Non-equilateral rectangular photomask container

Abstract

The invention relates to a non-equilateral rectangular photomask container, which comprises a non-equilateral rectangular photomask container with a single-layer box and a double-layer box, a box body of the single-layer box and an outer box of the double-layer box, and the lengths and the widths of the box body of the single-layer box and the outer box of the double-layer box are equal to the length and the width of a non-equilateral rectangular photomask multiplied by 1.25-2.5. And the length and the width of the inner box of the double-layer box are equal to the length and the width of the non-equilateral rectangular photomask multiplied by 1.05 to 2.0. The outer box comprises a gas diffusion device, the gas diffusion device comprises a fluid path and a gas diffusion assembly, and the fluid path conveys gas to the gas diffusion assembly to purge towards the cover body of the inner box. And the central ranges of the outer box and the inner box comprise observation windows at corresponding positions, so that the non-equilateral rectangular photomasks and the protective film parts of the photomasks in the container can be observed.

Description

Technical Field

[0001] The present invention relates to the field of mask containers, and specifically to a non-equilateral rectangular mask container, especially an extreme ultraviolet light mask transfer container for semiconductor equipment, and more especially a non-equilateral rectangular mask container for accommodating extreme ultraviolet light masks with non-equilateral rectangular structures. Background Art

[0002] As feature size and resolution continue to shrink at new process nodes, the density and number of devices on advanced semiconductor reticles are rapidly increasing. Extreme ultraviolet lithography (EUV) has become a key technology in the semiconductor industry. EUV light is a wavelength less than 13.5 nanometers. Exposure machines that use EUV as a light source are known as EUV exposure machines / lithography machines (collectively, EUV equipment). These machines use ultra-small wavelength light to print microchips, further miniaturizing integrated circuits. To further shrink device nodes and achieve smaller features, the development of high-numerical aperture extreme ultraviolet (High-NA EUV) lithography technology is crucial, for example, increasing the numerical aperture from 0.33 to over 0.55.

[0003] The development of high-NA exposure systems aims to achieve higher-resolution imaging capabilities, enabling improved precision, clearer imaging, and the printing of larger numbers of microchips, thereby increasing the production capacity and yield of advanced processes. The development of high-NA EUV equipment is expected to enable continued linewidth reduction in semiconductor manufacturing processes. However, due to the optical properties of high-NA EUV light, the exposure imaging area on the wafer is significantly reduced compared to conventional NA exposure systems, sometimes even halving. The development of photomasks requires enlarging the size of the mask to sufficiently cover the wafer's exposure imaging area. Therefore, the existing equilateral rectangular mask size must be modified to a larger non-equilateral rectangular mask to accommodate high-NA EUV lithography technology, enabling processes down to the nanometer level, or even the angstrom level. In addition to changing the structural design of non-equilateral rectangular masks, it is also necessary to overturn the structural design of the original rectangular mask box. Proposing an effective mask transfer solution for large-sized non-equilateral rectangular mask boxes in the new technology field is definitely a huge technological advancement for advanced processes. Summary of the Invention

[0004] The present invention provides a non-equilateral rectangular mask container for accommodating non-equilateral rectangular masks. The non-equilateral rectangular mask container includes: an outer box, including a shell and a door that open and close, the shell and the door respectively having a length and a width, and defining a accommodating space. An inner box, including a cover and a base that open and close, the cover and the base respectively having a length and a width, the inner box is located in the accommodating space of the outer box, and the inner box is used to accommodate the non-equilateral rectangular mask. The length of the outer box is the length of the non-equilateral rectangular mask multiplied by 1.25 to 2.5, and the width of the outer box is the width of the non-equilateral rectangular mask multiplied by 1.25 to 2.5. The length of the inner box is the length of the non-equilateral rectangular mask multiplied by 1.05 to 2.0, and the width of the inner box is the width of the non-equilateral rectangular mask multiplied by 1.05 to 2.0.

[0005] The present invention also provides a non-equilateral rectangular mask container for accommodating a non-equilateral rectangular mask, comprising: an outer box comprising a shell and a door that open and close, the shell and the door each having a length and a width, and defining a accommodating space; an inner box comprising a lid and a base that open and close, the lid and the base each having a length and a width, the inner box being located within the accommodating space of the outer box and configured to accommodate the non-equilateral rectangular mask; and a gas diffusion device disposed within the outer box, the gas diffusion device comprising a fluid path connecting the shell and the door and a gas diffusion assembly, the fluid path conveying gas to the gas diffusion assembly for purging toward the lid of the inner box. The length of the outer box is the length of the non-equilateral rectangular mask multiplied by 1.25 to 2.5 times, and the width of the outer box is the width of the non-equilateral rectangular mask multiplied by 1.25 to 2.5 times. The length of the inner box is the length of the non-equilateral rectangular mask multiplied by 1.05 to 2.0, and the width of the inner box is the width of the non-equilateral rectangular mask multiplied by 1.05 to 2.0.

[0006] The present invention also provides a non-equilateral rectangular mask container for accommodating non-equilateral rectangular masks, comprising: an outer box comprising a shell and a door that open and close, the shell and the door each having a length and a width, and defining a accommodating space; an inner box comprising a lid and a base that open and close, the lid and the base each having a length and a width, the inner box being located within the accommodating space of the outer box and being used to accommodate the non-equilateral rectangular mask; at least two observation windows, respectively provided on the door and the base, with the two observation windows of the door and the base being in corresponding positions. The base has a central area, the observation window of the base is located within the central area, and the length and width of the central area are respectively the length of the non-equilateral rectangular mask multiplied by 0.9 and the width of the non-equilateral rectangular mask multiplied by 0.9. The observation window of the door is positioned to cover at least a portion of the central area of ​​the base. The observation window of the door and the observation window of the base are used to directly observe the non-equilateral rectangular mask and the portion of the pellicle. The length of the outer box is the length of the non-equilateral rectangular mask multiplied by 1.25 to 2.5, and the width of the outer box is the width of the non-equilateral rectangular mask multiplied by 1.25 to 2.5. The length of the inner box is the length of the non-equilateral rectangular mask multiplied by 1.05 to 2.0, and the width of the inner box is the width of the non-equilateral rectangular mask multiplied by 1.05 to 2.0.

