Micro-nano preparation and characterization device

Abstract

The invention discloses a micro-nano preparation and characterization device, and relates to the technical field of micro-nano. The micro-nano preparation and characterization device comprises a frame body, a supporting plate, a first adjusting platform and a scanning probe module, the frame body comprises a bottom plate and a top plate which are arranged in parallel, the supporting plate is rotationally arranged on the bottom plate and used for supporting and fixing a sample, the first adjusting platform is arranged below the top plate, and the scanning probe module is arranged on the first adjusting platform. The scanning probe module is arranged on the first adjusting platform, the height of the scanning probe module is adjustable, the scanning probe module is used for preparing and representing a sample, and the first adjusting platform is used for adjusting the position of the scanning probe module relative to the circle center of a to-be-operated area of the sample. According to the micro-nano preparation and characterization device, the position limitation of the supporting platform on the scanning probe module can be relieved, large-range and continuous etching and scanning operation on the sample is achieved, and the micro-nano preparation and characterization efficiency is improved.

Description

Technical Field

[0001] This invention relates to the field of micro-nano technology, and more specifically, to a micro-nano fabrication and characterization apparatus. Background Technology

[0002] The field of micro / nano technology encompasses numerous processes such as etching, assembly, morphology scanning, and detection of micro / nano components. For example, taking etching as an example, a nanoscale scanning probe interacts with the sample to etch the desired pattern onto the sample. During morphology scanning of micro / nano components, the scanning probe scans the finished micro / nano component to acquire morphology information, thereby detecting the etching effect.

[0003] In related technologies, the main structure of micro-nano fabrication systems applied in the field of micro-nano device processing includes a scanning probe module and a support platform. The scanning probe module is set on the support platform with three-point support. Due to the limited range of movement of the scanning probe module, the actual etchable area and the scanning morphology range are small, which makes it unsuitable for large samples such as wafers. Moreover, when inspecting large wafers, only local operations can be performed, and it is impossible to comprehensively and quickly obtain information about the entire surface of the wafer or etch the entire wafer. There is a potential risk of etching and scanning omissions, which seriously affects the efficiency of micro-nano fabrication and characterization. Summary of the Invention

[0004] The present invention aims to at least partially solve one of the technical problems in the related art.

[0005] To address this, this invention proposes a micro / nano fabrication and characterization device that removes the positional limitations of the support platform on the scanning probe module, enabling large-scale and continuous etching and scanning operations on samples, thereby improving the efficiency of micro / nano fabrication and characterization.

[0006] The micro / nano fabrication and characterization apparatus of this invention includes:

[0007] The frame includes a bottom plate and a top plate arranged in parallel.

[0008] A support plate, which is rotatably mounted on the base plate, is used to support and fix the sample;

[0009] A first adjustment platform and a scanning probe module are provided. The first adjustment platform is located below the top plate, and the scanning probe module is located on the first adjustment platform and its height is adjustable. The scanning probe module is used for sample preparation and characterization, and the first adjustment platform is used to adjust the position of the scanning probe module relative to the center of the sample working area.

[0010] The micro / nano fabrication and characterization apparatus of this invention can remove the positional restrictions of the support platform on the scanning probe module, enabling large-scale and continuous etching and scanning operations on the sample, thereby improving the efficiency of micro / nano fabrication and characterization.

[0011] In some embodiments, the scanning probe module includes a housing and a plurality of connecting rods, the plurality of connecting rods being spaced apart from the housing, and each connecting rod being provided with a connector for connecting to the first adjustment platform, the connector being used to drive the scanning probe module to move toward or away from the first adjustment platform.

[0012] In some embodiments, at least three connecting rods are provided, and the at least three connecting rods are spaced apart circumferentially along the housing, and the at least three connecting rods are used to adjust the tilt angle of the scanning probe module.

[0013] In some embodiments, the connector is made of a flexible material, a drum is rotatably mounted on the first adjustment platform, the connector is wound around the drum, and a drive unit is fixedly mounted on the first adjustment platform. The drive unit is connected to the drum and drives the drum to rotate to tighten or release the connector.

[0014] In some embodiments, the connecting rod is provided with connecting holes, the plurality of connecting holes are equidistant from the top surface of the housing, and a connecting ring is provided on the connecting hole, the connecting ring being connected to the connecting member.

[0015] In some embodiments, the connector is a direct drive module, one end of the connector is fixedly connected to the first adjustment platform, and the other end of the connector is hinged to the connecting rod.

