Container for containing precursor

Abstract

A container for containing a precursor in liquid or solid form is disclosed. The container comprises an inlet port for supplying gas to an interior of the container and an outlet port for removing gas from the interior of the container, the inlet port and the outlet port being spaced apart in a first direction, the container comprising an upper inner surface and an opposing bottom inner surface, the upper surface being arranged to face, in use, a precursor contained in the container. The container is shaped such that a vertical distance between a top surface of the precursor and an upper inner surface of the container varies between the inlet and the outlet, with a minimum value at a point located between the inlet and the outlet in the first direction.

Description

Technical Field

[0001] The present invention relates generally to semiconductor processing and, more particularly, to apparatus and methods for providing precursors. Background Art

[0002] In the semiconductor industry, various processes are used to form a thin film of material on a substrate such as a silicon wafer. In chemical vapor deposition (CVD), reactant gases (also referred to herein as precursor gases) of different reactants are delivered to one or more substrates in a reaction chamber. The reactant gases react with each other in the reaction chamber to form a thin film on one or more substrates. In atomic layer deposition (ALD) processes, gaseous precursors are alternately and repeatedly supplied to a substrate or wafer to form a thin film of material on the wafer. A reactant is adsorbed on the wafer in a self-limiting process. Different, subsequently pulsed reactants react with the adsorbed material to form a monolayer of the desired material.

[0003] In some applications, the reactant gas is stored in a reactant source container in a gaseous form. In such applications, the reactant vapor is typically gaseous at ambient (i.e., normal) pressure and temperature. Examples of such gases include nitrogen, oxygen, hydrogen, and ammonia. However, in some cases, vapors of source chemicals ("precursors") that are liquid or solid (e.g., hafnium chloride) at ambient pressure and temperature are used. For some substances, the vapor pressure at room temperature is too low, so that they must be heated to produce a sufficient amount of reactant vapor (steam extraction method).

[0004] Some precursors desired for such thin film deposition processes have low volatility, such that even at temperatures above 100°C, the vapor pressure is insufficient to provide the required amount of precursor for the precursor deposition step within the time allotted to the process. This can be a problem, particularly in applications where the reaction chamber contains multiple substrates with high surface enhancement, because in such cases the effective surface area on which the precursor will be deposited may be 400 or more times greater than the surface area of ​​a flat substrate. Maintaining the precursor in gaseous form above the vaporization temperature for extended periods of time results in the precursor decomposing, thereby rendering it unsuitable for use in the deposition process.

[0005] As an alternative to vapor extraction, a carrier gas approach can be used, in which an inert gas is brought into contact with a precursor in liquid form contained in a precursor container. The precursor vapor diffuses into the inert gas and is carried out of the container along with the carrier gas and into the reactor chamber. In direct liquid injection, small droplets of the precursor are injected into a heated carrier gas, where they evaporate into the carrier gas and are swept through. The capacity of such devices is limited and they are not suitable for high surface enhancement or multi-wafer applications. In a bubbler, an inert gas is injected through the liquid precursor from the bottom of the container, forming bubbles in the precursor. As the bubbles rise, the precursor evaporates from the surface of the bubble toward the center of the bubble, so that once the bubble reaches the surface of the precursor, the inert gas is saturated with the precursor vapor. This requires a large amount of precursor to be provided in the container, which may lead to decomposition of unstable precursors.

[0006] Typical solid or liquid source precursor delivery systems include solid or liquid source precursor containers and heating devices (such as radiant heat lamps, resistance heaters, etc.). The container includes solid (such as powder form) or liquid source precursors. The heating device heats the container to increase the vapor pressure of the precursor gas in the container. The container has an inlet and outlet for making an inert carrier gas (such as N2) flow through the container. The carrier gas sweeps the precursor vapor through the container outlet and eventually reaches the substrate reaction chamber. The container generally includes an isolation valve for isolating the contents of the container from the container external fluid. Generally, an isolation valve is arranged upstream of the container inlet, and another isolation valve is arranged downstream of the container outlet. The precursor source container is generally supplied with a pipe extending from the inlet and outlet, an isolation valve on the pipe, and fittings on the valve, and the fittings are configured to be connected to the gas flow line of the remaining substrate processing equipment. Summary of the Invention

[0007] According to a first aspect of the present invention, there is provided a container for containing a precursor in liquid or solid form, the container comprising an inlet port for supplying gas to the interior of the container and an outlet port for removing gas from the interior of the container, the inlet port and the outlet port being spaced apart in a first direction, the container comprising an upper inner surface and an opposing bottom inner surface, the upper surface being arranged to face the precursor contained in the container during use, wherein the container is shaped so that the vertical distance between the top surface of the precursor and the upper inner surface of the container varies between the inlet and the outlet, having a minimum value at a point located between the inlet and the outlet in the first direction.

