Substrate processing apparatus and substrate processing method

Abstract

The invention relates to a substrate processing apparatus and a substrate processing method. Provided is a technique capable of improving the separation efficiency of a separation membrane. This substrate processing apparatus (100) is provided with: a recovery tank (60) for storing a mixed fluid containing water that is supplied to a substrate (W) and then recovered, and an organic solvent that is supplied to the substrate (W) and then recovered; a circulation pipe (62) connected to the recovery tank (60); a dehydrator (621) which is provided in the circulation pipe (62) and which is provided with a separation membrane (51) that permits the passage of water and does not permit the passage of the organic solvent; a pump (622) provided to the circulation pipe (62); and a heater (624) which is provided on the downstream side of the recovery tank (60) and on the upstream side of the dehydrator (621) in the circulation pipe (62), and which heats the mixed fluid to a boiling point or higher of the water.

Description

Technical Field

[0001] The present invention relates to a substrate processing device and a substrate processing method. Background Art

[0002] In a substrate processing device used in the manufacturing process of semiconductor devices, for example, after treating the substrate with a chemical solution, it is cleaned with a rinse liquid. In Patent Document 1, isopropyl alcohol (IPA: Isopropyl Alcohol) is supplied to a substrate that has been cleaned with a rinse liquid (i.e., a substrate covered with a rinse liquid (typically water)), and the rinse liquid on the substrate is replaced with IPA. Then, the substrate is rotated at high speed to blow off the IPA attached to the substrate, thereby drying the substrate. When the substrate is rotated at high speed to blow off the attached liquid, the surface tension of the attached liquid may cause the pattern to collapse, but by pre-displacing the water attached to the substrate with IPA having a smaller surface tension than water, the pattern collapse can be suppressed. In addition, since IPA is bipolar, it can be wetted even if the surface of the substrate is hydrophobic. Therefore, water marks are not easily generated on the dried substrate.

[0003] [Background Art Literature]

[0004] [Patent Document]

[0005] [Patent Document 1] Japanese Patent Application Laid-Open No. 2017-41505 Summary of the Invention

[0006] [Problems to be solved by the invention]

[0007] Patent Document 1 describes the recovery of IPA supplied to a substrate. Because IPA is supplied to a substrate covered in water, the recovered IPA is diluted with water (i.e., the IPA is recovered as a mixed liquid with water). Therefore, in order to reuse the recovered IPA, it is necessary to separate the water from the mixed liquid.

[0008] When separating water from a mixture of an organic solvent such as IPA and water, for example, a separation membrane can be used through which water molecules can pass but organic solvent molecules cannot. In order to shorten the time required for water separation, it is necessary to improve the separation efficiency of the separation membrane.

[0009] Therefore, an object of the present invention is to provide a technology capable of improving the separation efficiency of a separation membrane.

[0010] [Technical means to solve the problem]

[0011] The first form is a substrate processing device, comprising: a rinsing liquid supply unit, which supplies a rinsing liquid containing water to a substrate; an organic solvent supply unit, which supplies an organic solvent to the substrate; a recovery tank, which stores a mixed fluid, wherein the mixed fluid includes the water supplied to the substrate and then recovered, and the organic solvent supplied to the substrate and then recovered; a circulation piping, which is connected to the recovery tank; a dehydrator, which is arranged in the circulation piping and has a separation membrane that allows the water to pass through but does not allow the organic solvent to pass through; a pump, which is arranged in the circulation piping; and a heater, which is arranged in the circulation piping on the downstream side of the recovery tank and the upstream side of the dehydrator, and heats the mixed fluid to above the boiling point of the water.

[0012] A second aspect is the substrate processing apparatus according to the first aspect, further comprising a cooler provided on a downstream side of the dehydrator and an upstream side of the recovery tank in the circulation pipe.

[0013] A third aspect is the substrate processing apparatus according to the second aspect, wherein the cooler cools the mixed fluid to a temperature lower than a boiling point of the organic solvent and higher than room temperature.

[0014] The fourth form is a substrate processing device according to the second or third form, wherein the pressure resistance of the piping portion in the circulation piping that is downstream of the cooler and upstream of the heater is lower than the pressure resistance of the piping portion in the circulation piping that is downstream of the heater and upstream of the cooler.

[0015] A fifth aspect is the substrate processing apparatus according to any one of the second to fourth aspects, further comprising a pressure reducer provided in the circulation pipe for reducing the pressure of the mixed fluid after being cooled by the cooler.

[0016] The sixth form is a substrate processing device according to any one of the first to fifth forms, comprising: a purification tank connected to the recovery tank via a liquid supply pipe, storing a concentrated fluid obtained by separating the water from the mixed fluid; and a filter provided in the pipe connected to the purification tank, capturing the removal target substance contained in the concentrated fluid flowing through the pipe.

[0017] A seventh aspect is the substrate processing apparatus according to the sixth aspect, wherein the concentrated fluid stored in the purge tank passes through the filter, is transported to the organic solvent supply unit, and is then supplied to the substrate.

[0018] An eighth aspect is the substrate processing apparatus according to any one of the first to seventh aspects, wherein the circulation pipe includes a plurality of branch portions provided between a branch position and a merging position, and the recovery tank is provided in each of the plurality of branch portions.

[0019] The 9th form is a substrate processing device according to any one of the 1st to 8th forms, wherein the dehydrator is arranged in a posture where the channel extends in the vertical direction, the channel becomes the flow path of the mixed fluid in the separation membrane, and the mixed fluid flowing through the circulation piping flows in from the opening on the vertical lower side of the channel.

[0020] A tenth aspect is the substrate processing apparatus according to the ninth aspect, wherein the dehydrator and the heater are arranged in a vertical direction.

[0021] The 11th form is a substrate processing method, comprising: a rinsing liquid supplying process, supplying a rinsing liquid containing water to a substrate; an organic solvent supplying process, supplying an organic solvent to the substrate; a storage process, storing a mixed fluid in a recovery tank, the mixed fluid containing the water supplied to the substrate and then recovered, and the organic solvent supplied to the substrate and then recovered; a circulation process, circulating the mixed fluid stored in the recovery tank in a circulation piping connected to the recovery tank; a heating process, heating the mixed fluid to above the boiling point of the water using a heater provided in the circulation piping; and a separation process, allowing the heated mixed fluid to flow into a dehydrator to separate the water from the mixed fluid, the dehydrator being provided on the downstream side of the heater in the circulation piping and the upstream side of the recovery tank, and having a separation membrane that allows the water to pass through but does not allow the organic solvent to pass through.

[0022] [Effects of the Invention]

[0023] According to each of the first and eleventh aspects, water contained in the mixed fluid can be allowed to flow into the dehydrator in a vapor state, thereby improving the separation efficiency of the separation membrane.

[0024] According to the second aspect, the pressure of the mixed fluid can be reduced by cooling the heated mixed fluid by the cooler.

[0025] According to the third aspect, the organic solvent contained in the mixed fluid returns from a vapor state to a liquid state by being cooled by the cooler, thereby enabling the pressure of the mixed fluid to be sufficiently reduced. Meanwhile, the cooler only cools the mixed fluid to a temperature higher than room temperature, thereby reducing the load on both the heater and the cooler.

[0026] According to the fourth form, the pressure resistance of a part of the circulation piping (the piping part downstream of the cooler and upstream of the heater) is lower than the pressure resistance of other parts of the circulation piping (the piping part downstream of the heater and upstream of the cooler), so the device can be miniaturized compared to the case where the circulation piping as a whole has a relatively high pressure resistance.

[0027] According to the fifth aspect, the pressure of the mixed fluid reduced by the cooler can be further reduced by the pressure reducer.

[0028] According to the sixth aspect, the removal target substance can be removed from the concentrated fluid obtained by separating water from the mixed fluid, thereby improving the cleanliness of the concentrated fluid.

[0029] According to the seventh aspect, the concentrated fluid obtained by separating water from a mixed fluid containing water supplied to a substrate and then recovered, and an organic solvent supplied to a substrate and then recovered, is resupplied to the substrate after its cleanliness is improved. This reduces the amount of organic solvent used and discharged.

[0030] According to the eighth aspect, a plurality of recovery tanks are provided in the circulation piping. Therefore, by switching the recovery tank as the liquid delivery destination, water supplied to the substrate and then recovered and the organic solvent supplied to the substrate and then recovered can be delivered without interruption.

[0031] According to the ninth aspect, the mixed fluid flowing from the circulation pipe into the cell flows from bottom to top within the vertically extending cell. Therefore, the mixed fluid flowing into the cell remains fully within the cell and comes into contact with the separation membrane. This further improves separation efficiency.

[0032] According to the tenth aspect, the heat loss of the mixed fluid heated by the heater before flowing into the dehydrator is reduced, thereby reducing the load on the heater. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] Figure 1 It is a plan view schematically showing a configuration example of a substrate processing apparatus.

[0034] Figure 2 It is a side view schematically showing a configuration example of a processing unit.

[0035] Figure 3 It is a diagram schematically showing a configuration example of an organic solvent recovery unit.

[0036] Figure 4 It is a side sectional view schematically showing a configuration example of a dehydrator.

[0037] Figure 5 This is a diagram showing an example of the flow of processing performed in the organic solvent recovery section.

[0038] Figure 6 This is a diagram showing an example of a process flow for separating water from a mixed fluid.

[0039] Figure 7 It is a diagram for explaining step S1.

[0040] Figure 8 It is a diagram for explaining step S201.

[0041] Figure 9 It is a diagram for explaining step S203.

[0042] Figure 10 It is a diagram for explaining step S207.

[0043] Figure 11 It is a diagram for explaining step S3.

[0044] Figure 12 It is a diagram for explaining step S4.

[0045] Figure 13 It is a diagram schematically showing a configuration example of an organic solvent recovery unit according to a modification. DETAILED DESCRIPTION

[0046] The following describes an embodiment with reference to the accompanying drawings. The components described in this embodiment are for illustrative purposes only and are not intended to limit the scope of the present invention. The drawings are schematic and, for ease of description, may include omissions of components, exaggerations or simplifications of dimensions, exaggerations or simplifications of numbers, and simplifications of configurations. Furthermore, the positional relationships of the components shown in the drawings are not necessarily accurate representations.

[0047] Expressions expressing relative or absolute positional relationships (for example, "in a direction," "along a direction," "parallel," "orthogonal," "center," "concentric," "coaxial," etc.), unless otherwise specified, not only strictly express the positional relationship, but also include states in which the angle or distance is relatively displaced within a tolerance or a range that can achieve equivalent functions. Expressions expressing equal states (for example, "same," "equal," "homogeneous," etc.), unless otherwise specified, not only strictly express equal states quantitatively, but also include states in which there is a tolerance or a difference that can achieve equivalent functions. Expressions expressing shapes (for example, "circular," "elliptical," "quadrilateral," "cylindrical," etc.), unless otherwise specified, not only strictly express the shapes geometrically, but also include shapes within a range that can achieve equivalent effects, such as shapes with concave-convex corners or chamfers. Expressions such as "equipped," "equipped with," "including," and "having" constituent elements are not exclusive expressions that exclude the presence of other constituent elements. The expression "at least one of A, B, and C" includes "only A," "only B," "only C," "any two of A, B, and C," and "all of A, B, and C." When ordinal numbers such as "first" or "second" are used, these terms are used as appropriate to facilitate understanding of the content of the embodiments and are not intended to limit the order in which these ordinal numbers may occur.

