Srafs adding method, device, storage medium and electronic equipment

Abstract

The application discloses an SRAF adding method, device, storage medium and electronic equipment, wherein the SRAF adding method comprises the following steps: obtaining a target layer layout, an original SRAF and a process design rule; extracting a target feature from the target layer layout and extracting a minimum safety distance from the process design rule; expanding the target feature and the original SRAF according to the minimum safety distance to form a blocking area; calculating a difference set of the blocking area and a boundary of the target layer layout to obtain a plurality of blank areas; generating a plurality of candidate SRAFs based on the blank areas and determining a target SRAF from the plurality of candidate SRAFs according to a preset rule; and merging the target SRAF and the candidate SRAF to generate a final SRAF set. The embodiment of the application can automatically identify the blank areas and adaptively generate the SRAF in the blank areas.

Description

TECHNICAL FIELD

[0001] Embodiments of the present application relate to the technical field of semiconductor technology, and in particular to a SRAF adding method and device, a storage medium and an electronic device. BACKGROUND

[0002] A photolithography process is a key step in integrated circuit manufacturing, and resolution and pattern accuracy directly affect device performance and yield. With the shrinking of process nodes, the use of optical proximity correction (OPC) and sub-resolution assist features (SRAF) has become an important means to ensure pattern printability. SRAF adds small auxiliary structures that do not participate in the formation of the final pattern near the target pattern, changes the local optical interference conditions, and thus improves the edge placement error (EPE), critical dimension (CD) distribution, and contour consistency of the target pattern.

[0003] However, in the context of via layers and high-density or irregularly arranged scenes, the existing SRAF placement method often leaves several blank areas (i.e., positions where SRAF can theoretically be placed but are not filled) on the layout when adhering to process minimum spacing and conflict removal rules. These blank areas can cause an increase in local edge placement error (EPE), CD deviation, or the generation of new printing hotspots. SUMMARY

[0004] Embodiments of the present application provide a SRAF adding method, device, storage medium, and electronic device, which can automatically identify blank areas and adaptively generate SRAF in the blank areas.

[0005] In a first aspect, embodiments of the present application provide a SRAF adding method, comprising:

[0006] obtaining a target layer layout, original SRAF, and process design rules;

[0007] extracting target features from the target layer layout and minimum safety spacing from the process design rules;

[0008] dilating the target features and the original SRAF according to the minimum safety spacing to form a blocked area;

[0009] calculating the difference set of the blocked area and the target layer layout boundary to obtain several blank areas;

[0010] generating a plurality of candidate SRAFs based on the blank area, and determining a target SRAF from the plurality of candidate SRAFs according to a preset rule;

[0011] merging the target SRAF with the candidate SRAFs to generate a final SRAF set.

[0012] In the SRAF adding method provided in the embodiments of the present application, the expanding the target feature and the original SRAF according to the minimum safety distance to form a blocking area comprises:

[0013] determining a buffer distance for expansion according to the minimum safety distance;

[0014] performing a geometric buffer operation on the target feature and the original SRAF respectively according to the buffer distance to form corresponding expansion polygons;

[0015] preprocessing the expansion polygons to generate a blocking area.

[0016] In the SRAF adding method provided in the embodiments of the present application, the preprocessing the expansion polygons to generate a blocking area comprises:

[0017] performing a set operation on a plurality of the expansion polygons to obtain a blocking polygon set;

[0018] performing splicing and deduplication processing on the blocking polygon set to generate a blocking area.

[0019] In the SRAF adding method provided in the embodiments of the present application, the generating a plurality of candidate SRAFs based on the blank area comprises:

[0020] performing geometric analysis on a plurality of the blank areas respectively, and determining a candidate SRAF generation strategy according to the geometric analysis results;

[0021] generating a preliminary SRAF in a corresponding blank area according to the candidate SRAF generation strategy;

[0022] performing screening on a plurality of the preliminary SRAFs to generate a plurality of candidate SRAFs.

