Uniformly-distributed photon physical wave antibacterial bin and application

Abstract

The invention relates to the technical field of physical wave antibiosis, in particular to an evenly-distributed photon physical wave antibiosis bin and application, the evenly-distributed photon physical wave antibiosis bin comprises a bin body and a linear rail arranged in the bin body, a bearing table is slidably installed in the linear rail, and a plurality of fixing plates distributed at equal intervals are fixed to the bearing table; the staggered clamping mechanism is arranged on the fixing plate and comprises a first clamping plate and a second clamping plate which are symmetrically arranged; and the lifting guide mechanism is arranged on the bearing table and connected with the dislocation clamping mechanism, and an adjusting assembly is arranged on the lifting guide mechanism. According to the clamping device, through cooperation of the adjusting assembly and the lifting guide mechanism, the first clamping plate or the second clamping plate is controlled to execute the clamping action firstly; and then the second clamping plate or the first clamping plate is controlled to execute the releasing action, and it is ensured that the first clamping plate and the second clamping plate execute the alternate clamping action so as to alternately treat the textile clamping dead angle.

Description

Technical Field

[0001] This invention relates to the field of physical wave antibacterial technology, specifically a uniformly distributed photon physical wave antibacterial chamber and its application. Background Technology

[0002] Photonic physical wave antibacterial involves placing textiles inside an antibacterial chamber. Through broadband photonic quantum guidance technology, the particles in the textiles are subjected to particle beam action, causing denaturation of microbial proteins, inactivation of enzymes, and alteration of DNA. This severely disrupts the normal physiological metabolism of microorganisms, thereby affecting their proliferation ability and achieving antibacterial and bacteriostatic effects.

[0003] When performing antibacterial treatment, the textiles to be treated can be placed in the warehouse, and the antibacterial treatment can be achieved by emitting physical waves to penetrate the textiles for a certain period of time. In order to ensure the processing capacity, the textiles are usually placed in the warehouse in a stacked manner. The mutual stacking and interference of the textiles will increase the time for physical waves to penetrate the textiles, thereby reducing work efficiency and easily causing the problem of incomplete antibacterial treatment.

[0004] To address this, the textiles can be neatly arranged within the storage chamber by clamping, ensuring they always face the direction of the physical wave emission. This guarantees that the physical wave can fully penetrate the textiles, thereby reducing the required antibacterial time. However, regardless of whether the textiles are clamped with metal or plastic, the physical wave cannot penetrate the clamped workpiece at the clamping position, resulting in antibacterial dead zones at the clamping position. Summary of the Invention

[0005] The purpose of this invention is to provide a uniformly distributed photonic physical wave antibacterial chamber and its application, in order to solve the problems mentioned in the background art.

[0006] To achieve the above objectives, the present invention provides the following technical solution: a uniformly distributed photonic physical wave antibacterial chamber, comprising: a chamber body, and a linear track opened within the chamber body, a support platform slidably installed within the linear track, and multiple fixed plates evenly distributed on the support platform; further comprising: a misaligned clamping mechanism disposed on the fixed plates, including a first clamping plate and a second clamping plate symmetrically arranged; a lifting guide mechanism disposed on the support platform and connected to the misaligned clamping mechanism, the lifting guide mechanism being provided with an adjustment component, the adjustment component being able to control the first clamping plate and the second clamping plate to alternately perform clamping and releasing actions when the lifting guide mechanism drives the misaligned clamping mechanism to move; when the first clamping plate completes its clamping action, the second clamping plate performs its releasing action; when the second clamping plate completes its clamping action, the first clamping plate performs its releasing action.

[0007] As a further aspect of the present invention: the misaligned clamping mechanism includes a first movable rod and a second movable rod that are slidably mounted on the fixed plate and are symmetrically arranged, and a first limiting ring that abuts against the fixed plate is fixed on the first movable rod and the second movable rod.

[0008] As a further embodiment of the present invention: the misaligned clamping mechanism further includes movable plates fixed to the ends of the first movable rod and the second movable rod respectively, the movable plates having symmetrically arranged sliding grooves, and sliding blocks being slidably installed in the sliding grooves, the sliding blocks being fixedly connected to the first clamping plate and the second clamping plate.

