Preparation device and method of carbon nanotube coated porous silicon structure

Abstract

The application discloses a preparation device and method of carbon nanotube coated porous silicon structure and relates to the technical field of battery materials. The device comprises a main body and a processing mechanism fixed on the main body and used for reducing the particle size of silicon-based materials. An annular screen and a baffle are arranged on the main body, the annular screen is rotationally connected to the main body, and the processing mechanism is arranged in the annular screen. The baffle is rotationally connected to the annular screen, and the baffle has a material blocking state and a material discharging state when rotating with the annular screen. When the baffle is located below the processing mechanism, the baffle is in the material blocking state to drive unqualified materials to rise. The preparation device and method of carbon nanotube coated porous silicon structure can screen the materials discharged from the processing mechanism through the rotating annular screen, and the unqualified materials rise with the baffle in the material blocking state. After the baffle moves to above the processing mechanism, the unqualified materials are re-input into the processing mechanism.

Description

Technical Field

[0001] This invention relates to the field of battery materials technology, specifically to a device and method for preparing a carbon nanotube-coated porous silicon structure. Background Technology

[0002] The theoretical specific capacity of graphite is 372 mA·h / g (already reaching around 365), which limits the potential for increasing the energy density of lithium-ion batteries. Silicon-based anode materials are the preferred choice for the next generation due to their higher theoretical specific capacity (4200 mA·h / g at high temperature and 3580 mA·h / g at room temperature).

[0003] For example, the patent document with authorization announcement number CN118693272B, authorization announcement date December 31, 2024, entitled "A Carbon Nanotube-Reinforced Carbon-Coated Porous Silicon / Alloy Composite Material and Its Preparation," describes a preparation method that includes: adding a precursor to softened asphalt, stirring evenly, then rolling it into thin sheets using a roller press, cooling, crushing, then high-temperature carbonization, ball milling, and sieving; finally, chemical vapor deposition. In the resulting carbon nanotube-reinforced carbon-coated porous silicon / alloy composite material, the carbon-coated porous silicon and the nano-silicon alloy are connected by carbon nanotubes and uniformly dispersed within the carbon-coated shell; it exhibits excellent electrochemical performance as a negative electrode material.

[0004] In the existing technology, silicon-based materials need to be crushed or ground multiple times during processing, and there are particle size requirements during processing. This means that most crushing or grinding devices need to be used with screens, and the unqualified materials screened out need to be crushed or ground again. Obviously, the reprocessing of unqualified materials is quite cumbersome. Summary of the Invention

[0005] The purpose of this invention is to provide an apparatus and method for preparing carbon nanotube-coated porous silicon structures to overcome the above-mentioned shortcomings in the prior art.

[0006] To achieve the above objectives, the present invention provides the following technical solution:

[0007] An apparatus for preparing a carbon nanotube-coated porous silicon structure includes a main body and a processing mechanism fixed on the main body for reducing the particle size of the silicon-based material. The main body is provided with:

[0008] A ring screen is rotatably connected to the main body, and the processing mechanism is set inside the ring screen.

[0009] A baffle is rotatably connected to an annular screen. When the baffle rotates with the annular screen, it has a material blocking state and a material discharging state. When the baffle is below the processing mechanism, it is in the material blocking state to drive the unqualified material to rise. After the baffle moves above the processing mechanism, it switches to the material discharging state so that the material falls into the processing mechanism.

[0010] The above-mentioned apparatus for preparing a carbon nanotube-coated porous silicon structure has a circulation chamber on its main body, an annular screen rotatably connected inside the circulation chamber, and a processing mechanism fixed to the inner wall of the circulation chamber.

[0011] The aforementioned apparatus for preparing a carbon nanotube-coated porous silicon structure includes an annular screen with an annular enclosure.

[0012] In the above-mentioned apparatus for preparing a carbon nanotube-coated porous silicon structure, a gap is left between the outer wall of the annular screen and the inner wall of the circulation chamber.

