photovoltaic modules

Abstract

This disclosure relates to the photovoltaic field and provides a photovoltaic module, comprising: a first substrate and a second substrate disposed opposite to each other, the first substrate having a first surface and a second surface opposite to each other, wherein the first surface is located on the side of the first substrate away from the second substrate, and the first surface has a concave-convex structure; a battery string and an encapsulation layer, the battery string and the encapsulation layer being located between the first substrate and the second substrate, the encapsulation layer being located between the battery string and the first substrate, and also between the battery string and the second substrate; an ion barrier layer, the ion barrier layer being located on the first surface; and an anti-reflection layer, the anti-reflection layer being located on the side of the ion barrier layer away from the first surface, wherein the anti-reflection layer has pores, and the surface of the anti-reflection layer away from the ion barrier layer is a fully enclosed surface, which at least helps to improve the light utilization rate and anti-glare effect of the photovoltaic module, and extend the module life.

Description

Technical Field

[0001] This disclosure relates to the photovoltaic field, and more particularly to a photovoltaic module. Background Technology

[0002] Solar energy is a renewable, clean, and widely distributed emerging energy source that is being increasingly used in power generation. Solar photovoltaic modules, as the core component of photovoltaic power generation systems, can directly convert sunlight into electrical energy based on the photovoltaic effect.

[0003] Currently, traditional photovoltaic modules commonly use high-gloss patterned glass as the front cover material. However, this type of glass has a high surface reflectivity, causing a large amount of incident light to be reflected and not effectively utilized. This not only reduces light absorption efficiency but also limits the overall power generation performance of the module. Furthermore, strong specular reflections at certain angles can create concentrated glare, causing eye strain and even vision damage. In traffic scenarios, such reflected light can also interfere with drivers' vision, posing safety hazards. Simultaneously, the use of large areas of high-reflectivity glass exacerbates light pollution problems in cities and around power plants. Summary of the Invention

[0004] This disclosure provides a photovoltaic module that at least improves the light utilization rate and anti-glare effect of the photovoltaic module, and extends the module's lifespan.

[0005] This disclosure provides a photovoltaic module, comprising: a first substrate and a second substrate disposed opposite to each other, the first substrate having a first surface and a second surface opposite to each other, wherein the first surface is located on the side of the first substrate away from the second substrate, and the first surface has a concave-convex structure; a battery string and an encapsulation layer, the battery string and the encapsulation layer being located between the first substrate and the second substrate, the encapsulation layer being located between the battery string and the first substrate, and also between the battery string and the second substrate; an ion blocking layer, the ion blocking layer being located on the first surface; and an antireflection layer, the antireflection layer being located on the side of the ion blocking layer away from the first surface, wherein the antireflection layer has pores, and the surface of the antireflection layer away from the ion blocking layer is a fully enclosed surface.

[0006] Optionally, the holes inside the antireflective layer are multiple independent and non-connected hole structures.

[0007] Optionally, the uneven structure of the first surface is formed by a chemical etching process, and the surface roughness of the uneven structure is 100nm~500nm.

[0008] Optionally, the concave-convex structure includes multiple protruding units, the protruding units being conical or hemispherical in shape.

[0009] Optionally, the ratio of the thickness of the ion blocking layer to the thickness of the antireflection layer is 1:(1~1.5).

[0010] Optionally, the thickness of the ion-barrier layer is 50 nm to 150 nm.

[0011] Optionally, the thickness of the antireflective layer is 80nm~120nm.

[0012] Optionally, the refractive index of the antireflective layer is 1.22 to 1.65.

[0013] Optionally, the material of the ion barrier layer is silicon oxide or silicon nitride.

[0014] Optionally, the reflectivity of the photovoltaic module on the first surface side is 1.5% to 2%.

[0015] The technical solution provided in this disclosure has at least the following advantages:

[0016] The photovoltaic module disclosed herein includes a first substrate and a second substrate disposed opposite to each other. The first substrate has a first surface away from the second substrate, which has a concave-convex structure to effectively reduce surface reflectivity, suppress glare, and improve light capture capability. An ion-blocking layer and an anti-reflection layer are sequentially disposed on the first surface. The ion-blocking layer directly covers the concave-convex surface, effectively inhibiting the outward migration of alkali metal ions such as sodium and calcium from within the first substrate, thus preventing weakening of the first substrate's protection of the cells and extending the module's lifespan. The anti-reflection layer is located on the side of the ion-blocking layer away from the first surface. The anti-reflection layer contains pores to adjust the refractive index for anti-reflection purposes, and the surface of the anti-reflection layer away from the ion-blocking layer is a fully enclosed surface, effectively blocking the intrusion of external moisture and corrosive ions, preventing corrosion of the first substrate surface. This synergistic design with the multi-layer functional structure significantly improves the optical performance, environmental durability, and long-term reliability of the photovoltaic module. Attached Figure Description

[0017] One or more embodiments are illustrated by way of example with reference numerals in the accompanying drawings. These illustrations do not constitute a limitation on the embodiments. Elements with the same reference numerals in the drawings are denoted as similar elements. Unless otherwise stated, the figures in the drawings are not to be limited by scale.

