System and method for implementing digital flatbed printing scan sequencing

Abstract

A digital flat panel printing system includes adjacent scan areas, an exposure unit positioned over the scan areas, a memory, and a processing device operatively coupled to the memory. The exposure unit includes a first exposure unit associated with a first scan area and a second exposure unit associated with a second scan area. The processing device is to initiate a digital flat panel printing process to pattern a substrate disposed on a platform according to an instruction. The processing device is further to execute, at a first time, a first pass of the first exposure unit over a stitching area at an interface of the first scan area and the second scan area. The processing device is further to execute, at a second time that is less than forty seconds different from the first time, a second pass of the second exposure unit over the stitching area.

Description

Technical Field

[0001] This manual generally relates to the manufacture of electronic components. More specifically, this manual relates to digital offset printing. Background Technology

[0002] Flat panel printing is used to manufacture semiconductor components and display devices, such as flat panel displays. Examples of flat panel displays include thin-film display devices, such as, for example, liquid crystal displays (LCDs) and organic light-emitting diode (OLED) displays. Large-area substrates can be used to manufacture flat panel displays for use with computers, touch panel devices, personal digital assistants (PDAs), cellular phones, television monitors, and the like.

[0003] In digital offset printing, multiple exposure units are used to increase throughput, with each unit responsible for a portion of the printing area. However, delays in scanning at boundaries can cause feature aberrations in the formed area. This can result in visible boundaries between areas printed by different exposure units. For display devices, visible boundaries are defects that can render the manufactured display unusable. Summary of the Invention

[0004] The following is a brief overview of this disclosure in order to provide a basic understanding of some aspects of this disclosure. This overview is not an exhaustive summary of this disclosure. It is not intended to identify any essential or key elements of this disclosure, nor is it intended to depict any category of particular embodiments of this disclosure or any category of the claims. Its sole purpose is to present some concepts of this disclosure in a simplified form as a prelude to the more detailed description that follows.

[0005] According to at least one embodiment, a digital flatbed printing system is provided. The digital flatbed printing system includes a plurality of scanning areas, including a first scanning area and a second scanning area adjacent to the first scanning area. The digital flatbed printing system further includes a plurality of exposure units located above the plurality of scanning areas. The plurality of exposure units includes a first exposure unit associated with the first scanning area and a second exposure unit associated with the second scanning area. The digital flatbed printing system further includes memory and at least one processing device operatively coupled to the memory. The at least one processing device is configured to initiate a digital flatbed printing process to pattern a substrate disposed on a platform according to instructions. The at least one processing device is further configured to perform a first pass of the first exposure unit over a splicing area at the interface between the first and second scanning areas at a first time. The at least one processing device is further configured to perform a second pass of the second exposure unit over the splicing area at a second time, less than forty seconds different from the first time.

[0006] According to at least one embodiment, a system is provided. The system includes memory and at least one processing device operatively coupled to the memory. The at least one processing device is configured to initiate a digital flatbed printing process to pattern a substrate according to instructions. The at least one processing device is further configured to perform a first pass of a first exposure unit over a splicing area at the interface of a first scan area of ​​a plurality of scan areas and a second scan area of ​​a plurality of scan areas at a first time. The at least one processing device is further configured to perform a second pass of a second exposure unit over the splicing area at a second time, less than forty seconds later than the first time.

[0007] According to at least one embodiment, a method is provided. The method includes initiating a digital flatbed printing process via a processing device to pattern a substrate according to instructions. The method further includes performing a first pass of a first exposure unit over a splicing area at the interface of a first scan area of ​​a plurality of scan areas and a second scan area of ​​a plurality of scan areas at a first time. The method further includes performing a second pass of a second exposure unit over the splicing area at a second time, less than forty seconds later than the first time. Attached Figure Description

[0008] The aspects and embodiments of this disclosure will be more fully understood from the detailed description and accompanying drawings given below, which are intended to illustrate the aspects and embodiments by way of example and without limitation.

[0009] Figure 1 This is a top-down view of a digital flatbed printing system according to some implementations.

[0010] Figures 2A to 2DThis is a top-down view, according to some embodiments, showing the scan path of a substrate through a single digital flatbed printing exposure unit of a digital flatbed printing system.

[0011] Figures 3A to 3D This is a top-down view, according to some embodiments, showing the scan path of a substrate through a single digital flatbed printing exposure unit of a digital flatbed printing system.

[0012] Figures 4A to 4C The figure illustrates an example of digital flatbed printing exposure unit boundary smoothing according to some implementation methods.

[0013] Figure 5 This is a diagram of an example scanning configuration of a digital flatbed printing exposure unit in a single-bridge implementation according to some embodiments.

[0014] Figures 6A to 6B This is a diagram of an example scan sequence of a digital flatbed printing exposure unit over time, according to some implementation methods.

[0015] Figure 7 The figure illustrates features formed on a substrate by a digital flatbed printing process according to some embodiments.

[0016] Figure 8 This is a flowchart of a method for implementing digital flatbed printing scanning sorting according to some embodiments.

[0017] Figure 9 This is a block diagram of a digital flatbed printing system according to some implementation methods.

[0018] Figure 10 This is a block diagram illustrating a computer system according to certain embodiments. Detailed Implementation

[0019] Digital flatbed printing can be used to generate patterns (e.g., etched masks for digital alignment) onto a substrate surface without using photomasks (e.g., through maskless flatbed printing). Digital flatbed printing technologies (e.g., Texas Instruments'® programmable light steering technology) enable high-speed, high-resolution maskless flatbed printing solutions for printed circuit board (PCB) patterning, soldering masks, flat panel displays, laser marking, and other digital exposure systems that benefit from high speed and precision. Digital flatbed printing exposes patterns directly onto a photoresist film without using contact masks (e.g., photomasks). This reduces material costs, improves production rates, and allows for rapid pattern changes. Direct exposure increases productivity compared to narrow laser beams or masking systems. An advantage of digital flatbed printing is the ability to change the flatbed printing pattern from one run to the next without the cost of generating a new photomask. Illustratively, digital flatbed printing can be used to perform large-area patterning during electronic component manufacturing.

[0020] In digital offset printing, multiple digital offset printing exposure units (“exposure units”) can be used to improve the throughput of digital offset printing tools. Conventional exposure units can print or expose rectangular non-overlapping areas or cut layers. Cut layers can be used as filters to instruct layout processing software to maintain the pattern to be printed on the cut layer associated with a particular exposure unit. Each of the multiple exposure units can be responsible for a portion of the printing area and for different cut layers. Scanning at the boundaries of exposure units can be delayed from one scan to another. This delay can lead to non-uniformity (e.g., non-uniformity, inconsistency, irregularity) at the boundaries of exposure units (e.g., “joining areas”). This non-uniformity can reduce yield and thus decrease the output value.

[0021] Exposure units often sequentially scan sub-sections of a printed area to increase throughput. For example, an exposure unit might scan a first portion of the printed area, followed by an adjacent second portion, an adjacent third portion, and so on. Because adjacent exposure units move together across the printed area, sequential scanning of sub-sections causes scanning delays at exposure unit boundaries (e.g., at splicing areas). These scanning delays can lead to feature anomalies formed during scanning. Such anomalies can cause changes in critical dimensions, which in turn necessitates scrapping products, thus reducing overall yield.