[0008] An advantage of embodiments of the present invention is that a container can be provided that can provide substantially complete saturation of the carrier gas flowing through the container with the precursor gas.

[0009] The minimum point may be located at a midpoint between the inlet and the outlet in the first direction.

[0010] The upper inner surface may have a spherical shape.The upper inner surface may have a conical shape.

[0011] The container may be formed such that a vertical distance between a top surface of the precursor and an upper inner surface of the container increases along the first direction from a minimum point toward the inlet or the outlet.

[0012] The container may be formed such that the vertical distance between the top surface of the precursor and the top inner surface of the container increases in any direction away from the minimum point. The vertical distance may increase continuously in any direction away from the minimum point. The vertical distance may increase in a stepwise manner in any direction away from the minimum point.

[0013] The upper inner surface may include a flat section centered at the minimum point, wherein a width of the flat section is less than two-thirds of a distance between the inlet and the outlet.

[0014] The width of the container may be less than twice the distance between the inlet and the outlet.

[0015] The container may be cylindrical in shape, and the minimum point may be located on the axis of the cylinder.

[0016] The container may comprise a receptacle for containing the precursor in solid or liquid form and a lid removably attached to the receptacle, wherein the upper inner surface of the container is the lower surface of the lid.

[0017] The inlet port and the outlet port may be provided in the cover.

[0018] The inlet port and the outlet port may be provided in a wall of the container.

[0019] At least one of the inlet port and the outlet port may have a slit shape, the width of the slit being greater than the height thereof.

[0020] At least one of the inlet port and the outlet port may include a plurality of holes arranged in a slit shape.

[0021] The container may include a sidewall and a base, and the vertical distance between the upper inner surface of the container and the base of the container may vary between a maximum value and a minimum value, and the height of the sidewall may be at least 1.5 times the difference between the maximum vertical distance and the minimum vertical distance.

[0022] The height of the side wall may be less than ten times the difference between the maximum vertical distance and the minimum vertical distance.

[0023] The width of the container may be at least five times the height of the container.

[0024] The width of the container may be at least ten times the height of the container.

[0025] The width of the container may be approximately the same as the height of the container. This may allow for a large supply of precursor to be provided.

[0026] The container may further comprise one or more heating elements for heating the container and / or a precursor that may be contained in the container.

[0027] According to a second aspect of the invention there is provided a method of providing a carrier gas substantially saturated with a precursor gas, the method comprising providing a container according to the first aspect, providing a precursor in solid or liquid form in the container, and flowing the carrier gas from an inlet to an outlet.

[0028] The container may include one or more heating elements, and the method may include heating the precursor contained in the container using the one or more heating elements before and / or while the carrier gas flows from the inlet to the outlet.

[0029] According to a third aspect of the invention, there is provided a lid for a container for containing a precursor in liquid or solid form, the lid comprising an inlet port for supplying gas to the interior of the container and an outlet port for removing gas from the interior of the container, the inlet port and the outlet port being spaced apart in a first direction, the lid comprising an upper surface and a lower surface, the lower surface being arranged to face the precursor contained in the container during use, wherein the lid is shaped so that the vertical distance between the top surface of the precursor and the lower surface of the lid varies between the inlet and the outlet, having a minimum value at a point located between the inlet and the outlet in the first direction.

[0030] An advantage of embodiments of the present invention is that a cover can be provided that can provide substantially complete saturation of a carrier gas flowing through a container with a precursor gas to which the cover is attached.

[0031] The minimum point may be located at a midpoint between the inlet and the outlet in the first direction.

[0032] The lower surface may have a spherical shape.The lower surface may have a conical shape.

[0033] The cover may be formed such that a vertical distance between a top surface of the precursor and a lower surface of the cover increases from a minimum point toward the inlet or the outlet along the first direction.

[0034] The cover may be formed so that the vertical distance between the top surface of the precursor and the lower surface of the cover increases in any direction away from the minimum point. The vertical distance may increase continuously in any direction away from the minimum point. The vertical distance may increase in a stepwise manner in any direction away from the minimum point.

[0035] The lower surface may include a flat section centered at the minimum point, wherein a width of the flat section is less than two-thirds of a distance between the inlet and the outlet.

[0036] The width of the cover may be less than twice the distance between the inlet and the outlet.

[0037] At least one of the inlet port and the outlet port may have a slit shape, the width of the slit being greater than the height thereof.