[0007] The present invention also provides a non-equilateral rectangular photomask container for accommodating a non-equilateral rectangular photomask, comprising: a housing and a door. The door and the housing are configured to open and define a storage space, the door and the housing having the same length and width, and the storage space is configured to accommodate the non-equilateral rectangular photomask. The length and width are respectively the length of the non-equilateral rectangular photomask multiplied by 1.25 to 2.5. BRIEF DESCRIPTION OF THE DRAWINGS

[0008] The present invention may be further understood with reference to the following drawings and descriptions. Non-limiting and non-exhaustive examples are described with reference to the following drawings. Components in the drawings are not necessarily to scale; emphasis is placed on illustrating the structure and principles.

[0009] Figure 1A An embodiment of a non-equilateral rectangular photomask container according to the present invention is shown.

[0010] Figure 1B An exploded view of a non-equilateral rectangular photomask container according to the present invention is shown.

[0011] Figure 1C Displays a partial section of the door.

[0012] Figure 1D Displays a partial edge of the door.

[0013] Figure 1E The display housing and door are provided with automatic locking means.

[0014] Figure 1F Shows the elastic retaining components.

[0015] Figure 2A A top view of the outer box.

[0016] Figure 2B This is a top view of the inner box.

[0017] Figure 3A Schematic diagram of the observation method of the non-equilateral rectangular mask container of the present invention.

[0018] Figure 3B Displays the setting range of the inner box observation window.

[0019] Figure 4A The upward facing surface configuration of the door of the outer box is displayed.

[0020] Figure 4B Shows the bottom configuration of the door of the outer box.

[0021] Figure 4C The upward facing surface configuration of the base of the inner box is shown.

[0022] Figure 4D The bottom configuration of the base showing the inner box.

[0023] Figure 4E A detailed section showing the door and base combined.

[0024] Figure 5A The environmental control method of the non-equilateral rectangular photomask container of the present invention is illustrated.

[0025] Figure 5B Shows the configuration inside the housing.

[0026] Figure 5C Shows the configuration of the upward-facing surface of the door.

[0027] Figure 6A A partial cross-section showing the shell and door (before they are combined).

[0028] Figure 6B A partial cross-section showing the shell and door (when combined).

[0029] Figure 7A Schematic diagram of an inner box with filtering means.

[0030] Figure 7B The overlapping relationship between the gas diffusion assembly and the filtering means is illustrated from a top view.

[0031] Figure 8A Shows the top configuration of the inner box lid.

[0032] Figure 8B Shows the inside configuration of the inner box.

[0033] Figure 8C The partial display shows that when the shell and the cover are combined, the protrusion of the shell corresponds to the depression of the cover.

[0034] Figure 9 Schematic diagram showing the support structure of the base.

[0035] Figure 10 A schematic diagram showing another aspect of the support structure of the base.

[0036] Figure 11 A schematic diagram showing another aspect of the support structure of the base.

[0037] Description of Figure Numbers:

[0038] 1: Mask container

[0039] 10: Outer box

[0040] 102: Shell

[0041] 104: Door

[0042] 1041: Strengthen support components

[0043] 106: Dynamic coupling pin

[0044] 108: Sealing ring

[0045] 109: Guide groove

[0046] 110: Bevel

[0047] 111: Concave

[0048] 112: Elastic locking piece

[0049] 113: Stoma

[0050] 113A: Air intake

[0051] 113B: Exhaust hole

[0052] 20: Inner box

[0053] 21: Corner support;

[0054] 22: Auxiliary support

[0055] 202: Cover

[0056] 204: Base

[0057] 2041: Load-bearing surface

[0058] 2042: Platform

[0059] 2043: Surrounding surface

[0060] 2044: Film frame avoidance groove

[0061] 206: Elastic retaining component

[0062] 50A: Central observation window

[0063] 50B: Observation window

[0064] 50C: Central observation window

[0065] 50D: Observation window

[0066] 50E: Observation window

[0067] 50F: Observation window

[0068] 51A: Inner positioning groove assembly

[0069] 51B: External positioning groove assembly

[0070] 60: Fluid Path

[0071] 601: receiving port

[0072] 602: Washer

[0073] 62: Gas diffusion assembly

[0074] 64: Bump

[0075] 66: Central pressing assembly

[0076] 80: Filtering methods

[0077] 90: Hollow part

[0078] 92: Filter component

[0079] 94: Depression

[0080] 10L: Length

[0081] 10W: Width

[0082] 20L: Length

[0083] 20W: Width

[0084] R: Mask

[0085] P: Photomask film

[0086] OB1: First observation window

[0087] OB2: Second observation window

[0088] L1: length

[0089] L2: Width

[0090] V: Air valve assembly DETAILED DESCRIPTION

[0091] The present invention will be described more fully below with reference to the accompanying drawings, illustrating specific exemplary embodiments. However, the claimed subject matter may be embodied in many different forms, and thus the construction of the claimed subject matter is not limited to any exemplary embodiment disclosed herein; the exemplary embodiments are merely illustrative. Similarly, the present invention is intended to provide a reasonably broad scope for the claimed subject matter.

[0092] The use of the term "in one embodiment" in this specification does not necessarily refer to the same embodiment, and the use of "in other (some / some) embodiments" in this specification does not necessarily refer to different embodiments. The intent is, for example, that claimed subject matter includes combinations of all or some of the example embodiments. The term "coupled" as used in this specification includes "directly connected" or "indirectly connected."

