Hypochlorous acid solution generating device capable of automatically adjusting displacement stroke based on solution amount

Abstract

The application discloses a hypochlorous acid solution generating device based on automatic adjustment of displacement stroke of solution quantity, relates to the technical field of hypochlorous acid solution production, and is used for generating sodium hypochlorite solution into hypochlorous acid water. The hypochlorous acid solution generating device comprises a main body mechanism, a displacement mechanism, a pipeline adjusting mechanism and a liquid replacing mechanism. The main body mechanism and the displacement mechanism are connected. The main body mechanism and the pipeline adjusting mechanism are connected. The main body mechanism and the liquid replacing mechanism are connected. The displacement mechanism and the pipeline adjusting mechanism are connected. The displacement mechanism and the liquid replacing mechanism are connected. The main body mechanism comprises a workbench, an initial solution storage tank and a hypochlorous acid water storage tank. The initial solution storage tank is arranged on the workbench. The hypochlorous acid water storage tank is arranged on the workbench. The workbench is connected with the displacement mechanism. The workbench is connected with the pipeline adjusting mechanism.

Description

Technical Field

[0001] This invention relates to the field of hypochlorous acid production technology, specifically a hypochlorous acid generating device based on automatic adjustment of the displacement stroke according to the solution volume. Background Technology

[0002] Hypochlorous acid has strong oxidizing properties and is widely used for disinfection and sterilization in medical and health, food processing, water treatment and other fields. In conventional technology, ion exchange is used to convert sodium hypochlorite solution into hypochlorous acid solution. Through displacement, sodium ions in sodium hypochlorite solution are replaced with hydrogen ions.

[0003] In most existing technologies for generating hypochlorous acid from sodium hypochlorite solution, the sodium hypochlorite solution is directly introduced and reacted with the H-type strong acid cation exchange resin layer. The flow path of the sodium hypochlorite solution is fixed, and the displacement path cannot be adjusted according to the input solution volume. At the same time, the resin after displacement has a high sodium ion content. If the solution is not changed, it may affect subsequent displacement. During the solution change process, the resin surface may not be horizontal due to solution exchange, which will affect the displacement path. Summary of the Invention

[0004] The purpose of this invention is to provide a hypochlorous acid generating device that automatically adjusts the displacement stroke based on the solution volume, so as to solve the problems raised in the prior art.

[0005] To achieve the above objectives, the present invention provides the following technical solution:

[0006] This generating device is used to generate hypochlorous acid water from sodium hypochlorite solution. The hypochlorous acid water generating device includes a main body, a displacement mechanism, a pipeline adjustment mechanism, and a liquid exchange mechanism. The main body and the displacement mechanism are connected, the main body and the pipeline adjustment mechanism are connected, the main body and the liquid exchange mechanism are connected, the displacement mechanism and the pipeline adjustment mechanism are connected, and the displacement mechanism and the liquid exchange mechanism are connected.

[0007] In this generating device, sodium hypochlorite solution is converted into hypochlorous acid solution. Sodium ions in the sodium hypochlorite solution are replaced by an H-type strong acid cation exchange resin. The main structure provides a support base and a place for the sodium hypochlorite and hypochlorous acid solutions. After the sodium hypochlorite solution is introduced, the replacement mechanism converts it into hypochlorous acid solution through the H-type strong acid cation exchange resin. The pipeline adjustment mechanism adjusts the position of the inlet in the replacement mechanism according to the amount of sodium hypochlorite solution input, and adjusts the replacement stroke according to the input solution volume to reduce wasted stroke and improve replacement efficiency. The liquid exchange mechanism discharges the sodium-containing resin solution that has completed hydrogen and sodium replacement from the resin solution, and then introduces new H-type strong acid cation exchange resin solution, ensuring that the resin solution is mostly hydrogen-containing, facilitating more efficient replacement. Simultaneously, by setting up a mechanism, the upper surface of the resin solution remains horizontal and stable during the liquid exchange process, fixing the stroke and reducing the impact of resin solution surging during liquid exchange, which could cause the upper surface to become uneven and affect the replacement stroke.

[0008] Furthermore, the main structure includes a workbench, an initial solution storage tank, and a hypochlorous acid water storage tank. The initial solution storage tank is placed on the workbench, the hypochlorous acid water storage tank is placed on the workbench, the workbench is connected to the replacement mechanism, the workbench is connected to the pipeline adjustment mechanism, the workbench is connected to the liquid replacement mechanism, the initial solution storage tank is connected to the replacement mechanism, and the hypochlorous acid water storage tank is connected to the replacement mechanism.

