Projection and amplification liquid crystal display and manufacturing method thereof

Abstract

The invention relates to a projection and amplification liquid crystal display and a manufacturing method thereof, aims to solve the problem of deviation of traditional ITO fine patterns in the prior art, and is particularly suitable for projection and display amplification products of vehicle-mounted and industrial control equipment. By optimizing product design, using lower chromium layer glass Cr-glass as a base layer, designing a display pattern on the base layer, and plating an insulating layer and an ITO layer, the design space is expanded, the bonding allowance is improved, and finally the process yield and efficiency are improved.

Description

Technical Field

[0001] This invention relates to the field of liquid crystal display manufacturing, and more specifically to a projection and magnification type liquid crystal display and its manufacturing method. Background Technology

[0002] Liquid crystal displays (LCDs) have been widely used in the commercial sector and are increasingly being applied to display devices in automotive, airborne, and industrial control applications. With technological advancements, LCD technology has become increasingly mature. However, the manufacturing process of LCDs is complex, with some insurmountable control challenges, especially in projection and magnification applications such as automotive and industrial control. LCDs must meet the dual requirements of high-fidelity image magnification and strong environmental adaptability. Traditional designs employ a double-layer ITO glass structure: the upper ITO glass is etched with horizontal electrodes, and the lower ITO glass is etched with vertical electrodes. The overlapping area forms a dot matrix display unit (such as numbers / icons). The display pattern and electrode traces share the same ITO layer, forcing the wiring to pass through the edges of the pattern, thus compressing the trace width.

[0003] The manufacturing process of LCD displays is divided into front-end and back-end processes. The main production steps of the front-end process include photolithography pattern making, TOP layer printing, PI layer printing, friction, screen printing of sealant, screen printing of conductive points or lines, powder spraying, lamination, hot pressing, etc.

[0004] The current method for fabricating photolithographic patterns involves coating an ITO glass surface with a layer of photoresist, exposing it through a mask in an exposure device, and then completing the ITO photolithographic pattern fabrication through processes such as development, acid etching, and stripping. During this production process, when the line and pattern alignment requirement is less than or equal to 15 micrometers, photolithography may result in defects such as pattern loss and pattern etching deformation. Due to limitations in the precision and process capability of photolithography equipment, this problem cannot be effectively avoided.

[0005] The production of screen-printed sealant, conductive points, or lines currently all uses screen printing equipment. The sealant and conductive points or lines are printed onto the ITO glass with the pre-engraved pattern at the designed location through screen printing. During this production process, because the screen comes into contact with the PI layer, screen marks appear on the PI, which are displayed as screen marks on the monitor. This is a defect in projection and magnification monitors. The current manufacturing method cannot avoid this, and a large amount of manual magnification inspection and selection is required.

[0006] Currently, the bonding process uses bonding equipment to bond two pieces of glass with sealant printed on them according to the bonding marks on the glass. The precision of the bonding machine is generally 20±5 micrometers. However, because the bonding allowance for projection and magnification display products is required to be less than 10 micrometers, the current process can lead to problems such as graphic distortion.

[0007] When the projection magnification is ≥1.5x, even a slight offset (>10μm) in the ITO layer can cause breakage or distortion of the magnified pattern. Since the ITO layer simultaneously bears the weight of both the fine pattern and the wiring, pattern loss is prone to occur during acid etching. Existing technologies, such as CN119511574A, "A Manufacturing Method for Improving Edge Whitening of Dot Matrix Displays in FFSTN Liquid Crystal Displays," use two layers of ITO glass to form a dot matrix pattern (overlapping horizontal and vertical lines) through photolithography, optimizing the filler blocks to improve edge whitening. However, this solution does not involve etching the pattern onto a chromium layer; the chromium plate is used as a mask in the photolithography process but not as the display pattern layer. It fails to address the issue of freeing up wiring space and does not separate the pattern and wiring functions. Given the specific needs of projection magnification scenarios, a revolutionary solution based on display principles is urgently required. Summary of the Invention

[0008] To address the aforementioned problems, this invention discloses a projection and magnification type liquid crystal display and its manufacturing method, which can improve the bonding allowance and reduce the defect rate of pattern deformation.

