An epitaxial furnace substrate transfer device

Abstract

This invention belongs to the field of silicon carbide substrate production technology, specifically an epitaxial furnace substrate transfer device, including an epitaxial furnace body; a transfer box is fixedly connected to one side of the epitaxial furnace body; through grooves are formed on opposite surfaces of both sides of the transfer box; the through grooves are connected to the epitaxial furnace body, and the substrate is clamped and transferred through the cooperation of a tray, electric push rod, robotic arm and gripper. Then, the substrate surface is treated by air jetting through the nozzle on the bottom of the bottom cover, thereby cleaning the substrate surface. The arc-shaped groove draws in the gas in the transfer box, so that dust does not disperse in the transfer box. At the same time, the electric control valve at the through groove 3 is opened, so that silicon carbide particles in the epitaxial wheel body 1 are also drawn into the annular groove 10, thereby avoiding contamination of the substrate by particles inside the epitaxial wheel body 1, and further ensuring the cleaning effect of the substrate, thus ensuring the final product quality.

Description

Technical Field

[0001] This invention belongs to the field of silicon carbide substrate production technology, specifically an epitaxial furnace substrate transfer device. Background Technology

[0002] An epitaxial furnace is a key piece of equipment used in the manufacture of semiconductor materials. It is mainly used to grow high-quality single-crystal thin films on single-crystal substrates. Its working principle is to deposit semiconductor materials on the substrate under high temperature and high pressure to form a crystal layer with the same crystal lattice structure as the substrate. Substrate transfer is an important part of ensuring the smooth operation of the production process.

[0003] In the prior art, the substrate transfer device of the epitaxial furnace is usually composed of a robotic arm, a cantilever, grippers and a tray. Position sensors are used to ensure repeatability and positioning accuracy in a high temperature and high vacuum environment, so that the robotic arm can control the grippers to pick up the substrate and transfer the substrate to the processing area inside the epitaxial furnace, thereby enabling the substrate surface to grow high-quality single crystal thin films smoothly.

[0004] In the prior art, during the process of transferring the substrate by the gripper, the substrate comes into contact with the outside air. Since the air contains a lot of dust particles, and in addition, during the epitaxial furnace process, more and more fine silicon carbide particles accumulate inside. When the gate is opened to change the substrate, the airflow disturbance will cause the fine silicon carbide particles in the epitaxial furnace to adhere to the substrate. These dust and particles will affect the formation of single crystal thin films on the substrate surface, and thus affect the final product quality.

[0005] Therefore, the present invention provides an epitaxial furnace substrate transfer device. Summary of the Invention

[0006] In order to overcome the shortcomings of the prior art, at least one technical problem raised in the background art is solved.

[0007] The technical solution adopted by this invention to solve its technical problem is as follows: An epitaxial furnace substrate transfer device according to this invention includes an epitaxial furnace body; a transfer box is fixedly connected to one side of the epitaxial furnace body; through grooves are formed on opposite surfaces of both sides of the transfer box; the through grooves communicate with the epitaxial furnace body, and an electrically controlled valve is installed at the connection point; a tray is rotatably connected inside the transfer box, and the tray is driven by a servo motor; an electric push rod is embedded at the center of the surface of the tray; a robotic arm is fixedly connected to the telescopic end of the electric push rod; a gripper is installed at the execution end of the robotic arm; a top cover is fixedly connected to the top surface of the transfer box; the top cover… Multiple evenly spaced nozzles are installed on the bottom surface of the container; the nozzles are connected to an external gas pumping assembly; the external gas pumping assembly pumps pure inert gas into the nozzles via a gas pump; an arc-shaped groove is formed on the inner wall of the transfer box; the arc-shaped groove is connected to an external vacuum pump; during operation, to avoid dust easily adhering to the substrate surface during the feeding and unloading of the substrate into the epitaxial furnace, which could affect the final product quality, this embodiment of the invention can be used. First, during the substrate loading process, the cooperation of a tray, an electric push rod, and a robotic arm drives the grippers to extend from a through groove on the side away from the epitaxial furnace body. The robotic arm then grips the substrate to be processed, and then moves the grippers and substrate back into the transfer box. At this time, the nozzle on the bottom of the top cover sprays pure inert gas onto the top surface of the substrate, blowing away the dust adhering to the substrate surface. While the nozzle is spraying gas, the external vacuum pump simultaneously draws gas from the transfer box through the arc-shaped groove, allowing the dust blown up by the inert gas to be discharged to the outside through the arc-shaped groove, thus preventing the dust from spreading inside the transfer box and falling back onto the substrate surface. After the substrate surface is cleaned, the electronically controlled valve no longer closes the through groove between the epitaxial furnace body and the transfer box, allowing the robotic arm and grippers to move freely. The system can feed the substrate into the epitaxial furnace body, where it is clamped and transferred through the cooperation of a tray, electric push rod, robotic arm, and grippers. Then, the substrate surface is treated with air jets by the nozzle on the bottom of the cover, thus cleaning the substrate surface. The arc-shaped groove draws in the gas in the transfer box, preventing dust from spreading inside. At the same time, the electric control valve at the through groove opens, allowing silicon carbide particles inside the epitaxial wheel body to be drawn into the annular groove, thus preventing particle contamination of the substrate from inside the epitaxial wheel body. This further ensures the cleaning effect of the substrate and guarantees the final product quality.

