Touch panel, method of manufacturing touch panel, and display device including the touch panel

Abstract

The invention relates to a touch panel, a manufacturing method of the touch panel, and a display device including the touch panel. The touch panel includes: a substrate including a sensing area and a peripheral area surrounding at least a portion of the sensing area; a first touch insulating layer disposed on the substrate and defining at least one first opening portion exposing at least a portion of the substrate in the sensing area; a first touch electrode array including a plurality of first touch electrodes arranged in a first direction in the sensing area on the first touch insulating layer and a connection portion connecting adjacent first touch electrodes among the plurality of first touch electrodes; and a second touch electrode array including a plurality of second touch electrodes arranged in a second direction intersecting the first direction in the same layer as the plurality of first touch electrodes in the sensing region, and defining a 2-1 opening overlapping the first opening on a plane between the second touch electrode array and the first touch electrode array.

Description

Technical Field

[0001] The present invention relates to a touch panel, a method for manufacturing the touch panel, and a display device including the touch panel. Background Art

[0002] With the advancement of information technology, the importance of display devices as a medium connecting users and information is becoming increasingly prominent. Consequently, the use of display devices such as liquid crystal display devices, organic light emitting display devices, and plasma display devices is increasing.

[0003] Recently, touch panels that recognize touch input are being used as input devices for display devices, mainly smartphones and tablet personal computers. The touch panel determines whether a user has inputted a touch and calculates the corresponding position as touch input coordinates. Summary of the Invention

[0004] An object of the present invention is to provide a touch panel that reduces the risk of electrical short circuits.

[0005] Another object of the present invention is to provide a method for manufacturing the touch panel.

[0006] Another object of the present invention is to provide a display device including the touch panel.

[0007] However, the objects of the present invention are not limited to the above objects, and can be expanded in various ways without departing from the spirit and scope of the present invention.

[0008] In order to achieve the aforementioned one purpose of the present invention, the touch panel according to an embodiment of the present invention may include: a substrate, including a sensing area and a peripheral area surrounding at least a portion of the sensing area; a first touch insulating layer, arranged on the substrate and defining at least one first opening portion in the sensing area for exposing at least a portion of the substrate; a first touch electrode array, including a plurality of first touch electrodes arranged along a first direction on the first touch insulating layer in the sensing area and a connecting portion connecting adjacent first touch electrodes among the plurality of first touch electrodes; and a second touch electrode array, including a plurality of second touch electrodes arranged in the sensing area on the same layer as the plurality of first touch electrodes along a second direction intersecting the first direction, and defining a 2-1 opening portion overlapping with the first opening portion on a plane between the first touch electrode array and the second touch electrode array.

[0009] In one embodiment, the width of the first opening may be greater than the width of the 2-1st opening.

[0010] In one embodiment, each of the first touch electrode array and the second touch electrode array may cover a side surface of the first touch insulation layer exposed by the first opening.

[0011] In one embodiment, inside the first opening, a metal residual film including the same material as the first touch electrode array and the second touch electrode array may be provided in the outer contour area of ​​the 2-1 opening, and inside the first opening, the metal residual film may not be provided in the central area of ​​the 2-1 opening.

[0012] In one embodiment, the touch panel may further include: at least one island electrode pattern, arranged on the first touch insulating layer in the sensing area, and arranged between second touch electrodes adjacent in the plane among the multiple second touch electrodes; and at least one bridge pattern, arranged between the substrate and the first touch insulating layer in the sensing area, being entirely covered by the first touch insulating layer, and connecting the island electrode pattern with second touch electrodes adjacent to the island electrode pattern among the multiple second touch electrodes.

[0013] In one embodiment, the width of a portion of the 2-1 opening that overlaps with the bridge pattern in a plane may be greater than the width of a portion of the 2-1 opening that does not overlap with the bridge pattern in a plane.

[0014] In one embodiment, a 2-2 opening may be defined between the island electrode pattern and the first touch electrode array.

[0015] In one embodiment, the width of the first opening may be greater than the width of the 2-2 opening.

[0016] In one embodiment, inside the first opening, a metal residual film including the same material as the first touch electrode array and the second touch electrode array may be provided in the outer contour area of ​​the 2-2 opening, and inside the first opening, the metal residual film may not be provided in the central area of ​​the 2-2 opening.

[0017] In one embodiment, the width of the first opening may be smaller than the width of the 2-1 opening and the width of the 2-2 opening.

[0018] In one embodiment, each of the first touch electrode array and the second touch electrode array may not overlap with the first opening in a plane.

[0019] In one embodiment, the touch panel may further include: a second touch insulation layer, arranged on the first touch insulation layer, the first touch electrode array, and the second touch electrode array, and filling the first opening, the 2-1 opening, and the 2-2 opening.

[0020] In order to achieve the aforementioned another object of the present invention, the manufacturing method of a touch panel according to an embodiment of the present invention may include the following steps: forming a first metal layer on a substrate including a sensing area and a peripheral area surrounding at least a portion of the sensing area; forming a metal pattern overlapping with the sensing area by removing a portion of the first metal layer; forming a first touch insulating layer covering the metal pattern on the substrate; forming at least one first opening portion exposing the metal pattern by removing a portion of the first touch insulating layer; forming a first touch electrode array and a second touch electrode array with a 2-1 opening portion overlapping with the first opening portion on the first touch insulating layer in the sensing area; and removing the metal pattern.

[0021] In one embodiment, the width of the first opening may be greater than the width of the 2-1st opening.

[0022] In one embodiment, the steps of forming the first touch electrode array and the second touch electrode array may include the following steps: forming a second metal layer on the first touch insulation layer and the metal pattern; and forming a metal residual film, the first touch electrode array, and the second touch electrode array on the substrate and the metal pattern by removing a portion of the second metal layer.

[0023] In one embodiment, in the step of removing the metal pattern, the metal pattern and the metal residual film on the metal pattern may be removed simultaneously.

[0024] In one embodiment, the first touch electrode array may include: a plurality of first touch electrodes extending along a first direction; and a connecting portion connecting adjacent first touch electrodes among the plurality of first touch electrodes, and the second touch electrode array may include: a plurality of second touch electrodes arranged in the same layer as the plurality of first touch electrodes along a second direction intersecting the first direction.

[0025] In one embodiment, the step of forming the first touch electrode array and the second touch electrode array may include the following steps: forming at least one island electrode pattern on the first touch insulating layer in the sensing area between two second touch electrodes adjacent in a plane among the plurality of second touch electrodes. The step of forming the metal pattern may include the following steps: forming at least one bridge pattern between the substrate and the first touch insulating layer in the sensing area, the bridge pattern being entirely covered by the first touch insulating layer and connecting the island electrode pattern to a second touch electrode adjacent to the island electrode pattern among the plurality of second touch electrodes. A 2-2 opening having a width smaller than the width of the first opening may be defined between the island electrode pattern and the first touch electrode array.

[0026] In order to achieve another object of the present invention as mentioned above, a display device according to an embodiment of the present invention may include: a display panel, including a display area in which a plurality of pixels are arranged and a non-display area surrounding at least a portion of the display area; and a touch panel, arranged on the display panel, the touch panel including: a substrate, including a sensing area corresponding to the display area and a peripheral area surrounding at least a portion of the sensing area and corresponding to the non-display area; a first touch insulating layer, arranged on the substrate and defining at least one first opening portion in the sensing area for exposing at least a portion of the substrate; a first touch electrode array, including a plurality of first touch electrodes arranged along a first direction on the first touch insulating layer in the sensing area and a connecting portion connecting adjacent first touch electrodes of the plurality of first touch electrodes; and a second touch electrode array, including a plurality of second touch electrodes arranged in the sensing area on the same layer as the plurality of first touch electrodes along a second direction intersecting the first direction, and defining a second opening portion overlapping with the first opening portion on a plane between the first touch electrode array and the second touch electrode array.