[0013] The above-mentioned apparatus for preparing a carbon nanotube-coated porous silicon structure has an inlet at the top and an outlet at the bottom of the processing mechanism.

[0014] The above-mentioned apparatus for preparing a carbon nanotube-coated porous silicon structure has a feeding channel on the main body that is connected to the circulation chamber and extends into the inlet, and a discharge port at the bottom of the main body that is connected to the circulation chamber.

[0015] The above-mentioned apparatus for preparing a carbon nanotube-coated porous silicon structure includes a brush roller inside the annular screen, a connecting rod hinged to the end of the brush roller, the connecting rod being hinged to a baffle, and a first elastic element being provided between the connecting rod and the baffle.

[0016] In the aforementioned apparatus for preparing a carbon nanotube-coated porous silicon structure, as the baffle rises with the annular screen, the baffle switches to a material-blocking state, thereby driving the brush roller away from the baffle and thus driving the material on the annular screen away from the baffle. As the annular screen rotates, the material approaches the baffle again under the action of gravity, thus repeatedly screening the material.

[0017] In the aforementioned apparatus for preparing a carbon nanotube-coated porous silicon structure, after the baffle rises above the processing mechanism, the baffle switches to the discharge state to drive the brush roller closer to the baffle. At the same time, the brush roller can clean the annular screen.

[0018] A method for preparing a carbon nanotube-coated porous silicon structure, based on the apparatus for preparing a carbon nanotube-coated porous silicon structure according to any one of the above-mentioned methods, includes the following steps:

[0019] S1. Silicon powder is processed by grinding, acid washing, and solvent cleaning to obtain silicon powder with uniform particle size and less than 50 micrometers.

[0020] S2. Silicon powder is treated with hydrofluoric acid, nitric acid, hydrochloric acid, sulfuric acid, hydrogen peroxide, or a mixture thereof to obtain porous silicon.

[0021] S3. Disperse the carbon nanotubes, then mix and stir the carbon nanotubes and porous silicon. Finally, pass the stirred liquid through a long heating strip with a plate at the front until more than 80% of the solvent evaporates and a block structure is formed.

[0022] S4. Crush the blocky structure from the above steps using a crusher, and then roll the crushed material in a drum for 2 hours.

[0023] S5. Coating materials such as carbon nanotubes, graphite, carbon black, carbon fiber, graphene oxide, porous carbon, and asphalt using a coating machine.

[0024] S6. The final product is formed through processes such as depolymerization, sintering, crushing, sieving, and demagnetization.

[0025] In the above technical solution, the present invention provides a preparation device and method for carbon nanotube-coated porous silicon structure. The rotating annular screen can screen the material discharged from the processing mechanism, so that the material with a larger particle size remains in the screen. As the screen rotates, the unqualified material rises with the baffle in the material blocking state until the baffle moves above the processing mechanism. Then the baffle switches to the discharge state so that the unqualified material is put back into the processing mechanism. This forms a cycle to improve the efficiency of crushing or grinding the material to the target particle size. Attached Figure Description

[0026] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in this invention. For those skilled in the art, other drawings can be obtained based on these drawings.

[0027] Figure 1 This is a schematic diagram of the overall structure provided for an embodiment of the present invention;

[0028] Figure 2 This is a schematic diagram of the feeding channel structure provided in another embodiment of the present invention;

[0029] Figure 3 This is a schematic diagram of a brush roller structure provided in another embodiment of the present invention;

[0030] Figure 4 This is a schematic diagram of a baffle structure provided in another embodiment of the present invention;

[0031] Figure 5 This is a schematic diagram of an annular friction plate structure provided in another embodiment of the present invention;

[0032] Figure 6 This is a schematic diagram of an arc-shaped limiting plate structure provided in another embodiment of the present invention;

[0033] Figure 7 This is a schematic diagram of a stop structure provided in another embodiment of the present invention.

