High-wear-resistance hydrophobic energy-saving glass and preparation method thereof

Abstract

This invention discloses a highly wear-resistant, hydrophobic, and energy-saving glass and its preparation method, belonging to the field of coated glass technology. The method includes: preparing an indium tin oxide (ITO) thin film on the first surface of a glass substrate, followed by preparing a first template layer with specific cracks; subsequently depositing a first type of diamond (Type A) thin film and a zinc oxide thin film sequentially, then dissolving the first template layer with a solvent to form a first raised mesh structure; subsequently depositing a silver layer, a nickel-chromium alloy layer, and a silicon nitride layer sequentially to form a low-emissivity film system, and dissolving the zinc oxide thin film again to expose the first raised mesh structure; finally, depositing a second type of diamond (Type A) thin film for reinforcement. On the second surface of the glass substrate, a second raised mesh composed of a third type of diamond (Type A) thin film is prepared using a similar template method, and a fluorosilane polymer coating is applied to form a hydrophobic surface. The glass obtained by this invention not only has excellent wear resistance and hydrophobicity but also meets the energy-saving requirements of green buildings.

Description

Technical Field

[0001] This invention relates to the field of coated glass, specifically to a highly wear-resistant, hydrophobic, and energy-saving glass and its preparation method. Background Technology

[0002] Energy-saving glass is a widely used energy-efficient material in the construction industry. Its core principle involves depositing a low-emissivity film, such as a silver-based metallic film or a fluorine-doped oxide film, on the surface of a glass substrate. By giving the glass high reflectivity to far-infrared rays, it significantly reduces heat conduction and radiation, thus achieving excellent thermal insulation. In modern buildings, energy-saving glass is often used in large-area curtain wall structures. While this application improves the energy efficiency and aesthetics of buildings, it also brings significant practical problems.

[0003] Since building curtain walls are mostly located at high altitudes, stains, dust, grease, and other contaminants on the glass surfaces are difficult to clean. Conventional manual cleaning not only requires high costs but also poses safety risks associated with working at heights. The long-term accumulation of these contaminants not only damages the building's appearance but also directly reduces the glass's light transmittance, thereby affecting its energy-saving performance.

[0004] To address this cleaning challenge, research has proposed introducing hydrophobic materials onto the surface of energy-saving glass to create a self-cleaning surface. This approach utilizes the repulsive effect of the hydrophobic surface on water droplets, allowing rainwater to roll across the glass surface and carry away dust particles, thus reducing cleaning frequency and improving ease of use. However, most hydrophobic materials currently on the market are organic compounds with extremely poor abrasion resistance. During glass transportation, handling, installation, and daily use, they are easily subjected to physical friction and environmental erosion, leading to rapid failure of the hydrophobic function. Furthermore, existing technologies often focus only on improving a single functional surface, failing to comprehensively consider the different functional requirements of both sides of the glass. One side needs high abrasion resistance to protect the internal functional layer, while the other side needs to be both abrasion-resistant and hydrophobic to achieve self-cleaning. This lack of stability and durability of the surface functional layer has become a major bottleneck restricting the practical and large-scale application of self-cleaning energy-saving glass, failing to meet the building industry's requirements for long-term material performance. Summary of the Invention

[0005] The purpose of this invention is to overcome the shortcomings of the prior art and provide a high wear-resistant hydrophobic energy-saving glass and its preparation method. While retaining the original optical and thermal properties of energy-saving glass, it achieves a unity of surface self-cleaning function and durability characteristics, and solves the problems of poor wear resistance and easy failure of functional layer in existing hydrophobic energy-saving glass.

[0006] To achieve the above objectives, the specific solution adopted by the present invention is as follows:

[0007] On one hand, the present invention provides a method for preparing highly wear-resistant, hydrophobic, and energy-saving glass, comprising the following steps:

[0008] (1) A glass substrate is provided, and an indium tin oxide film is deposited on its first surface;

[0009] (2) A polymer emulsion is coated on the surface of the indium tin oxide film and dried at low temperature to form a first template layer with a cracked structure, wherein the cracked structure has cracks with a width of 15-25 μm and a spacing of 60-100 μm;

[0010] (3) A first-type diamond film and a zinc oxide film are sequentially deposited on the surface of the first template layer;

[0011] (4) The first template layer is dissolved and removed using the first solvent, so that the first diamond film and zinc oxide film are retained only inside the crack, forming the first raised mesh structure;

[0012] (5) A silver layer, a nickel-chromium alloy layer and a silicon nitride layer are sequentially deposited on the surface of the first raised mesh structure;

[0013] (6) The zinc oxide film is dissolved and removed by a second solvent, causing the silver layer, nickel-chromium alloy layer and silicon nitride layer covering it to fall off accordingly, thereby exposing the first raised mesh structure;

[0014] (7) Deposit a second type diamond film on the entire surface after the treatment in step (6);

[0015] (8) A polymer emulsion is coated on the second surface of the glass substrate and dried at low temperature to form a second template layer with a cracked structure, wherein the cracked structure has cracks with a width of 15-25 μm and a spacing of 60-100 μm;

[0016] (9) Deposit a third type of diamond film on the surface of the second template layer;

[0017] (10) The second template layer is dissolved and removed using the first solvent, so that the third type of diamond film is retained only inside the crack, forming a second raised mesh structure;

[0018] (11) A hydrophobic coating is applied to the surface of the second raised mesh structure, and a hydrophobic surface is formed by heat treatment.

[0019] Furthermore, the polymer emulsion is a pure acrylic emulsion, the first solvent is chloroform, and the second solvent is an alkaline solution.

[0020] Further, in step (1), the deposition thickness of the indium tin oxide film is 200-300 nm.

[0021] Further, in step (3), the deposition thickness of the first type of diamond film is 60-70 nm, and the deposition thickness of the zinc oxide film is 300-400 nm.

[0022] Further, in step (5), the deposition thickness of the silver layer is 8-12 nm, the deposition thickness of the nickel-chromium alloy layer is 3-4 nm, and the deposition thickness of the silicon nitride layer is 50-60 nm.

[0023] Furthermore, in step (7), the deposition thickness of the second type of diamond film is 30-40 nm.

[0024] Furthermore, in step (9), the deposition thickness of the third type of diamond film is 150-200 nm.

[0025] Furthermore, the raw material used for applying the hydrophobic coating is a fluorosilane polymer hydrophobic coating.

[0026] On the other hand, the present invention provides a highly wear-resistant, hydrophobic, and energy-saving glass, which is prepared by the above-described method.

[0027] Beneficial effects:

[0028] (1) The heat transfer coefficient of the glass prepared by this invention is ≤1.6W / (m²). 2 ·K), far lower than the 3.1W / (m²) of ordinary insulated glass substrates. 2 With a heat transfer coefficient of ·K, it can effectively reduce heat conduction and radiation inside and outside the building, reduce the energy consumption of air conditioning and heating equipment, and meet the energy-saving requirements of green buildings.

