Impurity separation device and impurity separation method based on mass-to-charge ratio difference

Abstract

The invention discloses an impurity separation device and an impurity separation method based on mass-to-charge ratio difference, and relates to the technical field of metallurgical separation, metal purification and thin film deposition, the impurity separation device comprises: a vacuum system for providing a vacuum or inert gas environment; the excitation device is used for exciting the to-be-purified raw material and generating a mixed ion beam, and the excitation device is provided with an ion beam outlet; the separation device is connected with the vacuum system, a single electric field area and an electromagnetic composite field area are arranged in the separation device side by side, and the mixed ion beam enters the single electric field area through the ion beam outlet to be accelerated and then enters the electromagnetic composite field area to generate deflection and separation to form a plurality of single-component ion beams; any single-component ion beam returns to the single electric field area after deflection and is decelerated; and the collecting device is arranged in the separating device and used for collecting the decelerated single-component ion beams, impurity elements can be separated through a single method, the separating process is simple, efficiency is high, and preparation of ultra-pure metal and alloy materials is achieved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of metallurgical separation, metal purification and thin film deposition, and particularly relates to an impurity separation device based on mass-to-charge ratio difference and an impurity separation method. BACKGROUND

[0002] Metallurgical separation and purification is a process of extracting and purifying target metals by using the difference in one or more basic properties of target elements and impurity elements. For example, the metallurgical process for extracting crude metals from minerals includes mineral crushing, flotation, smelting, leaching, and solvent extraction, ion exchange, etc. The process is long, complex, time-consuming, and polluting, and can only produce crude products with limited purity on a large scale. In the use of crude products for deep purification to produce high-purity metals, the current purification principle mainly uses the difference in physical or chemical properties of different elements to realize the separation between elements, such as vacuum metallurgy method using the difference in vapor pressure, directional solidification and zone melting method using the difference in solubility, and solid-state electromigration method using the difference in atomic mobility. However, a single method or a single step cannot separate target elements from all impurity elements at one time, so multiple methods need to be combined, which makes the process complex and low in efficiency. SUMMARY

[0003] The purpose of the present application is to provide an impurity separation device based on mass-to-charge ratio difference and an impurity separation method, which can separate impurity elements using a single method and a single process, has a simple separation process, high separation efficiency, realizes the preparation of ultra-high purity metals and alloy materials, and solves the problems existing in the prior art.

[0004] To achieve the above purpose, the present application provides the following solutions: The application provides a kind of impurity separation device based on mass-to-charge ratio difference, comprising vacuum system, excitation device, separation device and collection device, the vacuum system is used to provide vacuum environment or inert gas environment;The excitation device is used to excite raw material to be purified and generate mixed ion beam, the excitation device is provided with ion beam outlet;The ion beam outlet is connected with the vacuum system, to emit the mixed ion beam to the vacuum system;The separation device is connected with the vacuum system, the separation device is sequentially arranged with single electric field area and electromagnetic complex field area, the single electric field area is communicated with the ion beam outlet, the mixed ion beam is accelerated after entering the single electric field area and enters the electromagnetic complex field area, the mixed ion beam can be deflected in the electromagnetic complex field area, and based on mass-to-charge ratio difference separation forms a plurality of single component ion beams with different deflection trajectories, any one of the single component ion beams can return to the single electric field area after deflection, and slow down under the action of the single electric field area;The collection device is arranged in the separation device and is communicated with the single electric field area, and the collection device is used to collect each single component ion beam after deceleration.

[0005] In some embodiments, the separation device comprises an electric field device and a magnetic field device, the electric field device comprises a negative electrode and a positive electrode arranged in parallel, an electric field is generated between the negative electrode and the positive electrode, an extraction hole is formed in the positive electrode and communicated with the ion beam outlet, and the mixed ion beam enters the single electric field area through the extraction hole;The magnetic field device comprises a first magnet and a second magnet arranged in parallel, and the magnetic field generated between the first magnet and the second magnet is perpendicular to the electric field direction of the electric field;The magnetic field device is arranged close to the negative electrode and is combined with the electric field device to divide the electric field generated between the negative electrode and the positive electrode into the single electric field area close to the positive electrode and the electromagnetic complex field area close to the negative electrode;The collection device is arranged on the positive electrode and located in the single electric field area.

