Layout ssa rule calculation method and device, electronic equipment and storage medium

Abstract

Embodiments of the present application disclose a layout SSA rule calculation method and device, electronic equipment and a storage medium. The scheme can determine process window requirement data table according to the focal length exposure matrix data corresponding to the layout and the preset rule, the data table records the minimum line width and the minimum spacing that meet the photolithography process window under different center distances, generates a predefined SSA rule table according to the preset line width interval sequence and the spacing interval sequence, traverses each cell of the predefined SSA rule table, calculates the compensation value corresponding to each cell according to the data table, fills the compensation value into the predefined SSA rule table, and outputs the final SSA rule table. Embodiments of the present application generate a process window requirement data table through the focal length exposure matrix data of the layout, and then calculate the compensation values of different line width intervals and spacing intervals, so as to obtain the SSA rule table. The SSA rule can maintain the original layout design size to a large extent after use, and greatly improves the calculation efficiency and accuracy.

Description

Technical Field

[0001] The present application relates to the field of chip manufacturing technology, and specifically to a method, device, electronic device and storage medium for calculating SSA rules of a layout. Background Art

[0002] In the field of chip layout design, a series of design rules are typically set for the layout to meet design and manufacturing requirements, and the final layout must be completed under the premise of meeting all design rules. For some complex wiring layer layouts, there may still be many design patterns that do not meet manufacturing requirements. To address this, engineers generally perform SSA (selective resizing) on ​​patterns with a small manufacturing process window in the layout before publication to improve the manufacturing process window of the entire layout. This operation is usually performed according to the established resizing rules.

[0003] Currently, the existing SSA rule generation method is highly dependent on manual operation. It is necessary to manually analyze the minimum line width and minimum spacing that meet the process window requirements at each center distance, and then calculate the compensation values ​​corresponding to different size intervals one by one. Finally, an SSA rule table with line width and spacing as horizontal and vertical coordinates is generated. A single rule table may contain hundreds to thousands of data points. Manual calculation requires repeated table lookup, comparison and verification, which is not only time-consuming but also prone to manual calculation errors, seriously restricting the speed of design iteration. Summary of the Invention

[0004] The present application provides a method, device, electronic device and storage medium for calculating the SSA rule of a layout. A process window requirement data table is generated through the focal length exposure matrix data of the layout, and then the compensation values ​​of different line width intervals and spacing intervals are calculated to obtain an SSA rule table. The SSA rule can maintain the original layout design size to a large extent after use, and greatly improves the calculation efficiency and accuracy.

[0005] This application provides a method for calculating the SSA rule of a layout, including:

[0006] Determine a process window requirement data table based on the focal length exposure matrix data corresponding to the layout and preset rules, wherein the data table records the minimum line width and minimum spacing that meet the lithography process window under different center distances;

[0007] Generate a predefined SSA rule table according to the preset line width interval sequence and spacing interval sequence;

[0008] Traversing each cell of the predefined SSA rule table, and calculating the compensation value corresponding to each cell according to the data table;

[0009] Fill the compensation value into the predefined SSA rule table and output a final SSA rule table.

[0010] Optionally, the preset rules include the following conditions:

[0011] The minimum line width and minimum spacing corresponding to each center distance are not greater than half of the center distance;

[0012] The minimum line width and the minimum spacing increase as the center distance increases;

[0013] When the center distance exceeds the maximum value in the data table, the minimum line width and minimum spacing corresponding to the maximum value are adopted.

[0014] Optionally, calculating the compensation value corresponding to each cell according to the data table includes:

[0015] Determine the line width interval [Wn, Wn+1) of the current cell in row n and the spacing interval [Sm, Sm+1) of the current cell in column m, and calculate the center distance interval [Pnm, Pnm+1) of the current cell, where Pnm=Wn+Sm and Pnm+1=Wn+1+Sm+1.

[0016] Calculate the minimum line width Wnm_min and minimum spacing Snm_min required for the center distance interval, Wnm_min=Wmin(Pnm+1), Snm_min=Smin(Pnm+1), where Wmin(Pnm+1) and Smin(Pnm+1) represent the minimum line width and minimum spacing corresponding to Pnm+1, respectively;

[0017] The compensation value is calculated according to the minimum line width Wnm_min and the minimum spacing Snm_min required for the center distance interval.

[0018] Optionally, the calculation process of Wmin(Pnm+1) and Smin(Pnm+1) includes:

[0019] Obtain two values ​​Pnm+1_f and Pnm+1_b adjacent to Pmn+1 in the data table, satisfying Pnm+1_f≤Pnm+1≤Pnm+1_b;

[0020] Calculate Wmin(Pnm+1) and Smin(Pnm+1) according to the following formula:

[0021] Wmin(Pnm+1)=Wmin(Pnm+1_f)+[Wmin(Pnm+1_b)-Wmin(Pnm+1_f)]·(Pnm+1-Pnm+1_f) / (Pnm+1_b-Pnm+1_f);

[0022] Smin(Pnm+1)=Smin(Pnm+1_f)+[Smin(Pnm+1_b)-Smin(Pnm+1_f)]·(Pnm+1-Pnm+1_f) / (Pnm+1_b-Pnm+1_f);

[0023] Where, Wmin(Pnm+1_f) is the minimum line width of Pnm+1_f in the data table, Wmin(Pnm+1_b) is the minimum line width of Pnm+1_b in the data table, Smin(Pnm+1_f) is the minimum pitch of Pnm+1_f in the data table, and Smin(Pnm+1_b) is the minimum pitch of Pnm+1_b in the data table.