[0009] As a further embodiment of the present invention: the lifting guide mechanism includes two movable sleeves that slide axially along the first movable rod and the second movable rod respectively, and a second limiting ring that abuts against the movable sleeve is fixed on the first movable rod and the second movable rod. A first limiting post and a second limiting post are fixed on the side walls of the two movable sleeves respectively; it also includes a limiting component and a translation component disposed on the support platform for adjusting the position of the movable sleeve by means of the first limiting post and the second limiting post.

[0010] As a further embodiment of the present invention: the limiting component includes a guide rail fixed to the side wall of the fixed plate, a support plate slidably mounted on the guide rail, and a guide groove formed on the support plate that slidably engages with the first limiting post and the second limiting post.

[0011] As a further embodiment of the present invention: the translation component includes a bidirectional lead screw rotatably mounted on the support platform, and the bidirectional lead screw is threaded with symmetrically arranged threaded sleeves, which are fixedly connected to the support plate.

[0012] As a further embodiment of the present invention: the guide groove includes a first straight groove, a first inclined groove, a second straight groove, a second inclined groove, and a third straight groove formed on the support plate, wherein the ends of the first straight groove, the first inclined groove, the second straight groove, the second inclined groove, and the third straight groove are connected to each other in sequence.

[0013] As a further embodiment of the present invention: the adjusting assembly includes springs respectively sleeved on the first movable rod and the second movable rod, the two ends of the springs respectively abutting against the movable sleeve and the movable plate, a support sleeve fixed on the sliding block, and a support rod slidably installed inside the support sleeve and fixedly connected to the movable sleeve.

[0014] As a further embodiment of the present invention: a handle for pulling the support platform to slide radially along the straight track is fixed on the support platform.

[0015] The application of a uniformly distributed photonic physical wave antibacterial chamber in photonic physical wave antibacterial applications in textiles.

[0016] Compared with the prior art, the beneficial effects of the present invention are: the present application can control the first clamping plate and the second clamping plate to perform alternating clamping actions on the textile with the cooperation of the lifting guide mechanism and the adjustment component, and the second clamping plate will only perform the release action after the first clamping plate has finished clamping, and similarly, the first clamping plate will only perform the clamping action after the second clamping plate has finished clamping, ensuring that the textile is always in a clamped state. In this way, the textile can be kept in a clamped state to increase the area of ​​the textile receiving physical waves, and the clamping dead corners can be treated alternately to avoid the problem of inadequate antibacterial treatment of textiles.

[0017] By switching the positions of the first and second limiting posts within the guide groove, the positional changes of the first and second clamping plates can be precisely controlled. Furthermore, when the first or second clamping plate separates from the textile, it can also shift vertically until it is misaligned with the textile, ensuring that the first and second clamping plates do not interfere with the emitted physical waves.

[0018] By clamping the edges and corners of the textile with the first and second clamps, it is possible to control the textile to always maintain the largest receiving area facing the direction of physical wave emission. This avoids the situation in traditional antibacterial chambers where textiles are stacked, which would require a longer processing time. Furthermore, because the textiles are in a regular clamped state, the difficulty of physical wave penetration is reduced, and the penetration of physical waves is made more uniform. Attached Figure Description

