Continuous spot plating equipment capable of cleaning material belt

Abstract

The invention discloses continuous spot plating equipment capable of cleaning a material strap, which comprises a plurality of spot plating wheels which are arranged in two rows in a staggered manner, and a spot plating tank is arranged in each spot plating wheel; the to-be-spot-plated belt is tangentially wound on the first guide roller and then is tangentially wound on the plurality of spot-plating wheels in sequence; each spot plating wheel is matched with one pressing mechanism, and one end of each pressing mechanism is in an arc shape and extrudes the to-be-spot-plated belt to be attached to the circumferential side face of the corresponding spot plating wheel; each pressing mechanism is provided with two tensioning mechanisms which are symmetrically arranged, the tensioning mechanisms can automatically adjust the acting force applied to the pressing mechanisms, and the pressing mechanisms can extrude the to-be-spot-plated belt to be tightly attached to the spot plating wheel; and the cleaning rollers are arranged on the two sides of the to-be-spot-plated belt between the two adjacent spot plating wheels correspondingly or in a staggered manner. The spot plating device has the characteristics that spot plating can be carried out on the two sides of the to-be-spot-plated strip at the same time, and the two sides of the to-be-spot-plated strip can be cleaned.

Description

Technical Field

[0001] This invention relates to the field of electroplating technology, and more specifically to a continuous spot plating apparatus for cleaning material strips. Background Technology

[0002] Electroplating is widely used in various industries. Different materials require electroplating for various purposes. Its core principle is to deposit a metal or alloy layer on the metal surface through electrolysis to achieve effects such as corrosion resistance and enhanced wear resistance. Conventional electroplating processes include barrel plating, continuous plating, and brush plating. Continuous plating is suitable for wire or strip materials. However, current wire or strip materials are typically plated on one side only. Therefore, when double-sided plating is required, the operation involves plating one side first, then plating the other side, which is obviously time-consuming and reduces the efficiency of wire or strip electroplating.

[0003] In addition, electroplating processes also include special electroplating processes, such as spot plating, composite electroplating, and alloy plating. Spot plating is a localized electroplating technique that uses molds or masks to confine the electroplating solution to specific areas of a part, achieving precise localized electroplating. Common equipment for spot plating includes spot plating wheels and spot plating tanks. When spot plating is required on wire or strip, the spot plating wheel or tank can be equipped with corresponding spot plating holes according to the set spot plating positions. The spot plating positions on the wire or strip come into contact with the electroplating solution in the spot plating tank through the spot plating holes, thus allowing electroplating to occur at the spot plating locations on the wire or strip.

[0004] It is evident that in existing wire and strip processes involving continuous plating and / or spot plating, the wires and strips are not cleaned again upon entering the plating station. However, during transmission, the wires and strips are easily contaminated with oil, dust, or residual electrolyte. If not cleaned promptly, this can pollute the plating area, leading to uneven plating or poor adhesion at the terminals. Summary of the Invention

[0005] To address the aforementioned problems in one or more prior art techniques, this invention provides a continuous spot plating apparatus for cleaning material strips. This invention can clean the material strip, preventing impurities from entering the electroplating workstation, and also enables continuous spot plating on both sides of the material strip. In order to achieve the above-mentioned objectives of the present invention, the following technical solution is adopted: A continuous spot plating apparatus for cleaning strips includes multiple spot plating rollers arranged in two staggered rows, each roller having a spot plating groove; a strip to be spot plating, tangentially wound around a first guide roller, and then tangentially wound around multiple spot plating rollers in sequence; a pressing mechanism, each spot plating roller being matched with a pressing mechanism, one end of which is arc-shaped to press the strip to be spot plating against the circumferential side of the spot plating roller; a tensioning mechanism, each pressing mechanism being equipped with two symmetrically arranged tensioning mechanisms, the tensioning mechanisms being able to self-adjust the force applied to the pressing mechanism, enabling the pressing mechanism to keep the strip to be spot plating tightly against the spot plating roller; and cleaning rollers, correspondingly or staggeredly arranged on both sides of the strip to be spot plating between two adjacent spot plating rollers.

[0006] Furthermore, the cleaning roller includes a first bearing seat; a fixed shaft, vertically mounted on the first bearing seat, on which a first spring, a tray, and a cleaning roller are sequentially mounted, the circumferential surface of the cleaning roller being wrapped with an electroplated cloth for cleaning; a short shaft connected to the fixed shaft; a pressure plate fitted onto the short shaft; and a nut connected to the short shaft nut and fitting against the pressure plate.