[0048] <1. Substrate Processing Apparatus>

[0049] Reference Figure 1 A substrate processing apparatus 100 according to the embodiment will be described. Figure 1 It is a plan view schematically showing a configuration example of the substrate processing apparatus 100 .

[0050] The substrate processing apparatus 100 is a so-called single-wafer processing apparatus that processes target substrates W one by one. The target substrates W of the substrate processing apparatus 100 are, for example, semiconductor substrates. The target substrates W are, for example, disk-shaped.

[0051] The substrate processing apparatus 100 includes a load port 1 , a transfer robot 2 , a main transport robot 3 , a processing unit 4 , an organic solvent recovery unit 5 , and a control unit 6 .

[0052] The loading port 1 is an interface for taking and placing a substrate W from a carrier C, which is a storage container for accommodating multiple substrates W. For example, there are multiple loading ports 1 (3 in the example shown in the figure). The multiple loading ports 1 are arranged in a row in the horizontal direction, for example. The carrier C can be a type that stores the substrate W in a confined space (for example, a FOUP (FrontOpening Unified Pod), a SMIF (Standard Mechanical Interface) wafer box, etc.), or a type that exposes the substrate W to the external atmosphere (for example, an OC (OpenCassette, open wafer box) etc.).

[0053] The transfer robot 2 is a transport device that transports substrates W. As an example, the transfer robot 2 is a horizontal multi-joint robot having a pair of hands 21, 21 for holding the substrate W and an arm 22 connected to each hand 21. In addition, the transfer robot 2 has a drive mechanism (not shown) for rotating each hand 21 and flexing, extending, rotating, and raising and lowering each arm 22. The transfer robot 2 transports substrates W between the carrier C placed on the loading port 1 and the main transport robot 3. That is, the transfer robot 2 moves in and out of the carrier C placed on the loading port 1, performing a carry-out action (i.e., the action of taking out the substrate W contained in the carrier C through the hand 21) and a carry-in action (i.e., the action of placing the substrate W held by the hand 21 into the carrier C). In addition, the transfer robot 2 moves in and out of the handover position to transfer substrates W to and from the main transport robot 3.

[0054] The main transfer robot 3 is a transfer device that transfers the substrate W. As an example, the main transfer robot 3 is a horizontal multi-joint robot, which includes a pair of hands 31, 31 for holding the substrate W and an arm 32 connected to each hand 31. In addition, the main transfer robot 3 includes a drive mechanism (not shown) for rotating each hand 31 and flexing, extending, rotating, and lifting each arm 32. The main transfer robot 3 transfers the substrate W between the transfer robot 2 and each processing unit 4. That is, the main transfer robot 3 moves in and out of the handover position to transfer the substrate W to and from the transfer robot 2. In addition, the main transfer robot 3 moves in and out of the processing unit 4 to perform a carry-in action (that is, the action of carrying the substrate W held by the hand 31 into the processing unit 4) and a carry-out action (that is, the action of carrying the substrate W in the processing unit 4 by the hand 31).

[0055] The processing unit 4 performs a predetermined process on the substrate W using a processing liquid (e.g., a chemical solution, a rinse liquid, and an organic solvent). Here, for example, a plurality (e.g., three) of processing units 4 stacked vertically form a tower, and multiple (four in the illustrated example) towers are provided to surround the main transfer robot 3. The specific structure of the processing unit 4 will be described below.

[0056] The organic solvent recovery unit 5 recovers the organic solvent used for treatment in the treatment units 4 and supplies it back to the treatment units 4. For example, the number of organic solvent recovery units 5 is equal to the number of towers. Each organic solvent recovery unit 5 corresponds to a tower, recovering the organic solvent used for treatment in each treatment unit 4 contained in the corresponding tower and supplying it back to each treatment unit 4. The specific structure of the organic solvent recovery unit 5 will be described below.

[0057] The control unit 6 controls the operation of each component of the substrate processing apparatus 100 (the load port 1, the transfer robot 2, the main transport robot 3, the processing unit 4, and the organic solvent recovery unit 5). The control unit 6 is composed of, for example, a conventional computer having electrical circuits. As an example, the control unit 6 includes a CPU (Central Processor Unit) that performs various computations (data processing), a ROM (Read Only Memory) that stores basic programs, etc., a RAM (Random Access Memory) that serves as a work area when the CPU performs designated processing (data processing), a storage device (specifically, a non-volatile storage device such as a flash memory or a hard disk drive), and a bus that interconnects these components. The storage device or RAM can store a program that specifies the processing performed by the control unit 6. In this case, for example, the CPU can execute the program, causing each component of the substrate processing apparatus 100 to be controlled by the control unit 6, thereby executing the processing specified by the program in the substrate processing apparatus 100. In other words, the CPU can execute the program to implement circuitry in the control unit 6 that executes the processing specified by the program. However, part or all of the control performed by the control unit 6 (part or all of the circuits implemented in the control unit 6) may be executed (implemented) by hardware such as a dedicated logic circuit.

[0058] <2. Processing Unit>

[0059] <2-1. Configuration of Processing Unit>

[0060] Reference Figure 2 The configuration of the processing unit 4 will be described. Figure 2 It is a side view schematically showing a configuration example of the processing unit 4 .

[0061] The processing unit 4 performs a predetermined process on the substrate W using a processing liquid (eg, a chemical solution, a rinse liquid, or an organic solvent). The processing unit 4 includes, for example, a spin chuck 41 , a cup 42 , and a nozzle 43 . The spin chuck 41 , cup 42 , and nozzle 43 are housed in a processing chamber 44 .

[0062] The rotating chuck 41 holds the substrate W in a horizontal position (a position in which the thickness direction of the substrate W is along the up-down direction (vertical direction)) while rotating the substrate W around an axis (rotation axis) A that passes through the center of its main surface and extends up and down. Specifically, the rotating chuck 41 includes, for example, a rotating base 411. The rotating base 411 is a disc-shaped component that is arranged in a position in which the thickness direction is along the up-down direction. A plurality of chuck pins 412 are provided on the upper surface of the rotating base 411. The plurality of chuck pins 412 are arranged at equal intervals along a circumference corresponding to the periphery of the substrate W. A link mechanism (not shown) is connected to the plurality of chuck pins 412 to move them between a contact position and a release position. The "contact position" refers to the position in which the chuck pins 412 contact the periphery of the substrate W. The "release position" refers to the position in which the chuck pins 412 leave the periphery of the substrate W. When each of the multiple chuck pins 412 is in the contact position, the substrate W is held (clamped) in a horizontal position above the spin base 411. When each of the multiple chuck pins 412 is in the release position, the substrate W is released from its grip. The linkage mechanism switches the position of the chuck pins 412 in accordance with instructions from the control unit 6. Specifically, the timing of holding and releasing the substrate W is controlled by the control unit 6. Furthermore, the spin base 411 is connected to a rotation motor 414 via a shaft 413 coaxial with the rotation axis A. The shaft 413 and the rotation motor 414 are housed in a protective cover 415. The rotation motor 414 rotates the shaft 413 about the rotation axis A. This causes the spin base 411, and thus the substrate W held thereon, to rotate about the rotation axis A. The rotation motor 414 rotates the spin base 411 in accordance with instructions from the control unit 6. That is, the rotation speed, rotation start time, rotation end time, etc. of the spin base 411 (and therefore the substrate W) are controlled by the control unit 6 .

[0063] The cup 42 receives the processing liquid discharged from the substrate W held and rotated by the spin chuck 41. Specifically, the cup 42 includes, for example, a cylindrical guide portion 421 coaxially arranged with the rotation axis A, an inclined portion 422 connected to the upper end of the guide portion 421 and tapering upward, and a liquid receiving portion 423 connected to the lower end of the guide portion 421 and forming an upwardly open annular groove. The liquid receiving portion 423 is provided with a cup-side recovery pipe for recovering the liquid received therein. For example, a cup-side recovery pipe (not shown) for a chemical solution and a cup-side recovery pipe 424 for an organic solvent are provided. Furthermore, a cup-lifting mechanism 425 is connected to the cup 42 to raise and lower the cup between a lower and upper positions. The "lower position" refers to a position in which the upper end of the cup 42 (specifically, the upper end of the inclined portion 422) is positioned below the substrate W held by the spin chuck 41. The "upper position" means that the upper end of the retainer 42 is positioned above the substrate W held by the spin chuck 41. The retainer elevating mechanism 425 elevates the retainer 42 in accordance with instructions from the control unit 6. In other words, the position of the retainer 42 is controlled by the control unit 6.

[0064] The nozzles 43 discharge a processing liquid onto the upper surface of the substrate W held by the spin chuck 41. Here, for example, nozzles 43 are provided according to the type of processing liquid. Specifically, there are provided nozzles 43 for discharging a chemical liquid (hereinafter also referred to as "chemical liquid nozzle 43a"), nozzles 43 for discharging a rinse liquid (hereinafter also referred to as "rinsing liquid nozzle 43b"), and nozzles 43 for discharging an organic solvent (hereinafter also referred to as "organic solvent nozzle 43c").

[0065] The chemical nozzle 43a sprays a chemical solution onto the upper surface of the substrate W held by the spin chuck 41. The chemical nozzle 43a is connected to a chemical supply source 433a via a chemical pipe 432a through which a chemical valve 431a is inserted. When the chemical valve 431a is opened, the chemical solution is supplied to the chemical nozzle 43a through the chemical pipe 432a, and then the chemical solution is sprayed from the chemical nozzle 43a. The chemical valve 431a opens and closes according to instructions from the control unit 6. In other words, the timing of spraying the chemical solution from the chemical nozzle 43a is controlled by the control unit 6. The chemical solution is, for example, hydrofluoric acid. However, the chemical solution is not limited to hydrofluoric acid and may also include at least one of sulfuric acid, acetic acid, nitric acid, hydrochloric acid, hydrofluoric acid, phosphoric acid, aqueous ammonia, aqueous hydrogen peroxide, an organic acid (e.g., citric acid, oxalic acid, etc.), an organic base (e.g., TMAH: tetramethylammonium hydroxide, etc.), a surfactant, and a preservative.