[0024] Optionally, the calculation rule of the compensation value includes:

[0025] When Wn ≤ Sm and Wn ≥ Wnm_min, the compensation value Bnm = 0;

[0026] When Wn ≤ Sm and Wn < Wnm_min, the compensation value Bnm = (Wnm_min - Wn) / 2;

[0027] When Wn > Sm and Sm ≥ Snm_min, the compensation value Bnm = 0;

[0028] When Wn > Sm and Sm < Snm_min, the compensation value Bnm = -(Snm_min - Sm) / 2.

[0029] Optionally, the method further includes:

[0030] When the nth row where the cell is located is the last row, the line width interval is defined as [Wn, +∞);

[0031] When the mth column where the cell is located is the last column, the pitch interval is defined as [Sm, +∞).

[0032] Optionally, the method further includes:

[0033] Setting the line width interval sequence according to the segmented step size, and setting the pitch interval sequence according to the segmented step size.

[0034] This application also provides an SSA rule calculation device for a layout, including:

[0035] A determination module, configured to determine a process window requirement data table according to the focal length exposure matrix data corresponding to the layout and a preset rule, where the data table records the minimum line width and minimum pitch that meet the lithography process window under different center distances;

[0036] A generation module, configured to generate a predefined SSA rule table according to a preset line width interval sequence and a preset spacing interval sequence;

[0037] A calculation module, configured to traverse each cell of the predefined SSA rule table and calculate a compensation value corresponding to each cell according to the data table;

[0038] The output module is configured to fill the compensation value into the predefined SSA rule table and output a final SSA rule table.

[0039] The present application also provides an electronic device, which includes a memory and a processor, wherein a computer program is stored in the memory, and the processor executes the steps in any one of the SSA rule calculation methods for the layout provided in the present application by calling the computer program stored in the memory.

[0040] The present application also provides a storage medium storing a computer program, wherein the computer program is suitable for loading by a processor to execute the steps in any one of the SSA rule calculation methods for a layout provided in the present application.

[0041] The SSA rule calculation method for the layout provided in this application can determine the process window requirement data table based on the focal length exposure matrix data corresponding to the layout and the preset rules. The data table records the minimum line width and minimum spacing that meet the lithography process window under different center distances. According to the preset line width interval sequence and spacing interval sequence, a predefined SSA rule table is generated, each cell of the predefined SSA rule table is traversed, and the compensation value corresponding to each cell is calculated according to the data table. The compensation value is filled into the predefined SSA rule table, and the final SSA rule table is output. The embodiment of the present application generates a process window requirement data table through the focal length exposure matrix data of the layout, and then calculates the compensation values ​​of different line width intervals and spacing intervals to obtain an SSA rule table. The SSA rule can maintain the original layout design size to a large extent after use, and greatly improves the calculation efficiency and accuracy. BRIEF DESCRIPTION OF THE DRAWINGS

[0042] In order to more clearly illustrate the technical solutions in this application, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative work.

[0043] Figure 1 This is a flow chart of the SSA rule calculation method for the layout provided in the embodiment of the present application;

[0044] Figure 2This is another flowchart of the SSA rule calculation method for the layout provided in the embodiment of the present application;

[0045] Figure 3 This is an expression of the predefined SSA rules provided in the embodiment of the present application;

[0046] Figure 4 This is a schematic representation of the SSA rule after inputting the compensation value provided in the embodiment of the present application;

[0047] Figure 5 This is a structural diagram of an SSA rule calculation device for a layout provided in an embodiment of the present application;

[0048] Figure 6 This is a structural diagram of an electronic device provided in an embodiment of the present application. DETAILED DESCRIPTION

[0049] Exemplary embodiments will be described in detail herein, with examples illustrated in the accompanying drawings. In the following description, when referring to the drawings, identical numerals in different figures represent identical or similar elements, unless otherwise indicated. The embodiments described in the following exemplary embodiments are not intended to represent all embodiments consistent with the present application. Rather, they are merely examples of apparatus and methods consistent with certain aspects of the present application, as detailed in the appended claims.

[0050] It should be noted that, in this document, the terms "include", "comprises" or any other variations thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device comprising a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, an element defined by the sentence "comprising a ..." does not exclude the presence of other identical elements in the process, method, article or device comprising the element. In addition, components, features, and elements with the same name in different embodiments of the present application may have the same meaning or different meanings, and their specific meanings need to be determined by their explanation in the specific embodiment or further combined with the context of the specific embodiment.

[0051] It should be understood that, although the various steps in the flowchart in the embodiment of the present application are shown in sequence according to the indication of the arrows, these steps are not necessarily performed in sequence in the order indicated by the arrows. Unless clearly stated herein, the execution of these steps is not strictly limited in order, and they can be performed in other orders. Moreover, at least a portion of the steps in the figure may include multiple sub-steps or multiple stages, and these sub-steps or stages are not necessarily performed at the same time, but can be performed at different times, and their execution order is not necessarily performed in sequence, but can be performed in turn or alternately with at least a portion of other steps or sub-steps or stages of other steps.