[0023] In the SRAF adding method provided in the embodiments of the present application, the determining a candidate SRAF generation strategy according to the geometric analysis results comprises:

[0024] when the area of the blank area is greater than a first preset area and is in a regular shape, generating a preliminary SRAF in the blank area by using a maximum inscribed rectangle method;

[0025] When the area of the blank region is smaller than a second preset area or is irregular, a grid method is used to generate preliminary SRAFs in the blank region;

[0026] When the blank region is in the shape of a long and narrow channel, a skeleton extraction method is used to generate preliminary SRAFs in the blank region.

[0027] In the SRAF adding method provided in the embodiments of the present application, the screening of the preliminary SRAFs to generate candidate SRAFs includes:

[0028] The size screening is performed on the preliminary SRAFs to eliminate preliminary SRAFs with a width smaller than a preset minimum width or a length greater than a preset maximum length, to obtain candidate SRAFs.

[0029] In the SRAF adding method provided in the embodiments of the present application, the determination of the target SRAF from the candidate SRAFs according to a preset rule includes:

[0030] The priority evaluation is performed on the candidate SRAFs, and a candidate SRAF with a priority higher than a preset threshold is selected as a candidate set according to the priority evaluation result.

[0031] Optical simulation or contour simulation is performed on the candidate set.

[0032] The target SRAF is determined from the candidate set according to the simulation result.

[0033] In a second aspect, the embodiments of the present application provide an SRAF adding device, which includes:

[0034] An acquisition unit is configured to acquire a target layer layout, original SRAFs and process design rules;

[0035] An extraction unit is configured to extract target features from the target layer layout and a minimum safety distance from the process design rules;

[0036] An expansion unit is configured to expand the target features and the original SRAFs according to the minimum safety distance to form a blocking region;

[0037] A calculation unit is configured to calculate a difference set of the blocking region and a boundary of the target layer layout to obtain blank regions;

[0038] A determination unit is configured to generate candidate SRAFs based on the blank regions and determine a target SRAF from the candidate SRAFs according to a preset rule;

[0039] A merging unit is configured to merge the target SRAF and the candidate SRAFs to generate a final SRAF set.

[0040] In a third aspect, the present application provides a storage medium, which stores a plurality of instructions, and the instructions are adapted to be loaded by a processor to execute the SRAF adding method according to any one of the above aspects.

[0041] In a fourth aspect, the present application provides an electronic device, which comprises a memory, a processor and a computer program stored in the memory and executable on the processor, wherein the processor implements the SRAF adding method according to any one of the above aspects when executing the computer program.

[0042] To sum up, the SRAF adding method provided by the embodiments of the present application comprises: obtaining a target layer layout, an original SRAF and a process design rule; extracting a target feature from the target layer layout and extracting a minimum safety distance from the process design rule; expanding the target feature and the original SRAF according to the minimum safety distance to form a blocking area; calculating a difference set of the blocking area and a boundary of the target layer layout to obtain a plurality of blank areas; generating a plurality of candidate SRAs based on the blank areas and determining a target SRA from the plurality of candidate SRAs according to a preset rule; and merging the target SRA and the candidate SRAs to generate a final SRA set. The embodiments of the present application can automatically identify blank areas and adaptively generate SRAs in the blank areas, which realizes significant improvement in local EPE / CD and contour consistency, reduction in manual intervention and reduction in new hotspot and conflict risks on the premise of taking into account process constraints and simulation efficiency, thereby improving lithography imaging quality and manufacturing yield. BRIEF DESCRIPTION OF DRAWINGS

[0043] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed in the embodiment description will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor.

[0044] Figure 1 is an application scenario diagram of the SRAF adding method provided by the embodiments of the present application.

[0045] Figure 2 is a flow diagram of the SRAF adding method provided by the embodiments of the present application.

[0046] Figure 3 is a structural diagram of the SRAF adding device provided by the embodiments of the present application.

[0047] Figure 4 is a structural diagram of the electronic device provided by the embodiments of the present application. DETAILED DESCRIPTION

[0048] The exemplary embodiments will be described in detail herein with reference to the attached drawings. In the following description, like reference numerals refer to like elements, unless the context clearly dictates otherwise. The following description is not intended to represent all embodiments in accordance with the present application. Rather, they merely represent typical embodiments in accordance with a portion of the application, as detailed in the appended claims.