[0029] (2) The water droplet contact angle of the glass surface prepared by the present invention is ≥150°, and rainwater can quickly roll on the surface and carry away dust particles, realizing a self-cleaning function, which greatly reduces the cleaning frequency and cost of high-altitude glass; and after being subjected to 500 grams of pressure (pressure area 1cm) 2 After 10,000 cycles of friction with steel wool, the water droplet contact angle remains ≥140°, and the hydrophobic properties remain stable.

[0030] (3) The wear-resistant surface of the present invention withstands 500g of pressure (pressure area 1cm²). 2 After being rubbed 10,000 times with steel wool, no obvious friction marks were observed, and the light transmittance remained unchanged. In this invention, the first and second types of diamond films on the wear-resistant surface ensure the wear resistance of the energy-saving film system; while the third type of diamond film on the hydrophobic surface directly protects the hydrophobic coating, solving the problem of poor wear resistance of traditional organic hydrophobic materials.

[0031] (4) The glass prepared by the present invention has a visible light transmittance of ≥75%, and while achieving energy saving, hydrophobicity and wear resistance, it does not affect the lighting needs of the building interior.

[0032] (5) The glass prepared by the present invention is suitable for large-area high-altitude glass application scenarios such as building curtain walls, which can reduce the danger and economic investment of cleaning operations, while ensuring that the glass maintains a good appearance and performance for a long time, and improves the practicality of green buildings and intelligent energy-saving systems, which has significant economic benefits and social significance. Attached Figure Description

[0033] Figure 1 This is a comparison of the water droplet angles before and after a friction test on the hydrophobic glass surface prepared in Example 1 of the present invention.

[0034] Figure 2 This is a schematic diagram of the cross-sectional structure of the glass prepared according to the present invention.

[0035] Figure 3 This is an optically magnified photograph of the hydrophobic glass surface prepared in Example 1 of the present invention. Detailed Implementation

[0036] The technical solution of the present invention will be clearly and completely described below with reference to specific embodiments. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the protection scope of the present invention.

[0037] It should be noted that, for ease of description, the side of the glass coated with a hydrophobic coating is referred to as the "hydrophobic surface," which is located on the same side as the second surface of the glass substrate. The side away from the hydrophobic coating is referred to as the "abrasion-resistant surface," which is located on the same side as the first surface of the glass substrate.

[0038] First, preparation method

[0039] This invention provides a highly wear-resistant, hydrophobic, and energy-saving glass and its preparation method. Please refer to [link / reference]. Figure 2 Its preparation method mainly includes the following steps:

[0040] (1) A glass substrate is provided, and an indium tin oxide (ITO) thin film is deposited on its first surface by magnetron sputtering. Specifically, high-purity ITO with an ITO ratio of 9:1 and a purity of 99.99% is used as the target material, and argon is used as the sputtering gas. Under deposition pressure of 0.8-1.2 Pa and sputtering power of 200-300 W, an ITO thin film with a thickness of 200-300 nm is prepared on its first surface. The purpose of this step is to: use the ITO thin film as a transition layer to improve the interface bonding between the first surface of the glass substrate and the subsequent first template layer, providing a good substrate for the stable adhesion of the first template layer;

[0041] (2) A polymer emulsion (preferably pure acrylic emulsion) is coated on the surface of the indium tin oxide film, and then dried at low temperature to form a first template layer with a cracked structure. Specific method: Pure acrylic emulsion is coated using a roller coating method, controlling the coating thickness to be 20-30 μm, and dried at a low temperature of 5-15℃ to form a first template layer with a cracked structure. The cracked structure consists of cracks with a width of 15-25 μm and a spacing of 60-100 μm. The purpose of this step is that the first template layer serves as a template for preparing the first raised mesh structure. The specific-sized cracks formed after low-temperature drying provide a positioning contour for the subsequent deposition of the first type of diamond film and zinc oxide film, ensuring that the dimensions of the first raised mesh structure meet the design requirements.

[0042] (3) A first-type diamond film and a zinc oxide film are sequentially deposited on the surface of the first template layer. Specific method: Using high-purity graphite as the target material and argon as the sputtering gas, a first-type diamond film with a thickness of 60-70 nm is deposited under deposition pressure of 0.8-1.2 Pa and sputtering power of 200-300 W; subsequently, a high-purity zinc oxide ceramic target is used, and a zinc oxide film with a thickness of 300-400 nm is deposited under the same deposition conditions. The purpose of this step is as follows: The first-type diamond film, as one of the core wear-resistant layers, has high hardness and a low coefficient of friction. It is both a basic component of the first raised grid structure and the core layer for subsequent exposed grids. The zinc oxide film mainly functions as a sacrificial layer. On the one hand, it provides stable support for the subsequent deposition of functional layers such as silver, ensuring that the silver layer and others can adhere uniformly to its surface; on the other hand, in subsequent processes, the zinc oxide film can be dissolved and removed through specific chemical methods, creating conditions for the formation of a specific grid structure.

[0043] (4) The first template layer is dissolved and removed using the first solvent, so that the first diamond-like film and zinc oxide film remain only inside the crack, forming the first raised mesh structure. Specific method: Trichloromethane is used as the first solvent, and ultrasonic cleaning is performed for 25-30 minutes to dissolve and remove the first template layer. The purpose of this step is to: remove the film layer in the non-cracked area by dissolving the first template layer, ensuring the precise formation of the first raised mesh structure;

[0044] (5) A silver layer, a nickel-chromium alloy layer, and a silicon nitride layer are sequentially deposited on the surface of the first raised mesh structure. Specific method: The layers are deposited sequentially using magnetron sputtering.

[0045] Silver layer: High-purity silver is used as the target material, the deposition pressure is 0.8-1.2 Pa, the sputtering power is 50-80 W, and the thickness is 8-12 nm;

[0046] Nickel-chromium alloy layer: using an alloy target with a nickel-chromium mass ratio of 1:1, under the same deposition conditions, with a thickness of 3-4 nm;

[0047] Silicon nitride layer: High-purity silicon is used as the target material, argon-nitrogen mixture (flow ratio 1:1) is used as the sputtering gas, deposition pressure is 0.8-1.2 Pa, sputtering power is 150-200 W, and thickness is 50-60 nm;

[0048] The purpose of this step is as follows: The silver layer possesses excellent optical properties, especially high reflectivity for far-infrared rays. In practical applications, such as on building windows, the silver layer effectively reflects far-infrared rays emitted by indoor objects, retaining heat indoors and reducing heat loss to the outside, thus providing good insulation. In summer, it also reflects outdoor heat radiation, preventing heat from entering the room and reducing the energy consumption of indoor air conditioning and other cooling equipment, achieving energy conservation. The nickel-chromium alloy layer plays a crucial role in protecting the silver layer throughout the entire film system. Due to the relatively reactive chemical properties of silver, it is easily oxidized in air and may be subject to various physical frictions and chemical corrosion during daily use. The nickel-chromium alloy layer acts as a barrier, preventing oxygen, moisture, and other corrosive substances from contacting the silver layer, preventing oxidation and wear, thus ensuring the long-term stability of the silver layer's high reflectivity and guaranteeing the glass's long-term and reliable energy-saving effect. The silicon nitride layer has good chemical stability and mechanical properties, effectively isolating the external environment from corroding the internal silver and nickel-chromium alloy layers. For example, in a humid environment, the silicon nitride layer can prevent moisture penetration and prevent the silver layer and nickel-chromium alloy layer from corroding; under ultraviolet radiation, the silicon nitride layer can absorb some ultraviolet rays, reducing the damage of ultraviolet rays to the silver layer and nickel-chromium alloy layer, and further improving the durability and stability of the film system.

