Material mixing device for photoresist

Abstract

The invention relates to the technical field of photoresist preparation equipment, and provides a material mixing device for photoresist. The ultrasonic dispersion device comprises a stirring tank, a rotating shaft vertically arranged in the stirring tank, an ultrasonic dispersion unit arranged outside the stirring tank, a sleeve which fixedly sleeves the periphery of the rotating shaft and is provided with a limiting groove with a coplanar side wall and a separation side wall, a stirring paddle which penetrates through the limiting groove and is rotationally connected with the rotating shaft and is provided with filtering holes, and a sliding plate which penetrates through the peripheral wall of the stirring tank in a sliding manner, the stirring paddles can be circumferentially separated or coplanar to form a filter plate along with forward and reverse rotation of the rotating shaft, the sliding plate can be matched with the filter plate to form a material collecting area corresponding to the ultrasonic dispersion unit in the circumferential direction, bulk materials are intercepted by the filter plate and reserved in the material collecting area, and after the ultrasonic dispersion unit is started, ultrasonic energy of the ultrasonic dispersion unit can act on the bulk materials in the material collecting area in a concentrated mode. Concentrated dispersion of partial areas is achieved, and the technical problem that the mixing efficiency is low due to the fact that the ultrasonic action is not concentrated and not thorough is thoroughly solved.

Description

Technical Field

[0001] This invention relates to the field of photoresist preparation equipment technology, specifically to a photoresist mixing device. Background Technology

[0002] In precision electronics fields such as semiconductor manufacturing and display panel production, photoresist, as a key functional material, directly determines the resolution, linewidth accuracy, and development stability of photolithographic patterns through its compositional uniformity. The mixing process is the core step in ensuring the uniformity of photoresist composition. Photoresist raw material systems typically contain resins, photoinitiators, solvents, and functional additives. Some raw materials are prone to forming clumps during storage or premixing. If these clumps cannot be completely dispersed, defects such as pinholes and scratches will appear in the photoresist coating, severely affecting the production yield of downstream devices.

[0003] To address the problem of dispersing clump-like materials, existing photoresist mixing devices typically employ a combined dispersion structure of "stirring" and "ultrasound." This structure mainly includes a sealed stirring chamber, a stirring paddle extending into the chamber, and an ultrasonic dispersion unit for auxiliary dispersion. The ultrasonic dispersion unit, through the cavitation effect generated by high-frequency vibration, can disrupt the intermolecular forces of the clump-like materials, achieving uniform dispersion. It is a key component in existing technologies for improving dispersion performance.

[0004] However, existing ultrasonic dispersion units in mixing devices generally employ a single-side-wall mounting method. This means the ultrasonic transducer is fixed to one side wall of the mixing chamber via a flange or welded structure, with the ultrasonic radiation surface facing inwards. In this mounting method, during mixing, the stirring paddle drives the material within the chamber in a circular motion. Agglomerated materials continuously move with the overall material flow, only briefly receiving ultrasonic stimulation when passing through the radiation area of ​​the ultrasonic dispersion unit. Because ultrasonic radiation has a limited effective radius, a single-side-wall ultrasonic dispersion unit can only cover a localized area of ​​the chamber. Most agglomerated materials struggle to enter the effective radiation area during the mixing cycle, or their residence time within the radiation area is too short, resulting in a lack of concentrated ultrasonic dispersion.

[0005] The aforementioned dispersion defects directly lead to a significant reduction in mixing efficiency: to achieve the preset dispersion effect, the stirring time needs to be extended, which not only increases production energy consumption, but may also cause thermal aging or solvent evaporation of photoresist raw materials due to prolonged stirring, affecting the stability of photoresist performance; in addition, even if the stirring time is extended, it is still difficult to avoid the presence of incompletely dispersed clumps of material in local areas, resulting in large differences in photoresist uniformity between batches, which increases the difficulty of quality control. Summary of the Invention

[0006] To overcome the above-mentioned defects, embodiments of the present invention provide a photoresist mixing device, which solves the technical problem that in the prior art, the ultrasonic dispersion unit of the photoresist stirring device is located on the side wall of the stirring chamber, and the clumps of material move continuously in the chamber with the stirring paddle during stirring, resulting in the ultrasonic dispersion unit not dispersing the clumps of material in a concentrated and incomplete manner, thus leading to low dispersion effect and reduced mixing efficiency.

[0007] According to one aspect, at least one embodiment of the present invention provides a photoresist mixing apparatus, comprising: The mixing tank has a vertically arranged rotating shaft inside and an ultrasonic dispersion unit on the outside; A sleeve is fixedly sleeved on the outer circumference of the rotating shaft, and an installation cavity is formed between the sleeve and the shaft. The peripheral wall of the sleeve is provided with several limiting grooves that communicate with the installation cavity. The circumferential angles of the projection of the limiting grooves increase from top to bottom. Each limiting groove has a coplanar sidewall and a separating sidewall. The coplanar sidewalls of the limiting grooves are coplanar, and the separating sidewalls of the limiting grooves form a stepped structure. Several stirring paddles are rotatably connected to the outer periphery of the rotating shaft, and are respectively set through the limiting groove. Several filter holes are provided on the stirring paddles. A sliding plate slides through the circumferential wall of the mixing tank and is arranged adjacent to the ultrasonic dispersion unit; The sleeve can rotate clockwise with the rotating shaft so that several agitators abut against the separation sidewalls of several limiting grooves, and the several agitators are circumferentially separated; the sleeve can rotate counterclockwise with the rotating shaft so that several agitators abut against the coplanar sidewalls, and the several agitators are coplanar to form a filter plate. The sliding plate can slide into the mixing tank to cooperate with the filter plate to form a collection area that corresponds to the circumference of the ultrasonic dispersion unit.

[0008] For example, in at least one embodiment of the present invention, a photoresist mixing apparatus further includes a tidying component disposed on a mixing tank, the tidying component comprising: The outer shell is fixed to the side wall of the mixing tank and located on the side of the sliding plate away from the ultrasonic dispersion unit. The inner cavity of the outer shell is connected to the interior of the mixing tank. A rotating component is rotatably connected inside the housing and is arranged vertically. The rotating component has a blocking protrusion for blocking the sliding plate. A rotating torsion spring is provided between the rotating component and the housing. The rotating torsion spring is used to provide the torque that drives the rotating component to rotate so that the blocking protrusion releases the sliding plate. Several locking mechanisms are vertically arranged on the rotating part and correspond one-to-one with several stirring paddles. The locking mechanisms are used to lock the circumferential position of the rotating part and the outer shell. The locking mechanisms can be unlocked under the synchronous action of several stirring paddles so that the rotating part can rotate under the action of the rotating torsion spring and release the sliding plate.