[0006] In some embodiments, the vacuum system comprises a first shell and a second shell, the first shell and the second shell are communicated through a connecting hole, the electric field device is arranged in the first shell, the excitation device is arranged in the second shell, and the ion beam outlet and the extraction hole are communicated through the connecting hole;The magnetic field device is arranged on the first shell.

[0007] In some embodiments, the negative electrode and the positive electrode are connected to the inner wall of the first shell through an insulating mounting structure respectively.

[0008] In some embodiments, the vacuum system further comprises a vacuum valve, the vacuum valve is arranged at the connecting hole, and after the vacuum valve is closed, the first shell and the second shell can be independently vacuumized or broken vacuum.

[0009] In some embodiments, a metal grid is arranged on the extraction hole, and the metal grid is used to extract the mixed ion beam.

[0010] In some embodiments, the vacuum system further comprises a vacuumizing device and a gas analysis measuring device, the vacuumizing device is in communication with the first shell and the second shell to vacuumize the first shell and / or the second shell; a probe of the gas analysis measuring device is arranged in the first shell to analyze and measure the gas pressure and gas components in the first shell.

[0011] In some embodiments, the vacuum system further comprises a gas filling device, the gas filling device is in communication with the first shell and / or the second shell to fill the first shell and / or the second shell with inert gas.

[0012] In some embodiments, the second shell comprises an ion excitation chamber and an ion transmission pipeline, an output end of the excitation device is in communication with the ion excitation chamber, and the excitation device comprises one of an arc discharge excitation device, a laser excitation device and a microwave excitation device.

[0013] The application also provides an impurity separation method using the above-mentioned impurity separation device based on mass-to-charge ratio difference, comprising: putting the raw material to be purified into the excitation device, turning on the vacuum system to create the vacuum environment or the inert gas environment; turning on the separation device to generate the single electric field region and the electromagnetic field composite region; turning on the excitation device to emit the mixed ion beam to the vacuum system, the mixed ion beam is accelerated after entering the single electric field region and then enters the electromagnetic composite field region, the mixed ion beam can be deflected in the electromagnetic composite field region, and based on the mass-to-charge ratio difference, a plurality of single-component ion beams with different deflection trajectories are separated and formed, any single-component ion beam can return to the single electric field region after deflection and slow down under the action of the single electric field region; collecting each single-component ion beam after slowing down by the collection device; turning off the excitation device, the separation device and the vacuum system after a preset time, and taking out the collection device.

[0014] The application has the following technical effects compared with the prior art: The impurity separation device based on mass-to-charge ratio difference provided by the application utilizes the physical characteristics that ion beams with different mass-to-charge ratios are positionally separated during movement in an electromagnetic field, realizes separation and collection of target atoms and impurities in the raw material to be purified, has a simple separation process and high separation efficiency, the raw material to be purified is excited by the excitation device to generate a mixed ion beam, after acceleration in a single electric field area, the mixed ion beam enters an electromagnetic composite field area to be deflected and separated into multiple ion beams, realizing separation of different ion state atoms, and after deceleration in a single electric field area, the mixed ion beam is collected by the collection device, breaking through the bottleneck of the existing purification technology, and assisting in realizing preparation of ultrahigh-purity metal and alloy materials; by selecting different excitation devices, the device can also be used for processing and separation of various raw materials, and has wide applicability.

[0015] The impurity separation method provided by the application adopts the above-mentioned impurity separation device based on mass-to-charge ratio difference, has a simple separation process and high separation efficiency, and can also be used for processing and separation of various raw materials by selecting different excitation devices, and has wide applicability. BRIEF DESCRIPTION OF DRAWINGS

[0016] In order to more clearly illustrate the technical solutions in the embodiments of the application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiments. Obviously, the drawings in the following description only constitute some embodiments of the application, and for those skilled in the art, other drawings can also be obtained based on these drawings without creative labor.