[0034] Explanation of reference numerals in the attached figures:

[0035] 1. Main body; 2. Processing mechanism; 3. Annular screen; 4. Baffle; 5. Circulation chamber; 6. Annular enclosure; 7. Feeding channel; 8. Discharge port; 9. Brush roller; 10. Connecting rod; 11. Connecting shaft; 12. Extension; 13. Annular friction plate; 14. Friction wheel; 15. Arc-shaped limiting plate; 16. Stop block; 17. Connecting column. Detailed Implementation

[0036] To enable those skilled in the art to better understand the technical solution of the present invention, the present invention will be further described in detail below with reference to the accompanying drawings.

[0037] Reference Figure 1-7 This invention provides a device for preparing a porous silicon structure coated with carbon nanotubes, including a main body 1 and a processing mechanism 2 fixed on the main body 1 for reducing the particle size of silicon-based materials. The main body 1 is provided with an annular screen 3 and a baffle 4. The annular screen 3 is rotatably connected to the main body 1, and the processing mechanism 2 is disposed inside the annular screen 3. The baffle 4 is rotatably connected to the annular screen 3. When the baffle 4 rotates with the annular screen 3, it has a material blocking state and a material discharging state. When the baffle 4 is below the processing mechanism 2, the baffle 4 is in the material blocking state to drive unqualified materials to rise. After the baffle 4 moves above the processing mechanism 2, the baffle 4 switches to the material discharging state so that the materials fall into the processing mechanism 2.

[0038] Specifically, the processing unit 2 can be a pulverizer or grinder from the existing technology to grind the silicon-based material to the required particle size range as needed. In the process of preparing carbon nanotube-coated porous silicon structures, the material needs to be processed through the processing unit 2 multiple times. Since most steps have requirements on the particle size of the material, a screen will be set up to work in conjunction with the processing unit 2. Obviously, the unqualified material on the screen needs to be processed in a centralized manner, which is quite cumbersome. The innovation of this invention lies in the following: an annular screen 3 and a baffle 4 are provided on the main body 1, and the processing mechanism 2 is placed inside the annular screen 3. The material discharged from the processing mechanism 2 is screened by the rotating annular screen 3 (the main body 1 is provided with a drive mechanism for rotating the annular screen 3, which is prior art and is not shown in the figure, so it will not be described in detail here). Qualified material is discharged outside the annular screen 3, while unqualified material remains inside the annular screen 3. During the rotation of the annular screen 3, the baffle 4, which is in the material blocking state, can rotate with the annular screen 3 and bring the unqualified material above the processing mechanism 2. Then, the baffle 4 switches to the discharge state (a rotating structure such as a motor can be provided on the annular screen 3 to drive the baffle 4 to rotate) so that the material is put back into the processing mechanism 2. In this way, a material processing cycle is formed, which maximizes the efficiency of material processing.

[0039] In another embodiment of the present invention, the main body 1 is further provided with a circulation cavity 5, an annular screen 3 is rotatably connected to the circulation cavity 5, and the processing mechanism 2 is fixed to the inner wall of the circulation cavity 5. An annular barrier 6 is constructed on the annular screen 3. A gap is left between the outer wall of the annular screen 3 and the inner wall of the circulation cavity 5. Specifically, the outer wall of the processing mechanism 2 is fixed to the inner wall of the circulation cavity 5 by a fixing frame or other structure, so that the processing mechanism 2 is stably positioned inside the annular screen 3; the annular screen 3 is annular in overall structure, with annular barriers 6 constructed on both sides. The inner diameter of the annular barriers 6 is smaller than the inner diameter of the annular screen 3, thus blocking the material and minimizing the possibility of material falling without screening; the edge of the circumferential surface of the annular screen 3 and the side of the annular barriers 6 are in contact with the circulation cavity 5 (i.e., the annular screen 3 is rotatably connected to the circulation cavity 5 through this part), and there is a certain gap between the circumferential surface of the annular screen 3 and the inner wall of the circulation cavity 5, so that the qualified material screened out by the annular screen 3 can fall into the circulation cavity 5 and be discharged in a concentrated manner.