[0009] For example, in a photoresist mixing device provided in at least one embodiment of the present invention, a rotating component is provided with a plurality of vertically spaced mounting grooves and a plurality of insertion grooves corresponding to and communicating with the mounting grooves. The insertion grooves are arranged to penetrate the rotating component laterally. The inner peripheral wall of the outer shell is provided with snap-fit ​​grooves corresponding to the insertion grooves one by one. The locking mechanism includes: The trigger rod is rotatably connected to the mounting groove in the middle. One end of the trigger rod has a trigger end that can extend into the mixing tank and a connecting end located in the mounting groove. A guide groove is provided on the connecting end. The trigger end can swing into the mounting groove under the action of the stirring paddle. A reset torsion spring is provided between the trigger rod and the rotating part. The reset torsion spring is used to provide the reset torque for the trigger rod to swing so that the trigger end resets and enters the mixing tank. The plug rod is slidably connected in the plug groove. One end of the plug rod can be engaged in the plug groove to lock the circumferential position of the rotating part and the outer shell. The other end of the plug rod is provided with a guide post that slides and rotates with the guide groove. When the rotating shaft rotates forward, the agitator can actuate the trigger end to reverse the trigger rod, thereby driving the plug rod to slide with the help of the guide post, so that the end of the plug rod slides into the depth of the locking groove, thus keeping the rotating part locked to the outer shell. When the rotating shaft reverses, the agitator can actuate the trigger end, causing the trigger rod to rotate forward. This, in turn, drives the insertion rod to slide with the help of the guide post, allowing the end of the insertion rod to slide out of the locking groove, thereby releasing the locking between the rotating part and the outer casing.

[0010] For example, in a photoresist mixing device provided in at least one embodiment of the present invention, the upper end of the rotating member penetrates the top wall of the outer shell, and a magnetic plate is provided on the outer periphery of the upper end of the rotating member. A first electromagnetic component is provided on the top of the outer shell. The rotating member can rotate under the action of a rotating torsion spring to drive the magnetic plate closer to the first electromagnetic component. The first electromagnetic component can generate a magnetic field that repels the magnetic plate after being energized, so that the rotating component can overcome the restoring force of the rotating torsion spring and rotate in the opposite direction. This causes the end of the plug rod to engage with the locking groove under the restoring action of the trigger rod, thereby locking the circumferential position of the rotating component and the outer shell.

[0011] For example, in a photoresist mixing device provided in at least one embodiment of the present invention, a sliding plate penetrates the side wall of the outer shell and slides with the outer shell, and an elastic element is provided between the sliding plate and the outer shell. The elastic element is used to elastically push the sliding plate so that the sliding plate slides into the mixing tank.

[0012] For example, in a photoresist mixing device provided in at least one embodiment of the present invention, a magnetic attraction part is provided on the side of the sliding plate away from the mixing tank, and a second electromagnetic component is slidably connected to the outer shell; the second electromagnetic component can generate a magnetic field that is attracted to the polarity of the magnetic attraction part after being energized, so as to magnetically attract the magnetic attraction part and drive the sliding plate to slide away from the mixing tank.

[0013] For example, in a photoresist mixing device provided in at least one embodiment of the present invention, the sleeve is provided with two sets of axially spaced limiting grooves, each set of limiting grooves having a plurality of grooves, and the plurality of limiting grooves being distributed at intervals along the axial direction of the sleeve.

[0014] For example, in a photoresist mixing device provided in at least one embodiment of the present invention, guide chamfers are provided on both sides of the opening end of the snap-fit ​​groove, and the guide chamfers are used to guide the end of the plug rod into the snap-fit ​​groove.

[0015] For example, in a photoresist mixing device provided in at least one embodiment of the present invention, both sides of the trigger end are provided with arc-shaped contact surfaces for contacting the stirring paddle, and the arc-shaped contact surfaces have the same radius of curvature as the inner peripheral wall of the stirring tank.

[0016] For example, in a photoresist mixing apparatus provided in at least one embodiment of the present invention, the top of the mixing tank is provided with an inlet, the bottom of the mixing tank is provided with an outlet, and a guide plate extending downwardly to guide the material is fixed below the inlet.

[0017] The beneficial effects of the embodiments of the present invention are as follows: In this invention, when the rotating shaft reverses, the sleeve reverses synchronously with the rotating shaft. After the stirring paddle forms a filter plate, it drives the sliding plate to slide, causing the sliding plate to extend into the mixing tank. The sliding plate and the filter plate enclose a material collection area in the mixing tank. The circumferential position of this material collection area corresponds to the ultrasonic dispersion unit, that is, the radiation surface of the ultrasonic dispersion unit is directly facing the material collection area. The clumps of material are intercepted by the filter plate and retained in the material collection area. After the ultrasonic dispersion unit is activated, its ultrasonic energy can be concentrated on the clumps of material in the material collection area to achieve "targeted dispersion" and completely solve the problem of low efficiency caused by the non-concentrated and incomplete ultrasonic action. Attached Figure Description

[0018] To more clearly illustrate the technical solutions in the embodiments of the present invention, the accompanying drawings used in the description of the embodiments of the present invention will be briefly introduced below. Obviously, the drawings described below are merely some exemplary embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on the content of the exemplary embodiments of the present invention and these drawings without any creative effort.

[0019] Figure 1 This is a schematic diagram of the stirring state of a photoresist mixing device in one embodiment of the present invention; Figure 2 for Figure 1 A top-cross view of the mixing device in the stirring state in the embodiment; Figure 3 for Figure 2 Enlarged view of point A in the middle; Figure 4 for Figure 1 A schematic diagram of the rotating shaft, sleeve, and stirring paddle in the stirring state in the embodiment; Figure 5 for Figure 2 Enlarged view at point B in the middle; Figure 6 for Figure 1 Enlarged view at point C; Figure 7 for Figure 1 A cross-sectional internal structure diagram of the mixing device collecting clumps of material in the embodiment; Figure 8 for Figure 1 A top-cross view of the mixing device collecting aggregated materials in the embodiment; Figure 9 for Figure 8 Enlarged view at point D; Figure 10 for Figure 1 A schematic diagram of the structure of the rotating shaft, sleeve, and stirring paddle in the embodiment for collecting clump-shaped materials; Figure 11 for Figure 1 The embodiment shows another perspective structural diagram of the rotating shaft, sleeve, and stirring paddle collecting the clump of material.

