Laminate and display device including the same

By introducing a cover layer between the wavelength conversion layer and the light absorption layer to control its thickness and refractive index, the problems of light leakage and in-plane unevenness in the display device are solved, and a wider color gamut and stable luminous intensity are achieved.

CN120604148APending Publication Date: 2025-09-05SUMITOMO CHEM CO LTD
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Patent Information

Application Number
CN202480009293.1
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Priority Date
2024-03-05
Filing Date
2024-03-08
Publication Date
2025-09-05

AI Technical Summary

Technical Problem

In the conventional display device, part of the primary light transmitted by the wavelength conversion layer leaks to the visible side, resulting in limited color gamutization of the display device, and the problem of in-plane unevenness of the light absorbing layer is difficult to effectively suppress.

Method used

A cover layer is introduced between the wavelength conversion layer and the light absorption layer, and the thickness is controlled to be less than 15 μm, and the refractive index relationship of each layer is adjusted to form a laminate to ensure the uniformity and light intensity of the light absorption layer are maintained.

Benefits of technology

In-plane unevenness of the light absorbing layer is effectively suppressed, the color gamutization effect of the display device is improved, and the luminous intensity is maintained.

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Abstract

The present invention addresses the problem of providing a laminate in which in-plane unevenness of a light-absorbing layer can be suppressed. The laminate according to the present invention is characterized by comprising a wavelength conversion layer and a light absorption layer, the wavelength conversion layer containing light-emitting inorganic semiconductor particles, an overcoat layer being provided between the wavelength conversion layer and the light absorption layer, and the overcoat layer having a film thickness of 15 [mu] m or less.
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Description

Technical Field

[0001] The present invention relates to a laminate including an overcoat layer and a display device including the laminate. Background Art

[0002] Patent Document 1 describes a curable resin composition containing quantum dots and a wavelength conversion film formed using the curable resin composition.

[0003] Prior art literature

[0004] Patent Literature

[0005] Patent Document 1: Japanese Patent Application Laid-Open No. 2016-065178 Summary of the Invention

[0006] Problems to be solved by the invention

[0007] In recent years, there has been a growing demand for display devices with wider color gamuts. For example, with the release of Recommendation Rec. ITU-R BT.2020, which defines the ultra-high-definition video format (SHV), there has been a demand for a further expansion of the color reproduction range. This has led to a further increase in the coverage ratio of the Rec. ITU-R BT.2020 color gamut (the ratio of the color range that can be represented in this color reproduction range to the color reproduction range of Rec. ITU-R BT.2020).

[0008] In a display device having a wavelength conversion layer that absorbs primary light from a primary light source and emits light after wavelength conversion (color conversion), usually, the primary light irradiated on the wavelength conversion layer is not completely absorbed by the wavelength conversion layer, but a portion of the light passes through the wavelength conversion layer and leaks to the visible side. This may become a factor that hinders the wide color gamut of the display device. One solution to this problem is to arrange a light absorption layer that absorbs the primary light after passing through the wavelength conversion layer on the wavelength conversion layer. However, by making a stacked structure, it is easy to form in-plane unevenness in the light absorption layer. From the perspective of uneven luminous intensity of the entire display device, it is also important to suppress the in-plane unevenness of the light absorption layer. The subject of the present invention is to provide a stacked body that can suppress the in-plane unevenness of the light absorption layer.

[0009] Means used to solve problems

[0010] The gist of the present invention is as follows.

[0011] [1] A laminate comprising a wavelength conversion layer and a light absorbing layer, wherein the wavelength conversion layer contains light-emitting inorganic semiconductor particles,

[0012] A cover layer is provided between the wavelength conversion layer and the light absorption layer,

[0013] The overcoat layer has a thickness of 15 μm or less.

[0014] [2] The laminate according to [1], wherein a film thickness ratio calculated from (thickness of the overcoat layer + thickness of the light absorbing layer) / thickness of the wavelength conversion layer is 0.100 or more and 5 or less.

[0015] [3] The laminate according to [1] or [2], wherein a ratio of the thickness of the light absorbing layer to the thickness of the laminate (light absorbing layer / laminated body) is 0.030 to 0.300.

[0016] [4] The laminate according to any one of [1] to [3], wherein the laminate satisfies the following i) and ii):

[0017] i) the refractive index of the cover layer is less than the refractive index of the wavelength conversion layer;

[0018] ii) The refractive index of the cover layer is smaller than the refractive index of the light absorbing layer.

[0019] [5] The laminate according to any one of [1] to [4], wherein the value represented by Formula 1 of the wavelength conversion layer, the light absorbing layer, and the overcoat layer is 0.30 or less,

[0020] {Q 20 / (T 20 +T 30 )} / {Q 10 / T 10} ... (Formula 1)

[0021] [In formula 1,

[0022] Q 10 : Total amount of light-emitting inorganic semiconductor particles and organic ligands in the wavelength conversion layer (g)

[0023] Q 20 : Total amount of colorants in the light absorbing layer (g)

[0024] T 10 : Thickness of wavelength conversion layer (μm)

[0025] T 20 : Thickness of the light absorbing layer (μm)

[0026] T 30 : thickness of the overcoat layer (μm)].

[0027] [6] A display device comprising the laminate according to any one of [1] to [5].

[0028] Effects of the Invention

[0029] According to the present invention, the laminate further includes a cover layer between the wavelength conversion layer and the light absorbing layer, and the thickness of the cover layer is adjusted to 15 μm or less, thereby suppressing in-plane unevenness of the light absorbing layer. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Figure 1 This is a schematic cross-sectional view showing an example of the laminate of the present invention.

[0031] Figure 2 This is a schematic cross-sectional view showing another example of the laminate of the present invention.

[0032] Figure 3 It is a schematic cross-sectional view showing an example of the display device of the present invention. DETAILED DESCRIPTION

[0033] <Laminate>

[0034] The laminate (preferably an optical laminate) of the present invention is characterized in that the laminate includes a wavelength conversion layer and a light absorbing layer, and further comprises an overcoat layer between the wavelength conversion layer and the light absorbing layer.

[0035] Figure 1 This is a schematic cross-sectional view showing an example of the laminate of the present invention. Figure 1 The laminate shown includes a wavelength conversion layer 10 and a light absorbing layer 20, and has a cover layer 30 between the wavelength conversion layer 10 and the light absorbing layer 20. Figure 1 As shown in the laminated body, the cover layer 30 is directly laminated on the wavelength conversion layer 10, and the cover layer 30 is in contact with the wavelength conversion layer 10. Alternatively, the light absorbing layer 20 may be directly laminated on the cover layer 30, and the light absorbing layer 20 is in contact with the cover layer 30. Figure 1 Although not shown, other layers may be present between the overcoat layer 30 and the wavelength conversion layer 10, between the overcoat layer 30 and the light absorbing layer 20, or on the light absorbing layer 20 (however, these layers are different from the wavelength conversion layer 10, the overcoat layer 30, and the light absorbing layer 20). The light absorbing layer 20 is, for example, disposed on the light extraction direction side of the wavelength conversion layer 10.

[0036] Figure 2 : is a schematic cross-sectional view showing another example of the laminate of the present invention. Figure 2 As shown in FIG. 1 , the laminate of the present invention may include a first wavelength conversion layer 11 emitting red light and a second wavelength conversion layer 12 emitting green light. In this case, Figure 2 As shown, it includes a first wavelength conversion layer 11, a first overcoat layer 31 and a first light absorbing layer 21 in sequence, and also includes a second wavelength conversion layer 12, a second overcoat layer 32 and a second light absorbing layer 22 in sequence. Figure 2In the embodiment, a single (integrated) cover layer may be provided instead of separately providing the first cover layer 31 and the second cover layer 32. Similarly, a single (integrated) light absorbing layer may be provided instead of separately providing the first light absorbing layer 21 and the second light absorbing layer 22.

[0037] The thickness of the laminate of the present invention (hereinafter also referred to as “total film thickness”) is, for example, 4.0 μm to 30 μm, preferably 5.0 μm to 27 μm, and more preferably 6.0 μm to 15 μm.

[0038] The refractive index of each layer constituting the laminate of the present invention preferably satisfies at least one of the following relationships i) to iii). In a preferred embodiment, the refractive index of each layer preferably satisfies the following relationships i) and ii), and more preferably satisfies all of the following relationships i) to iii).

[0039] i) The refractive index of the cover layer 30 is lower than the refractive index of the wavelength conversion layer 10 .

[0040] ii) The refractive index of the cover layer 30 is lower than the refractive index of the light absorbing layer 20 .

[0041] iii) The refractive index of the wavelength conversion layer 10 is greater than the refractive index of the light absorbing layer 20 .

[0042] The refractive index can be measured by the measurement method described in the Example section below, and the refractive index of each layer at a wavelength of 550 nm can be evaluated.

[0043] In the wavelength ranges of 400 nm to 465 nm and 530 nm to 1690 nm, the refractive index of each layer constituting the laminate of the present invention preferably satisfies the relationship of wavelength conversion layer > light absorption layer > overcoat layer.

[0044] Furthermore, in the wavelength range of greater than 465 nm and less than 530 nm, the refractive index of each layer constituting the laminate of the present invention preferably satisfies the relationship of light absorbing layer > wavelength converting layer > overcoat layer.

[0045] The refractive index can be measured according to the measurement method described in the Examples section below.

[0046] The laminated body of the present invention can be suitably used as a color conversion member disposed on a primary light source (for example, a blue light source) of a display device.

[0047] 1. Wavelength conversion layer

[0048] The wavelength conversion layer absorbs primary light from a primary light source and emits green light or red light, and preferably converts the wavelength of blue light, which is the primary light, into the wavelength of green light or red light.

[0049] The thickness of the wavelength conversion layer is, for example, 1 μm to 20 μm, preferably 1.5 μm to 18 μm, more preferably 1.8 μm to 14 μm, further preferably 2 μm to 12 μm, and even more preferably 2 μm to 10 μm. If the thickness of the wavelength conversion layer is too small, when primary light is irradiated onto the wavelength conversion layer, there is a tendency for the primary light to not be fully absorbed or scattered by the wavelength conversion layer, and the proportion of the primary light that passes through the wavelength conversion layer to increase.

[0050] The ratio of the thickness of the wavelength conversion layer to the total film thickness (wavelength conversion layer / total film thickness) is, for example, 0.250 to 0.990, preferably 0.350 to 0.900, and more preferably 0.450 to 0.850.

[0051] The refractive index of the wavelength conversion layer is preferably 1.55 or greater, more preferably 1.60 or greater, and even more preferably 1.65 or greater, and is preferably 1.85 or less, more preferably 1.80 or less, and even more preferably 1.75 or less.

[0052] 2. Light absorption layer

[0053] The light-absorbing layer allows transmission of light within a specific wavelength range while absorbing light within at least a portion of other wavelength ranges. Light emitted from the wavelength conversion layer passes through the light-absorbing layer and is emitted from the display device as green or red light. The provision of a light-absorbing layer prevents leakage of primary light to the visible side of the light-absorbing layer, thereby enabling a wide color gamut display device. The light-absorbing layer is particularly preferably a color resist layer.

[0054] The wavelength region of light allowed to pass through the light-absorbing layer is a green or red wavelength region. For example, the green wavelength region is within the range of 495 nm to 585 nm. For example, the red wavelength region is within the range of 585 nm to 780 nm. The wavelength region of light absorbed by the light-absorbing layer is preferably a blue wavelength region, more preferably within the wavelength range of 450 nm, for example, within the range of 380 nm or more and less than 495 nm.

[0055] exist Figure 2 In this case, the first light absorbing layer 21 allows transmission of light in the red wavelength range. The second light absorbing layer 22 allows transmission of light in the green wavelength range. The wavelength range of light absorbed by the first and second light absorbing layers 21 and 22 is preferably a blue wavelength range, more preferably a wavelength range including 450 nm, for example, a wavelength range within a range of 380 nm or more and less than 495 nm.

[0056] The light absorbing layer preferably has an average light transmittance of 98% or more in the wavelength range of 520 nm to 780 nm, for example. An average light transmittance of 98% or more can further increase the luminous intensity.

[0057] The thickness of the light absorbing layer is, for example, not less than 0.1 μm and not more than 30 μm. From the viewpoint of effectively suppressing leakage of primary light (blue light) to the visible side of the light absorbing layer, the thickness is preferably not less than 0.5 μm and not more than 20 μm, more preferably not less than 0.7 μm and not more than 10 μm, further preferably not less than 0.9 μm and not more than 5 μm, and even more preferably not less than 1.0 μm and not more than 2 μm.

[0058] The ratio of the thickness of the light absorbing layer to the total film thickness (light absorbing layer / total film thickness) is, for example, 0.030 to 0.400, preferably 0.030 to 0.300, more preferably 0.050 to 0.200, and further preferably 0.090 to 0.175.

[0059] The refractive index of the light absorbing layer is preferably 1.45 or greater, more preferably 1.50 or greater, and even more preferably 1.55 or greater, and is preferably 1.75 or less, more preferably 1.70 or less, and even more preferably 1.65 or less.

[0060] 3. Topcoat

[0061] The overcoat layer is a layer that can suppress a decrease in luminous intensity. While the presence of a light-absorbing layer can lead to a decrease in luminous intensity compared to the absence of a light-absorbing layer, the present inventors have discovered that by laminating an overcoat layer between the wavelength conversion layer and the light-absorbing layer, the decrease in luminous intensity can be significantly suppressed despite the presence of the light-absorbing layer. The overcoat layer is particularly preferably a resin layer.

[0062] The thickness of the overcoat layer is 15 μm or less, preferably 12 μm or less. There is a correlation between the thickness of the overcoat layer and the film-forming properties of the light-absorbing layer. When the thickness of the overcoat layer is 15 μm or less, the in-plane unevenness of the light-absorbing layer can be suppressed. In particular, from the viewpoint of suppressing the unevenness of the film thickness within the overcoat layer, the thickness of the overcoat layer is more preferably 9 μm or less, further preferably 7 μm or less, and further preferably 5 μm or less. The thickness of the overcoat layer is, for example, 0.1 μm or more, preferably 0.4 μm or more, more preferably 0.7 μm or more, further preferably 1.2 μm or more, and further preferably 1.8 μm or more. When the thickness of the overcoat layer is 0.1 μm or more, it becomes easy to form an overcoat layer having a uniform thickness, and the unevenness of the film thickness within the overcoat layer can be reduced.

[0063] The thickness ratio of the overcoat layer to the light absorbing layer (overcoat layer / light absorbing layer) is, for example, 0.10 to 15, preferably 0.50 to 12, and more preferably 0.8 to 10.

[0064] The thickness ratio of the overcoat layer to the wavelength conversion layer (overcoat layer / wavelength conversion layer) is, for example, 0.020 to 3, preferably 0.100 to 2, and more preferably 0.150 to 1.

[0065] The film thickness ratio calculated from (overcoat layer+light absorbing layer) / wavelength conversion layer is, for example, 0.100 to 5, preferably 0.200 to 3, and more preferably 0.250 to 1.500.

[0066] The value calculated from thickness of overcoat layer×thickness of light absorbing layer / thickness of wavelength converting layer is, for example, 0.030 μm to 5 μm, preferably 0.080 μm to 3 μm, and more preferably 0.100 μm to 2 μm.

[0067] The ratio of the thickness of the overcoat layer to the total film thickness (overcoat layer / total film thickness) is, for example, 0.010 or more and less than 1, preferably 0.050 or more and 0.600 or less, and more preferably 0.100 or more and 0.400 or less.

[0068] The refractive index of the overcoat layer is preferably 1.35 or greater, more preferably 1.40 or greater, and even more preferably 1.45 or greater, and is preferably 1.65 or less, more preferably 1.60 or less, and even more preferably 1.55 or less.

[0069] The values ​​shown in Formula 1 for the wavelength conversion layer, light absorbing layer, and overcoat layer in the present invention are preferably 0.30 or less, more preferably 0.010 to 0.28, further preferably 0.015 to 0.25, further preferably 0.020 to 0.20, and particularly preferably 0.022 to 0.15. Blue light leaking from the wavelength conversion layer is usually absorbed by the light absorbing layer. From the viewpoint of suppressing blue light leakage and maintaining luminous intensity, the amount of colorant in the laminate (specifically, the total amount of luminescent inorganic semiconductor particles and organic ligands in the wavelength conversion layer (Q 10 ) and the total amount of colorants in the light absorbing layer (Q 20 That is, by adjusting the value represented by Formula 1 within the above range, a laminated body can be easily obtained that suppresses blue light leakage and maintains appropriate luminous intensity.

[0070] In Formula 1, regarding the luminescent inorganic semiconductor particles and organic ligands in the wavelength conversion layer and the colorant in the light absorbing layer, reference should be made to the luminescent inorganic semiconductor particles (A), organic ligands (G), and colorant (I) described later.

[0071] {Q 20 / (T 20 +T 30 )} / {Q 10 / T 10} ... (Formula 1)

[0072] [In formula 1,

[0073] Q 10 : Total amount of light-emitting inorganic semiconductor particles and organic ligands in the wavelength conversion layer (g)

[0074] Q 20 : Total amount of colorants in the light absorbing layer (g)

[0075] T 10 : Thickness of wavelength conversion layer (μm)

[0076] T 20 : Thickness of the light absorbing layer (μm)

[0077] T 30 : Thickness of the overcoat layer (μm)]

[0078] <Composition>

[0079] The wavelength conversion layer can be formed from a wavelength conversion layer-forming composition (hereinafter also referred to as “composition I”) containing light-emitting inorganic semiconductor particles (A) (hereinafter also referred to as “semiconductor particles (A)”).

[0080] The composition I may comprise an organic ligand (G).

[0081] The composition I may comprise a light scattering agent (B).

[0082] The composition I may comprise a resin (C).

[0083] The composition I may contain a polymerizable compound (D).

[0084] The composition I may comprise a polymerization initiator (E).

[0085] The composition I may contain a polymerization initiation auxiliary (E1).

[0086] The composition I may comprise an antioxidant (F).

[0087] The composition I may comprise a solvent (J).

[0088] The composition I may comprise a leveling agent (H).

[0089] The light-absorbing layer can be formed from a composition for forming a light-absorbing layer (hereinafter also referred to as “composition II”).

[0090] Composition II comprises a colorant (I).

[0091] Composition II may comprise a resin (C).

[0092] Composition II may contain a polymerizable compound (D).

[0093] Composition II may contain a polymerization initiator (E).

[0094] Composition II may contain a polymerization initiation auxiliary (E1).

[0095] Composition II may comprise an antioxidant (F).

[0096] Composition II may comprise a solvent (J).

[0097] Composition II may contain a leveling agent (H).

[0098] The overcoat layer can be formed from an overcoat layer-forming composition (hereinafter also referred to as “composition III”).

[0099] Composition III may comprise a resin (C).

[0100] Composition III may contain a polymerizable compound (D).

[0101] The composition III may contain a polymerization initiator (E).

[0102] Composition III may contain a polymerization initiation auxiliary (E1).

[0103] Composition III may comprise an antioxidant (F).

[0104] Composition III may comprise a solvent (J).

[0105] Composition III may contain a leveling agent (H).

[0106] Composition III may contain a UV absorber.

[0107] Composition III is substantially free of semiconductor particles (A) and colorant (I). "Substantially free of semiconductor particles (A) and colorant (I)" means that the content of each of the semiconductor particles (A) and colorant (I) relative to the total solid content of Composition III is preferably 1% by mass or less, more preferably 0.5% by mass or less, even more preferably 0.1% by mass or less, and particularly preferably 0% by mass.

[0108] In addition, in this specification, unless otherwise specified, the compound exemplified as each component can be used alone or in combination of two or more.

[0109] <Luminescent Inorganic Semiconductor Particles (A)>

[0110] The semiconductor particles (A) absorb primary light and emit green light or red light, and preferably convert the wavelength of blue light as the primary light into the wavelength of red light or green light.

[0111] In this specification, "blue" refers to all light that is visually perceived as blue (all light having intensity in the blue wavelength region, for example, the range of 380nm to 495nm), and is not limited to light of a single wavelength. "Green" refers to all light that is visually perceived as green (all light having intensity in the green wavelength region, for example, the range of 495nm to 585nm), and is not limited to light of a single wavelength. "Red" refers to all light that is visually perceived as red (all light having intensity in the red wavelength region, for example, the range of 585nm to 780nm), and is not limited to light of a single wavelength. "Yellow" refers to all light that is visually perceived as yellow (all light having intensity in the yellow wavelength region, for example, the range of 560nm to 610nm), and is not limited to light of a single wavelength.

[0112] The emission spectrum of the semiconductor particles (A) emitting green light preferably includes a peak with a maximum value within the wavelength range of 500 nm to 560 nm, more preferably includes a peak with a maximum value within the wavelength range of 520 nm to 545 nm, and even more preferably includes a peak with a maximum value within the wavelength range of 525 nm to 535 nm. This can further enhance the emission intensity of green light from the display device. The half-value width of this peak is preferably 15 nm to 80 nm, more preferably 15 nm to 60 nm, even more preferably 15 nm to 50 nm, and particularly preferably 15 nm to 45 nm. This can further enhance the emission intensity of green light from the display device.

[0113] The emission spectrum of the red-emitting semiconductor particles (A) preferably includes a peak with a maximum value within the wavelength range of 610 nm to 750 nm, more preferably includes a peak with a maximum value within the wavelength range of 620 nm to 650 nm, and even more preferably includes a peak with a maximum value within the wavelength range of 625 nm to 645 nm. This can further enhance the red emission intensity of the display device. The half-value width of this peak is preferably 15 nm to 80 nm, more preferably 15 nm to 60 nm, even more preferably 15 nm to 50 nm, and particularly preferably 15 nm to 45 nm. This can further enhance the red emission intensity of the display device.

[0114] Examples of the semiconductor particles (A) include quantum dots and particles composed of compounds having a perovskite crystal structure (hereinafter also referred to as "perovskite compounds"), with quantum dots being preferred. Quantum dots are light-emitting semiconductor particles with a particle size of 1 nm to 100 nm. They utilize the band gap of the semiconductor to absorb ultraviolet light or visible light (e.g., blue light) and emit light.

[0115] Examples of quantum dots include: CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, HgS, HgSe, HgTe, CdHgTe, CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, C dZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, Hg Compounds of Group 12 elements such as ZnSeTe and HgZnSTe and Group 16 elements; compounds of Group 13 elements such as GaN, GaP, GaAs, AlN, AlP, AlAs, InN, InP, InAs, GaNP, GaNAs, GaPAs, AlNP, AlNAs, AlPAs, InNP, InNAs, InPAs, GaAlNP, GaAlNAs, GaAlPAs, GaInNP, GaInNAs, GaInPAs, InAlNP, InAlNAs, InAlPAs and Group 15 elements; compounds of Group 14 elements such as PdS and PbSe and Group 16 elements, etc.

[0116] When the quantum dots contain S or Se, they may be surface-modified with metal oxides or organic substances. Using surface-modified quantum dots can prevent S or Se from being captured by reactive components contained or potentially contained in composition I.

[0117] Furthermore, quantum dots can also be formed by combining the above compounds to form a core-shell structure. Examples of such combinations include fine particles with a CdSe core and a ZnS shell, and fine particles with an InP core and a ZnSeS shell.

[0118] The energy state of quantum dots depends on their size, allowing for flexible selection of emission wavelengths by varying the particle size. Furthermore, the narrow spectral width of light emitted by quantum dots facilitates the widening of the color gamut of display devices. Furthermore, quantum dots have a high responsiveness, which also improves the efficiency of primary light utilization.

[0119] The perovskite compound is a compound having A, B, and X as components and having a perovskite-type crystal structure.

[0120] A is a component located at each vertex of a hexahedron with B as the center in the perovskite crystal structure, and is a monovalent cation.

[0121] X represents a component located at each vertex of an octahedron with B as the center in the perovskite crystal structure, and is at least one ion selected from the group consisting of a halogen ion and a thiocyanate ion.

[0122] B is a component located at the center of a hexahedron having A at its vertices and an octahedron having X at its vertices in the perovskite crystal structure, and is a metal ion.

[0123] The perovskite compound containing A, B, and X as components is not particularly limited, and may be a compound having any of a three-dimensional structure, a two-dimensional structure, and a quasi-two-dimensional structure.

[0124] In the case of three-dimensional structures, perovskite compounds are composed of ABX (3+δ) express.

[0125] In the case of two-dimensional structures, perovskite compounds are composed of A2BX (4+δ) express.

[0126] Here, δ is a number that can be appropriately changed according to the charge balance of B, and is not less than -0.7 and not more than 0.7.