[0016] In some embodiments, the first adjustment platform includes a connecting plate, a first plate, and a second plate. The connecting plate is fixedly disposed on the top plate. The first plate is adjustablely disposed on the connecting plate along a first direction. The second plate is adjustablely disposed on the first plate along a second direction. The first direction and the second direction intersect and are parallel to the connecting plate respectively. The scanning probe module is connected to the second plate.

[0017] In some embodiments, the first adjustment platform is provided in multiple ways, and the multiple first adjustment platforms are arranged in a ring and spaced apart from the support plate, and the scanning probe module is arranged in a one-to-one correspondence with the first adjustment platform.

[0018] In some embodiments, a second adjustment platform is further included, which is disposed on the base plate, and the support plate is rotatably disposed on the second adjustment platform. The second adjustment platform is used to drive the support plate to move along the length direction and the width direction of the base plate, respectively.

[0019] In some embodiments, the second adjustment platform includes a third plate and a fourth plate, the third plate being disposed on the base plate and adjustable in position along the length direction of the base plate, the fourth plate being disposed on the third plate and adjustable in position along the width direction of the base plate, and the support plate being rotatably disposed on the fourth plate. Attached Figure Description

[0020] Figure 1 This is a first-view structural schematic diagram of the micro / nano fabrication and characterization apparatus according to an embodiment of the present invention.

[0021] Figure 2 This is a second-view structural schematic diagram of the micro / nano fabrication and characterization device according to an embodiment of the present invention.

[0022] Figure 3 This is a schematic diagram showing the connection between the first adjustment platform and the scanning probe module in the micro / nano fabrication and characterization apparatus of this invention.

[0023] Figure 4 This is a schematic diagram of the arrangement of multiple scanning probe modules in the micro / nano fabrication and characterization apparatus of this invention.

[0024] Figure label:

[0025] Frame 1; Base plate 11; Top plate 12;

[0026] Support plate 2;

[0027] First adjustment platform 3; connecting plate 31; first plate 32; second plate 33;

[0028] Scanning probe module 4; housing 41; connecting rod 42; connecting hole 421; connecting ring 43;

[0029] Connector 5;

[0030] Roll 6;

[0031] Second adjustment platform 7; Third plate 71; Fourth plate 72;

[0032] Sample 8. Detailed Implementation

[0033] Embodiments of the present invention are described in detail below, examples of which are illustrated in the accompanying drawings. The embodiments described below with reference to the accompanying drawings are exemplary and intended to explain the present invention, and should not be construed as limiting the present invention.

[0034] like Figure 1 , Figure 2 and Figure 3As shown, the micro / nano fabrication and characterization apparatus of this invention includes a frame 1, a support plate 2, a first adjustment platform 3, and a scanning probe module 4. The frame 1 includes a base plate 11, a top plate 12, and a vertical plate disposed between the base plate 11 and the top plate 12. The base plate 11 and the top plate 12 are arranged in parallel. The support plate 2 is rotatably mounted on the base plate 11 and is used to support and fix the sample 8. The first adjustment platform 3 is located below the top plate 12. The scanning probe module 4 is located on the first adjustment platform 3 and its height is adjustable. The scanning probe module 4 is used to prepare and characterize the sample 8. The first adjustment platform 3 is used to adjust the position of the scanning probe module 4 relative to the center of the area to be processed on the sample 8.

[0035] In use, the micro / nano fabrication and characterization apparatus of this invention places the sample 8 on the support plate 2 and rotates the support plate 2 to further adjust the position of the sample 8. At the same time, the position of the scanning probe module 4 is adjusted radially in the area to be processed by the first adjustment platform 3, and then the scanning probe module 4 is adjusted in the height direction by the first adjustment platform 3 so that the scanning probe module 4 is positioned to meet the height requirements of the etching or scanning operation. The support plate 2 is rotated, and the etching or scanning operation of the sample 8 is started by the scanning probe module 4. After the area is completed, the above steps are repeated to achieve large-area and continuous etching and scanning operations on the sample 8.

[0036] The micro-nano fabrication and characterization apparatus of this invention removes the positional restriction of the support platform on the scanning probe module 4 by setting the first adjustment platform 3, and adjusts the spatial position of the scanning probe module 4 by the first adjustment platform 3, thereby realizing large-scale and continuous etching or scanning operations on the sample 8, eliminating the problem of missing etching or scanning of the sample 8, and improving the efficiency of micro-nano fabrication and characterization.