[0038] At least one of the inlet port and the outlet port may include a plurality of holes arranged in a slit shape.

[0039] This summary is provided to introduce a selection of concepts in a simplified form. These concepts are further described in detail in the detailed description of example embodiments of the present disclosure below. This summary is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to be used to limit the scope of the claimed subject matter. BRIEF DESCRIPTION OF THE DRAWINGS

[0040] Certain embodiments of the present invention will now be described by way of example with reference to the accompanying drawings, in which:

[0041] Figure 1a is a plan view of a lid of a container according to an embodiment of the present invention viewed toward an upper surface of the lid;

[0042] Figure 1b yes Figure 1a a perspective cutaway view of a portion of a cover;

[0043] Figure 1c It is taken along line AA Figure 1a a cross-sectional view of a cover;

[0044] Figure 2a is a cross-sectional view in a vertical plane of a container according to an embodiment of the present invention;

[0045] Figure 2b is a cross-sectional view in a vertical plane of a container according to an embodiment of the present invention, the container comprising a precursor;

[0046] Figure 2c is a cross-sectional view in a vertical plane of a container according to an embodiment of the present invention, the container having an upper inner surface with an offset spherical shape;

[0047] Figure 2d is a cross-sectional view in a vertical plane of a container according to an embodiment of the present invention, illustrating a gas flow path through the container;

[0048] Figure 3a is a cross-sectional view in a vertical plane of a comparative example of a precursor container not included in the present invention;

[0049] Figure 3b yes Figure 3a a plan view of the lid of the precursor container shown in ;

[0050] Figure 4The gas flow path from the inlet to the outlet of a container according to an embodiment of the present invention is shown. The drawn line represents the flow path taken, and the shading level of the line at any point represents the precursor gas saturation at that point;

[0051] Figure 5 Shown for Figure 3a The gas flow path of the precursor container shown in FIG;

[0052] Figure 6 is a cross-sectional view in a vertical plane of a container according to an embodiment of the present invention, the container having an upper inner surface having a conical shape;

[0053] Figure 7 is a cross-sectional view in a vertical plane of a container according to an embodiment of the present invention, the container having a conical upper inner surface and a flat section;

[0054] Figure 8 is a plan view of an upper inner surface of a container according to an embodiment of the present invention;

[0055] Figure 9 is a cross-sectional view in a vertical plane of a container according to an embodiment of the present invention, the container not including a removably attached lid;

[0056] Figure 10 is a cross-sectional view in a vertical plane of a container according to an embodiment of the present invention, wherein an inlet port and an outlet port are provided in a side wall of the container;

[0057] Figure 11 is a schematic diagram of a slit-shaped inlet or outlet port;

[0058] Figure 12 is a schematic diagram of an inlet port or an outlet port including a plurality of holes arranged in a slit shape;

[0059] Figure 13 is a cross-sectional view in a vertical plane of a container including a heating element according to an embodiment of the present invention.

[0060] It should be understood that the elements in the drawings are shown for simplicity and clarity and are not necessarily drawn to scale. For example, the sizes of some elements in the drawings may be exaggerated relative to other elements to help improve understanding of the illustrated embodiments of the present disclosure. DETAILED DESCRIPTION

[0061] Although certain embodiments and examples are disclosed below, those skilled in the art will appreciate that the invention extends beyond the specifically disclosed embodiments and / or uses of the invention and obvious modifications and equivalents thereof. Accordingly, it is intended that the scope of the disclosed invention should not be limited by the specific disclosed embodiments described below.

[0062] As used herein, the term "substrate" may refer to any underlying material or materials, including any underlying material or materials that can be modified or upon which a device, circuit, or film can be formed. A "substrate" can be continuous or discontinuous; rigid or flexible; solid or porous; and combinations thereof. A substrate can be in any form, such as a powder, a sheet, or a workpiece. Sheet-form substrates can include wafers of various shapes and sizes. Substrates can be made of semiconductor materials, including, for example, silicon, silicon germanium, silicon oxide, gallium arsenide, gallium nitride, and silicon carbide.

[0063] The continuous substrate may extend beyond the boundaries of the processing chamber in which the deposition process occurs. In some processes, the continuous substrate may be moved through the processing chamber, such that the process continues until the end of the substrate is reached. The continuous substrate may be supplied from a continuous substrate feed system to allow for the manufacture and output of the continuous substrate in any suitable form.

[0064] The illustrations presented herein are not intended to be actual views of any particular material, structure, or device, but are merely idealized representations used to describe embodiments of the present disclosure.