[0127] As ABX (3+δ) Preferred specific examples of the perovskite compound having a three-dimensional perovskite crystal structure include:

[0128] <h2 style=";text-align:left;direction:ltr">CH3NH3PbBr3, CH3NH3PbCl3, CH3NH3PbI3, CH3NH3PbBr<h2 style=";text-align:left;direction:ltr"> (3-y) <h2 style=";text-align:left;direction:ltr"> I<h2 style=";text-align:left;direction:ltr"> y <h2 style=";text-align:left;direction:ltr"> (0<y<3)、CH3NH3PbBr<h2 style=";text-align:left;direction:ltr"> (3-y) <h2 style=";text-align:left;direction:ltr"> Cl<h2 style=";text-align:left;direction:ltr"> y <h2 style=";text-align:left;direction:ltr"> (0<y<3)、(H2N=CH-NH2)PbBr3、(H2N=CH-NH2)PbCl3、(H2N=CH-NH2)PbI3、<h2 style=";text-align:left;direction:ltr"> <h2 style=";text-align:left;direction:ltr">

[0129] <h2 style=";text-align:left;direction:ltr"> CH3NH3Pb<h2 style=";text-align:left;direction:ltr"> (1-a) <h2 style=";text-align:left;direction:ltr"> Ca<h2 style=";text-align:left;direction:ltr"> a <h2 style=";text-align:left;direction:ltr"> Br3 (0<a≤0.7)、CH3NH3Pb<h2 style=";text-align:left;direction:ltr"> (1-a) <h2 style=";text-align:left;direction:ltr"> Sr<h2 style=";text-align:left;direction:ltr"> a <h2 style=";text-align:left;direction:ltr"> Br3 (0<a≤0.7)、CH3NH3Pb<h2 style=";text-align:left;direction:ltr"> (1-a) <h2 style=";text-align:left;direction:ltr"> No<h2 style=";text-align:left;direction:ltr"> a <h2 style=";text-align:left;direction:ltr"> Br<h2 style=";text-align:left;direction:ltr"> (3+δ) <h2 style=";text-align:left;direction:ltr"> (0<a≤0.7,0<δ≤0.7)、CH3NH3Pb<h2 style=";text-align:left;direction:ltr"> (1-a) <h2 style=";text-align:left;direction:ltr"> Ba<h2 style=";text-align:left;direction:ltr"> a <h2 style=";text-align:left;direction:ltr"> Br3 (0<a≤0.7)、CH3NH3Pb<h2 style=";text-align:left;direction:ltr"> (1-a) <h2 style=";text-align:left;direction:ltr"> Dy<h2 style=";text-align:left;direction:ltr"> a <h2 style=";text-align:left;direction:ltr"> Br<h2 style=";text-align:left;direction:ltr"> (3+δ) <h2 style=";text-align:left;direction:ltr"> (0<a≤0.7,0<δ≤0.7)、<h2 style=";text-align:left;direction:ltr"> <h2 style=";text-align:left;direction:ltr">

[0130] <h2 style=";text-align:left;direction:ltr"> CH3NH3Pb<h2 style=";text-align:left;direction:ltr"> (1-a) <h2 style=";text-align:left;direction:ltr"> Na<h2 style=";text-align:left;direction:ltr"> a <h2 style=";text-align:left;direction:ltr"> Br<h2 style=";text-align:left;direction:ltr"> (3+δ) <h2 style=";text-align:left;direction:ltr"> (0<a≤0.7,-0.7≤δ<0)、CH3NH3Pb<h2 style=";text-align:left;direction:ltr"> (1-a) <h2 style=";text-align:left;direction:ltr"> Li<h2 style=";text-align:left;direction:ltr"> a <h2 style=";text-align:left;direction:ltr"> Br<h2 style=";text-align:left;direction:ltr"> (3+δ) <h2 style=";text-align:left;direction:ltr"> (0<a≤0.7,-0.7≤δ<0)、<h2 style=";text-align:left;direction:ltr"> <h2 style=";text-align:left;direction:ltr">

[0131] <h2 style=";text-align:left;direction:ltr"> CsPb<h2 style=";text-align:left;direction:ltr"> (1-a) <h2 style=";text-align:left;direction:ltr"> Na<h2 style=";text-align:left;direction:ltr"> a <h2 style=";text-align:left;direction:ltr"> Br<h2 style=";text-align:left;direction:ltr"> (3+δ) <h2 style=";text-align:left;direction:ltr"> (0<a≤0.7,-0.7≤δ<0)、CsPb<h2 style=";text-align:left;direction:ltr"> (1-a) <h2 style=";text-align:left;direction:ltr"> Li<h2 style=";text-align:left;direction:ltr"> a <h2 style=";text-align:left;direction:ltr"> Br<h2 style=";text-align:left;direction:ltr"> (3+δ) <h2 style=";text-align:left;direction:ltr"> (0<a≤0.7,-0.7≤δ<0)、<h2 style=";text-align:left;direction:ltr"> <h2 style=";text-align:left;direction:ltr">

[0132] <h2 style=";text-align:left;direction:ltr"> CH3NH3Pb<h2 style=";text-align:left;direction:ltr"> (1-a) <h2 style=";text-align:left;direction:ltr"> Na<h2 style=";text-align:left;direction:ltr"> a <h2 style=";text-align:left;direction:ltr"> Br<h2 style=";text-align:left;direction:ltr"> (3+δ-y) <h2 style=";text-align:left;direction:ltr"> I<h2 style=";text-align:left;direction:ltr"> y <h2 style=";text-align:left;direction:ltr"> (0<a≤0.7,-0.7≤δ<0,0<y<3)、CH3NH3Pb<h2 style=";text-align:left;direction:ltr"> (1-a) <h2 style=";text-align:left;direction:ltr"> Li<h2 style=";text-align:left;direction:ltr"> a <h2 style=";text-align:left;direction:ltr"> Br<h2 style=";text-align:left;direction:ltr"> (3+δ-y) <h2 style=";text-align:left;direction:ltr"> Iy (0<a≤0.7,-0.7≤δ<0,0<y<3)、CH3NH3Pb (1-a) Na a Br (3+δ-y) Cl y (0<a≤0.7,-0.7≤δ<0,0<y<3)、CH3NH3Pb (1-a) Li a Br (3+δ-y) Cl y (0<a≤0.7,-0.7≤δ<0,0<y<3)、

[0133] (H2N=CH-NH2)Pb (1-a) Na a Br (3+δ) (0<a≤0.7,-0.7≤δ<0)、(H2N=CH-NH2)Pb (1-a) Li a Br (3+δ) (0<a≤0.7,-0.7≤δ<0)、(H2N=CH-NH2)Pb (1-a) Na a Br (3+δ-y) I y (0<a≤0.7,-0.7≤δ<0,0<y<3)、(H2N=CH-NH2)Pb (1-a) Na a Br (3+δ-y) Cl y (0<a≤0.7,-0.7≤δ<0,0<y<3)、

[0134] CsPbBr3、CsPbCl3、CsPbI3、CsPbBr (3-y) I y (0<y<3)、CsPbBr (3-y) Cl y (0<y<3)、CH3NH3PbBr (3-y) Cl y (0<y<3)、

[0135] CH3NH3Pb (1-a) Zn a Br3 (0<a≤0.7)、CH3NH3Pb (1-a) Al a Br (3+δ) (0<a≤0.7,0≤δ≤0.7)、CH3NH3Pb (1-a) Co a Br3 (0<a≤0.7)、CH3NH3Pb (1-a) Mna Br3 (0<a≤0.7)、CH3NH3Pb (1-a) Mg a Br3 (0<a≤0.7)、

[0136] CsPb (1-a) Zn a Br3 (0<a≤0.7)、CsPb (1-a) Al a Br (3+δ) (0<a≤0.7,0<δ≤0.7)、CsPb (1-a) Co a Br3 (0<a≤0.7)、CsPb (1-a) Mn a Br3 (0<a≤0.7)、CsPb (1-a) Mg a Br3 (0<a≤0.7)、

[0137] CH3NH3Pb (1-a) Zn a Br (3-y) I y (0<a≤0.7,0<y<3)、CH3NH3Pb (1-a) Al a Br (3+δ-y) I y (0<a≤0.7,0<δ≤0.7,0<y<3)、CH3NH3Pb (1-a) Co a Br (3-y) I y (0<a≤0.7,0<y<3)、CH3NH3Pb (1-a) Mn a Br (3-y) I y (0<a≤0.7,0<y<3)、CH3NH3Pb (1-a) Mg a Br (3-y) I y (0<a≤0.7,0<y<3)、CH3NH3Pb (1-a) Zn a Br (3-y) Cl y (0<a≤0.7,0<y<3)、CH3NH3Pb (1-a) Al a Br (3+δ-y) Cl y (0<a≤0.7,0<δ≤0.7,0<y<3)、CH3NH3Pb (1-a) Coa Br (3+δ-y) Cl y (0<a≤0.7, 0<y<3), CH3NH3Pb (1-a) Mn a Br (3-y) Cl y (0<a≤0.7, 0<y<3), CH3NH3Pb (1-a) Mg a Br (3-y) Cl y (0<a≤0.7,0<y<3),

[0138] (H2N=CH-NH2)Zn a Br3 (0<a≤0.7), (H2N=CH-NH2)Mg a Br3 (0<a≤0.7), (H2N=CH-NH2)Pb (1-a) Zn a Br (3-y) I y (0<a≤0.7, 0<y<3), (H2N=CH-NH2)Pb (1-a) Zn a Br (3-y) Cl y (0<a≤0.7, 0<y<3), etc.

[0139] As provided by A2BX (4+δ) Preferred specific examples of the perovskite compound having a two-dimensional perovskite crystal structure include:

[0140] (C4H9NH3)2PbBr4, (C4H9NH3)2PbCl4, (C4H9NH3)2PbI4, (C7H 15 NH3)2PbBr4、(C7H 15 NH3)2PbCl4、(C7H 15 NH3)2PbI4、(C4H9NH3)2Pb (1-a) Li a Br (4+δ) (0<a≤0.7,-0.7≤δ<0), (C4H9NH3)2Pb (1-a) Na a Br (4+δ) (0<a≤0.7,-0.7≤δ<0), (C4H9NH3)2Pb (1-a) Rb a Br (4+δ) (0<a≤0.7, -0.7≤δ<0),

[0141] (C7H 15 NH3)2Pb (1-a) Ankle a Br (4+δ) (0<a≤0.7,−0.7≤δ<0)、(C7H 15 NH3)2Pb (1-a) Li a Br (4+δ) (0<a≤0.7,−0.7≤δ<0)、(C7H 15 NH3)2Pb (1-a) Rb a Br (4+δ) (0<a≤0.7,-0.7≤δ<0)、

[0142] (C4H9NH3)2Pb (1-a) Ankle a Br (4+δ-y) I y (0<a≤0.7,-0.7≤δ<0,0<y<4)、(C4H9NH3)2Pb (1-a) Li a Br (4+δ-y) I y (0<a≤0.7,-0.7≤δ<0,0<y<4)、(C4H9NH3)2Pb (1-a) Rb a Br (4+δ-y) I y (0<a≤0.7,-0.7≤δ<0,0<y<4)、

[0143] (C4H9NH3)2Pb (1-a) Ankle a Br (4+δ-y) Cl y (0<a≤0.7,-0.7≤δ<0,0<y<4)、(C4H9NH3)2Pb (1-a) Li a Br (4+δ-y) Cl y (0<a≤0.7,-0.7≤δ<0,0<y<4)、(C4H9NH3)2Pb (1-a) Rb a Br (4+δ-y) Cl y (0<a≤0.7,-0.7≤δ<0,0<y<4)、

[0144] (C4H9NH3)2PbBr4、(C7H 15 NH3)2PbBr4、

[0145] (C4H9NH3)2PbBr(4-y) Cl y (0<y<4)、(C4H9NH3)2PbBr (4-y) I y (0<y<4)、

[0146] (C4H9NH3)2Pb (1-a) Zn a Br4 (0<a≤0.7)、(C4H9NH3)2Pb (1-a) Mg a Br4 (0<a≤0.7)、(C4H9NH3)2Pb (1-a) Co a Br4 (0<a≤0.7)、(C4H9NH3)2Pb (1-a) Mn a Br4 (0<a≤0.7)、

[0147] (C7H 15 NH3)2Pb (1-a) Zn a Br4 (0<a≤0.7)、(C7H 15 NH3)2Pb (1-a) Mg a Br4 (0<a≤0.7)、(C7H 15 NH3)2Pb (1-a) Co a Br4 (0<a≤0.7)、(C7H 15 NH3)2Pb (1-a) Mn a Br4 (0<a≤0.7)、

[0148] (C4H9NH3)2Pb (1-a) Zn a Br (4-y) I y (0<a≤0.7,0<y<4)、(C4H9NH3)2Pb (1-a) Mg a Br (4-y) I y (0<a≤0.7,0<y<4)、(C4H9NH3)2Pb (1-a) Co a Br (4-y) I y (0<a≤0.7,0<y<4)、(C4H9NH3)2Pb (1-a) Mn a Br (4-y) I y (0<a≤0.7,0<y<4)、

[0149] (C4H9NH3)2Pb (1-a) Zn a Br (4-y) Cl y (0<a≤0.7, 0<y<4), (C4H9NH3)2Pb (1-a) Mg a Br (4-y) Cl y (0<a≤0.7, 0<y<4), (C4H9NH3)2Pb (1-a) Co a Br (4-y) Cl y (0<a≤0.7, 0<y<4), (C4H9NH3)2Pb (1-a) Mn a Br (4-y) Cl y (0<a≤0.7, 0<y<4), etc.

[0150] The semiconductor particles (A) that absorb primary light and emit green light may be used alone or in combination of two or more. The semiconductor particles (A) that absorb primary light and emit red light may be used alone or in combination of two or more.

[0151] The content of the semiconductor particles (A) in the composition I relative to the total amount of the solid content of the composition I is, for example, 1 mass % or more and 60 mass % or less, preferably 10 mass % or more and 50 mass % or less, more preferably 15 mass % or more and 50 mass % or less, further preferably 20 mass % or more and 50 mass % or less, and even more preferably 25 mass % or more and 45 mass % or less.

[0152] It should be noted that, in this specification, the total solids content of a composition refers to the total of the components contained in the composition excluding the solvent (J). The content of the solids content of the composition can be measured using known analytical methods such as liquid chromatography or gas chromatography. The content of each component in the solids content of the composition can also be calculated based on the blending ratios used during composition preparation.

[0153] In the present specification, the content or content ratio of each component refers to the total content or total content ratio of these components when two or more components are contained.

[0154] Composition II preferably contains substantially no semiconductor particles (A). "Substantially no semiconductor particles (A)" means that the content of semiconductor particles (A) relative to the total solid content of Composition II is preferably 1% by mass or less, more preferably 0.5% by mass or less, further preferably 0.1% by mass or less, and particularly preferably 0% by mass.

[0155] Composition III does not substantially contain semiconductor particles (A). The content of semiconductor particles (A) relative to the total solid content of Composition III is preferably 1 mass % or less, more preferably 0.5 mass % or less, further preferably 0.1 mass % or less, and particularly preferably 0 mass %.

[0156] <Organic ligand (G)>

[0157] The semiconductor particles (A) may be present in the composition in a state coordinated with the organic ligand (G). The organic ligand (G) is, for example, an organic compound having a polar group capable of coordinating with the semiconductor particles (A). The organic ligand (G) may be coordinated, for example, on the surface of the semiconductor particles (A). The composition may contain one or more organic ligands (G).

[0158] The organic ligand (G) preferably has at least a portion of its molecules coordinated to the semiconductor particles (A), but may also have all or substantially all of its molecules coordinated to the semiconductor particles (A). Inclusion of an organic ligand (G) coordinated to the semiconductor particles (A) can be advantageous from the perspective of improving the stability and dispersibility of the semiconductor particles (A) and the luminescence intensity of the wavelength conversion layer.

[0159] The polar group of the organic ligand (G) is, for example, at least one group selected from the group consisting of a thiol group (-SH), a carboxyl group (-COOH), and an amino group (-NH2). Polar groups selected from this group can be advantageous in improving coordination with the semiconductor particles (A). High coordination can contribute to improving the stability and dispersibility of the semiconductor particles (A) in the composition, as well as increasing the luminous intensity of the wavelength conversion layer. More preferably, the polar group is at least one group selected from the group consisting of a thiol group and a carboxyl group. The organic ligand (G) may have one or more polar groups.

[0160] The organic ligand (G) may be, for example, an organic compound represented by the following formula (x).

[0161] X A -R X (x)

[0162] Where, X A is the above polar group, R XIt is a monovalent hydrocarbon group that may contain heteroatoms (N, O, S, halogen atoms, etc.). The hydrocarbon group may have one or more unsaturated bonds such as carbon-carbon double bonds. The hydrocarbon group may have a linear, branched, or cyclic structure. The number of carbon atoms in the hydrocarbon group may be, for example, 1 to 40, or 1 to 30. The methylene group in the hydrocarbon group may be replaced by -O-, -S-, -C(=O)-, -C(=O)-O-, -OC(=O)-, -C(=O)-NH-, or -NH-.

[0163] Group R X A polar group may be included. For a specific example of the polar group, refer to the polar group X A The above records.

[0164] As a polar group X having a carboxyl group A Specific examples of the organic ligand include, in addition to formic acid, acetic acid, and propionic acid, saturated or unsaturated fatty acids. Specific examples of saturated or unsaturated fatty acids include: saturated fatty acids such as butyric acid, valeric acid, caproic acid, caprylic acid, capric acid, lauric acid, myristic acid, pentadecanoic acid, palmitic acid, heptadecanoic acid, stearic acid, arachidic acid, behenic acid, and lignoceric acid; monounsaturated fatty acids such as myristoleic acid, palmitoleic acid, oleic acid, eicosenoic acid, erucic acid, and nervonic acid; and polyunsaturated fatty acids such as linoleic acid, α-linolenic acid, γ-linolenic acid, stearidonic acid, dihomo-γ-linolenic acid, arachidonic acid, eicosatetraenoic acid, docosadienoic acid, and adrenic acid (docosatetraenoic acid).

[0165] Having a thiol group or an amino group as the polar group X A Specific examples of the organic ligand include the above-mentioned organic ligands having a carboxyl group as a polar group X A The carboxyl group of the organic ligand is replaced by a thiol group or an amino group of the organic ligand.

[0166] In addition to the above, examples of the organic ligand represented by the above formula (x) include compound (G-1) and compound (G-2).

[0167] [Compound (G-1)]

[0168] Compound (G-1) is a compound having a first functional group and a second functional group. The first functional group is a carboxyl group (-COOH), and the second functional group is a carboxyl group or a thiol group (-SH). Compound (G-1) can serve as a ligand coordinated to semiconductor particles (A) due to its presence of a carboxyl group and / or a thiol group. The composition may contain only one compound (G-1) or two or more compounds (G-1).

[0169] An example of compound (G-1) is a compound represented by the following formula (G-1a): Compound (G-1) may be an acid anhydride of the compound represented by formula (G-1a).

[0170]

[0171] [Where R B In the presence of multiple R B In the case of , they may be the same or different. The above-mentioned hydrocarbon group may have one or more substituents. In the case of multiple substituents, they may be the same or different, and they may be bonded to each other to form a ring together with the atoms to which they are bonded. The -CH2- contained in the above-mentioned hydrocarbon group may be replaced by at least one of -O-, -S-, -SO2-, -CO- and -NH-.

[0172] p represents an integer from 1 to 10.]

[0173] As R B Examples of the divalent hydrocarbon group represented by include chain hydrocarbon groups, alicyclic hydrocarbon groups, aromatic hydrocarbon groups, and groups formed by combining these groups.

[0174] Examples of the chain hydrocarbon group include linear or branched alkanediyl groups, which usually have 1 to 50 carbon atoms, preferably 1 to 20 carbon atoms, and more preferably 1 to 10 carbon atoms. Examples of the alicyclic hydrocarbon group include monocyclic or polycyclic cycloalkanediyl groups, which usually have 3 to 50 carbon atoms, preferably 3 to 20 carbon atoms, and more preferably 3 to 10 carbon atoms. Examples of the aromatic hydrocarbon group include monocyclic or polycyclic arenediyl groups, which usually have 6 to 20 carbon atoms.

[0175] Examples of the substituent that the hydrocarbon group may have include an alkyl group having 1 to 50 carbon atoms, a cycloalkyl group having 3 to 50 carbon atoms, an aryl group having 6 to 20 carbon atoms, a carboxyl group, an amino group, and a halogen atom. The substituent that the hydrocarbon group may have is preferably a carboxyl group, an amino group, or a halogen atom.

[0176] When -CH2- contained in the above hydrocarbon group is replaced by at least one of -O-, -CO-, and -NH-, the replacement for -CH2- is preferably at least one of -CO- and -NH-, more preferably -NH-. p is preferably 1 or 2.

[0177] Examples of the compound represented by formula (G-1a) include compounds represented by the following formulas (1-1) to (1-9).

[0178]

[0179] Specific examples of the compound represented by formula (G-1a) include, by chemical name, mercaptoacetic acid, 2-mercaptopropionic acid, 3-mercaptopropionic acid, 3-mercaptobutyric acid, 4-mercaptobutyric acid, mercaptosuccinic acid, mercaptostearic acid, mercaptooctanoic acid, 4-mercaptobenzoic acid, 2,3,5,6-tetrafluoro-4-mercaptobenzoic acid, L-cysteine, N-acetyl-L-cysteine, 3-methoxybutyl 3-mercaptopropionate, and 3-mercapto-2-methylpropionic acid. Among them, 3-mercaptopropionic acid and mercaptosuccinic acid are preferred.

[0180] Another example of compound (G-1) is a polycarboxylic acid compound, and preferably, compound (G-1b) is a compound represented by formula (G-1a) above, wherein -SH in formula (G-1a) is replaced by a carboxyl group (-COOH).

[0181] Examples of the compound (G-1b) include the following compounds.

[0182] Succinic acid, glutaric acid, adipic acid, octafluoroadipic acid, azelaic acid, dodecanedioic acid, tetradecanedioic acid, hexadecanedioic acid, heptadecanedioic acid, octadecanedioic acid, nonadecanedioic acid, dodecafluorooctanedioic acid, 3-ethyl-3-methylglutaric acid, hexafluoroglutaric acid, trans-3-hexenedioic acid, sebacic acid, hexadecanedicarboxylic acid, acetylene dicarboxylic acid, trans-aconitic acid, 1,3-adamantanedicarboxylic acid, bicyclo[2.2.2]octane-1,4-dicarboxylic acid, cis-4-cyclohexene-1,2-dicarboxylic acid, 1,1-cyclopropanedicarboxylic acid, 1,1-cyclobutanedicarboxylic acid, cis- or trans-1,3-cyclohexanedicarboxylic acid, cis- - or trans-1,4-cyclohexanedicarboxylic acid, 1,1-cyclopentanediacetic acid, 1,2,3,4-cyclopentanetetracarboxylic acid, decahydro-1,4-naphthalene dicarboxylic acid, 2,3-norbornane dicarboxylic acid, 5-norbornene-2,3-dicarboxylic acid, phthalic acid, 3-fluorophthalic acid, isophthalic acid, tetrafluoroisophthalic acid, terephthalic acid, tetrafluoroterephthalic acid, 2,5-dimethylterephthalic acid, 2,6-naphthalene dicarboxylic acid, 2,3-naphthalene dicarboxylic acid, 1,4-naphthalene dicarboxylic acid, 1,1'-ferrocene dicarboxylic acid, 2,2'-biphenyl dicarboxylic acid, 4,4'-biphenyl dicarboxylic acid, 2,5-furan dicarboxylic acid Acid, benzophenone-2,4'-dicarboxylic acid monohydrate, benzophenone-4,4'-dicarboxylic acid, 2,3-pyrazinedicarboxylic acid, 2,3-pyridinedicarboxylic acid, 2,4-pyridinedicarboxylic acid, 3,5-pyridinedicarboxylic acid, 2,5-pyridinedicarboxylic acid, 2,6-pyridinedicarboxylic acid, 3,4-pyridinedicarboxylic acid, pyrazole-3,5-dicarboxylic acid monohydrate, 4,4'-stilbene dicarboxylic acid, anthraquinone-2,3-dicarboxylic acid, 4-(carboxymethyl)benzoic acid, chelidonic acid monohydrate, azobenzene-4,4'-dicarboxylic acid, azobenzene-3,3'-dicarboxylic acid, chlorendic acid, 1H-imidazole-4,5-dicarboxylic acid , 2,2-bis(4-carboxyphenyl)hexafluoropropane, 1,10-bis(4-carboxyphenoxy)decane, dipropylmalonic acid, dithiodiglycolic acid, 3,3'-dithiodipropionic acid, 4,4'-dithiodibutyric acid, 4,4'-dicarboxydiphenyl ether, 4,4'-dicarboxydiphenyl sulfone, ethylene glycol bis(4-carboxyphenyl) ether, 3,4-ethylenedioxythiophene-2,5-dicarboxylic acid, 4,4'-isopropylidene diphenoxyacetic acid, 1,3-acetonedicarboxylic acid, methylenedisalicylic acid, 5,5'-thiodisalicylic acid, tris(2-carboxyethyl)isocyanurate, tetrafluorosuccinic acid, α,α,α',α'-tetramethyl-1,3-benzenedipropionic acid, 1,3,5-benzenetricarboxylic acid, etc.

[0183] From the perspective of improving the stability and dispersibility of the semiconductor particles (A) and the luminescence intensity of the wavelength conversion layer, the molecular weight of the compound (G-1) is preferably 3000 or less, more preferably 2500 or less, even more preferably 2000 or less, even more preferably 1000 or less, particularly preferably 800 or less, and most preferably 500 or less. The molecular weight of the compound (G-1) is generally 100 or greater.

[0184] The molecular weight may be a number average molecular weight or a weight average molecular weight. In this case, the number average molecular weight and the weight average molecular weight are respectively the number average molecular weight and the weight average molecular weight measured by gel permeation chromatography (GPC) in terms of standard polystyrene.

[0185] When composition I contains compound (G-1), the content ratio of compound (G-1) to semiconductor particles (A) in composition I is preferably 0.001 to 1, more preferably 0.01 to 0.5, and even more preferably 0.02 to 0.45, in terms of mass ratio. When the content ratio is within this range, it can be advantageous from the perspective of improving the stability and dispersibility of the semiconductor particles (A) and the luminous intensity of the wavelength conversion layer.

[0186] When composition I contains compound (G-1), from the viewpoint of improving the stability and dispersibility of the semiconductor particles (A) and the luminous intensity of the wavelength conversion layer, the content of compound (G-1) in composition I is preferably 0.1 mass % to 20 mass % relative to the total amount of solid components of composition I, more preferably 0.2 mass % to 20 mass %, further preferably 0.2 mass % to 10 mass %, even more preferably 0.5 mass % to 10 mass %, particularly preferably 0.5 mass % to 8 mass %.

[0187] [Compound (G-2)]

[0188] Compound (G-2), unlike compound (G-1), comprises a polyalkylene glycol structure and has a polar group at a molecular terminal. The molecular terminal is preferably the terminus of the longest carbon chain in compound (G-2) (carbon atoms in the carbon chain may be replaced by other atoms such as oxygen atoms).

[0189] The composition may contain only one compound (G-2) or two or more compounds (G-2). The composition may contain compound (G-1) or compound (G-2), or compound (G-1) and compound (G-2).

[0190] Note that a compound including a polyalkylene glycol structure and having the above-mentioned first functional group and second functional group belongs to compound (G-1).

[0191] The polyalkylene glycol structure refers to a structure represented by the following formula.

[0192]

[0193] (n is an integer greater than or equal to 2). C The alkylene group includes, for example, an ethylene group and a propylene group.

[0194] Specific examples of the compound (G-2) include polyalkylene glycol compounds represented by the following formula (G-2a).

[0195]

[0196] In formula (G-2a), X is a polar group, Y is a monovalent group, and Z is C is a divalent or trivalent group. n is an integer greater than 2. m is 1 or 2. R C It is an alkylene group.

[0197] The polar group X is preferably at least one group selected from the group consisting of a thiol group (-SH), a carboxyl group (-COOH), and an amino group (-NH2). Polar groups selected from this group can be advantageous in terms of improving coordination with the semiconductor particles (A). From the perspective of improving the stability and dispersibility of the semiconductor particles (A) and the luminescence intensity of the wavelength conversion layer, the polar group X is more preferably at least one group selected from the group consisting of a thiol group and a carboxyl group.

