Splicing mask and splicing exposure method of color filter

Abstract

The invention discloses a splicing mask plate and a splicing exposure method of a color filter, and the splicing mask plate comprises a central pattern module which comprises a main pattern region and at least one pair of mutually matched central splicing edge regions adjacent to the main pattern region, the first center splicing edge area and the second center splicing edge area are located on the two opposite sides of the main pattern area in the first direction respectively, and patterns on the first center splicing edge area and the second center splicing edge area are configured to be spliced at preset positions so as to jointly form a target pattern; the first center splicing edge area is provided with a plurality of first intervals and a plurality of first pixel units, the first intervals and the first pixel units are alternately arranged, the second center splicing edge area is provided with a plurality of second intervals and a plurality of second pixel units, and the second intervals and the second pixel units are alternately arranged. The positions of the first intervals are in one-to-one correspondence with the positions of the second pixel units, and the positions of the second intervals are in one-to-one correspondence with the positions of the first pixel units, so that adverse effects caused by splicing seams formed by splicing exposure are reduced.

Description

Technical Field

[0001] The present invention relates to the field of liquid crystal display, and in particular to a splicing exposure method for splicing a mask plate and a color filter. Background Art

[0002] A Thin Film Transistor-Liquid Crystal Display (TFT-LCD) consists of two sheets of glass, with a color filter on top and a thin film transistor (TFT) on the bottom, sandwiching a layer of liquid crystal. This is combined with components such as a polarizer, backlight, and driver circuitry to form a complete display module. The color filter (CF) is a key component of a TFT-LCD, enabling the display to produce a color image. It primarily consists of a transparent glass substrate, a black matrix (BM), and a color resist layer.

[0003] Currently, proximity exposure machines are widely used in color filter production. However, due to the limitations of mask size, color filters larger than the mask size are difficult to obtain, making it difficult to meet the increasing size requirements of LCD products.

[0004] Therefore, there is an urgent need for a method for manufacturing large-size color filters. Summary of the Invention

[0005] The technical problem solved by the present invention is to provide a splicing exposure method for splicing a mask plate and a color filter, so as to improve the performance of the formed color filter.

[0006] To solve the above technical problems, the technical solution of the present invention provides a splicing mask, comprising: a plurality of graphic modules isolated from each other by shading tapes, wherein the plurality of graphic modules include a central graphic module, the central graphic module including a main graphic area, and a pair of mutually cooperating central splicing edge areas adjacent to the main graphic area, comprising at least a first central splicing edge area and a second central splicing edge area, the first central splicing edge area and the second central splicing edge area being respectively located on opposite sides of the main graphic area in a first direction, the graphics on the first central splicing edge area and the second central splicing edge area being configured to be spliced ​​at a predetermined position to jointly form a target pattern, the first central splicing edge area having a plurality of first intervals and a plurality of first pixel units, the first intervals and the first pixel units being arranged alternately, the second central splicing edge area having a plurality of second intervals and a plurality of second pixel units, the second intervals and the second pixel units being arranged alternately, the positions of the first intervals corresponding one-to-one to the positions of the second pixel units, and the positions of the second intervals corresponding one-to-one to the positions of the first pixel units.

[0007] Optionally, the width of the shading band between two adjacent graphic modules is greater than or equal to 2 mm.

[0008] Optionally, the central graphic module also includes: a third central stitching edge area and a fourth central stitching edge area, a total of two pairs of central stitching edge areas that cooperate with each other, the third central stitching edge area and the fourth central stitching edge area are located on both sides of the main graphic area in the second direction, and the graphics thereon are configured to be spliced ​​at predetermined positions to jointly form the target pattern, and the first direction and the second direction are perpendicular to each other.

[0009] Optionally, the central graphic module also includes: four central stitching corner areas located at the corners of the main graphic area and cooperating with each other, each of the central stitching corner areas being adjacent to a central stitching edge area on both sides, and the graphics on the four central stitching corner areas are configured to be stitched together at predetermined positions to jointly form the target pattern.

[0010] Optionally, several of the graphic modules further include: four side graphic modules, one side graphic module corresponding to one central splicing edge area, each side graphic module including a first side splicing edge area and a second side splicing edge area located on two opposite sides thereof, and a third side splicing edge area located on a third side thereof, the first side splicing edge area and the second side splicing edge area cooperate with each other, and the graphics thereon are configured to be spliced ​​at a predetermined position to jointly form the target pattern, and the graphics on the third side splicing edge area and the corresponding central splicing edge area are configured to be spliced ​​at a predetermined position to jointly form the target pattern.

[0011] Optionally, several of the graphic modules further include: four corner graphic modules, each of the corner graphic modules having a first corner splicing edge area and a second corner splicing edge area respectively located on two adjacent sides thereof, one corner graphic module corresponds to two side graphic modules, and one side graphic module corresponds to two corner graphic modules, the first corner splicing edge area cooperates with the first side splicing edge area of ​​the corresponding side graphic module, and the graphics thereon are configured to be spliced ​​at a predetermined position to jointly form the target pattern, the second corner splicing edge area cooperates with the second side splicing edge area of ​​the corresponding other side graphic module, and the graphics thereon are configured to be spliced ​​at a predetermined position to jointly form the target pattern.

