Gas supply system and magnetron sputtering coating equipment

Abstract

The invention discloses a gas supply system and magnetron sputtering coating equipment, the gas supply system comprises: an exhaust member having a gas outlet cavity, the cavity wall of the gas outlet cavity comprises a first wall and a second wall, the first wall and the second wall are oppositely arranged, the first wall is provided with a plurality of gas outlet holes, and the plurality of gas outlet holes are communicated with the gas outlet cavity; and the air inlet piece comprises an air inlet end, the air inlet piece is arranged in the air outlet cavity, the air inlet end faces the second wall, and air in the air inlet piece can enter the air outlet cavity from the air inlet end and is exhausted from the air outlet hole. According to the gas supply system, gas can be uniformly discharged, and the product quality is effectively improved.

Description

Technical Field

[0001] This invention relates to the field of glass coating technology, and in particular to a gas supply system and magnetron sputtering coating equipment. Background Technology

[0002] In related technologies, vacuum magnetron sputtering coated glass is a glass product in which a thin film of metal, alloy, or compound is deposited on the glass surface using vacuum magnetron sputtering technology, thereby controlling its optical properties to meet specific functional requirements. In this process, the glass to be coated is placed in a sputtering chamber, and process gases are introduced to generate and maintain glow discharge (plasma). The uniform distribution of the process gas in the sputtering chamber is a key prerequisite for achieving stable sputtering and obtaining high-quality, uniform thin films.

[0003] In vacuum magnetron sputtering coating, the uniformity of gas supply is one of the core factors affecting film quality, directly impacting plasma stability, sputtering rate, and the uniformity of film composition and thickness. Current gas supply devices discharge gas directly from exhaust ports on the pipeline, which has a significant drawback: exhaust ports closer to the inlet discharge more gas, while those farther away discharge less. This issue leads to variations in the thickness of the glass coating, consequently affecting product performance and quality. Summary of the Invention

[0004] This invention aims to solve at least one of the technical problems existing in the prior art. To this end, this invention proposes a gas supply system capable of uniformly discharging gas, effectively improving product quality.

[0005] The present invention also proposes a magnetron sputtering coating device.

[0006] A gas supply system according to a first aspect embodiment of the present invention includes:

[0007] An exhaust component has an exhaust chamber, the chamber wall of which includes a first wall and a second wall, the first wall and the second wall being disposed opposite to each other, the first wall being provided with a plurality of exhaust holes, and the plurality of exhaust holes communicating with the exhaust chamber;

[0008] An air intake component includes an air intake end, which is disposed in the air outlet chamber. The air intake end faces the second wall, and the gas in the air intake component can enter the air outlet chamber from the air intake end and be discharged from the air outlet.

[0009] The gas supply system according to embodiments of the present invention has at least the following beneficial effects: the inlet component is disposed in the outlet chamber, with the inlet end facing the second wall. That is, after the gas enters through the inlet component, when the gas enters the outlet chamber, the gas first impacts the second wall, thereby filling one side of the outlet chamber. Then, the gas is buffered and diffused to the other side of the outlet chamber, and after being filled, it is discharged from the outlet hole. In this way, the gas discharged from the exhaust component can be made more uniform. Specifically, the gas supply system can uniformly discharge gas, effectively improving the quality of the product.

[0010] According to some embodiments of the present invention, the air supply system includes a first pipe and a second pipe, one end of the first pipe is connected to the midpoint of the second pipe, and both ends of the second pipe are provided with the air inlet end.

[0011] According to some embodiments of the present invention, the air supply system has two exhaust components and two intake components, with each intake component corresponding to one exhaust component.

[0012] According to some embodiments of the gas supply system of the present invention, the orientation of the air outlet in one of the exhaust components is opposite to the orientation of the air outlet in the other exhaust component.

[0013] According to some embodiments of the present invention, the air supply system includes an air intake component comprising a first pipe, a second pipe, and two third pipes. One end of the first pipe is connected to the midpoint of the second pipe, and both ends of the second pipe are respectively connected to the midpoints of the two third pipes. Both ends of the third pipes are provided with air intake ends.

[0014] According to some embodiments of the present invention, the air supply system has two exhaust components and two intake components, with each intake component corresponding to one exhaust component.

[0015] According to some embodiments of the gas supply system of the present invention, the orientation of the air outlet in one of the exhaust components is opposite to the orientation of the air outlet in the other exhaust component.

[0016] According to some embodiments of the present invention, the gas supply system further includes a main air inlet, which is connected to the other end of each of the two first pipes.

[0017] According to some embodiments of the present invention, in the gas supply system, a plurality of gas outlet holes are arranged at intervals along the length direction of the exhaust member.

[0018] The magnetron sputtering coating apparatus according to a second aspect of the present invention includes the gas supply system described in any one of the first aspect embodiments.