[0022] This disclosure addresses these and other drawbacks of the prior art by using digital flatbed printing scanning sequence to reduce the delay between scans of the splicing area at the interface between exposure unit boundaries. Reducing the delay between splicing area scans can reduce anomalies in the printed features in the splicing area and can result in a gradual transition between the pairs of exposure units. According to the embodiments described herein, at least two different scan sequences can be used to perform digital flatbed printing scanning. In some embodiments, an inside-out scan sequence can be implemented, such that the scans of the splicing area at the boundary of two adjacent scan areas by two adjacent exposure units occur sequentially, one scan following the next. In some embodiments, a similar outside-in scan sequence can be implemented. First scanning the splicing area with a first exposure unit and then scanning the splicing area with a second exposure unit reduces the delay between scans, resulting in a more uniform feature formation on the substrate, particularly at the splicing area. In some embodiments, the delay between scanning the splicing area with the first exposure unit and scanning the splicing area with the second exposure unit is less than forty seconds.

[0023] In some implementations, a first sub-region of the scanning area of ​​a first exposure unit near the edge of the scanning area (e.g., within the boundary of the exposure unit) is scanned, followed by a second sub-region near the opposite edge of the scanning area. The first and second sub-regions may be spliced ​​regions associated with the scanning area and adjacent scanning areas. A third sub-region near the first sub-region is scanned, followed by a fourth sub-region near the second sub-region, and so on, until all sub-regions of the scanning area have been scanned. The sequence described above can be referred to as an outside-in scanning sequence. Further details will be provided below regarding... Figure 2A With Figure 2D Describe further details about the scanning sequence from the outside in.

[0024] In some implementations, a first sub-region of the scanned region (e.g., an inner sub-region, a central sub-region, etc.) close to the center line of the scanned region is scanned, followed by a second sub-region close to the first sub-region. Subsequently, a third sub-region is scanned close to the first sub-region on the side opposite the first and second sub-regions. Scanning continues until both edge sub-regions of the scanned region have been scanned. Edge sub-regions may be spliced ​​regions associated with the scanned region and adjacent scanned regions. The sequence described above can be referred to as an inside-out scan sequence. Further details will follow below regarding... Figure 3A With Figure 3D Describe further details about the scan sequence from the inside out.

[0025] The aspects and embodiments of this disclosure result in technical advantages over other approaches. For example, as mentioned above, non-uniformity at the boundaries of a pair of adjacent exposure units (e.g., at the splicing area) and / or at the boundaries of a pair of scans associated with a given exposure unit can be reduced. Thus, improved photolithography for patterned substrates can be achieved.

[0026] Figure 1 This is a top-down view of a digital offset printing system (“System”) 100 according to some embodiments. As shown, the digital offset printing system 100 includes a platform assembly 110, which includes a substrate (e.g., a granite substrate), a platform, and a substrate disposed on the platform. The substrate may be a glass plate, a wafer, a PCB, or other type of substrate. The substrate may correspond to or be positioned within a digital offset printing or scanning area having several scanning areas, including scanning areas 112-1 through 112-4. The left side portion of the platform assembly 110 corresponds to a first bridge 114-1 above the platform assembly 110, and the right side portion of the platform assembly 110 corresponds to a second bridge 114-2 above the platform assembly 110. Exposure units are attached to bridges 114-1 and 114-2. In some embodiments, the length of each bridge 114-1 and 114-2 may vary between about 500 mm and about 1000 mm. For example, the length of each bridge 114-1 and 114-2 may be about 750 mm.

[0027] The substrate may include a photoresist material disposed on the material to be etched. The photoresist material may be a positive photoresist material (i.e., where the portion of the photoresist material exposed to light becomes soluble in the photoresist developer) or a negative photoresist material (i.e., where the portion of the photoresist material exposed to light becomes insoluble in the photoresist developer). Therefore, a photoresist pattern can be formed by removing designated portions of the photoresist material. In some embodiments, the material to be etched is a conductive material (e.g., a metal). For example, a conductive material may be molybdenum. After removing the designated areas of the photoresist material, the now-exposed material can be etched according to the photoresist pattern. For example, wiring may be formed during the etching process. Alternatively, the patterned material may be photosensitive itself, thereby eliminating the need to add a photoresist layer and performing the subsequent etching process.

[0028] To perform photoresist patterning, the digital flatbed printing system 100 further includes a first column of digital flatbed printing exposure units (“exposure units”) suspended from a first bridge 114-1, and a second column of exposure units suspended from a second bridge 114-2. For example, the first column of exposure units includes exposure units 1 through 11, and the second column of exposure units includes exposure units 12 through 22. Therefore, in this illustrative example, a total of 22 exposure units are shown. However, Figure 1 The number of exposure units shown should not be considered limiting, and the digital flatbed printing system 100 may include any suitable number of exposure units according to the embodiments described herein.

[0029] Each exposure unit may include a lens assembly that projects an image onto a photoresist material on a substrate. Each lens assembly is shown as the lower right corner adjacent to its associated scanning area. For example, lens assembly 120 of exposure unit 1 is associated with scanning area 112-1. In some embodiments, each lens assembly is approximately 4 mm high and approximately 3 mm wide. However, according to the embodiments described herein, each lens assembly may have any suitable size.

[0030] During digital offset printing, each exposure unit moves relative to the substrate to expose a region of the substrate (e.g., a rectangular region) to electromagnetic radiation, such as light (e.g., ultraviolet, near-ultraviolet, etc.). During scanning, the exposure unit exposes the corresponding scan area according to a programmed scan path. The exposure unit is not moved above the platform assembly 110, which can move in the XY direction below the exposure unit according to the programmed scan path. Because the field of view of the lens assembly (e.g., lens assembly 120) can be smaller than its associated scan area (e.g., scan area 112-1), the platform assembly 110 may have to repeatedly move back and forth until the entire scan area (e.g., scan area 112-1) is printed. The projection lens assembly 120 scans scan area 112-1, and trimmings may occur based on the sharpness of scan area 112-1, except for the first and last scans. A larger number of exposure units results in fewer scans that can be performed, which can correspond to higher throughput.

[0031] Each exposure unit can be responsible for a different scanning area, which may or may not overlap with adjacent scanning areas of other exposure units. To avoid a sudden transition from a first scanning area to a second scanning area adjacent to the first scanning area (attached to the same bridge or a different bridge), the exposure unit corresponding to the first scanning area can encroach on the second scanning area. Similarly, the exposure unit corresponding to the second scanning area can encroach on the first scanning area. For example, exposure unit 1 can encroach on scanning areas 112-2 and / or 112-3, and exposure unit 2 can encroach on scanning areas 112-1 and / or 112-4. Thus, shared exposure can be observed at the boundaries or "stitching lines" between adjacent exposure units on the same bridge and / or exposure units on different bridges.

[0032] The splicing line can be defined by a trimming layer, which can be a software-defined layer that sets the scan path boundary for each exposure unit during the movement of the platform assembly 110. Due to imperfect printing conditions, the splicing line can be visible on the substrate after printing. For example, if the actual position of the exposure unit shifts by about 1 micrometer, a 1-micrometer-wide gap or double exposure band may exist near the splicing line. Although the splicing line is shown as a straight line in this illustrative example (making the scan area rectangular), the splicing line can be curved (e.g., wavy).