[0037] The scanning probe module 4 includes a scanning probe, a scanning probe holder, and a piezoelectric scanner. The scanning probe is mounted on the scanning probe holder, which is mounted on the piezoelectric scanner. The spatial position of the piezoelectric scanner relative to the scanning probe module 4 is adjustable to facilitate the adjustment of the scanning probe's position relative to the sample 8, ensuring the high precision requirements of the scanning probe etching and scanning.

[0038] In some embodiments, such as Figure 1 , Figure 2 and Figure 3 As shown, the scanning probe module 4 includes a housing 41 and multiple connecting rods 42. The multiple connecting rods 42 are spaced apart on the housing 41. The connecting rods 42 are provided with connectors 5 that are connected to the first adjustment platform 3. The connectors 5 are used to drive the scanning probe module 4 to move towards or away from the first adjustment platform 3.

[0039] The connecting rod 42 and the connector 5 are provided. The connecting rod 42 extends the housing 41, so that the connection position of the connector 5 and the housing 41 is located at a set distance outside the housing 41. This avoids interference between the connector 5 and the housing 41 when the housing 41 is adjusted, thus avoiding affecting the adjustment range of the connector 5. At the same time, the height of the scanning probe module 4 can be adjusted simultaneously through multiple connectors 5, which is convenient, safe and reliable.

[0040] Optionally, multiple sensors are provided on the housing 41 corresponding to the connecting rod 42, and the tilt angle of the scanning probe module 4 is monitored through the multiple sensors.

[0041] Optionally, the cross-section of the housing 41 is circular, and the connecting rod 42 is disposed at the end of the housing 41 near the first adjusting platform 3; or, the cross-section of the housing 41 is fan-shaped, and some of the connecting rods 42 are disposed at the end of the housing 41 near the first adjusting platform 3, and some of the connecting rods 42 are disposed on the side wall of the housing 41.

[0042] In some embodiments, such as Figure 3 As shown, there are at least three connecting rods 42, which are spaced apart around the housing 41. The at least three connecting rods 42 are used to adjust the tilt angle of the scanning probe module 4.

[0043] At least three connecting rods 42 are provided, and the three connecting rods 42 are arranged on the periphery of the housing. The center of gravity of the scanning probe module 4 is located in the enclosed space where the multiple connecting rods 42 are connected in sequence. The connecting parts 5 are arranged one-to-one with the connecting rods 42. By adjusting any one of the at least three connecting parts 5, the tilt angle and tilt direction of the scanning probe module 4 can be adjusted, which facilitates the adjustment of the working posture of the scanning probe module 4. At the same time, the stability of the connecting rods 42 after being connected to the connecting parts 5 is ensured, and the swaying of the scanning probe module 4 relative to the connection position of the connecting parts 5 and the connecting rods 42 during use is avoided, thus ensuring the stability and reliability of the scanning probe module 4 during use.

[0044] Alternatively, the connecting rods 42 may be provided in three, four, five, or six configurations.

[0045] In some embodiments, such as Figure 3 As shown, the connector 5 is made of flexible material. A drum 6 is rotatably mounted on the first adjustment platform 3. The connector 5 is wound around the drum 6. A drive unit (not shown in the figure) is fixedly mounted on the first adjustment platform 3. The drive unit is connected to the drum 6 and drives the drum 6 to rotate to tighten or release the connector 5.

[0046] Specifically, the first adjustment platform 3 is provided with multiple rollers 6 rotatably corresponding to multiple connecting rods 42. The two sides of the rollers 6 are supported and fixed by lugs, and a drive unit is provided on one side of the rollers 6. Optionally, the drive unit is a drive motor. The output shaft of the drive motor is connected to the rollers 6 through a coupling or gear transmission. The end of the connecting piece 5 wound on the rollers 6 is connected to the connecting rods 42. When multiple drive motors drive the rollers 6 to tighten the connecting piece 5 at the same time, the scanning probe module 4 moves towards the first adjustment platform 3. When multiple drive motors drive the rollers 6 to release the connecting piece 5 at the same time, the scanning probe module 4 moves away from the first adjustment platform 3. When some of the multiple drive motors drive the rollers 6 to tighten or release the connecting piece 5, and some drive motors stop working, or when some of the multiple drive motors drive the rollers 6 to tighten the connecting piece 5, and some motors drive the rollers 6 to release the connecting piece 5, the tilt angle of the scanning probe module 4 can be adjusted.