[0066] The rinsing liquid nozzle 43b sprays rinsing liquid onto the upper surface of the substrate W held by the spin chuck 41. That is, here, the rinsing liquid nozzle 43b functions as a rinsing liquid supply unit that supplies rinsing liquid to the substrate W. The rinsing liquid nozzle 43b is connected to a rinsing liquid supply source 433b via a rinsing liquid pipe 432b through which a rinsing liquid valve 431b is inserted. When the rinsing liquid valve 431b is opened, the rinsing liquid is supplied to the rinsing liquid nozzle 43b through the rinsing liquid pipe 432b, and then the rinsing liquid is sprayed from the rinsing liquid nozzle 43b. The rinsing liquid valve 431b opens and closes according to instructions from the control unit 6. That is, the spraying timing of the rinsing liquid from the rinsing liquid nozzle 43b is controlled by the control unit 6. Here, the rinsing liquid is water (specifically, for example, pure water (deionized water)).

[0067] The organic solvent nozzle 43c sprays an organic solvent onto the upper surface of the substrate W held by the spin chuck 41. Specifically, the organic solvent nozzle 43c functions as an organic solvent supply unit for supplying organic solvent to the substrate W. The organic solvent nozzle 43c is connected to the organic solvent recovery unit 5 via an organic solvent pipe 432c, which is interposed with an organic solvent valve 431c. When the organic solvent valve 431c is opened, an organic solvent (of sufficiently high purity, specifically, an organic solvent with a purity of 99 wt% or greater) is supplied to the organic solvent nozzle 43c through the organic solvent pipe 432c and then sprayed from the organic solvent nozzle 43c. The organic solvent valve 431c opens and closes in response to instructions from the control unit 6. Specifically, the timing of the spraying of the organic solvent from the organic solvent nozzle 43c is controlled by the control unit 6. The organic solvent is, for example, a water-soluble organic solvent. Here, the organic solvent is isopropyl alcohol (IPA).

[0068] Furthermore, a nozzle movement mechanism may be connected to at least one of the chemical liquid nozzle 43a, the rinse liquid nozzle 43b, and the organic solvent nozzle 43c to move the nozzle between a processing position and a retreat position. The "processing position" refers to the position where the processing liquid ejected from the nozzles 43a, 43b, and 43c is supplied to the substrate W held by the spin chuck 41. The "retreat position" refers to a position where the nozzles 43a, 43b, and 43c are located outside (radially outward) of the periphery of the substrate W held by the spin chuck 41 when viewed from above. In this case, the nozzle movement mechanism moves the nozzles 43a, 43b, and 43c in accordance with instructions from the control unit 6. In other words, the positions of the nozzles 43a, 43b, and 43c are controlled by the control unit 6.

[0069] <2-2. Operation of Processing Unit>

[0070] Continue to refer to Figure 2 An example of the operation of the processing unit 4 will be described.

[0071] The operations performed in the processing unit 4 are performed under the control of the control unit 6. Specifically, the control unit 6 controls the chuck pin 412, the rotary motor 414, the cup lifting mechanism 425, the chemical liquid valve 431a, the rinse liquid valve 431b, the organic solvent valve 431c, and the like, thereby executing a series of operations in the processing unit 4.

[0072] When the main transfer robot 3 carries the substrate W into the processing chamber 44 , the spin chuck 41 holds the substrate W. Then, the spin chuck 41 starts to rotate.

[0073] In this state, the chemical liquid valve 431a is opened. Then, the chemical liquid is ejected from the chemical liquid nozzle 43a toward the upper surface of the substrate W that is held and rotated by the spin chuck 41. As a result, the chemical liquid is supplied to the entire upper surface of the substrate W, and the substrate W is treated with the chemical liquid (chemical liquid supply process). For example, when hydrofluoric acid is used as the chemical liquid, foreign matter such as particles is removed from the substrate W by the chemical liquid. During the chemical liquid supply process, the cup 42 is arranged in the upper position. Therefore, the chemical liquid that flies around the substrate W is caught by the cup 42. That is, the chemical liquid that flies around the substrate W is caught by the inclined portion 422, and is guided downward by the guide portion 421, and is gathered in the liquid receiving portion 423. The chemical liquid caught by the cup 42 (i.e., the chemical liquid that is gathered in the liquid receiving portion 423) is recovered through the cup side recovery pipe (not shown) for the chemical liquid.

[0074] At a point in time after a specified time has passed since the start of spraying the chemical liquid, the chemical liquid valve 431a is closed. As a result, the chemical liquid stops being sprayed from the chemical liquid nozzle 43a. Next, the rinsing liquid valve 431b is opened. As a result, the rinsing liquid is sprayed from the rinsing liquid nozzle 43b toward the upper surface of the substrate W that is held and rotated by the spin chuck 41. As a result, the rinsing liquid is supplied to the entire upper surface of the substrate W, and the chemical liquid attached to the substrate W is washed away by the rinsing liquid (rinsing liquid supply process). During the rinsing liquid supply process, the cup 42 is also arranged in the upper position. Therefore, the chemical liquid and rinsing liquid scattered around the substrate W are caught by the cup 42. The chemical liquid and rinsing liquid caught by the cup 42 are recovered through the cup-side recovery pipe (not shown) for the chemical liquid.

[0075] At a point in time after a specified time has passed since the start of spraying of the rinsing liquid, the rinsing liquid valve 431b is closed. As a result, the rinsing liquid stops being sprayed from the rinsing liquid nozzle 43b. Next, the organic solvent valve 431c is opened. As a result, IPA is sprayed from the organic solvent nozzle 43c toward the upper surface of the substrate W that is held and rotated by the rotary chuck 41. As a result, IPA is supplied to the entire upper surface of the substrate W, and the rinsing liquid attached to the substrate W is replaced with IPA (organic solvent supply process). During the organic solvent supply process, the support cup 42 is also arranged in the upper position. Therefore, the rinsing liquid and IPA scattered around the substrate W are caught by the support cup 42. The rinsing liquid and IPA caught by the support cup 42 are recovered through the support cup side recovery pipe 424 for the organic solvent.

[0076] At a point in time after a specified time has passed since the start of IPA supply, the organic solvent valve 431c is closed. Then, IPA stops being ejected from the organic solvent nozzle 43c. At this stage, the rinsing liquid on the substrate W is completely replaced by IPA, forming a liquid film of IPA covering the entire upper surface of the substrate W. Next, the rotary chuck 41 starts to rotate at high speed. As a result, the substrate W rotates at high speed, and the IPA on the substrate W is thrown to the surroundings of the substrate W due to centrifugal force (spin drying process). During the period when the substrate W rotates at high speed, the support cup 42 is also arranged in the upper position. Therefore, the IPA scattered around the substrate W is caught by the support cup 42. The IPA caught by the support cup 42 is recovered through the support cup side recovery pipe 424 for the organic solvent.

[0077] When a predetermined time has passed since the spin chuck 41 started rotating at high speed, the spin chuck 41 stops rotating. At this stage, the IPA has been removed from the substrate W, and the substrate W has dried. The dried substrate W is then carried out of the processing chamber 44 by the main transfer robot 3 .

[0078] At this point, a series of processes for one substrate W is completed. In the processing unit 4 , the substrates W are processed one by one in sequence by repeatedly performing the series of operations.

[0079] <3. Organic Solvent Recovery Department>

[0080] <3-1. Structure>

[0081] Reference Figure 3 The structure of the organic solvent recovery unit 5 will be described. Figure 3 It is a diagram schematically showing a configuration example of the organic solvent recovery unit 5 .

[0082] The organic solvent recovery unit 5 includes a recovery tank 60, a purge tank 70, and a supply tank 80. As an example, the recovery tank 60 and the purge tank 70 are housed in a first storage box 50a, and the supply tank 80 is housed in a second storage box 50b. In addition, as an example, the first storage box 50a is arranged outside the outer wall 100a of the substrate processing apparatus 100 (for example, under the clean room (underground) where the substrate processing apparatus 100 is installed), and the second storage box 50b is arranged inside the outer wall 100a of the substrate processing apparatus 100 ( Figure 1 ).

[0083] (a) Recovery tank 60

[0084] Recovery tank 60 is connected to cup 42 via recovery pipe 61. Specifically, one end of recovery pipe 61 is connected to recovery tank 60, and the other end is connected to cup 42 (specifically, cup-side recovery pipe 424 connected to cup 42). For example, recovery pipe 61 is connected to cups 42 included in each of multiple processing units 4 belonging to the same tower. Recovery pipe 61 is provided with a recovery valve 611. When recovery valve 611 is open, the organic solvent (here, IPA) that has accumulated in cup 42 during the organic solvent supply and spin drying processes is guided through recovery pipe 61 into recovery tank 60 and stored there. However, IPA (of sufficiently high purity, specifically, 99 wt% or higher) is recovered during the spin drying process, while IPA is recovered mixed with a rinse solution (here, water) (i.e., diluted with water) during the organic solvent supply process. Therefore, the recovery tank 60 stores a mixed fluid containing water supplied to the substrate W in the processing unit 4 and then recovered, and IPA supplied to the substrate W in the processing unit 4 and then recovered.

[0085] A circulation pipe (dehydration circulation pipe) 62 is connected to the recovery tank 60. Specifically, one end and the other end of the dehydration circulation pipe 62 are both connected to the recovery tank 60. The dehydration circulation pipe 62 forms a circulation path that circulates the mixed fluid stored in the recovery tank 60 so that it flows out of the recovery tank 60 and returns to the recovery tank 60.

[0086] The dehydration circulation pipe 62 is provided with a dehydrator (separator) 621. The dehydrator 621 separates water from the mixed fluid flowing therein to perform dehydration. The structure of the dehydrator 621 will be described below.

[0087] The dehydration circulation piping 62 is provided with a pump (dehydration-side liquid-feeding pump) 622 and a pair of on-off valves 623a and 623b. As an example, the dehydration-side liquid-feeding pump 622 is provided on the downstream side of the recovery tank 60 and the upstream side of the dehydrator 621. In addition, one on-off valve 623a is provided on the upstream side of the recovery tank 60, and the other on-off valve 623b is provided on the downstream side of the recovery tank 60. The dehydration-side liquid-feeding pump 622 delivers the mixed fluid in the dehydration circulation piping 62 at the pressure required for circulation (circulation pressure). When the pair of on-off valves 623a and 623b are both open, the dehydration-side liquid-feeding pump 622 delivers the mixed fluid at the circulation pressure, thereby circulating the mixed fluid stored in the recovery tank 60 in the dehydration circulation piping 62.