[0012] Optionally, the corner graphic module has a first width in the first direction, the central graphic module has a second width in the first direction, and the second width is greater than or equal to twice the first width; the corner graphic module has a first length in the second direction, the central graphic module has a second length in the second direction, and the second length is greater than or equal to twice the first length.

[0013] Correspondingly, the technical solution of the present invention also provides a splicing exposure method for a color filter, comprising: providing a splicing mask, the splicing mask comprising a plurality of graphic modules isolated from each other by shading tapes, the plurality of graphic modules comprising a central graphic module, the central graphic module comprising a main graphic area, and a pair of mutually cooperating central splicing edge areas adjacent to the main graphic area, at least including a first central splicing edge area and a second central splicing edge area, the first central splicing edge area and the second central splicing edge area being respectively located on opposite sides of the main graphic area in a first direction, the graphics on the first central splicing edge area and the second central splicing edge area being configured to be spliced ​​at a predetermined position to jointly form a target pattern, the first central splicing edge area having a plurality of first intervals and a plurality of first pixel units, the first intervals and the first pixel units being arranged alternately, and the second central splicing edge area having A plurality of second intervals and a plurality of second pixel units, the second intervals and the second pixel units are arranged alternately, the positions of the first intervals correspond one-to-one to the positions of the second pixel units, and the positions of the second intervals correspond one-to-one to the positions of the first pixel units; providing a substrate, the substrate including a central area; dividing the central area into a plurality of first rectangular areas of the same size according to the size of the central graphic module, the plurality of first rectangular areas being arranged along the first direction; using the stitching mask to perform stitching exposure, including: using the central graphic module to sequentially expose the plurality of first rectangular areas, one first rectangular area corresponding to one first exposure area, and an overlapping exposure area between two adjacent first exposure areas, so that the pattern of the second central stitching edge area in the previous exposure and the pattern of the first stitching edge area in the subsequent exposure are stitched together into the target pattern on the substrate.

[0014] Optionally, the central graphic module also includes: a third central stitching edge area and a fourth central stitching edge area, a total of two pairs of central stitching edge areas that cooperate with each other, the third central stitching edge area and the fourth central stitching edge area are located on both sides of the main graphic area in the second direction, and the graphics thereon are configured to be stitched at a predetermined position to jointly form the target pattern, the first direction and the second direction are perpendicular to each other; a number of the first rectangular areas are also arranged along the second direction; the use of the stitching mask for stitching exposure also includes: stitching the graphics of the fourth central stitching edge area in the previous exposure and the graphics of the third stitching edge area in the subsequent exposure into the target pattern on the substrate.

[0015] Optionally, the central graphic module also includes: four central stitching corner areas located at the corners of the main graphic area and cooperating with each other, each of the central stitching corner areas being adjacent to a central stitching edge area on both sides, and the graphics on the four central stitching corner areas are configured to be stitched together at predetermined positions to jointly form the target pattern.

[0016] Optionally, several of the graphic modules further include: four side graphic modules, one side graphic module corresponds to one of the central splicing edge areas, each side graphic module includes a first side splicing edge area and a second side splicing edge area located on two opposite sides thereof, and a third side splicing edge area located on a third side thereof, the first side splicing edge area and the second side splicing edge area cooperate with each other, and the graphics thereon are configured to be spliced ​​at a predetermined position to jointly form the target pattern, and the graphics on the third side splicing edge area and the corresponding central splicing edge area are configured to be spliced ​​at a predetermined position to jointly form the target pattern; the substrate further includes: four side graphic modules located on both sides of the central area in the first direction and on both sides of the second direction, respectively. edge areas, one edge area corresponds to one edge graphic module; the splicing exposure method further includes: for each edge area, according to the size of the corresponding edge graphic module, dividing the edge area into a plurality of second rectangular areas of the same size, and the plurality of second rectangular areas are arranged along the first direction or the second direction; the use of the splicing mask for splicing exposure further includes: using the corresponding edge graphic module to sequentially expose the plurality of second rectangular areas, one second rectangular area corresponds to one second exposure area, and there is an overlapping exposure area between two adjacent second exposure areas, so that the pattern of the second edge splicing edge area in the previous exposure and the pattern of the first edge splicing edge area in the subsequent exposure are spliced ​​together into the target pattern on the substrate.