[0017] Figure 1 The impurity separation device in the embodiment provided by the application is shown in the overall structure diagram. Figure 2 The principle diagram of the impurity separation device in the embodiment provided by the application is shown. Figure 3 The front view of the impurity separation device in the embodiment provided by the application is shown. Figure 4 The A-A sectional view of the impurity separation device in the embodiment provided by the application is shown. Figure 3 The structure diagram of the electric field device in the embodiment provided by the application is shown. Figure 5 The local enlarged view of the B part in the embodiment provided by the application is shown. Figure 6 Figure 4 The local enlarged view of the B part in the embodiment provided by the application is shown.

[0018] ​In the figure: 100, impurity separation device; 1, excitation device; 2, electric field device; 21, positive electrode; 211, extraction hole; 212, metal grid; 22, negative electrode; 23, single electric field area; 3, magnetic field device; 31, first magnet; 32, second magnet; 33, electromagnetic composite field area; 4, vacuum system; 41, first shell; 411, observation window; 42, second shell; 421, ion excitation chamber; 422, ion transmission pipeline; 43, vacuum pump; 44, partial pressure vacuum gauge; 45, vacuum gauge; 46, air charging device. DETAILED DESCRIPTION

[0019] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the scope of protection of the present application.

[0020] The purpose of the present application is to provide an impurity separation device and method based on mass-to-charge ratio difference, which can separate impurity elements using a single method, has a simple separation process, high separation efficiency, realizes the preparation of ultra-pure metal and alloy materials, and solves the problems of the prior art.

[0021] In order to make the above-mentioned purposes, features and advantages of the present application more apparent and easy to understand, the following will combine the drawings in the embodiments of the present application to further describe the present application in detail. Figures 1-6 and the specific embodiments.

[0022] Embodiment one The present embodiment provides an impurity separation device 100 based on mass-to-charge ratio difference, which is shown in the figure. Figures 1-2The impurity separation device 100 based on the mass-to-charge ratio difference comprises a vacuum system 4, an excitation device 1, a separation device, and a collection device. The vacuum system 4 is configured to provide a vacuum environment or an inert gas environment. The excitation device 1 is configured to excite a raw material to be purified and generate a mixed ion beam. The excitation device 1 is provided with an ion beam outlet. The ion beam outlet is connected to the vacuum system 4 to emit the mixed ion beam to the vacuum system 4. The separation device is connected to the vacuum system 4. The separation device is provided with a single electric field area 23 and an electromagnetic composite field area 33 arranged side by side in the separation device. The single electric field area 23 is in communication with the ion beam outlet. The mixed ion beam enters the single electric field area 23, is accelerated, and then enters the electromagnetic composite field area 33. The mixed ion beam can be deflected in the electromagnetic composite field area 33 and separated based on the mass-to-charge ratio difference to form a plurality of single-component ion beams with different deflection trajectories. Any single-component ion beam can return to the single electric field area 23 after deflection and be decelerated under the action of the single electric field area 23. The collection device is arranged in the separation device and is in communication with the single electric field area 23. The collection device is configured to collect the single-component ion beams after deceleration. The impurity separation device 100 based on the mass-to-charge ratio difference provided in the embodiment utilizes the physical characteristics that the ion beams with different mass-to-charge ratios are separated in position during the movement in the electromagnetic field. When the charged particles move in the electromagnetic field, the charged particles are subjected to the electric field force and the magnetic field force. The resultant force of the two forces is the electromagnetic force on the charged particles, which can be determined according to the formula F = m·dv / dt = q (E + v × B). The electromagnetic force on the charged particles with different mass-to-charge ratios is different when the charged particles move in the electromagnetic field, which leads to the difference in the movement state and the separation in the spatial position, thereby realizing the separation and collection of the target atoms and impurities in the raw material to be purified. The separation process is simple, and the separation efficiency is high. The raw material to be purified is excited by the excitation device 1 to generate the mixed ion beam. After being accelerated by the single electric field area 23, the mixed ion beam is deflected and separated into a plurality of single-component ion beams in the electromagnetic composite field area 33, thereby realizing the separation of different ion state atoms. After being decelerated by the single electric field area 23, the single-component ion beams are collected by the collection device. The bottleneck of the existing purification technology is broken, and the preparation of ultra-high purity metal and alloy materials can be realized. By selecting different excitation devices 1, the impurity separation device 100 can also be used for the treatment and separation of a plurality of raw materials to be purified, and has wide applicability. Moreover, the mixed ion beam is separated and then returned to the single electric field area 23. Under the action of the single electric field area 23, the single-component ion beams can be deposited at the collection device with controlled terminal energy, and the sputtering of the single-component ion beams can be reduced.