[0009] In the main structure, the workbench provides a place for the generating device to work, the initial solution storage tank is used to store sodium hypochlorite solution, and the hypochlorite water storage tank is used to store hypochlorite solution after the displacement is completed. The sodium hypochlorite solution is converted into hypochlorite solution through the displacement mechanism.

[0010] Furthermore, the replacement mechanism includes a replacement generator connected to a workbench. The replacement generator includes a preparation tank and an H-type strong acid cation exchange resin layer. The preparation tank is placed on the workbench, and the H-type strong acid cation exchange resin layer is placed inside the preparation tank at its lower level. The preparation tank is connected to a liquid exchange mechanism. The replacement mechanism also includes an injection pipe, a sampling pipe, and an injection port. The injection pipe and sampling pipe are placed on the workbench. One end of the injection pipe is connected to the injection port, and the end of the injection pipe away from the injection port is connected to the initial solution storage tank. The injection pipe is connected to the replacement generator and the preparation tank. The injection port is connected to the replacement generator and is placed in the preparation tank. The longitudinal section of the injection port is trapezoidal, and several liquid permeation holes are provided on the bottom and sides of the injection port. The sampling pipe is connected to the replacement generator and the preparation tank. One end of the sampling pipe is placed above the H-type strong acid cation exchange resin layer inside the preparation tank, and the other end of the sampling pipe is connected to the hypochlorous acid water storage tank. The injection pipe is connected to a pipeline adjustment mechanism and the liquid exchange mechanism.

[0011] In the replacement mechanism, the sodium ions in the sodium hypochlorite solution are replaced with hydrogen ions, turning it into a hypochlorous acid solution. The sodium hypochlorite solution flows from the initial solution storage tank through the injection pipe to the injection port into the H-type strong acid cation exchange resin layer. The injection port has liquid permeation holes at the bottom and sides, so that the solution can flow out not only from the bottom but also from the side, which can accelerate the replacement speed and improve the replacement efficiency. After the sodium hypochlorite solution passes through the H-type strong acid cation exchange resin layer and becomes a hypochlorous acid solution, the hypochlorous acid solution is drawn away by the liquid collection pipe above the H-type strong acid cation exchange resin layer and flows into the hypochlorous acid water storage tank.

[0012] Furthermore, the pipeline adjustment mechanism includes a flow detection device connected to the injection pipe. The flow detection device includes electrode plates and energized wires. Two electrode plates are provided, placed inside the injection pipe, and placed parallel to each other. The line connecting the two electrode plates is perpendicular to the solution flow direction. The two electrode plates are connected to energized wires. The pipeline adjustment mechanism also includes a pipeline length adjustment device connected to the worktable and the injection pipe. The pipeline length adjustment device includes a fixed rod and a pushing hydraulic cylinder. The fixed rod is connected to the worktable, the fixed end of the pushing hydraulic cylinder is fastened to the worktable, and the output end of the pushing hydraulic cylinder is fastened to the injection pipe. There are two sets of fixed rods. The first fixed rod is fastened to the injection pipe and is located on the side of the injection pipe near the initial solution storage tank. The second fixed rod is movably connected to the injection pipe. The fixed rod includes a through-ring and a rod body. The rod body and the through-ring are fastened to each other and the rod body is fastened to the worktable. The first through-ring is fastened to the injection pipe, and the second through-ring is slidably connected to the injection pipe.

[0013] In the pipeline adjustment mechanism, this mechanism is used to adjust the position of the injection port in the H-type strong acid cation exchange resin layer. It adjusts the displacement stroke according to the amount of sodium hypochlorite solution input, reducing wasted strokes and improving efficiency. The solution flow rate is detected by a flow detection device. When the electrode plate is conductive, an electromotive force is generated when the sodium hypochlorite solution passes through, which is converted into current. The solution flow rate is determined based on the duration of the current flow. When no solution flows through, an effective current loop cannot be formed. If the current loop exists for a longer time, the amount of sodium hypochlorite solution input is larger. At this time, the hydraulic cylinder is pushed to shorten until the injection pipe is parallel to the bottom surface of the worktable, positioned below the H-type strong acid cation exchange resin layer. After the sodium hypochlorite solution is injected, the flow rate reaches the H-type strong acid cation exchange resin layer. During the process at the top of the H-type strong acid cation exchange resin layer, the displacement stroke is relatively long, allowing for more thorough displacement. If the time is short, the amount of sodium hypochlorite solution input is less. In this case, the hydraulic cylinder is pushed up, causing the injection tube to be lifted between two fixed rods. The fixed rod near the initial solution storage tank is tightly connected to the injection tube. Therefore, when lifted, the injection tube and injection port in the H-type strong acid cation exchange resin layer move upward, and the injected sodium hypochlorite solution is located in the upper layer of the H-type strong acid cation exchange resin layer, with a shorter displacement stroke. Through this design, the displacement stroke can be changed according to the amount of sodium hypochlorite solution input, improving displacement efficiency and reducing useless displacement.