[0017] Optionally, several of the graphic modules further include: four corner graphic modules, each of the corner graphic modules having a first corner splicing edge area and a second corner splicing edge area respectively located on two adjacent sides thereof, one corner graphic module corresponds to two side graphic modules, and one side graphic module corresponds to two corner graphic modules, the first corner splicing edge area cooperates with the first side splicing edge area of ​​the corresponding side graphic module, and the graphics thereon are configured to be spliced ​​at a predetermined position to jointly form the target pattern, the second corner splicing edge area cooperates with the second side splicing edge area of ​​the corresponding other side graphic module, and the graphics thereon are configured to be spliced ​​at a predetermined position to jointly form the target pattern. The target pattern is formed at the same time; the substrate also includes: four corner areas respectively located at the four corners of the central area, each of the corner areas is adjacent to two side areas on both sides, and one corner area corresponds to one corner graphic module; the splicing exposure also includes: using the corresponding corner graphic modules to expose the four corner areas respectively to form a third exposure area in the corner area, and there is an overlapping area between the third exposure area and the adjacent second exposure area, so that the pattern of the first corner splicing edge area and the corresponding pattern of the first side splicing edge area are spliced ​​together into the target pattern on the substrate, and the pattern of the second corner splicing edge area and the corresponding second side splicing edge area are spliced ​​together into the target pattern on the substrate.

[0018] Optionally, the deviation accuracy is controlled to be ≤1 μm during the stitching exposure.

[0019] Compared with the existing technology, the technical solution of the embodiment of the present invention has the following beneficial effects:

[0020] In the splicing mask provided by the technical solution of the present invention, a color filter larger than the size of one mask can be formed by using the splicing mask for splicing exposure. Moreover, due to the overlapping exposure area at the splicing point of the two previous and next exposures, the pattern of the second central splicing edge area in the previous exposure and the pattern of the first splicing edge area in the next exposure can be spliced ​​together on the substrate to form the target pattern. Due to the relative misalignment of the pattern of the second central splicing edge area and the pattern of the first splicing edge area, the subtle differences in the splicing are dispersed, thereby reducing the visibility of the splicing seam at the design level. While forming a large-sized color filter, the adverse effects of the splicing seam formed by the splicing exposure can be reduced.

[0021] In the color filter splicing exposure method provided by the technical solution of the present invention, the splicing exposure method can be used to form a color filter larger than the size of one mask. Moreover, by having overlapping exposure areas at the splicing point between the two previous and next exposures, the pattern of the second central splicing edge area in the previous exposure and the pattern of the first splicing edge area in the next exposure can be spliced ​​together on the substrate to form the target pattern. Due to the relative misalignment of the pattern of the second central splicing edge area and the pattern of the first splicing edge area on the splicing mask, subtle differences in the splicing are dispersed, thereby reducing the visibility of the splicing seam at the design level. While forming a large-sized color filter, the adverse effects of the splicing seam formed by the splicing exposure can be reduced. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figures 1 to 3 1 is a schematic structural diagram of a splicing mask according to an embodiment of the present invention;

[0023] Figure 4 1 is a flow chart of a method for splicing and exposing color filters according to an embodiment of the present invention;

[0024] Figures 5 and 6 1 is a structural diagram of each step in a color filter splicing exposure method according to an embodiment of the present invention. DETAILED DESCRIPTION

[0025] It should be noted that the terms “surface” and “on” in this specification are used to describe relative positional relationships in space and are not limited to whether there is direct contact.

[0026] As described in the background art, the size of the color filter formed by the prior art cannot meet the increasing size requirements of liquid crystal products.

[0027] To address the above-mentioned problems, the present invention provides a method for splicing and exposing a spliced ​​mask and a color filter. Splicing exposure using a spliced ​​mask can form a color filter larger than the size of one mask. Furthermore, by providing overlapping exposure areas at the splicing point between the two exposures, the pattern of the second central splicing edge area in the previous exposure and the pattern of the first splicing edge area in the subsequent exposure can be spliced ​​together on the substrate to form the target pattern. Due to the relative misalignment of the pattern of the second central splicing edge area and the pattern of the first splicing edge area, subtle differences in the splicing are dispersed, thereby reducing the visibility of the splicing seam at the design level. This reduces the adverse effects of the splicing seam formed by the splicing exposure while forming a large-sized color filter.

[0028] In order to make the above-mentioned objects, features and beneficial effects of the present invention more obvious and easy to understand, specific embodiments of the present invention are described in detail below with reference to the accompanying drawings.

[0029] Figures 1 to 3 It is a structural schematic diagram of a splicing mask according to an embodiment of the present invention.

[0030] Please refer to Figures 1 to 3 , Figure 1 This is a schematic diagram of the top view of the splicing mask. Figure 2 for Figure 1 A magnified image of the central graphic module. Figure 3 It is used to illustrate that the target pattern is formed after the first central splicing edge area c1 and the second central splicing edge area c2 are spliced ​​together. The splicing mask 10 includes: a plurality of graphic modules separated from each other by a light-shielding tape M, the plurality of graphic modules include a central graphic module C, and the central graphic module C includes a main graphic area ( Figure 1 and Figure 2 The main graphic area is provided with a plurality of central stitching edge areas, the first central stitching edge area c1 and the second central stitching edge area c2 being adjacent to the main graphic area, wherein the first central stitching edge area c1 and the second central stitching edge area c2 are respectively located on opposite sides of the main graphic area in the first direction X. The graphics on the first central stitching edge area c1 and the second central stitching edge area c2 are configured to be stitched together at a predetermined position to jointly form a target pattern. The first central stitching edge area c1 has a plurality of first intervals I1 and a plurality of first pixel units I2, and the first intervals I1 and the first pixel units I2 are arranged alternately. The second central stitching edge area c2 has a plurality of second intervals II1 and a plurality of second pixel units II2, and the second intervals II1 and the second pixel units II2 are arranged alternately. The position of the first interval I1 corresponds one-to-one to the position of the second pixel unit II2, and the position of the second interval II1 corresponds one-to-one to the position of the first pixel unit I2.