[0198] The group Y is a monovalent group. Group Y is not particularly limited, but examples thereof include monovalent hydrocarbon groups that may have substituents (such as N, O, S, or halogen atoms). The -CH2- group contained in the hydrocarbon group may be replaced by -O-, -S-, -C(=O)-, -C(=O)-O-, -OC(=O)-, -C(=O)-NH-, or -NH-. The number of carbon atoms in the hydrocarbon group is, for example, 1 or more and 12 or less. The hydrocarbon group may have an unsaturated bond.

[0199] As group Y, there can be mentioned: an alkyl group having a straight-chain, branched or cyclic structure with a carbon number of 1 or more and 12 or less; an alkoxy group having a straight-chain, branched or cyclic structure with a carbon number of 1 or more and 12 or less, etc. The number of carbon atoms of the alkyl group and the alkoxy group is preferably 1 or more and 8 or less, more preferably 1 or more and 6 or less, and further preferably 1 or more and 4 or less. The -CH2- contained in the alkyl group and the alkoxy group can be replaced by -O-, -S-, -C(=O)-, -C(=O)-O-, -OC(=O)-, -C(=O)-NH-, -NH-, etc. Among them, group Y is preferably a straight-chain or branched alkoxy group having a carbon number of 1 or more and 4 or less, more preferably a straight-chain alkoxy group having a carbon number of 1 or more and 4 or less.

[0200] Group Y may contain a polar group. Examples of such polar groups include at least one group selected from the group consisting of a thiol group (-SH), a carboxyl group (-COOH), and an amino group (-NH2). However, as described above, compounds containing a polyalkylene glycol structure and having the aforementioned first and second functional groups fall within the category of compound (G-1). The polar group is preferably located at the terminal end of group Y.

[0201] Group Z C is a divalent or trivalent group. C The hydrocarbon group is not particularly limited and may include a divalent or trivalent hydrocarbon group that may contain a heteroatom (N, O, S, a halogen atom, etc.). The number of carbon atoms in the hydrocarbon group is, for example, 1 to 24. The hydrocarbon group may have an unsaturated bond.

[0202] Regarding the group Z as a divalent group C , examples include: an alkylene group having a linear, branched, or cyclic structure with a carbon number of 1 or more and 24 or less; an alkenylene group having a linear, branched, or cyclic structure with a carbon number of 1 or more and 24 or less, etc. The number of carbon atoms of the alkyl and alkenylene groups is preferably 1 or more and 12 or less, more preferably 1 or more and 8 or less, and further preferably 1 or more and 4 or less. -CH2- contained in the alkyl and alkenylene groups can be replaced by -O-, -S-, -C(=O)-, -C(=O)-O-, -OC(=O)-, -C(=O)-NH-, -NH-, etc. About the group Z as a trivalent group C Examples of the above-mentioned divalent group Z include: C A group after removing one hydrogen atom.

[0203] Group Z C It may have a branched structure. Group Z having a branched structure CA branched chain different from the branched chain including the polyalkylene glycol structure represented by the above formula (G-2a) may have a polyalkylene glycol structure different from the polyalkylene glycol structure represented by the above formula (G-2a).

[0204] Among them, group Z C It is preferably a linear or branched alkylene group having 1 to 6 carbon atoms, and more preferably a linear alkylene group having 1 to 4 carbon atoms.

[0205] R C The alkylene group is preferably a linear or branched alkylene group having 1 to 6 carbon atoms, and more preferably a linear alkylene group having 1 to 4 carbon atoms.

[0206] n in formula (G-2a) is an integer of 2 or greater, preferably 2 or greater and 540 or less, more preferably 2 or greater and 120 or less, and even more preferably 2 or greater and 60 or less.

[0207] The molecular weight of compound (G-2) can be, for example, from about 150 to about 10,000. From the perspective of improving the stability and dispersibility of the semiconductor particles (A) and the luminescence intensity of the wavelength conversion layer, it is preferably from 150 to 5,000, and more preferably from 150 to 4,000. This molecular weight can be either a number average molecular weight or a weight average molecular weight. In this case, the number average molecular weight and the weight average molecular weight are, respectively, the number average molecular weight and the weight average molecular weight measured by GPC in terms of standard polystyrene.

[0208] When composition I contains compound (G-2), the content ratio of compound (G-2) to semiconductor particles (A) in composition I is preferably 0.001 to 2, more preferably 0.01 to 1.5, and even more preferably 0.1 to 1. When the content ratio is within this range, it can be advantageous from the viewpoint of improving the stability and dispersibility of the semiconductor particles (A) and the luminous intensity of the wavelength conversion layer.

[0209] When composition I contains compound (G-2), from the viewpoint of improving the stability and dispersibility of the semiconductor particles (A) and the luminous intensity of the wavelength conversion layer, the content of compound (G-2) in composition I is preferably 0.1 mass % or more and 40 mass % or less, more preferably 0.1 mass % or more and 20 mass % or less, further preferably 1 mass % or more and 15 mass % or less, and even more preferably 2 mass % or more and 12 mass % or less, relative to the total amount of solid components of composition I.

[0210] When composition I contains an organic ligand (G), the content ratio of the organic ligand (G) to the semiconductor particles (A) in composition I is preferably 0.001 to 1, more preferably 0.01 to 0.8, and even more preferably 0.02 to 0.5, by mass. This content ratio within this range can be advantageous from the perspective of improving the stability and dispersibility of the semiconductor particles (A) and the luminescence intensity of the wavelength conversion layer. The content of the organic ligand (G) referred to herein refers to the total content of all organic ligands contained in composition I.

[0211] From the viewpoint of improving the stability and dispersibility of the semiconductor particles (A) and the luminous intensity of the wavelength conversion layer, the total content of the semiconductor particles (A) and the organic ligand (G) in the composition I is preferably greater than 10 mass % and less than 75 mass %, more preferably greater than 12 mass % and less than 70 mass %, and further preferably greater than 15 mass % and less than 65 mass %, relative to the total amount of solid components of the composition I.

[0212] Composition II and Composition III preferably contain substantially no organic ligand (G). "Substantially no organic ligand (G)" means that the content of the organic ligand (G) relative to the total solid content of Composition II or Composition III is preferably 1% by mass or less, more preferably 0.5% by mass or less, even more preferably 0.1% by mass or less, and particularly preferably 0% by mass.

[0213] <Light scattering agent (B)>

[0214] Examples of the light scattering agent (B) include inorganic particles such as metal or metal oxide particles and glass particles. Examples of metal oxides include TiO2, SiO2, BaTiO3, and ZnO. TiO2 particles are preferred for efficient light scattering. The particle size of the light scattering agent (B) is, for example, approximately 0.03 μm to 20 μm, preferably 0.05 μm to 1 μm, and more preferably 0.05 μm to 0.5 μm.

[0215] As the light scattering agent (B), a light scattering agent that has been dispersed in part or all of the solvent (J) using a dispersant can be used. As the dispersant, a commercially available product can be used. Examples of commercially available products include:

[0216] DISPERBYK-101, 102, 103, 106, 107, 108, 109, 110, 111, 116, 118, 130, 140, 154, 161, 162, 163, 164, 165, 166, 170, 171, 174, 180, 181, 182, 183, 184, 185, 190, 192, 2000 manufactured by BYK Japan , 2001, 2020, 2025, 2050, 2070, 2095, 2150, 2155; ANTI-TERRA-U, U100, 203, 204, 250; BYK -P104, P104S, P105, 220S, 6919; BYK-LPN6919, 21116; LACTIMON, LACTIMON-WS; Bykumen, etc.;

[0217] SOLSPERSE-3000, 9000, 13000, 13240, 13650, 13940, 16000, 17000, 18000, 20000, 21000, 24000, 26000, 27000, 28000, 31845, 32000, 32500, 32550, 33500, 32600, 34750, 35100, 36600, 38500, 41000, 41090, 53095, 55000, 76500, etc. manufactured by Japan Lubrizol;

[0218] EFKA-46, 47, 48, 452, 4008, 4009, 4010, 4015, 4020, 4047, 4050, 4055, 4060, 4080, 4400, 4401, 4402, 4403, 4406, 4408, 4300, 4310, 4320, 4330, 4340, 450, 451, 453, 4540, 4550, 4560, 4800, 5010, 5065, 5066, 5070, 7500, 7554, 1101, 120, 150, 1501, 1502, 1503, etc. manufactured by BASF;

[0219] AJISPER PA111, PB711, PB821, PB822, PB824, etc. manufactured by Ajinomoto Fine-Techno Co., Ltd.

[0220] The content rate of the light-scattering agent (B) in Composition I is, for example, 0.001% by mass or more and 50% by mass or less, preferably 1% by mass or more and 30% by mass or less, more preferably 2% by mass or more and 20% by mass or less, still more preferably 2% by mass or more and 15% by mass or less, and even more preferably 3% by mass or more and 10% by mass or less, based on the total amount of the solid components of Composition I.

[0221] Composition II and Composition III preferably substantially do not contain the light-scattering agent (B). "Substantially do not contain the light-scattering agent (B)" means that the content rate of the light-scattering agent (B) is preferably 1% by mass or less, more preferably 0.5% by mass or less, still more preferably 0.1% by mass or less, and particularly preferably 0% by mass, based on the total amount of the solid components of Composition II or Composition III.

[0222] <Colorant (I)>

[0223] The colorant (I) may be a pigment or a dye. As the pigment, known pigments can be used, for example, pigments classified as pigments in The Society of Dyers and Colourists' Colour Index. One kind of pigment may be used alone, or two or more kinds may be used in combination. As the dye, known dyes can be used, for example, dyes described in The Society of Dyers and Colourists' Colour Index and Dyeing Notes (Shikisen Note) (Shikisen-sha). One kind of dye may be used alone, or two or more kinds may be used in combination. [[ID=I1]]

[0224] The colorant (I) is preferably a pigment and preferably contains at least one selected from the group consisting of yellow colorants, green colorants, and red colorants.

[0225] Examples of the yellow colorant include: C.I. Pigment Yellow 1, 3, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 83, 86, 93, 94, 109, 110, 117, 125, 128, 129, 137, 138, 139, 147, 148, 150, 153, 154, 166, 173, 185, 194, 214, 231, etc. Other examples of the yellow colorant are the following dyes.

[0226] C.I. Solvent Yellow 4, 14, 15, 23, 24, 25, 38, 62, 63, 68, 79, 81, 82, 83, 89, 94, 98, 99, 117, 162, 163, 167, 189, etc. C.I. Solvent Dyes;

[0227] CI Acid Yellow 1, 3, 7, 9, 11, 17, 23, 25, 29, 34, 36, 38, 40, 42, 54, 65, 72, 73, 76, 79, 98, 99, 111, 112, 113, 114, 116, 119, 123, 128, 134, 135, 138, 139, 140, 144, 150, 155, 157, 16 0, 161, 163, 168, 169, 172, 177, 178, 179, 184, 190, 193, 196, 197, 199, 202, 203, 204, 205, 207, 212, 214, 220, 221, 228, 230, 232, 235, 238, 240, 242, 243, 251 and other CI acid dyes;

[0228] CI direct dyes such as CI Direct Yellow 2, 4, 28, 33, 34, 35, 38, 39, 43, 44, 47, 50, 54, 58, 68, 69, 70, 71, 86, 93, 94, 95, 98, 102, 108, 109, 129, 132, 136, 138, 141;

[0229] CI disperse dyes such as CI Disperse Yellow 51, 54, 76;

[0230] CI reactive dyes such as CI Reactive Yellow 2, 76, 116;

[0231] CI mordant yellow 5, 8, 10, 16, 20, 26, 30, 31, 33, 42, 43, 45, 56, 61, 62, 65 and other CI mordant dyes, etc.

[0232] Examples of green colorants include green pigments such as CI Pigment Green 7, 36, 58, 59, 62, and 63. Other examples of green colorants include the following dyes.

[0233] CI solvent dyes such as CI Solvent Green 1, 3, 4, 5, 7, 28, 29, 32, 33, 34, 35;

[0234] CI acid green 1, 3, 5, 6, 7, 8, 9, 11, 13, 14, 15, 16, 22, 25, 27, 28, 41, 50, 50:1, 58, 63, 65, 80, 104, 105, 106, 109 and other CI acid dyes;

[0235] CI direct dyes such as CI Direct Green 25, 27, 31, 32, 34, 37, 63, 65, 66, 67, 68, 69, 72, 79, 82;

[0236] CI basic dyes such as CI Basic Green 1;

[0237] CI mordant green 1, 3, 4, 5, 10, 13, 15, 19, 21, 23, 26, 29, 31, 33, 34, 35, 41, 43, 53 and other CI mordant dyes;

[0238] CI vat dyes such as CI Vat Green 1, etc.

[0239] Examples of red colorants include CI Pigment Red 9, 97, 105, 122, 123, 144, 149, 166, 168, 176, 177, 178, 179, 180, 190, 192, 209, 215, 216, 224, 242, 254, 255, 264, 265, 266, 268, 269, and 273. Other examples of red colorants include the following dyes.

[0240] CI solvent dyes such as CI Solvent Red 24, 45, 49, 90, 91, 111, 118, 119, 122, 124, 125, 127, 130, 132, 143, 145, 146, 150, 151, 155, 160, 168, 169, 172, 175, 181, 207, 218, 222, 227, 230, 245, 247;

[0241] CI Acid Red 1, 4, 8, 14, 17, 18, 26, 27, 29, 31, 33, 34, 35, 37, 40, 42, 44, 50, 51, 52, 57, 66, 73, 76, 80, 87, 88, 91, 92, 94, 95, 97, 98, 103, 106, 111, 114, 129, 133, 134, 138, 143, 145, 150, 151, 155, 158, 160, 172, 176, 182, 183 , 195, 198, 206, 211, 215, 216, 217, 227, 228, 249, 252, 257, 258, 260, 261, 266, 268, 270, 274, 277, 280, 281, 289, 308, 312, 315, 316, 339, 341, 345, 346, 349, 382, ​​383, 388, 394, 401, 412, 417, 418, 422, 426 and other CI acid dyes;

[0242] CI Direct Red 79, 82, 83, 84, 91, 92, 96, 97, 98, 99, 105, 106, 107, 172, 173, 176, 177, 179, 181, 182, 184, 204, 207, 211, 213, 218, 220, 221, 222, 232, 233, 234, 241, 243, 246, 250 and other CI direct dyes;

[0243] CI basic dyes such as CI Basic Red 1, 9, 10;

[0244] CI Mordant Red 1, 2, 3, 4, 9, 11, 12, 14, 17, 18, 19, 22, 23, 24, 25, 26, 27, 29, 30, 32, 33, 36, 37, 38, 39, 41, 42, 43, 45, 46, 48, 52, 53, 56, 62, 63, 71, 74, 76, 78, 85, 86, 88, 90, 94, 95 and other CI mordant dyes, etc.

[0245] The colorant (I) more preferably contains a yellow colorant, further preferably contains a yellow pigment, and further preferably contains at least one selected from the group consisting of CI Pigment Yellow 138, 150, and 231.

[0246] The colorant (I) may be subjected to, as necessary, rosin treatment, surface treatment using a colorant derivative having an acidic or basic group introduced therein, grafting treatment onto the colorant surface using a polymer compound, micronization treatment using a sulfuric acid micronization method, washing treatment using an organic solvent or water to remove impurities, or removal of ionic impurities using an ion exchange method. The particle size of the colorant (I) is preferably substantially uniform.

[0247] When Composition II contains a green colorant and / or a red colorant, the colorant (I) contained in Composition II is preferably a green colorant when the wavelength conversion layer is a layer that emits green light, and is preferably a red colorant when the wavelength conversion layer is a layer that emits red light. The green colorant and the red colorant may be used alone or in combination of two or more.

[0248] The content of the colorant (I) in the composition II relative to the total solid content of the composition II is, for example, 0.01% by mass or more and 99.99% by mass or less, preferably 0.1% by mass or more and 99.9% by mass or less, more preferably 1% by mass or more and 99% by mass or less, further preferably 10% by mass or more and 90% by mass or less, and even more preferably 15% by mass or more and 70% by mass or less.

[0249] Composition I preferably contains substantially no colorant (I). "Substantially no colorant (I)" means that the content of colorant (I) relative to the total solid content of composition I is preferably 1% by mass or less, more preferably 0.5% by mass or less, further preferably 0.1% by mass or less, and particularly preferably 0% by mass.

[0250] Composition III does not substantially contain the colorant (I). The content of the colorant (I) relative to the total solid content of Composition III is preferably 1% by mass or less, more preferably 0.5% by mass or less, further preferably 0.1% by mass or less, and particularly preferably 0% by mass.

[0251] <Resin (C)>

[0252] Examples of the resin (C) include the following resins [K1] to [K6].

[0253] Resin [K1]: a copolymer having a structural unit derived from at least one (a) selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic anhydrides (hereinafter also referred to as “(a)”) and a structural unit derived from a monomer (c) copolymerizable with (a) (however, different from (a)) (hereinafter also referred to as “(c)”);

[0254] Resin [K2]: a copolymer comprising structural units derived from the above-mentioned (a), structural units derived from the above-mentioned (c), and structural units derived from a monomer (b) having a cyclic ether structure having 2 to 4 carbon atoms and an ethylenically unsaturated bond (hereinafter also referred to as "(b)");

[0255] Resin [K3]: a copolymer having a structural unit obtained by adding the structural unit derived from the above-mentioned (b) to the structural unit derived from the above-mentioned (a) and a structural unit derived from the above-mentioned (c);

[0256] Resin [K4]: a copolymer comprising a structural unit obtained by adding the structural unit derived from the structural unit of the structural unit (a) to the structural unit (b), followed by ester bonding with a carboxylic acid anhydride, and a structural unit derived from the structural unit (c);

[0257] Resin [K5]: a copolymer having a structural unit obtained by adding the structural unit derived from the above-mentioned (a) and the above-mentioned (b) and a structural unit derived from the above-mentioned (c);

[0258] Resin [K6]: A copolymer having a structural unit obtained by adding the structural unit derived from the above (a) and the above (b), followed by ester bonding with a carboxylic acid anhydride, and a structural unit derived from the above (c).

[0259] Examples of (a) include unsaturated monocarboxylic acids such as (meth)acrylic acid, crotonic acid, o-vinylbenzoic acid, m-vinylbenzoic acid, and p-vinylbenzoic acid;

[0260] Unsaturated dicarboxylic acids such as maleic acid, fumaric acid, citraconic acid, mesaconic acid, itaconic acid, 3-vinylphthalic acid, 4-vinylphthalic acid, 3,4,5,6-tetrahydrophthalic acid, 1,2,3,6-tetrahydrophthalic acid, dimethyltetrahydrophthalic acid, and 1,4-cyclohexenedicarboxylic acid;

[0261] Bicyclic unsaturated compounds containing a carboxyl group, such as methyl-5-norbornene-2,3-dicarboxylic acid, 5-carboxybicyclo[2.2.1]hept-2-ene, 5,6-dicarboxybicyclo[2.2.1]hept-2-ene, 5-carboxy-5-methylbicyclo[2.2.1]hept-2-ene, 5-carboxy-5-ethylbicyclo[2.2.1]hept-2-ene, 5-carboxy-6-methylbicyclo[2.2.1]hept-2-ene, and 5-carboxy-6-ethylbicyclo[2.2.1]hept-2-ene;

[0262] Unsaturated dicarboxylic acid anhydrides such as maleic anhydride, citraconic anhydride, itaconic anhydride, 3-vinylphthalic anhydride, 4-vinylphthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride, 1,2,3,6-tetrahydrophthalic anhydride, dimethyltetrahydrophthalic anhydride, and 5,6-dicarboxybicyclo[2.2.1]hept-2-ene anhydride;

[0263] Unsaturated mono[(meth)acryloyloxyalkyl] esters of divalent or higher polycarboxylic acids such as mono[2-(meth)acryloyloxyethyl] succinate and mono[2-(meth)acryloyloxyethyl] phthalate;

[0264] Unsaturated (meth)acrylates containing hydroxyl and carboxyl groups in the same molecule, such as α-(hydroxymethyl) (meth) acrylic acid.

[0265] Among them, (meth)acrylic acid, mono[2-(meth)acryloyloxyethyl]succinate, maleic anhydride, and the like are preferred from the viewpoint of copolymerization reactivity and the like.

[0266] In this specification, (meth)acrylic acid refers to acrylic acid and / or methacrylic acid, and the same applies to "(meth)acryloyl" and "(meth)acrylate".

[0267] (b) is, for example, a monomer having a cyclic ether structure having 2 to 4 carbon atoms (e.g., at least one selected from the group consisting of an oxirane ring, an oxetane ring, and a tetrahydrofuran ring) and an ethylenically unsaturated bond. (b) is preferably a monomer having a cyclic ether structure having 2 to 4 carbon atoms and a (meth)acryloyloxy group.

[0268] Examples of (b) include a monomer (b1) having an oxirane group and an ethylenically unsaturated bond (hereinafter sometimes referred to as “(b1)”), a monomer (b2) having an oxetane group and an ethylenically unsaturated bond (hereinafter sometimes referred to as “(b2)”), and a monomer (b3) having a tetrahydrofuran group and an ethylenically unsaturated bond (hereinafter sometimes referred to as “(b3)”).

[0269] Examples of (b1) include a monomer (b1-1) having an epoxidized structure of a linear or branched aliphatic unsaturated hydrocarbon (hereinafter sometimes referred to as “(b1-1)”), and a monomer (b1-2) having an epoxidized structure of an alicyclic unsaturated hydrocarbon (hereinafter sometimes referred to as “(b1-2)”).

[0270] Examples of (b1-1) include glycidyl (meth)acrylate, β-methyl glycidyl (meth)acrylate, β-ethyl glycidyl (meth)acrylate, glycidyl vinyl ether, o-vinylbenzyl glycidyl ether, m-vinylbenzyl glycidyl ether, p-vinylbenzyl glycidyl ether, α-methyl-o-vinylbenzyl glycidyl ether, α-methyl-m-vinylbenzyl glycidyl ether, α-methyl-p-vinylbenzyl glycidyl ether, 2,3-bis(glycidyloxy) 2,4-bis(glycidyloxymethyl)styrene, 2,5-bis(glycidyloxymethyl)styrene, 2,6-bis(glycidyloxymethyl)styrene, 2,3,4-tris(glycidyloxymethyl)styrene, 2,3,5-tris(glycidyloxymethyl)styrene, 2,3,6-tris(glycidyloxymethyl)styrene, 3,4,5-tris(glycidyloxymethyl)styrene, 2,4,6-tris(glycidyloxymethyl)styrene, etc.

[0271] Examples of (b1-2) include vinylcyclohexene monoxide, 1,2-epoxy-4-vinylcyclohexane (e.g., CELLOXIDE 2000; manufactured by Daicel Corporation), 3,4-epoxycyclohexylmethyl (meth)acrylate (e.g., Cyclomer A400; manufactured by Daicel Corporation), 3,4-epoxycyclohexylmethyl (meth)acrylate (e.g., Cyclomer M100; manufactured by Daicel Corporation), a compound represented by formula (BI), and a compound represented by formula (BII).

[0272]

[0273] [In formula (BI) and formula (BII), R e and R fIt represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and the hydrogen atom contained in the alkyl group may be substituted by a hydroxy group.

[0274] X e and X f Indicates a single bond, *-R g -,*-R g -O-, *-R g -S- or *-R g -NH-.

[0275] R g It represents an alkanediyl group having 1 to 6 carbon atoms.

[0276] *Indicates the bonding site with O.]

[0277] Examples of the alkyl group having 1 to 4 carbon atoms include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, and a tert-butyl group.

[0278] Examples of the alkyl group in which a hydrogen atom is substituted by a hydroxy group include a hydroxymethyl group, a 1-hydroxyethyl group, a 2-hydroxyethyl group, a 1-hydroxypropyl group, a 2-hydroxypropyl group, a 3-hydroxypropyl group, a 1-hydroxy-1-methylethyl group, a 2-hydroxy-1-methylethyl group, a 1-hydroxybutyl group, a 2-hydroxybutyl group, a 3-hydroxybutyl group, and a 4-hydroxybutyl group.

[0279] As R e and R f Preferred examples include a hydrogen atom, a methyl group, a hydroxymethyl group, a 1-hydroxyethyl group, and a 2-hydroxyethyl group, and more preferred examples include a hydrogen atom and a methyl group.

[0280] Examples of the alkanediyl group include a methylene group, an ethylene group, a propane-1,2-diyl group, a propane-1,3-diyl group, a butane-1,4-diyl group, a pentane-1,5-diyl group, and a hexane-1,6-diyl group.

[0281] As X e and X f , preferably include a single bond, a methylene group, an ethylene group, *-CH2-O- and *-CH2CH2-O-, and more preferably include a single bond and *-CH2CH2-O- (* represents a bonding site with O).

[0282] Examples of the compound represented by formula (BI) include compounds represented by any one of formulas (BI-1) to (BI-15). Among them, compounds represented by formula (BI-1), formula (BI-3), formula (BI-5), formula (BI-7), formula (BI-9), or formulas (BI-11) to (BI-15) are preferred, and compounds represented by formula (BI-1), formula (BI-7), formula (BI-9), or formula (BI-15) are more preferred.

[0283]

[0284] Examples of the compound represented by formula (BII) include compounds represented by any one of formulas (BII-1) to (BII-15). Among them, compounds represented by formula (BII-1), formula (BII-3), formula (BII-5), formula (BII-7), formula (BII-9), or formulas (BII-11) to (BII-15) are preferred, and compounds represented by formula (BII-1), formula (BII-7), formula (BII-9), or formula (BII-15) are more preferred.

[0285]

[0286] The compound represented by formula (BI) and the compound represented by formula (BII) may be used alone or in combination of two or more. When the compound represented by formula (BI) and the compound represented by formula (BII) are used in combination, the content ratio [compound represented by formula (BI) : compound represented by formula (BII)] is preferably 5:95 to 95:5, more preferably 20:80 to 80:20, on a molar basis.

[0287] As (b2), a monomer having an oxetanyl group and a (meth)acryloyloxy group is more preferred. Examples of (b2) include 3-methyl-3-methacryloyloxymethyloxetane, 3-methyl-3-acryloyloxymethyloxetane, 3-ethyl-3-methacryloyloxymethyloxetane, 3-ethyl-3-acryloyloxymethyloxetane, 3-methyl-3-methacryloyloxyethyloxetane, 3-methyl-3-acryloyloxyethyloxetane, 3-ethyl-3-methacryloyloxyethyloxetane, and 3-ethyl-3-acryloyloxyethyloxetane.