[0040] Preferably, the processing mechanism 2 has a feed inlet at the top and a discharge outlet at the bottom. The main body 1 has a feeding channel 7 communicating with the circulation chamber 5, extending into the feed inlet. The bottom of the main body 1 has a discharge outlet 8 communicating with the circulation chamber 5. Specifically, the feeding channel 7 is located at the top of one side of the main body 1. The width of the feed inlet is greater than the width of the annular screen 3, allowing the feeding channel 7 to extend to the feed inlet without affecting the operation of the annular screen 3 and other structures. The width of the discharge outlet is less than the width of the annular screen 3, minimizing the possibility of material discharged from the outlet falling outside the annular screen 3. The screened material falls into the circulation chamber 5, and the discharge outlet 8 is located at the bottom of the circulation chamber 5, allowing material with the correct particle size to be discharged through the discharge outlet 8 under gravity.

[0041] Furthermore, a brush roller 9 is provided inside the annular screen 3, and a connecting rod 10 is hinged to the end of the brush roller 9. The connecting rod 10 is hinged to the baffle 4, and a first elastic element is provided between the connecting rod 10 and the baffle 4. Specifically, the brush roller 9 has a connecting shaft 11 along its axial direction. The connecting shaft 11 rests on the annular barrier 6, and the outer wall of the brush roller 9 contacts the inner wall of the annular screen 3. The connecting rod 10 is hinged to the connecting shaft 11, and the connecting rod 10 is located on the side of the annular barrier 6 away from the annular screen 3 to minimize interference between the connecting rod 10 and the annular barrier 6. The annular barrier 6 has multiple sets of baffles 4 and brush roller 9 structures arranged in annular array. In this embodiment, the first elastic element can be a torsion spring structure (not shown) in the prior art to force the connecting rod 10 to approach the baffle 4, thereby driving the connecting shaft 11 to rest on the annular barrier 6. During the process of rotating the baffle 4 through a rotating structure such as a motor, the connecting rod 10 can drive the connecting shaft 11 to move along the annular barrier 6, thereby cleaning the material on the annular barrier 6 through the brush roller 9.

[0042] With this configuration, as the baffle 4 rises with the annular screen 3, it switches to a material-blocking state, causing the brush roller 9 to move away from the baffle 4, thereby moving the material on the annular screen 3 away from the baffle 4. As the annular screen 3 rotates, the material approaches the baffle 4 again under gravity, thus repeatedly screening the material. After the baffle 4 rises above the processing mechanism 2, it switches to a discharge state, causing the brush roller 9 to approach the baffle 4. At the same time, the brush roller 9 can clean the annular screen 3. The advantage is that when the drive mechanism drives the annular screen 3 to rotate, the baffle 4 rises with the annular screen 3 to lift the material above the processing mechanism 2 (e.g., ...). Figure 3As shown, the screen rotates counterclockwise, and the baffle 4 on the right side causes the material to rise. During this process, the material first falls evenly between two adjacent baffles 4 through the discharge port, at which point the material can be screened by the annular screen 3. As the annular screen 3 rotates, the baffle 4 switches states and drives the brush roller 9 to move, so that the brush roller 9 can drive the material away from the corresponding baffle 4, and the material can be dynamically screened again during this process. As the annular screen 3 rotates, the material approaches the corresponding baffle 4 under the action of gravity (the surface of the brush roller 9 is a brush structure with gaps for the material to pass through), and the material can also be dynamically screened on one side during this process. Until the baffle 4 moves above the processing mechanism 2, the baffle 4 switches to the discharge state (as shown). Figure 4 As shown, the baffle 4 on the right side switches to the position on the left side to put the unqualified material left on the annular screen 3 into the feed inlet of the processing mechanism 2. During this process, the brush roller 9 can approach the corresponding baffle 4 to clean the annular screen 3 and try to avoid material residue on the annular screen 3.