[0033] The path 130 of the exposure unit 120-1 is illustrated. Path 130 can travel in a back-and-forth manner. More specifically, during scanning, the platform assembly 110 moves across the scan area 120-1 in the X direction (i.e., from right to left), during which time the exposure unit 120-1 patterns a line across the scan area 120-1. After reaching the left edge of the scan area 112-1, the platform assembly 110 moves in the Y direction (i.e., up or down) and then moves back in the X direction (i.e., from left to right) to pattern another line across the scan area 120-1. The platform assembly 110 then moves again in the Y direction (i.e., up or down) and then again in the X direction (i.e., from right to left). Path 130 can travel in this back-and-forth manner until the entire scan area 120-1 has been scanned, at which point a complete image has been patterned on the substrate. The image can then be developed for substrate etching. According to the embodiments described herein, the distance "Y1" that the platform travels in the Y direction during scanning can be any suitable distance. In some embodiments, Y1 can vary between about 150 mm and about 180 mm. For example, Y1 can be about 164 mm. In embodiments, the scanning distance of each exposure unit in the X direction corresponds to the length of bridges 114-1 and 114-2. According to the embodiments described herein, the total width "Y2" of the scanning area can be any suitable width. In some embodiments, "Y2" can vary between about 1600 mm and about 2000 mm. For example, Y2 can be about 1800 mm. Due to differences in substrate size, the travel distance (e.g., in the X direction) for each scan can be different. For example, in some embodiments, the substrate comprises an 8-inch circular wafer. As another example, in some embodiments, the substrate comprises a 12-inch circular wafer.

[0034] In some implementations... Figure 1 The scanning process shown can be used to produce a display (e.g., a flat panel display). In some embodiments, the display is a liquid crystal display (LCD). Further details regarding the exposure unit 120-1 of scan path 130 will now be referenced below. Figures 2A to 2D describe.

[0035] Figures 2A to 2D These are top-down views 200A-200D of the scanning path from the outside to the inside of a scanning area 220 of a substrate through a single digital flatbed printing exposure unit (“exposure unit”) 210 of a digital flatbed printing system, according to some embodiments. The exposure unit 210 may be, for example, as referenced above. Figure 1The described digital flatbed printing system 100 includes an exposure unit 120-1. A substrate is disposed on a platform (not shown). In some embodiments, a first designated area to be scanned (e.g., a sub-region of the scanning area 220) may be located near the edge of the scanning area 220.

[0036] Figure 2A The diagram shows the exposure unit 210 and the scanning area 220 of the substrate before the first scan is performed using the exposure unit 210. Before performing the first scan, the edge 222 of the scanning area 220 can be aligned with the edge 212 of the exposure unit 210. The platform moves the substrate in the XY direction according to the digital flatbed printing scanning program, thereby performing multiple scans across the scanning area 220.

[0037] Figure 2B The formation of scan region 230-1 within scan region 220 after the first scan is performed using exposure unit 210 is illustrated. More specifically, the platform moves the substrate in the positive X direction below exposure unit 210 to form scan region 230-1. In some embodiments, scan region 230-1 and / or scan region 230-2 correspond to a stitching region associated with scan region 220 and adjacent scan regions. Scan region (such as scan region 230-1) may be referred to as a sub-region of scan region 220. The amount of time that exposure unit 210 uses to scan scan region 230-1 may be referred to as scan duration.

[0038] Figure 2C The formation of the scan area 230-2 after performing a second scan using the exposure unit 210 is shown. More specifically, after performing a first scan using the exposure unit 210, the platform moves the substrate in the negative Y direction to align the exposure unit 210 with the next designated area, and then the platform moves the substrate under the exposure unit 210 in the negative X direction to form the scan area 230-2.

[0039] Figure 2D The formation of scan region 230-3 after performing a third scan using exposure unit 210 is shown. More specifically, after performing a second scan using exposure unit 210, the platform moves the substrate in the positive Y direction to align exposure unit 210 with the next designated area, and then the platform moves the substrate under exposure unit 210 in the positive X direction to form scan region 230-3. By forming scan regions 230-4, 230-5, and 230-6, additional scans (such as fourth, fifth, and sixth scans) can be performed to complete the scan.

[0040] During the scanning process described above, one or more "mura" issues may be observed. Mura is a Japanese term that generally refers to any visible changes that occur across the display and are attributable to the scanning process.

[0041] One example of clouding is "scan clouding," which occurs after each scan. For instance, one type of scan clouding is illumination inhomogeneity, where the exposure field of the exposure unit is inconsistent (e.g., the top edge of the exposure field has a different illumination field than the bottom edge). More specifically, each time a scan is performed to scan lines or "draw stripes," the top edge of the scan will be brighter or darker than the bottom edge. This can adversely affect patterning dimensions. Another example of clouding is "vibration clouding," where vibrations caused by operating the digital offset printing system can cause the exposure unit to vibrate, resulting in scan instability. Since the vibrations of the exposure unit may not be spatially synchronized, this can lead to visible variations across the display.

[0042] Another example of cloudiness is "boundary cloudiness," where a sudden change in appearance can be observed at the boundary or edge of an area scanned by one exposure unit and an adjacent area scanned by another exposure unit. For example, boundary cloudiness can occur at the boundary between areas scanned by a pair of adjacent exposure units across a given bridge (e.g., in...). Figure 1 Boundary cloudiness can occur at the boundary between scanned areas 112-2 and 112-4. As another example, boundary cloudiness can occur at the boundary between areas scanned by a pair of adjacent exposure units corresponding to different bridges (e.g., in...). Figure 1 It appears at the boundary between the scanned areas 112-1 and 112-2.

[0043] Various microscopic and / or macroscopic causes can exist for boundary cloudiness. For example, if an exposure cell is emitting more light during scanning compared to its neighboring cells, a sudden change in the linewidth of the printed line can be observed across the boundaries between exposure cells. As another example, if an exposure cell is out of focus compared to other exposure cells, the photoresist sidewall profile corresponding to each exposure cell can be different. For instance, an exposure cell with better focus can have more vertical sidewalls compared to the more sloping sidewalls of an exposure cell with poor focus. Thus, problems can exist at the boundaries of adjacent scan areas.

[0044] As will be described in further detail herein, cloud patches (e.g., boundary cloud patches) can be sorted by performing the scan ordering described herein (such as that described above). Figures 2A to 2D The described sequence from the outside in, or the following text about... Figures 3A to 3D The described inside-out sequence is used to reduce delays between scans of spliced ​​areas at the edges of the scanned area. For example, the digital lithography sequence described herein can be performed to create a smooth transition between areas scanned by different exposure units (e.g., maintaining critical dimensions across areas).

[0045] In some implementations, performing the sequencing described herein includes performing dose mixing, where dose refers to the amount of radiation or light exposed to a region. For dose mixing, the intensity of the light source can be adjusted during scanning one or more portions of the region associated with the exposure unit. Alternatively or additionally, the number of passes applied to different portions of the region associated with the exposure unit can be varied to provide different exposure levels through the exposure unit. For example, a first exposure unit may apply 100% of the target light intensity to achieve the full dose for the majority of the region that the first exposure unit is responsible for. However, for a portion of the region that the first exposure unit is responsible for (such as a stitching region), the first exposure unit may apply 50% of the target light intensity to provide half the dose. A second exposure unit may extend into the region that the first exposure unit is responsible for (e.g., the stitching region) and may apply 50% of the target light intensity to that portion of the region that receives 50% of the dose through the first exposure unit. Thus, the dose or exposure of the two exposure units is effectively “mixed” for that portion of the region, such that it receives a partial dose from one exposure unit and a partial dose from the other. Dose mixing can be achieved by performing “local multiple passes” at the boundaries of the corresponding scanned regions. More specifically, multiple passes of the scan can be performed around the boundary to achieve a dose mixing effect.