[0088] A heater 624 is installed in the dehydration circulation piping 62. Heater 624 is located downstream of the recovery tank 60 and upstream of the dehydrator 621. In the illustrated example, heater 624 is located downstream of the dehydration-side liquid delivery pump 622. Heater 624 heats the mixed fluid to a specified temperature (heating temperature) T1. Here, heating temperature T1 is set to a temperature above the boiling point of water. In other words, heater 624 heats the mixed fluid to a temperature above the boiling point of water. The "boiling point of water" mentioned here strictly refers to the boiling point of water at the circulation pressure. However, because the circulation pressure is sufficiently low, the boiling point of water at the circulation pressure can be considered to be the same as the boiling point of water at atmospheric pressure (100°C). The specific configuration of heater 624 is arbitrary. As an example, heater 624 can be formed using a heater that covers the periphery of the piping to heat the fluid flowing therein (so-called jacket heater). If heater 624 is formed using a jacket heater, even if the pressure of the mixed fluid in the piping increases due to heating, it is unlikely to affect the operation of heater 624. Furthermore, when the heater 624 is formed using a jacket heater, it is provided so as to cover the periphery of a metal pipe having excellent thermal conductivity, for example, so that the mixed fluid in the pipe can be heated efficiently.

[0089] A cooler 625 is provided in the dehydration circulation pipe 62. The cooler 625 is provided on the downstream side of the dehydrator 621 and the upstream side of the recovery tank 60. The cooler 625 cools the mixed fluid to a specified temperature (cooling temperature) T2. Here, the cooling temperature T2 is set to a temperature lower than the boiling point of the organic solvent (IPA in this case). In other words, the cooler 625 cools the mixed fluid to a temperature lower than the boiling point of the organic solvent. The "boiling point of the organic solvent" mentioned here strictly refers to the boiling point of the organic solvent under the circulation pressure. However, as mentioned above, since the circulation pressure is small enough, the boiling point of the organic solvent under the circulation pressure can be regarded as the same as the boiling point of the organic solvent under atmospheric pressure (82.3°C in the case where the organic solvent is IPA). The specific structure of the cooler 625 can be arbitrary. As an example, the cooler 625 can also use a device (so-called heat exchanger) that circulates a cooling medium in a cooling pipe provided around the pipe to take away the heat of the fluid flowing through the pipe and cool it.

[0090] As described above, heater 624 heats the mixed fluid to a heating temperature T1 above the boiling point of water, while cooler 625 cools the mixed fluid to a cooling temperature T2 below the boiling point of IPA. Therefore, the mixed fluid changes state as it circulates through the dehydration circulation piping 62. Specifically, the mixed fluid circulating in the dehydration circulation piping 62 becomes a vapor (i.e., both the water and IPA contained in the mixed fluid are in a vapor state) while flowing through the piping portion downstream of heater 624 and upstream of cooler 625 (hereinafter referred to as "first piping portion 62a"), and becomes a liquid (i.e., both the water and IPA contained in the mixed fluid are in a liquid state) while flowing through the portion downstream of cooler 625 and upstream of heater 624 (hereinafter referred to as "second piping portion 62b")

[0091] Therefore, the first piping section 62a, the equipment located therein (e.g., the dehydrator 621), the heater 624, and the cooler 625 have pressure resistance to withstand the pressure of the mixed fluid in a vapor state and heat resistance to withstand heating temperature T1. On the other hand, the second piping section 62b and the equipment located therein (e.g., the recovery tank 60, the dehydration-side liquid feed pump 622, and the pair of on-off valves 623a and 623b) do not need to have pressure resistance to withstand the pressure of the mixed fluid in a vapor state and heat resistance to withstand heating temperature T1. In other words, the second piping section 62b and the equipment located therein can have lower pressure resistance and lower heat resistance than the first piping section 62a and the equipment located therein. As an example, the first piping section 62a is formed of pressure-resistant piping (e.g., metal piping), and the second piping section 62b is formed of non-pressure-resistant piping (e.g., resin piping). In addition, the recovery tank 60 does not need to be a pressure vessel (pressure tank), and may be formed of, for example, an atmospheric pressure tank.

[0092] Here, heater 624 and cooler 625 are installed in the same dehydration circulation pipe 62. Therefore, the mixed fluid cooled to cooling temperature T2 flows into heater 624, and the mixed fluid heated to heating temperature T1 flows into cooler 625. In other words, heater 624 must raise the mixed fluid temperature from cooling temperature T2 to heating temperature T1, and cooler 625 must lower the mixed fluid temperature from heating temperature T1 to cooling temperature T2. To reduce the load on heater 624 and cooler 625, the difference between heating temperature T1 and cooling temperature T2 should be as small as possible. Specifically, heating temperature T1 should be set as low as possible within a range above the boiling point of water. As an example, heating temperature T1 is set approximately 5-10°C higher than the boiling point of water (105-110°C). Furthermore, cooling temperature T2 should be set as high as possible within a range below the boiling point of the organic solvent (here, IPA). For example, cooling temperature T2 is set below the boiling point of IPA but above room temperature. In particular, the cooling temperature T2 is preferably a temperature approximately 5 to 10° C. lower than the boiling point of IPA (ie, 77.3 to 72.3° C.).

[0093] A pressure reducer 626 may also be provided in the dehydration circulation pipe 62. The pressure reducer 626 may be provided, for example, on the downstream side of the cooler 625 and the upstream side of the recovery tank 60 to reduce the pressure of the mixed fluid cooled by the cooler 625. The pressure reducer 626 may, for example, reduce the flow path, thereby causing a pressure loss in the fluid flowing through the pipe, thereby reducing the pressure of the mixed fluid flowing out to the secondary side to a value lower than the pressure of the mixed fluid flowing in from the primary side. As an example, the pressure reducer 626 may be formed using a restriction valve, a relief valve, a reducing valve, or the like. By providing the pressure reducer 626, the pressure on the pipe portion of the second pipe portion 62b that is further downstream than the pressure reducer 626 and the equipment types (for example, the recovery tank 60, the dehydration side liquid feed pump 622, and a pair of on-off valves 623a, 623b) provided therein can be suppressed to a sufficiently low level.

[0094] Various sensors can be installed in the dehydration circulation piping 62. For example, the dehydration circulation piping 62 may include a concentration sensor 627 for measuring the concentration of IPA contained in the mixed fluid circulating in the dehydration circulation piping 62, a pressure sensor 628 for detecting the pressure of the mixed fluid circulating in the dehydration circulation piping 62, a temperature sensor 629 for detecting the temperature of the mixed fluid circulating in the dehydration circulation piping 62, and a flow sensor (flow meter) 630 for measuring the flow rate of the mixed fluid circulating in the dehydration circulation piping 62. Each of the sensors 627, 628, 629, and 630 is preferably installed in the second piping portion 62b. In the illustrated example, the concentration sensor 627 is arranged at a position downstream of the pressure reducer 626 and upstream of the recovery tank 60, the pressure sensor 628 is arranged near the downstream side of the dehydration side liquid supply pump 622, the temperature sensor 629 is arranged near the upstream side of the heater 624, and the flow sensor 630 is arranged near the upstream side of the dehydration side liquid supply pump 622.

[0095] (b) Dehydrator 621

[0096] Next, refer to Figure 3 and Figure 4 The dehydrator 621 will be described. Figure 4 It is a side sectional view schematically showing a configuration example of the dehydrator 621.

[0097] The dehydrator 621 includes a separation membrane 51 and a housing 52 .

[0098] The separation membrane 51 is a membrane that allows water to pass through but does not allow the organic solvent (IPA in this case) to pass through (blocks the passage of the organic solvent). Specifically, the separation membrane 51 is, for example, a zeolite membrane formed of zeolite. Zeolite has a basic unit of, for example, a tetrahedral structure (e.g., containing (SiO4) 4- and (AlO4) 5- The separation membrane 51 comprises a crystalline structure formed by interconnected units (e.g., at least one basic unit in the zeolite matrix). Specifically, the separation membrane 51 has the following configuration: a cylindrical substrate 511 is provided with numerous pores 512 extending through the cylindrical substrate along its axis. The pores 512 serve as flow paths for the mixed fluid within the separation membrane 51. In this case, the entire substrate 511 may be formed of zeolite, or only the inner circumference of each pore 512 may be formed of zeolite.

[0099] The housing 52 is a hollow cylindrical member that houses the separation membrane 51. A pair of sealing members 520 are provided between the housing 52 and the separation membrane 51 housed therein to seal the separation membrane 51 therebetween. Each sealing member 520 is, for example, annular and is provided at one end and the other end of the separation membrane 51 in the axial direction. The interior space of the housing 52 is divided by the separation membrane 51 into the interior space of the separation membrane 51 (i.e., the interior space of each channel 512), namely, the channel interior space V1, and the exterior space of the separation membrane 51, namely, the separation space V2. Furthermore, the housing 52 is provided with an inlet 521, a first outlet 522, and a second outlet 523. The inlet 521 is provided at one end surface of the housing 52 in the axial direction and communicates with the channel interior space V1 through one opening of each channel 512. The first outlet 522 is provided at the other end surface of the housing 52 in the axial direction and communicates with the channel interior space V1 through the other opening of each channel 512. The second outflow port 523 is provided on the side surface (peripheral surface) of the casing 52 and communicates with the separation space V2.

[0100] The dehydration circulation pipe 62 is connected to the inlet 521 and the first outlet 522. Meanwhile, the separation pipe 53, equipped with a vacuum pump 531, is connected to the second outlet 523. The mixed fluid flowing through the dehydration circulation pipe 62 flows from the inlet 521 into the dehydrator 621 (specifically, the cell space V1) and flows through the cell space V1. In this state, when the vacuum pump 531 installed in the separation pipe 53 is activated, the separation space V2 is depressurized, creating a pressure difference between the cell space V1 and the separation space V2. The separation membrane 51 separating the cell space V1 and the separation space V2 is a membrane that is permeable to water but impermeable to IPA. Therefore, when a pressure difference is established between the cell space V1 and the separation space V2, the water (water molecules) contained in the mixed fluid flowing into the cell space V1 passes through the separation membrane 51, reaches the separation space V2, and then flows into the separation pipe 53 through the second outlet 523. In this way, water is separated from the mixed fluid. Meanwhile, because the IPA (IPA molecules) contained in the mixed fluid flowing into the pore space V1 cannot pass through the separation membrane 51, it flows within the pore space V1 and flows into the dehydration circulation pipe 62 through the first outlet 522. As a result, the mixed fluid flows out of the dehydrator 621 with an IPA concentration that is higher than when it entered the dehydrator 621. With each repeated passage through the dehydrator 621, the IPA concentration in the mixed fluid increases.

[0101] Here, the heater 624 provided on the upstream side of the dehydrator 621 heats the mixed fluid to a heating temperature T1 which is higher than the boiling point of water. Therefore, the mixed fluid flowing into the dehydrator 621 becomes a vapor state (i.e., the water and IPA contained in the mixed fluid are both in a vapor state). Compared with liquid water, water in a vapor state (water vapor) has a larger distance between molecules, a smaller force between molecules, and a higher average kinetic energy of molecules, so it is easier for it to pass through the separation membrane 51. Therefore, by making the water contained in the mixed fluid flowing into the dehydrator 621 into a vapor state, the separation efficiency (dehydration efficiency) is improved. The method of making the fluid to be separated into a vapor state and then supplying it to the separation membrane 51 is also called VP (Vapor permeation) method.