[0019] Figure 1 A schematic diagram of one embodiment of a uniformly distributed photonic physical wave antibacterial chamber; Figure 2 A schematic diagram of the internal structure of a uniformly distributed photonic physical wave antibacterial chamber in one embodiment; Figure 3 A schematic diagram of the structure of the support platform, fixing plate, and misaligned clamping mechanism in one embodiment of a uniformly distributed photonic physical wave antibacterial chamber; Figure 4 for Figure 3 Another structural diagram from another angle; Figure 5 A schematic diagram showing the connection relationship between the misaligned clamping mechanism, the lifting and guiding mechanism, and the adjusting component in one embodiment of a uniformly distributed photon physical wave antibacterial chamber; Figure 6 for Figure 5 Enlarged structural diagram at point A; Figure 7A schematic diagram of the structure of some lifting guide mechanism, misaligned clamping mechanism and adjustment component in one embodiment of a uniformly distributed photon physical wave antibacterial chamber; Figure 8 A schematic diagram of the structure of a partially misaligned clamping mechanism, a partially lifting and guiding mechanism, and an adjustment component in one embodiment of a uniformly distributed photonic physical wave antibacterial chamber; Figure 9 An exploded view of the partial misaligned clamping mechanism and adjustment components in one embodiment of a uniformly distributed photonic physical wave antibacterial chamber; Figure 10 A schematic diagram of the partially misaligned clamping mechanism in one embodiment of a uniformly distributed photonic physical wave antibacterial chamber; Figure 11 This is a schematic diagram of the structure of the staggered clamping mechanism and the fixing plate in one embodiment of the uniformly distributed photon physical wave antibacterial chamber.

[0020] In the diagram: 1. Warehouse body; 101. Linear track; 2. Cabinet door; 3. Support platform; 4. Fixed plate; 401. Guide rail; 5. Two-way lead screw; 6. Threaded sleeve; 7. Support plate; 701. First straight groove; 702. First inclined groove; 703. Second straight groove; 704. Second inclined groove; 705. Third straight groove; 8. First movable rod; 801. First limiting ring; 802. Second limiting ring; 9. Movable plate; 901. Slide groove; 10. Sliding block; 11. First clamping plate; 12. Movable sleeve; 13. First limiting post; 14. Spring; 15. Support sleeve; 16. Support rod; 17. Second movable rod; 18. Second clamping plate; 19. Second limiting post. Detailed Implementation

[0021] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0022] Furthermore, elements in this invention are referred to as being "fixed to" or "set on" another element, which may be directly on the other element or may also include an intervening element. When an element is considered to be "connected" to another element, it may be directly connected to the other element or may also include an intervening element. The terms "vertical," "horizontal," "left," "right," and similar expressions used herein are for illustrative purposes only and do not represent the only possible implementations.

[0023] Please see Figures 1-11In this embodiment of the invention, a uniformly distributed photonic physical wave antibacterial chamber includes: a chamber body 1, and a linear track 101 opened within the chamber body 1. A support platform 3 is slidably installed within the linear track 101, and multiple fixed plates 4 are fixed on the support platform 3 at equal intervals. It also includes: a misaligned clamping mechanism disposed on the fixed plates 4, comprising a first clamping plate 11 and a second clamping plate 18 symmetrically arranged; a lifting guide mechanism disposed on the support platform 3 and connected to the misaligned clamping mechanism, wherein the lifting guide mechanism is provided with an adjustment component, which can control the first clamping plate 11 and the second clamping plate 18 to alternately perform clamping and releasing actions when the lifting guide mechanism drives the misaligned clamping mechanism to move; when the first clamping plate 11 completes its clamping action, the second clamping plate 18 performs its releasing action; when the second clamping plate 18 completes its clamping action, the first clamping plate 11 performs its releasing action; and a handle is fixed on the support platform 3 for pulling the support platform 3 to slide radially along the linear track 101.

