Cover plate glass liquid polishing device and liquid polishing method

Abstract

The invention relates to the technical field of glass processing, and discloses a cover plate glass liquid polishing device and a liquid polishing method.The cover plate glass liquid polishing device comprises a liquid polishing mechanism, the liquid polishing mechanism comprises a first liquid polishing pool and a second liquid polishing pool which are arranged in parallel, a first supporting part is arranged at the bottom of the first liquid polishing pool, and a second supporting part is arranged at the bottom of the second liquid polishing pool; a first distance is formed between the first supporting part and the second supporting part in the vertical direction; the first supporting part and the second supporting part are used for supporting the bottom of the cover plate glass. The storage mechanism is used for loading to-be-processed cover plate glass; and the storage mechanism is placed in the first liquid throwing pool or the second liquid throwing pool. The driving mechanism is arranged on one side of the liquid throwing mechanism and is used for controlling the object placing mechanism to move between the first liquid throwing pool and the second liquid throwing pool, so that the cover plate glass in the object placing mechanism is alternately liquid-thrown between the first liquid throwing pool and the second liquid throwing pool. The liquid polishing uniformity is realized, poor grinding marks and dents on the edge of the glass after liquid polishing are avoided, and the liquid polishing processing quality of the cover plate glass is effectively ensured.

Description

Technical Field

[0001] This application belongs to the field of glass processing technology, specifically relating to a cover glass liquid polishing device and liquid polishing method. Background Technology

[0002] Glass liquid polishing technology involves placing a liquid polishing fixture filled with glass into a liquid polishing tank, and using bubbling to blow the etching liquid, causing the etching liquid to flow relative to the glass surface, thereby washing away the etching products on the glass surface and ensuring the quality of the glass surface. Existing liquid polishing technologies are mainly divided into static liquid polishing and dynamic liquid polishing. Specifically, static liquid polishing refers to the process where the glass remains stationary within the polishing frame. The operation involves placing a polishing fixture filled with glass into the polishing tank. Bubbling forces the etching liquid to flow relative to the glass surface, thus washing away the etched residue. However, the chemical reaction products at the glass edges in contact with the polishing frame dissolve more slowly, delaying the chemical reaction process and creating frame marks at the glass-frame support, resulting in uneven filament output during polishing.

[0003] Dynamic liquid polishing refers to the relative displacement between the glass and the support points of the liquid polishing frame during the polishing process. This technology is an improvement on the existing static liquid polishing. It uses a cylinder to drive the support column and the limiting structure, causing the glass to move up and down along a specific trajectory. Then, bubbling is used to wash away the chemical reaction products at the glass and the support points of the liquid polishing frame, thereby reducing frame defects and improving the processing quality of cover glass. However, the continuous up and down movement of the glass in the liquid polishing frame can cause friction marks on the glass at the frame support points. In addition, under chemical corrosion, the bracket at the bottom of the liquid polishing frame will experience slight mechanical impacts due to the continuous up and down lifting of the glass, resulting in dents and defects on the glass edges. Summary of the Invention

[0004] To address the shortcomings of the prior art, this application provides a cover glass liquid polishing device and method. By setting up the liquid polishing mechanism, uniformity of liquid polishing is achieved, and defects such as scratches and dents on the glass edges after liquid polishing are avoided, effectively ensuring the quality of the cover glass liquid polishing process.

[0005] The technical effects to be achieved in this application are realized through the following aspects: In a first aspect, this application provides a cover glass liquid polishing apparatus, comprising: The liquid polishing mechanism includes a first liquid polishing tank and a second liquid polishing tank arranged side by side. The bottom of the first liquid polishing tank is provided with a first support part, and the bottom of the second liquid polishing tank is provided with a second support part. The first support part and the second support part are separated by a first distance in the vertical direction. The first support part and the second support part are used to support the bottom of the cover glass. A loading mechanism for loading cover glass to be processed; the loading mechanism is placed in the first liquid polishing tank or the second liquid polishing tank; and A drive mechanism, located on one side of the liquid polishing mechanism, is used to control the movement of the placement mechanism between the first liquid polishing tank and the second liquid polishing tank, so that the cover glass in the placement mechanism is alternately liquid polished between the first liquid polishing tank and the second liquid polishing tank.

[0006] In some implementations, the first distance is any value between 10mm and 30mm.