[0043] In another embodiment of the present invention, as an alternative to the first elastic element forcing the connecting rod 10 closer to the baffle 4, preferably, the annular barrier 6 is provided with a plurality of extensions 12, annular friction plates 13 are fixed on the plurality of extensions 12, a friction wheel 14 is fixed on the end of the brush roller 9, the friction wheel 14 and the annular friction plate 13 are adapted to each other, and the first elastic element is used to force the connecting rod 10 away from the baffle 4. Specifically, the annular friction plate 13, the annular barrier 6, and the annular screen 3 are coaxially arranged. The annular friction plate 13 is located on the side of the connecting rod 10 away from the annular barrier 6 to minimize interference between the structures. The friction wheel 14 is located on the side of the connecting rod 10 away from the annular barrier 6 and is fixed on the connecting shaft 11. The friction wheel 14 is connected to the outer wall of the annular friction plate 13. In this embodiment, the first elastic element can be a torsion spring structure (not shown) from the prior art to force the connecting rod 10 away from the baffle 4, thereby causing the connecting shaft 11 and the annular barrier 6 to separate and causing the friction wheel 14 and the annular friction plate 13 to be connected (in this embodiment, the connecting shaft 11 does not contact the annular barrier 6, but the outer wall of the brush roller 9 is still in contact with the annular screen 3). This avoids interference between the connecting shaft 11 and the annular barrier 6. During the movement of the brush roller 9, the annular friction plate 13 can drive the friction wheel 14, the connecting shaft 11, and the brush roller 9 to rotate synchronously.

[0044] The advantage of this setup is that when the baffle 4 switches to the material blocking state, the brush roller 9 moves away from the corresponding baffle 4, and during this movement, the brush roller 9 rotates to sweep the material away from the corresponding baffle 4 (e.g., Figure 5As shown, during the process of the brush roller 9 moving from left to right, the brush roller 9 moves away from the corresponding baffle 4 and rotates counterclockwise, further improving the screening efficiency; when the baffle 4 switches to the discharge state, the brush roller 9 approaches the corresponding baffle 4, and the brush roller 9 can rotate to improve the efficiency of cleaning materials.

[0045] In another embodiment of the present invention, as an alternative to the above-mentioned method of rotating the baffle 4 by a rotating structure such as a motor, the inner wall of the circulation chamber 5 is further provided with an arc-shaped limiting plate 15, and a stop block 16 is provided at the top of the arc-shaped limiting plate 15. A second elastic element is provided between the annular screen 3 and the baffle 4 to force the baffle 4 to approach the corresponding brush roller 9. The second elastic element can be a torsion spring (not shown) in the prior art. Under the action of the first elastic element and the second elastic element, the baffle 4 and the connecting rod 10 tend to be parallel, so that the friction wheel 14 abuts against the extension 12 (e.g., Figure 6 As shown, the position of the extension 12 has been adjusted, at which point the baffle 4 is in the material-blocking state. Figure 6 (The state of the right side baffle 4); the end of the connecting rod 10 near the baffle 4 is equipped with a connecting post 17. The connecting post 17 is arranged along the axial direction of the connecting shaft 11. Both the connecting post 17 and the connecting rod 10 are rotatably connected to the connecting shaft 11. The connecting post 17 extends to the plane where the arc-shaped limiting plate 15 and the stop block 16 are located. During the rotation of the annular screen 3, the connecting post 17 and the stop block 16 on the upper right side abut (e.g., Figure 7 As shown, the connecting post 17 and the stop block 16 on the right side baffle 4 abut against each other, forcing the baffle 4 to rotate to the discharge state. During this process, the first and second elastic elements store elastic potential energy. Subsequently, after the connecting post 17 passes the stop block 16 and abuts against the outer wall of the arc-shaped limiting plate 15, the baffle 4 remains in the discharge state; until the connecting post 17 separates from the arc-shaped limiting plate 15 (as shown). Figure 6 As shown, the connecting post 17 on the right side baffle 4 is separated from the arc-shaped limiting plate 15. Under the action of the first elastic element and the second elastic element, the baffle 4 rotates to the material blocking state.