[0020] In the diagram: 1. Mixing tank; 2. Ultrasonic dispersion unit; 3. Rotating shaft; 4. Sleeve; 31. Mounting cavity; 41. Limiting groove; 411. Coplanar sidewall; 412. Separation sidewall; 5. Stirring paddle; 51. Filter plate; 6. Sliding plate; 61. Collection area; 7. Outer shell; 8. Rotating component; 84. Blocking protrusion; 9. Locking mechanism; 81. Mounting groove; 82. Insertion groove; 71. Snap-fit ​​groove; 91. Trigger rod; 911. Guide groove; 92. Insertion rod; 921. Guide post; 83. Magnetic plate; 10. First electromagnetic component; 62. Elastic component; 63. Magnetic suction part; 11. Second electromagnetic component; 711. Guide chamfer; 912. Arc-shaped contact surface; 101. Inlet; 102. Outlet; 12. Guide plate. Detailed Implementation

[0021] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and not intended to limit it.

[0022] To keep the drawings concise, each drawing only schematically shows the parts relevant to the disclosure; these do not represent the actual structure of the product. Furthermore, for ease of understanding, in some drawings, only one of components with the same structure or function is schematically shown, or only one is labeled. In this document, "one" not only means "only one," but can also mean "more than one," and "several" includes "two" and "more than two."

[0023] In this document, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to fixed connections, detachable connections, or integral connections; they can refer to mechanical connections or electrical connections; they can refer to direct connections or indirect connections through an intermediate medium; and they can refer to the internal communication between two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0024] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0025] In the description of this embodiment, terms such as "upper," "lower," "left," and "right" are based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of description and simplification of operation, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the present invention.

[0026] Furthermore, in the description of this application, the terms "first," "second," etc., are used only to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0027] In precision electronics fields such as semiconductor manufacturing and display panel production, photoresist is a key functional material for pattern transfer. Its compositional uniformity directly determines the resolution, linewidth accuracy, and development stability of the photolithographic pattern. If incompletely dispersed clumps of material exist in the photoresist, defects such as pinholes and scratches will appear in the coating, severely reducing the production yield of downstream devices. The mixing process, as a core step in ensuring the uniformity of photoresist composition, requires thorough mixing of resin, photoinitiator, solvent, and functional additives. In particular, it is crucial to address the dispersion of clumps of material formed during storage or premixing.

[0028] Existing photoresist mixing devices mostly employ a composite dispersion structure combining stirring and ultrasound. This typically includes a sealed stirring chamber, a fixed stirring paddle extending into the chamber, and an ultrasonic dispersion unit mounted on one side wall. The ultrasonic dispersion unit uses the cavitation effect generated by high-frequency vibration to disrupt the intermolecular forces of clump-like materials. However, the single-side-wall mounting method has significant drawbacks: when the stirring paddle moves the material in a circular motion, the clumps can only briefly flow through the ultrasonic radiation area, and the effective radius of the ultrasound is limited. Most clumps fail to enter the radiation area or have too short a residence time, resulting in a lack of concentration of ultrasonic dispersion. This necessitates extending the stirring time to ensure dispersion effectiveness. This not only increases energy consumption but may also cause thermal aging of the photoresist raw material or solvent evaporation due to prolonged stirring, affecting performance stability. Furthermore, significant batch-to-batch uniformity differences increase the difficulty of quality control.

[0029] The photoresist mixing device in this embodiment is centered around a mixing tank 1. The overall structure includes a mixing tank 1, a rotating shaft 3, an ultrasonic dispersion unit 2, a sleeve 4, a stirring paddle 5, and a sliding plate 6, with the following connection relationships: like Figure 1 , Figure 7 As shown, the mixing tank 1 is a closed cavity with an inlet 101 at the top and an outlet 102 at the bottom, serving as the core space for material mixing. A guide plate 12 is fixed below the inlet 101 at the top. The guide plate 12 extends downward at an angle away from the inlet 101 to guide the raw materials to fall smoothly into the tank and to allow the materials to slide down the tank wall, preventing material splashing when entering the mixing tank 1. A valve can be installed at the outlet 102 at the bottom to control the discharge of photoresist after mixing.

[0030] The rotating shaft 3 is vertically installed inside the mixing tank 1. Its two ends are rotatably engaged with the top and bottom walls of the mixing tank 1, respectively. Its upper end extends out of the mixing tank 1 and is connected to an external drive mechanism (such as a motor). It can rotate forward or backward around its own axis under external drive to provide power for mixing.

[0031] The ultrasonic dispersion unit 2 is fixed to the outer side wall of the mixing tank 1, with its radiating surface facing the inside of the mixing tank 1. It is used to apply ultrasonic energy to the material in the tank through high-frequency vibration, thereby breaking the intermolecular forces of the agglomerated material and achieving dispersion. The installation position of the ultrasonic dispersion unit 2 corresponds to the circumferential position of the subsequently formed collection area 61 to ensure that the ultrasonic energy is concentrated on the agglomerated material.

[0032] like Figure 3 , Figure 4 , Figure 10 , Figure 11 As shown, the sleeve 4 is fixedly fitted onto the outer circumference of the rotating shaft 3, forming an annular mounting cavity 31 between the sleeve 4 and the rotating shaft 3. This mounting cavity 31 provides space for the rotation of the stirring paddle 5 and restricts the radial displacement of the stirring paddle 5. Several limiting grooves 41 are formed on the peripheral wall of the sleeve 4. Each limiting groove 41 passes through the sleeve 4 radially and communicates with the mounting cavity 31. The circumferential angles of the projections of the limiting grooves 41 on the horizontal plane increase sequentially from top to bottom. Each limiting groove 41 has a coplanar sidewall 411 and a separating sidewall 412. The coplanar sidewalls 411 of all limiting grooves 41 are in the same plane, and the separating sidewalls 412 of all limiting grooves 41 are staggered sequentially along the circumference of the sleeve 4, forming a stepped structure.

[0033] The number of stirring paddles 5 corresponds one-to-one with the limiting grooves 41. One end of each stirring paddle 5 is rotatably connected to the outer periphery of the rotating shaft 3 through a bushing structure, and this end is located inside the mounting cavity 31. The other end of the stirring paddle 5 passes through the corresponding limiting groove 41 and extends to the outside of the sleeve 4. It can move synchronously with the rotation of the rotating shaft 3 and can scrape the inner wall of the mixing tank 1. Several filter holes are opened on the plate surface of the stirring paddle 5.