[0065] The specific embodiments shown and described are illustrative of the present invention and its best mode and are not intended to limit the scope of the various aspects and embodiments in any way. In fact, for the sake of brevity, the conventional manufacturing, connection, preparation and other functional aspects of the system may not be described in detail. In addition, the connecting lines shown in the various figures are intended to represent exemplary functional relationships and / or physical connections between the various elements. Many alternative or additional functional relationships or physical connections may exist in actual systems and / or may not exist in some embodiments.

[0066] It should be understood that the configurations and / or methods described herein are exemplary in nature, and these specific embodiments or examples should not be considered limiting, as many variations are possible. The specific routines or methods described herein may represent one or more of any number of processing strategies. Therefore, the various actions shown may be performed in the order shown, in other orders, or in some cases omitted.

[0067] The subject matter of the present disclosure includes all novel and nonobvious combinations and subcombinations of the various processes, systems and configurations, and other features, functions, acts, and / or properties disclosed herein, as well as any and all equivalents thereof.

[0068] refer to Figures 1a to 1c, shows a cover 1 according to an embodiment of the present invention. As will be described in more detail below, the cover 1 may be included in a container 20 (Figure 2) for containing a precursor in solid or liquid form. The cover 1 includes an inlet port (or inlet) 2 and an outlet port (or outlet) 3. The inlet port 2 and the outlet port 3 are spaced apart in a first direction x. The cover 1 has an upper surface 4, a lower surface 5, and a side surface 6 extending between the upper surface 4 and the lower surface 5. In some embodiments, the upper surface 4 is substantially planar, however, the present invention is not limited thereto, and the upper surface 4 may include a non-planar portion in some embodiments. The midpoint between the inlet port 2 and the outlet port 3 in the first direction is denoted as M, which is located on the lower surface 5.

[0069] The inlet port 2 and the outlet port 3 can each provide a conduit through the lid 1 by connecting the upper surface 4 and the lower surface 5. The inlet port 2 is configured to allow a carrier gas or an inert gas to be introduced into the container 20 (Figure 2), and the lid 2 is included in the container 20. The outlet port 3 is configured to allow a gas to exit the container therethrough. In some embodiments, the inlet port 2 and the outlet port 3 can extend along a z-direction perpendicular to the first direction x.

[0070] In some embodiments, the cover 1 may be substantially circular in shape when viewed in a direction toward the upper surface 4, however, the present invention is not limited to a substantially circular cover. In some embodiments, the cover 1 may be oval in shape. In some embodiments, the cover 1 may be square or rectangular in shape, or have a different shape.

[0071] Now refer to Figure 2a and 2b , the lid 1 is removably attached to the precursor supply receptacle 7. The lid 1 and the receptacle 7 together form a container 20. The receptacle 7 includes a base 8 and a side wall 9 extending upward from the base 8, and is configured to accommodate a precursor 10 in solid or liquid form having a surface S. The volume between the surface S of the precursor 10 and the lower surface 5 of the lid 1 (also referred to as the upper inner surface of the container 20) is referred to as the head space H. When the lid 1 is removably attached to the receptacle 7, a seal (not shown) can be provided between the lid 1 and the receptacle 7 to ensure that the contents of the receptacle are fixed therein. In one embodiment, the seal can be an O-ring that is disposed in a groove (not shown) formed in the receptacle 7. In another embodiment, the seal can be formed as a metal gasket or a V-shaped seal that is configured to be disposed between the receptacle 7 and the lid 1.

[0072] In some embodiments, the lid 1 and the receptacle 7 are formed of the same material so that the two components have substantially the same thermal conductivity and the same coefficient of thermal expansion. In some embodiments, the receptacle 7 is formed of a material that is different from the material used to form the lid 1. In some embodiments, the receptacle 7 and the lid 1 are formed of stainless steel. In other embodiments, the receptacle 7 and / or the lid 1 can be formed of a high nickel alloy, aluminum, or titanium. It should be understood by those of ordinary skill in the art that the receptacle 7 and the lid 1 can be formed of any other material that is sufficient to allow sufficient heat transfer to evaporate the precursor disposed within the receptacle 7 while being inert, or non-reactive with the precursor or contents within the receptacle 7; and strong enough to withstand the pressure difference between the inside and outside of the container.

