Novel alkali etching equipment

Abstract

The invention discloses novel alkali etching equipment which comprises a main tank and an auxiliary tank, and heating devices and temperature detecting devices are uniformly arranged in the main tank and the auxiliary tank, so that the temperature of solutions in the main tank and the auxiliary tank reaches a uniform set temperature; the main tank and the auxiliary tank form a solution circulating system together, a solution in the main tank flows to the top from the bottom and uniformly contacts and flows with the surface of the glass, the surface of the glass and the solution form a uniform chemical reaction process, and meanwhile, the solution is beneficial to temperature uniformity in the tank; a liquid bubbling pipeline, a bubbling pipeline and a hole plate are mounted in the main tank, so that the flowing direction and the flowing speed of a solution in the main tank are uniform; the main tank adopts a turning cover mode, the alkali sealing performance of an upper cover and the tank body is strong, and meanwhile, an air draft is additionally arranged on the tank body of the main tank to prevent alkali liquor steam in the tank from overflowing; the temperature of the solution in the tank body is uniform, and the product yield is effectively improved.

Description

Technical Field

[0001] The present invention relates to the technical field of etching equipment, in particular to a novel alkali etching equipment. Background Art

[0002] Currently, in the field of electronic display screens, common glass surface non-refractive light processes include etching AG and spraying AG. Etching AG is a chemical etching process. After AG treatment, the surface of the glass substrate remains, which is scratch-resistant, wear-resistant, and highly transparent, and displays high-definition images. This process produces good anti-glare glass and is highly recognized by the market.

[0003] At present, the mainstream etching technology used in the chemical etching thinning process and etching of AG glass on the market is acid etching (hydrofluoric acid solution). During the production process of acid etching technology, fluorine-containing wastewater and hazardous fluorine-containing lime sludge will be produced. However, the alkaline etching (sodium hydroxide solution) technology, which is in the development stage, does not produce fluorine-containing hazardous waste, and is of great significance to environmental innovation, pollution reduction and emission reduction. The commonly used production equipment for acid etching is mainly the acid etching tank immersion method and the horizontal etching thinning line knife spray method. However, the alkaline etching production process does not yet have real mass production equipment. Among them, the immersion test scheme used for alkaline etching includes immersing the glass substrate in the alkaline etching tank equipment and soaking the substrate with alkaline etching solution. The alkaline etching solution is mainly a sodium hydroxide solution with a concentration of 40% to 75% and a temperature of 100°C to 170°C.

[0004] The alkaline etching immersion process described above uses equipment currently tested. The material is resistant to strong alkali corrosion at high temperatures. A common immersion solution involves a multi-tank immersion system, where the glass substrate is inserted into a glass basket, which is then lifted and moved into the immersion tank by a robotic arm. Basic functions of this immersion system include tank heating, basket agitation, and self-circulation of the chemical solution within the tank. Tank heating involves installing a heater inside the tank or at the edge of the tank. A circulating pump is required to circulate the solution within the tank to maintain the set temperature. Basket agitation is required to achieve uniform etching on the glass surface. The alkaline etching immersion system described above is currently being tested. After heating the alkali etching solution to the set temperature, this type of equipment struggles to maintain temperature uniformity across the tank, resulting in significant temperature differences between locations within the tank. Simply agitating the glass basket within the immersion tank can lead to uneven etching. The equipment also suffers from poor sealing, and when the high-temperature alkali solution evaporates from the tank, crystals form around the device, contaminating the equipment.

[0005] For example, patent CN216871910U discloses an alkaline etching liquid preparation tank for improving the back reflectivity, including a liquid preparation tank and a liquid outlet. The liquid preparation tank is provided with a reaction zone for neutralizing the etching liquid, a mixing zone for mixing the etching liquid, and a precipitation zone for precipitating viscous precipitates in the etching liquid. The reaction zone, the mixing zone, and the precipitation zone are sequentially arranged inside the liquid preparation tank. The reaction zone includes a liquid inlet pipe for introducing the preparation liquid. The liquid preparation tank is an open structure, and the heating structure is arranged at the bottom of the tank body.