[0009] Technical solution:

[0010] A projection and magnification type liquid crystal display comprises, from bottom to top, a lower polarizer (12), a lower chromium glass layer (11), a lower insulating layer (10), a lower ITO layer (9), a lower PI layer (8), a liquid crystal layer (6), a spacer particle layer (5), an upper PI layer (4), an upper TOP layer (3), an upper ITO glass layer (2), and an upper polarizer (1), wherein,

[0011] The inner surface of the lower chromium layer glass (11) is provided with a display pattern formed by etching. The display pattern is a graphic entity of the final projection. The lower insulating layer (10) covers the chromium surface of the lower chromium layer glass (11) and the display pattern. The lower ITO layer (9) is disposed on the lower insulating layer (10), and its pattern area completely covers the chromium layer display pattern. The ITO layer only undertakes the electrode wiring function.

[0012] The display pattern is independently defined by the lower chromium layer glass (11). The wiring design of the upper ITO glass (2) and the lower ITO layer (9) is a patternless electrode conduction structure. The two work together to achieve optical projection magnification of the chromium layer pattern. The display pattern (such as the Mercedes-Benz logo) is defined by etching the chromium layer, and the projection magnification is achieved by combining it with the ITO layer. That is, the display pattern is formed by etching the lower chromium layer glass, which serves as the projection source. The ITO layer is only responsible for electrode wiring and switching functions and does not participate in the pattern definition.

[0013] Preferably, the lower chromium layer glass (11) includes a glass surface and a chromium surface, wherein the chromium surface is the inner surface of the liquid crystal display, and the chromium surface display pattern is formed by the following steps: exposing the chromium surface using a graphic mask, and etching the target pattern through development, acid etching, and stripping processes.

[0014] Preferably, the wiring area of ​​the lower ITO layer (9) extends 20-50 μm beyond the edge of the chromium layer pattern to form a buffer zone for projection display.

[0015] Preferably, the liquid crystal mode is TN-LCD, STN-LCD or VA-LCD, which is suitable for projection magnification display scenarios.

[0016] This invention also discloses a method for manufacturing a projection and magnification type liquid crystal display, comprising the following steps:

[0017] Step 1: Design a display pattern on the chromium surface of the lower chromium layer glass (11), wherein the pattern is a solid graphic of a geometric symbol;

[0018] Step 2: Deposit an insulating layer (10) on the chromium surface and pattern, and deposit an ITO layer (9) to optimize the ITO wiring scheme. Form a wiring layer containing only electrode traces by photolithography.

[0019] Step 3: Photolithography is performed on the ITO surface of the upper ITO glass (2) to form a pure conductive electrode without display function;

[0020] Step 4: After assembly, the chromium layer pattern is projected and magnified using an external optical lens.

[0021] As a preferred embodiment, the photolithography etching process includes exposing the chromium surface to a mask, followed by development, acid etching, and stripping to form a pattern, thereby creating a display pattern entity independent of the electrode wiring.

[0022] As a preferred option, the photolithography etching process includes exposing the chromium surface to a mask, followed by development, acid etching, and stripping to form a pattern, wherein the chromium layer pattern is smaller than the corresponding area of ​​the lower ITO layer (9).

[0023] As a preferred embodiment, the wiring design of the lower ITO layer (9) satisfies the following: the wiring area completely covers the chromium layer pattern and extends outward by 20-50μm to form a bonding margin buffer band; the wiring only contains the segment electrode SEG and the common electrode COM channel, and has no display function pattern.

[0024] Preferably, the ITO surface of the upper ITO glass (2) in step 2 is formed by photolithography as follows: a continuous electrode layer without display function, the electrode shape being a rectangular or circular conductive block; the size of the conductive block is larger than the smallest display unit of the chromium layer pattern, and partially overlaps with the wiring area of ​​the lower ITO layer (9), with an overlap rate ≥95%.

[0025] Preferably, step 3 further includes adding an optical lens group to the outside of the bonded component to project and magnify the chromium layer pattern onto the target display surface; wherein the projection light source is a backlight module or ambient incident light.

[0026] Preferably, the insulating layer in step 1 is silicon carbide or silicon dioxide with a deposition thickness of 100-500 nm; the curing temperature after printing the lower PI layer is 200-280 degrees Celsius, and the curing time is 10-30 minutes.