[0288] As (b3), a monomer having a tetrahydrofuranyl group and a (meth)acryloyloxy group is more preferred. Specific examples of (b3) include tetrahydrofurfuryl acrylate (for example, Viscoat V#150, manufactured by Osaka Organic Chemical Industry Co., Ltd.) and tetrahydrofurfuryl methacrylate.

[0289] As (b), (b1) is preferable from the viewpoint of further improving reliability such as heat resistance and chemical resistance.

[0290] As (b), a monomer having an ethylene oxide ring and an ethylenically unsaturated bond is preferred because the reactivity during the production of the resins [K3] to [K6] is high and unreacted (b) is less likely to remain.

[0291] Examples of (c) include methyl (meth)acrylate, ethyl (meth)acrylate, n-butyl (meth)acrylate, sec-butyl (meth)acrylate, tert-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, dodecyl (meth)acrylate, lauryl (meth)acrylate, stearyl (meth)acrylate, cyclopentyl (meth)acrylate, cyclohexyl (meth)acrylate, 2-methylcyclohexyl (meth)acrylate, tricyclo[5.2.1.0](meth)acrylate. 2,6 ] decane-8-yl ester (in this technical field, as a common name, it is called "tetrahydrodicyclopentadienyl (meth)acrylate". In addition, it is sometimes called "tricyclodecyl (meth)acrylate"), tricyclo[5.2.1.0 2,6 ] decen-8-yl ester (in this technical field, as a common name, referred to as "dihydrodicyclopentadienyl (meth)acrylate"); (meth)acrylates such as tetrahydrodicyclopentadienyloxyethyl (meth)acrylate, isobornyl (meth)acrylate, adamantyl (meth)acrylate, allyl (meth)acrylate, propargyl (meth)acrylate, phenyl (meth)acrylate, naphthyl (meth)acrylate, and benzyl (meth)acrylate;

[0292] (Meth)acrylates containing hydroxyl groups, such as 2-hydroxyethyl (meth)acrylate and 2-hydroxypropyl (meth)acrylate;

[0293] Diethyl maleate, diethyl fumarate, diethyl itaconate and other dicarboxylic acid diesters;

[0294] Bicyclo[2.2.1]hept-2-ene, 5-methylbicyclo[2.2.1]hept-2-ene, 5-ethylbicyclo[2.2.1]hept-2-ene, 5-hydroxybicyclo[2.2.1]hept-2-ene, 5-hydroxymethylbicyclo[2.2.1]hept-2-ene, 5-(2'-hydroxyethyl)bicyclo[2.2.1]hept-2-ene, 5-methoxybicyclo[2.2.1]hept-2-ene, 5-ethoxybicyclo[2.2.1]hept-2-ene, 5,6-dihydroxybicyclo[2.2.1]hept-2-ene, 5,6-bis(hydroxymethyl)bicyclo[2.2.1]hept-2-ene, 5,6-bis(2'-hydroxyethyl)bicyclo[2.2.1]hept-2-ene, 5,6-dimethoxy Bicyclic unsaturated compounds such as bicyclo[2.2.1]hept-2-ene, 5,6-diethoxybicyclo[2.2.1]hept-2-ene, 5-hydroxy-5-methylbicyclo[2.2.1]hept-2-ene, 5-hydroxy-5-ethylbicyclo[2.2.1]hept-2-ene, 5-hydroxymethyl-5-methylbicyclo[2.2.1]hept-2-ene, 5-tert-butoxycarbonylbicyclo[2.2.1]hept-2-ene, 5-cyclohexyloxycarbonylbicyclo[2.2.1]hept-2-ene, 5-phenoxycarbonylbicyclo[2.2.1]hept-2-ene, 5,6-bis(tert-butoxycarbonyl)bicyclo[2.2.1]hept-2-ene, and 5,6-bis(cyclohexyloxycarbonyl)bicyclo[2.2.1]hept-2-ene;

[0295] Dicarbonyl imide derivatives such as N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, 3-maleimidobenzoic acid N-succinimidyl ester, 4-maleimidobutyric acid N-succinimidyl ester, 6-maleimidocaproic acid N-succinimidyl ester, 3-maleimidopropionic acid N-succinimidyl ester, and N-(9-acridinyl)maleimide;

[0296] Styrene, α-methylstyrene, m-methylstyrene, p-methylstyrene, vinyltoluene, p-methoxystyrene, acrylonitrile, methacrylonitrile, vinyl chloride, vinylidene chloride, acrylamide, methacrylamide, vinyl acetate, 1,3-butadiene, isoprene, 2,3-dimethyl-1,3-butadiene, etc.

[0297] Among the above, from the viewpoint of copolymerization reactivity and heat resistance of the resin (C), methyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, tetrahydrodicyclopentadienyl (meth)acrylate, benzyl (meth)acrylate, styrene, vinyltoluene, N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, bicyclo[2.2.1]hept-2-ene, and the like are preferred.

[0298] In the resin [K1], the ratio of the structural units derived from each monomer in all the structural units constituting the resin [K1] is preferably:

[0299] Structural units derived from (a): 2 mol% or more and 60 mol% or less,

[0300] Structural units derived from (c): 40 mol% or more and 98 mol% or less;

[0301] More preferably:

[0302] Structural units derived from (a): 10 mol% or more and 50 mol% or less,

[0303] Structural units derived from (c): 50 mol% or more and 90 mol% or less.

[0304] When the ratio of the structural units of the resin [K1] is within the above range, the storage stability and solvent resistance tend to be excellent.

[0305] Resin [K1] can be produced, for example, by referring to the method described in the document "Experimental Methods for Polymer Synthesis" (written by Takayuki Otsu, published by Kagaku Doujin Co., Ltd., first edition, first printing, published on March 1, 1972) and the cited documents described in the document.

[0306] Specifically, a method is exemplified in which predetermined amounts of (a) and (c), a polymerization initiator, and a solvent are added to a reaction vessel, a deoxygenated atmosphere is created by replacing oxygen with nitrogen, and the mixture is heated and maintained while stirring.

[0307] The polymerization initiator and solvent used are not particularly limited, and those commonly used in this field can be used. For example, polymerization initiators include azo compounds (such as 2,2'-azobisisobutyronitrile and 2,2'-azobis(2,4-dimethylvaleronitrile)) and organic peroxides (such as benzoyl peroxide). Solvents that dissolve the monomers can be used, and examples thereof include those described below as solvent (J).

[0308] The resulting copolymer may be used directly as a post-reaction solution, after concentration or dilution, or after being isolated as a solid (powder) by reprecipitation or other methods. If a solvent (J) described below is used as a solvent during polymerization, the post-reaction solution can be used directly in the preparation of the composition, thereby simplifying the composition production process.

[0309] In the resin [K2], the ratio of the structural units derived from each monomer in all the structural units constituting the resin [K2] is preferably:

[0310] Structural units derived from (a): 2 mol% to 45 mol%,

[0311] Structural units derived from (b): 2 mol% to 95 mol%,

[0312] Structural units derived from (c): 1 mol% to 65 mol%;

[0313] More preferably:

[0314] Structural units derived from (a): 5 mol% to 40 mol%,

[0315] Structural units derived from (b): 5 mol% to 80 mol%,

[0316] Structural units derived from (c): 5 mol % to 60 mol %.

[0317] When the ratio of the structural unit of the resin [K2] is within the above range, the storage stability of the compositions I to III and the developability when forming a colored pattern tend to be excellent.

[0318] The resin [K2] can be produced, for example, in the same manner as described as the method for producing the resin [K1].

[0319] Resin [K3] can be produced by adding the cyclic ether having 2 to 4 carbon atoms contained in (b) and the carboxylic acid and / or carboxylic anhydride contained in (a) to the copolymer of (a) and (c).

[0320] First, a copolymer of (a) and (c) is produced in the same manner as described as the method for producing resin [K1]. In this case, the ratio of the structural units derived from the respective monomers is preferably the same as described for resin [K1].

[0321] Next, the cyclic ether having 2 to 4 carbon atoms contained in (b) is reacted with a portion of the carboxylic acid and / or carboxylic anhydride derived from (a) in the copolymer.

[0322] After producing the copolymer of (a) and (c), the atmosphere in the flask is replaced from nitrogen to air, and the reaction is carried out at, for example, 60° C. to 130° C. for 1 to 10 hours in the presence of (b), a reaction catalyst (e.g., an organic phosphorus compound, a metal complex, an amine compound, etc.) of a carboxylic acid or a carboxylic anhydride and a cyclic ether, and a polymerization inhibitor (e.g., hydroquinone, etc.), thereby producing resin [K3].

[0323] The amount of (a) and (b) used per 100 mol is preferably 5 mol or more and 80 mol or less, and more preferably 10 mol or more and 75 mol or less. By setting the amount within this range, the storage stability of the composition and the balance between the solvent resistance, heat resistance, and mechanical strength of each layer tend to be improved.

[0324] Examples of organophosphorus compounds used as reaction catalysts include triphenylphosphine. Examples of amine compounds used as reaction catalysts include aliphatic tertiary amine compounds and aliphatic quaternary ammonium salt compounds. Specific examples include tris(dimethylaminomethyl)phenol, triethylamine, tetrabutylammonium bromide, and tetrabutylammonium chloride. The reaction catalyst is preferably an organophosphorus compound.

[0325] The amount of the reaction catalyst used is preferably 0.001 parts by mass or more and 5 parts by mass or less relative to 100 parts by mass of the total amount of (a), (b), and (c).

[0326] The amount of the polymerization inhibitor used is preferably 0.001 parts by mass or more and 5 parts by mass or less relative to 100 parts by mass of the total amount of (a), (b), and (c).

[0327] The reaction conditions such as the feeding method, reaction temperature and time can be appropriately adjusted in consideration of the production equipment, the amount of heat generated by the polymerization, etc. It should be noted that, like the polymerization conditions, the feeding method and reaction temperature can be appropriately adjusted in consideration of the production equipment, the amount of heat generated by the polymerization, etc.

[0328] Resin [K4] is a resin obtained by further reacting resin [K3] with carboxylic acid anhydride. Carboxylic acid anhydride is reacted with hydroxyl groups generated by the reaction of carboxylic acid or carboxylic acid anhydride with cyclic ether.

[0329] Examples of the carboxylic anhydride include succinic anhydride, maleic anhydride, citraconic anhydride, itaconic anhydride, 3-vinylphthalic anhydride, 4-vinylphthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride, 1,2,3,6-tetrahydrophthalic anhydride, dimethyltetrahydrophthalic anhydride, and 5,6-dicarboxybicyclo[2.2.1]hept-2-ene anhydride.

[0330] The amount of carboxylic anhydride used is preferably 0.5 mol or more and 1 mol or less relative to 1 mol of the amount of (b) used.

[0331] Regarding resin [K5], as a first step, a copolymer of (b) and (c) is obtained in the same manner as for the production of resin [K1]. As described above, the obtained copolymer may be used directly as a solution after the reaction, after concentration or dilution, or after being extracted as a solid (powder) by methods such as reprecipitation.

[0332] The ratios of the structural units derived from (b) and (c) relative to the total number of moles of all structural units constituting the copolymer are preferably:

[0333] Structural units derived from (b): 5 mol% or more and 95 mol% or less,

[0334] Structural units derived from (c): 5 mol% or more and 95 mol% or less;

[0335] More preferably:

[0336] Structural units derived from (b): 10 mol% or more and 90 mol% or less,

[0337] Structural units derived from (c): 10 mol % or more and 90 mol % or less.

[0338] Resin [K5] can be obtained by reacting the carboxylic acid or carboxylic anhydride contained in (a) with the cyclic ether derived from (b) contained in the copolymer of (b) and (c) under the same conditions as those for producing resin [K3].

[0339] The amount of (a) to be reacted with the copolymer is preferably 5 mol or more and 80 mol or less relative to 100 mol of (b).

[0340] Resin [K6] is a resin obtained by further reacting resin [K5] with carboxylic acid anhydride. Carboxylic acid anhydride is reacted with hydroxyl groups generated by the reaction of cyclic ether with carboxylic acid or carboxylic acid anhydride.

[0341] Examples of the carboxylic anhydride include succinic anhydride, maleic anhydride, citraconic anhydride, itaconic anhydride, 3-vinylphthalic anhydride, 4-vinylphthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride, 1,2,3,6-tetrahydrophthalic anhydride, dimethyltetrahydrophthalic anhydride, and 5,6-dicarboxybicyclo[2.2.1]hept-2-ene anhydride.

[0342] The amount of carboxylic anhydride used is preferably 0.5 mol to 1 mol relative to 1 mol of the amount of (a) used.

[0343] Examples of the resin [K1], resin [K2], resin [K3], resin [K4], resin [K5], and resin [K6] include: benzyl (meth)acrylate / (meth)acrylic acid copolymer, styrene / (meth)acrylic acid copolymer, (meth)acrylic acid / mono[2-(meth)acryloyloxyethyl]succinate / tetrahydrodicyclopentadienyl (meth)acrylate / methyl (meth)acrylate copolymer, and the like resin [K1];

[0344] Glycidyl (meth)acrylate / benzyl (meth)acrylate / (meth)acrylic acid copolymer, Glycidyl (meth)acrylate / styrene / (meth)acrylic acid copolymer, 3,4-epoxytricyclo[5.2.1.0 2,6 ] decyl ester / (meth) acrylic acid / methyl (meth) acrylate copolymer, 3,4-epoxytricyclo[5.2.1.0 2,6 ] decyl ester / (meth) acrylic acid / N-cyclohexylmaleimide copolymer, 3,4-epoxytricyclo[5.2.1.0 2,6 ] Decyl ester / (meth) acrylic acid / benzyl (meth) acrylate copolymer resin [K2];

[0345] Resins such as a resin obtained by adding glycidyl (meth)acrylate to a benzyl (meth)acrylate / (meth)acrylic acid copolymer, a resin obtained by adding glycidyl (meth)acrylate to a tricyclodecyl (meth)acrylate / styrene / (meth)acrylic acid copolymer, a resin obtained by adding glycidyl (meth)acrylate to a tricyclodecyl (meth)acrylate / benzyl (meth)acrylate / (meth)acrylic acid copolymer, and a resin obtained by adding glycidyl (meth)acrylate to a tetrahydrodicyclopentadienyl (meth)acrylate / methyl (meth)acrylate / (meth)acrylic acid copolymer [K3];

[0346] A resin obtained by ester-bonding tetrahydrophthalic anhydride or succinic anhydride to a resin obtained by adding glycidyl (meth)acrylate to benzyl (meth)acrylate / (meth)acrylic acid copolymer; a resin obtained by ester-bonding tetrahydrophthalic anhydride or succinic anhydride to a resin obtained by adding glycidyl (meth)acrylate to tricyclodecyl (meth)acrylate / benzyl (meth)acrylate / (meth)acrylic acid copolymer; a resin obtained by ester-bonding tetrahydrophthalic anhydride or succinic anhydride to a resin obtained by ester-bonding tetrahydrophthalic anhydride or succinic anhydride to a resin obtained by adding glycidyl (meth)acrylate to tricyclodecyl (meth)acrylate / benzyl (meth)acrylate / (meth)acrylic acid copolymer; Resins obtained by ester-bonding a resin obtained by adding glycidyl (meth)acrylate to a tetrahydrodicyclopentadienyl (meth)acrylate / methyl (meth)acrylate / (meth)acrylic acid copolymer, and resins obtained by ester-bonding a resin obtained by adding glycidyl (meth)acrylate to a tetrahydrodicyclopentadienyl (meth)acrylate / 2-ethylhexyl (meth)acrylate / (meth)acrylic acid copolymer to tetrahydrophthalic anhydride or succinic anhydride [K4];

[0347] Resins such as a resin obtained by adding (meth)acrylic acid to a copolymer of tricyclodecyl (meth)acrylate / glycidyl (meth)acrylate, and a resin obtained by adding (meth)acrylic acid to a copolymer of tricyclodecyl (meth)acrylate / styrene / glycidyl (meth)acrylate [K5];

[0348] Resins obtained by ester-bonding a resin obtained by adding (meth)acrylic acid to a copolymer of tricyclodecyl (meth)acrylate and glycidyl (meth)acrylate to tetrahydrophthalic anhydride or succinic anhydride, and a resin obtained by ester-bonding a resin obtained by adding (meth)acrylic acid to a copolymer of tetrahydrodicyclopentadienyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, and glycidyl (meth)acrylate to tetrahydrophthalic anhydride or succinic anhydride [K6].

[0349] The resin (C) contained in the composition I and the composition III preferably includes at least one selected from the group consisting of resin [K1], resin [K2], resin [K3], resin [K4], resin [K5], and resin [K6], more preferably includes at least one selected from the group consisting of resin [K1] and resin [K2], and further preferably includes resin [K1].

[0350] The resin (C) contained in the composition II preferably includes at least one selected from the group consisting of resin [K1], resin [K2], resin [K3], resin [K4], resin [K5], and resin [K6], more preferably includes at least one selected from the group consisting of resin [K1] and resin [K2], and even more preferably includes resin [K1] and resin [K2].

[0351] Other examples of resin (C) include those described in Japanese Patent Application Laid-Open No. 2018-123274. Examples of such resins include polymers having double bonds in side chains, a structural unit (α) represented by the following formula (I) and a structural unit (β) represented by the following formula (II) in the main chain, and further containing an acid group (hereinafter also referred to as "resin (Ca)").

[0352] The acid groups may be introduced into the resin (Ca) by, for example, including a structural unit (γ) derived from an acid group-containing monomer (e.g., (meth)acrylic acid). The resin (Ca) preferably includes structural units (α), (β), and (γ) in its main chain skeleton.

[0353]

[0354] [Where R A and R Bare the same or different and represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms. n represents the average number of repeating units of the structural unit represented by formula (I) and is a number greater than 1.]

[0355]

[0356] [Where R C are the same or different and represent a hydrogen atom or a methyl group. D are the same or different and represent a linear or branched hydrocarbon group having 4 to 20 carbon atoms. m represents the average number of repeating units of the structural unit represented by formula (II) and is a number greater than 1.]

[0357] In the resin (Ca), from the viewpoint of heat resistance and storage stability of the resin (Ca), the content ratio of the structural unit (α) relative to 100 mass% of the total amount of all monomer units forming the main chain skeleton of the resin (Ca) is, for example, 0.5 mass% to 50 mass%, preferably 1 mass% to 40 mass%, and more preferably 5 mass% to 30 mass%. In formula (I), n represents the average number of repeating units of the structural unit (α) in the resin (Ca), and n can be set so that the content ratio of the structural unit (α) is within the above range.

[0358] From the perspective of solvent resistance of each layer, the content ratio of the structural unit (β) relative to 100 mass% of the total amount of all monomer units forming the main chain skeleton of the resin (Ca) is, for example, 10 mass% to 90 mass%, preferably 20 mass% to 80 mass%, and more preferably 30 mass% to 75 mass%. In formula (II), m represents the average number of repeating units of the structural unit (β) in the resin (Ca), and m can be set so that the content ratio of the structural unit (β) is within the above range.

[0359] From the viewpoint of the solubility of the resin (Ca) in the solvent (J), etc., the content ratio of the structural unit (γ) relative to 100 mass% of the total amount of all monomer units forming the main chain skeleton of the resin (Ca) is, for example, 0.5 mass% to 50 mass%, preferably 2 mass% to 50 mass%, and more preferably 5 mass% to 45 mass%.

[0360] The weight average molecular weight (Mw) of the resin (C), as measured by GPC, in terms of standard polystyrene, is, for example, 1,000 to 100,000. From the perspective of the developability and luminescence intensity of the composition, it is preferably 2,000 to 50,000, and more preferably 3,000 to 20,000. The Mw of the resin (C) can be adjusted by appropriately combining reaction conditions such as the selection of raw materials, the method of charging, and the reaction temperature and time. The Mw of the resin (C) can be measured using the measurement method described in the Examples section below. Alternatively, the Mw of the resin (C) contained in the composition can also be measured using GPC.

[0361] The molecular weight distribution [weight average molecular weight (Mw) / number average molecular weight (Mn)] of the resin (C) measured by GPC is, for example, 1.0 to 6.0, and preferably 1.2 to 4.0 from the viewpoint of improving emission intensity.

[0362] From the perspective of the developability of the composition and the solvent resistance of each layer, the acid value of the resin (C) is, for example, 30 mgKOH / g or greater, preferably 90 mgKOH / g or greater and 150 mgKOH / g or less, more preferably 95 mgKOH / g or greater and 140 mgKOH / g or less, and even more preferably 100 mgKOH / g or greater and 130 mgKOH / g or less. The acid value of the resin (C) can be adjusted by, for example, the content of monomer components having acid groups (such as the aforementioned (a)), the content of carboxylic acid anhydride that reacts with hydroxyl groups generated by the reaction of a carboxylic acid or carboxylic acid anhydride with a cyclic ether, and the like.

[0363] The acid value of the resin (C) is measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of the resin (C). It can be determined, for example, by titration using an aqueous potassium hydroxide solution. Specifically, it can be measured according to the measurement method described in the Examples section below. Alternatively, the acid value can be determined by, for example, performing a structural analysis of the resin (C) contained in the composition.

[0364] From the perspective of improving luminescence intensity, the resin (C) preferably comprises a resin having a double bond equivalent weight of 300 g / eq to 2000 g / eq, and more preferably comprises a resin having a double bond equivalent weight of 500 g / eq to 1500 g / eq. Examples of resins having a double bond equivalent weight of 300 g / eq to 2000 g / eq include (meth)acrylic resins. The resin (C) preferably comprises a (meth)acrylic resin.

[0365] The content of the resin (C) in the composition I is, for example, 5% by mass or more and 80% by mass or less, preferably 10% by mass or more and 70% by mass or less, more preferably 13% by mass or more and 60% by mass or less, and even more preferably 17% by mass or more and 55% by mass or less, relative to the total solid content of the composition I. When the content of the resin (C) is within this range, the semiconductor particles (A) tend to be more easily dispersed, and the luminous intensity of the wavelength conversion layer tends to be higher.

[0366] The content of the resin (C) in the composition II relative to the total solid content of the composition II is, for example, 0.00001 mass % or more and 99.99999 mass % or less, preferably 1 mass % or more and 99 mass % or less, more preferably 1 mass % or more and 97 mass % or less, further preferably 1 mass % or more and 95 mass % or less, further preferably 3 mass % or more and 90 mass % or less, particularly preferably 5 mass % or more and 80 mass % or less, and most preferably 10 mass % or more and 70 mass % or less.

[0367] The content of the resin (C) in the composition III relative to the total solid content of the composition III is, for example, 0.00001% by mass or more and 99.99999% by mass or less, preferably 1% by mass or more and 99% by mass or less, more preferably 1% by mass or more and 97% by mass or less, further preferably 1% by mass or more and 95% by mass or less, even more preferably 3% by mass or more and 90% by mass or less, particularly preferably 5% by mass or more and 80% by mass or less, and most preferably 10% by mass or more and 70% by mass or less.

[0368] In the composition I, the mass ratio (solid content ratio) of the resin (C) to the polymerizable compound (D) is, for example, 1 or more. From the viewpoint of the developability of the composition I and the luminous intensity of the wavelength conversion layer, it is preferably 1.5 or more, more preferably 2 or more, and preferably 5 or less, more preferably 4 or less.

[0369] In the composition II, the mass ratio (solid content ratio) of the resin (C) to the polymerizable compound (D) is, for example, 0.5 or more, preferably 0.8 or more, more preferably 1.2 or more, and preferably 5 or less, more preferably 4 or less, from the viewpoint of the developability of the composition II.

[0370] In the composition III, the mass ratio (solid content ratio) of the resin (C) to the polymerizable compound (D) is, for example, 1 or more, preferably 1.5 or more, more preferably 2 or more, and preferably 5 or less, more preferably 4 or less, from the viewpoint of the developability and luminescence intensity of the composition III.

[0371] <Polymerizable Compound (D)>

[0372] The polymerizable compound (D) is a compound that can be polymerized by active radicals, acids, or the like generated by the polymerization initiator (E) described below. Examples of the polymerizable compound (D) include photopolymerizable compounds such as compounds having an ethylenically unsaturated bond, for example, (meth)acrylate compounds. Other examples of the polymerizable compound (D) are thermally polymerizable compounds. The composition may contain two or more polymerizable compounds (D).

[0373] The polymerizable compound (D) is preferably a photopolymerizable compound having three or more ethylenically unsaturated bonds in the molecule. The weight average molecular weight of the polymerizable compound (D) is preferably 150 or more and 2900 or less, and more preferably 250 or more and 1500 or less.

[0374] Examples of the polymerizable compound (D) include a compound (Da) having three or more (meth)acryloyloxy groups in the molecule and an acidic functional group, and a compound (Db) having three or more (meth)acryloyloxy groups in the molecule and no acidic functional group. The photopolymerizable compound preferably contains at least one of compound (Da) and compound (Db), but may also contain two or more compounds (Da), two or more compounds (Db), or at least one of compound (Da) and at least one of compound (Db). Examples of the acidic functional group include a carboxyl group, a sulfonic acid group, and a phosphoric acid group. Among these, the acidic functional group is preferably a carboxyl group.

[0375] When the polymerizable compound (D) in composition I includes compound (Da), the dispersibility of the semiconductor particles (A) can be improved, and the luminescence intensity of the wavelength conversion layer can be increased. Furthermore, when the polymerizable compound (D) includes compound (Da), the curability and heat resistance of the composition can be improved.

[0376] The number of (meth)acryloyloxy groups possessed by one molecule of compound (D) is, for example, 3 or more and 6 or less, preferably 3 or more and 5 or less, and more preferably 3. The number of acidic functional groups possessed by one molecule of compound (Da) is 1 or more, preferably 1. When having two or more acidic functional groups, the respective acidic functional groups may be different or the same, and preferably have at least one carboxyl group.

[0377] Examples of compound (Da) include compounds obtained by esterifying a compound having three or more (meth)acryloyloxy groups and a hydroxyl group, such as pentaerythritol tri(meth)acrylate or dipentaerythritol penta(meth)acrylate, with a dicarboxylic acid. Examples of such compounds include compounds obtained by monoesterifying pentaerythritol tri(meth)acrylate with succinic acid, compounds obtained by monoesterifying dipentaerythritol penta(meth)acrylate with succinic acid, compounds obtained by monoesterifying pentaerythritol tri(meth)acrylate with maleic acid, and compounds obtained by monoesterifying dipentaerythritol penta(meth)acrylate with maleic acid. Among these, compounds obtained by monoesterifying pentaerythritol tri(meth)acrylate with succinic acid are preferred.

