Liquid supply device, cleaning device, cleaning method, and computer readable medium

Abstract

The application discloses a liquid supply device, a cleaning device, a cleaning method and a computer readable medium. The liquid supply device comprises a nozzle, a splash-proof cover, an absorption assembly and a flushing pipeline. The nozzle is used for supplying a processing liquid to the surface of a substrate. The splash-proof cover is arranged at the outer periphery of the nozzle and has a suction port. The absorption assembly comprises an absorption channel and a suction device. The absorption channel is used for communicating with the inner side of the splash-proof cover through the suction port. The suction device is used for sucking the gas on the inner side of the splash-proof cover through the absorption channel. The flushing pipeline is connected with the absorption channel and is used for introducing a flushing liquid into the absorption channel to flush the absorption channel. The application can flush the crystallization in the absorption channel clean, avoid affecting the absorption effect of the absorption channel, and avoid the crystallization from falling onto the surface of the substrate to cause pollution.

Description

Technical Field

[0001] This application relates to the field of semiconductor manufacturing technology, and in particular to a liquid supply device, a cleaning device, a cleaning method, and a computer-readable medium. Background Technology

[0002] In semiconductor substrate processing, after photolithography, the photoresist on the substrate surface needs to be cleaned off. SPM (Sulfuric Acid Hydrogen Peroxide Mixture) is typically used for photoresist stripping, as its strong oxidizing properties can decompose the photoresist.

[0003] During the photoresist cleaning process, SPM solution is supplied to the substrate surface through nozzles. The SPM solution reacts violently with the photoresist on the substrate surface, resulting in splashing and the generation of acid gas. Typically, a splash shield is placed around the nozzle, and an absorption channel is used to absorb the gas inside the splash shield, removing gases such as acid gas. However, acid gas may crystallize within the absorption channel. In actual substrate processing, these crystals can easily affect the absorption efficiency of the absorption channel or fall onto the substrate surface, causing contamination.

[0004] Therefore, it is necessary to provide a liquid supply device, a cleaning device, a cleaning method, and a computer-readable medium to solve the problem of improving crystallization within the absorption channel. Summary of the Invention

[0005] The purpose of this application is to solve the problem of how to improve crystallization within absorption channels in the prior art.

[0006] To address the aforementioned problems, one embodiment of this application provides a liquid supply device, comprising:

[0007] Nozzles are used to supply processing liquid to the surface of the substrate.

[0008] A splash guard is provided on the outer periphery of the nozzle, and the splash guard has a suction port;

[0009] An absorption assembly includes an absorption channel and a suction device. The absorption channel communicates with the inside of a splash shield via a suction port, and the suction device draws gas from the inside of the splash shield through the absorption channel.

[0010] The flushing line, connected to the absorption channel, is used to introduce flushing fluid into the absorption channel to flush it.

[0011] Another embodiment of this application provides a cleaning apparatus, comprising:

[0012] The cleaning tank contains cleaning fluid and is used to clean the splash guard of the aforementioned liquid supply device.

[0013] Another embodiment of this application provides a cleaning method for cleaning the splash guard of the above-mentioned liquid supply device. The cleaning method includes:

[0014] Supply cleaning fluid to the cleaning tank of the cleaning device;

[0015] Clean the splash guard in the cleaning solution and control the splash guard to rise and fall in the cleaning solution;

[0016] After the predetermined time, the supply of cleaning fluid to the cleaning tank is stopped, and the splash guard is controlled to stop rising and falling.

[0017] Drain the cleaning fluid from the cleaning tank.

[0018] Another embodiment of this application proposes a computer-readable medium storing computer program code that implements the above-described cleaning method when executed by a processor.

[0019] This application uses a flushing pipeline to flush the absorption channel, which can clean away crystals and other contaminants in the absorption channel, thus avoiding affecting the absorption effect of the absorption channel and preventing crystals from falling onto the substrate surface and causing contamination.