[0019] The magnetron sputtering coating equipment according to embodiments of the present invention has at least the following beneficial effects: The inlet is disposed in the outlet chamber with the inlet end facing the second wall. That is, after the gas enters through the inlet, it first impacts the second wall, filling one side of the outlet chamber. Then, the gas is buffered and diffused to the other side of the outlet chamber, and finally discharged from the outlet hole. This ensures that the gas discharged from the outlet is relatively uniform. Specifically, the gas supply system can uniformly discharge gas, effectively improving product quality. Furthermore, the magnetron sputtering coating equipment with this gas supply system produces products of higher quality.

[0020] Additional aspects and advantages of the invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. Attached Figure Description

[0021] The present invention will be further described below with reference to the accompanying drawings and embodiments, wherein:

[0022] Figure 1 This is a schematic diagram of a gas supply system according to some embodiments of the present invention;

[0023] Figure 2 This is a schematic diagram of an exhaust component in an air supply system according to some embodiments of the present invention;

[0024] Figure 3 This is a schematic diagram of the air intake component in the air supply system according to the first embodiment of the present invention;

[0025] Figure 4 This is a schematic diagram of the air intake component in the air supply system of the second embodiment of the present invention.

[0026] Figure label:

[0027] Air supply system 10, exhaust component 100, air outlet chamber 110, first wall 111, air outlet 112, second wall 113, air inlet component 200, air inlet end 210, first pipe 300, second pipe 400, third pipe 500, main air inlet component 600. Detailed Implementation

[0028] Embodiments of the present invention are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and should not be construed as limiting the present invention.

[0029] In the description of this invention, it should be understood that the orientation descriptions, such as up, down, front, back, left, right, etc., are based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limiting this invention.

[0030] In the description of this invention, "several" means one or more, "multiple" means two or more, "greater than," "less than," and "exceeding" are understood to exclude the stated number, while "above," "below," and "within" are understood to include the stated number. The use of "first" and "second" in the description is merely for distinguishing technical features and should not be construed as indicating or implying relative importance, or implicitly indicating the number of indicated technical features, or implicitly indicating the order of the indicated technical features.

[0031] In the description of this invention, unless otherwise explicitly defined, terms such as "set up," "install," and "connect" should be interpreted broadly, and those skilled in the art can reasonably determine the specific meaning of the above terms in this invention in conjunction with the specific content of the technical solution.

[0032] In the description of this invention, the terms "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of the invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0033] In related technologies, vacuum magnetron sputtering coated glass is a glass product in which a thin film of metal, alloy, or compound is deposited on the glass surface using vacuum magnetron sputtering technology, thereby controlling its optical properties to meet specific functional requirements. In this process, the glass to be coated is placed in a sputtering chamber, and process gases are introduced to generate and maintain glow discharge (plasma). The uniform distribution of the process gas in the sputtering chamber is a key prerequisite for achieving stable sputtering and obtaining high-quality, uniform thin films.

[0034] In vacuum magnetron sputtering coating, the uniformity of gas supply is one of the core factors affecting film quality, directly related to plasma stability, sputtering rate, and the uniformity of film composition and thickness. Current gas supply devices discharge gas directly from the exhaust ports of the pipe, which has significant drawbacks: exhaust ports closer to the inlet discharge more gas, while those farther away discharge less. This problem leads to variations in the thickness of the glass coating, thus affecting product performance and quality. Therefore, this application proposes a gas supply system 10.

[0035] Please refer to Figures 1 to 4 In some embodiments, the air supply system 10 includes an exhaust component 100 and an intake component 200. The exhaust component 100 has an exhaust chamber 110, which can be cubic or cuboid in shape. The chamber wall of the exhaust chamber 110 includes a first wall 111 and a second wall 113, which are disposed opposite to each other. The first wall 111 is provided with a plurality of exhaust holes 112, which communicate with the exhaust chamber 110. The exhaust component 100 can be made of metal, such as steel or iron. The exhaust holes 112 can be formed by a stamping process, and their shape can be square or circular. The number of exhaust holes 112 is not specifically limited; it can be ten, twenty, thirty, or forty. The air intake component 200 includes an air intake end 210, which is disposed in the air outlet chamber 110. Specifically, one end of the air intake component 200 extends into the air outlet chamber 110, while the other end is located outside the air outlet chamber 110. The air intake end 210 faces the second wall 113. Gas in the air intake component 200 can enter the air outlet chamber 110 from the air intake end 210 and be discharged from the air outlet 112. Specifically, the air inlet 200 is disposed in the air outlet chamber 110, with the air inlet end 210 facing the second wall 113. That is, after the gas enters through the air inlet 200, when the gas enters the air outlet chamber 110, the gas first impacts the second wall 113, thereby filling one side of the air outlet chamber 110. Then, the gas is buffered and diffused to the other side of the air outlet chamber 110, and after filling, it is discharged from the air outlet 112. In this way, the gas discharged by the exhaust component 100 can be made more uniform. Specifically, the air supply system 10 can discharge gas evenly, effectively improving the quality of the product.