[0007] In some implementations, the storage mechanism includes opposing side plates, several support members, and several limiting parts; The limiting part is connected between the side plates and is located at the four corners of the side plates; The support member is connected between the side plates and is located on both sides of the lower end of the side plate below the limiting part; In the horizontal direction, with the central axis of the side plate as the center, adjacent support members are symmetrically arranged, adjacent limiting parts are symmetrically arranged, and the distance between adjacent support members is less than the distance between adjacent limiting parts.

[0008] In some implementations, the limiting part includes a body and a plurality of locking blocks, the locking blocks being evenly spaced and fitted onto the body, and the locking blocks having locking grooves for placing and limiting the edges of the cover glass.

[0009] In some implementations, the storage mechanism further includes a partition disposed between the side plates and parallel to the side plates, and extending through the support member and the limiting part.

[0010] In some implementations, the lower end of the partition is provided with a groove.

[0011] In some implementations, the placement mechanism further includes several reinforcing rods connected between the side plates and disposed between adjacent limiting parts; the central axis of the reinforcing rods is arranged parallel to the central axis of the limiting part.

[0012] In some implementations, the upper end of the side plate is provided with a hanging part, which is detachably connected to the drive component.

[0013] Secondly, this application provides a method for liquid polishing cover glass, using the aforementioned liquid polishing apparatus for cover glass, the steps of which include: S1: Load the cover glass to be processed onto the storage mechanism; S2: Move the placement mechanism into the first liquid polishing tank through the driving mechanism, so that the bottom of the cover glass is in close contact with the first support part, inject NaOH solution into the first liquid polishing tank, and set the initial liquid polishing parameters; S3: After the initial liquid polishing is completed, the placement mechanism is moved to the second liquid polishing tank by the driving mechanism, so that the bottom of the cover glass is in close contact with the second support part. NaOH solution is continued to be injected into the second liquid polishing tank, and the same liquid polishing parameters as the first liquid polishing tank are maintained. S4: Repeat S2 and S3 at least once; S5: Complete the liquid polishing process, move the placement mechanism out of the liquid polishing mechanism through the drive mechanism, and perform subsequent cleaning and drying treatment on the cover glass.

[0014] In some implementations, the liquid polishing parameters include the concentration of the NaOH solution, the temperature, and the liquid polishing time.

[0015] In summary, this application has at least the following advantages: The cover glass liquid polishing device and method provided in this application, through the setting of the liquid polishing mechanism, uses support parts of different heights to support the cover glass being liquid polished, so as to realize the cover glass being liquid polished at different heights alternately, avoiding the undesirable phenomenon of frame marks between the cover glass and the placement mechanism, and ensuring the uniformity of liquid polishing; at the same time, it reduces the frequency of the cover glass moving up and down in the support position due to the use of dynamic liquid polishing, reduces the number of frictions and the number of impacts when lifting the glass, and can effectively avoid the occurrence of scratches and dents on the glass edges after liquid polishing, thus ensuring the quality of the liquid polishing process of the cover glass. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the cover glass liquid polishing device in Embodiment 1 of this application.

[0017] Figure 2 This is another schematic diagram of the cover glass liquid polishing device in Embodiment 1 of this application.

[0018] Figure 3 This is a side view of the cover glass liquid polishing device in Embodiment 1 of this application (excluding the shell of the liquid polishing tank).

[0019] Figure 4 This is a schematic diagram of the storage mechanism in Embodiment 2 of this application.

[0020] Figure 5 for Figure 4 A magnified structural diagram of part A in the middle.

[0021] Figure 6 This is another structural schematic diagram of the storage mechanism in Embodiment 2 of this application.

[0022] Figure 7 This is a schematic flowchart of the cover glass liquid polishing method in Embodiment 3 of this application.

[0023] Marked in the image: 1. Liquid polishing mechanism; 11. First liquid polishing tank; 111. First support part; 112. Second support part; 12. Second liquid polishing tank; 2. Storage mechanism; 21. Side plate; 211. Hanging part; 22. Support component; 23. Limiting part; 231. Body; 232. Locking block; 233. Locking groove; 24. Partition plate; 241. Groove; 25. Reinforcing rod; 3. Drive mechanism; 4. Cover glass. Detailed Implementation

[0024] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. The described embodiments are only some embodiments of this application, not all embodiments.

[0025] Therefore, the following detailed description of the embodiments of this application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely to illustrate selected embodiments of the application. All other embodiments obtained by those skilled in the art based on the embodiments in this application without inventive effort are within the scope of protection of this application.