[0049] It should be noted that, in the present document, the terms "comprises", "comprising", or any other variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but can also include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element preceded by "comprises... a" does not, without more constraints, foreclose the existence of additional identical elements in the process, method, article, or apparatus that comprises the element. Also, like-named components having a same or similar function are typically identified in the description for each embodiment of the application.

[0050] It should be understood that the exemplary embodiments described herein are intended to explain the application and not to limit the application.

[0051] In the following description, suffixes "module", "part", or "unit" used for an element are merely intended for facilitating the description of the application, and are not intended to limit the application. Therefore, "module", "part", or "unit" can be mixedly used.

[0052] In the description of the present application, it should be noted that the terms "upper", "lower", "left", "right", "inner", "outer", and the like, indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are merely used to facilitate the description of the present application and simplify the description, and do not indicate or imply that the indicated device or element must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application. In addition, the terms "first", "second", and the like are used only for the purpose of description and cannot be understood as indicating or implying relative importance.

[0053] In the context of via layers and high-density or irregularly shaped arrangements, the existing SRAF placement method often leaves several blank areas (i.e., theoretically, SRAF can be placed but not filled) on the layout when following the process minimum distance and conflict removal rules. These blank areas will cause local EPE to increase, CD to shift, or new printing hotspots to be generated.

[0054] Based on this, the embodiment of the application provides an SRAF adding method, device, storage medium and electronic equipment. Specifically, the SRAF adding device can be integrated in the electronic equipment, which can be a server or a terminal and the like. The terminal can include a mobile phone, a wearable smart device, a tablet computer, a notebook computer, a personal computer (PC) and the like. The server can be a single server or a server cluster composed of multiple servers, and can be a physical server or a virtual server.

[0055] For example, as shown in Figure 1 The electronic equipment can obtain a target layer layout, an original SRAF and a process design rule, extract a target feature from the target layer layout, and extract a minimum safety distance from the process design rule. The target feature and the original SRAF are expanded according to the minimum safety distance to form a blocking area. The difference set of the blocking area and the target layer layout boundary is calculated to obtain a plurality of blank areas. A plurality of candidate SRAFs are generated based on the blank areas, and a target SRAF is determined from the plurality of candidate SRAFs according to a preset rule. The target SRAF and the candidate SRAF are merged to generate a final SRAF set.

[0056] The technical solutions shown in the application will be described in detail below through specific embodiments. It should be noted that the order of the following embodiments is not limited to the priority order of the embodiments.

[0057] Please refer to Figure 2 , Figure 2 is a flowchart of the SRAF adding method provided by the embodiment of the application. The specific process of the SRAF adding method can be as follows:

[0058] 101、Obtain a target layer layout, an original SRAF and a process design rule.

[0059] The target layer layout refers to the geometric data set of the target layer (such as the via layer) that needs to be added or supplemented with SRAF for photolithography correction in the integrated circuit design layout file (such as GDSII or OASIS file). The target layer layout can include the shape, position, arrangement information of all design patterns on the target layer, as well as die boundary or tile division information. For example, in the application scenario of the via layer, the target layer layout is the geometric boundary and distribution of all vias in the layer.

[0060] The original SRAF refers to a set of auxiliary features that have been placed around the target layer in the conventional SRAF generation process according to the geometric rules and process constraints (such as minimum spacing, minimum width, etc.) of the target layer. The original SRAF is usually stored as a separate layer in the layout file to improve the optical imaging effect of the target pattern.

[0061] The process design rule refers to a set of parameters specified by the semiconductor process flow for constraining the placement of auxiliary features and layout design, referred to as "MRC" for short. The rule includes but is not limited to: minimum safe spacing, minimum line width, maximum line length, aspect ratio limit, whether to allow non-axial placement, raster resolution, candidate area threshold, and lithography simulation criteria, etc. As an external input condition, the process design rule can ensure that the generation and selection process of SRAF conforms to the manufacturing process limit, avoiding the generation of new conflicts or hotspots.

[0062] 102、extract the target feature from the target layer layout and the minimum safe spacing from the process design rule.

