Copolymer

By adding reactive olefinic unsaturated compounds to copolymer precursors and controlling specific parameters, the problems of insufficient storage stability and solvent resistance of photosensitive resin compositions were solved, and the excellent performance of resin-cured films was achieved.

CN120936633APending Publication Date: 2025-11-11RESONAC CORP
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Patent Information

Application Number
CN202480023319.8
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Priority Date
2024-04-23
Filing Date
2024-10-29
Publication Date
2025-11-11

AI Technical Summary

Technical Problem

In the prior art, photosensitive resin compositions and photosensitive coloring compositions have insufficient storage stability and solvent resistance, and poor developability.

Method used

A copolymer is used in which a reactive olefinic unsaturated compound is added to a copolymer precursor containing structural units with terminal isocyanate groups, structural units with hydroxyl groups, and structural units with acid groups. The olefinic unsaturated group equivalent, acid value, terminal isocyanate group equivalent, and hydroxyl equivalent are controlled to ensure that the weight-average molecular weight and molecular weight distribution are within a specific range.

Benefits of technology

The copolymer exhibits excellent storage stability, imparts excellent solvent resistance to the cured resin film, and provides good developability to the photosensitive resin composition.

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Abstract

The invention discloses a copolymer. A copolymer obtained by adding an ethylenically unsaturated compound (e) having a functional group reactive with an acid group to a part of the acid group of a structural unit (a-3) having an acid group in a copolymer precursor containing a structural unit (a-1) having a blocked isocyanate group, a structural unit (a-2) having a hydroxyl group, and a structural unit (a-3) having an acid group.
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Citation Information

Patent Citations

  • Photosensitive resin composition, cured film, and method for producing the same

    JP2019053266A