[0014] Furthermore, the liquid exchange mechanism includes a solution detection device, which is placed on the workbench and connected to the preparation tank. The solution detection device includes a monochromatic light source and a photoresistor, with no fewer than three photoresistors. The photoresistors are securely connected to the inner wall of the preparation tank and are placed at the bottom of the preparation tank. The monochromatic light source is securely connected to the workbench, and the monochromatic light beam is obliquely directed towards the preparation tank. The preparation tank near the monochromatic light source is made of transparent material, and the photoresistors are placed on the side from which the monochromatic light is emitted.

[0015] In the solution detection device, the concentration of resin replaced by the H-type strong acid cation exchange resin layer is detected. A monochromatic light source is obliquely incident into the resin layer. The refractive index of the air, the surface of the preparation tank, and the resin layer gradually increases. Therefore, after the light enters, the incident angle is greater than the refraction angle. When the device is started, the solution detection device starts simultaneously. Before the replacement, the light enters and is refracted onto a photoresistor. During the replacement process, hydrogen ions are replaced by sodium ions, and the refractive index decreases. Therefore, the light will be deflected, the refraction angle will increase, and the light will shine on other photoresistors, resulting in a decrease in the corresponding resistance. The concentration of hydrogen ions and sodium ions in the resin solution is detected by different photoresistors, thereby changing the liquid exchange rate.

[0016] Furthermore, the liquid exchange mechanism also includes a liquid exchange device, which is securely connected to the workbench. The liquid exchange device includes an input pipe, an output pipe, a proportional valve, an input tank, and an output tank. The proportional valve, input tank, and output tank are placed on the workbench. One end of the input pipe is connected to the tank body below the preparation tank, and the other end of the input pipe is connected to the proportional valve. The proportional valve is connected to the input tank through a pipe. One end of the output pipe is connected to the tank body below the preparation tank, and the other end of the output pipe is connected to the output tank. The liquid exchange mechanism also includes a perforated plate, which is securely connected to the inner wall of the preparation tank. The perforated plate is placed between the H-type strong acid cation exchange resin layer and the upper air layer, and the injection pipe passes through the perforated plate.

[0017] In the liquid exchange device, the injection rate of the H-type strong acid cation exchange resin solution is adjusted by controlling the proportional valve according to the solution detection device. Because the molecular weight of sodium ions is greater than that of hydrogen ions, the solution containing sodium ions will move downwards in the H-type strong acid cation exchange resin layer. Since the liquid exchange device is located in the lower half of the H-type strong acid cation exchange resin layer, when opened, it can directly flush a larger amount of sodium-containing solution from the output pipe to the output tank. Meanwhile, the H-type strong acid cation exchange resin solution flows from the input tank into the preparation tank through the input pipe. At this time, the content of H-type strong acid cation exchange resin solution in the preparation tank remains relatively high. However, a strong acidic cation exchange resin Na-type solution still exists. Due to the characteristic that the acidic cation exchange resin has a greater ion selectivity for sodium ions than hydrogen ions, the increased hydrogen ions after the sodium hypochlorite solution passes through the strong acidic cation exchange resin H-type layer come into contact with the strong acidic cation exchange resin Na-type layer and undergo a non-violent ion exchange reaction. This results in some hydrogen ions being replaced by sodium ions, allowing the final solution pH value to be maintained at around 5-6, which can inhibit the generation of chlorine gas. By covering the H-type strong acidic cation exchange resin layer with a porous plate, the resin solution can be stabilized during liquid exchange, keeping the resin surface level and maintaining a fixed displacement path.