[0063] Specifically, the target feature refers to the geometric pattern (such as the boundary of the via) that actually needs to be imaged on the target layer, which can be obtained by analyzing the corresponding layer data in the target layer layout. The minimum safe spacing is specified in the process design rule, which usually represents the minimum allowed spacing between SRAF and target pattern or other structures.

[0064] 103、expand the target feature and the original SRAF according to the minimum safe spacing to form a blocking region.

[0065] Specifically, a geometric buffer operation method can be used to perform an outward expansion operation on the target feature and the original SRAF respectively, and the buffer distance of the expansion is the aforementioned minimum safe distance, thereby obtaining the corresponding expansion polygons. Merging these expansion polygons, the blocking region covering all prohibited placement regions is obtained. The blocking region is used to identify the range where SRAF cannot be placed to ensure that the subsequently generated candidate SRAF meets the process safety requirements.

[0066] That is, step 104 can be as follows: first, determine the buffer distance for expansion according to the minimum safe distance given in the process design rule; then, perform a geometric buffer operation on the target feature and the original minimum safe spacing SRAF minimum safe spacing respectively using the buffer distance, thereby obtaining a plurality of expansion polygons; finally, pre-process the expansion polygons to generate a blocking region for identifying prohibited minimum safe spacing SRAF minimum safe spacing. Through the above-mentioned manner, the safety boundaries of all target features and original minimum safe spacing SRAF minimum safe spacing can be uniformly represented, avoiding the occurrence of boundary crossing or conflict in the subsequent candidate minimum safe spacing SRAF minimum safe spacing generation process.

[0067] In another specific embodiment, the process of preprocessing the expanded polygons to generate the blocking region can be as follows: first, perform a union operation on the plurality of expanded polygons to obtain a set of blocking polygons; then, perform a stitching and deduplication operation on the set of blocking polygons to eliminate overlapping, adjacent or redundant boundaries, thereby forming a unique and continuous blocking region. The blocking region thus obtained can cover all regions where the minimum safe distance SRAF cannot be placed, and avoid misjudgment caused by repeated boundaries or geometric fragments, ensuring the integrity and accuracy of the blocking region.

[0068] 104. Calculate the difference set of the blocking region and the target layer layout boundary to obtain a plurality of blank regions.

[0069] The target layer layout boundary refers to the minimum envelope polygon of all design patterns in the target layer, which can be obtained by analyzing the corresponding layer data in the target layer layout file (such as GDSII or OASIS file). The obtained boundary data should retain the original geometric constraint information of the layout to ensure the accuracy of the subsequent difference set operation.

[0070] Specifically, the difference set operation can be performed on the blocking region and the target layer layout boundary to exclude the regions where the minimum safe distance SRAF cannot be placed, and only keep the blank regions that can be used to generate SRAF. The difference set operation can use standard computational geometry algorithms, such as polygon Boolean operation, combined with spatial index optimization methods (such as R-tree or Quadtree), to ensure the operation efficiency and accuracy.

[0071] 105. Generate a plurality of candidate SRAFs based on the blank regions, and determine the target SRAF from the plurality of candidate SRAFs according to a preset rule.

[0072] In some embodiments, the plurality of blank regions can be geometrically analyzed first, and the candidate SRAF generation strategy can be determined according to the geometric analysis results; the initial SRAFs can be generated in the corresponding blank regions according to the candidate SRAF generation strategy; the plurality of initial SRAFs can be screened to generate a plurality of candidate SRAFs. Finally, the target SRAF can be determined from the plurality of candidate SRAFs according to a preset rule.

[0073] For example, when the area of the blank region is greater than the first preset area and has a regular shape (e.g., close to a rectangle or a square), a maximum inscribed rectangle method can be used to generate the preliminary SRAF in the blank region. This embodiment can find the maximum rectangular region that meets the minimum line width and minimum safety distance requirements inside the blank region, and place the SRAF inside the rectangle, which can ensure that the SRAF covers the center of the region as evenly as possible, thereby making full use of the blank region space. This embodiment can generate larger and regular SRAFs in a large regular area, thereby improving the edge contrast of the target feature and the optical imaging uniformity, while avoiding unstable imaging effects caused by too small SRAF size or scattered distribution.