[0049] (6) The zinc oxide film is dissolved and removed using a second solvent, causing the silver layer, nickel-chromium alloy layer, and silicon nitride layer covering it to detach accordingly, thereby exposing the first raised mesh structure. Specific method: A 5% sodium hydroxide solution is used as the second solvent, and ultrasonic cleaning is performed for 20-30 minutes to dissolve and remove the zinc oxide film. The purpose of this step is to: dissolve the zinc oxide sacrificial layer, causing the surface low-emissivity film system to detach, precisely exposing the first raised mesh structure, thus creating conditions for the subsequent deposition of the second type of diamond film;

[0050] (7) Deposit a second type of diamond film on the entire surface after step (6). Specific method: Using high-purity graphite as the target material and argon as the sputtering gas, deposit a second type of diamond film with a thickness of 30-40 nm under the conditions of deposition gas pressure of 0.8-1.2 Pa and sputtering power of 200-300 W. The function of this step is: the second type of diamond film, as one of the core wear-resistant layers, is deposited on the exposed grid and surrounding surface, further thickening the wear-resistant film layer and strengthening the wear resistance of the first surface of the glass;

[0051] (8) A polymer emulsion is coated on the second surface of the glass substrate and dried at low temperature to form a second template layer with a cracked structure, wherein the cracked structure has cracks with a width of 15-25 μm and a spacing of 60-100 μm. Specific method: Pure acrylic emulsion is coated using a roller coating method, the coating thickness is controlled to be 20-30 μm, and dried at a low temperature of 5-15℃ to form a second template layer with a cracked structure. The function of this step is: the second template layer serves as a template for preparing the second raised mesh structure, and its cracked structure provides a positioning contour for the subsequent deposition of the third type of diamond film;

[0052] (9) Deposit a third type of diamond film on the surface of the second template layer. Specific method: Using high-purity graphite as the target material and argon as the sputtering gas, deposit a third type of diamond film with a thickness of 150-200 nm under deposition pressure of 0.8-1.2 Pa and sputtering power of 200-300 W. The purpose of this step is that the third type of diamond film, as one of the core wear-resistant layers, is the only component of the second raised mesh structure, providing a stable and rough adhesion substrate for the hydrophobic coating;

[0053] (10) The second template layer is dissolved and removed using the first solvent, so that the third type of diamond film remains only inside the crack, forming a second raised mesh structure. Specific method: Using chloroform as the first solvent, ultrasonic cleaning is performed for 20-30 minutes to dissolve and remove the second template layer. The purpose of this step is to ensure that the third type of diamond film remains only inside the crack by dissolving the second template layer, forming a second raised mesh structure;

[0054] (11) A hydrophobic coating is applied to the surface of the second raised mesh structure, and a hydrophobic surface is formed by heat treatment. Specific method: A fluorosilane polymer hydrophobic coating (model NC319) is applied and baked at 80°C for 30-60 minutes. The purpose of this step is that the hydrophobic coating has excellent hydrophobic properties, effectively reducing the surface energy of the glass surface, allowing water droplets to form a larger contact angle on the glass surface, thereby achieving a hydrophobic effect. After heat treatment, the hydrophobic coating can adhere more firmly to the surface of the second raised mesh structure, ensuring that the second surface of the glass has stable and reliable hydrophobic properties. In conjunction with the second raised mesh structure, when water droplets fall on the glass surface, due to the hydrophobic properties of the surface and the guiding effect of the mesh structure, the water droplets can quickly roll off, carrying away dust and other impurities from the surface, achieving a self-cleaning function.

[0055] Second, the thickness limits and functions of each layer.

[0056] The following section explains the thickness limits and functions of each layer.

[0057] Glass substrate: As the basic carrier of all functional layers, it provides mechanical support for the entire composite structure and ensures the overall structural stability of the glass.

[0058] Indium tin oxide thin film (200-300nm): As a transition layer, it improves the interface bonding state between the first surface of the glass substrate and the subsequent first template layer, and provides a good substrate for the stable adhesion of the first template layer. The thickness range of 200-300nm can ensure its structural stability and interface bonding effect. If it is too thin, it will lead to insufficient transition effect and poor adhesion of the first template layer. If it is too thick, it may affect the light transmittance of the glass and increase the preparation cost.

[0059] First template layer (20-30μm): Serves as a template for the preparation of the first raised mesh structure. The specific-sized cracks formed after low-temperature drying provide positioning contours for the subsequent deposition of the first type of diamond film and zinc oxide film, ensuring that the dimensions of the first raised mesh structure meet the design requirements. The thickness range of 20-30μm is crucial for forming a crack width of 15-25μm and a crack spacing of 60-100μm. If it is too thin, it is difficult to form a complete crack structure; if it is too thick, it will lead to incomplete dissolution by the first solvent, affecting the forming accuracy of the first raised mesh structure.

[0060] The second template layer (20-30μm): serves as the template for the preparation of the second raised mesh structure. The specific-sized cracks formed after low-temperature drying provide a positioning contour for the subsequent deposition of the third type of diamond film, ensuring that the size of the second raised mesh structure meets the design requirements. The thickness range of 20-30μm is the key to forming the corresponding crack specifications. If it is too thin, it is difficult to form a complete crack structure. If it is too thick, it will lead to incomplete dissolution by the first solvent, affecting the forming accuracy of the second raised mesh structure.

[0061] Type I diamond film (60-70nm): One of the core wear-resistant layers, it has high hardness and low coefficient of friction. It is not only a basic component of the first raised grid structure, but also the core layer of the subsequently exposed grid, which can initially improve the wear resistance of the glass surface. The thickness range of 60-70nm can meet the basic wear resistance requirements of the first raised grid structure and the integrity of the subsequently exposed grid. If it is too thin, the grid will be easy to break and the wear resistance will be insufficient. If it is too thick, it will increase the internal stress of the film layer, which may cause the first raised grid structure to fall off.