[0007] Furthermore, the cleaning roller includes a support column with two parallel spaced support cylinders, each support cylinder having a second spring and a groove extending along its length on its side; and a cleaning roller with support rods rotatably mounted at both ends, the support rods being inserted into corresponding grooves, the support rods being connected to the second springs, the second springs applying elastic deformation force to the support rods, the support rods pressing the cleaning roller against the strip to be plated, and the circumferential surface of the cleaning roller being wrapped with an electroplating cloth for cleaning.

[0008] Furthermore, the tensioning mechanism includes a telescopic drive component with a piston; a support shaft, one end of which is connected to the piston and the other end of which is fixedly mounted with a cylinder, the cylinder having a mounting groove; a pressure sensor, having a pressure surface for measuring pressure, mounted in the mounting groove, the pressure surface protruding from the circumference of the cylinder; and a controller electrically connected to the telescopic drive component and the pressure sensor.

[0009] Furthermore, the continuous spot plating equipment for cleanable material strips of the present invention also includes an alarm, a first anti-detachment ring, and a nano-coating. The alarm is electrically connected to the controller, the first anti-detachment ring is installed on the support shaft for supporting the cylinder, and the pressure surface is provided with a nano-coating.

[0010] Furthermore, the continuous spot plating equipment for cleanable material strips of the present invention also includes a stirring mechanism, wherein at least one stirring mechanism is installed in the spot plating tank, and the stirring mechanism is used to push the electroplating solution in the spot plating tank.

[0011] Furthermore, the stirring mechanism includes a stirring drive component, a drive shaft, and multiple stirring blades, which are staggered and spaced on the drive shaft. The stirring blades extend in an arc from the drive shaft in the opposite direction of rotation, then bend in an S-shape, and are inclined at the end away from the drive shaft.

[0012] Furthermore, the stirring blade has multiple arc-shaped grooves at one end away from the drive shaft, and the arc-shaped groove at the end has an inclined end, the inclined end being inclined at an angle of 50° to 65° with the vertical plane.

[0013] Furthermore, the stirring blades are polished to prevent adsorption, thus preventing the electroplating solution from adsorbing onto them.

[0014] Furthermore, the continuous spot plating equipment for cleanable material strips of the present invention also includes a liquid pump, a delivery pipe, a control valve and a liquid level sensor. One end of the delivery pipe is connected to the spot plating tank and the other end is connected to the liquid pump and is equipped with a control valve. The liquid level sensor is installed in the spot plating tank to monitor the liquid level of the electroplating solution in the spot plating tank and is electrically connected to the liquid pump.

[0015] 1. This invention has the advantages of cleaning the material strip, preventing impurities adsorbed on the strip from entering the electroplating station, thus further improving the electroplating quality; and enabling continuous electroplating on both sides of the material strip. Specifically, before entering the electroplating station, both sides of the material strip are cleaned by cleaning rollers to remove impurities attached to the strip, achieving a clean strip and improving the electroplating quality; multiple spot plating wheels are arranged in two staggered rows, with three adjacent spot plating wheels forming a triangular distribution. The material strip is tangentially wound around the spot plating wheels in sequence, ensuring that different spot plating wheels match both sides of the material strip, thus achieving continuous spot plating on both sides of the material strip.

[0016] 2. This invention employs a clamping mechanism to press the strip to be plated tightly against the plating wheel. A tensioning mechanism applies force to the clamping mechanism, and the force applied to the clamping mechanism is self-adjusting, ensuring that the clamping mechanism keeps the strip to be plated tightly against the plating wheel. This prevents the plating solution from leaking out of the plating location and ensures uniform contact between the plating location and the plating solution, thus improving the plating quality at the plating location. Attached Figure Description

[0017] To more clearly illustrate the specific embodiments of the present invention or the technical solutions in the prior art, the accompanying drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. In all the drawings, similar elements or parts are generally identified by similar reference numerals. In the drawings, the elements or parts are not necessarily drawn to scale.