[0102] In addition, the structure of the side of the separation pipe 53 into which the water separated from the mixed fluid flows can be appropriately specified. Here, for example, a condenser 532 is provided at a position upstream of the vacuum pump 531 in the separation pipe 53. A drainage pipe 54 is connected to the condenser 532 to guide the water condensed there. The drainage pipe 54 is provided with a decomposer 541 for decomposing a trace amount of organic solvent (here, IPA) contained in the water flowing therethrough to improve the purity of the water. The decomposer 541 may be, for example, a device that electrolyzes IPA contained in the water to improve the purity of the water. In this case, the decomposer 541 may include, for example, a tank for temporarily storing water flowing through the drainage pipe 54, a pair of electrodes immersed in the water stored in the tank, and a power supply unit that supplies power to the pair of electrodes to form a potential difference therebetween. The drainage pipe 54 may also be connected to the rinsing liquid supply source 433b ( Figure 2 ) or can be connected to a factory water recovery line. For example, if drain pipe 54 is connected to flushing liquid supply source 433b, the water separated from the mixed fluid and flowing into separation pipe 53 is condensed in condenser 532 and then flows into drain pipe 54. After passing through decomposer 541 to increase the purity of the water, it is then directed to flushing liquid supply source 433b and sprayed from flushing liquid nozzle 43b as flushing liquid. In other words, in this case, the water separated from the mixed fluid is reused as flushing liquid.

[0103] (c) Purification tank 70

[0104] Refer again Figure 3 . The purification tank 70 is connected to the recovery tank 60 via the first liquid supply pipe 71 and the dehydration circulation pipe 62. That is, one end side of the first liquid supply pipe 71 is connected to the purification tank 70, and the other end side of the first liquid supply pipe 71 is connected to the dehydration circulation pipe 62. As an example, the other end side of the first liquid supply pipe 71 is connected to the second pipe portion 62b of the dehydration circulation pipe 62 (for example, a position further upstream than the heater 624 and further downstream than the dehydration side liquid supply pump 622). However, the other end side of the first liquid supply pipe 71 can also be directly connected to the recovery tank 60 without passing through the dehydration circulation pipe 62. A first liquid supply valve 711 is provided on the first liquid supply pipe 71. In the recovery tank 60, a fluid (hereinafter also referred to as "concentrated fluid") is obtained in which the concentration (purity) of IPA is sufficiently increased (to the extent that it can be supplied to the substrate W) by separating water from the mixed fluid. When the first liquid supply valve 711 is opened, the concentrated fluid is guided to the first liquid supply pipe 71 and flows into the purification tank 70 and is stored there.

[0105] A circulation pipe (purification circulation pipe) 72 is connected to the purification tank 70. Specifically, one end and the other end of the purification circulation pipe 72 are both connected to the purification tank 70. The purification circulation pipe 72 forms a circulation path that allows the concentrated fluid stored in the purification tank 70 to flow out of the purification tank 70 and then return to the purification tank 70.

[0106] The purification circulation piping 72 is provided with a pump (purification-side liquid delivery pump) 721 and an on-off valve 722. For example, the on-off valve 722 is located downstream of the purification-side liquid delivery pump 721 and upstream of the purification tank 70. The purification-side liquid delivery pump 721 delivers the concentrated fluid within the purification circulation piping 72 at the pressure required for circulation. When the on-off valve 722 is open, the purification-side liquid delivery pump 721 delivers the concentrated fluid at the pressure required for circulation, thereby circulating the concentrated fluid stored in the purification tank 70 within the purification circulation piping 72.

[0107] The purification circulation piping 72 is equipped with a filter 723 and a temperature regulator 724. For example, the filter 723 is located downstream of the purification-side liquid delivery pump 721 and upstream of the purification tank 70, while the temperature regulator 724 is located downstream of the purification-side liquid delivery pump 721 and upstream of the filter 723. The filter 723 captures the removal targets (e.g., particles, metals, etc.) contained in the concentrated fluid flowing through the purification circulation piping 72. By passing the concentrated fluid through the filter 723, the removal targets contained in the concentrated fluid are removed from the concentrated fluid, thereby improving the cleanliness of the concentrated fluid. An exhaust piping 7231 may also be connected to the filter 723. The temperature regulator 724 is a device with cooling and heating capabilities. For example, it is an electronic heat exchanger that uses a Peltier element for electronic cooling and heating. When high-temperature fluid passes through the filter 723, the performance of the filter 723 may degrade due to thermal expansion and other factors. Therefore, here, the temperature regulator 724 cools the concentrated fluid circulating in the purification circulation pipe 72 to a predetermined temperature (for example, room temperature) as needed. This can suppress the performance degradation of the filter 723.

[0108] Various sensors may also be installed in the purification circulation piping 72. For example, the purification circulation piping 72 may include a pressure sensor 725 for detecting the pressure of the concentrated fluid circulating in the purification circulation piping 72, a temperature sensor 726 for detecting the temperature of the concentrated fluid circulating in the purification circulation piping 72, and a particle counter (not shown) for counting the number of particles contained in the concentrated fluid circulating in the purification circulation piping 72. In the illustrated example, the pressure sensor 725 is installed near the downstream side of the purification-side liquid delivery pump 721, and the temperature sensor 726 is installed near the downstream side of the temperature regulator 724.

[0109] (d) Supply tank 80

[0110] The supply tank 80 is connected to the purge tank 70 via a second liquid supply pipe 81 and a purge circulation pipe 72. Specifically, one end of the second liquid supply pipe 81 is connected to the supply tank 80, while the other end is connected to the purge circulation pipe 72. As an example, the other end of the second liquid supply pipe 81 is connected to the purge circulation pipe 72 upstream of the filter 723 and downstream of the purge-side liquid supply pump 721. However, the other end of the second liquid supply pipe 81 may be directly connected to the purge tank 70 without passing through the purge circulation pipe 72. A second liquid supply valve 811 is provided on the second liquid supply pipe 81. When a concentrated fluid (hereinafter referred to as "purified fluid") with sufficiently improved cleanliness (to the extent that it can be supplied to the substrate W) is obtained in the purification tank 70, when the second liquid supply valve 811 is opened, the purified fluid is guided to the second liquid supply pipe 81 and flows into the supply tank 80 and is stored there.

[0111] The supply tank 80 can also be connected to a fresh liquid supply source 821 via a fresh liquid pipe 82. In this case, one end of the fresh liquid pipe 82 is connected to the supply tank 80, and the other end of the fresh liquid pipe 82 is connected to the fresh liquid supply source 821. The fresh liquid supply source 821 is a source of unused IPA (IPA of sufficiently high purity, specifically, IPA with a purity of 99 wt% or greater, for example) that has never been supplied to the substrate W. A fresh liquid valve 822 is provided on the fresh liquid pipe 82. When the fresh liquid valve 822 is opened, unused IPA is directed into the fresh liquid pipe 82 and flows into the supply tank 80, where it is stored.

[0112] The supply tank 80 is connected to the organic solvent nozzle 43c via the third liquid supply pipe 83. Specifically, one end of the third liquid supply pipe 83 is connected to the supply tank 80, and the other end of the third liquid supply pipe 83 is connected to the organic solvent nozzle 43c (specifically, the organic solvent pipe 432c connected to the organic solvent nozzle 43c). For example, the third liquid supply pipe 83 is connected to the organic solvent nozzle 43c included in each of the multiple processing units 4 belonging to the same tower. A pump (supply-side liquid supply pump) 831 is provided on the third liquid supply pipe 83. When the organic solvent valve 431c is opened, the purified fluid stored in the supply tank 80 is transported to the side of the organic solvent nozzle 43c by the supply-side liquid supply pump 831 and ejected from the organic solvent nozzle 43c.

[0113] The third liquid supply pipe 83 may also be provided with a filter 832 for capturing removal targets contained in the purified fluid transported through the third liquid supply pipe 83, and a temperature regulator 833 for regulating the temperature of the purified fluid transported through the third liquid supply pipe 83 (i.e., heating or cooling the purified fluid to a predetermined temperature). In the illustrated example, the temperature regulator 833 is provided downstream of the supply-side liquid supply pump 831, and the filter 832 is provided downstream of the temperature regulator 833. Furthermore, various sensors may be provided in the third liquid supply pipe 83. For example, the third liquid supply pipe 83 may be provided with a pressure sensor 834 for detecting the pressure of the purified fluid transported through the third liquid supply pipe 83, or a temperature sensor 835 for detecting the temperature of the purified fluid transported through the third liquid supply pipe 83. In the illustrated example, the pressure sensor 834 is provided near the downstream side of the supply-side liquid supply pump 831, and the temperature sensor 835 is provided near the downstream side of the temperature regulator 833.

[0114] <3-2. Action>

[0115] Reference Figures 5 to 12 The flow of the treatment performed in the organic solvent recovery section 5 will be described. Figure 5 1 is a diagram showing an example of the flow of the process performed in the organic solvent recovery unit 5 . Figure 6 This is a diagram showing an example of a process flow for separating water from a mixed fluid. Figures 7 to 12 It is a diagram schematically showing the state of the organic solvent recovery unit 5 in each step. Figures 7 to 12 In the figure, for convenience of explanation, the pipes through which the fluid flows are indicated by solid lines, and the pipes through which the fluid does not flow are indicated by dotted lines.

[0116] The operation of the organic solvent recovery unit 5 is performed under the control of the control unit 6. Specifically, the control unit 6 controls the pumps (the dehydration-side liquid feed pump 622, the vacuum pump 531, the purification-side liquid feed pump 721, and the supply-side liquid feed pump 831), valves (the recovery valve 611, the pair of on-off valves 623a and 623b, the first liquid feed valve 711, the on-off valve 722, the second liquid feed valve 811, and the new liquid valve 822), the heater 624, the cooler 625, the pressure reducer 626, the condenser 532, the decomposer 541, the temperature regulators 724 and 833) based on input information from sensors (the concentration sensor 627, the pressure sensors 628, 725, and 834, and the temperature regulators 724 and 833), thereby performing a series of operations in the organic solvent recovery unit 5.

[0117] Step S1

[0118] First, when the recovery tank 60 is empty, the recovery valve 611 is opened. Then, the liquid collected in the holder 42 during the organic solvent supply process and the spin drying process is guided to the recovery pipe 61 and flows into the recovery tank 60. As a result, a mixed fluid containing water supplied to the substrate W and then recovered, and IPA ( Figure 7 (Storage process) When a predetermined amount of the mixed fluid has been stored in the recovery tank 60 , the recovery valve 611 is closed.

[0119] Step S2

[0120] Next, water is separated from the mixed fluid stored in the recovery tank 60. Figure 6 and Figures 8 to 10 This processing will be described in detail.