[0073] refer to Figure 2b , the cover 1 may be shaped so that the vertical distance (i.e., the distance in the z direction) between the lower surface 5 (also referred to as the upper inner surface of the container 20) and the surface S of the precursor 10 is not constant on the lower surface 5, the surface S being a plane located below the lower surface 5 of the cover 1 and having the z direction as its normal. The cover 1 may be shaped so that the vertical distance at the midpoint M is smaller than the vertical distance at the first point P1 which is closer to the inlet than to the outlet, and is smaller than the vertical distance at the second point P2 which is closer to the outlet than to the outlet. In some embodiments, this condition may be satisfied by a cover 1 having a lower surface 5 in the shape of a spherical dome, wherein the center of the sphere of which the dome is a part is located on the same side of the cover 1 as the upper surface 4. In some embodiments, this condition may be satisfied by a cover 1 having a lower surface 5 in the shape of a cone ( Figure 3a ). Thus, the cap 1 according to an embodiment of the present invention forms a headspace H that is not cylindrical in shape but is higher around the circumference or edge of the cap than towards the midpoint.

[0074] refer to Figure 2c In some embodiments, the cover 1 (or the upper inner surface of the container) is shaped so that the vertical distance between the top surface of the precursor and the upper inner surface of the container varies between the inlet and the outlet, with the minimum point P located between the inlet port 2 and the outlet port 3 in the first direction. min The minimum point P is not necessarily the midpoint between the inlet port 2 and the outlet port 3. For example, the cover 1 (or the upper inner surface of the container) may have a spherical shape that is offset or a conical shape that is offset. The cover 1 (or the upper inner surface) may be shaped so that at the minimum point P min The vertical distance at is smaller than the vertical distance at a third point P3 between the minimum point and the entrance in the first direction, and smaller than the vertical distance at a fourth point P4 between the minimum point and the exit in the first direction.

[0075] refer to Figure 2d, the inlet port 2 and the outlet port 3 are configured to allow corresponding inlet gas lines and outlet gas lines to be coupled thereto. For example, in some embodiments, the inlet gas line 11 can be welded to the inlet port 2. In some embodiments, the outlet gas line 12 can be welded to the outlet port 2. The inlet gas line and the outlet gas line may include corresponding valves (not shown) for controlling the inlet / outlet gas flow. The skilled person will recognize that various means of attaching the gas lines to the inlet port 2 and the outlet port 3 are possible, such as (but not limited to) providing an interface component at the inlet port / outlet port configured to attach to a valve assembly.

[0076] Still refer to Figure 2d , the gas flow path F from the inlet port to the outlet port can be carried out as follows. The carrier gas or inert gas flows through the inlet port 2 into the interior of the container 20, for example, by opening a valve (not shown) located upstream of the inlet port 2. Just before entering the inlet port 2, the saturation of the carrier gas relative to the precursor gas can be substantially 0%. In some embodiments, just before entering the inlet port 2, the saturation of the carrier gas relative to the precursor gas can be non-zero. For example, two or more containers 20 can be provided, wherein the outlet port 3 of the first container is fluidly connected to the inlet port 2 of the second container. In such an arrangement, the gas entering the inlet port 2 of the second container can have a non-zero saturation relative to the precursor gas. When the carrier gas flows along the surface S of the precursor 10, the precursor vapor 13 diffuses into the carrier gas, and the mixture of the carrier gas and the precursor gas is sucked toward the outlet port 3. Relative to the saturation of the carrier gas at the inlet port 2, the saturation of the carrier gas at a specific position along the gas flow path from the inlet port 2 to the outlet port 3 increases as the time spent flowing along the surface of the precursor 10 increases. The time it takes for a gas to travel from the inlet port 2 to the outlet port 3 is called the residence time. The gas exiting the outlet port 3 is therefore a mixture of the carrier gas and the precursor gas. The saturation of the carrier gas with respect to the precursor gas at a specific temperature T is given by the partial pressure of the precursor gas divided by the vapor pressure of the precursor at that temperature. When the partial pressure equals the vapor pressure, full (100%) saturation is achieved.

[0077] Figure 3a and Figure 3bA comparative example of a container 107 having a cover 101, which is not included in the present invention, is shown. The cover 101 has a planar and parallel upper surface 104 and lower surface 105. The inlet port 102 provides gas to the interior of the container 107, and the outlet port 103 allows the gas to leave the container 107. The inlet port 102 and the outlet port 103 are separated in a first direction x'. The shape of the cover 101 is circular. The container 107 accommodates a precursor 110 having a surface S' that is planar and parallel to the lower surface 105. The shape of the head space H' is cylindrical. The gas flowing into the container 107 through the inlet port 102 can take various paths from the inlet 102 to the outlet 103. The residence time of a gas flow following a substantially straight path R1 from inlet 102 to outlet 103 will be less than the residence time of a gas flow following a path R2 that curves relative to R1 or a gas flow following a path R3 that substantially follows the circumference of the container from inlet 102 to outlet 103. Consequently, the gas flow along R1 will have a lower saturation of precursor vapor at outlet 103 than the gas flow along R2. This uneven distribution of residence time, depending on the flow path employed, results in the gas at outlet 103 not being fully saturated with precursor vapor, which reduces the efficiency of the semiconductor process in which the gas is to be used.