[0006] Existing alkaline etching equipment has the following main shortcomings: 1. After the equipment immersion tank is heated, the alkaline solution in the tank is heated to the set temperature, but the temperature uniformity in different areas is poor; 2. The immersion tank has only two temperature measuring rods installed on the outside of the circulation pipe, which cannot monitor the temperature of different areas of the solution inside the tank in real time; 3. The simple tossing of the glass basket cannot solve the problem of etching uniformity between the alkaline solution and different areas of the glass surface; 4. The equipment has poor sealing. After the high-temperature alkaline solution vapor overflows, crystals form around the equipment, contaminating the equipment; 5. The control of the amplitude and direction of the alkaline solution movement directly affects the DOI, thickness, haze and other indicators of the alkaline-etched glass, which fails to meet the standards and has a poor appearance. Summary of the Invention

[0007] In view of the shortcomings of the existing technology, the present invention provides a new type of alkaline etching equipment to achieve uniform solution temperature in the tank and improve product yield.

[0008] In order to solve the above technical problems, the technical solution adopted by the present invention is:

[0009] This novel alkaline etching equipment includes a basket lifting structure and a main tank for holding etching solution for etching. The main tank is provided with an internal heating structure. It also includes a sub-tank and a liquid supply pump. The sub-tank is connected to the bottom of the main tank through the liquid supply pump and the liquid inlet pipe. The upper part of the main tank is connected to the sub-tank through the liquid return pipe. A group of sub-tank heating structures are provided in the sub-tank.

[0010] Further or preferred:

[0011] The top of the main tank is provided with a heat-insulating upper cover which can be flipped open.

[0012] A tank body insulation layer is provided on the outside of the main tank.

[0013] The bottom of the main tank is provided with a tank bottom liquid-filling structure for filling liquid.

[0014] One main tank and one auxiliary tank are connected to form a tank unit, and the device includes a group of tank units arranged side by side.

[0015] A group of heating pipes are arranged and installed above the auxiliary tank, and the heating pipes extend into the interior of the tank body. A multi-stage detachable overflow baffle is installed inside the auxiliary tank.

[0016] A group of temperature probes are provided in each of the main tank and the auxiliary tank.

[0017] The upper part of the main tank is higher than the upper part of the auxiliary tank, the upper end of the liquid return pipe is connected to the upper part of the main tank, and the lower end of the liquid return pipe is connected to the upper part of the auxiliary tank.

[0018] The heat-insulating upper cover is provided with an exhaust structure.

[0019] The liquid drum structure at the bottom of the tank body comprises a liquid drum pipe, a bubble pipe and a perforated plate arranged at the bottom of the main tank.

[0020] Compared with the prior art, the present invention has the following advantages: the novel alkali etching equipment has a reasonable structural design, a single alkali etching immersion tank structure includes a main tank and a sub-tank, heating devices and temperature detection devices are evenly arranged inside the main tank and the sub-tank, so that the solution temperature in the main tank and the sub-tank reaches a uniform set temperature; the main tank and the sub-tank together form a solution circulation system, the solution in the main tank flows from the bottom to the top, uniformly contacts and flows with the glass surface, uses the glass surface and the solution to form a uniform chemical reaction process, and the liquid is conducive to the temperature uniformity in the tank; the installation of the drum liquid pipe and the bubbling pipe and the perforated plate in the main tank makes the flow direction and flow rate of the solution in the main tank uniform; the main tank adopts a flip-up cover, the upper cover and the tank body have strong alkali sealing performance, and at the same time, an exhaust fan is installed on the main tank body to prevent the alkali solution vapor in the tank from overflowing; the temperature of the solution in the tank body is uniform, which effectively improves the product yield. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] The following is a brief description of the contents and symbols in the drawings of this specification:

[0022] Figure 1 Schematic diagram of solution flow of the present invention.

[0023] Figure 2 This is a schematic diagram of the main tank structure of the present invention.

[0024] Figure 3 It is a schematic diagram of the tank unit structure of the present invention.

[0025] Figure 4 It is a schematic diagram of the tank unit assembly of the present invention.

[0026] In the picture:

[0027] 1. Upper cover flip structure, 2. Insulated upper cover, 3. Tank insulation layer, 4. Tank bottom liquid drum structure, 5. Tank internal heating structure, 6. Main tank, 7. Auxiliary tank, 8. Auxiliary tank heating structure, 9. Liquid supply pump, 10. Robotic arm. DETAILED DESCRIPTION

[0028] The specific implementation of the present invention will be further explained in detail below through description of embodiments with reference to the accompanying drawings.