[0074] For example, when the area of the blank region is less than the second preset area or has an irregular shape (e.g., curved, bifurcated, or uneven), a gridding method can be used to generate the preliminary SRAF in the blank region. Specifically, the blank region can be divided into a plurality of grid cells, and the size and spacing of each grid cell meet the minimum line width and safety distance constraints. Then, a suitable grid cell is selected as the SRAF placement position according to the grid position and process design rules. Through the gridding method, SRAFs can be regularly placed even in complex or small area regions, avoiding the situation of SRAF repetition or conflict caused by irregular regions, while ensuring that the SRAF maintains a safety distance from the target feature.

[0075] For example, when the blank region has a long and narrow channel shape (when the blank region has a long, narrow, or channel-shaped structure, and the width is limited), a skeleton extraction method can be used to generate the preliminary SRAF in the blank region. Specifically, the blank region can be skeletonized first to extract the center line of the region and form a skeleton line. Then, the SRAF is placed evenly along the skeleton line, so that the SRAF is arranged as much as possible along the center line while maintaining a minimum safety distance from the channel edge. The skeleton extraction method can make full use of the limited space in the long and narrow region, avoid conflicts between the SRAF and the target feature or the blocking region, and ensure that the auxiliary feature is effectively distributed in the channel, thereby improving the imaging effect and process manufacturability.

[0076] In the step of "selecting a plurality of preliminary SRAFs to generate a plurality of candidate SRAFs", the size of the preliminary SRAF can be screened to remove the preliminary SRAF with a width less than a preset minimum width or a length greater than a preset maximum length, thereby obtaining a plurality of candidate SRAFs.

[0077] The size screening can eliminate the primary SRAFs with too small width or too large length, ensuring that each candidate SRAF meets the process design rules such as minimum line width, minimum spacing and maximum length limit, and avoiding the generation of SRAFs that cannot be manufactured or are prone to breakage. The screened candidate SRAFs can be reasonably distributed around the target feature, improving the lithography imaging effect, for example, improving the edge contrast, enhancing the feature imaging uniformity, while avoiding the generation of new imaging hot spots. By eliminating the non-compliant or poor-effect SRAFs in advance, the amount of calculation in the subsequent optical simulation, priority evaluation and target SRAF determination process is reduced, and the efficiency and reliability of the overall SRAF addition process are improved.

[0078] In some embodiments, the step of "determining a target SRAF from the candidate SRAFs according to preset rules" can specifically be: performing priority evaluation on the candidate SRAFs, and selecting candidate SRAFs with priority higher than a preset threshold as a candidate set according to the priority evaluation result; performing optical simulation or contour simulation on the candidate set; and determining the target SRAF from the candidate set according to the simulation result.

[0079] The priority evaluation can score the SRAFs according to the optical improvement effect on the target feature, the minimum spacing with the target feature and other design rule constraints. According to the priority evaluation result, the candidate SRAFs with priority higher than a preset threshold are selected to form a candidate set. Subsequently, optical simulation or contour simulation is performed on the candidate set to further evaluate the contribution of each candidate SRAF to the imaging quality of the target feature. For example, the influence of the SRAF on the edge contrast and imaging uniformity can be analyzed through optical transfer function (OTF), point spread function (PSF) or contour simulation. Finally, the target SRAF is determined from the candidate set according to the simulation result. The determined target SRAF can effectively improve the optical imaging effect of the target feature and meet the process design rules and safety spacing constraints. Through this step, the optimal SRAF set can be screened, providing a basis for subsequent merging with the original SRAF and final layout generation.

[0080] 106、Merging the target SRAF with the candidate SRAF to generate a final SRAF set.

[0081] Specifically, the original SRAF can be first preliminarily merged with the target SRAF to aggregate the geometric data of all SRAFs including position, size and shape information. Subsequently, conflict detection is performed on the merged final SRAF set to check whether there is overlap between the SRAFs, the spacing is less than the minimum safety spacing or there is conflict with the target feature. For the conflict part, it can be processed by deleting, adjusting the position or modifying the size, etc. to ensure that each SRAF meets the process constraints.