[0047] By using a flexible material for the connector 5, stress concentration at the connection point between the connecting rod 42 and the connector 5 can be avoided during the adjustment of the tilt angle of the scanning probe module 4, thus preventing damage to the connector 5 or the connecting rod 42. At the same time, the number of turns of the reel 6 for releasing or retracting facilitates the measurement of the distance the scanning probe module 4 moves, making it easier to accurately control the height position of the scanning probe module 4. Furthermore, the flexible connection can reduce the impact force between the scanning probe module 4 and the sample 8 in case of operational errors during adjustment, thus protecting the scanning probe module 4.

[0048] Optionally, connector 5 is a connecting rope or chain.

[0049] In some embodiments, such as Figure 3 As shown, the connecting rod 42 is provided with a connecting hole 421. The distance from multiple connecting holes 421 to the top surface of the housing 41 is equal. A connecting ring 43 is provided on the connecting hole 421. The connecting ring 43 is connected to the connecting piece 5.

[0050] By setting the connecting hole 421 and the connecting ring 43, the connection between the flexible connector 5 and the connecting rod 42 is facilitated, preventing the connector 5 from twisting or wrapping around the connecting rod 42 during the adjustment of the scanning probe module 4. This ensures the precise adjustment of the scanning probe module 4 and the stability of the scanning probe module 4 during operation. The restriction of the position of the connecting hole 421 on the connecting rod 42 also facilitates the adjustment of the position of the scanning probe module 4 after the initial connection between the connector 5 and the connecting rod 42.

[0051] In some embodiments, the connector 5 is a direct drive module, one end of the connector 5 is fixedly connected to the first adjustment platform 3, and the other end of the connector 5 is hinged to the connecting rod 42.

[0052] By setting the connector 5 as a direct drive module, the connection between the scanning probe module 4 and the first adjustment platform 3 can be strengthened, avoiding delays in the movement of the scanning probe module 4 when the first adjustment platform 3 moves, and preventing the scanning probe module 4 from shaking relative to the first adjustment platform 3 when it reaches the set working position after the first adjustment platform 3 moves, thus facilitating rapid and continuous multi-area operation of the scanning probe module 4.

[0053] Optionally, the connection between the connector 5 and the connecting rod 42 can be a ball joint or a fisheye bearing.

[0054] Optionally, the connector 5 can be an electric telescopic rod, a hydraulic telescopic rod, a pneumatic telescopic rod, etc.

[0055] In some embodiments, such as Figure 3 and Figure 4 As shown, the first adjustment platform 3 includes a connecting plate 31, a first plate 32, and a second plate 33. The connecting plate 31 is fixedly mounted on the top plate 12. The first plate 32 is adjustable along the first direction and mounted on the connecting plate 31. The second plate 33 is adjustable along the second direction and mounted on the first plate 32. The first and second directions intersect and are parallel to the connecting plate 31 respectively. The scanning probe module 4 is connected to the second plate 33.

[0056] Specifically, the connecting plate 31 is provided with a first slide groove extending in a first direction, the first plate 32 is provided with a first slider, the first slider is slidably assembled in the first slide groove and stops in the thickness direction of the connecting plate 31 with the first slide groove, the connecting plate 31 or the first plate 32 is provided with a first driving member, the first driving member drives the first plate 32 to move relative to the connecting plate 31 in a first direction, the first plate 32 is provided with a second slide groove extending in a second direction, the second plate 33 is provided with a second slider, the second slider is slidably assembled in the second slide groove and stops in the thickness direction of the connecting plate 31 with the second slide groove, the first plate 32 or the second plate 33 is provided with a second driving member, the second driving member drives the second plate 33 to move relative to the first plate 32 in a second direction.

[0057] Preferably, the cross-section of the connecting plate 31 is rectangular or square, the first direction is the extension direction of one of the two adjacent sides of the quadrilateral on the bottom surface of the connecting plate 31, and the second direction is the extension direction of the other of the two adjacent sides of the quadrilateral on the bottom surface of the connecting plate 31, that is, the first direction and the second direction are perpendicular to each other.

[0058] It is understandable that a coordinate system is established on the connecting plate 31 with the first direction as the X-axis and the second direction as the Y-axis. The position of the scanning probe module 4 is adjusted along the X-axis by the first plate 32 and along the Y-axis by the second plate 33. The first adjustment platform 3 is the XY two-degree-of-freedom adjustment platform.