[0018] Figure 1 This is a light reflection phenomenon on the surface of traditional patterned glass;

[0019] Figure 2 This is a corrosion reaction on the surface of traditional patterned glass;

[0020] Figure 3 This is a schematic diagram of the structure of a photovoltaic module provided in an embodiment of this disclosure;

[0021] Figure 4 The light reflection phenomenon on the surface of the first substrate provided in the embodiments of this disclosure.

[0022] Explanation of reference numerals in the attached figures:

[0023] Traditional patterned glass 1, patterned anti-glare glass 2, mold spots 3, first substrate 10, second substrate 20, battery string 30, encapsulation layer 40, ion barrier layer 50, anti-reflection layer 60, first surface 101, second surface 102, hole 61. Detailed Implementation

[0024] like Figure 1 As shown, in existing photovoltaic modules, traditional patterned glass 1 has a high surface gloss, and incident light (indicated by solid arrows in the figure) still produces strong directional reflected light (indicated by dashed arrows in the figure) at certain incident angles. If this reflected light directly enters the human eye, it may cause stinging, visual fatigue, or even temporary visual impairment, posing a significant safety hazard. To reduce specular reflection and alleviate light pollution, the industry generally uses patterned anti-glare glass as the front cover of the module.

[0025] Patterned anti-glare glass has an irregular, textured surface. When sunlight shines on it, this texture causes multi-directional refraction, reflection, and diffuse reflection, scattering the light's path and preventing the formation of a clear image. This blurs the view and reduces glare, thus balancing architectural aesthetics and visual safety to some extent. However, the irregular texture of the patterned anti-glare glass surface easily accumulates moisture and pollutants in harsh environments such as coastal areas and high-temperature, high-humidity locations. Figure 2 As shown, under long-term exposure, alkali metal ions (such as Na) in the patterned anti-glare glass 2 + Ca 2+ ) and water vapor (including H) + Chemical reactions involving substances such as CO2 produce white alkali silicate deposits, known as mold spots. These corrosion products not only severely affect the appearance of the modules but also scatter or block incident light, significantly reducing the light transmittance of the patterned anti-glare glass, thereby weakening the power generation efficiency of the photovoltaic modules and causing economic losses.

[0026] Based on the aforementioned technical problems, this disclosure creatively proposes a photovoltaic module, including a first substrate and a second substrate disposed opposite to each other. By setting an uneven structure on the first surface of the first substrate away from the second substrate, surface reflectivity can be reduced, glare suppressed, and light capture efficiency improved. Furthermore, an ion-blocking layer and an anti-reflection layer are sequentially disposed on the first surface. The ion-blocking layer covers the uneven structure, preventing the migration of alkali metal ions, protecting the cells from damage, and extending the module's lifespan. The anti-reflection layer contains pores, allowing for anti-reflection effects through refractive index adjustment. Simultaneously, the outer surface of the anti-reflection layer is a fully enclosed structure, effectively preventing the intrusion of water vapor and corrosive ions, thus avoiding corrosion of the first substrate. This synergistic design of multiple functional structures significantly improves the optical performance, environmental durability, and long-term reliability of the photovoltaic module.

[0027] In the description of the embodiments of this disclosure, technical terms such as "first" and "second" are used only to distinguish different objects and should not be construed as indicating or implying relative importance or implicitly specifying the number, specific order, or primary or secondary relationship of the indicated technical features. In the description of the embodiments of this disclosure, "multiple" means two or more, unless otherwise explicitly defined. Similarly, "multiple sets" refers to two or more sets (including two sets), and "multiple pieces" refers to two or more pieces (including two pieces).

[0028] In this document, the term "embodiment" means that a particular feature, structure, or characteristic described in connection with an embodiment may be included in at least one embodiment of this disclosure. The appearance of this phrase in various places throughout the specification does not necessarily refer to the same embodiment, nor is it a separate or alternative embodiment mutually exclusive with other embodiments. It will be explicitly and implicitly understood by those skilled in the art that the embodiments described herein can be combined with other embodiments.