[0034] like Figure 1 , Figure 8 As shown, the sliding plate 6 slides through the peripheral wall of the mixing tank 1, and the installation position of the sliding plate 6 is adjacent to the ultrasonic dispersion unit 2. The sliding plate 6 can slide down under the drive of external force, extending into the mixing tank 1 or exiting the mixing tank 1.

[0035] This device achieves an integrated process of stirring and dispersing, intercepting lumpy materials, and centralized ultrasonic treatment through the cooperative structure of the stirring paddle 5 and the sleeve 4, the material collection structure of the sliding plate 6 and the filter plate 51, the side wall of the limiting groove 41, and the filter holes of the stirring paddle 5. The specific working process is as follows: The sleeve 4 rotates synchronously with the rotating shaft 3, and through the contact between different side walls of the limiting groove 41 and the stirring paddle 5, it drives the stirring paddle 5 to switch between two states: circumferential separation and coplanar merging. like Figure 1 , Figure 2 , Figure 4As shown, when the rotating shaft 3 rotates clockwise, the sleeve 4 rotates synchronously with the rotating shaft 3. The separation sidewall 412 of the limiting groove 41 rotates with the sleeve 4 and contacts the sidewall of the stirring paddle 5. Since the separation sidewall 412 is distributed in a stepped shape and the circumferential angle of the projection of the limiting groove 41 increases from top to bottom, the separation sidewall 412 generates a thrust on the stirring paddle 5, causing each stirring paddle 5 to swing around the connection point with the rotating shaft 3 until it completely abuts against the separation sidewall 412 of the corresponding limiting groove 41. At this time, several stirring paddles 5 are evenly separated along the circumference of the sleeve 4 and rotate synchronously with the rotating shaft 3 to thoroughly stir the material in the mixing tank 1. The material can generate bidirectional flow through the stirring paddle 5, reducing the stirring dead zone and realizing the dispersion of the material.

[0036] like Figure 7 , Figure 8 , Figure 10 , Figure 11 As shown, when the rotating shaft 3 reverses, the sleeve 4 reverses synchronously with the rotating shaft 3. The coplanar sidewall 411 of the limiting groove 41 rotates with the sleeve 4 and comes into contact with the stirring paddle 5. Since all the coplanar sidewalls 411 are on the same plane, the coplanar sidewalls 411 generate a thrust on the stirring paddle 5, causing each stirring paddle 5 to swing around the connection point until the sidewalls of all the stirring paddles 5 abut against the coplanar sidewalls 411. At this time, several stirring paddles 5 are on the same vertical plane, forming a complete filter plate 51. The area of ​​the filter plate 51 covers most of the outer periphery of the sleeve 4, which can intercept clumps of material in the material.

[0037] After the agitator 5 forms the filter plate 51, it drives the sliding plate 6 to slide, causing the sliding plate 6 to extend into the mixing tank 1. The sliding plate 6 and the filter plate 51 enclose a material collection area 61 within the mixing tank 1. The circumferential position of this material collection area 61 corresponds to that of the ultrasonic dispersion unit 2, that is, the radiation surface of the ultrasonic dispersion unit 2 faces the material collection area 61. Figure 7 , Figure 8 As shown, the clump-like material is intercepted by the filter plate 51 and retained in the collection area 61. After the ultrasonic dispersion unit 2 is activated, its ultrasonic energy can be concentrated on the clump-like material in the collection area 61 to achieve "targeted dispersion" and completely solve the defects of non-concentrated and incomplete ultrasonic action.

[0038] like Figure 4 , Figure 11 As shown, the coplanar sidewalls 411 of the limiting groove 41 are coplanarly arranged to ensure that when the rotating shaft 3 reverses, all the stirring paddles 5 can swing synchronously to the same plane, avoiding gaps in the filter plate 51 due to sidewall misalignment, thereby preventing clumps of material from leaking out of the gaps; the separating sidewall 412 forms a stepped structure and the projected circumferential angle increases from top to bottom, so that the stirring paddles 5 at different heights form different circumferential expansion angles when rotating forward, with the expansion angle of the lower stirring paddle 5 being greater than that of the upper stirring paddle 5.

[0039] To prevent the sliding plate 6 from accidentally extending into the mixing tank 1 before the agitator 5 forms a complete filter plate 51, this device is equipped with neat components on the mixing tank 1, such as... Figure 1 , Figure 2 , Figure 6 As shown. The neat assembly includes a housing 7, a rotating component 8, and several locking mechanisms 9: The outer shell 7 is fixed to the side wall of the mixing tank 1 and is located on the side of the sliding plate 6 away from the ultrasonic dispersion unit 2. The outer shell 7 is a hollow cavity structure, and its side wall near the mixing tank 1 is connected to the side wall of the mixing tank 1, so that the inner cavity of the outer shell 7 and the interior of the mixing tank 1 form a communication space, providing installation and movement space for the rotating part 8 and the locking mechanism 9.

[0040] The rotating component 8 is vertically disposed within the inner cavity of the outer shell 7. Its upper and lower ends are respectively connected to the top and bottom walls of the outer shell 7 via bearings, allowing it to rotate freely around its own axis. An integrally formed blocking protrusion 84 is formed on the outer peripheral wall of the rotating component 8. The position of the blocking protrusion 84 corresponds to that of the sliding plate 6. When the rotating component 8 is in its initial position, the side wall of the blocking protrusion 84 is in contact with the sliding plate 6, restricting the sliding plate 6 from sliding into the mixing tank 1. A rotating torsion spring is connected between the rotating component 8 and the inner wall of the outer shell 7. One end of the rotating torsion spring is fixed to the inner wall of the outer shell 7, and the other end is fixed to the outer peripheral wall of the rotating component 8. In its initial state, the rotating torsion spring is in a torsional storage state, and its torsion direction is to drive the rotating component 8 to rotate, so that the blocking protrusion 84 moves away from the sliding plate 6, thereby releasing the sliding of the sliding plate 6.

[0041] The number of locking mechanisms 9 corresponds one-to-one with the stirring paddles 5, and they are evenly spaced along the axial direction of the rotating part 8. The locking mechanism 9 is used to lock the circumferential position of the rotating part 8 and the outer shell 7 in the initial state to prevent the rotating part 8 from rotating on its own under the torque of the rotating torsion spring. Only when all the stirring paddles 5 rotate in the opposite direction at the same time (i.e., form the filter plate 51) and pass through all the locking mechanisms 9 at the same time can all the locking mechanisms 9 be unlocked at the same time, so that the rotating part 8 can rotate under the torque of the rotating torsion spring and release the sliding plate 6.