[0008] Preferably, a base is provided on the top surface of the nozzle; a rotating rod is fixedly connected to each nozzle in the same row; the rotating rod rotates on the bottom surface of the base; a toothed plate is meshed at one end of the rotating rod; a groove is formed on the surface of the base at a corresponding position of the toothed plate; the toothed plate is slidably connected in the groove; a gear is meshed on the top surface of the toothed plate; the gear is rotatably connected to the top surface of the base, and the gear is driven by a servo motor; during operation, when the nozzle needs to perform air jet cleaning on the substrate surface, the servo motor will drive the gear. First, it rotates forward, then reverses, with the same rotation angle in both directions. Since gear one meshes with the toothed plate, the toothed plate slides back and forth in the groove under the drive of gear one. The reciprocating sliding of the toothed plate drives the rotating rod meshing with the toothed plate to continuously rotate forward and backward, which in turn drives the nozzle fixed to the rotating rod to continuously swing. This allows the inert gas sprayed from the nozzle to continuously sweep across the substrate surface at different angles, making it easier to blow away the dust adhering to the substrate surface, thereby improving the cleaning effect on the substrate.

[0009] Preferably, a second gear is meshed with the side surface of the tray; a transmission rod is fixedly connected to the top surface of the second gear; the rotating rod is rotatably connected to the inner wall of the transfer box; a third gear is fixedly connected to the top surface of the transmission rod; and the third gear is meshed with the base. During operation, when the tray drives the electric push rod and the robotic arm to rotate, the tray also drives the second gear to rotate synchronously. The rotating second gear then drives the transmission rod to rotate synchronously, and the rotating transmission rod then drives the third gear on its top to rotate. Since the third gear is meshed with the base, the base also rotates synchronously with the third gear, thereby causing the nozzle on the surface of the base to rotate with the rotation of the tray. This ensures that after the robotic arm retracts the gripper into the transfer box, the nozzle remains on the top surface of the substrate gripped by the gripper, and the nozzle is positioned between the grippers. This allows dust to be blown out from the less obstructed grippers on both sides during the oscillation of the nozzle and the spraying of air onto the substrate surface, preventing dust accumulation at the connection between the gripper and the robotic arm.

[0010] Preferably, a temporary storage tank is fixedly connected to one side of the transfer box; the temporary storage tank is connected to the transfer box and adjacent to the epitaxial furnace body; a partition plate is fixedly connected inside the temporary storage tank; a pair of exhaust pipes are fixedly connected to the side surface of the temporary storage tank; the two exhaust pipes are connected to the inside of the temporary storage tank, and the two exhaust pipes are located at the top and bottom of the partition plate respectively; the exhaust pipes are connected to an external vacuum pump; a sealing door is installed on the side of the temporary storage tank away from the transfer box, and the sealing door is located at the bottom of the partition plate; during operation, when the substrate is still being processed inside the epitaxial furnace body, the robotic arm will first transfer the substrate to be processed into the transfer box through the grippers, then clean its surface with the nozzle, and then place it into the transfer box. The top surface of the partition inside the temporary storage tank is used for cleaning. After the substrate is processed, the electronic control valve is opened, and the robotic arm is driven to reach into the epitaxial furnace body to pick up the substrate. Then, it returns to the transfer box and is cleaned by the nozzle. The processed substrate is then placed at the bottom of the partition inside the transfer tank. The robotic arm then sends the substrate to be processed from the top surface of the partition into the epitaxial furnace body, while the processed substrate is taken out from the bottom sealed door. Since the robotic arm can prepare for cleaning the next substrate in advance while the epitaxial furnace body is still processing the substrate, the substrate preparation time is shortened, thereby improving work efficiency. At the same time, two exhaust pipes continuously suck up the gas in the temporary storage tank to prevent dust in the air from contaminating the substrate in the temporary storage tank.

[0011] Preferably, a top-out groove is provided at the connection between the temporary storage tank and the transfer box; a baffle is slidably connected inside the top-out groove, and the baffle can seal the connection between the temporary storage tank and the transfer box; a transmission plate is fixedly connected to the side of the baffle near the transfer box; a driven plate is fixedly connected to the side surface of the telescopic end of the electric push rod; the end of the transmission plate away from the baffle is located at the top of the driven plate; the arc-shaped groove is located at the top of the driven plate; during operation, when the epitaxial furnace body is processing the substrate, and the substrate to be processed is cleaned and placed on the top of the partition, the electric push rod will raise the driven plate, and the driven plate will push the transmission plate to rise, and finally the transmission plate will drive the baffle to rise, so that the baffle can seal the connection between the transfer box and the temporary storage tank, thereby ensuring that the substrate stored in the storage tank can be in a sealed vacuum state, and further preventing dust from adhering to its surface.

[0012] Preferably, a hydraulic rod is embedded in the bottom surface of the temporary storage tank; a receiving seat is rotatably connected to the top surface of the hydraulic rod; a placement groove is formed on the top surface of the receiving seat; limit posts are fixed to both sides of the receiving seat; guide grooves are formed on the inner wall of the temporary storage tank at the corresponding positions of the limit posts; the limit posts are slidably connected in the guide grooves; during operation, when the robotic arm needs to place the processed substrate into the temporary storage tank, the robotic arm will place the processed substrate into the placement groove on the surface of the receiving seat to fix the substrate and prevent it from sliding in the temporary storage tank. When the user needs to remove the processed substrate from the receiving seat, the user needs to control the hydraulic rod to drive the receiving seat to descend. Since the limit posts on both sides of the receiving seat are slidably connected in the guide grooves, the receiving seat will also rotate 180 degrees during the descent, making it easier for the user to remove the processed substrate from the placement groove.