[0027] Beneficial effects

[0028] This invention provides a projection and magnification liquid crystal display and its manufacturing method. The lower layer of the liquid crystal display uses chromium-plated glass. The required pattern is etched into the chromium layer, and an insulating layer and an ITO layer are deposited on the chromium layer. The ITO is then patterned and photolithographically fabricated. At this time, the design pattern has sufficient space margin, and the product bonding margin is ≥20 micrometers. The liquid crystal display designed and manufactured using this method solves defects such as pattern distortion, pattern missing, and mesh marks in liquid crystal displays. At the same time, the efficiency of manual inspection is improved, thereby improving the yield and efficiency of projection and magnification liquid crystal display processes. Attached Figure Description

[0029] To more clearly illustrate the technical solutions in the embodiments of the present invention, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0030] Figure 1 Product structure diagram provided for embodiments of the present invention;

[0031] Figure 2 The product display effect diagram provided for the embodiments of the present invention;

[0032] Figure 3 The conventional design diagram provided for embodiments of the present invention;

[0033] Figure 4 This is a schematic diagram of poor graphic deformation after magnification of the projection of the bonding misalignment provided in an embodiment of the present invention;

[0034] Figure 5 The optimized design diagram is provided for an embodiment of the present invention.

[0035] Figure label:

[0036] 1-Upper polarizer, 2-Upper ITO glass, 3-Upper TOP layer, 4-Upper PI layer, 5-Plastic ball, 6-Liquid crystal layer, 7-Frame adhesive, 8-Lower PI layer, 9-Lower ITO layer, 10-Lower insulating layer, 11-Lower chromium glass, 12-Lower polarizer. Detailed Implementation

[0037] To make the above-mentioned objects, features, and advantages of the present invention more apparent and understandable, specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. Many specific details are set forth in the following description to provide a thorough understanding of the present invention. However, the present invention can be practiced in many different ways as described herein, and those skilled in the art can make similar modifications without departing from the spirit of the invention; therefore, the present invention is not limited to the specific embodiments disclosed below. Embodiments of the present invention will be further described in detail below with reference to the accompanying drawings.

[0038] Example 1

[0039] In traditional designs, COM / SEG electrodes are connected through the edges of patterns, resulting in limited space and narrow wiring, which makes acid etching and development difficult and leads to misalignment and deformation during bonding. For example... Figures 3 to 4 As shown, the COM / SEG electrodes (thin lines in the figure) must pass through the corner gaps of the display pattern and connect to the peripheral pins. The display pattern and wiring channels share the same ITO layer, resulting in compressed wiring width and significantly increased etching difficulty. This invention discloses a projection and magnification type liquid crystal display and its manufacturing method, which reconstructs the display function through a three-layer structure, separating graphic display from electrode conduction. After optimization, the pattern leaves sufficient space for wiring, the chromium layer pattern serves as the display core, and the ITO layer is only used for functional connections.

[0040] like Figures 1 to 2 As shown, the display consists of three parts: upper glass ITO wiring, lower glass ITO wiring, and a chromium layer pattern. The chromium layer is responsible for the display pattern, while the ITO layer is only responsible for the switching function. This allows for a wider wiring design, reducing photolithography difficulty and bonding risks. In this invention, the lower glass layer uses chromium-plated glass, with the display pattern photolithographically etched onto the chromium surface, followed by the deposition of an insulating layer and an ITO layer. This frees up design space for the ITO layer, providing ample wiring width and pattern allowance, and increasing the bonding allowance to ≥20 micrometers.

[0041] like Figure 1 As shown in the product structure diagram, the order of each layer from top to bottom is as follows: upper polarizer 1, upper ITO glass 2, TOP layer 3, PI layer 4, spacer particles 5, liquid crystal layer 6, frame adhesive 7 (the frame adhesive wraps the liquid crystal layer, and the liquid crystal layer wraps the spacer particles), lower PI layer 8, lower ITO layer 9, insulating layer 10, lower chromium layer glass 11, and lower polarizer 12.

[0042] The lower chromium layer glass 11 includes a glass surface and a chromium surface, with the chromium surface serving as the inner surface of the liquid crystal display. The displayed pattern (such as the Mercedes-Benz logo) is formed by etching the lower chromium layer glass, which serves as the projection source. The chromium surface display pattern is formed through the following steps: exposing the chromium surface using a pattern mask, followed by development, acid etching, and stripping processes to etch the target pattern.

