Vinyl polymer, method for producing same, polishing liquid, and vinyl monomer
CN120826422APending Publication Date: 2025-10-21TOAGOSEI CO LTD
Patent Information
- Application Number
- CN202480016073.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Priority Date
- 2023-05-17
- Filing Date
- 2024-05-10
- Publication Date
- 2025-10-21
AI Technical Summary
Technical Problem
Existing (meth)acrylate polymers contain ester bonds in their molecular structure, which causes the polishing liquid to be easily hydrolyzed during storage, affecting processing accuracy.
Method used
A vinyl polymer comprising a vinyl monomer (A) and a vinyl monomer (B) of a specific structure is used to synthesize a block copolymer by living free radical polymerization, thereby avoiding the presence of ester bonds and improving storage stability.
Benefits of technology
A vinyl polymer with excellent storage stability is provided. It can be used as an additive in polishing liquid to ensure processing accuracy, stabilize the polishing rate, and reduce dishing.
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Smart Images
Figure CN120826422A_ABST
Abstract
The vinyl polymer includes a structural unit (A) derived from a vinyl monomer (A) represented by structural formula (1) (in the structural formula, R is a hydrogen atom or a methyl group, W is a divalent hydrocarbon group having 6 or less carbon atoms, X is a divalent functional group having 1 or less carbon atoms and including a heteroatom, Y is a divalent hydrocarbon group having 6 or less carbon atoms, and X is a divalent functional group having 1 or less carbon atoms. Z is a hydrogen atom or an alkyl group having 1-4 carbon atoms, and n is an integer of 4 or more. The vinyl polymer is obtained, for example, by polymerizing one or more vinyl monomers including the vinyl monomer (A) by living radical polymerization.
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Citation Information
Patent Citations
Method for producing water soluble polymer for polishing liquid composition
JP2017017177A