[0082] After the merging is completed, boundary optimization and arrangement can also be performed on the SRAF set to remove redundant boundaries or small fragments to form a continuous and standard geometric pattern set. The finally generated SRAF set includes both the original SRAF and the target SRAF generated by supplement, and all the SRAFs meet the process design rules such as minimum width, minimum spacing and maximum length.

[0083] The embodiment of the present application can realize unified management of the original SRAF and the target SRAF, avoid repetition or conflict, improve the edge contrast of the target feature and the imaging uniformity, and at the same time ensure the manufacturability of the final SRAF set and the direct use of the final SRAF set for subsequent optical simulation and manufacturing verification.

[0084] To sum up, the SRAF adding method provided by the embodiment of the present application includes obtaining a target layer layout, an original SRAF and process design rules; extracting a target feature from the target layer layout and extracting a minimum safe spacing from the process design rules; expanding the target feature and the original SRAF according to the minimum safe spacing to form a blocking area; calculating the difference set of the blocking area and the target layer layout boundary to obtain a plurality of blank areas; generating a plurality of candidate SRAFs based on the blank areas, and determining a target SRAF from the plurality of candidate SRAFs according to a preset rule; and merging the target SRAF and the candidate SRAF to generate a final SRAF set. The embodiment of the present application can automatically identify the blank area and adaptively generate SRAF in the blank area, realize significant improvement of local EPE / CD and contour consistency, reduction of manual intervention and reduction of new hotspot and conflict risk under the premise of considering process constraints and simulation efficiency, and thus improve the lithography imaging quality and manufacturing yield.

[0085] In order to better implement the SRAF adding method provided by the embodiment of the present application, the embodiment of the present application further provides an SRAF adding device. The meanings of the terms are the same as those in the above SRAF adding method, and the specific implementation details can be referred to the description in the method embodiment.

[0086] Please refer to Figure 3 , Figure 3 is a structural schematic diagram of the SRAF adding device provided by the embodiment of the present application. The SRAF adding device can include an acquisition unit 201, an extraction unit 202, an expansion unit 203, a calculation unit 204, a determination unit 205 and a merging unit 206. Among them,

[0087] The acquisition unit 201 is configured to acquire a target layer layout, an original SRAF and process design rules;

[0088] The extraction unit 202 is configured to extract a target feature from the target layer layout and extract a minimum safe spacing from the process design rules;

[0089] The expansion unit 203 is configured to expand the target feature and the original SRAF according to the minimum safety distance to form a blocking area;

[0090] The calculation unit 204 is configured to calculate a difference set of the blocking area and a boundary of the target layer layout to obtain a plurality of blank areas;

[0091] The determination unit 205 is configured to generate a plurality of candidate SRAFs based on the blank areas, and determine a target SRAF from the plurality of candidate SRAFs according to a preset rule;

[0092] The merging unit 206 is configured to merge the target SRAF and the candidate SRAF to generate a final SRAF set.

[0093] The specific implementation of each unit can refer to the above-mentioned embodiments of the SRAF adding method, which will not be repeated here.

[0094] To sum up, the SRAF adding device provided by the embodiments of the present application can obtain a target layer layout, an original SRAF and a process design rule through the obtaining unit 201; the extraction unit 202 extracts a target feature from the target layer layout and extracts a minimum safety distance from the process design rule; the expansion unit 203 expands the target feature and the original SRAF according to the minimum safety distance to form a blocking area; the calculation unit 204 calculates a difference set of the blocking area and a boundary of the target layer layout to obtain a plurality of blank areas; the determination unit 205 generates a plurality of candidate SRAFs based on the blank areas, and determines a target SRAF from the plurality of candidate SRAFs according to a preset rule; and the merging unit 206 merges the target SRAF and the candidate SRAF to generate a final SRAF set. The embodiments of the present application can automatically identify blank areas and adaptively generate SRAFs in the blank areas, which realizes significant improvement in local EPE / CD and profile consistency, reduction in manual intervention and reduction in new hotspot and conflict risk under the premise of taking into account process constraints and simulation efficiency, thereby improving lithography imaging quality and manufacturing yield.