[0042] The working process of the tidying component is as follows: In the initial stirring state, the locking mechanism 9 is locked, the rotating part 8 cannot rotate, and the blocking protrusion 84 restricts the sliding plate 6 from sliding; when the rotating shaft 3 reverses and the stirring paddle 5 swings synchronously to the coplanar position, the stirring paddle 5 contacts the locking mechanism 9 and triggers unlocking. The rotating part 8 rotates under the torque of the rotating torsion spring, and the blocking protrusion 84 rotates with the rotating part 8 and disengages from the sliding plate 6. The restriction of the sliding plate 6 is released, and it can freely extend into the stirring tank 1.

[0043] To ensure that the locking mechanism 9 can operate synchronously with the agitator 5, the locking mechanism 9 adopts a transmission structure in which the trigger rod 91 and the plug rod 92 cooperate, such as... Figure 3 , Figure 5 , Figure 9As shown. The rotating part 8 has several vertically spaced mounting slots 81; each mounting slot 81 is connected to a corresponding insertion slot 82, which penetrates the side wall of the rotating part 8 laterally; the inner peripheral wall of the outer shell 7 has a snap-fit ​​slot 71 that corresponds one-to-one with the insertion slot 82, the opening of the snap-fit ​​slot 71 faces the insertion slot 82, and the depth of the snap-fit ​​slot 71 is greater than the length of the insertion rod 92.

[0044] The middle part of the trigger rod 91 is rotatably connected to the mounting groove 81 via a pin, allowing it to swing around the pin within the mounting groove 81. One end of the trigger rod 91 is the trigger end, which extends out of the mounting groove 81 and into the mixing tank 1, where it can contact the stirring paddle 5. The other end of the trigger rod 91 is the connecting end, located within the mounting groove 81, and has a guide groove 911, which is an oblong hole. A return torsion spring connects the trigger rod 91 and the rotating component 8. One end of the return torsion spring is fixed to the connecting end of the trigger rod 91, and the other end is fixed to the inner wall of the mounting groove 81. In its initial state, the return torsion spring is in its natural state, and its torque direction is to drive the trigger rod 91 to swing, keeping the trigger end extended out of the mounting groove 81 and into the mixing tank 1.

[0045] The plug rod 92 is slidably connected in the plug groove 82 and can slide back and forth along the plug groove 82; one end of the plug rod 92 extends out of the plug groove 82 and is engaged in the engagement groove 71 of the outer shell 7. Through the cooperation between the plug rod 92 and the engagement groove 71, the circumferential position of the rotating part 8 and the outer shell 7 is locked; the other end of the plug rod 92 is integrally formed with a guide post 921, which is inserted into the guide groove 911 of the trigger rod 91. The guide post 921 and the guide groove 911 are in sliding and rotating cooperation, that is, the guide post 921 can slide along the length of the groove in the guide groove 911.

[0046] When the rotating shaft 3 rotates clockwise, the stirring paddle 5 rotates with the rotating shaft 3 and contacts the trigger end of the trigger rod 91, pushing the trigger end to swing into the mounting groove 81. The trigger rod 91 rotates counterclockwise around the central pin. The guide slide 911 moves with the trigger rod 91, and its inner wall generates a thrust on the guide post 921 towards the snap-fit ​​groove 71, causing the plug rod 92 to slide into the snap-fit ​​groove 71. The end of the plug rod 92 can slide into the depth of the snap-fit ​​groove 71. At this time, the circumferential position of the rotating part 8 and the outer shell 7 is still locked, and the rotating part 8 cannot rotate. The blocking protrusion 84 maintains the restriction on the sliding plate 6.

[0047] When the rotating shaft 3 reverses, the stirring paddle 5 rotates in the opposite direction with the rotating shaft 3, contacts the trigger end again and pushes the trigger end to swing into the mounting groove 81, and the trigger rod 91 rotates clockwise around the central pin; the guide slide 911 moves with the swing of the trigger rod 91, and its inner wall generates a pulling force on the guide post 921 away from the locking groove 71, which drives the plug rod 92 to slide away from the locking groove 71 until the end of the plug rod 92 completely slides out of the locking groove 71. At this time, the locking between the rotating part 8 and the outer shell 7 is released, and the rotating part 8 rotates under the torque of the rotating torsion spring, releasing the sliding plate 6.

[0048] By utilizing the cooperation between the trigger rod 91 and the plug rod 92, the locking mechanism 9 ensures that the circumferential locking state between the rotating part 8 and the outer shell 7 is not affected when the rotating shaft 3 drives several stirring rods to rotate forward. At the same time, it ensures that the triggering part of the trigger rod 91 can always swing into the mixing tank 1 under the action of the reset torsion spring. When the rotating shaft 3 drives the stirring paddle 5 to rotate in reverse, the locking mechanism 9 can release the lock between the rotating part 8 and the outer shell 7. Only when all the stirring paddles 5 can be vertically aligned to form the filter plate 51 can all the locking mechanisms 9 be triggered simultaneously, so that the rotating part 8 can rotate under the action of the rotating torsion spring to release the sliding of the sliding plate 6.

[0049] To reset the rotating component 8 and relock the sliding plate 6 after ultrasonic treatment, this device has a magnetic plate 83 at the upper end of the rotating component 8 and a first electromagnetic component 10 at the top of the outer casing 7. Figure 6 As shown. The upper end of the rotating part 8 extends vertically upward through the top wall of the outer shell 7, and the rotating part 8 and the top wall of the outer shell 7 are rotated together by a bearing; a magnetic plate 83 is fixed on the outer peripheral wall of the upper end of the rotating part 8, and the magnetic plate 83 has a fixed polarity (such as N pole).

[0050] The top end face of the outer casing 7 is fixed with a first electromagnetic component 10 by bolts. The position of the first electromagnetic component 10 corresponds to the position of the magnetic plate 83. The first electromagnetic component 10 can be controlled to be powered on and off by an external circuit. When the first electromagnetic component 10 is powered on, it can generate a magnetic field that is repulsive to the polarity of the magnetic plate 83 (e.g., the side of the first electromagnetic component 10 closest to the magnetic plate 83 is the N pole). When the first electromagnetic component 10 is de-powered, the magnetic field disappears.