[0093] See also Figure 1A and Figure 1B . Figure 1A A specific embodiment of the non-equilateral rectangular photomask container 1 of the present invention is shown. Figure 1B An exploded view of the non-equilateral rectangular mask container 1 is shown. The non-equilateral rectangular mask container 1 is a non-equilateral rectangular double-layer box comprising a non-equilateral rectangular outer box 10 and an inner box 20. In one embodiment, the non-equilateral rectangular masks housed in the mask container 1 are 6-inch x 12-inch masks, or masks with an aspect ratio of approximately 1:1.86 to 2.5, but the present invention is not limited thereto. The outer box 10 has structural features that enable it to be compatible with the overhead crane system (OHT system) within the factory, allowing the masks housed in the outer box 10 and the inner box 20 to be transferred between factory equipment.

[0094] The outer box 10 includes a shell 102 and a door 104. The shell 102 is surrounded by a plurality of walls to form a space with an opening. The opening can be a downward opening or a side opening, and the door 104 is used to cover the opening of the shell 102. The top of the shell 102 also provides a feature compatible with the OHT system and a handle allowing the operator to grasp it. In the present embodiment, the opening of the shell 102 is downward, and an upward surface of the door 104 is provided with a carrying means (means for carrying), which is used to carry the inner box 20 above the upward surface as an example. Of course, the design of the outer box can also be that the opening of the shell 102 is toward the side, then the shell 102 is provided with a carrying means (means for carrying), for carrying the inner box 20 in the space. Regardless of the design of the above-mentioned outer box, the outer box all includes a shell 102 and a door 104 that open and close, the shell 102 has a length and a width, and the door 104 cooperates with the opening of the shell 102 to define a accommodating space.

[0095] The inner box 20 includes a cover 202 and a base 204 that open and close. The cover 202 and the base 204 have a length and a width respectively. The inner box 20 is located in the receiving space of the outer box 10 and is used to accommodate a non-equilateral rectangular mask (not shown).

[0096] It is worth noting that, in order to differentiate the design structure of conventional equilateral rectangular masks, the non-equilateral rectangular mask is relatively large, so the size of the mask container needs to be redefined. The non-equilateral rectangular mask container of the present invention has a non-equilateral structure. This structural feature is that the length of the outer box 10 is the length of the non-equilateral rectangular mask multiplied by 1.25 to 2.5, and the width of the outer box 10 is the width of the non-equilateral rectangular mask multiplied by 1.25 to 2.5. The length of the inner box 20 is the length of the non-equilateral rectangular mask multiplied by 1.05 to 2.0, and the width of the inner box 20 is the width of the non-equilateral rectangular mask multiplied by 1.05 to 2.0.

[0097] The upward surface of the door 104 is provided with three dynamic coupling pins 106, which can be coupled to the bottom of the inner box 20. The upward surface of the door 104 is also provided with a sealing means, which can substantially seal the housing 102 and the accommodating space defined by the door 104. The upward surface of the door 104 is also provided with a sealing ring 108. Figure 1CA portion of the sealing ring 108 is shown embedded in the structure of the door 104, and the exposed portion of the sealing ring 108 can touch against a downward surface of the housing 102 to form a seal. The housing 102 or the door 104 also provides means for observation, allowing the identification device to observe the state of the accommodating space from below the door 104, the details of which will be described in the following paragraphs. The housing 102 and the door 104 also include automatic locking means. A plurality of guiding slots 109 are formed on the sides of the door 104, and Figure 1D The enlarged view shows that the guide groove 109 has an inclined surface 110 , and a recess 111 is formed below the inclined surface 110 .

[0098] Figure 1E When the display housing 102 is combined with the door 104, the cross-sectional structure corresponds to the aforementioned guide groove 109. The side wall edge of the housing 102 (at the corresponding Figure 1B An elastic locking member 112 is disposed at the guide groove 109 of the housing 102. The member 112 is composed of a spring and a slider, but the present invention is not limited thereto. The elastic locking member 112 can be changed between a fully released state and a compressed state. When the housing 102 approaches the door 104, the slider of the elastic locking member 112 first contacts the top of the inclined surface 110 and is guided by the inclined surface 110. As the housing 102 and door 104 move closer, the slider of the elastic locking member 112 slides down the inclined surface 110 while being pushed laterally, causing the spring to compress until it passes the bottom of the inclined surface 110 and is released into the recess 111, thereby locking the housing 102 and the door 104. The shape of the elastic locking member 112 can be appropriately designed to reduce obstruction to the slider's entry from the inclined surface 110 into the recess 111. To unlock, the elastic locking member 112 can be disengaged from the recess 111, allowing the housing 102 to be removed from the door 104.

[0099] Door 104 also provides means for environment control, such as controlling humidity and pressure. Figure 1B The upward surface of the display door 104 is provided with a plurality of air holes 113, which can be used as air filling holes or air suction holes according to the setting. The bottom of the door 104 also has corresponding air holes for connecting to the gas system of the device. Figure 5B The display door 104 further includes a plurality of air valve components V corresponding to the air holes 113 to control the opening and closing of the airflow respectively.

[0100] The inner box 20 is mainly composed of machined components, including a cover 202 and a base 204. The cover 202 is composed of a top and side walls, and is provided with a gas filtering means (means for filtering) to allow the gas filled in the outer box 10 to diffuse into the inner box 20, the details of which are described in subsequent paragraphs. The inner side of the cover 202 has a displacement restriction means (means for displacement restriction) to limit the horizontal and longitudinal displacement of the mask. An upward surface of the base 204 is provided with a supporting means to support the bottom of the mask and also to limit the lateral displacement of the mask. The base 204 is also provided with an observation means to allow the identification device to observe the status of the bottom of the mask from below the base 204. The cover 202 is also provided with an elastic restriction means. As Figure 1B The display cover 202 is provided with a plurality of elastic retaining elements 206 on its four edges, the details of which are shown in FIG. Figure 1F The elastic retaining member 206 consists of a fixed end and a curved arm. As the cover 202 approaches the base 204, the curved arm of the elastic retaining member 206 slides downward along the perimeter of the base 204 until the downward-facing surface of the cover 202 contacts the upward-facing surface of the base 204. The elastic retaining member 206 is a molded component with considerable elasticity. The elastic retaining member 206 around the cover 202 supports the perimeter of the base 204, thereby preventing the cover 202 from horizontally shifting relative to the base 204.

