Detection method, processing method and processing device of pole piece

Abstract

The invention relates to the technical field of batteries, in particular to a pole piece detection method, a pole piece processing method and a pole piece processing device. The detection method comprises the following steps: acquiring the embossing height in a first area; the height of embossing in a second area is obtained, the second area and the first area are arranged in the second direction, and the second direction is perpendicular to the first direction. According to the detection method, the embossing height of the pole piece can be detected in the process that the pole piece moves in the first direction, the detection method is online detection, the pole piece can be detected without stopping the processing device, and the detection method can be used for fully detecting the pole piece. In the process of detecting the embossing height of the pole piece, the first area and the second area are arranged in the second direction, embossing at different positions of the embossing mechanism can be detected, whether installation of the embossing mechanism is horizontal or not can be judged, the accuracy of the detection method is high, and faults in the embossing process can be found in time.

Description

Technical Field

[0001] This application relates to the field of battery technology, and in particular to a method for detecting, processing, and processing apparatus for electrode sheets. Background Technology

[0002] With the development of new energy sources, more and more fields are adopting new energy as their power source. Due to their advantages such as high energy density, rechargeability, safety, and environmental friendliness, battery devices are widely used in new energy vehicles, consumer electronics, and energy storage systems. In the battery manufacturing process, electrode embossing is a crucial step in the winding process. The height of the embossing on the electrode is also one of the more important parameters of the electrode.

[0003] In related technologies, the accuracy of detecting the embossing height of electrode sheets is relatively low. Summary of the Invention

[0004] This application aims to at least solve one of the technical problems existing in the prior art. To this end, this application proposes a method for detecting electrode sheets, a processing method, and a processing apparatus, which can increase the accuracy of detecting the height of the embossing on the electrode sheets.

[0005] According to the electrode detection method of the first aspect of this application, the electrode has a first region and a second region, both the first region and the second region are embossed, and the embossing height is obtained by a detection device. The detection method includes: The height of the embossing within a first region is obtained, and the first region extends along a first direction; The height of the embossed pattern within the second region is obtained. The second region extends along the first direction, and the second region and the first region are arranged along a second direction, with the second direction perpendicular to the first direction. The electrode detection method according to the embodiments of this application has at least the following beneficial effects: In the embodiment of this application, the embossing height of the electrode sheet can be detected during the movement of the electrode sheet along the first direction. The detection method is an online detection that can detect the electrode sheet without stopping the processing device, and the detection method can perform a full inspection of the electrode sheet. During the detection of the embossing height of the electrode sheet, the first region and the second region are arranged along the second direction, thereby enabling the detection of embossing at different positions of the embossing mechanism and determining whether the embossing mechanism is installed horizontally. The detection method of this application has high accuracy and can detect faults in the embossing process relatively quickly.

[0006] According to some embodiments of this application, along the second direction, the electrode has opposing first and second edges, and the first region and the second region are both arranged spaced apart from the first edge and the second edge.

[0007] The detection device has a first position, a second position, and a third position arranged along the second direction. When the detection device is located at the first position, it can scan the first area; when the detection device is located at the second position, it can scan the second area; and when the detection device is located at the third position, it can scan the third area. After obtaining the height of the embossed pattern within the first area, the detection method further includes: The detection device is controlled to move toward the second position along the second direction until the detection device moves to the second position; After obtaining the height of the embossed pattern in the second region, the detection method further includes: The control detection device moves along the second direction toward the third position until the detection device moves to the third position; Specifically, when the detection device moves from the first position to the second position, and from the second position to the third position, the detection device stops scanning.

[0008] According to some embodiments of this application, along the second direction, the electrode has opposing first and second edges, and the first region and the second region are both arranged spaced apart from the first edge and the second edge.

[0009] According to some embodiments of this application, the average height of the embossed pattern in the first region is a first average height, and the average height of the embossed pattern in the second region is a second average height. After obtaining the height of the embossed pattern in the second region, the detection method further includes: Obtain the difference between the first average height and the second average height; A defect is determined to have occurred when the absolute value of the difference is greater than or equal to a preset height.

[0010] According to some embodiments of this application, when the size of the electrode sheet along the first direction is greater than or equal to 1200 mm, the sizes of the first region and the second region along the first direction are both greater than or equal to twice the circumference of the embossing mechanism; and / or, when the size of the electrode sheet along the first direction is less than 1200 mm, the sizes of the first region and the second region along the first direction are both greater than or equal to the circumference of the embossing mechanism, and less than the circumference of the embossing mechanism.