[0029] In the description of the embodiments of this disclosure, the term "and / or" is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent three cases: A exists, A and B exist simultaneously, and B exists. Additionally, the character " / " in this document generally indicates that the preceding and following related objects have an "or" relationship.

[0030] In the description of the embodiments of this disclosure, the technical terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," and "circumferential," etc., indicating orientation or positional relationships, are based on the orientation or positional relationships shown in the accompanying drawings and are only for the convenience of describing the embodiments of this disclosure and simplifying the description. They do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation on the embodiments of this disclosure. For example, if the device or element in the illustration is inverted, then the element described as "below," "under," "below," or "bottom" of other elements or features will be oriented "above" or "top" of said other elements or features. Therefore, the term "below" may, depending on the context in which the term is used, encompass both above and below orientations, which will be obvious to those skilled in the art. Materials may be oriented in other ways (e.g., rotated 90 degrees, inverted, flipped), and the spatial relative descriptive terms used herein may be interpreted accordingly.

[0031] In the description of the embodiments of this disclosure, unless otherwise expressly specified and limited, technical terms such as "installation," "connection," "joining," and "fixing" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in the embodiments of this disclosure according to the specific circumstances.

[0032] In the accompanying drawings corresponding to the embodiments of this disclosure, the thickness and area of ​​the layers are enlarged for better understanding and ease of description. Furthermore, when describing a component as "generally" formed on another component, it means that the component is not formed on the entire surface (or front surface) of the other component, nor on a portion of the edge of the entire surface.

[0033] In the description of the embodiments of this disclosure, when a component "includes" another component, other components are not excluded unless otherwise stated, and may be further included. The formation or placement of a second component above or on a first component, or on the surface of a first component, or on one side of a first component, may include embodiments where the first and second components are in direct contact, and may also include embodiments where an additional component may be placed between the first and second components, thereby preventing direct contact between the first and second components. For simplicity and clarity, various components may be drawn at different scales. In the drawings, some layers / components may be omitted for simplicity. Unless otherwise specified, the formation or placement of a second component on the surface of a first component refers to direct contact between the first and second components. The term "component" can refer to a layer, film, region, portion, structure, etc.

[0034] The terminology used in the description of the various embodiments herein is for the purpose of describing particular embodiments only and is not intended to be limiting. As used in the description of the various embodiments and the appended claims, the term "component" is also intended to include the plural form unless the context clearly indicates otherwise. Components include layers, films, regions, or plates, etc.

[0035] The embodiments of this disclosure will now be described in detail with reference to the accompanying drawings. However, those skilled in the art will understand that many technical details have been provided in the embodiments of this disclosure to facilitate a better understanding of the disclosure. However, the technical solutions claimed in this disclosure can be implemented even without these technical details and various variations and modifications based on the following embodiments.

[0036] Figure 3 This is a schematic diagram of the structure of a photovoltaic module provided in an embodiment of this disclosure.

[0037] refer to Figure 3 The photovoltaic module includes: a first substrate 10 and a second substrate 20 disposed opposite to each other, a cell string 30, an encapsulation layer 40, an ion barrier layer 50, and an anti-reflection layer 60.

[0038] Specifically, the first substrate 10 has a first surface 101 and a second surface 102 opposite to each other, wherein the first surface 101 is located on the side of the first substrate 10 away from the second substrate 20, and the first surface 101 has a concave-convex structure.

[0039] In some embodiments, the first substrate 10 is glass. The first surface 101 of the first substrate 10 is the light-facing surface of the photovoltaic module.

[0040] refer to Figure 4The first surface 101 is a rough surface composed of a large number of randomly distributed and irregularly arranged microscopic protrusions. The microscopic morphology of these protrusions can be approximately conical, hemispherical, or a transitional form. When parallel incident light (indicated by solid arrows in the figure) shines on this uneven surface, its random and disordered microscopic protrusions are equivalent to countless tiny reflecting surfaces with different orientations. They disperse the originally concentrated and highly directional specular reflection light into diffuse reflection light that spreads in all directions of space (indicated by dashed arrows in the figure). This fundamentally eliminates the possibility of high-intensity reflected light spots at specific viewing angles, achieving a soft visual appearance over a wide angle.

[0041] The battery string 30 and the encapsulation layer 40 are located between the first substrate 10 and the second substrate 20. The encapsulation layer 40 is located between the battery string 30 and the first substrate 10, and also between the battery string 30 and the second substrate 20.