[0101] In this embodiment, the non-equilateral rectangular mask container is a double-layer box design, so when the outer box 10 accommodates the inner box 20, the length of the outer box 10 is basically parallel to the length of the inner box 20, and of course the width of the outer box 10 is basically parallel to the width of the inner box 20.

[0102] In another embodiment, the non-equilateral rectangular photomask container of the present invention is a single-layer box for accommodating non-equilateral rectangular photomasks. The non-equilateral rectangular photomask container includes a shell and a door. The door and the shell open and define a storage space, and the door and the shell have the same length and width. The storage space is used to accommodate the non-equilateral rectangular photomask. To distinguish the non-equilateral rectangular photomask container from the single-layer box design structure of conventional equilateral rectangular photomask boxes, the non-equilateral rectangular photomask container of the present invention is a single-layer box structure characterized by the length and width of the door and shell being the length of the non-equilateral rectangular photomask multiplied by 1.25 to 2.5, respectively.

[0103] Figure 2A The measurement definitions of the length 10L and the width 10W of the outer box 10 are shown. Figure 2B The measurement definitions of the length 20L and width 20W of the inner box 20 are shown. The length 10L of the outer box 10 extends between a pair of handles on the housing 102 , and the length 20L of the inner box 20 extends between a pair of flanges on the lid 202 .

[0104] In one embodiment, the length and width of the housing 102 are 19 to 21 inches and 12 to 14 inches, respectively, and the length and width of the door are 16 to 18.9 inches and 11 to 13.9 inches, respectively. However, the present invention is not limited thereto and the size range design can be adjusted according to application requirements.

[0105] In one embodiment, the length and width of the cover 202 are 14 to 16 inches and 7 to 9 inches, respectively, and the length and width of the base 204 are 12 to 15 inches and 6 to 8.9 inches, respectively. However, the present invention is not limited thereto and the size range design can be adjusted according to application requirements.

[0106] Figure 3A The diagram shows the observation means provided by the mask container, including the observation means of the outer box and the observation means of the inner box. When the mask R is placed in the inner box of the mask container, the mask pellicle P (pellicle) that protects the mask pattern is attached to the bottom of the mask and maintains an appropriate distance from the base of the inner box. The pattern size of the non-equilateral rectangular mask is larger than the pattern size of the known equilateral rectangular mask, so the size of the mask pellicle must also be relatively increased. Since the mask pellicle is composed of a frame and a film, and the central area of ​​the film lacks frame support, the central area of ​​the large-sized film may produce a larger deformation. In view of this, the observation means are mainly set in the central area of ​​the outer box and the inner box to observe the deformation state of the mask pellicle. The observation means of the outer box includes setting a first observation window OB1, and the observation means of the inner box includes setting a second observation window OB2. The first observation window OB1 and the second observation window OB2 have a corresponding relationship. Accordingly, an identification device (such as a lens) located below the mask container can read the state of the central area of ​​the mask pellicle P through the first observation window OB1 and the second observation window OB2.

[0107] Figure 3B The following diagram illustrates the range within which the second observation window OB2 is positioned. This range is defined by a rectangle with a length L1 and a width W1, with the center of the rectangle overlapping the center of the inner box base. In one embodiment, the length L1 of this range is approximately equal to the length of the non-equilateral rectangular mask multiplied by 0.9, and the width W1 of this range is approximately equal to the width of the non-equilateral rectangular mask multiplied by 0.9. At least a portion of the second observation window OB2 should be located within this range. As for the first observation window OB1, its projection range should, in principle, overlap with at least a portion of the second observation window OB2. The first observation window OB1 and the second observation window OB2 can be circular, rectangular, polygonal, or other irregular shapes.

[0108] See Figure 4A and Figure 4BIn the illustrated embodiment, a central observation window 50A is provided in the center of the door 104. A rectangular observation window 50B is provided between the center and the periphery of the door 104. The base 204 also has a corresponding observation window 50E located at the same location. The range of observation window 50B excludes the range of central observation window 50A. Observation window 50B of the door 104 primarily allows observation of the non-equilateral rectangular photomask, pellicle frame, and pellicle portion within the base 204 through observation window 50E of the base 204.

[0109] See Figure 4C and Figure 4D In the illustrated embodiment, the base 204 is provided with a central observation window 50C, which is a circular observation window. The central observation window 50C of the base 204 corresponds to the central observation window 50A of the door 104, providing a viewing area for observing whether the central area of ​​the pellicle is deformed or sagging. The base 204 also provides other observation windows 50D, 50E, and 50F. Four of the observation windows 50D are located at the intersection of a reticle supporting surface 2041 and four platforms 2042. These observation windows 50D serve as reticle pre-alignment system (RPAS) windows, allowing a reader on a load port to capture multiple alignment marks on a non-equilateral reticle through these observation windows 50D.

[0110] In other embodiments, the observation window 50D may also be arranged near the width side of the base 204. The platform 2042 is close to the long side of the base 204 and defines a plurality of pellicle pockets 2044 with a surrounding surface 2043. These pellicle pockets 2044 can prevent the pellicle frame and the base 204 from interfering with each other. The remaining observation windows 50E and 50F are located in a corner area of ​​the mask bearing surface 2041, wherein the observation window 50E is elliptical and the observation window 50F is circular, and the sizes of the two are quite different, and are used to observe the photomask, the pellicle frame and its pellicle. As shown in FIG. Figure 4D The bottom surface of the base 204 shown in the embodiment is provided with an inner positioning groove component 51A and an outer positioning groove component 51B around the central observation window 50C or a center position. The inner positioning groove component 51A and the outer positioning groove component 51B are respectively composed of three groove components for matching the dynamic coupling pin, such as Figure 4A The kinematic coupling pin 106 or other kinematic coupling pins contained in the loading port.