[0036] Further, the specific structure of the air intake 200 is described below. In some embodiments, the air intake 200 includes a first pipe 300 and a second pipe 400. One end of the first pipe 300 is connected to the midpoint of the second pipe 400, that is, the middle position of the first pipe 300 and the second pipe 400 is connected, and the other end of the first pipe 300 is used to allow gas to enter. Both ends of the second pipe 400 are provided with air intake ends 210. Specifically, the first pipe 300 serves as the main delivery channel, and one end of it is precisely connected to the midpoint of the second pipe 400 in a sealed manner. This connection method ensures that after the gas enters from the first pipe 300, it can be evenly distributed to both ends of the second pipe 400. After the gas flows evenly to the end of the second pipe 400, it flows into the air outlet chamber 110. In this way, the gas can enter the air outlet chamber 110 evenly. In addition, it should be added that multiple air holes can also be provided at the air intake end 210. The multiple air holes can be arranged in an array distribution, and the multiple air holes can further disperse the gas evenly. For example, a flow divider is installed at the end of the second tube 400, and the flow divider has a plurality of air holes.

[0037] Furthermore, in some embodiments, two exhaust components 100 and two intake components 200 are provided. Each intake component 200 is correspondingly provided with one exhaust component 100. Specifically, two exhaust components 100 and two intake components 200 are provided, and the two intake components 200 and the two exhaust components 100 form a one-to-one corresponding relationship, that is, each intake component 200 specifically provides gas delivery for one exhaust component 100. This corresponding arrangement structure not only facilitates independent control of the gas flow rate of each exhaust path, but also reduces the impact of a single component failure on the operation of the entire system to a certain extent, thereby improving the reliability of the system.

[0038] Furthermore, in some embodiments, the orientation of the exhaust port 112 in one exhaust component 100 is opposite to that in the other exhaust component 100. Specifically, the opposite orientation of the exhaust port 112 in one exhaust component 100 allows the discharged gas to form complementary convection or diffusion ranges in space, preventing excessive gas accumulation in local areas and thus more effectively achieving uniform gas distribution within the target space, meeting specific requirements for gas emission direction in different scenarios. In addition, the opposite orientation also reduces mutual interference between the gases discharged from the two exhaust components 100, improving the efficiency and uniformity of gas emission.

[0039] Furthermore, in addition to the structure described above, the air intake component 200 also has other structures. For details, please refer to... Figures 1 to 4In some embodiments, the air intake component 200 includes a first pipe 300, a second pipe 400, and two third pipes 500. One end of the first pipe 300 is connected to the midpoint of the second pipe 400, and both ends of the second pipe 400 are connected to the midpoints of the two third pipes 500, respectively. Each end of the third pipe 500 is provided with an air intake end 210. The first pipe 300 serves as the initial gas delivery channel, with one end sealed to the midpoint of the second pipe 400 to ensure that gas can smoothly enter the second pipe 400 from the first pipe 300 and be transmitted to both ends. The two ends of the second pipe 400 are connected to the midpoints of the two third pipes 500, allowing gas flowing out from both ends of the second pipe 400 to be further diverted into the two third pipes 500. To maximize the air intake range, each third pipe 500 is provided with an air intake end 210 at both ends. This multi-stage diversion design significantly improves the gas collection capacity of the air intake component 200, ensuring that the gas supply system 10 receives a sufficient gas source. Furthermore, this multi-stage flow-dividing structure design enables uniform gas distribution, resulting in a more uniform gas flow into the outlet chamber 110. This uniform gas can then be discharged through the outlet port 112. Additionally, multiple air holes can be provided at the inlet end 210, arranged in an array to further disperse the gas evenly. For example, a flow-dividing plate with multiple air holes is installed at the end of the second pipe 400.

[0040] Further, please refer to Figures 1 to 4 In some embodiments, two exhaust components 100 and two intake components 200 are provided, with each intake component 200 corresponding to one exhaust component 100. Specifically, the gas delivered by each intake component 200 is specifically supplied to its corresponding exhaust component 100. This arrangement can be matched with the three-stage piping structure of the intake component 200, allowing the gas, after multi-stage diversion, to be delivered to the corresponding exhaust component 100 in an orderly manner, ensuring the stability and specificity of the gas during transmission. It should be noted that the gas entering the two intake components 200 can be the same gas or different types of gas.