[0062] Type II diamond film (30-40nm): One of the core wear-resistant layers, deposited on the exposed first raised grid structure and surrounding surface, further thickens the wear-resistant film layer, strengthens the wear resistance of the first surface of the glass, and ensures the stability of the wear-resistant surface; the thickness range of 30-40nm can effectively thicken the wear-resistant layer without affecting the light transmittance, and works synergistically with Type I diamond film to improve wear resistance. If it is too thin, the strengthening effect is insufficient, and if it is too thick, it will reduce the light transmittance of the glass.

[0063] The third type of diamond film (150-200nm): one of the core wear-resistant layers, is the only component of the second raised mesh structure. It provides a stable and rough adhesion substrate for the hydrophobic coating, while protecting the hydrophobic coating from friction damage due to its high hardness. The thickness range of 150-200nm can ensure the stability of the second raised mesh structure and the adhesion effect of the hydrophobic coating. If it is too thin, the mesh will be easily deformed and unable to support the hydrophobic coating. If it is too thick, it will affect the flatness of the second surface of the glass and even cause uneven adhesion of the hydrophobic coating.

[0064] Zinc oxide film (300-400nm): As a sacrificial layer, it can be dissolved by the second solvent (alkaline solution) in the future, causing the silver layer, nickel-chromium alloy layer and silicon nitride layer on the surface to fall off, thereby precisely exposing the first raised grid structure underneath, creating conditions for the subsequent deposition of the second type of diamond film; the thickness of 300-400nm can ensure rapid and complete dissolution in the second solvent, while providing stable support for the upper film layer. If it is too thin, the support will be insufficient, and if it is too thick, the dissolution time will be too long, affecting the preparation efficiency.

[0065] Silver layer (8-12nm): Low-emissivity core functional layer, which gives the glass high reflectivity to far-infrared rays and is the key layer to achieve energy-saving effect; the thickness of 8-12nm can ensure the performance of high reflectivity to far-infrared rays, while avoiding the decrease in light transmittance of the glass due to excessive thickness. If it is too thin, the low-emissivity effect will be poor and the energy-saving requirements cannot be met.

[0066] Nickel-chromium alloy layer (3-4nm): Protects the silver layer, prevents oxidation and wear during preparation or use, improves the stability of the silver layer, and ensures the long-term effectiveness of low radiation. A thickness of 3-4nm can effectively protect the silver layer without affecting the optical performance of the film system. Too thin a layer will not provide sufficient protection, while too thick a layer will reduce the light transmittance of the glass and negate the energy-saving effect of the silver layer.

[0067] Silicon nitride layer (50-60nm): The outer protective layer isolates the nickel-chromium alloy layer and silver layer from external environmental factors (such as humidity and pollutants), further improving the durability of the low-emissivity film system. A thickness of 50-60nm can provide good protection. If it is too thin, the protection effect is poor and the film system is prone to failure. If it is too thick, it will increase the thickness of the film system and affect the overall optical and mechanical properties of the glass.

[0068] Hydrophobic coating (fluorosilane polymer hydrophobic coating): imparts hydrophobic properties to the second surface of glass, and works in conjunction with the second raised mesh structure to achieve self-cleaning function.

[0069] Third, an analysis of the reasons for achieving high wear resistance, hydrophobicity, and energy saving.

[0070] The reason why the glass with high wear resistance and hydrophobic energy saving can be obtained through the design of the present invention is as follows: (1) Reason for the realization of energy saving effect: the low radiation film system is formed by silver layer, nickel-chromium alloy layer and silicon nitride layer. Among them, silver layer is the low radiation core layer, which can give the glass high reflectivity to far-infrared rays and significantly reduce heat conduction and radiation; nickel-chromium alloy layer and silicon nitride layer play a protective role for silver layer, ensuring the stability of low radiation film system, thereby achieving long-term reliable heat insulation effect, and thus achieving the purpose of energy saving. (2) Reason for the realization of hydrophobic effect: through the template action of the first template layer and the second template layer, the first raised grid structure and the second raised grid structure are prepared respectively. The two types of grid structures can increase the roughness of the glass surface. Combined with the hydrophobic properties of the hydrophobic coating, the water droplets form a "rolling" state on the glass surface rather than an "adhering" state. During the rolling process of rainwater, the dust and stains on the surface can be carried away, realizing the self-cleaning function. (3) Reasons for achieving wear resistance: Type I diamond film, Type II diamond film, and Type III diamond film have the characteristics of high hardness and low coefficient of friction, which are the core materials for improving the wear resistance of glass. This invention further enhances the wear resistance of the film by depositing the three types of diamond films multiple times and constructing the first raised grid structure and the second raised grid structure, avoiding the problem that traditional organic hydrophobic layers are easily damaged by friction, and ensuring the long-term effectiveness of the functional layer.

[0071] Fourth, the interaction between different layers

[0072] (1) Indium tin oxide film and glass substrate, first template layer: The indium tin oxide film improves the interfacial compatibility between the first surface of the glass substrate and the first template layer, reduces the interfacial tension between the two, and enables the first template layer to be stably attached to the glass surface, providing a reliable template for the subsequent preparation of the first raised grid structure.

[0073] (2) First template layer and first type diamond film and zinc oxide film: The crack structure of the first template layer provides precise positioning for the deposition of the first type diamond film and zinc oxide film, so that the two types of film are retained only in the crack, which is the key to the formation of the first raised grid structure; and the polymer material of the first template layer is easily dissolved by the first solvent (trichloromethane), ensuring that the film in the non-crack area can be completely removed.

[0074] (3) Zinc oxide film and type I diamond film, silver layer / nickel-chromium alloy layer / silicon nitride layer: The zinc oxide film is tightly attached to the surface of the type I diamond film, providing a flat support for the silver layer, nickel-chromium alloy layer and silicon nitride layer above, ensuring that the low-emissivity film system can be deposited uniformly; at the same time, the zinc oxide film is easily dissolved by the second solvent (alkaline solution), and its dissolution can drive the low-emissivity film system on the surface to fall off synchronously, accurately exposing the first raised grid structure.

[0075] (4) Nickel-chromium alloy layer and silver layer: The nickel-chromium alloy layer is tightly wrapped around the surface of the silver layer, which can prevent the silver layer from oxidizing when it comes into contact with air and water vapor. It can also buffer the stress when the silicon nitride layer is deposited later, improve the chemical stability and mechanical properties of the silver layer, and ensure low radiation effect.

[0076] (5) Silicon nitride layer, nickel-chromium alloy layer, and silver layer: As the outermost layer of the low-emissivity film system, the silicon nitride layer has good chemical stability and density, which can isolate the corrosion of the nickel-chromium alloy layer and silver layer by external humidity and pollutants (such as dust and grease), and extend the service life of the low-emissivity film system.