[0024] Specifically, when antibacterializing textiles, the textiles can be placed inside the chamber 1. A photon broadband microwave quantum generator equipped inside the chamber 1 continuously emits microwave quanta onto the textiles, causing the textile particles to act as a particle beam. This results in the denaturation of microbial proteins, inactivation of enzymes, and alteration of DNA, severely disrupting the normal physiological metabolism of microorganisms and thus affecting their reproductive capacity, achieving an antibacterial and bacteriostatic effect. To enhance the treatment effect, a certain distance can be maintained between the textiles to ensure comprehensive treatment. The chamber 1 is equipped with a cabinet door 2, which can be opened. The handle controls the support platform 3 to slide radially along the linear track 101, moving towards a direction away from the chamber 1. When the support platform 3 moves to a position convenient for the operator, the operator can access it via the first clamp 11 or the second clamp... Plate 18 clamps both sides of the textile to be treated. After clamping, the control platform 3 returns to the chamber 1. At this time, the textile can be treated with photon physical waves. Since either the first clamping plate 11 or the second clamping plate 18 will cause processing dead angles when clamping, the first clamping plate 11 and the second clamping plate 18 are controlled to perform alternating clamping actions on the textile with the cooperation of the lifting guide mechanism and the adjustment component. The second clamping plate 18 will only perform the release action after the first clamping plate 11 has finished clamping, and similarly, the first clamping plate 11 will only perform the clamping action after the second clamping plate 18 has finished clamping, to ensure that the textile is always in a clamped state. In this way, the textile can be kept in a clamped state to increase the area of ​​the textile receiving physical waves, and the clamping dead angles can be treated alternately to avoid the problem of inadequate antibacterial treatment of textiles.

[0025] Please see Figures 2-9The misaligned clamping mechanism includes a first movable rod 8 and a second movable rod 17 slidably mounted on the fixed plate 4 and arranged symmetrically. A first limiting ring 801 that abuts against the fixed plate 4 is fixed on the first movable rod 8 and the second movable rod 17. The misaligned clamping mechanism also includes a movable plate 9 fixed to the ends of the first movable rod 8 and the second movable rod 17 respectively. A sliding groove 901 is formed on the movable plate 9 and arranged symmetrically. A sliding block 10 is slidably mounted in the sliding groove 901. The sliding block 10 is fixedly connected to the first clamping plate 11 and the second clamping plate 18.

[0026] In detail, with the central reference plane of the fixed plate 4 as the plane of symmetry, the first movable rod 8 and the second movable rod 17 are symmetrically arranged, so that the clamping points of the first clamping plate 11 and the second clamping plate 18 on the textile are staggered. During the antibacterial treatment of the textile, the first clamping plate 11 and the second clamping plate 18 can perform alternating clamping actions on the textile, so that the textile is perpendicular to the emission direction of the physical wave, thereby ensuring the penetration effect of the physical wave on the textile. If the first clamping plate 11 performs a clamping action on the textile, the second clamping plate 18 is in a separated state from the textile, and under the action of the lifting guide mechanism and the adjusting component, the textile is separated from the textile. The second clamping plate 18 is located at the end of its stroke in the direction of approaching the fixed plate 4, so that the second clamping plate 18 is separated from the textile in the vertical direction, ensuring that the second clamping plate 18 does not obstruct the physical wave, and the physical wave can smoothly handle the dead angle of the clamping point of the second clamping plate 18. Similarly, when the second clamping plate 18 performs a clamping action on the textile, the first clamping plate 11 is separated from the textile and located at the end of its stroke in the direction of approaching the fixed plate 4, so that the first clamping plate 11 is separated from the textile in the vertical direction. At this time, the physical wave can smoothly handle the dead angle of the clamping point of the first clamping plate 11.

[0027] By using the alternating staggered clamping of the first clamping plate 11 and the second clamping plate 18, it can be ensured that when the first clamping plate 11 or the second clamping plate 18 is separated from the textile, the processing dead corners generated on the textile can be smoothly processed, so as to ensure the comprehensiveness of textile processing.

[0028] Please see Figures 3-7 , Figure 10The lifting guide mechanism includes two movable sleeves 12 that slide axially along the first movable rod 8 and the second movable rod 17, respectively. A second limiting ring 802 is fixed on the first movable rod 8 and the second movable rod 17 to engage with the movable sleeves 12. A first limiting post 13 and a second limiting post 19 are fixed to the side walls of the two movable sleeves 12, respectively. The mechanism also includes a limiting component and a translation component disposed on the support platform 3 for adjusting the position of the movable sleeves 12 via the first limiting post 13 and the second limiting post 19. The limiting component includes a guide rail 401 fixed to the side wall of the fixed plate 4. A support plate 7 is slidably mounted on the guide rail 401. A guide groove is formed on the support plate 7 that slidably engages with the first limiting post 13 and the second limiting post 19. The translation component includes a bidirectional lead screw 5 rotatably mounted on the support platform 3. symmetrically arranged threaded sleeves 6 are threadedly connected to the bidirectional lead screw 5. The threaded sleeves 6 are fixedly connected to the support plate 7.