[0018] Compared with the prior art, the beneficial effects of the present invention are as follows: After startup, the present invention, by setting a replacement mechanism, converts the sodium hypochlorite solution into a hypochlorous acid solution through the H-type strong acid cation exchange resin after the sodium hypochlorite solution is introduced. By setting a pipeline adjustment mechanism, the amount of sodium hypochlorite solution input is detected by an electrode plate. Based on the input amount, the hydraulic cylinder is driven to adjust the position of the input pipe in the replacement mechanism. If the amount of sodium hypochlorite solution input is large, the hydraulic cylinder is pushed to shorten until the injection pipe is parallel to the bottom surface of the worktable and placed below the H-type strong acid cation exchange resin layer. During the process of the sodium hypochlorite solution reaching the top of the H-type strong acid cation exchange resin layer, its replacement stroke is relatively long, allowing for more thorough replacement. If the amount of sodium hypochlorite solution input is small, the hydraulic cylinder is pushed to lift, causing the injection pipe to be lifted between two fixed rods, and the injection pipe and injection port in the H-type strong acid cation exchange resin layer move upward. The injected sodium hypochlorite solution is positioned in the upper layer of the H-type strong acid cation exchange resin layer, resulting in a shorter displacement stroke. The displacement stroke is adjusted according to the input solution volume to improve displacement efficiency and reduce wasted displacement. By setting up a liquid exchange mechanism, the concentration change of the resin solution is detected based on light refraction, thereby controlling the proportional valve and adjusting the injection speed of the H-type strong acid cation exchange resin solution. Since the molecular weight of sodium ions is greater than that of hydrogen ions, the solution containing sodium ions in the H-type strong acid cation exchange resin layer will move downwards. Therefore, the liquid exchange device is placed in a lower position of the preparation tank to directly displace most of the sodium-containing resin solution. The remaining sodium-containing resin will be further displaced, so that some hydrogen ions are replaced by sodium ions, inhibiting the generation of chlorine gas. A porous plate is placed on top of the H-type strong acid cation exchange resin layer to stabilize the resin solution during liquid exchange, maintain the resin surface level, and keep the displacement stroke fixed. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the overall structure of the present invention;

[0020] Figure 2 This is a side view of the present invention;

[0021] Figure 3 This is a top view of the present invention;

[0022] Figure 4 This is a schematic diagram illustrating the starting of the hydraulic cylinder according to the present invention;

[0023] Figure 5 Schematic diagram of flow detection device;

[0024] Figure 6 This is a schematic diagram of the interior of the preparation tank.

[0025] In the diagram: 1. Main body; 11. Workbench; 12. Initial solution storage tank; 13. Hypochlorous acid water storage tank; 2. Displacement mechanism; 21. Displacement generator; 211. Preparation tank; 22. Injection pipe; 23. Liquid collection pipe; 24. Injection port; 3. Pipeline adjustment mechanism; 31. Flow detection device; 311. Electrode plate; 32. Pipeline length adjustment device; 321. Fixing rod; 3211. Through-ring; 3212. Rod body; 322. Pushing hydraulic cylinder; 4. Liquid exchange mechanism; 41. Solution detection device; 411. Monochromatic light source; 412. Photoresistor; 42. Liquid exchange device; 421. Input pipe; 422. Output pipe; 423. Proportional valve; 43. Perforated plate. Detailed Implementation

[0026] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0027] Example: Figures 1-6 As shown, the present invention provides a hypochlorous acid solution generating device based on automatic adjustment of the displacement stroke of the solution volume. The generating device is used to generate hypochlorous acid water from sodium hypochlorite solution. The hypochlorous acid solution generating device includes a main body 1, a displacement mechanism 2, a pipeline adjustment mechanism 3, and a liquid exchange mechanism 4. The main body 1 and the displacement mechanism 2 are connected, the main body 1 and the pipeline adjustment mechanism 3 are connected, the main body 1 and the liquid exchange mechanism 4 are connected, the displacement mechanism 2 and the pipeline adjustment mechanism 3 are connected, and the displacement mechanism 2 and the liquid exchange mechanism 4 are connected.

[0028] In this generating device, sodium hypochlorite solution is converted into hypochlorous acid solution. Sodium ions in the sodium hypochlorite solution are replaced by H-type strong acid cation exchange resin. The main body 1 provides a supporting foundation and a place for the sodium hypochlorite solution and hypochlorous acid solution. After the sodium hypochlorite solution is introduced, the replacement mechanism 2 converts the sodium hypochlorite solution into hypochlorous acid solution through the H-type strong acid cation exchange resin. The pipeline adjustment mechanism 3 adjusts the position of the inlet 24 in the replacement mechanism 2 according to the amount of sodium hypochlorite solution input, and adjusts the replacement stroke according to the amount of solution input to reduce useless stroke and improve replacement efficiency. The liquid exchange mechanism 4 discharges the sodium-containing resin solution that has completed hydrogen and sodium replacement from the resin solution, and then introduces new H-type strong acid cation exchange resin solution, so that the resin solution is mostly hydrogen-containing resin solution, which facilitates more efficient replacement. At the same time, by setting the mechanism, the upper surface of the resin solution is kept horizontal and stable during the liquid exchange process, fixing the stroke and reducing the impact of resin solution surging caused by liquid exchange, which would cause the upper surface to be uneven and affect the replacement stroke.