[0077] (6) Type III diamond film and hydrophobic coating: The second raised grid structure formed by the type III diamond film provides a rough and stable adhesion surface for the hydrophobic coating, increases the contact area between the hydrophobic coating and the glass, and enhances the bonding strength; at the same time, the high hardness of the type III diamond film can prevent external friction from directly acting on the hydrophobic coating and prevent the hydrophobic coating from falling off.

[0078] (7) Glass substrate and functional layers: The glass substrate provides stable mechanical support for all functional layers such as indium tin oxide film, first template layer, and second template layer, ensuring that the entire laminated structure does not deform or fall off during transportation, installation and use, and ensuring the overall performance of the glass.

[0079] Fifth, multi-layer synergistic enhancement of performance

[0080] Highly wear-resistant and hydrophobic energy-saving glass achieves comprehensive performance enhancement through the synergistic effect of multiple film layers, meeting the diverse needs of high-end application scenarios.

[0081] On one hand, on the first surface of the glass substrate, a first-type diamond film and a second-type diamond film together form a composite wear-resistant layer. The first-type diamond film possesses excellent properties such as high hardness, low coefficient of friction, and good chemical stability, serving as the foundation of the core wear-resistant layer and providing initial wear resistance for the glass. After deposition on the first raised grid structure and surrounding surface, the second-type diamond film further thickens the wear-resistant film layer, enhancing the wear resistance of the first surface of the glass. When the glass surface is rubbed by external objects, the two diamond films work together to disperse frictional stress, effectively reducing surface wear and ensuring that the wear-resistant surface (no silver layer residue afterwards, referring to the area corresponding to the first surface) remains unmarked and has stable light transmittance after rubbing, thus guaranteeing the optical and wear-resistant performance of the glass during long-term use. On the other hand, on the second surface of the glass, a third-type diamond film and a hydrophobic coating construct a hydrophobic self-cleaning system. The third-type diamond film has high hardness, providing a stable and rough adhesion substrate for the hydrophobic coating. Its rough surface increases the contact area between the coating and the film, improving the coating's adhesion and allowing the hydrophobic coating to adhere more firmly to the glass surface. Simultaneously, the high hardness of the Type III diamond film effectively protects the hydrophobic coating from damage caused by external friction, ensuring stable performance during long-term use. After being coated with a fluorosilane polymer hydrophobic coating and heat-treated at 80℃, it forms a tight bond with the Type III diamond film, achieving a long-lasting hydrophobic self-cleaning function. When water droplets fall on the glass surface, due to the surface's hydrophobic properties and the guiding effect of the mesh structure, the water droplets quickly roll off, carrying away surface dust and other impurities, achieving a self-cleaning effect and keeping the glass clean and transparent, reducing the frequency and cost of manual cleaning. Furthermore, the construction of the silver-based low-emissivity film system endows the glass with highly efficient energy-saving performance. The silver layer has a high reflectivity for far-infrared rays, effectively reflecting far-infrared radiation emitted by indoor objects, retaining heat indoors and reducing heat loss to the outside, thus providing excellent insulation. In summer, it also reflects outdoor heat radiation, preventing heat from entering the room and reducing the energy consumption of indoor air conditioning and other cooling equipment. The nickel-chromium alloy layer protects the silver layer, preventing oxidation and wear, and ensuring the long-term stability of its high reflectivity. The silicon nitride layer isolates the glass from external corrosion, effectively preventing oxygen, moisture, and other corrosive substances from eroding the internal silver and nickel-chromium alloy layers, further improving the durability and stability of the film system. The synergistic effect of these three elements enables the glass to achieve long-term reliable energy-saving effects, reducing building energy consumption and meeting the requirements of sustainable development.

[0082] Sixth, Implementation Examples

[0083] The present invention will be further illustrated below with reference to specific embodiments. It should be understood that these embodiments are for illustrative purposes only and are not intended to limit the scope of protection of the present invention.

[0084] Example 1

[0085] This embodiment provides a method for preparing highly wear-resistant, hydrophobic, and energy-saving glass, which mainly includes the following steps:

[0086] (1) Provide a glass substrate and clean and dry it, put it into a magnetron sputtering equipment, use high-purity indium tin oxide as the sputtering target and argon as the sputtering gas, and prepare an indium tin oxide thin film with a thickness of 250 nm on the first surface of the glass substrate under the conditions of deposition pressure of 1.0 Pa and sputtering power of 250 W.

[0087] (2) Pure acrylic emulsion (polymer emulsion) was coated onto the surface of indium tin oxide film by roller coating and dried at 10°C (low temperature) to form a first template layer with a thickness of 25 μm, a crack width of 20 μm, and a crack spacing of 80 μm.

[0088] (3) Using high-purity graphite as the sputtering target and argon as the sputtering gas, a first-type diamond film with a thickness of 65 nm was prepared by magnetron sputtering on the surface of the first template layer under the conditions of deposition pressure of 1.0 Pa and sputtering power of 250 W; and then using high-purity zinc oxide ceramic target as the sputtering target and argon as the sputtering gas, a zinc oxide film with a thickness of 350 nm was prepared by magnetron sputtering on the surface of the first-type diamond film under the conditions of deposition pressure of 1.0 Pa and sputtering power of 250 W.

[0089] (4) Use chloroform (first solvent) to ultrasonically clean the glass for 25 minutes to dissolve and remove the first template layer, so that the first type of diamond film and zinc oxide film are only retained inside the crack, forming a first raised grid structure with a thickness of 415nm, a width of 20μm and a crack spacing of 80μm.

[0090] (5) A silver layer, a nickel-chromium alloy layer, and a silicon nitride layer are sequentially prepared by magnetron sputtering on the surface of the first raised mesh structure:

[0091] A silver layer with a thickness of 10 nm was prepared using a high-purity silver target as the sputtering target and argon as the sputtering gas under the conditions of deposition pressure of 1.0 Pa and sputtering power of 60 W.

[0092] Using a nickel-chromium alloy target (nickel-chromium mass ratio 1:1) as the sputtering target and argon as the sputtering gas, a nickel-chromium alloy layer with a thickness of 3.5 nm was prepared under the conditions of deposition pressure of 1.0 Pa and sputtering power of 60 W.

[0093] Using high-purity silicon as the sputtering target and an argon-nitrogen mixture (flow ratio 1:1) as the sputtering gas, a silicon nitride layer with a thickness of 55 nm was prepared under the conditions of deposition pressure of 1.0 Pa and sputtering power of 170 W.

[0094] (6) Use a 5% sodium hydroxide solution (second solvent) to ultrasonically clean the glass for 25 minutes to dissolve and remove the zinc oxide film, so that the silver layer, nickel-chromium alloy layer and silicon nitride layer covering it fall off accordingly, thereby exposing the first raised mesh structure.

[0095] (7) Using high-purity graphite as the sputtering target and argon as the sputtering gas, a type II diamond film with a thickness of 35 nm was deposited on the entire surface after step (6) under the conditions of deposition pressure of 1.0 Pa and sputtering power of 250 W.