[0052] It should be noted that in this article, step codes such as 101 and 102 are used for the purpose of expressing the corresponding content more clearly and concisely, and do not constitute a substantial limitation on the order. Those skilled in the art may execute 102 first and then 101, etc. during specific implementation, but these should all be within the scope of protection of this application.

[0053] References herein to "embodiments" mean that a particular feature, structure, or characteristic described in connection with the embodiments may be included in at least one embodiment of the present application. The appearance of this phrase in various places in the specification does not necessarily refer to the same embodiment, nor does it constitute an independent or alternative embodiment that is mutually exclusive of other embodiments. It is understood, both explicitly and implicitly, by those skilled in the art that the embodiments described herein may be combined with other embodiments.

[0054] An embodiment of the present application provides a method for calculating the SSA rules of a layout. The executor of the method for calculating the SSA rules of a layout may be the SSA rule calculation device for the layout provided in the embodiment of the present application, or a server integrating the SSA rule calculation device for the layout, wherein the SSA rule calculation device for the layout may be implemented in hardware or software.

[0055] like Figure 1 As shown, Figure 1 This is a first flow chart of the SSA rule calculation method for a layout provided in an embodiment of the present application. The specific flow of the SSA rule calculation method for the layout can be as follows:

[0056] 101. Determine a process window requirement data table based on the focal length exposure matrix data corresponding to the layout and preset rules. The data table records the minimum line width and minimum spacing that meet the photolithography process window at different center distances.

[0057] In one embodiment, the minimum line width (Width) and minimum spacing (Space) in the layout can be determined first. Using these as a starting point, different center-to-center distance (Pitch) scenarios can be traversed at a preset step size, for example, with the step size increasing by 10nm at a time. For each center-to-center distance, the minimum line width and minimum spacing that meet the lithography process window requirements are determined by analyzing the focus exposure matrix (FEM) data, thereby forming the aforementioned process window requirement data table. Specifically, this data table can be generated by the following steps: Starting with the minimum line width and minimum spacing on a standard test pattern, increasing the focus-exposure test data at a fixed step size for different combinations of line width, spacing, and center-to-center distance, and analyzing the data to determine the minimum line width and minimum spacing that meet the process window yield for each center-to-center distance.

[0058] Furthermore, the specific evaluation criteria for the above-mentioned process window may include the dimension (CD) variation range and the edge position error (EPE) limit. Specifically, the deviation between the actual critical dimension (such as line width) of the pattern and the design target value can be controlled within ±10%. For example, if the design target line width is 50nm, the actual CD must meet 45nm≤CD≤55nm. If it exceeds this range, it is judged that the process window does not meet the standard. The offset of the pattern edge relative to the ideal position can be set to less than 5nm. For example, when measuring the edge position of the pattern under a scanning electron microscope, if the edge offset exceeds 5nm, it is considered that the parameter combination cannot meet the yield requirements and the line width or spacing needs to be increased and retested.

[0059] In one embodiment, the preset rules may include the following conditions: the minimum line width and minimum spacing corresponding to each center distance are no greater than half the center distance; the minimum line width and minimum spacing increase as the center distance increases; and when the center distance exceeds the maximum value in the datasheet, the minimum line width and minimum spacing corresponding to the maximum value are used. For example, when Pitch = 100nm, the minimum line width and spacing must not exceed 50nm (Pitch / 2) ​​to avoid image distortion caused by optical interference. Furthermore, as the center distance increases, for example, from 100nm to 200nm, the corresponding minimum line width and spacing must also increase, for example, from 42nm to 65nm, to ensure that the process window changes reasonably with the expansion of the size. For another example, if the actual center distance exceeds the maximum value in the datasheet, such as the maximum center distance in the datasheet is 200nm, the minimum line width and spacing corresponding to this maximum value, such as 65nm, can be uniformly used to avoid process risks caused by missing data.

[0060] 102. Generate a predefined SSA rule table according to a preset line width interval sequence and a preset spacing interval sequence.

[0061] In one embodiment, when setting the interval sequence of line width (Width) and spacing (Space), the line width interval sequence can be set according to the segmented step size, and the spacing interval sequence can be set according to the segmented step size. For example, when setting the line width interval according to the segmented step size, the step size of the 50-100nm interval can be set to 10nm, the step size of the 100-200nm interval can be set to 20nm, and the step size of the 200-1000nm interval can be set to 50nm. Correspondingly, when setting the spacing interval according to the segmented step size, the step size of the 50-100nm interval can be set to 10nm, the step size of the 100-200nm interval can be set to 20nm, and the step size of the 200-1000nm interval can be set to 50nm. Finally, with the line width interval as the row and the spacing interval as the column, a two-dimensional matrix is ​​formed, that is, a blank predefined SSA rule table is generated, and each cell corresponds to a size combination interval, such as a line width of 50-60nm and a spacing of 50-60nm.

[0062] In one embodiment, if the process window requires that the data table show that a certain size range has no process risk, for example, if line widths > 150nm meet the process window, the cells in this area can be automatically merged to reduce redundant calculations. For example, line widths of 150-200nm can be merged into a single row to improve efficiency.

[0063] 103. Traverse each cell of the predefined SSA rule table and calculate the compensation value corresponding to each cell according to the data table.