[0029] The main body 1 includes a workbench 11, an initial solution storage tank 12, and a hypochlorous acid water storage tank 13. The initial solution storage tank 12 is placed on the workbench 11, the hypochlorous acid water storage tank 13 is placed on the workbench 11, the workbench 11 is connected to the replacement mechanism 2, the workbench 11 is connected to the pipeline adjustment mechanism 3, the workbench 11 is connected to the liquid replacement mechanism 4, the initial solution storage tank 12 is connected to the replacement mechanism 2, and the hypochlorous acid water storage tank 13 is connected to the replacement mechanism 2.

[0030] In the main body 1, the workbench 11 provides a place for the generating device to work, the initial solution storage tank 12 is used to store sodium hypochlorite solution, and the hypochlorite water storage tank 13 is used to store hypochlorite solution after the replacement is completed. The sodium hypochlorite solution is converted into hypochlorite solution by the replacement mechanism 2.

[0031] The replacement mechanism 2 includes a replacement generator 21 connected to a workbench 11. The replacement generator 21 includes a preparation tank 211 and an H-type strong acid cation exchange resin layer. The preparation tank 211 is placed on the workbench 11, and the H-type strong acid cation exchange resin layer is located inside the lower part of the preparation tank 211. The preparation tank 211 is connected to the liquid exchange mechanism 4. The replacement mechanism 2 also includes an injection pipe 22, a liquid collection pipe 23, and an injection port 24. The injection pipe 22 and the liquid collection pipe 23 are placed on the workbench 11. One end of the injection pipe 22 is connected to the injection port 24, and the end of the injection pipe 22 away from the injection port 24 is connected to the initial solution storage tank 12. The injection pipe 22 is connected to the displacement generator 21 and the preparation tank 211. The injection port 24 is connected to the displacement generator 21 and is placed in the preparation tank 211. The longitudinal section of the injection port 24 is trapezoidal. Several liquid permeation holes are provided on the bottom and side surfaces of the injection port 24. The liquid collection pipe 23 is connected to the displacement generator 21 and the preparation tank 211. One end of the liquid collection pipe 23 is placed above the H-type strong acid cation exchange resin layer in the preparation tank 211. The other end of the liquid collection pipe 23 is connected to the hypochlorous acid water storage tank 13. The injection pipe 22 is connected to the pipeline adjustment mechanism 3 and the liquid exchange mechanism 4.

[0032] In the replacement mechanism 2, the mechanism is used to replace sodium ions in the sodium hypochlorite solution with hydrogen ions, making it a hypochlorous acid solution. The sodium hypochlorite solution flows from the initial solution storage tank 12 through the injection pipe 22 to the injection port 24 into the H-type strong acid cation exchange resin layer. The injection port 24 is provided with liquid permeation holes at the bottom and sides, so that the solution can flow out not only from the bottom but also from the side, which can accelerate the replacement speed and improve the replacement efficiency. After the sodium hypochlorite solution passes through the H-type strong acid cation exchange resin layer and becomes a hypochlorous acid solution, the hypochlorous acid solution is drawn away by the liquid collection pipe 23 above the H-type strong acid cation exchange resin layer and flows into the hypochlorous acid water storage tank 13.

[0033] The pipeline adjustment mechanism 3 includes a flow detection device 31 connected to an injection pipe 22. The flow detection device 31 includes electrode plates 311 and power-conducting wires. Two electrode plates 311 are provided, placed inside the injection pipe 22, and are parallel to each other. The line connecting the two electrode plates 311 is perpendicular to the solution flow direction. Power-conducting wires connect the two electrode plates 311. The pipeline adjustment mechanism 3 also includes a pipeline length adjustment device 32 connected to a worktable 11 and the injection pipe 22. The pipeline length adjustment device 32 includes a fixing rod 321 and a pushing hydraulic cylinder 322. The worktable 11 is connected, the fixed end of the hydraulic cylinder 322 is fastened to the worktable 11, and the output end of the hydraulic cylinder 322 is fastened to the injection pipe 22. There are two sets of fixing rods 321. The first fixing rod 321 is fastened to the injection pipe 22 and is placed on the side of the injection pipe 22 near the initial solution storage tank 12. The second fixing rod 321 is movably connected to the injection pipe 22. The fixing rod 321 includes a through ring 3211 and a rod body 3212. The rod body 3212 is fastened to the through ring 3211 and the rod body 3212 is fastened to the worktable 11. The first through ring 3211 is fastened to the injection pipe 22, and the second through ring 3211 is slidably connected to the injection pipe 22.