[0020] Other features and corresponding beneficial effects of this application will be described in the latter part of the specification, and it should be understood that at least some of the beneficial effects will become obvious from the description in this application. Attached Figure Description

[0021] Figure 1 This is a schematic diagram illustrating an application scenario of a liquid supply device according to an embodiment of this application;

[0022] Figure 2 For this application Figure 1 A bottom view of the splash guard in the embodiment shown;

[0023] Figure 3 For this application Figure 1 A cross-sectional structural schematic diagram of the splash guard in the embodiment shown;

[0024] Figure 4 This is a schematic diagram of the structure of a liquid supply device according to an embodiment of this application;

[0025] Figure 5 for Figure 1 Enlarged view of section F in the middle;

[0026] Figure 6 for Figure 1 A cross-sectional view along section line AA;

[0027] Figure 7 This is a cross-sectional structural diagram of a splash guard according to another embodiment of this application;

[0028] Figure 8 This is a schematic diagram of the liquid supply device according to another embodiment of this application;

[0029] Figure 9 This is a cross-sectional structural diagram of a liquid supply device and a cleaning device according to an embodiment of this application; and

[0030] Figure 10 This is a flowchart of a cleaning method according to an embodiment of this application. Detailed Implementation

[0031] The following specific embodiments illustrate the implementation of this application. Those skilled in the art can easily understand other advantages and effects of this application from the content disclosed in this specification. Although the description of this application will be presented in conjunction with preferred embodiments, this does not mean that the features of this application are limited to this embodiment. On the contrary, the purpose of describing the application in conjunction with embodiments is to cover other options or modifications that may extend from the scope of protection of this application. To provide a thorough understanding of this application, many specific details will be included in the following description. This application may also be implemented without using these details. Furthermore, to avoid confusion or obscuring the focus of this application, some specific details will be omitted in the description. It should be noted that, unless otherwise specified, the embodiments and features in the embodiments of this application can be combined with each other.

[0032] It should be noted that in this specification, similar reference numerals and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0033] The technical solutions of this application will now be clearly and completely described with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this application. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0034] In the description of this application, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0035] In the description of this application, it should be noted that, unless otherwise expressly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection between two components. Those skilled in the art can understand the specific meaning of the above terms in this application based on the specific circumstances.

[0036] To make the objectives, technical solutions, and advantages of this application clearer, the embodiments of this application will be described in further detail below with reference to the accompanying drawings.

[0037] The liquid supply device proposed in this application is applicable to high-temperature SPM cleaning equipment, or other wet cleaning and etching equipment that requires a liquid supply device. The liquid supply device is used to supply a processing liquid from the top of the substrate to the surface of the substrate. The processing liquid can be an SPM solution or a phosphoric acid solution, etc.

[0038] Figure 1 This is a schematic diagram illustrating an application scenario of a liquid supply device according to an embodiment of this application.

[0039] refer to Figure 1 The liquid supply device provided in this application includes a nozzle 10, a splash shield 20, an absorption assembly, and a rinsing conduit 30. The nozzle 10 supplies treatment liquid to the surface of the substrate 50. The splash shield 20 is disposed on the outer periphery of the nozzle 10 to reduce the spray distance and range of the splashed liquid. The splash shield 20 has a suction port 21. The absorption assembly includes an absorption channel 40 and a suction device 45. The absorption channel 40 communicates with the inner side of the splash shield 20 through the suction port 21. The suction device 45 draws gas, such as acid gas, from the inner side of the splash shield 20 through the absorption channel 40 to prevent the acid gas from spreading over a wide area. The absorption channel 40 is also connected to the rinsing conduit 30, which is used to introduce rinsing liquid into the absorption channel 40 to rinse it. A first end of the absorption channel 40 communicates with the inner side of the splash shield 20, and a second end of the absorption channel 40 communicates with the rinsing conduit 30. The rinsing pipe 30 introduces rinsing liquid into the absorption channel 40 from the second end and discharges it from the first end, thereby cleaning the absorption channel 40. Since acid gas may condense and crystallize inside the absorption channel 40, rinsing the absorption channel 40 through the rinsing pipe 30 can remove the crystals inside the absorption channel 40, avoiding affecting the absorption effect of the absorption channel 40 and preventing crystals from falling onto the surface of the substrate 50 and causing contamination.