[0029] like Figures 1 to 4 As shown, the novel alkaline etching equipment includes a main tank 6, an auxiliary tank 7, a basket lifting structure, a liquid supply pump 9, a heating structure and a temperature sensor for detecting the temperature of the solution in the main tank and the auxiliary tank.

[0030] The main tank 6 is used to hold the etching solution for etching, and the basket lifting structure can be a robot 10, which is efficient in operation. An internal heating structure 5 is provided in the main tank. The auxiliary tank is connected to the bottom of the main tank through a liquid supply pump and a liquid inlet pipe. The upper part of the main tank is connected to the auxiliary tank through a liquid return pipe. A group of auxiliary tank heating structures 8 are provided in the auxiliary tank. The main tank and the auxiliary tank together form a solution circulation system. The solution in the main tank flows from the bottom to the top, evenly contacts and flows with the glass surface, uses the glass surface and the solution to form a uniform chemical reaction process, and is also conducive to temperature uniformity in the tank.

[0031] The main tank is equipped with an insulation layer 3 on the outside, and a reversible, insulated cover 2 is installed on top. This cover automatically opens via a reversing mechanism 1, which can be driven by a motor and gears. Furthermore, an exhaust mechanism is incorporated into the cover 2. The main tank's reversible cover provides a strong alkali-tight seal between the cover and the tank. An exhaust fan is also installed on the main tank to prevent alkali vapor from escaping.

[0032] The bottom of the main tank is provided with a tank bottom liquid-filling structure 4 for filling the tank. Preferably, the tank bottom liquid-filling structure includes a liquid-filling pipe and a bubble pipe, as well as a perforated plate, disposed at the bottom of the main tank. The installation of the liquid-filling pipe, bubble pipe, and perforated plate within the main tank ensures uniform flow direction and velocity of the solution within the main tank.

[0033] A set of heating pipes is installed above the auxiliary tank and extends into the tank body. The auxiliary tank is equipped with a multi-stage removable overflow baffle. A set of temperature probes are set in both the main tank and the auxiliary tank. Since the auxiliary tank is not used for direct etching, the fully heated and uniformly heated etching solution is fed into the main tank.

[0034] The upper part of the main tank is higher than the upper part of the auxiliary tank. The upper end of the return pipe is connected to the upper part of the main tank, and the lower end of the return pipe is connected to the upper part of the auxiliary tank. The main tank and the auxiliary tank together form a solution circulation system, which is conducive to temperature uniformity in the main tank.

[0035] A main tank and a secondary tank are connected to form a tank unit. The equipment includes a group of tank units arranged side by side. Each tank unit corresponds to a robot and is equipped with a touch screen and an electrical cabinet, making operation simple and efficient. In other words, each single alkaline etching immersion tank structure includes a main tank and a secondary tank. Heating structures and temperature detection structures are evenly arranged inside the main tank and the secondary tank to ensure that the solution temperature in the main tank and the secondary tank reaches a uniform set temperature.

[0036] like Figures 1 to 4As shown, preferred embodiments of the present invention are:

[0037] The new alkali etching equipment of the present invention can achieve uniform heating of the solution in the tank, detect the solution temperature at different locations in the tank, and ensure uniform solution flow parallel to the glass plane. This can improve the process indicators of alkali etching glass and increase the output yield.

[0038] The equipment includes an installation frame, a main trough, an auxiliary trough, and a basket lifting structure; the installation frame is equipped with a main trough, a liquid supply pump, a pipeline, etc., the main trough is equipped with an automatic flip-up structure, and insulation material is installed outside the trough. The flip-up structure has a double-layer insulation structure and a flip-up motor mechanism. The main trough is equipped with a heating wire, a temperature measuring rod, a liquid drum tube at the bottom of the trough, a servo basket throwing mechanism, and an overflow structure on the top of the trough.

[0039] The surface of the auxiliary tank is provided with insulation material, and multiple L-shaped heating tubes are arranged and installed above the auxiliary tank, extending to the inside of the tank body. A multi-stage detachable overflow baffle is installed inside the auxiliary tank, and multiple temperature probes are installed at different positions inside the auxiliary tank.

[0040] The basket lifting structure can be equipped with a lifting hoist or a handling robot arm.

[0041] The above equipment is a single-slot production equipment (including main and auxiliary slots). According to the actual product mass production situation, multiple single-slot equipment can be combined and equipped with a robotic arm to form a mass production line equipment.