[0011] According to some embodiments of this application, the electrode has an embossed region extending along the first direction, the embossed region including a starting region and an ending region, the starting region and the ending region being located at opposite ends of the embossed region along the first direction, and the detection method includes: When the detection device passes through the starting area or the ending area, the detection device is controlled to stop scanning.

[0012] Embodiments of this application also provide a processing method for processing electrode sheets, the processing method comprising: Control the embossing mechanism to emboss the electrode sheets; Control the electrode to move along the first direction; During the embossing process of the electrode sheet by the embossing mechanism, the electrode sheet passing through the embossing mechanism is detected using any of the above-described detection methods; The electrode is controlled to move toward the roller along the first direction.

[0013] Embodiments of this application also provide a processing apparatus for processing electrode sheets, the processing apparatus comprising: Machine tool; An embossing mechanism is installed on the machine base, and the embossing mechanism is used to emboss the electrode sheet; A detection device is installed on the machine tool, and the detection device is configured to use the detection method as described in any of the above. The embossing mechanism, the detection device, and the roller are arranged sequentially along the direction of movement of the electrode sheet.

[0014] Additional aspects and advantages of this application will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of this application. Attached Figure Description

[0015] The present application will be further described below with reference to the accompanying drawings and embodiments, wherein: Figure 1 This is a schematic flowchart of a method for detecting an electrode sheet in one embodiment of this application; Figure 2 This is a schematic flowchart of a method for detecting an electrode sheet in one embodiment of this application; Figure 3 This is a simplified structural diagram of an electrode sheet in one embodiment of this application. The type of electrode sheet in the diagram is an electrode sheet with a tab in the center. Figure 4 This is a simplified structural diagram of an electrode sheet in one embodiment of this application. The type of electrode sheet in the diagram is a non-tab-centered electrode sheet.

[0016] Figure label: 100, electrode sheet; 100a, first edge; 100b, second edge; 110, embossing; 120, first region; 130, second region; 140, third region; 150, embossed area; 151, starting region; 152, ending region; 200, electrode tab. Detailed Implementation

[0017] The embodiments of this application are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this application, and should not be construed as limiting this application.

[0018] In the description of this application, it should be understood that the orientation descriptions, such as up, down, front, back, left, right, etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.

[0019] In the description of this application, "several" means one or more, "multiple" means two or more, "greater than," "less than," and "exceeding" are understood to exclude the stated number, while "above," "below," and "within" are understood to include the stated number. The use of "first" and "second" in the description is merely for distinguishing technical features and should not be construed as indicating or implying relative importance, or implicitly indicating the number of indicated technical features, or implicitly indicating the order of the indicated technical features.

[0020] In the description of this application, unless otherwise expressly defined, terms such as "setup," "installation," and "connection" should be interpreted broadly, and those skilled in the art can reasonably determine the specific meaning of the above terms in this application in conjunction with the specific content of the technical solution.

[0021] In the description of this application, the terms "one embodiment," "some embodiments," "illustrative embodiment," "example," "specific example," or "some examples," etc., refer to specific features, structures, materials, or characteristics described in connection with that embodiment or example, which are included in at least one embodiment or example of this application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0022] In related technologies, there are no standards or methods for online measurement of electrode embossing height. When it is necessary to detect the embossing height of the electrode, the machine must be stopped or the height must be measured after processing is completed. During the inspection process, randomly sampled electrodes that have already been embossed are taken, usually the first and last electrodes, for offline inspection. This inspection method makes it difficult to detect processing defects in a timely manner and also makes it difficult to guarantee the accuracy of height measurement.

[0023] In the electrode sheet 100 inspection method of this application, the inspection is performed during the movement of the electrode sheet 100 along the first direction, thereby enabling online detection of the embossing height 110 of the electrode sheet 100. This inspection method can perform a full inspection of the electrode sheet 100, thus enabling timely detection of processing defects with high accuracy. Furthermore, the first region 120 and the second region 130 are arranged along the second direction, allowing for the inspection of the embossing 110 in different regions of the embossing 110 mechanism, thereby further improving the accuracy of the inspection.

[0024] This application provides a method for detecting an electrode 100. Please refer to [link to relevant documentation]. Figure 1 and Figure 2 The electrode 100 has a first region 120 and a second region 130, both of which have embossing 110. The height of the embossing 110 is obtained by a detection device. The detection method for the electrode 100 includes: Step S1: Obtain the height of the embossing in the first region, where the first region 120 extends along the first direction; Step S2: Obtain the height of the embossed pattern in the second region. The second region 130 extends along the first direction. The second region 130 and the first region 120 are arranged along the second direction, and the second direction is perpendicular to the first direction.