[0013] Preferably, a support ring is fixedly connected to the inner wall of the placement groove; the inner diameter of the support ring is smaller than the diameter of the substrate; a support column is slidably connected to the bottom of the placement groove at its center; a spring is fixedly connected between the support column and the bottom of the placement groove; during operation, when the robotic arm places the substrate at the receiving seat, the substrate is placed on the top surface of the support column by the gripper of the robotic arm's execution end. Subsequently, under the action of the substrate's gravity, the support column continuously descends and compresses the spring until the edge of the substrate rests on the support ring, thereby completing the fixation of the substrate. Thus, during the placement process, the substrate directly hits the bottom of the placement groove, thereby causing damage to the substrate.

[0014] Preferably, the bottom surface of the receiving seat has a pair of openings that penetrate the receiving seat; the bottom surface of the temporary storage tank is fixedly connected to a pair of cooling seats at the corresponding position of the arc-shaped groove; the cooling seats are adapted to the arc-shaped groove and have cooling pipes embedded inside; during operation, when the hydraulic rod drives the receiving seat down to the sealing door, the cooling seats at the bottom of the temporary storage tank will just insert into the openings on the surface of the receiving seat, thereby lifting the substrate from the support ring for easy handling by the user. The cooling seats have cooling pipes embedded inside, and when the substrate comes into contact with the cooling seats, the cooling seats can dissipate heat from the substrate, thereby preventing burns when the user handles it. At the same time, the substrate cools down quickly, allowing the substrate to quickly enter the next processing step.

[0015] Preferably, the inner wall of the receiving seat has multiple evenly arranged air jet holes; the inner wall of the temporary storage tank is slidably connected to a gas guide pipe on the side away from the sealing door, and the gas guide pipe is driven by a hydraulic cylinder; the side surface of the receiving seat has an air inlet, and the air inlet is adapted to the gas guide pipe; the gas guide pipe is connected to an external gas pumping assembly; the external gas pumping assembly is used to introduce pure inert gas into the gas guide pipe; during operation, when the receiving seat descends to the sealing door, the gas guide pipe is aligned with the air inlet on the surface of the receiving seat, and then the gas guide pipe is inserted into the air inlet under the drive of the hydraulic cylinder, and inert gas is introduced. Finally, the inert gas is discharged from the air jet holes, thereby cleaning the top surface of the processed substrate. Then, the dust-containing gas is sucked away by the suction pipe, thereby cleaning the substrate surface to ensure smooth subsequent processing.

[0016] Preferably, a sealing membrane is fixedly connected between the surface of the air guide tube and the inner wall of the temporary storage tank, and the sealing membrane is elastic; a rubber pad is fixedly connected at the opening of the air guide tube, and the cross-section of the rubber pad is triangular; during operation, when the air guide tube moves, the sealing membrane can seal the gap between the air guide tube and the temporary storage tank, thereby ensuring the airtightness of the temporary storage tank. At the same time, after the air guide tube is inserted into the air inlet, the rubber pad can also fill the gap between the inner wall of the air inlet and the air guide tube, thereby reducing gas leakage.

[0017] The beneficial effects of this invention are as follows:

[0018] 1. The epitaxial furnace substrate transfer device of the present invention achieves substrate clamping and transfer through the cooperation of a tray, electric push rod, robotic arm and gripper. Then, the substrate surface is treated by air jetting through the nozzle on the bottom surface of the bottom cover, thereby cleaning the substrate surface. The arc groove draws in the gas in the transfer box, so that dust does not disperse in the transfer box. At the same time, the electric control valve at the through groove opens, so that silicon carbide particles in the epitaxial wheel body are also drawn into the annular groove, thereby avoiding contamination of the substrate by particles inside the epitaxial wheel body, thus further ensuring the cleaning effect of the substrate and ensuring the final product quality.

[0019] 2. The epitaxial furnace substrate transfer device of the present invention uses a reciprocating sliding toothed plate to drive a rotating rod meshing with it to continuously rotate in both directions, thereby driving a nozzle fixed to the rotating rod to continuously swing, so that the inert gas sprayed from the nozzle can continuously sweep across the substrate surface at different angles, making it easier to blow away the dust adhering to the substrate surface, thereby improving the cleaning effect on the substrate. Attached Figure Description

[0020] The invention will now be further described with reference to the accompanying drawings.

[0021] Figure 1 This is a perspective view of the present invention;

[0022] Figure 2 This is a cross-sectional view of the top cover in this invention;

[0023] Figure 3 This is a cross-sectional view of the transfer box in this invention;

[0024] Figure 4 This is a schematic diagram of the base structure in this invention;

[0025] Figure 5 This is a schematic diagram of the partition plate in this invention;

[0026] Figure 6 This is a cross-sectional view of the temporary storage tank in this invention;

[0027] Figure 7 This is a schematic diagram of the cooling base in this invention;

[0028] Figure 8 This is a schematic diagram of the structure of the receiving seat in this invention;

[0029] Figure 9 This is a schematic diagram of the structure of the rubber pad in this invention;

[0030] In the diagram: 1. Epitaxial furnace body; 2. Transfer box; 3. Through groove; 4. Pallet; 5. Electric actuator; 6. Robotic arm; 7. Gripper; 8. Top cover; 9. Nozzle; 10. Arc groove; 11. Base; 12. Rotating rod; 13. Gear plate; 14. Slide groove; 15. Gear 1; 6. Gear 2; 17. Transmission rod; 18. Gear 3; 19. Temporary storage tank; 20. Divider plate; 21. Extraction pipe; 2 2. Sealing door; 23. Top-out slot; 24. Baffle; 25. Transmission plate; 26. Driven plate; 27. Hydraulic rod; 28. Receiving seat; 29. ​​Placement slot; 30. Limiting post; 31. Guide slot; 32. Support ring; 33. Support column; 34. Spring; 35. Opening; 36. Cooling seat; 38. Jet nozzle; 39. Air guide pipe; 40. Air inlet; 41. Sealing membrane; 42. Rubber pad. Detailed Implementation

[0031] To make the technical means, creative features, objectives and effects of this invention easier to understand, the invention will be further described below in conjunction with specific embodiments.