[0027] In one embodiment, the width of the first opening may be greater than the width of the second opening.

[0028] In an embodiment of the present invention, a touch panel may include: a first touch insulating layer having at least one first opening defined in a sensing area, exposing a portion of the substrate; a first touch electrode array comprising a plurality of first touch electrodes arranged on the first touch insulating layer and aligned along a first direction; and a second touch electrode array comprising a plurality of second touch electrodes arranged on the first touch insulating layer and aligned along a second direction. A second opening is defined between the first and second touch electrode arrays, overlapping the first opening in a plane. This minimizes or reduces the risk of electrical short circuits caused by residual metal film.

[0029] However, the effects of the present invention are not limited to the above-mentioned effects, and can be expanded in various ways within the scope not departing from the idea and scope of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Figure 1 is a plan view showing a display device according to an embodiment of the present invention.

[0031] Figure 2 It shows Figure 1 A diagram showing a shape in which the display device is curved.

[0032] Figure 3 It is schematically shown Figure 1 A cross-sectional view of a display device.

[0033] Figure 4 It shows Figure 3 A plan view of the display panel.

[0034] Figure 5 It is along Figure 4 Cross-sectional view taken along line I-I'.

[0035] Figure 6 It shows Figure 3 A plan view of the touch panel.

[0036] Figure 7 It is enlarged to show Figure 6 Floor plan of area A.

[0037] Figure 8 It is a plan view for explaining the width of the opening defined between the first pattern and the second pattern.

[0038] Figure 9 It is along Figure 7 Cross-sectional view taken along line Ⅱ-Ⅱ'.

[0039] Figure 10 is shown along Figure 7 An example of a cross-sectional view taken along line III-III' and line IV-IV'.

[0040] Figures 11 to 19 Is used to illustrate Figure 10 A cross-sectional view of a method for manufacturing a touch panel.

[0041] Figure 20 is shown along Figure 7 Another example of a cross-sectional view taken along lines III-III' and IV-IV'.

[0042] Description of Reference Numerals DETAILED DESCRIPTION

[0043] Hereinafter, a touch panel, a method for manufacturing a touch panel, and a display device including a touch panel according to embodiments of the present invention will be described in detail with reference to the accompanying drawings. The same reference numerals are used for the same components in the drawings, and repeated description of the same components will be omitted.

[0044] Figure 1 is a plan view showing a display device according to an embodiment of the present invention. Figure 2 It shows Figure 1 A diagram showing a shape in which the display device is curved.

[0045] Reference Figure 1 and Figure 2 , a display device DD according to an embodiment of the present invention may include a display panel DP.

[0046] The display panel DP may include a display area DA and a non-display area NDA. The display area DA may be a region capable of generating light or displaying an image by adjusting the transmittance of light provided by an external light source. The non-display area NDA may be a region where no image is displayed. The non-display area NDA may be located around the display area DA. For example, the non-display area NDA may entirely surround the display area DA.

[0047] A plurality of pixels may be arranged in the display area DA. Each of the pixels may emit light. Since the pixels emit light, the display area DA may display an image.

[0048] Wirings connected to the pixels may also be arranged in the display area DA, for example, the wirings may include data wirings, scan signal wirings, power wirings, and the like.

[0049] A driving unit for driving the pixels may be disposed in the non-display area NDA. For example, the driving unit may include a scanning driving unit, a light emitting driving unit, a power supply voltage generating unit, a timing controller, etc. The pixels may emit light based on signals received from the driving unit.

[0050] The non-display area NDA may include a bending area BA and a pad area PDA. The pad area PDA may be located on one side of the display area DA. Specifically, the pad area PDA may be spaced apart from the one side of the display area DA in a direction opposite to the second direction DR2 parallel to the upper surface of the display panel DP.

[0051] In the pad area PDA, a signal pad for electrically connecting the display driving circuit to the connection film may be arranged. Figure 4 This will be described later.

[0052] The bending area BA may be located between the display area DA and the pad area PDA on a plane. Figure 2 As shown, the bending area BA may be bent about a bending axis extending along the first direction DR1. In this case, the pad area PDA may overlap in plane with the main area AA defined by the display area DA and a portion of the non-display area NDA. Specifically, the pad area PDA may be located below the main area AA. The display device DD may be provided in a shape in which the bending area BA is bent about the bending axis.

[0053] In this specification, a plane may be defined by a first direction DR1 and a second direction DR2 intersecting the first direction DR1. For example, the first direction DR1 may be perpendicular to the second direction DR2. Furthermore, the third direction DR3 may be perpendicular to the plane.

[0054] For example, the display device DD may be an organic light emitting display device (OLED), a liquid crystal display device (LCD), a quantum dot emission display device (QDOD), a micro light emitting diode display device (LED), a field emission display device (FED), a plasma display device (PDP), or an electrophoretic display device (EPD). The following description focuses on the case where the display device DD is an organic light emitting display device, but embodiments of the present invention are not necessarily limited to this.

[0055] Figure 3 It is schematically shown Figure 1 A cross-sectional view of a display device.

[0056] Reference Figure 1 and Figure 3 , a display device DD according to an embodiment of the present invention may include a display panel DP, a sealing member SLM, and a touch panel TP.

[0057] The display panel DP may include a first substrate SUB1, a circuit layer CL, and a light emitting element layer EL.

[0058] The first substrate SUB1 can include a transparent or opaque material. For example, the first substrate SUB1 can include an insulating material such as glass, quartz, or a polymer resin. Examples of polymer resins that can be used for the first substrate SUB1 include polyethersulfone (PES), polyacrylate (PA), polyarylate (PAR), polyetherimide (PEI), polyethylene naphthalate (PEN), polyethylene terephthalate (PET), polyimide (PI), and polycarbonate (PC). These materials can be used alone or in combination. Optionally, the first substrate SUB1 can also include a metal material. However, embodiments of the present invention are not limited to this.

[0059] The circuit layer CL may be arranged on the first substrate SUB1. For example, the circuit layer CL may include transistors, data lines, scan signal lines, power lines, scan control lines, and the like. The circuit layer CL may overlap with the display area DA and the non-display area NDA. Specifically, the transistors, data lines, scan signal lines, and power lines of the circuit layer CL may overlap with the display area DA, and the scan control lines may overlap with the non-display area NDA. A detailed description of the components of the circuit layer CL will be provided later.

[0060] The light-emitting element layer EL may be disposed on the circuit layer CL. The light-emitting element layer EL may include light-emitting elements that generate light and a pixel definition film that defines pixels. The light-emitting elements of the light-emitting element layer EL may overlap with the display area DA. A detailed description of the components of the light-emitting element layer EL will be provided later.

[0061] The touch panel TP may include a second substrate SUB2 and a touch sensing layer TSL.

[0062] The second substrate SUB2 may include a transparent substance or an opaque substance. For example, the second substrate SUB2 may include an insulating substance such as glass, quartz, a polymer resin, etc. Examples of the polymer resin that can be used as the second substrate SUB2 may include polyethersulfone, polyacrylate, polyarylate, polyetherimide, polyethylene naphthalate, polyethylene terephthalate, polyimide, polycarbonate, etc. They can be used alone or in combination with each other. Optionally, the second substrate SUB2 may also include a metal substance. However, the embodiments of the present invention are not limited to this. In addition, the second substrate SUB2 may serve as a packaging substrate for packaging the light-emitting element layer EL.

[0063] The touch sensing layer TSL may be disposed on the second substrate SUB2. The touch sensing layer TSL may include a plurality of touch electrode arrays for capacitively sensing user touches, a touch pad portion, and a plurality of touch drive wirings and touch sensing wirings electrically connecting the touch pad portion to the touch electrode arrays. For example, the touch sensing layer TSL may sense a user's touch using self-capacitance or mutual capacitance. However, embodiments of the present invention are not limited thereto.