[0059] By adjusting the positions of the first plate 32 and the second plate 33, the position of the scanning probe module 4 relative to the working area of ​​the sample 8 can be adjusted, ensuring the efficiency of the scanning probe module 4 in etching and scanning the sample 8.

[0060] Preferably, the first or second direction is parallel to the extension direction of one of the diameters of the area to be worked on in the sample 8.

[0061] Optionally, the first driving component includes a first adjusting motor, a first gear, and a first rack. The first rack is disposed on the connecting plate 31, the first adjusting motor is disposed on the first plate 32, and the first gear is fixedly disposed at the output end of the first adjusting motor and meshes with the first rack. The first plate 32 moves relative to the connecting plate 31 by driving the first gear to rotate through the first adjusting motor.

[0062] The second driving component includes a second adjusting motor, a second gear, and a second rack. The second rack is mounted on the second plate 33, and the second adjusting motor is mounted on the first plate 32. The second gear is fixedly mounted on the output end of the second adjusting motor and meshes with the second rack. The second plate 33 moves relative to the first plate 32 by driving the second gear to rotate through the second adjusting motor.

[0063] Optionally, the first driving component is a first linear motor, which is disposed between the connecting plate 31 and the first plate 32 and extends along a first direction. The worktable on the first linear motor is fixedly connected to the first plate 32, and the first linear motor is used to drive the first plate 32 to move relative to the connecting plate 31 along the first direction. The second driving component is a second linear motor, which is disposed between the first plate 32 and the second plate 33 and extends along a second direction. The worktable on the second linear motor is fixedly connected to the second plate 33, and the second linear motor is used to drive the second plate 33 to move relative to the first plate 32 along the second direction.

[0064] In some embodiments, such as Figure 1 , Figure 2 and Figure 4 As shown, there are multiple first adjustment platforms 3, and the multiple first adjustment platforms 3 are arranged in a ring with the support plates 2 at intervals. The scanning probe module 4 is arranged in a one-to-one correspondence with the first adjustment platform 3.

[0065] By setting up multiple first adjustment platforms 3, multiple scanning probe modules 4 can be operated simultaneously, further enabling the preparation and characterization of high-throughput scanning probes, improving the etching or scanning efficiency of the sample 8, and restricting the position of the multiple first adjustment platforms 3 to ensure that the first adjustment platform 3 can adjust the position of the scanning probe module 4 along the diameter extension direction of the area to be worked on the sample 8, thereby improving the adjustment efficiency of the first adjustment platform 3 on the scanning probe module 4 and avoiding interference between adjacent scanning probe modules 4 during the adjustment process.

[0066] In some embodiments, such as Figure 1 and Figure 2 As shown, it includes a second adjustment platform 7, which includes a third plate 71 and a fourth plate 72. The third plate 71 is disposed on the base plate 11 and its position is adjustable along the length direction of the base plate 11. The fourth plate 72 is disposed on the third plate 71 and its position is adjustable along the width direction of the base plate 11. The support plate 2 is rotatably disposed on the fourth plate 72.

[0067] By setting the second adjustment platform 7, the third plate 71 and the fourth plate 72 to move relative to the base plate 11, the position of the support plate 2 relative to the plane of the base plate 11 can be further adjusted, which facilitates etching or scanning of the sample 8.

[0068] It is understandable that a coordinate system is established on the support plate 2 with the length direction of the base plate 11 as the X-axis, the width direction of the base plate 11 as the Y-axis, and the thickness direction of the base plate 11 as the Z-axis. The position of the support plate 2 is adjusted on the X-axis by the third plate 71, and on the Y-axis by the fourth plate 72. The position of the support plate 2 and the sample 8 are adjusted by rotating the support plate 2 relative to the fourth plate 72 around the Z-axis. The second adjustment platform 7 is XYθ. Z Three-degree-of-freedom adjustment platform.

[0069] Optionally, two linear motors extending along the length of the base plate 11 are provided parallel to each other on the base plate 11, and the two ends of the third plate 71 are respectively connected to the worktables on the two linear motors, and the third plate 71 is driven to move by the linear motors.

[0070] Optionally, the fourth plate 72 is slidably disposed on the third plate 71, and the third plate 71 is provided with a linear motor connected to the fourth plate 72. The linear motor is used to drive the fourth plate 72 to move along the extension direction of the third plate 71.

[0071] Optionally, the fourth plate 72 is slidably disposed on the third plate 71, the third plate 71 is rotatably provided with a screw, and the fourth plate 72 is provided with a connecting block that is threadedly engaged with the screw. The screw rotates to drive the connecting block and the fourth plate 72 to move relative to the third plate 71.

