System for producing ultrapure helium

Abstract

The present application relates to the technical field of gas separation, and discloses an ultrapure helium production system, which comprises a vacuum cold box and a production device arranged in the vacuum cold box and comprising first raw material conveying pipelines, a first adsorber, second raw material conveying pipelines and a second adsorber which are sequentially connected, a first-stage heat exchange assembly is arranged on the first raw material conveying pipelines, and a second-stage heat exchange assembly is arranged on the second raw material conveying pipelines; wherein the second-stage heat exchange assembly comprises an expander, the second adsorber is used for adsorbing impurity gas with a boiling point temperature of more than 16K, and the boiling point temperature of the impurity gas adsorbed by the first adsorber is higher than that of the impurity gas adsorbed by the second adsorber. The present application reduces the adsorption temperature, can deeply remove the impurities in the helium, purifies the helium to ultrapure helium, and meets the needs of the fields of frontier science and cutting-edge manufacturing.

Description

Technical Field

[0001] This invention relates to the field of gas separation technology, and more specifically to an ultrapure helium production system. Background Technology

[0002] Helium is a non-renewable strategic resource. Due to its unique ultra-low temperature properties and chemical inertness, it plays a vital role in cutting-edge science, advanced manufacturing, medicine, and aerospace. High purity helium is required, generally reaching high-purity or ultra-pure levels. Current purification technologies mainly include membrane separation, pressure swing adsorption, cryogenic distillation, and cryogenic adsorption. Helium production primarily focuses on pure helium (≥99.99%) and high-purity helium (≥99.9995%), while the demand for ultra-pure helium remains unmet. Summary of the Invention

[0003] In view of this, the present invention provides an ultrapure helium production system to solve the problem of unmet demand for ultrapure helium.

[0004] This invention provides an ultrapure helium production system, comprising: a vacuum cold box; and a production device disposed inside the vacuum cold box, comprising a first raw material delivery pipeline, a first adsorber, a second raw material delivery pipeline, and a second adsorber arranged sequentially. The first raw material delivery pipeline is provided with a primary heat exchange assembly, and the second raw material delivery pipeline is provided with a secondary heat exchange assembly. The secondary heat exchange assembly includes an expander. The second adsorber is used to adsorb impurity gases with a boiling point temperature above 16K. The boiling point temperature of the impurity gases adsorbed by the first adsorber is higher than that of the impurity gases adsorbed by the second adsorber.

[0005] Beneficial effects: By setting up a vacuum cold box, the loss of cold energy during the purification process can be minimized. The ultra-low temperature production device has the ability to deeply remove impurities such as nitrogen, oxygen, and neon from helium, and further purify pure helium to ultrapure helium. The expansion machine is used to obtain cold energy, which can achieve rapid cooling and rapid and stable production of qualified gas, thereby improving operating efficiency.

[0006] In one optional embodiment, the preparation device further includes an ultrapure material delivery pipeline, which is connected to the second adsorber. The ultrapure material delivery pipeline is configured to exchange heat with the first raw material delivery pipeline through the first-stage heat exchange component, and the ultrapure material delivery pipeline is configured to exchange heat with the second raw material delivery pipeline through the second-stage heat exchange component.

[0007] Beneficial effects: By setting up ultrapure material delivery pipelines, and exchanging heat with the first and second raw material delivery pipelines through primary and secondary heat exchange components, the heat exchange efficiency of the entire production system can be further optimized, enabling the ultrapure material to exchange heat with the raw materials during the delivery process, thereby making more effective use of cold energy and reducing energy waste.

[0008] In one optional embodiment, a throttling valve is provided on the ultrapure material delivery pipeline, the throttling valve being located downstream of the second adsorber and upstream of the secondary heat exchange assembly.

[0009] Beneficial effect: Setting a throttle valve can further cool the ultrapure helium gas.

[0010] In one optional embodiment, the primary heat exchange assembly includes a first heat exchanger and a second heat exchanger, the second heat exchanger being disposed close to the first adsorber relative to the first heat exchanger, the ultrapure material delivery pipeline being configured to exchange heat with the first raw material delivery pipeline through the first heat exchanger, the second heat exchanger having a liquid nitrogen cold source, and the second heat exchanger being configured to exchange heat with the first raw material delivery pipeline through the liquid nitrogen cold source.