[0064] An anti-reflection layer and a cover window may be additionally disposed on the touch sensing layer TSL. In this case, the anti-reflection layer may be disposed on the touch sensing layer TSL, and the cover window may be attached to the anti-reflection layer by a transparent adhesive member.

[0065] The sealing member SLM can bond the first substrate SUB1 of the display panel DP and the second substrate SUB2 of the touch panel TP in the non-display area NDA. For example, the sealing member SLM can include a frit adhesive layer, an ultraviolet curable resin, or a thermosetting resin. However, embodiments of the present invention are not limited thereto.

[0066] exist Figure 3 Although an empty space is shown between the light-emitting element layer EL and the second substrate SUB2, embodiments of the present invention are not limited thereto. For example, a filling film may be disposed between the light-emitting element layer EL and the second substrate SUB2. The filling film may include an epoxy filling film or a silicon filling film. However, embodiments of the present invention are not limited thereto.

[0067] Figure 4 It shows Figure 3 A plan view of the display panel.

[0068] Reference Figure 1 、 Figure 3 and Figure 4As described above, the display device DD may include a display panel DP. Furthermore, the display device DD may include a display driver circuit DIC, a connection film CF, and a touch driver circuit TDC. Here, the display panel DP may include a plurality of pixels PX, a scan driver SDV, scan signal lines SL, scan control lines CSL, power lines PL, data lines DL, and a plurality of signal pads SE1.

[0069] Pixels PX may be arranged in the display area DA. Specifically, the pixels PX may be arranged in a matrix along a first direction DR1 and a second direction DR2 in the display area DA. For example, each pixel PX may include at least one driving transistor, at least one switching transistor, a light-emitting element (e.g., an organic light-emitting diode), and at least one capacitor. A scan driver SDV may be disposed in the non-display area NDA. The scan driver SDV may provide various signals for driving the pixels PX.

[0070] The signal pads SE1 may be arranged in the pad area PDA. The signal pads SE1 may be spaced apart from each other along the first direction DR1. The signal pads SE1 may be electrically connected to the display driver circuit DIC via wiring. Each signal pad SE1 may include a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive material, or the like. These materials may be used alone or in combination.

[0071] The scan signal lines SL, data lines DL, and power lines PL may be electrically connected to the pixels PX and may be arranged in the display area DA. The scan control lines CSL may be electrically connected to the scan driving part SDV and may be arranged in the non-display area NDA.

[0072] The scan signal lines SL may extend along the first direction DR1 , may be electrically connected to the scan driving part SDV, and may receive scan signals from the scan driving part SDV and provide the scan signals to the pixels PX.

[0073] The data wiring DL may extend along the second direction DR2 . The data wiring DL may be electrically connected to the display driving circuit DIC . The data wiring DL may receive a data voltage from the display driving circuit DIC and provide the data voltage to the pixel PX.

[0074] The power wiring PL may extend along the second direction DR2. The power wiring PL may be electrically connected to the display driver circuit DIC. The power wiring PL may receive a power voltage from the display driver circuit DIC and provide the power voltage to the pixel PX. For example, the power voltage may be a high power voltage for driving the pixel PX.

[0075] The scan control line CSL may be electrically connected to the display driving circuit DIC. Accordingly, the scan control line CSL may receive a control signal from the display driving circuit DIC and provide the control signal to the scan driving unit SDV.

[0076] The display driver circuit DIC may be disposed in the pad area PDA on the display panel DP. Specifically, the display driver circuit DIC may be disposed in a planar manner between the connection film CF and the display area DA. The display driver circuit DIC may generate various signals and voltages for driving the pixels PX. For example, the display driver circuit DIC may provide the data voltages to the data lines DL, the power voltage to the power lines PL, and the control signals to the scan control lines CSL.

[0077] For example, the display driving circuit DIC can be formed as an integrated circuit and attached to the display panel DP via a chip on plastic (COP) or chip on glass (COG) method. Optionally, the display driving circuit DIC can also be attached to a connection film CF.

[0078] The connection film CF may be attached to the signal pad SE1 of the display panel DP using an adhesive member. The adhesive member may include an anisotropic conductive film. For example, the connection film CF may be a printed circuit board (PCB), a flexible printed circuit board (FPCB), or a flexible film.

[0079] The touch drive circuit TDC may be arranged on the connection film CF. Specifically, the touch drive circuit TDC may be formed as an integrated circuit and mounted on the connection film CF. The touch drive circuit TDC may be connected to the touch screen through the connection film CF and the signal pad SE1. Figure 3 and Figure 6 The touch panel TP is electrically connected.

[0080] like Figure 4 As shown, the structure in which the touch driving circuit TDC is arranged on the connection film CF can be applied to Figure 3 The touch sensing layer TSL is directly arranged on the display panel DP. In this case, Figure 3 The second substrate SUB2 and the sealing member SLM may be omitted. However, the embodiments of the present invention are not limited thereto. Figure 3As shown, in the case where the display device DD has a structure in which the touch panel TP is manufactured separately and arranged on the display panel DP, the touch driving circuit TDC can be mounted on a separate touch circuit substrate, and the touch circuit substrate can also be attached to the touch pad portion of the touch panel TP (for example, Figure 6 touch pad portion TPP).

[0081] The touch drive circuit TDC can apply a touch drive signal to the touch electrodes of the touch panel TP and measure the capacitance of the touch electrodes. The touch drive signal can be a signal having multiple drive pulses. The touch drive circuit TDC can determine whether a touch input has occurred based on the capacitance value and calculate the touch coordinates where the touch was input.

[0082] Figure 5 It is along Figure 4 For example, Figure 5 It shows Figure 4 A cross-sectional view of a portion of the display area DA.

[0083] Reference Figure 5 The display panel DP may include a first substrate SUB1, a circuit layer CL disposed on the first substrate SUB1, and a light emitting element layer EL disposed on the circuit layer CL. Here, the circuit layer CL may include a buffer layer BUF, a transistor TR, a first insulating layer IL1, a second insulating layer IL2, and a third insulating layer IL3. The light emitting element layer EL may include a light emitting element LED and a pixel definition layer PDL.

[0084] A buffer layer BUF may be disposed on the first substrate SUB1. The buffer layer BUF may prevent metal atoms or impurities from diffusing from the first substrate SUB1 to the transistor TR. Furthermore, if the surface of the first substrate SUB1 is uneven, the buffer layer BUF may improve the flatness of the surface of the first substrate SUB1. For example, the buffer layer BUF may include silicon oxide (SiO x ), silicon nitride (SiN x ), silicon oxynitride (SiO x N y ) etc. These can be used alone or in combination with each other.

[0085] An active pattern ACT may be disposed on the buffer layer BUF. The active pattern ACT may include a metal oxide semiconductor, an inorganic semiconductor (e.g., amorphous silicon, polysilicon), or an organic semiconductor. The active pattern ACT may include a source region, a drain region, and a channel region located between the source and drain regions.

[0086] The metal oxide semiconductor may include a binary compound (AB) containing indium (In), zinc (Zn), gallium (Ga), tin (Sn), titanium (Ti), aluminum (Al), hafnium (Hf), zirconium (Zr), magnesium (Mg), etc. x ), ternary compounds (AB x C y ), quaternary compounds (AB x C y D z ) etc. For example, the metal oxide semiconductor may include zinc oxide (ZnO x ), gallium oxide (GaO x ), tin oxide (SnO x ), indium oxide (InO x ), indium gallium oxide (IGO), indium zinc oxide (IZO), indium tin oxide (ITO), indium zinc tin oxide (IZTO), indium gallium zinc oxide (IGZO), etc. These can be used alone or in combination with each other.