[0023] In some embodiments, reference is made to Figures 1-2The separation device comprises an electric field device 2 and a magnetic field device 3. The electric field device 2 comprises a negative electrode 22 and a positive electrode 21 arranged in parallel, and an electric field is generated between the negative electrode 22 and the positive electrode 21. The positive electrode 21 is provided with an extraction hole 211 which is in communication with the ion beam outlet, and the mixed ion beam enters the single electric field area 23 through the extraction hole 211. The magnetic field device 3 comprises a first magnet 31 and a second magnet 32 arranged in parallel, and the magnetic field generated between the first magnet 31 and the second magnet 32 is perpendicular to the electric field direction of the electric field. The magnetic field device 3 is arranged close to the negative electrode 22 and is combined with the electric field device 2 to divide the electric field generated between the negative electrode 22 and the positive electrode 21 into the single electric field area 23 close to the positive electrode 21 and the electromagnetic combined field area 33 close to the negative electrode 22. The collecting device is arranged on the positive electrode 21 and is located in the single electric field area 23. In this embodiment, a direct current power supply is used to apply voltage to the positive electrode 21 and the negative electrode 22 to generate an electric field between the positive electrode 21 and the negative electrode 22. The form of the electric field includes but is not limited to uniform electric field, non-uniform electric field, steady electric field and time-varying electric field, etc. In this embodiment, the electric field is a uniform electric field. The forms of the first magnet 31 and the second magnet 32 include but are not limited to permanent magnet, electromagnet, superconducting magnet, etc. The form of the magnetic field generated includes but is not limited to static magnetic field, time-varying magnetic field, uniform magnetic field, non-uniform magnetic field and their combination forms. In this embodiment, the first magnet 31 and the second magnet 32 are the corresponding two poles of a two-pole electromagnet, and the magnetic field generated between the first magnet 31 and the second magnet 32 is a uniform magnetic field. By arranging the magnetic field device 3 close to the negative electrode 22, the electromagnetic combined field area 33 is formed in the area close to the negative electrode 22, so that the area close to the positive electrode 21 is the single electric field area 23. Referring to Figure 2Taking purification and recovery of a mixture of A metal elements and B metal elements as an example, after the to-be-purified raw material is excited by the excitation device 1, the generated mixed ion beam will undergo the following stages: a stage is a mixed ion beam extraction process, a stage is a mixed ion beam acceleration stage; a stage is a mixed ion beam deflection and separation stage, wherein c1 stage is a stage in which the kinetic energy of each single component ion beam increases, c2 stage is a stage in which the kinetic energy of each single component ion beam decreases, d stage is a single component ion beam deceleration stage; e stage is a single component ion beam deposition stage, wherein e stage is a process in which the single component ion beam is deposited at the collection device with a controlled terminal energy. In this embodiment, the collection device and the electric field device 2 are integrated into the same device. Specifically, the anode 21 includes two sub-plate of emitter and collector, the single component ion beam is deposited on the surface of the collector after deceleration in the single electric field area 23, after the deposition of each single component ion beam is completed, the collector is disassembled to realize the recovery of the target atoms and impurities, the target atoms and impurities are deposited in different areas of the surface of the collector. In other embodiments, the collection device can also be a collection plate or other forms which is independently detachable connected to the surface of the anode 21. In other embodiments, the first magnet 31 and the second magnet 32 can also use two independent magnets in a split form, and in specific use, one of the first magnet 31 and the second magnet 32 uses N pole and the other uses S pole to establish a magnetic field between the first magnet 31 and the second magnet 32.