[0018] Figure 1 This is a schematic diagram of the structure of a continuous spot plating device for cleanable material strips according to the present invention; Figure 2This is a schematic diagram of the structure of the plating tank in this invention, in which a stirring mechanism and a liquid level sensor are installed; Figure 3 This is a schematic diagram of the tensioning mechanism in this invention; Figure 4 for Figure 3 Schematic diagram of the structure of the central support jacking cylinder; Figure 5 This is a schematic diagram of the stirring mechanism in this invention; Figure 6 This is a schematic diagram of one structure of the cleaning roller in this invention; Figure 7 This is a schematic diagram of another structure of the cleaning roller in this invention; Figure 8 This is a schematic diagram of the installation structure of the spot plating wheel and the support base in this invention; The names and serial numbers of each component in the diagram are as follows: 1-Workbench, 2-Plate strip to be plated, 3-Pressure mechanism, 31-Pressure belt, 32-First shaft, 33-First support, 34-First roller, 4-Tensioning mechanism, 41-Telescopic drive, 42-Piston, 43-Support shaft, 44-First anti-detachment ring, 45-Nano coating, 46-Cylinder, 47-Mounting groove, 48-Pressure sensor, 5-First guide roller, 6-Cleaning roller, 61-First bearing seat, 62-Fixed shaft, 63-First spring, 64-Pattern, 65-Cleaning roller, 66-Pressure plate, 67-Nut, 68-Short shaft, 69-Support column, 610-Support cylinder, 611-Slide groove, 612-Second spring, 613-Support rod; 7-Spot plating wheel, 8-Electroplating shaft, 9-Spot plating tank, 91-Spot plating hole, 10-Second guide roller, 11-Controller, 12-Alarm, 13-Liquid pump, 14-Transfer pipe, 15-Control valve, 16-Stirring mechanism, 161-Stirring drive component, 162-Drive shaft, 163-Stirring blade, 1631-Arc groove, 1632-Inclined end, 17-Liquid level sensor, 18-Support base, 19-Second support base. Detailed Implementation

[0019] To enable those skilled in the art to better understand the technical solutions in this application, the technical solutions of the present invention will be clearly and completely described below in conjunction with the accompanying drawings and embodiments. Obviously, the described embodiments are only a part of the embodiments in this application. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without creative effort should fall within the scope of protection of this application. Example

[0020] like Figures 1 to 8As shown, this disclosure discloses a continuous spot plating device for cleanable strips, including multiple spot plating wheels 7, a strip to be spot plating 2, a pressing mechanism 3, a tensioning mechanism 4, a second guide roller 10, and a cleaning roller 6. The multiple spot plating wheels 7 are arranged in two staggered rows, and each spot plating wheel 7 has a spot plating groove 9. The strip to be spot plating 2 is tangentially wound around the first guide roller 5, and then sequentially tangentially wound around the multiple spot plating wheels 7. Each spot plating wheel 7 is matched with a pressing mechanism 3, one end of which is arc-shaped to press the strip to be spot plating 2 against the circumferential side of the spot plating wheel 7. Each pressing mechanism 3 is equipped with two symmetrically arranged tensioning mechanisms 4, which are self-adjusting to the force applied to the pressing mechanism 3, ensuring that the pressing mechanism 3 keeps the strip to be spot plating 2 tightly against the spot plating wheel 7. The cleaning roller 6 is correspondingly or staggeredly arranged on both sides of the strip to be spot plating 2 between two adjacent spot plating wheels 7. The strip to be plated 2 extends tangentially outward from the end of the plating wheel 7, then wraps tangentially around the second guide roller 10, and then extends outward relative to the second guide roller 10.

[0021] like Figure 1 As shown, the top of the plating wheel 7 is open, the plating wheel 7 is mounted on the support base 18, the support base 18 is rotatably mounted on the plating shaft 8, and the plating shaft 8 is mounted on the worktable 1 via the second support base 19.

[0022] One rotatable connection between the support base 18 and the plating shaft is as follows: the support base and the plating shaft are connected via bearings. The support base can rotate relative to the plating shaft with the aid of bearings.

[0023] It should be noted that the support base can be driven to rotate by the drive mechanism, thereby driving the plating wheel to rotate. Of course, the rotational speed of the support base and the moving speed of the strip to be plating are matched. The drive mechanism may include a drive motor, a drive wheel, and a ring wheel. The ring wheel is located on the support base, and the drive wheel is mounted on the output shaft of the drive motor. The drive wheel and the ring wheel are connected by a transmission.

[0024] If the drive wheel and the ring wheel are pulley structures, then the drive wheel and the ring wheel are connected by a transmission belt.

[0025] If the drive wheel and the ring wheel are gears, then the drive wheel and the ring wheel are meshed and connected for transmission.