[0043] The lower chromium glass layer handles the graphic display function. The chromium layer is photolithographically etched to create the display image; it does not participate in conductivity, reserving buffer space for the ITO layer. The middle insulating layer and ITO layer only handle electrode switching functions and do not require intricate patterns. The ITO layer can be designed with wide traces, which bypass the display area and connect to the pins via wide paths, completely avoiding corner compression and improving bonding margin. The optimized trace and pattern design allows for a bonding margin of ≥20 micrometers, resulting in an optimized display such as… Figure 5 As shown.

[0044] In this embodiment, the pattern to be displayed is the Mercedes-Benz logo. The Mercedes-Benz logo is etched onto the chromium layer. The ITO layer is designed as a square area covering the pattern on the chromium layer. When lit, the square area projects and displays the Mercedes-Benz logo, that is, the pattern on the chromium layer is projected and magnified (such as by optical projection onto a car). The ITO layer provides ample wiring space (such as square shape) to ensure high tolerance for bonding offset, which can reach more than 20 micrometers, avoiding the offset problem of traditional ITO fine patterns.

[0045] This embodiment also provides an experimental mass production data table, as shown in Table 1 below:

[0046] Table 1. Experimental production data:

[0047]

[0048] As shown in Table 1, in the two sets of data for the original design J4657, bonding misalignment accounted for 74% (2388 / 3218) and 51% (1555 / 3052) of the total defects, respectively. In the new design, this figure is zero. This indicates that the three-layer structure design of this application completely solves the problem of pattern deformation caused by bonding misalignment. In terms of pass rate, the pass rate for J4657 was 15-28%, while the new design remained stable at 93-95%. With a sample size of 3280 pieces for the new design, the pass rate reached 3103 pieces, achieving an impressive production capacity release. The pass rate for the original design was even lower during high-temperature pressing (15% vs 28%), indicating that the traditional structure is more sensitive to thermal stress. The new design remained stable across different batches, indirectly verifying the heat resistance performance of the chromium-insulator-ITO structure.

[0049] This invention addresses the problems of pattern deformation, mesh marks, and poor bonding misalignment (such as pattern loss due to slight misalignment in automotive projection equipment). Traditional designs use an ITO layer that simultaneously handles both the pattern and wiring, leading to limited wiring space. For example, wiring in the sharp corners of the Mercedes-Benz logo is prone to breakage, and the bonding allowance needs to be <10 micrometers. This invention, through structural innovation, uses a chromium-coated glass layer as a base, with the pattern etched onto the chromium surface. A wide-area electrode is placed on the ITO layer; in this embodiment, it is a cube that only covers the pattern and handles wiring (e.g., the cube is larger than the Mercedes-Benz logo). This achieves functional separation between the chromium layer and the ITO layer. In projection scenarios, the chromium-coated Mercedes-Benz logo is projected through optical magnification, while the ITO cube provides the conductive path, avoiding sharp corner misalignment. The bonding allowance is increased to ≥20 micrometers, and the yield rate is improved from 15-28% to 93-95%.

[0050] In summary, this application solves the problems of graphic distortion, mesh marks, and lamination misalignment by separating display and wiring functions. It is suitable for projection magnification products, such as automotive and industrial control systems.

[0051] Example 2

[0052] This embodiment discloses a method for manufacturing a projection and magnification type liquid crystal display, including:

[0053] Step 1, fabrication of the lower layer component: Design a display pattern on the chromium surface of the lower chromium layer glass 11 and form the display pattern through photolithography etching process. The pattern is a solid graphic of the Mercedes-Benz logo or geometric logo. Deposit an insulating layer 10 and a lower ITO layer 9 on the chromium surface and the pattern, optimize the ITO wiring scheme so that its layout area completely covers the display pattern and ensures that a bonding margin is left. Print and cure the lower PI layer 8 on the lower ITO layer 9.

[0054] Step 2, prepare the upper component: attach a polarizer 1 to the ITO surface of the upper ITO glass 2; print and cure the upper TOP layer 3 on the ITO surface of the upper ITO glass 2, and print and cure the upper PI layer 4 on the upper TOP layer 3.