[0031] At this point, the stitching exposure using the stitching mask 10 can form a color filter larger than the size of one mask, and the overlapping exposure area at the stitching point of the two previous and next exposures can make the pattern of the second central stitching edge area c2 in the previous exposure and the pattern of the first stitching edge area c1 in the next exposure be stitched together on the substrate to form the target pattern. Due to the relative misalignment of the pattern of the second central stitching edge area c2 and the pattern of the first stitching edge area c1, the subtle differences in the stitching are dispersed, thereby reducing the visibility of the stitching seam at the design level. While forming a large-sized color filter, the adverse effects of the stitching seam formed by the stitching exposure can be reduced.

[0032] In this embodiment, in the first central splicing edge region c1, a plurality of first pixel units I2 are arranged at intervals along the first direction X, and are also arranged at intervals along the second direction Y; in the second central splicing edge region c2, a plurality of second pixel units II2 are arranged at intervals along the first direction X, and are also arranged at intervals along the second direction Y.

[0033] In this embodiment, the central graphic module C further includes: a third central splicing edge region c3 and a fourth central splicing edge region c4, two pairs of cooperating central splicing edge regions. The third central splicing edge region c3 and the fourth central splicing edge region c4 are located on either side of the main graphic region in the second direction Y. The graphics thereon are configured to be spliced ​​at predetermined positions to form the target pattern. The first direction X and the second direction Y are mutually perpendicular. The two pairs of cooperating central splicing edge regions c1 to c4 enable splicing of graphics in the first direction X and the second direction Y.

[0034] In this embodiment, similar to the first central stitching edge area c1 and the second central stitching edge area c2, the third central stitching edge area c3 has a plurality of third intervals III1 and a plurality of third pixel units III2, and the third intervals III1 and the third pixel units III2 are arranged alternately. The fourth central stitching edge area c4 has a plurality of fourth intervals IV1 and a plurality of fourth pixel units IV2, and the fourth intervals IV1 and the fourth pixel units IV2 are arranged alternately. The position of the third interval III1 corresponds one-to-one to the position of the fourth pixel unit IV2, and the position of the fourth interval IV1 corresponds one-to-one to the position of the third pixel unit III2.

[0035] It should be noted that the first pixel unit I2, the second pixel unit II2, the third pixel unit III2, and the fourth pixel unit IV2 are respectively used to form one or more pixel patterns.

[0036] In another embodiment, the central graphic module may only include a main graphic area and a pair of mutually cooperating central splicing side areas adjacent to the main graphic area, for splicing graphics in the first direction.

[0037] In this embodiment, the central graphic module C further includes four central splicing corner regions n1-n4 located at the corners of the main graphic region and cooperating with each other. Each central splicing corner region is adjacent to a central splicing side region on both sides. The patterns on the four central splicing corner regions are configured to be spliced ​​together at predetermined positions to collectively form the target pattern. Here, similar to the first central splicing side region c1 and the second central splicing side region c2, the patterns in each central splicing corner region are incomplete compared to the target pattern. Only when the patterns in the four central splicing corner regions n1-n4 are spliced ​​together can a complete pattern, i.e., the target pattern, be formed. When spliced ​​together, the patterns in different central splicing corner regions are offset from each other.

[0038] It should be noted that the technical solution of the present invention is applicable to all color filter manufacturing processes, including any photolithography layer, such as the black matrix layer, RGB color resist layer, and so on. The target pattern described herein refers to the same pattern as the main pattern area. For example, in the black matrix layer manufacturing process, the main pattern area includes a plurality of opening patterns. The following description will use the black matrix layer manufacturing process as an example.

[0039] In this embodiment, the main graphic area includes a plurality of opening units (indicated by purple boxes) arranged in an array along the first direction X, and each of the opening units includes three opening patterns arranged along the first direction X. In the photolithography process for forming the black matrix layer, after exposure using the stitching mask, the opening patterns of the plurality of opening units are transferred to the substrate, thereby forming a plurality of opening units within the black matrix layer. Each opening unit includes three openings. Subsequently, three photolithography processes are performed to form a red photoresist layer, a green photoresist layer, and a blue photoresist layer within the three openings, respectively.

[0040] In this embodiment, several of the graphic modules further include: four side graphic modules Bi (i is 1 to 4), one side graphic module Bi corresponds to one central splicing edge area ci, each side graphic module Bi includes a first side splicing edge area bi1 and a second side splicing edge area bi2 located on two opposite sides thereof, and a third side splicing edge area bi3 located on a third side thereof, the first side splicing edge area bi1 and the second side splicing edge area bi2 cooperate with each other, and the graphics thereon are configured to be spliced ​​at a predetermined position to jointly form the target pattern, the graphics on the third side splicing edge area bi3 and the corresponding central splicing edge area ci are configured to be spliced ​​at a predetermined position to jointly form the target pattern.