[0078] Now refer to Figure 2d In embodiments of the present invention, by providing a container 20 having an upper inner surface 5 (e.g., the lower surface 5 of the lid 1) having a shape that forms a headspace H, which is not cylindrical but rather is higher toward the circumference of the container 20 than toward the center of the container 20, the saturation of the carrier gas with respect to the precursor at the outlet port 3 can be substantially equal for all flow paths from the inlet port 2 to the outlet port 3. Towards the center of the container 20, where the gas flow path has a shorter residence time in the case of a cylindrical headspace, the reduced height of the headspace H provided by the container 20 according to embodiments of the present invention results in reduced conductivity and, therefore, a longer residence time. Therefore, in some embodiments, the container 20 can have an upper inner surface 4 (which can be the lower surface of the lid 1) shaped so as to provide a headspace H for which the distribution of residence times for various possible flow paths is substantially uniform. This can facilitate providing a gas at the outlet port 3 that has a saturation of at least 95%, and preferably at least 97%, with the precursor gas. Computational fluid dynamics-based simulations were performed to simulate the saturation of precursor gas along various gas flow paths of a container according to an embodiment of the present invention by calculating three aspects: flow (distribution) from the inlet port to the outlet port, evaporation rate (based on the driving forces: the precursor vapor pressure at the solid / liquid surface and the precursor partial pressure in the gas phase just above the surface), and transport (diffusion) in the gas flow.

[0079] The simulated container includes a lid having a lower surface having a spherical shape as described with respect to Figures 1 and 2. The maximum vertical distance from the surface of the precursor to the lower surface of the lid is 5 mm, and the minimum vertical distance from the surface of the precursor to the lower surface of the lid is 2.5 mm as measured at the midpoint. The maximum width (i.e., diameter) of the container is 200 mm. As a comparative example, the gas flow path of a container of the same size and a lid having a planar lower surface is simulated, wherein the constant vertical distance from the surface of the precursor to the lower surface of the lid is 3.75 mm. In each example, the depth of the precursor contained in the container is 15 mm. Figure 4 It can be seen that according to embodiments of the present invention, the saturation increases at substantially the same rate along different gas flow paths from the inlet to the outlet of the container, such that the saturation of all flow paths at the outlet is substantially equal. Figure 5 , for the comparative example, the saturation of different flow paths at the outlet varies. The average saturation at the outlet is calculated to be 94.5% for the comparative example and 98.5% for the precursor source assembly according to the embodiment of the present invention.

[0080] Refer again Figure 2a In some embodiments, the container 20 has dimensions such that the vertical distance between the lower surface 5 of the lid 1 or the upper inner surface 5 of the container 20 and the base 8 of the container 20 varies between a maximum value h1 and a minimum value h2, wherein the maximum vertical distance h1 (e.g., the height of the sidewall 9) is between 1.5 and 5 times the difference between the maximum value h1 and the minimum value h2. By providing the container 20 with such dimensions, the height of the headspace H can be limited to a limited range and have a non-cylindrical shape, so that the residence time of the carrier gas along various flow paths can be varied to cause substantially all of the gas phase to be saturated when it reaches the outlet port 3.

[0081] In some embodiments, the size of the container can be designed so that its width is at least five times the height of the container, preferably at least ten times or more the height of the container. In some embodiments, the size of the container can be designed to have a width that is at least five times the average height of the headspace, preferably at least ten times or more the average height of the headspace. The width can be less than 100 times the average height of the headspace. This can help provide a large surface area for picking up precursors by carrier gas. In embodiments where the inlet and outlet ports are located in the upper inner surface of the lid 1 or container 20, the width of the container 20 can be less than twice the distance between the inlet and outlet.

[0082] Reference Figure 6 In some embodiments, the lower surface 5 of the cover 1 or the upper inner surface of the container 20 may have a vertex at the midpoint M or at the minimum point P minThe conical shape at the point where the vertical distance between the lower surface 5 and the front surface S is from the midpoint M (or the minimum point P min ) increases in the direction toward the edge of the cover 1. Figure 7 In some embodiments (here shown with respect to a conical lower surface, but applicable to caps having other shapes, such as a spherical shape), the lower surface 5 includes a flat section 13 centered about the midpoint and substantially parallel to the surface S of the precursor, wherein the width w1 of the flat section is less than two-thirds of the distance w2 between the inlet and the outlet. The flat portion may be circular in shape. In some embodiments, the lower surface 5 includes a flat section that is not necessarily centered about the midpoint M, and all points on the flat section may be considered to be the minimum point P. min .