[0111] The present invention also integrates the observation window with the support mechanism. Figure 4EA partial cross-section of the door 104 and base 204 is shown when they are joined. When the base 204 is placed on the kinematic coupling pin 106 of the door 104, a reinforcing support assembly 1041 is provided on the inner side of a bottom portion of the door 104 to support the inner box 20. Specifically, the reinforcing support assembly 1041 of the door 104 can abut against the center of the base 204. As shown in the cross-sectional view, the reinforcing support assembly 1041 is a hollow cylindrical structure protruding from the inner side of the door 104. The central observation window 50A can be integrated into the reinforcing support assembly 1041 in any known manner. In this embodiment, the central observation window 50A is confined within the unroofed space of the hollow cylindrical structure. The central observation window 50C of the base 204 corresponds to the reinforcing support assembly 1041. When the base 204 is placed on the door 104, the central observation window 50A of the door 104 is aligned with the central observation window of the base 204, or the two overlap in projection. Basically, the three dynamic coupling pins 106 on the door 104 are sufficient to support the base 204, and the reinforcing support assembly 1041 can serve as an additional support means. When the base 204 has tolerance or deformation and the center sinks slightly, the reinforcing support assembly 1041 can support the central area of ​​the base 204.

[0112] In addition to the aforementioned observation windows provided at corresponding locations on the door 104 and base 204, in another embodiment, if the housing opening faces sideways, the housing 102 and base 204 each have an observation window provided at corresponding locations. The base 204 has a central region, with the observation window located within the central region. The central region has a length and a width equal to the length of the equilateral rectangular mask multiplied by 0.9 and the width of the equilateral rectangular mask multiplied by 0.9, respectively. The observation window of the housing 102 covers at least a portion of the central region of the base 204. The observation windows of the housing 102 and the base 204 are used to directly observe the equilateral rectangular mask and its protective film.

[0113] The present invention also includes improvements to the environmental control within the container. Conventional photomask containers control the environment by introducing an inert gas, known as XCDA (e.g., nitrogen), into a sealed outer box through vents in the outer box's door. Once the outer box's internal environment reaches a specific pressure, the gas diffuses into the inner box through a filter assembly within the inner box. However, as the size of the photomask transport box increases, the time required for the gas to enter the inner box increases. Therefore, the present photomask container provides an improved method to enhance the efficiency of gas diffusion.

[0114] Figure 5AThe present invention illustrates the environmental control method for the photomask container. A gas diffusion device is further provided in the outer box 10. The gas diffusion device includes at least one fluid path 60 and at least one gas diffusion component 62 that connects the shell 102 and the door 104. One end of the fluid path 60 or manifold is coupled to the gas valve component V of the door 104 to receive gas. The other end of the fluid path 60 is coupled to the gas diffusion component 62. The fluid path 60 transports gas to the gas diffusion component 62 to purge toward the cover 202 of the inner box 20. The gas diffusion component 62 is basically located at the top of the accommodating space of the outer box 10 and has a gas diffusion interface that allows gas to diffuse toward the top of the cover 202 of the inner box 20. When there is a pressure difference between the external environment and the internal environment of the inner box 20, the gas is forced to pass through the filter component and enter the inner box 20, thereby achieving microenvironmental control of the inner box 20.

[0115] Figure 5B and Figure 5C Shows specific examples of environmental control measures. Figure 5B The gas diffuser assembly 62 is shown disposed on the top inner side of the housing 102. The fluid path 60 extends from one end of the gas diffuser assembly 62 along an inner sidewall of the housing 102 to an air hole at the bottom of the door 104. In this embodiment, the fluid path 60 and the gas diffuser assembly 62 are arranged in pairs on the top inner side of the housing 102. The fluid path 60 may be integrally formed with the housing 102 and have a receiving port 601. A gas chamber may be included in the fluid path 60 or connected between the fluid path 60 and the gas diffuser assembly 62 to collect gas and then supply it to the gas diffuser assembly 62. In other embodiments, the gas chamber may be configured to collect gas from multiple receiving ports 601 or multiple fluid paths 60 and supply it to one or more gas diffuser assemblies 62. The fluid path 60 extends from the receiving port 601 along the sidewall to the ceiling of the housing 102. In other embodiments, the fluid path 60 is a detachable tube. The gas diffuser assembly 62 is removably secured to the top of the housing 102. The gas diffuser assembly 62 is a long bar parallel to the long sides of the housing 102. The ends of the gas diffuser assembly 62 are respectively coupled to the two fluid paths 60. In other embodiments, the gas diffuser assembly 62 may have other shapes. It should be understood that the number and combination of fluid paths 60 and gas diffuser assemblies 62 are not limited to this embodiment.

[0116] Figure 5CThe upward surface of the display door 104 is provided with a plurality of air holes 113, four of which are intake holes 113A (intake openings) and two of which are exhaust holes 113B (exhaust openings). The four receiving ports 601 of the shell 102 correspond to the four intake holes 113A. When the shell 102 and the door 104 are combined, the receiving ports 601 can receive gas from the intake holes 113A. Therefore, after the gas enters the outer box 10, it is guided to the top of the shell 102 and then diffuses downward from the top. Since the cover 202 of the inner box 20 has a filter assembly, a large amount of gas concentrated above the cover 202 helps to diffuse into the inner box 20 through the filtering means of the cover 202, thereby improving the efficiency of environmental control.

[0117] Figure 6A and Figure 6B A partial cross-section of another embodiment of the environmental control means is shown. A sealing member, such as a gasket 602, is provided at the junction of the air hole 113 of the door 104 and the fluid path 60. The gasket 602 may be elastic and configured to fit snugly against the upwardly facing surface of the door 104 when the housing 102 and door 104 are joined, thereby sealing the receiving port 601. In other possible embodiments, the gasket 602 may be installed at the air inlet 113A.