[0011] Beneficial effects: By setting up a first heat exchanger and a second heat exchanger, the ultrapure material delivery pipeline first pre-cools the first raw material delivery pipeline through the first heat exchanger, and then the liquid nitrogen cold source further cools the first raw material delivery pipeline through the second heat exchanger. The liquid nitrogen cold source has the characteristics of rapid cooling and precise temperature control, making the heat exchange process more reasonable and efficient.

[0012] In one optional embodiment, the secondary heat exchange assembly includes a third heat exchanger and a fourth heat exchanger. The fourth heat exchanger is disposed close to the second adsorber relative to the third heat exchanger. The third heat exchanger, the expander, and the fourth heat exchanger are sequentially connected. The ultrapure material delivery pipeline is configured to exchange heat with the second raw material delivery pipeline through the third heat exchanger and the fourth heat exchanger.

[0013] Beneficial effects: The installation of a third and fourth heat exchanger allows the second raw material delivery pipeline to exchange heat and cool down with the ultrapure material delivery pipeline through the third heat exchanger, and then further cool down through the fourth heat exchanger, effectively improving the cooling effect on the second raw material delivery pipeline. The ultrapure helium production system can stabilize the gas temperature at the second adsorber through the fourth heat exchanger. The expansion machine can handle a large amount of raw material gas and has a large cooling capacity, enabling rapid cooling and rapid production.

[0014] In one alternative embodiment, the second heat exchanger has a first outlet, the outlet temperature of which is the liquid nitrogen temperature, and the first adsorber is used to adsorb impurity gases with a boiling point not lower than the liquid nitrogen temperature.

[0015] Beneficial effect: Setting the adsorption temperature of the first adsorber allows for the adsorption of some impurity gases first, providing more favorable conditions for the subsequent production of ultrapure helium.

[0016] In one alternative embodiment, the fourth heat exchanger has a second outlet, the outlet temperature of which is not higher than 16K.

[0017] Beneficial effects: Setting the temperature of the second outlet to no higher than 16K can effectively adsorb impurities in helium and produce ultrapure helium with a purity of over 99.9999%.

[0018] In one alternative embodiment, the throttle valve has a third outlet, the outlet temperature of which is not higher than 15K.

[0019] Beneficial effect: Setting the temperature of the third outlet to no higher than 15K can stabilize the gas temperature at the second adsorber.

[0020] In one alternative embodiment, the interiors of the first and second adsorbers are filled with an adsorbent, the surface of which has a highly porous structure.

[0021] Beneficial effects: By setting the surface of the adsorbent to have a highly porous structure, the adsorption area can be increased, and impurities in helium can be removed efficiently.

[0022] In one optional embodiment, the preparation system further includes a first shut-off valve and a second shut-off valve, wherein the first shut-off valve is disposed at the inlet of the preparation system and the second shut-off valve is disposed at the outlet of the preparation system.

[0023] Beneficial effects: Setting up a first shut-off valve and a second shut-off valve can isolate the production system from other external process units, improving the safety and reliability of the system. Attached Figure Description

[0024] To more clearly illustrate the specific embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0025] Figure 1 This is a schematic diagram of an ultrapure helium production system according to an embodiment of the present invention;

[0026] Figure 2 for Figure 1 The diagram shows the piping structure of the ultrapure helium production system.