[0029] The guide groove includes a first straight groove 701, a first inclined groove 702, a second straight groove 703, a second inclined groove 704, and a third straight groove 705 formed on the support plate 7. The ends of the first straight groove 701, the first inclined groove 702, the second straight groove 703, the second inclined groove 704, and the third straight groove 705 are connected to each other in sequence.

[0030] Please see Figures 3-9 The adjusting assembly includes springs 14 respectively sleeved on the first movable rod 8 and the second movable rod 17. The two ends of the springs 14 abut against the movable sleeve 12 and the movable plate 9 respectively. A support sleeve 15 is fixed on the sliding block 10. A support rod 16 fixedly connected to the movable sleeve 12 is slidably installed inside the support sleeve 15.

[0031] Please see Figure 10Furthermore, the first straight groove 701, the first inclined groove 702, the second straight groove 703, the second inclined groove 704, and the third straight groove 705 have the same length in the horizontal direction. In the initial state, the two threaded sleeves 6 are located at the end of their strokes in directions away from each other, and the first movable rod 8 is located at the end of its stroke in a direction away from the threaded sleeve 6. The first limiting ring 801 connected to it abuts against the fixed plate 4, making the distance between the first clamping plate 11 and the fixed plate 4 the maximum. Under the action of the threaded sleeve 6, the first limiting post 13 is located in the first straight groove 701 away from the first inclined groove. At the end of the stroke on one side of 702, the movable sleeve 12 located on the first movable rod 8 is separated from the second limiting ring 802, and the distance between the movable sleeve 12 and the movable plate 9 is minimized. At this time, the compression of the spring 14 abutting against the movable sleeve 12 is maximized. Under the action of the movable sleeve 12, the size of the mutual engagement between the support sleeve 15 and the support rod 16 is maximized, so that the sliding block 10 is located at the end of the stroke on one side of the slide groove 901, and the distance between the two sliding blocks 10 is minimized, so as to perform a clamping action on the textile through the first clamping plate 11; please refer to Figure 7The second movable rod 17 is located at the end of its stroke towards the threaded sleeve 6, causing the first limiting ring 801 connected to it to be separated from the fixed plate 4, so that the gap between the second clamping plate 18 and the fixed plate 4 is minimized. Under the action of the threaded sleeve 6, the second limiting post 19 is located at the connection position of the second inclined groove 704 and the second straight groove 703, so that the movable sleeve 12 on the second movable rod 17 is in abutting state with the second limiting ring 802, and the gap between the movable sleeve 12 and the movable plate 9 is maximized, while the elongation of the spring 14 in its natural state is greater than that of the movable sleeve 18. The maximum distance between the 2 and the movable plate 9 is such that the spring 14 remains compressed and always provides a thrust to the movable sleeve 12 toward the movable plate 9. Under the action of the movable sleeve 12, the size of the interlocking of the support sleeve 15 and the support rod 16 is minimized, so that the sliding block 10 is located at the end of its stroke on the other side of the slide groove 901, and the distance between the two sliding blocks 10 is maximized. At this time, the distance between the second clamping plates 18 is maximized, and they are separated from the textile in the vertical direction. In this state, the first clamping plate 11 will obstruct physical waves, thereby causing the textile to... A blind spot is created. To address this blind spot, the first clamping plate 11 and the second clamping plate 18 need to be controlled to alternately perform clamping actions. This can be achieved by controlling the rotation of the bidirectional lead screw 5, which in turn drives the two threaded sleeves 6 to move, thereby moving the support plate 7. Under the action of the guide rail 401, the support plate 7 can only slide along the length of the guide rail 401. Therefore, the support plate 7 and the guide rail 401 have a guiding function, ensuring that the threaded sleeves 6 can only slide along the axial direction of the bidirectional lead screw 5 and will not rotate with it. The support plate 7 also drives the guide groove to move, causing the first limiting post 13 to move relative to the support... Plate 7 slides along the first straight groove 701 so that the position of the movable