[0024] In some embodiments, reference is made to Figures 1-4The vacuum system 4 comprises a first shell 41 and a second shell 42, the first shell 41 and the second shell 42 are communicated through the connecting hole, the electric field device 2 is arranged in the first shell 41, the excitation device 1 is arranged in the second shell 42, and the ion beam outlet and the extraction hole 211 are communicated through the connecting hole; the magnetic field device 3 is arranged on the first shell 41. In the embodiment, the positive electrode 21 and the negative electrode 22 of the electric field device 2 are arranged on the opposite two sides of the inner wall of the first shell 41 respectively, the magnetic field device 3 is arranged outside the first shell 41, and the first magnet 31 and the second magnet 32 are arranged in parallel and are located on the top surface and the bottom surface of the first shell 41 respectively, so as to form the electric field and the magnetic field with the electric field direction and the magnetic field direction perpendicular to each other. And the first magnet 31 and the second magnet 32 are arranged close to the negative electrode 22 to form a single electric field area 23 and an electromagnetic composite field area 33 arranged side by side. Specifically, the first shell 41 can comprise a first shell main body and a first shell cover which are detachably connected, and the first shell main body and the first shell cover are sealingly connected, so as to facilitate the recovery and replacement of the collection device. The second shell 42 can also comprise a second shell main body and a second shell cover which are detachably connected, and the second shell main body and the second shell cover are also sealingly connected, so as to facilitate the loading of the raw material to be purified. In the embodiment, the first shell 41 is further provided with an observation window 411 arranged on the side surface perpendicular to the positive electrode 21 or the negative electrode 22, so as to observe and monitor the process condition in the first shell 41.

[0025] In some embodiments, with reference to Figure 4 The negative electrode 22 and the positive electrode 21 are connected to the inner wall of the first shell 41 through the insulating mounting structure respectively. In the embodiment, the insulating mounting structure is an insulating mounting plate made of insulating material, and the insulating material can be selected from ceramic, glass and the like. In the embodiment, the material of the insulating mounting plate is glass. In other embodiments, the insulating mounting structure can also be an insulating mounting buckle, an insulating slot or other structures capable of connecting the negative electrode 22 and the positive electrode 21 to the inner wall of the first shell 41 respectively.

[0026] In some embodiments, the vacuum system 4 further comprises a vacuum valve (not shown in the figure) arranged at the connecting hole. After the vacuum valve is closed, the first shell 41 and the second shell 42 can independently perform vacuumizing or vacuum breaking. By arranging the vacuum valve at the connecting hole, the first shell 41 and the second shell 42 can independently perform vacuumizing or vacuum breaking, so that when the consumables or components of the first shell 41 or the second shell 42 are replaced, the internal environment of the second shell 42 or the first shell 41 is not affected, thereby improving the production efficiency.

[0027] In some embodiments, with reference to Figures 4-6A metal grid 212 is arranged on the extraction hole 211, and the metal grid 212 is used to extract the mixed ion beam. In this embodiment, the metal grid 212 is made of refractory metal materials such as tungsten, molybdenum, and tantalum. By arranging a metal grid 212 between the plasma region and the vacuum chamber, the metal grid 212 is in communication with the anode 21, and the plasma sheath layer and the single electric field region 23 are naturally established on both sides of the metal grid 212, so that the plasma is isolated from the inside of the first shell 41, and the charged particles in the plasma are extracted from the plasma to the single electric field region 23 to become the mixed ion beam with certain energy, composition, and charge state, which is in directional motion, thereby realizing the ion beam extraction process in the a stage. Figure 2