[0027] Explanation of reference numerals in the attached figures:

[0028] 110. Vacuum cold box; 120. Production device; 1201. First raw material conveying pipeline; 12011. First pipeline; 12012. Second pipeline; 12013. Third pipeline; 1202. First adsorber; 1203. Second raw material conveying pipeline; 12031. Fourth pipeline; 12032. Fifth pipeline; 12033. Sixth pipeline; 12034. Seventh pipeline; 1204. Second adsorber; 1205. Primary heat exchange assembly; 12051. First heat exchanger; 12052. Second heat exchanger; 120521. First outlet; 1206. Secondary heat exchange assembly; 12061, expander; 12062, third heat exchanger; 12063, fourth heat exchanger; 120631, second outlet; 1207, ultrapure material conveying pipeline; 12071, first ultrapure pipeline; 12072, second ultrapure pipeline; 12073, third ultrapure pipeline; 12074, fourth ultrapure pipeline; 12075, fifth ultrapure pipeline; 1208, throttle valve; 12081, third outlet; 1209, first shut-off valve; 1210, second shut-off valve; 1211, first waste gas pipeline; 1212, second waste gas pipeline. Detailed Implementation

[0029] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0030] The following is combined Figure 1 and Figure 2 The following describes embodiments of the present invention.

[0031] According to embodiments of the present invention, an ultrapure helium production system is provided, such as... Figure 1As shown, it includes: a vacuum cold box 110; and a production device 120, which is disposed inside the vacuum cold box 110, including a first raw material conveying pipeline 1201, a first adsorber 1202, a second raw material conveying pipeline 1203, and a second adsorber 1204 connected in sequence. The first raw material conveying pipeline 1201 is provided with a primary heat exchange component 1205, and the second raw material conveying pipeline 1203 is provided with a secondary heat exchange component 1206. The secondary heat exchange component 1206 includes an expander 12061. The second adsorber 1204 is used to adsorb impurity gases with a boiling point temperature above 16K. The boiling point temperature of the impurity gas adsorbed by the first adsorber 1202 is higher than that of the impurity gas adsorbed by the second adsorber 1204.

[0032] The ultrapure helium production system of this embodiment, by setting up a vacuum cold box 110, can minimize the loss of cold energy during the purification process. The ultra-low temperature production device 120 has the ability to deeply remove impurities such as nitrogen, oxygen, and neon from helium, and further purify pure helium to ultrapure helium. The expansion machine 12061 is used to obtain cold energy, which can achieve rapid cooling and rapid and stable production of qualified gas, thereby improving operating efficiency.

[0033] It is worth noting that in related technologies, the adsorption temperature for helium purification is 20K to 30K, and cooling is achieved using a refrigerator. However, the refrigeration efficiency of the refrigerator is low, and the gas throughput is small and unstable. In this embodiment, by determining that the second adsorber 1204 adsorbs impurity gases with a boiling point temperature above 16K, and by using an expander 12061, ultrapure helium can be produced efficiently.

[0034] Specifically, in this embodiment, the expander 12061 is a turbine expander 12061, which can stably produce ultrapure helium even when the flow rate of the raw material helium reaches the level of thousands of cubic meters per hour.

[0035] It is worth noting that the vacuum cold box 110 is a vacuum Dewar, which has vacuum insulation properties.

[0036] In one embodiment, such as Figure 1As shown, the preparation device 120 also includes an ultrapure material conveying pipeline 1207, which is connected to the second adsorber 1204. The ultrapure material conveying pipeline 1207 is configured to exchange heat with the first raw material conveying pipeline 1201 through a primary heat exchange component 1205, and with the second raw material conveying pipeline 1203 through a secondary heat exchange component 1206. This configuration, by setting up the ultrapure material conveying pipeline 1207 to exchange heat with the first raw material conveying pipeline 1201 and the second raw material conveying pipeline 1203 through the primary and secondary heat exchange components 1205 and 1206, further optimizes the heat exchange efficiency of the entire preparation system, allowing the ultrapure material to exchange heat with the raw materials during transport, thereby more effectively utilizing cooling energy and reducing energy waste.

[0037] In one embodiment, such as Figure 1 As shown, a throttling valve 1208 is installed on the ultrapure material delivery pipeline 1207. The throttling valve 1208 is located downstream of the second adsorber 1204 and upstream of the secondary heat exchange component 1206. This configuration allows the throttling valve 1208 to further cool the ultrapure helium gas.