[0040] In some embodiments, reference Figure 1The absorption assembly also includes a suction switch valve 401 and a pressure gauge 403. The suction switch valve 401 and pressure gauge 403 are disposed on the absorption channel 40. The suction switch valve 401 controls the opening and closing of the absorption channel 40, and the pressure gauge 403 monitors the internal pressure of the absorption channel 40. A flushing switch valve 301 is disposed on the flushing pipeline 30, which controls the opening and closing of the flushing pipeline 30. In this embodiment, the suction device 45 can be the exhaust device of the cleaning equipment itself where the liquid supply device is located, or it can be a newly configured device, such as a vacuum generator. It can also include both the vacuum generator and the exhaust device, with the vacuum generator connected to the exhaust device for simultaneous suction. When the suction device 45 is a vacuum generator, if the pressure gauge 403 detects an abnormal internal pressure in the absorption channel 40, it can feed back to the controller, which will issue an alarm signal, prompting the operator to perform maintenance.

[0041] In some embodiments, reference Figure 1 The liquid supply device also includes a purge line 32 for introducing a purge medium into the absorption channel 40 to dry the absorption channel 40 and prevent liquid droplets in the absorption channel 40 from falling onto the substrate 50. The purge medium is, for example, nitrogen gas.

[0042] In some embodiments, reference Figure 1 The splash shield 20 has an inner wall 25 and an outer wall 27. The inner wall 25 is closer to the nozzle 10, and the outer wall 27 is further away from the nozzle 10 than the inner wall 25. The suction port 21 penetrates through the inner wall 25. The inner side of the splash shield 20 refers to the space enclosed by the inner wall 25, and the nozzle 10 is located within this space. The absorption channel 40 includes a first absorption channel 41 and a second absorption channel 43. The first absorption channel 41 is formed between the inner wall 25 and the outer wall 27, and its first end communicates with the suction port 21. The second absorption channel 43 is located outside the splash shield 20, and its first end communicates with the second end of the first absorption channel 41. The second end of the second absorption channel 43 is connected to the suction device 45. Figure 1 In the example shown, the nozzle 10 is independently positioned and embedded within the splash guard 20. In other embodiments, the nozzle 10 may also be formed on the body of the splash guard 20 by machining through holes.

[0043] Figure 2 For this application Figure 1 The diagram shows a bottom view of the splash guard in the embodiment shown.

[0044] In some embodiments, in conjunction with reference Figure 1 and Figure 2 The first absorption channel 41 has one or more. For example... Figure 1 and Figure 2The system comprises multiple first absorption channels 41, which are evenly distributed circumferentially along the splash shield 20. It also comprises multiple suction ports 21, with the first ends of each of the first absorption channels 41 communicating with a second absorption channel 43 after converging. The suction ports 21 are circular or elliptical in shape. In this embodiment, the presence of multiple first absorption channels 41 and suction ports 21 allows for the absorption of gases, such as acid gases, over a wider range, resulting in better suction performance. Figure 2 In the example shown, a ring of suction ports 21 is provided on the inner sidewall 25. In other examples, multiple rings of suction ports 21 may also be provided on the inner sidewall 25. The first absorption channel 41 may also be single and annular.

[0045] Figure 3 For this application Figure 1 A cross-sectional structural diagram of the splash guard in the embodiment shown.

[0046] In some embodiments, reference Figure 3 The sidewall of the splash guard 20 includes a main body 201 and an extension 202. The extension 202 extends from the main body 201 in a direction away from the nozzle 10. The first end of the first absorption channel 41 is inclined relative to the horizontal plane and penetrates the inner sidewall 25 corresponding to the extension 202 to form a suction port 21. This method of forming the suction port 21 increases the suction area and allows for the suction of gas from the edge of the extension 202, thus increasing the suction range and improving the suction effect. The extension direction of the extension 202 forms an angle α with the vertically downward direction, and the angle α is an acute angle. Figure 3 In the example shown, the main body 201 is cylindrical, one end of the extension 202 is connected to the main body 201, and the other end of the extension 202 away from the main body 201 extends away from the nozzle 10. In other words, the other end of the extension 202 away from the main body 201 extends outward, and this other end is further away from the nozzle 10 in the radial direction of the splash shield 20 than the main body 201.

[0047] Figure 4 This is a schematic diagram of the liquid supply device according to an embodiment of this application.