[0046] With this configuration, during the rotation of the annular screen 3, multiple baffles 4 can passively switch states based on their relative positions to the arc-shaped limiting plate 15. This allows the baffles 4 to switch from a discharge state to a blocking state at the bottom to lift the material in the annular screen 3, and from a blocking state to a discharge state at the top to re-feed the screened unqualified material into the processing mechanism 2. The advantage is that, during the rotation of the annular screen 3, the baffles 4 can passively switch states based on the arc-shaped limiting plate 15 and other structures to adapt to the screening and circulation of materials. Compared to the original technical solution that required multiple motors on the annular screen 3 to drive multiple baffles 4 to rotate, the technical solution in this embodiment significantly reduces costs and improves the automation level of the device.

[0047] This invention also provides a method for preparing a porous silicon structure coated with carbon nanotubes, based on the preparation apparatus described above, comprising the following steps: S1, treating silicon powder by grinding, acid washing, and solvent cleaning to obtain silicon powder with uniform particle size and a particle size of less than 50 micrometers; S2, treating the silicon powder with hydrofluoric acid, nitric acid, hydrochloric acid, sulfuric acid, hydrogen peroxide, or a mixture thereof to obtain porous silicon (preferably, the ratio of the mixed acid is hydrofluoric acid: nitric acid: hydrogen peroxide = 10:3:1); S3, dispersing the carbon nanotubes (this is prior art, and the dispersion method described in patent publication number CN117566729A can be used), and then mixing the carbon nanotubes and porous silicon. The mixture is stirred, and then passed through a long heating belt with a plate at the front. The front plate is controlled to make the mixture roll on the heating belt until more than 80% of the solvent evaporates, resulting in a blocky structure. S4. The blocky structure from the above step is crushed using a pulverizer, and then the crushed material is rolled in a drum for 2 hours. S5. A combination of materials such as carbon nanotubes, graphite, carbon black, carbon fiber, graphene oxide, porous carbon, and pitch is coated using a coating machine (preferably, carbon nanotubes: graphene: pitch = 1:2:5). S6. Finally, through processes such as depolymerization, sintering, crushing, sieving, and demagnetization, the final product (i.e., a porous silicon structure coated with carbon nanotubes) is formed. Specifically, in the above steps, the process of reducing the particle size of silicon powder or silicon-based materials can be carried out using any of the above-mentioned preparation devices.

[0048] The foregoing has only described certain exemplary embodiments of the present invention by way of illustration. Undoubtedly, those skilled in the art can modify the described embodiments in various ways without departing from the spirit and scope of the present invention. Therefore, the foregoing drawings and descriptions are illustrative in nature and should not be construed as limiting the scope of protection of the claims of the present invention.