[0026] like Figure 1As shown, one structure of the clamping mechanism 3 includes a clamping band 31, a first shaft 32, a first support 33, and four first rollers 34. The four first rollers 34 form a square structure and are installed on the plating wheel 7. Two first rollers 34 are symmetrically installed on both sides of the plating wheel 7, and the remaining two first rollers are installed at intervals between the plating wheel 7. The first rollers 34 are fitted onto the first shaft 32, and the first shaft 32 is installed on the worktable 1 via the first support 33. The clamping band 31 is tangentially wrapped around the four first rollers 34, and the clamping band 31 located between the two first rollers 34 installed close to the plating wheel 7 is arc-shaped and pressed against the plating wheel 7. Thus, the clamping band can press the strip to be plating between the clamping band and the plating wheel and adhere it to the plating wheel, which is beneficial for plating the strip to be plating.

[0027] Understandably, the clamping band does not move with the strip to be plated, but rather maintains static compression of the strip to be plated.

[0028] like Figure 1 As shown, to facilitate the application of force to the clamping band, two tensioning mechanisms 4 are symmetrically installed on both sides of the clamping mechanism, simultaneously applying a compressive force to the clamping band, thus keeping the clamping band pressing the strip to be plated against the plating wheel. It can be understood that the two tensioning mechanisms 4 symmetrically apply pressure to the clamping band, squeezing it and keeping the entire clamping band taut, thereby ensuring that the clamping band presses the strip to be plated tightly against the plating wheel.

[0029] The tensioning mechanism 4 can compress the pressure belt in real time according to the set compression force, so that the pressure belt always keeps the belt to be plated tightly attached to the plating wheel, which can effectively improve the plating quality.

[0030] It should be noted that applying force to a single tensioning band has disadvantages: tightening the tensioning band only on one side can easily cause uneven tension, leading to misalignment of the spot plating area or accelerated wear, which in turn can cause problems such as gold penetration or inconsistent film thickness. For example, common devices rely on a tensioning wheel on one side, and after long-term use, the tensioning band loosens, requiring frequent adjustments to ensure contact.

[0031] The advantages of symmetrical force application in this disclosure are: by applying balanced force through two symmetrically arranged tensioning mechanisms 4, the pressure band is subjected to uniform force, resulting in a tighter fit and reducing uneven plating. The tensioning mechanism 4 can automatically compensate for wear and maintain stable contact pressure.

[0032] In some embodiments of this disclosure, a first structure for the cleaning roller is provided, such as... Figure 6As shown, the cleaning roller 6 includes a first bearing seat 61, a fixed shaft 62, a short shaft 68, and a nut 67. The fixed shaft 62 is vertically mounted on the first bearing seat 61, and a first spring 63, a tray 64, and a cleaning roller 65 are sequentially mounted on it. The circumferential surface of the cleaning roller 65 is wrapped with an electroplated cloth for cleaning. The short shaft 68 is connected to the fixed shaft 62. A pressure plate 66 is fitted onto the short shaft 68. The nut 67 is connected to the short shaft 68 and fits against the pressure plate.

[0033] The cleaning roller 65 can rotate relative to the fixed shaft 62, which facilitates the rolling contact between the cleaning roller and the strip to be plated, and can avoid damage to the strip by the cleaning roller.

[0034] Nut 67 is threaded to short shaft 68, achieving self-locking between the nut and short shaft. The nut restricts the pressure plate, which in turn restricts the cleaning roller, thus preventing the cleaning roller from coming off the top of the fixed shaft.

[0035] The first spring 63 can support the cleaning roller 65 at a set height, so that the cleaning roller can make good contact with the strip to be plated.

[0036] In some embodiments of this disclosure, a second structure for the cleaning roller is provided, such as... Figure 7 As shown, the cleaning roller 6 includes a support column 69 and a cleaning roller 65. The support column 69 has two parallel, spaced-apart support cylinders 610, each with a second spring 612 and a groove 611 extending along its length on its side. The cleaning roller 65 has rotatable support rods 613 at both ends, which are inserted into the corresponding grooves 611. The support rods 613 are connected to the second springs 612, which apply an elastic deformation force to the support rods 613. The support rods 613 and the cleaning roller 65 are pressed against the strip 2 to be plated. The circumferential surface of the cleaning roller 65 is wrapped with an electroplating cloth for cleaning.

[0037] Understandably, electroplating cloths are made from pure cotton substrates and processed with ultra-fine nano abrasives, cleaning agents, and polishing agents. They are mainly used for cleaning and maintaining the shine of electroplated surfaces, and have the characteristics of removing dirt, preventing rust, and not damaging the original surface treatment.