[0064] In one embodiment, the center distance interval associated with the current cell can be determined first. Specifically, the line width interval and pitch interval corresponding to the cell can be determined first, and then the center distance interval can be calculated based on the line width interval and pitch interval. For example, if the line width interval corresponding to the cell is 60-70nm and the pitch interval is 70-80nm, then the center distance pitch range is 60+70=130nm at the lower limit and 70+80=150nm at the upper limit, that is, the center distance interval is 130-150nm.

[0065] Next, we can take the upper limit of the center distance range, 150nm, and find the corresponding minimum line width and minimum spacing requirements in the process window requirement data table. For example, the minimum line width requirement is 54nm, and the minimum spacing requirement is 54nm. If 150nm is not directly in the table, we can further interpolate the adjacent pitch values. For example, if 140nm requires 50nm and 160nm requires 54nm, we can interpolate and calculate that 150nm requires 52nm.

[0066] In one embodiment, when calculating the compensation value, it can be determined based on the comparison results of the cell line width lower limit and the minimum line width requirement, the comparison results of the cell spacing lower limit and the minimum spacing requirement, and the comparison results of the line width and the spacing. For example, when the cell line width lower limit 60nm ≥ the minimum line width requirement 52nm, and the line width ≤ the spacing, the compensation value = 0, that is, there is no need to adjust the cell. When the line width lower limit 60nm < the minimum line width requirement 65nm, and the line width ≤ the spacing, the compensation value = (65-60) / 2 = 2.5nm, that is, it is necessary to positively widen the line width. When the spacing lower limit 70nm < the minimum spacing requirement 75nm, and the line width > the spacing, the compensation value = -(75-70) / 2 = -2.5nm, that is, negatively narrow the line width.

[0067] 104. Fill the compensation value into the predefined SSA rule table and output the final SSA rule table.

[0068] In one embodiment, the compensation values ​​calculated in step 103 can be filled into a predefined table row by row and column by column through an automatic calculation tool to form a complete SSA rule table. This table can be directly imported into the OPC software to automatically adjust the size of the graphics corresponding to the line width and spacing in the layout. It should be noted that the above-mentioned SSA rule table can support dynamic export formats such as CSV, XML, etc. to adapt to different OPC tools. The accuracy of the compensation value can be set as needed, for example, it can be set to 0.0005μm, so as to meet the nano-level adjustment requirements of advanced processes (such as 3nm). In addition, the automatic calculation tool can integrate a historical data comparison function to quickly identify the compensation differences between different layout versions and improve the efficiency of process iteration.

[0069] As described above, the SSA rule calculation method for the layout proposed in the embodiment of the present application can determine the process window requirement data table based on the focal length exposure matrix data corresponding to the layout and the preset rules. The data table records the minimum line width and minimum spacing that meet the lithography process window under different center distances. According to the preset line width interval sequence and spacing interval sequence, a predefined SSA rule table is generated, each cell of the predefined SSA rule table is traversed, and the compensation value corresponding to each cell is calculated according to the data table. The compensation value is filled into the predefined SSA rule table, and the final SSA rule table is output. The embodiment of the present application generates a process window requirement data table through the focal length exposure matrix data of the layout, and then calculates the compensation values ​​of different line width intervals and spacing intervals to obtain an SSA rule table. The SSA rule can maintain the original layout design size to a large extent after use, and greatly improves the calculation efficiency and accuracy.

[0070] The method described in the above embodiment will be further described below.

[0071] See also Figure 2 , Figure 2This is a second flow chart of the SSA rule calculation method for a layout provided in an embodiment of the present application. The method includes:

[0072] 201. Determine a process window requirement data table based on the focal length exposure matrix data corresponding to the layout and preset rules. The data table records the minimum line width and minimum spacing that meet the photolithography process window at different center distances.

[0073] In one embodiment, the minimum line width and minimum spacing in the layout can be locked first, such as 42nm, and then increased by a fixed step size such as 3nm with it as the starting point. At the same time, the center distance is expanded from the minimum value such as 100nm by a fixed step size such as 20nm to form multiple sets of line width, spacing, and center distance combinations. Next, for each combination, test data under different focal lengths and exposure amounts are collected, and the minimum line width and minimum spacing that meet the process window yield are analyzed and determined. The above conditions for meeting the process window yield are such as critical dimension change ≤±10%, edge error <5nm, etc., and finally a process window requirement data table is generated. For example, when the center distance is 100nm, the minimum line width / spacing is determined to be 42nm through testing, and when the center distance is 120nm, it is 45nm, and so on.

[0074] The above preset rules require that the minimum line width / pitch corresponding to each center distance be ≤ half of the center distance, for example, ≤ 50nm for a center distance of 100nm. Furthermore, as the center distance increases, the minimum line width / pitch increases accordingly. Furthermore, if the center distance exceeds the maximum value in the table, such as 200nm, the minimum line width / pitch corresponding to the maximum value, for example, 65nm, can be uniformly adopted.

[0075] 202. Generate a predefined SSA rule table according to a preset line width interval sequence and a preset spacing interval sequence.