Claims

1. An apparatus for preparing a carbon nanotube-coated porous silicon structure, comprising a main body and a processing mechanism fixed to the main body and used to reduce the particle size of a silicon-based material, characterized in that, The main body is provided with: An annular screen is rotationally connected to the main body, and the processing mechanism is arranged in the annular screen; A baffle is rotationally connected to the annular screen, and the baffle has a material blocking state and a material discharging state when the baffle rotates with the annular screen. When the baffle is located below the processing mechanism, the baffle is in the material blocking state to drive the unqualified material to rise. After the baffle moves above the processing mechanism, the baffle switches to the material discharging state to make the material fall into the processing mechanism; The main body is provided with a circulation cavity, and the annular screen is rotationally connected to the circulation cavity, and the processing mechanism is fixed to the inner wall of the circulation cavity; A brush roller is arranged in the annular screen, and a connecting rod is hingedly connected to the end of the brush roller, the connecting rod is hingedly connected to the baffle, and a first elastic member is arranged between the connecting rod and the baffle; During the lifting of the baffle along with the annular screen, the baffle switches to the material blocking state to drive the brush roller to move away from the baffle, so as to drive the material on the annular screen to move away from the baffle. With the rotation of the annular screen, the material is again close to the baffle under the action of gravity, so as to repeatedly screen the material; After the baffle is lifted above the processing mechanism, the baffle switches to the material discharging state to drive the brush roller to move close to the baffle, and the brush roller can clean the annular screen; The inner wall of the circulation cavity is provided with an arc-shaped limiting plate, the top end of the arc-shaped limiting plate is provided with a stop block, a second elastic member is arranged between the annular screen and the baffle to force the baffle to move close to the corresponding brush roller, the baffle and the connecting rod tend to be parallel under the action of the first elastic member and the second elastic member, so that the friction wheel abuts against the extension, at this time the baffle is in the material blocking state; one end of the connecting rod close to the baffle is provided with a connecting column, the connecting column is arranged along the axial direction of the connecting shaft, and the connecting column and the connecting rod are rotationally connected to the connecting shaft, the connecting column extends to the plane where the arc-shaped limiting plate and the stop block are located, and during the rotation of the annular screen, the upper right connecting column and the stop block abut against each other to force the baffle to rotate to the material discharging state; The baffle switches from the material discharging state to the material blocking state to drive the material in the annular screen to rise when the baffle is at the bottom, and switches from the material blocking state to the material discharging state to re-put the screened unqualified material into the processing mechanism when the baffle is at the top.

2. The device for preparing a carbon nanotube-coated porous silicon structure according to claim 1, wherein An annular fence is arranged on the annular screen.

3. The device for preparing a carbon nanotube-coated porous silicon structure according to claim 1, wherein A gap is left between the outer wall of the annular screen and the inner wall of the circulation cavity.

4. The device for preparing a carbon nanotube-coated porous silicon structure according to claim 1, wherein The processing mechanism is provided with an inlet at the top and an outlet at the bottom.

5. The apparatus according to claim 4, wherein the carbon nanotube-coated porous silicon structure is prepared by the steps of: (a) providing a porous silicon structure; (b) providing a carbon nanotube solution; (c) mixing the porous silicon structure and the carbon nanotube solution; and (d) drying the mixture. The main body is provided with a feeding channel communicated with the circulation cavity, the feeding channel extends into the inlet, and the main body is provided with a discharging opening communicated with the circulation cavity at the bottom.

6. A method for the production of a carbon nanotube-coated porous silicon structure, based on the production device for a carbon nanotube-coated porous silicon structure according to any one of claims 1 to 5, characterized in that The method comprises the following steps: S1. The silicon powder is treated by grinding, pickling and solvent cleaning to obtain silicon powder with uniform particle size and a particle size of less than 50 microns; S2. The silicon powder is treated by a mixed acid of hydrofluoric acid, nitric acid, hydrochloric acid, sulfuric acid, hydrogen peroxide or a combination thereof to obtain porous silicon; S3. The carbon nanotubes are dispersed, then the carbon nanotubes and the porous silicon are mixed and stirred, and finally the stirred mixture is passed through a heating belt with a front plate until the solvent evaporates by more than 80%, and a block structure is obtained; S4. The block structure in the above step is crushed by a crusher, and then the crushed material is rolled in a roller for 2 hours. S5, carbon nanotubes, graphite, carbon black, carbon fiber, graphene oxide, porous carbon, pitch material combination with coating machine for coating; S6, through depolymerization, sintering, crushing, screening, magnetic process finally formed product.

Images