[0378] Examples of commercially available products of compound (Da) include "ARONIX M-510" manufactured by Toagosei Co., Ltd., which contains a dibasic acid anhydride adduct of pentaerythritol tri(meth)acrylate as a main component, and "ARONIX M-520D" manufactured by Toagosei Co., Ltd., which contains a dibasic acid anhydride adduct of dipentaerythritol penta(meth)acrylate as a main component. These commercial products have a carboxyl group as an acidic functional group.

[0379] The ethylenically unsaturated bond contained in the compound (Db) is preferably a (meth)acryloyloxy group. The number of ethylenically unsaturated bonds contained in one molecule of the compound (Db) is preferably 3 to 6.

[0380] Examples of the compound (Db) include trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, tripentaerythritol octa(meth)acrylate, tripentaerythritol hepta(meth)acrylate, tetrapentaerythritol deca(meth)acrylate, tetrapentaerythritol nona(meth)acrylate, tris(2-(meth)acryloyloxyethyl)isocyanurate, ethylene glycol-modified pentaerythritol tetra(meth)acrylate, ethylene glycol-modified dipentaerythritol hexa(meth)acrylate, propylene glycol-modified pentaerythritol tetra(meth)acrylate, propylene glycol-modified dipentaerythritol hexa(meth)acrylate, caprolactone-modified pentaerythritol tetra(meth)acrylate, and caprolactone-modified dipentaerythritol hexa(meth)acrylate. Among them, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, and the like are preferred.

[0381] From the perspective of improving the developability of the composition, Composition I and Composition III preferably contain Compound (Da). Of 100% by mass of the polymerizable compound (D) contained in Composition I or Composition III, the compound (Da) is preferably present in an amount of 50% by mass or greater, and more preferably 70% by mass or greater. On the other hand, from the perspective of improving curability, Composition II preferably contains Compound (Db). Of 100% by mass of the polymerizable compound (D) contained in Composition II, the compound (Db) is preferably present in an amount of 50% by mass or greater, and more preferably 70% by mass or greater.

[0382] The content of the polymerizable compound (D) in the composition I is preferably 7% by mass or more and 60% by mass or less, more preferably 10% by mass or more and 45% by mass or less, and even more preferably 13% by mass or more and 30% by mass or less, relative to the total solid content of the composition I. When the content of the polymerizable compound (D) is within this range, the developability of the composition I and the solvent resistance of the wavelength conversion layer tend to be improved.

[0383] The content of the polymerizable compound (D) in the composition II relative to the total amount of the solid content of the composition II is, for example, 0.00001% by mass or more and 99.99999% by mass or less, preferably 1% by mass or more and 99% by mass or less, more preferably 1% by mass or more and 97% by mass or less, further preferably 1% by mass or more and 95% by mass or less, even more preferably 1% by mass or more and 90% by mass or less, particularly preferably 2% by mass or more and 80% by mass or less, and most preferably 3% by mass or more and 70% by mass or less.

[0384] The content of the polymerizable compound (D) in Composition III relative to the total solid content of Composition III is, for example, 0.00001% by mass to 99.99999% by mass, preferably 1% by mass to 99% by mass, more preferably 1% by mass to 97% by mass, even more preferably 1% by mass to 95% by mass, even more preferably 1% by mass to 90% by mass, particularly preferably 2% by mass to 80% by mass, particularly more preferably 3% by mass to 70% by mass, preferably 7% by mass to 60% by mass, more preferably 10% by mass to 55% by mass, and even more preferably 15% by mass to 50% by mass. When this content is within the above range, it is advantageous in suppressing a decrease in luminous intensity due to heat from the wavelength conversion layer.

[0385] <Polymerization Initiator (E)>

[0386] The polymerization initiator (E) is a compound that generates active radicals, acids, etc. under the action of light or heat, and can initiate polymerization of the polymerizable compound (D). The composition may contain one or more polymerization initiators (E).

[0387] Examples of the polymerization initiator (E) include photopolymerization initiators such as oxime compounds, biimidazole compounds, triazine compounds, and acylphosphine compounds; and thermal polymerization initiators such as azo compounds and organic peroxides.

[0388] An example of an oxime compound is an oxime compound having a first molecular structure represented by the following formula (1). Hereinafter, this oxime compound is also referred to as “oxime compound (1)”.

[0389]

[0390] From the perspective of improving the luminescence intensity, the inclusion of an oxime compound (1) as the polymerization initiator (E) can be advantageous. It is presumed that one reason for this effect is that, due to the unique molecular structure of the oxime compound (1), the absorption wavelength of the oxime compound (1) changes significantly before and after the cleavage (decomposition) of the oxime compound (1), which is required for the oxime compound (1) to initiate photopolymerization, resulting in a high photoradical polymerization initiation ability of the oxime compound (1).

[0391] In formula (1), R 1 Represents R 11 , OR 11 、COR 11 SR 11 、CONR 12 R 13 or CN.

[0392] R 11 、R 12 and R 13 Each independently represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms.

[0393] By R 11 、R 12 or R 13 The hydrogen atoms of the group represented by OR 21 、COR 21 SR 21 NR 22 R 23 、CONR 22 R 23 、-NR 22 -OR 23 、-N(COR 22 )-OCOR23 、-C(=N-OR 21 )-R 22 、-C(=N-OCOR 21 )-R 22 , CN, halogen atoms or COOR 21 replace.

[0394] R 21 、R 22 and R 23 Each independently represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms.

[0395] By R 21 、R 22 or R 23 The hydrogen atom of the group represented may be substituted with CN, a halogen atom, a hydroxyl group or a carboxyl group.

[0396] In the R 11 、R 12 、R 13 、R 21 、R 22 or R 23 When the group represented by has an alkylene moiety, the alkylene moiety may be replaced by -O-, -S-, -COO-, -OCO-, -NR 24 -、-NR 24 CO-、-NR 24 COO-、-OCONR 24 -, -SCO-, -COS-, -OCS-, or -CSO- is interrupted 1 to 5 times.

[0397] R 24 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms.

[0398] In the R 11 、R 12 、R 13 、R 21 、R 22 or R 23 When the group represented by has an alkyl portion, the alkyl portion may be branched or cyclic. 12 and R 13 can form a ring together, R 22 and R 23 can form a ring together.

[0399] * represents a bonding site with another molecular structure other than the first molecular structure of the oxime compound (1), that is, the second molecular structure.

[0400] As the R 11 、R 12 、R 13 、R 21 、R 22 、R 23 and R 24 The alkyl group having 1 to 20 carbon atoms represented by is, for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, a pentyl group, an isopentyl group, a tert-pentyl group, a hexyl group, a heptyl group, an octyl group, an isooctyl group, a 2-ethylhexyl group, a tert-octyl group, a nonyl group, an isononyl group, a decyl group, an isodecyl group, an undecyl group, a dodecyl group, a tetradecyl group, a hexadecyl group, an octadecyl group, an eicosyl group, a cyclopentyl group, a cyclohexyl group, a cyclohexylmethyl group, a cyclohexylethyl group, and the like.

[0401] As the R 11 、R 12 、R 13 、R 21 、R 22 、R 23 and R 24 The aryl group having 6 to 30 carbon atoms represented by phenyl is exemplified by phenyl, tolyl, xylyl, ethylphenyl, naphthyl, anthracenyl, phenanthrenyl, phenyl substituted by one or more of the above alkyl groups, biphenyl substituted by one or more of the above alkyl groups, naphthyl substituted by one or more of the above alkyl groups, anthracenyl substituted by one or more of the above alkyl groups, and the like.

[0402] As the R 11 、R 12 、R 13 、R 21 、R 22 、R 23 and R 24 Examples of the aralkyl group having 7 to 30 carbon atoms include benzyl, α-methylbenzyl, α,α-dimethylbenzyl, and phenylethyl.

[0403] As the R 11 、R 12 、R 13 、R 21 、R 22 、R 23 and R 24 The heterocyclic group having 2 to 20 carbon atoms represented by , for example, pyridyl, pyrimidinyl, furyl, thienyl, tetrahydrofuranyl, dioxolanyl, benzo oxazol-2-yl, tetrahydropyranyl, pyrrolidinyl, imidazolyl, pyrazolidinyl, thiazolidinyl, isothiazolidinyl, Oxazolidinyl, isocyanate oxazolidinyl, piperidinyl, piperazinyl, morpholinyl, etc., preferably a 5- to 7-membered heterocyclic ring.

[0404] R in formula (1) 12 and R 13 Can form a ring together, R 22 and R 23 Can form a ring together means R 12 and R 13 Together with the nitrogen, carbon or oxygen atoms connected to each other, they can form a ring, R 22 and R 23 A ring may be formed together with the commonly linked nitrogen atom, carbon atom or oxygen atom.

[0405] As R in formula (1) 12 and R 13 The ring that can be formed together, R 22 and R 23 Examples of the ring that can be formed together include a cyclopentane ring, a cyclohexane ring, a cyclopentene ring, a benzene ring, a piperidine ring, a morpholine ring, a lactone ring, and a lactam ring, and a 5- to 7-membered ring is preferred.

[0406] As R in formula (1) 11 、R 12 、R 13 、R 21 、R 22 and R 23 Examples of the halogen atom which may be possessed by the substituent include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

[0407] R in formula (1) 1 Preferably R 11 , more preferably an alkyl group having 1 to 20 carbon atoms, further preferably an alkyl group having 1 to 10 carbon atoms, and further preferably an alkyl group having 1 to 6 carbon atoms.

[0408] An example of the second molecular structure connected to the first molecular structure represented by formula (1) is a structure represented by the following formula (2). The second molecular structure refers to another molecular structure portion of the oxime compound (1) other than the first molecular structure.

[0409] The bonding site represented by "*" in formula (2) is directly bonded to the bonding site represented by "*" in formula (1). That is, when the second molecular structure is the structure represented by formula (2), the benzene ring having "-*" in formula (2) is directly bonded to the carbonyl group having "-*" in formula (1).

[0410]

[0411] In formula (2), R 2 and R 3 Each independently represents R 11 , OR 11 SR 11 、COR 11 、CONR 12 R 13 NR 12 COR 11 , OCOR 11 、COOR 11 SCOR 11 , OCSR 11 、COSR 11 , CSOR 11 , CN or halogen atom.

[0412] When there are multiple R 2 , they may be the same or different.

[0413] When there are multiple R 3 , they may be the same or different.

[0414] R 11 、R 12 and R 13 Means the same as above.

[0415] s and t each independently represent an integer of 0-4.

[0416] L represents a sulfur atom, CR 31 R 32 , CO or NR 33 .

[0417] R 31 、R 32 and R 33 Each independently represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, or an aralkyl group having 7 to 30 carbon atoms.

[0418] In the R 31 、R 32 or R 33 When the group represented by has an alkyl portion, the alkyl portion may be branched or cyclic. 31 、R 32 and R 33 Each independently can form a ring together with any adjacent benzene ring.

[0419] R 4represents a hydroxyl group, a carboxyl group, or a group represented by the following formula (2-1).

[0420]

[0421] (In formula (2-1), L 1 Indicates -O-, -S-, and -NR 22 -、-NR 22 CO-, -SO2-, -CS-, -OCO-, or -COO-. )

[0422] R 22 Means the same as above.

[0423] L 2 It represents a group obtained by removing v hydrogen atoms from an alkyl group having 1 to 20 carbon atoms, a group obtained by removing v hydrogen atoms from an aryl group having 6 to 30 carbon atoms, a group obtained by removing v hydrogen atoms from an aralkyl group having 7 to 30 carbon atoms, or a group obtained by removing v hydrogen atoms from a heterocyclic group having 2 to 20 carbon atoms.

[0424] In L 2 When the group represented by has an alkylene moiety, the alkylene moiety may be replaced by -O-, -S-, -COO-, -OCO-, -NR 22 -、-NR 22 COO-、-OCONR 22 -, -SCO-, -COS-, -OCS- or -CSO- is interrupted 1 to 5 times, and the alkylene portion may be branched or cyclic.

[0425] R 4a Indicates OR 41 SR 41 、CONR 42 R 43 NR 42 COR 43 , OCOR 41 、COOR 41 SCOR 41 , OCSR 41 、COSR 41 , CSOR 41 , CN or halogen atom.

[0426] When there are multiple R 4a , they may be the same or different.

[0427] R 41 、R 42 and R 43Each independently represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, or an aralkyl group having 7 to 30 carbon atoms, in the case of R 41 、R 42 and R 43 When the group represented by has an alkyl portion, the alkyl portion may be branched or cyclic. 42 and R 43 can form a ring together.

[0428] v represents an integer from 1 to 3.)

[0429] * represents a bonding site with the first molecular structure of the oxime compound (1).

[0430] From R in formula (2) 11 、R 12 、R 13 、R 21 、R 22 、R 23 、R 24 、R 31 、R 32 and R 33 , and R in the above formula (2-1) 22 、R 41 、R 42 and R 43 Examples of alkyl groups having 1 to 20 carbon atoms, aryl groups having 6 to 30 carbon atoms, and aralkyl groups having 7 to 30 carbon atoms are similar to those of R in formula (1). 11 、R 12 、R 13 、R 21 、R 22 、R 23 and R 24 Same as example.

[0431] From R in formula (2) 11 、R 12 、R 13 、R 21 、R 22 、R 23 、R 24 , and R in the above formula (2-1) 22 Examples of heterocyclic groups having 2 to 20 carbon atoms are similar to those of R in formula (1). 11 、R 12 、R 13 、R 21 、R 22 、R 23 and R 24 Same as example.

[0432] R in formula (2) 31 、R 32 and R 33 Each independently can form a ring with any adjacent benzene ring means R 31 、R 32 and R 33 Each independently can form a ring together with the nitrogen atom bonded to any adjacent benzene ring.

[0433] R in formula (2) 31 、R 32 and R 33 Examples of rings that can be formed together with any adjacent benzene ring are similar to those for R in formula (1). 12 and R 13 and R 22 and R 23 Same as the example of a ring that can be formed together.

[0434] L in the above formula (2-1) 2 It represents a group obtained by removing v hydrogen atoms from an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms.

[0435] Examples of the group obtained by removing v hydrogen atoms from an alkyl group having 1 to 20 carbon atoms include, for example, a methylene group, an ethylene group, a propylene group, a methylethylene group, a butylene group, a 1-methylpropylene group, a 2-methylpropylene group, a 1,2-dimethylpropylene group, a 1,3-dimethylpropylene group, a 1-methylbutylene group, a 2-methylbutylene group, a 3-methylbutylene group, a 4-methylbutylene group, a 2,4-dimethylbutylene group, a 1,3-dimethylbutylene group, a pentylene group, a hexylene group, a heptylene group, an octylene group, a nonylene group, a decylene group, a dodecylene group, a tridecylene group, a tetradecylene group, a pentadecylene group, an ethane-1,1-diyl group, and a propane-2,2-diyl group.

[0436] Examples of the group obtained by removing v hydrogen atoms from an aryl group having 6 to 30 carbon atoms include, for example, when v is 1, 1,2-phenylene, 1,3-phenylene, 1,4-phenylene, 2,6-naphthylene, 1,4-naphthylene, 2,5-dimethyl-1,4-phenylene, diphenylmethane-4,4'-diyl, 2,2-diphenylpropane-4,4'-diyl, diphenylsulfide-4,4'-diyl, and diphenylsulfone-4,4'-diyl.

[0437] Examples of the group obtained by removing v hydrogen atoms from an aralkyl group having 7 to 30 carbon atoms include, when v is 1, a group represented by the following formula (a) and a group represented by the following formula (b).

[0438]

[0439] [In formulas (a) and (b), L 3 and L 5 represents an alkylene group having 1 to 10 carbon atoms, L 4 and L 6 represents a single bond or an alkylene group having 1 to 10 carbon atoms.]

[0440] Examples of the alkylene group having 1 to 10 carbon atoms include methylene, ethylene, propylene, methylethylene, butylene, 1-methylpropylene, 2-methylpropylene, 1,2-dimethylpropylene, 1,3-dimethylpropylene, 1-methylbutylene, 2-methylbutylene, 3-methylbutylene, 4-methylbutylene, 2,4-dimethylbutylene, 1,3-dimethylbutylene, pentylene, hexylene, heptylene, octylene, nonylene, and decylene.

[0441] Examples of the group obtained by removing v hydrogen atoms from a heterocyclic group having 2 to 20 carbon atoms include, for example, when v is 1, 2,5-pyridinediyl, 2,6-pyridinediyl, 2,5-pyrimidinediyl, 2,5-thiophenediyl, 3,4-tetrahydrofurandiyl, 2,5-tetrahydrofurandiyl, 2,5-furandiyl, 3,4-thiazolediyl, 2,5-benzofurandiyl, 2,5-benzothiophenediyl, N-methylindole-2,5-diyl, 2,5-benzothiazolediyl, 2,5-benzo divalent heterocyclic groups such as oxadiyl and the like.

[0442] As R in formula (2) 2 and R 3 , and R in the above formula (2-1) 4a Examples of the halogen atom represented by include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

[0443] From the viewpoint of solubility in the solvent (J) and / or developability of the composition, a preferred example of the structure represented by formula (2) is a structure represented by the following formula (2a).

[0444]

[0445] [In formula (2a), L' represents a sulfur atom or NR 50 , R 50 represents a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, R2 、R 3 、R 4 , s and t have the same meanings as above.]

[0446] From the same viewpoint as above, another preferred example of the structure represented by formula (2) is a structure represented by the following formula (2b).

[0447]

[0448] [In formula (2b), R 44 represents a hydroxyl group, a carboxyl group, or a group represented by the following formula (2-2).

[0449]

[0450] (In formula (2-2), L 11 Indicates *-O- or *-OCO-, * indicates L 12 The bonding site, L 12 represents an alkylene group having 1 to 20 carbon atoms, which may be interrupted by 1 to 3 -O- groups, R 44a Indicates OR 55 or COOR 55 , R 55 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.)]

[0451] R 44 The group represented by the formula (2-2) is preferred. In this case, it is advantageous in terms of the solubility of the oxime compound (1) in the solvent (J) and the developability of the composition.

[0452] By L 12 The number of carbon atoms of the alkylene group represented by is preferably 1 to 10, more preferably 1 to 4.

[0453] R 44a It is preferably a hydroxy group or a carboxyl group, and more preferably a hydroxy group.

[0454] The method for producing the oxime compound (1) having the second molecular structure represented by formula (2) is not particularly limited, and it can be produced, for example, by the method described in JP-A-2011-132215.

[0455] Another example of the second molecular structure connected to the first molecular structure represented by formula (1) is a structure represented by the following formula (3).

[0456] The bonding site represented by "*" in formula (3) is directly bonded to the bonding site represented by "*" in formula (1). That is, when the second molecular structure is the structure represented by formula (3), the benzene ring having "-*" in formula (3) is directly bonded to the carbonyl group having "-*" in formula (1).

[0457]

[0458] In formula (3), R 5 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms.

[0459] In the R 5 When the group represented by has an alkyl portion, the alkyl portion may be branched or cyclic.

[0460] By R 5 The hydrogen atoms of the group represented by R 21 , OR 21 、COR 21 SR 21 NR 22 R 23 、CONR 22 R 23 、-NR 22 -OR 23 、-N(COR 22 )-OCOR 23 NR 22 COR 21 , OCOR 21 、COOR 21 、-C(=N-OR 21 )-R 22 、-C(=N-OCOR 21 )-R 22 SCOR 21 , OCSR 21 、COSR 21 , CSOR 21 , hydroxyl, nitro, CN, halogen atom or COOR 21 replace.

[0461] R 21 、R 22 and R 23 Means the same as above.

[0462] By R 21 、R 22 or R 23The hydrogen atom of the group represented may be substituted with CN, a halogen atom, a hydroxyl group or a carboxyl group.

[0463] In the R 21 、R 22 and R 23 When the group represented by has an alkylene moiety, the alkylene moiety may be replaced by -O-, -S-, -COO-, -OCO-, -NR 24 -、-NR 24 CO-、-NR 24 COO-、-OCONR 24 -, -SCO-, -COS-, -OCS-, or -CSO- is interrupted 1 to 5 times.

[0464] R 24 Means the same as above.

[0465] In the R 21 、R 22 and R 23 When the group represented by has an alkyl portion, the alkyl portion may be branched or cyclic. 22 and R 23 can form a ring together.

[0466] R 6 、R 7 、R 8 and R 9 Each independently represents R 61 , OR 61 SR 61 、COR 62 、CONR 63 R 64 NR 65 COR 61 , OCOR 61 、COOR 62 SCOR 61 , OCSR 61 、COSR 62 , CSOR 61 , hydroxyl, nitro, CN or halogen atom.

[0467] R 61 、R 62 、R 63 、R 64 and R 65 Each independently represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms.

[0468] By R 61、R 62 、R 63 、R 64 or R 65 The hydrogen atoms of the group represented by OR 21 、COR 21 SR 21 NR 22 R 23 、CONR 22 R 23 、-NR 22 -OR 23 、-N(COR 22 )-OCOR 23 、-C(=N-OR 21 )-R 22 、-C(=N-OCOR 21 )-R 22 , CN, halogen atoms or COOR 21 replace.

[0469] R 6 and R 7 can form a ring together, R 7 and R 8 can form a ring together, R 8 and R 9 can form a ring together.

[0470] * represents a bonding site with the first molecular structure of the oxime compound (1).

[0471] From R in formula (3) 5 、R 21 、R 22 、R 23 、R 24 、R 61 、R 62 、R 63 、R 64 and R 65 Examples of alkyl groups having 1 to 20 carbon atoms, aryl groups having 6 to 30 carbon atoms, aralkyl groups having 7 to 30 carbon atoms, and heterocyclic groups having 2 to 20 carbon atoms are the same as those for R in formula (1). 11 、R 12 、R 13 、R 21 、R 22 、R 23 and R 24 Same as example.

[0472] R in formula (3) 22 and R 23 Can form a ring together means R 22 and R23 A ring may be formed together with the commonly linked nitrogen atom, carbon atom or oxygen atom.

[0473] R in formula (3) 22 and R 23 Examples of rings that can be formed together are similar to those of R in formula (1). 12 and R 13 and R 22 and R 23 Same as the example of a ring that can be formed together.

[0474] As R in formula (3) 6 、R 7 、R 8 and R 9 The halogen atom represented by R 5 、R 21 、R 22 、R 23 、R 61 、R 62 、R 63 、R 64 and R 65 Examples of the halogen atom including a hydrogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

[0475] From the viewpoint of solubility in the solvent (J) and / or developability of the composition, in a preferred embodiment, R 5 It is a group represented by the following formula (3-1).

[0476]

[0477] [In formula (3-1), Z represents a group obtained by removing one hydrogen atom from an alkyl group having 1 to 20 carbon atoms, a group obtained by removing one hydrogen atom from an aryl group having 6 to 30 carbon atoms, a group obtained by removing one hydrogen atom from an aralkyl group having 7 to 30 carbon atoms, or a group obtained by removing one hydrogen atom from a heterocyclic group having 2 to 20 carbon atoms,

[0478] In the case where the group represented by Z has an alkylene moiety, the alkylene moiety may be replaced by -O-, -S-, -COO-, -OCO-, -NR- 24 -、-NR 24 COO-、-OCONR 24 -, -SCO-, -COS-, -OCS- or -CSO- is interrupted 1 to 5 times, and the alkylene portion may be branched or cyclic,

[0479] R 21 、R 22 and R24 Means the same as above.]

[0480] From the same viewpoint as described above, Z in formula (3-1) is preferably a methylene group, an ethylene group, or a phenylene group.

[0481] From the same point of view as above, R in formula (3-1) 21 and R 22 It is preferably an alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 30 carbon atoms, and more preferably a methyl group, an ethyl group or a phenyl group.

[0482] From the same viewpoint as above, in another preferred embodiment, R 7 For nitro.

[0483] The method for producing the oxime compound (1) having the second molecular structure represented by formula (3) is not particularly limited, and it can be produced, for example, by the methods described in JP-A-2000-80068 and JP-A-2011-178776.

[0484] Another example of the second molecular structure connected to the first molecular structure represented by formula (1) is a structure represented by the following formula (4).

[0485] The bonding site represented by "*" in formula (4) is directly bonded to the bonding site represented by "*" in formula (1). That is, when the second molecular structure is the structure represented by formula (4), the benzene ring having "-*" in formula (4) is directly bonded to the carbonyl group having "-*" in formula (1).

[0486]

[0487] In formula (4), R 71 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms.

[0488] In the R 71 When the group represented by has an alkyl portion, the alkyl portion may be branched or cyclic.

[0489] By R 71 The hydrogen atoms of the group represented by R 21 , OR 21 、COR 21 SR 21 NR 22 R 23 、CONR 22 R 23 、-NR 22 -OR23 、-N(COR 22 )-OCOR 23 NR 22 COR 21 , OCOR 21 、COOR 21 、-C(=N-OR 21 )-R 22 、-C(=N-OCOR 21 )-R 22 SCOR 21 , OCSR 21 、COSR 21 , CSOR 21 , hydroxyl, nitro, CN, halogen atom or COOR 21 replace.

[0490] R 21 、R 22 and R 23 Means the same as above.

[0491] By R 21 、R 22 or R 23 The hydrogen atom of the group represented may be substituted with CN, a halogen atom, a hydroxyl group or a carboxyl group.

[0492] In the R 21 、R 22 and R 23 When the group represented by has an alkylene moiety, the alkylene moiety may be replaced by -O-, -S-, -COO-, -OCO-, -NR 24 -、-NR 24 CO-、-NR 24 COO-、-OCONR 24 -, -SCO-, -COS-, -OCS-, or -CSO- is interrupted 1 to 5 times.

[0493] R 24 Means the same as above.

[0494] In the R 21 、R 22 and R 23 When the group represented by has an alkyl portion, the alkyl portion may be branched or cyclic. 22 and R 23 can form a ring together.

[0495] R 72 、R 73 and 3 R's 74 Each independently represents R 61, OR 61 SR 61 、COR 62 、CONR 63 R 64 NR 65 COR 61 , OCOR 61 、COOR 62 SCOR 61 , OCSR 61 、COSR 62 , CSOR 61 , hydroxyl, nitro, CN or halogen atom.

[0496] R 61 、R 62 、R 63 、R 64 and R 65 Each independently represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms.

[0497] By R 61 、R 62 、R 63 、R 64 or R 65 The hydrogen atoms of the group represented by OR 21 、COR 21 SR 21 NR 22 R 23 、CONR 22 R 23 、-NR 22 -OR 23 、-N(COR 22 )-OCOR 23 、-C(=N-OR 21 )-R 22 、-C(=N-OCOR 21 )-R 22 , CN, halogen atoms or COOR 21 replace.