[0076] In one embodiment, line width intervals and spacing intervals are preset according to design requirements. For example, line width is divided into [0.05μm, 0.06μm), [0.06μm, 0.07μm), etc. in 0.01μm steps, and spacing is divided into [0.05μm, 0.06μm), [0.06μm, 0.07μm), etc. in 0.01μm steps. A blank table is generated with line width intervals as rows and spacing intervals as columns. Figure 3 As shown, this embodiment can also set the line width interval according to the segmented step length, and set the spacing interval according to the segmented step length, for example, when the line width reaches 0.1μm, the step length becomes 0.02μm, and when the line width reaches 0.2μm, the step length becomes 0.05μm.

[0077] 203. Traverse each cell of the predefined SSA rule table, determine the line width interval [Wn, Wn+1) of the nth row and the spacing interval [Sm, Sm+1) of the mth column where the current cell is located, and calculate the center distance interval [Pnm, Pnm+1) of the current cell.

[0078] In one embodiment, when traversing each cell in a table, the line width interval [Wn, Wn+1) of the row and the spacing interval [Sm, Sm+1) of the column can be determined. Then, the corresponding center distance interval [Pnm, Pnm+1] can be calculated using the formulas Pnm=Wn+Sm and Pnm+1=Wn+1+Sm+1. For example, if a cell corresponds to a line width interval [0.07μm, 0.08μm] and a spacing interval [0.14μm, 0.16μm], the center distance interval is [0.21μm-0.24μm], and the calculation process is 0.07+0.14=0.21, 0.08+0.16=0.24.

[0079] It should be noted that if the cell is in the last row, the line width range can be extended to [Wn, +∞); if the cell is in the last column, the spacing range can be extended to [Sm, +∞).

[0080] 204. Calculate the minimum line width Wnm_min and minimum spacing Snm_min required for the center distance interval [Pnm, Pnm+1).

[0081] In one embodiment, Wnm_min=Wmin(Pnm+1), Snm_min=Smin(Pnm+1), where Wmin(Pnm+1) and Smin(Pnm+1) represent the minimum line width and minimum spacing corresponding to Pnm+1, respectively. The calculation process of Wmin(Pnm+1) and Smin(Pnm+1) includes: obtaining two values ​​Pnm+1_f and Pnm+1_b adjacent to Pnmn+1 from a data table, satisfying Pnm+1_f≤Pnm+1≤Pnm+1_b, and then calculating Wmin(Pnm+1) and Smin(Pnm+1) according to the following formulas:

[0082] Wmin(Pnm+1)=Wmin(Pnm+1_f)+[Wmin(Pnm+1_b)-Wmin(Pnm+1_f)]·(Pnm+1-Pnm+1_f) / (Pnm+1_b-Pnm+1_f);

[0083] Smin(Pnm+1)=Smin(Pnm+1_f)+[Smin(Pnm+1_b)-Smin(Pnm+1_f)]·(Pnm+1-Pnm+1_f) / (Pnm+1_b-Pnm+1_f);

[0084] Among them, Wmin(Pnm+1_f) is the minimum line width of Pnm+1_f in the data table, Wmin(Pnm+1_b) is the minimum line width of Pnm+1_b in the data table, Smin(Pnm+1_f) is the minimum pitch of Pnm+1_f in the data table, and Smin(Pnm+1_b) is the minimum pitch of Pnm+1_b in the data table. It should be noted that if Pnm+1 exceeds the maximum value Pmax in the data table, the minimum line width / pitch corresponding to Pmax can be directly adopted.

[0085] For example, if Pnm+1 = 0.22μm, that is, 220nm, and the adjacent values found in the data table are Pnm+1_f = 200nm (corresponding to the minimum line width of 65nm) and Pnm+1_b = 240nm (assuming the corresponding minimum line width of 70nm), then Wnm_min = 65 + (70 - 65)×(220 - 200) / (240 - 200) = 65 + 5×0.5 = 67.5nm; if Pnm+1 = 300nm (exceeding the maximum value of 200nm in the table), then Wnm_min = 65nm and Snm_min = 65nm.

[0086] 205. Calculate the compensation value Bnm according to the minimum line width Wnm_min and the minimum pitch Snm_min required by the center distance interval.

[0087] In one embodiment, the calculation rules for the compensation value Bnm include: when Wn≤Sm and Wn≥Wnm_min, the compensation value Bnm = 0; when Wn≤Sm and Wn<Wnm_min, the compensation value Bnm = (Wnm_min - Wn) / 2; when Wn>Sm and Sm≥Snm_min, the compensation value Bnm = 0; when Wn>Sm and Sm<Snm_min, the compensation value Bnm = -(Snm_min - Sm) / 2.

[0088] For example, if Wn = 70nm, Sm = 140nm, and Wnm_min = 67.5nm, then Bnm = 0 when the conditions are met. If Wn = 60nm < 67.5nm, then Bnm = (67.5 - 60) / 2 = 3.75nm. If Wn = 80nm, Sm = 70nm, and Snm_min = 67.5nm, then Bnm = 0 when Sm≥Snm_min. If Sm = 60nm < 67.5nm, then Bnm = -(67.5 - 60) / 2 = -3.75nm.

[0089] 206. Fill the compensation value Bnm into the predefined SSA rule table and output the final SSA rule table.