[0118] Figure 7A The cover of the inner box is provided with a filtering means 80, which is specifically implemented as follows Figure 8A and Figure 8B As shown, the filtering means 80 includes a plurality of hollow portions 90 and a filter assembly 92. Gas can pass through the hollow portions 90 and reach the filter assembly 92. The filter assembly 92 can be a filter membrane or a porous material assembly. Depending on a pressure difference, the gas diffuses through the filter assembly 92 into the inner box 20 or escapes from the inner box 20. Figure 7B The diagram illustrates the relationship between the gas diffuser assembly 62 and the filter 80, shown from a top-down perspective. The effective ranges of the paired gas diffuser assembly 62 and filter 80 must overlap to ensure rapid gas entry into the inner cartridge 20. The length of the gas diffuser assembly 62 or diffuser tube is greater than the length of the filter 80 or filter membrane, ensuring that the purge area sufficiently covers the filter 80, thereby improving diffusion efficiency. However, the present invention is not limited to this.

[0119] The present invention further includes tri-axle positioning members and directional positioning recesses to enhance the positioning and stability of the inner box.

[0120] like Figure 8AThe embodiment shows that the upward surface of the cover 202 is provided with a displacement limiting means. A total of eight recesses 94 (dents) are formed around the edges of the cover 202, wherein there are two recesses 94 on each side of the cover 202. Figure 8C As can be seen from the cross-section, one end of the elastic retaining element 206 is fixed to the bottom of the recess 94 .

[0121] Return Figure 5B As shown, the displacement limiting means further includes a plurality of positioning protrusions 64 provided on the top inner side of the housing 102. These protrusions 64 are configured to correspond to the recesses 94. When the housing 102 is combined with the door 104, these protrusions 64 cooperate with the corresponding recesses 94. Figure 8C As shown, one side edge of the protrusion 64 contacts the inclined surface of the recess 94 to form a restriction, so that the horizontal and vertical directions of the inner box cover are restricted by these protrusions 64, that is, Figure 8A The three axes XYZ shown are all restricted. In addition, Figure 5B A central pressing assembly 66 is additionally provided at the center of the inner side of the display housing 102 to press the center of the hollow portion 90 to prevent deflection of the hollow portion 90. Therefore, the top center of the inner box 20 can be restrained by the upper central pressing assembly 66 and the lower reinforcing support assembly 1041, making the inner box 20 more stable.

[0122] Since the non-equilateral rectangular mask contained in the mask container 1 of the present invention is a 6-inch × 12-inch mask, which is much larger than the existing square mask size, in order to solve the problem that the base 204 of the inner box 20 is prone to uneven support points when carrying the non-equilateral rectangular mask, which causes the 6-inch × 12-inch mask to deform and warp. Figure 9 , showing a schematic diagram of the support structure of the base 204. The base 204 of the inner box 20 also includes multiple corner supports 21 and at least two auxiliary supports 22. The multiple corner supports 21 are located at the corners of the base 204, and each auxiliary support 22 is located between two adjacent corner supports 21. Two auxiliary supports 22 are located along the length of the inner box 20.

[0123] Continuing with the above, multiple corner supports 21, for example four, are provided, each serving as the primary support for the non-equilateral rectangular mask. Auxiliary supports 22 made of a cushioning material are provided on either side of the long sides of the non-equilateral rectangular mask to provide auxiliary support for the non-equilateral rectangular mask. When the non-equilateral rectangular mask R is placed on the base 204, the auxiliary supports 22 first contact the non-equilateral rectangular mask (first contact). As the weight of the non-equilateral rectangular mask presses downward, the auxiliary supports 22 deform and slowly contact the four corner supports 21 (second contact), providing a more uniform support for the non-equilateral rectangular mask.

[0124] In another embodiment, the two auxiliary supports 22 may have a lower top height than the four corner supports 21 and be positioned on either side of the long sides of the non-equilateral rectangular mask. When the non-equilateral rectangular mask is placed on the base 204, the four corner supports 21 first contact the non-equilateral rectangular mask, while the auxiliary supports 22 do not directly contact the non-equilateral rectangular mask. If the non-equilateral rectangular mask deforms due to long-term storage, the auxiliary supports 22 contact the non-equilateral rectangular mask to prevent excessive deformation.

[0125] In another embodiment, the two auxiliary support members 22 may also be inclined auxiliary support members or curved auxiliary support members, and are disposed on both sides of the long sides of the non-equilateral rectangular mask. That is, each auxiliary support member 22 contacts the long sides of the non-equilateral rectangular mask with an inclined surface or a curved surface. When the non-equilateral rectangular mask is placed on the base 204, the auxiliary support members 22 will first contact the non-equilateral rectangular mask with the inclined surface or the curved surface (first contact). As the weight of the non-equilateral rectangular mask presses downward, the chamfered edge of the non-equilateral rectangular mask slowly slides down along the inclined surface of the inclined auxiliary support member or the curved auxiliary support member to contact the four corner support members 21 (second contact), thereby providing a more uniform mask support method.

[0126] In another embodiment, the four corner supports 21 and the two auxiliary supports 22 are all inclined or curved auxiliary supports. That is, each corner support 21 and auxiliary support 22 contacts the long and short sides of the non-equilateral rectangular mask with an inclined or curved surface. When the non-equilateral rectangular mask is placed on the base 204, the four corner supports 21 and the two auxiliary supports 22 are chamfered and slowly slide down along the inclined surfaces of the inclined or curved auxiliary supports to achieve a more uniform mask support.