[0028] In some embodiments, referring to Figure 1 The vacuum system 4 further comprises a vacuum pumping device and a gas analysis and measurement device. The vacuum pumping device is in communication with the first shell 41 and the second shell 42 to pump the first shell 41 and / or the second shell 42. The probe of the gas analysis and measurement device is arranged in the first shell 41 to analyze and measure the gas pressure and the gas composition in the first shell 41. Specifically, the first shell 41 is connected to the vacuum pumping device through a first vacuum pipeline and a first valve, and the second shell 42 is connected to the vacuum pumping device through a second vacuum pipeline and a second valve. Closing the vacuum valves can pump the inside of the first shell 41 or the inside of the second shell 42, respectively, and opening the vacuum valves can pump the inside of the first shell 41 and the inside of the second shell 42 simultaneously. In this embodiment, the vacuum pumping device is a vacuum pump 43. In this embodiment, the gas analysis and measurement device comprises a partial pressure vacuum gauge 44 and a vacuum gauge tube 45. The partial pressure vacuum gauge 44 is used for gas composition analysis, and the vacuum gauge tube 45 is used for gas pressure detection. If the vacuum valves are provided to isolate the first shell 41 and the second shell 42, the second shell 42 needs to be provided with an independent gas analysis and measurement device.

[0029] In some embodiments, referring to Figure 1 The vacuum system 4 further comprises a gas filling device 46 in communication with the first shell 41 and / or the second shell 42 to fill the first shell 41 and / or the second shell 42 with inert gas. According to different specific processes, appropriate inert gas can be filled in the first shell 41 and the second shell 42 which have been pumped to a preset vacuum degree to meet the necessary inert gas atmosphere for the separation of the mixed ion beam.

[0030] In some embodiments, referring to Figure 4 ​The second shell 42 comprises an ion excitation chamber 421 and an ion transmission conduit 422. The output end of the excitation device 1 is in communication with the ion excitation chamber 421. The excitation device 1 can be an arc discharge excitation device, a laser excitation device, a microwave excitation device, or the like. For metal materials, the arc discharge excitation device or the laser excitation device can be used for excitation. For non-metal or metal compound raw materials, the microwave excitation device can be used for excitation. In this embodiment, the raw material to be purified is a metal material, the excitation device 1 is a laser excitation device, and the ion transmission conduit 422 is a straight conduit. In other embodiments, the ion transmission conduit 422 can be a curved conduit to intercept large or uncharged particles generated in the ion excitation process of the excitation device 1 on the raw material to be purified. In other embodiments, the excitation device 1 can also be other excitation devices capable of exciting metal materials, non-metal materials, or metal compound materials.

[0031] In other embodiments, the impurity separation device 100 further comprises an auxiliary system for ensuring the normal operation of the separation device, including a cooling system, a power system, a control system, and the like.

[0032] Embodiment Two The embodiment also provides an impurity separation method using the impurity separation device 100 based on the mass-to-charge ratio difference in Embodiment One. The method comprises: placing the raw material to be purified in the excitation device 1, turning on the vacuum system 4 to create a vacuum environment or an inert gas environment; turning on the separation device to generate a single electric field region 23 and an electromagnetic composite field region 33; turning on the excitation device 1 to emit a mixed ion beam to the vacuum system 4. The mixed ion beam enters the single electric field region 23 and is accelerated, and then enters the electromagnetic composite field region 33. The mixed ion beam can be deflected in the electromagnetic composite field region 33, and based on the mass-to-charge ratio difference, a plurality of single-component ion beams with different deflection trajectories are separated and formed. Any single-component ion beam can return to the single electric field region 23 after deflection, and slow down under the action of the single electric field region 23. The collection device collects each single-component ion beam after slowing down. After a preset time, the excitation device 1, the separation device, and the vacuum system 4 are turned off, and the collection device is removed. In an ideal state, i.e., when the single electric field region 23 and the electromagnetic composite field region 33 are large enough, any single-component ion beam can return to the single electric field region 23 after deflection. However, in actual implementation, the single electric field region 23 and the electromagnetic composite field region 33 can be small, and some single-component ion beams that are not collection targets can have a deflection radius that is too large to return to the single electric field region 23. According to actual needs, only the deflection radius of the single-component ion beam that is a collection target can be considered, and the size of the single electric field region 23 and the electromagnetic composite field region 33 can be adjusted.