[0041] Furthermore, in some embodiments, the orientation of the exhaust port 112 in one exhaust component 100 is opposite to that in the other exhaust component 100. Specifically, the orientation of the exhaust port 112 of one exhaust component 100 is completely opposite to that of the other exhaust component 100. This design allows the two exhaust components 100 to discharge gas in different directions during operation, thereby achieving gas diffusion over a larger spatial area. In addition, the opposite orientation can reduce mutual interference between the gases discharged from the two exhaust components 100, improving the efficiency and uniformity of gas emission.

[0042] Further, please refer to Figures 1 to 4 In some embodiments, the gas supply system 10 further includes a main air inlet 600. The main air inlet 600 is connected to the other ends of both first pipes 300. As the main input terminal of the gas source, the main air inlet 600 is connected to the other ends of both first pipes 300 via branch pipes. This allows external gas to first enter the main air inlet 600, which then distributes the gas to the two first pipes 300. The main air inlet 600 simplifies the connection of the gas source, facilitates centralized control of the total gas intake of the entire system, and ensures that the gas pressure and flow rate obtained by the two air inlets 200 remain balanced, improving the stability of system operation. The main air inlet 600 can be connected to the two first pipes 300 via a three-way valve.

[0043] Further, please refer to Figures 1 to 4 In some embodiments, multiple vent holes 112 are spaced apart along the length of the exhaust member 100. Specifically, multiple vent holes 112 are arranged sequentially at certain intervals along the length of the exhaust member 100. This spaced arrangement can prevent gas from being concentrated in a local area of ​​the exhaust member 100, and instead allow the gas to be discharged gradually and evenly through each vent hole 112 during the flow process, thereby better meeting the requirements of the target space for uniform gas distribution.

[0044] In some embodiments, the magnetron sputtering coating equipment includes the gas supply system 10 of any of the first aspect embodiments. An inlet 200 is disposed in the outlet chamber 110, with the inlet end 210 facing the second wall 113. That is, after gas enters from the inlet 200, when the gas enters the outlet chamber 110, the gas first impacts the second wall 113, thereby filling one side of the outlet chamber 110. Then, the gas is buffered and diffused to the other side of the outlet chamber 110, and after filling, it is discharged from the outlet hole 112. This ensures that the gas discharged from the exhaust device 100 is relatively uniform. Specifically, the gas supply system 10 can uniformly discharge gas, effectively improving product quality. Furthermore, the magnetron sputtering coating equipment with this gas supply system 10 produces products of higher quality.

[0045] The embodiments of the present invention have been described in detail above with reference to the accompanying drawings. However, the present invention is not limited to the above embodiments. Within the scope of knowledge possessed by those skilled in the art, various changes can be made without departing from the spirit of the present invention. Furthermore, unless otherwise specified, the embodiments of the present invention and the features thereof can be combined with each other.

Claims

1. A gas supply system, characterized by, include: An exhaust component has an exhaust chamber, the chamber wall of which includes a first wall and a second wall, the first wall and the second wall being disposed opposite to each other, the first wall being provided with a plurality of exhaust holes, and the plurality of exhaust holes communicating with the exhaust chamber; An air intake component includes an air intake end, which is disposed in the air outlet chamber. The air intake end faces the second wall, and the gas in the air intake component can enter the air outlet chamber from the air intake end and be discharged from the air outlet.

2. The gas supply system of claim 1, wherein The air intake component includes a first pipe and a second pipe, one end of the first pipe is connected to the midpoint of the second pipe, and both ends of the second pipe are provided with the air intake end.

3. The gas supply system of claim 2, wherein, Two exhaust components and two intake components are provided, with each intake component corresponding to one exhaust component.

4. The gas supply system of claim 3, wherein The orientation of the air outlet in one of the exhaust components is opposite to the orientation of the air outlet in the other exhaust component.

5. The gas supply system of claim 1, wherein, The air intake component includes a first pipe, a second pipe, and two third pipes. One end of the first pipe is connected to the midpoint of the second pipe, and both ends of the second pipe are respectively connected to the midpoints of the two third pipes. Each end of the third pipe is provided with an air intake end.

6. The gas supply system according to claim 5, characterized in that, Two exhaust components and two intake components are provided, with each intake component corresponding to one exhaust component.

7. The gas supply system according to claim 6, characterized in that, The orientation of the air outlet in one of the exhaust components is opposite to the orientation of the air outlet in the other exhaust component.

8. The gas supply system according to claim 6, characterized in that, The gas supply system also includes a main air intake, which is connected to the other end of each of the two first pipes.

9. The gas supply system according to claim 1, characterized in that, Along the length of the exhaust component, a plurality of exhaust holes are spaced apart.

10. A magnetron sputtering coating equipment, characterized in that, Includes the gas supply system as described in any one of claims 1 to 9.

Images