[0121] First, a pair of on-off valves 623a and 623b are opened simultaneously, and the mixed fluid is fed by the dehydration side liquid feeding pump 622 at a circulating pressure. As a result, the mixed fluid stored in the recovery tank 60 is circulated in the dehydration circulation pipe 62 (step S201: circulation process). Figure 8 ).

[0122] Next, heating of the mixed fluid is started (step S202a: heating process). Specifically, the heater 624 heats the mixed fluid circulating in the dehydration circulation pipe 62 to a heating temperature T1 that is higher than the boiling point of water. In addition, cooling of the mixed fluid is started at the same time as heating of the mixed fluid is started (step S202b: cooling process). Specifically, the cooler 625 cools the mixed fluid circulating in the dehydration circulation pipe 62 to a cooling temperature T2 that is lower than the boiling point of IPA. By heating and cooling, the mixed fluid changes its state while circulating in the dehydration circulation pipe 62. That is, in this state, the mixed fluid circulating in the dehydration circulation pipe 62 becomes a vapor state while flowing through the first piping portion 62a, and becomes a liquid state while flowing through the second piping portion 62b.

[0123] Next, while the mixed fluid is being heated and cooled, the vacuum pump 531 is started. By operating the vacuum pump 531, the separation space V2 is decompressed, and a pressure difference is established between the channel inner space V1 and the separation space V2. Due to this pressure difference, the water contained in the mixed fluid flowing into the channel inner space V1 passes through the separation membrane 51 and reaches the separation space V2, and flows into the separation pipe 53. That is, when the mixed fluid circulating in the dehydration circulation pipe 62 passes through the dehydrator 621, the water contained in the mixed fluid is separated (step S203: separation process) Figure 9Here, the mixed fluid flowing into the dehydrator 621 is heated to a vapor state (i.e., both the water and IPA contained in the mixed fluid are vaporized). By converting the water contained in the mixed fluid flowing into the dehydrator 621 into a vapor state, water can be efficiently separated from the mixed fluid.

[0124] Then, the vacuum pump 531 is operated for a specified time. During this period, the heating and cooling of the mixed fluid also continue. During this period, the mixed fluid circulating in the dehydration circulation pipe 62 repeatedly passes through the dehydrator 621, and the concentration of IPA in the mixed fluid gradually increases. Here, through measurement, calculation, etc., the time required for the concentration of IPA in the mixed fluid stored in the recovery tank 60 to fully increase (to a level that can be supplied to the substrate W) (i.e., the time required until concentrated fluid is obtained) is pre-determined and set as the specified time. Therefore, after the specified time has passed since the start of the operation of the vacuum pump 531, the recovery tank 60 is in a state where concentrated fluid is stored. If the specified time has passed since the start of the operation of the vacuum pump 531 (yes in step S204), the operation of the vacuum pump 531 is stopped. As a result, the separation of water in the dehydrator 621 is approximately stopped (step S205). Furthermore, the heating of the mixed fluid is stopped (step S206a), and the cooling of the mixed fluid is stopped (step S206b).

[0125] Then, the first liquid delivery valve 711 is opened. Then, the concentrated fluid stored in the recovery tank 60 is delivered to the purification tank 70 through the first liquid delivery pipe 71. Thus, the concentrated fluid is stored in the purification tank 70 (step S207) ( Figure 10 When all the concentrated fluid stored in the recovery tank 60 is transferred to the purification tank 70 , the first liquid feeding valve 711 is closed.

[0126] Step S3

[0127] Next, the cleanliness of the concentrated fluid stored in the purification tank 70 is improved. Specifically, the on-off valve 722 is opened, and the concentrated fluid is fed by the purification side liquid feeding pump 721 at a pressure required for circulation. As a result, the concentrated fluid stored in the purification tank 70 is circulated in the purification circulation pipe 72 ( Figure 11). This state lasts for a specified time. During this period, the cleanliness of the concentrated fluid circulating in the purification circulation piping 72 gradually improves by repeatedly passing through the filter 723. Here, the time required for the cleanliness of the concentrated fluid circulating in the purification circulation piping 72 to be sufficiently improved (to the extent that it can be supplied to the substrate W) (i.e., the time required until the purified fluid is obtained) is determined in advance by measurement, calculation, etc., and is set as the specified time. Therefore, at the stage where the specified time has passed since the start of the circulation, the purification tank 70 is in a state where the purified fluid is stored. When the specified time has passed since the start of the circulation, the on-off valve 722 is closed.

[0128] Step S4

[0129] Next, the second liquid delivery valve 811 is opened. Then, the purified fluid in the purification tank 70 is delivered to the supply tank 80 through the second liquid delivery pipe 81. Thus, the purified fluid is stored in the supply tank 80 ( Figure 12 For example, when all the purge fluid in the purge tank 70 has been delivered to the supply tank 80, the second liquid delivery valve 811 is closed. Then, when the organic solvent valve 431c is opened, the purge fluid stored in the supply tank 80 is delivered to the organic solvent nozzle 43c side by the supply-side liquid delivery pump 831 and ejected from the organic solvent nozzle 43c. In other words, the purge fluid is supplied to the substrate W. In addition, while passing through the third liquid delivery pipe 83, the purge fluid can pass through the filter 832 to improve its cleanliness, and the temperature can be adjusted by the temperature regulator 833 as needed. In addition, if the amount of purge fluid stored in the supply tank 80 becomes less than a specified amount, the new liquid valve 822 can be opened to replenish unused IPA to the supply tank 80.

[0130] This series of processes (steps S1 to S4) is repeated in the organic solvent recovery unit 5. However, the process of the next step S1 may be started before the process of step S4 is completed (for example, after the process of step S3 is completed).

[0131] <4. Effect>

[0132] The substrate processing apparatus 100 of the embodiment described above includes: a rinse liquid supply unit (rinsing liquid nozzle) 43b for supplying a rinse liquid containing water to the substrate W; an organic solvent supply unit (organic solvent nozzle) 43c for supplying an organic solvent (e.g., IPA) to the substrate W; a recovery tank 60 for storing a mixed fluid containing water supplied to the substrate W and then recovered, and an organic solvent supplied to the substrate W and then recovered; a circulation pipe (dehydration circulation pipe) 62 connected to the recovery tank 60; a dehydrator 621 provided in the dehydration circulation pipe 62 and equipped with a separation membrane 51 that allows water to pass but does not allow the organic solvent to pass; a pump (dehydration-side liquid feeding pump) 622 provided in the dehydration circulation pipe 62; and a heater 624 provided in the dehydration circulation pipe 62 downstream of the recovery tank 60 and upstream of the dehydrator 621 to heat the mixed fluid to a temperature above the boiling point of water. This configuration allows water contained in the mixed fluid to flow into the dehydrator 621 in a vapor state. This can improve the separation efficiency of the separation membrane 51 .

[0133] In addition, the substrate processing apparatus 100 of the embodiment is provided with a cooler 625, which is arranged on the downstream side of the dehydrator 621 in the dehydration circulation piping 62 and the upstream side of the recovery tank 60. According to this structure, by utilizing the cooler 625 to cool the heated mixed fluid, the pressure of the mixed fluid can be reduced. In addition, the mixed fluid circulating in the dehydration circulation piping 62 is subjected to resistance when passing through the cooler 625. Therefore, the mixed fluid in the vapor state becomes easy to stay on the downstream side (that is, the first piping portion 62a) of the cooler 625. Thus, the mixed fluid is fully in contact with the separation membrane 51, and the separation efficiency of the separation membrane 51 is further improved.

[0134] In addition, in the embodiment, the cooler 625 cools the mixed fluid to a temperature lower than the boiling point of the organic solvent (e.g., IPA) and higher than room temperature. According to this configuration, by utilizing the cooler 625 for cooling, the IPA contained in the mixed fluid returns from a vapor state to a liquid state, thereby being able to fully reduce the pressure of the mixed fluid. On the other hand, since the cooler 625 only cools the mixed fluid to a temperature higher than room temperature, the loads on the heater 624 and the cooler 625 are both reduced. As a result, for example, the heater 624 and the cooler 625 can be miniaturized.

[0135] In addition, in the above embodiment, the pressure resistance of the second piping portion 62b of the dehydration circulation piping 62 (the piping portion downstream of the cooler 625 and upstream of the heater 624) is lower than the pressure resistance of the first piping portion 62a of the dehydration circulation piping 62 (the piping portion downstream of the heater 624 and upstream of the cooler 625). This configuration allows for a more compact device compared to a case where the entire dehydration circulation piping 62 has a relatively high pressure resistance.

[0136] Furthermore, the substrate processing apparatus 100 of the embodiment described above includes a pressure reducer 626, which is installed in the dehydration circulation piping 62 and reduces the pressure of the mixed fluid after being cooled by the cooler 625. This configuration allows the pressure reducer 626 to further reduce the pressure of the mixed fluid that has passed through the cooler 625. Consequently, the pressure experienced by the piping section downstream of the pressure reducer 626 in the second piping section 62b and the equipment installed therein can be kept sufficiently low.

[0137] The substrate processing apparatus 100 of the embodiment described above also includes a purge tank 70 connected to a recovery tank 60 via a liquid supply pipe (first liquid supply pipe) 71, storing a concentrated fluid obtained by separating water from a mixed fluid; and a filter 723 provided in a pipe (purification circulation pipe) 72 connected to the purge tank 70, capturing removal target substances contained in the concentrated fluid flowing through the purification circulation pipe 72. This configuration allows the removal target substances to be removed from the concentrated fluid obtained by separating water from the mixed fluid, thereby improving the cleanliness of the concentrated fluid.

[0138] Furthermore, in the aforementioned embodiment, the concentrated fluid stored in the purge tank 70 passes through the filter 723 before being transported to the organic solvent nozzle 43c and supplied to the substrate W. Specifically, the concentrated fluid, obtained by separating the water from a mixed fluid containing water supplied to the substrate W and then recovered, and an organic solvent supplied to the substrate W and then recovered, is then supplied to the substrate W again after its cleanliness level has been improved. This reduces the amount of organic solvent used and discharged (liquid saving). IPA is a volatile organic compound (VOC), and reducing its use and discharge can reduce environmental impact.

[0139] <5. Variations>

[0140] The configuration and operation of the substrate processing apparatus 100 of the embodiment described above can be modified as appropriate. In the following description, the same elements as those described in the embodiment described above are denoted by the same reference numerals, and their description will be omitted.

[0141] <5-1. First Modification>

[0142] Reference Figure 13 The configuration of the organic solvent recovery unit 5 t according to the first modification will be described. Figure 13 1 is a diagram schematically showing an example of the organic solvent recovery unit 5 t .

[0143] The organic solvent recovery unit 5t includes a plurality of (two in the example shown) recovery tanks 60A and 60B, a plurality of (two in the example shown) purification tanks 70A and 70B, and a supply tank 80 (see FIG. Figure 3 ).