[0087] A first insulating layer IL1 may be disposed on the buffer layer BUF. The first insulating layer IL1 may sufficiently cover the active pattern ACT and may have a substantially flat upper surface without generating a step difference around the active pattern ACT. Optionally, the first insulating layer IL1 may cover the active pattern ACT and may also be disposed with a uniform thickness along the contour of the active pattern ACT. For example, the first insulating layer IL1 may include a material such as silicon oxide, silicon nitride, silicon oxynitride, silicon carbide (SiC x ), silicon carbide oxide (SiO x C y ) etc. These can be used alone or in combination with each other.

[0088] A gate electrode GAT may be disposed on the first insulating layer IL1. The gate electrode GAT may overlap with the channel region of the active pattern ACT. The gate electrode GAT may include a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive substance, or the like. Examples of the metal include silver (Ag), molybdenum (Mo), aluminum (Al), tungsten (W), copper (Cu), nickel (Ni), chromium (Cr), titanium (Ti), tantalum (Ta), platinum (Pt), scandium (Sc), and the like. Examples of the conductive metal oxide include indium tin oxide, indium zinc oxide, and the like. Furthermore, examples of the metal nitride include aluminum nitride (AlN x ), tungsten nitride (WN x ), chromium nitride (CrN x ) etc. They can be used alone or in combination with each other.

[0089] A second insulating layer IL2 may be disposed on the first insulating layer IL1. The second insulating layer IL2 may fully cover the gate electrode GAT and may have a substantially flat upper surface without creating a step around the gate electrode GAT. Optionally, the second insulating layer IL2 may cover the gate electrode GAT and may also be disposed with a uniform thickness along the contours of each gate electrode GAT. For example, the second insulating layer IL2 may include an inorganic substance such as silicon oxide, silicon nitride, silicon oxynitride, silicon carbide, or silicon oxycarbide. These may be used alone or in combination.

[0090] A source electrode SE and a drain electrode DE may be disposed on the second insulating layer IL2. The source electrode SE may be connected to the source region of the active pattern ACT via a contact hole extending through the first portion of the first insulating layer IL1 and the second insulating layer IL2. The drain electrode DE may be connected to the drain region of the active pattern ACT via a contact hole extending through the second portion of the first insulating layer IL1 and the second insulating layer IL2. For example, each of the source electrode SE and the drain electrode DE may include a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive substance, or the like. These materials may be used alone or in combination.

[0091] Accordingly, the transistor TR including the active pattern ACT, the gate electrode GAT, the source electrode SE, and the drain electrode DE may be arranged in the display area DA on the first substrate SUB1.

[0092] A third insulating layer IL3 may be disposed on the second insulating layer IL2. The third insulating layer IL3 may fully cover the source electrode SE and the drain electrode DE. The third insulating layer IL3 may include an inorganic substance or an organic substance. For example, the third insulating layer IL3 may include an organic substance such as phenolic resin, polyacrylate resin, polyimide resin, polyamide resin, siloxane resin, or epoxy resin. These may be used alone or in combination.

[0093] An anode electrode ADE may be disposed on the third insulating layer IL3. The anode electrode ADE may be connected to the drain electrode DE (or source electrode SE) of the transistor TR via a contact hole penetrating the third insulating layer IL3. For example, the anode electrode ADE may include a metal, an alloy, a metal nitride, a conductive metal oxide, a transparent conductive material, or the like. These materials may be used alone or in combination. In one embodiment, the anode electrode ADE may have a stacked structure including ITO / Ag / ITO.

[0094] A pixel definition layer (PDL) may be disposed on the third insulating layer IL3. The pixel definition layer (PDL) may cover the edge of the anode electrode ADE. The pixel definition layer (PDL) may include an inorganic substance or an organic substance. For example, the pixel definition layer (PDL) may include an organic substance such as epoxy resin or silicone resin. These may be used alone or in combination. In another embodiment, the pixel definition layer (PDL) may also include an organic substance containing a light-shielding substance such as a black pigment or a black dye.

[0095] A light emitting layer (EML) may be disposed on the anode electrode (ADE). The light emitting layer (EML) may include an organic material that emits light of a predetermined color. For example, the light emitting layer (EML) may include an organic material that emits red light, green light, or blue light.

[0096] A cathode electrode CTE may be disposed on the light emitting layer EML and the pixel definition layer PDL. For example, the cathode electrode CTE may include metal, alloy, metal nitride, conductive metal oxide, transparent conductive material, etc. These may be used alone or in combination.

[0097] Figure 6 It shows Figure 3 A plan view of the touch panel. Figure 7 It is enlarged to show Figure 6 Floor plan of area A.

[0098] Reference Figure 3 、 Figure 6 and Figure 7 The touch panel TP may include a sensing area SA for sensing a user's touch and a peripheral area PA for not sensing a user's touch. The peripheral area PA may be located around the sensing area SA. For example, the peripheral area PA may entirely surround the sensing area SA.

[0099] The sensing area SA can be Figure 1 and Figure 4 The display area DA corresponds to the peripheral area PA. Figure 1 and Figure 4That is, the sensing area SA may overlap with the display area DA, and the peripheral area PA may overlap with the non-display area NDA. Optionally, the sensing area SA may also partially overlap with the non-display area NDA.

[0100] The touch panel TP may include a plurality of first touch electrode arrays TEA1, a plurality of second touch electrode arrays TEA2, a plurality of driving wirings TX1-1, TX2-1, TX3-1, TX1-2, TX2-2, TX3-2, a plurality of sensing wirings RX1, RX2, RX3, RX4, RX5, a plurality of guard wirings G1, G2, G3, G4, a plurality of ground wirings ES1, ES2, and a touch pad portion TPP.

[0101] The first touch electrode array TEA1 and the second touch electrode array TEA2 may be arranged in the sensing area SA. A plurality of drive wirings TX1-1, TX2-1, TX3-1, TX1-2, TX2-2, TX3-2, a plurality of sensing wirings RX1, RX2, RX3, RX4, RX5, a plurality of guard wirings G1, G2, G3, G4, a plurality of ground wirings ES1, ES2, and a touch pad portion TPP may be arranged in the peripheral area PA.

[0102] Each of the first touch electrode arrays TEA1 may extend along the first direction DR1, and the first touch electrode arrays TEA1 may be repeatedly arranged along the second direction DR2.

[0103] Furthermore, each of the second touch electrode arrays TEA2 may extend along the second direction DR2, and the second touch electrode arrays TEA2 may be repeatedly arranged along the first direction DR1. Here, the term "extend" may refer to extending in a direction in which a plurality of touch electrodes that are not directly connected to each other are arranged.

[0104] The first touch electrode array TEA1 may include a plurality of first touch electrodes TE1 and a connection portion CP, and the second touch electrode array TEA2 may include a plurality of second touch electrodes TE2. In the sensing area SA, the touch panel TP may further include: an island electrode pattern TIP arranged between adjacent second touch electrodes TE2; a first bridge pattern BP1 connecting the second touch electrodes TE2 and the island electrode pattern TIP; and a second bridge pattern BP2 connecting adjacent first touch electrodes TE1 and second touch electrodes TE2.

[0105] In one embodiment, the first touch electrode array TEA1, the second touch electrode array TEA2, and the island electrode pattern TIP may comprise the same material and may be arranged on the same layer. That is, the first touch electrode array TEA1, the second touch electrode array TEA2, and the island electrode pattern TIP may be formed by the same process.

[0106] The first touch electrode array TEA1, the second touch electrode array TEA2, and the island electrode pattern TIP may include a conductive metal oxide. For example, the first touch electrode array TEA1, the second touch electrode array TEA2, and the island electrode pattern TIP may include indium gallium oxide (IGO), indium zinc oxide (IZO), indium tin oxide (ITO), indium zinc tin oxide (IZTO), indium gallium zinc oxide (IGZO), etc. These may be used alone or in combination. In one embodiment, the first touch electrode array TEA1, the second touch electrode array TEA2, and the island electrode pattern TIP may include indium tin oxide (ITO).