[0041] Here, taking the edge graphic module B1 as an example, the edge graphic module B1 corresponds to the first central splicing edge area c1, and the graphics on the first edge splicing edge area b11 and the second edge splicing edge area b12 of the edge graphic module B1 are configured to be spliced ​​at a predetermined position, which can jointly form the target pattern, and its third edge splicing edge area b13 and the graphics on the first central splicing edge area c1 are configured to be spliced ​​at a predetermined position to jointly form the target pattern.

[0042] In this embodiment, several of the graphic modules further include: four corner graphic modules Aj (j is 1 to 4), each of the corner graphic modules Aj has a first corner splicing edge area aj1 and a second corner splicing edge area aj2 respectively located on two adjacent sides thereof, one corner graphic module Aj corresponds to two side graphic modules Bi, and one side graphic module Bi corresponds to two corner graphic modules Aj, the first corner splicing edge area aj1 cooperates with the first side splicing edge area bi1 of the corresponding side graphic module Bi, and the graphics thereon are configured to be spliced ​​at a predetermined position to jointly form the target pattern, the second corner splicing edge area aj2 cooperates with the second side splicing edge area bi2 of the corresponding other side graphic module Bi, and the graphics thereon are configured to be spliced ​​at a predetermined position to jointly form the target pattern.

[0043] Here, taking the corner graphic module A3 as an example, it has a first corner splicing edge area a31 and a second corner splicing edge area a32. The graphics on the first corner splicing edge area a31 and the first edge splicing edge area b11 of the side graphic module B1 are configured to be spliced ​​at a predetermined position to jointly form the target pattern. The second corner splicing edge area a32 and the graphics on the second edge splicing edge area b42 of another side graphic module B4 are configured to be spliced ​​at a predetermined position to jointly form the target pattern.

[0044] In this embodiment, the edge graphic module Bi also has two edge splicing corner areas (not shown in the figure) located at its corners, and the corner graphic module Aj also has two corner splicing corner areas (not shown in the figure) located at its corners. It is also necessary to set the pattern according to the overlapping area when the splicing mask is used for exposure. Please refer to the setting of the center splicing corner area for details, which will not be repeated here.

[0045] In this embodiment, the arrangement of the stitching mask is as follows: the central graphic module C is located in the middle of the stitching mask, the four corner graphic modules A1-A4 are respectively located at the four corners of the stitching mask, and the four side graphic modules B1-B4 are located at the four sides of the stitching mask.

[0046] Here, the arrangement of the spliced ​​masks is beneficial to improving the utilization rate of the masks. In other embodiments, the arrangement of the spliced ​​masks may not be limited to this.

[0047] In this embodiment, the corner graphic modules A1-A4 have a first width L1 in the first direction X, and the central graphic module C has a second width L2 in the first direction X. The second width L2 is greater than or equal to twice the first width L1. The purpose of setting the second width L2 greater than or equal to twice the first width L1 is to reduce the number of splicing exposures.

[0048] In this embodiment, the corner graphic modules A1-A4 have a first length R1 in the second direction Y, and the central graphic module C has a second length R2 in the second direction Y. The second length R2 is greater than or equal to twice the first length R1. The purpose of setting the second length R2 greater than or equal to twice the first length R1 is to reduce the number of splicing exposures.

[0049] In this embodiment, the width h of the light-shielding band M between two adjacent graphic modules is greater than or equal to 2 mm. The purpose of setting the width h is to facilitate shielding of unnecessary graphic modules during exposure. For example, when using the central graphic module C for exposure, the remaining side graphic modules Bi and corner graphic modules Aj are shielded to prevent other unnecessary patterns from being transferred to the substrate.

[0050] Correspondingly, an embodiment of the present invention further provides a method for splicing exposure of a color filter, which uses the above-mentioned splicing mask to perform splicing exposure, which is described in detail below.

[0051] Figure 4 FIG. 4 is a flow chart of a color filter splicing exposure method according to an embodiment of the present invention.

[0052] Please refer to Figure 4 , the splicing exposure method comprises the following steps:

[0053] Step S101, providing a stitching mask, the stitching mask including a plurality of graphic modules separated from each other by light-shielding tapes, the plurality of graphic modules including a central graphic module, the central graphic module including a main graphic area and a pair of mutually cooperating central stitching edge areas adjacent to the main graphic area, comprising at least a first central stitching edge area and a second central stitching edge area, the first central stitching edge area and the second central stitching edge area being located on opposite sides of the main graphic area in a first direction, the graphics on the first central stitching edge area and the second central stitching edge area being configured to be stitched together at a predetermined position to jointly form a target pattern, the first central stitching edge area having a plurality of first intervals and a plurality of first pixel units, the first intervals and the first pixel units being arranged alternately, the second central stitching edge area having a plurality of second intervals and a plurality of second pixel units, the second intervals and the second pixel units being arranged alternately, the positions of the first intervals corresponding one-to-one to the positions of the second pixel units, and the positions of the second intervals corresponding one-to-one to the positions of the first pixel units;

[0054] Step S102, providing a substrate, wherein the substrate includes a central area;

[0055] Step S103: dividing the central area into a plurality of first rectangular areas of the same size according to the size of the central graphic module, wherein the plurality of first rectangular areas are arranged along the first direction;

[0056] Step S104, using the stitching mask to perform stitching exposure, the stitching exposure comprising: using the central graphic module to sequentially expose a plurality of the first rectangular areas, one first rectangular area corresponding to one first exposure area, and an overlapping exposure area between two adjacent first exposure areas, so that the pattern of the second central stitching edge area in the previous exposure and the pattern of the first stitching edge area in the subsequent exposure are stitched together into the target pattern on the substrate.