[0042] In order to improve the temperature uniformity of the heated liquid inside the main tank, the main tank heating device adopts a heat-conducting structure made of a material resistant to corrosion by strong alkaline solutions. Heating wires and temperature probes can be installed on the outside of the heat-conducting structure; the heat-conducting structure is evenly welded on both sides of the main tank, and uniform heating and temperature detection can be achieved on the upper, middle and lower sides of the main tank.

[0043] In order to improve the uniformity of the solution temperature inside the main tank and the uniformity of etching the glass surface when the basket is placed in the tank, bubbling tubes are installed on both sides of the main tank and at the bottom of the main tank. The bubbling tubes are evenly arranged pipes, and each pipe has evenly arranged small holes, through which bubbles can be evenly removed. A flat perforated plate is installed above the bottom bubbling tubes. The perforated plate is a plate with evenly arranged through holes on the top, which can achieve uniform bubbling at the bottom and uniform upward flow of the bubbling liquid at the bottom.

[0044] In order to improve the uniformity of the temperature of the solution inside the auxiliary tank after heating, several heating rods are evenly arranged and installed on both sides of the long side of the auxiliary tank; at the same time, temperature probes are evenly arranged and installed to monitor the temperature of the solution inside the auxiliary tank in real time; in order to ensure the thermal insulation of the auxiliary tank, several removable tank covers are installed on the top of the auxiliary tank.

[0045] The present invention addresses the shortcomings of conventional alkaline etching and immersion equipment. Specifically, it solves the problem of low product yield caused by uneven temperature control in the solution temperature control part and uneven reaction of the liquid solution in the existing alkaline etching and immersion equipment. The present invention achieves uniform solution temperature within the tank, thereby improving product yield.

[0046] The above is only an illustration of a preferred embodiment of the present invention. The above technical features can be arbitrarily combined to form multiple embodiments of the present invention.

[0047] The present invention is described above by way of example in conjunction with the accompanying drawings. It is obvious that the specific implementation of the present invention is not limited to the above-mentioned method. As long as various non-substantial improvements are made using the concept and technical solution of the present invention, or the concept and technical solution of the present invention are directly applied to other occasions without improvement, they are all within the scope of protection of the present invention.

Claims

1. A novel alkaline etching device, comprising a basket lifting structure and a main tank for holding an etching solution for etching, wherein the main tank is provided with an internal heating structure, characterized in that: It also includes a sub-tank and a liquid supply pump. The sub-tank is connected to the bottom of the main tank through the liquid supply pump and the liquid inlet pipe, and the upper part of the main tank is connected to the sub-tank through the liquid return pipe. A group of sub-tank heating structures are provided in the sub-tank.

2. The novel alkali etching equipment according to claim 1, wherein: The top of the main tank is provided with a heat-insulating upper cover which can be flipped open.

3. The novel alkali etching equipment as claimed in claim 1, characterized in that: A tank body insulation layer is provided on the outside of the main tank.

4. The novel alkali etching equipment as claimed in claim 1, wherein: The bottom of the main tank is provided with a tank bottom liquid-filling structure for filling liquid.

5. The novel alkali etching equipment as claimed in claim 1, characterized in that: One main tank and one auxiliary tank are connected to form a tank unit, and the device includes a group of tank units arranged side by side.

6. The novel alkali etching equipment as claimed in claim 1, characterized in that: A group of heating pipes are arranged and installed above the auxiliary tank, and the heating pipes extend into the interior of the tank body. A multi-stage detachable overflow baffle is installed inside the auxiliary tank.

7. The novel alkali etching equipment as claimed in claim 1, characterized in that: A group of temperature probes are provided in each of the main tank and the auxiliary tank.

8. The novel alkali etching equipment as claimed in claim 1, characterized in that: The upper part of the main tank is higher than the upper part of the auxiliary tank, the upper end of the liquid return pipe is connected to the upper part of the main tank, and the lower end of the liquid return pipe is connected to the upper part of the auxiliary tank.

9. The novel alkali etching equipment as claimed in claim 2, characterized in that: The heat-insulating upper cover is provided with an exhaust structure.

10. The novel alkali etching equipment according to claim 4, characterized in that: The liquid drum structure at the bottom of the tank body comprises a liquid drum pipe, a bubble pipe and a perforated plate arranged at the bottom of the main tank.

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