[0032] like Figures 1 to 4As shown in the embodiment of the present invention, an epitaxial furnace substrate transfer device includes an epitaxial furnace body 1; a transfer box 2 is fixedly connected to one side of the epitaxial furnace body 1; through grooves 3 are formed on opposite surfaces on both sides of the transfer box; the through grooves 3 communicate with the epitaxial furnace body 1, and an electrically controlled valve is installed at the connection; a tray 4 is rotatably connected inside the transfer box 2, and the tray 4 is driven by a servo motor; an electric push rod 5 is embedded at the center of the surface of the tray 4; a robotic arm 6 is fixedly connected to the telescopic end of the electric push rod 5; a gripper 7 is installed at the execution end of the robotic arm 6; a top cover 8 is fixedly connected to the top surface of the transfer box 2; and multiple... Uniformly arranged nozzles 9; the nozzles 9 are connected to an external gas pumping assembly; the external gas pumping assembly pumps pure inert gas into the nozzles 9 through a gas pump; the inner wall of the transfer box 2 is provided with an arc-shaped groove 10; the arc-shaped groove 10 is connected to an external vacuum pump; during operation, in order to avoid the substrate surface from easily getting dusty during the process of feeding and feeding the substrate into and out of the epitaxial furnace, which would affect the final product quality, the embodiment of the present invention can be used. First, during the substrate loading process, the cooperation of the tray 4, the electric push rod 5 and the robotic arm 6 drives the gripper 7 to extend from the through groove 3 on the side away from the epitaxial furnace body 1, and then grips the substrate to be loaded. After the substrate is cleaned, the robotic arm 6 moves the gripper 7 and the substrate back into the transfer box 2. At this time, the nozzle 9 on the bottom of the top cover 8 sprays pure inert gas towards the top surface of the substrate, thus blowing away the dust adhering to the substrate surface. While the nozzle 9 is spraying gas, the external vacuum pump simultaneously draws gas from the transfer box 2 through the arc-shaped groove 10, so that the dust blown up by the inert gas can be discharged to the outside through the arc-shaped groove 10, thus preventing the dust from spreading in the transfer box 2 and falling back onto the substrate surface. After the substrate surface is cleaned, the electronic control valve no longer closes the through groove 3 between the epitaxial furnace body 1 and the transfer box 2, allowing the robotic arm 6 and gripper 7 to move the substrate back into the transfer box 2. The substrate is fed into the epitaxial furnace body 1, where it is clamped and transferred by the cooperation of the tray 4, electric push rod 5, robotic arm 6 and gripper 7. Then, the substrate surface is treated by air jetting through the nozzle 9 on the bottom of the bottom cover, which cleans the substrate surface. The arc groove 10 draws in the gas in the transfer box 2, preventing dust from spreading in the transfer box 2. At the same time, the electric control valve at the through groove 3 is opened, which draws the silicon carbide particles in the epitaxial wheel body 1 into the annular groove 10, thereby preventing particles inside the epitaxial wheel body 1 from contaminating the substrate. This further ensures the cleaning effect of the substrate and guarantees the final product quality.

[0033] like Figures 3 to 4As shown, a base 11 is provided on the top surface of the nozzle 9; a rotating rod 12 is fixedly connected to each other in the same row of nozzles 9; the rotating rod 12 rotates on the bottom surface of the base 11; a toothed plate 13 is meshed with one end of the rotating rod 12; a groove 14 is formed on the surface of the base 11 at the corresponding position of the toothed plate 13; the toothed plate 13 is slidably connected in the groove 14; a gear 15 is meshed with the top surface of the toothed plate 13; the gear 15 is rotatably connected to the top surface of the base 11, and the gear 15 is driven by a servo motor; during operation, when the nozzle 9 needs to perform air jet cleaning on the substrate surface, the servo motor... The gear 15 will rotate forward first and then reverse, with the same rotation angle in both directions. Since the gear 15 meshes with the toothed plate 13, the toothed plate 13 will slide back and forth in the slide groove 14 under the drive of the gear 15. The reciprocating sliding of the toothed plate 13 will drive the rotating rod 12, which meshes with the toothed plate 13, to continuously rotate forward and reverse, thereby causing the nozzle 9, which is fixed to the rotating rod 12, to continuously swing. This allows the inert gas ejected from the nozzle 9 to continuously sweep across the substrate surface at different angles, making it easier to blow away the dust adhering to the substrate surface, thus improving the cleaning effect on the substrate.