[0048] In some embodiments, reference Figure 1 and Figure 4 The liquid supply device also includes a swing arm 70, which is connected to the splash shield 20 and the nozzle 10 respectively. The swing arm 70 is used to move the splash shield 20 and the nozzle 10 so that the splash shield 20 and the nozzle 10 are moved above or away from the substrate 50. The second absorption channel 43 is located inside the swing arm 70. For example, the second absorption channel 43 is disposed in the cavity 71 of the swing arm 70, on the swing arm 70, or is the cavity 71 of the swing arm 70.

[0049] exist Figure 1 In the example shown, the second absorption channel 43 is disposed in the cavity 71 of the swing arm 70, so the outer peripheral surface of the splash shield 20 is smooth and without dead corners, making it difficult for liquid to accumulate when cleaning the splash shield 20. The second absorption channel 43 can be formed by an air extraction pipe 60, that is, the internal channel of the air extraction pipe 60 is the second absorption channel 43. In addition, a liquid supply pipe 80 is also disposed in the cavity 71 of the swing arm 70. The liquid supply pipe 80 is connected to the nozzle 10 and is used to supply treatment liquid to the nozzle 10. A liquid supply switch valve 801 is disposed on the liquid supply pipe 80 to control the opening and closing of the liquid supply pipe 80. When the flushing pipe 30 introduces flushing liquid into the absorption channel 40, the liquid supply switch valve 801 is closed. In other examples, this can also be omitted. Figure 1 The exhaust pipe 60 shown uses the cavity 71 of the swing arm 70 directly as the second absorption channel 43. Alternatively, the second absorption channel 43 can be formed by machining through holes on the body of the swing arm 70.

[0050] Figure 5 for Figure 1 Enlarged view of section F in the middle; Figure 6 for Figure 1 Cross-sectional view along section line AA.

[0051] In some embodiments, in conjunction with reference Figure 5 and Figure 6 The swing arm 70 comprises, from the inside out, an inner liner 73, a metal tube 75, an anti-corrosion layer (not shown), and a housing 79. The inner liner 73 forms the cavity 71 inside the swing arm 70. The material of the inner liner 73 is hydrophobic, preventing moisture adhesion after the flushing pipe 30 flushes the cavity 71. The metal tube 75 is positioned between the housing 79 and the inner liner 73, reinforcing the swing arm 70. The anti-corrosion layer is positioned on the outer periphery of the metal tube 75 to prevent acid gases from seeping between the housing 79 and the metal tube 75 and corroding the metal tube 75. The housing 79 can be made of PTFE, and the inner liner 73 can be made of PFA.

[0052] In some embodiments, reference Figure 1 The outer surface of the splash guard 20 is made of a hydrophobic material, which does not easily attract water. After the splash guard 20 has been cleaned in the cleaning device, it can be removed from the cleaning device without drying. The cleaning device will be described later.

[0053] In some embodiments, reference Figure 1The liquid supply device also includes a breather hole 23, which communicates with the inner side of the splash guard 20. When the splash guard 20 is immersed in the cleaning fluid for cleaning, the breather hole 23 allows air inside the splash guard 20 to escape, thereby facilitating the entry of the cleaning fluid into the inner side of the splash guard 20, ensuring that the surface of the inner wall 25 facing the nozzle 10 is fully in contact with the cleaning fluid. Figure 1 In the example shown, the vent 23 is connected to the absorption channel 40, with the outlet of the vent 23 facing upwards. The size of the vent 23 is smaller than the size of the absorption channel 40, with the ratio between the size of the vent 23 and the size of the absorption channel 40 ranging from 1 / 10 to 1 / 5, thereby reducing or even eliminating the impact on the rinsing and suction of the absorption channel 40. In other embodiments, the vent 23 may not be provided. Instead, when the splash shield 20 is immersed in the cleaning solution for cleaning, the suction switch valve 401 is opened to allow air to escape from the inside of the splash shield 20, thereby allowing the cleaning solution to enter the inside of the splash shield 20. Alternatively, a separate valve may be provided on the passage of the absorption channel 40, which is opened when the splash shield 20 is immersed in the cleaning solution for cleaning.

[0054] Figure 7 This is a cross-sectional structural diagram of a splash guard according to another embodiment of this application; Figure 8 This is a schematic diagram of the liquid supply device according to another embodiment of this application.