[0046] Figures 3A to 3D These are top-down views 300A-300D of the scanning path from the inside out through the scanning area 320 of a substrate passing through a single digital flatbed printing exposure unit (“exposure unit”) 310 of a digital flatbed printing system, according to some embodiments. The exposure unit 310 may be, for example, as referenced above. Figure 1 The described digital flatbed printing system 100 includes an exposure unit 120-1. A substrate is disposed on a platform (not shown). In some embodiments, a first designated area to be scanned (e.g., a first sub-region of the scan area 320) may be close to the horizontal centerline of the scan area 320 (e.g., the centerline in the X direction).

[0047] Figure 3A The formation of scan region 330-1 within scan region 320 after the first scan is performed using exposure unit 310 is illustrated. More specifically, the platform moves the substrate in the positive X direction below exposure unit 310 to form scan region 330-1. Before performing the first scan, the edge 322 of scan region 320 can be aligned with the edge 312 of exposure unit 310. The platform moves the substrate in the XY direction according to the digital flatbed printing scanning program, thereby performing multiple scans across scan region 320. The amount of time that exposure unit 310 uses to scan scan region 330-1 can be referred to as scan duration.

[0048] Figure 3BThe formation of the scan area 330-2 after performing a second scan using the exposure unit 310 is shown. More specifically, after performing a first scan using the exposure unit 310, the platform moves the substrate in the positive Y direction to align the exposure unit 310 with the next designated area, and then the platform moves the substrate under the exposure unit 310 in the negative X direction to form the scan area 330-2.

[0049] Figure 3C The formation of the scan area 330-3 after performing a third scan using the exposure unit 310 is shown. More specifically, after performing a second scan using the exposure unit 310, the platform moves the substrate in the negative Y direction to align the exposure unit 310 with the next designated area, and then the platform moves the substrate under the exposure unit 310 in the positive X direction to form the scan area 330-3.

[0050] Figure 3D The formation of additional scan areas 330-4, 330-5, and 330-6 after the fourth, fifth, and sixth scans are performed using exposure unit 310 is illustrated. More specifically, the platform moves the substrate back and forth in the Y direction to align exposure unit 310 with the next designated area. The platform moves the substrate back and forth in the X direction to form the additional scan areas. In some embodiments, scan areas 330-5 and 330-6 correspond to stitching areas associated with scan area 320 and adjacent scan areas.

[0051] Figures 4A to 4C Figures 400A-400C illustrate examples of edge smoothing for digital flatbed printing exposure units (“exposure units”) according to some embodiments. Exposure unit edge smoothing can be achieved by performing exposure unit edge shifting and / or dose mixing. For example, Figures 400A-400C may each correspond to a clipping layer that defines the boundary of the exposure unit.

[0052] exist Figure 4A Figure 400A illustrates a first scan region 410-A corresponding to a first exposure unit and a second scan region 420-A corresponding to a second exposure unit, separated by a boundary 415. The first and second exposure units can be adjacent exposure units attached to the same bridge. For example, the first exposure unit can correspond to... Figure 1 Exposure unit 1, and the second exposure unit can correspond to Figure 1 Exposure unit 2. Alternatively, the first and second exposure units can be adjacent exposure units attached to different bridges. For example, the first exposure unit can correspond to Figure 1 Exposure unit 1, and the second exposure unit can correspond to Figure 1 Exposure unit 12.

[0053] In this example, there is no exposure unit boundary smoothing between the first scan region 410-A and the second scan region 420-A. More specifically, the first exposure unit is 100% responsible for scanning in the first scan region 410-A up to boundary 415, and subsequently, the second exposure unit is 100% responsible for scanning in the second scan region 420-A up to boundary 415. In other words, the first scan region 410-A receives 100% of the dose from the first exposure unit, and the second scan region 420-A receives 100% of the dose from the second exposure unit.

[0054] exist Figure 4B Figure 400B illustrates a first scan region 410-B corresponding to a first exposure unit and a second scan region 420-B corresponding to a second exposure unit. Here, smoothing of the exposure unit boundary between the first scan region 410-B and the second scan region 420-B has resulted in jagged edges. More specifically, the first exposure unit is programmed to extend into the original scan region corresponding to the second exposure unit (e.g., Figure 4A The second exposure unit is programmed to extend into the original scan area corresponding to the first exposure unit (e.g., scan area 410-B) and the second exposure unit is programmed to extend into the original scan area corresponding to the first exposure unit (e.g., scan area 410-B). Figure 4A The serrations are incorporated into the scanning area 410-A. Figure 4B The boundary is shown through vertical boundaries 430-1 to 430-4 and horizontal boundaries 435-1 to 435-3. Boundaries 430-1 to 430-4 and 435-1 to 435-1 may not be visible and are provided for illustration. Figure 3B The exposure unit boundaries are smoothed as shown. The mixed dose region is defined between vertical boundaries 430-1 and 430-4. Regarding the region defined by horizontal boundary 435-1, the first exposure unit provides 75% of the dose and the second exposure unit provides 25% of the dose. Regarding the region defined by horizontal boundary 335-2, both the first and second exposure units provide 50% of the dose. Regarding the region defined by horizontal boundary 335-3, the first exposure unit provides 25% of the dose and the second exposure unit provides 75% of the dose.

[0055] Figure 4BThe boundary smoothing shown can be achieved by performing exposure unit boundary shifting and / or dose mixing. Regarding exposure unit boundary shifting, multiple passes can be performed to achieve jagged blending. In this illustrative example, four passes can be performed, where the exposure unit boundary is shifted after each pass (i.e., four-pass boundary shifting). For example, in the single-bridge case, the exposure unit boundary can be shifted vertically (e.g., by vertically shifting the trimmed layer), and in the dual-bridge case, the exposure unit boundary can be shifted horizontally (e.g., by horizontally shifting the trimmed layer). Regarding dose mixing, when performing a single pass, “local multiple passes” can be performed around the original boundary 415 to provide a specified dose to each of the exposure units. In this illustrative example, the first and second exposure units can each provide four dose amounts (100%, 75%, 50%, and 25%) to achieve this. Figure 4B The boundaries of the exposure units shown are smooth.

[0056] exist Figure 4C Figure 400C illustrates a first exposure unit region 410-C and a second exposure unit region 420-C having gradually blended diagonal boundaries 440. In some embodiments, the horizontal distance covered by boundary 440 corresponds to the stitching region between the first exposure unit region 410-C and the second exposure unit region 420-C. Achieving gradual blending of the diagonal boundaries 440 is theoretically ideal for boundary smoothing at the stitching region because it can be obtained after a suitable number (e.g., an infinite number) of dose blendings during exposure unit boundary shifting and / or a suitable fine (e.g., infinitesimally fine) dose blending around the boundaries of each exposure unit during dose blending.

[0057] Figure 5 Figure 500 shows an example scanning configuration 520 of a digital flatbed printing exposure unit in a single-bridge embodiment according to some implementations. Scanning configuration 520 illustrates an example splicing area 524 with respect to a first scan area 521 and a second scan area 522. In some embodiments, the splicing area 524 is located at the interface between the first scan area 521 and the second scan area 522. For example, the first scan area 521 may be associated with a first exposure unit, and the second scan area 522 may be associated with a second exposure unit. The exposure unit boundaries of both the first and second exposure units may overlap, and the overlapping area may correspond to the splicing area 524.