[0042] An ion-blocking layer 50 is located on the first surface 101, and an anti-reflection layer 60 is located on the side of the ion-blocking layer 50 away from the first surface 101. The anti-reflection layer 60 has a hole 61, and the surface of the anti-reflection layer 60 away from the ion-blocking layer 50 is a fully enclosed surface.

[0043] The ion barrier layer 50 is a continuous, non-porous, and dense thin film structure. Its "dense and non-porous" characteristic means that, at the microscopic scale, such as when observed through a transmission electron microscope, there are no penetrating or open pores inside the film layer, forming a complete physical and chemical barrier.

[0044] In some embodiments, the first substrate 10 contains active metal ions such as sodium and calcium. Under long-term high temperature, high humidity, and electric field conditions, these ions tend to migrate to the surface of the first substrate 10. The ion barrier layer 50, as a dense barrier with extremely high chemical inertness, effectively prevents these internal ions from diffusing outward. This prevents them from migrating to the surface of the first substrate 10 and reacting with water vapor and carbon dioxide in the atmosphere to form white corrosion products, thereby fundamentally protecting the long-term stability of the first substrate 10 and the electrical reliability of the photovoltaic module.

[0045] The antireflective layer 60 has a porous internal structure, which is the physical basis for its low refractive index. Furthermore, all these internal pores are completely sealed by an extremely thin, dense, non-porous solid material on their air-exposed surfaces, forming a continuous, complete, and fully enclosed outer surface. This prevents dust, water vapor, salt spray, and other contaminants from penetrating the pores inside the antireflective layer 60, fundamentally solving the problems of traditional porous antireflective films being easily contaminated, difficult to clean, and experiencing performance degradation due to water vapor adsorption. In addition, because external media cannot enter, the effective refractive index of the antireflective layer 60 is unaffected by ambient humidity; its antireflective performance remains constant regardless of whether the environment is dry or humid, ensuring the long-term stability of the photovoltaic module's power output.

[0046] It should be noted that the term "fully enclosed surface" refers to the outer surface of the antireflective layer 60 being continuous and dense in both macroscopic and functional terms. Even if there are micron or nanometer-sized micropores that may exist due to limitations in manufacturing precision, it is still considered a "fully enclosed surface." These micropores are much smaller than the independent pores inside the antireflective layer 60 and are insufficient to form effective permeation channels for water vapor or corrosive ions. The "fully enclosed" requirement in this disclosure refers to functional enclosure based on barrier performance, rather than an absolute absence of any microscopic defects in a physical sense.

[0047] The ion barrier layer 50 blocks the release of internal ions and provides a robust substrate; the fully enclosed surface of the antireflective layer 60 blocks the intrusion of external substances. Together, they form a two-way protection for the first substrate 10, significantly enhancing the reliability of the photovoltaic module.

[0048] It is worth noting that, due to the uneven surface of the first surface 101, its surface area is much larger than that of a flat surface. This provides a larger adhesion area and a stronger mechanical interlocking effect for the subsequently deposited ion barrier layer 50, significantly enhancing the bonding force between the ion barrier layer 50 and the first substrate 10. In addition, the ion barrier layer 50 deposited on the uneven surface also has an uneven structure, resulting in a larger adhesion area and a stronger mechanical interlocking effect between the subsequently deposited antireflection layer 60 and the ion barrier layer 50. This significantly enhances the bonding force between the antireflection layer 60 and the first substrate 10, improving the reliability of the photovoltaic module in long-term outdoor environments.

[0049] The photovoltaic module disclosed herein includes a first substrate and a second substrate disposed opposite to each other. The first substrate has a first surface away from the second substrate, which has a concave-convex structure to effectively reduce surface reflectivity, suppress glare, and improve light capture capability. An ion-blocking layer and an anti-reflection layer are sequentially disposed on the first surface. The ion-blocking layer directly covers the concave-convex surface, effectively inhibiting the outward migration of alkali metal ions such as sodium and calcium from within the first substrate, thus preventing weakening of the first substrate's protection of the cells and extending the module's lifespan. The anti-reflection layer is located on the side of the ion-blocking layer away from the first surface. The anti-reflection layer contains pores to adjust the refractive index for anti-reflection purposes, and the surface of the anti-reflection layer away from the ion-blocking layer is a fully enclosed surface, effectively blocking the intrusion of external moisture and corrosive ions, preventing corrosion of the first substrate surface. This synergistic design with the multi-layer functional structure significantly improves the optical performance, environmental durability, and long-term reliability of the photovoltaic module.

[0050] The embodiments of this disclosure will now be described in more detail with reference to the accompanying drawings.