[0498] R 72 and R 73 Can form a ring together, 2 R 74 can form a ring together.

[0499] * represents a bonding site with the first molecular structure of the oxime compound (1).

[0500] From R in formula (4) 71 、R21 、R 22 、R 23 、R 24 、R 61 、R 62 、R 63 、R 64 and R 65 Examples of alkyl groups having 1 to 20 carbon atoms, aryl groups having 6 to 30 carbon atoms, aralkyl groups having 7 to 30 carbon atoms, and heterocyclic groups having 2 to 20 carbon atoms are the same as those for R in formula (1). 11 、R 12 、R 13 、R 21 、R 22 、R 23 and R 24 Same as example.

[0501] R in formula (4) 22 and R 23 Can form a ring together means R 22 and R 23 A ring may be formed together with the commonly linked nitrogen atom, carbon atom or oxygen atom.

[0502] R in formula (4) 22 and R 23 Examples of rings that can be formed together are similar to those of R in formula (1). 12 and R 13 and R 22 and R 23 Same as the example of a ring that can be formed together.

[0503] As R in formula (4) 72 、R 73 and R 74 The halogen atom represented by R 71 、R 21 、R 22 、R 23 、R 61 、R 62 、R 63 、R 64 and R 65 Examples of the halogen atom including a hydrogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

[0504] The method for producing the oxime compound (1) having the second molecular structure represented by formula (4) is not particularly limited, and it can be produced, for example, by the methods described in International Publication Nos. 2017 / 051680 and 2020 / 004601.

[0505] Another example of the second molecular structure connected to the first molecular structure represented by formula (1) is a structure represented by the following formula (5).

[0506] The bonding site represented by "*" in formula (5) is directly bonded to the bonding site represented by "*" in formula (1). That is, when the second molecular structure is the structure represented by formula (5), the pyrrole ring having "-*" in formula (5) is directly bonded to the carbonyl group having "-*" in formula (1).

[0507]

[0508] In formula (5), R 81 represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms.

[0509] In the R 81 When the group represented by has an alkyl portion, the alkyl portion may be branched or cyclic.

[0510] By R 81 The hydrogen atoms of the group represented by R 21 , OR 21 、COR 21 SR 21 NR 22 R 23 、CONR 22 R 23 、-NR 22 -OR 23 、-N(COR 22 )-OCOR 23 NR 22 COR 21 , OCOR 21 、COOR 21 、-C(=N-OR 21 )-R 22 、-C(=N-OCOR 21 )-R 22 SCOR 21 , OCSR 21 、COSR 21 , CSOR 21 , hydroxyl, nitro, CN, halogen atom or COOR 21 replace.

[0511] R 21 、R 22 and R 23 Means the same as above.

[0512] By R 21 、R 22 or R 23 The hydrogen atom of the group represented may be substituted with CN, a halogen atom, a hydroxyl group or a carboxyl group.

[0513] In the R 21 、R 22 and R 23 When the group represented by has an alkylene moiety, the alkylene moiety may be replaced by -O-, -S-, -COO-, -OCO-, -NR 24 -、-NR 24 CO-、-NR 24 COO-、-OCONR 24 -, -SCO-, -COS-, -OCS-, or -CSO- is interrupted 1 to 5 times.

[0514] R 24 Means the same as above.

[0515] In the R 21 、R 22 and R 23 When the group represented by has an alkyl portion, the alkyl portion may be branched or cyclic. 22 and R 23 can form a ring together.

[0516] R 82 、R 83 、R 84 、R 85 and R 86 Each independently represents R 61 , OR 61 SR 61 、COR 62 、CONR 63 R 64 NR 65 COR 61 , OCOR 61 、COOR 62 SCOR 61 , OCSR 61 、COSR 62 , CSOR 61 , hydroxyl, nitro, CN or halogen atom.

[0517] R 61 、R 62 、R 63 、R 64 and R 65Each independently represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms.

[0518] By R 61 、R 62 、R 63 、R 64 or R 65 The hydrogen atoms of the group represented by OR 21 、COR 21 SR 21 NR 22 R 23 、CONR 22 R 23 、-NR 22 -OR 23 、-N(COR 22 )-OCOR 23 、-C(=N-OR 21 )-R 22 、-C(=N-OCOR 21 )-R 22 , CN, halogen atoms or COOR 21 replace.

[0519] R 83 and R 84 can form a ring together, R 84 and R 85 can form a ring together, R 85 and R 86 can form a ring together.

[0520] * represents a bonding site with the first molecular structure of the oxime compound (1).

[0521] From R in formula (5) 81 、R 21 、R 22 、R 23 、R 24 、R 61 、R 62 、R 63 、R 64 and R 65 Examples of alkyl groups having 1 to 20 carbon atoms, aryl groups having 6 to 30 carbon atoms, aralkyl groups having 7 to 30 carbon atoms, and heterocyclic groups having 2 to 20 carbon atoms are the same as those for R in formula (1). 11 、R 12 、R 13 、R 21 、R 22 、R 23 and R24 Same as example.

[0522] R in formula (5) 22 and R 23 Can form a ring together means R 22 and R 23 A ring may be formed together with the commonly linked nitrogen atom, carbon atom or oxygen atom.

[0523] R in formula (5) 22 and R 23 Examples of rings that can be formed together are similar to those of R in formula (1). 12 and R 13 and R 22 and R 23 Same as the example of a ring that can be formed together.

[0524] As R in formula (5) 82 、R 83 、R 84 、R 85 and R 86 The halogen atom represented by R 81 、R 21 、R 22 、R 23 、R 61 、R 62 、R 63 、R 64 and R 65 Examples of the halogen atom including a hydrogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

[0525] The method for producing the oxime compound (1) having the second molecular structure represented by formula (5) is not particularly limited, and it can be produced, for example, by the methods described in International Publication Nos. 2017 / 051680 and 2020 / 004601.

[0526] Another example of the second molecular structure connected to the first molecular structure represented by formula (1) is a structure represented by the following formula (6).

[0527] The bonding site represented by "*" in formula (6) is directly bonded to the bonding site represented by "*" in formula (1). That is, when the second molecular structure is the structure represented by formula (6), the benzene ring having "-*" in formula (6) is directly bonded to the carbonyl group having "-*" in formula (1).

[0528]

[0529] In formula (6), the four R 91 、R 92 、R93 、R 94 、R 95 、R 96 and R 97 Each independently represents R 61 , OR 61 SR 61 、COR 62 、CONR 63 R 64 NR 65 COR 61 , OCOR 61 、COOR 62 SCOR 61 , OCSR 61 、COSR 62 , CSOR 61 , hydroxyl, nitro, CN or halogen atom.

[0530] R 61 、R 62 、R 63 、R 64 and R 65 Each independently represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an aralkyl group having 7 to 30 carbon atoms, or a heterocyclic group having 2 to 20 carbon atoms.

[0531] By R 61 、R 62 、R 63 、R 64 or R 65 The hydrogen atoms of the group represented by OR 21 、COR 21 SR 21 NR 22 R 23 、CONR 22 R 23 、-NR 22 -OR 23 、-N(COR 22 )-OCOR 23 、-C(=N-OR 21 )-R 22 、-C(=N-OCOR 21 )-R 22 , CN, halogen atoms or COOR 21 replace.

[0532] R 21 、R 22 and R 23 Means the same as above.

[0533] R 92 and R 93 can form a ring together, R 94 and R 95 can form a ring together, R 95 and R 96 can form a ring together, R 96 and R 97 can form a ring together.

[0534] * represents a bonding site with the first molecular structure of the oxime compound (1).

[0535] From R in formula (6) 21 、R 22 、R 23 、R 61 、R 62 、R 63 、R 64 and R 65 Examples of alkyl groups having 1 to 20 carbon atoms, aryl groups having 6 to 30 carbon atoms, aralkyl groups having 7 to 30 carbon atoms, and heterocyclic groups having 2 to 20 carbon atoms are the same as those for R in formula (1). 11 、R 12 、R 13 、R 21 、R 22 and R 23 Same as example.

[0536] R in formula (6) 22 and R 23 Can form a ring together means R 22 and R 23 A ring may be formed together with the commonly linked nitrogen atom, carbon atom or oxygen atom.

[0537] R in formula (6) 22 and R 23 Examples of rings that can be formed together are similar to those of R in formula (1). 12 and R 13 and R 22 and R 23 Same as the example of a ring that can be formed together.

[0538] As R in formula (6) 91 、R 92 、R 93 、R 94 、R 95 、R 96 and R 97 The halogen atom represented by R 21 、R 22 、R 23 、R61 、R 62 、R 63 、R 64 and R 65 Examples of the halogen atom including a hydrogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

[0539] The method for producing the oxime compound (1) having the second molecular structure represented by formula (6) is not particularly limited, and it can be produced, for example, by the methods described in International Publication Nos. 2017 / 051680 and 2020 / 004601.

[0540] Another example of the oxime compound (excluding the oxime compound (1)) is a compound represented by the formula (EA).

[0541]

[0542] [Where,

[0543] R ea1 It represents a branched hydrocarbon group having 3 to 20 carbon atoms which may have a substituent.

[0544] R ea2 ~R ea5 Each independently represents a hydrocarbon group having 1 to 20 carbon atoms which may have a substituent.

[0545] n represents any integer from 0 to 4.

[0546] The -CH2- contained in the above hydrocarbon groups may be replaced by -O-, -S-, -CO- or -OCO-.]

[0547] As R ea1 Examples of the branched hydrocarbon group having 3 to 20 carbon atoms include a branched saturated hydrocarbon group having 3 to 20 carbon atoms and a branched unsaturated hydrocarbon group having 3 to 20 carbon atoms.

[0548] As R ea1The branched saturated hydrocarbon group having 3 to 20 carbon atoms represented by butyl includes, for example, 1-methylethyl (isopropyl), 1-methylpropyl (sec-butyl), 2-methylpropyl (isobutyl), 1,1-dimethylethyl (tert-butyl), 1,1-dimethylpropyl, 2,2-dimethylpropyl, 1,2-dimethylpropyl, 1-ethylpropyl, 1-methylbutyl, 2-methylbutyl, 3-methylbutyl, 1,1-dimethylbutyl, 2,2-dimethylbutyl, 3,3-dimethylbutyl, 1,2-dimethylbutyl, 1,3-dimethylbutyl 1-Methylpentyl, 2-Methylbutyl, 1-Ethylbutyl, 2-Ethylbutyl, 1-Methylpentyl, 2-Methylpentyl, 3-Methylpentyl, 4-Methylpentyl, 1,1-Dimethylpentyl, 2,2-Dimethylpentyl, 3,3-Dimethylpentyl, 1,2-Dimethylpentyl, 1,3-Dimethylpentyl, 2,3-Dimethylpentyl, 1-Ethylpentyl, 2-Ethylpentyl, 3-Ethylpentyl, 1-Methylhexyl, 2-Methylhexyl, 3-Methylhexyl, 4-Methylhexyl, 1,1-Dimethylhexyl, 2,2-Dimethylhexyl, 3 ,3-dimethylhexyl, 1,2-dimethylhexyl, 1,3-dimethylhexyl, 2,3-dimethylhexyl, 1-ethylhexyl, 2-ethylhexyl, 3-ethylhexyl, 1-methylheptyl, 2-methylheptyl, 3-methylheptyl, 4-methylheptyl, 1,1-dimethylheptyl, 2,2-dimethylheptyl, 3,3-dimethylheptyl, 1,2-dimethylheptyl, 1,3-dimethylheptyl, 2,3-dimethylheptyl, 1-ethylheptyl, 2-ethylheptyl, 3-ethylheptyl, 1-methyloctyl, 2-methyloctyl, 3 Branched-chain alkyl groups include methyloctyl, 4-methyloctyl, 1,1-dimethyloctyl, 2,2-dimethyloctyl, 3,3-dimethyloctyl, 1,2-dimethyloctyl, 1,3-dimethyloctyl, 2,3-dimethyloctyl, 1-ethyloctyl, 2-ethyloctyl, 3-ethyloctyl, 1-methylnonyl, 2-methylnonyl, 3-methylnonyl, 4-methylnonyl, dimethylnonyl, ethylnonyl, methyldecyl, dimethyldecyl, ethyldecyl, methylundecyl, dimethylundecyl, ethylundecyl, and methyldodecyl.

[0549] By R ea1 The branched alkyl group represented by may be any of a branched primary alkyl group, a branched secondary alkyl group, and a branched tertiary alkyl group.

[0550] By R ea1 The number of carbon atoms in the branched saturated hydrocarbon group represented by is preferably 4 or more, more preferably 5 or more, and is preferably 16 or less, more preferably 12 or less, and further preferably 10 or less.

[0551] As R ea1 The branched unsaturated hydrocarbon group represented by R ea1A group in which at least one carbon-carbon single bond contained in the branched saturated hydrocarbon group represented by is replaced by a carbon-carbon double bond or a carbon-carbon triple bond.

[0552] As R ea1 Examples of the branched unsaturated hydrocarbon group represented by include alkenyl groups such as isopropenyl, isobutenyl, isopentenyl, isohexenyl, isoheptenyl, isooctenyl, isononenyl, and isodecenyl; and alkynyl groups such as isopropynyl, isobutynyl, isopentenyl, isohexyl, isoheptynyl, isooctynyl, isononynyl, and isodecenyl.

[0553] By R ea1 The number of carbon atoms in the branched unsaturated hydrocarbon group represented by is preferably 4 or more, more preferably 5 or more, and is preferably 16 or less, more preferably 12 or less, and further preferably 10 or less.

[0554] As R ea2 、R ea3 、R ea4 and R ea5 The hydrocarbon group having 1 to 20 carbon atoms represented by includes saturated hydrocarbon groups having 1 to 20 carbon atoms, unsaturated hydrocarbon groups having 2 to 20 carbon atoms, aromatic hydrocarbon groups having 6 to 20 carbon atoms, and the like. ea2 、R ea3 、R ea4 and R ea5 The hydrocarbon groups represented may be the same or different.

[0555] Examples of the saturated hydrocarbon group having 1 to 20 carbon atoms include linear alkyl groups such as methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, dodecyl, hexadecyl, and eicosyl; branched alkyl groups such as isopropyl, isobutyl, isopentyl, neopentyl, and 2-ethylhexyl; and alicyclic saturated hydrocarbon groups having 3 to 20 carbon atoms such as cyclopropyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, and tricyclodecyl. The saturated hydrocarbon group preferably has 1 to 18 carbon atoms, more preferably 1 to 15, even more preferably 1 to 10, and even more preferably 1 to 8 carbon atoms.

[0556] Examples of the unsaturated hydrocarbon group having 2 to 20 carbon atoms include alkenyl groups such as vinyl, allyl, butenyl, pentenyl, hexenyl, heptenyl, octenyl, nonenyl, decenyl, undecenyl, dodecenyl, hexadecenyl, octadecenyl, and eicosenyl; alkynyl groups such as ethynyl, propynyl, hexynyl, decynyl, and eicosynyl; and cycloalkenyl groups such as cyclopentenyl, cyclohexenyl, and cycloheptenyl. The unsaturated hydrocarbon group preferably has 2 to 18 carbon atoms, more preferably 2 to 15, and even more preferably 2 to 10 carbon atoms.

[0557] Examples of the aromatic hydrocarbon group having 6 to 20 carbon atoms include phenyl, xylyl, trimethylphenyl, dipropylphenyl, di(2,2-dimethylpropyl)phenyl, naphthyl, benzyl, phenylethyl, and phenylbutyl. The aromatic hydrocarbon group preferably has 6 to 18 carbon atoms, more preferably 6 to 15, and even more preferably 6 to 12 carbon atoms.

[0558] As R ea1 、R ea2 、R ea3 、R ea4 and R ea5 The substituents that the hydrocarbon group represented by may have include a halogen atom, a cyano group, and a nitro group. The halogen atom is preferably a fluorine atom, a bromine atom, a chlorine atom, or an iodine atom.

[0559] The -CH2- contained in the above hydrocarbon group can be replaced by -O-, -S-, -CO- or -OCO-, and the adjacent -CH2- will not be replaced by the same group at the same time, and the terminal -CH2- will not be replaced.

[0560] n represents any integer of 0 to 4, preferably an integer of 0 to 3, more preferably an integer of 0 to 2, further preferably an integer of 0 or 1, and even more preferably 0.

[0561] *-OCO-R ea4 The bonding position of the group (* represents the bonding site with the phenyl group) can be the *-OCO-R ea4 The group is bonded to any of the 2-position, 3-position, or 4-position of the phenyl group, preferably the 3-position or the 4-position, and more preferably the 4-position.

[0562] By R ea1 The branched hydrocarbon group having 3 to 20 carbon atoms represented by is preferably a branched saturated hydrocarbon group having 3 to 20 carbon atoms, more preferably a branched alkyl group having 3 to 20 carbon atoms, further preferably a branched alkyl group having 3 to 10 carbon atoms, and preferably one or more selected from the group consisting of 1-methylpentyl, 2-methylpentyl, 3-methylpentyl, 1-ethylpentyl, 2-ethylpentyl, 3-ethylpentyl, 1-methylhexyl, 2-methylhexyl, 3-methylhexyl, 1-ethylhexyl, 2-ethylhexyl, 3-ethylhexyl, 1-methylheptyl, 2-methylheptyl, 3-methylheptyl, 1-ethylheptyl, 2-ethylheptyl and 3-ethylheptyl.

[0563] By R ea2 、R ea3 、R ea4 and R ea5The hydrocarbon group having 1 to 20 carbon atoms represented by is preferably a saturated hydrocarbon group having 1 to 20 carbon atoms or an unsaturated hydrocarbon group having 2 to 20 carbon atoms, more preferably a saturated hydrocarbon group having 1 to 20 carbon atoms, further preferably a chain saturated hydrocarbon group having 1 to 10 carbon atoms, and still more preferably a chain alkyl group having 1 to 8 carbon atoms.

[0564] R ea2 The chain alkyl group is preferably a group having 1 to 8 carbon atoms, and more preferably a group having 1 to 6 carbon atoms.

[0565] R ea3 The chain alkyl group is preferably a group having 1 to 8 carbon atoms, and more preferably a group having 1 to 3 carbon atoms.

[0566] R ea4 The chain alkyl group is preferably a group having 1 to 8 carbon atoms, and more preferably a group having 1 to 3 carbon atoms.

[0567] R ea5 The chain or branched alkyl group is preferably a group having 1 to 8 carbon atoms, and more preferably a chain or branched alkyl group having 1 to 6 carbon atoms.

[0568] Other examples of the photopolymerization initiator include photopolymerization initiators other than the oxime compound (1) and the compound represented by the formula (EA). Examples of other photopolymerization initiators include oxime compounds other than the oxime compound (1) and the compound represented by the formula (EA), biimidazole compounds, triazine compounds, and acylphosphine compounds.

[0569] Examples of oxime compounds other than the oxime compound (1) and the compound represented by the formula (EA) include oxime compounds having a partial structure represented by the following formula (d1): * represents a bonding site.

[0570]

[0571] Examples of the oxime compound having a partial structure represented by formula (d1) include N-benzoyloxy-1-(4-phenylthiophenyl)butane-1-one-2-imine, N-benzoyloxy-1-(4-phenylthiophenyl)octane-1-one-2-imine, N-benzoyloxy-1-(4-phenylthiophenyl)-3-cyclopentylpropane-1-one-2-imine, N-acetoxy-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethane-1-imine, N-acetoxy-1-[9-ethyl-6-{2-methyl-4-(3,3-dimethyl-2,4-dioxetane]-1-imine]

[0014] Examples include N-acetyloxy-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-3-cyclopentylpropane-1-imine, and N-benzoyloxy-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-3-cyclopentylpropane-2-imine; and compounds described in JP-A-2011-132215, WO-2008 / 78678, WO-2008 / 78686, and WO-2012 / 132558. Commercially available products such as Irgacure OXE01 (N-benzoyloxy-1-(4-phenylthiophenyl)octan-1-one-2-imine), OXE02 (N-acetoxy-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethane-1-imine) (both manufactured by BASF), and N-1919 (manufactured by ADEKA) can also be used.

[0572] Among them, the oxime compound having a partial structure represented by formula (d1) is preferably at least one selected from the group consisting of N-benzoyloxy-1-(4-phenylthiophenyl)butane-1-one-2-imine, N-benzoyloxy-1-(4-phenylthiophenyl)octane-1-one-2-imine, N-acetoxy-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethane-1-imine, and N-benzoyloxy-1-(4-phenylthiophenyl)-3-cyclopentylpropane-1-one-2-imine, and more preferably N-benzoyloxy-1-(4-phenylthiophenyl)octane-1-one-2-imine or N-acetoxy-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethane-1-imine.

[0573] Examples of the biimidazole compound include compounds represented by formula (d5).

[0574]

[0575] [In formula (d5), R E ~R J represents an aryl group having 6 to 10 carbon atoms which may have a substituent.]

[0576] Examples of the aryl group having 6 to 10 carbon atoms include phenyl, tolyl, xylyl, ethylphenyl, and naphthyl, and phenyl is preferred.

[0577] Examples of the substituent include a halogen atom and an alkoxy group having 1 to 4 carbon atoms. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom, preferably a chlorine atom. Examples of the alkoxy group having 1 to 4 carbon atoms include a methoxy group, an ethoxy group, a propoxy group, and a butoxy group, preferably a methoxy group.

[0578] Examples of the biimidazole compound include 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, 2,2'-bis(2,3-dichlorophenyl)-4,4',5,5'-tetraphenylbiimidazole (see, for example, Japanese Patent Application Laid-Open No. 06-75372 and Japanese Patent Application Laid-Open No. 006-75373), 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole, and 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenylbiimidazole. Biimidazole compounds in which the phenyl groups at the 4,4',5,5'-positions are substituted with alkoxycarbonyl groups (e.g., see Japanese Patent Application Publication No. 48-38403 and Japanese Patent Application Laid-Open No. 62-174204), and biimidazole compounds in which the phenyl groups at the 4,4',5,5'-positions are substituted with alkoxycarbonyl groups (e.g., see Japanese Patent Application Laid-Open No. 7-10913). Among these, compounds represented by the following formula or mixtures thereof are preferred.

[0579]

[0580] Examples of the triazine compound include 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-(4-methoxynaphthyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-piperonyl-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-(4-methoxyphenyl)-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[ 2-(5-methylfuran-2-yl)vinyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(furan-2-yl)vinyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(4-diethylamino-2-methylphenyl)vinyl]-1,3,5-triazine, 2,4-bis(trichloromethyl)-6-[2-(3,4-dimethoxyphenyl)vinyl]-1,3,5-triazine, etc. Among them, 2,4-bis(trichloromethyl)-6-piperonyl-1,3,5-triazine is preferred.

[0581] Examples of the acylphosphine compound include bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide and (2,4,6-trimethylbenzoyl)diphenylphosphine oxide.

[0582] Examples of other photopolymerization initiators other than the oxime compound (1) and the compound represented by the formula (EA) include: benzoin compounds such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether; benzophenone compounds such as benzophenone, methyl o-benzoylbenzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 3,3',4,4'-tetrakis(tert-butylperoxycarbonyl)benzophenone, 2,4,6-trimethylbenzophenone, and 4,4'-bis(diethylamino)benzophenone; quinone compounds such as 9,10-phenanthrenequinone, 2-ethylanthraquinone, and camphorquinone; 10-butyl-2-chloroacridone, benzil, methyl phenylglyoxylate, and titanocene compounds.

[0583] The content of the polymerization initiator (E) in the composition (I) is preferably from 0.1 to 300 parts by mass, more preferably from 0.1 to 200 parts by mass, relative to 100 parts by mass of the polymerizable compound (D). Furthermore, the content of the polymerization initiator (E) in the composition (I) is preferably from 0.1 to 30 parts by mass, more preferably from 0.5 to 20 parts by mass, relative to 100 parts by mass of the combined amount of the resin (C) and the polymerizable compound (D). When the content of the polymerization initiator (E) is within this range, the sensitivity of the composition (I) tends to increase, resulting in a shorter exposure time, and thus, the productivity of the wavelength conversion layer tends to increase.

[0584] The content of the polymerization initiator (E) in the composition II is preferably 0.001 mass % to 60 mass %, more preferably 0.01 mass % to 50 mass %, relative to the total amount of the resin (C) and the polymerizable compound (D).

[0585] The content of the polymerization initiator (E) in the composition III is preferably from 0.001% by mass to 60% by mass, more preferably from 0.01% by mass to 50% by mass, further preferably from 0.05% by mass to 30% by mass, and even more preferably from 0.1% by mass to 10% by mass, relative to the total amount of the resin (C) and the polymerizable compound (D).

[0586] From the viewpoint of improving the emission intensity, the content of the oxime compound (1) in the polymerization initiator (E) is preferably 30% by mass or more and 100% by mass or less, more preferably 50% by mass or more and 100% by mass or less, further preferably 80% by mass or more and 100% by mass or less, even more preferably 90% by mass or more and 100% by mass or less, particularly preferably 95% by mass or more and 100% by mass or less, and most preferably 100% by mass, relative to the total amount of the polymerization initiator (E).

[0587] <Polymerization initiator aid (E1)>

[0588] The composition may contain a polymerization initiator (E) and a polymerization initiator aid (E1). The polymerization initiator aid (E1) is a compound or sensitizer that promotes polymerization of the polymerizable compound (D) initiated by the polymerization initiator (E). Examples of the polymerization initiator aid (E1) include photopolymerization initiators such as amine compounds, alkoxyanthracene compounds, thioxanthone compounds, and carboxylic acid compounds, as well as thermal polymerization initiators. The composition may contain two or more polymerization initiators (E1).

[0589] Examples of the amine compound include triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, 2-ethylhexyl 4-dimethylaminobenzoate, N,N-dimethyl-p-toluidine, 4,4'-bis(dimethylamino)benzophenone (commonly known as Michler's ketone), 4,4'-bis(diethylamino)benzophenone, and 4,4'-bis(ethylmethylamino)benzophenone.

[0590] Examples of the alkoxyanthracene compound include 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 2-ethyl-9,10-diethoxyanthracene, 9,10-dibutoxyanthracene, and 2-ethyl-9,10-dibutoxyanthracene.

[0591] Examples of the thioxanthone compound include 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, and 1-chloro-4-propoxythioxanthone.