[0033] The actual implementation process of the above impurity separation method mainly includes: Install, place the raw material to be purified and collect the plate. Connect the inside of the first shell 41 and the second shell 42 with the atmosphere, open or disassemble the second shell 42, load the raw material to be purified into the excitation device 1 and place it properly.

[0034] Obtain the necessary vacuum or inert gas atmosphere for the process. Turn on the vacuum system 4, and vacuum the inside of the first shell 41 and the second shell 42 to the necessary vacuum degree for the process, or appropriately fill in the inert gas to achieve the necessary inert gas atmosphere for the process. Preferably, after the first time the background vacuum degree is reached in the inside of the first shell 41 and the second shell 42, a certain amount of inert gas within a safe range is filled in for cleaning, gas replacement or purging in the inside of the first shell 41 and the second shell 42, and then the inside of the first shell 41 and the second shell 42 is vacuumed again. This step can be repeated multiple times, which is beneficial to reduce the content of sensitive gases harmful to the process and product quality.

[0035] Turn on the electric field device 2 and the magnetic field device 3. Establish a single electric field area 23 and an electromagnetic composite field area 33 in the first shell 41 to accelerate, deflect, separate, decelerate and deposit the mixed ion beam or each single component ion beam.

[0036] Start the separation and purification process. After the single electric field area 23 and the electromagnetic composite field area 33 reach the set working conditions and are stable, turn on the excitation device 1 to start the excitation of the raw material to be purified, and generate a mixed plasma. After the plasma flows through the metal mesh 212 from the extraction hole 211 to form a mixed ion beam, under the driving action of the single electric field area 23 and the electromagnetic composite field area 33, the steps of accelerating, deflecting, separating, decelerating and depositing the mixed ion beam or each single component ion beam automatically start and maintain until the excitation device 1 is turned off or the raw material to be purified is consumed.

[0037] End or pause the separation and purification process. When the process requirements are met or the consumables need to be replaced, turn off the excitation device 1, the electric field device 2 and the magnetic field device 3 and the vacuum system 4 in turn, connect the inside of the equipment with the atmosphere, take out or disassemble the collection plate with the separation and purification product, and replace the consumables. After this step is completed, it is considered that a complete process cycle is ended.

[0038] The impurity separation method provided by the application adopts the impurity separation device 100 based on the mass-to-charge ratio difference of example one, has a simple separation process and high separation efficiency; by selecting different excitation devices 1, it can also be used for the treatment and separation of various raw materials, and has wide applicability.

[0039] The principles and implementation manners of the present application are described by using specific examples in the present application, and the above examples are only used for helping to understand the method of the present application and its core idea; meanwhile, for the general technical personnel in the art, according to the idea of the present application, the specific implementation manners and application ranges will be changed. In conclusion, the content of the present specification should not be understood as the limitation of the present application.

Claims

1. An impurity separation device based on mass-to-charge ratio difference, characterized in that: include: Vacuum systems are used to provide a vacuum environment or an inert gas environment; An excitation device is used to excite the raw material to be purified and generate a mixed ion beam. The excitation device is provided with an ion beam outlet. The ion beam outlet is connected to the vacuum system to emit the mixed ion beam into the vacuum system. A separation device is connected to the vacuum system. A single electric field region and an electromagnetic composite field region are arranged side by side inside the separation device. The single electric field region is connected to the ion beam outlet. The mixed ion beam enters the single electric field region, is accelerated, and then enters the electromagnetic composite field region. The mixed ion beam can be deflected in the electromagnetic composite field region and separated into multiple single component ion beams with different deflection trajectories based on the difference in mass-to-charge ratio. Any single component ion beam can return to the single electric field region after deflection and decelerate under the action of the single electric field region. as well as A collecting device is disposed within the separating device and connected to the single electric field region. The collecting device is used to collect each of the decelerated single component ion beams.

