Optoelectronic system azimuth pitching calibration method based on observation of multi-point targets

Abstract

The invention discloses a photoelectric system azimuth pitching calibration method based on observation of a multi-point target. The method can be applied to the fields of unmanned aerial vehicle low-altitude monitoring, security control and the like. The method comprises the following steps: setting a calibration point; collecting calibration point parameters and obtaining photoelectric correction parameters; and according to the longitude and latitude height of the target and the longitude and latitude height of the photoelectricity, utilizing the calibration parameters to guide and control the photoelectricity. The method can effectively calibrate the azimuth angle and pitch angle errors of the photoelectric system base due to the fact that the mounting surface is not horizontal, and the operation method is simple and clear. The calibration result can be used for control and correction of any orientation and pitch angle of the photoelectric system.

Description

Technical Field

[0001] The present invention discloses a method for calibrating the azimuth and elevation of an optoelectronic system based on observing multiple targets. The invention can be applied to fields such as low-altitude surveillance and security control of unmanned aerial vehicles (UAVs). Background Art

[0002] Optoelectronic target tracking requires high precision and high data rates, as well as the ability to acquire target image information. Target-guided optoelectronic systems are commonly used to capture targets (i.e., using the target's absolute position detected by other detection methods, along with the optoelectronic mounting position and attitude, to calculate the optoelectronic system's control parameters, thereby controlling the optoelectronic system's rotation and capturing the target). However, in actual deployment, due to deviations between the optoelectronic system's azimuth and pitch zero points and the target's true azimuth and pitch zero points, installation errors, and foundation settlement, the optoelectronic base is not completely level. When using target-guided optoelectronics, the optoelectronic azimuth and pitch angles can deviate from the target's true azimuth and pitch zero points, potentially preventing the target from entering the optical field of view. Calibration of the optoelectronic system's azimuth and pitch zero point errors by observing a single point target cannot eliminate the azimuth and pitch errors caused by the tilt of the optoelectronic mounting plane. In summary, to ensure that the optoelectronic system can more accurately capture targets when the mounting plane is tilted, a more systematic and accurate calibration of the optoelectronic system's azimuth and pitch angles is required. Summary of the Invention

[0003] The present invention provides an azimuth and pitch calibration method for an optoelectronic system based on observing multi-point targets, which is used to solve the problem that the optoelectronic base cannot be adjusted to a completely horizontal state. The azimuth and pitch calibration method of the optoelectronic system is performed, and the deviation between the azimuth and pitch zero points and the coordinate azimuth and pitch zero points, installation errors, and errors caused by foundation settlement that result in the optoelectronic base not being completely horizontal are eliminated, thereby achieving more precise guidance and control of the optoelectronic system.

[0004] The technical solution adopted in the present invention is:

[0005] A method for calibrating the azimuth and elevation of an optoelectronic system based on observing multiple target locations comprises the following steps:

[0006] (1) Set the calibration point. The specific process is as follows:

[0007] With the photoelectric sensor as the origin, obtain at least three calibration points in a clockwise direction at a set distance and in line of sight with the photoelectric sensor. The clockwise angle from the first calibration point to the last calibration point should be greater than 180°.

[0008] (2) Obtaining photoelectric calibration parameters. The specific process is as follows:

[0009] (201) Collect calibration point parameters for each calibration point in turn: collect the latitude and longitude of the calibration point respectively, and magnify the optical television field to a set magnification, rotate the photoelectric device to point the center of the field of view to the calibration point, and record the azimuth and pitch angle of the photoelectric observation calibration point at this time;

[0010] (202) Calculation of photoelectric calibration parameters: Based on the latitude and longitude of the calibration point and the azimuth and pitch angles of the photoelectric observation calibration point, a pose deviation estimation method of the photoelectric sensing device based on particle swarm optimization is used to calculate the photoelectric calibration parameters, namely the azimuth, roll and pitch angles of the photoelectric plane.

[0011] (3) Use the photoelectric calibration parameters to guide and control the photoelectric. The specific process is as follows:

[0012] (301) Obtaining the azimuth and elevation angles of the target relative to the photoelectric device: Calculating the azimuth and elevation angles of the target relative to the photoelectric device based on the latitude and longitude of the target and the latitude and longitude of the photoelectric device;

[0013] (302) Calculating the correct control parameters: Based on the azimuth and elevation angles of the target relative to the optoelectronics and the optoelectronic calibration parameters calculated in step (2), a pose deviation estimation method of the optoelectronic sensing device based on particle swarm optimization is used to calculate the azimuth and elevation angles of the optoelectronic observation target, thereby inferring the control parameters of the guiding optoelectronics.