[0034] In the pipeline adjustment mechanism 3, this mechanism is used to adjust the position of the injection port 24 in the H-type strong acid cation exchange resin layer. It adjusts the displacement stroke according to the amount of sodium hypochlorite solution input, reducing wasted strokes and improving efficiency. The flow rate is detected by the flow detection device 31, and the electrode plate 311 is conductive. When the sodium hypochlorite solution passes through, an electromotive force is generated, which is converted into current. The amount of solution is determined based on the duration of the current flow. When no solution flows through, an effective current loop cannot be formed. If the current loop exists for a longer time, the amount of sodium hypochlorite solution input is larger. At this time, the hydraulic cylinder 322 is pushed to shorten until the injection pipe 22 is parallel to the bottom surface of the worktable 11, positioned below the H-type strong acid cation exchange resin layer. After the sodium hypochlorite solution is injected, the flow rate reaches the H-type strong acid cation exchange resin layer. During the process at the top of the acidic cation exchange resin layer, the displacement stroke is relatively long, allowing for more thorough displacement. If the time is short, the amount of sodium hypochlorite solution input is less. In this case, the hydraulic cylinder 322 is pushed up, causing the injection pipe 22 to be lifted between the two fixed rods 321. The fixed rods 321 near the initial solution storage tank 12 are tightly connected to the injection pipe 22. Therefore, when lifted, the injection pipe 22 and the injection port 24 in the H-type strong acidic cation exchange resin layer move upward. The injected sodium hypochlorite solution is located in the upper layer of the H-type strong acidic cation exchange resin layer, and its displacement stroke is shorter. Through this design, the displacement stroke can be changed according to the amount of sodium hypochlorite solution input, improving the displacement efficiency and reducing useless displacement.

[0035] The liquid exchange mechanism 4 includes a solution detection device 41, which is placed on the workbench 11 and connected to the preparation tank 211. The solution detection device 41 includes a monochromatic light source 411 and a photoresistor 412. There are at least three photoresistors 412, which are tightly connected to the inner wall of the preparation tank 211 and are located at the bottom of the preparation tank 211. The monochromatic light source 411 is tightly connected to the workbench 11, and the beam of the monochromatic light source 411 is obliquely directed toward the preparation tank 211. The preparation tank 211 near the monochromatic light source 411 is made of transparent material, and the photoresistor 412 is located on the side from which the monochromatic light source 411 emits light.

[0036] In the solution detection device 41, the device is used to detect the resin concentration of the H-type strong acid cation exchange resin layer that has been replaced. A monochromatic light source 411 is tilted into the resin layer. The refractive index of the air, the surface of the preparation tank 211 and the resin layer gradually increases. Therefore, after the light enters, the incident angle is greater than the refraction angle. When the device starts up, the solution detection device 41 starts up synchronously. Before the replacement, the light enters and is refracted onto a photoresistor 412. During the replacement process, hydrogen ions are replaced by sodium ions, and the refractive index decreases. Therefore, the light will be deflected and the refraction angle will increase. The light will shine on other photoresistors 412, and the corresponding resistance will decrease. The concentration of hydrogen ions and sodium ions in the resin solution is detected by different photoresistors 412, thereby changing the liquid exchange rate.

[0037] The liquid exchange mechanism 4 also includes a liquid exchange device 42, which is fastened to the workbench 11. The liquid exchange device 42 includes an input pipe 421, an output pipe 422, a proportional valve 423, an input tank, and an output tank. The proportional valve 423, the input tank, and the output tank are placed on the workbench 11. One end of the input pipe 421 is connected to the tank body below the preparation tank 211, and the other end of the input pipe 421 is connected to the proportional valve 423. The proportional valve 423 is connected to the input tank through a pipe. One end of the output pipe 422 is connected to the tank body below the preparation tank 211, and the other end of the output pipe 422 is connected to the output tank. The liquid exchange mechanism 4 also includes a porous plate 43, which is fastened to the inner wall of the preparation tank 211. The porous plate 43 is placed between the H-type strong acid cation exchange resin layer and the upper air layer, and the injection pipe 22 passes through the porous plate 43.

[0038] In the liquid exchange device 42, the injection rate of the H-type strong acid cation exchange resin solution is adjusted by controlling the proportional valve 423 according to the solution detection device 41. Since the molecular weight of sodium ions is greater than that of hydrogen ions, the solution containing sodium ions will move downwards in the H-type strong acid cation exchange resin layer. The liquid exchange device 42 is located in the lower half of the H-type strong acid cation exchange resin layer, so when it is opened, a larger amount of solution containing sodium ions can be directly flushed out from the output pipe 422 to the output tank. Meanwhile, the H-type strong acid cation exchange resin solution flows from the input tank into the preparation tank 211 through the input pipe 421. At this time, the H-type strong acid cation exchange resin solution in the preparation tank 211... The content of sodium hypochlorite has always been relatively high, but there is still a strong acidic cation exchange resin Na-type solution. Due to the characteristic that the ion selectivity of acidic cation exchange resin is that sodium ions are greater than hydrogen ions, the hydrogen ions that increase after the sodium hypochlorite solution passes through the strong acidic cation exchange resin H-type come into contact with the strong acidic cation exchange resin Na-type and undergo a non-violent ion exchange reaction. This results in some hydrogen ions being replaced by sodium ions, so that the pH value of the final solution can be maintained at around 5-6, which can inhibit the generation of chlorine gas. By covering the H-type strong acidic cation exchange resin layer with a porous plate 43, the resin solution can be stabilized during the exchange, the resin surface can be kept horizontal, and the exchange stroke can be kept fixed.