[0095] The embodiments of the present application also provide an electronic device, which can be integrated with the SRAF adding device of the embodiments of the present application, as shown in FIG. 1, which shows a structural schematic diagram of an electronic device related to the embodiments of the present application, in particular: Figure 4

[0096] The electronic device can include a processor 301 with one or more processing cores and a memory 302 with one or more computer readable storage media, and the like. Those skilled in the art can understand that, Figure 4 ​The electronic device structure shown in the figures does not constitute a limitation on the electronic device, and can include more or fewer components than shown, or combine certain components, or arrange the components differently. Among them:

[0097] The processor 301 is the control center of the electronic device, connects various parts of the entire electronic device through various interfaces and lines, and performs various functions of the electronic device and processes data by running or executing software programs and / or the present application stored in the memory 302, and calling data stored in the memory 302, thereby monitoring the entire electronic device. Optionally, the processor 301 can include one or more processing cores; preferably, the processor 301 can integrate an application processor and a modem processor, wherein the application processor mainly processes operation storage media, user interfaces, and application programs, etc., and the modem processor mainly processes wireless communication. It can be understood that the above-mentioned modem processor can also not be integrated into the processor 301.

[0098] The memory 302 can be used to store software programs and the present application, and the processor 301 executes various function applications and data processing by running the software programs stored in the memory 302 and the present application. The memory 302 can mainly include a program storage area and a data storage area, wherein the program storage area can store application programs required by at least one function, such as operation storage media; the data storage area can store data created according to the use of the electronic device, etc. In addition, the memory 302 can include a high-speed random access memory, and can also include a non-volatile memory, such as at least one magnetic disk storage device, a flash memory device, or other volatile solid-state memory device. Accordingly, the memory 302 can also include a memory controller to provide access for the processor 301 to the memory 302.

[0099] Although not shown, the electronic device can also include a display unit, an input unit, a power supply, etc., which will not be described here. In particular, in the present embodiment, the processor 301 in the electronic device will load the executable file corresponding to the process of one or more application programs into the memory 302 according to the following instructions, and run the application programs stored in the memory 302 by the processor 301, thereby realizing various functions, as follows:

[0100] Obtain a target layer layout, an original SRAF, and a process design rule;

[0101] Extract target features from the target layer layout, and extract minimum safety distances from the process design rule;

[0102] Expand the target features and the original SRAF according to the minimum safety distances to form a blocking area;

[0103] calculate a difference set of the blocking region and a boundary of the target layer layout to obtain a plurality of blank regions;

[0104] generate a plurality of candidate SRAFs based on the blank regions, and determine the target SRAF from the plurality of candidate SRAFs according to a preset rule;

[0105] merge the target SRAF and the candidate SRAF to generate a final SRAF set.

[0106] Those skilled in the art can understand that all or part of the steps in the various methods of the above embodiments can be completed by instructions, or by related hardware controlled by the instructions, which can be stored in a computer readable storage medium and loaded and executed by a processor.

[0107] To this end, an embodiment of the present application provides a storage medium, which stores a plurality of instructions. The instructions can be loaded by a processor to execute steps in any method provided by an embodiment of the present application. For example, the instructions can execute the following steps:

[0108] obtain a target layer layout, an original SRAF and a process design rule;

[0109] extract target features from the target layer layout, and extract a minimum safety distance from the process design rule;

[0110] dilate the target features and the original SRAF according to the minimum safety distance to form a blocking region;

[0111] calculate a difference set of the blocking region and a boundary of the target layer layout to obtain a plurality of blank regions;

[0112] generate a plurality of candidate SRAFs based on the blank regions, and determine the target SRAF from the plurality of candidate SRAFs according to a preset rule;

[0113] merge the target SRAF and the candidate SRAF to generate a final SRAF set.

[0114] The specific implementation of each operation can be referred to the foregoing embodiments, which will not be described here.

[0115] The storage medium can include a read only memory (ROM), a random access memory (RAM), a magnetic disk or an optical disk, etc.

[0116] Since the instructions stored in the storage medium can execute steps in any method provided by an embodiment of the present application, the beneficial effects that can be achieved by any method provided by an embodiment of the present application can be achieved. Details can be referred to the foregoing embodiments, which will not be described here.