[0058] In some embodiments, the first exposure unit performs a scan of the stitching region 524, while the second exposure unit performs a scan of a sub-region of the second scan region 522. Subsequently, the second exposure unit performs a scan of the stitching region, while the first exposure unit performs a scan of a sub-region of the first scan region. In some embodiments, the first and second exposure units each use a partial dose to perform a scan of the stitching region 524, such that the stitching region 524 receives 100% of the dose between two scans. For example, the first exposure unit may scan the stitching region 524 with 50% of the dose, and the second exposure unit may subsequently scan the stitching region 524 with the remaining 50%. In some embodiments, regarding... Figures 4A to 4C One or more of the described boundary smoothing techniques are performed by the first and second exposure units with respect to the stitching region 524. In some embodiments, the second scan of the stitching region 524 is performed within a threshold time amount following the first scan of the stitching region 524, as described below. Figures 6A to 6B As described.

[0059] Figures 6A to 6B This is a diagram of an example scan sequence of a digital flatbed printing exposure unit over time, according to some implementation methods. Figure 6A It is a diagram of the outside-in scan sequence 600A of the digital flatbed printing exposure unit with respect to time, according to some implementations. Figure 6B It is a diagram of the inside-out scan sequence 600B of a digital flatbed printing exposure unit with respect to time, according to some implementations.

[0060] In some embodiments, the splicing region 624 is associated with the first scanning region 621 and the second scanning region 622. The splicing region 624 may correspond to the boundary region between the first scanning region 621 and the second scanning region 622. In some embodiments, the first exposure unit of the digital flatbed printing system may have a boundary region including the first scanning region 621 and the splicing region 624. The second exposure unit may have a boundary region including the second scanning region 622 and the splicing region 624. The first and second exposure units may be attached to the same bridge unit. Thus, the first and second exposure units can move together with the substrate (i.e., the first scanning region 621, the second scanning region 622, and the splicing region 624).

[0061] See Figure 6AThe diagram illustrates a scanning sequence 600A from the outside in. For illustrative purposes, the scanning sequence 600A from the outside in includes four different time intervals for performing the scanning operation. However, sequence 600A is not limited to four different time intervals. In some embodiments, the scanning sequence 600A from the outside in includes more different time intervals for performing the scanning operation. In some embodiments, during the duration of time interval 612-1, a first exposure unit (not shown) scans a first sub-region 614-1A of the first scan region 621. Simultaneously, a second exposure unit (not shown) scans a first sub-region 614-1B of the second scan region 622 corresponding to the stitching region 624. In some embodiments, the second exposure unit scans the first sub-region 614-1B corresponding to the stitching region 624 using a partial dose of radiation. The first exposure unit may scan the first sub-region 614-1A using a full dose of radiation. Sub-regions 614-1A and 614-1B may be “outer” sub-regions. In some embodiments, the first sub-region 614-1A is adjacent to the outer edge of the first scan region 621. Since the splicing area 624 is located at the boundary between the first scanning area 621 and the second scanning area 622, the sub-area 614-1B is adjacent to the outer edge of the second scanning area 622. After the time interval 612-1 expires, the platform on which the substrate is placed moves in the Y direction to align the first and second exposure units with the next sub-area to be scanned.

[0062] During the duration of time interval 612-2, the first exposure unit scans the second sub-region 614-2A of the first scan area 621, while the second exposure unit scans the second sub-region 614-2B of the second scan area 622. In some embodiments, the first exposure unit uses a partial dose of radiation to scan the second sub-region 614-2A corresponding to the stitching area 624. The second exposure may use a full dose of radiation to scan the second sub-region 614-2B. In some embodiments, the second sub-region 614-2A is located near the outer edge of the first scan area 621, and the second sub-region 614-2B is located near the outer edge of the second scan area 622. In some embodiments, the second sub-regions 614-2A and 614-2B are located near the edges opposite to the corresponding first sub-regions 614-1A and 614-1B. Sub-regions 614-2A and 614-2B may be “external” sub-regions. After time interval 612-2 expires, the platform moves in the Y direction to align the first and second exposure units with the next sub-region to be scanned.

[0063] During the time interval 612-3, the first exposure unit scans the third sub-region 614-3A of the first scan area 621, while the second exposure unit scans the third sub-region 614-3B of the second scan area 622. The third sub-region 614-3A may be close to the first sub-region 614-1A, and the third sub-region 614-3B may be close to the first sub-region 614-1B. The third sub-region 614-3A may be closer to the horizontal centerline of the first scan area 621 than the first sub-region 614-1A, and the third sub-region 614-3B may be closer to the horizontal centerline of the second scan area 622 than the first sub-region 614-1B. In some embodiments, the third sub-regions 614-3A and 614-3B are "inner" sub-regions. After the time interval 612-3 expires, the platform moves in the Y direction to align the first and second exposure units with the next sub-region to be scanned.

[0064] During the duration of time interval 612-4, the first exposure unit scans the fourth sub-region 614-4A of the first scan area 621, while the second exposure unit scans the fourth sub-region 614-4B of the second scan area 622. The fourth sub-region 614-4A may be close to the second sub-region 6142-A, and the fourth sub-region 614-4B may be close to the second sub-region 614-2B. The fourth sub-region 614-4A may be closer to the horizontal centerline of the first scan area 621 than the second sub-region 614-2A, and the fourth sub-region 614-4B may be closer to the horizontal centerline of the second scan area 622 than the second sub-region 614-2B. In some embodiments, the fourth sub-regions 614-4A and 614-4B are "inner" sub-regions. In some embodiments, according to scan sequence 600A, the outer sub-regions are scanned before the inner sub-regions. After the time interval 612-4 expires, all first scan regions 621 and second scan regions 622 can be scanned, and one or more scan features generated by the scan can be formed. Each of the time intervals 612-1, 612-2, 612-3, and / or 612-4 can be the scan duration.

[0065] See Figure 6BThe diagram illustrates a scanning sequence from the inside out. For illustrative purposes, the inside-out scanning sequence 600B includes four different time intervals for performing the scanning operation. However, sequence 600B is not limited to four time intervals. In some embodiments, the inside-out scanning sequence 600B includes more different time intervals for performing the scanning operation. In some embodiments, during the duration of time interval 612-1, a first exposure unit scans a first sub-region 614-1A of a first scan region 621, and a second exposure unit scans a first sub-region 614-1B of a second scan region 622. The first sub-regions 614-1A and 614-1B may be “inner” sub-regions of the respective first scan region 621 and second scan region 622. In some embodiments, the first sub-region 614-1A is located near the horizontal centerline of the first scan region 621, and the first sub-region 614-1B is located near the horizontal centerline of the second scan region 622. After the time interval 612-1 expires, the platform moves in the Y direction to align the first and second exposure units with the next sub-region to be scanned.