[0038] In one embodiment, such as Figure 1 As shown, the primary heat exchange assembly 1205 includes a first heat exchanger 12051 and a second heat exchanger 12052. The second heat exchanger 12052 is positioned close to the first adsorber 1202 relative to the first heat exchanger 12051. The ultrapure material delivery pipeline 1207 is configured to exchange heat with the first raw material delivery pipeline 1201 through the first heat exchanger 12051. The second heat exchanger 12052 has a liquid nitrogen cold source and is configured to exchange heat with the first raw material delivery pipeline 1201 through the liquid nitrogen cold source. With this configuration, a first heat exchanger 12051 and a second heat exchanger 12052 are set up. The ultrapure material delivery pipeline 1207 first pre-cools the first raw material delivery pipeline 1201 through the first heat exchanger 12051. Then, the liquid nitrogen cold source further cools the first raw material delivery pipeline 1201 through the second heat exchanger 12052. The liquid nitrogen cold source has the characteristics of rapid cooling and precise temperature control, making the heat exchange process more reasonable and efficient.

[0039] In one embodiment, such as Figure 1As shown, the secondary heat exchange assembly 1206 includes a third heat exchanger 12062 and a fourth heat exchanger 12063. The fourth heat exchanger 12063 is positioned close to the second adsorber 1204 relative to the third heat exchanger 12062. The third heat exchanger 12062, the expander 12061, and the fourth heat exchanger 12063 are sequentially connected. The ultrapure material conveying pipeline 1207 is configured to exchange heat with the second raw material conveying pipeline 1203 through the third heat exchanger 12062 and the fourth heat exchanger 12063. With this configuration, a third heat exchanger 12062 and a fourth heat exchanger 12063 are installed. The second raw material conveying pipeline 1203 exchanges heat with the ultrapure material conveying pipeline 1207 through the third heat exchanger 12062 for cooling, and then further cools through the fourth heat exchanger 12063, effectively improving the cooling effect on the second raw material conveying pipeline 1203. The ultrapure helium production system can stabilize the gas temperature at the second adsorber 1204 through the fourth heat exchanger 12063. The expander 12061 can process a large amount of raw material gas and has a large cooling capacity, enabling rapid cooling and rapid production.

[0040] Specifically, in this embodiment, the outlet temperature of the third heat exchanger 12062 is around 40K.

[0041] Specifically, in this embodiment, such as Figure 2 As shown, the ultrapure material delivery pipeline 1207 includes a first ultrapure pipeline 12071, a second ultrapure pipeline 12072, a third ultrapure pipeline 12073, a fourth ultrapure pipeline 12074, and a fifth ultrapure pipeline 12075. The ultrapure outlet of the second adsorber 1204 and the inlet of the throttle valve 1208 are connected through the first ultrapure pipeline 12071. The connections between the first ultrapure pipeline 12071 and the inlet of the throttle valve 1208, and the ultrapure outlet of the second adsorber 1204, are all fixed by welding. The outlet of the throttle valve 1208 and the inlet of the fourth heat exchanger 12063 are connected through the second ultrapure pipeline 12072. The connections between the second ultrapure pipeline 12072 and the outlet of the throttle valve 1208, and the inlet of the fourth heat exchanger 12063, are all fixed by welding. The outlet of the fourth heat exchanger 12063 is fixed to the inlet of the third heat exchanger 12062 via a third ultrapure pipeline 12073. The connection between the third ultrapure pipeline 12073 and the inlet of the third heat exchanger 12062 and the outlet of the fourth heat exchanger 12063 is fixed by welding. The outlet of the third heat exchanger 12062 is fixed to the inlet of the first heat exchanger 12051 via a fourth ultrapure pipeline 12074. The connection between the fourth ultrapure pipeline 12074 and the inlet of the first heat exchanger 12051 and the outlet of the third heat exchanger 12062 is fixed by welding. The outlet of the first heat exchanger 12051 is fixedly connected to the fifth ultrapure pipeline 12075 by welding. The outlet of the fifth ultrapure pipeline 12075 is the outlet of the production system.