[0034] like Figures 2 to 4 As shown, a second gear 6 is meshed with the side surface of the tray 4; a transmission rod 17 is fixedly connected to the top surface of the second gear 6; the rotating rod 12 is rotatably connected to the inner wall of the transfer box 2; a third gear 18 is fixedly connected to the top surface of the transmission rod 17; the third gear 18 is meshed with the base 11; during operation, when the tray 4 drives the electric push rod 5 and the robotic arm 6 to rotate, the tray 4 will also drive the second gear 6 to rotate synchronously, and the rotating second gear 6 will drive the transmission rod 17 to rotate synchronously, and then the rotating transmission rod 17 will drive the third gear 18 on its top to rotate, and so on. Because gear 3 18 meshes with base 11, base 11 will also rotate synchronously with gear 3 18, thereby causing the nozzle 9 on the surface of base 11 to rotate with the tray 4. This ensures that after the robotic arm 6 retracts the gripper 7 into the transfer box 2, the nozzle 9 is always on the top surface of the substrate held by the gripper 7, and the nozzle 9 is also located between the grippers. This allows dust to be blown out from the less obstructed sides of the gripper 7 during the swinging of the nozzle 9 and the spraying of air onto the substrate surface, thus preventing dust from accumulating at the connection between the gripper 7 and the robotic arm 6.

[0035] like Figure 1 , Figure 5 and Figure 6As shown, a temporary storage tank 19 is fixedly connected to one side of the transfer box 2; the temporary storage tank 19 is connected to the transfer box 2 and adjacent to the epitaxial furnace body 1; a partition plate 20 is fixedly connected inside the temporary storage tank 19; a pair of exhaust pipes 21 are fixedly connected to the side surface of the temporary storage tank 19; the two exhaust pipes 21 are connected to the inside of the temporary storage tank 19, and the two exhaust pipes 21 are located at the top and bottom of the partition plate 20 respectively; the exhaust pipes 21 are connected to an external vacuum pump; a sealing door 22 is installed on the side of the temporary storage tank 19 away from the transfer box 2, and the sealing door 22 is located at the bottom of the partition plate; during operation, when the substrate is still being processed inside the epitaxial furnace body 1, the robotic arm 6 will first transfer the substrate to be processed to the transfer box 2 through the gripper 7, and then the surface of the substrate will be processed by the nozzle 9. The substrate is cleaned and then placed on the top surface of the partition inside the temporary storage tank 19. After the substrate is processed, the electronic control valve is opened, and the robotic arm 6 is driven to reach into the epitaxial furnace body 1 to pick up the substrate. Then it returns to the transfer box 2 and is cleaned by the nozzle 9. The processed substrate is then placed at the bottom of the partition inside the transfer tank. The robotic arm 6 then sends the substrate to be processed from the top surface of the partition into the epitaxial furnace body 1, while the processed substrate is taken out from the bottom sealing door 22. Since the robotic arm 6 can prepare for the cleaning of the next substrate in advance while the epitaxial furnace body 1 is still processing the substrate, the substrate preparation time is shortened, thereby improving work efficiency. At the same time, the two exhaust pipes 21 continuously suck up the gas in the temporary storage tank 19 to prevent dust in the air from contaminating the substrate in the temporary storage tank 19.

[0036] like Figures 6 to 7 As shown, a top-out groove 23 is provided at the connection between the temporary storage tank 19 and the transfer box 2; a baffle 24 is slidably connected inside the top-out groove 23, and the baffle 24 can seal the communication between the temporary storage tank 19 and the transfer box 2; a transmission plate 25 is fixedly connected to the side of the baffle 24 near the transfer box 2; a driven plate 26 is fixedly connected to the side surface of the telescopic end of the electric push rod 5; the end of the transmission plate 25 away from the baffle 24 is located at the top of the driven plate 26; the arc-shaped groove 10 is located at the driven plate 26. At the top; during operation, when the epitaxial furnace body 1 is processing a substrate, and the substrate to be processed is cleaned and placed on top of the partition, the electric push rod 5 will rise from the driven plate 26, and the driven plate 26 will push the transmission plate 25 to rise. Finally, the transmission plate 25 will drive the baffle 24 to rise, so that the baffle 24 can seal the connection between the transfer box 2 and the storage tank, thereby ensuring that the substrate stored in the storage tank can be in a sealed vacuum state, and further preventing dust from adhering to its surface.

[0037] like Figures 6 to 8As shown, a hydraulic rod 27 is embedded in the bottom surface of the storage tank 19; a receiving seat 28 is rotatably connected to the top surface of the hydraulic rod 27; a placement groove 29 is formed on the top surface of the receiving seat 28; limit posts 30 are fixedly connected to both sides of the receiving seat 28; guide grooves 31 are formed on the inner wall of the storage tank 19 at the corresponding positions of the limit posts 30; the limit posts 30 are slidably connected in the guide grooves 31; during operation, when the robotic arm 6 needs to place the processed substrate into the storage tank 19, the robotic arm 6 will... The processed substrate is placed into the placement groove 29 on the surface of the receiving seat 28 to fix the substrate and prevent it from sliding in the temporary storage tank 19. When the user needs to remove the processed substrate from the receiving seat 28, the user needs to control the hydraulic rod 27 to drive the receiving seat 28 to descend. Since the limiting posts 30 on both sides of the receiving seat 28 are slidably connected in the guide groove 31, the receiving seat 28 will also rotate 180 degrees during the descent, so that the user can more easily remove the processed substrate from the placement groove 29.

[0038] like Figure 8 As shown, a support ring 32 is fixedly connected to the inner wall of the placement groove 29; the inner diameter of the support ring 32 is smaller than the diameter of the substrate; a support column 33 is slidably connected to the bottom of the placement groove 29 at the center; a spring 34 is fixedly connected between the support column 33 and the bottom of the placement groove 29; during operation, when the robotic arm 6 places the substrate at the receiving seat 28, the substrate is placed on the top surface of the support column 33 by the gripper 7 of the robotic arm 6. Subsequently, the support column 33 continuously descends under the action of the substrate's gravity and compresses the spring 34 until the edge of the substrate rests on the support ring 32, thereby completing the fixation of the substrate. Thus, during the placement process, the substrate directly hits the bottom of the placement groove 29, thereby causing damage to the substrate.