[0066] In some embodiments, during the duration of time interval 612-2, the first exposure unit scans the second sub-region 614-2A of the first scan area 621, while the second exposure unit scans the second sub-region 614-2B of the second scan area 622. The second sub-regions 614-2A and 614-2B may be “inner” sub-regions of the corresponding first scan area 621 and second scan area 622. In some embodiments, the second sub-region 614-2A is located near the horizontal centerline of the first scan area 621, opposite to the centerline of the first sub-region 614-1A. In some embodiments, the second sub-region 614-2B is located near the horizontal centerline of the second scan area 622, opposite to the centerline of the first sub-region 614-1B. After the time interval 612-2 expires, the platform moves in the Y direction to align the first and second exposure units with the next sub-region to be scanned.

[0067] In some embodiments, during the duration of time interval 612-3, the first exposure unit scans the third sub-region 614-3A of the first scan area 621, while the second exposure unit scans the third sub-region 614-3B of the second scan area 622. The third sub-regions 614-3A and 614-3B may be “outer” sub-regions of the corresponding first scan area 621 and second scan area 622. In some embodiments, the third sub-region 614-3A is adjacent to the outer edge of the first scan area 621. The third sub-region 614-3A may correspond to the stitching area 624. In some embodiments, the third sub-region 614-3B is adjacent to the outer edge of the second scan area 622. In some embodiments, the first exposure unit uses a partial dose of radiation to scan the third sub-region 614-3A corresponding to the stitching area 624. The second exposure unit may use a full dose of radiation to scan the third sub-region 614-3B. After the time interval 612-3 expires, the platform moves in the Y direction to align the first and second exposure units with the next sub-region to be scanned.

[0068] In some embodiments, during the duration of time interval 612-4, the first exposure unit scans the fourth sub-region 614-4A of the first scan area 621, while the second exposure unit scans the fourth sub-region 614-4B of the second scan area 622. The fourth sub-regions 614-4A and 614-4B may be “outer” sub-regions of the corresponding first scan area 621 and second scan area 622. In some embodiments, according to scan sequence 600B, the inner sub-regions are scanned before the outer sub-regions. After the time interval 612-4 expires, all first scan areas 621 and second scan areas 622 may be scanned, and one or more scan features generated by the scanning may be formed.

[0069] In some embodiments, each time interval 612-1, 612-2, 612-3, and 612-4 is a predetermined time length. In some embodiments, the duration of each time interval is less than 40 seconds. In some embodiments, each time interval has a duration between 1 and 20 seconds. In some embodiments, each time interval has a duration of approximately 3 seconds. In some embodiments, each time interval has a duration of approximately 8 seconds. In some embodiments, scanning operations performed on the stitching area 624 (e.g., a first scan performed by the first exposure unit and a second scan performed by the second exposure unit) occur over a period of less than 40 seconds. In some embodiments, scanning operations performed on the stitching area 624 occur over a period of between 1 and 20 seconds. In some embodiments, scanning operations performed on the stitching area 624 occur over a period of less than 8 seconds. In some embodiments, scanning operations performed on the stitching area 624 occur over a period of less than 3 seconds.

[0070] Figure 7 Figures 700A and 700B illustrate features formed on a substrate using a digital flatbed printing process according to some embodiments. Figure 700A shows a scan feature formed on the substrate using scan sequencing, where there is a large time delay between the first and second scans on the splicing area 724. Figure 700B shows a scan feature formed on the substrate using the digital flatbed printing scan sequencing described herein, where there is a time delay below a threshold time amount between the first and second scans on the splicing area 724. As shown in Figure 700A, when a scan operation is performed on the splicing area 724 with a delay longer than the threshold time amount, an anomaly 726 may occur in the features formed by the scan. This anomaly 726 may include defects requiring the scrapping of the scanned substrate. As shown in Figure 700B, when a scan operation is performed on the splicing area 724 with a delay shorter than the threshold time amount, no anomaly may occur due to the delay between scans. In some embodiments, the threshold time amount is approximately 40 seconds. In some embodiments, the threshold time amount is approximately 20 seconds. In some embodiments, the threshold time amount is approximately 8 seconds. In some embodiments, the threshold time amount is approximately 3 seconds. By using an inside-out or outside-in scan sequence for the first scan region 721 and the second scan region 722, the delay between the first scan of the splicing region using the first exposure unit and the second scan of the splicing region using the second exposure unit can be reduced. By reducing the delay between scans performed on the splicing region 724, fewer defects are formed in the substrate, resulting in increased process output.

[0071] Figure 8 A flowchart is depicted for a method 800 for implementing digital offset printing scanning sequencing according to some embodiments. The method can be executed by processing logic, which may include hardware (circuit systems, dedicated logic, etc.), computer-readable instructions (running on a general-purpose computer system or a dedicated machine), or a combination of both. In an illustrative example, method 800 can be executed by the processing apparatus of a digital offset printing system. It should be noted that... Figure 8 The boxes depicted in the text can be executed simultaneously or in a different order than those depicted.

[0072] At block 810, the processing logic receives an instruction to perform a digital photolithography process to pattern a substrate. At block 820, the processing logic initiates a digital photolithography process to pattern the substrate according to the instruction. The substrate can be positioned on a platform, and the platform can move in the XY direction below a digital photolithography exposure unit (“exposure unit”) according to the instruction. For example, the instruction can be executed to implement a scan sequence as described above herein. In some embodiments, the digital photolithography process is a multi-pass process that includes multiple passes of scanning two or more adjacent scan areas.

[0073] At block 830, the processing logic performs a first pass of the first exposure unit over the stitching region at a first instant. The stitching region may be located at the interface between a first scan area corresponding to the first exposure unit and a second scan area corresponding to the second exposure unit. In some embodiments, the first exposure unit provides a portion of the radiation dose to the stitching region. For example, the first exposure unit may provide 50% of the total radiation dose to the stitching region during the first pass. While the first exposure unit performs the first pass over the stitching region, the second exposure unit may perform a pass over a sub-region of the second scan area associated with the second exposure unit.

[0074] At block 840, the processing logic performs a second pass of the second exposure unit over the stitching area at a second time. In some embodiments, the second time differs from the first time by less than approximately 40 seconds. In some embodiments, the second time differs from the first time by less than approximately 20 seconds, less than approximately 8 seconds, or less than approximately 3 seconds. In some embodiments, the second exposure unit provides a portion of the radiation dose to the stitching area. For example, the second exposure unit may provide 50% of the total radiation dose to the stitching area during the first pass. In some embodiments, the first exposure unit contributes a first percentage of radiation to the stitching area during the first pass, and the second exposure unit contributes a second percentage of radiation to the stitching area during the second pass. The sum of the first percentage and the second percentage equals 100%. When the second exposure unit performs the second pass over the stitching area, the first exposure unit may perform a pass over a sub-region of the first scan area associated with the first exposure unit.

[0075] In some implementations, the first pass and / or the second pass occur at the beginning or end of a multi-pass digital flatbed printing process. In some implementations, the processing logic utilizes the information described herein. Figure 6A The described outside-in scanning sequence or the sequence described in this article. Figure 6B The described scanning sequence is from the inside out. In some implementations, the second pass of the second exposure unit over the stitching area occurs after the first pass of the first exposure unit over the stitching area.

[0076] Figure 9 This is a block diagram illustrating a digital offset printing system (“System”) 900 according to some embodiments. As shown, System 900 includes a digital offset printing exposure unit (“exposure unit”) 910, a platform 920, and a processing device 930. The processing device 930 includes a processor 932 operatively coupled to memory 934. The memory may hold instructions 936 for performing digital offset printing within System 900. For example, instructions 926 may include instructions for controlling the movement of platform 920 and / or exposure unit 910. When executed, the instructions may implement methods for performing the exposure unit scanning sequence described herein.