[0051] The working process is as follows: After ultrasonic treatment, the sliding plate 6 slides out of the mixing tank 1. When the sliding plate 6 needs to be locked again, the first electromagnetic component 10 is energized. The first electromagnetic component 10 generates a magnetic field that repels the magnetic plate 83. The magnetic field force pushes the magnetic plate 83 to drive the rotating component 8 to rotate in the opposite direction around its own axis. During the rotation of the rotating component 8, it overcomes the torque of the rotating torsion spring. At the same time, the trigger rod 91 swings back to its original position under the torque of the reset torsion spring. It drives the plug rod 92 to slide towards the locking groove 71 through the guide post 921 until the end of the plug rod 92 is re-locked into the locking groove 71 as the rotating component 8 rotates. The circumferential position of the rotating component 8 and the outer shell 7 is locked again. The blocking protrusion 84 is reset as the rotating component 8 rotates and re-fits the sliding plate 6, restricting the sliding of the sliding plate 6. Then the power supply of the first electromagnetic component 10 is disconnected, the magnetic field disappears, and the rotating component 8 maintains its initial position under the action of the locking mechanism 9, waiting for the next round of mixing.

[0052] To ensure smooth rotation of the rotating component 8, both the upper and lower ends of the rotating component 8 can extend out of the outer shell 7, and each end can be equipped with a corresponding magnetic plate 83 and a first electromagnetic component 10. The smooth rotation of the rotating component 8 can be achieved by the synchronous magnetic repulsion between the upper and lower ends.

[0053] To achieve automatic insertion and withdrawal of the sliding plate 6, an elastic element 62 disposed between the housing 7 and the sliding plate 6 provides the insertion force, and a second electromagnetic element 11 provides the withdrawal force. Figure 6 , Figure 9 As shown. The end of the sliding plate 6 away from the mixing tank 1 slides inside the outer shell 7, and a smooth sliding connection is achieved through the form of guide holes and guide posts. The elastic element 62, which is set between the outer shell 7 and the sliding plate 6, is sleeved on the guide post. The elastic element 62 is in a compressed state in the initial state, and its elastic force is directed to push the sliding plate 6 into the mixing tank 1.

[0054] A magnetic suction part 63 is installed on the side wall of the sliding plate 6 away from the mixing tank 1. The magnetic suction part 63 is a block structure made of magnetic material. A second electromagnetic component 11 is provided on the outer side wall of the outer shell 7. The sliding direction of the second electromagnetic component 11 is the same as the sliding direction of the sliding plate 6, and the position of the second electromagnetic component 11 corresponds to the magnetic suction part 63. A driving mechanism that can drive the second electromagnetic component 11 to slide is also provided on the side wall of the outer shell 7. This driving mechanism can be a rotating motor on the outer shell 7 that drives the lead screw to rotate. The lead screw is threadedly connected to the second electromagnetic component 11. At the same time, a guide rod that assists the sliding of the second electromagnetic component 11 is provided on the outer shell 7. When the second electromagnetic component 11 is energized, it can generate a magnetic field that attracts the polarity of the magnetic suction part 63 (e.g., the side of the magnetic suction part 63 near the second electromagnetic component 11 is the S pole, and the side of the second electromagnetic component 11 near the magnetic suction part 63 is the N pole). When the second electromagnetic component 11 is de-energized, the magnetic field disappears.

[0055] When the rotating part 8 is unlocked and the blocking protrusion 84 releases the sliding plate 6, if the second electromagnetic part 11 is in a de-energized state, the elastic part 62 releases the compression force, pushing the sliding plate 6 to slide into the mixing tank 1 until the sliding plate 6 and the filter plate 51 cooperate to form the material collection area 61.

[0056] When the sliding plate 6 needs to retract, the second electromagnetic component 11 is energized. The second electromagnetic component 11 generates a magnetic field that attracts the magnetic attraction part 63. The magnetic force causes the sliding plate 6 to slide along with the second electromagnetic component 11. Driven by the rotation of the lead screw, the second electromagnetic component 11 pulls the magnetic attraction part 63, causing the sliding plate 6 to slide away from the mixing tank 1. During the sliding process, the sliding plate 6 compresses the elastic component 62 until the sliding plate 6 completely retracts from the mixing tank 1. After the sliding plate 6 retracts from the mixing tank 1, the first electromagnetic component 10 is energized, causing the rotating component 8 to reverse. The locking mechanism 9 locks the position between the rotating component 8 and the outer shell 7, thereby restricting the sliding of the sliding component. After the second electromagnetic component 11 completes the reset sliding of the sliding plate 6, it can be de-energized and slide in the opposite direction to approach the mixing tank 1 to reset itself.

[0057] It should be noted that in this embodiment, the sleeve 4 is provided with two sets of axially spaced limiting grooves 41, and the corresponding stirring paddles 5 and locking mechanisms 9 are also divided into two sets. The number of stirring paddles 5 and locking mechanisms 9 corresponds one-to-one with the number of limiting grooves 41. Alternatively, three or more sets of axially spaced limiting grooves 41 can be set according to the height of the mixing tank 1. By setting multiple sets of stirring paddles 5, the stirring effect can be more uniform, and the number can be increased as the height of the mixing tank increases.

[0058] To prevent the insertion rod 92 from failing to align with the locking slot 71 due to a deviation in the reset angle of the rotating component 8, this device features a guide chamfer 711 at the open end of the locking slot 71. Figure 5 , Figure 9 As shown. Both sides of the opening end of the snap-fit ​​groove 71 are machined with guide chamfers 711. The guide chamfers 711 are inclined outward along the depth direction of the snap-fit ​​groove 71 to form a funnel-shaped guide structure. The inclination angle of the guide chamfers 711 is adapted to the sliding direction of the plug rod 92. That is, when the plug rod 92 slides into the snap-fit ​​groove 71, its end can first contact the inclined surface of the guide chamfers 711 and slide into the snap-fit ​​groove 71 along the inclined surface.

[0059] When the rotating part 8 rotates in the opposite direction under the push of the first electromagnetic part 10, the plug rod 92 slides into the locking groove 71 under the drive of the trigger rod 91; the end of the plug rod 92 will first contact the inclined surface of the guide chamfer 711, and the lateral force generated by the inclined surface will push the plug rod 92 or the rotating part 8 to fine adjust the position, ensuring that the plug rod 92 can slide smoothly into the locking groove 71, and improving the reliability of the locking mechanism 9 reset.