[0039] like Figures 6 to 8 As shown, the bottom surface of the receiving seat 28 has a pair of openings 35, and the openings 35 penetrate the receiving seat 28; the bottom surface of the temporary storage tank 19 is fixedly connected to a pair of cooling seats 36 at the corresponding position of the arc groove 10; the cooling seats 36 are adapted to the arc groove 10 and have cooling pipes embedded inside; during operation, when the hydraulic rod 27 drives the receiving seat 28 down to the sealing door 22, the cooling seats 36 at the bottom of the temporary storage tank 19 will just insert into the openings 35 on the surface of the receiving seat 28, thereby lifting the substrate from the support ring 32 for easy handling by the user. The cooling seats 36 have cooling pipes embedded inside, and when the substrate comes into contact with the cooling seats 36, the cooling seats 36 can dissipate heat from the substrate, thereby preventing the user from getting burned when handling it. At the same time, the substrate cools down quickly, allowing the substrate to quickly enter the next processing step.

[0040] like Figures 5 to 8As shown, the inner wall of the receiving seat 28 is provided with a plurality of evenly arranged air jet holes 38; the inner wall of the temporary storage tank 19 is slidably connected to the side away from the sealing door 22 with a gas guide pipe 39, and the gas guide pipe 39 is driven by a hydraulic cylinder; the side surface of the receiving seat 28 is provided with an air inlet 40, and the air inlet 40 is adapted to the gas guide pipe 39; the gas guide pipe 39 is connected to an external air pumping assembly; the external air pumping assembly is used to introduce pure inert gas into the gas guide pipe 39; during operation, when the receiving seat 28 descends to the sealing door 22, the gas guide pipe 39 is just aligned with the air inlet 40 on the surface of the receiving seat 28, and then the gas guide pipe 39 is inserted into the air inlet 40 under the drive of the hydraulic cylinder, and inert gas is introduced into it. Finally, the inert gas is discharged from the air jet holes 38, thereby cleaning the top surface of the processed substrate, and then the dust-containing gas is sucked away by the suction pipe, thereby cleaning the substrate surface to ensure smooth subsequent processing.

[0041] like Figure 7 and Figure 9 As shown, a sealing membrane 41 is fixedly connected between the surface of the air guide tube 39 inside the temporary storage tank 19 and the inner wall of the temporary storage tank 19, and the sealing membrane 41 is elastic; a rubber pad 42 is fixedly connected at the opening of the air guide tube 39, and the cross-section of the rubber pad 42 is triangular; during operation, when the air guide tube 39 moves, the sealing membrane 41 can seal the gap between the air guide tube 39 and the temporary storage tank 19, thereby ensuring the airtightness of the temporary storage tank 19. At the same time, after the air guide tube 39 is inserted into the air inlet 40, the rubber pad 42 can also fill the gap between the inner wall of the air inlet 40 and the air guide tube 39, thereby reducing gas leakage.

[0042] To prevent dust from easily adhering to the substrate surface during the feeding and unloading process into the epitaxial furnace, which could affect the final product quality, this invention can be used. Firstly, during substrate loading, the tray 4, electric push rod 5, and robotic arm 6 work together to drive the gripper 7 to extend from the through-slot 3 on the side away from the epitaxial furnace body 1, then grip the substrate to be processed. Afterwards, the robotic arm 6 drives the gripper 7 and the substrate back into the transfer box 2. At this time, the nozzle 9 on the bottom surface of the top cover 8 sprays pure inert gas towards the top surface of the substrate, blowing away the dust adhering to the substrate surface. While the nozzle 9 is spraying gas, an external vacuum pump simultaneously draws gas from the transfer box 2 through the arc-shaped groove 10, allowing the dust blown up by the inert gas to be discharged to the outside through the arc-shaped groove 10, thus preventing dust from spreading within the transfer box 2. The substrate then falls back onto the substrate surface. Once the substrate surface is cleaned, the electronically controlled valve no longer closes the through groove 3 between the epitaxial furnace body 1 and the transfer box 2, allowing the robotic arm 6 and gripper 7 to feed the substrate into the epitaxial furnace body 1. Through the cooperation of the tray 4, electric push rod 5, robotic arm 6, and gripper 7, the substrate is clamped and transferred. Then, the substrate surface is sprayed with air by the nozzle 9 on the bottom of the bottom cover, thus cleaning the substrate surface. The arc groove 10 draws in the gas inside the transfer box 2, preventing dust from spreading inside the transfer box 2. At the same time, the electronically controlled valve at the through groove 3 opens, allowing silicon carbide particles inside the epitaxial wheel body 1 to be drawn into the annular groove 10, thus preventing particles inside the epitaxial wheel body 1 from contaminating the substrate, further ensuring the cleaning effect of the substrate, and thus ensuring the final product quality.

