Starting sheet cleaning method for electrodeposition nickel production
By cutting the nickel plate, cleaning with mixed acid, hydrochloric acid, water, and anhydrous ethanol, combined with special edge strip wrapping and drying, the problem of removing impurities from the surface of the nickel starting plate is solved, achieving a highly efficient cleaning effect that is suitable for electrolytic nickel production.
Patent Information
- Application Number
- CN202511617500.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-11-06
- Publication Date
- 2026-01-23
AI Technical Summary
In current electrolytic nickel production, the cleaning methods for the nickel starting plate cannot completely remove surface impurities, affecting the quality of electrolytic nickel and its subsequent use. Furthermore, existing chemical cleaning methods are limited to a single type of acid, which cannot meet the cleaning requirements of various impurity elements.
The cut nickel plates are cleaned with mixed acid, hydrochloric acid, water, and anhydrous ethanol. Various high-quality pure acid solutions and pure water are used in proportion, combined with special edge strips to ensure the cleaning effect. Finally, they are dried.
It effectively removes the oxide layer and surface metal impurities from the nickel starting plate, prevents short-term oxidation, is suitable for electrowinning processes to produce nickel products of different purities, and is simple to operate, low in cost, and easy to promote.
Smart Images
Figure CN121380968A_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to the technical field of electrowinning nickel production, in particular to a method for cleaning starting plates for electrowinning nickel production. BACKGROUND
[0002] At present, in the process of electrowinning nickel production, the cleaning of nickel starting plates is particularly important. Cleaning to remove surface impurities can prevent nickel starting plates from contaminating products and maintain the surface of nickel starting plates from oxidizing, which can effectively reduce the probability of stratification of electrowinning nickel and directly affect the later use effect of electrowinning nickel. In the existing cleaning of nickel starting plates, ordinary physical cleaning method can only remove a small part of physical adhesion impurities and dirt on the surface of nickel starting plates, and cannot completely remove the impurities on the outer surface of nickel starting plates. Chemical cleaning method and combined cleaning method can remove impurities on the surface and outer surface of the plate at the same time, among which the chemical cleaning method is the most effective. However, the ordinary chemical cleaning method has single cleaning method and single type of acid solution. Since there are many types of impurity elements controlled in electrowinning nickel, a single type of acid solution cannot meet the cleaning effect requirements of nickel starting plates. SUMMARY
[0003] The present application provides a method for cleaning starting plates for electrowinning nickel production to solve the problems in the above background.
[0004] In order to achieve the above purpose, the present application adopts the following technical scheme: A method for cleaning starting plates for electrowinning nickel production, comprising cutting, mixed acid cleaning, hydrochloric acid cleaning, water washing, anhydrous ethanol washing and drying of nickel plates in sequence to obtain starting plates suitable for electrowinning nickel production.
[0005] Further, the nickel plates are cut to obtain the nickel starting plates to be cleaned, the width of the nickel starting plates to be cleaned is 400mm-1000mm, and the length is 400mm-1000mm.
[0006] Further, after the nickel starting plates are coated with special edge strips around, the mixed acid system cleaning, hydrochloric acid cleaning and anhydrous ethanol washing are all carried out on the surface of the nickel starting plates.
[0007] Further, the acid solution used in the cleaning includes concentrated sulfuric acid, glacial acetic acid, hydrochloric acid, pure water and hydrogen peroxide, and all are of superior purity, and the pure water is industrial grade pure water.
[0008] Further, the concentration of the mixed acid cleaning is V pure water:V concentrated sulfuric acid:V hydrogen peroxide:V glacial acetic acid = 25:10-20:3.5:2, the liquid level is above 1mm from the surface of the starting plate; the ratio of hydrochloric acid to pure water is 4:1, the liquid level is above 1mm from the surface of the starting plate; the ratio of anhydrous ethanol to pure water is 1:1, the mixed acid cleaning is performed first, the mixed acid cleaning time is 180s-300s; then the hydrochloric acid cleaning is performed, the hydrochloric acid cleaning time is 60s-120s, the pure water washing time is 30s-60s, the water pressure for flushing is 0.05MPa-0.15MPa, the anhydrous ethanol cleaning time is 5s-15s, and the anhydrous ethanol soaking time is 5s-15s.
[0009] Further, the drying temperature is 60-80℃, and the drying time is 15s-60s.