[0025] For example, the first direction is parallel to the length direction of the electrode 100, and steps S1 and S2 are both performed during the movement of the electrode 100 along the first direction. The second direction is parallel to the height direction of the electrode 100, and both the first and second directions are parallel to the horizontal plane. The first region 120 and the second region 130 are approximately rectangular in shape, and the first region 120 and the second region 130 are arranged along the second direction and along the first direction. For example, the first direction is as follows: Figure 3 The direction indicated by the middle arrow R1, the second direction is as follows Figure 3 The direction indicated by the middle arrow R2.

[0026] In the embodiment of this application, the height detection of the embossing 110 of the electrode 100 can be performed during the movement of the electrode 100 along the first direction. The detection method is an online detection that can detect the electrode 100 without stopping the processing device, and the detection method can perform a full inspection of the electrode 100. During the height detection of the embossing 110 of the electrode 100, the first region 120 and the second region 130 are arranged along the second direction, thereby enabling the detection of the pattern protrusions at different positions of the embossing 110 mechanism, and determining whether the installation of the embossing 110 mechanism is horizontal. The detection method of this application has high accuracy and can detect faults in the embossing 110 process in a relatively timely manner.

[0027] In one embodiment, please refer to Figure 3 and Figure 4 Along the second direction, the electrode 100 has opposing first edges 100a and second edges 100b, and first regions 120 and second regions 130 are both spaced apart from the first edges 100a and second edges 100b. Exemplarily, the first edges 100a and second edges 100b both extend along the first direction, and a third region 140 is spaced apart from both the first edges 100a and second edges 100b. The spacing between the first region 120, the second region 130, and the third region 140 and the first edges 100a and second edges 100b has at least three rows of embossing 110. During the embossing 110 process on the electrode 100, the pressure of the embossing 110 mechanism along the second direction may be uneven, and the pressure at the edges may be smaller. Therefore, the embossing 110 near the first edge 100a and the second edge 100b of the electrode 100 may not accurately reflect whether the embossing 110 mechanism is horizontal, or the degree of wear of the patterned protrusions on the embossing 110 mechanism. The first region 120 and the second region 130 are located between the first edge 100a and the second edge 100b, which can reflect the horizontal installation of the embossing mechanism 110 as much as possible and reduce misjudgment of defects.

[0028] In one embodiment, please refer to Figure 3 and Figure 4 The electrode 100 has a central axis extending along the first direction. Along the second direction, the distance between the first region 120 and the first edge 100a is less than the distance between the first region 120 and the second edge 100b and the central axis. Similarly, the distance between the second region 130 and the second edge 100b is less than the distance between the second region 130 and the first edge 100a and the central axis. The first region 120 and the second region 130 are located on opposite sides of the electrode 100 along the second direction. When a deviation occurs in the embossing 110 mechanism, the difference in embossing height between the first region 120 and the second region 130 is relatively large, thus enabling more accurate detection of deviations in the installation position of the embossing 110 mechanism.

[0029] In one embodiment, please refer to Figures 2 to 4 After obtaining the height of the embossed pattern 110 within the second region 130, the detection method also includes: Step S3: Obtain the height of the embossed pattern within the third region. The third region 140 extends along the first direction, and the third region 140, the first region 120, and the second region 130 are all arranged along the second direction. For example, the first region 120, the second region 130, and the third region 140 are arranged sequentially along the first direction. It is understood that the embodiments of this application do not limit the arrangement of the first region 120, the second region 130, and the third region 140 along the second direction. Along the second direction, the arrangement of the first region 120, the second region 130, and the third region 140 can be, for example, the first region 120, the second region 130, and the third region 140 arranged sequentially, or it can be the first region 120, the third region 140, and the second region 130 arranged sequentially.

[0030] In this design, the first region 120, the second region 130, and the third region 140 are arranged alternately along the second direction. It is understood that the alternate arrangement of the first region 120, the second region 130, and the third region 140 along the second region 130 means that, when projected along the first direction, the projected areas of the first region 120, the second region 130, and the third region 140 do not overlap. The staggered arrangement of the first region 120, the second region 130, and the third region 140 allows for the detection of as many pattern protrusions as possible in different areas of the embossing mechanism 110. The first region 120, the second region 130, and the third region 140 can respectively reflect the embossed patterns 110 processed at different positions along the second direction, thereby further improving the accuracy of the detection method. For example, along the second direction, the number of rows of embossed patterns 110 included in the first region 120, the second region 130, and the third region 140 can be a single row, or two or three rows.