[0043] When the nozzle 9 needs to perform air cleaning on the substrate surface, the servo motor drives the gear 15 to rotate forward first and then in reverse, and the rotation angles in both directions are the same. Since the gear 15 meshes with the toothed plate 13, the toothed plate 13 will slide back and forth in the slide groove 14 under the drive of the gear 15. The reciprocating sliding of the toothed plate 13 will drive the rotating rod 12 meshing with the toothed plate 13 to continuously rotate forward and backward, thereby driving the nozzle 9, which is fixed to the rotating rod 12, to continuously swing. This allows the inert gas sprayed from the nozzle 9 to continuously sweep across the substrate surface at different angles, making it easier to blow away the dust adhering to the substrate surface, thereby improving the cleaning effect on the substrate.

[0044] When the tray 4 drives the electric push rod 5 and the robotic arm 6 to rotate, the tray 4 also drives the gear 6 to rotate synchronously. The rotating gear 6 then drives the transmission rod 17 to rotate synchronously. The rotating transmission rod 17 then drives the gear 18 on its top to rotate. Since the gear 18 meshes with the base 11, the base 11 also rotates synchronously with the gear 18. This causes the nozzle 9 on the surface of the base 11 to rotate with the tray 4. After the robotic arm 6 drives the gripper 7 back into the transfer box 2, the nozzle 9 can always be on the top surface of the substrate held by the gripper 7. The nozzle 9 is also located between the grippers. This allows the dust to be blown out from the less obstructed sides of the gripper 7 during the swinging of the nozzle 9 and the spraying of air onto the substrate surface, thus preventing dust from accumulating at the connection between the gripper 7 and the robotic arm 6.

[0045] While the substrate is still being processed inside the epitaxial furnace body 1, the robotic arm 6 first transfers the substrate to be processed to the transfer box 2 via the gripper 7, then cleans its surface with the nozzle 9, and then places it on the top surface of the partition inside the temporary storage tank 19. After the substrate is processed, the electronic control valve is opened, and the robotic arm 6 drives the gripper to reach into the epitaxial furnace body 1 to pick up the substrate, then returns to the transfer box 2, cleans it with the nozzle 9, and places the processed substrate at the bottom of the partition inside the transfer tank. Then the robotic arm 6 sends the substrate to be processed from the top surface of the partition into the epitaxial furnace body 1, while the processed substrate is taken out from the bottom sealing door 22. Since the robotic arm 6 can prepare for the cleaning of the next substrate in advance while the epitaxial furnace body 1 is still processing the substrate, the substrate preparation time is shortened, thereby improving work efficiency. At the same time, the two exhaust pipes 21 continuously suck up the gas in the temporary storage tank 19 to prevent dust in the air from contaminating the substrate in the temporary storage tank 19.

[0046] When the epitaxial furnace body 1 is processing a substrate, and the substrate to be processed is cleaned and placed on top of the partition, the electric push rod 5 will rise from the driven plate 26, and the driven plate 26 will push the transmission plate 25 to rise. Finally, the transmission plate 25 will drive the baffle 24 to rise, so that the baffle 24 can seal the connection between the transfer box 2 and the storage tank, thereby ensuring that the substrate stored in the storage tank can be in a sealed vacuum state, and further preventing dust from adhering to its surface.

[0047] When the robotic arm 6 needs to place the processed substrate into the temporary storage tank 19, the robotic arm 6 will place the processed substrate into the placement groove 29 on the surface of the receiving seat 28 to fix the substrate and prevent it from sliding in the temporary storage tank 19. When the user needs to remove the processed substrate from the receiving seat 28, the user needs to control the hydraulic rod 27 to drive the receiving seat 28 to descend. Since the limiting posts 30 on both sides of the receiving seat 28 are slidably connected in the guide groove 31, the receiving seat 28 will also rotate 180 degrees during the descent, so that the user can more easily remove the processed substrate from the placement groove 29.

[0048] When the robotic arm 6 places the substrate at the receiving seat 28, the substrate is placed on the top surface of the support column 33 by the gripper 7 of the robotic arm 6. Then, under the action of the substrate's gravity, the support column 33 continuously descends and compresses the spring 34 until the edge of the substrate rests on the support ring 32, thereby completing the fixation of the substrate. As a result, during the placement process, the substrate directly hits the bottom of the placement groove 29, causing damage to the substrate.

[0049] When the hydraulic rod 27 lowers the receiving seat 28 to the sealing door 22, the cooling seat 36 at the bottom of the temporary storage tank 19 will be inserted into the opening 35 on the surface of the receiving seat 28, thereby lifting the substrate from the support ring 32 for easy handling by the user. The cooling seat 36 is embedded with a cooling tube. When the substrate comes into contact with the cooling seat 36, the cooling seat 36 can dissipate heat from the substrate, thereby preventing the user from getting burned when handling it. At the same time, the substrate cools down quickly, allowing it to quickly enter the next processing step.

[0050] When the receiving seat 28 descends to the sealing door 22, the air guide pipe 39 is aligned with the air inlet 40 on the surface of the receiving seat 28. Then, driven by the hydraulic cylinder, the air guide pipe 39 is inserted into the air inlet 40 and inert gas is introduced. Finally, the inert gas is discharged from the jet hole 38, thereby cleaning the top surface of the processed substrate. Then, the suction pipe removes the dust-containing gas, thus cleaning the substrate surface to ensure smooth subsequent processing.

[0051] When the air duct 39 moves, the sealing membrane 41 can seal the gap between the air duct 39 and the temporary storage tank 19, thereby ensuring the airtightness of the temporary storage tank 19. At the same time, after the air duct 39 is inserted into the air inlet 40, the rubber gasket 42 can also fill the gap between the inner wall of the air inlet 40 and the air duct 39, thereby reducing gas leakage.