[0060] Furthermore, to prevent jamming or localized wear when the stirring paddle 5 contacts the trigger rod 91, this device provides an arc-shaped abutment surface 912 at the trigger end of the trigger rod 91, such as... Figure 5 , Figure 9 As shown. Both sides of the trigger end are arc-shaped contact surfaces 912, and the radius of curvature of the arc-shaped contact surface 912 is the same as the radius of curvature of the inner peripheral wall of the mixing tank 1. The center of the arc-shaped contact surface 912 coincides with the center of the mixing tank 1, so that the arc-shaped contact surface 912 and the inner peripheral wall of the mixing tank 1 are distributed in concentric arcs.

[0061] When the stirring paddle 5 rotates around the center of the mixing tank 1 with the rotating shaft 3, the edge of the stirring paddle 5 and the arc-shaped contact surface 912 of the trigger end form a smooth transition contact, which avoids deformation or wear of the stirring paddle 5 or the trigger end due to excessive local force; at the same time, it makes the thrust of the stirring paddle 5 on the trigger end more uniform, ensuring that the trigger rod 91 swings smoothly, avoiding slippage and jamming of the plug rod 92 due to uneven force, and improving the stability of the locking mechanism 9.

[0062] To prevent the raw materials from directly impacting the moving parts such as the stirring paddle 5 and the sleeve 4 when they are fed into the inlet 101, this device is equipped with a guide plate 12 below the inlet 101. Figure 1 , Figure 7 As shown. The guide plate 12 is fixed to the inner top wall of the mixing tank 1 by bolts and is located directly below the feed inlet 101. The guide plate 12 extends downward at an angle away from the feed inlet 101, with its lower end close to the inner wall of the mixing tank 1. The width of the guide plate 12 is adapted to the width of the feed inlet 101. The inclination angle of the guide plate 12 is preferably such that the raw material can slide down the plate surface slowly, usually set to 30°~60°.

[0063] When adding photoresist raw materials into the mixing tank 1, after the raw materials are put into the inlet 101, they will first fall onto the surface of the guide plate 12 and slowly slide down along the inclined surface of the guide plate 12. After the raw materials slide out from the lower end of the guide plate 12, they will fall into the material in the tank along the inner wall of the mixing tank 1, rather than directly impacting the stirring paddle 5, sleeve 4 or rotating shaft 3. This not only protects the moving parts and avoids positional displacement or damage caused by impact, but also reduces the adhesion of raw materials on the top inner wall of the mixing tank 1, reduces raw material waste, and ensures the accuracy of the photoresist raw material ratio.

[0064] The complete workflow of the photoresist mixing apparatus described in this embodiment is as follows: Preliminary stirring and dispersion stage: Start the external drive mechanism to drive the rotating shaft 3 to rotate forward; the sleeve 4 rotates synchronously with the rotating shaft 3, and the separation side wall 412 of the limiting groove 41 pushes the stirring paddle 5 to swing until several stirring paddles 5 achieve circumferential separation; the stirring paddle 5 rotates with the rotating shaft 3 to stir the raw materials in the tank.

[0065] In the stage of lumpy material collection: the rotation direction of the rotating shaft 3 is switched to reverse; the sleeve 4 rotates synchronously with the rotating shaft 3, and the coplanar sidewall 411 of the limiting groove 41 pushes the stirring paddle 5 to swing inward until all the stirring paddles 5 are coplanar to form the filter plate 51; when the stirring paddle 5 rotates in the reverse direction, it pushes the trigger end, causing the plug rod 92 to slide out of the locking groove 71, and the rotating part 8 is locked out; the rotating part 8 rotates under the action of the rotating torsion spring, blocking the protrusion 84 away from and releasing the sliding plate 6, the elastic part 62 releases the elastic force, pushing the sliding plate 6 into the mixing tank 1, and cooperating with the filter plate 51 to form the collection area 61; the fine particles in the material flow out through the filter holes of the filter plate 51, and the lumpy material is intercepted in the collection area 61.

[0066] Concentrated ultrasonic dispersion stage: Ultrasonic dispersion unit 2 is activated, and ultrasonic energy is concentrated on the clumps of material in the aggregate area 61 to destroy the intermolecular forces and achieve thorough dispersion; after ultrasonic treatment is completed, ultrasonic dispersion unit 2 is turned off.

[0067] Reset and discharge stage: Powering on the second electromagnetic component 11 causes the magnetic attraction part 63 to drive the sliding plate 6 out of the mixing tank 1; powering on the first electromagnetic component 10 pushes the rotating component 8 to rotate in the opposite direction to reset, and the plug rod 92 re-engages into the locking groove 71, blocking the protrusion 84 to restrict the sliding plate 6; switching the rotating shaft 3 to rotate forward causes the stirring paddle 5 to separate circumferentially again, and the dispersed material is stirred a second time to ensure overall uniformity; opening the discharge port 102 valve at the bottom of the mixing tank 1 allows the uniformly mixed photoresist to be discharged from the discharge port 102; after discharge, the drive mechanism and all electromagnetic components are turned off, and the device returns to its initial state, waiting for the next operation.

[0068] It should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and are not intended to limit it. Although the present invention has been described in detail with reference to preferred embodiments, those skilled in the art should understand that modifications or equivalent substitutions can be made to the technical solutions of the present invention without departing from the spirit and scope of the technical solutions of the present invention, and all such modifications or substitutions should be covered within the scope of the claims of the present invention.

Claims

1. A mixing device for photoresist, characterized in that, include: The mixing tank (1) has a vertically arranged rotating shaft (3) inside and an ultrasonic dispersion unit (2) outside. A sleeve (4) is fixedly sleeved on the outer periphery of the rotating shaft (3) and forms an installation cavity (31) between the sleeve (4) and the sleeve (4). The sleeve (4) has a plurality of limiting grooves (41) communicating with the installation cavity (31) on its peripheral wall. The circumferential angles of the projections of the plurality of limiting grooves (41) increase from top to bottom. Each limiting groove (41) has a coplanar sidewall (411) and a separating sidewall (412). The coplanar sidewalls (411) of the plurality of limiting grooves (41) are coplanarly arranged, and the separating sidewalls (412) of the plurality of limiting grooves (41) form a stepped structure. Several stirring paddles (5) are rotatably connected to the outer periphery of the rotating shaft (3) and are respectively arranged through the limiting groove (41). Several filter holes are provided on the stirring paddles (5). The sliding plate (6) slides through the peripheral wall of the mixing tank (1) and is arranged adjacent to the ultrasonic dispersion unit (2); The sleeve (4) can rotate clockwise with the rotating shaft (3) so that the plurality of stirring paddles (5) respectively abut against the separation sidewalls (412) of the plurality of limiting grooves (41) and so that the plurality of stirring paddles (5) are circumferentially separated; the sleeve (4) can rotate counterclockwise with the rotating shaft (3) so that the plurality of stirring paddles (5) abut against the coplanar sidewalls (411) and so that the plurality of stirring paddles (5) are coplanar to form a filter plate (51). The sliding plate (6) can slide into the mixing tank (1) to cooperate with the filter plate (51) to form a collection area (61) that corresponds to the circumferential direction of the ultrasonic dispersion unit (2).