[0031] It is understood that other embodiments of this application are not limited to the first region 120, the second region 130, and the third region 140 being arranged alternately along the second direction. Exemplarily, the first region 120, the second region 130, and the third region 140 partially overlap along the second direction.

[0032] In one embodiment, please refer to Figure 1 The detection device has a first position, a second position, and a third position arranged along the second direction. When the detection device is in the first position, it can scan the first region 120; when the detection device is in the second position, it can scan the second region 130; and when the detection device is in the third position, it can scan the third region 140. After obtaining the height of the embossing 110 within the first region 120, the detection method further includes: Step S4: Control the detection device to move along the second direction toward the second position until the detection device moves to the second position; After obtaining the height of the embossed pattern within the second region 130 (110), the detection method also includes: Step S5: Control the detection device to move along the second direction toward the third position until the detection device moves to the third position; Specifically, when the detection device moves from the first position to the second position, and from the second position to the third position, the detection device stops scanning.

[0033] For example, during the execution of steps S4 and S5, the electrode 100 continues to move along the first direction, while the detection device moves relative to the electrode 100 along an oblique direction. The movement direction of the detection device relative to the electrode 100 intersects with both the first and second directions. The detection device can be a CCD (charge-coupled device) camera. While the detection device moves along the second direction, the electrode 100 continues to move along the first direction. The detection device may vibrate during its movement, and the relative speed between the detection device and the electrode 100 is relatively large. This may cause distortion in the embossed pattern 110 scanned by the detection device, making it difficult to accurately detect the height of the embossed pattern 110. Stopping the scanning while the detection device moves along the second direction can reduce the impact of inaccurate scanning of the embossed pattern 110 height on the detection results, thereby increasing the accuracy of the detection results to a certain extent.

[0034] In one embodiment, please refer to Figure 1 The average height of the embossed flowers 110 within the first region 120 is the first average height, and the average height of the embossed flowers 110 within the second region 130 is the second average height. After obtaining the height of the embossed flowers 110 within the second region 130, the detection method further includes: Step S6: Obtain the difference between the first average height and the second average height; Step S7: When the absolute value of the difference is greater than or equal to the preset height, a defect is determined to have occurred.

[0035] In the embodiment of this application, the difference between the first average height and the second average height is used to determine whether there is a defect in the installation position of the embossing mechanism 110. When the difference between the first average height and the second average height is large, it can be determined that the axial direction of the embossing mechanism 110 forms an angle with the horizontal plane, indicating a deviation in the installation position of the embossing mechanism 110. This may result in some areas having a deeper embossing height and others having a shallower embossing height. For example, the preset height can be 10 μm. When the absolute value of the difference between the first average height and the second average height is greater than or equal to 10 μm, it can be determined that the difference between the first region 120 and the second region 130 is large, indicating a deviation in the installation position of the embossing mechanism 110.

[0036] It is understood that other embodiments of this application are not limited to determining whether a defect has occurred based on the relationship between the absolute value of the difference and a preset height. For example, a defect can be determined by the relationship between the height of the embossed 110 in the first region 120 and the second region 130 and a height threshold. For example, the height threshold can be 200 μm. A fault is determined to have occurred when the height of the embossed 110 in the first region 120 and the second region 130 exceeds 200 μm. When the height of the embossed 110 is large, the current collector is thinner, the tensile strength is reduced, and the electrode 100 may break, leading to powder shedding.

[0037] In another embodiment, the average height of the embossed 110 within the third region 140 is the third average height. The detection method further includes obtaining the difference between any two of the first average height, the second average height, and the third average height. When the absolute value of the range of the first average height, the second average height, and the third average height is greater than or equal to a preset height, a defect is determined to have occurred.