[0057] The following is a detailed description with reference to the accompanying drawings.

[0058] Figures 5 and 6 1 is a structural diagram of each step in a color filter splicing exposure method according to an embodiment of the present invention.

[0059] Please continue to refer to Figures 1 to 3 , execute step S101 to provide a splicing mask 10. Please refer to the above description for the structure of the splicing mask 10, which will not be repeated here.

[0060] Please refer to Figure 5 , and continue to refer to Figures 1 to 3 , executing step S102 , providing a substrate 20 , wherein the substrate includes a central area 21 .

[0061] In this embodiment, the substrate 20 further includes four side areas 31 - 34 respectively located on both sides of the central area 21 in the first direction X and on both sides of the second direction Y, and one side area corresponds to one side graphic module.

[0062] Specifically, the side area 31 corresponds to the side graphic module B1, the side area 32 corresponds to the graphic module B2, the side area 33 corresponds to the side graphic module B3, and the side area 34 corresponds to the graphic module B4.

[0063] In this embodiment, the substrate 20 further includes four corner areas 41 - 44 located at the four corners of the central area 21 , each corner area is adjacent to two side areas on both sides, and one corner area corresponds to one corner graphic module Aj.

[0064] Specifically, corner area 41 corresponds to corner graphic module A1, corner area 42 corresponds to corner graphic module A2, corner area 43 corresponds to corner graphic module A3, and corner area 44 corresponds to corner graphic module A4.

[0065] Please continue to refer to Figures 1 to 5 , executing step S103, dividing the central area 21 into a plurality of first rectangular areas cc of the same size according to the size of the central graphic module C, and the plurality of first rectangular areas cc are arranged along the first direction X.

[0066] It should be noted here that Figure 5 The number of the first rectangular areas cc is only for illustration. The number of the first rectangular areas cc is greater than or equal to 2 and can be adjusted according to actual needs.

[0067] In this embodiment, the substrate 20 is divided into grids to obtain a plurality of first rectangular areas cc in the central area 21 .

[0068] In this embodiment, a plurality of the first rectangular areas cc are further arranged along the second direction Y.

[0069] In this embodiment, each side area is further divided into a plurality of second rectangular areas bb of the same size according to the size of the corresponding side graphic module Bi, and the plurality of second rectangular areas bb are arranged along the first direction X or the second direction Y.

[0070] Specifically, taking the edge area 31 as an example, it is divided into a plurality of second matrix areas bb of the same size and arranged along the second direction Y according to the size of its corresponding edge graphic module B1.

[0071] Please refer to Figure 6 , and continue to refer to Figures 1 to 3, executing step S104, using the stitching mask 10 to perform stitching exposure, including: using the central pattern module C to sequentially expose a plurality of first rectangular areas cc, where each first rectangular area cc corresponds to a first exposure area, and there is an overlapping exposure area between two adjacent first exposure areas, so that the pattern of the second central stitching edge area c2 in the previous exposure and the pattern of the first stitching edge area c1 in the next exposure are stitched together on the substrate 20 to form the target pattern.

[0072] At this point, the above-mentioned stitching exposure method can be used to form a color filter larger than the size of one mask plate, and the overlapping exposure area at the stitching point of the two previous and next exposures can make the pattern of the second central stitching edge area c2 in the previous exposure and the pattern of the first stitching edge area c1 in the next exposure be stitched together on the substrate 20 to form the target pattern. Due to the relative staggered setting of the pattern of the second central stitching edge area c2 and the pattern of the first stitching edge area c1 on the stitching mask, the subtle differences in the stitching are dispersed, thereby reducing the visibility of the stitching seam at the design level. While forming a large-sized color filter, the adverse effects of the stitching seam formed by the stitching exposure can be reduced.

[0073] In this embodiment, the pattern of the fourth central stitching edge region c4 in the previous exposure and the pattern of the third stitching edge region c3 in the next exposure are also stitched together on the substrate 20 to form the target pattern. That is, the mask 10 is also used for stitching in the second direction Y to form a larger color filter. The number of pixel units in the color filter in the first direction X and the second direction Y can be adjusted according to actual needs.

[0074] In this embodiment, the corresponding edge graphic module Bi is also used to expose several second rectangular areas bb in sequence, one second rectangular area bb corresponds to one second exposure area, and there is an overlapping exposure area between two adjacent second exposure areas, so that the graphic of the second edge splicing area bi2 in the previous exposure and the graphic of the first edge splicing area bi1 in the subsequent exposure are spliced ​​into the target pattern on the substrate 20.