[0055] In some embodiments, reference Figure 7 and Figure 8 The splash guard 20 includes a side wall 25, through which a suction port 21 penetrates. The absorption channel 40 is formed by a suction pipe 60 located outside the swing arm 70. Depending on actual process requirements, the liquid supply device may also include a housing (not shown), which is disposed outside the splash guard 20 and the suction pipe 60. The inner side of the housing wraps around the splash guard 20 and the suction pipe 60, while the outer side of the housing is smooth and free of dead corners, making it less prone to liquid accumulation. In other embodiments, the absorption channel 40 may be located inside the swing arm 70.

[0056] Figure 9 This is a cross-sectional structural diagram of a liquid supply device and a cleaning device according to an embodiment of this application.

[0057] In some embodiments, reference Figure 9This application also proposes a cleaning device 90, which includes a cleaning tank 91, an inlet pipe 93, and a drain pipe 95. The cleaning tank 91 is used to clean the splash guard 20 in the aforementioned liquid supply device. It should be understood that since the splash guard 20 is located on the outer periphery of the nozzle 10, the portion of the nozzle 10 located inside the splash guard 20 can also be cleaned during the cleaning process. The cleaning tank 91 has an inlet and a drain. The inlet pipe 93 is connected to the inlet and supplies cleaning liquid to the cleaning tank 91 through the inlet. The drain pipe 95 is connected to the drain and discharges the cleaning liquid from the cleaning tank 91 through the drain. The inlet pipe 93 is equipped with an inlet switch valve 931 and a flow meter 933. The inlet switch valve 931 is used to control the opening and closing of the inlet pipe 93, and the flow meter 933 is used to monitor the flow rate in the inlet pipe 93 in real time. A drain valve 951 is installed on the drain pipe 95 to control the opening and closing of the drain pipe 95. In this embodiment, the inlet and outlet can share a single inlet 911. The cleaning fluid can be pure water.

[0058] In some embodiments, reference Figure 9 The cleaning device 90 also includes an overflow trough 97, which is located on the outer periphery of the cleaning tank 91 to receive the cleaning fluid overflowing from the cleaning tank 91. The overflow trough 97 reduces the requirements for cleaning fluid flow rate and supply time, eliminating concerns about cleaning fluid in the cleaning tank 91 flowing outside the cleaning device 90. Furthermore, to improve the cleaning effect of the splash guard 20, it can be raised and lowered several times during the cleaning process. The cleaning fluid carried out by the splash guard 20 during its raising can overflow into the overflow trough 97, while simultaneously providing a continuous supply of cleaning fluid to the cleaning tank 91. This eliminates concerns about cleaning fluid overflowing outside the cleaning device 90 or insufficient cleaning fluid, thereby reducing the requirements for cleaning fluid flow rate and supply time, making the cleaning process of the splash guard 20 simple and convenient. Additionally, the cleaning device 90 may also include an overflow pipe 971, which is connected to the overflow trough 97 to discharge the cleaning fluid from the overflow trough 97. When cleaning the splash guard 20, cleaning fluid can be supplied to the cleaning tank 91 while the cleaning fluid in the overflow tank 97 is discharged, so that the cleaning fluid in the cleaning tank 91 has fluidity, which helps to clean the splash guard 20.

[0059] In this embodiment, combined with Figure 1 and Figure 9Rinsing fluid is introduced into the absorption channel 40 through the rinsing pipe 30 to rinse the absorption channel 40. After rinsing, the rinsing fluid can be discharged from the absorption channel 40 into the cleaning device 90. For example, after the actual substrate processing is completed, the nozzle 10 is moved from above the substrate 50 to above the cleaning device 90, and then the nozzle 10 is lowered into the cleaning tank 91 of the cleaning device 90, with the splash guard 20 lowering along with the nozzle 10. The rinsing switch valve 301 is opened to rinse the absorption channel 40, and the rinsing fluid in the rinsing pipe 30 is discharged into the cleaning tank 91. At this time, the drain switch valve 951 can be opened to discharge the rinsing fluid from the cleaning tank 91. After rinsing the absorption channel 40, the absorption channel 40 is dried through the blow-through pipe 32.

[0060] Figure 10 This is a flowchart of a cleaning method according to an embodiment of this application.