[0038] The slide groove 611 allows the support rod 613 to slide along the length of the support cylinder 610.

[0039] Understandably, during use, the second springs 612 of both support cylinders 610 are in a state of compressed elastic deformation, thereby exerting an elastic deformation force on the support rod. The support rod drives the cleaning roller 65 to press against the strip to be plated 2, so that the cleaning roller 65 and the strip to be plated 2 come into contact and connect. This facilitates the cleaning of the strip to be plated by the electroplating cloth on the cleaning roller, making the surface of the strip to be plated clean, preventing impurities from entering the electroplating station, and improving the quality of the spot plating work on the strip to be plated.

[0040] One installation method for cleaning rollers: Two cleaning rollers 65 are respectively set on both sides of the strip to be plated, which can achieve simultaneous cleaning of both sides of the strip to be plated.

[0041] Another way to install the cleaning rollers: two cleaning rollers are set 65 degrees off on both sides of the strip to be plated, which can clean both sides of the strip to be plated at the same time.

[0042] The strip to be plated 2 is tangentially wrapped around the two cleaning rollers 65, which makes the strip to be plated at this point S-shaped, which can further improve the contact quality between the two cleaning rollers and the strip to be plated, and can better clean the strip to be plated.

[0043] It should be noted that the cleaning roller 65 is supported by two second springs. When the strip to be plated swings significantly, it can push the cleaning roller to move, which can prevent the strip to be plated from becoming taut and breaking.

[0044] In some embodiments of this disclosure, a structure of a tensioning mechanism is provided. The tensioning mechanism 4 includes a telescopic drive member 41, a support shaft 43, a pressure sensor 48, and a controller 11. The telescopic drive member 41 is provided with a piston 42; one end of the support shaft 43 is connected to the piston 42, and the other end is fixedly mounted with a cylinder 46, which is provided with a mounting groove 47; the pressure sensor 48 is provided with a pressure surface for measuring pressure, and the pressure sensor 48 is mounted in the mounting groove 47, with the pressure surface protruding from the circumferential surface of the cylinder 46; the controller 11 is electrically connected to the telescopic drive member 41 and the pressure sensor 48.

[0045] The first anti-detachment ring 44 is installed on the support shaft 43 to support the cylinder 46.

[0046] The pressure surface is coated with a nano-coating 45. The nano-coating can form a microporous structure on the surface of the cleaning roller, which has a strong adsorption capacity and hydrophobicity. It can effectively adsorb dirt particles and reduce moisture residue, reduce dirt adhesion rate through physical repulsion, and reduce cleaning frequency.

[0047] This disclosure discloses a method for applying pressure to the clamping belt when it becomes slack, causing the clamping belt to tighten the strip to be plated onto the plating wheel again. Specifically, the pressure sensor 48 monitors the pressure between the cylinder 46 and the clamping belt 31 in real time and transmits the monitored pressure data to the controller 11. Understandably, the controller can preset a pressure range, for example, a minimum pressure value and a maximum pressure value, with the normal operating pressure being between the minimum and maximum pressure values. During operation, a pressure H can be selected between the minimum and maximum pressure values. Under this pressure, the clamping belt can keep the strip to be plated tightly pressed against the plating wheel. When the pressure detected by the pressure sensor is less than pressure H, the telescopic drive drives the piston 42 to extend. The piston pushes the support shaft 43, which in turn moves the cylinder 46. The cylinder 46 causes the pressure surface of the pressure sensor to press against the strip to be plated. When the pressure reaches pressure H again, the telescopic drive stops driving the piston to extend, and the piston maintains its extended length, with the pressure surface on the pressure sensor maintaining pressure against the plating wheel. The telescopic drive component works in conjunction with the pressure sensor to achieve pressure adjustment of the self-adjusting cylindrical extrusion clamping belt.

[0048] In some embodiments of this disclosure, an alarm 12 is added to facilitate the detection of the piston's maximum extension stroke. The alarm 12 is electrically connected to the controller 11.

[0049] The telescopic drive component 41 can be a pneumatic cylinder or a hydraulic cylinder. The telescopic drive component drives the piston to extend and retract. To facilitate control of the piston's extension and retraction stroke, the controller can set the minimum retraction stroke and the maximum extension stroke of the piston. When the piston is at its minimum retraction stroke, the support shaft 43 drives the cylinder 46 to just touch the clamping strip; when the piston is at its maximum extension stroke, the controller activates an alarm, and the operator can then know from the alarm that the piston has extended to its maximum stroke, indicating that the clamping strip has undergone significant deformation and is no longer suitable for pressing the strip to be plated, requiring replacement of the clamping strip.