[0144] The recovery tanks 60A and 60B are connected to the support cup 42 via the recovery pipe 61t. That is, one end side of the recovery pipe 61t is branched, and the end of one branch part 61A is connected to the first recovery tank 60A, and the end of the other branch part 61B is connected to the second recovery tank 60B. The other end side of the recovery pipe 61t is connected to the support cup 42 (specifically, the support cup side recovery pipe 424 connected to the support cup 42). Recovery valves 611A and 611B are provided in each branch part 61A and 61B. When a recovery valve 611A is opened, the liquid gathered in the support cup 42 during the organic solvent supply process and the rotary drying process is guided to the recovery pipe 61t and flows into the first recovery tank 60A and is stored there. That is, the mixed fluid is stored in the first recovery tank 60A. Similarly, when the other recovery valve 611B is opened, the liquid collected in the cup 42 during the organic solvent supply process and the spin drying process is guided to the recovery pipe 61t and flows into the second recovery tank 60B, where it is stored. In other words, the mixed fluid is stored in the second recovery tank 60B.

[0145] A circulation pipe (dehydration circulation pipe) 62t is connected to the recovery tanks 60A and 60B. The dehydration circulation pipe 62t is defined with a branching point R1 and a confluence point R2, with multiple branch pipes 620A and 620B (the same number as the recovery tanks 60A and 60B) disposed between them. Furthermore, each of the multiple branch pipes 620A and 620B is provided with a recovery tank 60A and 60B. Specifically, one branch pipe 620A is provided with a first recovery tank 60A, and another branch pipe 620B is provided with a second recovery tank 60B. Furthermore, one branch pipe 620A is provided with a pair of first valves 621A and 621A across the first recovery tank 60A, and another branch pipe 620B is provided with a pair of second valves 621B and 621B across the second recovery tank 60B. When the pair of first valves 621A, 621A is open and the pair of second valves 621B, 621B is closed, a circulation path is formed in which the mixed fluid stored in the first recovery tank 60A circulates by flowing out of the first recovery tank 60A and returning to the first recovery tank 60A. Conversely, when the pair of first valves 621A, 621A is closed and the pair of second valves 621B, 621B is open, a circulation path is formed in which the mixed fluid stored in the second recovery tank 60B circulates by flowing out of the second recovery tank 60B and returning to the second recovery tank 60B.

[0146] As in the aforementioned embodiment, the dehydration circulation pipe 62t is provided with a dehydrator 621, a dehydration-side liquid delivery pump 622, a pair of on-off valves 623a and 623b, a heater 624, a cooler 625, a pressure reducer 626, and various sensors 627, 628, 629, and 630. These components are provided at positions upstream of the branch point R1 and downstream of the confluence point R2.

[0147] As in the aforementioned embodiment, heater 624 heats the mixed fluid to a heating temperature T1 above the boiling point of water. Furthermore, cooler 625 cools the mixed fluid to a cooling temperature T2 below the boiling point of IPA. Therefore, as in the aforementioned embodiment, the mixed fluid circulating in the dehydration circulation piping 62t becomes a vapor while flowing through the first piping section 62a, which is located downstream of heater 624 and upstream of cooler 625, and becomes a liquid while flowing through the second piping section 62b, which is located downstream of cooler 625 and upstream of heater 624. Therefore, as in the aforementioned embodiment, the first piping section 62a, the equipment provided therein (e.g., dehydrator 621), heater 624, and cooler 625 have pressure resistance sufficient to withstand the pressure of the mixed fluid in a vapor state, and heat resistance sufficient to withstand the heating temperature T1. On the other hand, the second piping portion 62b and the equipment installed therein (e.g., the first recovery tank 60A, the second recovery tank 60B, the dehydration-side liquid feed pump 622, and the pair of on-off valves 623a and 623b) may not have the pressure resistance to withstand the pressure of the mixed fluid in the vapor state, nor the heat resistance to withstand the heating temperature T1. As an example, the first recovery tank 60A and the second recovery tank 60B are both formed of atmospheric pressure tanks.

[0148] The purification tanks 70A and 70B are connected to the recovery tanks 60A and 60B via a first liquid supply pipe 71t and a dehydration circulation pipe 62t. Specifically, one end of the first liquid supply pipe 71t branches, with one branch portion 71A connected to the first purification tank 70A and the other branch portion 71B connected to the second purification tank 70B. The other end of the first liquid supply pipe 71t is connected to the second pipe portion 62b of the dehydration circulation pipe 62t. First liquid supply valves 711A and 711B are provided in each branch portion 71A and 71B. When concentrated fluid is collected in the first recovery tank 60A or the second recovery tank 60B, opening the first liquid supply valve 711A on the first purification tank 70A side allows the concentrated fluid to flow into the first liquid supply pipe 71t and into the first purification tank 70A, where it is stored. Similarly, when concentrated fluid is obtained in the first recovery tank 60A or the second recovery tank 60B, when the first liquid supply valve 711B on the second purification tank 70B side is opened, the concentrated fluid is guided to the first liquid supply pipe 71t and flows into the second purification tank 70B to be stored there.

[0149] Circulation pipes (purification circulation pipes) 72A and 72B are connected to the first purge tank 70A and the second purge tank 70B. Similar to the purge circulation pipe 72 in the aforementioned embodiment, each of the purge circulation pipes 72A and 72B is equipped with a purge-side liquid delivery pump 721, an on-off valve 722, a filter 723, a temperature regulator 724, and various sensors 725 and 726.

[0150] Each of the first purge tank 70A and the second purge tank 70B is connected to the supply tank 80 ( Figure 3 ) connection. That is, one end of the second liquid supply pipe 81t branches, with the end of one branch portion 81A connected to the purification circulation pipe 72A on the first purification tank 70A side, and the end of the other branch portion 81B connected to the purification circulation pipe 72B on the second purification tank 70B side. The other end of the second liquid supply pipe 81t is connected to the supply tank 80. Second liquid supply valves 811A and 811B are provided in each branch portion 81A and 81B. When the second liquid supply valve 811A on the first purification tank 70A side is opened after the purified fluid is obtained in the first purification tank 70A, the purified fluid in the first purification tank 70A is guided to the second liquid supply pipe 81t and flows into the supply tank 80 to be stored there. Similarly, when the second purge tank 70B receives the purified fluid and the second liquid delivery valve 811B on the second purge tank 70B side is opened, the purified fluid in the second purge tank 70B is guided to the second liquid delivery pipe 81t and flows into the supply tank 80 to be stored there.

[0151] In the organic solvent recovery unit 5t, a series of processes (steps S1 to S4) similar to those in the above embodiment are also performed. Figure 5 ).

[0152] That is, similar to the above-described embodiment, in the organic solvent recovery section 5t, the liquid gathered in the support cup 42 is first transported to a recovery tank (for example, the first recovery tank 60A), and the mixed fluid is stored there (step S1). Next, a process of separating water from the mixed fluid stored in the first recovery tank 60A is performed (step S2). However, in the organic solvent recovery section 5t, in parallel with this process, the liquid gathered in the support cup 42 is transported to another recovery tank (the second recovery tank 60B), and the mixed fluid is stored there. That is, after the liquid gathered in the support cup 42 is transported to a recovery tank 60A, it is transported to another recovery tank 60B without waiting for the recovery tank 60A to be emptied (that is, without waiting for the process of separating water from the mixed fluid stored in the recovery tank 60A to be completed).

[0153] Similarly to the aforementioned embodiment, in the organic solvent recovery section 5t, the concentrated fluid obtained by separating water from the mixed fluid is transferred from the first recovery tank 60A or the second recovery tank 60B to the first purification tank 70A or the second purification tank 70B for storage. If the concentrated fluid is stored in the first purification tank 70A or the second purification tank 70B, the cleanliness of the concentrated fluid is improved (step S3), and the resulting purified fluid is transferred to the supply tank 80 (step S4). Since multiple purification tanks 70A and 70B are provided, the concentrated fluid can be transferred to another purification tank 70B while the cleanliness improvement process is being performed in one purification tank 70A.

[0154] As described above, the organic solvent recovery unit 5t includes multiple recovery tanks 60A and 60B. Therefore, by switching the recovery tanks 60A and 60B as the liquid delivery destination, the liquid collected in the holder 42 (i.e., water supplied to the substrate W and then recovered, and the organic solvent supplied to the substrate W and then recovered) can be continuously delivered. Furthermore, the organic solvent recovery unit 5t includes multiple purge tanks 70A and 70B. Therefore, by switching the purge tanks 70A and 70B as the liquid delivery destination, the concentrated fluid obtained by separating water from the mixed fluid can be continuously delivered. This shortens the cycle time from recovering the organic solvent supplied to the substrate W to resupplying it to the substrate W. Consequently, the amount of organic solvent used and discharged can be effectively reduced.

[0155] <5-2. Second Modification>

[0156] In the organic solvent recovery section 5 of the aforementioned embodiment, the dehydrator 621 may also be arranged in the following posture and orientation: the channel 512 extends in the vertical direction, and the inlet 521 is arranged vertically downward (thus, the first outlet 522 is arranged vertically upward). In this case, the mixed fluid flowing through the dehydration circulation pipe 62 flows in from the opening on the vertically downward side of the channel 512.

[0157] According to this variation, the mixed fluid flowing into the channel 512 from the dehydration circulation pipe 62 flows from bottom to top inside the channel 512 extending in the vertical direction (channel inner space V1). Therefore, for example, even if a portion of the mixed fluid flowing into the channel inner space V1 condenses and becomes a liquid (such as droplets) in the middle of passing through the channel inner space V1, the mixed fluid will be fully retained in the channel inner space V1 due to gravity, thereby fully contacting the separation membrane 51. Therefore, the possibility of the water contained in the liquid being separated increases. That is, the separation efficiency is further improved. In addition, according to this variation, due to the head pressure, the pressure of the mixed fluid on the secondary side of the dehydrator 621 becomes lower than the pressure of the mixed fluid on the primary side. That is, the pressure of the mixed fluid after passing through the dehydrator 621 can be reduced.

[0158] <5-3. Third Modification>

[0159] In the case where the dehydrator 621 is arranged with the channel 512 extending in the vertical direction, as in the organic solvent recovery section 5 of the second variation, the dehydrator 621 and the heater 624 can be arranged in the vertical direction. Specifically, for example, in the case where the dehydrator 621 is arranged with the channel 512 extending in the vertical direction, a piping portion extending in the vertical direction (vertical piping portion) can be provided in and near the portion of the dehydration circulation piping 62 connected to the inlet 521, and the heater 624 can be provided in the vertical piping portion. As an example, the heater 624 formed using a jacket heater can be provided so as to cover at least the circumference of the vertical piping portion. Since the heater 624 is provided in the vertical piping portion, the heat loss generated by the mixed fluid heated by the heater 624 before flowing into the dehydrator 621 is reduced. Consequently, the load on the heater 624 is reduced.