[0051] In some embodiments, the holes 61 inside the antireflective layer 60 are multiple independent and non-connected hole structures.

[0052] The phrase "independent and non-connected" here means that within the three-dimensional bulk phase of the antireflective layer 60, each pore 61 is surrounded by a solid pore wall, forming a closed cavity. There are no connecting channels or gaps between these cavities. This means that water vapor, salt spray, and other pollutants in the external environment completely lose any channel or diffusion path to penetrate into the interior of the antireflective layer 60. Even if the surface sealing layer of the antireflective layer 60 has microscopic defects under extreme conditions, the independent pore structure can limit the penetration to a localized area, preventing it from spreading laterally within the antireflective layer 60, thereby greatly improving the reliability of the overall protective function.

[0053] Secondly, the interconnected network of pores weakens the material's mechanical strength and creates a large internal surface area, making it prone to chemical corrosion. In contrast, the independent closed-cell structure distributes stress among the individual closed units, improving the density and mechanical strength of the antireflective layer 60.

[0054] In some embodiments, the uneven structure of the first surface 101 is formed by a chemical etching process, and the surface roughness of the uneven structure is 100nm~500nm, for example, it can be 100nm, 150nm, 200nm, 250nm, 300nm, 350nm, 400nm, 450nm or 500nm.

[0055] To more clearly illustrate how the above-mentioned uneven structure with a specific roughness is formed, a chemical etching process is described in detail below. The chemical etching process mainly includes the following steps:

[0056] S1: First surface 101 preprocessing.

[0057] In some embodiments, S1 includes, but is not limited to, the following steps:

[0058] S11: Rinse the first surface 101 with deionized water to remove dust and particulate matter.

[0059] S12: Wipe the first surface 101 with anhydrous ethanol or other organic solvents to thoroughly remove oil and organic residues.

[0060] S13: Place the cleaned first substrate 10 in an oven at 80℃~100℃ and dry for 10 to 15 minutes.

[0061] S14: Remove and cool to room temperature for later use. This step ensures that the first surface 101 is clean, dry, and activated, which is beneficial for subsequent uniform etching.

[0062] S2: Etching solution preparation.

[0063] In some embodiments, S2 includes, but is not limited to, the following steps:

[0064] S21: Add a measured amount of deionized water to a corrosion-resistant container (such as a polytetrafluoroethylene container).

[0065] S22: Under thorough stirring, slowly add hydrofluoric acid (HF) to prepare an etching solution of the required concentration.

[0066] S23: To further improve etching uniformity, 0.1wt%~0.5wt% of nonionic surfactant can be added to enhance the wettability of the etching solution on the surface of the first substrate 10.

[0067] S24: Stir well and let stand for 5 to 10 minutes before use.

[0068] S3: Chemical etching of the first surface 101 is performed using an etching solution.

[0069] In some embodiments, S3 includes, but is not limited to, the following steps:

[0070] S31: Immerse the pretreated first substrate 10 completely in the etching solution, or use a spraying method to make the etching solution evenly cover the first surface 101.

[0071] S32: Etching is performed under constant temperature conditions, and uniform reaction is ensured by mechanical stirring at a constant speed or circulation of etching solution, avoiding localized excessive corrosion or gas adhesion.

[0072] Step S33: After the preset etching time is reached, the first substrate 10 is immediately removed to terminate the reaction.

[0073] S4: Post-processing and inspection.

[0074] In some embodiments, S4 includes, but is not limited to, the following steps:

[0075] S41: Rinse the surface of the first substrate 10 vigorously with plenty of deionized water for 2 to 3 minutes to quickly remove residual acid and reaction products.

[0076] S42: Neutralize the surface of the first substrate 10 with a weak alkaline solution of 5wt%~10wt% sodium bicarbonate (NaHCO3) for 1 to 2 minutes to completely eliminate the acidic substances remaining on the surface of the first substrate 10.

[0077] S43: Rinse again with deionized water until the effluent is neutral (pH 6-8).

[0078] S44: Dry the surface moisture with clean compressed air, or dry at a low temperature of 60℃~80℃ for 5 to 10 minutes.

[0079] S45: Use a surface profilometer or atomic force microscope (AFM) to examine the surface roughness (Ra) and microstructure of the formed uneven structure.