[0096] (8) A pure acrylic emulsion (polymer emulsion) is coated on the second surface of the glass substrate and dried at 10°C (low temperature) to form a second template layer with a thickness of 25 μm, a crack width of 20 μm, and a crack spacing of 80 μm;

[0097] (9) Using high-purity graphite as the sputtering target and argon as the sputtering gas, a type III diamond film with a thickness of 170 nm was deposited on the surface of the second template layer under the conditions of deposition pressure of 1.0 Pa and sputtering power of 250 W.

[0098] (10) Use chloroform (first solvent) to ultrasonically clean the glass for 25 minutes to dissolve and remove the second template layer, so that the third type of diamond film is only retained inside the crack, forming a second raised grid structure with a thickness of 170nm, a width of 20μm, and a crack spacing of 80μm.

[0099] (11) A fluorosilane polymer hydrophobic coating is applied to the surface of the second raised grid structure and baked at 80°C for 50 min to obtain a highly wear-resistant, hydrophobic and energy-saving glass.

[0100] The heat transfer coefficient of the insulating glass prepared in this embodiment is 1.51 W / (m²). 2 ·K), with a visible light transmittance of 75.8%. Figure 1 This is a comparison of the water droplet angles before and after friction testing of the hydrophobic surface of the high wear-resistant, hydrophobic, and energy-saving glass prepared in Example 1 of this invention. The left side of the image shows the water droplet angle before the friction experiment, with a contact angle of 151°. The water droplet exhibits a clear "spherical" rolling tendency on the glass surface. The right side shows the water droplet angle after being subjected to 500 grams of pressure (pressure area 1 cm²). 2 The water droplet angle after 10,000 cycles of friction with steel wool is 146°, and it still maintains a good hydrophobic morphology, proving that the hydrophobic surface has stable wear resistance. Figure 3 This is an optical magnified photograph of the hydrophobic surface of the high wear-resistant, hydrophobic, and energy-saving glass of the present invention. The image clearly shows the second raised grid structure formed by the third type of diamond film. The grid width is 20 μm and the spacing is 80 μm. The grid outline is regular and there is no obvious deformation or breakage, which proves that the grid structure prepared by the template method meets the design requirements.

[0101] Example 2

[0102] This embodiment provides a method for preparing highly wear-resistant, hydrophobic, and energy-saving glass, which mainly includes the following steps:

[0103] (1) Provide a glass substrate and clean and dry it. Place it in a magnetron sputtering device, use high-purity indium tin oxide as the sputtering target and argon as the sputtering gas. Under the conditions of deposition pressure of 0.8 Pa and sputtering power of 200 W, prepare an indium tin oxide thin film with a thickness of 200 nm on the first surface of the glass substrate.

[0104] (2) Pure acrylic emulsion (polymer emulsion) is coated onto the surface of indium tin oxide film by roller coating and dried at 5°C (low temperature) to form a first template layer with a thickness of 20 μm, a crack width of 15 μm, a crack spacing of 60 μm and a cracked structure.

[0105] (3) Using high-purity graphite as the sputtering target and argon as the sputtering gas, a first-type diamond film with a thickness of 60 nm was prepared by magnetron sputtering on the surface of the first template layer under the conditions of deposition pressure of 0.8 Pa and sputtering power of 200 W; and then using high-purity zinc oxide ceramic as the sputtering target and argon as the sputtering gas, a zinc oxide film with a thickness of 400 nm was prepared by magnetron sputtering on the surface of the first-type diamond film under the conditions of deposition pressure of 0.8 Pa and sputtering power of 200 W.

[0106] (4) Use chloroform (first solvent) to ultrasonically clean the glass for 20 minutes to dissolve and remove the first template layer, so that the first type of diamond film and zinc oxide film are only retained inside the crack, forming a first raised grid structure with a thickness of 460nm, a width of 15μm and a crack spacing of 60μm.

[0107] (5) A silver layer, a nickel-chromium alloy layer, and a silicon nitride layer are sequentially prepared by magnetron sputtering on the surface of the first raised mesh structure:

[0108] Using high-purity silver as the sputtering target and argon as the sputtering gas, a silver layer with a thickness of 8 nm was prepared under the conditions of deposition pressure of 0.8 Pa and sputtering power of 50 W.

[0109] Using a nickel-chromium alloy target (nickel-chromium mass ratio 1:1) as the sputtering target and argon as the sputtering gas, a nickel-chromium alloy layer with a thickness of 3 nm was prepared under the conditions of deposition pressure of 0.8 Pa and sputtering power of 50 W.

[0110] A silicon nitride layer with a thickness of 50 nm was prepared using a high-purity silicon target as the sputtering target and an argon-nitrogen mixture as the sputtering gas under the conditions of a deposition pressure of 0.8 Pa and a sputtering power of 150 W.

[0111] (6) Use a 5% sodium hydroxide solution (second solvent) to ultrasonically clean the glass for 20 minutes to dissolve and remove the zinc oxide film, so that the silver layer, nickel-chromium alloy layer and silicon nitride layer covering it fall off accordingly, thereby exposing the first raised mesh structure.

[0112] (7) Using high-purity graphite as the sputtering target and argon as the sputtering gas, a 30 nm thick Type II diamond film was deposited on the entire surface after step (6) under the conditions of deposition pressure of 0.8 Pa and sputtering power of 200 W.

[0113] (8) A pure acrylic emulsion (polymer emulsion) is coated on the second surface of the glass substrate and dried at 5°C (low temperature) to form a second template layer with a thickness of 20 μm, a crack width of 15 μm, a crack spacing of 60 μm and a cracked structure.

[0114] (9) Using high-purity graphite as the sputtering target and argon as the sputtering gas, a type III diamond film with a thickness of 150 nm was deposited on the surface of the second template layer under the conditions of deposition pressure of 0.8 Pa and sputtering power of 200 W.

[0115] (10) Use chloroform (first solvent) to ultrasonically clean the glass for 20 minutes to dissolve and remove the second template layer, so that the third type of diamond film is only retained inside the crack, forming a second raised grid structure with a thickness of 150nm, a width of 15μm, and a crack spacing of 60μm.

[0116] (11) A fluorosilane polymer hydrophobic coating is applied to the surface of the second raised grid structure and baked at 80°C for 30 minutes to obtain a highly wear-resistant, hydrophobic and energy-saving glass.

[0117] The heat transfer coefficient of the insulating glass prepared in this embodiment is 1.59 W / (m²). 2 •K), visible light transmittance is 76.3%, water droplet contact angle is 153°; hydrophobic surface withstands 500g pressure (pressure area 1cm²). 2 After 10,000 cycles of rubbing with steel wool, the water droplet angle is 143°. After 10,000 cycles of rubbing with the same conditions, the wear-resistant surface shows no obvious rubbing marks, and the light transmittance remains unchanged.