[0050] In some embodiments of this disclosure, a stirring mechanism 16 is added to facilitate the flow of the electroplating solution within the spot plating wheel. The spot plating tank 9 is equipped with at least one stirring mechanism 16, which is used to propel the electroplating solution within the spot plating tank 9.

[0051] The number of stirring mechanisms 16 can be 1, 2, or 3. For example, in this embodiment, two stirring mechanisms are installed, one at each end of the spot plating tank. The two stirring mechanisms work simultaneously, which facilitates the flow of the electroplating solution within the tank and forces the plating liquid into the spot plating holes. Compared to a static spot plating solution, the spot plating solution in the tank of this disclosure flows due to the movement of the two stirring mechanisms, allowing the solution to quickly flow into the spot plating holes, thus improving the efficiency of the spot plating process.

[0052] In some embodiments of this disclosure, a structure of the stirring mechanism is provided, such as... Figure 5 As shown, the stirring mechanism 16 includes a stirring drive 161 and multiple stirring blades 163. The stirring drive 161 is provided with a drive shaft 162, and the multiple stirring blades 163 are installed on the drive shaft 162 at staggered intervals. The stirring blades 163 extend arc-shaped from the drive shaft 162 in the opposite direction of rotation, then bend in an S-shape, and are inclined at the end away from the drive shaft 162.

[0053] In this embodiment, the stirring blade 163 is provided with a plurality of arc-shaped grooves 1631 at one end away from the drive shaft 162, and the arc-shaped groove 1631 at the end is provided with an inclined end 1632.

[0054] The stirring blades 163 are equipped with multiple arc-shaped grooves 1631, which increase the contact area between the blades and the electroplating solution, resulting in more uniform stirring. The concave arc-shaped structure guides the electroplating solution to form multi-directional turbulence, increasing the gas-liquid contact area and making the dissolved oxygen distribution more uniform. Compared with straight blades, this design improves dissolved oxygen efficiency by more than 30%, and is especially suitable for electroplating systems requiring high oxygen content (such as cyanide leaching). When a propeller-type agitator is used in conjunction with concave arc-shaped blades, the vortex effect can continuously draw air below the liquid surface, avoiding "oxygen dead zones".

[0055] like Figure 5 As shown, multiple arc-shaped grooves can form a wave-like or alternating concave / convex curved surface design, which can promote the fluid to form a three-dimensional circulation within the groove, reducing the accumulation of deposits. This can reduce the amount of deposits at the bottom of the spot plating tank by more than 90%.

[0056] The stirring blade 163 of this disclosure is provided with multiple arc-shaped grooves 1631, which can form a concave arc-shaped mechanical stirring. The concave arc-shaped mechanical stirring can replace air stirring, avoiding the introduction of oil or particulate contaminants by compressed air and ensuring the purity of the plating solution. For example, this is especially important for high-requirement plating solutions such as nickel sulfamate, where impurities caused by air stirring will directly reduce the ductility of the plating layer.

[0057] The stirring blade 163 of this disclosure has multiple arc-shaped grooves 1631, which can enhance fluid uniformity and make the electric field distribution more stable, avoiding scorching of the coating due to excessively high local current density or insufficient brightness due to excessively low local current density. Uniform stirring can widen the acceptable current density range by about 40%.

[0058] The inclined end 1632 of this disclosure has an inclination angle of 50° to 65° with the vertical plane. The inclination angle can be 50°, 55°, 60° or 65°. A suitable inclination angle can be selected according to the working requirements. During stirring, it can facilitate the radial flow of the plating solution in the plating tank, which can facilitate the plating solution to flow into the plating holes on the side of the plating tank, thereby improving the plating quality.

[0059] In some embodiments of this disclosure, in order to prevent the plating solution from adsorbing onto the stirring blades, a method for treating the stirring blades is provided: the stirring blades are polished to prevent adsorption, which can prevent the plating solution from adsorbing.

[0060] The agitator blades can be made of 304 or 316L stainless steel. 304 and 316L stainless steel have excellent corrosion resistance, resisting chemical corrosion in electroplating solutions and ensuring long-term stable operation of the equipment.