[0107] In one embodiment, the first bridge pattern BP1 and the second bridge pattern BP2 may include the same material and be disposed on the same layer. That is, the first bridge pattern BP1 and the second bridge pattern BP2 may be formed by the same process.

[0108] The first bridge pattern BP1 and the second bridge pattern BP2 may include a conductive material. In one embodiment, the first bridge pattern BP1 and the second bridge pattern BP2 may include molybdenum (Mo), aluminum (Al), platinum (Pt), silver (Ag), gold (Au), nickel (Ni), titanium (Ti), tantalum (Ta), copper (Cu), niobium (Nb), or the like. These materials may be used alone or in combination. Each of the first bridge pattern BP1 and the second bridge pattern BP2 may be formed as a single layer or multiple layers. In one embodiment, the first bridge pattern BP1 and the second bridge pattern BP2 may include molybdenum-niobium (MoNb).

[0109] One of the first touch electrode TE1 and the second touch electrode TE2 may be a driving electrode, and the other may be a sensing electrode. In this embodiment, the case where the first touch electrode TE1 is a sensing electrode and the second touch electrode TE2 is a driving electrode is described as an example.

[0110] The first touch electrodes TE1 may be repeatedly arranged along the first direction DR1 and may be electrically connected to each other along the first direction DR1. Specifically, adjacent first touch electrodes TE1 may be connected to each other via a connection portion CP disposed therebetween. The connection portion CP may be integrally formed with the first touch electrode TE1.

[0111] For example, a portion of the first touch electrode TE1 may have a diamond shape on a plane. In this case, another portion of the first touch electrode TE1 adjacent to the edge of the sensing area SA may have a diamond shape cut in half on a plane.

[0112] The second touch electrodes TE2 may be repeatedly arranged along the second direction DR2 and may be electrically connected to each other along the second direction DR2. Specifically, at least one island electrode pattern TIP may be arranged between adjacent second touch electrodes TE2. The island electrode pattern TIP and adjacent second touch electrodes TE2 may be connected via a first bridge pattern BP1. The first bridge pattern BP1 may be connected to the second touch electrode TE2 via a first contact hole CNT1 and may be connected to the island electrode pattern TIP via a second contact hole CNT2.

[0113] For example, two island electrode patterns TIP and four first bridge patterns BP1 may be arranged between two adjacent second touch electrodes TE2. In this case, even if one of the four first bridge patterns BP1 is disconnected, the adjacent second touch electrodes TE2 may be connected to each other. However, the present invention is not limited thereto.

[0114] For example, a portion of the second touch electrode TE2 may have a diamond shape on a plane. In this case, another portion of the second touch electrode TE2 adjacent to the edge of the sensing area SA may have a diamond shape cut in half on a plane.

[0115] Adjacent first touch electrodes TE1 and second touch electrodes TE2 can be connected to each other via a second bridge pattern BP2. Specifically, the second bridge pattern BP2 can be connected to the first touch electrode TE1 via a third contact hole CNT3, and can be connected to the second touch electrode TE2 via a fourth contact hole CNT4. Even if a portion of the first bridge pattern BP1 is disconnected, the second bridge pattern BP2 can electrically connect adjacent second touch electrodes TE2. Optionally, the second bridge pattern BP2 can also be omitted.

[0116] For example, based on two first touch electrodes TE1 and two second touch electrodes TE2 adjacent to each other, four second bridge patterns BP2 may be arranged. However, the present invention is not limited thereto.

[0117] The first touch electrode array TEA1, the second touch electrode array TEA2, and the island electrode pattern TIP are physically separated from each other, and a gap (GAP) may exist between them. That is, a second opening OP2 may be defined between the first touch electrode array TEA1, the second touch electrode array TEA2, and the island electrode pattern TIP. In one embodiment, a 2-1 opening OP2-1 may be defined between the adjacent first touch electrode array TEA1 and the second touch electrode array TEA2, and a 2-2 opening OP2-2 may be defined between the adjacent first touch electrode array TEA1 and the island electrode pattern TIP.

[0118] The drive wirings TX1-1, TX2-1, TX3-1, TX1-2, TX2-2, and TX3-2 may be connected to the second touch electrode array TEA2. Specifically, the drive wirings TX1-1, TX2-1, TX3-1, TX1-2, TX2-2, and TX3-2 may include first drive wirings TX1-1, TX2-1, and TX3-1 connected to the lower end of the second touch electrode array TEA2 and second drive wirings TX1-2, TX2-2, and TX3-2 connected to the upper end of the second touch electrode array TEA2. The first drive wirings TX1-1, TX2-1, and TX3-1 may extend from the touch pad portion TPP along the second direction DR2 and connect to the lower end of the second touch electrode array TEA2. The second drive wirings TX1-2, TX2-2, and TX3-2 may extend from the touch pad portion TPP along the second direction DR2 and detour around the left edge of the sensing area SA to connect to the upper end of the second touch electrode array TEA2.

[0119] The sensing wirings RX1, RX2, RX3, RX4, and RX5 may be connected to the first touch electrode array TEA1. Specifically, one of the sensing wirings RX1, RX2, RX3, RX4, and RX5 may be connected to one of the first touch electrode arrays TEA1. Each of the sensing wirings RX1, RX2, RX3, RX4, and RX5 may extend from the touch pad portion TPP along the second direction DR2 and may extend along the right edge of the sensing area SA, thereby connecting to the right end of the first touch electrode array TEA1.

[0120] The driving wirings TX1-1, TX2-1, TX3-1, TX1-2, TX2-2, and TX3-2 may be applied with touch driving signals via the touch pad portion TPP. Accordingly, the touch driving signals may be provided to the second touch electrode array TEA2. The first touch electrode array TEA1 may be applied with touch sensing signals, which may be provided to the sensing wirings RX1, RX2, RX3, RX4, and RX5.

[0121] Ground wiring ES1 and ES2 may be arranged at the outermost portions of the drive wiring TX1-1, TX2-1, TX3-1, TX1-2, TX2-2, TX3-2 and the sensing wiring RX1, RX2, RX3, RX4, RX5. The ground wiring ES1 and ES2 may include a first ground wiring ES1 and a second ground wiring ES2. The first ground wiring ES1 and the second ground wiring ES2 may form a ring shape on a plane surrounding the sensing area SA, the drive wiring TX1-1, TX2-1, TX3-1, TX1-2, TX2-2, TX3-2, and the sensing wiring RX1, RX2, RX3, RX4, RX5. The first ground wiring ES1 and the second ground wiring ES2 may not be connected to each other.

[0122] The first ground wiring ES1 may surround portions of the sensing wirings RX1, RX2, RX3, RX4, RX5 located on the right side of the sensing area SA and portions of the sensing wirings RX1, RX2, RX3, RX4, RX5 extending from the lower side of the sensing area SA in the first direction DR1.

[0123] The second ground wiring ES2 may surround portions of the driving wirings TX1-1, TX2-1, TX3-1, TX1-2, TX2-2, and TX3-2 located on the left side of the sensing area SA and portions of the driving wirings TX1-1, TX2-1, TX3-1, TX1-2, TX2-2, and TX3-2 extending from the upper and lower sides of the sensing area SA along the first direction DR1.

[0124] A first reference voltage signal may be applied to each of the first ground wiring ES1 and the second ground wiring ES2. Each of the first ground wiring ES1 and the second ground wiring ES2 can mitigate electrostatic shock that may be applied from the outside to the driving wiring TX1-1, TX2-1, TX3-1, TX1-2, TX2-2, TX3-2, the sensing wiring RX1, RX2, RX3, RX4, RX5, the first touch electrode array TEA1, and the second touch electrode array TEA2.