[0077] Figure 10 This is a block diagram illustrating a computer system 1000 according to certain embodiments. In some embodiments, the computer system 1000 is connected (e.g., via a network, such as a Local Area Network (LAN), intranet network, extranet network, or the Internet) to other computer systems. In some embodiments, the computer system 1000 operates as a server or client computer in a client-server environment, or as a peer computer in a peer-to-peer or distributed network environment. In some embodiments, the computer system 1000 is provided via a personal computer (PC), tablet PC, set-top box (STB), personal digital assistant (PDA), cellular phone, network equipment, server, network router, switch or bridge, or any device capable of executing a set of instructions (continuously or otherwise) that specifies actions to be taken by that device. Furthermore, the term "computer" should include any set of computers that independently or jointly execute a set of instructions (or multiple sets of instructions) to perform any one or more methods described herein.

[0078] In another aspect, the computer system 1000 includes a processing device 1002 that communicates with each other via a bus 1008, volatile memory 1004 (e.g., random access memory (RAM)), non-volatile memory 1006 (e.g., read-only memory (ROM) or electronically erasable programmable ROM (EEPROM)), and a data storage device 1016.

[0079] In some embodiments, the processing device 1002 is provided by one or more processors, such as general-purpose processors (e.g., complex instruction set computing (CISC) microprocessors, reduced instruction set computing (RISC) microprocessors, very long instruction word (VLIW) microprocessors, microprocessors implementing other types of instruction sets, or microprocessors implementing combinations of various types of instruction sets) or special-purpose processors (e.g., application specific integrated circuits (ASICs), field programmable gate arrays (FPGAs), digital signal processors (DSPs), or network processors).

[0080] In some embodiments, the computer system 1000 further includes a network interface device 1022 (e.g., coupled to a network 1074). In some embodiments, the computer system 1000 also includes a video display unit 1010 (e.g., an LCD), an alphanumeric input device 1012 (e.g., a keyboard), a cursor control device 1014 (e.g., a mouse), and a signal generation device 1020.

[0081] In some embodiments, the data storage device 1016 includes a non-transitory computer-readable storage medium 1024 storing instructions 1026 that encode any one or more of the methods or functions described herein. For example, the instructions 1026 may include instructions for controlling the movement of a platform and / or digital flatbed printing exposure units (“exposure units”) of a digital flatbed printing system, which, when executed, may implement the method for performing the exposure unit scanning sequence described herein.

[0082] In some embodiments, instruction 1026 is also wholly or partially suspended in volatile memory 1004 and / or processing device 1002 during its execution by computer system 1000. Therefore, in some embodiments, volatile memory 1004 and processing device 1002 also constitute machine-readable storage media.

[0083] Although computer-readable storage medium 1024 is shown as a single medium in the illustrative example, the term "computer-readable storage medium" should include a single medium or multiple media (e.g., a centralized or distributed database, and / or associated caches and servers) that store one or more sets of executable instructions. The term "computer-readable storage medium" should also include any tangible medium capable of storing or encoding a set of instructions for execution by a computer, which causes the computer to perform any one or more of the methods described herein. The term "computer-readable storage medium" should include, but is not limited to, solid-state memory, optical media, and magnetic media.

[0084] In some embodiments, the methods, components, and features described herein are implemented through discrete hardware components or integrated into the functionality of other hardware components, such as ASICs, FPGAs, DSPs, or similar devices. In some embodiments, the methods, components, and features are implemented through firmware modules or functional circuitry within hardware devices. In some embodiments, the methods, components, and features are implemented as any combination of hardware devices and computer program components, or as a computer program.

[0085] Unless otherwise specifically stated, terms such as “training,” “identifying,” “further training,” “retraining,” “causing,” “receiving,” “providing,” “obtaining,” “optimizing,” “determining,” “updating,” “initializing,” “generating,” “adding,” or similar, refer to actions and processes performed or implemented by a computer system that manipulate and transform data representing physical (electronic) quantities in the caches and memory of a computer system into other data representing physical quantities similarly represented in the memory or caches or other such information storage, transmission, or display devices of a computer system. In some embodiments, as used herein, the terms “first,” “second,” “third,” “fourth,” etc., are designations for distinguishing different elements and do not have ordinal meaning based on their numerical designation.

[0086] The examples described herein also relate to an apparatus for performing the methods described herein. In some embodiments, this apparatus is specifically configured to perform the methods described herein, or includes a general-purpose computer system selectively programmed by a computer program stored in a computer system. Such a computer program is stored in a computer-readable tangible storage medium.

[0087] The methods and illustrative examples described herein are not inherently related to any particular computer or other device. In some implementations, various general-purpose systems are used in accordance with the teachings described herein. In some implementations, more specialized devices are configured to perform each of the methods described herein and / or their individual functions, routines, subroutines, or operations. Examples of structures for various such systems are set forth in the foregoing description.

[0088] The foregoing description sets forth several specific details, such as examples of specific systems, components, methods, etc., to provide a good understanding of several embodiments of the invention. However, it will be apparent to those skilled in the art that at least some embodiments of the invention can be practiced without such specific details. In other instances, well-known components or methods are not described in detail and are provided in a simple block diagram format to avoid unnecessarily obscuring the invention. Therefore, the specific details set forth are merely exemplary. Specific embodiments may vary from these exemplary details and are still contemplated within the scope of the invention.

[0089] Throughout this specification, references to "one embodiment" or "an embodiment" mean that a particular feature, structure, or characteristic described in connection with an embodiment is included in at least one embodiment. Therefore, the phrase "in one embodiment" appearing in various places throughout this specification does not necessarily refer to the same embodiment. Furthermore, the term "or" is intended to mean inclusive rather than exclusionary. When the terms "about" or "approximately" are used herein, this is intended to mean that the provided nominal values ​​are accurate within ±10%.

[0090] Although the operations of the methods described herein are illustrated and described in a specific order, the order of operations for each method may be changed, such that some operations may be performed in reverse order, or that some operations may be performed at least partially concurrently with other operations. In another embodiment, instructions or sub-operations of different operations may be performed intermittently and / or alternately.

[0091] It will be understood that the above description is intended to be illustrative rather than restrictive. Many other implementation examples will become apparent to those skilled in the art upon reading and understanding the above description. Although this disclosure describes specific examples, it will be appreciated that the systems and methods of this disclosure are not limited to the examples described herein, but can be practiced with modifications within the scope of the appended claims. Therefore, the specification and drawings are to be considered illustrative rather than restrictive. Consequently, the scope of this disclosure should be determined by reference to the appended claims together with the full scope of their equivalents.

Claims

1. A digital flatbed printing system, the digital flatbed printing system comprising: Multiple scanning areas, wherein the multiple scanning areas include a first scanning area and a second scanning area adjacent to the first scanning area; Multiple exposure units are positioned above multiple scanning areas, and the multiple exposure units include a first exposure unit associated with the first scanning area and a second exposure unit associated with the second scanning area; Memory; as well as At least one processing device, operatively coupled to the memory, the at least one processing device being configured to: Initiate a digital flatbed printing process to pattern a substrate set on a platform according to instructions; The first exposure unit performs its first pass over the stitching area at the interface between the first and second scanning areas at the first instant; and The second exposure unit performs a second pass over the stitching area at a second time that is less than forty seconds different from the first time.