[0055] Step 3, Assemble and inject liquid crystal: Screen print frame adhesive 7 on the edge area of ​​the lower PI layer 8 or the upper PI layer 4, spray spacer particles 5 inside the display area, attach the lower and upper components, and form a closed cavity by hot pressing and curing the frame adhesive 7; inject liquid crystal into the cavity by vacuum infusion to form liquid crystal layer 6; finally attach the lower polarizer 12 to the back of the lower chromium layer glass 11 to form a complete display.

[0056] Specifically,

[0057] One side of the glass is the ITO side. A pattern mask (designed and fabricated using an optimized scheme based on customer requirements) is used, followed by photolithography on the ITO side using current industry technology to obtain the desired pattern. The display pattern is independently defined through chromium layer etching. The wiring design between the upper ITO glass 2 and the lower ITO layer 9 is a patternless electrode conduction structure. Together, they achieve optical projection magnification of the chromium layer pattern.

[0058] The upper TOP layer 3 uses a letterpress printing machine to print the liquid TOP onto the surface of the upper glass 2ITo layer, which is then cured at a temperature of 220-340℃.

[0059] The wiring area of ​​the lower ITO layer 9 extends 20-50μm beyond the edge of the chromium layer pattern, forming a buffer zone for projection display.

[0060] The ITO surface of the upper ITO glass 2 is photolithographically formed to create purely conductive electrodes without display function. Unlike the existing horizontal and vertical dot matrix technology, this embodiment uses projection display. The ITO surface only contains segment electrode (SEG) and common electrode (COM) channels, serving only as electrode conduction, without any pattern. It can be designed as a cube, such as... Figure 5 As shown.

[0061] The upper PI layer 4 is made by printing liquid PI onto the upper TOP layer 3 using a letterpress printing press, and then curing it at a temperature of 200-280℃.

[0062] The sealant 7 is screen-printed onto the ITO glass at the designed location. The upper and lower layers of glass are then combined and sealed through a bonding and hot-pressing process.

[0063] Using a powder spraying machine, the spacer particle layer 5 is sprayed onto the glass printed with PI layers according to the required quantity, that is, onto the upper PI layer 4 or the lower PI layer 8.

[0064] Fabrication of liquid crystal layer 6: Liquid crystal is injected into the empty cell of the liquid crystal display using a vacuum method through a crystal filling machine. Liquid crystal modes include: twisted nematic liquid crystal TN-LCD, high twisted nematic liquid crystal HTN-LCD, ultra-high twisted nematic liquid crystal STN-LCD, compensated ultra-high twisted nematic liquid crystal FSTN-LCD, vertically aligned liquid crystal VA-LCD, EBN, and other liquid crystal modes.

[0065] To prepare the lower PI8 layer, a letterpress printing plate is used; liquid PI is printed onto the lower ITO layer 9 using a printing press, and then cured at a temperature of 200-280℃.

[0066] The lower ITO9 layer uses current industry technology to deposit ITO onto the insulating layer 10 on the inner surface of the lower chromium glass. Then, using a pattern mask (the pattern is designed and manufactured according to the customer's needs with an optimized solution), the ITO surface is photolithographically ...

[0067] The lower insulating layer 10 is prepared by using existing vacuum magnetron sputtering and other processes to deposit the insulating layer on the chromium surface of the lower chromium glass 11.

[0068] The lower chromium layer glass 11, with a thickness selectable from 0.2mm to 3.0mm, has one chromium side. Serving as the inner surface of the liquid crystal display, the chromium side is photolithographically etched using a pattern mask (the pattern is designed and manufactured according to optimized solutions based on customer requirements) to obtain the desired pattern. A lower polarizer 12 is then attached to the lower chromium layer glass 11 using a pick-and-place machine or manually. The lower polarizer 12 is a polarizer cut to the required angle and size according to product requirements.

[0069] In this embodiment, an optical lens group is added to the outside of the bonded component to project and magnify the chromium layer pattern onto the target display surface. The magnification of the optical lens group is 1.5-5 times, and the projection light source is a backlight module or ambient incident light. The projection effect is as follows. Figure 2 As shown.

[0070] In existing technologies, the overlapping portion of the ITO wiring on the upper and lower glass plates forms the desired pattern. When the wiring allowance is small, misalignment between the upper and lower glass plates can cause pattern distortion or missing parts. This invention consists of three parts: upper glass ITO wiring, lower glass ITO wiring, and a chrome pattern. The desired pattern is etched onto the chrome surface. When the display is activated, only the desired pattern is shown. The upper and lower glass ITO wiring is responsible for the on / off function of the display. The wiring can be much larger than the pattern, thus allowing for a large allowance in the upper and lower glass ITO wiring. Simultaneously, the photolithography difficulty is significantly reduced. Therefore, this invention effectively solves the problem of pattern distortion and missing parts in products with small patterns or limited allowance.