[0090] Fill the calculated compensation values ​​into the predefined table row by row and column by column to form a rule table that can be directly imported into the OPC software. Figure 6 As shown, the cell compensation value of a line width of 0.05μm and a spacing of 0.1μm is -0.005μm, which means the line width is narrowed, while the cell compensation value of a line width of 0.1μm and a spacing of 0.05μm is 0.005μm, which means the line width is widened, and the cell compensation value of a line width of 0.1μm and a spacing of 0.08μm is 0, which means no adjustment is required.

[0091] In one embodiment, the calculation process of the compensation value Bnm is automatically performed by a computer program: the FEM data table file path is input, the row value sequence and column value sequence parameters are received in a graphical interface, and a visual SSA rule table is automatically generated and supported for export.

[0092] As described above, the SSA rule calculation method for the layout proposed in the embodiment of the present application can determine the process window requirement data table based on the focal length exposure matrix data corresponding to the layout and the preset rules. The data table records the minimum line width and minimum spacing that meet the lithography process window under different center distances. According to the preset line width interval sequence and spacing interval sequence, a predefined SSA rule table is generated, and each cell of the predefined SSA rule table is traversed to determine the line width interval [Wn, Wn+1) of the nth row and the spacing interval [Sm, Sm+1) of the mth column where the current cell is located, and the center distance interval [Pnm, Pnm+1) of the current cell is calculated, and the minimum line width Wnm_min and the minimum spacing Snm_min required for the center distance interval [Pnm, Pnm+1) are calculated. The compensation value Bnm is calculated based on the minimum line width Wnm_min and the minimum spacing Snm_min required for the center distance interval, and the compensation value Bnm is filled into the predefined SSA rule table, and the final SSA rule table is output. The embodiment of the present application generates a process window requirement data table through the focal length exposure matrix data of the layout, and then calculates the compensation values ​​of different line width intervals and spacing intervals to obtain an SSA rule table. The SSA rule can maintain the original layout design size to a large extent after use, and greatly improves the calculation efficiency and accuracy.

[0093] In order to implement the above method, an embodiment of the present application also provides a layout SSA rule calculation device, which can be specifically integrated into terminal devices such as mobile phones, tablet computers and other devices.

[0094] For example, Figure 5 FIG. 1 is a schematic diagram of a structure of an SSA rule calculation device for a layout provided in an embodiment of the present application. The SSA rule calculation device for the layout may include:

[0095] Determination module 301, for determining a process window requirement data table based on the focal length exposure matrix data corresponding to the layout and preset rules, wherein the data table records the minimum line width and minimum spacing that meet the lithography process window at different center distances;

[0096] A generating module 302 is configured to generate a predefined SSA rule table according to a preset line width interval sequence and a preset spacing interval sequence;

[0097] A calculation module 303 is configured to traverse each cell of the predefined SSA rule table and calculate a compensation value corresponding to each cell according to the data table;

[0098] The output module 304 is configured to fill the compensation value into the predefined SSA rule table and output a final SSA rule table.

[0099] As can be seen from the above, the SSA rule calculation device for the layout proposed in the embodiment of the present application can determine the process window requirement data table based on the focal length exposure matrix data corresponding to the layout and the preset rules. The data table records the minimum line width and minimum spacing that meet the lithography process window under different center distances. According to the preset line width interval sequence and spacing interval sequence, a predefined SSA rule table is generated, each cell of the predefined SSA rule table is traversed, and the compensation value corresponding to each cell is calculated according to the data table. The compensation value is filled into the predefined SSA rule table, and the final SSA rule table is output. The embodiment of the present application generates a process window requirement data table through the focal length exposure matrix data of the layout, and then calculates the compensation values ​​of different line width intervals and spacing intervals to obtain an SSA rule table. The SSA rule can maintain the original layout design size to a large extent after use, and greatly improves the calculation efficiency and accuracy.

[0100] All of the above technical solutions can be combined in any way to form optional embodiments of the present application, and will not be described in detail here.

[0101] Those skilled in the art will appreciate that all or part of the steps in the various methods of the above embodiments may be accomplished by instructions, or by controlling related hardware through instructions. The instructions may be stored in a computer-readable storage medium and loaded and executed by a processor.

[0102] To this end, an embodiment of the present application provides a computer-readable storage medium storing a plurality of computer programs, which can be loaded by a processor to execute the steps of any of the layout SSA rule calculation methods provided in the embodiments of the present application. For example, the computer program can execute the following steps:

[0103] Determine a process window requirement data table based on the focal length exposure matrix data corresponding to the layout and preset rules, wherein the data table records the minimum line width and minimum spacing that meet the lithography process window under different center distances;

[0104] Generate a predefined SSA rule table according to the preset line width interval sequence and spacing interval sequence;

[0105] Traversing each cell of the predefined SSA rule table, and calculating the compensation value corresponding to each cell according to the data table;

[0106] Fill the compensation value into the predefined SSA rule table and output a final SSA rule table.

[0107] The specific implementation of the above operations can be found in the previous embodiments and will not be repeated here.

[0108] The storage medium may include a read-only memory (ROM), a random access memory (RAM), a magnetic disk or an optical disk, etc.

[0109] Since the computer program stored in the storage medium can execute the steps in the SSA rule calculation method for any layout provided in the embodiments of the present application, the beneficial effects that can be achieved by the SSA rule calculation method for any layout provided in the embodiments of the present application can be achieved. Please see the previous embodiments for details and will not be repeated here.