[0125] The protection wiring G1, G2, G3, and G4 may be arranged between the drive wiring TX1-1, TX2-1, TX3-1, TX1-2, TX2-2, and TX3-2 and the sensing wiring RX1, RX2, RX3, RX4, and RX5 and / or between the drive wiring TX1-1, TX2-1, TX3-1, TX1-2, TX2-2, and TX3-2 and the sensing wiring RX1, RX2, RX3, RX4, and RX5 and the respective ground wirings ES1 and ES2. The protection wiring G1, G2, G3, and G4 may include a first protection wiring G1, a second protection wiring G2, a third protection wiring G3, and a fourth protection wiring G4.

[0126] The first protection wiring G1 can be arranged between the sensing wirings RX1, RX2, RX3, RX4, and RX5 and the first ground wiring ES1. The second protection wiring G2 can be arranged between the driving wirings TX1-1, TX2-1, TX3-1, TX1-2, TX2-2, and TX3-2 and the sensing wirings RX1, RX2, RX3, RX4, and RX5. The third protection wiring G3 can be arranged between the first driving wirings TX1-1, TX2-1, and TX3-1 and the second driving wirings TX1-2, TX2-2, and TX3-2. The fourth protection wiring G4 can be arranged between the second driving wirings TX1-2, TX2-2, and TX3-2 and the second ground wiring ES2.

[0127] A second reference voltage signal may be applied to each of the first, second, third, and fourth protection wirings G1, G2, G3, and G4. Each of the first, second, third, and fourth protection wirings G1, G2, G3, and G4 can prevent signal interference that may occur between adjacent wirings. For example, the first guard wiring G1 can prevent mutual signal interference between the sensing wirings RX1, RX2, RX3, RX4, and RX5 and the first ground wiring ES1; the second guard wiring G2 can prevent mutual signal interference between the driving wirings TX1-1, TX2-1, TX3-1, TX1-2, TX2-2, and TX3-2 and the sensing wirings RX1, RX2, RX3, RX4, and RX5; the third guard wiring G3 can prevent mutual signal interference between the first driving wirings TX1-1, TX2-1, and TX3-1 and the second driving wirings TX1-2, TX2-2, and TX3-2; and the fourth guard wiring G4 can prevent mutual signal interference between the second driving wirings TX1-2, TX2-2, and TX3-2 and the second ground wiring ES2.

[0128] Figure 8 It is a plan view for explaining the width of the opening defined between the first pattern and the second pattern.

[0129] Reference Figure 8 , the first pattern PT1 and Figure 7 The first touch electrode array TEA1 corresponds to the second pattern PT2. Figure 7 The second touch electrode array TEA2 or the island electrode pattern TIP corresponds to the second touch electrode array TEA2 or the island electrode pattern TIP, and the bridge pattern BP corresponds to the Figure 7 The first bridge pattern BP1 or the second bridge pattern BP2 corresponds to the first bridge pattern BP1 or the second bridge pattern BP2.

[0130] The first pattern PT1 and the second pattern PT2 may be connected to each other by the bridge pattern BP. The first pattern PT1 and the second pattern PT2 may be physically separated from each other, and a gap may exist between them. That is, an opening OP may be defined between the first pattern PT1 and the second pattern PT2.

[0131] The width of the opening OP may vary depending on the location. Specifically, the width WT2 of the portion of the opening OP that overlaps with the bridge pattern BP may be different from the width WT1 of the portion of the opening OP that does not overlap with the bridge pattern BP. In one embodiment, the width WT2 of the portion of the opening OP that overlaps with the bridge pattern BP may be greater than the width WT1 of the portion of the opening OP that does not overlap with the bridge pattern BP. Accordingly, the metal residual film (for example, the residual film) remaining in the opening OP that overlaps with the bridge pattern BP can be minimized or reduced. Figure 9 There is a risk of electrical short circuit caused by residual metal film MR).

[0132] For example, a portion of the opening OP overlapping the bridge pattern BP may have a shape protruding toward the second pattern PT2 . However, embodiments of the present invention are not limited thereto.

[0133] Figure 9 It is along Figure 7 Cross-sectional view taken along line Ⅱ-Ⅱ'. Figure 10 is shown along Figure 7 Hereinafter, the stacking structure of the first bridge pattern BP1, the first touch electrode TE1, the second touch electrode TE2 and the island electrode pattern TIP will be described.

[0134] Reference Figure 7 、 Figure 9 and Figure 10 The touch panel TP may include a sensing area SA and a peripheral area PA. Accordingly, the second substrate SUB2 may also include a sensing area SA and a peripheral area PA.

[0135] A first bridge pattern BP1 may be arranged on the second substrate SUB2. A first touch insulating layer TIL1 may be arranged on the second substrate SUB2 and the first bridge pattern BP1. The first touch insulating layer TIL1 may entirely cover the first bridge pattern BP1. Similarly, the first touch insulating layer TIL1 may also entirely cover the first bridge pattern BP1. Figure 7 The second bridge pattern BP2 is formed. For example, the first touch insulating layer TIL1 may include silicon oxide, silicon nitride, silicon oxynitride, etc. These may be used alone or in combination. In one embodiment, the first touch insulating layer TIL1 may include silicon dioxide (SiO2).

[0136] In one embodiment, at least one first opening OP1 may be defined in the first touch insulation layer TIL1 in the sensing area SA, exposing at least a portion of the second substrate SUB2. For example, the first opening OP1 may extend along the 2-1st opening OP2-1 and along the 2-2nd opening OP2-2. However, the first opening OP1 may not be formed in the portions of the 2-1st opening OP2-1 and the 2-2nd opening OP2-2 that overlap with the first bridge pattern BP1 and the second bridge pattern BP2.

[0137] The first touch electrode TE1, the second touch electrode TE2, the connection portion CP, and the island electrode pattern TIP may be arranged on the first touch insulating layer TIL1. The island electrode pattern TIP is connected to the first bridge pattern BP1 via a second contact hole CNT2 penetrating a portion of the first touch insulating layer TIL1. The second touch electrode TE2 may be connected to the first bridge pattern BP1 via a first contact hole CNT1 penetrating a portion of the first touch insulating layer TIL1.

[0138] As described above, a 2-1st opening OP2-1 may be defined between the adjacent first touch electrode TE1 and the second touch electrode TE2, and a 2-2nd opening OP2-2 may be defined between the adjacent first touch electrode TE1 and the island electrode pattern TIP and between the adjacent connection portion CP and the island electrode pattern TIP.

[0139] Each of the 2-1st opening OP2-1 and the 2-2nd opening OP2-2 may overlap with the first opening OP1 in a planar manner. The width W2 of the 2-1st opening OP2-1 may differ from the width W1 of the first opening OP1, and the width W3 of the 2-2nd opening OP2-2 may differ from the width W1 of the first opening OP1. In one embodiment, the width W1 of the first opening OP1 may be greater than the width W2 of the 2-1st opening OP2-1 and the width W3 of the 2-2nd opening OP2-2, respectively. In this case, each of the first touch electrode TE1, the second touch electrode TE2, and the island electrode pattern TIP may cover the side surface of the first touch insulating layer TIL1 exposed by the first opening OP1. Similarly, the connection portion CP may also cover the side surface of the first touch insulating layer TIL1 exposed by the first opening OP1. However, embodiments of the present invention are not limited to this.

[0140] For example, each of the width W2 of the 2-1st opening OP2-1 and the width W3 of the 2-2nd opening OP2-2 may be in the range of several micrometers (μm). When each of the width W2 of the 2-1st opening OP2-1 and the width W3 of the 2-2nd opening OP2-2 is 10 micrometers (μm) or more, the 2-1st opening OP2-1 and the 2-2nd opening OP2-2 can be recognized from the outside.