[0039] Working principle of this invention: After startup, the invention uses a displacement mechanism 2 to convert sodium hypochlorite solution into hypochlorous acid solution via an H-type strong acid cation exchange resin after the sodium hypochlorite solution is introduced. A pipeline adjustment mechanism 3 uses an electrode plate 311 to detect the amount of sodium hypochlorite solution entering the system. Based on the amount, a hydraulic cylinder 322 is driven to adjust the position of the input pipe 421 within the displacement mechanism 2. If the amount of sodium hypochlorite solution entering the system is large, the hydraulic cylinder 322 is shortened until the injection pipe 22 is parallel to the bottom surface of the worktable 11, positioned below the H-type strong acid cation exchange resin layer. During the process of the sodium hypochlorite solution reaching the top of the H-type strong acid cation exchange resin layer, the displacement stroke is longer, allowing for more thorough displacement. If the amount of sodium hypochlorite solution entering the system is small, the hydraulic cylinder 322 is raised, causing the injection pipe 22 to be lifted between two fixed rods 321, placing the injection pipe 22 and the injection port in the H-type strong acid cation exchange resin layer. The sodium hypochlorite solution, positioned at the upper layer of the H-type strong acid cation exchange resin layer, moves upwards (24). Its displacement stroke is shorter. The displacement stroke is adjusted according to the input solution volume to improve displacement efficiency and reduce wasted displacement. The liquid exchange mechanism 4 detects changes in resin solution concentration based on light refraction, thereby controlling the proportional valve 423 to adjust the injection speed of the H-type strong acid cation exchange resin solution. Since the molecular weight of sodium ions is greater than that of hydrogen ions, the sodium-containing solution in the H-type strong acid cation exchange resin layer moves downwards. Therefore, the liquid exchange device 42 is positioned below the preparation tank 211, directly displacing most of the sodium-containing resin solution. The remaining sodium-containing resin is then further displaced, allowing some hydrogen ions to be replaced by sodium ions, inhibiting chlorine generation. A porous plate 43 covers the H-type strong acid cation exchange resin layer, stabilizing the resin solution during liquid exchange, maintaining a horizontal resin surface, and ensuring a fixed displacement stroke.

[0040] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above, and that the invention can be implemented in other specific forms without departing from its spirit or essential characteristics. Therefore, the embodiments should be considered in all respects as exemplary and non-limiting, and the scope of the invention is defined by the appended claims rather than the foregoing description. Thus, all variations falling within the meaning and scope of equivalents of the claims are intended to be included within the present invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