[0080] To achieve controllable formation of surface roughness (Ra) in the range of 100nm to 500nm for the uneven structure, key process parameters need to be coordinated and controlled. Their preferred ranges and functions are shown in the table below:

[0081] Table 1

[0082]

[0083] Understandably, the concentration of hydrofluoric acid is crucial for controlling the etching rate and morphology. Too low a concentration results in a slow, uneven etching rate, making it difficult to achieve effective roughness; too high a concentration leads to an overly vigorous reaction, making it difficult to control depth and uniformity, and also compromises safety. Etching time directly determines the etching depth and roughness. Too short a time may result in insufficient roughness and insignificant anti-glare effects; too long a time can lead to over-corrosion, potentially affecting the glass's mechanical strength and reducing effective light transmittance. Process temperature affects reaction kinetics. Increasing the temperature accelerates the reaction, but excessively high temperatures can exacerbate HF volatilization, causing uneven and uncontrollable reactions. Within acceptable limits, room temperature operation offers good controllability, uniformity, and economy. Stirring speed determines reaction uniformity; appropriate stirring helps eliminate concentration gradients and heat accumulation, preventing the formation of striped or spotted uneven etching patterns and ensuring a uniform diffuse scattering surface. pH value affects the etching mechanism of the glass and the dissolution behavior of its components. Within this acidic range, the dissolution of the SiO2 network is the primary process, which is conducive to the formation of the desired random uneven morphology, rather than structural defects caused by the selective dissolution of certain components.

[0084] To illustrate this more specifically, three non-limiting embodiments are provided below:

[0085] Example 1:

[0086] Parameters: hydrofluoric acid concentration is 10wt%, etching time is 5 minutes, temperature is 25℃, and stirring speed is 100rpm.

[0087] Results: The surface roughness Ra of the obtained first substrate 10 was approximately 300 nm, forming a random pit structure with a diameter of approximately 1-2 μm and a depth of approximately 250 nm to 350 nm. Measurements showed that its surface reflectivity was significantly reduced from approximately 8% for conventional glass to approximately 1.8%.

[0088] Example 2:

[0089] Parameters: hydrofluoric acid concentration is 15wt%, etching time is 3 minutes, temperature is 35℃, and stirring speed is 150rpm.

[0090] Results: The resulting surface roughness Ra was approximately 280 nm, with pit diameters of approximately 0.8–1.5 μm and depths of approximately 200–300 nm. The reflectivity decreased to approximately 2.0%.

[0091] Example 3:

[0092] Parameters: hydrofluoric acid concentration is 8wt%, etching time is 8 minutes, temperature is 20℃, and stirring speed is 80rpm.

[0093] Results: The obtained surface roughness Ra is approximately 350 nm, the pit diameter is approximately 1.5 μm to 2.5 μm, and the depth is approximately 300 nm to 400 nm. The reflectivity is reduced to approximately 1.5%, exhibiting a better anti-reflection effect.

[0094] By systematically adjusting the process parameters, precise control over the final surface roughness, pit size, and optical properties can be achieved. The relationship between the aforementioned process parameters and surface morphology is shown in Table 2.

[0095] Table 2

[0096]

[0097] The uneven structure with a roughness in the range of 100nm to 500nm formed by the above process provides an ideal substrate for the subsequent deposition of the ion blocking layer 50 and the anti-reflection layer 60, which together achieve the purpose of anti-glare and high weather resistance in the embodiments of this disclosure.

[0098] In some embodiments, the concave-convex structure includes a plurality of protruding units, the protruding units being conical or hemispherical in shape.

[0099] The conical and hemispherical protrusions have a continuous, smoothly varying curved surface. Compared to prismatic or steep frustum structures, this smooth surface produces a more uniform distribution of scattered light intensity, effectively avoiding the formation of secondary strong reflection spots at specific discrete angles, thus achieving a glare-free, soft diffuse reflection effect.

[0100] Secondly, this smooth, raised morphology provides an ideal substrate for the subsequent deposition of the ion-barrier layer 50 and the anti-reflection layer 60. It avoids sharp edges or deep, narrow trenches, allowing the ion-barrier layer 50 and the anti-reflection layer 60 to achieve uniform, shape-preserving coverage, minimizing localized abrupt changes in film thickness or deposition defects. Furthermore, the anti-reflection layer 60, covering the smooth surface, maintains efficient anti-reflection functionality, working in synergy with the scattering effect of the uneven structure to achieve an extremely low total surface reflectivity.

[0101] In some embodiments, the uneven structure includes multiple irregular pits, exhibiting a microscopic morphology resembling a "crater" or "honeycomb." The pits are nearly circular or elliptical in shape, with a diameter ranging from 0.5 μm to 3 μm and a depth from 100 nm to 500 nm. Correspondingly, the height of the raised units is comparable to the pit depth, forming a randomly distributed three-dimensional micro / nano structure. This structure allows incident light to undergo multiple scattering at multiple scales and directions, completely disrupting the directional consistency of specular reflection, thereby effectively suppressing directional glare and significantly improving the applicability and safety of photovoltaic modules.