[0127] Please refer to Figure 10 , showing a schematic diagram of another support structure of the base 204. The corner support members 21 serve as the main support for the non-equilateral rectangular mask and are arranged on both sides of the long sides of the non-equilateral rectangular mask. Four auxiliary support members 22 are arranged at the corners of the base 204 and use a buffer material to serve as auxiliary supports for the non-equilateral rectangular mask. When the non-equilateral rectangular mask R is placed on the base 204, the four auxiliary support members 22 at the corners will first contact the non-equilateral rectangular mask (first contact). As the weight of the mask presses downward, the four auxiliary support members 22 with buffering properties are deformed, causing the mask to slowly contact the corner support members 21 (second contact), thereby providing a more uniform support method for the non-equilateral rectangular mask.

[0128] Please refer to Figure 11, showing another schematic diagram of the support structure of the base 204. A plurality of corner support members 21 are arranged at two corners and one long side of the base 204, forming a triangular distribution. A plurality of auxiliary support members 22 are arranged in corresponding positions to the plurality of corner support members 21. Similarly, a plurality of auxiliary support members 22 are arranged at two corners and one long side of the base 204, forming a triangular distribution. The three support points formed by the plurality of corner support members 21 serve as the main support for the non-equilateral rectangular mask. The three support points formed by the plurality of auxiliary support members 22 use a buffering material as an auxiliary support for the non-equilateral rectangular mask. When the non-equilateral rectangular mask R is placed on the base 204, the plurality of auxiliary support members 22 will first contact the mask (first contact). As the weight of the mask presses downward, the plurality of auxiliary support members 22 with buffering properties will deform and slowly contact the plurality of corner support members 21 at the other three support points (second contact), so as to provide a more uniform mask support method.

[0129] The material of the corner support 21 includes but is not limited to the group consisting of polyetheretherketone (PEEK), polyamideimide (PEI), polyetherimide (PAI), polyetherimide (PI) and their mixtures. The material of the auxiliary support 22 includes but is not limited to polyethylene (PE), polypropylene (PP), polyethylene terephthalate (PET), thermoplastic elastomer (TPR), thermoplastic polyester elastomer (TPEE), fluorine-containing elastomer (FKM), siliconized elastomer (LSR). The materials of the corner support 21 and the auxiliary support 22 can also be interchangeable as mentioned above, or the corner support 21 and the auxiliary support 22 can be the same material. Any combination of the materials of the corner support 21 and the auxiliary support 22 is used for the above Figures 9 to 11 The variations of the embodiments also fall within the scope of patent protection of the present invention.

[0130] However, it should be understood that the various embodiments of the present invention are for illustrative purposes only. Various modifications may be made without departing from the scope and spirit of the present invention, and all such modifications are intended to be encompassed by the scope of the present invention. Therefore, the various embodiments described in this specification are not intended to limit the present invention. The true scope and spirit of the present invention are disclosed in the following claims.

Claims

1. A non-equilateral rectangular mask container for accommodating a non-equilateral rectangular mask, wherein: The non-equilateral rectangular mask container comprises: An outer box, comprising a shell and a door that open and close, the shell and the door respectively having a length and a width, and defining a receiving space; and an inner box comprising a cover and a base that are opened and closed, the cover and the base respectively having a length and a width, the inner box being located in the accommodating space of the outer box and being used to accommodate the non-equilateral rectangular mask; The length of the outer box is the length of the non-equilateral rectangular mask multiplied by 1.25 to 2.5, and the width of the outer box is the width of the non-equilateral rectangular mask multiplied by 1.25 to 2.5; The length of the inner box is the length of the non-equilateral rectangular mask multiplied by 1.05 to 2.0, and the width of the inner box is the width of the non-equilateral rectangular mask multiplied by 1.05 to 2.

0.

2. The non-equilateral rectangular mask container according to claim 1, wherein: The housing and the base are respectively provided with an observation window at a corresponding position, wherein: The base has a central area, the observation window of the base is located in the central area, and a length and a width of the central area are respectively the length of the non-equilateral rectangular mask multiplied by 0.9 and the width of the non-equilateral rectangular mask multiplied by 0.9; The observation window of the shell covers at least a portion of the central range of the base. The observation window of the shell and the observation window of the base are used to directly observe the non-equilateral rectangular mask and the protective film thereof.

3. The non-equilateral rectangular mask container according to claim 1, wherein: The door and the base are respectively provided with an observation window at a corresponding position, wherein: The base has a central area, the observation window of the base is located in the central area, and a length and a width of the central area are respectively the length of the non-equilateral rectangular mask multiplied by 0.9 and the width of the non-equilateral rectangular mask multiplied by 0.9; The observation window of the door covers at least a portion of the central range of the base. The observation window of the door and the observation window of the base are used to directly observe the non-equilateral rectangular mask and the protective film thereof.

4. The non-equilateral rectangular mask container according to claim 1, wherein: The door and the base are respectively provided with an observation window at a corresponding position for observing the non-equilateral rectangular mask, the protective film frame and the protective film portion.

5. The non-equilateral rectangular mask container according to claim 1, wherein: The base also includes a plurality of photomask pre-alignment system windows for capturing alignment marks on the non-equilateral rectangular photomask.

6. The non-equilateral rectangular photomask container according to claim 1, wherein: The base also includes a plurality of film frame avoidance grooves.

7. The non-equilateral rectangular mask container according to claim 1, wherein: The base further comprises an inner positioning groove component, an outer positioning groove component or a combination thereof.

8. The non-equilateral rectangular mask container according to claim 1, wherein: A reinforcing support component is arranged on the inner side of a bottom of the door for supporting the inner box.

9. The non-equilateral rectangular photomask container according to claim 1, wherein: A plurality of three-axis positioning members are arranged on the inner side of the shell, and a directional positioning groove is arranged on the periphery of the cover body. The plurality of three-axis positioning members are arranged corresponding to the positions of the directional positioning groove and are positioned against each other.

10. The non-equilateral rectangular photomask container according to claim 1, wherein: The door is provided with a guide groove, and the shell is provided with an elastic locking piece, which guides and positions the lock buckle along the guide groove.