[0026] Example 1: Please see the appendix Figure 1-3 The cover glass liquid polishing device of this application includes a liquid polishing mechanism 1, a placement mechanism 2 and a driving mechanism 3.

[0027] The liquid polishing mechanism 1 includes a first liquid polishing tank 11 and a second liquid polishing tank 12 arranged side by side. The bottom of the first liquid polishing tank 11 is provided with a first support part 111, and the bottom of the second liquid polishing tank 12 is provided with a second support part 112. The first support part 111 and the second support part 112 are separated by a first distance in the vertical direction. The first support part 111 and the second support part 112 are used to support the bottom of the cover glass 4. The placement mechanism 2 is used to load the cover glass 4 to be processed. The placement mechanism 2 is placed in the first liquid polishing tank 11 or the second liquid polishing tank 12. The drive mechanism 3 is provided on one side of the liquid polishing mechanism 1 and is used to control the movement of the placement mechanism 2 between the first liquid polishing tank 11 and the second liquid polishing tank 12 so that the cover glass 4 in the placement mechanism 2 is alternately liquid polished between the first liquid polishing tank 11 and the second liquid polishing tank 12.

[0028] The first liquid polishing tank 11 and the second liquid polishing tank 12 are used to hold etching liquid and etch the cover glass 4. The height of the first support 111 is lower than the height of the second support 112. The drive mechanism 3 can specifically adopt a gantry-type moving mechanism, that is, the crossbeam is supported by columns or guide rails on both sides, and the crossbeam can move along the direction of the columns to achieve longitudinal movement, while the actuator on the crossbeam can move along the direction of the crossbeam to achieve lateral movement, forming a three-dimensional moving mode similar to a "gantry" frame structure. It can be understood that the actuator can specifically adopt sliders, robotic arms, etc., to lift the placement mechanism 2, as long as the structure matches the placement mechanism 2.

[0029] In this embodiment, the cover glass 4 liquid polishing device has the following overall liquid polishing process: First, the cover glass 4 is placed in the placement mechanism 2, and then the placement mechanism 2 is moved above the first liquid polishing pool 11 by the driving mechanism 3, and the placement mechanism 2 is placed at the bottom of the first liquid polishing pool 11, so that the first support part 111 supports the cover glass 4 in the placement mechanism 2, so that the cover glass 4 can be liquid polished in the first liquid polishing pool 11. After a period of time, the drive mechanism 3 moves the placement mechanism 2 from the first liquid polishing tank 11 to the second liquid polishing tank 12, so that the bottom of the cover glass 4 in the placement mechanism 2 is supported by the second support part 112. Since the first support part 111 and the second support part 112 are separated by a first distance in the vertical direction, and the height of the second support part 112 is set to be greater than the height of the first support part 111, the cover glass 4 moves upward, thereby changing the support position between the cover glass 4 and the placement mechanism 2. After the cover glass 4 is etched in the second liquid polishing tank 12 for a period of time, the placement mechanism 2 is placed in the first liquid polishing tank 11 and the second liquid polishing tank 12 in sequence for liquid polishing until the wire feed amount designed for the product is reached, and the liquid polishing ends.

[0030] Through the above technical solution, the drive mechanism 3 uses the placement mechanism 2, which is filled with cover glass 4, to perform liquid polishing back and forth in the first liquid polishing tank 11 and the second liquid polishing tank 12. Due to the height difference between the first support part 111 and the second support part 112, the cover glass 4 can be lifted back and forth in the first liquid polishing tank 11 and the second liquid polishing tank 12. As a result, the cover glass 4 passively slides up and down in the placement mechanism 2. During this process, the contact point between the glass and the placement mechanism 2 can fully react, avoiding the phenomenon of uneven liquid polishing caused by delayed chemical reaction process. It effectively removes the marks of contact with the placement mechanism 2 and ensures the uniformity of liquid polishing. Moreover, compared with dynamic liquid polishing, the liquid polishing process of this device greatly reduces the frequency of up and down movement of the cover glass 4 in the support position of the placement mechanism 2, reduces the number of frictions and the number of impacts when the glass is lifted by the low rod, and thus effectively reduces the defects of glass edge scratches and dents after liquid polishing, ensuring the liquid polishing processing quality of the cover glass 4 and effectively improving the production yield of the cover glass 4.

[0031] In this structure, a liquid polishing device is used to polish the cover glass 4 in a liquid polishing tank. The overall operation process is simple and easy to learn, and the structural design is simple and conducive to subsequent maintenance.