[0102] In some embodiments, the ratio of the thickness of the ion blocking layer 50 to the thickness of the antireflective layer 60 is 1:(1~1.5).

[0103] Ensuring sufficient thickness of the ion-barrier layer 50 is the primary prerequisite for achieving long-term corrosion protection; while the corresponding thickness of the anti-reflection layer 60 is the core guarantee for achieving efficient anti-reflection and anti-glare. The total thickness of the two thin films is controlled between 130nm and 270nm to ensure that the overall film system achieves the best balance between mechanical stability and optical performance.

[0104] In some embodiments, the thickness of the ion barrier layer 50 is 50nm to 150nm, for example, it can be 50nm, 60nm, 70nm, 80nm, 90nm, 100nm, 110nm, 120nm, 130nm, 140nm or 150nm.

[0105] Optionally, in some embodiments, the thickness of the ion barrier layer 50 can be further controlled within the range of 80 nm to 100 nm.

[0106] If the thickness of the ion blocking layer 50 is less than 50nm, the film is prone to defects such as pinholes, which become short-circuit channels for water vapor and ion migration, severely weakening its blocking ability and causing the component to be prone to corrosion. Furthermore, the film layer that is too thin has insufficient mechanical strength and is easily damaged under process or environmental stress, and cannot provide stable support for the upper anti-reflection layer 60.

[0107] If the thickness of the ion barrier layer 50 exceeds 150 nm, the accumulated internal stress during deposition can easily lead to film peeling, warping, or cracking, thereby compromising the protective function. Furthermore, while meeting performance requirements, controlling the thickness is beneficial for improving deposition efficiency and reducing material consumption and production costs. This thickness range achieves the best balance between barrier reliability, mechanical stability, optical performance, and manufacturing feasibility.

[0108] In some embodiments, the thickness of the antireflective layer 60 is 80nm to 120nm, for example, it can be 80nm, 85nm, 90nm, 95nm, 100nm, 105nm, 110nm, 115nm or 120nm.

[0109] If the thickness of the antireflection layer 60 is less than 80 nm, its optical thickness is too small to meet the effective interference conditions, resulting in a significant decrease in the antireflection effect. Secondly, the antireflection layer 60 requires a sufficiently thick and dense material to construct a complete and continuous fully sealed surface layer on its outer surface. An excessively thin film layer is difficult to form a uniform and defect-free sealing layer on its porous internal structure, which may leave nanoscale open pores, thereby weakening its ability to isolate water vapor and pollutants.

[0110] When the thickness of the antireflective layer 60 exceeds 120 nm, an excessively thick antireflective layer 60 will accumulate higher internal stress, increasing the risk of delamination between it and the underlying ion-blocking layer 50, affecting the long-term reliability of the entire film system. Moreover, controlling the thickness is beneficial to improving production efficiency and reducing raw material costs while meeting optimal performance requirements. This thickness range achieves the best balance between barrier reliability, antireflective effect, mechanical stability, optical performance, and manufacturing feasibility.

[0111] Optionally, in some embodiments, the thickness of the antireflection layer 60 can be further controlled within the range of 90nm to 110nm. This thickness design is based on the principle of optical interference and can effectively reduce the reflectivity in the visible light band to below 2%, achieving optimal anti-glare effect in conjunction with the microporous structure inside the antireflection layer 60.

[0112] In some embodiments, the refractive index of the antireflective layer 60 is 1.22 to 1.65.

[0113] The refractive index of air is 1.0, and that of glass is 1.5. This refractive index is between that of air and glass, which meets the optical matching requirements of antireflective coatings. By providing an appropriate intermediate refractive index, in conjunction with optimized film thickness, it can effectively promote destructive interference of reflected light from the interface, thereby minimizing interface reflection loss.

[0114] Optionally, in some embodiments, the refractive index of the antireflective layer 60 can be further controlled within the range of 1.25-1.35.

[0115] In some embodiments, the ion barrier layer 50 is made of silicon oxide or silicon nitride.

[0116] Alternatively, dense silicon oxide (SiO2) or silicon nitride (SiN) may be used. x As the ion-barrier layer 50 material, its refractive index ranges from 1.46 to 2.0. This film can be prepared by plasma-enhanced chemical vapor deposition (PECVD) or atomic layer deposition (ALD) processes to ensure high density and absence of pinholes or interconnected pores, thereby effectively blocking the penetration of water vapor and corrosive ions.