[0117] The SRAF adding method, device, storage medium and electronic equipment provided by the present application are described in detail above, and the principles and implementation manners of the present application are described by applying specific examples in the present text. The above example descriptions are only used to help understand the core idea of the present application; meanwhile, for those skilled in the art, the specific implementation manners and application ranges will be changed according to the idea of the present application. In summary, the content of the present specification should not be understood as a limitation of the present application.

Claims

1. A method for adding SRAF, characterized in that, include: Obtain the target layer layout, original SRAF, and process design rules; Target features are extracted from the target layer layout, and minimum safety clearance is extracted from the process design rules. The target features are geometric shapes. The buffer distance for expansion is determined based on the minimum safety clearance. Geometric buffering operations are performed on the target feature and the original SRAF according to the buffer distance to form the corresponding expanded polygon; A set of blocking polygons is obtained by performing a union operation on several of the aforementioned expanded polygons. The blocking polygon set is spliced ​​and deduplicated to generate the blocking region; Calculate the difference between the blocked region and the boundary of the target layer layout to obtain several blank areas; Geometric analysis is performed on several blank regions, and candidate SRAF generation strategies are determined based on the results of the geometric analysis. According to the candidate SRAF generation strategy, preliminary SRAFs are generated in the corresponding blank areas respectively; The preliminary SRAFs are screened to generate a number of candidate SRAFs, and the target SRAF is determined from the number of candidate SRAFs according to preset rules. The target SRAF is merged with the original SRAF to generate the final SRAF set.

2. The SRAF addition method as described in claim 1, characterized in that, The step of determining the candidate SRAF generation strategy based on geometric analysis results includes: When the area of ​​the blank region is larger than the first preset area and has a regular shape, the maximum inscribed rectangle method is used to generate a preliminary SRAF in the blank region. When the area of ​​the blank region is smaller than the second preset area or is irregular in shape, a rasterization method is used to generate a preliminary SRAF within the blank region. When the blank area is in the shape of a narrow channel, a preliminary SRAF is generated within the blank area using a skeleton extraction method.

3. The SRAF addition method as described in claim 1, characterized in that, The step of filtering the preliminary SRAFs to generate a number of candidate SRAFs includes: Size screening is performed on several of the initial SRAFs to remove those with a width smaller than a preset minimum width or a length greater than a preset maximum length, thus obtaining several candidate SRAFs.

4. The SRAF addition method as described in claim 1, characterized in that, The step of determining the target SRAF from a plurality of candidate SRAFs according to a preset rule includes: Priority evaluation is performed on several candidate SRAFs, and candidate SRAFs with priority higher than a preset threshold are selected as candidate sets based on the priority evaluation results. Perform optical simulation or contour simulation on the candidate set; The target SRAF is determined from the candidate set based on the simulation results.

5. An SRAF adding device, characterized in that, include: The acquisition unit is used to acquire the target layer layout, the original SRAF, and the process design rules. An extraction unit is used to extract target features from the target layer layout and extract minimum safety spacing from the process design rules, wherein the target features are geometric shapes; An expansion unit is used to determine a buffer distance for expansion based on the minimum safety distance; perform geometric buffering operations on the target feature and the original SRAF according to the buffer distance to form corresponding expansion polygons; and perform a union operation on several expansion polygons to obtain a set of blocking polygons. The blocking polygon set is spliced ​​and deduplicated to generate the blocking region; The calculation unit is used to calculate the difference between the boundary of the blocking region and the boundary of the target layer layout to obtain several blank regions; The determining unit is used to perform geometric analysis on several blank areas respectively, and determine a candidate SRAF generation strategy based on the geometric analysis results; generate preliminary SRAFs in the corresponding blank areas according to the candidate SRAF generation strategy; filter the several preliminary SRAFs to generate several candidate SRAFs, and determine the target SRAF from the several candidate SRAFs according to preset rules. The merging unit is used to merge the target SRAF with the original SRAF to generate a final SRAF set.

6. A storage medium, characterized in that, The storage medium stores multiple instructions adapted for loading by a processor to execute the SRAF addition method according to any one of claims 1-4.

7. An electronic device, characterized in that, It includes a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein the processor, when executing the computer program, implements the SRAF addition method as described in any one of claims 1-4.

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