[0061] In some embodiments, in conjunction with reference Figure 1 , Figure 9 and Figure 10 This application proposes a cleaning method, which can be implemented based on the aforementioned liquid supply device, for cleaning the splash guard 20 in the liquid supply device. The cleaning method includes the following steps:

[0062] Cleaning fluid is supplied to the cleaning tank 91 of the cleaning device 90. Specifically, the inlet valve 931 is opened and the drain valve 951 is closed. During this step, cleaning fluid can be continuously supplied to the cleaning tank 91.

[0063] The splash guard 20 is cleaned in the cleaning solution, and its raising and lowering within the solution is controlled. In this step, the splash guard 20 is immersed in the cleaning solution, and the cleaning solution in the cleaning tank 91 can overflow into the overflow tank 97. Simultaneously controlling the splash guard 20 to rise and fall several times within the cleaning solution—for example, controlling the splash guard 20 to descend and immerse itself in the cleaning solution, then rise to a predetermined height—helps improve the cleaning effect of the splash guard 20. By using the breather 23 or opening the suction switch valve 401, the surface of the inner wall 25 facing the nozzle 10 can be made to fully contact the cleaning solution, further ensuring a thorough cleaning of the splash guard 20.

[0064] After the predetermined time, the supply of cleaning fluid to the cleaning tank 91 is stopped, and the splash guard 20 is controlled to stop rising and falling; and

[0065] Drain the cleaning fluid from the cleaning tank 91. Specifically, close the inlet valve 931 and open the drain valve 951.

[0066] In actual cleaning, the above steps can be repeated cyclically. Specifically, by draining the cleaning fluid from the cleaning tank 91 and then resupplying it to the cleaning tank 91 of the cleaning device 90, the cleanliness of the cleaning fluid in the cleaning tank 91 is improved, thus enhancing the cleaning effect of the splash guard 20. The frequency and speed of the splash guard 20's raising and lowering can be set according to the actual process.

[0067] Finally, the splash guard 20 was cleaned.

[0068] In this embodiment, after cleaning the splash guard 20, the supply of cleaning fluid to the cleaning tank 91 is stopped, and the cleaning fluid in the cleaning tank 91 is drained. Specifically, the inlet valve 931 is closed, and the drain valve 951 is opened. After the cleaning fluid in the cleaning tank 91 is drained, the drain valve 951 is closed.

[0069] In this embodiment, the splash shield 20 can be cleaned after rinsing the absorption channel 40, or the steps of rinsing the absorption channel 40 and cleaning the splash shield 20 can be repeated.

[0070] This application also proposes a computer-readable medium storing computer program code that implements the cleaning method described above when executed by a processor.

[0071] When the cleaning method is implemented as a computer program, it can also be stored as an article of manufacture in a computer-readable storage medium. For example, computer-readable storage media can include, but are not limited to, magnetic storage devices (e.g., hard disks, floppy disks, magnetic stripes), optical discs (e.g., compact discs (CDs), digital multifunction discs (DVDs)), smart cards, and flash memory devices (e.g., electrically erasable programmable read-only memory (EPROM), cards, sticks, key drives). Furthermore, the various storage media described herein can represent one or more devices and / or other machine-readable media for storing information. The term "machine-readable medium" can include, but is not limited to, wireless channels and various other media (and / or storage media) capable of storing, containing, and / or carrying code and / or instructions and / or data.

[0072] It should be understood that the embodiments described above are merely illustrative. The embodiments described herein may be implemented in hardware, software, firmware, middleware, microcode, or any combination thereof. For hardware implementation, the processor may be implemented within one or more application-specific integrated circuits (ASICs), digital signal processors (DSPs), digital signal processing devices (DSPDs), programmable logic devices (PLDs), field-programmable gate arrays (FPGAs), processors, controllers, microcontrollers, microprocessors, and / or other electronic units designed to perform the functions described herein, or combinations thereof.