sleeve 12 connected thereto does not change. The first clamping plate 11 always remains in a clamping state, while the second limiting post 19 will slide relative to the support plate 7 along the second inclined groove 704 and move toward the third straight groove 705, so that the movable sleeve 12 connected thereto moves toward the direction away from the fixed plate 4. Since the spring 14 is in a compressed state, the movable sleeve 12 will control the movable plate 9 and the second movable rod 17 to move synchronously through the spring 14, thereby controlling the second clamping plate 18 to move toward the textile through the sliding block 10.When the second movable rod 17 drives the first limiting ring 801 to abut against the fixed plate 4, the positions of the second movable rod 17 and the movable plate 9 no longer change. At this time, the second clamping plate 18 just moves to the clamping position, and the second limiting post 19 is still located in the second inclined groove 704. In response, the movable sleeve 12 continues to move and separates from the second limiting ring 802. Since the position of the movable plate 9 no longer changes, the spring 14 will continue to be compressed. At the same time, the movable sleeve 12 will also drive the support rod 16 to move and continue to move towards the support sleeve 15, thereby controlling the two sliding blocks 10 to move along the slide groove 901 through the support sleeve 15. The second clamping plate 18 slides radially and moves towards each other, thereby continuously reducing the distance between the second clamping plate 18 and the textile. When the second clamping plate 18 is in contact with the textile, it continues to move to increase the clamping force on the textile until the second limiting post 19 moves to the position where the second inclined groove 704 and the third straight groove 705 are connected. At this time, the position of the movable sleeve 12 no longer changes, and the second clamping plate 18 completes the clamping action on the textile. When the second limiting post 19 moves to the position where the second inclined groove 704 and the third straight groove 705 are connected, the first limiting post 13 moves to the position where the first straight groove 701 and the first inclined groove 705 are connected. At the connection point 2, the support plate 7 continues to move, causing the second limiting post 19 to slide along the third straight groove 705, and the first limiting post 13 to enter the first inclined groove 702, thereby driving the connected movable sleeve 12 to move towards the fixed plate 4. Since the spring 14 is in a compressed state, it is released elastically, so that the position of the movable plate 9 will not change. The movable sleeve 12 will drive the support rod 16 to move away from the support sleeve 15, so that the support sleeve 15 will drive the two sliding blocks 10 to move away from each other, thereby controlling the two first clamping plates 11 and the textile to separate. When the movable sleeve 12 moves to abut against the second limiting ring 802, the first clamping plate 11 completely separates from the textile. At this time, the movable sleeve 12 drives the first movable rod 8 to move towards the threaded sleeve 6 via the second limiting ring 802, causing the first limiting ring 801 to separate from the fixed plate 4. Simultaneously, it controls the first clamping plate 11 to separate from the textile in the vertical direction. When the first limiting post 13 moves to the position where the first inclined groove 702 and the second straight groove 703 are connected, the bidirectional lead screw 5 stops rotating, and the second limiting post 19 just moves to the end of its stroke on the side of the third straight groove 705 away from the second inclined groove 704.

[0032] Preferably, by controlling the second clamping plate 18 to perform a clamping action on the textile first, and then controlling the first clamping plate 11 to perform a releasing action on the textile, the textile is moved aside in the vertical direction. In this way, the textile can be continuously clamped to ensure that it always faces the direction of physical wave emission during antibacterial treatment. At the same time, when the first clamping plate 11 and the second clamping plate 18 perform alternating clamping actions, the dead corners generated by the clamping points of the first clamping plate 11 and the second clamping plate 18 can be effectively dealt with, thereby ensuring that the textile receives comprehensive and effective physical wave antibacterial treatment.

[0033] The application of a uniformly distributed photonic physical wave antibacterial chamber in photonic physical wave antibacterial applications in textiles.