[0592] Examples of the carboxylic acid compound include phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, methoxyphenylthioacetic acid, dimethoxyphenylthioacetic acid, chlorophenylthioacetic acid, dichlorophenylthioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, and naphthoxyacetic acid.

[0593] When composition I contains a polymerization initiator aid (E1), the content of the polymerization initiator aid (E1) in composition I is preferably from 0.1 parts by mass to 300 parts by mass, and more preferably from 0.1 parts by mass to 200 parts by mass, per 100 parts by mass of the polymerizable compound (D). Furthermore, the content of the polymerization initiator aid (E1) in composition I is preferably from 0.1 parts by mass to 30 parts by mass, and more preferably from 1 part by mass to 20 parts by mass, per 100 parts by mass of the combined amount of the resin (C) and the polymerizable compound (D). When the content of the polymerization initiator aid (E1) is within this range, the sensitivity of composition I can be further improved.

[0594] When a polymerization initiator aid (E1) is used, the content of the polymerization initiator aid (E1) in the composition II is preferably from 0.00001% by mass to 60% by mass, and more preferably from 0.0001% by mass to 50% by mass, relative to the total amount of the resin (C) and the polymerizable compound (D). Furthermore, the content of the polymerization initiator aid (E1) in the composition II is preferably from 0.1 parts by mass to 30 parts by mass, and more preferably from 1 part by mass to 20 parts by mass, relative to 100 parts by mass of the total amount of the resin (C) and the polymerizable compound (D).

[0595] When a polymerization initiator aid (E1) is used, the content of the polymerization initiator aid (E1) in the composition III is preferably from 0.00001% by mass to 60% by mass, and more preferably from 0.0001% by mass to 50% by mass, relative to the total amount of the resin (C) and the polymerizable compound (D). Furthermore, the content of the polymerization initiator aid (E1) in the composition III is preferably from 0.1 parts by mass to 30 parts by mass, and more preferably from 1 part by mass to 20 parts by mass, relative to 100 parts by mass of the total amount of the resin (C) and the polymerizable compound (D).

[0596] <Antioxidant (F)>

[0597] The antioxidant (F) is not particularly limited as long as it is an antioxidant commonly used in industry, and phenolic antioxidants, phosphorus-containing antioxidants, phosphorus / phenol composite antioxidants, sulfur-containing antioxidants, etc. can be used. The composition may contain two or more antioxidants (F).

[0598] Phosphorus / phenol complex antioxidants are compounds having one or more phosphorus atoms and one or more phenol structures in the molecule. From the viewpoint of the developability and luminescence intensity of the composition, the antioxidant (F) preferably contains a phosphorus / phenol complex antioxidant.

[0599] Examples of phenolic antioxidants include Irganox (registered trademark) 1010 (Irganox 1010: pentaerythritol tetrakis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate], manufactured by BASF Corporation), Irganox 1076 (Irganox 1076: octadecyl 3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate, manufactured by BASF Corporation), Irganox 1330 (Irganox 1330: 3,3',3",5,5',5"-hexa-tert-butyl-a,a',a"-(mesitylene-2,4,6-triyl)tri-p-cresol, manufactured by BASF Corporation), and Irganox 3114 (Irganox 3114: 1,3,5-tris(3,5-di-tert-butyl-4-hydroxybenzyl)-1,3,5-triazine-2,4,6(1H,3H,5H)-trione, manufactured by BASF Corporation), Irganox 3790 (Irganox 3790: 1,3,5-tris((4-tert-butyl-3-hydroxy-2,6-xylyl)methyl)-1,3,5-triazine-2,4,6(1H,3H,5H)-trione, manufactured by BASF Corporation), Irganox 1035 (Irganox 1035: thiodiethylene bis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate], manufactured by BASF Corporation), Irganox 1135 (Irganox 1135: 3,5-bis(1,1-dimethylethyl)-4-hydroxy-C7-C9 side chain alkyl ester of phenylpropionic acid, manufactured by BASF Corporation), Irganox 1520L (Irganox 1520L: 4,6-bis(octylthiomethyl)-o-cresol, manufactured by BASF Corporation), Irganox 3125 (Irganox 3125, manufactured by BASF Corporation), Irganox 565 (Irganox 565: 2,4-bis(n-octylthio)-6-(4-hydroxy-3',5'-di-tert-butylanilino)-1,3,5-triazine, manufactured by BASF Corporation), ADKSTAB (registered trademark) AO-80 (ADK STAB AO-80: 3,9-bis(2-(3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propionyloxy)-1,1-dimethylethyl)-2,4,8,10-tetraoxaspiro(5,5)undecane, manufactured by ADEKA Co., Ltd.), Sumilizer (registered trademark) BHT, Sumilizer GA-80, Sumilizer GS (all manufactured by Sumitomo Chemical Co., Ltd.), Cyanox (registered trademark) 1790 (Cyanox 1790, manufactured by Cytec Co., Ltd.), vitamin E (manufactured by Eisai Co., Ltd.), etc.

[0600] Examples of the phosphorus-containing antioxidant include Irgafos (registered trademark) 168 (Irgafos 168: tris(2,4-di-tert-butylphenyl) phosphite, manufactured by BASF Corporation), Irgafos 12 (Irgafos 12: tris[2-[[2,4,8,10-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphep-6-yl]oxy]ethyl]amine, manufactured by BASF Corporation), Irgafos 38 (Irgafos 38: bis(2,4-bis(1,1-dimethylethyl)-6-methylphenyl) phosphite ethyl ester, manufactured by BASF Corporation), ADK STAB (registered trademark) 329K, ADK STAB PEP36, and ADK STAB PEP-8 (all manufactured by ADEKA Corporation), and Sandstab P-EPQ (manufactured by Clariant), Weston (registered trademark) 618, Weston 619G (all manufactured by GE), Ultranox 626 (manufactured by GE), etc.

[0601] Examples of phosphorus / phenol composite antioxidants include Sumilizer (registered trademark) GP (6-[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propoxy]-2,4,8,10-tetra-tert-butyldibenzo[d,f][1.3.2]dioxaphosphopepene) (manufactured by Sumitomo Chemical Co., Ltd.).

[0602] Examples of the sulfur-containing antioxidant include dialkyl thiodipropionate compounds such as dilauryl thiodipropionate, dimyristyl thiodipropionate, and distearyl thiodipropionate; and β-alkylthiopropionate compounds of polyols such as tetrakis[methylene(3-dodecylthio)propionate]methane.

[0603] The content of the antioxidant (F) in the composition I is, for example, 1 part by mass or more and 50 parts by mass or less relative to 100 parts by mass of the resin (C). From the viewpoint of luminous intensity and heat resistance, it is preferably 5 parts by mass or more and 40 parts by mass or less, and more preferably 7 parts by mass or more and 30 parts by mass or less.

[0604] The content of the antioxidant (F) in the composition II is, for example, 1 part by mass or more and 50 parts by mass or less relative to 100 parts by mass of the resin (C). From the viewpoint of luminous intensity and heat resistance, it is preferably 5 parts by mass or more and 40 parts by mass or less, and more preferably 7 parts by mass or more and 30 parts by mass or less.

[0605] The content of the antioxidant (F) in the composition III is, for example, 1 part by mass or more and 50 parts by mass or less relative to 100 parts by mass of the resin (C). From the viewpoint of luminous intensity and heat resistance, it is preferably 5 parts by mass or more and 40 parts by mass or less, and more preferably 7 parts by mass or more and 30 parts by mass or less.

[0606] <Solvent (J)>

[0607] The solvent (J) is preferably a solvent that dissolves the resin (C), the polymerizable compound (D), and the polymerization initiator (E). Examples of the solvent (J) include ester solvents (solvents containing -COO- but not -O- in the molecule), ether solvents (solvents containing -O- but not -COO- in the molecule), ether ester solvents (solvents containing -COO- and -O- in the molecule), ketone solvents (solvents containing -CO- but not -COO- in the molecule), alcohol solvents (solvents containing OH but not -O-, -CO-, or COO- in the molecule), aromatic hydrocarbon solvents, amide solvents, and dimethyl sulfoxide.

[0608] Examples of the ester solvent include methyl lactate, ethyl lactate, n-butyl lactate, methyl 2-hydroxyisobutyrate, ethyl acetate, n-butyl acetate, isobutyl acetate, n-amyl formate, isoamyl acetate, n-butyl propionate, isopropyl butyrate, ethyl butyrate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, cyclohexyl acetate, and γ-butyrolactone.

[0609] Examples of the ether solvent include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, 3-methoxy-1-butanol, 3-methoxy-3-methylbutanol, tetrahydrofuran, tetrahydropyran, 1,4-dioxane, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, anisole, phenethyl ether, and methyl anisole.

[0610] Examples of the ether ester solvent include methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-methoxy-2-methylpropionate, ethyl 2-ethoxy-2-methylpropionate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether acetate, and diethylene glycol monobutyl ether acetate.

[0611] Examples of the ketone solvent include 4-hydroxy-4-methyl-2-pentanone, acetone, 2-butanone, 2-heptanone, 3-heptanone, 4-heptanone, 4-methyl-2-pentanone, cyclopentanone, cyclohexanone, and isophorone.

[0612] Examples of the alcohol solvent include methanol, ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, and glycerin.

[0613] Examples of the aromatic hydrocarbon solvent include benzene, toluene, xylene, and mesitylene.

[0614] Examples of the amide solvent include N,N-dimethylformamide, N,N-dimethylacetamide, and N-methylpyrrolidone.

[0615] The solvent (J) preferably contains one or more selected from the group consisting of propylene glycol monomethyl ether acetate, ethyl lactate, propylene glycol monomethyl ether, cyclohexyl acetate, ethyl 3-ethoxypropionate, ethylene glycol monomethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, 4-hydroxy-4-methyl-2-pentanone, and aromatic hydrocarbon solvents.

[0616] The solvent (J) is preferably propylene glycol monomethyl ether acetate, ethyl lactate, propylene glycol monomethyl ether, cyclohexyl acetate, ethyl 3-ethoxypropionate, ethylene glycol monomethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, 4-hydroxy-4-methyl-2-pentanone or toluene, or a mixture of two or more thereof.

[0617] The solvent (J) is a component other than the solid component, and for example, the solvent contained in the dispersion of the semiconductor particles (A) or the solution of the resin (C) is also included in the solvent (J).

[0618] The content of solvent (J) in composition I is the ratio of the total mass of all solvents contained in the composition to the total mass of composition I. The content of solvent (J) in composition I relative to the total mass of composition I is, for example, 40% by mass or more and 95% by mass or less, preferably 55% by mass or more and 90% by mass or less. In other words, the solids content of composition I is, for example, 5% by mass or more and 60% by mass or less, preferably 10% by mass or more and 45% by mass or less. When the content of solvent (J) is within this range, the flatness of the composition layer during coating tends to be improved, and a wavelength conversion layer of an appropriate thickness can be easily formed.

[0619] Relative to the total amount of Composition II, the solid content of Composition II is preferably 0.01 mass % or more and 100 mass % or less, more preferably 0.1 mass % or more and 99.9 mass % or less, further preferably 0.1 mass % or more and 99 mass % or less, further preferably 1 mass % or more and 90 mass % or less, further more preferably 1 mass % or more and 80 mass % or less, particularly preferably 1 mass % or more and 70 mass % or less, extremely preferably 1 mass % or more and 60 mass % or less, and most preferably 1 mass % or more and 50 mass % or less.

[0620] The solid content of Composition III is preferably 0.01% by mass or more and 100% by mass or less, more preferably 0.1% by mass or more and 99.9% by mass or less, further preferably 0.1% by mass or more and 99% by mass or less, still more preferably 1% by mass or more and 90% by mass or less, still more preferably 1% by mass or more and 80% by mass or less, particularly preferably 1% by mass or more and 70% by mass or less, extremely preferably 1% by mass or more and 60% by mass or less, and most preferably 1% by mass or more and 50% by mass or less, relative to the total amount of Composition III.

[0621] <Leveling agent (H)>

[0622] Examples of leveling agents (H) include silicone surfactants, fluorinated surfactants, and silicone surfactants containing fluorine atoms. These may have polymerizable groups in their side chains. From the perspective of the composition's developability and luminous intensity, the leveling agent (H) is preferably a fluorinated surfactant. The composition may contain two or more leveling agents (H).

[0623] Examples of the silicone-based surfactant include surfactants having a siloxane bond in the molecule. Specific examples include Toray Silicone DC3PA, Toray Silicone SH7PA, Toray Silicone DC11PA, Toray Silicone SH21PA, Toray Silicone SH28PA, Toray Silicone SH29PA, Toray Silicone SH30PA, and Toray Silicone SH8400 (trade names: manufactured by Toray Dow Corning Co., Ltd.); KP321, KP322, KP323, KP324, KP326, KP340, and KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.); and TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF4446, TSF4452, and TSF4460 (manufactured by Momentive Performance Materials Japan Ltd.).

[0624] Examples of fluorinated surfactants include surfactants having a fluorine-containing carbon chain in the molecule. Specific examples include Fluorad (registered trademark) FC430 and Fluorad FC431 (manufactured by Sumitomo 3M Co., Ltd.); Megaface (registered trademark) F142D, Megaface F171, Megaface F172, Megaface F173, Megaface F177, Megaface F183, Megaface F554, Megaface F575, Megaface R30, and Megaface RS-718-K (manufactured by DIC Corporation); Eftop (registered trademark) EF301, Eftop EF303, Eftop EF351, and Eftop EF352 (manufactured by Mitsubishi Materials Electronic Chemicals, Ltd.); and Surflon (registered trademark) S381, Surflon S382, Surflon SC101 and Surflon SC105 (manufactured by Asahi Glass Co., Ltd.) and E5844 (manufactured by Daikin Fine Chemicals Laboratories, Ltd.), etc.

[0625] Examples of silicone surfactants containing fluorine atoms include surfactants containing a siloxane bond and a fluorocarbon chain in the molecule. Specific examples include Megaface (registered trademark) R08, Megaface BL20, Megaface F475, Megaface F477, and Megaface F443 (manufactured by DIC Corporation).

[0626] When composition I includes a leveling agent (H), the content of the leveling agent (H) in composition I is, for example, 0.001% by mass to 1.0% by mass, preferably 0.005% by mass to 0.75% by mass, and more preferably 0.01% by mass to 0.5% by mass, relative to the total amount of composition I. When the content of the leveling agent (H) is within this range, the flatness of the wavelength conversion layer can be further improved.

[0627] When the composition II contains a leveling agent (H), the content of the leveling agent (H) in the composition II is, for example, 0.001 mass % to 1.0 mass %, preferably 0.005 mass % to 0.75 mass %, and more preferably 0.01 mass % to 0.5 mass %, relative to the total amount of the composition II.

[0628] When composition III contains a leveling agent (H), the content of the leveling agent (H) in composition III is, for example, 0.001 mass % to 1.0 mass %, preferably 0.005 mass % to 0.75 mass %, and more preferably 0.01 mass % to 0.5 mass %, relative to the total amount of composition III.

[0629] <Other ingredients>

[0630] Compositions I, II, and III may further contain additives known in the art, such as ultraviolet absorbers, polymerization inhibitors, fillers, other polymer compounds, adhesion promoters, light stabilizers, and chain transfer agents, as needed.

[0631] Examples of the ultraviolet absorber include benzotriazole compounds such as 2-(2-hydroxy-3-tert-butyl-5-methylphenyl)-5-chlorobenzotriazole and (2-(2,4-dihydroxyphenyl)-2H-benzotriazole); benzophenone compounds such as 2-hydroxy-4-octyloxybenzophenone; benzoate compounds such as 2,4-di-tert-butylphenyl-3,5-di-tert-butyl-4-hydroxybenzoate; and triazine compounds such as 2-(4,6-diphenyl-1,3,5-triazin-2-yl)-5-hexyloxyphenol.

[0632] <Method for producing composition>

[0633] Compositions I, II, and III can be produced by a method comprising a step of mixing predetermined components and, if necessary, other components. The method for producing compositions I, II, and III may further comprise a step of preparing resin (C).

[0634] When using a colorant (I), it is preferably used in the form of a colorant dispersion obtained by pre-mixing the colorant (I) with a portion or all of the solvent (J) and dispersing the mixture using a bead mill or the like until the average particle size of the colorant (I) reaches approximately 0.2 μm or less. In this case, a dispersant or a portion or all of the resin (C) may be added as needed. The dispersant described in the section regarding the light scattering agent (B) can be used as the dispersant.

[0635] <Method for Manufacturing Laminated Body>

[0636] 1. Wavelength conversion layer (composition I)

[0637] The wavelength conversion layer can be provided on the substrate by, for example, the following method a or method b.

[0638] Method a: comprising the steps of applying composition I on a substrate and then drying the substrate;

[0639] Method b: A wavelength conversion layer is produced by a method comprising applying composition I onto a support and then drying the layer. The wavelength conversion layer is then peeled from the support and bonded to a substrate via an adhesive layer.

[0640] In one embodiment, the composition I is a resin composition R1 further comprising a resin (C). The wavelength conversion layer (resin film) formed from the resin composition R1 can be formed by applying the composition I on a substrate or a support and then drying the coating.

[0641] In another embodiment, composition I is a curable composition R2 further comprising a polymerizable compound (D) and a polymerization initiator (E). Curable composition R2 may further comprise a resin (C). The wavelength conversion layer formed from curable composition R2 is a cured film. This cured film can be obtained by applying curable composition R2 onto a substrate or support, drying it, and then curing it using light and / or heat.

[0642] One embodiment of the curable composition R2 is a photocurable composition R3 containing a photopolymerizable compound and a photopolymerization initiator. The photocurable composition R3 may further contain a resin (C).

[0643] 2. Topcoat (Composition III)

[0644] In one embodiment, composition III is resin composition R4 further comprising resin (C). The overcoat layer (resin film) formed from resin composition R4 can be formed by applying composition III on a substrate and then drying the coating.

[0645] In another embodiment, composition III is a curable composition R5 further comprising a polymerizable compound (D) and a polymerization initiator (E). Curable composition R5 may further comprise a resin (C). The topcoat formed from curable composition R5 is a cured film. This cured film can be obtained by applying curable composition R5 onto a substrate, drying it, and then curing it using light and / or heat.

[0646] One embodiment of the curable composition R5 is a photocurable composition R6 containing a photopolymerizable compound and a photopolymerization initiator. The photocurable composition R6 may further contain a resin (C).

[0647] 3. Light Absorption Layer (Composition II)

[0648] In one embodiment, composition II is resin composition R7 further comprising resin (C). The light-absorbing layer (resin film) formed from resin composition R7 can be formed by applying composition II on a substrate and then drying the coating.

[0649] In another embodiment, composition II is a curable composition R8 further comprising a polymerizable compound (D) and a polymerization initiator (E). Curable composition R8 may further comprise a resin (C). The light-absorbing layer formed from curable composition R8 is a cured film. This cured film can be obtained by applying curable composition R8 onto a substrate, drying it, and then curing it using light and / or heat.

[0650] One embodiment of the curable composition R8 is a photocurable composition R9 containing a photopolymerizable compound and a photopolymerization initiator. The photocurable composition R9 may further contain a resin (C).

[0651] 4. Substrate

[0652] Examples of substrates for forming the wavelength conversion layer include glass plates such as quartz glass, borosilicate glass, aluminosilicate glass, and soda-lime glass coated with silica; resin plates such as polycarbonate, polymethyl methacrylate, and polyethylene terephthalate; silicon; substrates having thin films of aluminum, silver, or a silver / copper / palladium alloy formed thereon; and components included or capable of being included in a display device. Examples of components included or capable of being included in a display device include a primary light source (e.g., a blue light source), a light guide plate, a diffusion film (diffusion layer), a light reflecting member (e.g., a reflective film), a brightness enhancement member, a prism sheet, a barrier layer, and a protective layer.

[0653] The base material forming the overcoat layer is the wavelength conversion layer or another layer formed on the wavelength conversion layer (however, a layer different from the wavelength conversion layer, the overcoat layer, and the light absorbing layer).

[0654] The base material forming the light absorbing layer is the overcoat layer or another layer formed on the overcoat layer (however, a layer different from the wavelength conversion layer, the overcoat layer, and the light absorbing layer).

[0655] The wavelength conversion layer, overcoat layer, and light-absorbing layer can each be provided on the entire surface of each substrate, or they can be provided in a pattern on a portion of the substrate. Methods for patterning each layer (wavelength conversion layer, overcoat layer, or light-absorbing layer) on the substrate include photolithography, inkjet printing, and printing. Examples of printing methods include stencil printing, screen printing, and printing and coating using an applicator.

[0656] 5. Manufacturing Method

[0657] A patterned resin film (wavelength conversion layer) formed from resin composition R1, a patterned resin film (overcoat layer) formed from resin composition R4, and a patterned resin film (light-absorbing layer) formed from resin composition R7 can each be formed on the substrate corresponding to each layer as follows. First, resin composition R1, R4, or R7 is applied to the substrate corresponding to each layer through a mask to form a patterned composition layer. Examples of coating methods for the resin composition include spin coating, slit coating, and slit and spin coating.

[0658] Next, the composition layer is dried (to remove volatile components such as the solvent) to obtain a resin film (wavelength conversion layer, overcoat layer, or light absorption layer). Examples of drying methods include heating and drying, reduced-pressure drying, and combinations thereof. When heating and drying are performed, the temperature is preferably 30°C to 250°C, more preferably 50°C to 235°C. The heating time is preferably 10 seconds to 180 minutes, more preferably 30 seconds to 90 minutes. When reduced-pressure drying is performed, it is preferably performed at a pressure of 50 Pa to 150 Pa. The drying of the composition layer can be carried out in multiple steps, for example, by performing multiple drying steps with different drying temperatures.

[0659] For example, using photolithography, a patterned cured film (wavelength conversion layer) formed from the photocurable composition R3, a patterned cured film (overcoat layer) formed from the photocurable composition R6, and a patterned cured film (light-absorbing layer) formed from the photocurable composition R9 can be formed on the substrate corresponding to each layer in the following manner. First, the photocurable composition R3, R6, or R9 is applied to the substrate corresponding to each layer, and volatile components such as the solvent are removed by heating and drying (prebaking) and / or drying under reduced pressure to form a composition layer. The coating method is similar to that described above.

[0660] When heat drying is performed, the temperature is preferably 30°C to 120°C, more preferably 50°C to 110°C. The heating time is preferably 10 seconds to 60 minutes, more preferably 30 seconds to 30 minutes. When drying under reduced pressure, it is preferably performed at a pressure of 50 Pa to 150 Pa and a temperature range of 20°C to 25°C.

[0661] Next, the composition layer is exposed through a photomask formed into the desired pattern. The light source used for exposure is preferably one that generates light with a wavelength of 250 nm to 450 nm. For example, light near 436 nm, 408 nm, or 365 nm can be selectively extracted using a bandpass filter, depending on the absorption wavelength of the photopolymerization initiator. Specific examples of light sources include mercury lamps, light-emitting diodes, metal halide lamps, and halogen lamps.

[0662] In order to uniformly irradiate the entire exposure surface with parallel light or to accurately align the photomask with the substrate on which the composition layer is formed, it is preferable to use an exposure device such as a mask aligner or a stepper. After exposure, the composition layer is cured by polymerization of the photopolymerizable compound contained in the composition layer.

[0663] The exposed composition layer is brought into contact with a developer for development. The unexposed portions of the composition layer are dissolved in the developer and removed, thereby obtaining a patterned cured film (wavelength conversion layer, overcoat layer, or light-absorbing layer). Examples of the developer include aqueous solutions of alkaline compounds such as potassium hydroxide, sodium bicarbonate, sodium carbonate, and tetramethylammonium hydroxide, and organic solvents. The concentration of the alkaline compound in the aqueous solution is preferably from 0.01% to 10% by mass, and more preferably from 0.03% to 5% by mass. Examples of the organic solvent include the same organic solvents as those described above for solvent (J). The developer may contain a surfactant.

[0664] The development method may be any of a paddle method, a dipping method, a spray method, etc. Furthermore, the substrate may be tilted at any angle during development.

[0665] The patterned film obtained by development is preferably further heated (post-baked). The heating temperature is preferably 150°C to 250°C, more preferably 160°C to 235°C. The heating time is preferably 1 minute to 120 minutes, more preferably 10 minutes to 60 minutes. Heating after development allows polymerization of unreacted photopolymerizable compounds and the like contained in the film, thereby producing a cured film with even better chemical resistance. Even when development is not performed, it is preferable to further heat (post-bake) the exposed composition layer.

[0666] On the other hand, as a method for forming a cured film (wavelength conversion layer, overcoat layer, or light absorbing layer) on the entire surface of a substrate, there is a method in which a curable composition is applied to the substrate corresponding to each layer, dried as needed to form a composition layer, and the composition layer is heated and / or the entire surface of the composition layer is exposed to light.

[0667] The cured films formed from curable compositions R2, R5, and R7 comprise a cured reaction product of the polymerizable compound and polymerization initiator contained in the curable compositions R2, R5, and R7. This cured reaction product comprises a structure derived from the polymerizable compound and polymerization initiator. The structure derived from the polymerizable compound and polymerization initiator is, for example, the skeletal structure of the polymerizable compound and polymerization initiator, excluding the curing reaction site, or a portion thereof.

[0668] The shape and size of the patterned wavelength conversion layer, overcoat layer, and light absorbing layer are not particularly limited. For example, the patterned wavelength conversion layer, overcoat layer, and light absorbing layer may be square in plan view.

[0669] The wavelength conversion layer of one embodiment absorbs primary light from a primary light source and emits green light. It is preferably a layer that converts the wavelength of blue light, which is the primary light, to the wavelength of green light. The green light emitted by this wavelength conversion layer preferably includes a peak with a maximum in the wavelength range of 500 nm to 560 nm, more preferably in the wavelength range of 520 nm to 555 nm, and even more preferably in the wavelength range of 525 nm to 550 nm. The half-width of this peak is preferably 15 nm to 80 nm, more preferably 15 nm to 60 nm, even more preferably 15 nm to 50 nm, and particularly preferably 15 nm to 45 nm.

[0670] In another embodiment, the wavelength conversion layer absorbs primary light from a primary light source and emits red light. It is preferably a layer that converts the wavelength of blue light, which is the primary light, to the wavelength of red light. The red light emitted by this wavelength conversion layer preferably includes a peak with a maximum in the wavelength range of 610 nm to 750 nm, more preferably in the wavelength range of 620 nm to 650 nm, and even more preferably in the wavelength range of 625 nm to 645 nm. The half-width of this peak is preferably 15 nm to 80 nm, more preferably 15 nm to 60 nm, even more preferably 15 nm to 50 nm, and particularly preferably 15 nm to 45 nm.