[0032] In some preferred embodiments, the first distance is any value between 10mm and 30mm. This setting allows the cover glass 4 to move dynamically during the alternating liquid polishing process in the first liquid polishing tank 11 and the second liquid polishing tank 12. This distance ensures that the contact point between the cover glass 4 and the placement mechanism 2 is in full contact with the etching solution, achieving uniform liquid polishing. Simultaneously, it prevents excessive movement and instability of the cover glass 4, effectively ensuring its placement stability and guaranteeing smooth liquid polishing operations.

[0033] Example 2: The difference between this embodiment and Embodiment 1 is that, please refer to... Figure 4 The storage mechanism 2 of this embodiment includes side plates 21 arranged opposite to each other, a plurality of support members 22 and a plurality of limiting parts 23; the limiting parts 23 are connected between the side plates 21 and are located at the four corners of the side plates 21; the support members 22 are connected between the side plates 21 and are located on both sides of the lower end of the side plates 21 corresponding to the lower part of the limiting parts 23; in the horizontal direction, with the central axis of the side plate 21 as the center, the adjacent support members 22 are symmetrically arranged, the adjacent limiting parts 23 are symmetrically arranged, and the distance between adjacent support members 22 is less than the distance between adjacent limiting parts 23.

[0034] The support member 22 is staggered with the first support portion 111 and the second support portion 112, so that when the placement mechanism 2 is placed in the first liquid polishing tank 11 and the second liquid polishing tank 12, the first support portion 111 and the second support portion 112 replace the support member 22 and provide support for the cover glass 4. Preferably, there are two support members 22. There are four limiting portions 23. There are two side plates 21.

[0035] In this embodiment, the placement mechanism 2 uses a support member 22 to support the bottom of the cover glass 4, and a limiting part 23 to restrict and fix the upper and lower edges of the glass, ensuring the stability of the cover glass 4. Furthermore, the side plates 21 secure the support member 22 and the limiting part 23 on both sides, ensuring the overall structural robustness. This arrangement allows the cover glass 4 to be stably placed between the support member 22 and the limiting part 23, facilitating the drive mechanism 3 to move several cover glass panels 4 back and forth into the first liquid polishing tank 11 and the second liquid polishing tank 12, ensuring the smoothness of the entire liquid polishing process.

[0036] In some embodiments, see Figure 5The limiting part 23 includes a main body 231 and a plurality of locking blocks 232. The locking blocks 232 are evenly spaced and fitted onto the main body 231. Each locking block 232 has a locking groove 233, which is used to place and limit the edge of the cover glass 4. Preferably, the locking groove 233 is an outward-facing octagonal locking groove 233, that is, the distance between the two edges of the end of the locking groove 233 closer to the main body 231 is smaller than the distance between the two edges of the end of the locking groove 233 farther from the main body 231. This arrangement facilitates the entry of the cover glass 4 into the locking groove 233, improves placement convenience, and is conducive to automated batch placement.

[0037] Specifically, the edge of the cover glass 4 is placed within the slot 233. Since the limiting part 23 is located at the four corners of the side plate 21, it limits the four diagonal positions of the cover glass 4, ensuring the stability of the cover glass 4. Furthermore, the evenly spaced slots 232 ensure a safe gap between adjacent cover glass 4, preventing the cover glass 4 from getting too close and affecting the liquid polishing efficiency, while also ensuring the safety of the cover glass 4 during movement.

[0038] In some embodiments, see Figure 6 The storage mechanism 2 also includes a partition 24, which is disposed between the side plates 21 and parallel to them, and extends across the support member 22 and the limiting part 23. This partition 24 divides the limiting part 23 and the support member 22 into two sections, effectively shortening their length and improving their bending and deformation resistance. This prevents the cover glass 4 from being squeezed and deformed within the storage mechanism 2, further enhancing the structural stability of the storage mechanism 2 and effectively improving the liquid polishing yield of the cover glass 4.

[0039] In some embodiments, the lower end of the partition 24 is provided with a groove 241. With this setting, the groove 241 has the function of limiting and fixing. During the liquid polishing process, the placement mechanism 2 is placed in the liquid polishing tank for etching operation by the drive mechanism 3, and the groove 241 is matched with the limiting part in the liquid polishing tank that is adapted to the groove 241, thereby ensuring that the placement mechanism 2 is stably placed in the liquid polishing tank, thereby ensuring the processing quality of the cover glass 4.