[0042] Specifically, in this embodiment, such as Figure 2 As shown, the first raw material conveying pipeline 1201 includes a first pipeline 12011, a second pipeline 12012, and a third pipeline 12013. The raw material inlet of the first heat exchanger 12051 is fixedly connected to the first pipeline 12011 by welding. The inlet of the first pipeline 12011 is the inlet of the production system. The raw material outlet of the first heat exchanger 12051 and the raw material inlet of the second heat exchanger 12052 are connected through the second pipeline 12012. The connection between the second pipeline 12012 and the raw material outlet of the first heat exchanger 12051 and the raw material inlet of the second heat exchanger 12052 is fixed by welding. The raw material outlet of the second heat exchanger 12052 and the inlet of the first adsorber 1202 are connected through the third pipeline 12013. The connection between the third pipeline 12013 and the raw material outlet of the second heat exchanger 12052 and the inlet of the first adsorber 1202 is fixed by welding.

[0043] Specifically, in this embodiment, such as Figure 2 As shown, the second raw material conveying pipeline 1203 includes a fourth pipeline 12031, a fifth pipeline 12032, a sixth pipeline 12033, and a seventh pipeline 12034. The raw material outlet of the first adsorber 1202 and the raw material inlet of the third heat exchanger 12062 are connected through the fourth pipeline 12031, and the connections between the fourth pipeline 12031 and the raw material outlet of the first adsorber 1202 and the raw material inlet of the third heat exchanger 12062 are all fixed by welding. The raw material outlet of the third heat exchanger 12062 and the raw material inlet of the expander 12061 are connected through the fifth pipeline 12032, and the fifth pipeline 12032 and the raw material inlet of the third heat exchanger 12062 are connected through the fifth pipeline 12032. The connection between the outlet and the raw material inlet of the expander 12061 is fixed by welding. The raw material inlet of the fourth heat exchanger 12063 and the raw material outlet of the expander 12061 are connected by the sixth pipe 12033, and the connection between the sixth pipe 12033 and the raw material inlet of the fourth heat exchanger 12063 and the raw material outlet of the expander 12061 is fixed by welding. The raw material outlet of the fourth heat exchanger 12063 and the inlet of the second adsorber 1204 are connected by the seventh pipe 12034, and the connection between the seventh pipe 12034 and the raw material outlet of the fourth heat exchanger 12063 and the inlet of the second adsorber 1204 is fixed by welding.

[0044] Specifically, in this embodiment, such as Figure 2As shown, the production system includes a first waste gas pipeline 1211 and a second waste gas pipeline 1212. The impurity outlet of the first adsorber 1202 is fixedly connected to the first waste gas pipeline 1211 by welding, and the impurity outlet of the second adsorber 1204 is fixedly connected to the second waste gas pipeline 1212 by welding.

[0045] In one embodiment, such as Figure 1 As shown, the second heat exchanger 12052 has a first outlet 120521, the outlet temperature of which is the liquid nitrogen temperature. The first adsorber 1202 is used to adsorb impurity gases with a boiling point not lower than the liquid nitrogen temperature. By setting the adsorption temperature of the first adsorber 1202 in this way, a portion of the impurity gases can be adsorbed first, providing more favorable conditions for the subsequent production of ultrapure helium.

[0046] In one embodiment, such as Figure 1 As shown, the fourth heat exchanger 12063 has a second outlet 120631, and the outlet temperature of the second outlet 120631 is not higher than 16K. With this setting, the temperature of the second outlet 120631 is set not higher than 16K, which can effectively adsorb impurities in helium and produce ultrapure helium with a purity of over 99.9999%.

[0047] In one embodiment, such as Figure 1 As shown, the throttle valve 1208 has a third outlet 12081, and the outlet temperature of the third outlet 12081 is not higher than 15K. This setting, which keeps the temperature of the third outlet 12081 at no higher than 15K, can stabilize the gas temperature at the second adsorber 1204.

[0048] In one embodiment, the interiors of the first adsorber 1202 and the second adsorber 1204 are filled with adsorbent, and the surface of the adsorbent has a highly porous structure. This configuration, with the adsorbent surface having a highly porous structure, increases the adsorption area and efficiently removes impurities from the helium gas.