[0671] The laminated body and display device described later may include both a wavelength conversion layer that emits green light and a wavelength conversion layer that emits red light.

[0672] The wavelength conversion layer can be a layer that absorbs a portion of the primary light and allows the remaining portion of the primary light to pass through. From the perspective of wide color gamut and energy efficiency of the display device, the transmittance of the wavelength conversion layer at a wavelength of 450nm is preferably 90% or less, more preferably 85% or less, further preferably 75% or less, further preferably 60% or less, particularly preferably 40% or less, more particularly preferably 30% or less, and most preferably 20% or less. It is expected that the amount of primary light passing through the wavelength conversion layer is small, but according to the present invention having a light absorbing layer, even if a portion of the primary light passes through the wavelength conversion layer, it is possible to suppress the leakage of the primary light to the visible side, and by providing the light absorbing layer, the reduction in luminous intensity can be suppressed. From this viewpoint, the transmittance of the wavelength conversion layer at a wavelength of 450nm can be 10% or more, further 15% or more, and further 20% or more.

[0673] The luminous intensity retention of the laminate of the present invention is preferably 60% or higher, more preferably 65% ​​or higher, and even more preferably 69% or higher. There is no particular upper limit, and 100% is ideal, but values ​​of 95% or lower, and even 90% or lower, are acceptable. The luminous intensity retention, which is reduced in a two-layer structure consisting of a wavelength conversion layer and a light-absorbing layer, can be significantly improved by further including an overcoat layer between the wavelength conversion layer and the light-absorbing layer. The luminous intensity retention can be measured using the measurement method described in the Examples section below.

[0674] The blue intensity cutoff of the laminate of the present invention is preferably 40% or greater, more preferably 60% or greater, even more preferably 80% or greater, and even more preferably 90% or greater. There is no particular upper limit, and 100% is ideal. However, even 99.5% or less, and even 90% or less, is acceptable. By laminating a light-absorbing layer, the blue intensity cutoff can be significantly improved. The blue intensity cutoff can be measured according to the measurement method described in the Examples section below.

[0675] <Display device>

[0676] The display device of the present invention comprises a primary light source and the laminate of the present invention. The display device is a device that emits light by irradiating a wavelength conversion layer with primary light from the primary light source, and extracts the emitted light through a light absorbing layer.

[0677] Figure 3 It is a schematic cross-sectional view showing an example of the display device of the present invention. Figure 3 The display device shown includes Figure 2 The stacked device shown in FIG. 1 includes a blue light source 40 as a primary light source, the blue light source 40 having a first region, a second region, and a third region as distinct regions. The first region of the blue light source 40 includes a first wavelength conversion layer 11 that emits red light, a first overcoat layer 31 disposed on the first wavelength conversion layer 11, and a first light-absorbing layer 21 disposed on the first overcoat layer 31. The second region of the blue light source 40 includes a second wavelength conversion layer 12 that emits green light, a second overcoat layer 32 disposed on the second wavelength conversion layer 12, and a second light-absorbing layer 22 disposed on the second overcoat layer 32. This display device includes a red light-emitting region (i.e., the first region), a green light-emitting region (i.e., the second region), and a blue light-emitting region (i.e., the third region). Thus, the display device includes the blue light source, the wavelength conversion layer, the overcoat layer, and the light-absorbing layer in this order along the optical path of light from the blue light source 40.

[0678] The first wavelength conversion layer 11 and the second wavelength conversion layer 12 may be directly disposed on the blue light source 40 , or may be disposed on a light guide plate disposed between the blue light source 40 and the first wavelength conversion layer 11 and the second wavelength conversion layer 12 in the optical path of light from the blue light source 40 .

[0679] The display device may further include: a transparent layer or a layer containing a light diffusing agent arranged on the third region of the blue light source 40 and allowing blue light to pass through; and a third light absorbing layer arranged on the layer and allowing blue light to pass through and absorbing light other than blue light.

[0680] As the blue light source 40, for example, a blue light-emitting diode (LED), a laser, an electroluminescence (EL), or other known light sources can be used. From the perspectives of color gamut and energy efficiency, the blue light source 40 preferably emits light with a peak in the range of 495 nm or less, and more preferably emits light with a peak in the range of 425 nm to 495 nm or less.

[0681] The display device may further include, for example, a light guide plate, a diffusion film (diffusion layer), a light reflecting member (such as a reflection film), a brightness enhancement member, a prism sheet, a barrier layer, and the like.

[0682] Any appropriate light guide plate may be used as the light guide plate. For example, a light guide plate having a lens pattern formed on the back side so as to deflect light from the lateral direction in the thickness direction, or a light guide plate having a prism shape formed on the back side and / or the visible side may be used.

[0683] The diffusion film diffuses the primary light or the light emitted from the wavelength conversion layer and may be, for example, an amplifying diffusion film. The light-reflecting member reflects the primary light toward the wavelength conversion layer and may be, for example, a reflective mirror, a film of reflective particles, a reflective metal film, or a reflector. The brightness-enhancing member reflects a portion of the light back in the direction of the transmitted light.

[0684] The prism sheet typically has a base material portion and a prism portion. The base material portion may also be omitted depending on the adjacent components. The prism sheet can be bonded to the adjacent components via any appropriate adhesive layer (e.g., an adhesive layer, a pressure-sensitive adhesive layer). The prism sheet is constructed by arranging a plurality of unit prisms protruding toward the side opposite to the visible side (the back side). By arranging the convex portion of the prism sheet toward the back side, light passing through the prism sheet is easily focused. In addition, if the convex portion of the prism sheet is arranged toward the back side, less light is reflected without entering the prism sheet compared to the case where the convex portion is arranged toward the visible side, and a display device with high luminous intensity can be obtained.

[0685] The barrier layer is a layer for protecting the wavelength conversion layer from water vapor and oxygen in the atmosphere as external gases.

[0686] The display device may also include a layer containing one or more dielectric materials in the optical path between adjacent elements (layers). The one or more dielectric materials include, for example, vacuum, air, gas, optical material, adhesive, optical adhesive, glass, polymer, solid, liquid, gel, curing material, optical bonding material, refractive index matching or refractive index mismatching material, refractive index gradient material, cladding or anti-cladding material, spacer, silicone, brightness enhancement material, scattering or diffusing material, reflective or anti-reflective material, wavelength selective material, wavelength selective anti-reflective material, or other suitable media known in the art, but are not limited thereto and may include any suitable material.

[0687] As a specific example of a display device, there can be mentioned a display device equipped with a wavelength conversion material for an EL display or a liquid crystal display. Figure 3 The example shown may also be, for example, the following display device.

[0688] A display device in which a wavelength conversion layer is arranged between a blue light source and a light guide plate along the end face (side face) of the light guide plate to form a backlight emitting white light (edge-type backlight), and a light absorbing layer is arranged on the light guide plate side;

[0689] A display device is formed by providing a wavelength conversion layer on a light guide plate, forming a backlight (surface-mounted backlight) that emits light from a blue light source placed on an end face (side face) of the light guide plate and irradiating the wavelength conversion layer through the light guide plate as white light, and a cover layer and a light-absorbing layer are provided on the wavelength conversion layer.

[0690] A display device in which a wavelength conversion layer is provided near the light-emitting portion of a blue light source to form a backlight (chip-based backlight) that emits the incident light as white light, and a cover layer and a light-absorbing layer are arranged on the wavelength conversion layer.

[0691] Example

[0692] The present invention will be described in more detail below with reference to Examples. Unless otherwise specified, "%" and "parts" in the Examples are by mass % and by mass parts.

[0693] <Measurement>

[0694] (1) Thickness measurement of wavelength conversion layer, cover layer and light absorption layer

[0695] The film thickness was measured using a film thickness measuring device (DEKTAKXT; manufactured by Bruker).

[0696] (2) Determination of luminous intensity maintenance rate

[0697] A light diffuser was placed on a backlight using a blue LED with a peak wavelength of 450nm as a point light source to form the backlight unit. The backlight unit was positioned with the light diffuser facing upward, and a spectroradiometer (TOPCON Co., Ltd., "SR-UL1R") was set up 60 cm above the surface of the light diffuser. A laminate consisting of a wavelength conversion layer, a top layer, and a light absorbing layer formed on a glass substrate (Comparative Example 1: a wavelength conversion layer formed on a glass substrate, and Comparative Example 2: a laminate of a wavelength conversion layer and a light absorbing layer formed on a glass substrate) was used as a measurement sample. This laminate was placed on the surface of the light diffuser with the laminate facing upward. In this state, the backlight was illuminated, and the spectroradiometer was used to measure the spectral luminance spectrum of light emitted from the laminate. From this spectrum, the luminous intensity (EI) (μW) at the maximum peak wavelength of the green emission peak was calculated.

[0698] The maximum peak wavelength of the green emission peak is 530 nm in the emission spectrum of the semiconductor particles (A) contained in the wavelength conversion layer, and the half-value width of the green emission peak is 42 nm.

[0699] The emission spectrum of the semiconductor particles (A) was measured using an absolute PL quantum yield measurement apparatus ("C9920-02" manufactured by Hamamatsu Photonics Co., Ltd., excitation light at 450 nm, room temperature, and atmospheric conditions). A dispersion of the semiconductor particles (A) diluted to an absorbance of 0.4 at a wavelength of 450 nm was used as a measurement sample.

[0700] The luminous intensity EI of the measured samplea The luminescence intensity of Comparative Example 1 was measured and designated as EI b The retention rate of the luminous intensity EI before and after lamination of the overcoat layer was calculated according to the following formula. The results are shown in Table 6.

[0701] Luminous intensity EI maintenance rate (%) = [EI a / EI b ]×100

[0702] (3) Blue intensity cutoff rate

[0703] The spectral radiance spectrum was measured by the same method as in “(2) Measurement of Luminous Intensity Retention Rate”, and the luminous intensity EI′ (μW) at a wavelength of 450 nm was calculated from the spectrum.

[0704] The luminous intensity EI' of the measured sample a The luminous intensity of Comparative Example 1 was measured and designated as EI'. b The blue intensity cutoff rate was calculated according to the following formula. The results are shown in Table 6.

[0705] Blue intensity cutoff rate (%) = [1-EI' a / EI' b ]×100

[0706] (4) Status of the cover layer

[0707] The film thickness of the laminate (a cured film comprising a wavelength conversion layer, an overcoat layer, and a light-absorbing layer) was measured at four arbitrary points using a film thickness meter (DEKTAKXT; manufactured by Bruker). The maximum film thickness Tmax, minimum film thickness Tmin, and average film thickness Tave at the four measured points were determined. Film thickness unevenness was calculated using the following formula, and the condition of the overcoat layer was evaluated based on the following criteria.

[0708] Film thickness unevenness (%) = (Tmax-Tmin) / Tave×100

[0709] ◎: Film thickness unevenness within 5%

[0710] ○: Film thickness unevenness is greater than 5% and within 10%

[0711] △: The unevenness of the film thickness is greater than 10%.

[0712] (5) Film forming properties of the light absorbing layer

[0713] The light-absorbing layer was visually observed, and the film-forming properties of the light-absorbing layer were evaluated based on the following criteria.

[0714] ○: The light absorbing layer is formed on substantially the entire surface of the overcoat layer.

[0715] ×: There is a portion on the overcoat layer where the light-absorbing layer is not formed (when the laminate is viewed from the light-absorbing layer side, the area of ​​the overcoat layer occupies 10% or more of the observed area)

[0716] (6) Determination of refractive index

[0717] The laminate of the wavelength conversion layer, the overcoat layer, and the light absorbing layer was measured using a spectroscopic ellipsometer to determine the refractive index of each layer at a wavelength of 550 nm. The ellipsometer was set as follows.

[0718] Device: M-2000 manufactured by JA Woollam

[0719] Measurement wavelength: 400nm~1690nm

[0720] Exposure time: 5 seconds

[0721] Incident angle: 50 degrees, 60 degrees, 70 degrees

[0722] (7) Determination of the weight average molecular weight (Mw) of the resin

[0723] The polystyrene-equivalent weight average molecular weight (Mw) of the resin (C) was measured by GPC under the following conditions.

[0724] Device: HLC-8120GPC (manufactured by Tosoh Corporation)

[0725] Column: TSK-GELG2000HXL

[0726] Column temperature: 40°C

[0727] Solvent: tetrahydrofuran

[0728] Flow rate: 1.0 mL / min

[0729] Solid content concentration of analysis sample: 0.001% by mass to 0.01% by mass

[0730] Injection volume: 50 μL

[0731] Detector: RI

[0732] Calibration standard substances: TSK standard polystyrene F-40, F-4, F-288, A-2500, A-500 (manufactured by Tosoh Corporation)

[0733] <Synthesis Example 1: Synthesis of Resin (C1)>

[0734] A flask equipped with a reflux condenser, a dropping funnel, and a stirrer was purged with an appropriate amount of nitrogen to replace the atmosphere with nitrogen. 80 parts of propylene glycol monomethyl ether acetate (PGMEA) was added and heated to 85°C while stirring. Next, a mixed solution prepared by dissolving 6 parts of methacrylic acid, 25 parts of tetrahydrodicyclopentadienyl methacrylate, 40 parts of methyl methacrylate, and 29 parts of 1-[2-(methacryloyloxy)ethyl] succinate in 20 parts of PGMEA was added dropwise to the flask over 4 hours. Separately, a solution prepared by dissolving 9 parts of the polymerization initiator 2,2-azobis(2,4-dimethylvaleronitrile) in 40 parts of PGMEA was added dropwise over 5 hours. After the initiator solution was added dropwise, the temperature was maintained at 85°C for 4 hours and then cooled to room temperature to obtain a copolymer (Resin (C1)) solution. The solid content of the resin (C1) solution was 40%, and the weight average molecular weight Mw was 11,500.

[0735] <Synthesis Example 2: Synthesis of Resin (C2)>

[0736] A suitable amount of nitrogen was introduced into a flask equipped with a reflux condenser, a dropping funnel, and a stirrer to replace the atmosphere with nitrogen. 371 parts of PGMEA was added and heated to 85°C while stirring. Next, 54 parts of acrylic acid and 225 parts of 3,4-epoxytricyclo[5.2.1.0 2,6 ]Decan-8-yl ester and 3,4-epoxytricyclo[5.2.1.0 2,6 A mixed solution prepared by dissolving a mixture of 9-decane esters (containing a 50:50 molar ratio) and 81 parts of vinyltoluene (isomer mixture) in 80 parts of PGMEA was added dropwise to the flask. Separately, a solution prepared by dissolving 30 parts of the polymerization initiator 2,2-azobis(2,4-dimethylvaleronitrile) in 160 parts of PGMEA was added dropwise over 5 hours. After the initiator solution was added dropwise, the mixture was maintained at 85°C for 4 hours and then cooled to room temperature to obtain a copolymer (Resin (C2)) solution. The Resin (C2) solution had a solids content of 37% and a weight-average molecular weight (Mw) of 10,600.

[0737] <Preparation Example 1: Preparation of Semiconductor Particle (A1) Dispersion Liquid>

[0738] A toluene dispersion a of semiconductor particles (A1) [green-emitting InP / ZnSeS quantum dots] containing oleic acid as an organic ligand (G1) was prepared. As described above, the green emission peak of these quantum dots had a maximum peak wavelength of 530 nm and a half-width of 42 nm.

[0739] Toluene was removed from the toluene dispersion a by distillation under reduced pressure. Then, 70 parts of cyclohexyl acetate (J3) was added to 30 parts of the total amount of the semiconductor particles (A1) and the organic ligand (G1), thereby obtaining a semiconductor particle (A1) dispersion b. The composition of the semiconductor particle (A1) dispersion b is shown in Table 1.

[0740] [Table 1]

[0741]

[0742] Regarding the composition ratio of the semiconductor particles (A1) to the organic ligand (G1), the residual amount of the mixture after removing toluene when heated to 550°C at a heating rate of 5°C / min was measured by TG-DTA measurement, and the residual amount was calculated as the weight of the organic ligand (G1).

[0743] <Preparation Example 2: Preparation of Composition (I) for Forming Wavelength Conversion Layer>

[0744] The semiconductor particle (A1) dispersion liquid b was mixed with the respective components to prepare a wavelength conversion layer-forming composition (I) having the composition shown in Table 2. In Table 2, the numbers of parts of the components other than the solvent (J) are expressed in terms of solid content.

[0745] [Table 2]

[0746]

[0747] The details of the abbreviations of the components shown in Table 2 are as follows.

[0748] Light Scattering Agent (B1): 60 parts of titanium oxide particles were mixed with 10 parts (based on solid content) of Resin C1 and 30 parts of PGMEA, and the titanium oxide particles were thoroughly dispersed using a bead mill. The number of parts of Light Scattering Agent (B1) listed in Table 2 is the number of parts per titanium oxide particle.

[0749] Polymerizable compound (D1): Carboxyl group-containing multifunctional (meth)acrylate (trade name "ARONIX (registered trademark) M-510" manufactured by Toagosei Co., Ltd.)

[0750] Polymerization initiator (E1): "IRGACURE (registered trademark) OXE-02" manufactured by BASF

[0751] Antioxidant (F1): Trade name "SUMILIZER (registered trademark) GP" manufactured by Sumitomo Chemical Co., Ltd.

[0752] Leveling agent (H1): Polyether-modified silicone oil (Toray Silicone SH8400, manufactured by Dow Corning Toray Industries, Ltd.)

[0753] Solvent (J1): Propylene glycol monomethyl ether acetate

[0754] Solvent (J3): Cyclohexyl acetate

[0755] <Preparation Example 3: Preparation of Overcoat Layer Forming Composition (III)>

[0756] The components were mixed to prepare an overcoat layer-forming composition (III) having the composition shown in Table 3. In Table 3, the numbers of parts of the components other than the solvent (J) are expressed in terms of solid content.

[0757] [Table 3]

[0758]

[0759] <Preparation Example 4: Preparation of Pigment Dispersion (Ph)>

[0760] The components shown in Table 4 were mixed, and a pigment as a colorant (I) was sufficiently dispersed using a bead mill to prepare a pigment dispersion (Ph-1).

[0761] [Table 4]

[0762]

[0763] The details of the abbreviations of the components shown in Table 4 are as follows.

[0764] Pigment (P1): CI Pigment Yellow 138

[0765] Pigment dispersant: solvent-based pigment dispersant

[0766] Resin (C3): Methacrylic acid / benzyl methacrylate copolymer (copolymerization ratio (mass ratio): 30 / 70, Mw: 1.2×10 4

[0767] Solvent (J1): Propylene glycol monomethyl ether acetate

[0768] Solvent (J2): Propylene glycol monomethyl ether (PGME)

[0769] <Preparation Example 5: Preparation of Composition for Forming Light-Absorbing Layer (II)>

[0770] The light-absorbing layer-forming composition (II) was obtained by mixing the components shown in Table 5. In Table 5, the number of parts of the resin is expressed in terms of solid content.

[0771] [Table 5]

[0772]

[0773] The details of the abbreviations of the components shown in Table 5 are as follows.

[0774] Polymerizable compound (D2): dipentaerythritol hexaacrylate (trade name "KAYARAD (registered trademark) DPHA" manufactured by Nippon Kayaku Co., Ltd.)

[0775] Polymerization initiator (E2): N-benzoyloxy-1-(4-phenylthiophenyl)octan-1-one-2-imine (trade name: "IRGACURE (registered trademark) OXE-01" manufactured by BASF)

[0776] Leveling agent (H1): Polyether-modified silicone oil (Toray Silicone SH8400, manufactured by Dow Corning Toray Industries, Ltd.)

[0777] Solvent (J1): Propylene glycol monomethyl ether acetate

[0778] <Example 1>

[0779] The wavelength conversion layer-forming composition (I) was applied to a 5 cm square glass substrate ("Eagle XG" manufactured by Corning Incorporated) by spin coating so that the thickness of the post-baked layer was 7 μm. The composition layer was then pre-baked at 100°C for 3 minutes to form the composition layer. The substrate with the composition layer formed thereon was exposed to light at 80 mJ / cm2 in an air atmosphere using an exposure machine ("TME-150RSK" manufactured by TOPCON Corporation). 2 The wavelength conversion layer was formed by irradiating the film with an exposure dose of 100 nm (based on 365 nm), developing the film, and then post-baking it at 180°C for 30 minutes. The weight difference before and after the formation of the wavelength conversion layer was calculated to be 0.043 g.

[0780] Next, the composition (III) for forming an overcoat layer was applied to the wavelength conversion layer by spin coating so that the thickness of the layer after post-baking was 0.3 μm, and then pre-baked at 100°C for 3 minutes to form a composition layer. The substrate with the composition layer formed on the wavelength conversion layer was exposed to light at 100 mJ / cm2 in an air atmosphere using an exposure machine (TME-150RSK manufactured by TOPCON Co., Ltd.). 2 The film was irradiated with light at an exposure dose of 100 nm (based on 365 nm), developed, and then post-baked at 180° C. for 30 minutes to form a laminate of the wavelength conversion layer and the overcoat layer.

[0781] Next, the composition (II) for forming a light-absorbing layer was applied to the overcoat layer by spin coating so that the thickness of the layer after post-baking was 1.5 μm, and then pre-baked at 100°C for 3 minutes to form a composition layer. The substrate with the composition layer formed on the overcoat layer was exposed to light at 100 mJ / cm2 in an air atmosphere using an exposure machine (TME-150RSK manufactured by TOPCON Co., Ltd.). 2 The film was irradiated with an exposure dose of 100 nm (based on 365 nm), developed, and then post-baked at 180°C for 30 minutes to form a laminate of a wavelength conversion layer, an overcoat layer, and a light-absorbing layer. The weight difference before and after forming the light-absorbing layer was calculated to be 0.004 g.

[0782] The refractive indices of the wavelength conversion layer, the overcoat layer, and the light absorbing layer were measured. The refractive indices were 1.70 for the wavelength conversion layer, 1.53 for the overcoat layer, and 1.62 for the light absorbing layer.

[0783] In addition, when calculating the value expressed by Formula 1, Q 10 (wavelength conversion layer) and Q 20 (Light Absorption Layer) The concentration of the colorant in each layer was determined according to the following method based on the weight of each layer and the colorant concentration in each layer. The content of the semiconductor particles (A1) and the organic ligand (G1) was 35.0% by mass relative to the total solid content of the wavelength conversion layer-forming composition (I). Furthermore, the content of the pigment (P1) was 26.4% by mass relative to the total solid content of the light absorption layer-forming composition (II).

[0784] Q 10 = Weight of wavelength conversion layer × (35.0 / 100)

[0785] Q 20 =The weight of the light absorbing layer × (26.4 / 100)

[0786] <Examples 2 to 8, Comparative Example 3>

[0787] A laminate was formed in the same manner as in Example 1, except that the thickness of each layer was changed as shown in Table 6. The weight of the light-absorbing layer of Example 7 and the wavelength-converting layer of Example 8, whose thicknesses differed from those in Example 1, was determined in the same manner as in Example 1. The weight of each layer was 0.001 g for the light-absorbing layer of Example 7 and 0.01 g for the wavelength-converting layer of Example 8.

[0788] <Comparative Example 1>

[0789] The wavelength conversion layer-forming composition (I) was applied to a 5 cm square glass substrate ("Eagle XG" manufactured by Corning Incorporated) by spin coating so that the thickness of the post-baked layer was 7 μm. The composition layer was then pre-baked at 100°C for 3 minutes to form the composition layer. The substrate with the composition layer formed thereon was exposed to light at 80 mJ / cm2 in an air atmosphere using an exposure machine ("TME-150RSK" manufactured by TOPCON Corporation). 2 The film was irradiated with light at an exposure dose of 100 nm (365 nm reference), developed, and then post-baked at 180° C. for 30 minutes, thereby forming a wavelength conversion layer.

[0790] <Comparative Example 2>

[0791] The composition (II) for forming a light-absorbing layer was applied to the wavelength conversion layer obtained in Comparative Example 1 by spin coating so that the thickness of the layer after post-baking was 1.5 μm. The composition layer was then pre-baked at 100°C for 3 minutes to form a composition layer. The substrate having the composition layer formed on the wavelength conversion layer was exposed to light at 100 mJ / cm2 in an air atmosphere using an exposure machine (TME-150RSK manufactured by TOPCON Corporation). 2 The film was irradiated with light at an exposure dose of 100 nm (based on 365 nm), developed, and then post-baked at 180° C. for 30 minutes, thereby forming a laminate of the wavelength conversion layer and the light absorption layer.

[0792] [Table 6]

[0793]

[0794]

[0795] Description of labels

[0796] 10. Wavelength conversion layer

[0797] 11. First wavelength conversion layer

[0798] 12. Second wavelength conversion layer

[0799] 20 Light absorption layer

[0800] 21. First light absorbing layer

[0801] 22. Second light absorbing layer

[0802] 30 topcoat

[0803] 31 First overcoat

[0804] 32 Second overcoat

[0805] 40 blue light source

Claims

1. A laminated body, wherein: The laminate comprises a wavelength conversion layer and a light absorbing layer, wherein the wavelength conversion layer contains light-emitting inorganic semiconductor particles. A cover layer is provided between the wavelength conversion layer and the light absorption layer, The overcoat layer has a thickness of 15 μm or less.

2. The laminate according to claim 1, wherein The film thickness ratio calculated from (thickness of the overcoat layer+thickness of the light absorbing layer) / thickness of the wavelength conversion layer is 0.100 or more and 5 or less.

3. The laminate according to claim 1, wherein The ratio of the thickness of the light absorbing layer to the thickness of the laminate (light absorbing layer / laminated body) is 0.030 to 0.

300.

4. The laminate according to claim 1, wherein The laminate satisfies the following i) and ii): i) the refractive index of the cover layer is less than the refractive index of the wavelength conversion layer; ii) The refractive index of the cover layer is smaller than the refractive index of the light absorbing layer.

5. The laminate according to claim 1, wherein The values ​​of Formula 1 of the wavelength conversion layer, the light absorption layer, and the overcoat layer are 0.30 or less. {Q 20 / (T 20 + T 30 ))} / {Q 10 / T 10} …… (Equation 1) [In formula 1, Q 10 : Total amount of light-emitting inorganic semiconductor particles and organic ligands in the wavelength conversion layer (g) Q 20 : Total amount of colorants in the light absorbing layer (g) T 10 : Thickness of wavelength conversion layer (μm) T 20 : Thickness of the light absorbing layer (μm) T 30 : thickness of the overcoat layer (μm)].

6. A display device, wherein: The display device includes the laminate according to any one of claims 1 to 5.

Citation Information

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