[0118] Example 3

[0119] This embodiment provides a method for preparing highly wear-resistant, hydrophobic, and energy-saving glass, which mainly includes the following steps:

[0120] (1) Provide a glass substrate and clean and dry it. Place it in a magnetron sputtering device, use high-purity indium tin oxide as the sputtering target and argon as the sputtering gas. Under the conditions of deposition pressure of 1.2 Pa and sputtering power of 300 W, prepare an indium tin oxide thin film with a thickness of 300 nm on the first surface of the glass substrate.

[0121] (2) Pure acrylic emulsion (polymer emulsion) is coated onto the surface of indium tin oxide film by roller coating and dried at 15°C (low temperature) to form a first template layer with a thickness of 30 μm, a crack width of 25 μm, a crack spacing of 100 μm and a cracked structure.

[0122] (3) Using high-purity graphite as the sputtering target and argon as the sputtering gas, a first-type diamond film with a thickness of 70 nm was prepared by magnetron sputtering on the surface of the first template layer under the conditions of deposition gas pressure of 1.2 Pa and sputtering power of 300 W; and then using high-purity zinc oxide ceramic target as the sputtering target and argon as the sputtering gas, a zinc oxide film with a thickness of 400 nm was prepared by magnetron sputtering on the surface of the first-type diamond film under the conditions of deposition gas pressure of 1.2 Pa and sputtering power of 300 W.

[0123] (4) Use chloroform (first solvent) to ultrasonically clean the glass for 30 minutes to dissolve and remove the first template layer, so that the first type of diamond film and zinc oxide film are only retained inside the crack, forming a first raised grid structure with a thickness of 470nm, a width of 25μm and a crack spacing of 100μm.

[0124] (5) A silver layer, a nickel-chromium alloy layer, and a silicon nitride layer are sequentially prepared by magnetron sputtering on the surface of the first raised mesh structure:

[0125] A silver layer with a thickness of 12 nm was prepared using a high-purity silver target as the sputtering target and argon as the sputtering gas under the conditions of deposition pressure of 1.2 Pa and sputtering power of 80 W.

[0126] Using a nickel-chromium alloy target (nickel-chromium mass ratio 1:1) as the sputtering target and argon as the sputtering gas, a nickel-chromium alloy layer with a thickness of 4 nm was prepared under the conditions of deposition pressure of 1.2 Pa and sputtering power of 80 W.

[0127] Using high-purity silicon as the sputtering target and an argon-nitrogen mixture (flow ratio 1:1) as the sputtering gas, a silicon nitride layer with a thickness of 60 nm was prepared under the conditions of deposition pressure of 1.2 Pa and sputtering power of 200 W.

[0128] (6) Use a 5% sodium hydroxide solution (second solvent) to ultrasonically clean the glass for 30 minutes to dissolve and remove the zinc oxide film, so that the silver layer, nickel-chromium alloy layer and silicon nitride layer covering it fall off accordingly, thereby exposing the first raised mesh structure.

[0129] (7) Using high-purity graphite as the sputtering target and argon as the sputtering gas, a 40 nm thick second-type diamond film was deposited on the entire surface after step (6) under the conditions of deposition pressure of 1.2 Pa and sputtering power of 300 W.

[0130] (8) A pure acrylic emulsion (polymer emulsion) is coated on the second surface of the glass substrate and dried at 15°C (low temperature) to form a second template layer with a thickness of 30 μm, a crack width of 25 μm, a crack spacing of 100 μm and a cracked structure.

[0131] (9) Using high-purity graphite as the sputtering target and argon as the sputtering gas, a type III diamond film with a thickness of 200 nm was deposited on the surface of the second template layer under the conditions of deposition pressure of 1.2 Pa and sputtering power of 300 W.

[0132] (10) Use chloroform (first solvent) to ultrasonically clean the glass for 30 minutes to dissolve and remove the second template layer, so that the third type of diamond film is only retained inside the crack, forming a second raised grid structure with a thickness of 200 nm, a width of 25 μm, and a crack spacing of 100 μm.

[0133] (11) A fluorosilane polymer hydrophobic coating is applied to the surface of the second raised grid structure and baked at 80°C for 60 min to obtain a highly wear-resistant, hydrophobic and energy-saving glass.

[0134] The heat transfer coefficient of the insulating glass prepared in this embodiment is 1.49 W / (m²). 2 •K), visible light transmittance is 75.1%, water droplet contact angle is 155°; hydrophobic surface withstands 500g pressure (pressure area 1cm²). 2 After 10,000 cycles of rubbing with steel wool, the water droplet angle is 147°. After 10,000 cycles of rubbing with the same conditions, the wear-resistant surface shows no obvious rubbing marks, and the light transmittance remains unchanged.

[0135] Example 4

[0136] This embodiment provides a method for preparing highly wear-resistant, hydrophobic, and energy-saving glass, which mainly includes the following steps:

[0137] (1) Provide a glass substrate and clean and dry it. Place it in a magnetron sputtering device, use high-purity indium tin oxide as the sputtering target and argon as the sputtering gas. Under the conditions of deposition pressure of 0.8 Pa and sputtering power of 230 W, prepare an indium tin oxide thin film with a thickness of 250 nm on the first surface of the glass substrate.

[0138] (2) Pure acrylic emulsion (polymer emulsion) is coated onto the surface of indium tin oxide film by roller coating and dried at 8°C (low temperature) to form a first template layer with a thickness of 28μm, a crack width of 23μm, a crack spacing of 90μm and a cracked structure.

[0139] (3) Using high-purity graphite as the sputtering target and argon as the sputtering gas, a first-type diamond film with a thickness of 70 nm was prepared by magnetron sputtering on the surface of the first template layer under the conditions of deposition pressure of 0.8 Pa and sputtering power of 222 W; and then using high-purity zinc oxide ceramic target as the sputtering target and argon as the sputtering gas, a zinc oxide film with a thickness of 370 nm was prepared by magnetron sputtering on the surface of the first-type diamond film under the conditions of deposition pressure of 0.8 Pa and sputtering power of 250 W.

[0140] (4) The glass was ultrasonically cleaned for 26 minutes with chloroform (the first solvent) to dissolve and remove the first template layer, so that the first type of diamond film and zinc oxide film were retained only inside the crack, forming a first raised grid structure with a thickness of 440 nm, a width of 23 μm and a crack spacing of 90 μm.

[0141] (5) A silver layer, a nickel-chromium alloy layer, and a silicon nitride layer are sequentially prepared by magnetron sputtering on the surface of the first raised mesh structure:

[0142] Using high-purity silver as the sputtering target and argon as the sputtering gas, a silver layer with a thickness of 11 nm was prepared under the conditions of deposition pressure of 0.9 Pa and sputtering power of 60 W.