[0034] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above, and that the invention can be implemented in other specific forms without departing from its spirit or essential characteristics. Therefore, the embodiments should be considered in all respects as exemplary and non-limiting, and the scope of the invention is defined by the appended claims rather than the foregoing description. Thus, all variations falling within the meaning and scope of equivalents of the claims are intended to be included within the present invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

[0035] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. A uniformly distributed photonic physical wave antibacterial chamber, comprising: The container body, and a linear track within the container body, with a support platform slidably mounted within the linear track, and multiple fixed plates evenly distributed on the support platform; characterized in that it further includes: a misaligned clamping mechanism, disposed on the fixed plates, comprising a first clamping plate and a second clamping plate symmetrically arranged; and a lifting guide mechanism, disposed on the support platform and connected to the misaligned clamping mechanism, the lifting guide mechanism being provided with an adjustment component, the adjustment component being able to control the first clamping plate and the second clamping plate to alternately perform clamping and releasing actions when the lifting guide mechanism drives the misaligned clamping mechanism to move; when the first clamping plate completes its clamping action, the second clamping plate performs its releasing action; when the second clamping plate completes its clamping action, the first clamping plate performs its releasing action.

2. The uniformly distributed photonic physical wave antibacterial chamber according to claim 1, characterized in that, The misaligned clamping mechanism includes a first movable rod and a second movable rod that are slidably mounted on the fixed plate and arranged symmetrically. A first limiting ring that abuts against the fixed plate is fixed on the first movable rod and the second movable rod.

3. The uniformly distributed photonic physical wave antibacterial chamber according to claim 2, characterized in that, The misaligned clamping mechanism further includes movable plates fixed to the ends of the first movable rod and the second movable rod, respectively. The movable plates are formed with symmetrically arranged sliding grooves, and sliding blocks are slidably installed in the sliding grooves. The sliding blocks are fixedly connected to the first clamping plate and the second clamping plate.

4. The uniformly distributed photonic physical wave antibacterial chamber according to claim 2, characterized in that, The lifting guide mechanism includes two movable sleeves that slide axially along the first movable rod and the second movable rod, respectively. A second limiting ring that abuts against the movable sleeve is fixed on the first movable rod and the second movable rod. A first limiting post and a second limiting post are fixed on the side walls of the two movable sleeves, respectively. The mechanism also includes a limiting component and a translation component disposed on the support platform for adjusting the position of the movable sleeve through the first limiting post and the second limiting post.

5. The uniformly distributed photonic physical wave antibacterial chamber according to claim 4, characterized in that, The limiting component includes a guide rail fixed to the side wall of the fixed plate, a support plate slidably mounted on the guide rail, and a guide groove formed on the support plate that slidably engages with the first limiting post and the second limiting post.

6. The uniformly distributed photonic physical wave antibacterial chamber according to claim 5, characterized in that, The translation component includes a bidirectional lead screw rotatably mounted on the support platform, and threaded sleeves arranged symmetrically are threadedly connected to the bidirectional lead screw, with the threaded sleeves being fixedly connected to the support plate.

7. The uniformly distributed photonic physical wave antibacterial chamber according to claim 5, characterized in that, The guide groove includes a first straight groove, a first inclined groove, a second straight groove, a second inclined groove, and a third straight groove formed on the support plate, with the ends of the first straight groove, the first inclined groove, the second straight groove, the second inclined groove, and the third straight groove connected to each other in sequence.

8. The uniformly distributed photonic physical wave antibacterial chamber according to claim 4, characterized in that, The adjusting assembly includes springs respectively sleeved on the first movable rod and the second movable rod, with the two ends of the springs abutting against the movable sleeve and the movable plate respectively. A support sleeve is fixed on the sliding block, and a support rod that is fixedly connected to the movable sleeve is slidably installed inside the support sleeve.

9. The uniformly distributed photonic physical wave antibacterial chamber according to claim 1, characterized in that, The support platform is fixed with a handle for pulling the support platform to slide radially along the straight track.

10. The application of a uniformly distributed photonic physical wave antibacterial chamber as described in claim 1 in photonic physical wave antibacterial applications in textiles.

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