[0160] <5-4. Other Variations>

[0161] In the aforementioned embodiment, to reduce the load on heater 624, it is effective to minimize the heat loss of the mixed fluid heated by heater 624 before it flows into dehydrator 621. To minimize this heat loss, the distance between heater 624 and dehydrator 621 should be as small as possible. For example, heater 624 is preferably positioned so that the distance from dehydrator 621 reaches the minimum allowed by the design. To minimize the distance between heater 624 and dehydrator 621, it is also preferable to avoid installing other equipment between them.

[0162] In the embodiment, the first piping portion 62a needs to have relatively high pressure resistance and relatively high heat resistance. Therefore, in order to miniaturize the device, the ratio of the length of the first piping portion 62a in the dehydration circulation piping 62 is as short as possible. For this reason, the distance between the heater 624 and the cooler 625 is as small as possible. Taking this into account, the heater 624 is preferably arranged at a position where the distance from the dehydrator 621 reaches the minimum value allowed by the design, as described above. In addition, the cooler 625 is also preferably arranged at a position where the distance from the dehydrator 621 reaches the minimum value allowed by the design. In order to reduce the distance between the cooler 625 and the dehydrator 621, it is also preferred not to have other equipment between the cooler 625 and the dehydrator 621.

[0163] In the embodiment described above, since the dehydration circulation pipe 62 is provided with a pressure reducer 626, the pressure borne by the piping portion downstream of the pressure reducer 626 and the equipment disposed therein is suppressed to be less than the pressure borne by the piping portion upstream of the pressure reducer 626 and the equipment disposed therein. Therefore, in order to effectively reduce the load borne by the piping, etc., the pressure reducer 626 is preferably located as upstream as possible. To this end, the smaller the distance between the pressure reducer 626 and the cooler 625, the better. For example, the pressure reducer 626 is preferably located so that the distance between the pressure reducer 626 and the cooler 625 reaches the minimum value allowed by the design. Furthermore, in order to reduce the distance between the pressure reducer 626 and the cooler 625, it is also preferred that no other equipment be disposed between the pressure reducer 626 and the cooler 625. In addition, the piping portion of the second piping portion 62b that is further downstream than the pressure reducer 626 and the equipment types installed there may have lower pressure resistance than the piping portion of the second piping portion 62b that is further upstream than the pressure reducer 626 and the equipment types installed there.

[0164] In the organic solvent recovery section 5 of the embodiment described above, one or both of the cooler 625 and the pressure reducer 626 may be omitted. For example, if the second piping portion 62b and the equipment provided therein have pressure resistance capable of withstanding the pressure of the mixed fluid in a vapor state and heat resistance capable of withstanding the heating temperature T1, the cooler 625 and the pressure reducer 626 may be omitted.

[0165] In the organic solvent recovery unit 5 of the embodiment described above, the recovery tank 60 and the purification tank 70 can share a single tank. Specifically, for example, a dehydration circulation pipe 62 and a purification circulation pipe 72 can be connected to the single tank (the recovery purification tank). In this case, the mixed fluid stored in the recovery purification tank is first circulated through the dehydration circulation pipe 62 to form a concentrated fluid. Subsequently, the concentrated fluid is circulated through the purification circulation pipe 72 to form a purified fluid.

[0166] In the organic solvent recovery unit 5 of the embodiment described above, a filter may be provided in the dehydration circulation pipe 62. In other words, the organic solvent recovery unit 5 can separate water from the mixed fluid circulating in the dehydration circulation pipe 62 while simultaneously removing the target substance. In this case, the purification tank 70 can be omitted, and the recovery tank 60 can be directly connected (without the purification tank 70) to the supply tank 80.

[0167] In the organic solvent recovery section 5 of the embodiment, the structure of the dehydrator 621 can be appropriately changed. For example, the separation membrane 51 provided by the dehydrator 621 is not limited to a zeolite membrane. For example, the separation membrane 51 may also be an organic separation membrane. An organic separation membrane is, for example, an organic membrane formed by polyvinyl alcohol, chitosan, polyimide, etc. Alternatively, the separation membrane 51 may also be a CNT (carbon nanotube) separation membrane. A CNT separation membrane is, for example, a membrane obtained by adding carbon nanotubes to a membrane of polyamide, etc. Alternatively, the separation membrane 51 may also be formed by a two-dimensional material. A two-dimensional material is a material composed of one layer of atoms, specifically, molybdenum sulfide (MoS2), a composite atomic layer compound formed by a pre-periodic transition metal (titanium, vanadium, etc.) and a light element (carbon or nitrogen), etc. Alternatively, the separation membrane 51 may be formed by a MOF (Metal Organic Frameworks) material, or by a carbon material (for example, graphene, graphene oxide, etc.).

[0168] In the substrate processing apparatus 100 of the embodiment described above, the processing units 4 to which the organic solvent recovery unit 5 recovers and supplies the organic solvent do not necessarily have to be the processing units 4 contained within the same tower. That is, the organic solvent recovery unit 5 can recover and supply the organic solvent to one or more arbitrarily selected processing units 4. Furthermore, the processing units 4 from which the organic solvent recovery unit 5 recovers the organic solvent can be different from the processing units 4 to which the organic solvent recovery unit 5 supplies the organic solvent.

[0169] In the substrate processing apparatus 100 of the embodiment described above, the organic solvent is not limited to IPA. For example, the organic solvent may be at least one of HFE (hydrofluoroether), methanol, ethanol, acetone, and trans-1,2-dichloroethylene. Furthermore, the organic solvent need not consist of a single component and may be a liquid mixture of multiple components.

[0170] In the substrate processing apparatus 100 of the embodiment, the rinse liquid may be any liquid including water, for example, carbonated water, electrolytic ionized water, hydrogen water, ozone water, or diluted hydrochloric acid water (eg, about 10 to 100 ppm).

[0171] In the substrate processing apparatus 100 of each of the aforementioned embodiments, the substrate W to be processed need not necessarily be a semiconductor substrate. For example, the substrate W to be processed may be a glass substrate for a photomask, a glass substrate for a liquid crystal display, a glass substrate for a plasma display, a substrate for an FED (Field Emission Display), a substrate for an optical disc, a magnetic disk, or a substrate for a magneto-optical disc. Furthermore, the substrate W to be processed need not be a completely circular shape and may have portions such as notches or orientation flats.

[0172] As described above, the substrate processing apparatus and substrate processing method have been described in detail. However, the descriptions are illustrative in all aspects and are not intended to limit the substrate processing apparatus and substrate processing method. It should be understood that numerous variations not shown are possible without departing from the scope of the present invention. The various configurations described in the various embodiments and variations may be appropriately combined or omitted as long as they do not conflict with each other.

[0173] [Explanation of Symbols]

[0174] 100 substrate processing device

[0175] 4 processing units

[0176] 43c Organic solvent nozzle

[0177] 43b Flushing fluid nozzle

[0178] 5. Organic solvent recovery department

[0179] 60 Recovery Tanks

[0180] 61 Recovery piping

[0181] 62 Circulation piping (circulation piping for dehydration)

[0182] 621 Dehydrator

[0183] 51 Separation membrane

[0184] 622 pump (dehydration side liquid delivery pump)

[0185] 624 Heater

[0186] 625 Cooler

[0187] 626 Pressure Reducer

[0188] 70 purification tank

[0189] 71 1st liquid supply piping

[0190] 72 Purification circulation piping

[0191] 721 Purification side liquid delivery pump

[0192] 723 filters

[0193] 80 supply tank

[0194] 81 2nd liquid supply piping.

Claims

1. A substrate processing apparatus comprising: a rinsing liquid supply unit for supplying a rinsing liquid containing water to the substrate; an organic solvent supplying unit for supplying an organic solvent to the substrate; a recovery tank storing a mixed fluid, wherein the mixed fluid includes the water supplied to the substrate and then recovered, and the organic solvent supplied to the substrate and then recovered; A circulation pipe connected to the recovery tank; a dehydrator, disposed in the circulation pipe, and comprising a separation membrane that allows the water to pass through but does not allow the organic solvent to pass through; a pump, provided in the circulation pipe; and The heater is provided in the circulation pipe on the downstream side of the recovery tank and the upstream side of the dehydrator, and heats the mixed fluid to a temperature equal to or higher than the boiling point of the water.

2. The substrate processing apparatus according to claim 1, comprising a cooler, The cooler is provided on the downstream side of the dehydrator and the upstream side of the recovery tank in the circulation pipe.

3. The substrate processing apparatus according to claim 2, wherein The cooler cools the mixed fluid to a temperature lower than the boiling point of the organic solvent and higher than normal temperature.

4. The substrate processing apparatus according to claim 2 or 3, wherein The pressure resistance of a piping portion downstream of the cooler and upstream of the heater in the circulation piping is lower than the pressure resistance of a piping portion downstream of the heater and upstream of the cooler in the circulation piping.

5. The substrate processing apparatus according to claim 2 or 3, comprising a pressure reducer, The pressure reducer is provided in the circulation pipe and reduces the pressure of the mixed fluid cooled by the cooler.

6. The substrate processing apparatus according to any one of claims 1 to 3, comprising: a purification tank connected to the recovery tank via a liquid feeding pipe, and storing a concentrated fluid obtained by separating the water from the mixed fluid; and The filter is provided in the pipe connected to the purification tank and captures the removal target substance contained in the concentrated fluid flowing through the pipe.

7. The substrate processing apparatus according to claim 6, wherein The concentrated fluid stored in the purification tank passes through the filter, is transported to the organic solvent supply unit, and is then supplied to the substrate.

8. The substrate processing apparatus according to any one of claims 1 to 3, wherein The circulation pipe includes a plurality of branch portions provided between a branch position and a confluence position, and The recovery tank is provided at each of the plurality of branch parts.

9. The substrate processing apparatus according to any one of claims 1 to 3, wherein The dehydrator is arranged in a posture where the pores extend in the vertical direction, and the pores serve as flow paths for the mixed fluid in the separation membrane. The mixed fluid flowing through the circulation pipe flows into the port from the opening on the vertically lower side.

10. The substrate processing apparatus according to claim 9, wherein The dehydrator and the heater are arranged in a vertical direction.

11. A substrate processing method comprising: a rinsing liquid supplying step of supplying a rinsing liquid containing water to the substrate; an organic solvent supplying step of supplying an organic solvent to the substrate; a storage step of storing a mixed fluid in a recovery tank, wherein the mixed fluid includes the water supplied to the substrate and then recovered, and the organic solvent supplied to the substrate and then recovered; a circulation step of circulating the mixed fluid stored in the recovery tank in a circulation pipe connected to the recovery tank; a heating step of heating the mixed fluid to a temperature above the boiling point of water by a heater provided in the circulation pipe; as well as The separation process allows the heated mixed fluid to flow into a dehydrator to separate the water from the mixed fluid. The dehydrator is arranged on the downstream side of the heater in the circulation piping and the upstream side of the recovery tank, and is equipped with a separation membrane that allows the water to pass through but does not allow the organic solvent to pass through.

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