[0061] One polishing method for stirring blades: chemical polishing (such as pickling and passivation paste treatment) can generate a dense, off-white passivation film on the surface of stainless steel blades, sealing the micropores on the metal surface, blocking the direct contact between the plating solution and the substrate, and significantly reducing the probability of chemical adsorption.

[0062] Chemical polishing procedure: Apply 1-2mm passivation paste, let stand for 1-20 minutes until the surface is completely covered with a white film, neutralize with caustic soda (sodium hydroxide), and then rinse with pure water.

[0063] Another polishing method for stirring blades: physical polishing to achieve a mirror effect (Ra≤0.2μm), thereby reducing surface roughness, reducing physical anchor points for plating solution retention, and making the high-gloss surface easier for liquid to detach, avoiding residue accumulation.

[0064] In some embodiments of this disclosure, to facilitate the replenishment of plating solution into the plating tank, a pump 13, a delivery pipe 14, a control valve 15, and a level sensor 17 are added. One end of the delivery pipe 14 is connected to the plating tank 9, and the other end is connected to the pump 13, and a control valve 15 is installed thereon. The level sensor 17 is installed in the plating tank 9 to monitor the level of the plating solution in the plating tank and is electrically connected to the pump 13.

[0065] The level sensor 17 monitors the level of the plating solution in the plating tank in real time. Understandably, a minimum and maximum level can be set. When the level sensor 17 detects the minimum level, the control valve 15 opens, the pump 13 starts, draws out the plating solution, and delivers it to the plating tank 9 through the delivery pipe 14, thus replenishing the plating tank. When the level sensor detects the maximum level, the control valve 15 closes, and the pump stops working. Understandably, the pump is connected to a device storing the plating solution.

[0066] It should be noted that the pump 13, control valve 15, and level sensor 17 are all electrically connected to the controller 11. The controller can control the operation of the pump based on the level data obtained from the level sensor. Understandably, the minimum and maximum levels of the level can be preset on the controller.

[0067] The working method of this disclosure: The strip to be plated 2 is tangentially wound around the first guide roller 5, and then tangentially wound around multiple staggered plating wheels 7 in sequence. This allows for plating on both sides of the strip to be plated. Then it extends to the second guide roller 10 and tangentially wound around the second guide roller 10, and then extends outward.

[0068] When the strip to be plated 2 is tangentially wrapped around the plating wheel 7, it is pressed into the plating wheel 7 in an arc shape by the clamping mechanism 3. The tensioning mechanism 4 provides a force source to the clamping mechanism 3, that is, the tensioning mechanism 4 applies a symmetrical force to the clamping mechanism, which makes the clamping band 31 in the clamping mechanism 3 bear the force evenly and can evenly squeeze the strip to be plated onto the plating wheel. The plating groove 9 is provided with plating holes 91, and the side of the plating wheel is provided with corresponding plating holes. When the strip to be plated passes through the plating wheel, the corresponding plating position on the strip to be plated can be plating.

[0069] Cleaning rollers 6 are provided on both sides of the strip to be plated between adjacent plating rollers. The cleaning rollers 6 can clean the strip to be plated 2, prevent impurities adsorbed on the strip from entering the plating station, and improve the plating quality.

[0070] During the spot plating process, when the clamping band 31 of the clamping mechanism 3 becomes fatigued and loose, the tensioning mechanism 4 can adjust itself according to the set pressure value. That is, the tensioning mechanism moves to squeeze the clamping band, so that the clamping band is tightened again. When the force applied by the tensioning mechanism reaches the set pressure value, it maintains the pressure value to squeeze the clamping band, so that the clamping mechanism always keeps the spot plating band tightly pressed on the spot plating wheel.

[0071] Obviously, the above embodiments are merely illustrative examples for clear explanation and are not intended to limit the implementation. Those skilled in the art will recognize that other variations or modifications can be made based on the above description. It is neither necessary nor possible to exhaustively list all possible implementations here. However, obvious variations or modifications derived therefrom are still within the scope of protection of this invention.