[0141] In one embodiment, within the first opening OP1, a metal residual film MR comprising the same material as the first touch electrode array TEA1 and the second touch electrode array TEA2 may be provided in the outer area OA of the 2-1 opening OP2-1, while no metal residual film MR may be provided in the central area CA of the 2-1 opening OP2-1. Similarly, within the first opening OP1, a metal residual film MR comprising the same material as the first touch electrode array TEA1 and the second touch electrode array TEA2 may be provided in the outer area OA of the 2-2 opening OP2-2, while no metal residual film MR may be provided in the central area CA of the 2-2 opening OP2-2. Accordingly, the risk of electrical short circuits caused by the metal residual film MR can be minimized or reduced.

[0142] However, in the 2-1 opening portion OP2-1 and the 2-2 opening portion OP2-2 overlapping the first bridge pattern BP1 and the second bridge pattern BP2, the metal residual film MR may be located on the first touch insulation layer TIL1.

[0143] Here, the metal residual film MR represents a pattern that remains after the etching process that removes the metal layer to form the first touch electrode array TEA1, the second touch electrode array TEA2, and the island electrode pattern TIP. In other words, the metal residual film MR represents a pattern that should have been removed by the etching process but was not.

[0144] A second touch insulating layer TIL2 may be disposed on the first touch electrode TE1, the second touch electrode TE2, the island electrode pattern TIP, and the connection portion CP. The second touch insulating layer TIL2 may cover the first touch electrode TE1, the second touch electrode TE2, the island electrode pattern TIP, and the connection portion CP. Furthermore, the second touch insulating layer TIL2 may fill the first opening OP1, the 2-1st opening OP2-1, and the 2-2nd opening OP2-2. For example, the second touch insulating layer TIL2 may include silicon oxide, silicon nitride, silicon oxynitride, or the like. These materials may be used alone or in combination. In one embodiment, the second touch insulating layer TIL2 may include silicon dioxide.

[0145] Refer again Figures 1 to 10In an embodiment of the present invention, a touch panel TP may include: a first touch insulating layer TIL1 having at least one first opening OP1 defined in a sensing area SA, exposing a portion of a second substrate SUB2; a first touch electrode array TEA1 comprising a plurality of first touch electrodes TE1 arranged on the first touch insulating layer TIL1 and aligned along a first direction DR1; and a second touch electrode array TEA2 comprising a plurality of second touch electrodes TE2 arranged on the first touch insulating layer TIL1 and aligned along a second direction DR2. A second opening OP2 may be defined between the first touch electrode array TEA1 and the second touch electrode array TEA2, overlapping with the first opening OP1 in plane. This minimizes or reduces the risk of electrical shorts caused by the metal residual film MR.

[0146] Figures 11 to 19 Is used to illustrate Figure 10 Hereinafter, the following description will be omitted or simplified with reference to Figure 7 、 Figure 8 and Figure 10 The description content is repeated.

[0147] Reference Figure 11 and Figure 12 The first metal layer ML1 may be entirely formed on the second substrate SUB2. For example, the first metal layer ML1 may be formed using molybdenum-niobium.

[0148] A portion of the first metal layer ML1 is removed by etching, thereby forming a metal pattern MP on the second substrate SUB2. Figure 7 The metal pattern MP may be formed along the first bridge pattern BP1 and the second bridge pattern BP2. Figure 7 The 2-1 opening OP2-1 and the 2-2 opening OP2-2 are extended in the region.

[0149] Reference Figure 13 and Figure 14 The first touch insulating layer TIL1 may be entirely formed on the second substrate SUB2 and the metal pattern MP. The first touch insulating layer TIL1 may be formed to cover the metal pattern MP. For example, the first touch insulating layer TIL1 may be formed using silicon dioxide.

[0150] A portion of the first touch insulating layer TIL1 is removed by an etching process, thereby forming a first opening OP1 that exposes the second substrate SUB2 and the metal pattern MP. The first opening OP1 may be formed to extend along the metal pattern MP. In this case, the first opening OP1 may not expose Figure 7 The first bridge pattern BP1 and the second bridge pattern BP2 are formed.

[0151] Reference Figure 15 The second metal layer ML2 may be formed entirely on the second substrate SUB2, the first touch insulating layer TIL1, and the metal pattern MP. The second metal layer ML2 may be formed to cover the metal pattern MP. For example, the second metal layer ML2 may be formed using indium tin oxide.

[0152] Reference Figure 16 and Figure 17 A photoresist pattern PR may be formed on the second metal layer ML2. The photoresist pattern PR may overlap with the first touch insulation layer TIL1 in a plane and may not overlap with the metal pattern MP. For example, the photoresist pattern PR may be formed using a positive photoresist. However, embodiments of the present invention are not limited thereto.

[0153] By using the photoresist pattern PR as a mask through an etching process, portions of the second metal layer ML2 that do not overlap with the photoresist pattern PR are removed, thereby forming the first touch electrodes TE1, the second touch electrodes TE2, and the island electrode pattern TIP (i.e., the first touch electrode array TEA1, the second touch electrode array TEA2, and the island electrode pattern TIP). Simultaneously, a metal residual film MR may be formed on the second substrate SUB2 and the metal pattern MP.

[0154] Refer again Figure 18 In one embodiment, using the photoresist pattern PR as a mask, the metal pattern MP and the metal residual film MR located on the metal pattern MP can be removed simultaneously. Specifically, the metal residual film MR located in the center area CA of the 2-1st opening OP2-1 and the 2-2nd opening OP2-2 can be removed, while the metal residual film MR located in the outer area OA of the 2-1st opening OP2-1 and the 2-2nd opening OP2-2 can remain. This minimizes or reduces the risk of electrical short circuits caused by the metal residual film MR.

[0155] Refer again Figure 19 , the photoresist pattern PR may be removed.

[0156] Refer again Figure 10 The second touch insulating layer TIL2 may be formed on the first touch electrode TE1, the second touch electrode TE2, and the island electrode pattern TIP. The second touch insulating layer TIL2 may fill the first opening OP1, the 2-1st opening OP2-1, and the 2-2nd opening OP2-2. For example, the second touch insulating layer TIL2 may be formed using silicon dioxide.

[0157] Based on this, it is possible to manufacture Figure 10 The touch panel TP shown.

[0158] Figure 20 is shown along Figure 7 Hereinafter, the cross-sectional view of another example of the cross-sectional view taken along the line III-III' and the line IV-IV' is omitted or simplified. Figure 10 The description content is repeated.

[0159] Reference Figure 20 , a first touch insulation layer TIL1 is arranged on the second substrate SUB2.

[0160] In one embodiment, in the sensing area SA, at least one first opening OP1 may be defined in the first touch insulating layer TIL1 to expose at least a portion of the second substrate SUB2. For example, the first opening OP1 may extend along the 2-1 opening OP2-1 and may extend along the 2-2 opening OP2-2. However, the first opening OP1 may not be formed adjacent to the 2-1 opening OP2-1 and the 2-2 opening OP2-2. Figure 7 and Figure 9 The first bridge pattern BP1 and the second bridge pattern BP2 overlap.

[0161] A first touch electrode TE1, a second touch electrode TE2, and an island electrode pattern TIP may be arranged on the first touch insulating layer TIL1.

[0162] As described above, a 2-1 opening OP2-1 may be defined between the adjacent first touch electrode TE1 and the second touch electrode TE2. Also, between the adjacent first touch electrode TE1 and the island electrode pattern TIP and the adjacent connection portion (eg, Figure 9 A 2-2nd opening portion OP2-2 may be defined between the connection portion CP) and the island electrode pattern TIP.

