembly (4) to regulate the vacuum degree in the reactor body assembly (2) during the growth phase, thereby maintaining a stable vacuum degree in the reactor and increasing the growth rate of the gallium nitride. Step 4: At the end stage, the vacuum pumping component (5) is started, and the vacuum degree in the reactor body component (2) is adjusted three times in cooperation with the regulating component (4) to meet the air pressure requirement at the end stage. After the three adjustments are completed, the vacuum pumping component (5) is used in cooperation with the regulating component (4) to adjust the vacuum degree in the reactor body component (2) at the end stage, maintain a stable vacuum degree in the reactor, end the gallium nitride reaction, and prepare for subsequent processing.

Images