[0075] In this embodiment, the corresponding corner graphic module Aj is also used to expose the four corner areas A1 to A4 respectively to form a third exposure area in the corner area, and there is an overlapping area between the third exposure area and the adjacent second exposure area, so that the graphic of the first corner splicing edge area aj1 and the corresponding graphic of the first side splicing edge area bi1 are spliced ​​together on the substrate 20 to form the target pattern, and the graphic of the second corner splicing edge area aj2 and the corresponding second side splicing edge area bi2 are spliced ​​together on the substrate 20 to form the target pattern.

[0076] In this embodiment, the deviation accuracy is controlled to be ≤1 μm during the splicing exposure. Controlling the deviation accuracy to be ≤1 μm is beneficial for reducing splicing marks and making them less noticeable to the naked eye.

[0077] Although the present invention is disclosed as above, the present invention is not limited thereto. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention should be based on the scope defined by the claims.

Claims

1. A splicing mask, characterized in that: include: Several graphic modules are isolated from each other by shading tapes, and several of the graphic modules include a central graphic module, the central graphic module includes a main graphic area, and a pair of mutually cooperating central splicing edge areas adjacent to the main graphic area, including at least a first central splicing edge area and a second central splicing edge area, the first central splicing edge area and the second central splicing edge area are respectively located on opposite sides of the main graphic area in a first direction, the graphics on the first central splicing edge area and the second central splicing edge area are configured to be spliced ​​at a predetermined position to jointly form a target pattern, the first central splicing edge area has a plurality of first intervals and a plurality of first pixel units, the first intervals and the first pixel units are arranged alternately, the second central splicing edge area has a plurality of second intervals and a plurality of second pixel units, the second intervals and the second pixel units are arranged alternately, the position of the first interval corresponds one-to-one to the position of the second pixel unit, and the position of the second interval corresponds one-to-one to the position of the first pixel unit.

2. The splicing mask according to claim 1, wherein: The width of the light-shielding band between two adjacent graphic modules is greater than or equal to 2 mm.

3. The splicing mask according to claim 1, wherein: The central graphic module also includes: a third central splicing edge area and a fourth central splicing edge area, a total of two pairs of the central splicing edge areas that cooperate with each other, the third central splicing edge area and the fourth central splicing edge area are located on both sides of the main graphic area in the second direction, and the graphics thereon are configured to be spliced ​​at a predetermined position to jointly form the target pattern, and the first direction and the second direction are perpendicular to each other.

4. The splicing mask according to claim 3, wherein: The central graphic module also includes: four central splicing corner areas located at the corners of the main graphic area and cooperating with each other, each of the central splicing corner areas being adjacent to a central splicing edge area on both sides, and the graphics on the four central splicing corner areas are configured to be spliced ​​at predetermined positions to jointly form the target pattern.

5. The splicing mask according to claim 3, wherein: Several of the graphic modules also include: four side graphic modules, one side graphic module corresponds to one central splicing edge area, each side graphic module includes a first side splicing edge area and a second side splicing edge area located on two opposite sides thereof, and a third side splicing edge area located on a third side thereof, the first side splicing edge area and the second side splicing edge area cooperate with each other, and the graphics thereon are configured to be spliced ​​at a predetermined position to jointly form the target pattern, and the graphics on the third side splicing edge area and the corresponding central splicing edge area are configured to be spliced ​​at a predetermined position to jointly form the target pattern.

6. The splicing mask according to claim 5, wherein: Several of the graphic modules also include: four corner graphic modules, each of the corner graphic modules having a first corner splicing edge area and a second corner splicing edge area respectively located on two adjacent sides thereof, one corner graphic module corresponds to two side graphic modules, and one side graphic module corresponds to two corner graphic modules, the first corner splicing edge area cooperates with the first side splicing edge area of ​​the corresponding side graphic module, and the graphics thereon are configured to be spliced ​​at a predetermined position to jointly form the target pattern, the second corner splicing edge area cooperates with the second side splicing edge area of ​​the corresponding other side graphic module, and the graphics thereon are configured to be spliced ​​at a predetermined position to jointly form the target pattern.

7. The splicing mask according to claim 6, wherein: The corner graphic module has a first width in the first direction, and the central graphic module has a second width in the first direction, wherein the second width is greater than or equal to twice the first width; The corner graphic module has a first length in the second direction, and the central graphic module has a second length in the second direction, wherein the second length is greater than or equal to twice the first length.