[0010] The present application has the following advantages: The present application cuts, cleans with mixed acid, cleans with hydrochloric acid, washes with water, washes with anhydrous ethanol and dries the nickel plate in sequence to obtain the starting plate suitable for the production of electro-deposited nickel, the cleaning method can effectively remove the oxidation layer and surface metal impurities on the nickel starting plate, and can also prevent the surface of the starting plate from oxidizing in a short period of time, and is suitable for cleaning the nickel starting plate used for the cathode in the electro-deposition tank in the production of different purity nickel products in the electro-deposition process, and has the advantages of convenience, simple operation and low production cost, and is easy to popularize and use. BRIEF DESCRIPTION OF DRAWINGS
[0011] Figure 1 The present application has the following advantages: DETAILED DESCRIPTION
[0012] The present application will be further described below in combination with the drawings and specific examples.
[0013] Example 1 The cleaning method of the starting plate for electro-deposited nickel production comprises: The nickel plate is cut according to the actual demand size to obtain the nickel starting plate to be cleaned, the width of the nickel starting plate to be cleaned is 400 mm, the length is 500 mm, then the uncleaned nickel starting plate is coated around by adding a custom edge strip, and the size of the custom edge strip is consistent with the size of the nickel starting plate. The acid solution required for cleaning is configured and cleaned, the mixed acid cleaning concentration is V pure water:V concentrated sulfuric acid:V hydrogen peroxide:V glacial acetic acid = 25:10:3.5:2, the amount of addition is 1 mm above the liquid level on the surface of the starting plate, the cleaning time is 180 s, the ratio of hydrochloric acid to pure water is 4:1, the amount of addition is 1 mm above the liquid level on the surface of the starting plate, the hydrochloric acid cleaning time is 60 s, the water pressure for flushing is 0.05 MPa, the cleaning time is 30 s, the ratio of anhydrous ethanol to pure water is 1:1, and the cleaning time is 5 s. Finally, drying at 60°C for 60s, obtaining the cleaned nickel starting plate.
[0014] The cleaning process is observed, the acid solution reacts completely, the surface of the cleaned nickel starting plate is observed by naked eye, there is no residual oxide layer, the nickel starting plate changes from greenish gray to bright silver, which reflects the original metal luster of pure nickel, the surface is clean without oil stains, and there is no other foreign matter, indicating that the oxide layer and surface impurities on the nickel starting plate to be cleaned are effectively removed.
[0015] Example 2 The cleaning method of the starting plate for electrodeposited nickel production comprises: The nickel plate is cut according to the actual demand size to obtain the nickel starting plate to be cleaned, the width of the nickel starting plate to be cleaned is 400 mm, the length is 700 mm, then the uncleaned nickel starting plate is coated around by adding a custom edge strip, and the size of the custom edge strip is consistent with the size of the nickel starting plate. The acid solution required for cleaning is configured and cleaned, the mixed acid cleaning concentration is V pure water:V concentrated sulfuric acid:V hydrogen peroxide:V glacial acetic acid = 25:15:3.5:2, the amount of addition is 1 mm above the liquid level on the surface of the starting plate, the cleaning time is 240 s, the ratio of hydrochloric acid to pure water is 4:1, the amount of addition is 1 mm above the liquid level on the surface of the starting plate, the hydrochloric acid cleaning time is 80 s, the water pressure for flushing is 0.1 MPa, the cleaning time is 40 s, the ratio of anhydrous ethanol to pure water is 1:1, and the cleaning time is 10 s. Finally, drying at 70°C for 30s, obtaining the cleaned nickel starting plate.
[0016] The cleaning process is observed, the acid solution reacts completely, the surface of the cleaned nickel starting plate is observed by naked eye, there is no residual oxide layer, the nickel starting plate changes from greenish gray to bright silver, which reflects the original metal luster of pure nickel, the surface is clean without oil stains, and there is no other foreign matter, indicating that the oxide layer and surface impurities on the nickel starting plate to be cleaned are effectively removed.