[0052] The foregoing has shown and described the basic principles, main features, and advantages of the present invention. Those skilled in the art should understand that the present invention is not limited to the above embodiments. The embodiments and descriptions in the specification are merely illustrative of the principles of the invention. Various changes and modifications can be made to the invention without departing from its spirit and scope, and all such changes and modifications fall within the scope of the present invention as claimed. The scope of protection of the present invention is defined by the appended claims and their equivalents.

Claims

1. An epitaxial furnace substrate transfer device, characterized in that: The system includes an epitaxial furnace body; a transfer box is fixedly connected to one side of the epitaxial furnace body; through grooves are formed on opposite surfaces of both sides of the transfer box; the through grooves communicate with the epitaxial furnace body, and an electrically controlled valve is installed at the connection point; a tray is rotatably connected inside the transfer box, and the tray is driven by a servo motor; an electric push rod is embedded at the center of the surface of the tray; a robotic arm is fixedly connected to the telescopic end of the electric push rod; a gripper is installed at the execution end of the robotic arm; a top cover is fixedly connected to the top surface of the transfer box; multiple evenly arranged nozzles are installed on the bottom surface of the top cover; the nozzles are connected to an external gas pumping assembly; the external gas pumping assembly pumps pure inert gas into the nozzles through a gas pump; an arc-shaped groove is formed on the inner wall of the transfer box; the arc-shaped groove is connected to an external vacuum pump.

2. The epitaxial furnace substrate transfer device according to claim 1, characterized in that: A base is provided on the top surface of the nozzle; a rotating rod is fixedly connected to each nozzle in the same row; the rotating rod rotates on the bottom surface of the base; a toothed plate is engaged with one end of the rotating rod; a sliding groove is opened on the surface of the base at the corresponding position of the toothed plate; the toothed plate is slidably connected in the sliding groove; a gear is engaged with the top surface of the toothed plate; the gear is rotatably connected to the top surface of the base, and the gear is driven by a servo motor.

3. The epitaxial furnace substrate transfer device according to claim 2, characterized in that: The side surface of the tray is meshed with a second gear; the top surface of the second gear is fixedly connected to a transmission rod; the rotating rod is rotatably connected to the inner wall of the transfer box; the top surface of the transmission rod is fixedly connected to a third gear; the third gear is meshed with the base.

4. The epitaxial furnace substrate transfer device according to claim 1, characterized in that: A temporary storage tank is fixedly connected to one side of the transfer box; the temporary storage tank is connected to the transfer box and is adjacent to the epitaxial furnace body; a partition plate is fixedly connected inside the temporary storage tank; a pair of exhaust pipes are fixedly connected to one side surface of the temporary storage tank; the two exhaust pipes are connected to the inside of the temporary storage tank, and the two exhaust pipes are located at the top and bottom of the partition plate respectively; the exhaust pipes are connected to an external vacuum pump; a sealing door is installed on the side of the temporary storage tank away from the transfer box, and the sealing door is located at the bottom of the partition plate.

5. The epitaxial furnace substrate transfer apparatus according to claim 4, characterized in that: A top-out groove is provided at the connection between the temporary storage tank and the transfer box; a baffle is slidably connected inside the top-out groove, and the baffle can seal the connection between the temporary storage tank and the transfer box; a transmission plate is fixedly connected to the side of the baffle near the transfer box; a driven plate is fixedly connected to the side surface of the telescopic end of the electric push rod; the end of the transmission plate away from the baffle is located at the top of the driven plate; the arc-shaped groove is located at the top of the driven plate.

6. The epitaxial furnace substrate transfer apparatus according to claim 5, characterized in that: The bottom surface of the temporary storage tank is inlaid with a hydraulic rod; the top surface of the hydraulic rod is fixedly connected to a rotatable support; the top surface of the support has a placement groove; both sides of the support are fixedly connected to limit posts; the inner wall of the temporary storage tank has guide grooves at the corresponding positions of the limit posts; the limit posts are slidably connected in the guide grooves.

7. The epitaxial furnace substrate transfer apparatus according to claim 6, characterized in that: A support ring is fixed to the inner wall of the placement groove; the inner diameter of the support ring is smaller than the diameter of the substrate; a support column is slidably connected to the bottom of the placement groove at the center; a spring is fixed between the support column and the bottom of the placement groove.

8. The epitaxial furnace substrate transfer apparatus according to claim 7, characterized in that: The bottom surface of the receiving seat is provided with a pair of arc-shaped grooves, and the arc-shaped grooves penetrate the receiving seat; the bottom surface of the temporary storage tank is fixedly connected to a pair of cooling seats at the corresponding positions of the arc-shaped grooves; the cooling seats are adapted to the arc-shaped grooves and are embedded with cooling pipes.

9. The epitaxial furnace substrate transfer apparatus according to claim 6, characterized in that: The inner wall of the receiving seat is provided with a plurality of evenly spaced air jet holes; the inner wall of the temporary storage tank is slidably connected to a gas guide pipe on the side away from the sealing door, and the gas guide pipe is driven by a hydraulic cylinder; the side surface of the receiving seat is provided with an air inlet, and the air inlet is adapted to the gas guide pipe; the gas guide pipe is connected to an external gas pumping assembly; the external gas pumping assembly is used to introduce pure inert gas into the gas guide pipe.

10. An epitaxial furnace substrate transfer apparatus according to claim 9, characterized in that: A sealing membrane is fixed between the surface of the air guide tube and the inner wall of the temporary storage tank, and the sealing membrane is elastic; a rubber pad is fixed at the opening of the air guide tube, and the cross-section of the rubber pad is triangular.

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