[0072] Optionally, a third adjusting motor is fixedly installed on the fourth plate 72. The output shaft of the third adjusting motor is vertically set and fixedly connected to the support plate 2. The support plate 2 is driven to rotate by the rotation of the third adjusting motor.

[0073] In the description of this invention, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," and "circumferential" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this invention and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0074] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this invention, "a plurality of" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0075] In this invention, unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection, an electrical connection, or a connection that allows communication between them; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise explicitly limited. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0076] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above," "over," and "on top" of the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0077] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples. Moreover, without contradiction, those skilled in the art can combine and integrate the different embodiments or examples described in this specification, as well as the features of different embodiments or examples.

[0078] Although embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention. Those skilled in the art can make changes, modifications, substitutions and variations to the above embodiments within the scope of the present invention.

Claims

1. A micro- and nanofabrication and characterization apparatus, characterized in that, The utility model relates to a scanning probe platform, comprising: a frame body comprising a bottom plate and a top plate arranged in parallel; a support plate rotatably arranged on the bottom plate, the support plate being used for supporting and fixing a sample; a first adjusting platform arranged below the top plate and a scanning probe module arranged on the first adjusting platform and adjustable in height, the scanning probe module being used for preparing and characterizing the sample, and the first adjusting platform being used for adjusting the position of the scanning probe module relative to the center of the region to be operated on the sample.

2. The micro-nano fabrication and characterization apparatus according to claim 1, wherein, The scanning probe module comprises a housing and a plurality of connecting rods arranged at intervals in the housing, and a connecting piece connected to the first adjusting platform is arranged on the connecting rod, the connecting piece being used for driving the scanning probe module to move towards or away from the first adjusting platform.

3. The micro-nano fabrication and characterization apparatus according to claim 2, wherein, The connecting rod is provided with at least three connecting rods arranged at intervals along the circumference of the housing, and the at least three connecting rods are used for adjusting the inclination angle of the scanning probe module.

4. The micro-nano fabrication and characterization apparatus according to claim 3, wherein, The connecting piece is made of flexible material, a winding drum is rotatably arranged on the first adjusting platform, the connecting piece is wound on the winding drum, and a driving unit is fixedly arranged on the first adjusting platform, the driving unit being in transmission connection with the winding drum and driving the winding drum to rotate to wind or release the connecting piece.

5. The micro-nano fabrication and characterization apparatus according to claim 4, wherein, A connecting hole is arranged on the connecting rod, the distances from the plurality of connecting holes to the top surface of the housing are equal, a connecting ring is arranged on the connecting hole, and the connecting ring is connected with the connecting piece.

6. The micro-nano fabrication and characterization apparatus according to claim 3, wherein, The connecting piece is a direct drive module, one end of the connecting piece is fixedly connected with the first adjusting platform, and the other end of the connecting piece is hingedly connected with the connecting rod.

7. The device for micro and nano fabrication and characterization according to any one of claims 1 to 6, characterized in that, The first adjusting platform comprises a connecting plate, a first plate and a second plate, the connecting plate being fixedly arranged on the top plate, the first plate being adjustably arranged on the connecting plate in a first direction, the second plate being adjustably arranged on the first plate in a second direction, the first direction and the second direction intersecting and being parallel to the connecting plate respectively, and the scanning probe module being connected to the second plate.

8. The micro-nano fabrication and characterization apparatus according to any one of claims 1-6, wherein, A plurality of first adjusting platforms are arranged, the plurality of first adjusting platforms being annularly and spacedly arranged corresponding to the support plate, and the scanning probe module and the first adjusting platform being one-to-one correspondingly arranged.

9. The micro-nano fabrication and characterization apparatus according to any one of claims 1-6, wherein, Further comprising a second adjusting platform arranged on the bottom plate, the support plate being rotatably arranged on the second adjusting platform, and the second adjusting platform being used for driving the support plate to move along the length direction of the bottom plate and the width direction of the bottom plate respectively.

10. The micro-nano fabrication and characterization apparatus according to claim 9, wherein, The second adjusting platform comprises a third plate and a fourth plate, the third plate being arranged on the bottom plate and being adjustably arranged in the length direction of the bottom plate, the fourth plate being arranged on the third plate and being adjustably arranged in the width direction of the bottom plate, and the support plate being rotatably arranged on the fourth plate.

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