[0110] An embodiment of the present application also provides an electronic device, including a memory and a processor, wherein the memory is used to store a computer program, and the processor is used to call and run the computer program from the memory, so that the device equipped with the chip executes the methods in various possible implementation modes as described above.

[0111] For example, the computer device mentioned above can be a terminal device with corresponding functions such as a mobile phone, tablet computer, personal computer, cloud computer, etc. Figure 6 , Figure 6 A schematic diagram of the structure of a computer provided in an embodiment of the present application.

[0112] The computer device 400 may include components such as a memory 401 and a processor 402. Those skilled in the art will appreciate that Figure 6 The computer device structure shown in the figure does not constitute a limitation to the computer device, and may include more or fewer components than shown in the figure, or combine certain components, or arrange the components differently.

[0113] Memory 401 can be used to store applications and data. The applications stored in memory 401 include executable code. Applications can be composed of various functional modules. Processor 402 executes various functional applications and data processing by running the applications stored in memory 401.

[0114] The processor 402 is the control center of the computer device. It uses various interfaces and lines to connect the various parts of the entire computer device. By running or executing applications stored in the memory 401 and calling data stored in the memory 401, it performs various functions of the computer device and processes data, thereby monitoring the computer device as a whole.

[0115] In this embodiment, the processor 402 in the computer device loads the executable code corresponding to one or more application processes into the memory 401 according to the following instructions, and the processor 402 runs the application stored in the memory 401 to execute:

[0116] Determine a process window requirement data table based on the focal length exposure matrix data corresponding to the layout and preset rules, wherein the data table records the minimum line width and minimum spacing that meet the lithography process window under different center distances;

[0117] Generate a predefined SSA rule table according to the preset line width interval sequence and spacing interval sequence;

[0118] Traversing each cell of the predefined SSA rule table, and calculating the compensation value corresponding to each cell according to the data table;

[0119] Fill the compensation value into the predefined SSA rule table and output a final SSA rule table.

[0120] It is understood that the above scenarios are merely examples and do not limit the application scenarios of the technical solutions provided in the embodiments of this application. The technical solutions of this application can also be applied to other scenarios. For example, those skilled in the art will appreciate that with the evolution of system architecture and the emergence of new business scenarios, the technical solutions provided in the embodiments of this application will also be applicable to similar technical problems.

[0121] The steps in the method of the embodiment of the present application can be adjusted in order, combined, or deleted according to actual needs. The modules in the device of the embodiment of the present application can be combined, divided, or deleted according to actual needs.

[0122] In this application, the same or similar terminology, technical solutions and / or application scenario descriptions are only described in detail the first time they appear. When they appear again later, they are generally not repeated for the sake of brevity. When understanding the technical solutions and other contents of this application, for the same or similar terminology, technical solutions and / or application scenario descriptions that are not described in detail later, you can refer to the previous relevant detailed descriptions.

[0123] In this application, the description of each embodiment has its own focus. For parts that are not described or recorded in detail in a certain embodiment, please refer to the relevant description of other embodiments.

[0124] The various technical features of the technical solution of this application can be combined arbitrarily. In order to make the description concise, not all possible combinations of the various technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this application.

[0125] The above embodiments can be implemented in whole or in part through software, hardware, firmware, or any combination thereof. When implemented using software, they can be implemented in whole or in part in the form of a computer program product. A computer program product comprises one or more computer instructions. When the computer program instructions are loaded and executed on a computer, the processes or functions according to the embodiments of the present application are generated in whole or in part. The computer can be a general-purpose computer, a special-purpose computer, a computer network, or other programmable device. The computer instructions can be stored in a computer-readable storage medium or transmitted from one computer-readable storage medium to another. For example, computer instructions can be transmitted from one website, computer, server, or data center to another website, computer, server, or data center via wired (e.g., coaxial cable, optical fiber, digital subscriber line) or wireless (e.g., infrared, wireless, microwave, etc.) means. The computer-readable storage medium can be any available medium that can be accessed by a computer, or a data storage device such as a server or data center that integrates one or more available media. Available media can include magnetic media (e.g., floppy disks, storage disks, magnetic tapes), optical media (e.g., DVDs), or semiconductor media (e.g., solid-state disks).

[0126] The above is a detailed introduction to the SSA rule calculation method, device, electronic device and storage medium for a layout provided in an embodiment of the present application. Specific examples are used herein to illustrate the principles and implementation methods of the present application. The description of the above embodiments is only used to help understand the method of the present application and its core idea; at the same time, for technical personnel in this field, based on the ideas of the present application, there will be changes in the specific implementation methods and application scope. In summary, the content of this specification should not be understood as a limitation on the present invention.