8. A color filter splicing exposure method, characterized in that: include: A stitching mask is provided, the stitching mask comprising a plurality of graphic modules separated from each other by light-shielding tapes, the plurality of graphic modules comprising a central graphic module, the central graphic module comprising a main graphic region and a pair of mutually cooperating central stitching edge regions adjacent to the main graphic region, comprising at least a first central stitching edge region and a second central stitching edge region, the first central stitching edge region and the second central stitching edge region being located on opposite sides of the main graphic region in a first direction, the patterns on the first central stitching edge region and the second central stitching edge region being configured to be stitched together at a predetermined position to jointly form a target pattern, the first central stitching edge region having a plurality of first intervals and a plurality of first pixel units, the first intervals and the first pixel units being arranged alternately, the second central stitching edge region having a plurality of second intervals and a plurality of second pixel units, the second intervals and the second pixel units being arranged alternately, the positions of the first intervals corresponding one-to-one with the positions of the second pixel units, and the positions of the second intervals corresponding one-to-one with the positions of the first pixel units; providing a substrate, the substrate comprising a central region; Dividing the central area into a plurality of first rectangular areas of the same size according to the size of the central graphic module, wherein the plurality of first rectangular areas are arranged along the first direction; The stitching exposure is performed using the stitching mask, including: using the central graphic module to sequentially expose a plurality of the first rectangular areas, wherein one first rectangular area corresponds to one first exposure area, and there is an overlapping exposure area between two adjacent first exposure areas, so that the pattern of the second central stitching edge area in the previous exposure and the pattern of the first stitching edge area in the next exposure are stitched together into the target pattern on the substrate.

9. The color filter splicing exposure method according to claim 8, wherein: The central graphic module also includes: a third central stitching edge area and a fourth central stitching edge area, a total of two pairs of central stitching edge areas that cooperate with each other, the third central stitching edge area and the fourth central stitching edge area are located on both sides of the main graphic area in the second direction, and the graphics thereon are configured to be stitched together at a predetermined position to jointly form the target pattern, the first direction and the second direction are perpendicular to each other; a plurality of the first rectangular areas are also arranged along the second direction; the use of the stitching mask for stitching exposure also includes: stitching the graphics of the fourth central stitching edge area in the previous exposure and the graphics of the third stitching edge area in the subsequent exposure into the target pattern on the substrate.

10. The color filter splicing exposure method according to claim 9, wherein: The central graphic module also includes: four central splicing corner areas located at the corners of the main graphic area and cooperating with each other, each of the central splicing corner areas being adjacent to a central splicing edge area on both sides, and the graphics on the four central splicing corner areas are configured to be spliced ​​at predetermined positions to jointly form the target pattern.

11. The color filter splicing exposure method according to claim 9, wherein: Several of the graphic modules further include: four side graphic modules, one side graphic module corresponds to one of the central splicing edge areas, each side graphic module includes a first side splicing edge area and a second side splicing edge area located on two opposite sides thereof, and a third side splicing edge area located on a third side thereof, the first side splicing edge area and the second side splicing edge area cooperate with each other, and the graphics thereon are configured to be spliced ​​at a predetermined position to jointly form the target pattern, and the graphics on the third side splicing edge area and the corresponding central splicing edge area are configured to be spliced ​​at a predetermined position to jointly form the target pattern; the substrate further includes: four side splicing modules located on both sides of the central area in the first direction and on both sides of the second direction, respectively. area, one of the edge areas corresponds to one of the edge graphic modules; the splicing exposure method further includes: for each of the edge areas, according to the size of the corresponding edge graphic module, dividing the edge area into a plurality of second rectangular areas of the same size, and the plurality of second rectangular areas are arranged along the first direction or the second direction; the use of the splicing mask for splicing exposure further includes: using the corresponding edge graphic module to sequentially expose the plurality of second rectangular areas, one of the second rectangular areas corresponds to one second exposure area, and there is an overlapping exposure area between two adjacent second exposure areas, so that the pattern of the second edge splicing edge area in the previous exposure and the pattern of the first edge splicing edge area in the subsequent exposure are spliced ​​into the target pattern on the substrate.

12. The color filter splicing exposure method according to claim 11, wherein: Several of the graphic modules further include: four corner graphic modules, each of the corner graphic modules having a first corner splicing edge area and a second corner splicing edge area respectively located on two adjacent sides thereof, one corner graphic module corresponds to two side graphic modules, and one side graphic module corresponds to two corner graphic modules, the first corner splicing edge area cooperates with the first side splicing edge area of ​​the corresponding side graphic module, and the graphics thereon are configured to be spliced ​​at a predetermined position to jointly form the target pattern, the second corner splicing edge area cooperates with the second side splicing edge area of ​​the corresponding other side graphic module, and the graphics thereon are configured to be spliced ​​at a predetermined position to jointly form the target pattern. into the target pattern; the substrate also includes: four corner areas respectively located at the four corners of the central area, each of the corner areas is adjacent to two side areas on both sides, and one corner area corresponds to one corner graphic module; the splicing exposure also includes: using the corresponding corner graphic modules to expose the four corner areas respectively to form a third exposure area in the corner area, and there is an overlapping area between the third exposure area and the adjacent second exposure area, so that the pattern of the first corner splicing edge area and the corresponding pattern of the first side splicing edge area are spliced ​​into the target pattern on the substrate, and the pattern of the second corner splicing edge area and the corresponding second side splicing edge area are spliced ​​into the target pattern on the substrate.

13. The color filter splicing exposure method according to claim 8, wherein: The deviation accuracy is controlled to be ≤1 μm in the splicing exposure.

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