11. The non-equilateral rectangular photomask container according to claim 1, wherein: The base of the inner box further comprises a plurality of corner support members and at least two auxiliary support members. The plurality of corner support members are respectively located at the corner positions of the base, and each of the auxiliary support members is located between two adjacent corner support members.

12. The non-equilateral rectangular photomask container according to claim 11, wherein: The two auxiliary support members are located on the length side of the inner box.

13. A non-equilateral rectangular mask container for accommodating a non-equilateral rectangular mask, wherein: The non-equilateral rectangular mask container comprises: An outer box includes a shell and a door that open and close together, the shell and the door respectively having a length and a width and defining a receiving space; an inner box comprising a cover and a base that open and close, the cover and the base respectively having a length and a width, the inner box being located in the accommodating space of the outer box and being used to accommodate the non-equilateral rectangular mask; and a gas diffusion device disposed in the outer box, the gas diffusion device comprising at least one fluid path and at least one gas diffusion component connected between the shell and the door, the fluid path conveying gas to the gas diffusion component to purge toward the cover of the inner box; The length of the outer box is the length of the non-equilateral rectangular mask multiplied by 1.25 to 2.5, and the width of the outer box is the width of the non-equilateral rectangular mask multiplied by 1.25 to 2.5; The length of the inner box is the length of the non-equilateral rectangular mask multiplied by 1.05 to 2.0, and the width of the inner box is the width of the non-equilateral rectangular mask multiplied by 1.05 to 2.

0.

14. The non-equilateral rectangular photomask container according to claim 13, wherein: The gas diffusion component is arranged on the inner side of a top of the shell. The fluid path is distributed at one end of the gas diffusion component and along an inner side wall of the shell to an air hole at a bottom of the door.

15. The non-equilateral rectangular photomask container according to claim 13, wherein: An air chamber is also provided between the fluid path and the gas diffusion component.

16. The non-equilateral rectangular photomask container according to claim 14, wherein: A sealing member is provided at the junction of the air hole of the door and the fluid path.

17. The non-equilateral rectangular photomask container according to claim 13, wherein: The cover body is provided with a filter assembly, and the gas purge range of the gas diffusion assembly is larger than the setting range of the filter assembly.

18. The non-equilateral rectangular photomask container according to claim 13, wherein: The door and the base are provided with observation windows at corresponding positions, wherein: The base has a central area, the observation window of the base is located in the central area, and a length and a width of the central area are respectively the length of the non-equilateral rectangular mask multiplied by 0.9 and the width of the non-equilateral rectangular mask multiplied by 0.9; The observation window of the door covers at least a portion of the central range of the base. The observation window of the door and the observation window of the base are used for directly observing the non-equilateral rectangular mask and a thin film of the protective film.

19. The non-equilateral rectangular photomask container according to claim 13, wherein: The base also includes a plurality of photomask pre-alignment system windows for capturing alignment marks on the non-equilateral rectangular photomask.

20. The non-equilateral rectangular photomask container according to claim 13, wherein: The base further comprises an inner positioning groove group, an outer positioning groove component or a combination thereof.

21. The non-equilateral rectangular photomask container according to claim 13, wherein: A reinforcing support piece is arranged on the inner side of a bottom of the door for supporting the inner box.

22. A non-equilateral rectangular mask container for accommodating a non-equilateral rectangular mask, wherein: The non-equilateral rectangular mask container comprises: An outer box includes a shell and a door that open and close together, the shell and the door respectively having a length and a width and defining a receiving space; an inner box comprising a cover and a base that open and close, the cover and the base respectively having a length and a width, the inner box being located in the accommodating space of the outer box and being used to accommodate the non-equilateral rectangular mask; and At least two observation windows are respectively provided on the door and the base, and the two observation windows on the door and the base are in corresponding positions; The base has a central area, the observation window of the base is located in the central area, and a length and a width of the central area are respectively the length of the non-equilateral rectangular mask multiplied by 0.9 and the width of the non-equilateral rectangular mask multiplied by 0.9; The observation window of the door is positioned to cover at least a portion of the central area of ​​the base, and the observation window of the door and the observation window of the base are used to directly observe the non-equilateral rectangular photomask and the protective film thereof; The length of the outer box is the length of the non-equilateral rectangular mask multiplied by 1.5 to 2.5, and the width of the outer box is the width of the non-equilateral rectangular mask multiplied by 1.5 to 2.5; and The length of the inner box is the length of the non-equilateral rectangular mask multiplied by 1.05 to 2.0, and the width of the inner box is the width of the non-equilateral rectangular mask multiplied by 1.05 to 2.

0.

23. The non-equilateral rectangular photomask container according to claim 22, wherein: The base also includes a plurality of mask pre-alignment windows for capturing alignment marks on the non-equilateral rectangular mask.

24. The non-equilateral rectangular photomask container according to claim 22, wherein: The non-equilateral rectangular mask container also includes a gas diffusion device, which is arranged in the outer box. The gas diffusion device includes a fluid path and a gas diffusion component connected between the shell and the door. The fluid path is used to provide gas to be blown toward the cover of the inner box through the gas diffusion component.

25. The non-equilateral rectangular photomask container according to claim 24, wherein: The gas diffusion component is arranged on the inner side of a top of the shell. The fluid path is distributed at one end of the gas diffusion component and along an inner side wall of the shell to an air hole at a bottom of the door.

26. The non-equilateral rectangular photomask container according to claim 24, wherein: An air chamber is also provided between the fluid path and the gas diffusion component.

27. The non-equilateral rectangular photomask container according to claim 25, wherein: A sealing member is provided at the junction of the air hole of the door and the fluid path.

28. A non-equilateral rectangular mask container for accommodating a non-equilateral rectangular mask, wherein: The non-equilateral rectangular mask container comprises: a housing; and a door, the door and the housing being openable and defining a receiving space, the door and the housing having the same length and width, the receiving space being used to receive the non-equilateral rectangular light mask; The length and the width are respectively the length of the non-equilateral rectangular mask multiplied by 1.25 to 2.5.

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