[0040] In some preferred embodiments, the lower end of the side plate 21 is also provided with a groove 241. The groove 241 at the lower end of the side plate 21 and the groove 241 at the lower end of the partition plate 24 have the same function, further ensuring the stability of the placement mechanism 2 when placed in the liquid slurry tank.

[0041] In some embodiments, the storage mechanism 2 further includes a plurality of reinforcing rods 25, which are connected between the side plates 21 and disposed between adjacent limiting portions 23; the central axis of the reinforcing rods 25 is parallel to the central axis of the limiting portion 23. This arrangement makes the overall structure more rigid and stable, preventing the fastening bolts in the storage mechanism 2 from loosening in a high-temperature and strong alkaline environment, thus preventing the liquid polishing frame from twisting and deforming, and effectively improving the overall stability and firmness of the storage mechanism 2.

[0042] In some embodiments, the upper end of the side plate 21 is provided with a hanging part 211, which is detachably connected to the drive component. Preferably, the hanging part 211 is hook-shaped. This arrangement effectively improves the ease of lifting and placing the storage mechanism 2 by the drive mechanism 3, ensuring smooth and rapid movement of the storage mechanism 2.

[0043] Example 3: This embodiment is based on the above embodiment; please refer to [link / reference]. Figure 7 A method for liquid polishing cover glass 4 is provided, employing the aforementioned cover glass 4 liquid polishing apparatus, the steps of which include: S1: Load the cover glass 4 to be processed onto the storage mechanism 2; S2: Move the placement mechanism 2 into the first liquid polishing tank 11 through the drive mechanism 3, so that the bottom of the cover glass 4 is in close contact with the first support part 111, inject NaOH solution into the first liquid polishing tank 11, and set the initial liquid polishing parameters. S3: After the initial liquid polishing is completed, the placement mechanism 2 is moved to the second liquid polishing tank 12 by the drive mechanism 3, so that the bottom of the cover glass 4 is in close contact with the second support part 112. NaOH solution is continued to be injected into the second liquid polishing tank 12, and the same liquid polishing parameters as the first liquid polishing tank 11 are maintained. S4: Repeat S2 and S3 at least once; S5: Complete the liquid polishing process, move the placement mechanism 2 out of the liquid polishing mechanism 1 through the drive mechanism 3, and perform subsequent cleaning and drying treatment on the cover glass 4.

[0044] In some embodiments, the liquid polishing parameters include the concentration of the NaOH solution, the temperature, and the liquid polishing time.

[0045] In this embodiment, the liquid polishing method for the cover glass 4 involves setting the liquid polishing parameters in steps S2 to S4 to a NaOH solution concentration greater than 50% and a temperature above 100 degrees Celsius. If the total etching time is 2000 seconds, it is divided into four segments: first, the cover glass enters the first liquid polishing tank 11 for 500 seconds of etching; then, the drive mechanism 3 pulls out the placement mechanism 2 into the second liquid polishing tank 12 for another 500 seconds of etching; subsequently, the placement mechanism 2 re-enters the first liquid polishing tank 11 for 500 seconds; and finally, it enters the second liquid polishing tank 12 for 500 seconds, after which the chemical etching ends. The etching time can be flexibly determined based on the specific etching state. For example, if the cover glass 4 is statically in the liquid polishing tank, and after 500 seconds the shelf mark is visible, but after 400 seconds the etching mark is no longer visible, then each segment can be set to less than or equal to 400 seconds, and the segments can be divided according to the total time. In S5, cleaning involves removing the strong alkali. This can be done by immersing the cover glass in a clean water tank, using multiple tanks and soaking each tank for approximately 3 minutes to achieve a thorough cleaning. Drying can be achieved by air drying.

[0046] Through the above technical solution, the overall liquid polishing process is simple and non-redundant, with strong cycle time, which not only achieves high liquid polishing efficiency, but also ensures the liquid polishing processing quality of cover glass 4, and greatly improves the production yield of cover glass 4.

[0047] In this application, unless otherwise expressly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.

[0048] In the description of this application, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship commonly used when the product of this application is in use. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation on this application. In addition, the terms "first," "second," and "third," etc., are only used to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0049] Furthermore, terms such as "horizontal," "vertical," and "sag" do not imply that components must be absolutely horizontal or suspended, but rather that they can be slightly tilted. For example, "horizontal" simply means that its direction is more horizontal relative to "vertical," and does not mean that the structure must be completely horizontal, but can be slightly tilted.