2. The digital flatbed printing system of claim 1, wherein the digital flatbed printing process is a multi-pass process comprising multiple passes, and wherein performing the digital flatbed printing process comprises performing the second pass after the first pass at the beginning of the multi-pass process or at the end of the multi-pass process.

3. The digital flatbed printing system of claim 1, wherein the first exposure unit and the second exposure unit are attached to the same bridge of the digital flatbed printing system, and wherein, in order to perform the digital flatbed printing process, the at least one processing device is used for: The second exposure unit is used to scan a first sub-region of the second scan area, while the first exposure unit is used to perform the first pass; and The first exposure unit is used to scan the second sub-region of the first scan area, while the first exposure unit is used to perform the second pass.

4. The digital flatbed printing system as described in claim 1, wherein the digital flatbed printing process comprises: Scan a first sub-region of the corresponding scan region that is close to the first edge of the corresponding scan region among the plurality of scan regions; Subsequently, a second sub-region of the corresponding scan area, adjacent to the second edge opposite the first edge of the corresponding scan area, is scanned, wherein the first sub-region or the second sub-region includes the stitching area; and Then, a third sub-region, which is adjacent to the first sub-region and opposite to the first edge, is scanned.

5. The digital flatbed printing system as described in claim 1, wherein the digital flatbed printing process comprises: Scan the first sub-region of the corresponding scan region that is close to the center line of the corresponding scan region among the plurality of scan regions; The second sub-region of the corresponding scan area is then scanned toward the first edge of the corresponding scan area and close to the first sub-region. Scan a third sub-region of the corresponding scan area that is close to the first or second edge of the corresponding scan area; and Subsequently, a fourth sub-region is scanned that is adjacent to the first edge or the second edge of the corresponding scanned region opposite to the third sub-region, wherein the third sub-region or the fourth sub-region includes the stitching region.

6. The digital flatbed printing system of claim 1, wherein performing the first pass and performing the second pass includes performing dose mixing with respect to the splicing area, and wherein performing the dose mixing includes causing the first exposure unit to contribute a first percentage of the total dose to the splicing area and causing the second exposure unit to contribute a second percentage of the total dose to the splicing area, such that the sum of the first percentage and the second percentage equals 100%.

7. The digital flatbed printing system of claim 1, wherein the second time differs from the first time by approximately one scan duration.

8. A computer system, the computer system comprising: Memory; and At least one processing device, operatively coupled to the memory, the at least one processing device being configured to: Initiate a digital flatbed printing process to pattern the substrate according to instructions; The first exposure unit performs its first pass over the stitching area at the interface between the first scan area of ​​the multiple scan areas and the second scan area of ​​the multiple scan areas at the first moment; and The second exposure unit performs a second pass over the stitching area at a second time that is less than forty seconds different from the first time.

9. The computer system of claim 8, wherein the digital flatbed printing process is a multi-pass process comprising multiple passes, and wherein performing the digital flatbed printing process comprises performing the second pass after the first pass at the beginning of the multi-pass process or at the end of the multi-pass process.

10. The computer system of claim 8, wherein the first exposure unit and the second exposure unit are attached to the same bridge of the system, and wherein, in order to perform the digital flatbed printing process, the at least one processing device is configured to: The second exposure unit is used to scan a first sub-region of the second scan area, while the first exposure unit is used to perform the first pass; and The first exposure unit is used to scan the second sub-region of the first scan area, while the first exposure unit is used to perform the second pass.

11. The computer system of claim 8, wherein the digital offset printing process comprises: Scan a first sub-region of the corresponding scan region that is close to the first edge of the corresponding scan region among the plurality of scan regions; Subsequently, a second sub-region of the corresponding scan area, adjacent to the second edge opposite the first edge of the corresponding scan area, is scanned, wherein the first sub-region or the second sub-region includes the stitching area; and Then, a third sub-region, which is adjacent to the first sub-region and opposite to the first edge, is scanned.

12. The computer system of claim 8, wherein the digital offset printing process comprises: Scan the first sub-region of the corresponding scan region that is close to the center line of the corresponding scan region among the plurality of scan regions; The second sub-region of the corresponding scan area is then scanned toward the first edge of the corresponding scan area and close to the first sub-region. Scan a third sub-region of the corresponding scan area that is close to the first or second edge of the corresponding scan area; and Subsequently, a fourth sub-region is scanned that is adjacent to the first edge or the second edge of the corresponding scanned region opposite to the third sub-region, wherein the third sub-region or the fourth sub-region includes the stitching region.

13. The computer system of claim 8, wherein performing the first pass and performing the second pass includes performing dose mixing with respect to the stitching region, and wherein performing the dose mixing includes causing the first exposure unit to contribute a first percentage of the total dose to the stitching region and causing the second exposure unit to contribute a second percentage of the total dose to the stitching region, such that the sum of the first percentage and the second percentage equals 100%.

14. The computer system of claim 8, wherein the second time differs from the first time by less than eight seconds.

15. A method for implementing digital flatbed printing scanning sorting, the method comprising: A digital flatbed printing process is initiated by a processing device to pattern the substrate according to instructions; The first exposure unit performs its first pass over the stitching area at the interface between the first scan area of ​​the multiple scan areas and the second scan area of ​​the multiple scan areas at the first moment; and The second exposure unit performs a second pass over the stitching area at a second time that is less than forty seconds different from the first time.

16. The method of claim 15, wherein the digital flatbed printing process is a multi-pass process comprising multiple passes, and wherein performing the digital flatbed printing process comprises performing the second pass after the first pass at the beginning of the multi-pass process or at the end of the multi-pass process.

17. The method of claim 15, wherein the first exposure unit and the second exposure unit are attached to the same bridge of the digital flatbed printing system, and wherein the digital flatbed printing process comprises: The second exposure unit scans the first sub-region of the second scanning area, while the first exposure unit performs the first pass; and The first exposure unit scans the second sub-region of the first scan area, and simultaneously performs the second pass through the first exposure unit.

18. The method of claim 15, wherein the digital flatbed printing process comprises: Scan a first sub-region of the corresponding scan region that is close to the first edge of the corresponding scan region among the plurality of scan regions; Subsequently, a second sub-region of the corresponding scan area, adjacent to the second edge opposite the first edge of the corresponding scan area, is scanned, wherein the first sub-region or the second sub-region includes the stitching area; and Then, a third sub-region, which is adjacent to the first sub-region and opposite to the first edge, is scanned.

19. The method of claim 15, wherein the digital flatbed printing process comprises: Scan the first sub-region of the corresponding scan region that is close to the center line of the corresponding scan region among the plurality of scan regions; The second sub-region of the corresponding scan area is then scanned toward the first edge of the corresponding scan area and close to the first sub-region. Scan a third sub-region of the corresponding scan area that is close to the first or second edge of the corresponding scan area; and Subsequently, a fourth sub-region is scanned that is adjacent to the first edge or the second edge of the corresponding scanned region opposite to the third sub-region, wherein the third sub-region or the fourth sub-region includes the stitching region.

20. The method of claim 15, wherein performing the first pass and performing the second pass comprises: performing dose mixing with respect to the stitching region, and wherein performing the dose mixing comprises: causing the first exposure unit to contribute a first percentage of the total dose to the stitching region and causing the second exposure unit to contribute a second percentage of the total dose to the stitching region, such that the sum of the first percentage and the second percentage equals 100%.

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