Claims

1. A method for calculating the SSA rule of a layout, characterized in that: Including: Determine the process window requirement data table according to the focal length exposure matrix data corresponding to the layout and the preset rules. The data table records the minimum line width and minimum spacing that meet the lithography process window at different center distances. The preset rules include the following conditions: the minimum line width and minimum spacing corresponding to each center distance are not greater than half of the center distance; the minimum line width and minimum spacing increase as the center distance increases; when the center distance exceeds the maximum value in the data table, the minimum line width and minimum spacing corresponding to the maximum value are used. Generate a predefined SSA rule table according to the preset line width interval sequence and spacing interval sequence. Traverse each cell of the predefined SSA rule table, determine the line width interval [Wn, Wn+1) of the nth row where the current cell is located and the spacing interval [Sm, Sm+1) of the mth column where the current cell is located, and calculate the center distance interval [Pnm, Pnm+1) of the current cell, where Pnm = Wn + Sm, Pnm+1 = Wn+1 + Sm+1. Calculate the minimum line width Wnm_min and minimum spacing Snm_min required for the center distance interval, Wnm_min = Wmin(Pnm+1), Snm_min = Smin(Pnm+1), where Wmin(Pnm+1) and Smin(Pnm+1) respectively represent the minimum line width and minimum spacing corresponding to Pnm+1. When Wn ≤ Sm and Wn ≥ Wnm_min, the compensation value Bnm = 0. When Wn ≤ Sm and Wn < Wnm_min, the compensation value Bnm = (Wnm_min - Wn) / 2. When Wn > Sm and Sm ≥ Snm_min, the compensation value Bnm = 0. When Wn > Sm and Sm < Snm_min, the compensation value Bnm = -(Snm_min - Sm) / 2. Fill the compensation value into the predefined SSA rule table and output the final SSA rule table.

2. The method for calculating the SSA rule of a layout according to claim 1, wherein: The calculation process of Wmin(Pnm+1) and Smin(Pnm+1) includes: Obtain two values Pnm+1_f and Pnm+1_b adjacent to Pmn+1 in the data table, satisfying Pnm+1_f ≤ Pnm+1 ≤ Pnm+1_b. Calculate Wmin(Pnm+1) and Smin(Pnm+1) according to the following formula: Wmin(Pnm+1) = Wmin(Pnm+1_f) + [Wmin(Pnm+1_b) - Wmin(Pnm+1_f)]·(Pnm+1 - Pnm+1_f) / (Pnm+1_b - Pnm+1_f); Smin(Pnm+1) = Smin(Pnm+1_f) + [Smin(Pnm+1_b) - Smin(Pnm+1_f)]·(Pnm+1 - Pnm+1_f) / (Pnm+1_b - Pnm+1_f); Where, Wmin(Pnm+1_f) is the minimum line width of Pnm+1_f in the data table, Wmin(Pnm+1_b) is the minimum line width of Pnm+1_b in the data table, Smin(Pnm+1_f) is the minimum pitch of Pnm+1_f in the data table, and Smin(Pnm+1_b) is the minimum pitch of Pnm+1_b in the data table.

3. The method for calculating the SSA rule of a layout according to claim 1, wherein: The method further includes: When the nth row where the cell is located is the last row, the line width interval is defined as [Wn, +∞); When the mth column where the cell is located is the last column, the pitch interval is defined as [Sm, +∞).

4. The method for calculating the SSA rule of a layout according to any one of claims 1 to 3, wherein: The method further includes: Setting the line width interval sequence according to the segmentation step size, and setting the pitch interval sequence according to the segmentation step size.

5. A layout SSA rule calculation device, characterized in that: Including: A determination module, configured to determine a process window requirement data table according to the focal length exposure matrix data corresponding to the layout and a preset rule, where the data table records the minimum line width and minimum pitch that meet the lithography process window under different center distances; The preset rule includes the following conditions: the minimum line width and minimum pitch corresponding to each center distance are not greater than half of the center distance; the minimum line width and minimum pitch increase as the center distance increases; when the center distance exceeds the maximum value in the data table, the minimum line width and minimum pitch corresponding to the maximum value are used; A generation module, configured to generate a predefined SSA rule table according to a preset line width interval sequence and pitch interval sequence; A calculation module, configured to traverse each cell of the predefined SSA rule table, determine the line width interval [Wn, Wn+1) of the nth row where the current cell is located and the pitch interval [Sm, Sm+1) of the mth column where the current cell is located, and calculate the center distance interval [Pnm, Pnm+1) of the current cell, where Pnm = Wn + Sm, Pnm+1 = Wn+1 + Sm+1; calculate the minimum line width Wnm_min and minimum pitch Snm_min required for the center distance interval, Wnm_min = Wmin(Pnm+1), Snm_min = Smin(Pnm+1), where Wmin(Pnm+1) and Smin(Pnm+1) respectively represent the minimum line width and minimum pitch corresponding to Pnm+1; when Wn ≤ Sm and Wn ≥ Wnm_min, the compensation value Bnm = 0; when Wn ≤ Sm and Wn < Wnm_min, the compensation value Bnm = (Wnm_min - Wn) / 2; when Wn > Sm and Sm ≥ Snm_min, the compensation value Bnm = 0; when Wn > Sm and Sm < Snm_min, the compensation value Bnm = -(Snm_min - Sm) / 2; An output module, configured to fill the compensation value into the predefined SSA rule table and output the final SSA rule table.

6. An electronic device, characterized in that: The electronic device includes a memory and a processor, where a computer program is stored in the memory, and the processor executes the steps in the SSA rule calculation method for the layout according to any one of claims 1-4 by calling the computer program stored in the memory.

7. A storage medium, characterized in that: The storage medium stores a computer program, and the computer program is suitable for being loaded by a processor to execute the steps in the method for calculating the SSA rule of a layout according to any one of claims 1 to 4.

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