[0143] Using a nickel-chromium alloy target (nickel-chromium mass ratio 1:1) as the sputtering target and argon as the sputtering gas, a nickel-chromium alloy layer with a thickness of 3 nm was prepared under the conditions of deposition pressure of 0.9 Pa and sputtering power of 60 W.

[0144] Using high-purity silicon as the sputtering target and an argon-nitrogen mixture (flow ratio 1:1) as the sputtering gas, a silicon nitride layer with a thickness of 50 nm was prepared under the conditions of deposition pressure of 0.9 Pa and sputtering power of 160 W.

[0145] (6) Use a 5% sodium hydroxide solution (second solvent) to ultrasonically clean the glass for 23 minutes to dissolve and remove the zinc oxide film, so that the silver layer, nickel-chromium alloy layer and silicon nitride layer covering it fall off accordingly, thereby exposing the first raised mesh structure.

[0146] (7) Using high-purity graphite as the sputtering target and argon as the sputtering gas, a type II diamond film with a thickness of 35 nm was deposited on the entire surface after step (6) under the conditions of deposition pressure of 0.9 Pa and sputtering power of 222 W.

[0147] (8) A pure acrylic emulsion (polymer emulsion) is coated on the second surface of the glass substrate and dried at 5°C (low temperature) to form a second template layer with a thickness of 30 μm, a crack width of 25 μm, a crack spacing of 100 μm and a cracked structure.

[0148] (9) Using high-purity graphite as the sputtering target and argon as the sputtering gas, a type III diamond film with a thickness of 170 nm was deposited on the surface of the second template layer under the conditions of deposition pressure of 0.9 Pa and sputtering power of 230 W.

[0149] (10) The glass was ultrasonically cleaned for 23 minutes using chloroform (the first solvent) to dissolve and remove the second template layer, so that the third type of diamond film was retained only inside the crack, forming a second raised grid structure with a thickness of 170 nm, a width of 25 μm, and a crack spacing of 100 μm.

[0150] (11) A fluorosilane polymer hydrophobic coating is applied to the surface of the second raised grid structure and baked at 80°C for 50 min to obtain a highly wear-resistant, hydrophobic and energy-saving glass.

[0151] The heat transfer coefficient of the insulating glass prepared in this embodiment is 1.52 W / (m²). 2 •K), visible light transmittance is 75.5%, water droplet contact angle is 154°; hydrophobic surface withstands 500g pressure (pressure area 1cm²). 2 After 10,000 cycles of rubbing with steel wool, the water droplet angle is 145°. After 10,000 cycles of rubbing with the same conditions, the wear-resistant surface shows no obvious rubbing marks, and the light transmittance remains unchanged.

[0152] VII. Conclusion

[0153] The four embodiments described above selected different values ​​for key parameters in the technical solution of this invention, such as deposition gas pressure, sputtering power, film thickness, and process time (e.g., deposition gas pressure ranging from 0.8 to 1.2 Pa, sputtering power from 50 to 300 W, and film thickness from 3 to 400 nm), and all successfully prepared high-wear-resistant, hydrophobic, and energy-saving glass that met the design requirements. The results show that the heat transfer coefficient of the insulating glass in all embodiments is ≤1.6 W / (m²). 2 ·K) (Minimum 1.49W / (m 2 The glass exhibits a visible light transmittance of ≥75% (maximum 76.3%), an initial water droplet contact angle of ≥150° (maximum 155°), and after being rubbed 10,000 times with steel wool under 500g pressure, the water droplet angle on the hydrophobic surface remains ≥140° and the wear-resistant surface shows no signs of friction. This fully demonstrates that the process system of this invention can produce energy-saving, high-transmittance, high-hydrophobicity, and high-wear-resistant glass, which is fully compatible with the long-term performance requirements of glass in practical application scenarios such as building curtain walls.

[0154] The above description is merely a preferred embodiment of the present invention and is not intended to limit the scope of the invention in any way. All equivalent transformations or modifications made in accordance with the essence of the present invention should be covered within the protection scope of the present invention.

Claims

1. A method for preparing highly wear-resistant, hydrophobic, and energy-saving glass, characterized in that, Includes the following steps: (1) A glass substrate is provided, and an indium tin oxide film is deposited on its first surface; (2) A polymer emulsion is coated on the surface of the indium tin oxide film and dried at low temperature to form a first template layer with a cracked structure, wherein the cracked structure has cracks with a width of 15-25 μm and a spacing of 60-100 μm; (3) A first-type diamond film and a zinc oxide film are sequentially deposited on the surface of the first template layer; (4) The first template layer is dissolved and removed using the first solvent, so that the first diamond film and zinc oxide film are retained only inside the crack, forming the first raised mesh structure; (5) A silver layer, a nickel-chromium alloy layer and a silicon nitride layer are sequentially deposited on the surface of the first raised mesh structure; (6) The zinc oxide film is dissolved and removed by a second solvent, causing the silver layer, nickel-chromium alloy layer and silicon nitride layer covering it to fall off accordingly, thereby exposing the first raised mesh structure; (7) Deposit a second type diamond film on the entire surface after the treatment in step (6); (8) A polymer emulsion is coated on the second surface of the glass substrate and dried at low temperature to form a second template layer with a cracked structure, wherein the cracked structure has cracks with a width of 15-25 μm and a spacing of 60-100 μm; (9) Deposit a third type of diamond film on the surface of the second template layer; (10) The second template layer is dissolved and removed using the first solvent, so that the third type of diamond film is retained only inside the crack, forming a second raised mesh structure; (11) A hydrophobic coating is applied to the surface of the second raised mesh structure, and a hydrophobic surface is formed by heat treatment.

2. The preparation method according to claim 1, characterized in that, The polymer emulsion is a pure acrylic emulsion, the first solvent is chloroform, and the second solvent is an alkaline solution.

3. The preparation method according to claim 1, characterized in that, In step (1), the deposition thickness of the indium tin oxide film is 200-300 nm.

4. The preparation method according to claim 1, characterized in that, In step (3), the deposition thickness of the first type of diamond film is 60-70 nm, and the deposition thickness of the zinc oxide film is 300-400 nm.

5. The preparation method according to claim 1, characterized in that, In step (5), the deposition thickness of the silver layer is 8-12 nm, the deposition thickness of the nickel-chromium alloy layer is 3-4 nm, and the deposition thickness of the silicon nitride layer is 50-60 nm.

6. The preparation method according to claim 1, characterized in that, In step (7), the deposition thickness of the second type of diamond film is 30-40 nm.

7. The preparation method according to claim 1, characterized in that, In step (9), the deposition thickness of the third type of diamond film is 150-200 nm.

8. The preparation method according to claim 1, characterized in that, The raw material used for applying the hydrophobic coating is a fluorosilane polymer hydrophobic coating.

9. A highly wear-resistant, hydrophobic, and energy-saving glass, characterized in that, Prepared by the method according to any one of claims 1-8.

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