[0071] The above description is only a preferred embodiment of the present invention. For those skilled in the art, various corresponding changes and modifications can be made based on the above technical solutions and concepts, and all such changes and modifications should be included within the protection scope of the claims of the present invention.

Claims

1. A projection and magnification type liquid crystal display, characterized in that, The following layers are stacked sequentially from bottom to top: a lower polarizer (12), a lower chromium layer glass (11), a lower insulating layer (10), a lower ITO layer (9), a lower PI layer (8), a liquid crystal layer (6), a spacer particle layer (5), an upper PI layer (4), an upper TOP layer (3), an upper ITO glass (2), and an upper polarizer (1). The lower chromium layer glass (11) has a display pattern formed by etching on its inner surface. The display pattern is the final projected graphic entity. The lower insulating layer (10) covers the chromium surface of the lower chromium layer glass (11) and the display pattern. The lower ITO layer (9) is disposed on the lower insulating layer (10), and its pattern area completely covers the chromium layer display pattern. The ITO layer only undertakes the electrode wiring function. The display pattern is independently defined by the lower chromium layer glass (11). The wiring design of the upper ITO glass (2) and the lower ITO layer (9) is a patternless electrode conduction structure. The two work together to realize the optical projection magnification display of the chromium layer pattern.

2. The display according to claim 1, characterized in that, The lower chromium layer glass (11) includes a glass surface and a chromium surface. The chromium surface is the inner surface of the liquid crystal display. The chromium surface display pattern is formed by the following steps: exposing the chromium surface with a graphic mask, and etching the target pattern through development, acid etching, and stripping processes.

3. The display according to claim 1, characterized in that, The wiring area of ​​the lower ITO layer (9) extends 20-50 μm beyond the edge of the chromium layer pattern, forming a buffer zone for projection display.

4. The display according to claim 1, characterized in that, The liquid crystal mode is TN-LCD, STN-LCD, or VA-LCD, suitable for projection magnification display scenarios.

5. A method for manufacturing a projection and magnification type liquid crystal display, characterized in that, Includes the following steps: Step 1: Design a display pattern on the chromium surface of the lower chromium layer glass (11), wherein the pattern is a solid graphic of a geometric symbol; Step 2: Deposit an insulating layer (10) on the chromium surface and pattern, and deposit an ITO layer (9) to optimize the ITO wiring scheme. Form a wiring layer containing only electrode traces by photolithography. Step 3: Photolithography is performed on the ITO surface of the upper ITO glass (2) to form a pure conductive electrode without display function; Step 4: After assembly, the chromium layer pattern is projected and magnified using an external optical lens.

6. The manufacturing method according to claim 4, characterized in that, The photolithography etching process involves exposing a chromium surface to a mask, followed by development, acid etching, and removal to form a pattern, creating a display pattern entity independent of the electrode wiring.

7. The manufacturing method according to claim 4, characterized in that, The wiring design of the lower ITO layer (9) satisfies the following: the wiring area completely covers the chromium layer pattern and extends outward by 20-50μm to form a bonding margin buffer band; the wiring only contains the segment electrode SEG and the common electrode COM channel, and has no display function pattern.

8. The manufacturing method according to claim 4, characterized in that, In step 2, the ITO surface of the upper ITO glass (2) is formed by photolithography: a continuous electrode layer without display function, the electrode shape being a rectangular or circular conductive block; the size of the conductive block is larger than the smallest display unit of the chromium layer pattern, and overlaps with the wiring area of ​​the lower ITO layer (9).

9. The manufacturing method according to claim 4, characterized in that, Step 3 also includes adding an optical lens group to the outside of the bonded component to project and magnify the chromium layer pattern onto the target display surface.

10. The manufacturing method according to claim 4, characterized in that, The insulating layer described in step 1 is silicon carbide or silicon dioxide, with a deposition thickness of 100-500 nm; the curing temperature after printing the lower PI layer is 200-280 degrees Celsius, and the curing time is 10-30 minutes.

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