[0083] In some embodiments, the container 20 may be shaped such that the vertical distance between the surface S of the precursor 10 and the lower surface 5 of the lid 1 (or the upper inner surface of the container) is 100 mm / s along the first direction from the midpoint M or the minimum point P. min In some embodiments, the container 20 may be shaped so that the vertical distance between the surface S of the precursor 10 and the lower surface 5 of the lid 1 (or the upper inner surface of the container) measured in the horizontal plane increases away from the midpoint M (or the minimum point P). min ) increases continuously in any direction towards the side surface or edge 6 of the lid 1 or the side edge of the container 20. The vertical distance may increase continuously, for example, as described above with reference to Figure 2a In some embodiments, the vertical distance may increase in a stepwise manner. In some embodiments, the vertical distance may increase continuously in some areas of the lower surface 5 (or upper inner surface) and increase in a stepwise manner in other areas of the lower surface 5. Figure 8 In some embodiments, the container 20 may be shaped such that the lower surface 5 of the lid 1 or the upper inner surface of the container 20 has two areas, a first area A1 being an area enclosed by a circle centered at the midpoint and having the inlet port 2 and the outlet port 3 on its circumference, and a second area A2 being the remaining portion of the lower surface 5. The lower surface 5 may be shaped such that the vertical distance between the surface S of the precursor 10 and the lower surface 5 of the lid 1 continuously increases in the first area A1 and in the area A2 in any direction away from the midpoint toward the side surface or edge 6 of the lid 1. The lower surface 5 may be shaped such that the vertical distance between the surface S of the precursor 10 and the lower surface 5 of the lid 1 continuously increases in the first area A1 in any direction away from the midpoint toward the side surface or edge 6 of the lid 1, and such that the vertical distance between the surface S of the precursor 10 and the lower surface 5 of the lid 1 is constant in the second area A2.

[0084] refer to Figure 9In an embodiment of the present invention, container 20 does not include a removably attached lid 1 and can be a closed container having a sidewall 9 extending between an upper inner surface 5 and a base 8. Upper inner surface 5 can have the same properties as lower surface 5 of lid 1 as described herein. Container 20 has an upper outer surface 4, which can have the same properties as upper surface 4 of lid 1 as described herein.

[0085] refer to Figure 10 In an embodiment of the present invention, the container 20 (which may be as described in relation to Figure 9 The container 20 may be enclosed as described, or may include a lid 1 and a receptacle 7 as described above, and may have an inlet port 2 and an outlet port 3 located on the side wall 9 of the container 20 without passing through the lid 1 or the top surface 4, 5 of the container 20. The inlet port 2 and the outlet port 3 may be located at diametrically opposed positions and at the same height. The inlet port 2 and the outlet port 3 may each include a single hole. Figure 11 , the inlet port 2 and the outlet port 3 may each be slit-shaped, the height of which in the vertical direction is smaller than the width in the horizontal plane. Figure 12 , the inlet port 2 and the outlet port 3 may include a plurality of holes arranged in a slit shape.

[0086] refer to Figure 13 In some embodiments, the container 20 may include a heating element 13 configured to heat the container 20 and / or its contents. The heating element 13 may include one or more resistive heating elements for heating the container 20, which then transfers heat to the precursor 10. The heating element 13 may include one or more inductive heating elements for directly heating the precursor 10. The heating element 13 may include one or more thermoelectric elements. By heating the precursor 10 contained in the container 20, the vapor pressure of the precursor 10 may be increased, thereby increasing the amount of precursor vapor available for extraction with the carrier gas flow.

[0087] Embodiments of the present invention provide a method for providing a carrier gas that is substantially saturated with a precursor gas. The method may include the following steps. First, a container 20 according to an embodiment of the present invention is provided. A precursor in solid or liquid form is provided in the container and distributed so that its surface is substantially flat. The carrier gas flows from an inlet port 2 to an outlet port 3. Flowing the carrier gas from the inlet port 2 to the outlet port 3 may include opening a valve upstream of the inlet port 2 to allow the carrier gas to flow through the inlet port 2 into the container 20, and opening a valve downstream of the outlet port 3 to allow the carrier gas and the precursor gas to be drawn out of the container 20 through the outlet port 3. The inlet port 2 can be configured to be fluidically connected to a carrier gas supply line. The outlet port 3 can be configured to be fluidically connected to a gas line for delivering the precursor gas to, for example, a reaction chamber for processing one or more substrates. The outlet port 3 can be configured to be fluidically connected to a gas line for delivering the precursor gas to an accumulator container for collecting and storing the precursor gas, which will be supplied to the reaction chamber in a controlled manner for processing one or more substrates.