[0050] In this application, unless otherwise expressly specified and limited, "above or below" a first feature may include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on" a first feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" a first feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0051] Although the description of this application has been made in conjunction with the specific embodiments described above, it is obvious to those skilled in the art that many substitutions, modifications, and variations can be made based on the above description. Therefore, all such substitutions, modifications, and variations are included within the spirit and scope of the appended claims.

Claims

1. A cover glass liquid polishing device, characterized in that, include: The liquid polishing mechanism (1) includes a first liquid polishing tank (11) and a second liquid polishing tank (12) arranged side by side. The bottom of the first liquid polishing tank (11) is provided with a first support part (111), and the bottom of the second liquid polishing tank (12) is provided with a second support part (112). The first support part (111) and the second support part (112) are separated by a first distance in the vertical direction. The first support part (111) and the second support part (112) are used to support the bottom of the cover glass. The storage mechanism (2) is used to load the cover glass to be processed; the storage mechanism (2) is placed in the first liquid polishing tank (11) or the second liquid polishing tank (12); and A drive mechanism (3) is provided on one side of the liquid polishing mechanism (1) for controlling the movement of the placement mechanism (2) between the first liquid polishing pool (11) and the second liquid polishing pool (12) so that the cover glass in the placement mechanism (2) is alternately liquid polished between the first liquid polishing pool (11) and the second liquid polishing pool (12).

2. The cover glass liquid polishing device according to claim 1, characterized in that, The first distance is any value between 10mm and 30mm.

3. The cover glass liquid polishing device according to claim 1, characterized in that, The storage mechanism (2) includes oppositely arranged side plates (21), several support members (22) and several limiting parts (23); The limiting part (23) is connected between the side plates (21) and is located at the four corners of the side plates (21); The support member (22) is connected between the side plates (21) and is located on both sides of the lower end of the side plate (21) corresponding to the lower part of the limiting part (23); In the horizontal direction, with the central axis of the side plate (21) as the center, the adjacent support members (22) are symmetrically arranged, the adjacent limiting parts (23) are symmetrically arranged, and the distance between the adjacent support members (22) is less than the distance between the adjacent limiting parts (23).

4. The cover glass liquid polishing device according to claim 3, characterized in that, The limiting part (23) includes a body (231) and a number of locking blocks (232). The locking blocks (232) are evenly spaced and fitted onto the body (231). The locking blocks (232) are provided with locking grooves (233), which are used to place and limit the edge of the cover glass.

5. The cover glass liquid polishing device according to claim 3, characterized in that, The storage mechanism (2) also includes a partition (24), which is disposed between the side plates (21) and parallel to the side plates (21), and passes through the support member (22) and the limiting part (23).

6. The cover glass liquid polishing device according to claim 5, characterized in that, The lower end of the partition (24) is provided with a groove (241).

7. The cover glass liquid polishing device according to claim 3, characterized in that, The storage mechanism (2) also includes several reinforcing rods (25), which are connected between the side plates (21) and located between adjacent limiting parts (23); the central axis of the reinforcing rods (25) is parallel to the central axis of the limiting part (23).

8. The cover glass liquid polishing device according to claim 3, characterized in that, The upper end of the side plate (21) is provided with a hanging part (211), and the hanging part (211) is detachably connected to the driving component.

9. A method for liquid polishing cover glass, characterized in that, The cover glass liquid polishing apparatus according to any one of claims 1-8 comprises the following steps: S1: Load the cover glass to be processed onto the placement mechanism (2); S2: Move the placement mechanism (2) into the first liquid polishing tank (11) through the driving mechanism (3) so that the bottom of the cover glass is in close contact with the first support part (111), inject NaOH solution into the first liquid polishing tank (11), and set the initial liquid polishing parameters; S3: After the initial liquid polishing is completed, the placement mechanism (2) is moved to the second liquid polishing tank (12) by the driving mechanism (3) so that the bottom of the cover glass is in close contact with the second support part (112). NaOH solution is continued to be injected into the second liquid polishing tank (12) and the same liquid polishing parameters as the first liquid polishing tank (11) are maintained. S4: Repeat S2 and S3 at least once; S5: Complete the liquid polishing process, move the placement mechanism (2) out of the liquid polishing mechanism (1) through the drive mechanism (3), and perform subsequent cleaning and drying treatment on the cover glass.

10. The cover glass liquid polishing method according to claim 9, characterized in that, The liquid polishing parameters include the concentration of the NaOH solution, the temperature, and the liquid polishing time.

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