2. The photoresist mixing apparatus according to claim 1, characterized in that, It also includes a tidying assembly disposed on the mixing tank (1), the tidying assembly comprising: The outer shell (7) is fixed to the side wall of the mixing tank (1) and located on the side of the sliding plate (6) away from the ultrasonic dispersion unit (2). The inner cavity of the outer shell (7) is connected to the interior of the mixing tank (1). A rotating component (8) is rotatably connected inside the housing (7) and arranged vertically. The rotating component (8) has a blocking protrusion (84) for blocking the sliding plate (6). A rotating torsion spring is provided between the rotating component (8) and the housing (7). The rotating torsion spring is used to provide a torque to drive the rotating component (8) to rotate so that the blocking protrusion (84) releases the sliding plate (6). A number of locking mechanisms (9) are vertically arranged on the rotating member (8) and are arranged in a one-to-one correspondence with the number of stirring paddles (5). The locking mechanisms (9) are used to lock the circumferential position of the rotating member (8) and the outer shell (7). The locking mechanisms (9) can be unlocked under the synchronous action of the number of stirring paddles (5) so that the rotating member (8) rotates under the action of the rotating torsion spring and releases the sliding plate (6).

3. The photoresist mixing apparatus according to claim 2, characterized in that, The rotating component (8) is provided with several vertically spaced mounting slots (81) and several corresponding insertion slots (82) communicating with the mounting slots (81). The insertion slots (82) are arranged to pass through the rotating component (8) laterally. The inner peripheral wall of the outer shell (7) is provided with snap-fit ​​slots (71) that correspond one-to-one with the insertion slots (82). The locking mechanism (9) includes: A trigger rod (91) is rotatably connected in the middle of the mounting groove (81). One end of the trigger rod (91) has a trigger end that can extend into the mixing tank (1) and a connecting end located in the mounting groove (81). A guide groove (911) is provided on the connecting end. The trigger end can swing into the mounting groove (81) under the agitation of the stirring paddle (5). A reset torsion spring is provided between the trigger rod (91) and the rotating part (8). The reset torsion spring is used to provide the reset torque for the trigger rod (91) to swing so that the trigger end resets and enters the mixing tank (1). The plug rod (92) is slidably connected in the plug groove (82). One end of the plug rod (92) can be engaged in the locking groove (71) to lock the circumferential position of the rotating part (8) and the outer shell (7). The other end of the plug rod (92) is provided with a guide post (921) that slides and rotates with the guide groove (911). When the rotating shaft (3) rotates forward, the stirring paddle (5) can move the trigger end to reverse the trigger rod (91), so as to drive the plug rod (92) to slide by means of the guide post (921), so that the end of the plug rod (92) slides into the depth of the snap groove (71), thereby maintaining the locking of the rotating part (8) and the outer shell (7); When the rotating shaft (3) reverses, the stirring paddle (5) can move the trigger end to make the trigger rod (91) rotate forward, so as to drive the plug rod (92) to slide with the help of the guide post (921), so that the end of the plug rod (92) slides out of the snap-fit ​​groove (71), thereby releasing the locking between the rotating part (8) and the outer shell (7).

4. The photoresist mixing apparatus according to claim 3, characterized in that, The upper end of the rotating member (8) penetrates the top wall of the outer shell (7), and a magnetic plate (83) is provided on the outer periphery of the upper end of the rotating member (8). A first electromagnetic member (10) is provided on the top of the outer shell (7). The rotating member (8) can rotate under the action of the rotating torsion spring to drive the magnetic plate (83) to approach the first electromagnetic member (10). The first electromagnetic component (10) can generate a magnetic field that repels the magnetic plate (83) after being energized, so that the rotating component (8) overcomes the reset force of the rotating torsion spring and rotates in the opposite direction, thereby causing the end of the plug rod (92) to engage with the snap-fit ​​groove (71) under the reset action of the trigger rod (91) to lock the circumferential position of the rotating component (8) and the outer shell (7).

5. The photoresist mixing apparatus according to claim 2, characterized in that, The sliding plate (6) penetrates the side wall of the outer shell (7) and slides in cooperation with the outer shell (7). An elastic element (62) is provided between the sliding plate (6) and the outer shell (7). The elastic element (62) is used to elastically push the sliding plate (6) so that the sliding plate (6) slides into the mixing tank (1).

6. The photoresist mixing apparatus according to claim 5, characterized in that, The sliding plate (6) is provided with a magnetic suction part (63) on the side away from the mixing tank (1), and a second electromagnetic component (11) is slidably connected to the outer shell (7); the second electromagnetic component (11) can generate a magnetic field that attracts the magnetic suction part (63) with polarity after being energized, so as to magnetically attract the magnetic suction part (63) and drive the sliding plate (6) to slide away from the mixing tank (1).

7. The photoresist mixing apparatus according to claim 1, characterized in that, The sleeve (4) has two sets of axially spaced limiting grooves (41), each set of limiting grooves (41) has a number of them, and the limiting grooves (41) are distributed axially spaced along the sleeve (4).

8. The photoresist mixing apparatus according to claim 3, characterized in that, The two sides of the opening end of the snap-fit ​​groove (71) are provided with guide chamfers (711), which are used to guide the end of the plug rod (92) into the snap-fit ​​groove (71).

9. A photoresist mixing apparatus according to claim 3, characterized in that, Both sides of the trigger end are provided with arc-shaped contact surfaces (912) for contacting the stirring paddle (5), and the arc-shaped contact surfaces (912) have the same radius of curvature as the inner peripheral wall of the stirring tank (1).

10. The photoresist mixing apparatus according to claim 1, characterized in that, The mixing tank (1) has an inlet (101) at the top and an outlet (102) at the bottom. A guide plate (12) extending downwards to guide the material is fixed below the inlet (101).

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