[0073] Some aspects of this application can be executed entirely by hardware, entirely by software (including firmware, resident software, microcode, etc.), or by a combination of hardware and software. The aforementioned hardware or software may be referred to as a "data block," "module," "engine," "unit," "component," or "system." The processor may be one or more application-specific integrated circuits (ASICs), digital signal processors (DSPs), digital signal processing devices (DAPDs), programmable logic devices (PLDs), field-programmable gate arrays (FPGAs), processors, controllers, microcontrollers, microprocessors, or combinations thereof. Furthermore, aspects of this application may manifest as computer products residing in one or more computer-readable media, including computer-readable program code. For example, computer-readable media may include, but are not limited to, magnetic storage devices (e.g., hard disks, floppy disks, magnetic tapes, etc.), optical discs (e.g., compressed CDs, digital multifunction DVDs, etc.), smart cards, and flash memory devices (e.g., cards, sticks, key drives, etc.).

[0074] A computer-readable medium may contain a propagated data signal containing computer program code, for example, on baseband or as part of a carrier wave. This propagated signal may take various forms, including electromagnetic, optical, and so on, or suitable combinations thereof. A computer-readable medium can be any computer-readable medium other than a computer-readable storage medium, which can be connected to an instruction execution system, apparatus, or device to enable communication, propagation, or transmission of a program for use. The program code located on the computer-readable medium can be propagated through any suitable medium, including radio, cable, fiber optic cable, radio frequency signals, or similar media, or any combination of the above media.

[0075] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this application, and are not intended to limit them. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. A liquid supply device, characterized in that, include: Nozzles are used to supply processing liquid to the surface of the substrate. A splash guard is disposed on the outer periphery of the nozzle, and the splash guard has a suction port; An absorption assembly includes an absorption channel and a suction device. A first end of the absorption channel communicates with the inside of the splash shield via a suction port. The suction device is connected to a second end of the absorption channel and is used to suction gas from the inside of the splash shield through the absorption channel. A flushing pipeline, connected to the second end of the absorption channel, is used to introduce flushing fluid into the absorption channel to flush it.

2. The liquid supply device according to claim 1, characterized in that, It also includes a purge line for introducing a purge medium into the absorption channel to dry the absorption channel.

3. The liquid supply device according to claim 1, characterized in that, The splash shield has an inner sidewall and an outer sidewall. The inner sidewall is close to the nozzle, and the outer sidewall is further away from the nozzle than the inner sidewall. The suction port penetrates the inner sidewall, and the absorption channel includes: A first absorption channel is formed between the inner sidewall and the outer sidewall, and a first end of the first absorption channel is connected to the suction port; The second absorption channel is located outside the splash shield, and the first end of the second absorption channel is connected to the second end of the first absorption channel, and the second end of the second absorption channel is connected to the suction device.

4. The liquid supply device according to claim 3, characterized in that, The sidewall includes a main body and an extension. The extension extends from the main body in a direction away from the nozzle. The first end of the first absorption channel is inclined relative to the horizontal plane and penetrates the inner sidewall corresponding to the extension to form the suction port.

5. The liquid supply device according to claim 3, characterized in that, Also includes: A swing arm, connected to both the splash shield and the nozzle, is used to move the splash shield and the nozzle; wherein... The second absorption channel is located inside the swing arm.

6. The liquid supply device according to claim 5, characterized in that, The swing arm includes: A housing and an inner liner, the housing being disposed on the outer periphery of the inner liner, the inner liner being used to form a cavity inside the swing arm, the inner liner being made of a hydrophobic material.

7. The liquid supply device according to claim 1, characterized in that, The outer surface of the splash guard is made of a hydrophobic material.

8. The liquid supply device according to claim 1, characterized in that, Also includes: The breathing hole is connected to the inside of the splash guard.

9. A cleaning device, characterized in that, include: A cleaning tank containing cleaning fluid is used to clean the splash guard in the liquid supply device as described in any one of claims 1-8.

10. A cleaning method, characterized in that, For cleaning the splash guard in the liquid supply device as described in any one of claims 1-8, the cleaning method includes the following steps: Supply cleaning fluid to the cleaning tank of the cleaning device; The splash guard is cleaned in the cleaning solution, and the splash guard is controlled to rise and fall in the cleaning solution. After a predetermined time, the supply of cleaning fluid to the cleaning tank is stopped, and the splash guard is controlled to stop rising and falling; and Drain the cleaning fluid from the cleaning tank.

11. A computer-readable medium storing computer program code, characterized in that, The computer program code implements the cleaning method as described in claim 10 when executed by a processor.

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