[0049] In one embodiment, such as Figure 1 As shown, the preparation system also includes a first shut-off valve 1209 and a second shut-off valve 1210. The first shut-off valve 1209 is located at the inlet of the preparation system, and the second shut-off valve 1210 is located at the outlet of the preparation system. This configuration, with the first shut-off valve 1209 and the second shut-off valve 1210, can isolate the preparation system from other external process units, improving the safety and reliability of the system.

[0050] Although embodiments of the invention have been described in conjunction with the accompanying drawings, those skilled in the art can make various modifications and variations without departing from the spirit and scope of the invention, and such modifications and variations all fall within the scope defined by the appended claims.

Claims

1. A system for producing ultrapure helium, characterized in that, include: Vacuum cold box (110); The preparation device (120) is located inside the vacuum cold box (110) and includes a first raw material conveying pipeline (1201), a first adsorber (1202), a second raw material conveying pipeline (1203), and a second adsorber (1204) connected in sequence. A primary heat exchange component (1205) is provided on the first raw material conveying pipeline (1201), and a secondary heat exchange component (1206) is provided on the second raw material conveying pipeline (1203). The secondary heat exchange assembly (1206) includes an expander (12061), and the second adsorber (1204) is used to adsorb impurity gas with a boiling point temperature above 16K. The boiling point temperature of the impurity gas adsorbed by the first adsorber (1202) is higher than that of the impurity gas adsorbed by the second adsorber (1204). The preparation device (120) further includes an ultrapure material delivery pipeline (1207), which is connected to the second adsorber (1204). The ultrapure material delivery pipeline (1207) is heat-exchanging with the first raw material delivery pipeline (1201) through the first-stage heat exchange component (1205), and the ultrapure material delivery pipeline (1207) is heat-exchanging with the second raw material delivery pipeline (1203) through the second-stage heat exchange component (1206). A throttling valve (1208) is provided on the ultrapure material delivery pipeline (1207). The throttling valve (1208) is located downstream of the second adsorber (1204) and upstream of the secondary heat exchange assembly (1206). The secondary heat exchange assembly (1206) further includes a third heat exchanger (12062) and a fourth heat exchanger (12063). The fourth heat exchanger (12063) is disposed close to the second adsorber (1204) relative to the third heat exchanger (12062). The expander (12061) is disposed between the third heat exchanger (12062) and the fourth heat exchanger (12063). The ultrapure material conveying pipeline (1207) is configured to exchange heat with the second raw material conveying pipeline (1203) through the third heat exchanger (12062) and the fourth heat exchanger (12063). The outlet temperature of the third heat exchanger (12062) is 40K; The fourth heat exchanger (12063) has a second outlet (120631), the outlet temperature of which is not higher than 16K; The throttle valve (1208) has a third outlet (12081) with an outlet temperature not higher than 15K.

2. The ultrapure helium production system according to claim 1, characterized in that, The primary heat exchange assembly (1205) includes a first heat exchanger (12051) and a second heat exchanger (12052). The second heat exchanger (12052) is positioned close to the first adsorber (1202) relative to the first heat exchanger (12051). The ultrapure material delivery pipeline (1207) exchanges heat with the first raw material delivery pipeline (1201) through the first heat exchanger (12051). The second heat exchanger (12052) has a liquid nitrogen cold source and exchanges heat with the first raw material delivery pipeline (1201) through the liquid nitrogen cold source.

3. The ultrapure helium production system according to claim 2, characterized in that, The second heat exchanger (12052) has a first outlet (120521) with an outlet temperature of liquid nitrogen. The first adsorber (1202) is used to adsorb impurity gases with a boiling point not lower than that of liquid nitrogen.

4. The ultrapure helium production system according to any one of claims 1 to 3, characterized in that, The first adsorber (1202) and the second adsorber (1204) are filled with adsorbent, and the surface of the adsorbent has a highly porous structure.

5. The ultrapure helium production system according to any one of claims 1 to 3, characterized in that, The preparation system further includes a first shut-off valve (1209) and a second shut-off valve (1210), the first shut-off valve (1209) being located at the inlet of the preparation system and the second shut-off valve (1210) being located at the outlet of the preparation system.

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