[0038] In one embodiment, when the dimension of the electrode 100 along the first direction is greater than or equal to 1200 mm, the dimensions of the first region 120 and the second region 130 along the first direction are both greater than or equal to twice the perimeter of the embossing mechanism 110; and / or, when the dimension of the electrode 100 along the first direction is less than 1200 mm, the dimensions of the first region 120 and the second region 130 along the first direction are both greater than or equal to the perimeter of the embossing mechanism 110, and less than the perimeter of the embossing mechanism 110. Exemplarily, the embossing mechanism 110 rolls once while pressed against the electrode 100, and the distance of the pressed area along the first direction is equal to the perimeter of the embossing mechanism 110, which is typically 200 mm. When the electrode 100 is relatively long, the dimensions of either the first region 120 or the second region 130 along the first direction are both greater than or equal to twice the circumference of the embossing mechanism 110. The first region 120 and the second region 130 can detect areas where the embossing mechanism 110 is pressed into two different regions along the second direction. In the event of damage to the embossing mechanism 110, the first region 120 and the second region 130 can detect it as much as possible. Conversely, when the electrode 100 is relatively short along the first direction, the first region 120 and the second region 130 can also detect areas where the embossing mechanism 110 is pressed into one different region along the second direction. For example, when the dimension of the electrode 100 along the first direction is greater than or equal to 1200 mm, the dimension of the third region 140 along the first direction is greater than or equal to twice the circumference of the embossing mechanism 110; when the dimension of the electrode 100 along the first direction is less than 1200 mm, the dimension of the third region 140 along the first direction is greater than or equal to the circumference of the embossing mechanism 110, and less than the circumference of the embossing mechanism 110.

[0039] In one embodiment, please refer to Figure 3 and Figure 4 The electrode 100 has an embossed region 150 extending along a first direction. The embossed region 150 includes a starting region 151 and an ending region 152, which are located at opposite ends of the embossed region 150 along the first direction. The detection method includes: Step S8: When the detection device passes through the starting area 151 and / or the ending area 152, the detection device is controlled to stop scanning. It is understood that as the embossing mechanism 110 approaches and moves away from the electrode 100, the embossing 110 experiences a certain amount of acceleration relative to the electrode 100. While the electrode 100 continues to move along the first direction, the height of the embossing 110 in the starting area 151 and the ending area 152 may be too small or too large. This situation is caused by relative acceleration and is not due to defects in the embossing mechanism or processing device. Stopping the detection when the detection device passes through the starting area 151 and the ending area 152 can reduce the impact of the height of this portion of the embossing 110 on the detection results and reduce the possibility of false faults.

[0040] In one embodiment, please refer to Figure 3 and Figure 4 The starting region 151 is located at one end of the first region 120 away from the second region 130, and the ending region 152 is located at one end of the second region 130 away from the first region 120. When the detection device obtains the height of the embossing 110 in the third region 140, the starting region 151 is located at one end of the first region 120 away from the second region 130, and the ending region 152 is located at one end of the third region 140 away from the first region 120. The embossed region 150 extends continuously along the first direction from one end of the electrode 100 to the other end of the electrode 100.

[0041] In another embodiment, the electrode 100 is a type where the electrode tab 200 is centrally located. The electrode 100 has a plurality of embossed areas 150 spaced apart along a first direction, and the electrode tab 200 is connected between two adjacent embossed areas 150. Each embossed area 150 has a starting area 151 and an ending area 152 at opposite ends along the first direction.

[0042] An embodiment of this application also provides a processing method for processing electrode 100, the processing method including: The embossing mechanism 110 is used to emboss the electrode sheet 100; Control electrode 100 to move along the first direction; During the process of embossing the electrode 100 by the embossing mechanism 110, the electrode 100 after passing through the embossing mechanism 110 is tested using any of the above-mentioned testing methods. The control electrode 100 moves toward the roller in the first direction.

[0043] In the embodiment of this application, the roller applies pressure to the embossing 110, causing the height of the embossing 110 to shrink to a certain extent. After the embossing 110 mechanism performs the embossing 110 process on the electrode 100, the electrode 100 of the embossing 110 mechanism is inspected using a detection method. This allows the detection method to identify embossing 110 with processing defects before the height of the embossing 110 shrinks back, thereby enabling more accurate detection of embossing 110 with abnormal height.

[0044] Embodiments of this application also provide a processing apparatus for processing electrode sheets 100. The processing apparatus includes a machine base, an embossing mechanism 110, a detection device, and a guide roller. The embossing mechanism 110 is mounted on the machine base and is used to emboss the electrode sheet 100. Exemplarily, the embossing mechanism 110 is an embossing roller, and the surface of the embossing mechanism has multiple patterned raised dots. The detection device is mounted on the machine base and is located downstream of the embossing mechanism 110. The detection device is configured to use any of the detection methods described above. The guide roller is mounted on the machine base and is located downstream of the detection device. Along the movement direction of the electrode sheet 100, the embossing mechanism 110, the detection device, and the guide roller are arranged sequentially.