[0014] The beneficial effects of the present invention compared to the prior art are:

[0015] (1) The present invention can effectively calibrate the azimuth and elevation errors of the optoelectronic system base caused by the non-level installation surface, and the operation method is simple and clear.

[0016] (2) The calibration results of the present invention can be used for control correction of any azimuth and elevation angle of the optoelectronic system. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 Schematic diagram of setting calibration points according to an embodiment of the present invention.

[0018] Figure 2 This is a flow chart of calculating optoelectronic calibration parameters and control parameters according to an embodiment of the present invention. DETAILED DESCRIPTION

[0019] The following is combined with Figure 1-2 The present invention will be further described.

[0020] A method for azimuth and elevation calibration of an optoelectronic system based on observing multiple target points, such as Figure 2 As shown, it specifically includes the following steps:

[0021] (1) Set the calibration point. The specific process is as follows:

[0022] like Figure 1 As shown, with the photoelectric device as the center O, select N (N≥3) points A, B, C...N in a clockwise direction at an appropriate distance from the center and in line of sight with the photoelectric device as calibration points, where ∠AON should be greater than 180°.

[0023] (2) Obtaining photoelectric calibration parameters. The specific process is as follows:

[0024] (201) Collect calibration point parameters: obtain the latitude and longitude of calibration points A, B, C...N and convert them into the northeast celestial coordinate matrix m1 relative to the photoelectric center O, and magnify the optical television field to a suitable magnification, then rotate the photoelectric field to point the center of the field of view to the calibration points A, B, C...N respectively, and record the azimuth and elevation matrix m2 of the photoelectric observation calibration points A, B, C...N at this time;

[0025] (202) Calculation of photoelectric calibration parameters: Based on the parameter matrix m1 and matrix m2 of calibration points A, B, C...N, a pose deviation estimation method of photoelectric sensing equipment based on particle swarm optimization is used to calculate the photoelectric calibration parameters, that is, the azimuth angle θ of the plane where the photoelectric is located. x , pitch angle θ y and roll angle θ z .

[0026] (3) Use the photoelectric calibration parameters to guide and control the photoelectric. The specific process is as follows:

[0027] (301) Obtaining the azimuth and elevation angles of the target relative to the photoelectric device: Calculating the azimuth angle α1 and the elevation angle β1 of the target relative to the photoelectric device based on the latitude and longitude of the target {lon1, lat1, alt1} and the latitude and longitude of the photoelectric device {lon2, lat2, alt2};

[0028] (302) Obtain accurate control parameters: Based on the azimuth angle α1 and pitch angle β1 of the target relative to the optoelectronics and the optoelectronic calibration parameters calculated in step (2), that is, the azimuth angle θ of the plane where the optoelectronics is located x , pitch angle θ y and roll angle θ z , a pose deviation estimation method of optoelectronic sensing equipment based on particle swarm optimization is adopted to calculate the azimuth angle α and pitch angle β of the optoelectronic observation target, thereby inferring the control parameters of the guiding optoelectronics.

Claims

1. A method for calibrating the azimuth and elevation of an optoelectronic system based on observing multiple targets, characterized in that: The following steps are involved: (1) Set the calibration point. The specific process is as follows: With the photoelectric sensor as the origin, obtain at least three calibration points in a clockwise direction at a set distance and in line of sight with the photoelectric sensor. The clockwise angle from the first calibration point to the last calibration point should be greater than 180°. (2) Obtaining photoelectric calibration parameters. The specific process is as follows: (201) Collect calibration point parameters for each calibration point in turn: collect the latitude and longitude of the calibration point respectively, and magnify the optical television field to a set magnification, rotate the photoelectric device to point the center of the field of view to the calibration point, and record the azimuth and pitch angle of the photoelectric observation calibration point at this time; (202) Calculation of photoelectric calibration parameters: Based on the latitude and longitude of the calibration point and the azimuth and pitch angles of the photoelectric observation calibration point, a pose deviation estimation method of the photoelectric sensing device based on particle swarm optimization is used to calculate the photoelectric calibration parameters, namely the azimuth, roll and pitch angles of the photoelectric plane. (3) Use the photoelectric calibration parameters to guide and control the photoelectric. The specific process is as follows: (301) Obtaining the azimuth and elevation angles of the target relative to the photoelectric device: Calculating the azimuth and elevation angles of the target relative to the photoelectric device based on the latitude and longitude of the target and the latitude and longitude of the photoelectric device; (302) Calculating the correct control parameters: Based on the azimuth and elevation angles of the target relative to the optoelectronics and the optoelectronic calibration parameters calculated in step (2), a pose deviation estimation method of the optoelectronic sensing device based on particle swarm optimization is used to calculate the azimuth and elevation angles of the optoelectronic observation target, thereby inferring the control parameters of the guiding optoelectronics.

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