[0163] Each of the 2-1st opening portion OP2-1 and the 2-2nd opening portion OP2-2 may overlap with the first opening portion OP1 in a plane. The width W2 of the 2-1st opening portion OP2-1 may be different from the width W1 of the first opening portion OP1, and the width W3 of the 2-2nd opening portion OP2-2 may be different from the width W1 of the first opening portion OP1. In one embodiment, the width W1 of the first opening portion OP1 may be smaller than the width W2 of the 2-1st opening portion OP2-1 and the width W3 of the 2-2nd opening portion OP2-2, respectively. In this case, the first touch electrode TE1, the second touch electrode TE2, and the island electrode pattern TIP (i.e., each of the first touch electrode array (e.g., Figure 7 A first touch electrode array TEA1), a second touch electrode array (eg, Figure 7The second touch electrode array TEA2 and each of the island electrode patterns TIP may not overlap with the first opening OP1 in a plane. However, the embodiments of the present invention are not limited thereto.

[0164] A second touch insulation layer TIL2 may be disposed on the first touch electrode TE1, the second touch electrode TE2 and the island electrode pattern TIP.

[0165] Although the present invention has been described above with reference to exemplary embodiments, anyone with ordinary knowledge in the technical field will understand that various modifications and changes may be made to the present invention without departing from the scope of the invention and the field of the invention as described in the claims.

[0166] Industrial applicability The present invention can be applied to various display devices that can be equipped with a display device. For example, the present invention can be applied to high-resolution smartphones, mobile phones, smart tablets, smart watches, tablet personal computers, car navigation systems, televisions, computer monitors, laptop computers, etc.

Claims

1. A touch panel comprising: a substrate comprising a sensing region and a peripheral region surrounding at least a portion of the sensing region; a first touch insulating layer disposed on the substrate and defining at least one first opening in the sensing area for exposing at least a portion of the substrate; a first touch electrode array comprising a plurality of first touch electrodes arranged along a first direction on the first touch insulating layer in the sensing area and a connecting portion connecting adjacent first touch electrodes among the plurality of first touch electrodes; as well as The second touch electrode array includes a plurality of second touch electrodes arranged in the sensing area in the same layer as the plurality of first touch electrodes along a second direction intersecting the first direction, and defines a 2-1 opening portion overlapping the first opening portion on a plane between the second touch electrode array and the first touch electrode array.

2. The touch panel according to claim 1, wherein The width of the first opening is greater than the width of the 2-1 opening.

3. The touch panel according to claim 1, wherein Each of the first touch electrode array and the second touch electrode array covers a side surface of the first touch insulation layer exposed by the first opening.

4. The touch panel according to claim 1, wherein Inside the first opening, a metal residual film made of the same material as the first touch electrode array and the second touch electrode array is provided in the outer region of the 2-1 opening. Inside the first opening, the metal residual film is not provided in the central region of the 2-1 opening.

5. The touch panel according to claim 1, wherein Also includes: at least one island electrode pattern, arranged on the first touch insulation layer in the sensing area and arranged between the second touch electrodes adjacent on a plane among the plurality of second touch electrodes; as well as At least one bridge pattern is arranged between the substrate and the first touch insulation layer in the sensing area, is entirely covered by the first touch insulation layer, and connects the island electrode pattern and a second touch electrode adjacent to the island electrode pattern among the plurality of second touch electrodes.

6. The touch panel according to claim 5, wherein: A width of a portion of the 2-1 opening that overlaps with the bridge pattern in a planar manner is greater than a width of a portion of the 2-1 opening that does not overlap with the bridge pattern in a planar manner.

7. The touch panel according to claim 5, wherein: A 2-2 opening is defined between the island electrode pattern and the first touch electrode array.

8. The touch panel according to claim 7, wherein: The width of the first opening is greater than the width of the 2-2 opening.

9. The touch panel according to claim 7, wherein: Inside the first opening, a metal residual film made of the same material as the first touch electrode array and the second touch electrode array is provided in the outer region of the 2-2 opening. Inside the first opening, the metal residual film is not provided in the central region of the 2-2 opening.

10. The touch panel according to claim 7, wherein: The width of the first opening is smaller than the width of the 2-1 opening and the width of the 2-2 opening.

11. The touch panel according to claim 10, wherein: Each of the first touch electrode array and the second touch electrode array does not overlap with the first opening in a plane.

12. The touch panel according to claim 7, wherein: Also includes: The second touch insulating layer is arranged on the first touch insulating layer, the first touch electrode array, and the second touch electrode array, and fills the first opening, the 2-1 opening, and the 2-2 opening.

13. A method for manufacturing a touch panel, comprising the following steps: forming a first metal layer on a substrate including a sensing region and a peripheral region surrounding at least a portion of the sensing region; forming a metal pattern overlapping the sensing area by removing a portion of the first metal layer; forming a first touch insulating layer covering the metal pattern on the substrate; forming at least one first opening portion exposing the metal pattern by removing a portion of the first touch insulating layer; forming a first touch electrode array and a second touch electrode array defining a 2-1 opening portion overlapping the first opening portion on a plane between the first touch electrode array and the first touch electrode array on the first touch insulating layer in the sensing area; as well as The metal pattern is removed.

14. The method for manufacturing a touch panel according to claim 13, wherein: The width of the first opening is greater than the width of the 2-1 opening.

15. The method for manufacturing a touch panel according to claim 13, wherein: The steps of forming the first touch electrode array and the second touch electrode array include the following steps: forming a second metal layer on the first touch insulating layer and the metal pattern; and A metal residual film, the first touch electrode array, and the second touch electrode array are formed on the substrate and the metal pattern by removing a portion of the second metal layer.

16. The method for manufacturing a touch panel according to claim 15, wherein: In the step of removing the metal pattern, The metal pattern and the metal residual film on the metal pattern are removed simultaneously.

17. The method for manufacturing a touch panel according to claim 13, wherein: The first touch electrode array includes: a plurality of first touch electrodes extending along a first direction; and a connecting portion connecting adjacent first touch electrodes among the plurality of first touch electrodes. The second touch electrode array includes: a plurality of second touch electrodes arranged in the same layer as the plurality of first touch electrodes along a second direction intersecting the first direction.

18. The method for manufacturing a touch panel according to claim 17, wherein: The steps of forming the first touch electrode array and the second touch electrode array include the following steps: At least one island electrode pattern is formed on the first touch insulating layer in the sensing area between second touch electrodes adjacent on a plane among the plurality of second touch electrodes. The step of forming the metal pattern comprises the following steps: At least one bridge pattern is formed between the substrate and the first touch insulation layer in the sensing area, the bridge pattern being entirely covered by the first touch insulation layer and connecting the island electrode pattern and a second touch electrode adjacent to the island electrode pattern among the plurality of second touch electrodes. A 2-2 opening portion having a width smaller than a width of the first opening portion is defined between the island electrode pattern and the first touch electrode array.

19. A display device comprising: The display panel includes a display area in which a plurality of pixels are arranged and a non-display area surrounding at least a portion of the display area; as well as a touch panel disposed on the display panel, The touch panel includes: a substrate comprising a sensing area corresponding to the display area and a peripheral area surrounding at least a portion of the sensing area and corresponding to the non-display area; a first touch insulating layer disposed on the substrate and defining at least one first opening in the sensing area for exposing at least a portion of the substrate; a first touch electrode array comprising a plurality of first touch electrodes arranged along a first direction on the first touch insulating layer in the sensing area and a connecting portion connecting adjacent first touch electrodes among the plurality of first touch electrodes; and The second touch electrode array includes a plurality of second touch electrodes arranged in the sensing area in the same layer as the plurality of first touch electrodes along a second direction intersecting the first direction, and defines a second opening portion overlapping the first opening portion on a plane between the second touch electrode array and the first touch electrode array.

20. The display device according to claim 19, wherein The width of the first opening is greater than the width of the second opening.

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