Claims

1. A hypochlorous acid solution generating device based on automatic adjustment of displacement stroke according to solution volume, the generating device being used to generate hypochlorous acid water from sodium hypochlorite solution, characterized in that: The hypochlorous acid generating device includes a main body (1), a displacement mechanism (2), a pipeline adjustment mechanism (3), and a liquid exchange mechanism (4). The main body (1) and the displacement mechanism (2) are connected. The main body (1) and the pipeline adjustment mechanism (3) are connected. The main body (1) and the liquid exchange mechanism (4) are connected. The displacement mechanism (2) and the pipeline adjustment mechanism (3) are connected. The displacement mechanism (2) and the liquid exchange mechanism (4) are connected. The main structure (1) includes a workbench (11), an initial solution storage tank (12), and a hypochlorous acid water storage tank (13). The initial solution storage tank (12) is placed on the workbench (11), and the hypochlorous acid water storage tank (13) is placed on the workbench (11). The workbench (11) is connected to the replacement mechanism (2), the workbench (11) is connected to the pipeline adjustment mechanism (3), the workbench (11) is connected to the liquid replacement mechanism (4), the initial solution storage tank (12) is connected to the replacement mechanism (2), and the hypochlorous acid water storage tank (13) is connected to the replacement mechanism (2). The replacement mechanism (2) includes a replacement generator (21) and an injection tube (22). The replacement generator (21) is connected to the workbench (11). The replacement generator (21) includes a preparation tank (211) and an H-type strong acid cation exchange resin layer. The preparation tank (211) is placed on the workbench (11). The H-type strong acid cation exchange resin layer is placed inside the preparation tank (211) and below it. The preparation tank (211) is connected to the liquid exchange mechanism (4). One end of the injection tube (22) is connected to the preparation tank (211), and the other end of the injection tube (22) is connected to the initial solution storage tank (12). The pipeline adjustment mechanism (3) includes a flow detection device (31) and a pipeline length adjustment device (32). The flow detection device (31) is connected to the injection pipe (22). The flow detection device (31) includes an electrode plate (311) and a power-conducting wire. The two electrode plates (311) are placed parallel to each other inside the injection pipe (22). The line connecting the two electrode plates (311) is perpendicular to the flow direction of the solution. The two electrode plates (311) are connected to a power-conducting wire. The pipeline length adjustment device (32) is connected to the worktable (11). The pipeline length adjustment device (32) includes a fixed rod (321) and a pushing hydraulic cylinder (322). The fixed rod (321) is connected to the worktable (11). The pushing hydraulic cylinder (322) The fixed end and the workbench (11) are fastened together. The output end of the push hydraulic cylinder (322) and the injection pipe (22) are fastened together. The fixed rod (321) is provided in two sets. The first fixed rod (321) and the injection pipe (22) are fastened together. The first fixed rod (321) is placed on the side of the injection pipe (22) close to the initial solution storage tank (12). The second fixed rod (321) and the injection pipe (22) are movably connected. The fixed rod (321) includes a through ring (3211) and a rod body (3212). The rod body (3212) and the through ring (3211) are fastened together. The rod body (3212) and the workbench (11) are fastened together. The first through ring (3211) and the injection pipe (22) are fastened together. The second through ring (3211) and the injection pipe (22) are slidably connected. The liquid exchange mechanism (4) includes a solution detection device (41), which is placed on the workbench (11) and connected to the preparation tank (211).

2. The hypochlorous acid generating device based on automatic adjustment of displacement stroke according to claim 1, characterized in that: The replacement mechanism (2) further includes a sampling pipe (23) and an injection port (24). The injection pipe (22) and the sampling pipe (23) are placed on the workbench (11). One end of the injection pipe (22) is connected to the injection port (24). The injection pipe (22) is connected to the replacement generator (21). The injection port (24) is connected to the replacement generator (21). The injection port (24) is placed in the preparation tank (211). The longitudinal section of the injection port (24) is trapezoidal. 4) Several liquid permeation holes are provided on the bottom and side surfaces. The liquid collection pipe (23) is connected to the displacement generator (21). The liquid collection pipe (23) is connected to the preparation tank (211). One end of the liquid collection pipe (23) is placed above the H-type strong acid cation exchange resin layer in the preparation tank (211). The other end of the liquid collection pipe (23) is connected to the hypochlorous acid water storage tank (13). The injection pipe (22) is connected to the pipeline adjustment mechanism (3). The injection pipe (22) is connected to the liquid exchange mechanism (4).

3. The hypochlorous acid generating device based on automatic adjustment of the displacement stroke according to claim 2, characterized in that: The solution detection device (41) includes a monochromatic light source (411) and a photoresistor (412). There are at least three photoresistors (412). The photoresistors (412) are tightly connected to the inner wall of the preparation tank (211). The photoresistors (412) are placed at the bottom of the preparation tank (211). The monochromatic light source (411) is tightly connected to the worktable (11). The beam of the monochromatic light source (411) is obliquely directed toward the preparation tank (211). The preparation tank (211) is made of transparent material near the monochromatic light source (411). The photoresistors (412) are placed on the side where the light emitted by the monochromatic light source (411) is emitted.

4. The hypochlorous acid generating device based on automatic adjustment of displacement stroke according to claim 1, characterized in that: The liquid changing mechanism (4) also includes a liquid changing device (42), which is fastened to the workbench (11). The liquid changing device (42) includes an input pipe (421), an output pipe (422), a proportional valve (423), an input tank, and an output tank. The proportional valve (423), the input tank, and the output tank are placed on the workbench (11). One end of the input pipe (421) is connected to the tank body below the preparation tank (211), and the other end of the input pipe (421) is connected to the proportional valve (423). The proportional valve (423) is connected to the input tank through a pipe. One end of the output pipe (422) is connected to the tank body below the preparation tank (211), and the other end of the output pipe (422) is connected to the output tank.

5. The hypochlorous acid generating device based on automatic adjustment of displacement stroke according to claim 2, characterized in that: The liquid exchange mechanism (4) also includes a porous plate (43), which is fastened to the inner wall of the preparation tank (211). The porous plate (43) is placed between the H-type strong acid cation exchange resin layer and the upper air layer. The injection tube (22) passes through the porous plate (43).

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