[0017] Example 3 A cleaning method for anode plates for electro-deposition nickel production, comprising: The nickel plate is cut according to actual demand size to obtain a nickel anode plate to be cleaned, the nickel anode plate to be cleaned has a width of 400 mm and a length of 1000 mm, then a custom edge strip is installed to coat the uncleaned nickel anode plate, the size of the custom edge strip is consistent with the size of the nickel anode plate. The acid solution required for cleaning is configured and cleaned, the mixed acid cleaning concentration is V pure water:V concentrated sulfuric acid:V hydrogen peroxide:V glacial acetic acid = 25:20:3.5:2, the amount of addition is 1 mm above the surface of the anode plate, the cleaning time is 300 s, the ratio of hydrochloric acid to pure water is 4:1, the amount of addition is 1 mm above the surface of the anode plate, the hydrochloric acid cleaning time is 120 s, the water pressure for rinsing is 0.15 MPa, the cleaning time is 60 s, the ratio of anhydrous ethanol to pure water is 1:1, the cleaning time is 15 s. Finally, drying at 80 DEG C for 60 s to obtain the cleaned nickel anode plate.
[0018] The cleaning process is observed, the mixed acid under different ratios is completely reacted within the specified parameter change range, the surface of the cleaned nickel anode plate is observed by naked eye, no oxide layer is found, the nickel anode plate changes from greenish gray to bright silver, which reflects the original metal luster of pure nickel, the surface is clean without oil stains and other foreign matters, which indicates that the oxide layer and surface impurities on the nickel anode plate to be cleaned are effectively removed.
[0019] In summary, the cleaning method for anode plates for electro-deposition nickel production cuts the nickel plate in sequence, performs mixed acid cleaning, hydrochloric acid cleaning, water washing, anhydrous ethanol washing and drying to obtain the anode plate required for electro-deposition nickel production, the cleaning method can effectively remove the oxide layer and surface metal impurities on the nickel plate to be cleaned, also can prevent the surface of the anode plate from being oxidized in a short period of time, is suitable for cleaning the nickel anode plate used for preparing cathodes in an electro-deposition tank when high-end nickel products are produced by electro-deposition process, has the advantages of being convenient and fast, simple operation, low production cost and the like, and is convenient for popularization and use.
Claims
1. A method for cleaning the starting plate in electrolytic nickel production, characterized in that: The process involves sequentially cutting the nickel plate, cleaning it with mixed acid, cleaning it with hydrochloric acid, washing it with water, washing it with anhydrous ethanol, and drying it to obtain the starting plate suitable for electrolytic nickel production.
2. The method for cleaning the starting plate in electrolytic nickel production according to claim 1, characterized in that: The nickel plate is cut to obtain the nickel starting plate to be cleaned. The width of the nickel starting plate to be cleaned is 400mm-1000mm and the length is 400mm-1000mm.
3. A method for cleaning the starting plate in electrolytic nickel production according to claim 1 or 2, characterized in that: in After the nickel starting plate is covered with a special edge strip, the mixed acid system cleaning, hydrochloric acid cleaning, and anhydrous ethanol cleaning are all performed on the surface of the nickel starting plate.
4. A method for cleaning the starting plate in electrolytic nickel production according to any one of claims 1-3, characterized in that: The cleaning solution used includes concentrated sulfuric acid, glacial acetic acid, hydrochloric acid, pure water, and hydrogen peroxide, all of which are of superior purity, and the pure water is industrial grade pure water.
5. A method for cleaning the starting plate in electrolytic nickel production according to any one of claims 1-4, characterized in that: The mixed acid cleaning concentration is Vpure water:Vconcentrated sulfuric acid:Vhydrogen peroxide:Vglacial acetic acid = 25:10-20:3.5:2, with the added liquid level above 1 mm on the surface of the starting plate; the hydrochloric acid to pure water ratio is 4:1, with the added liquid level above 1 mm on the surface of the starting plate; the anhydrous ethanol to pure water ratio is 1:
1. The mixed acid cleaning is performed first, with a cleaning time of 180-300 seconds; followed by hydrochloric acid washing, with a cleaning time of 60-120 seconds; pure water washing, with a washing time of 30-60 seconds; the rinsing water pressure is 0.05 MPa-0.15 MPa; anhydrous ethanol washing, with a cleaning time of 5-15 seconds; and anhydrous ethanol soaking, with a soaking time of 5-15 seconds.
6. A method for cleaning the starting plate in electrolytic nickel production according to any one of claims 1-5, characterized in that: The drying temperature is 60℃-80℃, and the drying time is 15s-60s.