[0088] The container may include one or more heating elements, and the method may further include the step of heating the precursor container and / or the precursor contained therein before and / or during the step of flowing the carrier gas.

[0089] The container may include a resupply inlet for resupplying the precursor in solid or liquid form to the container. This can help maintain a relatively constant precursor surface level within the container. The inlet may be, for example, in the base of the container, a sidewall of the container, or a top surface or lid of the container. The method may also include the step of supplying the precursor in solid or liquid form to the container through the resupply inlet.

[0090] The precursor may include one or more of: HfCl4, ZrCl4, MoCl5, tetrakis(ethylmethylamido)zirconium (TEMAZr), tetrakis(ethylmethylamido)hafnium (TEMAHf), trimethylaluminum (TMA), trimethylborate (TMB), fluorotriethoxysilane (FTES), tetrakis-dimethylamidotitanium (TDMAT), tetrakis-diethylamido (TDEAT), CuTMVS, diethylsilane, and / or triethyl phosphate (TEPO). The carrier may contain nitrogen and / or argon.

Claims

1. A container for containing a precursor in liquid or solid form, the container comprising an inlet port for supplying gas to the interior of the container and an outlet port for removing gas from the interior of the container, the inlet port and the outlet port being spaced apart in a first direction, the container comprising an upper inner surface and an opposing bottom inner surface, the upper surface being arranged to face the precursor contained in the container in use, wherein The container is shaped such that a vertical distance between a top surface of the precursor and an upper inner surface of the container varies between the inlet and the outlet, having a minimum value at a point between the inlet and the outlet in the first direction.

2. The container according to claim 1, wherein The minimum point is located at a midpoint between the inlet and the outlet in the first direction.

3. The container according to claim 1 or 2, wherein The upper inner surface has a spherical shape.

4. The container according to claim 1 or 2, wherein The upper inner surface has a conical shape.

5. A container according to any preceding claim, wherein The container is formed such that a vertical distance between a top surface of the precursor and an upper inner surface of the container increases along the first direction from the minimum point toward the inlet or outlet.

6. The container according to claim 5, wherein The container is formed such that a vertical distance between a top surface of the precursor and a top inner surface of the container increases in any direction away from the minimum point.

7. The container according to claim 5 or 6, wherein The vertical distance increases continuously in any direction away from the minimum point.

8. The container according to claim 5 or 6, wherein The vertical distance increases in a step-wise manner in any direction away from the minimum point.

9. The container according to any one of claims 1 to 4 or 8, wherein The upper inner surface includes a flat section centered at the minimum point, wherein a width of the flat section is less than two-thirds of a distance between the inlet and the outlet.

10. A container according to any preceding claim, wherein The width of the container is less than twice the distance between the inlet and the outlet.

11. A container according to any preceding claim, wherein The container is cylindrical in shape, and wherein the minimum point is located on the axis of the cylinder.

12. A container according to any preceding claim, comprising a receptacle for containing the precursor in solid or liquid form and a lid removably attached to the receptacle, wherein The upper inner surface of the container is the lower surface of the lid.

13. The container according to claim 12, wherein The inlet port and the outlet port are provided in the cover.

14. A container according to any preceding claim, wherein At least one of the inlet port and the outlet port has a slit shape, the width of the slit being greater than the height thereof.

15. A container according to any preceding claim, wherein At least one of the inlet port and the outlet port includes a plurality of holes arranged in a slit shape.

16. A container according to any preceding claim, wherein The container comprises a sidewall and a base, wherein a vertical distance between an upper inner surface of the container and the base of the container varies between a maximum value and a minimum value, and wherein a height of the sidewall is between 1.5 times and 10 times the difference between the maximum vertical distance and the minimum vertical distance.

17. A container according to any preceding claim, wherein The width of the container is at least ten times the height of the container.

18. A container according to any preceding claim, further comprising one or more heating elements for heating the container and / or a precursor receivable therein.

19. A method of providing a carrier gas substantially saturated with a precursor gas, the method comprising providing a container according to any preceding claim, providing a precursor in solid or liquid form in the container, and flowing the carrier gas from an inlet to an outlet.

20. The method according to claim 19, wherein The container includes one or more heating elements, and the method includes heating the precursor contained in the container using the one or more heating elements before and / or while the carrier gas flows from the inlet to the outlet.

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