[0117] Alternatively, high-barrier dielectric materials such as alumina (Al2O3), titanium dioxide (TiO2), or zirconium oxide (ZrO2), or a multilayer composite structure composed of the above materials, can also be used. This dense film layer not only provides excellent chemical stability but also effectively protects the acid-etched surface of the underlying first substrate 10, preventing alkali metal precipitation or white spot corrosion in high-temperature and high-humidity environments, significantly improving the long-term reliability and environmental durability of the component.

[0118] In some embodiments, the reflectivity of the photovoltaic module on the first surface 101 side is 1.5% to 2%.

[0119] This disclosure can significantly reduce the reflectivity of photovoltaic modules on the first surface 101 from 8% to 10% of conventional patterned glass to 1.5% to 2%, a reduction of up to 5% to 80%.

[0120] Compared to single-layer antireflective coated glass with a surface reflectivity typically of 3%–4%, this solution combines a concave-convex structure with a dual-layer functional film consisting of an ion-barrier layer 50 and an antireflective layer 60, creating an optical synergy effect and achieving superior broadband antireflective performance. This not only effectively eliminates glare and light pollution but also increases module output power, significantly enhancing power generation efficiency and environmental adaptability.

[0121] This embodiment of the invention reduces surface reflectivity, suppresses glare, and improves light capture efficiency by providing an uneven structure on the first surface of the first substrate away from the second substrate. Furthermore, an ion-blocking layer and an anti-reflection layer are sequentially disposed on the first surface. The ion-blocking layer covers the uneven structure, preventing the migration of alkali metal ions, protecting the battery from damage, and extending the module's lifespan. The anti-reflection layer contains pores, allowing for anti-reflection effects through refractive index adjustment. Simultaneously, the outer surface of the anti-reflection layer is a fully enclosed structure, effectively preventing the intrusion of moisture and corrosive ions, thus avoiding corrosion of the first substrate. Moreover, the pores within the anti-reflection layer are multiple independent and non-interconnected pore structures, significantly improving the mechanical strength and overall reliability of the anti-reflection layer's protective function. Finally, by rationally setting the thicknesses of the ion-blocking layer and the anti-reflection layer, an optimal balance is achieved between barrier reliability, mechanical stability, optical performance, and manufacturing feasibility.

[0122] Those skilled in the art will understand that the above embodiments are specific examples of implementing this disclosure, and in practical applications, various changes in form and detail may be made without departing from the spirit and scope of this disclosure. Any person skilled in the art can make various alterations and modifications without departing from the spirit and scope of this disclosure; therefore, the scope of protection of this disclosure should be determined by the scope defined in the claims.

Claims

1. A photovoltaic module, characterized in that, include: A first substrate and a second substrate are disposed opposite to each other. The first substrate has a first surface and a second surface opposite to each other. The first surface is located on the side of the first substrate away from the second substrate. The first surface has a concave-convex structure and the surface roughness of the concave-convex structure is 100nm~500nm. A battery string and an encapsulation layer, wherein the battery string and the encapsulation layer are located between the first substrate and the second substrate, and the encapsulation layer is located between the battery string and the first substrate, and also between the battery string and the second substrate; An ion-blocking layer is located on the first surface, and the material of the ion-blocking layer is silicon oxide or silicon nitride. An antireflective layer is located on the side of the ion-blocking layer away from the first surface. The antireflective layer has pores, and the surface of the antireflective layer away from the ion-blocking layer is a fully enclosed surface. The pores inside the antireflective layer are multiple independent and non-connected pore structures.

2. A photovoltaic module according to claim 1, characterized in that, The uneven structure of the first surface is formed by a chemical etching process.

3. A photovoltaic module according to claim 1, characterized in that, The concave-convex structure includes multiple protruding units, which are conical or hemispherical in shape.

4. A photovoltaic module according to claim 1, characterized in that, The ratio of the thickness of the ion blocking layer to the thickness of the antireflective layer is 1:(1~1.5).

5. A photovoltaic module according to claim 4, characterized in that, The thickness of the ion-barrier layer is 50nm~150nm.

6. A photovoltaic module according to claim 4, characterized in that, The thickness of the antireflective layer is 80nm~120nm.

7. A photovoltaic module according to claim 1, characterized in that, The refractive index of the antireflective layer is 1.22~1.

65.

8. A photovoltaic module according to claim 1, characterized in that, The reflectivity of the photovoltaic module on the first surface side is 1.5% to 2%.

Images