Claims

1. A continuous spot plating device for cleanable material strips, characterized in that: include Multiple spot plating wheels (7) are arranged in two staggered rows, and each spot plating wheel (7) is provided with a spot plating groove (9). The strip to be plated (2) is tangentially wound around the first guide roller (5), and then tangentially wound around multiple spot plating wheels (7) in sequence. A pressing mechanism (3) is matched with each spot plating wheel (7). One end of the pressing mechanism (3) is arc-shaped to press the spot plating strip (2) to be attached to the circumferential side of the spot plating wheel (7); Tensioning mechanism (4), each clamping mechanism (3) is equipped with two symmetrically arranged tensioning mechanisms (4), the tensioning mechanism (4) can self-adjust the force applied to the clamping mechanism (3), so that the clamping mechanism (3) can squeeze the strip to be plated (2) to keep it tightly attached to the plating wheel (7); and The cleaning roller (6) is positioned on both sides of the strip (2) to be plated, either correspondingly or offset from the two adjacent plating rollers (7).

2. The continuous spot plating equipment for cleanable strips according to claim 1, characterized in that: The cleaning roller (6) includes First bearing housing (61); A fixed shaft (62) is vertically installed on the first bearing seat (61) and is sequentially fitted with a first spring (63), a tray (64), and a cleaning roller (65). The circumferential surface of the cleaning roller (65) is wrapped with an electroplated cloth for cleaning. The short shaft (68) is connected to the fixed shaft (62); Pressure plate (66), fitted onto short shaft (68); and Nut (67) is connected to the short shaft (68) nut and fits against the pressure plate.

3. The continuous spot plating equipment for cleanable strips according to claim 1, characterized in that: The cleaning roller (6) includes The support column (69) has two parallel, spaced-apart support cylinders (610), each support cylinder (610) is equipped with a second spring (612), and each has a sliding groove (611) extending along its length on its side; and The cleaning roller (65) has support rods (613) at both ends that rotate. The support rods (613) are inserted into corresponding grooves (611). The support rods (613) are connected to a second spring (612). The second spring (612) applies an elastic deformation force to the support rods (613). The support rods (613) and the cleaning roller (65) are pressed against the strip (2) to be plated. The circumferential surface of the cleaning roller (65) is covered with an electroplating cloth for cleaning.

4. The continuous spot plating equipment for cleanable strips according to claim 1, characterized in that: The tensioning mechanism (4) includes The telescopic drive component (41) is equipped with a piston (42). The support shaft (43) is connected to the piston (42) at one end and a cylinder (46) is fixedly installed at the other end. The cylinder (46) is provided with an installation groove (47). A pressure sensor (48) is provided with a pressure surface for measuring pressure and is installed in the mounting groove (47), the pressure surface protruding from the circumferential surface of the cylinder (46); The controller (11) is electrically connected to the telescopic drive (41) and the pressure sensor (48).

5. The continuous spot plating equipment for cleanable strips according to claim 4, characterized in that: It also includes an alarm (12), a first anti-detachment ring (44) and a nano-coating (45), the alarm (12) being electrically connected to the controller (11), and the first anti-detachment ring (44) being mounted on a support shaft (43) for supporting the cylinder (46). The pressure surface is provided with a nano-coating (45).

6. The continuous spot plating equipment for cleanable strips according to claim 1, characterized in that: It also includes a stirring mechanism (16), and the spot plating tank (9) is equipped with at least one stirring mechanism (16) for pushing the electroplating solution in the spot plating tank (9).

7. The continuous spot plating equipment for cleanable strips according to claim 6, characterized in that: The stirring mechanism (16) includes The stirring drive unit (161) is provided with a drive shaft (162), and Multiple stirring blades (163) are installed at staggered intervals on the drive shaft (162). The stirring blades (163) extend arc-shaped from the drive shaft (162) in the opposite direction of rotation, then bend in an S-shape, and are inclined at one end away from the drive shaft (162).

8. The continuous spot plating equipment for cleanable strips according to claim 7, characterized in that: The stirring blade (163) has a plurality of arc-shaped grooves (1631) at one end away from the drive shaft (162), and the arc-shaped groove (1631) at the end has an inclined end (1632), the inclined end (1632) has an inclination angle of 50° to 65° with the vertical plane.

9. The continuous spot plating equipment for cleanable strips according to claim 7, characterized in that: The stirring blades are polished to prevent adsorption, thus preventing the electroplating solution from adsorbing onto them.

10. The continuous spot plating equipment for cleanable strips according to claim 1, characterized in that: It also includes a liquid pump (13), a delivery pipe (14), a control valve (15) and a liquid level sensor (17). One end of the delivery pipe (14) is connected to the spot plating tank (9) and the other end is connected to the liquid pump (13), and a control valve (15) is installed thereon. The liquid level sensor (17) is installed in the spot plating tank (9) to monitor the liquid level of the electroplating solution in the spot plating tank and is electrically connected to the liquid pump (13).

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