[0045] Embodiments of this application also provide a storage medium, which is a computer-readable storage medium, and stores a computer program thereon. When the computer program is executed by a processor, it implements the steps of the detection method for the electrode 100 as described above.

[0046] The above embodiments are merely illustrative of the technical solutions of this application and are not intended to limit it. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. These modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application, and all should be covered within the scope of the specification of this application. In particular, as long as there is no structural conflict, the various technical features mentioned in the embodiments can be combined in any way. This application is not limited to the specific embodiments disclosed herein, but includes all technical solutions falling within the scope of protection.

Claims

1. A method for detecting electrodes, characterized in that, The electrode has a first region and a second region, both of which are embossed. The embossing height is obtained by a detection device, and the detection method includes: The height of the embossing within a first region is obtained, and the first region extends along a first direction; The height of the embossed pattern within the second region is obtained. The second region extends along the first direction. The second region and the first region are arranged along the second direction. The second direction is perpendicular to the first direction.

2. The detection method according to claim 1, characterized in that, Along the second direction, the electrode has opposing first and second edges, and the first region and the second region are arranged at intervals from the first edge and the second edge.

3. The detection method according to claim 2, characterized in that, The electrode has a central axis extending along the first direction. Along the second direction, the distance between the first region and the first edge is less than the distance between the first region and the second edge and the central axis, and the distance between the second region and the second edge is less than the distance between the second region and the first edge and the central axis.

4. The detection method according to claim 1, characterized in that, After obtaining the height of the embossed pattern in the second region, the detection method further includes: The height of the embossing in the third region is obtained. The third region extends along the first direction, and the third region, the first region, and the second region are all arranged along the second direction. The first region, the second region, and the third region are arranged alternately along the second direction.

5. The detection method according to claim 4, characterized in that, The detection device has a first position, a second position, and a third position arranged along the second direction. When the detection device is located at the first position, it can scan the first area; when the detection device is located at the second position, it can scan the second area; and when the detection device is located at the third position, it can scan the third area. After obtaining the height of the embossed pattern within the first area, the detection method further includes: The detection device is controlled to move toward the second position along the second direction until the detection device moves to the second position; After obtaining the height of the embossed pattern in the second region, the detection method further includes: The control detection device moves along the second direction toward the third position until the detection device moves to the third position; Specifically, when the detection device moves from the first position to the second position, and from the second position to the third position, the detection device stops scanning.

6. The detection method according to claim 1, characterized in that, The average height of the embossed pattern in the first region is the first average height, and the average height of the embossed pattern in the second region is the second average height. After obtaining the height of the embossed pattern in the second region, the detection method further includes: Obtain the difference between the first average height and the second average height; A defect is determined to have occurred when the absolute value of the difference is greater than or equal to a preset height.

7. The detection method according to claim 1, characterized in that, When the size of the electrode sheet along the first direction is greater than or equal to 1200 mm, the size of both the first region and the second region along the first direction is greater than or equal to twice the circumference of the embossing mechanism. And / or, when the size of the electrode sheet along the first direction is less than 1200 mm, the sizes of the first region and the second region along the first direction are both greater than or equal to the circumference of the embossing mechanism, and less than the circumference of the embossing mechanism.

8. The detection method according to claim 1, characterized in that, The electrode has an embossed region extending along the first direction, the embossed region including a starting region and an ending region, the starting region and the ending region being located at opposite ends of the embossed region along the first direction, and the detection method includes: When the detection device passes through the starting area and / or the ending area, the detection device is controlled to stop scanning.

9. A processing method, characterized in that, The processing method, used in electrode fabrication, includes: Control the embossing mechanism to emboss the electrode sheets; Control the electrode to move along the first direction; During the embossing process of the electrode sheet by the embossing mechanism, the electrode sheet is tested using the detection method as described in any one of claims 1 to 8; The electrode is controlled to move toward the roller along the first direction.

10. A processing apparatus, characterized in that, The processing apparatus, used for processing electrode sheets, includes: Machine tool; An embossing mechanism is installed on the machine base, and the embossing mechanism is used to emboss the electrode sheet; A detection device is installed on the machine tool, and the detection device is configured to use the detection method as described in any one of claims 1 to 8; The embossing mechanism, the detection device, and the roller are arranged sequentially along the direction of movement of the electrode sheet.

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