2. The impurity separation device based on mass-to-charge ratio difference according to claim 1, characterized in that: The separation device includes: An electric field device, comprising a negative electrode and a positive electrode arranged in parallel, wherein an electric field is generated between the negative electrode and the positive electrode, and an extraction port communicating with the ion beam outlet is provided on the positive electrode, through which the mixed ion beam enters the single electric field region; and A magnetic field device includes a first magnet and a second magnet arranged in parallel, wherein the magnetic field generated between the first magnet and the second magnet is perpendicular to the electric field direction; the magnetic field device is disposed near the negative electrode and combines with the electric field device to divide the electric field generated between the negative electrode and the positive electrode into a single electric field region near the positive electrode and an electromagnetic composite field region near the negative electrode; a collecting device is disposed on the positive electrode and located within the single electric field region.

3. The impurity separation device based on mass-to-charge ratio difference according to claim 2, characterized in that: The vacuum system includes a first housing and a second housing, which are connected by a connecting hole. The electric field device is disposed in the first housing, the excitation device is disposed in the second housing, and the ion beam outlet and the extraction hole are connected by the connecting hole. The magnetic field device is mounted on the first housing.

4. The impurity separation device based on mass-to-charge ratio difference according to claim 3, characterized in that: The negative electrode and the positive electrode are respectively connected to the inner wall of the first housing through an insulating mounting structure.

5. The impurity separation device based on mass-to-charge ratio difference according to claim 3, characterized in that: The vacuum system also includes a vacuum valve, which is located at the connection hole. When the vacuum valve is closed, both the first housing and the second housing can independently perform vacuuming or vacuum breaking.

6. The impurity separation device based on mass-to-charge ratio difference according to any one of claims 2 to 5, characterized in that: A metal grid is provided on the extraction hole, and the metal grid is used to extract the mixed ion beam.

7. The impurity separation device based on mass-to-charge ratio difference according to any one of claims 3 to 5, characterized in that: The vacuum system also includes: A vacuum pumping device, which is connected to the first housing and the second housing, to perform vacuum pumping on the first housing and / or the second housing; A gas analysis and measurement device, wherein the probe of the gas analysis and measurement device is disposed inside the first housing to analyze and measure the gas pressure and gas composition inside the first housing.

8. The impurity separation device based on mass-to-charge ratio difference according to claim 7, characterized in that: The vacuum system further includes an inflation device, which is in communication with the first housing and / or the second housing to inflate the first housing and / or the second housing with an inert gas.

9. The impurity separation device based on mass-to-charge ratio difference according to any one of claims 3 to 5, characterized in that: The second housing includes an ion excitation chamber and an ion transport channel. The output end of the excitation device is connected to the ion excitation chamber. The excitation device includes one of an arc discharge excitation device, a laser excitation device, and a microwave excitation device.

10. A method for impurity separation using the impurity separation device based on mass-to-charge ratio difference as described in any one of claims 1 to 9, characterized in that: include: The raw material to be purified is placed in the excitation device, and the vacuum system is turned on to create the vacuum environment or the inert gas environment. The separation device is activated to generate the single electric field region and the electromagnetic field composite region. The excitation device is turned on to emit the mixed ion beam into the vacuum system. The mixed ion beam is accelerated after entering the single electric field region and then enters the electromagnetic composite field region. The mixed ion beam can be deflected in the electromagnetic composite field region and separated into multiple single component ion beams with different deflection trajectories based on the difference in mass-to-charge ratio. Any single component ion beam can return to the single electric field region after deflection and decelerate under the action of the single electric field region. The decelerated individual component ion beams are collected by the collection device. After a preset time, the excitation device, the separation device, and the vacuum system are turned off, and the collection device is removed.

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