Ion beam current measurement module and apparatus, measurement method, and implantation device

By designing the spacing between the receiving unit group and the third receiving unit in the beam receiving assembly, the problem of inaccurate measurement of ion beam deflection angle was solved, achieving higher measurement accuracy and reducing secondary electron interference.

WO2026137649A1PCT designated stage Publication Date: 2026-07-02KINGSTONE SEMICONDUCTOR CO LTD +2
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Patent Information

Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
KINGSTONE SEMICONDUCTOR CO LTD
Filing Date
2025-04-15
Publication Date
2026-07-02

AI Technical Summary

Technical Problem

The accuracy of ion beam deflection angle measurement in existing technologies is not high, mainly due to the small spacing between receiving units, which leads to severe secondary electron interference and affects the accuracy of measurement results.

Method used

The design employs a beam receiving component, in which the receiving unit group and the third receiving unit are stacked and spaced apart along the first direction. The receiving unit group includes the first and second receiving units arranged in parallel intervals. The projection of the third receiving unit onto the receiving unit group covers the gap between them, thereby increasing the spacing between the receiving unit group and the third receiving unit and reducing the probability of secondary electronic interference.

Benefits of technology

This improves the accuracy of ion beam deflection angle measurement, reduces the impact of secondary electrons on the detection results of adjacent receiving units, and ensures the accuracy of measurement results.

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Abstract

An ion beam current measurement module and apparatus, a measurement method, and an implantation device. The measurement module is configured to measure a deflection angle of an ion beam current. The measurement module comprises a beam current receiving assembly, used for receiving the ion beam current; the beam current receiving assembly comprises a receiving unit group and a third receiving unit which are stacked in a first direction, and the third receiving unit is spaced apart from the receiving unit group in the first direction; the receiving unit group comprises a first receiving unit and a second receiving unit arranged in parallel and spaced apart, the arrangement direction of the first receiving unit and the second receiving unit is perpendicular to the first direction, and a gap between the first receiving unit and the second receiving unit is used for an ion beam current to pass through and reach the third receiving unit; and the projection of the third receiving unit on the receiving unit group covers the gap between the first receiving unit and the second receiving unit. The present invention is beneficial to improving the measurement accuracy of a deflection angle of an ion beam current.
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